JP2015102374A - Circuit board inspection device, integrated circuit inspection device, integrated circuit, circuit board inspection method, and integrated circuit inspection method - Google Patents

Circuit board inspection device, integrated circuit inspection device, integrated circuit, circuit board inspection method, and integrated circuit inspection method Download PDF

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JP2015102374A
JP2015102374A JP2013241916A JP2013241916A JP2015102374A JP 2015102374 A JP2015102374 A JP 2015102374A JP 2013241916 A JP2013241916 A JP 2013241916A JP 2013241916 A JP2013241916 A JP 2013241916A JP 2015102374 A JP2015102374 A JP 2015102374A
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誉 下平
Homare Shimodaira
誉 下平
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Hioki EE Corp
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Abstract

PROBLEM TO BE SOLVED: To detect an incomplete connection state.SOLUTION: A circuit board inspection device comprises: a signal output unit for outputting a control signal to a connection circuit 63; a measurement unit for supplying a constant current for measurement use, for example, between lands 51a, 51b to which are connected connection terminal parts 62a, 62b among a plurality of connection terminal parts 62a-62j connected to a circuit main body, and capable of executing a "first measurement process" for measuring a voltage between lands 51b, 51c to which connection terminal parts 62b, 62c are connected; and a processing unit for outputting a control signal from the signal output unit and connecting the connection terminal parts 62a, 62c to the connection terminal part 62b, as well as controlling the measurement unit to have it execute the "first measurement process" and inspecting a conduction state between the land 51b and the connection circuit 63 by calculating, on the basis of the result of process execution, the resistance value of conduction resistance between the land 51b and the connection circuit 63 to which the connection terminal part 62b is connected and comparing it with an inspection reference value.

Description

本発明は、集積回路が実装された実装基板を検査する基板検査装置および基板検査方法、集積回路を検査する集積回路検査装置および集積回路検査方法、並びに集積回路に関するものである。   The present invention relates to a substrate inspection apparatus and a substrate inspection method for inspecting a mounting board on which an integrated circuit is mounted, an integrated circuit inspection apparatus and an integrated circuit inspection method for inspecting an integrated circuit, and an integrated circuit.

例えば、下記の特許文献1には、JTAG規格に準じた各種の検査が可能なLSIが実装されている被検査基板を検査可能に構成された回路試験装置が開示されている。この回路試験装置は、被検査基板および治具(被検査基板との間で各種信号を送受信させることで被検査基板の動作を試験するための試験用基板)をそれぞれ接続可能に構成されると共に、試験プログラムを実行して被検査基板の動作を試験するための試験信号を発生させる制御CPUと、制御CPUが発生させた試験信号を被検査基板および治具に分配して入力する分配回路とを備えている。   For example, Patent Document 1 below discloses a circuit test apparatus configured to be able to inspect a substrate to be inspected on which an LSI capable of performing various inspections in accordance with the JTAG standard is mounted. The circuit test apparatus is configured to be connectable to a substrate to be inspected and a jig (a test substrate for testing the operation of the substrate to be inspected by transmitting and receiving various signals to and from the substrate to be inspected). A control CPU that executes a test program and generates a test signal for testing the operation of the substrate to be inspected, and a distribution circuit that distributes and inputs the test signal generated by the control CPU to the substrate to be inspected and the jig It has.

この回路試験装置による被検査基板の検査に際しては、制御CPUが試験プログラムに従って試験信号を発生させて分配回路を介して被検査基板に入力させる。この際に、被検査基板に実装されているLSIが不良品のときや、LSIの接続端子に端子浮き等が生じているときには、制御CPUから出力された試験信号に応じてLSIが正常に動作しないため、正常動作時に被検査基板(LSI)から出力されるべき信号が被検査基板から出力されなかったり、出力されるべき信号とは相違する信号が出力されたりする。したがって、制御CPUは、試験信号を出力した後に、出力されるべき信号が被検査基板(LSI)から出力されなかったときに、その試験信号に対応する試験項目についての不良が存在すると判定する。   When inspecting a substrate to be inspected by this circuit test apparatus, the control CPU generates a test signal according to the test program and inputs it to the substrate to be inspected via the distribution circuit. At this time, when the LSI mounted on the board to be inspected is defective or when the terminal of the LSI is floating, the LSI operates normally according to the test signal output from the control CPU. Therefore, a signal that should be output from the substrate to be inspected (LSI) during normal operation may not be output from the substrate to be inspected, or a signal that is different from the signal that should be output may be output. Therefore, after outputting the test signal, the control CPU determines that there is a defect for the test item corresponding to the test signal when the signal to be output is not output from the inspected substrate (LSI).

一方、端子浮き等が生じることなく、正常なLSIが実装されているときには、制御CPUから出力された試験信号に応じてLSIが正常に動作するため、正常動作時に被検査基板(LSI)から出力されるべき信号が被検査基板から出力される。したがって、制御CPUは、試験信号を出力した後に、出力されるべき信号が被検査基板(LSI)から出力されたときに、その試験信号に対応する試験項目については正常であると判定する。この後、制御CPUは、試験プログラムに従って他の試験信号を順次出力することにより、被検査基板(LSI)について予め規定された各試験項目を試験する。   On the other hand, when a normal LSI is mounted without causing terminal floating or the like, the LSI operates normally according to the test signal output from the control CPU, and therefore output from the substrate to be inspected (LSI) during normal operation. A signal to be processed is output from the substrate to be inspected. Therefore, after outputting the test signal, the control CPU determines that the test item corresponding to the test signal is normal when the signal to be output is output from the inspected substrate (LSI). Thereafter, the control CPU tests each test item defined in advance for the substrate to be inspected (LSI) by sequentially outputting other test signals in accordance with the test program.

特開2008−89340号公報(第3−9頁、第1,2図)JP 2008-89340 A (page 3-9, FIGS. 1 and 2)

ところが、従来の回路試験装置(検査装置)、およびその試験方法(検査方法)には、以下の解決すべき問題点が存在する。すなわち、従来の検査装置では、各試験項目毎に予め規定された試験信号を被検査基板に入力し、その際に、出力されるべき信号が出力されるか否かに基づいて被検査基板(LSI)を検査する構成・検査方法が採用されている。この場合、この種の検査装置による検査対象の基板では、LSIの接続端子と実装基板の接続用導体(ランド)とが、上記の試験信号等の入出力が可能な程度に接続されているものの、振動が加わったときなどに接続が絶たれてしまうような不完全な接続状態となっていることがある。また、LSIの内部においても、回路本体と接続端子とを接続する要素(ボンディングワイヤ、バンプ、シリコン貫通ビア等)において回路本体および接続端子のいずれかまたは双方に対して不完全な接続状態となっていることもある。   However, the conventional circuit test apparatus (inspection apparatus) and its test method (inspection method) have the following problems to be solved. That is, in the conventional inspection apparatus, a test signal defined in advance for each test item is input to the substrate to be inspected, and at that time, the substrate to be inspected (based on whether or not a signal to be output is output) A configuration / inspection method for inspecting (LSI) is employed. In this case, in the board to be inspected by this type of inspection apparatus, the connection terminals of the LSI and the connection conductors (lands) of the mounting board are connected to such an extent that the above test signals and the like can be input and output. In some cases, the connection may be incomplete, such as when the vibration is applied. In addition, even in the LSI, elements (bonding wires, bumps, through silicon vias, etc.) that connect the circuit body and connection terminals are incompletely connected to either or both of the circuit body and connection terminals. Sometimes.

しかしながら、従来の回路試験装置、およびその試験方法には、たとえ不完全な接続状態となっている部位が存在したとしても、回路試験装置から被検査基板(LSI)への試験信号の出力、およびその試験信号に応じて被検査基板(LSI)から出力される信号の回路試験装置への入力が正常に行われたときには、その被検査基板(LSI)が良品であると検査される。このため、検査の完了後に、上記の不完全な接続状態の部位に接続不良が生じて正常に動作しない状態となることがある。このように、従来の回路試験装置、およびその試験方法には、検査の完了後に接続不良が生じるおそれのある不完全な接続状態を検出することができないという問題点が存在する。   However, the conventional circuit test apparatus and its test method output test signals from the circuit test apparatus to the substrate to be inspected (LSI), even if there is an incompletely connected part. When a signal output from the board to be inspected (LSI) is normally input to the circuit test apparatus in accordance with the test signal, the board to be inspected (LSI) is inspected as a non-defective product. For this reason, after the inspection is completed, a connection failure may occur in the incompletely connected portion, and the device may not operate normally. As described above, the conventional circuit test apparatus and the test method have a problem that it is impossible to detect an incomplete connection state in which a connection failure may occur after the inspection is completed.

この場合、LSIの接続端子および実装基板の接続用導体の間の接続状態については、接続端子および接続用導体の双方にプローブをそれぞれプロービングして抵抗値を測定することで、上記のような不完全な接続状態を検出する検査装置・検査方法が存在する。しかしながら、ファインピッチ化が進む今日の基板や集積回路では、接続端子および接続用導体にプローブを別個独立してプロービングさせるのが困難となっている。また、例えば、ボールグリッドアレイ型の集積回路では、接続端子および接続用導体にプローブをプロービングすることができず、集積回路内の回路本体と接続端子とを接続する上記のような要素についても、プローブをプロービングすることができない。このため、抵抗値を測定する既存の検査装置の構成・方法においても、不完全な接続状態を検出するのが困難となっている。   In this case, the connection state between the connection terminal of the LSI and the connection conductor of the mounting board is determined by probing the probe to both the connection terminal and the connection conductor and measuring the resistance value as described above. There are inspection devices and inspection methods that detect a complete connection state. However, in today's substrates and integrated circuits where fine pitches are becoming increasingly difficult, it is difficult to probe probes independently at connection terminals and connection conductors. Further, for example, in the ball grid array type integrated circuit, the probe cannot be probed to the connection terminal and the connection conductor, and the above-described elements for connecting the circuit body and the connection terminal in the integrated circuit are also provided. The probe cannot be probed. For this reason, it is difficult to detect an incomplete connection state even in the configuration and method of an existing inspection apparatus that measures the resistance value.

本発明は、かかる解決すべき問題点に鑑みてなされたものであり、接続不良が生じるおそれのある不完全な接続状態を検出し得る基板検査装置、集積回路検査装置、集積回路、基板検査方法および集積回路検査方法を提供することを主目的とする。   The present invention has been made in view of the problems to be solved, and is a substrate inspection apparatus, integrated circuit inspection apparatus, integrated circuit, and substrate inspection method capable of detecting an incomplete connection state that may cause a connection failure. It is a main object of the present invention to provide an integrated circuit inspection method.

上記目的を達成すべく請求項1記載の基板検査装置は、回路本体と、当該回路本体に接続された複数の接続端子部と、外部装置から出力された制御信号に従って前記各接続端子部のうちの1つに対して当該1つの接続端子部とは相違する2つの当該接続端子部を接続する接続処理を実行する接続回路とが形成されている集積回路が実装された実装基板を検査対象として当該実装基板において当該各接続端子部が接続されている各接続用導体と当該接続回路との間の導通状態を検査可能に構成され、前記制御信号を出力する前記外部装置としての信号出力部と、前記1つの接続端子部が接続されている前記接続用導体と前記2つの接続端子部のうちの一方が接続されている前記接続用導体との間に測定用電流を供給すると共に、前記1つの接続端子部が接続されている前記接続用導体と前記2つの接続端子部のうちの他方が接続されている前記接続用導体との間の電圧を測定する第1の測定処理、および前記1つの接続端子部が接続されている前記接続用導体と前記2つの接続端子部のうちの一方が接続されている前記接続用導体との間に測定用電圧を印加すると共に、前記1つの接続端子部が接続されている前記接続用導体と前記2つの接続端子部のうちの他方が接続されている前記接続用導体との間を流れる電流を測定する第2の測定処理の少なくとも一方を実行可能な測定部と、前記信号出力部を制御して前記制御信号を出力させて前記1つの接続端子部に対して前記2つの接続端子部を接続させ、かつ前記測定部を制御して前記少なくとも一方の測定処理を実行させると共に、当該少なくとも一方の測定処理の結果に基づいて前記1つの接続端子部が接続されている前記接続用導体と前記接続回路との間の導通抵抗の抵抗値を求めて検査用基準値と比較することで当該接続用導体と当該接続回路との間の導通状態を検査する処理部とを備えている。   In order to achieve the above object, a substrate inspection apparatus according to claim 1, wherein a circuit body, a plurality of connection terminal portions connected to the circuit body, and each of the connection terminal portions according to a control signal output from an external device A mounting board on which an integrated circuit in which a connection circuit that executes connection processing for connecting two connection terminal parts different from the one connection terminal part is formed is mounted on one of A signal output unit as the external device configured to be able to inspect a conduction state between each connection conductor to which each connection terminal unit is connected on the mounting substrate and the connection circuit, and to output the control signal; Supplying a measurement current between the connection conductor to which the one connection terminal portion is connected and the connection conductor to which one of the two connection terminal portions is connected; Connections A first measurement process for measuring a voltage between the connection conductor to which a child part is connected and the connection conductor to which the other of the two connection terminal parts is connected, and the one connection A measurement voltage is applied between the connection conductor to which the terminal portion is connected and the connection conductor to which one of the two connection terminal portions is connected, and the one connection terminal portion is Measurement capable of executing at least one of the second measurement processes for measuring a current flowing between the connected conductor for connection and the connection conductor to which the other of the two connection terminal portions is connected. And the signal output unit to output the control signal, connect the two connection terminal units to the one connection terminal unit, and control the measurement unit to measure the at least one of As well as let the process run Obtaining a resistance value of a conduction resistance between the connection conductor to which the one connection terminal portion is connected based on the result of the at least one measurement process and the connection circuit, and comparing it with a reference value for inspection And a processing section for inspecting a conduction state between the connection conductor and the connection circuit.

