JP2004144533A - Minute light source locating system - Google Patents

Minute light source locating system Download PDF

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Publication number
JP2004144533A
JP2004144533A JP2002307887A JP2002307887A JP2004144533A JP 2004144533 A JP2004144533 A JP 2004144533A JP 2002307887 A JP2002307887 A JP 2002307887A JP 2002307887 A JP2002307887 A JP 2002307887A JP 2004144533 A JP2004144533 A JP 2004144533A
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Prior art keywords
slit
light source
light
lens unit
moving
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JP2002307887A
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JP3700848B2 (en
Inventor
Ryoichi Nozaki
野崎 亮一
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Noozeru Engineering Kk
ノーゼルエンジニアリング株式会社
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a minute light source locating system capable of quickly acquiring accurate positional data on the light emitting spot of a semiconductor laser attached to an inspection table. <P>SOLUTION: A triangular slit etc. are moved so that a luminous flux obtained by condensing with an objective lens 52 light from a minute light source 2 moves crossing the triangular slit 61 whose width becomes gradually wider in its width direction. On the basis of the variation property of the output amplitude of a first light-receiving means 54 which receives light having passed through the slit then, the location of the minute light source in XY plane vertical to its optical axis is specified. A grid slit member having a large number of slits in its transverse direction side by side is arranged being inclined obliquely, so that the distance from each slit up to the objective lens gradually changes interposing a picture dot in between. The slit etc. are moved so that the optical flux condensed with the objective lens crosses these slits, and by analyzing the variation property of the output amplitude of the light-receiving means obtained that time, the position in Z direction of the minute light source is specified. <P>COPYRIGHT: (C)2004,JPO

Description

[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to a minute light source position measuring device for measuring a position of a minute light source, and more particularly to a minute light source position measuring device for measuring an accurate mounting position of a semiconductor laser mounted on an inspection table.
[0002]
[Prior art]
One of the inspection items of a semiconductor laser used for a transmission device of optical communication by wavelength multiplexing is a side mode suppression ratio (SMSR: Side-Mode Suppression Ratio). In the measurement of the SMSR, a spectrum analyzer is used. At this time, it is necessary to make the output light of the semiconductor laser incident on one end of the optical fiber connected to the spectrum analyzer at a high level. That is, in the SMSR measurement, since the output difference between the peak wavelength and the side mode wavelength is about 35 dB, the position of the semiconductor laser and the optical fiber must be adjusted so that the side mode component is not buried in the noise. It is necessary to accurately perform the alignment so that the output light of the semiconductor laser is accurately incident on the optical fiber.
[0003]
Conventionally, for example, the relative position between the semiconductor laser and the end face of the optical fiber is moved little by little in each of the XYZ directions while observing a spectrum analyzer to find the position where the input is maximum, thereby performing the alignment.
[0004]
[Patent Document 1]
JP-A-2002-139311
[Patent Document 2]
JP-A-7-190773
[0005]
[Problems to be solved by the invention]
The alignment method as described above has a problem that it takes a long time to prepare for the measurement of the SMSR, and the inspection efficiency cannot be sufficiently increased. On the other hand, since the semiconductor laser is already fixed on the inspection table, if its position can be accurately measured, the positioning of the semiconductor laser should be automated by moving the optical fiber in accordance with the position of the fixed semiconductor laser. Becomes possible.
[0006]
The present invention has been made by paying attention to such a point, and is intended to obtain accurate position data of a minute light source such as a semiconductor laser mounted on an inspection table, and to quickly obtain position data in each of XYZ directions. It is an object of the present invention to provide a minute light source position measuring device that can be acquired at a time.
[0007]
[Means for Solving the Problems]
The gist of the present invention to achieve this object lies in the inventions in the following items.
[1] In a minute light source position measuring device for measuring the position of the minute light source (2),
A lens unit (52) for condensing light from the minute light source (2);
Light receiving means (54) for receiving the light beam condensed by the lens portion (52) and outputting a signal corresponding to the intensity thereof;
A slit member (60) having a slit (61) whose width gradually increases, wherein two directions orthogonal to a plane perpendicular to an optical axis of the lens portion (52) are defined as an X direction and a Y direction. (61) disposed between the lens portion (52) and the light receiving means (54) with the width direction of the direction coincident with the X direction;
Either the slit member (60) or the lens unit (52) or the lens unit (52) such that the light beam condensed via the lens unit (52) moves across the slit (61) in the width direction. Moving means (23) for moving the moving optical system (50) composed of both in the X direction;
Position analyzing means (81) for analyzing a position of the minute light source (2) based on a relationship between a position of the moving optical system (50) and an output value of the light receiving means (54);
The position analyzing means (81) determines that the center of the light beam is a slit (61) based on the change characteristic of the output value of the light receiving means (54) when the moving means (23) moves the moving optical system (50). ), The position of the moving optical system (50) in the X direction and the position of the light beam when the center of the light beam exits the slit (61) are determined. The position of the minute light source (2) in the Y direction is specified from the relationship between the distance of the light source and the extent of the width of the slit (61).
A minute light source position measuring device characterized by the above-mentioned.
[0008]
[2] In a minute light source position measuring device for measuring the position of the minute light source (2),
A lens unit (52) for condensing light from the minute light source (2);
Light receiving means (54) for receiving the light beam condensed by the lens portion (52) and outputting a signal corresponding to the intensity thereof;
A slit member (60) having a slit (61) whose width gradually widens symmetrically, wherein two directions orthogonal to a plane perpendicular to the optical axis of the lens portion (52) are defined as an X direction and a Y direction. A slit disposed between the lens unit (52) and the light receiving unit (54) with the width direction of the slit (61) coinciding with the X direction;
Either the slit member (60) or the lens unit (52) or the lens unit (52) such that the light beam condensed via the lens unit (52) moves across the slit (61) in the width direction. Moving means (23) for moving the moving optical system (50) composed of both in the X direction;
Position analyzing means (81) for analyzing a position of the minute light source (2) based on a relationship between a position of the moving optical system (50) and an output value of the light receiving means (54);
The position analyzing means (81) determines that the center of the light beam is a slit (61) based on the change characteristic of the output value of the light receiving means (54) when the moving means (23) moves the moving optical system (50). ), The position of the moving optical system (50) in the X direction and the position of the light beam when the center of the light beam exits the slit (61) are determined. The position of the minute light source (2) in the Y direction is specified from the relationship between the distance of the light source and the extent of the width of the slit (61), and the moving optical system when the center of the light beam enters the slit (61). The X-direction position of the minute light source (2) based on the center position between the X-direction position of (50) and the X-direction position of the moving optical system (50) when the center of the light beam exits the slit (61). Identify
A minute light source position measuring device characterized by the above-mentioned.
[0009]
[3] In the minute light source position measuring device for measuring the position of the minute light source (2),
A lens unit (52) for condensing light from the minute light source (2);
Light receiving means (54) for receiving the light beam condensed by the lens portion (52) and outputting a signal corresponding to the intensity thereof;
A slit member (60) having a slit (61) whose width gradually increases, wherein two directions orthogonal to a plane perpendicular to an optical axis of the lens portion (52) are defined as an X direction and a Y direction. (61) disposed between the lens portion (52) and the light receiving means (54) with the width direction of the direction coincident with the X direction;
Either the slit member (60) or the lens unit (52) or the lens unit (52) such that the light beam condensed via the lens unit (52) moves across the slit (61) in the width direction. Moving means (23) for moving the moving optical system (50) composed of both in the X direction;
Position analyzing means (81) for analyzing a position of the minute light source (2) based on a relationship between a position of the moving optical system (50) and an output value of the light receiving means (54);
The position analyzing means (81) determines that the center of the light beam is a slit (61) based on the change characteristic of the output value of the light receiving means (54) when the moving means (23) moves the moving optical system (50). ), The position of the moving optical system (50) in the X direction and the position of the light beam when the center of the light beam exits the slit (61) are determined. The position of the minute light source (2) in the Y direction is specified from the relationship between the distance of the light source and the extent of the width of the slit (61), and the moving optical system when the center of the light beam enters the slit (61). Between the X-direction position of (50) and the X-direction position of the moving optical system (50) when the center of the light beam exits the slit (61), the slit (61) spreads to the left and right. Divided according to the ratio of the spread Specifying the X-direction position of the micro light source (2) based on the location
A minute light source position measuring device characterized by the above-mentioned.
