JP2015034359A - Method for processing fabric surface - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a method for processing a fabric surface capable of suppressing that one surface is modified when the other surface is irradiated with plasma for modification by using a spray type plasma processing apparatus.SOLUTION: The method for processing a fabric surface includes: disposing a fabric 10 outside of electrodes that generate plasma P; applying plasma P generated between the electrodes to the fabric 10 from the side of a first surface 11 while sucking the plasma P passing through a space in the fabric 10 from the side of a second surface 12 that is opposite from the first surface 11 of the fabric.

Description

  The present invention relates to a method for processing a fabric surface.

  For example, a fabric that has been processed so that the functions of the front and back sides are different from each other such that one side is a hydrophilic surface and the other side is water-repellent (hereinafter referred to as “fabrics having different functions on the front and back sides”. Are also known, and a method for obtaining a fabric having such different functions is also disclosed. For example, in Patent Document 1 (Japanese Patent Application Laid-Open No. 2001-288664), a fabric having a different function on both sides is obtained by performing plasma treatment on a fabric having one side coated with a paste and then removing the paste. A single-sided modification method that yields is disclosed. Patent Document 2 (Japanese Patent Laid-Open No. 4-370269) discloses that a fabric is subjected to a plasma treatment to impart hydrophilicity, and then one surface of the fabric is subjected to a chemical treatment such as a water repellent treatment. A processing method for obtaining a fabric having a different function is described.

  In the plasma processing methods shown in Patent Documents 1 and 2, both surfaces of the fabric put into the vacuum vessel are plasma-treated. For this reason, in order to obtain a fabric having front and back different functions, in the former method, one side of the fabric is coated with a glue before the plasma treatment, and in the latter method, one side of the fabric is treated after the plasma treatment. It is necessary to provide a process for performing chemical treatment on the surface. Providing these steps is not desirable in view of workability and cost. Therefore, by using a spray-type plasma processing apparatus used under atmospheric pressure as shown in Reference 3 (Japanese Patent Laid-Open No. 2001-159074), only the surface irradiated with plasma (one surface) is selectively modified. A method of quality is disclosed.

JP 2001-288664 A JP-A-4-370269 JP 2001-159074 A

  However, in the above-described conventional method using a spray type plasma processing apparatus, there may be a modification effect even on a plasma non-irradiated surface that has not been irradiated with plasma. There will be no functional difference between the two.

  Accordingly, an object of the present invention is to provide a fabric capable of suppressing the modification of the other surface when one surface of the fabric is modified by irradiating with plasma using a spray type plasma processing apparatus. The object is to provide a method of processing a surface.

  As a result of intensive studies, the inventors of the present application have found a reason why the expected effect cannot be obtained by the above-described conventional method using a spray type plasma processing apparatus. That is, a part of the plasma active species from the plasma irradiation part passes through the gap of the fabric, and the plasma active species passing through this stays in the vicinity of the surface opposite to the irradiation surface of the fabric, so that the opposite side to the irradiation surface of the fabric It has been found that this aspect is improved.

  Then, the processing method of the surface of the cloth concerning one side of the present invention arranges cloth on the outside between the electrodes which generate plasma, and irradiates the plasma generated between the electrodes from the second surface side of the cloth, Plasma that passes through the gap of the fabric is sucked from the first surface side to the first surface that is the surface opposite to the second surface from the second surface.

  In this fabric surface processing method, since the plasma generated between the electrodes is irradiated to the fabric disposed outside the electrodes, the second surface (one surface) of the fabric can be selectively irradiated with plasma. it can. Further, since the plasma passing through the gap of the fabric from the second surface to the first surface is sucked from the first surface side, the plasma active species passing through the gap of the fabric is the surface opposite to the irradiation surface of the fabric. It can suppress staying in the vicinity of the other surface. Thereby, it can suppress that the 1st surface of a fabric is plasma-processed. As a result, it is possible to suppress the modification of the first surface when the second surface of the fabric is modified by irradiating the plasma using the spray type plasma processing apparatus.