また、請求項2記載の集積回路検査装置は、回路本体と、当該回路本体に接続された複数の接続端子部と、外部装置から出力された制御信号に従って前記各接続端子部のうちの1つに対して当該1つの接続端子部とは相違する2つの当該接続端子部を接続する接続処理を実行する接続回路とが形成されている集積回路を検査対象として当該各接続端子部の導通状態を検査可能に構成され、前記制御信号を出力する前記外部装置としての信号出力部と、前記1つの接続端子部と前記2つの接続端子部のうちの一方との間に測定用電流を供給すると共に、前記1つの接続端子部と前記2つの接続端子部のうちの他方との間の電圧を測定する第1の測定処理、および前記1つの接続端子部と前記2つの接続端子部のうちの一方との間に測定用電圧を印加すると共に、前記1つの接続端子部と前記2つの接続端子部のうちの他方との間を流れる電流を測定する第2の測定処理の少なくとも一方を実行可能な測定部と、前記信号出力部を制御して前記制御信号を出力させて前記1つの接続端子部に対して前記2つの接続端子部を接続させ、かつ前記測定部を制御して前記少なくとも一方の測定処理を実行させると共に、当該少なくとも一方の測定処理の結果に基づいて前記1つの接続端子部の導通抵抗の抵抗値を求めて検査用基準値と比較することで当該1つの接続端子部の導通状態を検査する処理部とを備えている。   According to another aspect of the present invention, there is provided an integrated circuit inspection apparatus including: a circuit body; a plurality of connection terminal portions connected to the circuit body; and one of the connection terminal portions according to a control signal output from an external device. On the other hand, the continuity state of each connection terminal portion is determined by examining an integrated circuit in which a connection circuit for executing connection processing for connecting two connection terminal portions different from the one connection terminal portion is formed. A measurement current is supplied between the signal output unit as the external device configured to be inspectable and outputting the control signal, and one of the one connection terminal unit and the two connection terminal units. A first measurement process for measuring a voltage between the one connection terminal portion and the other of the two connection terminal portions, and one of the one connection terminal portion and the two connection terminal portions. Measuring voltage between And a measurement unit capable of executing at least one of a second measurement process for measuring a current flowing between the one connection terminal unit and the other of the two connection terminal units, and the signal output unit The control signal is output to connect the two connection terminal portions to the one connection terminal portion, and the measurement unit is controlled to execute the at least one measurement process, and A processing unit for inspecting a conduction state of the one connection terminal unit by obtaining a resistance value of the conduction resistance of the one connection terminal unit based on a result of at least one measurement process and comparing the resistance value with an inspection reference value; I have.

また、請求項3記載の集積回路は、回路本体と、当該回路本体に接続された複数の接続端子部と、外部装置から出力された制御信号に従って前記各接続端子部のうちの1つに対して当該1つの接続端子部とは相違する2つの当該接続端子部を接続する接続処理を実行する接続回路とが形成されている。   According to a third aspect of the present invention, there is provided an integrated circuit according to claim 1, wherein a circuit body, a plurality of connection terminal portions connected to the circuit body, and one of the connection terminal portions according to a control signal output from an external device are provided. Thus, there is formed a connection circuit for executing a connection process for connecting two connection terminal portions different from the one connection terminal portion.

また、請求項4記載の基板検査方法は、回路本体と、当該回路本体に接続された複数の接続端子部と、外部装置から出力された制御信号に従って前記各接続端子部のうちの1つに対して当該1つの接続端子部とは相違する2つの当該接続端子部を接続する接続処理を実行する接続回路とが形成されている集積回路が実装された実装基板を検査対象として当該実装基板において当該各接続端子部が接続されている各接続用導体と当該接続回路との間の導通状態を検査する際に、前記制御信号を出力して前記1つの接続端子部に対して前記2つの接続端子部を接続させ、かつ前記1つの接続端子部が接続されている前記接続用導体と前記2つの接続端子部のうちの一方が接続されている前記接続用導体との間に測定用電流を供給すると共に、前記1つの接続端子部が接続されている前記接続用導体と前記2つの接続端子部のうちの他方が接続されている前記接続用導体との間の電圧を測定する第1の測定処理、および前記1つの接続端子部が接続されている前記接続用導体と前記2つの接続端子部のうちの一方が接続されている前記接続用導体との間に測定用電圧を印加すると共に、前記1つの接続端子部が接続されている前記接続用導体と前記2つの接続端子部のうちの他方が接続されている前記接続用導体との間を流れる電流を測定する第2の測定処理の少なくとも一方を実行すると共に、当該少なくとも一方の測定処理の結果に基づいて前記1つの接続端子部が接続されている前記接続用導体と前記接続回路との間の導通抵抗の抵抗値を求めて検査用基準値と比較することで当該接続用導体と当該接続回路との間の導通状態を検査する。   According to a fourth aspect of the present invention, there is provided a circuit board inspection method comprising: a circuit body; a plurality of connection terminal portions connected to the circuit body; and one of the connection terminal portions according to a control signal output from an external device. On the other hand, a mounting board on which an integrated circuit on which a connection circuit for executing connection processing for connecting two connection terminal parts different from the one connection terminal part is formed is mounted on the mounting board. When inspecting a conduction state between each connection conductor to which each connection terminal portion is connected and the connection circuit, the control signal is output and the two connection terminals are connected to the one connection terminal portion. A current for measurement is connected between the connection conductor to which the terminal portion is connected and the one connection terminal portion is connected to the connection conductor to which one of the two connection terminal portions is connected. While supplying A first measurement process for measuring a voltage between the connection conductor to which one connection terminal portion is connected and the connection conductor to which the other of the two connection terminal portions is connected; and A voltage for measurement is applied between the connection conductor to which one connection terminal portion is connected and the connection conductor to which one of the two connection terminal portions is connected, and the one connection terminal At least one of the second measurement processes for measuring the current flowing between the connection conductor to which the connection portion is connected and the connection conductor to which the other of the two connection terminal portions is connected In addition, a resistance value of a conduction resistance between the connection conductor to which the one connection terminal portion is connected and the connection circuit is obtained based on the result of the at least one measurement process, and compared with a reference value for inspection. To Inspecting electrical continuity between the connection conductor and the connection circuit.

また、請求項5記載の集積回路検査方法は、回路本体と、当該回路本体に接続された複数の接続端子部と、外部装置から出力された制御信号に従って前記各接続端子部のうちの1つに対して当該1つの接続端子部とは相違する2つの当該接続端子部を接続する接続処理を実行する接続回路とが形成されている集積回路を検査対象として当該各接続端子部の導通状態を検査する際に、前記制御信号を出力して前記1つの接続端子部に対して前記2つの接続端子部を接続させ、かつ前記1つの接続端子部と前記2つの接続端子部のうちの一方との間に測定用電流を供給すると共に、前記1つの接続端子部と前記2つの接続端子部のうちの他方との間の電圧を測定する第1の測定処理、および前記1つの接続端子部と前記2つの接続端子部のうちの一方との間に測定用電圧を印加すると共に、前記1つの接続端子部と前記2つの接続端子部のうちの他方との間を流れる電流を測定する第2の測定処理の少なくとも一方を実行すると共に、当該少なくとも一方の測定処理の結果に基づいて前記1つの接続端子部の導通抵抗の抵抗値を求めて検査用基準値と比較することで当該1つの接続端子部の導通状態を検査する。   The integrated circuit inspection method according to claim 5 is a circuit body, a plurality of connection terminal portions connected to the circuit body, and one of the connection terminal portions according to a control signal output from an external device. On the other hand, the continuity state of each connection terminal portion is determined by examining an integrated circuit in which a connection circuit for executing connection processing for connecting two connection terminal portions different from the one connection terminal portion is formed. When inspecting, the control signal is output to connect the two connection terminal portions to the one connection terminal portion, and one of the one connection terminal portion and the two connection terminal portions A first measurement process for supplying a measurement current between the one connection terminal portion and the other of the two connection terminal portions, and the one connection terminal portion, Of the two connection terminal portions And a measurement voltage is applied between the two connection terminals and at least one of the second measurement processes for measuring a current flowing between the one connection terminal and the other of the two connection terminals is executed. At the same time, the resistance value of the conduction resistance of the one connection terminal portion is obtained based on the result of the at least one measurement process and compared with the reference value for inspection, thereby inspecting the conduction state of the one connection terminal portion.

請求項1記載の基板検査装置、および請求項4記載の基板検査方法では、制御信号を出力して各接続端子部のうちの1つに対してその1つの接続端子部とは相違する2つの接続端子部を接続させ、かつ1つの接続端子部が接続されている接続用導体と2つの接続端子部のうちの一方が接続されている接続用導体との間に測定用電流を供給すると共に、1つの接続端子部が接続されている接続用導体と2つの接続端子部のうちの他方が接続されている接続用導体との間の電圧を測定する第1の測定処理、および1つの接続端子部が接続されている接続用導体と2つの接続端子部のうちの一方が接続されている接続用導体との間に測定用電圧を印加すると共に、1つの接続端子部が接続されている接続用導体と2つの接続端子部のうちの他方が接続されている接続用導体との間を流れる電流を測定する第2の測定処理の少なくとも一方を実行すると共に、少なくとも一方の測定処理の結果に基づいて1つの接続端子部が接続されている接続用導体と接続回路との間の導通抵抗の抵抗値を求めて検査用基準値と比較することで接続用導体と接続回路との間の導通状態を検査する。   In the substrate inspection apparatus according to claim 1 and the substrate inspection method according to claim 4, the control signal is output and two of the connection terminal portions different from the one connection terminal portion are output. While connecting the connection terminal portion and supplying a measurement current between the connection conductor to which one connection terminal portion is connected and the connection conductor to which one of the two connection terminal portions is connected A first measurement process for measuring a voltage between a connection conductor to which one connection terminal portion is connected and a connection conductor to which the other of the two connection terminal portions is connected, and one connection A measuring voltage is applied between the connecting conductor to which the terminal portion is connected and the connecting conductor to which one of the two connecting terminal portions is connected, and one connecting terminal portion is connected. The connection conductor and the other of the two connection terminals are connected For connection in which at least one of the second measurement processes for measuring the current flowing between the connection conductors that are connected is performed and one connection terminal portion is connected based on the result of at least one of the measurement processes The conduction state between the connection conductor and the connection circuit is inspected by obtaining the resistance value of the conduction resistance between the conductor and the connection circuit and comparing it with the reference value for inspection.

したがって、請求項1記載の基板検査装置、および請求項4記載の基板検査方法によれば、接続回路によって接続された3つの接続端子部が接続されている3つの接続用導体にプローブ等の接触子を接触させることで3つの接続用導体のうちの1つと接続回路との間の抵抗値を測定することができるため、集積回路の接続端子部、およびその接続端子部が接続されているべき接続用導体の双方にプローブ等の接触子を接触させることができない実装基板(集積回路)であっても、集積回路の接続回路と接続用導体との間に接続不良が生じる可能性がある不完全な接続状態の部位が存在するときには、これを確実に検出することができる。また、接続端子部における回路本体側の端部にプローブ等の接触子を接触させることができない集積回路の接続端子部内における不完全な接続状態の部位の存在を確実に検出することができる。   Therefore, according to the substrate inspection apparatus according to claim 1 and the substrate inspection method according to claim 4, the contact of the probe or the like with the three connection conductors to which the three connection terminal portions connected by the connection circuit are connected. Since the resistance value between one of the three connection conductors and the connection circuit can be measured by bringing the child into contact with each other, the connection terminal portion of the integrated circuit and the connection terminal portion should be connected. Even a mounting board (integrated circuit) in which a contact such as a probe cannot be brought into contact with both of the connecting conductors may cause a connection failure between the connecting circuit of the integrated circuit and the connecting conductor. When there is a completely connected portion, this can be reliably detected. Further, it is possible to reliably detect the presence of an incompletely connected portion in the connection terminal portion of the integrated circuit in which a contact such as a probe cannot be brought into contact with the end of the connection terminal portion on the circuit body side.

請求項2記載の集積回路検査装置、および請求項5記載の集積回路検査方法では、制御信号を出力して各接続端子部のうちの1つに対してその1つの接続端子部とは相違する2つの接続端子部を接続させ、かつ1つの接続端子部と2つの接続端子部のうちの一方との間に測定用電流を供給すると共に、1つの接続端子部と2つの接続端子部のうちの他方との間の電圧を測定する第1の測定処理、および1つの接続端子部と2つの接続端子部のうちの一方との間に測定用電圧を印加すると共に、1つの接続端子部と2つの接続端子部のうちの他方との間を流れる電流を測定する第2の測定処理の少なくとも一方を実行すると共に、少なくとも一方の測定処理の結果に基づいて1つの接続端子部の導通抵抗の抵抗値を求めて検査用基準値と比較することで1つの接続端子部の導通状態を検査する。   In the integrated circuit inspection apparatus according to claim 2 and the integrated circuit inspection method according to claim 5, a control signal is outputted and one of the connection terminal portions is different from the one connection terminal portion. Two connection terminal portions are connected, and a measurement current is supplied between one connection terminal portion and one of the two connection terminal portions, and one connection terminal portion and two connection terminal portions. A first measurement process for measuring a voltage between the other of the first and second connection terminals, and a measurement voltage is applied between one connection terminal portion and one of the two connection terminal portions. At least one of the second measurement processes for measuring the current flowing between the other of the two connection terminal portions is executed, and the conduction resistance of one connection terminal portion is determined based on the result of the at least one measurement process. Find the resistance value and compare it with the reference value for inspection Checking the conduction state of one connection terminal portion by.

