JP2015015289A - Method for manufacturing printed-wiring board - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a method for manufacturing a printed-wiring board which has high adhesion strength between an insulating substrate or a solder and a connection and high strength of a solder resist layer, and in which a smear is surely removed.SOLUTION: A method for manufacturing a printed-wiring board includes: a step (A1) in which a first solder resist layer 3-1 is formed; a step (B1) in which the first solder resist layer is thinned and a part of a conductor wiring is exposed; a step (C1) in which the whole surface of the first solder resist layer is exposed; a step (A2) in which a second solder resist layer 3-2 is formed; a step (C2) in which portions other than a region to be developed are exposed to the second solder resist layer; a step (D1) in which the second solder resist layer of an unexposed part is removed; a step (A3) in which a third solder resist layer 3-3 is formed; a step (C3) in which the portions other than the region to be developed are exposed to the third solder resist layer; and a step (D2) in which the third solder resist layer of the unexposed part is removed.

Description

  The present invention relates to a method for manufacturing a printed wiring board, and more particularly, to a method for manufacturing a printed wiring board suitable for mounting a semiconductor element by flip chip connection.

  2. Description of the Related Art Conventionally, there is known a printed wiring board having a circuit board having a connection portion formed on an insulating substrate and having a surface insulating layer made of a solder resist layer provided on the surface of the circuit board.

  Then, a connection portion such as a bump or a ball pad is provided on the surface of the printed wiring board, and an electronic component, another printed wiring board, or the like is connected via a solder ball disposed on the connection portion such as the bump or the ball pad. It is generally done. Note that the bump or ball pad has an SMD (Solder Mask Defined) structure formed by partially removing the surface insulating layer and exposing all or part of the connection portion, and the surface insulating layer partially. There is an NSMD (Non Solder Mask Defined) structure that is produced by completely removing the conductive circuit existing under the surface insulating layer.

  In the SMD structure, since the periphery of the connection portion is covered with a surface insulating layer, in order to securely fix the electrical connection between the electrode terminal of the electronic component and the corresponding connection portion, It is necessary to ensure the amount of solder necessary for the joint formed on the exposed surface. Therefore, since the connection pad is increased in size, it has become difficult to meet the demand for higher density of the connection portion accompanying the downsizing and higher performance of electronic components. On the other hand, in the NSMD structure, the surface insulating layer near the periphery of the connection portion is completely removed, and the side surface of the connection portion is completely exposed. Adhesive strength can be ensured. On the other hand, in the NSMD structure, the surface insulating layer near the periphery of the connection portion is completely removed, and the side surface of the connection portion is completely exposed, which may reduce the adhesive strength between the connection portion and the insulating substrate. There is.

  In order to solve such an adhesive strength problem, an opening having a depth of about 0 to 15 μm is formed in a part of the solder resist layer provided on the surface of the circuit board by laser light irradiation, so that one side surface of the connection portion is formed. A printed wiring board having a structure in which a portion is exposed from a solder resist layer and a manufacturing method thereof have been proposed (see, for example, Patent Document 1). By using the printed wiring board of Patent Document 1, the adhesive strength between the connecting portion and the insulating substrate is improved as compared with the printed wiring board in which the connecting portion existing under the solder resist layer is completely exposed. It becomes possible.

  As a method of mounting a semiconductor element on a connection pad, there is a method by flip chip connection. The flip-chip connection means that a part of a connection pad for connecting a semiconductor element provided on a wiring board is exposed corresponding to the arrangement of electrode terminals of the semiconductor element, and the exposed portion of the connection pad for connecting the semiconductor element and the above-mentioned It means that the electrode terminals of the semiconductor element are opposed to each other and are electrically connected via solder bumps or copper bumps.

  In a printed wiring board in which a semiconductor element is flip-chip connected on a circuit board, the gap between the semiconductor element and the circuit board is filled with an underfill (sealing resin) to ensure connection reliability between the semiconductor element and the circuit board. To reinforce. In order to ensure the reinforcing effect, a sufficient amount of underfill must be injected into the gap between the semiconductor element and the circuit board. However, when the flip-chip connection is performed using the printed wiring board obtained by Patent Document 1, when the underfill is injected enough to ensure the reinforcing effect, the underfill may be a gap between the semiconductor element and the circuit board. In some cases, it overflowed to the surroundings and adversely affected the electrical operation.

  By laser processing to the solder resist layer, it is possible to form a dam shape to prevent the underfill from overflowing to the surroundings, but in forming the opening to the solder resist layer using a laser, A phenomenon occurs in which the components (smear) of the solder resist layer are not decomposed and removed and remain on the periphery of the opening, the bottom, and the connection. If such smear remains, the bonding strength between the connecting portion and the solder becomes insufficient, and a problem occurs in the connection reliability between the printed wiring board and the electronic component. In order to avoid such problems, a process of removing this smear (desmear process) is usually required.

  As such a desmear process, a wet method using a chemical solution is used. Generally, after smear is swollen with a concentrated alkaline solution, the smear is decomposed and removed by a permanganate solution.

  However, if the desmear is surely carried out by such a method, the surface of the solder resist layer in contact with these chemicals is roughened, so that the strength of the solder resist layer is reduced, and the printed wiring board. In some cases, sufficient reliability could not be ensured. On the other hand, if this roughening phenomenon is to be suppressed, there is a problem that smear cannot be reliably removed.

  In the method of forming the opening and the dam shape in the solder resist layer, after forming the solder resist layer on the circuit board having the conductor circuit, the partial exposure is performed, and then the unexposed portion is developed and processed. Forming a dam shape by forming an opening that partially exposes the upper part of the connection part, then performing a second partial exposure, and then thinning the unexposed part of the second partial exposure by desmearing. It is disclosed (for example, see Patent Document 2). Since the opening of the solder resist layer by this method has an SMD structure, and the vicinity of the connection portion is covered with a surface insulating layer, the electrical connection between the electrode terminal of the electronic component and the corresponding connection portion is electrically connected. It is difficult to securely fix the connection, and the electrical connection between the connecting portion and the solder ball may be insufficient. Moreover, since the dam shape is formed by the desmear process by this method, the strength of the solder resist layer is lowered by roughening the solder resist layer, and the reliability of the printed wiring board is sufficient. In some cases, it could not be secured.

  In the method of forming the opening and the dam shape in the solder resist layer, after forming the solder resist layer on the circuit board having the conductor circuit, the partial exposure is performed, and then the unexposed portion is developed and processed. After forming an opening that completely exposes the connection portion, and then forming a second solder resist, a second partial exposure is performed in which an unexposed portion that is one size larger than the first partial exposure region is generated. Then, a method of forming a dam shape by developing an unexposed portion is disclosed (for example, see Patent Document 3). The opening of the solder resist layer by this method has an NSMD structure, and the connection portion is completely removed of the surface insulating layer in the vicinity thereof, and the side surface of the connection portion is completely exposed, so that the connection portion and the insulating substrate There is a risk that the adhesive strength between the two will decrease.