  Note that the suction of plasma from the first surface side is not limited to the suction of only the plasma passing through the gap, and all of the plasma that sucks the plasma together with other gases or passes through the gap. Instead of sucking a part of the plasma.

  In one embodiment, a region for sucking plasma may be set so as to include a region for plasma irradiation.

  In this fabric surface processing method, plasma treatment of the first surface of the fabric can be further suppressed.

  In one embodiment, the plasma suction flow rate may be set to be equal to or higher than the plasma irradiation flow rate.

  In this fabric surface processing method, plasma treatment of the first surface of the fabric can be further suppressed.

  In one embodiment, the plasma irradiation region and the plasma suction region may be moved relative to the fabric.

  In this fabric surface processing method, fabrics having different front and back functions can be obtained continuously.

  According to the present invention, the first surface (the other surface) is modified when the second surface (one surface) of the fabric is modified by irradiating plasma using the spray type plasma processing apparatus. It can be suppressed.

It is a schematic block diagram of the surface processing apparatus which enforces the surface processing method of the fabric which concerns on one Embodiment. It is the schematic block diagram which showed an example of the plasma irradiation apparatus shown in FIG. It is a schematic block diagram of the continuous surface processing apparatus which implements the surface processing of the fabric which concerns on one Embodiment continuously. It is a schematic block diagram of the surface processing apparatus which enforces the surface processing method of the fabric which concerns on other embodiment. It is a schematic block diagram of the surface processing apparatus which enforces the surface processing method of the fabric which concerns on other embodiment.

  Hereinafter, an embodiment for carrying out a surface treatment method for a fabric will be described with reference to the drawings. In the description of the drawings, the same elements are denoted by the same reference numerals, and redundant description is omitted. The dimensional ratios in the drawings do not necessarily match those described.

  FIG. 1 is a schematic configuration diagram of a surface processing apparatus 1 that performs a surface processing method for a fabric 10 according to an embodiment. FIG. 2 is a schematic configuration diagram illustrating an example of the plasma irradiation apparatus 20. In the fabric surface processing method according to one embodiment, the fabric 10 is disposed outside the electrodes (discharge generating electrode 21 and counter electrode 23) that generate plasma, and the second surface (one surface) 12 of the fabric. While irradiating the plasma P generated between the electrodes from the side and sucking the plasma P passing through the gap of the fabric 10 from the first surface 11 side opposite to the second surface 12 of the fabric 10, the fabric The second surface 12 of 10 is subjected to plasma treatment. The outside of the electrode that generates plasma means the outside of the region sandwiched between the discharge generating electrode 21 and the counter electrode 23 that generate plasma.

  As shown in FIG. 1, the surface processing apparatus 1 includes a plasma irradiation device 20 that irradiates the fabric 10 with plasma P, and a suction device 30 that sucks the plasma P that passes through the gap between the fabrics 10. The irradiation port 20a and the suction port 30a are arranged so as to face each other with an interval that allows the fabric 10 to pass therethrough. The planar shape in the direction orthogonal to the irradiation and suction directions of the irradiation port 20a and the suction port 30a may be circular or rectangular. Further, the long side may be a rectangle extending in the depth direction shown in FIG.

  In such a surface processing apparatus 1, the fabric 10 is disposed between the plasma P irradiation port 20a and the plasma P suction port 30a so that the plasma P can be sucked from the suction port 30a. P is irradiated. Thereby, the 2nd surface 12 of the fabric 10 is plasma-processed. That is, plasma active species are generated on the second surface 12 of the fabric 10.

  In the plasma treatment in the present embodiment, the second surface of the fabric 10 in which the plasma P generated between the atmospheric pressure plasma generation electrodes (the discharge generation electrode 21 and the counter electrode 23) is disposed outside the atmospheric pressure plasma generation electrode. 12 is performed.