したがって、請求項2記載の集積回路検査装置、および請求項5記載の集積回路検査方法によれば、接続回路によって接続された3つの接続端子部に接続子を接触させることにより、3つの接続端子部のうちの1つについての抵抗値を測定することができるため、接続端子部における回路本体側の端部に接触子を接触させることができない集積回路の接続端子部内における不完全な接続状態の部位の存在を確実に検出することができる。   Therefore, according to the integrated circuit inspection apparatus according to claim 2 and the integrated circuit inspection method according to claim 5, the three connection terminals are brought into contact with the three connection terminal portions connected by the connection circuit. Since the resistance value of one of the parts can be measured, the contact terminal cannot be brought into contact with the end of the connection terminal part on the circuit body side. The presence of the site can be reliably detected.

請求項3記載の集積回路によれば、回路本体と、回路本体に接続された複数の接続端子部と、外部装置から出力された制御信号に従って各接続端子部のうちの1つに対してその1つの接続端子部とは相違する2つの接続端子部を接続する接続処理を実行する接続回路とを形成したことにより、接続端子部における回路本体側の端部に接触子を接触させることができない集積回路について、接続回路の各スイッチ部を任意にオン状態に切り替えることで、3つの接続端子部における回路本体側の端部を任意に接続状態にすることができるため、接続回路によって接続された3つの接続端子部が接続されている3つの接続用導体に接触子を接触させることで3つの接続用導体のうちの1つと接続回路との間の抵抗値を測定し、これにより、接続端子部内における不完全な接続状態の部位の存在を確実に検出することができる。   According to the integrated circuit of claim 3, the circuit body, the plurality of connection terminal portions connected to the circuit body, and one of the connection terminal portions according to the control signal output from the external device By forming a connection circuit that executes a connection process for connecting two connection terminal portions different from one connection terminal portion, the contact cannot be brought into contact with the end of the connection terminal portion on the circuit body side. For the integrated circuit, by arbitrarily switching each switch part of the connection circuit to the ON state on the circuit body side in the three connection terminal parts, the connection circuit can be connected. A contact is brought into contact with the three connection conductors to which the three connection terminal portions are connected, thereby measuring a resistance value between one of the three connection conductors and the connection circuit. It is possible to reliably detect the presence of a site of an incomplete connection state in portion.

基板検査装置1の構成を示す構成図である。1 is a configuration diagram showing a configuration of a substrate inspection apparatus 1. FIG. 実装基板50、および実装基板50に実装された集積回路60の構成について説明するための説明図である。It is explanatory drawing for demonstrating the structure of the mounting substrate 50 and the integrated circuit 60 mounted in the mounting substrate 50. FIG. プローブ11の断面図である。2 is a cross-sectional view of a probe 11. FIG. 基板検査装置1による実装基板50(集積回路60)の検査方法について説明するための説明図である。It is explanatory drawing for demonstrating the inspection method of the mounting substrate 50 (integrated circuit 60) by the board | substrate inspection apparatus 1. FIG. 基板検査装置1による実装基板50(集積回路60)の検査方法について説明するための他の説明図である。It is another explanatory drawing for demonstrating the inspection method of the mounting board | substrate 50 (integrated circuit 60) by the board | substrate inspection apparatus. 集積回路検査装置1Aの構成を示す構成図である。It is a block diagram which shows the structure of 1A of integrated circuit test | inspection apparatuses. 基板検査装置1による実装基板50(集積回路60)の検査方法について説明するためのさらに他の説明図である。FIG. 10 is still another explanatory diagram for explaining a method of inspecting the mounting substrate 50 (integrated circuit 60) by the substrate inspection apparatus 1.

以下、本発明に係る基板検査装置、集積回路検査装置、集積回路、基板検査方法および集積回路検査方法の実施の形態について、添付図面を参照して説明する。   Embodiments of a substrate inspection apparatus, an integrated circuit inspection apparatus, an integrated circuit, a substrate inspection method, and an integrated circuit inspection method according to the present invention will be described below with reference to the accompanying drawings.

最初に、「基板検査装置」、「集積回路」および「基板検査方法」の実施の形態について説明する。   First, embodiments of “substrate inspection apparatus”, “integrated circuit”, and “substrate inspection method” will be described.

図1に示す基板検査装置1は、「基板検査装置」の一例であって、後述する「基板検査方法」に従って実装基板50(図2参照)などの各種回路基板の良否を電気的に検査可能に構成されている。また、実装基板50は、検査対象としての「実装基板」の一例であって、図2に示すように、集積回路60などの各種電子部品が実装されて構成されている。   A board inspection apparatus 1 shown in FIG. 1 is an example of a “board inspection apparatus” and can electrically inspect the quality of various circuit boards such as a mounting board 50 (see FIG. 2) according to a “board inspection method” described later. It is configured. The mounting board 50 is an example of a “mounting board” as an inspection target, and is configured by mounting various electronic components such as an integrated circuit 60 as shown in FIG.

この場合、集積回路60は、「集積回路」の一例であって、公知の半導体製造プロセスに従って形成された回路本体61と、回路本体61の回路パターンに接続された複数の接続端子部62a〜62j(以下、区別しないときには「接続端子部62」ともいう)と、回路本体61と共に公知の半導体製造プロセスに従って形成されて基板検査装置1等から出力された制御信号Sに従って各接続端子部62を接続または切断する接続回路63(後述するスイッチ部64a〜64j等)とを備えて構成されている。なお、本例では、発明についての理解を容易とするために、10個の接続端子部62を有する集積回路60を例に挙げて説明するが、実際の「集積回路」には、回路本体61の回路構成に応じてさらに多数の「接続端子部」が設けられている。   In this case, the integrated circuit 60 is an example of an “integrated circuit” and includes a circuit body 61 formed according to a known semiconductor manufacturing process and a plurality of connection terminal portions 62a to 62j connected to the circuit pattern of the circuit body 61. (Hereinafter referred to as “connection terminal portion 62” when not distinguished from each other), each connection terminal portion 62 is connected in accordance with a control signal S which is formed according to a known semiconductor manufacturing process together with the circuit body 61 and output from the substrate inspection apparatus 1 or the like. Alternatively, it is configured to include a connection circuit 63 (switches 64a to 64j and the like which will be described later) for cutting. In this example, in order to facilitate understanding of the invention, an integrated circuit 60 having ten connection terminal portions 62 will be described as an example. However, an actual “integrated circuit” includes a circuit body 61. Many “connection terminal portions” are provided according to the circuit configuration.

また、この種の「集積回路」では、一例として、シリコンウエハ上に形成された回路本体61内の回路パターンと、接続端子部62における接続端子(実装基板50等の回路基板に実装する際に回路基板のランド(接続用導体)に半田付けされる金属部品)とを接続するためのボンディングワイヤ、バンプおよびシリコン貫通ビア等(図示せず)を備えて接続端子部62が構成されている。さらに、10個の接続端子部62を有する本例の集積回路60では、接続端子部62a,62bを接続または切断するスイッチ部64aから、接続端子部62i,62jを接続または切断するスイッチ部64iまでの9個、および接続端子部62j,62aを接続または切断するスイッチ部64jの合計10個のスイッチ部64を備えて接続回路63が構成されている。この場合、各スイッチ部64は、一対の接続端子部62,62における回路本体61側の端部を接続/接断可能に形成されている。   In this type of “integrated circuit”, as an example, a circuit pattern in the circuit body 61 formed on a silicon wafer and a connection terminal in the connection terminal portion 62 (when mounted on a circuit board such as the mounting board 50). The connection terminal portion 62 includes bonding wires, bumps, through silicon vias, and the like (not shown) for connecting the lands (connecting conductors) of the circuit board to the lands (connecting conductors). Further, in the integrated circuit 60 of this example having ten connection terminal portions 62, from the switch portion 64a for connecting or disconnecting the connection terminal portions 62a and 62b to the switch portion 64i for connecting or disconnecting the connection terminal portions 62i and 62j. 9 and a total of ten switch units 64, ie, a switch unit 64j for connecting or disconnecting the connection terminal units 62j and 62a, constitute a connection circuit 63. In this case, each switch part 64 is formed so that the end part on the circuit body 61 side in the pair of connection terminal parts 62 and 62 can be connected / disconnected.

この接続回路63は、一例として、後述するように、基板検査装置1から出力されたJTAG規格に準ずる制御信号Sが入力されたときに、制御信号Sの内容に従い、各接続端子部62のうちの少なくとも1つに対してその1つの接続端子部62とは相違する少なくとも2つの接続端子部62を接続する接続処理を実行する。具体的には、接続回路63は、制御信号Sに従って各スイッチ部64の接続/接断状態を切り替えることにより、任意の3つの接続端子部62を接続する(各接続端子部62のうちの1つに対して他の2つをそれぞれ接続する)と共に、接続した状態の3つの接続端子部62に対して他の7つの接続端子部62を非接続状態にする(接断する)処理を実行する。また、接続回路63は、実装基板50(集積回路60)の検査時以外(実装基板50を製品として使用するとき)には、10個の接続端子部62が互いに非接続状態となるように各スイッチ部64をオフ状態に切り替える。   As an example, the connection circuit 63 includes, as will be described later, when a control signal S conforming to the JTAG standard output from the board inspection apparatus 1 is input, according to the content of the control signal S, A connection process for connecting at least two connection terminal portions 62 different from the one connection terminal portion 62 to at least one of the two is executed. Specifically, the connection circuit 63 connects any three connection terminal units 62 by switching the connection / disconnection state of each switch unit 64 in accordance with the control signal S (one of the connection terminal units 62). The other two connection terminals 62 are connected to each other), and the other seven connection terminal parts 62 are disconnected from (connected to) the three connection terminal parts 62 in a connected state. To do. The connection circuit 63 is configured so that the ten connection terminal portions 62 are not connected to each other except when the mounting substrate 50 (the integrated circuit 60) is inspected (when the mounting substrate 50 is used as a product). The switch unit 64 is switched to the off state.

また、実装基板50には、集積回路60の各接続端子部62を接続可能なランド51a〜51j(「接続用導体」の一例:以下、区別しないときには「ランド51」ともいう)が形成されている。なお、実際の集積回路60には、上記の各ランド51以外の各種導体パターンが形成されると共に、集積回路60以外の各種電子部品が実装されているが、発明についての理解を容易とするために、各ランド51以外の導体パターンや、集積回路60以外の電子部品に関する図示および説明を省略する。   In addition, lands 51 a to 51 j (an example of “connection conductor”: hereinafter referred to as “land 51” when not distinguished) are formed on the mounting substrate 50, to which each connection terminal portion 62 of the integrated circuit 60 can be connected. Yes. In the actual integrated circuit 60, various conductor patterns other than the lands 51 are formed and various electronic components other than the integrated circuit 60 are mounted. However, in order to facilitate understanding of the invention. In addition, illustrations and explanations regarding conductor patterns other than the lands 51 and electronic components other than the integrated circuit 60 are omitted.

一方、図1に示すように、基板検査装置1は、移動機構2、操作部3、表示部4、信号出力部5、測定部6、スキャナ7、処理部8、記憶部9および検査用治具10を備えて構成されている。この場合、検査用治具10は、後述するように、上記の信号出力部5や測定部6と実装基板50の各ランド51とを接続するための接続具であって、図4,5に示すように、接続すべき各ランド51a,51b・・等の位置に応じて複数のプローブ11a,11b・・(以下、区別しないときには「プローブ11」ともいう)が植設されて構成されている。また、図3に示すように、プローブ11は、一例として、一対のプローブ本体12a,12bが絶縁体12cを挟んで一体化されて、1つのランド51に両プローブ本体12a,12bをそれぞれプロービングさせることができるように構成されている。   On the other hand, as shown in FIG. 1, the substrate inspection apparatus 1 includes a moving mechanism 2, an operation unit 3, a display unit 4, a signal output unit 5, a measurement unit 6, a scanner 7, a processing unit 8, a storage unit 9, and an inspection treatment. The tool 10 is provided. In this case, the inspection jig 10 is a connection tool for connecting the signal output unit 5 or the measurement unit 6 to each land 51 of the mounting substrate 50 as described later. As shown, a plurality of probes 11a, 11b,... (Hereinafter also referred to as “probes 11” when not distinguished) are arranged according to the positions of the lands 51a, 51b,. . As shown in FIG. 3, as an example, the probe 11 includes a pair of probe main bodies 12 a and 12 b integrated with an insulator 12 c interposed therebetween, and causes each land 51 to probe both probe main bodies 12 a and 12 b. It is configured to be able to.

また、移動機構2は、処理部8の制御に従い、図示しない基板保持部によって保持された状態の実装基板50に向けて検査用治具10を移動させることによって実装基板50の各ランド51に各プローブ11(プローブ本体12a,12b)をそれぞれプロービングさせる。なお、基板保持部によって保持された状態の実装基板50に向けて検査用治具10を移動させることで各プローブ11を各ランド51にプロービングさせる例について説明するが、検査用治具10に向けて実装基板50(基板保持部)を移動させることで各プローブ11を各ランド51にプロービングさせたり、検査用治具10および実装基板50の双方を接近方向に移動させることで各プローブ11を各ランド51にプロービングさせたりすることもできる。   Further, the moving mechanism 2 moves the inspection jig 10 toward the mounting substrate 50 held by a substrate holding unit (not shown) according to the control of the processing unit 8, thereby moving the inspection jig 10 to each land 51 of the mounting substrate 50. The probes 11 (probe bodies 12a and 12b) are respectively probed. Although an example in which each probe 11 is probed on each land 51 by moving the inspection jig 10 toward the mounting substrate 50 held by the substrate holder will be described. By moving the mounting substrate 50 (substrate holding part), the probes 11 are probed on the lands 51, or by moving both the inspection jig 10 and the mounting substrate 50 in the approaching direction, The land 51 can also be probed.

