JP2015045077A - Film deposition apparatus, and film deposition method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a film deposition apparatus capable of simplifying an apparatus structure, lightening the weight of and reducing the cost of the apparatus structure.SOLUTION: A film deposition apparatus 1 comprises: a chamber 1; a raw material gas supply part 21 for supplying a raw material gas G to the inside of the chamber 10; an energy supply part 25 for supplying energy to the raw material gas G for reactions thereby to form one film deposition space 11; and a sheet transportation part 30 for transporting a long sheet S to the film deposition space 11. The film transportation part 30 includes: a sheet delivery part 31 for delivering the sheet while exposing a first face S1 to the sheet deposition space 11; a reversely folding part 40 for folding the long sheet S and reversing the surface and the back; and a sheet recovery part 35 for recovering the sheet while exposing a second surface S2 to the film deposition space 11.

Description

  The present invention relates to a film forming apparatus and a film forming method.

Next-generation devices such as organic EL devices and electronic paper devices are attracting attention.
A precise structure or material is used for the element which becomes the basis of these devices. For this reason, an element deteriorates under the influence of a trace amount of water and oxygen, and the performance is lowered.
For example, an organic EL device employs a structure in which an organic element is sandwiched between highly moisture-proof glass or plastic film (gas barrier film) in order to block the organic element from air.
In order to suppress deterioration of the organic EL organic element, a gas barrier film having high gas barrier performance is required.
Such a gas barrier film is manufactured by forming a gas barrier film made of a dense inorganic material or the like on one or both surfaces (front and back surfaces) of a plastic film using a plasma CVD apparatus or the like.

Patent Documents 1 to 3 describe film forming apparatuses that form thin films on both sides of a plastic film, respectively.
In the film forming apparatus described in Patent Documents 1 and 2, after forming a thin film on the first surface of the plastic film in the first film forming unit, the plastic film is reversed and then the second film forming unit applies the second surface to the second surface. A thin film is formed.
In the film forming apparatus described in Patent Document 3, a first film forming unit and a second film forming unit are arranged to face each other with a plastic film interposed therebetween, and a thin film is simultaneously formed on both surfaces of the plastic film.

JP 2000-338901 A JP2013-040378A JP 2006-299353 A

Each of the film forming apparatuses described in Patent Documents 1 to 3 includes a first film forming unit that forms a thin film on the first surface of the plastic film and a second film forming unit that forms a thin film on the second surface. Prepare each.
That is, as compared with a normal film forming apparatus, since a plurality of film forming units are provided, there is a problem that the apparatus becomes larger and heavier, and the gas piping and the like are increased to make the apparatus structure complicated. Furthermore, there is a problem that the device cost increases.

  An object of the present invention is to provide a film forming apparatus and a film forming method capable of simplifying the apparatus structure, reducing the weight, and reducing the cost.

  A first embodiment of a film forming apparatus according to the present invention includes a chamber, a source gas supply unit that supplies a source gas to the inside of the chamber, and an energy is applied to the source gas to cause a reaction to form one film forming space. An energy supply unit to be formed; and a sheet conveyance unit that conveys a long sheet to the one film formation space, wherein the sheet conveyance unit is a first surface of the long sheet with respect to the one film formation space. A sheet feeding unit that feeds out the sheet while exposing the sheet, a reversing folded unit that folds the long sheet and reverses the front and back, and a sheet collection unit that collects while exposing the second surface of the long sheet to the one film forming space. It is characterized by having.

  In a second embodiment of the film forming apparatus according to the present invention, in the first embodiment, the long sheet is a resin film, the source gas includes an inorganic material, and the first surface and the second surface A gas barrier layer is formed on the substrate.

  In a third embodiment of the film forming apparatus according to the present invention, in the first or second embodiment, the reverse folding section is a first section that folds the long sheet fed from the sheet feeding section in a direction that intersects the long sheet. A cross turn bar, a first turn bar that folds the long sheet that has passed through the first cross turn bar, and a cross section that is disposed so as to intersect the first cross turn bar and cross the long sheet that has passed through the first turn bar. A second cross turn bar that folds back in a direction, and a second turn bar that folds the long sheet passing through the second cross turn bar.