  In the method of forming the opening and dam shape in the solder resist layer, after forming the solder resist layer on the circuit board having the conductor circuit, the partial exposure process is performed, and then the solder resist layer in the unexposed portion is thinned. Discloses a method of forming an opening and a dam shape in a solder resist layer (see, for example, Patent Document 4). Since the opening of the solder resist layer by this method has an SMD structure, and the vicinity of the connection portion is covered with a surface insulating layer, the electrical connection between the electrode terminal of the electronic component and the corresponding connection portion is electrically connected. It is difficult to securely fix the connection, and the electrical connection between the connecting portion and the solder ball may be insufficient.

Japanese Patent No. 3346263 JP 2012-238668 A JP 05-226505 A JP 2011-77191 A

  A method of manufacturing a printed wiring board that has high adhesion strength between the connecting part and the insulating substrate and between the connecting part and solder, no electrical malfunction due to underfill outflow, high solder resist layer strength, and smear has been reliably removed. It is an object of the present invention to provide.

  As a result of intensive studies to solve the above problems, the present inventors have found that the following invention can solve the problem.

In a method of manufacturing a wiring board having a circuit board in which conductor wiring is formed on an insulating substrate, having a solder resist layer on the surface of the circuit board, and a part of the conductor wiring being exposed from the solder resist layer,
(A1) a step of forming a first solder resist layer on the circuit board;
(B1) The first solder resist layer is thinned by the thinning treatment solution until the thickness of the conductor wiring is equal to or less, and a part of the conductor wiring is exposed,
(C1) Step of exposing the entire surface of the first solder resist layer completed up to step (B1),
(A2) A step of forming a second solder resist layer on the circuit board on which the first solder resist layer completed up to step (C1) is formed,
(C2) a step of exposing a portion other than the region to be developed in the step (D1), which is a subsequent step, to the second solder resist layer;
(D1) the step of removing the second solder resist layer in the unexposed area with a developer;
(A3) The step of forming the third solder resist layer on the circuit board on which the first solder resist layer and the second solder resist layer are formed, completed up to the step (D1).
(C3) a step of exposing a portion other than the region to be developed in step (D2), which is a subsequent step, to the third solder resist layer;
(D2) a step in which the third solder resist layer in the unexposed area is removed with a developer;
A method of manufacturing a wiring board, comprising:

  A method of manufacturing a printed wiring board that has high adhesion strength between the connecting part and the insulating substrate and between the connecting part and solder, no electrical malfunction due to underfill outflow, high solder resist layer strength, and smear has been reliably removed. Can be provided.

It is explanatory drawing which shows the cross-section of the printed wiring board manufactured by this invention. It is explanatory drawing which shows an example of the manufacturing method of the printed wiring board by this invention. It is a schematic sectional drawing which shows an example of the circuit board which can be manufactured by this invention.

  The printed wiring board manufactured by this invention is demonstrated using drawing. First, the shape of the printed wiring board manufactured by this invention is demonstrated using FIG. The printed wiring board manufactured by the present invention has a circuit board in which a connection portion 2 is formed on an insulating substrate 1, and has a solder resist layer 3 on the surface of the circuit board. The underfill flow prevention dam 11 is formed by opening the semiconductor element mounting portion and the surrounding solder resist layer 3. Further, the connection portion 2 is partially exposed from the solder resist layer 3 by opening a part of the solder resist layer 3 at the bottom 12 of the underfill flow prevention dam. The “semiconductor element mounting portion” refers to a region occupied by a semiconductor element on the circuit board when the semiconductor element is mounted on the surface of the circuit board on which the solder resist layer 3 is formed. The “periphery” in the “semiconductor mounting portion and its periphery” refers to a range of 0 mm to 2 mm from the end of the semiconductor element. Further, “the connection part 2 is partially exposed from the solder resist layer 3” means that the upper part of the connection part 2 is completely exposed from the solder resist layer 3 and the connection part 2 The state in which a part of the side surface portion is exposed from the solder resist layer 3 is indicated.

  The connection part 2 partially exposed from the opening of the solder resist layer 3 can be used as a so-called bump or ball pad. That is, a solder ball or the like is disposed on the exposed conductor circuit connection portion 2, and the electrical connection between the other electronic components and other printed wiring boards and other mounting components is secured to the connection portion 2 via the solder ball. While being able to connect.

  In addition, as the mounting component, a flip chip, BGA (ball grid array), chip scale package, chip size package, or electronic component pad such as TCP (tape carrier package), leadless chip carrier, or a print for mounting them. A wiring board is mentioned.

  The effect of the printed wiring board manufactured by this invention is demonstrated. The printed wiring board manufactured according to the present invention has an underfill flow prevention dam 11 in which a semiconductor element mounting portion corresponding to the upper portion of the connection portion 2 and a solder resist layer 3 around the semiconductor element mounting portion are opened, and the underfill flow. A part of the solder resist layer 3 at the bottom 12 of the prevention dam is opened, and the connection part 2 is partially exposed from the solder resist layer 3.

  As a result, the side surface of the connection portion 2 has a structure in which the surface insulating layer made of the solder resist layer 3 is partially covered, and when the underfill is filled in the gap between the semiconductor element and the circuit board, It has a dam structure that prevents overflow from the gap between the semiconductor element and the circuit board. From these shapes, the effect of improving the adhesive strength between the connecting portion 2 and the insulating substrate 1 and increasing the contact area between the connecting portion 2 and the solder is obtained, and the underfill is compared with the printed wiring board manufactured by the prior art. Can be prevented from overflowing from the gap between the semiconductor element and the circuit board to the periphery. Furthermore, the printed wiring board with high strength of the solder resist layer 3 and improved reliability can be manufactured.

  An example of a method for manufacturing a printed wiring board according to the present invention will be described with reference to FIG. In this method, first, the connection portion 2 is partially exposed from the first solder resist layer 3-1 by thinning the entire surface of the first solder resist layer 3-1 formed on the surface of the circuit board. Next, the second solder resist layer 3-2 is formed on the surface of the first solder resist layer 3-1, the second solder resist layer 3-2 around the connection portion 2 is removed by development, and the solder resist layer 3 is removed. Then, the connecting portion 2 is exposed again. Next, a third solder resist layer 3-3 is formed on the surface of the second solder resist layer 3-2, and the semiconductor mounting portion and the surrounding third solder resist layer 3-3 are removed by development, thereby underfilling. The flow prevention dam 11 is formed, and the connecting portion 2 is exposed from the solder resist layer 3 again.