操作部3は、基板検査装置1による実装基板50の検査条件を設定操作したり、検査開始/停止を指示したりするための各種操作スイッチを備え(図示せず)、スイッチ操作に応じた操作信号を処理部8に出力する。表示部4は、処理部8の制御に従い、基板検査装置1の動作条件(検査条件)を設定するための設定画面や、検査結果を表示するための検査結果画面などの各種表示画面(図示せず)を表示する。   The operation unit 3 includes various operation switches (not shown) for setting and operating inspection conditions for the mounting substrate 50 by the substrate inspection apparatus 1 and instructing start / stop of inspection, and operations corresponding to switch operations. The signal is output to the processing unit 8. The display unit 4 is a variety of display screens (not shown) such as a setting screen for setting operating conditions (inspection conditions) of the substrate inspection apparatus 1 and an inspection result screen for displaying inspection results in accordance with the control of the processing unit 8. Display).

信号出力部5は、「外部装置」としての「信号出力部」の一例であって、JTAG規格に準ずる各種の制御信号Sを出力可能に構成されている。この場合、本例の基板検査装置1では、集積回路60の各スイッチ部64を制御するための制御信号S以外にも、JTAG規格に従って各種の検査を実施するための制御信号Sを信号出力部5から出力して実装基板50(集積回路60)の良否を検査することもできるように構成されているが、JTAG規格に沿った通常の検査については公知のため、その説明を省略する。   The signal output unit 5 is an example of a “signal output unit” as an “external device”, and is configured to output various control signals S conforming to the JTAG standard. In this case, in the board inspection apparatus 1 of this example, in addition to the control signal S for controlling each switch unit 64 of the integrated circuit 60, the signal output unit outputs a control signal S for performing various inspections according to the JTAG standard. 5, the mounting substrate 50 (integrated circuit 60) can be inspected for quality. However, since a normal inspection in accordance with the JTAG standard is known, the description thereof is omitted.

測定部6は、「測定部」の一例であって、図4,5に示すように、定電流源36aおよび電圧測定部36bを備えて構成されている。この測定部6は、処理部8の制御に従い、後述するようにして接続回路63によって接続された状態の3つの接続端子部62のうちの1つが接続されたランド51と、3つの接続端子部62のうちの他の1つが接続されたランド51との間にスキャナ7およびプローブ11を介して定電流源36aから測定用の定電流(「測定用電流」の一例)を供給すると共に、接続回路63によって接続された状態の3つの接続端子部62のうちの1つが接続されたランド51と、3つの接続端子部62のうちのさらに他の1つが接続されたランド51との間の電圧をスキャナ7およびプローブ11を介して電圧測定部36bによって測定し、その測定結果を示す測定値データD1を処理部8に出力する処理(「第1の測定処理」の一例)を実行する。   The measuring unit 6 is an example of a “measuring unit”, and includes a constant current source 36a and a voltage measuring unit 36b as shown in FIGS. The measurement unit 6 includes a land 51 to which one of the three connection terminal units 62 in a state of being connected by the connection circuit 63 is connected as described later, and three connection terminal units according to the control of the processing unit 8. A constant current for measurement (an example of “measurement current”) is supplied from the constant current source 36a via the scanner 7 and the probe 11 to the land 51 to which the other one of 62 is connected, and connected. The voltage between the land 51 to which one of the three connection terminal portions 62 connected by the circuit 63 is connected and the land 51 to which another one of the three connection terminal portions 62 is connected. Is measured by the voltage measuring unit 36b via the scanner 7 and the probe 11, and a process of outputting measured value data D1 indicating the measurement result to the processing unit 8 (an example of “first measurement process”) is executed.

スキャナ7は、処理部8の制御に従い、信号出力部5や測定部6(定電流源36aおよび電圧測定部36b)を検査用治具10の任意のプローブ11(プローブ本体12a,12b)に接続し、かつ、他のプローブ11を信号出力部5や測定部6から切断する。処理部8は、「処理部」に相当し、基板検査装置1を総括的に制御する。具体的には、処理部8は、移動機構2を制御して検査用治具10の各プローブ11(プローブ本体12a,12b)を実装基板50の各ランド51にプロービングさせる。   The scanner 7 connects the signal output unit 5 and the measurement unit 6 (constant current source 36a and voltage measurement unit 36b) to an arbitrary probe 11 (probe bodies 12a and 12b) of the inspection jig 10 according to the control of the processing unit 8. In addition, the other probe 11 is disconnected from the signal output unit 5 and the measurement unit 6. The processing unit 8 corresponds to a “processing unit” and comprehensively controls the substrate inspection apparatus 1. Specifically, the processing unit 8 controls the moving mechanism 2 to cause the probes 11 (probe main bodies 12 a and 12 b) of the inspection jig 10 to be probed on the lands 51 of the mounting substrate 50.

また、処理部8は、スキャナ7を制御して、実装基板50の各ランド51のうちの制御信号S(JTAG信号)を出力すべき接続端子部62が接続されたランド51にプロービングされている一対のプローブ11(プローブ本体12aおよびプローブ本体12bのいずれか)を信号出力部5に接続する。さらに、処理部8は、スキャナ7を制御することにより、各接続端子部62のうちの検査対象の接続端子部62(「1つの接続端子部」の一例)、およびその接続端子部62に接続されている他の接続端子部62(「2つの接続端子部のうちの一方」の一例)にプロービングされている一対のプローブ11を測定部6の定電流源36aに接続し、かつ検査対象の接続端子部62(1つの接続端子部)、およびその接続端子部62に接続されているさらに他の接続端子部62(「2つの接続端子部のうちの他方」の一例)にプロービングされている一対のプローブ11を測定部6の電圧測定部36bに接続させる。   Further, the processing unit 8 controls the scanner 7 and is probed to the land 51 to which the connection terminal unit 62 to which the control signal S (JTAG signal) of the land 51 of the mounting substrate 50 is to be output is connected. A pair of probes 11 (one of the probe main body 12 a and the probe main body 12 b) is connected to the signal output unit 5. Further, the processing unit 8 controls the scanner 7 to connect to the connection terminal unit 62 to be inspected (an example of “one connection terminal unit”) among the connection terminal units 62 and the connection terminal unit 62. The pair of probes 11 probed by the other connecting terminal portion 62 (an example of “one of the two connecting terminal portions”) is connected to the constant current source 36a of the measuring unit 6 and Probing is performed on the connection terminal portion 62 (one connection terminal portion) and still another connection terminal portion 62 (an example of “the other of the two connection terminal portions”) connected to the connection terminal portion 62. The pair of probes 11 are connected to the voltage measurement unit 36 b of the measurement unit 6.

また、処理部8は、信号出力部5を制御して、集積回路60の接続回路63に制御信号Sを出力することにより、測定部6(定電流源36aおよび電圧測定部36b)に接続されている上記の3本のプローブ11(プローブ本体12a,12bのいずれか)がプロービングされているランド51に接続された3つの接続端子部62を接続させる(「各接続端子部のうちの1つに対して1つの接続端子部とは相違する2つの接続端子部を接続させる」との処理の一例」)。さらに、処理部8は、定電流源36aを制御することにより、定電流源36aに接続されている両プローブ11(プローブ本体12a,12bのいずれか)を介して実装基板50(集積回路60)に測定用の定電流を供給させると共に、電圧測定部36bを制御することにより、電圧測定部36bに接続されている両プローブ11(プローブ本体12a,12bのいずれか)がプロービングされている両ランド51間の電圧を測定させる。   The processing unit 8 is connected to the measuring unit 6 (the constant current source 36a and the voltage measuring unit 36b) by controlling the signal output unit 5 and outputting the control signal S to the connection circuit 63 of the integrated circuit 60. The three connection terminals 62 connected to the land 51 on which the three probes 11 (one of the probe bodies 12a and 12b) are probed are connected ("one of the connection terminals"). An example of a process of “connecting two connection terminal portions different from one connection terminal portion” to “)”. Further, the processing unit 8 controls the constant current source 36a to thereby implement the mounting substrate 50 (integrated circuit 60) via both probes 11 (one of the probe bodies 12a and 12b) connected to the constant current source 36a. Both lands in which both probes 11 (one of the probe main bodies 12a and 12b) connected to the voltage measuring unit 36b are probed by supplying a constant current for measurement to the power source and controlling the voltage measuring unit 36b. The voltage between 51 is measured.

また、処理部8は、測定部6(電圧測定部36b)から出力される測定値データD1に基づき、定電流源36aおよび電圧測定部36bの双方に接続されているランド51(「1つの接続端子部が接続されている接続用導体」の一例)と、そのランド51に接続されている接続端子部62に接続された接続回路63(スイッチ部64)との間の導通抵抗の抵抗値を演算し、演算した抵抗値と、検査用基準データD0の値とを比較することにより、そのランド51と接続回路63との間の導通状態を検査する。   Further, the processing unit 8 uses the land 51 (“one connection”) connected to both the constant current source 36a and the voltage measurement unit 36b based on the measurement value data D1 output from the measurement unit 6 (voltage measurement unit 36b). An example of the “connecting conductor to which the terminal portion is connected”) and the resistance value of the conduction resistance between the connection circuit 63 (switch portion 64) connected to the connection terminal portion 62 connected to the land 51 The conduction state between the land 51 and the connection circuit 63 is inspected by calculating and comparing the calculated resistance value with the value of the reference data for inspection D0.

なお、本例の基板検査装置1では、スキャナ7を制御して任意の3本のプローブ11を定電流源36aおよび電圧測定部36bに接続させる処理から、定電流源36aを制御して測定用定電流を出力させ、かつ電圧測定部36bを制御して電圧を測定させる処理までの一連の処理が「第1の測定処理」に相当する。この「第1の測定処理」および測定値データD1や検査用基準データD0に基づく導通状態の検査処理については、後に具体的な例を示して詳細に説明する。一方、記憶部9は、処理部8の動作プログラムや検査用基準データD0などを記憶する。   Note that in the substrate inspection apparatus 1 of this example, from the process of controlling the scanner 7 to connect any three probes 11 to the constant current source 36a and the voltage measuring unit 36b, the constant current source 36a is controlled to perform measurement. A series of processes up to the process of outputting a constant current and controlling the voltage measuring unit 36b to measure the voltage corresponds to the “first measurement process”. The “first measurement process” and the inspection process of the conduction state based on the measurement value data D1 and the inspection reference data D0 will be described in detail later with a specific example. On the other hand, the storage unit 9 stores an operation program of the processing unit 8, reference data for inspection D0, and the like.

この基板検査装置1によって実装基板50を検査する際には、まず、集積回路60等の実装面(ランド51の形成面)を上向きにして実装基板50を基板保持部にセットする。次いで、操作部3の検査開始スイッチが操作されたときに、処理部8は、記憶部9に記憶されている動作プログラムに従って検査処理を開始する。具体的には、処理部8は、まず、移動機構2を制御して信号出力部5に向けて検査用治具10を下降させる。この際には、検査用治具10の各プローブ11(各プローブ本体12a,12b)が実装基板50の各ランド51にそれぞれプロービングされる。   When the mounting substrate 50 is inspected by the substrate inspection apparatus 1, first, the mounting substrate 50 is set on the substrate holding portion with the mounting surface (formation surface of the land 51) of the integrated circuit 60 or the like facing upward. Next, when the inspection start switch of the operation unit 3 is operated, the processing unit 8 starts the inspection process according to the operation program stored in the storage unit 9. Specifically, the processing unit 8 first controls the moving mechanism 2 to lower the inspection jig 10 toward the signal output unit 5. At this time, the probes 11 (probe main bodies 12 a and 12 b) of the inspection jig 10 are respectively probed on the lands 51 of the mounting substrate 50.

次いで、処理部8は、一例として、集積回路60の接続端子部62aが接続されているランド51aと、接続端子部62aに接続されている接続回路63との間の導通状態の検査を開始する。具体的には、処理部8は、信号出力部5を制御して実装基板50(集積回路60の接続回路63)に制御信号Sを出力することにより、図4に示すように、各スイッチ部64のうちのスイッチ部64a,64jをオン状態に切り替えさせると共に、スイッチ部64b〜64iをオフ状態に切り替えさせる。これにより、各接続端子部62のうちの接続端子部62aに対して接続端子部62b,62jの2つが接続されると共に、接続端子部62a,62b,62jに対して接続端子部62c〜62iの7つが切断された状態となる。   Next, for example, the processing unit 8 starts an inspection of a conduction state between the land 51a to which the connection terminal unit 62a of the integrated circuit 60 is connected and the connection circuit 63 connected to the connection terminal unit 62a. . Specifically, the processing unit 8 controls the signal output unit 5 to output a control signal S to the mounting substrate 50 (the connection circuit 63 of the integrated circuit 60), so that each switch unit as shown in FIG. The switch units 64a and 64j of 64 are switched to the on state, and the switch units 64b to 64i are switched to the off state. Thereby, two of the connection terminal portions 62b and 62j are connected to the connection terminal portion 62a of the connection terminal portions 62, and the connection terminal portions 62c to 62i are connected to the connection terminal portions 62a, 62b and 62j. Seven are disconnected.

