JP2015008172A - Fine pattern transfer device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a fine pattern transfer device capable of efficiently transferring a fine pattern even to a large-size substrate with good precision.SOLUTION: A fine pattern transfer device 30 comprises: a lamination part 37; and a transfer part 39. In the lamination part 37, a substrate 31 and a mold 32 are sent to between a resin-leveling press roller 37a and a resin-leveling support roller 37b and laminated together; a droplet of resin is crushed by casing the substrate and the mold to pass through between the resin-leveling press roller and the resin-leveling support roller and consequently, spreaded between the substrate 31 and the mold 32, whereby a resin layer 34a is formed. In the transfer part 39, the substrate 31 and the mold 32 are sent to between a transfer press roller 38 and a transfer support roller 43, and then pressed. The resin layer is uniformized in two steps. Therefore, a resin layer part 34b of a constant thickness is formed between the substrate 31 and the mold 32 without fail and in this condition, a fine pattern is transferred. Thus, the fine pattern can be transferred with good precision.

Description

  The present invention relates to a fine transfer device for transferring a fine pattern called a nanoimprint device, an imprint device or the like, and in particular, transfers a fine pattern to a photosensitive resin layer formed on the surface of a large-sized substrate such as an organic EL panel or a solar panel. The present invention relates to a fine transfer apparatus suitable for the above.

  Nanoimprint technology is used to transfer a fine pattern to a photosensitive resin layer formed on a substrate surface in a manufacturing process of LSI or the like. Patent Document 1 proposes a pattern forming method using such a nanoimprint technique.

  In the pattern forming method disclosed in Patent Document 1, a photosensitive resin layer is formed on the surface of a flat substrate, and a laminate is formed by sandwiching the photosensitive resin layer and laminating a mold on the substrate. A press process, an exposure process, and a separation process are sequentially performed on the laminate. In the pressing step, the laminated body is conveyed along a moving path passing through the nip portion of the press roller pair while being placed on the linear stage. By passing through the nip portion, the fine pattern of the mold is transferred to the photosensitive resin layer. In the exposure step, the photosensitive resin layer is irradiated with actinic rays from both sides of the laminate to cure the photosensitive resin layer. In the separation step, the mold is peeled off from the cured photosensitive resin layer.

JP 2010-105210 A, FIG. 4, FIG.

  A conventional pattern formation method using nanoimprint technology aims to transfer a fine pattern onto a small-sized substrate surface. In recent years, there is a high demand for large substrates such as display panels such as organic EL panels and solar panels. For example, a glass substrate of 500 mm × 500 mm is used. It is conceivable to apply a nanoimprint technology to such a large substrate to efficiently transfer a fine pattern.

  In order to transfer a fine pattern with high accuracy, it is necessary to accurately apply a photosensitive resin such as an ultraviolet curable resin with a uniform film thickness to the resin application region on the substrate surface. In the case of a large substrate, since the resin application area is wide, it becomes more difficult to apply the photosensitive resin with a uniform film thickness over the entire resin application area, and it is accurate so that it does not protrude from the resin application area. It becomes more difficult to apply the photosensitive resin well.

  Further, in a transfer process in which the mold is pressed against the photosensitive resin layer formed on the substrate surface by a press roller or the like, excess photosensitive resin is pushed out from the edge of the substrate. In the case of a large substrate, since the resin application area is wide, the amount of photosensitive resin that protrudes outward from the edge of the substrate is large. The photosensitive resin that protrudes outward from the edge of the substrate needs to be removed by cutting, for example, after being cured through an exposure process. However, the addition of the cutting / removing step is not preferable because it causes a decrease in production efficiency and an increase in manufacturing cost.

  In view of these points, an object of the present invention is to provide a fine transfer device capable of transferring a fine pattern with high accuracy and efficiency even to a large substrate.

  In order to solve the above-described problems, the fine transfer apparatus of the present invention has a resin application portion for applying a photosensitive resin on the surface of a substrate or the surface of a mold. The resin coating unit discharges photosensitive resin droplets from a single nozzle or a plurality of nozzles, and adheres the photosensitive resin droplets in a predetermined pattern to the surface of the substrate or the surface of the mold. Control of the ejection amount of droplets of the photosensitive resin ejected from the resin ejection unit and the nozzle, control of the deposition pattern of droplets of the photosensitive resin adhered to the substrate, or the ejection amount and the adhesion And a resin discharge control unit that controls both of the patterns.