  According to a fourth embodiment of the film forming apparatus of the present invention, in the third embodiment, the first cross turn bar, the first turn bar, the second cross turn bar, and the second turn bar all have a radius of 10 mm to 100 mm. It is characterized by the following.

  An embodiment of a film forming method according to the present invention includes a step of applying energy to a source gas supplied into a chamber to cause a reaction to form one film forming space, and a long sheet in the one film forming space. A conveying step that conveys the first sheet of the long sheet while exposing the first surface to the one film formation space, folding the long sheet back and upside down, It collects, exposing the 2nd surface of the said elongate sheet | seat with respect to film-forming space.

  The film forming apparatus and the film forming method according to the present invention can simplify the apparatus structure, reduce the weight, and reduce the cost.

It is a mimetic diagram showing a schematic structure of plasma CVD device 1 concerning an embodiment of the present invention. It is a figure which shows the inversion folding | returning part 40. FIG.

Embodiments of the present invention will be described with reference to the drawings.
FIG. 1 is a schematic diagram illustrating a schematic configuration of a plasma CVD apparatus 1 according to an embodiment of the present invention, where (a) is an overall view, and (b) is a cross-sectional view of a long sheet S after film formation processing. is there.

A plasma CVD apparatus (film forming apparatus) 1 is a film forming apparatus that forms thin films L (L1, L2) on both surfaces (first surface S1, second surface S2) of a long sheet S, respectively.
The plasma CVD apparatus 1 includes a vacuum chamber 10, a film forming unit 20, a sheet conveying unit 30, and the like.

The vacuum chamber 10 is a pressure vessel formed of a nickel-based alloy having excellent corrosion resistance such as Inconel. A film forming space 11 for forming a long sheet S is formed in the vacuum chamber 10.
A vacuum pump 12 is connected to the vacuum chamber 10. The vacuum pump 12 makes the space inside the vacuum chamber 10 a reduced pressure atmosphere.

Inside the vacuum chamber 10, a film forming unit 20 and a sheet conveying unit 30 are accommodated and arranged. Inside the vacuum chamber 10, the primary sheet roll SR1 and the secondary sheet roll SR2 of the long sheet S are also accommodated.
The primary web roll SR1 is obtained by winding a long sheet S before film formation, and the secondary web roll SR2 is obtained by winding a long sheet S after film formation.
The primary web roll SR1 and the secondary web roll SR2 are carried into and out of the vacuum chamber 10 through airtight doors (not shown).

  The film forming unit 20 forms a thin film (gas barrier layer) L by depositing a gas (raw material gas G) containing a raw material into plasma (raw material plasma P) and depositing it on the long sheet S. The film forming unit 20 includes a source gas supply unit 21 and an electrode unit 25.

The source gas supply unit 21 supplies the source gas G to the film formation space 11 of the vacuum chamber 10.
The source gas supply unit 21 includes a source gas introduction pipe 22 and a nozzle 23.
The source gas introduction pipe 22 feeds the source gas G from the outside to the inside of the vacuum chamber 10. The tip of the source gas introduction pipe 22 is connected to the nozzle 23. The base end of the source gas introduction pipe 22 is connected to, for example, a gas container (not shown). This gas container is filled with the source gas G.
The nozzle 23 ejects the source gas G fed from the source gas introduction pipe 22 toward the film formation space 11.

The electrode unit (energy supply unit) 25 includes a discharge electrode 26 (26A, 26B), a power cable 27, a high-frequency power source 28, and the like.
The discharge electrode 26 includes electrodes 26A and 26B that are non-grounded electrodes. The electrodes 26 </ b> A and 26 </ b> B are formed in a flat plate shape, for example, and are disposed to face each other inside the vacuum chamber 10.
A power cable 27, a high-frequency power source 28, and the like are connected to the discharge electrode 26 (26A, 26B).

High frequency power (energy) is supplied from the high frequency power supply 28 to the discharge electrode 26 (26A, 26B) via the power cable 27. Thereby, the source gas G existing in the space between the electrode 26A and the electrode 26B is ionized (reacted) to generate a source plasma (source plasma P). That is, the reacted source gas G becomes the source plasma P.
Between the electrode 26A and the electrode 26B, one film formation space 11 where the source plasma P exists is formed.

