JP2015083533A5 - - Google Patents

Download PDF

Info

Publication number
JP2015083533A5
JP2015083533A5 JP2014197181A JP2014197181A JP2015083533A5 JP 2015083533 A5 JP2015083533 A5 JP 2015083533A5 JP 2014197181 A JP2014197181 A JP 2014197181A JP 2014197181 A JP2014197181 A JP 2014197181A JP 2015083533 A5 JP2015083533 A5 JP 2015083533A5
Authority
JP
Japan
Prior art keywords
glass substrate
glass
sio
mgo
mol
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2014197181A
Other languages
Japanese (ja)
Other versions
JP2015083533A (en
JP6105539B2 (en
Filing date
Publication date
Application filed filed Critical
Priority to JP2014197181A priority Critical patent/JP6105539B2/en
Priority claimed from JP2014197181A external-priority patent/JP6105539B2/en
Publication of JP2015083533A publication Critical patent/JP2015083533A/en
Publication of JP2015083533A5 publication Critical patent/JP2015083533A5/ja
Application granted granted Critical
Publication of JP6105539B2 publication Critical patent/JP6105539B2/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Claims (12)

モル％表示で、
SiO2 55〜80%、
Al2O3 8〜20%、
B2O3 0〜8%、
MgO 0%超〜15%、
CaO 4〜13%、
SrO 0〜15%、
BaO 0〜10%、
を含有し、
SiO2+2×Al2O3が100%以下であり、
(SiO 2 -Al 2 O 3 /2)が50〜63%であり、
モル比B2O3/(SiO2+Al2O3)が0〜0.12であり、
モル比MgO/RO(但し、ROはMgO、CaO、SrO及びBaOの合量である)が0.15〜0.9の範囲であり、
歪点が690℃以上であり、
ガラス転移温度が740℃以上であり、
失透温度が1235℃以下である、ディスプレイ用ガラス基板。 In mol%
SiO 2 55-80%,
Al 2 O 3 8-20%,
B 2 O 3 0-8%,
MgO over 0% ~ 15%,
CaO 4-13 %,
SrO 0-15%,
BaO 0-10%,
Containing
SiO 2 + 2 × Al 2 O 3 is 100% or less,
(SiO 2 -Al 2 O 3/ 2) is 50 to 63%,
The molar ratio B 2 O 3 / (SiO 2 + Al 2 O 3 ) is 0 to 0.12,
The molar ratio MgO / RO (where RO is the total amount of MgO, CaO, SrO and BaO) is in the range of 0.15-0.9,
The strain point is 690 ° C or higher,
The glass transition temperature is 740 ° C or higher,
Ru der devitrification temperature is 1235 ℃ or less, a glass substrate for display. モル％表示で、
SiO2 55〜80%、
Al2O3 8〜20%、
B2O3 0〜8%、
MgO 0%超〜15%、
CaO 0〜20%、
SrO 0〜4%、
BaO 0〜10%、
を含有し、
SiO2+2×Al2O3が100%以下であり、
(SiO 2 -Al 2 O 3 /2)が50〜63%であり、
モル比B2O3/(SiO2+Al2O3)が0〜0.12であり、
モル比MgO/RO(但し、ROはMgO、CaO、SrO及びBaOの合量である)が0.15〜0.9の範囲であり、
歪点が690℃以上であり、
ガラス転移温度が740℃以上であり、
失透温度が1235℃以下である、ディスプレイ用ガラス基板。 In mol%
SiO 2 55-80%,
Al 2 O 3 8-20%,
B 2 O 3 0-8%,
MgO over 0% ~ 15%,
CaO 0-20%,
SrO 0~ 4%,
BaO 0-10%,
Containing
SiO 2 + 2 × Al 2 O 3 is 100% or less,
(SiO 2 -Al 2 O 3/ 2) is 50 to 63%,
The molar ratio B 2 O 3 / (SiO 2 + Al 2 O 3 ) is 0 to 0.12,
The molar ratio MgO / RO (where RO is the total amount of MgO, CaO, SrO and BaO) is in the range of 0.15-0.9,
The strain point is 690 ° C or higher,
The glass transition temperature is 740 ° C or higher,
Ru der devitrification temperature is 1235 ℃ or less, a glass substrate for display. 常温から10℃／分で昇温し、550℃で2時間保持し、その後、10℃／分で常温まで降温した後の下記式で示される熱収縮率が3ppm以上75ppm未満である、請求項１又は２に記載のガラス基板。The heat shrinkage rate represented by the following formula after raising the temperature from room temperature at 10 ° C / min, holding at 550 ° C for 2 hours, and then lowering the temperature to room temperature at 10 ° C / min is 3 ppm or more and less than 75 ppm. The glass substrate according to 1 or 2.
