JP2015087732A - Optical axis adjustment method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To grasp the direction or amount of deviation of an optical axis while an optical component is mounted in an object and adjust the optical axis.SOLUTION: A slit member having a slit for allowing light to pass through is inserted in an optical axis between an object in which an optical component is mounted and the optical component (step S1). While the slit member moves so that a slit crosses the optical axis, the amount of light passing through the slit and joining between the optical component and the object is detected (step S2). The direction of deviation of the optical axis and the amount of deviation of the optical axis are grasped from the relationship between the position of the slit and a change in the amount of light along with the movement of the slit member (step S3). The optical axis is adjusted on the basis of the direction of deviation of the optical axis and the amount of deviation of the optical axis (step S4).

Description

  The present invention relates to an optical axis adjustment method.

  Conventionally, the optical fiber is moved in two directions perpendicular to the optical axis and perpendicular to each other to measure the amount of light, and the optical axis of the optical component and the optical fiber is adjusted based on the relationship between the amount of movement of the optical fiber and the amount of light. There exists a method (for example, refer patent document 1). Also, the optical axis of the densitometer is adjusted by moving the measurement slit plate with a minute slit in the direction crossing the optical axis and placing the measurement slit plate at the position where the amount of light passing through the measurement slit plate is maximized. (For example, refer to Patent Document 2).

JP-A-9-311250 JP 2001-83085 A

  When an optical component is mounted on a target object on which the optical component is mounted with the optical axis shifted, it is necessary to adjust the position of the optical component to eliminate the optical axis shift. For that purpose, it is necessary to know how much and in what direction the optical axis of the optical component mounted on the object is shifted. However, the conventional optical axis adjustment method has a problem in that it is impossible to grasp the direction and amount of deviation of the optical axis while the optical component is mounted on the object.

  An object of the present invention is to provide an optical axis adjustment method capable of adjusting the optical axis by grasping the direction and amount of deviation of the optical axis in a state where the optical component is mounted on the object.

  In this optical axis adjustment method, a slit member having a slit through which light passes is inserted into the optical axis between the optical component and the object on which the optical component is mounted. While the slit member moves so that the slit crosses the optical axis, the amount of light coupled between the optical component and the object is detected through the slit. The shift direction of the optical axis and the shift amount of the optical axis are grasped from the relationship between the position of the slit and the amount of change in the amount of light accompanying the movement of the slit member. The optical axis adjustment is performed based on the optical axis deviation direction and the optical axis deviation amount.

  According to this optical axis adjustment method, the optical axis can be adjusted by grasping the direction and amount of deviation of the optical axis while the optical component is mounted on the object.

FIG. 1 is a diagram illustrating an example of an optical axis adjustment method according to the embodiment. FIG. 2 is a diagram (No. 1) that sequentially shows changes in light passing through the slit as the slit moves. FIG. 3 is a diagram (part 2) illustrating the state of change of light passing through the slit in order as the slit moves. FIG. 4 is a diagram (No. 3) that sequentially shows the change of light passing through the slit as the slit moves. FIG. 5 is a diagram (part 4) illustrating the state of change of light passing through the slit in order as the slit moves. FIG. 6 is a diagram (No. 5) for sequentially illustrating a change in light passing through the slit as the slit moves. FIG. 7 is a diagram (No. 6) sequentially illustrating the state of change of light passing through the slit as the slit moves. FIG. 8 is a diagram illustrating a change in the amount of light when the optical axes are aligned. FIG. 9 is a diagram illustrating a change in the amount of light when the optical axis is shifted to the left side. FIG. 10 is a diagram illustrating a change in the amount of light when the optical axis is shifted to the right side. FIG. 11 is a diagram (part 1) illustrating a calculation result and a profile of the light amount when the light spot is within the light incident surface. FIG. 12 is a diagram (part 2) illustrating a calculation result and a profile of the light amount when the light spot is within the light incident surface. FIG. 13 is a diagram (part 3) illustrating a calculation result and a profile of the light amount when the light spot is within the light incident surface. FIG. 14 is a diagram (part 4) illustrating a calculation result and a profile of the light amount when the light spot is within the light incident surface. FIG. 15 is a diagram (part 5) illustrating a calculation result and a profile of the light amount when the light spot is within the light incident surface. FIG. 16 is a diagram (part 6) illustrating a calculation result and a profile of the light amount when the light spot is within the light incident surface. FIG. 17 is a diagram (part 7) illustrating the calculation result and profile of the light amount when the light spot is within the light incident surface. FIG. 18 is a diagram (part 8) illustrating the calculation result and profile of the light amount when the light spot is within the light incident surface. FIG. 19 is a diagram illustrating the relationship between the slit position and the amount of received light when the light spot is within the light incident surface. FIG. 20 is a diagram (part 1) illustrating a calculation result of the light amount when the light spot is shifted 6 μm to the left side of the light incident surface. FIG. 21 is a diagram (part 2) illustrating the calculation result of the light amount when the light spot is shifted 6 μm to the left side of the light incident surface. FIG. 22 is a diagram (No. 3) illustrating the calculation result of the light amount when the light spot is shifted 6 μm to the left side of the light incident surface. FIG. 23 is a diagram (No. 4) illustrating the calculation result of the light amount when the light spot is shifted by 6 μm to the left side of the light incident surface. FIG. 24 is a diagram (No. 5) illustrating a calculation result of the light amount when the light spot is shifted 6 μm to the left side of the light incident surface. FIG. 25 is a diagram (No. 6) illustrating a calculation result of the light amount when the light spot is shifted 6 μm to the left side of the light incident surface. FIG. 26 is a diagram (No. 7) illustrating the calculation result of the light amount when the light spot is shifted 6 μm to the left side of the light incident surface. FIG. 27 is a diagram (No. 8) illustrating the calculation result of the light amount when the light spot is shifted 6 μm to the left side of the light incident surface. FIG. 28 is a diagram showing the relationship between the slit position and the amount of received light when the light spot is shifted 6 μm to the left side of the light incident surface. FIG. 29 is a diagram showing the relationship between the slit position and the amount of received light when the light spot is shifted 12 μm to the left of the light incident surface. FIG. 30 is a diagram illustrating a calculation result of the light amount when the light spot is shifted by 18 μm to the left side of the light incident surface. FIG. 31 is a diagram showing the relationship between the slit position and the amount of received light when the light spot is shifted by 18 μm to the left of the light incident surface. FIG. 32 is a diagram illustrating the calculation result of the light amount when the light spot is shifted by 12 μm to the lower side of the light incident surface. FIG. 33 is a diagram showing the relationship between the slit position and the amount of received light when the light spot is shifted 12 μm below the light incident surface. FIG. 34 is a diagram illustrating the relationship between the slit position, the received light amount, and the shift amount when the optical axis is shifted to the left side. FIG. 35 is a diagram illustrating the relationship among the slit position, the received light amount, and the shift amount when the optical axis is shifted to the right side. FIG. 36 is a diagram illustrating the relationship between the slit position and the amount of received light when the optical axis is shifted to the left and right. FIG. 37 is a diagram illustrating the relationship between the slit position and the amount of received light when the optical axis is shifted to the left side, lower side, and lower left side. FIG. 38 is a diagram illustrating the relationship between the slit position and the amount of received light when the optical axis is shifted to each of the lower left side and the lower right side. FIG. 39 is a diagram illustrating how the optical axis of an optical component having a light emitting element is adjusted by the optical axis adjustment method according to the embodiment. FIG. 40 is a diagram illustrating a state in which the slit member and the optical waveguide are viewed from above when the slit moves in the X direction. FIG. 41 is a diagram illustrating a state in which the slit member and the optical waveguide are viewed from above when the slit moves in the Y direction. FIG. 42 is a diagram illustrating an example of an optical component attachment procedure. FIG. 43 is a diagram illustrating a state in which the optical axis of the optical component having the light receiving element is adjusted by the optical axis adjusting method according to the embodiment. FIG. 44 is a diagram illustrating a state in which an optical component having a plurality of light emitting elements is attached to be inclined. FIG. 45 is a diagram showing another example to which the optical axis adjusting method shown in FIG. 1 is applied. FIG. 46 is a diagram showing still another example to which the optical axis adjustment method shown in FIG. 1 is applied.