続いて、処理部8は、スキャナ7を制御することにより、接続端子部62jが接続されているランド51jにプロービングさせられているプローブ11jのプローブ本体12a(または、プローブ本体12b)と、接続端子部62aが接続されているランド51aにプロービングさせられているプローブ11aのプローブ本体12a(または、プローブ本体12b)とを定電流源36aに接続すると共に、プローブ11aのプローブ本体12b(または、プローブ本体12a)と、接続端子部62bが接続されているランド51bにプロービングさせられているプローブ11bのプローブ本体12a(または、プローブ本体12b)とを電圧測定部36bに接続させる。次いで、処理部8は、定電流源36aを制御してプローブ11j,11aを介してランド51j,51aの間に測定用の定電流を供給させると共に、電圧測定部36bを制御してプローブ11a,11bを介してランド51a,51bの間の電圧を測定させる。   Subsequently, the processing unit 8 controls the scanner 7 to probe the probe main body 12a (or the probe main body 12b) of the probe 11j probed to the land 51j to which the connection terminal portion 62j is connected, and the connection terminal. The probe main body 12a (or probe main body 12b) of the probe 11a probed by the land 51a to which the section 62a is connected is connected to the constant current source 36a, and the probe main body 12b (or probe main body) of the probe 11a is connected. 12a) and the probe main body 12a (or the probe main body 12b) of the probe 11b probed by the land 51b to which the connection terminal portion 62b is connected are connected to the voltage measuring unit 36b. Next, the processing unit 8 controls the constant current source 36a to supply a constant current for measurement between the lands 51j and 51a via the probes 11j and 11a, and also controls the voltage measuring unit 36b to control the probes 11a and 11a. The voltage between the lands 51a and 51b is measured via 11b.

この際に、接続端子部62jに端子浮きが生じてランド51jと接続端子部62jとが正常に接続されていないとき、接続端子部62aに端子浮きが生じてランド51aと接続端子部62aとが正常に接続されていないとき、接続端子部62jの断線、および接続端子部62aの断線のいずれかが生じているときには、プローブ11jからプローブ11aに定電流源36aからの電流が流れないため、電圧測定部36bによって測定される電圧が、ほぼ「0V」となる。また、接続端子部62bに端子浮きが生じてランド51bと接続端子部62bとが正常に接続されていないとき、および接続端子部62bの断線のいずれかが生じているときには、プローブ11jからプローブ11aに定電流源36aからの電流が流れたとしても、電圧測定部36bによって測定される電圧が、ほぼ「0V」となる。したがって、処理部8は、電圧測定部36bからの測定値データD1の値が「0V」のとき(電圧が測定されなかったとき)には、ランド51jと接続回路63との間、ランド51aと接続回路63との間、およびランド51bと接続回路63との間のいずれかに接続不良が生じていると判定する。   At this time, when the terminal floating occurs in the connection terminal portion 62j and the land 51j and the connection terminal portion 62j are not normally connected, the terminal floating occurs in the connection terminal portion 62a, and the land 51a and the connection terminal portion 62a When the connection terminal portion 62j or the connection terminal portion 62a is disconnected when the connection is not normally made, the current from the constant current source 36a does not flow from the probe 11j to the probe 11a. The voltage measured by the measurement unit 36b is substantially “0V”. Further, when the terminal floating occurs in the connection terminal portion 62b and the land 51b and the connection terminal portion 62b are not normally connected, and when any one of the disconnections of the connection terminal portion 62b occurs, the probe 11j to the probe 11a Even if the current from the constant current source 36a flows, the voltage measured by the voltage measuring unit 36b is substantially “0V”. Therefore, when the value of the measurement value data D1 from the voltage measurement unit 36b is “0 V” (when no voltage is measured), the processing unit 8 is connected between the land 51j and the connection circuit 63, and between the land 51a and the connection circuit 63. It is determined that a connection failure has occurred between the connection circuit 63 and between the land 51 b and the connection circuit 63.

また、ランド51aと接続端子部62aとの間の接続状態が不完全な状態となっているとき(例えば、実装基板50の製造時におけるリフロー処理に際して半田の溶融が不完全でランド51aと接続端子部62aとが単に接しているだけの状態となっているとき)や、接続端子部62a内に接続状態が不完全な部位が存在するときには、これらの箇所での接触抵抗が大きくなるため、電圧測定部36bによって測定される電圧が、正常状態において測定される電圧よりも大きな値となる。具体的には、例えば、ランド51aと接続端子部62aとの間の接続状態が不完全な状態のときには、定電流源36aから供給した測定用の定電流が、ランド51j、接続端子部62j、接続回路63(スイッチ部64j)、接続端子部62aおよびランド51aを介してプローブ11jからプローブ11aに流れるものの、上記の不完全な接続状態に起因して、ランド51aと接続端子部62aとの間の抵抗値が大きくなっている。このため、ランド51b、接続端子部62b、接続回路63(スイッチ部64a)、接続端子部62aおよびランド51aを介して接続されているプローブ11a,11b間の電圧が、ランド51aと接続端子部62aとの間の抵抗値が小さいとき(接続状態が正常なとき)よりも大きくなる。   In addition, when the connection state between the land 51a and the connection terminal portion 62a is incomplete (for example, the reflow process at the time of manufacturing the mounting substrate 50 causes incomplete melting of the solder and the land 51a and the connection terminal). When the portion 62a is merely in contact with the portion 62a) or when there is an incompletely connected portion in the connection terminal portion 62a, the contact resistance at these portions increases, so the voltage The voltage measured by the measurement unit 36b is larger than the voltage measured in the normal state. Specifically, for example, when the connection state between the land 51a and the connection terminal portion 62a is incomplete, the constant current for measurement supplied from the constant current source 36a is converted into the land 51j, the connection terminal portion 62j, Although it flows from the probe 11j to the probe 11a via the connection circuit 63 (switch part 64j), the connection terminal part 62a, and the land 51a, the gap between the land 51a and the connection terminal part 62a is caused by the incomplete connection state. The resistance value of is large. For this reason, the voltage between the lands 51a, the connection terminals 62b, the connection circuit 63 (switch part 64a), the connection terminals 62a, and the probes 11a and 11b connected via the lands 51a is changed between the lands 51a and the connection terminals 62a. It becomes larger than when the resistance value between is small (when the connection state is normal).

したがって、処理部8は、定電流源36aから供給している定電流の電流値と、電圧測定部36bからの測定値データD1の値(電圧値)とに基づいて演算した抵抗値(この例では、集積回路60の接続回路63とランド51aとの間の部位P1の抵抗値)と、検査用基準データD0に記録されている基準値(抵抗値)とを比較し、演算した抵抗値が基準値よりも高いときには、集積回路60の接続回路63とランド51aとの間の部位P1の接続状態が不完全であると判定する。   Therefore, the processing unit 8 calculates a resistance value (this example) based on the current value of the constant current supplied from the constant current source 36a and the value (voltage value) of the measured value data D1 from the voltage measuring unit 36b. Then, the resistance value of the part P1 between the connection circuit 63 and the land 51a of the integrated circuit 60 is compared with the reference value (resistance value) recorded in the inspection reference data D0, and the calculated resistance value is When it is higher than the reference value, it is determined that the connection state of the portion P1 between the connection circuit 63 of the integrated circuit 60 and the land 51a is incomplete.

さらに、ランド51jおよび接続回路63の間、ランド51aおよび接続回路63の間、並びにランド51bおよび接続回路63の間の接続状態が良好のときには、電圧測定部36bによって測定される電圧が、正常状態において測定される電圧と同程度となる。したがって、処理部8は、定電流源36aから供給している定電流の電流値と、電圧測定部36bからの測定値データD1の値(電圧値)とに基づいて演算した抵抗値(部位P1の抵抗値)と、検査用基準データD0に記録されている基準値(抵抗値)とを比較し、演算した抵抗値が基準値に対する許容範囲内の値のときには、集積回路60の接続回路63とランド51aとの間の部位P1の接続状態が良好であると判定する。   Further, when the connection state between the land 51j and the connection circuit 63, between the land 51a and the connection circuit 63, and between the land 51b and the connection circuit 63 is good, the voltage measured by the voltage measurement unit 36b is in a normal state. It becomes the same level as the voltage measured in. Therefore, the processing unit 8 calculates the resistance value (part P1) based on the current value of the constant current supplied from the constant current source 36a and the value (voltage value) of the measured value data D1 from the voltage measuring unit 36b. And the reference value (resistance value) recorded in the inspection reference data D0. When the calculated resistance value is within the allowable range with respect to the reference value, the connection circuit 63 of the integrated circuit 60 is connected. It is determined that the connection state of the part P1 between the land 51a and the land 51a is good.

この場合、本例の基板検査装置1では、ランド51aと接続回路63との間の導通状態を検査する際に、ランド51jとランド51aとの間に定電流を供給しつつ、ランド51aとランド51bとの間の電圧を測定することで、上記の部位P1の抵抗値を演算している。したがって、例えば、ランド51jとランド51aとの間に定電流を供給しつつ、ランド51jとランド51aとの間の電圧を測定したり、ランド51aとランド51bとの間に定電流を供給しつつ、ランド51aとランド51bとの間の電圧を測定したりする構成・方法とは異なり、スイッチ部64jの構成要素が有する抵抗成分の非常に大きな抵抗値、スイッチ部64aの構成要素が有する抵抗成分の非常に大きな抵抗値、およびランド51aとプローブ11aとの間の接触抵抗の抵抗値を除いて、ランド51aと接続回路63との間の抵抗値を取得することができるため、ランド51aと接続回路63との間の導通状態を正確に検査することが可能となっている。   In this case, in the board inspection apparatus 1 of this example, when inspecting the conduction state between the land 51a and the connection circuit 63, a constant current is supplied between the land 51j and the land 51a, and the land 51a and the land 51a are connected. The resistance value of said part P1 is calculated by measuring the voltage between 51b. Therefore, for example, while a constant current is supplied between the land 51j and the land 51a, a voltage between the land 51j and the land 51a is measured, or a constant current is supplied between the land 51a and the land 51b. Unlike the configuration / method of measuring the voltage between the land 51a and the land 51b, the resistance component of the switch unit 64a has a very large resistance value and the resistance component of the switch unit 64a. Since the resistance value between the land 51a and the connection circuit 63 can be obtained except for the extremely large resistance value of the contact resistance and the resistance value of the contact resistance between the land 51a and the probe 11a, the connection with the land 51a is possible. It is possible to accurately inspect the conduction state with the circuit 63.

なお、接続回路63とランド51aとの間の部位P1の接続状態の検査に際して、接続回路63のスイッチ部64j,64aをオン状態に切り替えることで接続端子部62aに対して接続端子部62j,62bの2つを接続すると共に、各接続端子部62j,62a,62bが接続されているランド51j,51a,51bにプロービングされているプローブ11j,11a,11bの3本を用いて測定処理を実行する例について説明したが、「各接続端子部のうちの1つに接続する他の2つの接続端子部」は、「各接続端子部のうちの1つに対して隣接している2つの接続端子部」に限定されない。具体的には、接続回路63とランド51aとの間の部位P1の接続状態の検査に際して、接続回路63のスイッチ部64i,64j,64a,64bの4つをオン状態に切り替えることで接続端子部62a(「1つの接続端子部」)に対して接続端子部62i,62cの2つ(「他の2つの接続端子部」)を接続すると共に、各接続端子部62i,62a,62cが接続されているランド51i,51a,51cにプロービングされているプローブ11i,11a,11cの3本を用いて測定処理を実行することもできる。   When the connection state of the part P1 between the connection circuit 63 and the land 51a is inspected, the connection portions 62j and 62b are connected to the connection terminal portion 62a by switching the switch portions 64j and 64a of the connection circuit 63 to the ON state. Are connected, and the measurement process is executed using three probes 11j, 11a, and 11b probed on the lands 51j, 51a, and 51b to which the connection terminal portions 62j, 62a, and 62b are connected. Although the example has been described, “the other two connection terminal portions connected to one of the connection terminal portions” means “two connection terminals adjacent to one of the connection terminal portions” It is not limited to “part”. Specifically, when inspecting the connection state of the part P1 between the connection circuit 63 and the land 51a, the connection terminal portion is switched by switching the four switch portions 64i, 64j, 64a, and 64b of the connection circuit 63 to the on state. Two connection terminal portions 62i and 62c ("other two connection terminal portions") are connected to 62a ("one connection terminal portion"), and each connection terminal portion 62i, 62a and 62c is connected. It is also possible to execute the measurement process using three probes 11i, 11a, 11c probed on the lands 51i, 51a, 51c.

次いで、処理部8は、一例として、集積回路60の接続端子部62bが接続されているランド51bと、接続端子部62bに接続されている接続回路63との間の導通状態の検査を開始する。具体的には、処理部8は、信号出力部5を制御して実装基板50(集積回路60の接続回路63)に制御信号Sを出力することにより、図5に示すように、各スイッチ部64のうちのスイッチ部64a,64bをオン状態に切り替えさせると共に、スイッチ部64c〜64jをオフ状態に切り替えさせる。これにより、各接続端子部62のうちの接続端子部62bに対して接続端子部62a,62cの2つが接続されると共に、接続端子部62a〜62cに対して接続端子部62d〜62jの7つが切断された状態となる。   Next, as an example, the processing unit 8 starts an inspection of a conduction state between the land 51b to which the connection terminal unit 62b of the integrated circuit 60 is connected and the connection circuit 63 connected to the connection terminal unit 62b. . Specifically, the processing unit 8 controls the signal output unit 5 to output a control signal S to the mounting substrate 50 (the connection circuit 63 of the integrated circuit 60), so that each switch unit as shown in FIG. The switch units 64a and 64b of 64 are switched to the on state, and the switch units 64c to 64j are switched to the off state. Accordingly, two of the connection terminal portions 62a and 62c are connected to the connection terminal portion 62b of each connection terminal portion 62, and seven of the connection terminal portions 62d to 62j are connected to the connection terminal portions 62a to 62c. Disconnected state.