  First, a circuit board in which the connection portion 2 and the conductor circuit 14 are formed on the insulating substrate 1 is prepared (FIG. 2a). The connection part 2 can be formed using a subtractive method, a semi-additive method, an additive method, or the like. Next, in step (A1), an alkali development type first solder resist layer 3-1 is formed so as to cover the entire surface of the circuit board (FIG. 2A1). Next, in the step (B1), the entire surface of the first solder resist layer 3-1 is thinned to partially expose the connection part 2 from the first solder resist layer 3-1 (FIG. 2 (B1)). . Next, in the step (C1), the entire surface of the first solder resist layer 3-1 is exposed (FIG. 2 (C1)).

  Next, in the step (A2), an alkali development type second solder resist layer 3-2 is formed on the entire first solder resist layer 3-1 in which the steps up to the step (C1) have been completed (FIG. 2 ( A2)). Next, in the step (C2), a portion of the second solder resist layer 3-2 other than the region for forming the opening for partially exposing the connection portion 2 from the solder resist layer 3 is exposed with the actinic ray 7. (FIG. 2 (C2)). Although exposure is performed through the photomask 8 in FIG. 2 (C2), exposure may be performed by a direct drawing method. Next, in the step (D1), the connection part 2 is partially exposed from the solder resist layer 3 by developing the second solder resist layer in the unexposed part (FIG. 2 (D1)).

  Next, in the step (A3), the alkali developing type third solder resist layer 3 is entirely formed on the first solder resist layer 3-1 and the second solder resist layer 3-2 after the steps up to the step (D1) are completed. -3 is formed (FIG. 2 (A3)). Next, in the step (C3), portions other than the region where the underfill flow prevention dam is formed are exposed with the actinic ray 7 (FIG. 2 (C3)). In FIG. 2 (C3), exposure is performed through the photomask 8, but exposure may be performed by a direct drawing method. Subsequently, in the step (D2), the third solder resist layer 3-3 in the unexposed portion is removed by development processing, whereby the first solder resist layer 3 is formed on the surface of the circuit board as shown in FIG. 2 (D2). -1 and the second solder resist layer 3-2 and the third solder resist layer 3-3 are formed, an underfill flow prevention dam 11 is formed in the solder resist layer 3, and the underfill flow A printed wiring board in which the connection portion 2 is partially exposed from the solder resist layer 3 can be formed by the opening formed in the solder resist layer 3 at the bottom 12 of the prevention dam. Further, in the method for manufacturing a printed wiring board according to the present invention, the exposure areas in the steps (C2) and (C3) can be changed to an arbitrary shape. By changing the exposure areas, for example, the cross section shown in FIG. It is possible to manufacture a circuit board having a shape. In FIG. 3 a, convex portions of the solder resist layer 3 are formed between the connection portions 2. In FIG. 3 b, the connection portion 2 is exposed from the solder resist layer 3, and the conductor circuit 14 is covered with the solder resist layer 3.

  In the printed wiring board manufactured by the method of the present invention, the surface roughness Ra of the solder resist layer surface 9, the bottom portion 12 of the underfill flow prevention dam, and the solder resist layer bottom portion 13 around the connection portion tends to be 0.50 μm or less. . In the present invention, the surface roughness Ra of the solder resist layer surface 9 and the bottom portion 12 of the underfill flow prevention dam is preferably 0.10 μm or less, and the surface roughness Ra of the solder resist layer bottom portion 13 around the connection portion. Is preferably 0.50 μm or less. The surface roughness Ra is an arithmetic average surface roughness.

  In addition, since the first solder resist layer 3-1 of the solder resist layer bottom 13 around the connection portion in the state before the step (C 1) after the step (B 1) has not undergone photocuring with actinic rays, It is in a flexible state, and it is possible to easily change the surface roughness and smooth the surface.

  For example, as a smoothing treatment, the surface roughness Ra of the solder resist layer bottom 13 and the underfill flow prevention dam 12 around the connection portion can be reduced to 0.15 μm or less by exposing to an environment of 80 ° C. for 15 seconds. is there. Further, by exposing to an environment of 80 ° C. for 30 seconds, the surface roughness Ra of the solder resist layer bottom 13 around the connection portion and the underfill flow prevention dam 12 can be made 0.10 μm or less. The lower the surface roughness Ra of the solder resist layer surface 9 and the bottom portion 12 of the underfill flow prevention dam and the solder resist layer bottom portion 13 around the connection portion, the better the strength of the solder resist layer. The preferable temperature of the smoothing treatment is 25 to 120 ° C., and the preferable time is 5 to 1800 seconds. When the smoothing treatment temperature is lower than 25 ° C., the time required for the smoothing treatment becomes too long. Therefore, in consideration of productivity, the temperature is preferably 25 ° C. or more. Further, when the smoothing treatment temperature is higher than 120 ° C., the solder resist layer may start to be thermally cured. Therefore, the smoothing treatment is preferably performed at 120 ° C. or less.

  As the insulating substrate 1 in the present invention, for example, a substrate made of a synthetic resin, a composite resin substrate made of a synthetic resin and an inorganic filler, a composite resin substrate made of a synthetic resin and an inorganic fabric, and the like can be used. The insulating substrate can be provided with a connection portion, a through hole, or the like on the surface or inside thereof. The insulating substrate 1 can be provided with bumps or ball pads for mounting electronic components.

  The circuit board in the present invention is a board in which a connecting portion 2 made of a metal such as copper is formed on an insulating board 1. Bumps or ball pads for connecting electronic components such as semiconductor elements may be formed. Examples of the method for manufacturing the circuit board include a subtractive method, a semi-additive method, and an additive method. In the subtractive method, for example, an etching resist is formed on a copper clad laminate in which a copper foil is bonded to a glass base epoxy resin, and a circuit board is manufactured by performing exposure, development, etching, and resist stripping.

  As the solder resist according to the present invention, an alkali developing type can be used. Further, it may be either a one-component or two-component liquid resist, may be a dry film resist, and any one that can be developed with an aqueous alkaline solution can be used. The composition of the alkali development type solder resist includes, for example, an alkali-soluble resin, a polyfunctional acrylic monomer, a photopolymerization initiator, an epoxy resin, an inorganic filler, and the like.

  Examples of the alkali-soluble resin include alkali-soluble resins having both photo-curing properties and thermosetting properties. For example, a secondary hydroxyl group of a resin obtained by adding an acrylic acid to a novolac-type epoxy resin to form an epoxy acrylate. A resin to which an acid anhydride has been added may be mentioned. Examples of the polyfunctional acrylic monomer include trimethylolpropane triacrylate, dipentaerythritol hexaacrylate, pentaerythritol triacrylate, and the like. Examples of the photopolymerization initiator include 2-methyl-1- (4-methylthiophenyl) -2-morpholinopropan-1-one. Epoxy resin is used as a curing agent. It is cross-linked by reacting with carboxylic acid of alkali-soluble resin to improve heat resistance and chemical resistance, but carboxylic acid and epoxy react at room temperature, so the storage stability is poor and alkaline In general, the development type solder resist often takes a two-component form to be mixed before use. Examples of the inorganic filler include barium sulfate and silica.