  Exemplary embodiments of the optical axis adjustment method will be described below in detail with reference to the accompanying drawings. In the following description of each embodiment, the same components are denoted by the same reference numerals, and redundant descriptions are omitted.

FIG. 1 is a diagram illustrating an example of an optical axis adjustment method according to the embodiment. As shown in FIG. 1, when an optical axis adjustment process between an optical component and an object on which an optical component is mounted is started, first, light between the object and the optical component on which the optical component is mounted A slit member having a slit through which light passes is inserted into the shaft (step S1). The portions other than the slit of the slit member are light shielding portions that do not allow light to pass through.

  Next, while the slit member moves so that the slit crosses the optical axis, the amount of light coupled between the optical component and the object through the slit is detected (step S2). Next, the deviation direction of the optical axis and the deviation amount of the optical axis are grasped from the relationship between the position of the slit and the amount of change in the light amount accompanying the movement of the slit member (step S3).

  Optical axis adjustment is performed based on the optical axis deviation direction and the optical axis deviation amount (step S4). And a series of optical axis adjustment processes are complete | finished.

  2-7 is a figure which shows the mode of the change of the light which passes along a slit in order with the movement of a slit. 2-7, the light 2 is emitted from the optical component 1 having a light emitting element, and the light 2 passes through the slit 4 of the slit member 3 and enters the light incident surface 6 of the object 5. The amount of light incident on the incident surface 6 is detected. Moreover, in FIGS. 2-7, the slit member 3 moves from the left side of each figure to the right side, and the light-incidence surface 6 becomes the inclined surface which goes down from the near side of each figure toward the back side, for example. And

  When the optical axis is deviated, the center of the light 2 is shifted from the center of the light incident surface 6 in a state where the light 2 emitted from the optical component 1 hits the light incident surface 6. In the present embodiment, when the optical axis is deviated, the direction in which the center of the light 2 is deviated from the center of the light incident surface 6 is the direction of deviation of the optical axis, and light from the center of the light incident surface 6 The shift amount at the center of 2 is the shift amount of the optical axis. Here, the state in which the optical axes of the light 2 are aligned will be described as an example.

  As shown in FIG. 2, when the slit 4 is off the light incident surface 6, the light 2 emitted from the optical component 1 is blocked by the light shielding portion that is not the slit 4 of the slit member 3. Therefore, the light 2 does not enter the light incident surface 6.

  As shown in FIG. 3, when the slit member 3 moves to the right side from the state of FIG. 2, a part of the slit 4 reaches the light incident surface 6. Therefore, the left peripheral portion of the light 2 enters the light incident surface 6 through the slit 4.

  As shown in FIG. 4, when the slit member 3 further moves to the right side from the state of FIG. 3, a larger portion of the slit 4 reaches the light incident surface 6. Therefore, more peripheral portions of the light 2 enter the light incident surface 6 through the slit 4.

  As shown in FIG. 5, when the slit member 3 further moves to the right side from the state of FIG. 4, the slit 4 reaches the vicinity immediately above the light incident surface 6. Therefore, the central portion of the light 2 enters the light incident surface 6 through the slit 4.

  As shown in FIG. 6, when the slit member 3 further moves to the right side from the state of FIG. 5, the light shielding portion on the left side of the slit member 3 reaches the light incident surface 6. Therefore, the central portion of the light 2 is blocked by the light shielding portion of the slit member 3, and the peripheral portion on the right side of the light 2 enters the light incident surface 6 through the slit 4.

  As shown in FIG. 7, when the slit member 3 further moves to the right side from the state of FIG. 6, a larger part of the light shielding portion on the left side of the slit member 3 reaches the light incident surface 6. Therefore, the peripheral portion of the light 2 that enters the light incident surface 6 through the slit 4 is reduced.

  8, 9, and 10 are diagrams illustrating changes in the light amount when the optical axis is aligned, when the optical axis is shifted to the left side, and when the optical axis is shifted to the right side. is there. In FIGS. 8 to 10, the light 2 that has passed through the slit 4 of the slit member 3 that moves from the left side to the right side of each figure as indicated by an arrow is an inclined surface that falls from the near side to the far side in each figure. A state in which light is incident on the light incident surface 6 is shown.

  8 to 10, an alternate long and two short dashes line 7 represents a designed optical axis, that is, an optical axis when not shifted, and an alternate long and short dash line 8 indicates a position on the graph 9 corresponding to the state of each figure. Yes. Each graph 9 shown in FIGS. 8 to 10 represents the relationship of the light quantity with respect to the position of the slit 4, the vertical axis is the light quantity, and the horizontal axis is the slit position.

  Since the light 2 emitted from the optical component 1 is closer to the center, the light is stronger and the light is weaker toward the periphery. Therefore, the light amount is closer to the center and the light amount is smaller toward the periphery. Therefore, as shown in FIG. 8, when the optical axis of the optical component 1 is aligned, in the state where the slit 4 is positioned on the left side on the light incident surface 6, the peripheral portion on the left side of the light 2 passes through the slit 4. Since the light is incident on the light incident surface 6, the amount of light detected is small.

  When the slit 4 moves toward the right side and the slit 4 is positioned on or near the optical axis of the optical component 1, the central portion of the light 2 passes through the slit 4 and enters the light incident surface 6. Therefore, the maximum light amount is detected. When the slit 4 further moves toward the right side and the slit 4 is located on the right side of the light incident surface 6, the right peripheral portion of the light 2 enters the light incident surface 6 through the slit 4. The amount of light detected is reduced again.

  In the left peripheral portion and the right peripheral portion across the center of the light 2, the amount of light decreases in the same tendency from the center of the light 2 toward the periphery. Therefore, when the optical axis of the optical component 1 is aligned, the graph 9 has a symmetrical shape with respect to the position where the light quantity is maximum.

  As shown in FIG. 9, when the optical axis of the optical component 1 is shifted to the left side, even if the slit 4 moves from the left side to the right side, the slit 4 does not overlap with the light incident surface 6 before the slit 4 is overlapped. The light 2 that has passed through 4 does not enter the light incident surface 6. For this reason, the amount of light is zero until the slit 4 begins to overlap the light incident surface 6.