The sheet conveyance unit 30 conveys (sends and collects) the long sheet S to the film formation space 11. The sheet conveying unit 30 includes a sheet feeding unit 31, a sheet collecting unit 35, and a reverse folding unit 40.
The sheet feeding unit 31 and the sheet collecting unit 35 are disposed to face the reverse folding unit 40 with the film formation space 11 interposed therebetween. The direction in which the sheet feeding unit 31 and the sheet collecting unit 35 and the reverse folding unit 40 face each other is a direction orthogonal to the facing direction of the electrodes 26A and 26B.
The sheet feeding unit 31 is disposed to face the sheet collecting unit 35 with the film formation space 11 in between. The direction in which the sheet feeding unit 31 and the sheet collecting unit 35 face each other coincides with the facing direction of the electrodes 26A and 26B.

The sheet feeding unit 31 feeds the long sheet S before the film forming process from the primary raw roll SR1 and sends it to the film forming space 11. The sheet feeding unit 31 exposes the first surface S1 of the long sheet S to the raw material plasma P in the film forming space 11.
The sheet feeding unit 31 includes a sheet feeding bar 32, a tension adjustment bar 33, and the like.
The sheet feeding bar 32 is a cylindrical member, and is inserted through the center hole of the primary raw roll SR1 so as to rotatably hold the primary raw roll SR1. The sheet feeding bar 32 is positioned (arranged) in the uppermost stream on the conveyance route of the long sheet S.
The sheet feeding bar 32 is connected to a rotation motor (not shown), and rotates the primary material roll SR1 at an arbitrary rotation speed. Thereby, the long sheet S before the film forming process is fed out from the primary material roll SR1.
The tension adjustment bar 33 is a cylindrical member and has a function of measuring the tension of the long sheet S. By controlling the rotation speed of the sheet feeding bar 32 or the sheet take-up bar 36 based on the tension data measured by the tension adjustment bar 33, the tension applied to the long sheet S can be maintained in an appropriate fixed range. . The tension adjustment bar 33 is disposed in parallel to the sheet feeding bar 32 downstream of the sheet feeding bar 32. The long sheet S is wound around the tension adjusting bar 33 about a half turn, and rotates as the long sheet S is fed.

The sheet collecting unit 35 exposes the second surface S2 of the long sheet S to the raw material plasma P in the film forming space 11, collects the long sheet S after the film forming process from the film forming space 11, and outputs a secondary original. It is wound around the anti-roll SR2.
The sheet collection unit 35 includes a sheet take-up bar 36, a tension adjustment bar 37, and the like.
The sheet take-up bar 36 is a cylindrical member, and is inserted through the center hole of the secondary raw roll SR2 and rotatably holds the secondary raw roll SR2. The sheet take-up bar 36 is positioned (arranged) on the most downstream side of the conveyance route of the long sheet S and is arranged in parallel to the sheet feeding bar 32.
The sheet take-up bar 36 is connected to a rotation motor (not shown), and rotates the secondary material roll SR2 at an arbitrary rotation speed. Thereby, the long sheet S after the film forming process is wound around the secondary raw roll SR2.
The tension adjustment bar 37 is a cylindrical member and has a function of measuring the tension of the long sheet S. By controlling the rotation speed of the sheet feeding bar 32 or the sheet take-up bar 36 based on the tension data measured by the tension adjustment bar 37, the tension applied to the long sheet S can be maintained in an appropriate fixed range. . The tension adjustment bar 37 is disposed in parallel to the sheet take-up bar 36 upstream of the sheet take-up bar 36. The long sheet S is wound around the tension adjusting bar 37 about a half turn, and rotates as the long sheet S is collected.

