JP2015043385A - Substrate processing device having edge conveyance function - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a substrate processing device having an edge conveyance function that conveys a substrate, such as liquid crystal, in a high-speed and stable manner and without touching the upper and lower surfaces of the substrate, and that applies treatment to both upper and lower surfaces or only the upper surface of the substrate without causing contamination on the upper and lower surfaces of the substrate due to a roller trace or the like.SOLUTION: A substrate processing device 1 comprises a plurality of processing units for applying at least chemical treatment by chemicals, rinse treatment by water, and drying treatment by gas, such as air or nitrogen gas, from upward and downward of a substrate 11 to both upper and lower surfaces or only the upper surface of the substrate 11, and includes an edge conveyance function comprising loader sections 2 and unloader sections 9 in front of and behind the plurality of processing units. In the plurality of processing units, a plurality of conveyance rollers 13 are arranged which have V-shaped notches on the circumference of a roller surface that make contact with edge sections of both left and right sides of the substrate 11 from a horizontal direction to move the substrate 11, and which do not make contact with the upper or lower surface of the substrate 11.

Description

  The invention of the present application relates to a substrate processing apparatus such as a semiconductor substrate or a liquid crystal substrate. In particular, in a substrate processing apparatus that performs at least chemical treatment with a chemical solution, rinsing treatment with water, and drying treatment with an air knife, contacts the upper and lower surfaces of the substrate. The present invention relates to a substrate processing apparatus having an edge transfer function that performs processing on both or only an upper surface and a lower surface of a substrate while transporting the substrate.

  In the manufacturing process of a liquid crystal substrate, for example, a touch panel used for a smartphone or a tablet terminal is increasing in which circuit patterns are formed on both surfaces of a substrate. In this case, contamination of not only the upper surface of the substrate but also the lower surface of the substrate becomes a problem.

  However, in the conventional substrate processing apparatus, as shown in FIG. 12, which is an excerpt from Japanese Patent Laid-Open No. 2007-253068 (Patent Document 1), the substrate 011 is transported of the substrate. It is placed on a plurality of transport rollers 031 arranged at the lower part of the path, and is processed while being transported as a chemical treatment process, a rinse process process, and a drying process process using an air knife by the rotation of the transport roller 031. There is a problem that contamination such as roller marks occurs due to the conveyance roller 031 coming into contact with the back surface of the substrate.

  Further, in the example described in Japanese Patent Application Laid-Open No. 9-214181 (Patent Document 2), as shown in FIG. 13 which is an excerpt from the publication, they are provided at the left and right ends of the substrate. The substrate 011 is placed on one surface of the V inclined surface of a pair of transport rollers 032 having V-shaped grooves arranged so as to intersect the V shape on the extension line, and the other surface of the V inclined surface. In this method, the substrate 011 is transported by rotating the transport roller 032 while restricting meandering in the right and left directions of travel. In this method, the end of the lower surface of the substrate 011 is in contact with the transport roller 032. Therefore, the contamination of the part is inevitable.

Japanese Patent Laid-Open No. 2007-253068 JP-A-9-214181

  The invention of the present application solves the above-mentioned problems of the conventional substrate processing apparatus, conveys the substrate to the upper and lower surfaces of the substrate in a non-contact manner at high speed and stably, and rollers on the upper and lower surfaces of the substrate. It is an object of the present invention to provide a substrate processing apparatus having an edge transfer function that performs processing on both or only the upper surface and the lower surface of a substrate without generating contamination due to a mark or the like.

The above-described problems can be solved by the following invention described in each claim of the present application.
That is, according to the first aspect of the present invention, while moving a substrate such as a liquid crystal, both the upper and lower surfaces or only the upper surface of the substrate are subjected to at least chemical treatment with a chemical solution, rinsing treatment with water, and from above and below the substrate. A plurality of processing units including a chemical processing unit, a rinsing processing unit, and a drying processing unit that perform a drying process using a gas such as sprayed air or nitrogen gas, and a loader unit and an unloader unit before and after the plurality of processing units. In the substrate processing apparatus, each of the plurality of processing units includes a roller surface that moves the substrate while contacting the left and right edge portions of the substrate from the horizontal direction when viewed from the substrate transport direction. A plurality of transport rollers having V-shaped cuts in the circumference and not contacting the upper and lower surfaces of the substrate are arranged. A substrate processing apparatus having the edge conveying function.

  In the invention described in claim 2, the loader unit and the unloader unit are in contact with the edge portions on the left and right sides of the substrate from the horizontal direction when viewed from the transport direction of the substrate. A plurality of circularly-conical frustoconical transport rollers, which are tapered in two steps, are disposed, and the transport roller has corners where the two-step taper intersects the left and right sides of the substrate. 2. The substrate processing apparatus having an edge transport function according to claim 1, wherein the substrate processing apparatus has a structure that does not contact the upper and lower surfaces of the substrate by contacting the edge portions on both sides from the horizontal direction.

  Moreover, the invention described in claim 3 further includes an ultrasonic cleaning processing unit between the chemical processing unit and the rinsing processing unit, and the ultrasonic cleaning processing unit includes a transport path of the substrate. Ultrasonic irradiators that irradiate ultrasonic waves toward the upper and lower surfaces of the substrate are respectively disposed above and below the substrate so as to face each other with the substrate interposed therebetween, and the ultrasonic irradiators below are The water is ejected from a plurality of holes provided on the wall facing the substrate, and the substrate is held in a floating state, and a water film is formed between the substrate and the water film. The ultrasonic irradiator is configured to propagate ultrasonic waves to the substrate surface, and the upper ultrasonic irradiator forms a film of water between the substrate and the water by water ejected from a plurality of holes provided on the wall surface facing the substrate. Form and pass ultrasonic waves on the substrate surface through the water film A flat cylindrical top surface and a bottom surface of the substrate that are structured to be sown and that move the substrate by contacting the left and right edge portions of the substrate from the horizontal direction when viewed from the transport direction of the substrate. The substrate processing apparatus having an edge transfer function according to claim 1, wherein a plurality of transfer rollers that do not contact the substrate are arranged.