  When the slit 4 overlaps the left end on the light incident surface 6, the central portion of the light 2 passes through the slit 4 and enters the light incident surface 6, and thus the maximum light amount is detected. Therefore, the graph 9 has a shape that rises sharply. As the slit 4 moves from the state toward the right side, the peripheral portion on the right side of the light 2 passes through the slit 4 and enters the light incident surface 6, so that the detected light quantity gradually decreases. Therefore, the graph 9 has a shape that gradually falls.

  That is, when the optical axis of the optical component 1 is shifted to the left side, the graph 9 has an asymmetrical shape such that it rises steeply to become the maximum light amount and then gradually decreases.

  As shown in FIG. 10, when the optical axis of the optical component 1 is shifted to the right side, the right end of the slit 4 reaches the peripheral portion on the left side of the light 2 even if the slit 4 moves from the left side to the right side. In the previous stage, the light 2 is blocked by the light shielding portion of the slit member 3 and does not enter the light incident surface 6.

  As the slit 4 moves from the state toward the right side, a portion closer to the central portion of the light 2 enters the light incident surface 6 through the slit 4, so that the detected light quantity gradually increases. Therefore, the graph 9 has a slowly rising shape.

  When the slit 4 further moves to the right side and the slit 4 is positioned on or near the optical axis of the optical component 1, the central portion of the light 2 enters the light incident surface 6 through the slit 4. The maximum amount of light is detected. As the slit 4 further moves toward the right side, the slit 4 moves away from the light incident surface 6, so the amount of light detected decreases rapidly.

  That is, when the optical axis of the optical component 1 is shifted to the right side, the graph 9 is asymmetrically shaped on the left and right, such that the light amount gradually rises and reaches the maximum light amount, and then rapidly decreases. The shape of the pattern is opposite to that of the case where the optical axis is shifted to the left side.

  The thickness of the slit member 3 only needs to be between the optical component 1 and the light incident surface 6 of the object 5. The slit member 3 is made of, for example, a metal such as stainless steel, and the slit 4 may be punched out. For example, the slit member 3 is made of a glass plate that transmits light, and a light shielding portion that does not transmit light is painted black. It may be made.

  When the spot diameter of the light 2 impinging on the light incident surface 6 is larger than that of the light incident surface 6, the width of the slit 4 is preferably less than half of the width of the light incident surface 6. In addition, when the spot diameter of the light 2 impinging on the light incident surface 6 is smaller than that of the light incident surface 6, the width of the slit 4 is preferably less than or equal to half the spot diameter. If the width of the slit 4 is about ¼ of the width of the light incident surface 6, the optical axis deviation direction and the optical axis deviation amount can be obtained with higher accuracy.

  However, if the width of the slit 4 is too narrow, the amount of light incident on the light incident surface 6 through the slit 4 is reduced, so that good results cannot be obtained. Theoretically, a slit width not smaller than the wavelength of the light source is necessary so as not to cause optical interference, that is, optically.

  As described above, the relationship between the position of the slit and the amount of change in the light amount indicates whether or not the optical axis of the optical component 1 is deviated, and if so, how much is deviated in which direction. Reflects. Accordingly, by obtaining the relationship between the position of the slit and the amount of change in the amount of light, the direction and amount of deviation of the optical axis of the optical component 1 can be grasped.

  For this purpose, the relationship between the slit position and the amount of change in the amount of light with respect to various combinations of optical axis deviation directions and various optical axis deviation amounts is obtained in advance, and the obtained data is subjected to optical axis adjustment. You may store as a database in an apparatus. Then, from the database, the one that matches or is close to the relationship between the slit position and the amount of change in the amount of light obtained by detecting the amount of light in step S2 in the optical axis adjustment process shown in FIG. May be. The shift direction and shift amount of the data selected from the database may be used as the shift direction and shift amount of the optical axis of the optical component 1.

  In obtaining in advance the relationship between the slit position and the amount of change in the amount of light with respect to various combinations of optical axis deviation directions and various optical axis deviation amounts, for example, as described later, the light emitted from the light source has a Gaussian distribution. A theoretical calculation that approximates and integrates only the light that has passed through the slit may be performed. Alternatively, the amount of light may be calculated by simulation such as ray tracing, BPM method (Beam Propagation Method), FDTD method (Finite-Difference Time-Domain method, finite difference time domain method). Alternatively, data serving as a calibration curve may be collected by detecting the amount of light while actually moving the slit member at the design stage or the prototype stage.

  From the database of the relationship between various slit positions and the amount of change in light quantity obtained in advance by a known method, the relationship between the position of the slit and the amount of change in light quantity obtained in the actual product manufacturing stage A match or a close match can be selected. For example, the difference value between the relationship between the position of various slits and the amount of change in light amount obtained in advance and the relationship between the position of the slit and the amount of change in light amount obtained in the actual product manufacturing stage is the largest. A smaller one may be selected as a solution. Further, a pattern recognition technique used in character recognition or the like may be used. From the database of the relationship between various slit positions and the amount of change in light quantity obtained in advance, one that matches the relationship between the position of the slit and the amount of change in light quantity obtained in the actual product manufacturing stage, or The process of selecting the closest one may be executed by a computer, for example.

Example of Theoretical Calculation FIGS. 11 to 18 are diagrams showing calculation results and profiles of the light amount when the light spot is within the light incident surface. In each of FIGS. 11 to 18, the upper diagram shows the positional relationship between the spot 11 of the light 2, the slit 4, and the light incident surface 6, and the distribution representing the light quantity at that time in numerical values. In the lower diagram, the distribution of the amount of light is three-dimensionally represented. One of the two orthogonal directions is the X direction or the left-right direction, and the other is the Y direction or the up-down direction.

  11 to 18, the four concentric circles represent the spot 11 of the light 2, the large square is the light incident surface 6, and the vertically elongated rectangle is the slit 4. Bands with numerical values “3” to “30” extending in the X direction and the Y direction in contact with the spot 11 of the light 2 represent the scales 12 and 13. For example, as shown in FIG. 12, when the right side of the slit 4 is located between “6” and “9”, the position of the slit 4 is 6 μm.

  The numerical value written at the intersection of the scale 12 in the X direction and the scale 13 in the Y direction represents a value obtained by standardizing the amount of received light. For example, in the example shown in FIG. 12, since “0.5” is written at the intersection of the scale 12 in the X direction and the scale 13 in the Y direction, the value obtained by standardizing the amount of received light is 0.5.

  In each of the lower diagrams of FIGS. 11 to 18, the square represents the light incident surface 6, and the numbers “3” to “30” attached along the two sides of the light incident surface 6 are the scales in the upper diagram. It corresponds to numerical values of 12 and 13. A numerical value of “0” to “10” in the Z direction is a received light amount. In the lower diagram, the received light amount indicated by a numerical value in the upper diagram is shown as the height in the Z direction.