The reverse folding unit 40 folds the long sheet S fed from the sheet feeding unit 31 and directs it to the sheet collecting unit 35. Further, the reverse folding unit 40 reverses the front and back of the long sheet S.
When the long sheet S is fed from the sheet feeding portion 31, the first surface S1 faces the electrode 26B side, and the second surface S2 faces the electrode 26A side. In other words, when the long sheet S is sent out from the sheet feeding portion 31, the first surface S <b> 1 is exposed to the film forming space 11. At this time, since the second surface S2 is close to the electrode 26A, it is not exposed to the film formation space 11.
Further, when the long sheet S is collected by the sheet collecting unit 35, the first surface S1 faces the electrode 26B side, and the second surface S2 faces the electrode 26A side. In other words, when the long sheet S is collected by the sheet collecting unit 35, the second surface S <b> 2 is exposed to the film forming space 11. At this time, since the first surface S1 is close to the electrode 26B, it is not exposed to the film formation space 11.

FIG. 2 is a diagram showing the reverse folding unit 40.
The reverse folding portion 40 includes a first cross turn bar 41, a first turn bar 42, a second cross turn bar 43, and a second turn bar 44.
The first cross turn bar 41, the first turn bar 42, the second cross turn bar 43, and the second turn bar 44 are arranged in this order from the upstream side to the downstream side of the conveyance route of the long sheet S.
Further, the first cross turn bar 41, the first turn bar 42, the second cross turn bar 43, and the second turn bar 44 are arranged in this order in the direction from the electrode 26A to the electrode 26B.

The first cross turn bar 41, the first turn bar 42, the second cross turn bar 43, and the second turn bar 44 are all cylindrical members. The long sheet S is wound around the first cross turn bar 41, the first turn bar 42, the second cross turn bar 43, and the second turn bar 44 about a half turn, and rotates as the long sheet S is sent out and collected.
The first cross turn bar 41, the first turn bar 42, the second cross turn bar 43, and the second turn bar 44 all have a radius of 10 mm to 100 mm.
The long sheet S after the film forming process is a film used for an organic EL device or the like. The long sheet S after the film forming process is bent to a minimum radius of about 10 mm during use. If the minimum radius is less than 10 mm, the thin films L1 and L2 may be cracked. For this reason, even when the long sheet S is formed, the radius does not become less than 10 mm.
On the other hand, if the radius of the first cross turn bar 41 or the like exceeds 100 mm, the apparatus becomes large and heavy, and this is avoided.
The tension adjustment bars 33 and 37 also have a radius of 10 mm to 100 mm.

The first cross turn bar 41 folds the long sheet S in a direction intersecting (orthogonal) with respect to the carry-in direction and carries it out. The first cross turn bar 41 intersects with the longitudinal direction (conveying direction) of the long sheet S at an angle of about 45 °.
The first cross turn bar 41 is disposed so as to intersect the sheet feeding bar 32 and the sheet take-up bar 36 at an angle of about 45 °.
The long sheet S is fed into the first cross turn bar 41 from the sheet feeding portion 31. Then, after passing through the first cross turn bar 41, the long sheet S is sent out (carried out) along the width direction at the time of carrying in (feeding in). Thereby, as for the elongate sheet | seat S, 1st surface S1 faces the electrode 26A side, and 2nd surface S2 faces the electrode 26B side.

The first turn bar 42 folds the long sheet S in the direction opposite to the carry-in direction and carries it out. The first turn bar 42 is orthogonal to the longitudinal direction (conveying direction) of the long sheet S.
The first turn bar 42 is disposed so as to intersect the sheet feeding bar 32 and the sheet take-up bar 36 at an angle of about 90 °.
The long sheet S is fed from the first cross turn bar 41 to the first turn bar 42. Then, after passing through the first turn bar 42, it is turned 180 ° with respect to the carrying-in direction and sent out in the opposite direction. Thereby, as for the elongate sheet | seat S, 1st surface S1 faces the electrode 26B side, and 2nd surface S2 faces the electrode 26A side.