The plasma irradiation apparatus 20 includes a discharge generating electrode 21, a counter electrode (ground potential) 23, and a high-frequency power source 27. The discharge generating electrode 21 and the counter electrode 23 are arranged with a discharge space 25 for introducing a plasma generating gas (for example, N ₂ gas and Ar gas). The high frequency power supply 27 applies a high frequency voltage to the discharge generating electrode 21. The plasma irradiation apparatus 20 has an irradiation port 20 a that can irradiate the second surface 12 of the fabric 10 with the plasma P generated in the discharge space 25 by applying a high frequency voltage to the discharge generating electrode 21. .

  Conditions for plasma treatment using the plasma irradiation apparatus 20 (flow rate, irradiation distance, irradiation speed, etc.) are not particularly limited, and characteristics of the plasma irradiation apparatus 20 and types of the fabric 10 (material, thickness, density, etc.) It can be set appropriately according to the above.

Examples of the gas used for generating the plasma P (gas supplied to the discharge space between the plasma generating electrodes) include N ₂ gas and Ar gas. An example of the input power is about 10 W to 10 kW (frequency about 10 kHz to 10 GHz). The pressure of the gas used to generate plasma P during discharge is about atmospheric pressure. The flow rate of the gas used for generating the plasma is not particularly limited and can be set as appropriate.

  The method for irradiating the fabric 10 with the plasma P generated in the plasma irradiation apparatus 20 is not particularly limited. For example, it is possible to irradiate the fabric 10 placed in a place away from the irradiation port 20a by about 1 mm to 10 cm, preferably about 1 to 30 mm.

  Returning to FIG. 1, the suction device 30 is a portion that sucks the plasma P that passes from the second surface 12 side to the first surface 11 side through the gap of the fabric 10, and the first surface of the fabric 10. 11 is provided with a suction port 30a disposed opposite to 11.

  Conditions for sucking plasma P using the suction device 30 (flow rate, suction distance, suction speed, etc.) are not particularly limited, and characteristics of the suction device 30 and types of the fabric 10 (material, thickness, density, etc.) It can be set appropriately according to the above.

  Here, in the plan view seen from the thickness direction of the fabric 10, it is preferable that the region 10b for sucking the plasma P is set so as to completely include the region 10a irradiated with the plasma P (see FIG. 1). Moreover, it is preferable that the suction flow rate of the gas sucked from the first surface 11 side of the fabric 10 is set to be equal to or higher than the flow rate of the plasma P irradiated to the second surface 12 of the fabric 10.

  Examples of the fabric 10 include woven and knitted fabrics and non-woven fabrics. The fabric 10 used in this embodiment may be either hydrophilic or hydrophobic, but is preferably a hydrophobic fiber. Examples of hydrophobic fibers include polyester-based, polyamide-based, polypropylene-based, and polyacrylic-based synthetic fibers. Examples of hydrophilic fibers include cotton, hemp, silk, wool and the like. In the case where hydrophilic fibers are used, it is desirable to perform a water repellent treatment. When the surface processing apparatus 1 that performs the surface processing method of the fabric 10 according to an embodiment is used for the fabric 10 that has been subjected to such a process, the first surface 11 and the second surface 12 The difference in functions can be particularly increased.

As the woven or knitted fabric or nonwoven fabric, a woven or knitted fabric or nonwoven fabric that is a blend of hydrophobic fibers and hydrophilic fibers can also be used. Examples of such woven and knitted fabrics and nonwoven fabrics include a blend of polyester fibers and cotton. Although the fabric weight of a woven / knitted fabric and a nonwoven fabric is not specifically limited, Usually, it is about 20-500 g / m < ² >.

    The thickness of the fabric 10 used in the present embodiment is not particularly limited, and may be a relatively thin fabric 10. The thickness of the fabric 10 is usually about 20 to 5,000 μm. The thickness of the fiber used in the present embodiment is not particularly limited, but is usually about 7 to 400 denier.