  For example, as shown in FIG. 14, in the spot 11 of the light 2, the innermost circle is the region with the largest received light amount, and the received light amount is set to 10. The inside of the second annular portion is the region with the next largest amount of received light, and the received light amount is 6. The third inner annular portion is a region having the next largest received light amount, and the received light amount is set to 4.

  The outermost annular portion is the region with the smallest amount of received light, and the amount of received light is 1. The amount of received light is 0 outside the spot 11 of the light 2. Alternatively, the received light amount on the boundary line between adjacent regions with different received light amount values may be set to an intermediate value between the received light amount values of two adjacent regions.

  As shown in FIG. 11, when the position of the slit 4 is 0 μm, since the slit 4 does not overlap the spot 11 of the light 2, the value obtained by standardizing the amount of received light is 0.0. As shown in FIG. 12, when the position of the slit 4 reaches 6 μm, for example, the received light amounts of 1 and 0.5 are distributed in a portion where the slit 4 and the spot 11 of the light 2 overlap each other. The value obtained by normalizing is 0.5.

  As shown in FIG. 13, when the position of the slit 4 reaches 12 μm, for example, the received light amounts of 0.5, 1, 3, 4, 5 and 6 are distributed in the portion where the slit 4 and the spot 11 of the light 2 overlap. The value obtained by normalizing the amount of received light is 2.7. As shown in FIG. 14, when the position of the slit 4 reaches 18 μm, for example, the received light amounts of 1, 3, 4, 5, 6 and 10 are distributed in the portion where the slit 4 and the spot 11 of the light 2 overlap. The value obtained by standardizing the amount of received light is 5.7.

  As shown in FIG. 15, when the position of the slit 4 reaches 21 μm, for example, the received light amounts of 1, 3, 4, 5, 6 and 10 are distributed in the portion where the slit 4 and the spot 11 of the light 2 overlap. The value obtained by standardizing the amount of received light is 5.7. As shown in FIG. 16, when the position of the slit 4 becomes 27 μm, for example, the received light amounts of 0.5, 1, 3, 4, 5 and 6 are distributed in the portion where the slit 4 and the spot 11 of the light 2 overlap. The value obtained by normalizing the amount of received light is 2.7.

  As shown in FIG. 17, when the position of the slit 4 reaches 33 μm, for example, the received light amounts of 1 and 0.5 are distributed in a portion where a part of the slit 4 and the spot 11 of the light 2 overlap. The value obtained by normalizing is 0.5. As shown in FIG. 18, when the position of the slit 4 is 39 μm, since the slit 4 does not overlap the spot 11 of the light 2, the value obtained by standardizing the amount of received light is 0.0.

  FIG. 19 is a diagram illustrating the relationship between the slit position and the amount of received light when the light spot is within the light incident surface. In FIG. 19, the vertical axis represents the amount of received light, and the horizontal axis represents the position of the slit. FIG. 19 includes data when the positions of the slits 4 are 3 μm, 9 μm, 15 μm, 24 μm, 30 μm and 36 μm in addition to the data shown in FIGS. As shown in FIG. 19, when the optical axis is not shifted, the graph has a symmetrical shape.

  20 to 27 are diagrams showing calculation results of the light amount when the light spot is shifted 6 μm to the left side of the light incident surface. 20 to 27 show the positional relationship between the spot 11 of the light 2, the slit 4, and the light incident surface 6, and the distribution of the light quantity at that time in numerical values. The spot 11 of the light 2, the light incident surface 6, the slit 4, the scale 12 in the X direction, and the scale 13 in the Y direction are the same as those in FIGS.

  As shown in FIG. 20, when the position of the slit 4 is 0 μm, since the slit 4 is not on the light incident surface 6, the value obtained by standardizing the amount of received light is 0.0. As shown in FIG. 21, even when the position of the slit 4 is 6 μm, since the slit 4 is not on the light incident surface 6, the value obtained by standardizing the amount of received light is 0.0.

  As shown in FIG. 22, when the position of the slit 4 becomes 9 μm, for example, a part of the slit 4 is positioned on the light incident surface 6 and overlaps the spot 11 of the light 2, and 1, 3 and 4 are overlapped on the overlapped portion. The amount of received light is distributed, and the value obtained by standardizing the amount of received light is 0.9. As shown in FIG. 23, when the position of the slit 4 reaches 18 μm, for example, the received light amounts of 1, 3, 4, 5, 6 and 10 are distributed in the portion where the slit 4 and the spot 11 of the light 2 overlap. The value obtained by standardizing the amount of received light is 5.7.

  As shown in FIG. 24, when the position of the slit 4 reaches 21 μm, for example, the received light amounts of 1, 3, 4, 5, 6 and 10 are distributed in the portion where the slit 4 and the spot 11 of the light 2 overlap. The value obtained by standardizing the amount of received light is 5.7. As shown in FIG. 25, when the position of the slit 4 becomes 27 μm, for example, the received light amounts of 0.5, 1, 3, 4, 5 and 6 are distributed in the portion where the slit 4 and the spot 11 of the light 2 overlap. The value obtained by normalizing the amount of received light is 2.7.

  As shown in FIG. 26, when the position of the slit 4 reaches 33 μm, for example, a part of the slit 4 overlaps the spot 11 of the light 2 and the received light amounts of 0.5 and 1 are distributed in the overlapped portion. A value obtained by standardizing the amount of received light is 0.5. As shown in FIG. 27, when the position of the slit 4 is 39 μm, the slit 4 and the spot 11 of the light 2 do not overlap with each other, so the value obtained by standardizing the amount of received light is 0.0.

  FIG. 28 is a diagram showing the relationship between the slit position and the amount of received light when the light spot is shifted 6 μm to the left side of the light incident surface. In FIG. 28, the vertical axis represents the amount of received light, and the horizontal axis represents the position of the slit. FIG. 28 includes data when the positions of the slits 4 are 3 μm, 12 μm, 15 μm, 24 μm, 30 μm, and 36 μm in addition to the data shown in FIGS. As shown in FIG. 28, when the light spot is shifted 6 μm to the left side of the light incident surface, the graph has an asymmetric shape on the left and right, and the received light amount is normalized until the slit position exceeds 6 μm. The value is 0.

  FIG. 29 is a diagram showing the relationship between the slit position and the amount of received light when the light spot is shifted 12 μm to the left of the light incident surface. In FIG. 29, the vertical axis represents the amount of received light, and the horizontal axis represents the position of the slit. As shown in FIG. 29, when the light spot is shifted 12 μm to the left side of the light incident surface, the graph is asymmetrical on the left and right as in the case where the light spot is shifted 6 μm to the left side of the light incident surface. The value obtained by standardizing the amount of received light is 0 until the shape is reached and the slit position exceeds 12 μm.

  FIG. 30 is a diagram illustrating a calculation result of the light amount when the light spot is shifted by 18 μm to the left side of the light incident surface. FIG. 30 shows the positional relationship between the spot 11 of the light 2, the slit 4, and the light incident surface 6 and the distribution of the light quantity at that time in numerical values. The spot 11 of the light 2, the light incident surface 6, the slit 4, the scale 12 in the X direction, and the scale 13 in the Y direction are the same as those in FIGS.