The second cross turn bar 43 folds the long sheet S in a direction intersecting (orthogonal) with respect to the carry-in direction and carries it out. The second cross turn bar 43 intersects with the longitudinal direction (conveying direction) of the long sheet S at an angle of about 45 °.
The second cross turn bar 43 is disposed so as to intersect the sheet feeding bar 32 and the sheet take-up bar 36 at an angle of about 45 °.
The second cross turn bar 43 intersects the first cross turn bar 41 at an angle of about 90 °. The first cross turn bar 41 and the second cross turn bar 43 are arranged in an X shape.
The long sheet S is fed from the first turn bar 42 to the second cross turn bar 43. The long sheet S passes through the second cross turn bar 43 and is sent out along the width direction at the time of loading. The long sheet S is sent in the same direction as the direction sent from the sheet conveying unit 30. Thereby, as for the elongate sheet | seat S, 1st surface S1 faces the electrode 26A side, and 2nd surface S2 faces the electrode 26B side.

The second turn bar 44 folds the long sheet S in the direction opposite to the carry-in direction and carries it out. The second turn bar 44 is orthogonal to the longitudinal direction (conveying direction) of the long sheet S.
The second turn bar 44 is disposed in parallel to the sheet feeding bar 32 and the sheet take-up bar 36.
The long sheet S is fed from the second cross turn bar 43 to the second turn bar 44. Then, when the long sheet S passes through the second turn bar 44, the long sheet S is reversed by 180 ° with respect to the carry-in direction and sent out in the opposite direction. Thereby, as for the elongate sheet | seat S, 1st surface S1 faces the electrode 26B side, and 2nd surface S2 faces the electrode 26A side.
The long sheet S is sent in a direction opposite to the direction sent from the sheet conveying unit 30 and heads for the sheet collecting unit 35.

The reverse folding unit 40 bends the long sheet S twice in a direction orthogonal to the conveyance direction when the long sheet S is folded four times. Thereby, the reverse folding unit 40 reverses the long sheet S while folding it back in the direction opposite to the loading direction and carrying it out.
The first surface S1 of the long sheet S faces the electrode 26B side when being fed from the sheet feeding unit 31 and when being collected by the sheet collecting unit 35. The second surface S <b> 2 of the long sheet S faces the electrode 26 </ b> A side when being fed from the sheet feeding unit 31 and when being collected by the sheet collecting unit 35.
When the long sheet S is sent out from the sheet feeding portion 31, the first surface S <b> 1 is exposed to the film formation space 11. Further, when the long sheet S is collected by the sheet collecting unit 35, the second surface S <b> 2 is exposed to the film formation space 11.

The long sheet S before the film forming process is a resin film formed of a resin.
Examples of the resin forming the resin film include polyester resins such as polyethylene terephthalate (PET) and polyethylene naphthalate (PEN), polyolefin resins such as polyethylene (PE), polypropylene (PP), and cyclic polyolefin, polyamide resins, polycarbonate resins, Examples thereof include polystyrene resin, polyvinyl alcohol resin, saponified ethylene-vinyl acetate copolymer, polyacrylonitrile resin, acetal resin, polyimide resin, and polyether sulfide.
Additives such as a plasticizer, an antioxidant, an anti-aging agent, an antistatic agent, an antiblocking agent, a lubricant, and a color pigment may be blended.
The long sheet S before film formation may be a single layer film or a multilayer film. The first surface S1 and the second surface S2 of the long sheet S may be subjected to surface treatments such as flame treatment, plasma treatment, corona treatment, acid treatment, alkali treatment, sand blast treatment, and application of fine irregularities.

The source gas G is appropriately selected according to the design of the barrier film (thin film L). Examples of the source gas G include precursors such as organometallic compounds and metal complexes. Examples of these metals include Si, Al, In, Sn, Zn, Ti, Cu, and Ce. As the source gas G, for example, silane, hexamethyldisiloxane, 1,1,3,3-tetramethyldisiloxane, vinyltrimethylsilane, methyltrimethylsilane, hexamethyldisilane, methylsilane, dimethylsilane, trimethylsilane, diethyl Silane, propylsilane, phenylsilane, vinyltriethoxysilane, vinyltrimethoxysilane, tetramethoxysilane, tetraethoxysilane, phenyltrimethoxysilane, methyltriethoxysilane, octamethylcyclotetrasiloxane, dimethyldisilazane, trimethyldisilazane, Organic silicon compounds such as tetramethyldisilazane, pentamethyldisilazane, hexamethyldisilazane and the like can be mentioned. Preferably, silane and hexamethyldisiloxane are used. These organometallic compounds and precursors such as metal complexes can be used alone or in combination of two or more.
In addition to the raw material gas G, a reactive gas that reacts with the raw material gas G to become an oxide or a nitride may be mixed and supplied. Examples of the reactive gas include oxygen, ozone, nitrogen, and ammonia. These reactive gases can be used alone or in combination of two or more.
Furthermore, a carrier gas or a discharge gas may be used together with the source gas G as necessary. As such carrier gas and discharge gas, for example, hydrogen, helium, argon, neon, xenon, or the like can be used.