  Any method may be used to form the first solder resist layer 3-1, the second solder resist layer 3-2, and the third solder resist layer 3-3 on the surface of the circuit board. For example, a screen printing method, Examples thereof include a roll coating method, a spray method, a dipping method, a curtain coating method, a bar coating method, an air knife method, a hot melt method, a gravure coating method, a brush coating method, and an offset printing method. In the case of a dry film-shaped solder resist, a laminating method may be mentioned.

  The exposure to the first solder resist layer 3-1, the second solder resist layer 3-2 and the third solder resist layer 3-3 is performed by irradiating actinic rays, and a xenon lamp, a high pressure mercury lamp, a low pressure mercury lamp, and an ultrahigh pressure mercury lamp. Reflective image exposure using a UV fluorescent lamp as a light source, single-sided or double-sided contact exposure using a photomask, proximity method, projection method, laser scanning exposure, or the like can be used. When performing scanning exposure, a laser light source such as a UV laser, a He—Ne laser, a He—Cd laser, an argon laser, a krypton ion laser, a ruby laser, a YAG laser, a nitrogen laser, a dye laser, or an excimer laser is used as an emission wavelength. Accordingly, the exposure can be performed by scanning exposure using SHG wavelength conversion or scanning exposure using a liquid crystal shutter or a micromirror array shutter.

  In the step (B1), a method of partially exposing the connection part 2 from the first solder resist layer 3-1 by thinning the first solder resist layer 3-1 will be described. The step of thinning the first solder resist layer 3-1 is a micellization treatment (thinning treatment) in which the components in the first solder resist layer 3-1 of the non-exposed part are micellized by the thinning treatment liquid, And a step including a micelle removal process for removing micelles with a micelle removal solution. In addition, the solder resist layer surface that could not be removed, the remaining thinning treatment solution and the micelle removal solution were washed away by washing with water, the drying treatment for removing the washing water, and the smoothing treatment for smoothing the bottom of the opening. But you can.

  The thinning process (micellar process) is a process in which the resin component of the solder resist layer is made into micelles with a thinning process liquid, and the micelles are insolubilized in the thinning process liquid. Examples of the alkaline aqueous solution used as the thinning treatment liquid include alkali metal silicates such as lithium, sodium and potassium, alkali metal hydroxides, alkali metal phosphates, alkali metal carbonates, ammonium phosphates, An aqueous solution of an inorganic alkaline compound such as ammonium carbonate; monoethanolamine, diethanolamine, triethanolamine, methylamine, dimethylamine, ethylamine, diethylamine, triethylamine, cyclohexylamine, tetramethylammonium hydroxide (TMAH), tetraethylammonium hydroxide, An aqueous solution of an organic alkaline compound such as trimethyl-2-hydroxyethylammonium hydroxide (choline) can be used. The inorganic alkaline compound and organic alkaline compound can also be used as a mixture.

  The content of the alkaline compound can be 0.1% by mass or more and 50% by mass or less. Moreover, in order to make the surface of the first solder resist layer 3-1 more uniform, sulfates and sulfites can be added to the thinning solution. Examples of the sulfate or sulfite include alkali metal sulfates or sulfites such as lithium, sodium or potassium, and alkaline earth metal sulfates or sulfites such as magnesium and calcium.

  Among these, as the thinning treatment liquid, among these, an inorganic alkaline compound selected from alkali metal carbonates, alkali metal phosphates, alkali metal hydroxides, alkali metal silicates, and organics selected from TMAH and choline A thinning solution containing at least one of the alkaline compounds and containing 5 to 25% by mass of the inorganic alkaline compound and the organic alkaline compound can be preferably used because the surface can be made more uniform. it can. If it is less than 5% by mass, unevenness may easily occur in the process of thinning. Moreover, when it exceeds 25 mass%, precipitation of an inorganic alkaline compound will occur easily and it may be inferior to the temporal stability of a liquid, and workability | operativity. As for content of an alkaline compound, 7-17 mass% is more preferable, and 8-13 mass% is further more preferable. The pH of the thinning treatment solution is preferably 10 or more. Further, a surfactant, an antifoaming agent, a solvent and the like can be added as appropriate.

  As the thinning treatment, methods such as immersion treatment, paddle treatment, spray treatment, brushing, and scraping can be used, and immersion treatment is preferable. In the treatment methods other than the immersion treatment, bubbles are likely to be generated in the thinning treatment liquid, and the generated bubbles adhere to the surface of the first solder resist layer 3-1 during the thinning treatment, resulting in non-uniform film thickness. It may become.

  The thickness of the first solder resist layer 3-1, the second solder resist layer 3-2, the third solder resist layer 3-3, and the amount of the first solder resist layer 3-1 formed into a thin film, the solder resist layer 3 is determined. Moreover, the thinning amount of the first solder resist layer 3-1 can be freely adjusted within the range of 0.01 to 500 μm.

  In the micelle removal process for removing the micelles of the components of the solder resist layer insolubilized in the thinning solution, the micelles are dissolved and removed all at once by spraying the micelle removal solution.

  As the micelle removal liquid, tap water, industrial water, pure water or the like can be used. Further, by using an aqueous solution having a pH of 5 to 10 containing at least any one of inorganic alkaline compounds selected from alkali metal carbonates, alkali metal phosphates, and alkali metal silicates as a micelle removal solution, thinning treatment is performed. The components of the solder resist layer insolubilized with the liquid are easily redispersed. When the pH of the micelle removal solution is less than 5, the components of the solder resist layer may aggregate to form insoluble sludge and adhere to the surface of the thinned solder resist layer. On the other hand, when the pH of the micelle removal solution exceeds 10, the solder resist layer may be excessively dissolved and diffused, and film thickness unevenness may easily occur in the surface. In addition, the pH of the micelle removal solution can be adjusted using sulfuric acid, phosphoric acid, hydrochloric acid, or the like.

The spray conditions in the micelle removal process will be described. The spray conditions (temperature, time, spray pressure) are appropriately adjusted according to the dissolution rate of the solder resist layer to be thinned. Specifically, the treatment temperature is preferably 10 to 50 ° C, more preferably 15 to 35 ° C. The spray pressure is preferably 0.01 to 0.5 MPa, more preferably 0.1 to 0.3 MPa. The supply flow rate of the micelle removal liquid is preferably 0.030 to 1.0 L / min per 1 cm ^{2 of} the solder resist layer, more preferably 0.050 to 1.0 L / min, and further 0.10 to 1.0 L / min. preferable. When the supply flow rate is within this range, the micelles can be removed substantially uniformly in the surface without leaving insoluble components on the surface of the solder resist layer after thinning. When the supply flow rate per 1 cm ^{2 of the} solder resist layer is less than 0.030 L / min, the resin component of the insolubilized solder resist layer may be poorly dissolved. On the other hand, when the supply flow rate exceeds 1.0 L / min, parts such as a pump necessary for supply become enormous and a large-scale device may be required. Furthermore, when the supply amount exceeds 1.0 L / min, the effect on the dissolution and diffusion of the resin component of the solder resist layer may not change.