[0010]
[4] In a minute light source position measuring device for measuring the position of the minute light source (2),
A lens unit (52) for condensing light from the minute light source (2);
Light receiving means (54) for receiving the light beam condensed by the lens portion (52) and outputting a signal corresponding to the intensity thereof;
A slit member (60) having a slit (61) whose width gradually increases, wherein two directions orthogonal to a plane perpendicular to an optical axis of the lens portion (52) are defined as an X direction and a Y direction. (61) disposed between the lens portion (52) and the light receiving means (54) with the width direction of the direction coincident with the X direction;
Either the slit member (60) or the lens unit (52) or the lens unit (52) such that the light beam condensed via the lens unit (52) moves across the slit (61) in the width direction. Moving means (23) for moving the moving optical system (50) composed of both in the X direction;
Position analyzing means (81) for analyzing a position of the minute light source (2) based on a relationship between a position of the moving optical system (50) and an output value of the light receiving means (54);
The position analyzing means (81) determines that the center of the light beam is a slit (61) based on the change characteristic of the output value of the light receiving means (54) when the moving means (23) moves the moving optical system (50). ), The position of the moving optical system (50) in the X direction and the position of the light beam when the center of the light beam exits the slit (61) are determined. The position of the minute light source (2) in the Y direction is specified from the relationship between the distance of the light source and the extent of the width of the slit (61), and the center of the light beam enters the slit (61) or the slit (61). The position of the moving optical system (50) in the X direction at the time of exit from the position is determined by the X direction of the slit edge at the Y direction position obtained from the Y direction position of the light beam center at that time and the extent of the slit (61). By correcting countercurrently offset specifies the X-direction position of the micro light source (2)
A minute light source position measuring device characterized by the above-mentioned.
[0011]
[5] The slit member (60) is arranged so that the slit (61) is located at or near an image point where an image of the minute light source (2) is generated by the lens unit (52).
The minute light source position measuring device according to [1], [2], [3] or [4], characterized in that:
[0012]
[6] An attachment angle verifying means (82) for verifying a match between the width direction of the slit (61) and the X direction is further provided.
The mounting angle verification unit (82) is configured to determine a change characteristic of an output value of the light receiving unit (54) when the moving unit (23) moves the moving optical system (50) in the X direction, by using the slit member. (60) is measured at two positions shifted in the Y direction, and the relationship between the difference in the change characteristics and the moving distance of the slit member (60) in the Y direction and the rate at which the width of the slit (61) is increased. The difference between the width direction of the slit (61) and the X direction.
The minute light source position measuring device according to [1], [2], [3] or [4], characterized in that:
[0013]
[7] The position analysis means (81) determines the rise and fall of the output value of the light receiving means (54) when the moving means (23) moves the moving optical system (50) in the X direction. The moving optical system (50) is shifted in the Z direction, which is the optical axis direction, to determine the steepness of one or both of them, and the slit (61) generates an image of the minute light source (2). At least two points are performed in each of a state in front of and a state in the back of the image point, and a Z-direction position of the moving optical system (50) at which the steepness is maximized is calculated from the measurement results. Then, the position in the Z direction of the minute light source (2) is specified based on this.
The minute light source position measuring device according to [1], [2], [3] or [4], characterized in that:
[0014]
[8] In a minute light source position measuring device for measuring the position of the minute light source (2),
A lens unit (52) for condensing light from the minute light source (2);
Light receiving means (54) for receiving the light beam condensed by the lens portion (52) and outputting a signal corresponding to the intensity thereof;
A slit member (60) having a slit (61), wherein two directions orthogonal to a plane perpendicular to the optical axis of the lens portion (52) are defined as an X direction and a Y direction. One arranged in the vicinity of an image point at which an image of the minute light source (2) is generated, with the width direction oriented in a direction coinciding with the X direction;
Either the slit member (60) or the lens unit (52) or the lens unit (52) such that the light beam condensed via the lens unit (52) moves across the slit (61) in the width direction. Moving means (23) for moving the moving optical system (50) composed of both in the X direction;
Position analysis means (A) for analyzing the position of the minute light source (2) in the Z direction which is the optical axis direction based on the relationship between the position of the moving optical system (50) and the output value of the light receiving means (54). 81),
The position analysis means (81) is configured to output one of a rising edge and a falling edge of an output value of the light receiving means (54) when the moving means (23) moves the moving optical system (50) in the X direction. Alternatively, to determine the steepness of both, the moving optical system (50) is shifted in the Z direction which is the optical axis direction, and the slit (61) is a point where an image of the minute light source (2) is generated. At least two positions are performed in each of a state in front of the image point and a state in the back side, and a Z-direction position of the moving optical system (50) at which the steepness is maximized is calculated from the measurement results. The position of the minute light source (2) in the Z direction based on the
A minute light source position measuring device characterized by the above-mentioned.
[0015]
[9] In a minute light source position measuring device for measuring the position of the minute light source (2),
A lens unit (52) for condensing light from the minute light source (2);
Light receiving means (54) for receiving the light beam condensed by the lens portion (52) and outputting a signal corresponding to the intensity thereof;
A grating slit member (70) in which a number of slits (71) are juxtaposed in the width direction thereof, wherein the optical axis of the lens portion (52) is the Z direction and two directions orthogonal to each other in a plane perpendicular to the optical axis. When the X direction and the Y direction are perpendicular to the optical axis of the lens portion (52) and the direction in which the slits (61) are arranged coincides with the X direction, the direction in which the slits (71) are arranged An optical axis disposed near an image point where an image of the minute light source (2) is generated in a state where the optical axis is obliquely inclined so as to deviate from 90 degrees;
The grating slit member (70) and the lens so that a light beam condensed via the lens portion (52) moves across the multiple slits (71) in the direction in which they are arranged before and after the image point. Moving means (24) for moving a moving optical system (50) comprising one or both of the sections (52) in the X direction;
Position analyzing means (81) for analyzing the position of the minute light source (2) based on the relationship between the position of the moving optical system (50) and the output value of the light receiving means (54);
The position analyzing means (81) differentiates a change characteristic of an output value of the light receiving means (54) when the moving means (23) moves the moving optical system (50) to obtain an absolute value, At this time, the position in the X direction of the moving optical system (50) where the maximum value appears will be determined, and based on this, the position in the Z direction of the minute light source (2) will be specified.
A minute light source position measuring device characterized by the above-mentioned.
[0016]
[10] In a minute light source position measuring device for measuring the position of the minute light source (2),
A lens unit (52) for condensing light from the minute light source (2);
Light receiving means (54) for receiving the light beam condensed by the lens portion (52) and outputting a signal corresponding to the intensity thereof;
A grating slit member (70) in which a number of slits (71) are juxtaposed in the width direction thereof, wherein the optical axis of the lens portion (52) is the Z direction and two directions orthogonal to each other in a plane perpendicular to the optical axis. When the X direction and the Y direction are perpendicular to the optical axis of the lens portion (52) and the direction in which the slits (61) are arranged coincides with the X direction, the direction in which the slits (71) are arranged An optical axis disposed near an image point where an image of the minute light source (2) is generated in a state where the optical axis is obliquely inclined so as to deviate from 90 degrees;
The grating slit member (70) and the lens so that a light beam condensed via the lens portion (52) moves across the multiple slits (71) in the direction in which they are arranged before and after the image point. Moving means (24) for moving a moving optical system (50) comprising one or both of the sections (52) in the X direction;
Position analyzing means (81) for analyzing the position of the minute light source (2) based on the relationship between the position of the moving optical system (50) and the output value of the light receiving means (54);
The position analyzing means (81) detects a maximum from a number of peaks appearing in a change characteristic of an output value of the light receiving means (54) when the moving means (23) moves the moving optical system (50). The position in the X direction of the moving optical system (50) at which the peak value appears will be determined, and the position in the Z direction of the minute light source (2) will be specified based on this.
A minute light source position measuring device characterized by the above-mentioned.
[0017]
[11] The minute light source position measuring device according to [1], [2], [3] or [4] and the minute light source position measuring device according to [9] or [10] are connected to at least a lens unit (52). And a beam splitter (53) for splitting the light beam condensed by the lens unit (52) into a first light beam and a second light beam,
The first light flux output from the beam splitter (53) is used in the minute light source position measuring device according to [1], [2], [3] or [4],
The second light flux output from the beam splitter (53) is configured to be used in the minute light source position measuring device according to [9] or [10].
A minute light source position measuring device characterized by the above-mentioned.
[0018]
[12] Instead of moving the moving optical system (50) in the X direction, the lens unit (52) is rotated so that the light beam moves across the slit (61) in the width direction thereof, [1], [2], [3], [4], wherein the angle and the rotation angle of the lens unit (52) are used instead of the position and the movement distance of the moving optical system (50) in the X direction. ], [5], [6], [7], [8], [9], [10] or [11].
[0019]
The present invention operates as follows.
Light from a small light source (2) such as a semiconductor laser fixed to an inspection table is collected through a lens unit (52). The light receiving unit (54) receives the light beam condensed by the lens unit (52). A slit member (60) having a slit (61) whose width gradually increases is disposed between the lens part (52) and the light receiving means (54). The slit member (60) has a direction in which the width direction of the slit (61) coincides with the X direction when two directions orthogonal to each other in a plane perpendicular to the optical axis of the lens portion (52) are defined as an X direction and a Y direction. And is disposed between the lens part (52) and the light receiving means (54). Preferably, the slit (61) is arranged at or near an image point formed by the lens section (52). The image point is where the image (real image) of the minute light source (2) is generated by the lens unit (52). In other words, there is a portion (beam waist) where the diameter of the light beam condensed by the lens portion (52) is the smallest.
[0020]
The shape of the slit (61) may be, for example, an isosceles triangle having the bottom side in the width direction of the slit, or a right-angled triangle having one side in the X direction and the other side in the Y direction. The left and right edges of the slit need not necessarily spread evenly in the left and right directions in the Y direction. Further, the edge of the slit does not necessarily have to be a straight line, but may be a curved line as long as the width gradually increases.