  As shown in FIG. 30, when the light spot is shifted to the left side of the light incident surface 6 by 18 μm, the region having the largest amount of received light of the spot 11 of light 2, that is, the region having the received light amount of 10, is already It is off to the left of the light incident surface 6. And when the position of the slit 4 reaches 27 μm, the entire slit 4 overlaps with the light incident surface 6 for the first time.

  In the portion where the slit 4 and the spot 11 of the light 2 overlap when the position of the slit 4 is 27 μm, for example, received light amounts of 0.5, 1, 3, 4, 5 and 6 are distributed. A value obtained by standardizing the amount of received light is 2.7. When the slit 4 moves further to the right side, the peripheral portion on the right side of the spot 11 of the light 2 is incident on the light incident surface 6 through the slit 4, so the value obtained by standardizing the amount of received light decreases.

  FIG. 31 is a diagram showing the relationship between the slit position and the amount of received light when the light spot is shifted by 18 μm to the left of the light incident surface. In FIG. 31, the vertical axis represents the amount of received light, and the horizontal axis represents the position of the slit. As shown in FIG. 31, when the light spot is shifted 18 μm to the left side of the light incident surface 6, the graph is left and right as in the case where the light spot is shifted 6 μm to the left side of the light incident surface 6. The value obtained by standardizing the amount of received light is zero until the shape is asymmetric and the slit position exceeds 18 μm. Furthermore, since the region with the largest amount of light reception of the spot 11 of the light 2 is off the left side of the light incident surface 6, the maximum value of the standardized light reception amount is larger than the maximum value in FIGS. Becomes smaller.

  FIG. 32 is a diagram illustrating the calculation result of the light amount when the light spot is shifted by 12 μm to the lower side of the light incident surface. FIG. 32 shows the positional relationship between the spot 11 of the light 2, the slit 4, and the light incident surface 6 and the distribution of the light quantity at that time in numerical values. The spot 11 of the light 2, the light incident surface 6, the slit 4, the scale 12 in the X direction, and the scale 13 in the Y direction are the same as those in FIGS.

  As shown in FIG. 32, when the light spot is shifted by 12 μm to the lower side of the light incident surface 6, the lower part of the spot 11 of the light 2 is off the lower side of the light incident surface 6. Therefore, the value obtained by standardizing the amount of received light is smaller than the case where the spot 11 of the light 2 is not deviated vertically with respect to the light incident surface 6 as shown in FIGS.

  FIG. 33 is a diagram showing the relationship between the slit position and the amount of received light when the light spot is shifted 12 μm below the light incident surface. In FIG. 33, the vertical axis represents the amount of received light, and the horizontal axis represents the position of the slit. As shown in FIG. 33, when the light spot is shifted 12 μm below the light incident surface 6, the graph shows the case where the spot 11 of the light 2 does not deviate vertically from the light incident surface 6. However, the value obtained by standardizing the amount of received light is small.

  FIG. 34 is a diagram illustrating the relationship between the slit position, the received light amount, and the shift amount when the optical axis is shifted to the left side. In FIG. 34, the vertical axis represents the amount of received light, and the horizontal axis represents the position of the slit. FIG. 34 shows a graph when the amount of deviation of the optical axis to the left is 6 μm, 12 μm, and 18 μm, and a graph when there is no deviation of the optical axis for reference. As shown in FIG. 34, when the optical axis is shifted to the left side, the graph has an asymmetrical shape on the left and right, and the position where the light quantity is maximized is located on the right side as the shift amount to the left side increases.

  FIG. 35 is a diagram illustrating the relationship among the slit position, the received light amount, and the shift amount when the optical axis is shifted to the right side. In FIG. 35, the vertical axis represents the amount of received light, and the horizontal axis represents the position of the slit. FIG. 35 shows a graph when the amount of deviation to the right side of the optical axis is 6 μm, 12 μm, and 18 μm, and a graph when there is no deviation of the optical axis as a reference. As shown in FIG. 35, when the optical axis is shifted to the right side, the graph has an asymmetric shape on the left and right sides, and the position where the light quantity is maximized is located on the left side as the amount of shift to the right side increases.

  FIG. 36 is a diagram illustrating the relationship between the slit position and the amount of received light when the optical axis is shifted to the left and right. In FIG. 36, the vertical axis represents the amount of received light, and the horizontal axis represents the position of the slit. FIG. 36 shows a graph when the amount of deviation of the optical axis to the left in FIG. 34 is 12 μm and a graph when the amount of deviation of the optical axis to the right in FIG. 35 is 12 μm. As shown in FIG. 36, the graph in the case where the optical axis is shifted to the right side has a shape obtained by inverting the graph in the case where the optical axis is shifted to the left side. The same applies when the amount of deviation is other than 12 μm.

  FIG. 37 is a diagram illustrating the relationship between the slit position and the amount of received light when the optical axis is shifted to the left side, lower side, and lower left side. In FIG. 37, the vertical axis represents the amount of received light, and the horizontal axis represents the position of the slit. FIG. 37 shows a graph when the shift amount to the left of the optical axis in FIG. 34 is 12 μm, a graph when the shift amount to the lower side of the optical axis is 12 μm, and the left and lower sides of the optical axis. The graph in the case where the amount of deviation is 12 μm is shown. As shown in FIG. 37, the shape of the graph when the optical axis is shifted downward is the same as the graph when the optical axis is not shifted downward, but the amount of received light is small. The same applies when the amount of deviation is other than 12 μm.

  FIG. 38 is a diagram illustrating the relationship between the slit position and the amount of received light when the optical axis is shifted to each of the lower left side and the lower right side. In FIG. 38, the vertical axis represents the amount of received light, and the horizontal axis represents the position of the slit. FIG. 38 shows a graph in the case where the shift amount to the left and the lower side of the optical axis is 12 μm, and a graph in which the shift amount to the right and the lower side of the optical axis is 12 μm, respectively. Yes. As shown in FIG. 38, the graph when the optical axis is shifted to the lower right side has a shape obtained by inverting the graph when the optical axis is shifted to the lower left side. The same applies when the amount of deviation is other than 12 μm.

  According to the optical axis adjustment method shown in FIG. 1, the light amount of the light 2 that is coupled between the optical component 1 and the object 5 through the slit 4 changes according to the position of the slit 4. By obtaining the relationship between the amount of light and the amount of change in the amount of light, it is possible to grasp the direction and amount of deviation of the optical axis while the optical component 1 is mounted on the object 5. Therefore, the optical axis of the optical component 1 can be adjusted based on the grasped direction and amount of deviation of the optical axis.

・ Application to optical interconnect technology Recently, optical interconnect technology has attracted attention. The optical interconnect technology performs data transmission by optical communication in a server system or a network system device using, for example, a supercomputer. An optical waveguide is provided on a printed wiring board to which the optical interconnect technology is applied, and signal light emitted from an optical component having a light emitting element is incident on one end of the optical waveguide. The signal light propagated in the optical waveguide is emitted from the other end of the optical waveguide and received by an optical component having a light receiving element.