  After the micelle removal treatment, the solder resist layer that could not be removed, and the thinning treatment solution remaining on the surface of the solder resist layer and the micelle removal solution can be washed away by washing with water. As a method of washing with water, a spray method is preferable from the viewpoint of diffusion rate and liquid supply uniformity. As flush water, tap water, industrial water, pure water or the like can be used. Of these, it is preferable to use pure water. Pure water that is generally used for industrial purposes can be used.

  In the drying process, either hot air drying or room temperature ventilation drying can be used. Preferably, high-pressure air is supplied from an air gun or a blower, and a large amount of air is supplied from the blower to remove water remaining on the surface of the solder resist layer with an air knife. A drying method that blows away is good.

  In order to further reduce the surface roughness inside the opening formed by the thinning process, a smoothing process can be performed. As a method of the smoothing treatment, heating is performed at 25 to 120 ° C. for 5 seconds to 30 minutes using hot air drying, room temperature blowing drying or the like. In addition, the printed wiring board that has undergone the opening forming process by the thinning process and the subsequent smoothing process process has no residual smear that occurs in the formation of the opening in the solder resist layer using a conventional technique using a laser. Since there is no desmear process, the solder resist layer is not roughened.

  As a developing method, a developer corresponding to the solder resist layer to be used is used, spray is sprayed onto the surface of the circuit board, and unnecessary portions of the solder resist layer are removed. A dilute alkaline aqueous solution is used as the developer, and generally a 0.3 to 3 mass% sodium carbonate aqueous solution or potassium carbonate aqueous solution is used.

  EXAMPLES Hereinafter, although an Example demonstrates this invention further in detail, this invention is not limited to this Example.

Example 1
<Process (A1)>
Set an area assuming a part of a copper-clad laminate (area 170 mm x 200 mm, copper foil thickness 18 μm, substrate thickness 0.4 mm) as a 30 mm x 30 mm semiconductor element mounting portion, and use an etching resist in that area A circuit board having a circular connection portion 2 having a diameter of 150 μm was manufactured by the subtractive method. Next, a dry film solder resist (manufactured by Taiyo Ink Manufacturing Co., Ltd., trade name: PFR-800 AUS410) was vacuum thermocompression bonded. As a result, a first solder resist layer 3-1 having a dry film thickness of 38 μm was formed on the surface of the insulating substrate 1.

<Process (B1)>
Next, after peeling off the carrier film, the first solder resist layer 3-1 was thinned by being immersed in a 10% by mass aqueous sodium metasilicate solution (liquid temperature: 25 ° C.) for 26 seconds. Then, the micelle removal process, the water washing process, and the drying process were performed, and the connection part 2 was exposed from the 1st soldering resist layer 3-1. When the height from the surface of the first solder resist layer 3-1 after the thinning treatment to the upper part of the connection part 2 was measured, the height was 5 μm.

<Process (C1)>
Next, the entire surface of the first solder resist layer 3-1 was exposed with an energy of 300 mj / cm ² using a contact exposure machine.

<Process (A2)>
Next, a solder resist film (manufactured by Taiyo Ink Manufacturing Co., Ltd., trade name: PFR-800 AUS410) was vacuum thermocompression bonded from above the first solder resist layer 3-1 in which the step (C1) was completed. As a result, a second solder resist layer 3-2 having a dry film thickness of 18 μm is formed on the surface of the first solder resist layer 3-1, and the dry film thickness from the surface of the insulating substrate 1 to the surface of the second solder resist layer 3-2 is formed. Was 31 μm.

<Process (C2)>
Next, using a photomask 8 having a pattern in which actinic rays are irradiated outside the region from the end portion of the connection portion 2 to the outside to the outside of 200 μm, an energy of 300 mj / cm ² is obtained using a contact exposure machine. Then, the second solder resist layer 3-2 was exposed.

<Process (D1)>
Next, after peeling off the carrier film, the second solder resist layer in the unexposed area is developed for 22 seconds using a 1% by mass sodium carbonate aqueous solution (liquid temperature 30 ° C., spray pressure 0.15 MPa). The connection part 2 exposed from the first solder resist layer 3-1 and the first solder resist layer 3-1 around the connection part, which have been removed by 3-2 and covered with the second solder resist layer 3-2. Exposed again. The depth from the surface of the second solder resist layer 3-2 to the solder resist layer bottom 13 around the connection portion was 18 μm.

<Process (A3)>
Next, a solder resist film (manufactured by Taiyo Ink Manufacturing Co., Ltd., trade name: PFR-800 AUS410) is formed on the first solder resist layer 3-1 and the second solder resist layer 3-2 that have completed the step (D1). Vacuum thermocompression bonding was performed. As a result, a third solder resist layer 3-3 having a dry film thickness of 18 μm is formed on the surfaces of the first solder resist layer 3-1 and the second solder resist layer 3-2, and the third solder resist layer is formed from the surface of the insulating substrate 1. The dry film thickness up to the surface of 3-3 was 49 μm.

<Process (C3)>
Next, using a photomask 8 having a pattern in which actinic rays are irradiated in a region other than the region assumed as the semiconductor element mounting portion and the region extending from the end portion to the outside by 1 mm, 300 mj The third solder resist layer 3-3 was exposed with an energy of / cm ² .

<Process (D2)>
The third solder resist layer 3-3 in the unexposed area is removed by performing a development process for 36 seconds using a 1 mass% aqueous sodium carbonate solution (liquid temperature 30 ° C., spray pressure 0.15 MPa), and the third solder is removed. The bottom portion 12 of the underfill flow prevention dam that was covered by the resist layer 3-3 and was the surface of the second solder resist layer is exposed, and the connection portion 2 is exposed from the first solder resist layer 3-1. The first solder resist layer 3-1 around the connection part (solder resist layer bottom 13 around the connection part) was exposed again. The depth from the solder resist layer surface 9 which is the surface of the third solder resist layer 3-3 to the bottom 12 of the underfill flow prevention dam was 18 μm.

  Further, when the surface roughness was measured using an ultra-deep shape measurement microscope (manufactured by Keyence Corporation, product number “VK-8500”), the surface of the solder resist layer surface 9 and the bottom 12 of the underfill flow prevention dam The roughness Ra was 0.03 μm, and the surface roughness Ra of the solder resist layer bottom 13 around the connection portion was 0.42 μm. Further, when the solder resist layer surface 9, the bottom portion 12 of the underfill flow prevention dam, and the solder resist layer bottom portion 13 around the connecting portion were observed with a microscope, no smear remained.