  The photosensitive resin is applied to the surface of the substrate or the surface of the mold by discharging droplets of the photosensitive resin from a droplet discharge portion having the same configuration as the nozzle of the inkjet head. Since the application amount of the photosensitive resin can be finely controlled, the required minimum amount of the photosensitive resin can be accurately applied to the surface of the substrate or the mold. Thereby, the protrusion of the photosensitive resin from the edge of the substrate in the transfer process can be prevented or suppressed. Also, depending on the area, shape, etc. of the resin application area on the surface of the substrate, the photosensitive resin droplets adhere to the surface of the substrate with an appropriate adhesion pattern, and the substrate and the mold are pressed from both sides. The photosensitive resin spreads uniformly, and a resin layer having a uniform layer thickness can be formed with high accuracy.

  The fine transfer device of the present invention includes a laminated portion that sandwiches a photosensitive resin and overlaps a substrate and a mold to form a laminated body. The laminated portion includes a resin leveling press roller and a resin leveling support roller. The resin leveling press roller sandwiches the laminate and presses the resin leveling support roller with a pressing force for leveling the resin. Pressed against.

  In addition, by transporting the laminate along a movement path that passes through a line-shaped press position by a transfer press roller, a fine pattern of the mold is formed on the photosensitive resin layer sandwiched between the substrate and the mold. The transfer portion to be transferred includes the transfer press roller and the transfer support roller, and the transfer press roller is pressed against the transfer support roller with a transfer pressure while sandwiching the laminate. While the laminate passes between the transfer press roller and the transfer support roller, the fine pattern of the mold is transferred to the resin layer.

  Here, there is provided a nip pressure control unit for controlling the pressure for resin leveling, controlling the pressure for transfer, or controlling both the pressure for leveling resin and the pressure for transfer. It is desirable.

  In the laminating section, the substrate and the mold are fed and laminated between a resin leveling press roller and a resin leveling support roller, and by passing between these, droplets of the photosensitive resin are crushed. A layer of photosensitive resin is formed between the substrate and the mold. In the transfer section, the substrate and the mold are further fed and pressed between the transfer press roller and the transfer support roller. Thus, the photosensitive resin layer is made uniform in two stages. As a result, at the time of transfer, a fine pattern is transferred in a state in which a photosensitive resin layer having a certain thickness is reliably formed between the substrate and the mold. Therefore, a fine pattern can be transferred with high accuracy.

  Next, the exposure unit of the fine transfer apparatus according to the present invention has a light emitting unit and a light beam emitted from the light emitting unit immediately after being sent out from the nip portion of the transfer press roller and the transfer support roller. A reflective surface that reflects toward the photosensitive resin layer portion of the laminate. The reflective surface is formed on the outer peripheral surface of the transfer support roller, and the substrate of the laminate is a translucent substrate that is located on the transfer support roller side and can transmit the light beam.

  The transfer support roller is formed of a hard material in order to support the substrate in a flat state without bending at the transfer position. In order to be able to support the back surface of the substrate in a line contact state at the transfer position, it is necessary to increase the cylindricity of the outer peripheral surface of the transfer support roller. For this purpose, the outer peripheral surface of the support roller is generally mirror-finished. In the present invention, the outer peripheral surface of the mirror-finished support roller for transfer is used as a light reflecting surface for curing the photosensitive resin.

  In order to irradiate the layer of the photosensitive resin layer of the laminate immediately after being sent out from the nip between the transfer support roller and the transfer press roller, it is necessary to irradiate the substrate surface with the light from an oblique direction. There is. If the incident angle of the light beam is small, a part of the light beam that passes through the substrate and travels toward the photosensitive resin layer is reflected at the boundary between the substrate and the photosensitive resin layer, and is reflected on the photosensitive resin layer portion before transfer. There is a possibility of hitting.

  In the present invention, since the outer peripheral surface of the transfer support roller is used as a light reflecting surface, it is possible to irradiate the light beam at a large angle (an angle close to perpendicular to the substrate surface). Therefore, it is possible to reliably irradiate the portion of the photosensitive resin layer immediately after the transfer with light, and to prevent or suppress the other portion from being irradiated with the light.

  Next, the fine transfer device of the present invention has a resin block portion that prevents the photosensitive resin from protruding or wrapping around in a region other than the resin coating region between the substrate and the mold in the laminate. ing. As a result, it is possible to reliably prevent the photosensitive resin from protruding or wrapping around the portion other than the coating region on the surface of the substrate.

  Moreover, the fine transfer apparatus of this invention has the resin removal part which removes the photosensitive resin which protruded from the end surface of the said laminated body before hardening. Removing unnecessary photosensitive resin parts before curing eliminates the need for post-processes such as cutting and removing unnecessary photosensitive resin parts after curing, increasing the production efficiency of transfer work. it can.