  Next, a method for continuously performing the surface processing of the fabric 10 according to the embodiment will be described. FIG. 3 is a schematic configuration diagram of the continuous surface processing apparatus 3 that continuously performs the surface processing of the fabric 10 according to the embodiment. The continuous surface processing apparatus 3 is configured by adding a transport mechanism 40 to the surface processing apparatus 1 described above. The transport mechanism 40 includes an attachment roller 41, a transport roller 43, and a take-up roller 47.

  The attachment roller 41 is a roller for attaching the wound fabric 10 before being plasma-treated. The take-up roller 47 is rotated by a driving force such as a motor, and takes up the plasma-treated fabric 10. The transport roller 43 is appropriately provided to form a transport path from the attachment roller 41 to the take-up roller 47.

  The winding speed (feeding speed) of the fabric 10 when performing the continuous treatment can be appropriately set according to the type of the fabric 10, the irradiation flow rate, the high frequency power, etc., but is usually about 50,000 mm / min or less. Preferably, it is about 10,000 mm / min or less. By such continuous processing of the fabric 10, plasma active species are generated on the entire second surface 12 of the fabric 10.

  In the fabric surface processing method of the above-described embodiment, the plasma P generated between the electrodes (between the discharge generating electrode 21 and the counter electrode 23 shown in FIG. 2) is irradiated to the fabric 10 arranged outside the electrodes. The plasma P can be selectively irradiated to the second surface 12 of the fabric 10.

  Moreover, in the processing method of the fabric surface of the said embodiment, since what is called an atmospheric pressure blowing type plasma irradiation apparatus is used, it is not necessary to evacuate the inside of an apparatus. For this reason, the process and equipment for evacuating are not required, and the continuous processing of the surface of the fabric 10 can be easily performed. Since processing on the surface of the fabric 10 is continuously performed, the surface processing apparatus 1 (continuous surface processing apparatus 3) can be downsized, and processing is easy regardless of the size (length) of the fabric 10 and the like. And can be performed efficiently.

  Further, in the processing method of the fabric surface of the above embodiment, the plasma P passing through the gap of the fabric 10 is sucked from the first surface side 11, so that the plasma active species passing through the gap of the fabric 10 is the plasma irradiation surface. It can suppress staying in the 1st surface 11 vicinity which is a surface on the opposite side to the 2nd surface 12. Thereby, it can suppress that the 1st surface 11 of the fabric 10 is plasma-processed. As a result, the surface of the first surface 11 is prevented from being modified when the second surface 12 of the fabric is irradiated with plasma and modified (processed) using a spray-type plasma processing apparatus. can do.

  Next, the fabric 10 is disposed outside the electrodes 21 and 23 for generating plasma, and the plasma P is irradiated from the second surface 12 side of the fabric 10 and the plasma P passing through the gap of the fabric 10 is applied to the fabric 10. The point which can suppress that the 1st surface 11 is modified | reformed by attracting | sucking from the 1st surface 11 side is demonstrated based on Example 1 and Comparative Example 1. FIG. In addition, this invention is not limited to Example 1 shown below.

The following base materials were prepared as fabrics used in Example 1 and Comparative Example 1.
Base material: Polyester taffeta (weave basis weight 55 g / m ² Weft density: 104 pieces / inch, width 90 pieces / inch)

  Next, the contact angles when water droplets were dropped on the front surface (second surface) and the back surface (first surface) were measured, and the water repellency on the front surface and the back surface was evaluated. That is, the water repellency on the front surface and the back surface of the substrate before the predetermined processing was evaluated. The contact angle was measured using a fully automatic contact angle meter (DM-700) manufactured by Kyowa Interface Science Co., Ltd. As a result, as shown in Table 1 below, the contact angle between the front surface and the back surface was 105 °. That is, the fabrics used in the examples and comparative examples themselves do not have different functions.