  Furthermore, the invention described in claim 4 further includes a sponge roller cleaning processing unit between the chemical processing unit and the rinsing processing unit, and the sponge roller cleaning processing unit includes a transport path for the substrate. A plurality of sponge rollers are respectively disposed above and below the upper surface and the lower surface of the substrate, and viewed from the horizontal direction on the left and right edge portions of the substrate as viewed from the substrate transport direction. 4. The transfer roller according to claim 1, wherein a plurality of flat cylindrical transport rollers that are in contact with each other and are not in contact with an upper surface and a lower surface of the substrate are arranged. A substrate processing apparatus having an edge transfer function.

Since the invention of the present application is configured as described above, the following effects can be obtained.
In a plurality of processing units consisting of a chemical processing unit, a rinsing processing unit, and a drying processing unit, the substrates subjected to chemical processing with chemicals and rinsing processing with water are all from the first chemical processing step to the last drying processing step. In this processing step, a plurality of edge portions on both the left and right sides of the substrate are arranged so as to sandwich the substrate from the horizontal direction, and a conveyance roller having a V-shaped cut in the roller surface circumference (a conveyance roller with a V-shaped groove) The lower tapered surface of the V-shaped valley bottom is opened at an angle with respect to the lower surface of the substrate, and the V-shaped valley bottom of the V-shaped valley bottom Since the upper tapered surface is opened with a certain angle with respect to the upper surface of the substrate, the upper and lower surfaces of the substrate are not in contact with the V-grooved conveying roller, and the upper surface and the lower surface of the substrate are conveyed. Dirty due to contact with rollers It can be prevented.
In addition, the substrate can be moved at high speed and stably by the mechanical force of the V-grooved transport roller that rotates in contact with the horizontal direction only at the left and right edge portions of the substrate.

In the loader unit and unloader unit, the substrate has a frusto-conical shape that is tapered in two steps, with a plurality of edge portions on both the left and right sides of the substrate sandwiching the substrate from the horizontal direction. The conveyance roller (conveyance roller with two-step taper) is held in contact with only the corner where the two-step taper intersects, and the taper surface below the corner has an angle with respect to the lower surface of the substrate. Since the upper tapered surface of the corner is open at a certain angle with respect to the upper surface of the substrate, both the upper and lower surfaces of the substrate are in contact with the two-step tapered transport roller. In addition, both the upper surface and the lower surface of the substrate can be prevented from being contaminated by contact with the transport roller.
Further, the substrate can be moved at high speed and stably by the mechanical force due to the rotation of the transport roller with a two-step taper that rotates in contact with only the left and right edge portions of the substrate from the horizontal direction.

The two-stage tapered transport roller can also have the following effects.
The transport roller with a two-step taper has a truncated conical shape with a taper in two steps and is tapered upward. Therefore, when the substrate is set in the apparatus from above the apparatus in the loader section, the transport roller Therefore, a mechanism for moving the transport roller to the outside in the horizontal direction with respect to the substrate is unnecessary, and it can be manufactured simply and inexpensively.
Further, similarly to the loader unit, the unloader unit does not require a retracting mechanism for the transport roller with a two-step taper, and the processed substrate can be easily taken out above the apparatus.

In the ultrasonic cleaning processing unit, the substrate is held in a floating state and supported in the vertical direction (gravity direction) by water ejected from an ultrasonic irradiator disposed below, and edge portions on both the left and right sides of the substrate However, since it contacts only the cylindrical surface of a flat cylindrical transport roller (flat transport roller), which is arranged in a plurality so as to sandwich the substrate from the horizontal direction, both the upper and lower surfaces of the substrate are in contact with the flat transport roller. No, both the upper and lower surfaces of the substrate can be prevented from being contaminated by contact with the transport roller.
Further, the substrate can be moved at high speed and stably by the mechanical force generated by the rotation of the flat transport roller that rotates in contact with the horizontal direction only on the left and right edge portions of the substrate. Furthermore, since the transport roller has a simple structure as compared with other transport rollers, it can be manufactured at low cost.

The ultrasonic irradiator can also achieve the following effects.
A mechanical force such as vibration is applied to the contaminants adhering to the upper and lower surfaces of the substrate by ultrasonic waves emitted from ultrasonic irradiators placed above and below the substrate, and this is removed from the substrate surface. The substrate surface cleaning effect can be further improved by a synergistic effect with the chemical treatment with the chemical solution in the previous stage.

  In this case, a water film formed between the ultrasonic irradiator and the surface of the opposing substrate is used as a medium for propagating ultrasonic waves, instead of the conventional jet of water ejected from a nozzle. Because of the structure, the amount of water used can be reduced. Also, in contrast to the method in which the jet of water ejected from the nozzle is used as the ultrasonic propagation medium, the method in which the water film is used as the ultrasonic propagation medium allows the ultrasonic wave to propagate despite the small amount of water used. The region (area) can be increased, and the cleaning effect by ultrasonic waves can be further enhanced.

  In this case, the water that forms a water film between the ultrasonic irradiator and the surface of the opposing substrate is continuously supplied from a plurality of holes provided on the wall of the ultrasonic irradiator opposite to the substrate. , And smoothly flows along the surface of the substrate, so that the contaminants separated from the substrate surface can be smoothly carried away from the substrate surface.

  In the sponge roller cleaning processing unit, the substrate is supported in the vertical direction (gravity direction) by a plurality of sponge rollers that are in contact with the lower surface of the substrate, and includes a plurality of sponge rollers that are in contact with the upper surface of the substrate. Except for the part in contact with the sponge roller, the substrate is a flat cylindrical transport roller in which a plurality of edge portions on both the left and right sides of the substrate are arranged so as to sandwich the substrate from the horizontal direction, like the ultrasonic cleaning processing unit. Since it contacts only the cylindrical surface of the flat transport roller, both the upper and lower surfaces of the substrate do not contact the flat transport roller, and both the upper and lower surfaces of the substrate can be prevented from being contaminated by contact with the transport roller. .