The arithmetic average surface roughness Ra by an ultra-deep shape measuring microscope (manufactured by Keyence Corporation, product number “VK-8500”) uses a calculation formula according to JIS B0601-1994 surface roughness-definition. The measurement area was 900 μm ² and the reference length was 40 μm.

(Example 2)
<Process (A1)>
Set an area assuming a part of a copper-clad laminate (area 170 mm x 200 mm, copper foil thickness 18 μm, substrate thickness 0.4 mm) as a 30 mm x 30 mm semiconductor element mounting portion, and use an etching resist in that area A circuit board having a circular connection portion 2 having a diameter of 150 μm was manufactured by the subtractive method. Next, a dry film solder resist (manufactured by Taiyo Ink Manufacturing Co., Ltd., trade name: PFR-800 AUS410) was vacuum thermocompression bonded. As a result, a first solder resist layer 3-1 having a dry film thickness of 38 μm was formed on the surface of the insulating substrate 1.

<Process (B1)>
Next, after peeling off the carrier film, the first solder resist layer 3-1 was thinned by being immersed in a 10% by mass aqueous sodium metasilicate solution (liquid temperature: 25 ° C.) for 26 seconds. Then, the micelle removal process, the water washing process, and the drying process were performed, and the connection part 2 was exposed from the 1st soldering resist layer 3-1. Then, after performing the smoothing process (80 degreeC, 15 second), when the height from the 1st soldering resist layer 3-1 surface after thinning process to the connection part 2 upper part was measured, height is 5 micrometers. Met.

<Process (C1)>
Next, the entire surface of the first solder resist layer 3-1 was exposed with an energy of 300 mj / cm ² using a contact exposure machine.

<Process (A2)>
Next, a solder resist film (manufactured by Taiyo Ink Manufacturing Co., Ltd., trade name: PFR-800 AUS410) was vacuum thermocompression bonded from above the first solder resist layer 3-1 in which the step (C1) was completed. As a result, a second solder resist layer 3-2 having a dry film thickness of 18 μm is formed on the surface of the first solder resist layer 3-1, and the dry film thickness from the surface of the insulating substrate 1 to the surface of the second solder resist layer 3-2 is formed. Was 31 μm.

<Process (C2)>
Next, using a photomask 8 having a pattern in which actinic rays are irradiated outside the region from the end portion of the connection portion 2 to the outside to the outside of 200 μm, an energy of 300 mj / cm ² is obtained using a contact exposure machine. Then, the second solder resist layer 3-2 was exposed.

<Process (D1)>
Next, after peeling off the carrier film, the second solder resist layer in the unexposed area is developed for 22 seconds using a 1% by mass sodium carbonate aqueous solution (liquid temperature 30 ° C., spray pressure 0.15 MPa). The connection part 2 exposed from the first solder resist layer 3-1 and the first solder resist layer 3-1 around the connection part, which have been removed by 3-2 and covered with the second solder resist layer 3-2. Exposed again. The depth from the surface of the second solder resist layer 3-2 to the solder resist layer bottom 13 around the connection portion was 18 μm.

<Process (A3)>
Next, a solder resist film (manufactured by Taiyo Ink Manufacturing Co., Ltd., trade name: PFR-800 AUS410) is formed on the first solder resist layer 3-1 and the second solder resist layer 3-2 that have completed the step (D1). Vacuum thermocompression bonding was performed. As a result, a third solder resist layer 3-3 having a dry film thickness of 18 μm is formed on the surfaces of the first solder resist layer 3-1 and the second solder resist layer 3-2, and the third solder resist layer is formed from the surface of the insulating substrate 1. The dry film thickness up to the surface of 3-3 was 49 μm.

<Process (C3)>
Next, using a photomask 8 having a pattern in which actinic rays are irradiated in a region other than the region assumed as the semiconductor element mounting portion and the region extending from the end portion to the outside by 1 mm, 300 mj The third solder resist layer 3-3 was exposed with an energy of / cm ² .

<Process (D2)>
The third solder resist layer 3-3 in the unexposed area is removed by performing a development process for 36 seconds using a 1 mass% aqueous sodium carbonate solution (liquid temperature 30 ° C., spray pressure 0.15 MPa), and the third solder is removed. Connection in a state in which the bottom 12 of the underfill flow prevention dam that was covered by the resist layer 3-3 and was the surface of the second solder resist layer 3-2 is exposed and exposed from the first solder resist layer 3-1. The first solder resist layer 3-1 (solder resist layer bottom 13 around the connection portion) around the portion 2 and the connection portion was exposed again. The depth from the solder resist layer surface 9 which is the surface of the third solder resist layer 3-3 to the bottom 12 of the underfill flow prevention dam was 18 μm.

  Further, when the surface roughness was measured using an ultra-deep shape measurement microscope (manufactured by Keyence Corporation, product number “VK-8500”), the surface of the solder resist layer surface 9 and the bottom 12 of the underfill flow prevention dam The roughness Ra was 0.03 μm, and the surface roughness Ra of the solder resist layer bottom portion 13 around the connection portion was 0.14 μm. Further, when the solder resist layer surface 9, the bottom portion 12 of the underfill flow prevention dam, and the solder resist layer bottom portion 13 around the connecting portion were observed with a microscope, no smear remained.

The arithmetic average surface roughness Ra by an ultra-deep shape measuring microscope (manufactured by Keyence Corporation, product number “VK-8500”) uses a calculation formula according to JIS B0601-1994 surface roughness-definition. The measurement area was 900 μm ² and the reference length was 40 μm.

Example 3
<Process (A1)>
Set an area assuming a part of a copper-clad laminate (area 170 mm x 200 mm, copper foil thickness 18 μm, substrate thickness 0.4 mm) as a 30 mm x 30 mm semiconductor element mounting portion, and use an etching resist in that area A circuit board having a circular connection portion 2 having a diameter of 150 μm was manufactured by the subtractive method. Next, a dry film solder resist (manufactured by Taiyo Ink Manufacturing Co., Ltd., trade name: PFR-800 AUS410) was vacuum thermocompression bonded. As a result, a first solder resist layer 3-1 having a dry film thickness of 38 μm was formed on the surface of the insulating substrate 1.

<Process (B1)>
Next, after peeling off the carrier film, the first solder resist layer 3-1 was thinned by being immersed in a 10% by mass aqueous sodium metasilicate solution (liquid temperature: 25 ° C.) for 26 seconds. Then, the connection part 2 was exposed from the 1st soldering resist layer 3-1, performing the micelle removal process, the water washing process, and the drying process. Then, after performing the smoothing process (80 degreeC, 30 second), when the height from the surface of the 1st soldering resist layer 3-1 after a thin film process to the connection part 2 upper part was measured, height is 5 micrometers. Met.