Example 1
With respect to the base material conveyed at a speed of 3,000 mm / min, suction is performed from the first surface 11 side under the conditions shown in Table 1 below (gas flow rate: 5 L / min / 1 mmΦ, irradiation distance: 3 mm) from the back surface side. Then, the surface side of the fabric was hydrophilized by irradiating plasma from the surface side under the conditions shown in Table 1 below (gas flow rate: 5 L / min / 1 mmΦ, irradiation distance: 3 mm). Damage-free plasma PF-DFMJ (manufactured by Plasma Factory) was used as the plasma irradiation apparatus. At this time, in a plan view viewed from the thickness direction of the base material, the region sucked by the suction device was set so as to completely include the region irradiated with plasma by the plasma irradiation device. Here, the gas used for plasma generation (the gas supplied to the discharge space between the plasma generation electrodes) is N ₂ gas.

  With respect to the base material that was irradiated with plasma from the front surface side and sucked from the back surface side under the above-described conditions, each contact angle when water droplets were dropped on the front surface and the back surface was measured. The contact angle was measured using a fully automatic contact angle meter (DM-700) manufactured by Kyowa Interface Science as described above. As a result, as shown in Table 2 below, the contact angle on the front surface was 61.2 °, the contact angle on the back surface was 96.4 °, and the contact angle difference was 35.2 °.

(Comparative Example 1)
Next, the substrate was irradiated with plasma under the same conditions as in Example 1 except that suction from the back surface side was not performed on the substrate conveyed at a speed of 3,000 mm / min. And the contact angle difference between the front surface and the back surface was measured by the same measurement method as in Example 1 for the substrate irradiated with plasma, that is, the fabric whose surface side was hydrophilized. As a result, as shown in Table 2 below, the contact angle on the front surface was 57.1 °, the contact angle on the back surface was 80.6 °, and the contact angle difference was 23.5 °.

  As mentioned above, according to the said Example 1 and the comparative example 1, the direction (Example 1) which irradiates the plasma from the surface side in the state attracted | sucked from the back side only irradiates the plasma from the surface side (Comparative example 1) It was found that the change of the contact angle on the back surface of the fabric, that is, the effect of the modification can be suppressed compared to

  As mentioned above, although one embodiment and one Example were described, this invention is not limited to the said embodiment and Example, A various change is possible in the range which does not deviate from the meaning of invention.

  In the said embodiment, although the example which applied the attraction | suction apparatus 30 was given and demonstrated as a method of attracting | sucking the plasma which passes the fabric 10, this invention is not limited to this. For example, instead of the suction device 30, an object 130 containing a radical scavenger as shown in FIG. 4 is opposed to the first surface 11 that is the surface opposite to the second surface 12 that is the plasma irradiation surface. You may arrange in the position to do. Thereby, since the plasma active species passing through the fabric 10 is attracted by the radical scavenger, it is suppressed that the plasma active species stays in the vicinity of the first surface 11 of the fabric 10 and the first surface 11 of the fabric is plasma-treated. Can be suppressed. As a result, when the plasma irradiation apparatus 20 is used to modify the second surface 12 of the fabric 10 by irradiating with plasma, the first surface 11 can be prevented from being modified.

  Examples of the object 130 containing a radical scavenger include a film containing an antioxidant (such as a hindered phenol-based antioxidant). As shown in FIG. 4, the film containing the antioxidant may be disposed at a position facing the first surface 11 with a predetermined distance, or disposed so as to be in contact with the first surface 11. Also good. Further, as shown in FIG. 5, the film may be transported together with the fabric 10 while being in contact with the first surface 11 of the fabric 10. In this case, since the plasma active species is more reliably attracted by the film containing the radical scavenger, it is possible to further suppress the plasma treatment of the first surface 11 of the fabric.