  In a printed wiring board to which the optical interconnect technology is applied, for example, a light emitting element may be disposed right above one end of the optical waveguide, and a light receiving element may be disposed right above the other end of the optical waveguide. In this configuration, the light emitted downward from the light emitting element is reflected by a 45 ° mirror formed at one end of the optical waveguide, enters the core of the optical waveguide, propagates in the core of the optical waveguide, The light is reflected by a 45 ° mirror formed at the other end of the waveguide, exits from the core, and enters the light receiving element.

  The size of the core of the optical waveguide is approximately 30 μm to 50 μm square. In order not to remove light from the 45 ° mirror of the optical waveguide, it is desirable to align the position of the light emitting element or the light receiving element with respect to the 45 ° mirror with an accuracy of approximately ± 5 μm or less. If the core of the optical waveguide becomes smaller in the future, higher alignment accuracy is required when attaching the light emitting element or the light receiving element to the printed wiring board.

  Also, the closer the angle between the propagation direction of the light emitted from the light emitting element and entering the 45 ° mirror and the propagation direction of the light in the optical waveguide is closer to 90 °, the smaller the coupling loss in the 45 ° mirror. Therefore, in order to minimize the coupling loss in the 45 ° mirror, it is desirable that the light emitting element is positioned directly above the 45 ° mirror.

  FIG. 39 is a diagram illustrating how the optical axis of an optical component having a light emitting element is adjusted by the optical axis adjustment method according to the embodiment. FIG. 40 is a diagram illustrating a state in which the slit member and the optical waveguide are viewed from above when the slit moves in the X direction. FIG. 41 is a diagram illustrating a state in which the slit member and the optical waveguide are viewed from above when the slit moves in the Y direction.

  39 to 41, reference numeral 21 denotes a light emitting element provided in the optical component 1. A VCSEL (Vertical Cavity Surface Emitting LASER, vertical cavity surface emitting laser) is an example of the light emitting element 21. Reference numeral 22 denotes an attachment portion that is attached to a fine movement machine (not shown) that moves the slit member 3, and this attachment portion is fixed to the slit member 3. Reference numeral 23 denotes a printed wiring board, and an optical waveguide 24 is attached to the upper surface of the printed wiring board 23. The printed wiring board 23 provided with the optical waveguide 24 is an example of an object.

  The optical waveguide 24 has a core 25 and a clad 26, and 45 ° mirrors 27 and 28 are formed on both end faces of the core 25. One 45 ° mirror 27 is an example of a light incident surface, and reflects the light 2 emitted from the light emitting element 21 and guides it into the core 25 of the optical waveguide 24. When the optical axis of the optical component 1 having the light emitting element 21 is adjusted, for example, an optical power meter 29 is disposed on the other 45 ° mirror 28. The optical power meter 29 measures the amount of light emitted from the other 45 ° mirror 28.

  In FIG. 39, the footprint provided on the front surface of the printed wiring board 23, the terminals provided on the back surface of the optical component 1, and the bonding of solder or the like that joins the terminals of the optical component 1 and the footprint. The material is not shown.

  In the example shown in FIG. 40, the optical component 1 is provided with a plurality of light emitting elements 21 in a line in the X direction. For example, twelve light emitting elements 21 may be provided in the optical component 1. When a plurality of light emitting elements 21 are provided, as shown in FIG. 40, the slit member 3 that moves in the X direction is provided with slits 4 that extend in the Y direction by the same number as the number of the light emitting elements 21. Also good.

  In the example shown in FIG. 41, since a plurality of light emitting elements 21 are provided in a row in the X direction in the optical component 1, the slit member 3 that moves in the Y direction is provided with one or more slits 4 that extend in the X direction. It only has to be done. The X direction and the Y direction are not limited to the directions shown in FIGS. 40 and 41 as long as they are two orthogonal directions.

  FIG. 42 is a diagram illustrating an example of an optical component attachment procedure. As shown in FIG. 42, when attachment of the optical component 1 having the light emitting element 21 is started, first, a bonding material such as solder is applied on the footprint of the printed wiring board 23 (step S11). Next, the optical component 1 is sucked by the suction nozzle of an apparatus such as a mounter (step S12), and the position of the optical component 1 sucked by the suction nozzle is recognized (step S13).

  Next, the optical component 1 is moved to a predetermined mounting position of the printed wiring board 23 (step S14) and mounted at the predetermined mounting position (step S15). Next, the optical component 1 is fixed to the printed wiring board 23 by reflow soldering (step S16). Note that other electronic components and optical components other than the optical component 1 are also fixed to the printed wiring board 23 by reflow soldering. However, at this stage, an optical component having a light receiving element cannot be attached.

  After completion of the reflow soldering, as shown in FIG. 39, an optical power meter 29 is disposed on the 45 ° mirror 28 on the side that receives the light 2 emitted from the light emitting element 21, and the light emitting element 21 is lit to emit light power. The light quantity is measured by the meter 29. As a result, when a desired amount of light is obtained, the optical power meter 29 is removed, and the attachment of the optical component 1 having the light emitting element 21 is completed.

  On the other hand, when a desired light quantity cannot be obtained by the optical power meter 29, as shown in FIG. 39, a slit member is interposed between the optical component 1 and the optical waveguide 24 in a state where the optical power meter 29 is arranged. 3 is inserted. Then, the light emitting element 21 is illuminated, and the light quantity is measured by the optical power meter 29 while the slit 4 is moved in the X direction by the movement of the slit member 3 as shown in FIG. Thereby, in the X direction, the relationship between the slit position and the amount of change in the amount of light as in the graph 9 shown in FIGS. 8 to 10 is obtained.

  Subsequently, in the state where the light emitting element 21 is illuminated, as shown in FIG. 41, the light power meter 29 measures the light amount while the slit 4 moves in the Y direction by the movement of the slit member 3. Thereby, in the Y direction, the relationship between the slit position and the amount of change in the amount of light as in the graph 9 shown in FIGS. 8 to 10 is obtained (step S17).

  Next, each of the graphs in the X direction and the Y direction obtained in step S17 is matched with the data to be a calibration curve as shown in FIGS. 34 to 38, and the calibration curve data that matches or is close is selected. The Thereby, the deviation direction and deviation amount of the optical axis in the X direction and the deviation direction and deviation amount of the optical axis in the Y direction are grasped (step S18). The optical axis deviation direction and deviation amount may be grasped separately in the X direction and the Y direction, or the optical axis deviation direction and deviation amount in the X direction and the optical axis deviation direction and deviation amount in the Y direction are determined. By combining, it may be understood how much the optical axis is shifted in which direction.

  Next, the optical component 1 is heated, the bonding material such as solder fixing the optical component 1 is melted, and the optical component 1 moves freely (step S19). Next, the optical component 1 is moved in the direction opposite to the optical axis shift direction by the optical axis shift amount based on the optical axis shift direction and shift amount obtained in step S18 (step S20).

  When the optical component 1 is lifted when the optical component 1 is moved, if the optical component 1 is lifted too much, the bonding material such as molten solder is interrupted. Attention should be paid to the height to be lifted. Thereafter, the molten bonding material such as solder is cooled and hardened (step S21), and the mounting of the optical component 1 is completed.