<Process (C1)>
Next, the entire surface of the first solder resist layer 3-1 was exposed with an energy of 300 mj / cm ² using a contact exposure machine.

<Process (A2)>
Next, a solder resist film (manufactured by Taiyo Ink Manufacturing Co., Ltd., trade name: PFR-800 AUS410) was vacuum thermocompression bonded from above the first solder resist layer 3-1 in which the step (C1) was completed. As a result, a second solder resist layer 3-2 having a dry film thickness of 18 μm is formed on the surface of the first solder resist layer 3-1, and the dry film thickness from the surface of the insulating substrate 1 to the surface of the second solder resist layer 3-2 is formed. Was 31 μm.

<Process (C2)>
Next, using a photomask 8 having a pattern in which actinic rays are irradiated outside the region from the end portion of the connection portion 2 to the outside to the outside of 200 μm, an energy of 300 mj / cm ² is obtained using a contact exposure machine. Then, the second solder resist layer 3-2 was exposed.

<Process (D1)>
Next, after peeling off the carrier film, the second solder resist layer in the unexposed area is developed for 22 seconds using a 1% by mass sodium carbonate aqueous solution (liquid temperature 30 ° C., spray pressure 0.15 MPa). The connection part 2 exposed from the first solder resist layer 3-1 and the first solder resist layer 3-1 around the connection part, which have been removed by 3-2 and covered with the second solder resist layer 3-2. Exposed again. The depth from the surface of the second solder resist layer 3-2 to the solder resist layer bottom 13 around the connection portion was 18 μm.

<Process (A3)>
Next, a solder resist film (manufactured by Taiyo Ink Manufacturing Co., Ltd., trade name: PFR-800 AUS410) is formed on the first solder resist layer 3-1 and the second solder resist layer 3-2 that have completed the step (D1). Vacuum thermocompression bonding was performed. As a result, a third solder resist layer 3-3 having a dry film thickness of 18 μm is formed on the surfaces of the first solder resist layer 3-1 and the second solder resist layer 3-2, and the third solder resist layer is formed from the surface of the insulating substrate 1. The dry film thickness up to the surface of 3-3 was 49 μm.

<Process (C3)>
Next, using a photomask 8 having a pattern in which actinic rays are irradiated in a region other than the region assumed as the semiconductor element mounting portion and the region extending from the end portion to the outside by 1 mm, 300 mj The third solder resist layer 3-3 was exposed with an energy of / cm ² .

<Process (D2)>
The third solder resist layer 3-3 in the unexposed area is removed by performing a development process for 36 seconds using a 1 mass% aqueous sodium carbonate solution (liquid temperature 30 ° C., spray pressure 0.15 MPa), and the third solder is removed. Connection in a state in which the bottom 12 of the underfill flow prevention dam that was covered by the resist layer 3-3 and was the surface of the second solder resist layer 3-2 is exposed and exposed from the first solder resist layer 3-1. The first solder resist layer 3-1 (solder resist layer bottom 13 around the connection portion) around the portion 2 and the connection portion was exposed again. The depth from the solder resist layer surface 9 which is the surface of the third solder resist layer 3-1 to the bottom 12 of the underfill flow prevention dam was 18 μm.

  Further, when the surface roughness was measured using an ultra-deep shape measurement microscope (manufactured by Keyence Corporation, product number “VK-8500”), the surface of the solder resist layer surface 9 and the bottom 12 of the underfill flow prevention dam The roughness Ra was 0.03 μm, and the surface roughness Ra of the solder resist layer bottom 13 around the connection portion was 0.06 μm. Further, when the solder resist layer surface 9, the bottom portion 12 of the underfill flow prevention dam, and the solder resist layer bottom portion 13 around the connecting portion were observed with a microscope, no smear remained.

The arithmetic average surface roughness Ra by an ultra-deep shape measuring microscope (manufactured by Keyence Corporation, product number “VK-8500”) uses a calculation formula according to JIS B0601-1994 surface roughness-definition. The measurement area was 900 μm ² and the reference length was 40 μm.

(Comparative Example 1)
Set an area assuming a part of a copper-clad laminate (area 170 mm x 200 mm, copper foil thickness 18 μm, substrate thickness 0.4 mm) as a 30 mm x 30 mm semiconductor element mounting portion, and use an etching resist in that area A circuit board having a circular connection portion 2 having a diameter of 150 μm was manufactured by the subtractive method. Next, a dry film solder resist (manufactured by Taiyo Ink Manufacturing Co., Ltd., trade name: PFR-800 AUS410) was vacuum thermocompression bonded. As a result, a solder resist layer 3 having a dry film thickness of 41 μm from the surface of the insulating substrate 1 to the solder resist layer surface 9 was formed. Thereafter, the entire surface of the solder resist layer 3 was exposed with an energy of 1000 mj / cm ² using a contact exposure machine, and further heated at 150 ° C. for 30 minutes using a hot air dryer.

  Next, excimer laser light (wavelength 248 nm, output 50 W) is irradiated to a region assumed as a semiconductor element mounting portion and a region extending 1 mm outward from the end thereof, and an underfill flow prevention dam 11 is applied to the solder resist layer 3. Formed.

  Next, excimer laser light (wavelength: 248 nm, output: 50 W) was irradiated to an area from the end of the connection part 2 to the outside by 200 μm to expose the connection part 2 from the solder resist layer 3.

  When the solder resist layer surface 9 irradiated with the laser beam was observed with a microscope, the formation of the underfill flow prevention dam 11 and the irradiation of the laser beam when exposing the connecting portion 2 caused the solder resist layer surface 9 and the underfill flow prevention dam to Smear was generated at the bottom 12, the upper part of the connection part 2, and the solder resist layer bottom part 13 around the connection part.

  Next, a solution containing sodium hydroxide as a main component (Meltex Co., Ltd., trade name: Enplate (registered trademark) MLB-496A) and a solution containing 1-methoxy-2-propanol (Meltex stock) The solder resist layer 3 in which smear was generated was immersed in a mixed solution (manufactured by the company, trade name: Enplate (registered trademark) MLB-496B) and distilled water at 60 ° C. for 15 minutes to swell the smear. Next, a solution containing sodium permanganate as a main component (Meltex Co., Ltd., trade name: Enplate (registered trademark) MLB-497A) and a solution containing sodium hydroxide as a main component (Meltex Co., Ltd., product) Name: Enplate (registered trademark) MLB-497B) and a mixed solution of distilled water at 80 ° C. for 10 minutes to decompose and remove the swollen smear.