[0021]
The moving means (23) moves a moving optical system (50) including one or both of the slit member (60) and the lens portion (52) in the X direction. Since the slit (61) is set so that its width direction coincides with the X direction, this movement causes the light beam condensed via the lens portion (52) to cross the slit (61) in the width direction. Move. The moving optical system (50) may include only the slit member (60) or may include only the lens unit (52). Further, both the slit member (60) and the lens portion (52) may be integrally moved.
[0022]
The position analyzing means (81) determines that the center of the light beam enters the slit (61) based on the change characteristic of the output value of the light receiving means (54) when the moving means (23) moves the moving optical system (50). The position of the moving optical system (50) at the time and the position of the moving optical system (50) when the center of the light beam exits the slit (61) are obtained, and the distance therebetween and the width of the slit (61) are increased. The position of the minute light source (2) in the Y direction is specified from the relationship with the condition. That is, by grasping the moving distance from the time when the center of the light beam enters the slit (61) to the time when it exits, it is recognized which width of the slit (61) the center of the light beam has traversed. Since the slit (61) is formed so that the width gradually widens, it is possible to determine which position in the Y direction is orthogonal to the width direction of the slit (61). The position of the minute light source (2) in the Y direction can be specified based on this.
[0023]
Here, the width of the slit (61) in the portion where the light beam moves across is made larger than the diameter of the light beam. That is, it is necessary to ensure that the entire light beam can enter the slit when crossing. In this way, the light beam does not enter the slit (61) at all and the position where the output characteristic of the light receiving means (54) reaches a peak (the position where the entire light beam enters the slit (61)). The position can be specified as the position where the center of the light beam enters the slit (61). For example, when the output of the light receiving means (54) rises, the peak value when the light beam passes through the slit (61) becomes N% of the peak (for example, 10%, which is sufficiently lower than 50%). And a position at which M% (for example, 90%, which is sufficiently higher than 50%) is determined, and the center position of these positions is determined as the position when the center of the light beam enters the slit (61).
[0024]
In order for the width of the slit (61) to be larger than the diameter of the light beam passing through the slit (61), a portion (beam waist) where the diameter of the light beam becomes the smallest, in other words, the minute light source (2) is formed by the lens portion (52). It is desirable to dispose the slit member (60) at or near the image point where the image is generated. The smaller the diameter of the light beam crossing the slit (61), the smaller the width of the slit (61). As a result, the moving range of the moving optical system (50) is reduced, and the inspection can be performed more quickly. Further, the output value of the light receiving means (54) when the light beam enters and exits the slit (61) changes sharply as the diameter of the light beam decreases, so that the position where the center of the light beam enters and exits the slit (61) can be accurately determined. It can be grasped and measurement accuracy can be improved.
[0025]
Further, the width of the slit (61) is symmetrically widened, and the position analyzing means (81) determines the position of the moving optical system (50) when the center of the light beam enters the slit (61) and the light beam. Of the moving optical system (50) when the center of the light exits the slit (61) is determined, and this is specified as the position of the minute light source (2) in the X direction. As described above, since the slit (61) is symmetrically spread, the minute light source (2) can be obtained regardless of the position in the Y direction where the light beam crosses the slit (61) by determining the center position of the entrance and exit. Can be specified in the X direction.
[0026]
Even when the width of the slit (61) is not symmetrically widened, if it is known how one edge and the other edge of the slit (61) are widened, the center of the luminous flux is set to the slit. The extent to which the slit spreads to the left between the position of the moving optical system (50) when entering the (61) and the position of the moving optical system (50) when the center of the light beam exits the slit (61). The position of the minute light source (2) in the X direction can be obtained based on the points internally divided according to the ratio of the degree of spread to the right. For example, when the right edge extends at an angle of θ1 with respect to the Y direction and the left edge extends at an angle of θ2 with respect to the Y direction, the center of the light beam crosses the right edge of the slit (61). The position of the moving optical system (50) at the time and the position of the moving optical system (50) at the time when the center of the light beam crosses the left edge is obtained by dividing the position by the ratio of tan θ1: tan θ2, thereby obtaining a minute value. The position of the light source (2) in the X direction can be specified.
[0027]
Furthermore, since the position of the center of the light beam in the Y direction at the position where the light beam crosses the slit (61) can be specified, the position of the slit edge at the Y direction position with respect to the reference point of the Y direction position is determined based on the Y direction position and the extent of the slit (61). The amount of offset in the X direction is obtained, and the position of the moving optical system (50) when the center of the light beam enters the slit (61) or exits from the slit (61) is corrected by the amount of offset in the X direction, so that the position in the X direction is corrected. The position of the minute light source (2) may be specified. For example, using a triangular slit (61), the Y direction position of the center of the light beam when crossing the slit (61) is represented by a relative position to the intersection of the left and right slit edges, and Y1 is the center of the light beam from the right edge. If the position of the moving optical system (50) in the X direction when entering the slit (61) is X1, and the inclination of the right edge with respect to the Y direction is θ1, the offset amount in the X direction is Y1 × tan θ1, and the moving optical system (50) If X1 is corrected by subtracting Y1 × tan θ1 from X1, which is the X-direction position of (1), the X-direction position of the minute light source (2) can be specified based on this.
[0028]
Whether or not the slit member (60) is arranged so that the width direction of the slit (61) coincides with the X direction is verified as follows. For example, a slit (61) whose width is widened at a constant rate is used. In this example, an isosceles triangular slit (61) is used. The mounting angle verifying means (82) compares the change characteristics of the output value of the light receiving means (54) when the moving optical system (50) is moved in the X direction with two slit members (60) shifted in the Y direction. Measure at position. Then, based on the difference between these change characteristics and the relationship between the moving distance of the slit member (60) in the Y direction and the rate at which the width of the slit (61) increases, the width direction of the slit (61) and the X direction are different. Find match, mismatch or error.
[0029]
As a difference between the above-mentioned change characteristics, for example, a slit width at a position where a light beam crosses is obtained from a change characteristic of an output value, and a difference between slit widths at two positions where the slit member (60) is shifted in the Y direction is obtained. That is, based on the change characteristic of the output value of the light receiving means (54) when the moving means (23) moves the moving optical system (50) in the X direction, the moving optics when the center of the light beam enters the slit (61). From the position of the system (50) and the position of the moving optical system (50) when the center of the light beam exits the slit (61), the time from when the center of the light beam enters the slit (61) until it exits the slit (61). The distance is determined at two positions where the slit member (60) is shifted in the Y direction, the difference between these distances, the moving distance of the slit member (60) in the Y direction, and the width of the slit (61). An error between the width direction of the slit (61) and the X direction is determined from the relationship with the rate at which the width of the slit expands. Further, the difference in the position of the moving optical system (50) when the center of the light beam enters the slit (61) is determined as a difference, or the position of the moving optical system (50) when exiting the slit (61) is determined. The difference may be determined as a difference.
[0030]
From the relationship between the distance determined as the difference between these change characteristics, the moving distance of the slit member (60) in the Y direction, and the rate at which the width of the slit (61) increases, the width direction of the slit (61) and the X direction are different. For example, when the slit (61) spreads at an angle θ, a trigonometric function is used based on the distance obtained as the difference in the change characteristics and the moving distance of the slit (61) in the Y direction. There is a method in which the angle of the slit edge with respect to the Y direction is obtained by using the method, and the angle of attachment of the slit (61) is verified based on whether or not the angle matches the original angle θ or the magnitude of the angle θ.
[0031]
The position of the minute light source (2) in the optical axis direction (Z direction) of the lens section (52) is obtained as follows. The position analyzing means (81) is configured to output one of rising or falling in the change characteristic of the output value of the light receiving means (54) when the moving means (23) moves the moving optical system (50) in the X direction. The determination of the steepness of both is performed at several places by shifting the moving optical system (50) in the Z direction. More specifically, the slit (61) performs the above-described measurement at least at two positions in each of a state in front of and a state in the back of an image point where an image of the minute light source (2) is generated. The position of the moving optical system (50) in the Z direction at which the steepness obtained by the measurement is maximized is calculated, and the position of the minute light source (2) in the Z direction is specified based on the calculated position.
[0032]
As the steepness, the moving amount of the moving optical system (50) during the rising period, the moving amount of the moving optical system (50) during the falling period, the sum of these moving amounts, or the center of the light beam is in the slit (61). The difference between the position of the moving optical system (50) when entering and the position of the moving optical system (50) when the center of the light beam exits the slit (61) is used. The smaller these distances, the greater the steepness.
[0033]
For example, a position at which the output reaches 10% of the peak value of the output of the light receiving means (54) is defined as a rising start position, and a position at which the output reaches 90% is defined as a rising end position. The movement amount of (50) can be obtained. The same applies to the falling side. How to define the rising period and the falling period is not limited to the above-described one using 10% and 90%, but may be, for example, 20 to 80%.