It is explanatory drawing which shows the nanoimprint apparatus of Embodiment 1 to which this invention is applied. It is explanatory drawing which shows the application area | region control part of the resin in FIG. It is explanatory drawing which shows the resin removal part of the resin in FIG. It is explanatory drawing which shows the nanoimprint apparatus of Embodiment 2 to which this invention is applied. It is explanatory drawing which shows an example of the adhesion pattern by the resin application part in FIG. It is explanatory drawing which shows the exposure part in FIG.

  Embodiments of a fine transfer apparatus to which the present invention is applied will be described below with reference to the drawings. In the following embodiments, the present invention is applied to a nanoimprint apparatus that transfers a nano-order fine pattern. The present invention can be similarly applied to a fine transfer apparatus such as an imprint apparatus that transfers a micron-order fine pattern, and the present invention is not limited to a nanoimprint apparatus.

[Embodiment 1]
FIG. 1 is an explanatory diagram showing the main configuration of the nanoimprint apparatus (fine transfer apparatus) according to the first embodiment. A nanoimprint apparatus (fine transfer apparatus) 1 transfers a fine pattern of a mold 4 to a resin layer 3 made of an ultraviolet curable resin that covers the surface of a transparent glass substrate 2. The nanoimprint apparatus 1 is supplied with a laminate 5 having a configuration in which a mold 4 is laminated on a glass substrate 2 with a resin layer 3 interposed therebetween. Of course, a resin substrate may be used instead of the glass substrate 2.

  In addition, the laminated body 5 is supplied as follows. In the resin application part 6 indicated by an imaginary line in the figure, an ultraviolet curable resin is applied to the surface of the mold 4 by various known methods. In the mold 4 after the UV curable resin is applied, the glass substrate 2 is positioned in a state where the applied UV resin is sandwiched in the mold stacking portion 8 indicated by an imaginary line in the drawing. The resin application unit 6 and the mold lamination unit 8 may be mounted on the nanoimprint apparatus 1 or may be configured separately from the nanoimprint apparatus 1.

  The nanoimprint apparatus 1 includes an apparatus base 11, a movable stage 12 mounted on the apparatus base 11, and a moving mechanism 13 for moving the stage 12. The stage 12 can reciprocate linearly in the forward direction F and the backward direction B. A transfer unit 15 and an exposure unit 20 are mounted on the apparatus base 11.

  The transfer unit 15 is disposed in the middle of the moving path of the stage 12. The transfer unit 15 includes a roller support base 16 attached to the apparatus base 11, a roller press mechanism 17 mounted on the roller support base 16, and a transfer press roller 18 mounted on the roller press mechanism 17. Yes. The press roller 18 is located directly above the moving path of the stage 12 and can be moved up and down by the roller press mechanism 17.

  The exposure unit 20 is disposed at a position on the forward direction F side of the stage 12 with respect to the press roller 18. The exposure unit 20 includes an ultraviolet irradiation lamp 21 and a lamp driving circuit unit 22, and can irradiate the laminated body 5 sent in the forward direction F from the press roller 18 with ultraviolet rays obliquely from above.

  In the transfer operation, the laminated body 5 is positioned and fixed on the stage 12 with the glass substrate 2 positioned on the upper side, and is sent in the forward direction F together with the stage 12. In the transfer unit 15, the laminate 5 is sent out while being pressed against the stage 12 by a press roller 18 with a predetermined pressure. While passing the pressurizing position (nip position) by the press roller 18, the fine pattern of the mold 4 is transferred to the resin layer 3 made of an ultraviolet curable resin.

  The laminated body 5 after the transfer is irradiated with ultraviolet rays from the exposure unit 20. Ultraviolet rays pass through the transparent glass substrate 2 of the laminate 5 and irradiate the resin layer 3 to which the fine pattern has been transferred, whereby the resin layer 3 is cured. In the laminated body 5 after exposure, the mold 4 is peeled and removed at the demolding portion 9 indicated by an imaginary line in the drawing. The glass substrate 2 on which the fine pattern is transferred to the resin layer on the surface is removed from the stage 12 and conveyed toward the next process. The demolding unit 9 may be mounted on the nanoimprint apparatus 1 or may be configured separately from the nanoimprint apparatus 1.

  The stage 12 that has become empty moves in the backward direction B and returns to the initial position, which is the receiving position for the new laminate 5. The control of the moving mechanism 13 of the stage 12, the control of the pressing force by the press roller 18, and the exposure control of the exposure unit 20 are performed by the controller 10 mounted on the apparatus base 11.