  In the above embodiment, the plasma irradiation apparatus 20 as shown in FIG. 2 has been described as an example of the plasma irradiation apparatus that selectively irradiates the second surface 12 of the fabric 10 with the plasma P. However, the present invention is not limited thereto. For example, the following blow-out type plasma irradiation apparatus can be used. That is, for example, in the plasma irradiation apparatus 20 configured as described above, the counter electrode 23 is formed in a cylindrical shape so as to surround the discharge generating electrode 21, and a nozzle-shaped outlet is provided at one end thereof. An irradiation device can also be used. If such a plasma irradiation apparatus is used, plasma processing can be performed in a spot manner.

  In the said embodiment, although the example which moves the fabric 10 by the conveyance mechanism 40 was given and demonstrated, it is not limited to this, The surface processing of the fabric 10 is continuously performed by moving the surface processing apparatus 1. FIG. May be implemented.

  Although the said embodiment demonstrated the method of implementing the surface processing of the fabric 10 continuously, the following processes may be implemented as a post process of this surface processing. That is, when performing the above surface processing on the base fabric to be the adhesive interlining, it may include a step of manufacturing a clothing fabric by bonding the surface to the surface processed adhesive interlining. When the above surface processing is performed on the base fabric that becomes the adhesive interlining, the adhesion is improved by performing plasma processing on the surface (the other surface) that becomes the adhesive layer. As a result, the adhesive strength between the adhesive interlining and the outer surface can be increased. For example, the adhesive strength of a polyester taffeta having a contact angle of 105 ° without plasma treatment was 1.5 N / in, whereas the adhesive strength of a polyester taffeta having a contact angle of 78 ° was 8.0 N / in, The adhesive strength of the polyester taffeta with a contact angle of 63 ° was 9.8 N / in.

  Further, instead of the above-described process of manufacturing the clothing fabric, chemical treatment may be performed on the fabric that is selectively modified on one side (the second side 12 in the above embodiment). For example, after the plasma treatment step described in the upper part, the method further includes a polymerization step of bringing the second surface 12 of the fabric irradiated with the plasma active species into contact with a radical polymerizable monomer to perform graft polymerization. It may be. The contact between the second surface 12 of the fabric having the plasma active species and the monomer may be performed under atmospheric pressure, or may be performed after the second surface 12 of the fabric 10 is vacuum degassed in advance. Also good. Moreover, the graft polymerization reaction with respect to the 2nd surface 12 of a fabric can be performed by the method conventionally used, for example, you may carry out by any of a gas phase reaction and a liquid phase reaction (an immersion method, an impregnation method, etc.). . The graft polymerization reaction can be performed by spraying a polymerizable monomer onto the second surface 12 of the fabric.

  DESCRIPTION OF SYMBOLS 1 ... Surface processing apparatus, 3 ... Continuous surface processing apparatus, 10 ... Fabric, 11 ... 1st surface, 12 ... 2nd surface, 20 ... Plasma irradiation apparatus, 20a ... Irradiation port, 21 ... Electrode for discharge generation, 23 Reference electrode, 25 ... discharge space, 27 ... high frequency power supply, 30 ... suction device, 30a ... suction port, 40 ... transport mechanism, 41 ... mounting roller, 43 ... transport roller, 47 ... take-up roller, P ... plasma.

Claims (4)

  A fabric is arranged outside the electrodes that generate plasma, and the plasma generated between the electrodes is irradiated from the second surface side of the fabric, and the second surface is the second surface. A method for processing a fabric surface, wherein the first surface, which is the opposite surface, is sucked from the first surface side with the plasma passing through the gap of the fabric. A region for sucking the plasma is set so as to include the region to be irradiated with the plasma;
The processing method of the fabric surface of Claim 1. The plasma suction flow rate is set to be equal to or higher than the plasma irradiation flow rate.
The processing method of the fabric surface of Claim 1 or 2. Moving the plasma irradiation region and the plasma suction region relative to the fabric;
The processing method of the fabric surface as described in any one of Claims 1-3.

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