The thin films L (L1, L2) are gas barrier layers each formed of an inorganic material.
Examples of the inorganic material forming the thin film L (L1, L2) include metals, metal oxides, metal nitrides, metal oxynitrides, metal sulfides, metal carbides, and metal oxycarbides. Examples of the metal in these inorganic materials include Si, Al, In, Sn, Zn, Ti, Cu, and Ce. Any one of these inorganic materials may be used alone, or two or more thereof may be mixed and used.
As the inorganic material for forming the inorganic barrier layer, silicon oxide, silicon oxynitride (SiON), silicon oxide carbide (SiOC) and the like are preferable from the viewpoint of cost. Among these, SiON is particularly preferable in that the long sheet S after the film forming process is not colored and has excellent transparency.

  Since the thin films L1 and L2 are substantially the same, the long sheet S after the film forming process is less likely to curl. If curling can be prevented, handling when laminating another film or laminating further functional layers on the long sheet S after the film formation process becomes easy.

The thickness of each of the thin films L1 and L2 is preferably 2 μm or less, more preferably 1.5 μm or less, and even more preferably 1.0 μm or less. When each thickness is 2 μm or less, the material cost required for manufacturing the long sheet S after the film formation process can be reduced. In addition, productivity can be improved, for example, the time required for forming the thin films L1 and L2 can be reduced. Therefore, the manufacturing cost can be reduced.
Although the minimum of the thickness of thin film L1, L2 is not specifically limited, 0.25 micrometer or more is preferable and 0.5 micrometer or more is more preferable. When each thickness is 0.5 μm or more, the water vapor permeability of the long sheet S after film formation at 40 ° C. and 90% RH tends to be 10 ⁻⁴ g / m ² / day or less.

The thin films L1 and L2 have substantially the same thickness. For example, the thickness of the thin film L2 is preferably within a range of ± 10% of the thickness of the thin film L1.
Since the thin films L1 and L2 have substantially the same thickness, the long sheet S after the film forming process is less likely to curl. If curling can be prevented, handling when laminating another film or laminating further functional layers on the long sheet S after the film formation process becomes easy.
From the viewpoint of curling prevention, in the long sheet S after the film formation process, it is particularly preferable that the thin films L1 and L2 have substantially the same thickness.

The long sheet S after the film forming process has a high barrier property such that the water vapor permeability at 40 ° C. and 90% RH is 10 ⁻⁴ g / m ² / day or less, and is therefore suitable for applications requiring such a barrier property. Used for. Examples of such applications include organic EL devices, liquid crystal devices, and electronic paper devices. The long sheet S after film formation is particularly useful for an organic EL device.
However, the application of the long sheet S after the film forming process is not limited to these, and can be used for various applications requiring barrier properties against water vapor and the like.

A film forming process (film forming method) using the plasma CVD apparatus 1 will be described.
First, the primary material roll SR <b> 1 is carried into the vacuum chamber 10. Then, the primary material roll SR <b> 1 is installed in the sheet conveyance unit 30. Specifically, the primary material roll SR1 is fitted into the sheet feeding bar 32 of the sheet feeding unit 31. The sheet feeding bar 32 is inserted through the center hole of the primary material roll SR1. Further, the long sheet S before the film forming process is pulled out from the primary material roll SR1, and the long sheet S is arranged along the conveyance route. The leading end of the long sheet S is wound around the sheet take-up bar 36 of the sheet collection unit 35.