続いて、処理部8は、スキャナ7を制御することにより、プローブ11aのプローブ本体12a(または、プローブ本体12b)と、プローブ11bのプローブ本体12a(または、プローブ本体12b)とを定電流源36aに接続すると共に、プローブ11bのプローブ本体12b(または、プローブ本体12a)と、接続端子部62cが接続されているランド51cにプロービングさせられているプローブ11cのプローブ本体12a(または、プローブ本体12b)とを電圧測定部36bに接続させる。次いで、処理部8は、定電流源36aを制御してプローブ11a,11bを介してランド51a,51bの間に測定用の定電流を供給させると共に、電圧測定部36bを制御してプローブ11b,11cを介してランド51b,51cの間の電圧を測定させる。   Subsequently, the processing unit 8 controls the scanner 7 to connect the probe main body 12a (or probe main body 12b) of the probe 11a and the probe main body 12a (or probe main body 12b) of the probe 11b to the constant current source 36a. The probe main body 12b (or probe main body 12a) of the probe 11b and the probe main body 12a (or probe main body 12b) of the probe 11c probed by the land 51c to which the connection terminal portion 62c is connected are connected. Are connected to the voltage measuring unit 36b. Next, the processing unit 8 controls the constant current source 36a to supply a constant current for measurement between the lands 51a and 51b via the probes 11a and 11b, and also controls the voltage measuring unit 36b to control the probes 11b, The voltage between the lands 51b and 51c is measured via 11c.

この際に、接続端子部62aに端子浮きが生じてランド51aと接続端子部62aとが正常に接続されていないとき、接続端子部62bに端子浮きが生じてランド51bと接続端子部62bとが正常に接続されていないとき、接続端子部62aの断線、および接続端子部62bの断線のいずれかが生じているときには、プローブ11aからプローブ11bに定電流源36aからの電流が流れないため、電圧測定部36bによって測定される電圧が、ほぼ「0V」となる。また、接続端子部62cに端子浮きが生じてランド51cと接続端子部62cとが正常に接続されていないとき、および接続端子部62cの断線のいずれかが生じているときには、プローブ11aからプローブ11bに定電流源36aからの電流が流れたとしても、電圧測定部36bによって測定される電圧が、ほぼ「0V」となる。したがって、処理部8は、電圧測定部36bからの測定値データD1の値が「0V」のとき(電圧が測定されなかったとき)には、ランド51aと接続回路63との間、ランド51bと接続回路63との間、ランド51cと接続回路63との間のいずれかに接続不良が生じていると判定する。   At this time, when the terminal floating occurs in the connection terminal portion 62a and the land 51a and the connection terminal portion 62a are not normally connected, the terminal floating occurs in the connection terminal portion 62b, and the land 51b and the connection terminal portion 62b When the connection terminal 62a is disconnected or the connection terminal 62b is disconnected when the connection is not normally made, the current from the constant current source 36a does not flow from the probe 11a to the probe 11b. The voltage measured by the measurement unit 36b is substantially “0V”. Further, when the terminal floating occurs in the connection terminal portion 62c and the land 51c and the connection terminal portion 62c are not normally connected, and when any one of the disconnections of the connection terminal portion 62c occurs, the probe 11a to the probe 11b Even if the current from the constant current source 36a flows, the voltage measured by the voltage measuring unit 36b is substantially “0V”. Therefore, when the value of the measured value data D1 from the voltage measuring unit 36b is “0V” (when no voltage is measured), the processing unit 8 is connected between the land 51a and the connection circuit 63, and between the land 51b and It is determined that a connection failure has occurred between the connection circuit 63 and between the land 51 c and the connection circuit 63.

また、ランド51bと接続端子部62bとの間の接続状態が不完全な状態となっているときや、接続端子部62b内に接続状態が不完全な部位が存在するときには、これらの箇所での接触抵抗が大きくなるため、電圧測定部36bによって測定される電圧が、正常状態において測定される電圧よりも大きな値となる。したがって、処理部8は、定電流源36aから供給している定電流の電流値と、電圧測定部36bからの測定値データD1の値(電圧値)とに基づいて演算した抵抗値(この例では、集積回路60の接続回路63とランド51bとの間の部位P2の抵抗値)と、検査用基準データD0に記録されている基準値(抵抗値)とを比較し、演算した抵抗値が基準値よりも高いときには、集積回路60の接続回路63とランド51bとの間の部位P2の接続状態が不完全であると判定する。   In addition, when the connection state between the land 51b and the connection terminal portion 62b is in an incomplete state, or when there is an incomplete connection state in the connection terminal portion 62b, Since the contact resistance is increased, the voltage measured by the voltage measuring unit 36b is larger than the voltage measured in the normal state. Therefore, the processing unit 8 calculates a resistance value (this example) based on the current value of the constant current supplied from the constant current source 36a and the value (voltage value) of the measured value data D1 from the voltage measuring unit 36b. Then, the resistance value of the part P2 between the connection circuit 63 and the land 51b of the integrated circuit 60 is compared with the reference value (resistance value) recorded in the inspection reference data D0, and the calculated resistance value is When it is higher than the reference value, it is determined that the connection state of the part P2 between the connection circuit 63 of the integrated circuit 60 and the land 51b is incomplete.

さらに、ランド51aおよび接続回路63の間、ランド51bおよび接続回路63の間、並びにランド51cおよび接続回路63の間の接続状態が良好のときには、電圧測定部36bによって測定される電圧が、正常状態において測定される電圧と同程度となる。したがって、処理部8は、定電流源36aから供給している定電流の電流値と、電圧測定部36bからの測定値データD1の値(電圧値)とに基づいて演算した抵抗値(部位P2の抵抗値)と、検査用基準データD0に記録されている基準値(抵抗値)とを比較し、演算した抵抗値が基準値に対する許容範囲内の値のときには、集積回路60の接続回路63とランド51bとの間の部位P2の接続状態が良好であると判定する。   Further, when the connection state between the land 51a and the connection circuit 63, between the land 51b and the connection circuit 63, and between the land 51c and the connection circuit 63 is good, the voltage measured by the voltage measurement unit 36b is in a normal state. It becomes the same level as the voltage measured in. Therefore, the processing unit 8 calculates the resistance value (part P2) based on the current value of the constant current supplied from the constant current source 36a and the value (voltage value) of the measured value data D1 from the voltage measuring unit 36b. And the reference value (resistance value) recorded in the inspection reference data D0. When the calculated resistance value is within the allowable range with respect to the reference value, the connection circuit 63 of the integrated circuit 60 is connected. It is determined that the connection state of the portion P2 between the land 51b and the land 51b is good.

この後、処理部8は、動作プログラムに従い、接続回路63によって接続する1つの接続端子部と他の2つの接続端子部62との組合せを順次変更しつつ、上記のランド51aと接続回路63との間の接続状態や、ランド51bと接続回路63との間の接続状態の検査と同様にして、ランド51cと接続回路63との間の接続状態、ランド51dと接続回路63との間の接続状態、ランド51eと接続回路63との間の接続状態、ランド51fと接続回路63との間の接続状態、ランド51gと接続回路63との間の接続状態、ランド51hと接続回路63との間の接続状態、ランド51iと接続回路63との間の接続状態、およびランド51jと接続回路63との間の接続状態を順次検査する。また、処理部8は、集積回路60以外の「集積回路」についても、上記の集積回路60に関する検査と同様にして接続状態を検査する。さらに、処理部8は、公知のJTAG規格に準じた各種の検査や、実装基板50に形成されている導体パターンの導通検査および絶縁検査などの各種の検査を実行する。これにより、実装基板50についての一連の検査が完了する。   Thereafter, the processing unit 8 sequentially changes the combination of one connection terminal unit connected by the connection circuit 63 and the other two connection terminal units 62 in accordance with the operation program, while the land 51a and the connection circuit 63 are connected. The connection state between the land 51 c and the connection circuit 63, the connection state between the land 51 c and the connection circuit 63, and the connection between the land 51 d and the connection circuit 63 are the same as the inspection of the connection state between the land 51 b and the connection circuit 63. State, connection state between the land 51e and the connection circuit 63, connection state between the land 51f and the connection circuit 63, connection state between the land 51g and the connection circuit 63, and between the land 51h and the connection circuit 63 The connection state between the land 51i and the connection circuit 63 and the connection state between the land 51j and the connection circuit 63 are sequentially checked. Further, the processing unit 8 inspects the connection state of “integrated circuits” other than the integrated circuit 60 in the same manner as in the inspection relating to the integrated circuit 60 described above. Further, the processing unit 8 performs various inspections such as various inspections according to the known JTAG standard, and continuity inspection and insulation inspection of the conductor pattern formed on the mounting substrate 50. Thereby, a series of inspections on the mounting substrate 50 is completed.

このように、この基板検査装置1、および基板検査装置1による基板検査方法では、制御信号Sを出力して各接続端子部62のうちの1つに対してその1つの接続端子部62とは相違する2つの接続端子部62を接続させ、かつ1つの接続端子部62が接続されているランド51と2つの接続端子部62のうちの一方が接続されているランド51との間に測定用の定電流を供給すると共に、1つの接続端子部62が接続されているランド51と2つの接続端子部62のうちの他方が接続されているランド51との間の電圧を測定する「第1の測定処理」、および1つの接続端子部62が接続されているランド51と2つの接続端子部62のうちの一方が接続されているランド51との間に測定用の定電圧を印加すると共に、1つの接続端子部62が接続されているランド51と2つの接続端子部62のうちの他方が接続されているランド51との間を流れる電流を測定する「第2の測定処理」の少なくとも一方を実行すると共に、少なくとも一方の測定処理の結果(測定値データD1の値)に基づいて1つの接続端子部62が接続されているランド51と接続回路63との間の導通抵抗の抵抗値を求めて検査用基準値と比較することでランド51と接続回路63との間の導通状態を検査する処理を、少なくとも上記の1つの接続端子部62を変更して順次実行する。   As described above, in this board inspection apparatus 1 and the board inspection method by the board inspection apparatus 1, the control signal S is output and one of the connection terminal sections 62 is defined as one connection terminal section 62. Two different connection terminal portions 62 are connected, and between the land 51 to which one connection terminal portion 62 is connected and the land 51 to which one of the two connection terminal portions 62 is connected. The first current is measured and the voltage between the land 51 to which one connection terminal portion 62 is connected and the land 51 to which the other of the two connection terminal portions 62 is connected is measured as “first”. And a constant voltage for measurement is applied between the land 51 to which one connection terminal portion 62 is connected and the land 51 to which one of the two connection terminal portions 62 is connected. One connection terminal And at least one of the “second measurement process” for measuring the current flowing between the land 51 to which 2 is connected and the land 51 to which the other of the two connection terminal portions 62 is connected, Based on the result of at least one measurement process (value of measurement value data D1), the resistance value of the conduction resistance between the land 51 to which one connection terminal portion 62 is connected and the connection circuit 63 is obtained, and the inspection reference The process of inspecting the conduction state between the land 51 and the connection circuit 63 by comparing with the value is sequentially executed by changing at least one of the connection terminal portions 62.

したがって、この基板検査装置1、および基板検査装置1による基板検査方法によれば、接続回路63によって接続された3つの接続端子部62が接続されている3つのランド51にプローブ11(プローブ本体12a,12b)をプロービングさせることで3つのランド51のうちの1つと接続回路63との間の抵抗値を測定することができるため、集積回路60の接続端子部62、およびその接続端子部62が接続されているべきランド51の双方にプローブ11(プローブ本体12a,12b)をプロービングすることができない実装基板50(集積回路60)であっても、集積回路60の接続回路63とランド51との間に接続不良が生じる可能性がある不完全な接続状態の部位が存在するときには、これを確実に検出することができる。また、接続端子部62における回路本体61側の端部にプローブ11をプロービングすることができない集積回路60の接続端子部62内における不完全な接続状態の部位の存在を確実に検出することができる。   Therefore, according to this board inspection apparatus 1 and the board inspection method by the board inspection apparatus 1, the probe 11 (probe body 12a) is connected to the three lands 51 to which the three connection terminal portions 62 connected by the connection circuit 63 are connected. 12b), the resistance value between one of the three lands 51 and the connection circuit 63 can be measured. Therefore, the connection terminal portion 62 of the integrated circuit 60 and the connection terminal portion 62 are Even if the mounting substrate 50 (integrated circuit 60) cannot probe the probe 11 (probe bodies 12a, 12b) to both the lands 51 to be connected, the connection circuit 63 of the integrated circuit 60 and the lands 51 are not connected. If there is an incompletely connected part that may cause a connection failure between them, this can be detected reliably. That. Further, it is possible to reliably detect the presence of an incompletely connected portion in the connection terminal portion 62 of the integrated circuit 60 where the probe 11 cannot be probed at the end of the connection terminal portion 62 on the circuit body 61 side. .

また、この集積回路60によれば、回路本体61に接続された接続端子部62a〜62jを有すると共に基板検査装置1などの「外部装置」から出力された制御信号Sに従って各接続端子部62のうちの1つに対して他の2つを接続する接続処理を実行する接続回路63を回路本体61と共に形成したことにより、接続端子部62における回路本体61側の端部にプローブ11をプロービングすることができない集積回路60について、接続回路63の各スイッチ部64を任意にオン状態に切り替えることで、3つの接続端子部62における回路本体61側の端部を任意に接続状態にすることができるため、接続回路63によって接続された3つの接続端子部62が接続されている3つのランド51にプローブ11(プローブ本体12a,12b)をプロービングさせることで3つのランド51のうちの1つと接続回路63との間の抵抗値を測定し、これにより、接続端子部62内における不完全な接続状態の部位の存在を基板検査装置1によって確実に検出することができる。   Further, according to the integrated circuit 60, the connection terminals 62 a to 62 j connected to the circuit body 61 and the connection terminals 62 of the connection terminals 62 according to the control signal S output from the “external device” such as the substrate inspection apparatus 1. The probe 11 is probed at the end of the connection terminal portion 62 on the circuit body 61 side by forming the connection circuit 63 for executing connection processing for connecting the other two to one of them together with the circuit body 61. For the integrated circuit 60 that cannot be connected, the end portions on the circuit body 61 side of the three connection terminal portions 62 can be arbitrarily connected by arbitrarily switching each switch portion 64 of the connection circuit 63 to the ON state. Therefore, the probe 11 (probe main bodies 12a, 1) is connected to the three lands 51 to which the three connection terminal portions 62 connected by the connection circuit 63 are connected. The resistance value between one of the three lands 51 and the connection circuit 63 is measured by probing b), and thereby the substrate inspection is performed for the presence of an incompletely connected portion in the connection terminal portion 62. It can be reliably detected by the device 1.