熱収縮率（ppm）＝｛熱処理前後のガラスの収縮量／熱処理前のガラスの長さ｝×10Thermal shrinkage rate (ppm) = {Shrinkage amount of glass before and after heat treatment / Glass length before heat treatment} × 10 66
モル％表示で、
SiO2 63〜70%、
Al2O3 12〜15%、
B2O3 1.5〜7%、
MgO 3〜11%、
CaO 5〜11%、
SrO 0〜4%、
BaO 0〜4%、
を含有する、請求項１〜３のいずれか１項に記載のガラス基板。 In mol%
SiO 2 63-70%,
Al 2 O 3 12-15%,
B 2 O 3 1.5-7%,
MgO 3-11%,
CaO 5-11%,
SrO 0-4%,
BaO 0-4%,
Containing glass substrate according to any one of claims 1 to 3. SnO2とFe2O3とを含有し、
モル％表示で、
SnO2 0.03〜0.15%、
SnO2とFe2O3との合量は、0.05〜0.2%の範囲である、
請求項１〜４のいずれか１項に記載のガラス基板。 Containing SnO 2 and Fe 2 O 3 ,
In mol%
SnO 2 0.03-0.15%,
The total amount of SnO 2 and Fe 2 O 3 is in the range of 0.05-0.2%,
Glass substrate according to any one of claims 1 to 4. モル％表示で、
Li2O、Na2O及びK2Oの合量は、0.01〜0.5mol%である、請求項１〜５のいずれか１項に記載のガラス基板。 In mol%
Li 2 O, the total content of Na 2 O and K 2 O is 0.01 to 0.5 mol%, the glass substrate according to any one of claims 1 to 5. As2O3及びSb2O3を実質的に含有しない、請求項１〜６のいずれか１項に記載のガラス基板。 The as 2 O 3 and Sb 2 O 3 does not substantially contain a glass substrate according to any one of claims 1-6. 100〜300℃における平均熱膨張係数が28×10-7℃-1以上、50×10-7℃-1未満である、請求項１〜７のいずれか１項に記載のガラス基板。 100-300 average thermal expansion coefficient at ° C. is 28 × 10 -7 ℃ -1 or more and less than 50 × 10 -7 ℃ -1, a glass substrate according to any one of claims 1 to 7. 前記ガラス基板は、フラットパネルディスプレイ用ガラス基板である請求項１〜８のいずれか１項に記載のガラス基板。The said glass substrate is a glass substrate for flat panel displays, The glass substrate of any one of Claims 1-8. LTPSまたは酸化物半導体から形成された薄膜トランジスタをガラス基板表面に形成したディスプレイであって、前記ガラス基板が、請求項１〜９のいずれか１項に記載のガラス基板であるディスプレイ。 A thin film transistor formed from LTPS or an oxide semiconductor a de Isupurei formed on a glass substrate surface, the glass substrate, de a glass substrate according to any one of claims 1 to 9 display. ガラス基板を備える液晶ディスプレイまたは有機ＥＬディスプレイであって、前記ガラス基板が、請求項１〜９のいずれか１項に記載のガラス基板である、ディスプレイ。 What liquid crystal display or an organic EL display der comprising a glass substrate, the glass substrate is a glass substrate according to any one of claims 1 to 9, a display. 所定の組成に調合したガラス原料を熔解する熔解工程と、
前記熔解工程にて熔解した熔融ガラスを平板状ガラスに成形する成形工程と、
前記平板状ガラスを徐冷する工程であって、前記平板状ガラスの熱収縮率を低減するように前記平板状ガラスの冷却条件を制御する徐冷工程と、を含む請求項１〜９のいずれか１項に記載のディスプレイ用ガラス基板の製造方法。
A melting step of melting the glass raw material prepared in a predetermined composition;
A forming step of forming the molten glass melted in the melting step into a flat glass;
Comprising the steps of: slowly cooling the flat glass, more of claims 1-9; and a slow cooling step of controlling the cooling conditions of the flat glass to reduce the thermal shrinkage of the flat glass the process for producing a glass substrate for de Isupurei according to any one of claims.
JP2014197181A 2011-12-28 2014-09-26 Glass substrate for flat panel display and manufacturing method thereof Active JP6105539B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2014197181A JP6105539B2 (en) 2011-12-28 2014-09-26 Glass substrate for flat panel display and manufacturing method thereof