The sponge roller cleaning processing unit can also provide the following effects.
In the sponge roller cleaning processing section, a plurality of sponge rollers are arranged so as to sandwich the substrate from above and below, and the mechanical force of the rotating sponge roller can remove contaminants on the top and bottom surfaces of the substrate. The cleaning effect of the lower surface can be further improved.

It is a center longitudinal cross-sectional view of the substrate processing apparatus which has an edge conveyance function of one Example of invention of this application. It is a perspective view of the loader part of the substrate processing apparatus. It is a perspective view which shows the state in which the board | substrate is conveyed by the conveyance roller in the loader part of the same substrate processing apparatus. It is the figure which looked at the liquid cutting | disconnection air knife used in the chemical | medical solution processing part of the same substrate processing apparatus from the front of the substrate. It is a center sectional view of a chemical solution processing part of the substrate processing device. It is a center sectional view of the ultrasonic cleaning processing part of the substrate processing device. It is a schematic cross-sectional view of the same ultrasonic cleaning processing unit. It is a center sectional view of a sponge roller cleaning processing part of the substrate processing apparatus. It is a center sectional view of a final rinse processing part and a drying processing part of the substrate processing device. It is a perspective view of the rinse process part of the same substrate processing apparatus. It is a perspective view of the unloader part of the substrate processing apparatus. It is a figure which shows a prior art example. It is a figure which shows another prior art example.

Next, a preferred embodiment of a substrate processing apparatus having an edge transfer function according to the present invention will be described in detail with reference to the drawings.
Processes for processing a substrate such as a semiconductor substrate or a liquid crystal substrate include a cleaning process for removing contaminants such as particles, an etching process for forming a circuit pattern, and a peeling process for removing a photoresist. The substrate processing apparatus having the edge transfer function of the invention is used in a cleaning process for removing contaminants such as particles.

(Outline configuration)
As shown in FIG. 1, a substrate processing apparatus 1 having an edge transfer function according to this embodiment includes a loader unit 2 for loading a substrate 11 into the apparatus, and functional water obtained by adding alkali (potassium carbonate K ₂ CO ₃ ) to hydrogen water. The surface of the substrate 11 is mechanically treated with a chemical treatment unit 3 for removing contaminants by spraying, an ultrasonic cleaning unit 4 for removing contaminants by irradiating ultrasonic waves from above and below the substrate 11, and a sponge-like sponge roller 26a. Sponge roller cleaning processing unit 5 for removing contaminants by rubbing, rinsing processing unit 6 for rinsing the previous stage with water shower from above and below substrate 11, final rinsing processing unit 7 for rinsing with water shower, A drying processing unit 8 for drying the substrate 11 using an air knife 27 and an unloader unit 9 for taking out the substrate 11 from the apparatus are roughly configured.
Below, each said part is demonstrated in detail, respectively.

(Loader section)
First, the loader unit 2 for loading the substrate 11 into the apparatus will be described with reference to FIGS.
As shown in FIG. 2, the board | substrate 11 is set in an apparatus from the upper part of an apparatus by the hand or the board | substrate throwing apparatus which is not shown in figure.
A plurality of substrates 11 descending from the upper part of the apparatus are arranged in the loader unit 2 on the left and right sides of the traveling direction of the substrate 11 and are tapered in two steps, and are transporting rollers having a tapered truncated cone shape. (Carrying roller with two-step taper) 12 is placed such that only the edge portions (end faces or corner portions) on both the left and right sides of the substrate 11 are in contact with the corner portion 15 where the two-step taper intersects.

The two-stage tapered transport roller 12 starts rotating when the apparatus is turned on. When the substrate 11 is placed on the transport roller 12 with the two-step taper, as shown in FIG. 3, the substrate 11 is transported to the right in FIG. 3 by the rotation of the transport roller 12 with the two-step taper. Move to 3.
Even if the substrate 11 moves to the next processing unit, the two-tapered transport roller 12 continues to rotate as long as the apparatus is turned on, but the substrate 11 is not taken out of the apparatus by the unloader unit 9 described later. When the two sheets are congested, the rotation of all the transport rollers including the transport roller 12 with the two-step taper stops.

The lower tapered surface of the corner portion 15 where the two-step taper of the transport roller 12 with the two-step taper intersects is opened with a certain angle with respect to the lower surface of the substrate 11. Since the tapered surface is opened at a certain angle with respect to the upper surface of the substrate 11, the upper and lower surfaces of the substrate 11 do not contact the transport roller 12 with the two-step taper.
Further, since the transport roller 12 with a two-step taper has a two-step taper and has a tapered truncated cone shape upward, the substrate 11 is set in the device from above the device by the loader unit 2. Sometimes, the transport roller 12 does not need to be retracted, and a mechanism for moving the transport roller 12 outward in the horizontal direction with respect to the substrate 11 is unnecessary.

(Chemical solution processing department)
Next, the chemical processing unit 3 will be described with reference to FIGS.
As shown in FIG. 5, the chemical processing unit 3 includes a liquid cutting air knife 17 and a plurality of transport rollers arranged on the left and right in the traveling direction of the substrate 11 and having V-shaped cuts on the roller surface circumference ( A V-grooved conveyance roller) 13 and a two-fluid nozzle 18 that sprays a chemical on the substrate 11 are disposed above the conveyance path of the substrate 11. In the present embodiment, the two-fluid nozzle 18 is disposed only above the transport path of the substrate 11, but may be additionally disposed below the transport path of the substrate 11 as necessary. The chemical solution is stored in the functional water storage tank 101 shown in FIG.
When the substrate 11 is moved from the loader unit 2 to the chemical solution processing unit 3, the substrate 11 is conveyed by a V-grooved conveyance roller 13. The substrate 11 is placed so that only the left and right edge portions of the substrate 11 are in contact with the V-shaped cut valley bottom 16 of the V-shaped grooved conveying roller 13.