  Instead of attaching the optical component to the printed wiring board 23 by reflow soldering, the optical component 1 may be attached to the printed wiring board 23 by flip chip bonding using a flip chip bonder. In addition, since the relationship between the slit position and the amount of change in the amount of light obtained in step S17 is a waveform, in step S18, matching with data that becomes a calibration curve in the spectrum after Fourier transform may be performed. When performing waveform matching, a statistical method such as discriminant analysis or variance analysis may be used. The accuracy of matching is improved by using a statistical method.

  When the attachment of the optical component 1 having the light emitting element 21 is completed, the optical component having the light receiving element is mounted on the printed wiring board 23. By attaching an optical component having a light receiving element to the printed wiring board 23 using a bonding material such as solder, the light emitting element 21 whose optical axis is already aligned is illuminated, and the amount of current flowing through the light receiving element is measured. Thus, it can be seen whether or not a desired light amount is obtained by the light receiving element. When the desired light quantity is obtained, the attachment of the optical component having the light receiving element is completed. When the desired light quantity cannot be obtained, the optical axis of the optical component having the light receiving element is adjusted by performing step S17 and subsequent steps in FIG.

  FIG. 43 is a diagram illustrating a state in which the optical axis of the optical component having the light receiving element is adjusted by the optical axis adjusting method according to the embodiment. In FIG. 43, reference numeral 31 is a light receiving element provided in the optical component 1. Reference numeral 32 denotes an optical component having the light emitting element 21. When the optical axis of the optical component 1 having the light receiving element 31 is adjusted, the light emitting element 21 whose optical axis is already aligned is illuminated, and the light emitted from the 45 ° mirror 28 is received by the light receiving element 31. What is necessary is just to measure the amount of current flowing through.

  43, the footprint provided on the front surface of the printed wiring board 23, the terminals provided on the back surfaces of the optical components 1 and 32, and the terminals and footprints of the optical components 1 and 32 are joined. A bonding material such as solder is not shown.

  FIG. 44 is a diagram illustrating a state in which an optical component having a plurality of light emitting elements is attached to be inclined. When a plurality of light emitting elements 21 are provided in the optical component 1, the core 25 of the optical waveguide 24 is determined from the direction and amount of deviation of the optical axis in the X direction and the direction and quantity of deviation of the optical axis in the Y direction. The inclination of the optical component 1 with respect to the extending direction can be obtained.

  For example, as shown in FIG. 44, a line 41 connecting 45 ° mirrors 27 provided at one end of the plurality of cores 25 of the optical waveguide 24 and an irradiation position 42 of the light emitted from the plurality of light emitting elements 21 respectively. By obtaining the angle θ formed with the connecting line 43, the inclination of the optical component 1 can be obtained. The line 41 connecting the 45 ° mirrors 27 is obtained, for example, by calculating an approximate line connecting the 45 ° mirrors 27 from the position of each 45 ° mirror 27 by the least square method.

  Similarly, the line 43 connecting the light irradiation positions 42 is obtained, for example, by calculating an approximate line connecting the light irradiation positions 42 from the light irradiation positions 42 by the least square method. Alternatively, for example, in FIG. 44, a line 41 connecting the 45 ° mirror 27 from the position of the light irradiation position 42 with respect to the 45 ° mirror 27 at the left end and the position of the light irradiation position 42 with respect to the 45 ° mirror 27 at the right end, for example. And the angle θ formed by the light irradiation position 42 may be obtained.

  If the inclination of the optical component 1 relative to the direction in which the core 25 of the optical waveguide 24 extends is known, when the optical component is adjusted by moving the optical component 1 in step S20, the irradiation position 42 of each light is applied to each 45 ° mirror 27. The inclination of the optical component 1 can be eliminated so as to match. When the inclination of the optical component 1 disappears, the angle formed by the propagation direction of the light emitted from each light emitting element 21 and incident on each 45 ° mirror 27 and the propagation direction of the light in the core 25 of the optical waveguide 24 is 90 °. Therefore, the coupling loss in the 45 ° mirror 27 can be reduced.

  By attaching the optical component 1 to the printed wiring board 23 by applying the optical axis adjustment method shown in FIG. 1, the optical axis deviation direction and deviation amount are grasped in a state where the optical component 1 is mounted on the printed wiring board 23. Therefore, the optical axis of the optical component 1 can be adjusted without removing the optical component 1. In this case, since the solder fixing the optical component 1 to the printed wiring board 23 is heated and melted to adjust the optical axis, the thermal history applied to the printed wiring board 23 and the optical waveguide 24 is only once.

  On the other hand, when a desired light quantity cannot be obtained, the optical component 1 can be replaced with a new one. However, in that case, the solder fixing the optical component 1 is heated and melted to remove the optical component 1, the solder remaining on the printed wiring board 23 is removed by heating and melting, and a new optical component 1 is soldered. Therefore, the heat history is applied to the printed wiring board 23 and the optical waveguide 24 three times. Since the heat resistance of high-speed components tends to be low, it is preferable that the number of heat histories is small. Therefore, by applying the optical axis adjusting method shown in FIG. 1 and attaching the optical component 1, the heat burden on the printed wiring board 23 and the optical waveguide 24 can be reduced. Moreover, since the new optical component 1 becomes unnecessary, the cost of the optical component 1 and the cost of attachment work can be reduced.

  In addition, by applying the optical axis adjustment method shown in FIG. 1 to attach the optical component 1 to the printed wiring board 23, the optical axis deviation direction and deviation amount can be changed with the optical component 1 mounted on the printed wiring board 23. Since it can be grasped, data on the direction and amount of deviation of the optical axis can be accumulated. Then, the accumulated optical axis deviation data can be fed back to the work or apparatus for attaching the optical component 1.

  On the other hand, when a desired amount of light cannot be obtained, the optical coupling portion between the optical component 1 and the optical waveguide 24 can be cut to check whether the optical axis has shifted. However, in that case, since the optical component 1 and the printed wiring board 23 are destroyed, the light path cannot be actually confirmed by causing the light emitting element 21 to emit light. In addition, it is impossible to obtain the deviation of the optical axis in the direction orthogonal to the cut surface. Therefore, it is impossible to accurately grasp the direction and amount of deviation of the optical axis. Therefore, it is impossible to accumulate data on the direction and amount of deviation of the optical axis and feed back the data to the work or apparatus for attaching the optical component 1. Moreover, since the optical component 1 and the printed wiring board 23 cannot be reused, the cost increases.

  When there are a plurality of optical paths, the optical waveguide 24 has a plurality of cores 25, and the optical component 1 has a number of light emitting elements 21 or light receiving elements 31 corresponding to the number of cores 25. In this case, by applying the optical axis adjustment method shown in FIG. 1 and attaching the optical component 1 to the printed wiring board 23, whether or not a desired amount of light can be obtained due to a shift in the mounting position of the optical component 1; It can be determined whether a desired amount of light cannot be obtained due to destruction of the element or contamination of the optical path. For example, when a desired light amount cannot be obtained with almost all channels, it can be determined that the mounting position of the optical component 1 is shifted. On the other hand, when a desired amount of light is obtained in almost all channels, but a desired amount of light cannot be obtained in some channels, the light emitting element 21 or the light receiving element 31 of the channel where the desired amount of light cannot be obtained. It can be determined that the cause is that foreign matters are mixed in the optical path of the channel that is destroyed or cannot obtain a desired light quantity.