次に、「集積回路検査装置」および「集積回路検査方法」の実施の形態について説明する。なお、「集積回路」については、上記の実装基板50に実装されている集積回路60と同様のため、詳細な説明を省略する。また、基板検査装置1、および基板検査装置1による基板検査方法と同様の事項については、同様の符号を付して重複する説明を省略する。   Next, embodiments of the “integrated circuit inspection apparatus” and the “integrated circuit inspection method” will be described. The “integrated circuit” is the same as the integrated circuit 60 mounted on the mounting substrate 50, and thus detailed description thereof is omitted. In addition, the same reference numerals are given to the same matters as those of the substrate inspection apparatus 1 and the substrate inspection method by the substrate inspection apparatus 1, and the duplicate description is omitted.

図6に示す集積回路検査装置1Aは、「集積回路検査装置」の一例であって、前述した基板検査装置1における移動機構2および検査用治具10に代えて、ソケット20を備え、実装基板50等に実装される前の集積回路60を単体で検査することができるように構成されている。この場合、ソケット20は、検査用治具10におけるプローブ11に代えて、集積回路60における各接続端子部62の接続端子(実装基板50等の回路基板に実装する際に回路基板のランド(接続用導体)に半田付けされる金属部品)に接続可能な接続子(図示せず)を備えて構成されている。   An integrated circuit inspection apparatus 1A shown in FIG. 6 is an example of an “integrated circuit inspection apparatus”, and includes a socket 20 instead of the moving mechanism 2 and the inspection jig 10 in the substrate inspection apparatus 1 described above. The integrated circuit 60 before being mounted on 50 or the like can be inspected alone. In this case, instead of the probe 11 in the inspection jig 10, the socket 20 is connected to a connection terminal of each connection terminal portion 62 in the integrated circuit 60 (a circuit board land (connection) when mounted on a circuit board such as the mounting board 50. And a connector (not shown) connectable to a metal component soldered to the conductor).

この集積回路検査装置1Aによる集積回路60の検査に際しては、検査対象の集積回路60をソケット20にセットする。次いで、操作部3の検査開始スイッチが操作されたときに、処理部8は、記憶部9に記憶されている動作プログラムに従って検査処理を開始する。この際に、この集積回路検査装置1Aでは、上記の基板検査装置1による実装基板50の検査処理、つまり、一対のプローブ11(プローブ本体12a,12b)を介して定電流源36aから定電流をランド51,51間に供給し、かつ一対のプローブ11(プローブ本体12a,12b)を介してランド51,51間の電圧を測定し、その測定結果に基づいて演算した抵抗値と検査用基準データD0の値とを比較する上記の基板検査装置1による実装基板50の検査処理に代えて、ソケット20における一対の接続子を介して定電流源36aから定電流を接続端子部62,62(一対の接続端子)の間に供給し、かつ一対の接続子を介して接続端子部62,62(一対の接続端子)の間の電圧を測定し、その測定結果に基づいて演算した抵抗値と検査用基準データD0の値とを比較する処理を実行する。これにより、集積回路60の各接続端子部62の導通状態が順次検査される。   When the integrated circuit 60 is inspected by the integrated circuit inspection apparatus 1A, the integrated circuit 60 to be inspected is set in the socket 20. Next, when the inspection start switch of the operation unit 3 is operated, the processing unit 8 starts the inspection process according to the operation program stored in the storage unit 9. At this time, in the integrated circuit inspection apparatus 1A, the mounting substrate 50 is inspected by the substrate inspection apparatus 1, that is, a constant current is supplied from the constant current source 36a via the pair of probes 11 (probe bodies 12a and 12b). The voltage between the lands 51 and 51 is measured via the pair of probes 11 (probe main bodies 12a and 12b) and the voltage between the lands 51 and 51 is measured. Instead of the inspection processing of the mounting substrate 50 by the substrate inspection apparatus 1 that compares the value of D0, a constant current is supplied from the constant current source 36a via the pair of connectors in the socket 20 to the connection terminal portions 62 and 62 (a pair of Between the connection terminal portions 62 and 62 (a pair of connection terminals) via a pair of connectors, and a resistance calculated based on the measurement results. It performs a process of comparing the value of the inspection reference data D0 value. Thereby, the conduction | electrical_connection state of each connection terminal part 62 of the integrated circuit 60 is test | inspected sequentially.

このように、この集積回路検査装置1A、および集積回路検査装置1Aによる集積回路検査方法では、制御信号Sを出力して各接続端子部62のうちの1つに対してその1つの接続端子部62とは相違する2つの接続端子部62を接続させ、かつ1つの接続端子部62と2つの接続端子部62のうちの一方との間に測定用の定電流を供給すると共に、1つの接続端子部62と2つの接続端子部62のうちの他方との間の電圧を測定する「第1の測定処理」、および1つの接続端子部62と2つの接続端子部62のうちの一方との間に測定用の定電圧を印加すると共に、1つの接続端子部62と2つの接続端子部62のうちの他方との間を流れる電流を測定する「第2の測定処理」の少なくとも一方を実行すると共に、少なくとも一方の測定処理の結果に基づいて1つの接続端子部62の導通抵抗の抵抗値を求めて検査用基準値と比較することで1つの接続端子部62の導通状態を検査する処理を、少なくとも上記の1つの接続端子部62を変更して順次実行する。   As described above, in the integrated circuit inspection apparatus 1A and the integrated circuit inspection method by the integrated circuit inspection apparatus 1A, the control signal S is output and one of the connection terminal sections 62 is connected to the one connection terminal section. Two connection terminal portions 62 different from 62 are connected, a constant current for measurement is supplied between one connection terminal portion 62 and one of the two connection terminal portions 62, and one connection The “first measurement process” for measuring the voltage between the terminal portion 62 and the other of the two connection terminal portions 62, and the connection between the one connection terminal portion 62 and one of the two connection terminal portions 62 A constant voltage for measurement is applied between them, and at least one of the “second measurement process” for measuring a current flowing between one connection terminal portion 62 and the other of the two connection terminal portions 62 is executed. And at least one measurement process The process of inspecting the conduction state of one connection terminal part 62 by obtaining the resistance value of the conduction resistance of one connection terminal part 62 based on the result of this and comparing it with the reference value for inspection is performed at least for the one connection described above. The terminal unit 62 is changed and executed sequentially.

したがって、この集積回路検査装置1A、および集積回路検査装置1Aによる集積回路検査方法によれば、接続回路63によって接続された3つの接続端子部62にソケット20の接続子を接続させることにより、3つの接続端子部62のうちの1つについての抵抗値を測定することができるため、接続端子部62における回路本体61側の端部にプローブ11をプロービングすることができない集積回路60の接続端子部62内における不完全な接続状態の部位の存在を確実に検出することができる。   Therefore, according to the integrated circuit inspection apparatus 1A and the integrated circuit inspection method by the integrated circuit inspection apparatus 1A, by connecting the connector of the socket 20 to the three connection terminal portions 62 connected by the connection circuit 63, 3 Since the resistance value of one of the two connection terminal portions 62 can be measured, the connection terminal portion of the integrated circuit 60 in which the probe 11 cannot be probed at the end of the connection terminal portion 62 on the circuit body 61 side. The presence of an incompletely connected portion in 62 can be reliably detected.

なお、「基板検査装置」、「集積回路検査装置」および「集積回路」の構成や、「基板検査方法」および「集積回路検査方法」の具体的な手順については、上記の基板検査装置1、集積回路検査装置1Aおよび集積回路60の構成、およびこれらによる検査方法の手順に限定されない。例えば、JTAG規格に準じた制御信号Sを入力することで「接続処理」が実行される構成を例に挙げて説明したが、このような構成に代えて、SPI規格やI2C規格などの各種のシリアル通信規格に準じた制御信号を入力することで「接続処理」が実行される構成を採用することができる。   In addition, about the structure of "substrate inspection apparatus", "integrated circuit inspection apparatus", and "integrated circuit", and the specific procedure of "substrate inspection method" and "integrated circuit inspection method", said board | substrate inspection apparatus 1, The configuration of the integrated circuit inspection apparatus 1A and the integrated circuit 60, and the procedure of the inspection method using them are not limited. For example, the configuration in which the “connection process” is executed by inputting the control signal S conforming to the JTAG standard has been described as an example. However, in place of such a configuration, various configurations such as the SPI standard and the I2C standard are described. A configuration in which “connection processing” is executed by inputting a control signal in accordance with the serial communication standard can be employed.

また、一対のプローブ本体12a,12bを有するプローブ11を植設した検査用治具10を用いて実装基板50(集積回路60)を検査する構成の基板検査装置1、およびその検査方法を例に挙げて説明したが、各ランド51の位置に応じて単独のプローブ本体(プローブ)を植設した検査用治具(図示せず)を用いる構成および方法や、上記のプローブ11と同様に構成したプローブ、または、単独のプローブをそれぞれ別個の移動機構によって移動させてプロービングさせる構成(フライングプローブ式の検査装置)および方法を採用することもできる。   Further, the substrate inspection apparatus 1 configured to inspect the mounting substrate 50 (integrated circuit 60) using the inspection jig 10 in which the probe 11 having the pair of probe bodies 12a and 12b is implanted, and the inspection method thereof are taken as an example. As described above, the configuration and method using an inspection jig (not shown) in which a single probe main body (probe) is implanted in accordance with the position of each land 51, or the same configuration as the probe 11 described above. It is also possible to employ a probe (a flying probe type inspection apparatus) and method in which a probe or a single probe is moved by a separate moving mechanism and probed.

また、定電流源36aおよび電圧測定部36bを有する測定部6によって「第1の測定処理」を実行して実装基板50(集積回路60)を検査する構成の基板検査装置1や集積回路検査装置1Aを例に挙げて説明したが、「測定部」については、上記の測定部6の構成に代えて(または、そのような構成に加えて)、一例として、図7に示す基板検査装置1における測定部6aのように、定電圧源46aおよび電流測定部46bを備えて「第2の測定処理」を実行する構成を採用することもできる。この場合、同図に示す測定部6aでは、接続回路63のスイッチ部64a,64bがオン状態に切り替えられて接続端子部62bに対して接続端子部62a,62cがそれぞれ接続された状態において、接続端子部62aが接続されているランド51aと接続端子部62bが接続されているランド51bとの間に測定用の定電圧(「測定用電圧」の一例)を印加すると共に、ランド51bから接続端子部62cが接続されているランド51cに流れる電流の電流値を測定することにより、接続端子部62bにおける回路本体61側の端部とランド51bとの間の抵抗値を取得することができるように構成されている。   Further, the board inspection apparatus 1 and the integrated circuit inspection apparatus configured to inspect the mounting board 50 (integrated circuit 60) by executing the “first measurement process” by the measurement section 6 having the constant current source 36a and the voltage measurement section 36b. 1A has been described as an example, but the “measuring unit” is replaced with (or in addition to) the configuration of the measuring unit 6 described above, as an example, the substrate inspection apparatus 1 shown in FIG. A configuration in which the constant voltage source 46a and the current measurement unit 46b are included and the “second measurement process” is performed can be employed as in the measurement unit 6a in FIG. In this case, in the measurement unit 6a shown in the figure, in the state where the switch units 64a and 64b of the connection circuit 63 are switched on and the connection terminal units 62a and 62c are connected to the connection terminal unit 62b, respectively. A constant voltage for measurement (an example of “measurement voltage”) is applied between the land 51a to which the terminal portion 62a is connected and the land 51b to which the connection terminal portion 62b is connected. By measuring the current value of the current flowing through the land 51c to which the part 62c is connected, the resistance value between the end on the circuit body 61 side of the connection terminal part 62b and the land 51b can be obtained. It is configured.

なお、図示を省略するが、集積回路60を検査する集積回路検査装置1Aにおいても、前述した測定部6の構成に代えて(または、そのような構成に加えて)図7に示す測定部6aの構成を採用することもできる。このような構成を採用した基板検査装置1や集積回路検査装置1Aにおいても、前述した基板検査装置1や集積回路検査装置1A(測定部6を備えた構成)と同様の効果を奏することができる。   Although not shown, in the integrated circuit inspection apparatus 1A for inspecting the integrated circuit 60, instead of (or in addition to) the configuration of the measurement unit 6 described above, the measurement unit 6a shown in FIG. It is also possible to adopt the configuration. Also in the board inspection apparatus 1 and the integrated circuit inspection apparatus 1A adopting such a configuration, the same effects as those of the board inspection apparatus 1 and the integrated circuit inspection apparatus 1A (configuration including the measurement unit 6) described above can be obtained. .