  As shown in FIGS. 4 and 5, the liquid cutting air knife 17 is arranged at an appropriate interval so as to sandwich the substrate 11 from above and below at the boundary between the loader unit 2 and the chemical processing unit 3. The liquid cutting air knife 17 blows air from the nozzle at its tip toward the surface of the substrate 11 passing between the upper and lower nozzles, forms an air curtain, and sprays onto the substrate 11 by the chemical processing unit 3. It prevents that the chemical | medical solution which was made to flow backward on the said loader part 2 on the board | substrate 11 surface.

The substrate 11 is washed with a chemical solution sprayed from the two-fluid nozzle 18. In this embodiment, functional water obtained by adding alkali (potassium carbonate K ₂ CO ₃ ) to hydrogen water is used as the chemical solution. . This chemical solution is atomized in a mist form by the two-fluid nozzle 18 and permeates the contaminants attached to the substrate 11 to decompose and remove it.

When the apparatus is turned on, the V-grooved conveying roller 13 starts to rotate, and air is ejected from the liquid cutting air knife 17, and the operation is continued until the apparatus is turned off. The spraying of the chemical solution from the two-fluid nozzle 18 starts when the loader unit 2 detects the substrate 11, and the next substrate 11 is not detected even after the set time of the timer that starts at the same time as the substrate 11 is detected. In this case, the spraying of the chemical solution is stopped.
However, when the substrate 11 is not taken out of the apparatus by the unloader unit 9 described later and two sheets of paper are jammed, the rotation of all the transport rollers including the transport roller 13 with the V-shaped groove is stopped.

  In the V-grooved transport roller 13, the lower tapered surface of the V-shaped cut valley bottom 16 opens at a certain angle with respect to the lower surface of the substrate 11, and the V-shaped cut valley bottom 16 Since the upper tapered surface is opened at a certain angle with respect to the upper surface of the substrate 11, the upper and lower surfaces of the substrate 11 do not contact the V-grooved transport roller 13.

(Ultrasonic cleaning section)
Next, the ultrasonic cleaning processing unit 4 will be described with reference to FIGS.
As shown in FIG. 6, the ultrasonic cleaning processing unit 4 includes an ultrasonic irradiator 19 that irradiates ultrasonic waves toward the upper surface and the lower surface of the substrate 11 above and below the conveyance path of the substrate 11, respectively. One set or two sets (two sets in this embodiment) are arranged. The upper and lower ultrasonic irradiators 19 are arranged so as to face each other with the substrate 11 interposed therebetween.
In order to convey the substrate 11, a plurality of V-grooved conveyance rollers 13 similar to the chemical solution processing unit 3, which are arranged on the left and right in the traveling direction of the substrate 11, and the ultrasonic irradiator 19 are arranged in front and behind. A plurality of flat cylindrical transport rollers (flat transport rollers) 14 are provided.

  The inside of the ultrasonic irradiator 19 is divided into two boxes, and water close to the substrate 11 is poured from the water supply port 20, and the water filling the box faces the substrate 11 of the box. It ejects toward the substrate 11 from the plurality of holes 23 provided in the wall surface. A plurality of ultrasonic transducers 21 (three in this embodiment) are attached to the box far from the substrate 11.

The substrate 11 transported between the ultrasonic irradiators 19 disposed above and below the transport path of the substrate 11 is provided on the wall surface of the ultrasonic irradiator 19 disposed below the transport path facing the substrate 11. The water that is ejected from the plurality of holes 23 is held in a floating state.
At the same time, water is ejected from a plurality of holes 23 provided in the wall surface facing the substrate 11 of the ultrasonic irradiator 19 disposed on the upper side of the transport path, and the water ejected from above and below the substrate 11 A film 24 of water is formed between the upper and lower ultrasonic irradiators 19.

The ultrasonic wave 22 generated by the ultrasonic vibrator 21 of the ultrasonic irradiator 19 travels through the water filled in the box closer to the substrate 11, and is then formed between the substrate 11 and the ultrasonic irradiator 19. The light is transmitted to the surface of the substrate 11 through the water film 24 formed.
Contaminants on the surface of the substrate 11 are vibrated by the ultrasonic wave 22, peeled off from the surface of the substrate 11, and formed into a film 24 of water that smoothly flows along the surface of the substrate 11. It is carried away smoothly from the surface.

When the apparatus is turned on, a plurality of V-grooved conveyance rollers 13 arranged on the left and right in the traveling direction of the substrate 11 and the flat conveyance rollers 14 arranged before and after the ultrasonic irradiator 19 start rotating, At the same time, water injection into the ultrasonic irradiator 19 is started.
When the loader unit 2 detects the first substrate 11, the irradiation of the ultrasonic wave 22 is started, the rotation of the V-grooved conveyance roller 13 and the flat conveyance roller 14, the injection of water into the ultrasonic irradiator 19 and the ultrasonic wave. Irradiation 22 continues to operate until the device is turned off.
However, if the substrate 11 is not taken out from the apparatus by the unloader unit 9 described later and the two sheets are jammed, the rotation of all the conveyance rollers including the V-grooved conveyance roller 13 and the flat conveyance roller 14 is stopped. The irradiation of the ultrasonic wave 22 is also stopped.

Since the substrate 11 is transported by the V-grooved transport roller 13 at the entrance portion and the exit portion of the ultrasonic cleaning processing unit 4, both the upper and lower surfaces of the substrate 11 are in contact with the transport roller 13 like the chemical solution processing unit 3. Never do.
Further, in the portion that passes between the upper and lower ultrasonic irradiators 19, the substrate 11 is floated by the water ejected from the ultrasonic irradiators 19 disposed below the substrate conveyance path, while Since it is conveyed by the rotation of the flat cylindrical roller 14 that contacts only the edge portions on both sides from the horizontal direction, the upper and lower surfaces of the substrate 11 do not contact the conveyance roller 14.