[0034]
At the image point, the focus becomes sharper, so that the diameter of the light beam becomes smaller. Therefore, whether the focus is good or bad can be recognized based on whether or not the output of the light receiving means (54) changes sharply when the light beam enters and exits the slit (61). If at least two points are measured before and after the in-focus image point, respectively, the Z-direction of the image point is defined as the intersection of the graph in which the rising characteristic is regressively approximated by the least square method or the like and the graph in which the falling characteristic is also regressively approximated. You can find the position. Then, the actual position of the minute light source (2) in the Z direction can be specified from this position and the focal length and magnification of the lens unit (52).
[0035]
Further, the position of the minute light source (2) in the Z direction may be obtained as follows. Here, a lattice slit member (70) provided with a number of slits (71) in the width direction of the slit (61) is used. When the optical axis of the lens portion (52) is set to the Z direction and two directions orthogonal to each other in a plane perpendicular to the optical axis are set to the X direction and the Y direction, the lattice slit member (70) For example, 45 degrees so that the angle formed by the direction in which the slits (61) are arranged and the optical axis deviates from 90 degrees with respect to the state perpendicular to the optical axis and the direction in which the slits (61) are arranged in the X direction. When placed obliquely, it is arranged near an image point where an image of the minute light source (2) is generated. That is, a number of slits (71) are arranged so that the distance from each of the adjacent slits (61) to the lens portion (52) gradually changes over the image point.
[0036]
The moving means (23) includes a grating slit member (70) such that the light beam condensed via the lens portion (52) moves across a number of slits (71) in the direction in which they are arranged before and after the image point. ) And the lens unit (52) or the moving optical system (50) composed of both of them is moved in the X direction. Thereby, for example, the light beam moves from a state of passing through the slit (61) close to the lens section (52) to a state of passing through the slit (61) far from the lens section (52).
[0037]
When the moving optical system (50) is moved in this way, the output value of the light receiving means (54) has a changing characteristic having a wave according to the number of slits (61). Here, when the light beam passes through the slit (61) near the image point, the change characteristic (wave) when the light beam enters and exits the slit (61) changes sharply because the diameter of the light beam is small. . On the other hand, as the position of the slit (61) moves away from the image point, the focus becomes out of focus and the diameter of the light beam increases, so that the change characteristic when entering and exiting the slit (61) becomes gentle.
[0038]
Then, the position analyzing means (81) differentiates the change characteristic of the output value of the light receiving means (54) and takes its absolute value, and the position of the moving optical system (50) where the maximum value of the absolute value appears. Is determined by regression approximation or the like, and based on this, the position of the minute light source (2) in the Z direction is specified.
[0039]
If the focus is out of focus, the diameter of the light beam is larger than the slit width, and if the focus is in focus, the light beam diameter is smaller than the slit width. As the intersection of the graph approximating the part where the wave peak increases by the least square method etc. and the graph approximating the part where the wave peak decreases by the least square method etc. May be used to specify the position of the minute light source (2) in the Z direction.
[0040]
The light beam condensed by the lens unit (52) is split into a first light beam and a second light beam by a beam splitter (53), and the first light beam is passed through a slit (61) having a gradually widening width, so that the minute light source (2) ) Is specified in the X and Y directions, and the second light flux is passed through the lattice slit member (70) to specify the Z direction position of the minute light source (2). The position in the direction can be specified, and the position can be specified in all directions while the minute light source (2) is fixed. In addition, since the same measuring device can measure positions in all directions of XYZ, the measuring operation can be speeded up. Further, the lens unit (52), the lens barrel, the XYZ stage as the moving unit (23), and the like can be shared, and the device configuration is simplified.
[0041]
Further, instead of moving the moving optical system (50) in the X direction, the lens unit (52) is rotated so that the light beam moves across the slit (61) in the width direction, and the moving optical system (50) is rotated. The angle and the rotation angle of the lens unit (52) are used instead of the position and the movement distance in the X direction. When using a telescope optical system as the lens unit to specify the position of a minute light source that is several meters or farther away, instead of moving in the X direction, the angle or rotation angle of the lens unit (barrel) is changed. Good to use. In other words, when the moving optical system is moved in the X direction, which is the width direction of the slit, in order to specify the position of the minute light source in a distant and somewhat wide measurement range, only the X direction width of the measurement range is required. The moving optics must be moved. On the other hand, if the lens unit is rotated, a wide measurement range can be covered even at a long distance.
[0042]
If the direction (angle θ) where the minute light source exists and the distance (r) to the minute light source are known, the X-direction position of the minute light source can be specified. Further, since the Y-direction position at which the light beam has crossed the slit is known based on the rotation angle required to cross the slit, the Y-direction position of the minute light source can be specified based on this. That is, the inclination angle (θy) of the light beam with respect to the optical axis can be determined from the difference between the Y direction position where the extension of the optical axis of the telescope optical system intersects the slit and the Y direction position where the light beam from the minute light source crosses the slit. From this, and the distance (r) to the minute light source, the actual position of the minute light source in the Y direction can be obtained. Note that the minute light source may be a portion where light is reflected. For example, a configuration may be employed in which a reflection point on a certain object when the object is irradiated with a thin laser beam is treated as a minute light source, and the position of the reflection point is specified.
[0043]
BEST MODE FOR CARRYING OUT THE INVENTION
An embodiment of the present invention will be described below with reference to the drawings.
Each drawing shows an embodiment of the present invention.
FIG. 2 is a side view of the minute light source position measuring device 10 according to the present embodiment, FIG. 3 is a front view of the minute light source position measuring device 10, and FIG. It is. As shown in each figure, the minute light source position measuring device 10 includes a measuring table 20 having a stage movable in each of XYZ directions, an optical unit 50 attached to the measuring table 20, and a mechanical control for measurement. And a control unit 80 that performs signal processing and the like.
[0044]
The measurement table 20 includes a base plate 21 fixed to the floor, a column 22 extending vertically from the base plate 21 with a T-shaped cross section, an X stage 23 mounted on the column 22, and an X stage 23. It has a Y stage 24 mounted and mounted, a Z stage 25 mounted and mounted on the Y stage 24, and a holder arm 26 extending horizontally from the Z stage 25.
[0045]
The X stage 23, the Y stage 24, and the Z stage 25 are driven and moved by stepping motors 27a to 27c, respectively. The horizontal direction in the side view of FIG. 2 is the Y direction, and the vertical direction is the Z direction. The direction perpendicular to the Y direction in the plane perpendicular to the Z direction is the X direction (see FIG. 3).
[0046]
The optical unit 50 includes a lens barrel 51 mounted vertically on the holder arm 26, an objective lens 52 mounted on the lower end of the lens barrel 51, a beam splitter 53 mounted near the upper end of the lens barrel 51, and a beam splitter. A triangular slit member 60 attached near one output side (output side of the first light beam) 53 and a grating slit member 70 attached near the other output side (output side of the second light beam) of the beam splitter 53. And a first light receiving means 54 arranged behind the triangular slit member 60 and a second light receiving means 55 arranged behind the lattice slit member 70. The first light receiving means 54 and the second light receiving means 55 are composed of, for example, photodiodes. The optical section 50 is shielded so that light does not enter the inside from a portion other than the objective lens 52. In the present embodiment, the entire optical unit 50 forms a moving optical system. A predetermined point within the movable range of the moving optical system is set as the origin, and the position of the moving optical system is represented by a relative position from the origin.
[0047]
A semiconductor laser 2 as a minute light source to be inspected is fixed to an inspection table 3 having a radius of about 2 to 3 m which rotates about a distant axis (not shown). The semiconductor laser 2 emits a laser beam directly upward while being fixed to the inspection table 3. When the position of the light emitting point of the semiconductor laser 2 fixed to the inspection table 3 is measured by the minute light source position measuring device 10, the semiconductor laser 2 arrives directly below the objective lens 52 by rotating the inspection table 3. , It is stationary.
[0048]
After the accurate position of the light emitting point is measured by the minute light source position measuring device 10, the inspection table 3 rotates again and moves to the measurement position of the SMSR. Above the measurement point of the SMSR, an optical fiber is attached so that the end face thereof can be moved in the XYZ directions by a stepping motor, and the optical fiber is based on the position data acquired by the minute light source position measuring device 10. Is adjusted so that the laser light from the semiconductor laser 2 is accurately incident on the optical fiber.
[0049]
The control unit 80 is mainly configured by a computer device capable of executing a predetermined program. The control unit 80 performs various functions as the minute light source position measuring device 10, such as a function as the position analysis unit 81 and the attachment angle verification unit 82, and a movement control of each of the stages 23 to 25. The control unit 80 is connected to a control circuit of each of the stepping motors 27a to 27c, the first light receiving unit 54, and the second light receiving unit 55 through signal lines (not shown).
[0050]
FIG. 5 shows an example of the triangular slit member 60. The triangular slit member 60 has a slit 61 whose width gradually increases. The triangular slit member 60 is a plate member having a thickness of about 0.1 mm. Here, a slit 61 having the shape of an isosceles triangle is provided. The direction of the base of the isosceles triangle (the direction indicated by arrow 62 in the figure) is defined as the width direction of the slit.