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2011288651 2011-12-28
JP2011288651 2011-12-28
JP2012187879 2012-08-28
JP2012187879 2012-08-28
JP2014197181A JP6105539B2 (en) 2011-12-28 2014-09-26 Glass substrate for flat panel display and manufacturing method thereof

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2013509355A Division JP5805180B2 (en) 2011-12-28 2012-12-26 Glass substrate for flat panel display and manufacturing method thereof

Publications (3)

Publication Number Publication Date
JP2015083533A JP2015083533A (en) 2015-04-30
JP2015083533A5 true JP2015083533A5 (en) 2016-02-18
JP6105539B2 JP6105539B2 (en) 2017-03-29

Family

ID=48697451

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2013509355A Active JP5805180B2 (en) 2011-12-28 2012-12-26 Glass substrate for flat panel display and manufacturing method thereof
JP2014197181A Active JP6105539B2 (en) 2011-12-28 2014-09-26 Glass substrate for flat panel display and manufacturing method thereof

Family Applications Before (1)

Application Number Title Priority Date Filing Date
JP2013509355A Active JP5805180B2 (en) 2011-12-28 2012-12-26 Glass substrate for flat panel display and manufacturing method thereof

Country Status (5)

Country Link
JP (2) JP5805180B2 (en)
KR (3) KR101951085B1 (en)
CN (2) CN103429547A (en)
TW (4) TWI644880B (en)
WO (1) WO2013099970A1 (en)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013099970A1 (en) * 2011-12-28 2013-07-04 ＡｖａｎＳｔｒａｔｅ株式会社 Glass substrate for flat panel displays and method for manufacturing same
US9505650B2 (en) * 2012-12-05 2016-11-29 Asahi Glass Company, Limited Non-alkali glass substrate
CN105992749B (en) * 2013-11-28 2020-11-03 Ａｇｃ株式会社 Alkali-free glass substrate and method for thinning alkali-free glass substrate
JP6031613B2 (en) * 2014-06-30 2016-11-24 ＡｖａｎＳｔｒａｔｅ株式会社 Sheet glass manufacturing method and sheet glass manufacturing apparatus
KR20170093922A (en) * 2014-12-08 2017-08-16 코닝 인코포레이티드 Laminated Glass Article with Low Compaction and Method for Forming the Same
JP7060915B2 (en) * 2014-12-12 2022-04-27 日本電気硝子株式会社 Alkaline-free glass
KR20170110619A (en) * 2015-02-06 2017-10-11 아사히 가라스 가부시키가이샤 Optically selective transmission type glass and laminated substrate
GB201505091D0 (en) 2015-03-26 2015-05-06 Pilkington Group Ltd Glass
US20180319700A1 (en) * 2015-12-01 2018-11-08 Kornerstone Materials Technology Company, Ltd. Low-boron, barium-free, alkaline earth aluminosilicate glass and its applications
CN109071317A (en) 2016-04-27 2018-12-21 Ａｇｃ株式会社 alkali-free glass
JP7047757B2 (en) * 2016-05-25 2022-04-05 Ａｇｃ株式会社 Alkaline-free glass substrate, laminated substrate, and manufacturing method of glass substrate
JP7110981B2 (en) * 2016-08-05 2022-08-02 Ａｇｃ株式会社 Glass substrates, semiconductor devices and display devices
CN109843817B (en) * 2016-12-20 2021-11-02 日本电气硝子株式会社 Glass
KR102487675B1 (en) * 2017-02-15 2023-01-11 에이지씨 가부시키가이샤 Molding method of molten glass, molding apparatus, and manufacturing method of glass products
JPWO2018225627A1 (en) * 2017-06-05 2020-04-23 Ａｇｃ株式会社 Tempered glass
US10829408B2 (en) * 2017-12-13 2020-11-10 Corning Incorporated Glass-ceramics and methods of making the same
CN111630010A (en) * 2018-01-23 2020-09-04 日本电气硝子株式会社 Glass substrate and method for manufacturing same
JP7136184B2 (en) * 2018-03-09 2022-09-13 Ａｇｃ株式会社 Alkali-free glass substrate
JP7269957B2 (en) * 2018-04-25 2023-05-09 成都光明光▲電▼股▲分▼有限公司 glass composition
WO2020027088A1 (en) * 2018-07-31 2020-02-06 日本電気硝子株式会社 Substrate for displays and method for producing same
JP7389400B2 (en) * 2018-10-15 2023-11-30 日本電気硝子株式会社 Alkali-free glass plate
CN110357420B (en) * 2019-07-23 2022-03-04 中国洛阳浮法玻璃集团有限责任公司 Preparation method of electronic substrate glass with low thermal shrinkage
CN110862228A (en) * 2019-09-29 2020-03-06 彩虹显示器件股份有限公司 Preparation method of glass substrate
KR20240006552A (en) * 2021-05-10 2024-01-15 니폰 덴키 가라스 가부시키가이샤 Alkali-free glass plate
TW202319363A (en) * 2021-06-28 2023-05-16 日商日本電氣硝子股份有限公司 Alkali-free glass panel