(Sponge roller cleaning processing section)
Next, the sponge roller cleaning processing unit 5 will be described with reference to FIG.
As shown in FIG. 8, the sponge roller cleaning processing unit 5 includes two sponge rollers A 26 a and three sponge rollers B 26 b that are in contact with the upper surface of the substrate 11 above and below the transport path of the substrate 11. In addition, two sponge rollers A26a and five sponge rollers B26b, which are in contact with the lower surface of the substrate 11, are each provided with a sponge-like roller made of polyvinyl alcohol resin, which is called berclin.
In order to transport the substrate 11, a plurality of V-grooved transport rollers 13 similar to the chemical solution processing unit 3 and a flat transport similar to the ultrasonic cleaning processing unit 4 are arranged on the left and right in the traveling direction of the substrate 11. The rollers 14 are arranged respectively. The flat conveyance roller 14 is disposed between the rollers of the sponge roller.

Furthermore, in order to clean the surface of the substrate 11 and supply water to the sponge roller A 26a and the sponge roller B 26b, four sets of shower nozzles 25 are provided above the conveyance path of the substrate 11 and three sets are provided below. The upper and lower portions are alternately arranged so as to face the sponge roller A26a and the sponge roller B26b.
Further, as shown in FIG. 1, a sponge roller shower water circulation tank 102 for storing shower water and a sponge roller shower pump 104 for pumping water to the shower nozzle 25 are provided below the sponge roller cleaning processing unit 5. , Each is arranged.

The sponge roller A26a wetted by the shower of water rotates so that its roller surface is directed in the opposite direction to the traveling direction of the surface of the substrate 11, and mechanically rubs both the upper and lower surfaces of the substrate 11, 11 surface contaminants are removed. Further, the sponge roller B26b wetted by the shower of water rotates so that the circumferential speed thereof is the same as the traveling speed of the substrate 11 and the roller surface is directed in the same direction with respect to the traveling direction of the surface of the substrate 11. The traveling speed (feeding speed) of the substrate 11 to the sponge roller A26a is controlled.
The leading and trailing sponge rollers B26b also function to support the substrate 11 in the vertical direction (the direction of gravity) independently.

When the apparatus is turned on, a plurality of V-grooved conveyance rollers 13, flat conveyance rollers 14, sponge rollers A26a and sponge rollers B26b arranged on the left and right in the direction of travel of the substrate 11 start rotating, At the same time, the sponge roller shower pump 104 is actuated, and water injection from the shower nozzle 25 is started.
The water sprayed from the shower nozzle 25 returns to the sponge roller shower water circulation tank 102 provided at the lower part of the sponge roller cleaning processing unit 5, is pumped by the sponge roller shower pump 104, and is sprayed from the shower nozzle 25 again. The

The rotation of the V-grooved conveyance roller 13, the flat conveyance roller 14, the sponge roller A 26a and the sponge roller B 26b, and the water jet from the shower nozzle 25 continue to operate until the apparatus is turned off. .
However, if the substrate 11 is not taken out from the apparatus by the unloader unit 9 described later and the two sheets are jammed, the rotation of all the conveyance rollers including the V-grooved conveyance roller 13 and the flat conveyance roller 14 is stopped. The rotation of the sponge roller A26a and the sponge roller B26b is also stopped.

Since the substrate 11 is transported by the transport roller 13 with the V-shaped groove at the entrance portion and the exit portion of the sponge roller cleaning processing unit 5, both the upper and lower surfaces of the substrate 11 are in contact with the transport roller 13 as in the case of the chemical solution processing unit 3. Never do.
Further, the substrate 11 is subjected to mechanical cleaning by the sponge roller A 26 a, while being supported in the vertical direction (gravity direction) by the sponge roller A 26 a and the sponge roller B 26 b contacting the lower surface of the substrate 11, Since it is transported by the rotation of a flat cylindrical roller 14 that contacts only the edge portion from the horizontal direction, both the upper and lower surfaces of the substrate 11 are in contact with the transport roller 14 as in the ultrasonic cleaning processing unit 4. Never do.
In this case, the sponge roller B26b may also carry the conveyance force of the substrate 11, and the flat conveyance roller 14 may be left free.

(Rinse processing unit, drying processing unit)
Next, the rinsing and drying processing unit of the substrate 11 will be described with reference to FIGS.
As shown in FIG. 1, for rinsing the substrate 11, two processing chambers of a front-stage rinsing processing unit 6 and a rear-stage final rinsing processing unit 7 are provided, and after washing once by the front-stage rinsing processing unit 6, The final rinse treatment unit 7 at the subsequent stage performs finishing cleaning once again.
After the final rinse processing unit 7, a drying processing unit 8 is arranged.

In the rinsing and drying processing section of the substrate 11, a plurality of V-grooved transport rollers 13 similar to the chemical solution processing section 3 are arranged on the left and right of the traveling direction of the substrate 11 in order to transport the substrate 11. Yes.
Furthermore, a plurality of shower nozzles 25 for rinsing the substrate 11 are provided in the front-stage rinsing processing unit 6 and the rear-stage final rinsing processing unit 7, and the rinsing processing unit 6 is provided above and below the substrate transport path. In each of the three sets of final rinse treatment units 7, two sets of upper and lower shower nozzles 25 are arranged above and below the substrate transport path so that the water jets face each other.

  In the drying processing unit 8, air knives 27 for drying the substrate 11 are arranged above and below the conveyance path of the substrate 11, respectively, with their jets facing each other, and further dried. An ionizer 29 (see FIG. 1) for removing static electricity on the surface of the substrate 11 is disposed above the substrate transport path near the exit of the processing unit 8.