  In addition, by applying the optical axis adjustment method shown in FIG. 1 and attaching the optical component 1 to the printed wiring board 23, the relationship between the slit position and the amount of change in the amount of light was actually measured and then obtained in advance. From the relationship between the position of the slit and the amount of change in the amount of light, one that matches or is close to the relationship obtained by actual measurement may be selected. Therefore, it is possible to easily grasp the direction and amount of deviation of the optical axis.

  Further, by applying the optical axis adjustment method shown in FIG. 1 to attach the optical component 1 to the printed wiring board 23, the optical axis is changed depending on whether or not the relationship between the slit position and the amount of change in the amount of light has symmetry. Since it is known whether or not there is a deviation, it is possible to easily grasp whether or not the optical axis is displaced. Further, by moving the slit 4 so as to cross the two directions orthogonal to the optical axis, even if the optical axis is shifted in any direction with respect to the surfaces of the 45 ° mirrors 27 and 28, the optical axis shift direction or The amount of deviation can be grasped.

  Further, by applying the optical axis adjustment method shown in FIG. 1 and attaching the optical component 1 to the printed wiring board 23, the optical axis deviation direction and deviation amount are grasped for each of the light emitting element 21 and the light receiving element 31. Can be adjusted. Therefore, both the light emitting element 21 and the light receiving element 31 can be attached to the printed wiring board 23 with high coupling efficiency.

  FIG. 45 is a diagram showing another example to which the optical axis adjusting method shown in FIG. 1 is applied. As shown in FIG. 45, the optical axis adjustment method shown in FIG. 1 may be applied to an optical system in which a light emitting side optical component 51 having a light emitting element and a light receiving side optical component 52 having a light receiving element are opposed to each other. For example, the slit member 3 is moved so that the slit 4 traverses the optical axis of the light 2 emitted from the light-emitting side optical component 51 and incident on the light-receiving side optical component 52, thereby grasping the direction and amount of shift of the optical axis. May be. Then, the optical axis adjustment may be performed by moving the light emitting side optical component 51 or the light receiving side optical component 52 based on the grasped direction and amount of deviation of the optical axis.

  FIG. 46 is a diagram showing still another example to which the optical axis adjustment method shown in FIG. 1 is applied. As shown in FIG. 46, in an optical system in which lenses 53 and 54 are inserted between a light emitting side optical component 51 having a light emitting element and a light receiving side optical component 52 having a light receiving element, the optical axis adjustment shown in FIG. A method may be applied. For example, when the slit member 3 is moved, the slit 4 crosses the optical axis of the light 2 that is emitted from the light-emitting side optical component 51, passes through the lens 53, and further enters the light-receiving side optical component 52 through the lens 54. The optical axis deviation direction and deviation amount may be grasped. Then, the optical axis adjustment may be performed by moving the light-emitting side optical component 51, the lens 53, the lens 54, or the light-receiving side optical component 52 based on the grasped direction and amount of deviation of the optical axis.

  The following additional notes are further disclosed with respect to the embodiments including the above-described examples.

(Appendix 1) A slit member having a slit through which light passes is inserted into the optical axis between the optical component and the object on which the optical component is mounted, and the slit member crosses the optical axis. The amount of light coupled between the optical component and the object through the slit is detected, and the relationship between the position of the slit and the amount of change in the amount of light accompanying the movement of the slit member is detected. An optical axis adjustment method comprising: grasping a deviation direction of the optical axis and a deviation amount of the optical axis, and performing an optical axis adjustment based on the deviation direction of the optical axis and the deviation amount of the optical axis.

(Additional remark 2) The relationship between the position of the slit and the amount of change in the amount of light with respect to combinations of various optical axis deviation directions and various optical axis deviation amounts is obtained in advance, and the slit position obtained in advance. By selecting one that matches or is close to the relationship between the slit position acquired by moving the slit member and the amount of change in the amount of light, from the relationship between the amount of change in the amount of light and the amount of change in the amount of light. 2. The optical axis adjusting method according to appendix 1, wherein the optical axis deviation direction and the optical axis deviation amount are grasped.

(Supplementary Note 3) The relationship between the position of the slit and the amount of change in the light amount is symmetrical with respect to the peak position of the light amount when the optical axis is aligned, and the optical axis is deviated. The optical axis adjustment method according to appendix 1 or 2, wherein the light axis has an asymmetry with respect to a peak position of the light quantity.

(Supplementary note 4) The optical axis adjusting method according to any one of supplementary notes 1 to 3, wherein the slit member is moved so that the slit crosses two directions orthogonal to the optical axis.

(Additional remark 5) The said optical component has a light emitting element, The said target object is a printed wiring board provided with the optical waveguide in which the light radiate | emitted from the said light emitting element injects, The said optical component, the said target object, The optical axis adjustment method according to any one of appendices 1 to 4, wherein light coupled between the two is incident on an end face of one end of the optical waveguide.

(Additional remark 6) The said optical component has a light receiving element, The said target object is a printed wiring board provided with the optical waveguide which radiate | emits light to the said light receiving element, Between the said optical component and the said target object The optical axis adjusting method according to any one of appendices 1 to 4, wherein the coupled light is emitted from an end face of one end of the optical waveguide.

DESCRIPTION OF SYMBOLS 1 Optical component 2 Light 3 Slit member 4 Slit 5 Object 21 Light emitting element 23 Printed wiring board 24 Optical waveguide 31 Light receiving element

Claims (4)

Insert a slit member having a slit through which light passes into the optical axis between the optical component and the object on which the optical component is mounted,
While moving the slit member so that the slit crosses the optical axis, the amount of light coupled between the optical component and the object through the slit is detected,
From the relationship between the position of the slit accompanying the movement of the slit member and the amount of change in the light amount, grasp the deviation direction of the optical axis and the deviation amount of the optical axis,
An optical axis adjustment method, wherein an optical axis adjustment is performed based on a deviation direction of the optical axis and an amount of deviation of the optical axis. The relationship between the position of the slit and the amount of change in the amount of light with respect to combinations of various optical axis deviation directions and various optical axis deviation amounts is obtained in advance,
Among the relationship between the position of the slit and the amount of change in the light amount obtained in advance, one that matches the relationship between the position of the slit and the amount of change in the light amount obtained by moving the slit member, 2. The optical axis adjustment method according to claim 1, further comprising: grasping a deviation direction of the optical axis and an amount of deviation of the optical axis by selecting close ones.   The relationship between the position of the slit and the amount of change in the light amount is symmetrical with respect to the peak position of the light amount when the optical axis is aligned, and the amount of the light amount when the optical axis is shifted. 3. The optical axis adjustment method according to claim 1, wherein the optical axis adjustment method has asymmetry with respect to a peak position.   4. The optical axis adjustment method according to claim 1, wherein the slit member is moved so that the slit crosses two directions orthogonal to the optical axis. 5.

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