[0051]
FIG. 6 shows an example of the lattice slit member 70. A large number of slits 71 are provided in the lattice slit member 70 in the width direction thereof. The slit 71 has an elongated rectangular shape. The arrow 72 in the figure is the width direction of the slit 71, and a number of slits 71 are provided side by side in the width direction. The lattice slit member 70 is a plate-like member having a thickness of about 0.1 mm. Here, the width of the slit 71 is set to 0.2 mm, and the distance between the slits (the portion that does not allow light to pass) is set to 0.2 mm. Therefore, the pitch of the slits is 0.4 mm.
[0052]
FIG. 7 is an enlarged view of an upper end portion of the optical unit 50. The triangular slit member 60 is disposed perpendicular to the optical axis of the objective lens 52 on the first light flux output side of the beam splitter 53. The slit 61 is attached so that the width direction of the slit 61 coincides with the X direction shown in FIG. The grating slit member 70 is attached such that the direction in which the slits 71 are arranged is inclined at a predetermined angle from a state perpendicular to the optical axis of the objective lens 52 on the second light beam output side of the beam splitter 53. In this example, it is inclined by 45 degrees.
[0053]
The position of the triangular slit member 60 is set on the first light beam side of the beam splitter 53 at or near the image point of the light emitting point of the semiconductor laser 2. The image point is a point at which an image (real image) of the light emitting point of the semiconductor laser 2 is generated by the objective lens 52. In other words, a portion (beam waist) where the diameter of the light beam condensed by the objective lens becomes the narrowest. It is a place where there is. Similarly, the grating slit member 70 is disposed at or near the image point of the semiconductor laser 2 on the second light beam side of the beam splitter 53.
[0054]
First, measurement of the position of the semiconductor laser 2 in the X and Y directions will be described.
The semiconductor laser 2 is made to emit light in a state where the semiconductor laser 2 is set so as to be almost directly below the optical unit 50. In this state, the control unit 80 moves the X stage 23 so that the optical unit 50 traverses a predetermined X-direction scan range, and simultaneously sets the position coordinates of the optical unit 50 and the output value of the first light receiving unit 54 at that time. The change characteristics indicating the relationship with are recorded. The X direction scanning range is set to a range sufficient for the first light beam from the beam splitter 53 to cross the slit 61 of the triangular slit member 60 in the X direction.
[0055]
FIG. 1 schematically shows a state in which the triangular slit member 60 crosses the light beam condensed by the objective lens 52 in the X direction. FIG. 8 shows a state in which the triangular slit member 60 and the first light receiving unit 54 are viewed from the objective lens 52 side. The light beam moves across the slit regardless of whether only the slit is moved, or both the slit and the objective lens are moved, or even if the slit, the objective lens and the light receiving means are moved integrally. So that they can achieve similar results. However, when the slit and the objective lens or these and the light receiving means are moved integrally, the slit width ÷ the optical magnification is the testable range of the position of the semiconductor laser 2 when the light beam crosses the slit width. .
[0056]
9 to 12 show the change characteristics of the output value of the first light receiving means 54 when the optical unit 50 is moved so that the light beam crosses the slit 61. FIG. FIG. 9 shows a change characteristic 111 of an output value when the light beam crosses a relatively wide portion of the slit 61 in a state where the slit 61 is almost at the image point and is almost in focus. FIG. 10 shows an output value change characteristic 112 when the light beam crosses a relatively narrow portion of the slit 61 in a state where the slit 61 is almost at the image point and almost in focus. FIG. 11 shows an output value change characteristic 113 when the slit 61 is located at a position shifted from the image point to some extent in the Z direction and the light beam crosses a relatively wide portion of the slit 61 in a low focus state. I have. FIG. 12 shows an output value change characteristic 114 when the slit 61 is located at a position shifted from the image point to some extent in the Z direction and the light beam crosses a relatively narrow portion of the slit 61 in a low focus state. I have. As described above, as the slit 61 of the triangular slit member 60 is located closer to the image point, the rising and falling of the change characteristic becomes steeper, and as the distance from the image point becomes smaller, the rising and falling characteristics become gentler. Also, if the light beam passes through a wide portion of the slit width, the width of the wave that appears as a change characteristic increases accordingly.
[0057]
The position analysis means 81 analyzes as follows based on the acquired change characteristics. FIG. 13 shows a change characteristic 131 when the light beam crosses from the left edge to the right edge of the slit. As shown in the figure, the output value is obtained as the maximum value as Hmax. Further, the position coordinate of the optical unit 50 when the output level rises to 10% of Hmax is Xr1, and the position coordinate of the optical unit 50 when the output level rises to 90% of Hmax is Xr9, and the output level is Hmax. The position coordinate of the optical unit 50 at the time when the output level has decreased to 90% is determined as Xf9, and the position coordinate of the optical unit 50 at the time when the output level has decreased to 10% of Hmax is determined as Xf1. Here, the position coordinates are obtained up to one decimal place.
[0058]
Next, the position coordinates Xr1 of the optical unit 50 at the time when the output level has risen to 10% of Hmax, and the intermediate position coordinates between the position coordinates Xr9 of the optical unit 50 at the time when the output level has risen to 90% of Hmax,
Xr5 = (Xr1 + Xr9) ÷ 2 (1)
Is calculated as Xr5.
[0059]
Similarly, an intermediate position coordinate between the position coordinate Xf9 of the optical unit 50 when the output level drops to 90% of Hmax and the position coordinate Xf1 of the optical unit 50 when the output level drops to 10% of Hmax is given by:
Xf5 = (Xf1 + Xf9) ÷ 2 Equation (2)
Is calculated as Xf5.
[0060]
Xr5 is the position coordinate when the center of the light beam enters the slit (the position coordinate when the center of the light beam comes on the left edge of the slit), and Xf5 is the position coordinate when the center of the light beam leaves the slit ( (The position coordinates when the center of the light beam comes on the right edge of the slit).
[0061]
Further, an intermediate position between Xr5, which is the position coordinate at which the light beam center enters the slit, and Xf5, which is the position coordinate at which the light beam center exits the slit,
Px = (Xr5 + Xf5) ÷ 2 Equation (3)
Is calculated as Px.
[0062]
This Px indicates the position coordinate in the X direction of the light emitting point of the semiconductor laser 2 with respect to the origin. In equation (3), by dividing (Xr5 + Xf5) by 2, the position coordinates of the light emitting point in the X direction can be obtained regardless of the position in the Y direction where the light beam has crossed the slit 61. This is because the left and right edges of the slit 61 make the same angle with respect to the Y direction.
[0063]
When the width of the slit is not widened symmetrically with respect to the Y direction, the position coordinate of the center of the light beam entering the slit and the position coordinate of the center of the light beam leaving the slit are defined by the slit. By dividing internally according to the ratio of the degree of spread to the left and the degree of spread to the right, the position coordinates of the light emitting point in the X direction can be obtained. For example, when the right edge extends at an angle of θ1 with respect to the Y direction and the left edge extends at an angle of θ2 with respect to the Y direction, the position coordinates Xr5 when the light beam center crosses the left edge of the slit are defined as The X direction position of the minute light source can be obtained based on a position obtained by internally dividing the position between the light flux center and the position coordinate Xf5 when the light beam center crosses the right edge of the slit at a ratio of tan θ1: tan θ2. That is,
Px = Xr5 + (Xf5-Xr5) × tan θ2 / (tan θ1 + tan θ2) Equation (4)
Can be determined by:
[0064]
The position Py in the Y direction of the light beam center is
Py = (Xf5-Xr5) ÷ 2 + Yc (5)
Is calculated by Here, Yc is the position coordinate of the intersection of the left and right edges of the slit. Equation (5) holds when the left and right edges of the slit form an angle of 45 degrees with respect to the Y direction.
[0065]
The general formula in the case where the left and right edges are symmetrically spread at an angle θ with respect to the Y direction is:
Py = (Xf5−Xr5) ÷ 2 ÷ tan θ + Yc (6)
become. Further, when the right edge extends at an angle of θ1 with respect to the Y direction and the left edge extends at an angle of θ2 with respect to the Y direction,
Py = (Xf5−Xr5) ÷ (tan θ1 + tan θ2) + Yc (7)
Can be determined by:
[0066]
In addition, even when the left and right edges do not spread linearly, the slit has a shape such that the position in the Y direction and the distance between the left and right edges in the Y direction position coordinates correspond one-to-one. In this case, since the position coordinates in the Y direction can be specified from the distance between the left and right edges, the position coordinates in the Y direction of the light emitting point can be specified. For example, when the edge of the slit has a curved shape according to a certain function, the Y-directional position coordinates of the light emitting point are specified based on the distance when the center of the light beam crosses the slit by an operation based on the function. be able to. Furthermore, even when the distance cannot be expressed by a specific function, if the relationship between the distance between the edges of the slit and the position coordinate in the Y direction is measured in advance and stored in a reference table or the like, the light beam center when the light beam crosses the slit can be obtained. By reading the position coordinates in the Y direction corresponding to the distance from this reference table, the position coordinates in the Y direction of the light emitting point can be specified.