FIG. 9 shows the final rinse processing unit 7 and the processing unit of the part provided with the air knife 27 for drying the substrate 11 in a central sectional view thereof.
The front-stage rinsing processing unit 6 has the same structure as the final rinsing processing unit 7 shown in FIG. 9 except that the number of shower nozzles 25 for rinsing is different.

The rinsing is performed by shower water ejected from the shower nozzle 25 while the substrate 11 is conveyed by the V-grooved conveyance roller 13.
In drying, when the substrate 11 passes between the upper and lower air knives 27 while being transported by the V-shaped grooved transport roller 13, the air on the surface of the substrate 11 is blown off by air or nitrogen gas sprayed from the air knife 27. Is done by.
The dried substrate 11 moves to the unloader unit 9, but static electricity generated by friction with air or nitrogen gas blown on the surface of the substrate 11 during drying is generated in the substrate transport path near the outlet of the drying processing unit 8. It is removed by an ionizer 29 provided above.

When the apparatus is turned on, the V-grooved conveyance roller 13 in the rinsing processing unit 6 and the final rinsing processing unit 7 starts to rotate, and at the same time, the rinsing shower pump 105 (see FIG. 1) is activated, Water injection is started from the shower nozzle 25 in the processing unit 6 and the final rinse processing unit 7.
The water sprayed from the shower nozzle 25 returns to the rinse shower water circulation tank 103 provided at the lower part of the rinse treatment unit, is pumped by the rinse shower pump 105, and is sprayed from the shower nozzle 25 again.

The rotation of the V-grooved conveying roller 13 and the water jet from the shower nozzle 25 continue to operate until the apparatus is turned off.
However, when the substrate 11 is not taken out of the apparatus by the unloader unit 9 described later and two sheets of paper are jammed, the rotation of all the transport rollers including the transport roller 13 with the V-shaped groove is stopped.

Also in the drying processing unit 8, when the apparatus is turned on, the V-grooved conveyance roller 13 in the drying processing unit 8 starts rotating, and air or nitrogen gas is injected from the air knife 27 that dries the substrate 11. Be started. At the same time, the ionizer 29 starts to discharge.
The rotation of the V-grooved conveyance roller 13, the injection of air or nitrogen gas from the air knife 27, and the discharge of the ionizer 29 continue to operate until the apparatus is turned off.
However, when the substrate 11 is not taken out of the apparatus by the unloader unit 9 described later and two sheets of paper are jammed, the rotation of all the transport rollers including the transport roller 13 with the V-shaped groove is stopped.

Since the substrate 11 is transported by the transport roller 13 with the V-shaped groove, both the upper and lower surfaces of the substrate 11 do not come into contact with the transport roller 13 like the chemical solution processing unit 3.
FIG. 10 is a perspective view of the water shower portion of the rinsing section of the substrate processing apparatus 1, showing the positional relationship between the substrate 11, the shower nozzle 25, and the transport roller 13 with the V-shaped groove in three dimensions. Yes.

(Unloader part)
Next, the unloader unit 9 for taking out the substrate 11 from the apparatus will be described with reference to FIG.
Similarly to the loader unit 2, the unloader unit 9 includes a plurality of two-stage tapered transport rollers 12 arranged on the left and right in the traveling direction of the substrate 11. A stopper 28 with which the tip hits is arranged.

When the apparatus is turned on, the transport roller 12 with a two-step taper in the unloader unit 9 starts rotating.
The rotation of the two-tapered transport roller 12 continues to operate until the apparatus is turned off.
However, if the substrate 11 is not removed from the unloader unit 9 and the sensor of the first substrate 11 and the sensor of the second substrate 11 simultaneously detect each substrate 11, it is determined that the substrate is congested. All the conveyance rollers including the conveyance roller 12 with the step taper stop rotating.

  When the substrate 11 comes out of the drying processing unit 8, the substrate 11 is placed so that the left and right edge portions of the substrate 11 are in contact with the corner portion 15 where the two-step taper of the transport roller 12 with the two-step taper intersects. Then, it is transported into the unloader unit 9 and transported to a position where the tip of the substrate 11 hits the stopper 28.

The substrate 11 is taken out from the device by hand or by a substrate take-out device (not shown).
The lower tapered surface of the corner 15 where the two-step taper of the transport roller 12 with the two-step taper intersects is opened with a certain angle with respect to the lower surface of the substrate 11, and the upper tapered surface of the corner 15. However, since the upper surface of the substrate 11 is opened at a certain angle, the upper and lower surfaces of the substrate 11 do not come into contact with the transport roller 12 with the two-step taper. There is no need for the transport roller 12 to retreat.

(Effect of Example)
Since the substrate processing apparatus having the edge transfer function of the present embodiment is configured as described above and operates as described above, the following effects can be obtained.
In a plurality of processing units including the chemical processing unit 3, the rinsing processing unit 6, the final rinsing processing unit 7, and the drying processing unit 8, the substrate subjected to chemical processing with chemicals or rinsing processing with water is the first chemical processing step. In all the processing steps from the first drying processing step to the last drying processing step, a plurality of edge portions on both the left and right sides of the substrate 11 are arranged so as to sandwich the substrate 11 from the horizontal direction, and a V-shaped cut is made on the circumference of the roller surface. The conveying roller (conveying roller with V-shaped groove) 13 is held in contact with only the bottom of the V-shaped valley, and the tapered surface below the bottom of the V-shaped valley forms an angle with respect to the lower surface of the substrate 11. Since the upper tapered surface of the V-shaped valley bottom is opened at a certain angle with respect to the upper surface of the substrate 11, both the upper and lower surfaces of the substrate 11 are transported with the V-shaped groove. 13 But also the upper surface the lower surface of the substrate 11, it is possible to prevent contamination due to contact with the transport roller 13.
Further, the substrate 11 can be moved at high speed and stably by the mechanical force of the V-grooved transport roller 13 that rotates in contact with only the left and right edge portions of the substrate 11 from the horizontal direction.