  The tension of the long sheet S arranged along the conveyance route is adjusted by the tension adjustment bar 33 and the tension adjustment bar 37. Then, by rotating the sheet feeding bar 32 and the sheet take-up bar 36, the long sheet S is continuously conveyed (delivered and collected) along the conveying route.

  At the same time when the long sheet S is transported along the transport route, the inside of the vacuum chamber 10 is decompressed and the film forming unit 20 is operated. Specifically, the source gas G is injected from the nozzle 23 of the source gas supply unit 21 into the film formation space 11 of the vacuum chamber 10. In addition, high-frequency power is supplied to the electrodes 26A and 26B of the electrode section 25, and the source gas G existing in the space (film formation space 11) between the electrodes 26A and 26B is ionized to generate source plasma P. .

When the long sheet S is sent out from the sheet feeding portion 31, the first surface S1 is exposed to the raw material plasma P. Further, when the long sheet S is collected by the sheet collecting unit 35, the second surface S2 is exposed to the raw material plasma P.
For this reason, by continuously conveying the long sheet S along the conveyance route, the raw material is deposited on both surfaces (first surface S1, second surface S2) of the long sheet S, and the thin film L (L1, L2). ) Is formed. Since the thin film L1 on the first surface S1 and the thin film L2 on the second surface S2 are respectively exposed to the raw material plasma P existing in the film formation space 11, they are thin films of the same component.

  When the thin film L1 on the first surface S1 and the thin film L2 on the second surface S2 are formed, the long sheet S is continuously wound around the sheet take-up bar 36 of the sheet collection unit 35. The long sheet S after the film forming process in which the thin film L is formed over the entire length is wound around the sheet winding bar 36 to become the secondary raw roll SR2.

  Finally, after the film forming unit 20 is stopped and the inside of the vacuum chamber 10 is returned to the atmospheric pressure, the secondary raw roll SR2 is unloaded from the inside of the vacuum chamber 10.

The plasma CVD apparatus 1 includes an inversion folding unit 40 that folds the long sheet S and reverses the front and back. For this reason, the plasma CVD apparatus 1 forms one film-forming space 11 by one film-forming unit 20, and the thin films L (L 1) on both surfaces (first surface S 1, second surface S 2) of the long sheet S, respectively. , L2). Since the plasma CVD apparatus 1 has only one film forming unit 20, the structure of the apparatus can be simplified, the weight can be reduced, and the cost can be reduced.
Since one film forming space 11 is formed by one film forming unit 20, the thin films L1 and L2 having the same characteristics can be easily formed on the first surface S1 and the second surface S2.

  In the plasma CVD apparatus 1, it is not necessary for the operator to perform a process of turning the long sheet S upside down, so that the film forming process can be performed continuously. The film formation of the long sheet S is efficiently performed without interrupting the film formation process between the time when the primary material roll SR1 is carried into the vacuum chamber 10 and the time when the secondary material roll SR2 is carried out. Can do.

  Various shapes, combinations, and the like of the constituent members shown in the above-described embodiments are merely examples, and various modifications can be made based on design requirements and the like without departing from the gist of the present invention.

Although the case where the discharge electrode 26 of the electrode unit 25 includes two non-grounded electrodes (electrodes 26A and 26B) has been described, the present invention is not limited thereto. One of the discharge electrodes 26 (for example, the electrode 26B) may be replaced with a grounded metal member (vacuum chamber 10, table, etc.).
When a table is used in place of the electrode 26B, the table is disposed opposite to the electrode 26A and grounded. When high frequency power is supplied to the electrode 26A, the table functions as a ground electrode. For this reason, the source gas G existing in the space (deposition space 11) between the electrode 26A and the table can be ionized to generate the source plasma P.
When the vacuum chamber 10 is used instead of the electrode 26B, the vacuum chamber 10 is grounded. When high frequency power is supplied to the electrode 26A, the vacuum chamber 10 functions as a ground electrode. For this reason, the source gas G existing in the space (deposition space 11) between the electrode 26A and the vacuum chamber 10 can be ionized to generate the source plasma P.
Thus, the case where the electrode 26 for discharge of the electrode part 25 is equipped with one non-grounding electrode (electrode 26A) may be sufficient.