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3858293B2 (en) * 1995-12-11 2006-12-13 日本電気硝子株式会社 Alkali-free glass substrate
JP3988209B2 (en) * 1996-06-03 2007-10-10 旭硝子株式会社 Alkali-free glass and liquid crystal display panel
JP3804112B2 (en) * 1996-07-29 2006-08-02 旭硝子株式会社 Alkali-free glass, alkali-free glass manufacturing method and flat display panel
DE19916296C1 (en) * 1999-04-12 2001-01-18 Schott Glas Alkali-free aluminoborosilicate glass and its use
JP4534282B2 (en) * 1999-12-14 2010-09-01 旭硝子株式会社 Glass for liquid crystal display substrates
JP2004315354A (en) 2003-03-31 2004-11-11 Asahi Glass Co Ltd Alkali-free glass
JP5105571B2 (en) * 2003-10-10 2012-12-26 日本電気硝子株式会社 Method for producing alkali-free glass
CN102173581B (en) * 2005-08-15 2013-06-26 安瀚视特股份有限公司 Glass composition
WO2007080924A1 (en) * 2006-01-12 2007-07-19 Nippon Electric Glass Co., Ltd. Alkali-free glass substrate
US7833919B2 (en) * 2006-02-10 2010-11-16 Corning Incorporated Glass compositions having high thermal and chemical stability and methods of making thereof
JP5088670B2 (en) 2006-04-11 2012-12-05 日本電気硝子株式会社 Glass substrate for display
US8187715B2 (en) * 2008-05-13 2012-05-29 Corning Incorporated Rare-earth-containing glass material and substrate and device comprising such substrate
CN102471134B (en) * 2009-07-02 2015-04-15 旭硝子株式会社 Alkali-free glass and method for producing same
JP5375385B2 (en) * 2009-07-13 2013-12-25 日本電気硝子株式会社 Manufacturing method of glass substrate
JP5537144B2 (en) * 2009-12-16 2014-07-02 ＡｖａｎＳｔｒａｔｅ株式会社 Glass composition and glass substrate for flat panel display using the same
WO2013099970A1 (en) * 2011-12-28 2013-07-04 ＡｖａｎＳｔｒａｔｅ株式会社 Glass substrate for flat panel displays and method for manufacturing same

Similar Documents

Publication Publication Date Title
JP2015083533A5 (en)
JP2016011256A5 (en)
TWI490183B (en) Glass substrate for flat panel display and manufacturing method thereof
TWI510447B (en) Glass substrate for flat panel display and method for manufacturing the same
TWI677479B (en) Glass substrate for display
JP6149094B2 (en) Glass substrate for flat panel display and manufacturing method thereof
JP2012188350A5 (en)
JP5991429B2 (en) Non-alkali glass substrate and method for producing the same
CN107382052B (en) Alkali-free silicate glass and preparation method and application thereof
JP2011522767A5 (en)
JP2015034122A (en) Glass
TW201706223A (en) Glass substrate for display and method for producing same
TW201700424A (en) Glass
TWI652243B (en) Alkali-free glass
CN107601854A (en) A kind of preparation method of TFT LCD substrates glass
WO2014208521A1 (en) Alkali-free glass
CN105731790B (en) A kind of alkali-free alumina silicate glass composition, alkali-free alumina silicate glass and its preparation method and application
KR102229428B1 (en) Alkali-free glass
JP2010235444A5 (en)
KR20160026888A (en) Alkali-free glass
JPWO2013047586A1 (en) Glass substrate for flat panel display
JP6354943B2 (en) Glass
WO2014208524A1 (en) Alkali-free glass
WO2015166890A1 (en) Non-alkali glass
TW202037569A (en) glass substrate