In the chemical processing unit 3, the substrate 11 is washed with the chemical sprayed from the two-fluid nozzle 18. In this embodiment, alkali (potassium carbonate K ₂ CO ₃ ) is used as the chemical solution in hydrogen water. The added functional water is used, and this chemical solution is atomized by a two-fluid nozzle 18 into a mist, penetrates into contaminants attached to the substrate 11, and has the effect of decomposing and removing it. it can.

In the loader unit 2 and the unloader unit 9, the substrate 11 has a double-tapered upper direction in which a plurality of edge portions on the left and right sides of the substrate 11 are arranged so as to sandwich the substrate 11 from the horizontal direction. A tapered truncated cone-shaped transport roller (a transport roller having a two-step taper) 12 is held in contact with only a corner portion where the two-step taper intersects, and a taper surface below the corner portion is formed on the substrate 11. It opens with a certain angle with respect to the lower surface, and the upper tapered surface of the corner portion opens with a certain angle with respect to the upper surface of the substrate 11. The tapered conveying roller 12 is not contacted, and the upper surface and the lower surface of the substrate 11 can be prevented from being contaminated by contact with the conveying roller 12.
Further, the substrate 11 can be moved at high speed and stably by the mechanical force due to the rotation of the transport roller 12 with the two-step taper that rotates in contact with only the left and right edge portions of the substrate 11 from the horizontal direction. .

The transport roller 12 with a two-step taper can also have the following effects.
Since the transport roller 12 with the two-step taper has a truncated cone shape with a taper in two steps and tapering upward, when the substrate 11 is set in the apparatus from above the apparatus by the loader unit 2, In order to retract the transport roller 12, a mechanism for moving the transport roller 12 to the outside in the horizontal direction with respect to the substrate 11 is unnecessary, and the transport roller 12 can be manufactured simply and inexpensively.
Further, in the unloader unit 9, similarly to the loader unit 2, a retracting mechanism for the transport roller 12 with a two-step taper is unnecessary, and the processed substrate 11 can be easily taken out above the apparatus.

In the ultrasonic cleaning processing unit 4, the substrate 11 is held in a floating state and supported in a vertical direction (gravity direction) by water ejected from an ultrasonic irradiator 19 disposed below. Since the edge portions on both sides are in contact with only the cylindrical surface of a flat cylindrical transport roller (flat transport roller) 14 arranged so as to sandwich the substrate 11 from the horizontal direction, both the upper and lower surfaces of the substrate 11 are The flat conveyance roller 14 is not contacted, and the upper surface and the lower surface of the substrate 11 can be prevented from being contaminated by contact with the conveyance roller 14.
In addition, the substrate 11 can be moved at high speed and stably by the mechanical force generated by the rotation of the flat transport roller 14 that rotates in contact with the horizontal direction only at the left and right edge portions of the substrate 11. Furthermore, since the conveyance roller 14 has a simple structure as compared with other conveyance rollers, it can be manufactured at low cost.

The ultrasonic irradiator 19 can also provide the following effects.
The ultrasonic wave emitted from the ultrasonic irradiator 19 disposed above and below the substrate 11 applies mechanical force such as vibration to the contaminants adhering to the upper and lower surfaces of the substrate 11 and peels it from the substrate surface. The substrate surface cleaning effect can be further improved by a synergistic effect with the chemical treatment with the chemical solution in the previous stage. According to the experiment of the present inventor, the synergistic effect with this ultrasonic cleaning was particularly remarkable when chemical treatment was performed using alkaline water of Ph12.5.

In this case, as a medium for propagating ultrasonic waves, a water film 24 formed between the ultrasonic irradiator 19 and the surface of the opposing substrate 11 is used instead of a conventional jet of water ejected from a nozzle. Since the structure uses the water, the amount of water used can be reduced.
Further, in contrast to the method in which the jet of water ejected from the nozzle is used as an ultrasonic propagation medium, the method in which the water film 24 is used as an ultrasonic propagation medium propagates ultrasonic waves despite the small amount of water used. The region (area) to be applied can be increased, and the cleaning effect by ultrasonic waves can be further enhanced.

  In this case, the water that forms the water film 24 between the ultrasonic irradiator 19 and the surface of the opposing substrate 11 is a plurality of water provided on the wall surface of the ultrasonic irradiator 19 facing the substrate 11. Since the bubbles 23 are continuously ejected from the holes 23 and smoothly flow along the surface of the substrate 11, the contaminants peeled off from the substrate surface can be smoothly carried away from the substrate surface.

In the sponge roller cleaning processing unit 5, the substrate 11 is supported in the vertical direction (gravity direction) by the sponge roller A 26 a and the sponge roller B 26 b that are in contact with the lower surface of the substrate 11, and like the ultrasonic cleaning processing unit 4, Since the edge portions on both the left and right sides of the substrate 11 are in contact with only the cylindrical surface of the flat cylindrical transport roller 14 disposed so as to sandwich the substrate 11 from the horizontal direction, both the upper and lower surfaces of the substrate 11 are flat. There is no contact with the transport roller 14, and both the upper surface and the lower surface of the substrate 11 can be prevented from being contaminated by contact with the transport roller 14.
In addition, the substrate 11 can be moved at high speed and stably by the mechanical force generated by the rotation of the flat transport roller 14 that rotates in contact with the horizontal direction only at the left and right edge portions of the substrate 11. Furthermore, since the conveyance roller 14 has a simple structure as compared with other conveyance rollers, it can be manufactured at low cost.

The sponge roller cleaning processing unit 5 can also provide the following effects.
The sponge roller A26a wetted by the shower of water rotates so that its roller surface is directed in the opposite direction to the traveling direction of the surface of the substrate 11, and mechanically rubs both the upper and lower surfaces of the substrate 11, The contaminants on the surface of the substrate 11 can be removed and the cleaning effect on the upper and lower surfaces of the substrate 11 can be further improved. Further, the sponge roller B26b rotates so that the peripheral speed thereof is the same as the traveling speed of the substrate 11 and the roller surface is directed in the same direction with respect to the traveling direction of the surface of the substrate 11, and the sponge roller A26a of the substrate 11 is rotated. The traveling speed (feeding speed) to the section can be controlled.