  As the film forming apparatus and the film forming method, the plasma CVD apparatus 1 and the film forming method using the plasma CVD apparatus 1 have been described, but are not limited thereto. The film forming apparatus may be an apparatus for forming a film by chemical vapor deposition (chemical vapor deposition) and a film forming method by chemical vapor deposition (chemical vapor deposition). That is, a dry coating method such as a thermal CVD method or a catalytic CVD method may be used.

  The reverse folding portion is not limited to the case where four turn bars (first cross turn bar 41, first turn bar 42, second cross turn bar 43, and second turn bar 44) are provided. When three or less or five or more turn bars are used, a turn bar may not be used.

  The turn bar, the tension adjusting bar, or the like may be a roller that is rotatably supported during use, or may be a fixed roll that does not rotate during use. From the viewpoint of the load on the sheet conveying unit and the rubbing of the first surface S1 and the second surface S2 of the long sheet S, it is preferable that the roller is rotatably supported during use.

  The present invention is not limited to the case where the sheet feeding bar 32 is connected to the rotary motor and actively rotates. As the long sheet S is conveyed by the rotation of the sheet take-up bar 36, it may be passively rotated.

  The sheet feeding unit 31 and the sheet collecting unit 35 may not include the tension adjustment bars 33 and 37. The sheet feeding unit 31, the sheet collecting unit 35, and the reverse folding unit 40 may be provided with a plurality of tension adjustment bars and the like.

  The sheet feeding unit 31, the sheet collecting unit 35, and the reverse folding unit 40 are not limited to being housed and arranged inside the vacuum chamber 10. Any or all of the sheet feeding unit 31, the sheet collecting unit 35, and the reverse folding unit 40 may be disposed outside the vacuum chamber 10. For example, the sheet feeding unit 31 and the sheet collecting unit 35 may be arranged in a separate room adjacent to the vacuum chamber 10 so that the primary raw roll SR1 and the secondary raw roll SR2 are carried into and out of this separate room.

1 Plasma CVD equipment (film deposition equipment)
10 Vacuum chamber
11 Deposition space 21 Source gas supply section
25 Electrode unit (energy supply unit)
30 Sheet transport section
31 Sheet feeding part
35 Sheet collection unit
40 Inverted folding part
41 First cross turn bar
42 First turn bar
43 Second Cross Turn Bar
44 Second turn bar
G Raw material gas
L thin film (gas barrier layer)
S Long sheet
S1 first page
S2 second side

Claims (5)

A chamber;
A source gas supply unit for supplying source gas into the chamber;
An energy supply unit that forms a film formation space by applying energy to the source gas to react;
A sheet conveying section for conveying a long sheet to the one film formation space;
With
The sheet conveying unit is
A sheet feeding portion that feeds out the first surface of the long sheet to the one film formation space;
A reversing folded section for folding the long sheet and reversing the front and back;
A sheet collection unit that collects while exposing the second surface of the long sheet to the one film formation space;
A film forming apparatus comprising: The long sheet is a resin film,
The source gas includes an inorganic material,
The film forming apparatus according to claim 1, wherein a gas barrier layer is formed on the first surface and the second surface. The inverted folded portion is
A first cross turn bar that folds back in the direction intersecting the long sheet fed from the sheet feeding unit;
A first turn bar that folds the long sheet through the first cross turn bar;
A second cross turn bar that is arranged so as to cross the first cross turn bar and folds back in the direction crossing the long sheet passing through the first turn bar;
A second turn bar that turns back the long sheet through the second cross turn bar;
The film forming apparatus according to claim 1, further comprising: The film forming apparatus according to claim 3, wherein the first cross turn bar, the first turn bar, the second cross turn bar, and the second turn bar all have a radius of 10 mm to 100 mm. Forming a film formation space by applying energy to the source gas supplied to the inside of the chamber and reacting it;
A conveying step of conveying the long sheet to the one film formation space;
Have
The conveying step is
Feeding out the first surface of the long sheet to the one film formation space,
Fold the long sheet and reverse the front and back,
A film forming method comprising collecting the second sheet while exposing the second surface of the long sheet to the one film forming space.

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