[0067]
When the position coordinates in the Y direction are specified, the position coordinates in the X direction may be obtained as follows. An X-direction offset amount of the slit edge at the Y-direction position coordinates is determined from the specified Y-direction position coordinates and the extent and angle of the slit edge spread. The position coordinates of the light emitting point in the X direction are specified by correcting the position coordinates of the optical unit 50 in the X direction when the center of the light beam enters or exits the slit by the offset amount in the X direction. Is done.
[0068]
For example, when the right edge extends at an angle of θ1 with respect to the Y direction and the left edge extends at an angle of θ2 with respect to the Y direction, the position coordinate in the Y direction through which the center of the light beam passes is defined by the intersection of the left and right edges. When represented by a relative position Y1 with respect to
Y1 = (Xf5-Xr5) ÷ (tan θ1 + tan θ2) (8)
The relative offset amount X1 of the left edge with respect to the intersection of the left and right edges is
X1 = Y1 × tan θ2 Expression (9)
It becomes. Therefore, since the light emitting point should be located at a position shifted to the right by X1 from the left edge, the position coordinate Px of the light emitting point in the X direction is expressed by:
Px = Xr5 + X1 Expression (10)
Can be obtained as When the light beam center is based on Xf5 passing through the right edge, the X-direction offset amount is:
X2 = Y1 × tan θ1 Expression (11)
And Px is
Px = Xf5-X2 Expression (12)
Can be obtained as
[0069]
Next, verification of the mounting angle of the triangular slit member 60 will be described.
Here, the width of the slit is widened at a constant rate. The attachment angle verification unit 82 determines the change characteristic of the output value of the first light receiving unit 54 when the center of the light beam is moved across the slit 61 in the X direction by using two positions where the triangular slit member 60 is shifted in the Y direction. Measure with Then, from the difference between these change characteristics and the relationship between the moving distance dY of the slit member 60 in the Y direction and the rate at which the width of the slit 61 increases (the angle of the edge with respect to the Y direction), the width direction of the slit 61 and X A match with a direction, a mismatch, or a magnitude of an error is determined.
[0070]
For example, the position coordinate in the X direction when the light beam center passes through the left edge before moving in the Y direction is Xr5_0, and the position in the X direction when the light beam center passes through the left edge after moving by dY in the Y direction. Assuming that the coordinates are Xr5_1, the angle θr of the left edge with respect to the Y direction is
θr = arctan ((Xr5_0−Xr5_1) / dY) Equation (13)
Is obtained as
[0071]
The position coordinate in the X direction when the center of the light beam passes through the right edge before moving in the Y direction is Xf5_0. The position coordinate in the X direction when the center of the light beam passes through the right edge after moving by dY in the Y direction. Is Xf5_1, the angle θf of the right edge with respect to the Y direction is
θf = arctan ((Xf5_1-Xf5_0) / dY) Expression (14)
Is obtained as
[0072]
Then, θr and θ2 or θf and θ1 are compared, and based on the coincidence and disagreement and the magnitude thereof, if the angle is verified and the triangular slit member 60 is turned in any direction, the angle of the edge with respect to the Y direction is originally Verify that the angle is The angle of the optical unit 50 may be automatically rotated based on the verification result.
[0073]
Next, measurement of position coordinates in the Z direction will be described.
When measuring the position coordinates of the semiconductor laser 2 in the Z direction, the optical unit 50 is moved in the Y direction by the Y stage 24 with the semiconductor laser 2 emitting light. Then, the second light beam from the beam splitter 53 moves so as to cross the grating slit member 70 in the direction in which the slit 71 is provided. Actually, since the laser light is refracted by 90 degrees by the beam splitter 53, the second light flux moves in the Z direction in FIG.
[0074]
FIG. 14 shows a state in which a light beam moves across the slit 71 of the grating slit member 70 and a change characteristic 151 of the output value of the second light receiving means 55 observed at that time. Since the lattice slit member 70 is arranged so that the direction in which the slits 71 are arranged is inclined at 45 degrees as shown in FIGS. 7 and 14, the slit 71 a at one end of the provided slits is connected to the objective lens 52. The closer to the slit, the closer to the slit 71c at the other end, the further away from the objective lens 52. The lattice slit member 70 is arranged so that an image point is included between the slit 71a and the slit 71c.
[0075]
As described above, the closer the slit is to the image point, the sharper the rising and falling characteristics of the output value of the light receiving means when the light beam enters and exits the slit, and the more gradual the deviation from the image point. Therefore, when the light beam moves in the direction indicated by the arrow 140 in FIG. 14 and crosses the slits 71 provided side by side, the wave of each slit observed at that time becomes smaller as the one corresponding to the slit closer to the image point. It changes steeply, and the one corresponding to the slit far from the image point changes gradually.
[0076]
The position analysis means 81 differentiates the obtained change characteristic and further takes its absolute value. As a result, twice as many peaks as the number of slits crossed by the light beam are obtained. The height of the peak indicates the magnitude of the change rate (steepness) of the original wave. The position analysis means 81 finds the position coordinates corresponding to the image point by further mathematically processing the waveform obtained by differentiating and taking the absolute value. That is, the distance from the objective lens 52 to the image point is found. Specifically (see FIG. 14), assuming that the inclination angle of the grating slit member 70 is θz, the moving distance L1 of the light beam in the direction of arrow 140 from the reference point to the image point is divided by tan θz. , The offset amount L2 from the reference point in the Z direction is obtained. Then, the distance from the objective lens 52 to the image point is obtained by adding the distance from the objective lens to the reference point and the preceding offset amount L2. By converting this based on the optical magnification, the distance from the objective lens 52 to the light emitting point of the semiconductor laser 2 is obtained, and as a result, the position coordinates of the light emitting point in the Z direction are specified.
[0077]
Mathematical processing includes approximating an envelope connecting peaks of a waveform whose absolute value has been differentiated, and specifying the peak of the envelope as coordinates at which an image point may exist. As described above, the lattice slit member 70 in which a number of slits 71 are juxtaposed in the width direction is arranged obliquely so that these slits are dispersed before and after the image point, so that the luminous flux moves across these juxtaposed slits. Thus, the position coordinates of the light emitting point in the Z direction can be obtained only by moving the optical unit 50 once in a fixed direction.
[0078]
If the focus is out of focus, the diameter of the light beam is larger than the slit width, and if the focus is in focus, the light beam diameter is smaller than the slit width. As the intersection of the graph approximating the part where the wave peak increases by the least square method etc. and the graph approximating the part where the wave peak decreases by the least square method etc. The position of the minute light source in the Z direction may be specified based on
[0079]
Next, another method of obtaining the position coordinates in the Z direction will be described.
As described above, the closer to the image point, the steeper the change characteristic of the output value of the light receiving means when the light beam enters and exits the slit. Therefore, the steepness of the rise and fall of the waveform when the light beam moves across the triangular slit member 60 in the X direction is measured by moving the triangular slit member 60 to several positions in the Z direction. More specifically, at least two measurements are made before and after each image point. For example, as shown in FIG. 15, the steepness is defined as a rising start position at a position where the output value is 10% with respect to the peak of the change characteristic 151 of the first light receiving unit 54, and a rising end position with a position reaching 90%. Thus, the moving amount Xr of the moving optical system during the rising period is obtained, and this is used as the steepness. In this case, the smaller the amount of movement, the higher the steepness. The falling side is similarly obtained as Xf.
[0080]
Based on the steepness (movement amount) measured at least two places before and after the image point in focus, a graph 161 in which the change when the steepness increases is regressively approximated by a least square method or the like, and the steepness decreases. A graph 162 obtained by regression approximation of the change at the time by the least-squares method or the like is obtained as shown in FIG.
[0081]
More specifically, for example, about nine measurement points are provided so that at least two points can be reliably measured on both sides of the image point. In the case of a general semiconductor laser (CAN type), the error in the Z axis is about ± 20 μm. Therefore, for example, the Z stage 25 is moved at intervals of 15 μm in the range of −60 μm to +60 μm, and measurement is performed at nine locations. Then, one having the largest steepness is selected (the smallest one when the movement amount during the rising period is used), and the measured value is divided into front and rear portions, and each is approximated by a straight line by the least squares method. The intersection is determined, and the position coordinates in the Z direction are specified.
[0082]
As described above, the embodiments of the present invention have been described with reference to the drawings. However, the specific configuration is not limited to these embodiments, and even if there are changes and additions without departing from the gist of the present invention, the present invention will be described. included.
[0083]
For example, in the embodiment, the position coordinates of the light emitting point of the semiconductor laser 2 in the X direction and the Y direction are measured by moving the X stage 23, and the Z direction using the grating slit member 70 is measured by moving the Y stage 24. For example, if the direction in which the triangular slit member 60 is attached is changed by 90 degrees and the width direction of the slit is set in the Y direction, the Y stage 24 can be moved simply by moving the Y stage 24. Measurement in the XY directions using the slit member 60 and measurement in the Z direction using the grid slit member 70 can be performed at one time.