さらに、複数の接続子を有するソケット20を用いて集積回路60検査する構成の集積回路検査装置1A、およびその検査方法を例に挙げて説明したが、集積回路60の各接続端子部62(接続端子)にプローブをプロービングすることで、信号出力部5、定電流源36aおよび電圧測定部36b等を集積回路60(接続端子部62)に接続する構成および方法を採用することもできる。   Furthermore, although the integrated circuit inspection apparatus 1A configured to inspect the integrated circuit 60 using the socket 20 having a plurality of connectors and the inspection method thereof have been described as examples, the connection terminal portions 62 (connections) of the integrated circuit 60 are described. A configuration and method for connecting the signal output unit 5, the constant current source 36a, the voltage measuring unit 36b, and the like to the integrated circuit 60 (connection terminal unit 62) by probing the probe to the terminal can also be adopted.

また、定電流を供給して電圧値を測定する構成や定電圧を供給して電流値を測定する構成に代えて、電流値が既知の電流を供給して電圧値を測定する構成や電圧値が既知の電圧を供給して電流値を測定する構成を採用することもできる。   Also, instead of a configuration for supplying a constant current to measure a voltage value or a configuration for supplying a constant voltage to measure a current value, a configuration or voltage value for supplying a current with a known current value to measure the voltage value However, it is also possible to employ a configuration in which a known voltage is supplied to measure a current value.

1 基板検査装置
1A 集積回路検査装置
2 移動機構
5 信号出力部
6,6a 測定部
7 スキャナ
8 処理部
9 記憶部
10 検査用治具
11a,11b・・ プローブ
12a,12b プローブ本体
20 ソケット
36a 定電流源
36b 電圧測定部
46a 定電圧源
46b 電流測定部
50 実装基板
51a〜51j ランド
60 集積回路
61 回路本体
62a〜62j 接続端子部
63 接続回路
64a〜64j スイッチ部
D0 検査用基準データ
D1 測定値データ
P1,P2・・ 部位
S 制御信号
DESCRIPTION OF SYMBOLS 1 Board | substrate inspection apparatus 1A Integrated circuit inspection apparatus 2 Moving mechanism 5 Signal output part 6, 6a Measuring part 7 Scanner 8 Processing part 9 Memory | storage part 10 Inspection jig | tool 11a, 11b ... Probe 12a, 12b Probe main body 20 Socket 36a Constant current Source 36b Voltage measurement unit 46a Constant voltage source 46b Current measurement unit 50 Mounting board 51a to 51j Land 60 Integrated circuit 61 Circuit body 62a to 62j Connection terminal unit 63 Connection circuit 64a to 64j Switch unit D0 Test reference data D1 Measurement value data P1 , P2 ·· Site S Control signal

Claims (5)

回路本体と、当該回路本体に接続された複数の接続端子部と、外部装置から出力された制御信号に従って前記各接続端子部のうちの1つに対して当該1つの接続端子部とは相違する2つの当該接続端子部を接続する接続処理を実行する接続回路とが形成されている集積回路が実装された実装基板を検査対象として当該実装基板において当該各接続端子部が接続されている各接続用導体と当該接続回路との間の導通状態を検査可能に構成され、
前記制御信号を出力する前記外部装置としての信号出力部と、
前記1つの接続端子部が接続されている前記接続用導体と前記2つの接続端子部のうちの一方が接続されている前記接続用導体との間に測定用電流を供給すると共に、前記1つの接続端子部が接続されている前記接続用導体と前記2つの接続端子部のうちの他方が接続されている前記接続用導体との間の電圧を測定する第1の測定処理、および前記1つの接続端子部が接続されている前記接続用導体と前記2つの接続端子部のうちの一方が接続されている前記接続用導体との間に測定用電圧を印加すると共に、前記1つの接続端子部が接続されている前記接続用導体と前記2つの接続端子部のうちの他方が接続されている前記接続用導体との間を流れる電流を測定する第2の測定処理の少なくとも一方を実行可能な測定部と、
前記信号出力部を制御して前記制御信号を出力させて前記1つの接続端子部に対して前記2つの接続端子部を接続させ、かつ前記測定部を制御して前記少なくとも一方の測定処理を実行させると共に、当該少なくとも一方の測定処理の結果に基づいて前記1つの接続端子部が接続されている前記接続用導体と前記接続回路との間の導通抵抗の抵抗値を求めて検査用基準値と比較することで当該接続用導体と当該接続回路との間の導通状態を検査する処理部とを備えている基板検査装置。
A circuit body, a plurality of connection terminal portions connected to the circuit body, and the one connection terminal portion differ from one of the connection terminal portions according to a control signal output from an external device. Each connection in which each connection terminal portion is connected to the mounting substrate, with a mounting substrate on which an integrated circuit on which a connection circuit for executing connection processing for connecting the two connection terminal portions is formed is mounted, as an inspection target It is configured to be able to inspect the conduction state between the conductor for use and the connection circuit,
A signal output unit as the external device that outputs the control signal;
A current for measurement is supplied between the connection conductor to which the one connection terminal portion is connected and the connection conductor to which one of the two connection terminal portions is connected; A first measurement process for measuring a voltage between the connection conductor to which a connection terminal portion is connected and the connection conductor to which the other of the two connection terminal portions is connected; and the one A voltage for measurement is applied between the connection conductor to which the connection terminal portion is connected and the connection conductor to which one of the two connection terminal portions is connected, and the one connection terminal portion Can perform at least one of the second measurement processing for measuring the current flowing between the connection conductor to which the other is connected and the connection conductor to which the other of the two connection terminal portions is connected A measuring section;
Control the signal output unit to output the control signal to connect the two connection terminal units to the one connection terminal unit, and control the measurement unit to execute the at least one measurement process And determining a resistance value of a conduction resistance between the connection conductor to which the one connection terminal portion is connected and the connection circuit based on the result of the at least one measurement process, and a reference value for inspection A substrate inspection apparatus including a processing unit that inspects a conduction state between the connection conductor and the connection circuit by comparing.
回路本体と、当該回路本体に接続された複数の接続端子部と、外部装置から出力された制御信号に従って前記各接続端子部のうちの1つに対して当該1つの接続端子部とは相違する2つの当該接続端子部を接続する接続処理を実行する接続回路とが形成されている集積回路を検査対象として当該各接続端子部の導通状態を検査可能に構成され、
前記制御信号を出力する前記外部装置としての信号出力部と、
前記1つの接続端子部と前記2つの接続端子部のうちの一方との間に測定用電流を供給すると共に、前記1つの接続端子部と前記2つの接続端子部のうちの他方との間の電圧を測定する第1の測定処理、および前記1つの接続端子部と前記2つの接続端子部のうちの一方との間に測定用電圧を印加すると共に、前記1つの接続端子部と前記2つの接続端子部のうちの他方との間を流れる電流を測定する第2の測定処理の少なくとも一方を実行可能な測定部と、
前記信号出力部を制御して前記制御信号を出力させて前記1つの接続端子部に対して前記2つの接続端子部を接続させ、かつ前記測定部を制御して前記少なくとも一方の測定処理を実行させると共に、当該少なくとも一方の測定処理の結果に基づいて前記1つの接続端子部の導通抵抗の抵抗値を求めて検査用基準値と比較することで当該1つの接続端子部の導通状態を検査する処理部とを備えている集積回路検査装置。
A circuit body, a plurality of connection terminal portions connected to the circuit body, and the one connection terminal portion differ from one of the connection terminal portions according to a control signal output from an external device. An integrated circuit in which a connection circuit that executes connection processing for connecting two connection terminal portions is formed is configured to be inspected, and the conduction state of each connection terminal portion can be inspected.
A signal output unit as the external device that outputs the control signal;
A current for measurement is supplied between the one connection terminal portion and one of the two connection terminal portions, and between the one connection terminal portion and the other of the two connection terminal portions. A first measurement process for measuring a voltage, and applying a measurement voltage between the one connection terminal portion and one of the two connection terminal portions; and the one connection terminal portion and the two connection terminals A measurement unit capable of executing at least one of the second measurement processes for measuring a current flowing between the other of the connection terminal units;
Control the signal output unit to output the control signal to connect the two connection terminal units to the one connection terminal unit, and control the measurement unit to execute the at least one measurement process In addition, the resistance value of the conduction resistance of the one connection terminal portion is obtained based on the result of the at least one measurement process and compared with the reference value for inspection, thereby inspecting the conduction state of the one connection terminal portion. An integrated circuit inspection apparatus comprising a processing unit.
回路本体と、当該回路本体に接続された複数の接続端子部と、外部装置から出力された制御信号に従って前記各接続端子部のうちの1つに対して当該1つの接続端子部とは相違する2つの当該接続端子部を接続する接続処理を実行する接続回路とが形成されている集積回路。   A circuit body, a plurality of connection terminal portions connected to the circuit body, and the one connection terminal portion differ from one of the connection terminal portions according to a control signal output from an external device. An integrated circuit formed with a connection circuit for executing a connection process for connecting two connection terminal portions. 回路本体と、当該回路本体に接続された複数の接続端子部と、外部装置から出力された制御信号に従って前記各接続端子部のうちの1つに対して当該1つの接続端子部とは相違する2つの当該接続端子部を接続する接続処理を実行する接続回路とが形成されている集積回路が実装された実装基板を検査対象として当該実装基板において当該各接続端子部が接続されている各接続用導体と当該接続回路との間の導通状態を検査する際に、前記制御信号を出力して前記1つの接続端子部に対して前記2つの接続端子部を接続させ、かつ前記1つの接続端子部が接続されている前記接続用導体と前記2つの接続端子部のうちの一方が接続されている前記接続用導体との間に測定用電流を供給すると共に、前記1つの接続端子部が接続されている前記接続用導体と前記2つの接続端子部のうちの他方が接続されている前記接続用導体との間の電圧を測定する第1の測定処理、および前記1つの接続端子部が接続されている前記接続用導体と前記2つの接続端子部のうちの一方が接続されている前記接続用導体との間に測定用電圧を印加すると共に、前記1つの接続端子部が接続されている前記接続用導体と前記2つの接続端子部のうちの他方が接続されている前記接続用導体との間を流れる電流を測定する第2の測定処理の少なくとも一方を実行すると共に、当該少なくとも一方の測定処理の結果に基づいて前記1つの接続端子部が接続されている前記接続用導体と前記接続回路との間の導通抵抗の抵抗値を求めて検査用基準値と比較することで当該接続用導体と当該接続回路との間の導通状態を検査する基板検査方法。   A circuit body, a plurality of connection terminal portions connected to the circuit body, and the one connection terminal portion differ from one of the connection terminal portions according to a control signal output from an external device. Each connection in which each connection terminal portion is connected to the mounting substrate, with a mounting substrate on which an integrated circuit on which a connection circuit for executing connection processing for connecting the two connection terminal portions is formed is mounted, as an inspection target When inspecting the conduction state between the conductor for connection and the connection circuit, the control signal is output to connect the two connection terminal portions to the one connection terminal portion, and the one connection terminal A measurement current is supplied between the connection conductor to which the connection portion is connected and the connection conductor to which one of the two connection terminal portions is connected, and the one connection terminal portion is connected Have been said A first measurement process for measuring a voltage between the connection conductor and the connection conductor to which the other of the two connection terminal portions is connected, and the one connection terminal portion is connected The connection conductor to which a measurement voltage is applied between the connection conductor and the connection conductor to which one of the two connection terminal portions is connected and the one connection terminal portion is connected And at least one of a second measurement process for measuring a current flowing between the connection conductor to which the other of the two connection terminal portions is connected, and a result of the at least one measurement process The connection conductor and the connection are determined by obtaining a resistance value of a conduction resistance between the connection conductor and the connection circuit to which the one connection terminal portion is connected based on the reference value for inspection. Continuity with circuit Substrate inspection method for inspecting the state. 回路本体と、当該回路本体に接続された複数の接続端子部と、外部装置から出力された制御信号に従って前記各接続端子部のうちの1つに対して当該1つの接続端子部とは相違する2つの当該接続端子部を接続する接続処理を実行する接続回路とが形成されている集積回路を検査対象として当該各接続端子部の導通状態を検査する際に、前記制御信号を出力して前記1つの接続端子部に対して前記2つの接続端子部を接続させ、かつ前記1つの接続端子部と前記2つの接続端子部のうちの一方との間に測定用電流を供給すると共に、前記1つの接続端子部と前記2つの接続端子部のうちの他方との間の電圧を測定する第1の測定処理、および前記1つの接続端子部と前記2つの接続端子部のうちの一方との間に測定用電圧を印加すると共に、前記1つの接続端子部と前記2つの接続端子部のうちの他方との間を流れる電流を測定する第2の測定処理の少なくとも一方を実行すると共に、当該少なくとも一方の測定処理の結果に基づいて前記1つの接続端子部の導通抵抗の抵抗値を求めて検査用基準値と比較することで当該1つの接続端子部の導通状態を検査する集積回路検査方法。   A circuit body, a plurality of connection terminal portions connected to the circuit body, and the one connection terminal portion differ from one of the connection terminal portions according to a control signal output from an external device. When inspecting the continuity state of each of the connection terminal portions with an integrated circuit formed with a connection circuit that performs connection processing for connecting the two connection terminal portions as an inspection target, the control signal is output to output the control signal The two connection terminal portions are connected to one connection terminal portion, and a measurement current is supplied between the one connection terminal portion and one of the two connection terminal portions. A first measurement process for measuring a voltage between one connection terminal portion and the other of the two connection terminal portions, and between the one connection terminal portion and one of the two connection terminal portions. While applying the measurement voltage to While performing at least one of the 2nd measurement process which measures the electric current which flows between the one connection terminal part and the other of the two connection terminal parts, based on the result of the at least one measurement process An integrated circuit inspection method for inspecting a conduction state of the one connection terminal portion by obtaining a resistance value of the conduction resistance of the one connection terminal portion and comparing it with a reference value for inspection.
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