(Summary of main effects of Examples)
Loader unit 2, chemical solution processing unit 3, ultrasonic cleaning processing unit 4, sponge roller cleaning processing unit 5, pre-stage rinsing processing unit 6, final rinse processing unit 7 constituting the substrate processing apparatus 1 having the edge transfer function of this embodiment. In each processing / operation unit of the drying processing unit 8 and the unloader unit 9, the transport rollers used to transport the substrate 11 are three types of transport rollers, i.e., 2 according to the contents of the processing / operation. A transport roller 12 with a step taper, a transport roller 13 with a V-shaped groove, and a flat transport roller 14 are appropriately used. Even if any transport roller is used, the transport rollers horizontally hold the substrate 11. A plurality of substrates 11 are arranged so as to be sandwiched from the direction, and the substrate 11 is transported by rotating in contact with only the left and right edge portions of the substrate 11 from the horizontal direction. A shall, Therefore, both the upper and lower surfaces of the substrate 11, never come into contact with such transport rollers, also the upper surface the lower surface of the substrate 11, it is possible to prevent contamination due to contact with these transport rollers.
In addition, the substrate 11 can be moved at high speed and stably by the mechanical force of these conveying rollers that rotate in contact with the horizontal direction only on the left and right edge portions of the substrate 11.

  The invention of the present application is not limited to the above embodiments, and various modifications can be made without departing from the scope of the invention.

DESCRIPTION OF SYMBOLS 1 ... Substrate processing apparatus, 2 ... Loader part, 3 ... Chemical solution processing part, 4 ... Ultrasonic cleaning process part, 5 ... Sponge roller cleaning process part, 6 ... Rinse process part, 7 ... Final rinse process part, 8 ... Drying process , 9 ... Unloader part, 11 ... Substrate, 12 ... Two-tapered transport roller, 13 ... V-grooved transport roller, 14 ... Flat transport roller, 15 ... Corner, 16 ... Valley bottom, 17 ... Liquid draining Air knife, 18 ... 2 fluid nozzle, 19 ... Ultrasonic irradiator, 20 ... Water supply port, 21 ... Ultrasonic vibrator, 22 ... Ultrasonic, 23 ... Hole, 24 ... Water film, 25 ... Shower nozzle, 26a ... sponge roller A, 26b ... sponge roller B, 27 ... air knife, 28 ... stopper, 29 ... ionizer, 101 ... functional water storage tank, 102 ... sponge roller shower water circulation tank, 03 ... rinse shower water circulation tank, 104 ... sponge roller for shower pump, 105 ... pump for the rinse shower.

Claims (4)

While moving the substrate such as liquid crystal, at least both the upper and lower surfaces of the substrate or only the upper surface is subjected to chemical treatment with chemicals, rinsing treatment with water, and drying treatment with a gas such as air or nitrogen gas blown from above and below the substrate. In the substrate processing apparatus provided with a plurality of processing units consisting of a chemical processing unit, a rinse processing unit, a drying processing unit, and before and after the plurality of processing units, respectively, a loader unit and an unloader unit,
The plurality of processing units are provided with V-shaped cuts on the roller surface circumference, which moves the substrate while contacting the edge portions on both the left and right sides of the substrate from the horizontal direction when viewed from the substrate transport direction. In addition, a plurality of transport rollers that do not contact the upper and lower surfaces of the substrate are disposed.
A substrate processing apparatus having an edge transfer function. The loader unit and the unloader unit have a two-stage tapered upper side that moves the substrate by contacting the left and right edge portions of the substrate from the horizontal direction when viewed from the substrate transport direction. A plurality of truncated cone-shaped conveyance rollers are arranged toward the
The transport roller has a structure in which the corners where the two-step taper intersects do not contact the upper and lower surfaces of the substrate by contacting the edge portions on the left and right sides of the substrate from the horizontal direction.
The substrate processing apparatus having an edge transfer function according to claim 1. An ultrasonic cleaning processing unit is further provided between the chemical solution processing unit and the rinse processing unit,
In the ultrasonic cleaning processing unit,
Ultrasonic irradiators that irradiate ultrasonic waves toward the upper surface and the lower surface of the substrate are respectively disposed above and below the conveyance path of the substrate so as to face each other with the substrate interposed therebetween,
The ultrasonic irradiator below holds the substrate in a floating state by water ejected from a plurality of holes provided on a wall surface facing the substrate, and forms a water film between the substrate and the substrate. The ultrasonic wave is propagated to the substrate surface through the water film,
The upper ultrasonic irradiator forms a water film with the substrate by water ejected from a plurality of holes provided in a wall surface facing the substrate, and passes through the water film to the substrate surface. It is structured to propagate ultrasonic waves,
A plurality of transport rollers that are flat cylindrical and that do not contact the upper and lower surfaces of the substrate, in contact with the edge portions on both the left and right sides of the substrate from the horizontal direction when viewed from the substrate transport direction. Arranged,
The substrate processing apparatus having an edge transfer function according to claim 1 or 2. A sponge roller cleaning processing unit is further provided between the chemical processing unit and the rinsing processing unit,
In the sponge roller cleaning processing section,
A plurality of sponge rollers are respectively disposed above and below the transport path of the substrate so as to be in contact with the upper and lower surfaces of the substrate,
A plurality of transport rollers that are flat cylindrical and that do not contact the upper and lower surfaces of the substrate, in contact with the edge portions on both the left and right sides of the substrate from the horizontal direction when viewed from the substrate transport direction. Arranged,
A substrate processing apparatus having an edge transfer function according to claim 1.

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