[0084]
Further, in the embodiments, the semiconductor laser is used as the minute light source to be measured. However, the minute light source corresponding to this is not limited to the semiconductor laser. Further, in the embodiment, the microscope optical system is used. However, when measuring the position of a distant minute light source, a telescope optical system may be used. That is, instead of moving the moving optical system in the X direction, the lens unit of the telescope optical system is rotated so that the light beam moves across the slit in the width direction, and the position and movement of the moving optical system in the X direction are changed. The angle and the rotation angle of the lens unit are used instead of the distance. As a result, a wide range in a distant place can be covered as a measurement range.
[0085]
【The invention's effect】
According to the minute light source position measuring apparatus of the present invention, accurate position data of a fixed minute light source such as a semiconductor laser mounted on an inspection table can be easily obtained, so that an inspection preparation such as an SMSR can be promptly performed. be able to.
[0086]
In particular, the light beam condensed by the objective lens from the minute light source moves the slit etc. so that the light beam moves across the slit that gradually widens in the width direction, and the change in the intensity of the light passing through the slit at that time Since the position of the minute light source in the XY plane perpendicular to the optical axis is specified based on the characteristics, the position data can be obtained easily and quickly.
[0087]
Further, by arranging a slit member at or near an image point where the diameter of the light beam becomes the smallest and an image of the minute light source is generated, the width of the slit can be narrowed and the moving amount of the moving optical system can be reduced. As a result, the inspection can be performed more quickly. Also, the output value of the light receiving means when the light beam enters and exits the slit changes sharply as the diameter of the light beam decreases, so that the position where the center of the light beam enters and exits the slit by arranging the slit at or near the image point. Can be accurately grasped, and the measurement accuracy can be improved.
[0088]
The change characteristic of the output value of the light receiving means when the moving optical system is moved in the X direction is measured at two positions where the slit member is shifted in the Y direction, and the difference between these change characteristics and the slit member in the Y direction is measured. By calculating the difference between the width direction of the slit and the X direction from the relationship between the moving distance of the slit and the rate at which the width of the slit expands, the direction of the slit can be accurately and easily verified, and the measurement accuracy is improved. be able to.
[0089]
Further, the steepness of the rise or fall of the output value of the light receiving means when the moving optical system is moved in the X direction is measured at several points while shifting the moving optical system in the Z direction, and based on this measurement, the steepness is measured. Deriving the position of the moving optical system in the Z direction that maximizes the degree and specifying the position of the minute light source in the Z direction uses a slit or an optical system used to specify the XY directions. The position can also be specified, and the configuration of the device can be simplified.
[0090]
In addition, a lattice slit member with a number of slits arranged in the width direction of the slits is arranged obliquely so that the distance from each slit to the objective lens changes gradually across the image point, and is focused by the objective lens. In order to specify the position of the minute light source in the Z direction by moving the luminous flux across these slits and analyzing the change characteristic of the output value of the light receiving means at this time, the movement of the moving optical system is performed once. The position of the minute light source in the Z direction can be specified simply by performing the measurement, and quick position measurement can be performed.
[0091]
The luminous flux condensed by the objective lens is split into a first luminous flux and a second luminous flux by a beam splitter, and the first luminous flux is passed through a slit having a gradually widening to identify the position of the minute light source in the XY directions. When the two light beams are passed through the lattice slit member to specify the position of the small light source in the Z direction, the position can be specified in all directions of XYZ with the same measuring device. , XYZ in all directions. In addition, since the same measuring device can measure positions in all directions of XYZ, the measuring operation can be speeded up. Further, the objective lens, the lens barrel, the XYZ stage as the moving means, and the like can be shared, and the device configuration is simplified.
[Brief description of the drawings]
FIG. 1 is an explanatory diagram schematically showing an optical system of a minute light source position measuring device according to the present invention.
FIG. 2 is a side view showing a minute light source position measuring device according to one embodiment of the present invention.
FIG. 3 is a front view showing a minute light source position measuring device according to one embodiment of the present invention.
FIG. 4 is a top view showing a minute light source position measuring device according to one embodiment of the present invention.
FIG. 5 is a front view showing a triangular slit used in the minute light source position measuring device according to one embodiment of the present invention.
FIG. 6 is a front view showing a grating slit used in the minute light source position measuring device according to one embodiment of the present invention.
FIG. 7 is an explanatory diagram showing, in an enlarged manner, a portion near a slit of an optical unit included in the minute light source position measuring apparatus according to the embodiment of the present invention.
FIG. 8 is an explanatory diagram showing a state where the triangular slit and the first light receiving unit shown in FIG. 1 are viewed from the objective lens side.
FIG. 9 is a diagram illustrating a change characteristic of an output value when a slit is almost at an image point and a light beam crosses a relatively wide portion of the slit in the minute light source position measuring apparatus according to one embodiment of the present invention. FIG.
FIG. 10 is a diagram showing a change characteristic of an output value when a slit is almost at an image point and a light beam crosses a relatively narrow portion of the slit in the minute light source position measuring apparatus according to one embodiment of the present invention. FIG.
FIG. 11 shows a change characteristic of an output value when a slit is located at a position deviating from an image point and a light beam crosses a relatively wide portion of the slit in the minute light source position measuring apparatus according to one embodiment of the present invention. FIG.
FIG. 12 shows a change characteristic of an output value when a slit is located at a position deviating from an image point and a light beam crosses a relatively narrow portion of the slit in the minute light source position measuring apparatus according to one embodiment of the present invention. FIG.
FIG. 13 is a reference position used for obtaining a position where the center of a light beam passes through an edge of the slit from a change characteristic of an output value when the light beam crosses the slit in the minute light source position measuring apparatus according to one embodiment of the present invention; FIG.
FIG. 14 shows an example of a state in which a light beam moves across a grating slit and a change characteristic of an output value of a second light receiving unit observed at that time in the minute light source position measuring apparatus according to one embodiment of the present invention. FIG.
FIG. 15 is an explanatory diagram showing a reference range for obtaining a steepness used when measuring a position in the Z direction using a triangular slit in the minute light source position measuring device according to one embodiment of the present invention.
FIG. 16 is an explanatory diagram showing an example of an approximate graph for determining a position where the steepness is greatest based on the steepness measured by the minute light source position measuring device according to one embodiment of the present invention.
[Explanation of symbols]
2. Semiconductor laser
3. Inspection table
10. Micro light source position measuring device
20… Measuring table
21 ... Base plate
22 ... pillar part
23 ... X stage
24 ... Y stage
25 ... Z stage
26 ... Holder arm
27a-27c ... stepping motor
50 ... Optical part
51 ... barrel
52 Objective lens
53 ... Beam splitter
54.. First light receiving means
55 ... second light receiving means
60 ... triangular slit member
61 ... Triangular slit
70 ... Lattice slit member
71 ... Slit
80 ... Control unit
81: Position analysis means
82 mounting angle verification means
111-114, 131, 151 ... change characteristics
140: Arrow indicating the direction of movement of the light beam
162 ... Regression approximated graph

Claims (12)

  1. In a minute light source position measuring device that measures the position of a minute light source,
    A lens unit that collects light from the minute light source,
    A light receiving unit that receives the light flux condensed by the lens unit and outputs a signal corresponding to the intensity thereof,
    A slit member having a slit whose width gradually increases, wherein two directions orthogonal to a plane perpendicular to the optical axis of the lens unit are defined as an X direction and a Y direction, and the width direction of the slit coincides with the X direction. A direction arranged between the lens unit and the light receiving means,
    The moving optical system including one or both of the slit member and the lens unit is moved in the X direction so that the light beam condensed via the lens unit moves across the slit in the width direction. Means of transportation
    A position analyzing unit that analyzes a position of the minute light source based on a relationship between a position of the moving optical system and an output value of the light receiving unit,
    The position analysis means, the X-direction position of the moving optical system when the center of the light beam enters the slit from the change characteristics of the output value of the light receiving means when the moving means moves the moving optical system A position in the X direction of the moving optical system when the center of the light beam exits the slit is determined, and a position in the Y direction of the minute light source is specified based on a relationship between a distance therebetween and a width of the slit. A minute light source position measuring device characterized by the above-mentioned.
  2. In a minute light source position measuring device that measures the position of a minute light source,
    A lens unit that collects light from the minute light source,
    A light receiving unit that receives the light flux condensed by the lens unit and outputs a signal corresponding to the intensity thereof,
    A slit member having a slit whose width gradually widens symmetrically, wherein two directions perpendicular to a plane perpendicular to the optical axis of the lens unit are defined as an X direction and a Y direction, and the width direction of the slit is defined as the X direction. One disposed between the lens unit and the light receiving means in a direction coinciding with a direction,
    The moving optical system including one or both of the slit member and the lens unit is moved in the X direction so that the light beam condensed via the lens unit moves across the slit in the width direction. Means of transportation
    A position analyzing unit that analyzes a position of the minute light source based on a relationship between a position of the moving optical system and an output value of the light receiving unit,
    The position analysis means, the X-direction position of the moving optical system when the center of the light beam enters the slit from the change characteristics of the output value of the light receiving means when the moving means moves the moving optical system A position in the X direction of the moving optical system when the center of the light beam exits the slit is determined, and a position in the Y direction of the minute light source is specified based on a relationship between a distance therebetween and a width of the slit. The minute position based on the center position between the X direction position of the moving optical system when the center of the light beam enters the slit and the X direction position of the moving optical system when the center of the light beam exits the slit. A minute light source position measuring device for identifying a position of a light source in the X direction.