  When the depth from the solder resist layer surface 9 to the bottom 12 of the underfill flow prevention dam was measured, the depth was 18 μm, from the bottom 12 of the underfill flow prevention dam to the bottom 13 of the solder resist layer around the connection portion 2. When the depth of was measured, the depth was 10 μm. The surface roughness Ra of the solder resist layer surface 9 was 0.80 μm, and the surface roughness Ra of the bottom portion 12 of the underfill flow prevention dam and the solder resist layer bottom portion 13 around the connection portion was 0.90 μm. Further, when the solder resist layer surface 9 around the bottom portion 12 of the underfill flow prevention dam, the solder resist layer bottom portion 13 around the underfill flow prevention dam 11 and the connection portion 2 were observed with a microscope, the entire surface of the solder resist layer 3 was roughened. It had been.

(Comparative Example 2)
Set an area assuming a part of a copper-clad laminate (area 170 mm x 200 mm, copper foil thickness 18 μm, substrate thickness 0.4 mm) as a 30 mm x 30 mm semiconductor element mounting portion, and use an etching resist in that area A circuit board having a circular connection portion 2 having a diameter of 150 μm was manufactured by the subtractive method. Next, a solder resist film (trade name: PFR-800 AUS410, manufactured by Taiyo Ink Manufacturing Co., Ltd.) was subjected to vacuum thermocompression bonding. As a result, a solder resist layer 3 having a dry film thickness of 41 μm from the surface of the insulating substrate 1 to the solder resist layer surface 9 was formed. Thereafter, the entire surface of the solder resist layer 3 was exposed with an energy of 1000 mj / cm ² using a contact exposure machine, and further heated at 150 ° C. for 30 minutes using a hot air dryer.

Next, a resist film for blasting (trade name: MS7100, manufactured by Mitsubishi Paper Industries Co., Ltd.) was thermocompression bonded. Next, using a photomask 8 having a pattern in which actinic rays are irradiated in a region other than the region assumed as the semiconductor element mounting portion and the region extending from the end portion to the outside by 1 mm, using a contact exposure machine, 100 mj The blast resist layer 3 was exposed at an energy of / cm ² , and then developed to remove the unexposed blast resist layer.

  Next, sand blasting (abrasive material: SiC # 800, blast pressure 0.15 MPa) is performed on the blast resist film to form an underfill flow prevention dam 11 on the solder resist layer 3, and then the blast resist film is peeled off. did.

Next, a resist film for blasting (trade name: MS7100, manufactured by Mitsubishi Paper Industries Co., Ltd.) was vacuum thermocompression bonded. Next, using a photomask 8 having a pattern in which actinic rays are irradiated outside the region from the end of the connection part 2 to the outside to the outside of 200 μm, an energy of 100 mj / cm ² is obtained using a contact exposure machine. Then, the blast resist layer 3 was exposed to light, and then developed to remove the unexposed blast resist layer.

  Next, sand blasting (abrasive: SiC # 800, blast pressure 0.15 MPa) is performed on the resist film for blasting, and an opening is formed in the solder resist layer 3 at the bottom 12 of the underfill flow prevention dam to form the connection part 2. After exposing, the resist film for blasting was peeled off. When the depth from the solder resist layer surface 9 to the bottom 12 of the underfill flow prevention dam was measured, the depth was 18 μm, from the bottom 12 of the underfill flow prevention dam to the bottom 13 of the solder resist layer around the connection portion 2. When the depth of was measured, the depth was 10 μm. The surface roughness Ra of the solder resist layer surface 9 was 0.03 μm, and the surface roughness Ra of the bottom portion 12 of the underfill flow prevention dam and the solder resist layer bottom portion 13 around the connection portion was 1.20 μm. Further, when the solder resist layer 3 at the bottom portion 12 of the underfill flow prevention dam and the solder resist layer bottom portion 13 around the connecting portion was observed with a microscope, the entire surface was roughened.

  The printed wiring boards manufactured according to Examples 1 to 3 and Comparative Example 1 and Comparative Example 2 are soldered to the underfill flow prevention dam 11 and the connecting part 2 formed in the semiconductor element mounting part and the solder resist layer 3 around the semiconductor element mounting part. Since it is partially exposed from the resist layer 3, when this flip-chip connection is performed using this printed wiring board, a sufficient underfill is provided to ensure the connection reliability between the semiconductor element and the circuit board. When injected, it is possible to prevent the underfill from overflowing from the gap between the semiconductor element and the circuit board to the surroundings and adversely affecting the electrical operation, and the connecting portion 2 is arranged at a high density. Also in the printed wiring board, the adhesive strength between the connecting portion 2 and the insulating substrate 1 and the adhesive strength between the connecting portion 2 and the solder are increased, and high connection reliability is obtained.

  Furthermore, the printed wiring board manufactured and manufactured according to Examples 1 to 3 was formed by laser processing, desmearing treatment, and sand blasting, and Comparative Example 1 in which an opening for exposing an underfill flow prevention dam and a connection portion was formed in the solder resist layer. Compared with the printed wiring board of Comparative Example 2, the strength of the solder resist layer 3 is high, and high connection reliability is obtained.

  The present invention relates to a method for manufacturing a printed wiring board, and more specifically, can be used as a printed wiring board suitable for mounting a semiconductor element by flip chip connection.

DESCRIPTION OF SYMBOLS 1 Insulation board | substrate 2 Connection part 3 Solder resist layer 3-1 1st solder resist layer 3-2 2nd solder resist layer 3-3 3rd solder resist layer 7 Actinic ray 8 Photomask 9 Solder resist layer surface 11 Underfill flow prevention Dam 12 Underfill flow prevention dam bottom 13 Solder resist layer bottom 14 around the connecting portion Conductor circuit

Claims (1)

In a method of manufacturing a wiring board having a circuit board in which conductor wiring is formed on an insulating substrate, having a solder resist layer on the surface of the circuit board, and a part of the conductor wiring being exposed from the solder resist layer,
(A1) a step of forming a first solder resist layer on the circuit board;
(B1) The first solder resist layer is thinned by the thinning treatment solution until the thickness of the conductor wiring is equal to or less, and a part of the conductor wiring is exposed,
(C1) Step of exposing the entire surface of the first solder resist layer completed up to step (B1),
(A2) A step of forming a second solder resist layer on the circuit board on which the first solder resist layer completed up to step (C1) is formed,
(C2) a step of exposing a portion other than the region to be developed in the step (D1), which is a subsequent step, to the second solder resist layer;
(D1) the step of removing the second solder resist layer in the unexposed area with a developer;
(A3) The step of forming the third solder resist layer on the circuit board on which the first solder resist layer and the second solder resist layer are formed, completed up to the step (D1).
(C3) a step of exposing a portion other than the region to be developed in step (D2), which is a subsequent step, to the third solder resist layer;
(D2) a step in which the third solder resist layer in the unexposed area is removed with a developer;
A method of manufacturing a wiring board, comprising: