Classifications

• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
  • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
  • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
• • G—PHYSICS
  • G01—MEASURING; TESTING
  • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
  • G01Q30/00—Auxiliary means serving to assist or improve the scanning probe techniques or apparatus, e.g. display or data processing devices
  • G01Q30/02—Non-SPM analysing devices, e.g. SEM [Scanning Electron Microscope], spectrometer or optical microscope
• • G—PHYSICS
  • G01—MEASURING; TESTING
  • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
  • G01Q30/00—Auxiliary means serving to assist or improve the scanning probe techniques or apparatus, e.g. display or data processing devices
  • G01Q30/04—Display or data processing devices
• • G—PHYSICS
  • G02—OPTICS
  • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
  • G02B21/00—Microscopes
  • G02B21/0004—Microscopes specially adapted for specific applications
  • G02B21/002—Scanning microscopes
  • G02B21/0024—Confocal scanning microscopes (CSOMs) or confocal "macroscopes"; Accessories which are not restricted to use with CSOMs, e.g. sample holders
  • G02B21/008—Details of detection or image processing, including general computer control
• • G—PHYSICS
  • G06—COMPUTING OR CALCULATING; COUNTING
  • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
  • G06T11/00—Two-dimensional [2D] image generation
  • G06T11/60—Creating or editing images; Combining images with text
• • G—PHYSICS
  • G06—COMPUTING OR CALCULATING; COUNTING
  • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
  • G06T7/00—Image analysis
  • G06T7/0002—Inspection of images, e.g. flaw detection
  • G06T7/0004—Industrial image inspection
  • G06T7/0008—Industrial image inspection checking presence/absence
• • G—PHYSICS
  • G06—COMPUTING OR CALCULATING; COUNTING
  • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
  • G06T7/00—Image analysis
  • G06T7/40—Analysis of texture
• • G—PHYSICS
  • G06—COMPUTING OR CALCULATING; COUNTING
  • G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
  • G06V10/00—Arrangements for image or video recognition or understanding
  • G06V10/40—Extraction of image or video features
  • G06V10/46—Descriptors for shape, contour or point-related descriptors, e.g. scale invariant feature transform [SIFT] or bags of words [BoW]; Salient regional features
  • G06V10/467—Encoded features or binary features, e.g. local binary patterns [LBP]
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
  • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
  • H01J2237/25—Tubes for localised analysis using electron or ion beams
  • H01J2237/2505—Tubes for localised analysis using electron or ion beams characterised by their application
  • H01J2237/2583—Tubes for localised analysis using electron or ion beams characterised by their application using tunnel effects, e.g. STM, AFM
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
  • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
  • H01J2237/26—Electron or ion microscopes
  • H01J2237/28—Scanning microscopes
  • H01J2237/2813—Scanning microscopes characterised by the application
  • H01J2237/2817—Pattern inspection
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
  • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
  • H01J2237/30—Electron or ion beam tubes for processing objects
  • H01J2237/317—Processing objects on a microscale
  • H01J2237/3174—Etching microareas
  • H01J2237/31742—Etching microareas for repairing masks
  • H01J2237/31744—Etching microareas for repairing masks introducing gas in vicinity of workpiece

Landscapes

• Physics & Mathematics (AREA)
• General Physics & Mathematics (AREA)
• Engineering & Computer Science (AREA)
• Radiology & Medical Imaging (AREA)
• Health & Medical Sciences (AREA)
• General Health & Medical Sciences (AREA)
• Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
• Theoretical Computer Science (AREA)
• Computer Vision & Pattern Recognition (AREA)
• Analytical Chemistry (AREA)
• Chemical & Material Sciences (AREA)
• General Engineering & Computer Science (AREA)
• Optics & Photonics (AREA)
• Quality & Reliability (AREA)
• Preparing Plates And Mask In Photomechanical Process (AREA)
• Analysing Materials By The Use Of Radiation (AREA)

Applications Claiming Priority (2)

Publications (3)

Family

ID=53192316

Family Applications (1)

Country Status (3)

Families Citing this family (16)

Family Cites Families (5)

• 2013
  • 2013-12-13 DE DE102013225936.0A patent/DE102013225936B4/de active Active
• 2014
  • 2014-12-12 JP JP2014252222A patent/JP6249236B2/ja active Active
  • 2014-12-12 US US14/568,681 patent/US9990737B2/en active Active

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