  3. In a minute light source position measuring device that measures the position of a minute light source,
    A lens unit that collects light from the minute light source,
    A light receiving unit that receives the light flux condensed by the lens unit and outputs a signal corresponding to the intensity thereof,
    A slit member having a slit whose width gradually increases, wherein two directions orthogonal to a plane perpendicular to the optical axis of the lens unit are defined as an X direction and a Y direction, and the width direction of the slit coincides with the X direction. A direction arranged between the lens unit and the light receiving means,
    The moving optical system including one or both of the slit member and the lens unit is moved in the X direction so that the light beam condensed via the lens unit moves across the slit in the width direction. Means of transportation
    A position analyzing unit that analyzes a position of the minute light source based on a relationship between a position of the moving optical system and an output value of the light receiving unit,
    The position analysis means, the X-direction position of the moving optical system when the center of the light beam enters the slit from the change characteristics of the output value of the light receiving means when the moving means moves the moving optical system A position in the X direction of the moving optical system when the center of the light beam exits the slit is determined, and a position in the Y direction of the minute light source is specified based on a relationship between a distance therebetween and a width of the slit. In addition, the distance between the X-direction position of the moving optical system when the center of the light beam enters the slit and the X-direction position of the moving optical system when the center of the light beam exits the slit moves to the left of the slit. A minute light source position measuring apparatus characterized in that a position in the X direction of the minute light source is specified based on a position internally divided according to a ratio of a degree of spread and a degree of spread to the right.
  4. In a minute light source position measuring device that measures the position of a minute light source,
    A lens unit that collects light from the minute light source,
    A light receiving unit that receives the light flux condensed by the lens unit and outputs a signal corresponding to the intensity thereof,
    A slit member having a slit whose width gradually increases, wherein two directions orthogonal to a plane perpendicular to the optical axis of the lens unit are defined as an X direction and a Y direction, and the width direction of the slit coincides with the X direction. A direction arranged between the lens unit and the light receiving means,
    The moving optical system including one or both of the slit member and the lens unit is moved in the X direction so that the light beam condensed via the lens unit moves across the slit in the width direction. Means of transportation
    A position analyzing unit that analyzes a position of the minute light source based on a relationship between a position of the moving optical system and an output value of the light receiving unit,
    The position analysis means, the X-direction position of the moving optical system when the center of the light beam enters the slit from the change characteristics of the output value of the light receiving means when the moving means moves the moving optical system A position in the X direction of the moving optical system when the center of the light beam exits the slit is determined, and a position in the Y direction of the minute light source is specified based on a relationship between a distance therebetween and a width of the slit. In addition, the position of the moving optical system in the X direction when the center of the light beam enters or exits the slit is obtained from the Y position of the light beam center at that time and the degree of spread of the slit. A minute light source position measuring apparatus characterized in that an X direction position of the minute light source is specified by correcting the slit edge at the direction position with an X direction offset amount.
  5. 5. The slit member according to claim 1, wherein the slit member is arranged such that the slit is located at or near an image point where an image of the minute light source is generated by the lens unit. 6. The minute light source position measuring device as described in the above.
  6. Further comprising an attachment angle verification means for verifying the agreement between the width direction of the slit and the X direction,
    The mounting angle verification unit measures a change characteristic of an output value of the light receiving unit when the moving unit moves the moving optical system in the X direction at two positions where the slit member is shifted in the Y direction. Determining a difference between the direction of the slit in the width direction and the X direction from a relationship between the difference in the change characteristics and a moving distance of the slit member in the Y direction and a ratio of the width of the slit expanding. The minute light source position measuring device according to claim 1, 2, 3, or 4.
  7. The position analysis unit may determine that when the moving unit moves the moving optical system in the X direction, the steepness of one or both of rising and falling of the output value of the light receiving unit is determined. The optical system is shifted in the Z direction which is the optical axis direction, and at least two positions are respectively set in a state where the slit is located in front of an image point where an image of the minute light source is generated and a state where the slit is located in the back side. Calculating a Z-direction position of the moving optical system at which the steepness is maximum from the measurement results, and identifying a Z-direction position of the minute light source based on the calculated position. 5. The minute light source position measuring device according to 3 or 4.
  8. In a minute light source position measuring device that measures the position of a minute light source,
    A lens unit that collects light from the minute light source,
    A light receiving unit that receives the light flux condensed by the lens unit and outputs a signal corresponding to the intensity thereof,
    A slit member having a slit, and when two directions orthogonal to each other in a plane perpendicular to the optical axis of the lens unit are defined as an X direction and a Y direction, the width direction of the slit is set to a direction coinciding with the X direction. One disposed near an image point where an image of the minute light source is generated,
    The moving optical system including one or both of the slit member and the lens unit is moved in the X direction so that the light beam condensed via the lens unit moves across the slit in the width direction. Means of transportation
    Based on the relationship between the position of the moving optical system and the output value of the light receiving unit, the position analyzing unit has a position analyzing unit that analyzes the position of the minute light source in the Z direction that is the optical axis direction, When the moving means moves the moving optical system in the X direction, the steepness of one or both of the rise and the fall of the output value of the light receiving means is determined by setting the moving optical system to the optical axis. It is shifted in the Z direction, which is the direction, and the slit is performed at least two places in a state in which the slit is located in front of the image point where the image of the micro light source is generated and a state in which the slit is located in the back side, and from these measurement results, A minute light source position measuring device, wherein a Z direction position of the moving optical system at which the steepness is maximized is calculated, and a Z direction position of the minute light source is specified based on the calculated position.
  9. In a minute light source position measuring device that measures the position of a minute light source,
    A lens unit that collects light from the minute light source,
    A light receiving unit that receives the light flux condensed by the lens unit and outputs a signal corresponding to the intensity thereof,
    When the slit is a lattice slit member provided side by side in the width direction thereof, and the optical axis of the lens portion is the Z direction and two directions orthogonal to each other in a plane perpendicular to the optical axis are the X direction and the Y direction, In a state in which the angle formed by the direction in which the slits are arranged and the optical axis are deviated from 90 degrees with respect to a state in which the direction in which the slits are arranged and the direction in which the slits are arranged coincide with each other in a direction perpendicular to the optical axis of the lens unit. One disposed near an image point where an image of the minute light source is generated,
    The lattice slit member and / or the lens unit are formed such that the light beam condensed via the lens unit moves across the multiple slits in the direction in which they are arranged before and after the image point. Moving means for moving a moving optical system in the X direction;
    Position analysis means for analyzing the position of the minute light source based on the relationship between the position of the moving optical system and the output value of the light receiving means,
    The position analyzing means differentiates a change characteristic of an output value of the light receiving means when the moving means moves the moving optical system and takes an absolute value, at which the maximum value appears. A minute light source position measuring device, wherein a position in the X direction of the system is obtained, and a position in the Z direction of the minute light source is specified based on the X position.
  10. In a minute light source position measuring device that measures the position of a minute light source,
    A lens unit that collects light from the minute light source,
    A light receiving unit that receives the light flux condensed by the lens unit and outputs a signal corresponding to the intensity thereof,
    When the slit is a lattice slit member provided side by side in the width direction thereof, and the optical axis of the lens portion is the Z direction and two directions orthogonal to each other in a plane perpendicular to the optical axis are the X direction and the Y direction, In a state in which the angle formed by the direction in which the slits are arranged and the optical axis are deviated from 90 degrees with respect to a state in which the direction in which the slits are arranged and the direction in which the slits are arranged coincide with each other in a direction perpendicular to the optical axis of the lens unit. One disposed near an image point where an image of the minute light source is generated,
    The lattice slit member and / or the lens unit are formed such that the light beam condensed via the lens unit moves across the multiple slits in the direction in which they are arranged before and after the image point. Moving means for moving a moving optical system in the X direction;
    Position analysis means for analyzing the position of the minute light source based on the relationship between the position of the moving optical system and the output value of the light receiving means,
    The position analyzing means, from a number of peaks appearing in the change characteristic of the output value of the light receiving means when the moving means moves the moving optical system, a maximum peak value of the moving optical system in which a maximum peak value will appear. An X-direction position is determined, and a Z-direction position of the minute light source is specified based on the X-direction position.
  11. A minute light source position measuring device according to claim 1, 2, 3, or 4 and a minute light source position measuring device according to claim 9 or 10 are provided at least in common with a lens unit, and are condensed by the lens unit. A beam splitter that splits the split light beam into a first light beam and a second light beam,
    The first light flux output from the beam splitter is used in the minute light source position measuring device according to claim 1, 2, 3, or 4,
    A minute light source position measuring device, wherein the second light beam output from the beam splitter is used in the minute light source position measuring device according to claim 9 or 10.
  12. Instead of moving the moving optical system in the X direction, the lens unit is rotated so that the light beam moves across the slit in the width direction, and the position and moving distance of the moving optical system in the X direction 12. The minute light source position measuring apparatus according to claim 1, wherein an angle and a rotation angle of the lens unit are used instead of the angle.
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