(Resin block part)
In the nanoimprint apparatus 1 configured as described above, in the transfer unit 15, the laminated body 5 is pressed against the stage 12 by the press roller 18, and passes through a pressure position by the press roller 18. At this time, since the resin layer 3 between the glass substrate 2 and the mold 4 is also pressed, a part of the ultraviolet curable resin is pushed out between the glass substrate 2 and the mold 4, and the outside of the glass substrate 2 from the outer peripheral end. There is a risk of sticking out. In order to prevent such harmful effects, it is desirable that the laminate 5 has the following configuration.

  FIG. 2 is an explanatory view showing an example of a laminated body. A laminated body 5A shown in this figure includes a glass substrate 2, a mold 4, a magnet sheet 28, and a resin block sheet 29. In the resin application part 6 (see FIG. 1), the mold 4 made of a magnetic material such as Ni is placed on the magnet sheet 28 placed on the surface of the stage 12. Thereby, the mold 4 is arranged on the stage in a flat state. A resin block sheet 29 is fixed to the surface of the magnet sheet 28 so as to surround the mold 4. For example, the resin block sheet 29 is attached to the surface of the magnet sheet 28 while being detachable with an adhesive.

  In this state, a predetermined amount of ultraviolet curable resin 7 is applied to the surface of the mold 4. By applying the ultraviolet curable resin 7 to the mold surface flattened by the magnetic force, the necessary minimum amount of the ultraviolet curable resin can be uniformly applied accurately. Further, in this state, the applied ultraviolet curable resin was leveled using an applicator such as a bar coater, so that a more accurate amount of the ultraviolet curable resin was applied to the surface of the mold 4 with a uniform thickness. A state can be formed.

  After application, the laminated portion 8 (see FIG. 1) sandwiches the ultraviolet curable resin 7, positions the glass substrate 2, and laminates it on the mold 4. As a result, a laminate 5A having the configuration shown in FIG. 2 is obtained. The mold 4 is sandwiched between the glass substrate 2 and the magnet sheet 28 while being surrounded by the resin block sheet 29. Therefore, the ultraviolet curable resin 7 applied to the surface of the glass substrate 2 is in a state of being caught in a gap surrounded by the surface of the glass substrate 2, the surface of the mold 4, and the inner peripheral end surface of the resin block sheet 29. Become.

  Even when the laminated body 5A having such a configuration is pressed in the thickness direction by the press roller 18 in the transfer section 15, the ultraviolet curable resin 7 is prevented from moving to the outer peripheral side by the resin block sheet 29. Therefore, the ultraviolet curable resin 7 is not pushed out to the outer peripheral end side of the glass substrate 2 and protrudes outside.

  Here, the resin block sheet 29 is at least the thickness of the mold 4 plus the thickness of the resin layer of the ultraviolet curable resin 7. The resin block sheet 29 can be formed from a POM sheet, a fluororesin sheet, a fluororubber sheet, a silicon rubber sheet, or the like. In the case of a POM sheet or a fluororesin sheet, for example, the sheet thickness is set to 0.3 mm or more. In the case of a fluoro rubber sheet or a silicon rubber sheet, for example, the sheet thickness is 0.5 mm or more.

(Resin removal part)
In the laminated body 5, instead of preventing the UV curable resin from protruding between the glass substrate 2 and the mold 4 to the outer peripheral edge thereof, the UV curable resin protruding from the outer peripheral edge is removed before curing (before exposure). You may make it do.

  FIG. 3 is an explanatory view showing a laminate 5B suitable for removing the protruding ultraviolet curable resin. In the laminate 5B, the mold 4B has at least the edges 4a, 4b on both sides in the width direction projecting with a constant width outward from the edges 2a, 2b on both sides of the glass substrate 2 in the width direction. These edge portions 4a and 4b on both sides are bent at an angle of less than 90 degrees in a direction away from the glass substrate 2.

  In the nanoimprint apparatus 1, scrapers 25a and 25b and suction units 26a and 26b are arranged. The scrapers 25 a and 25 b are arranged on both sides of the stage 12 at a portion corresponding to the transfer position in the moving direction of the stage 12. Adsorption units 26a and 26b are disposed on the scrapers 25a and 25b, respectively.

  When the laminate 5B is pressed by the press roller 18 at the transfer position, the ultraviolet curable resin may be pushed outward from the edges 2a, 2b on both sides of the glass substrate 2. The extruded ultraviolet curable resin protrudes from the surfaces of the edges 4a and 4b on both sides of the inclined mold 4. The ultraviolet curable resin that protrudes from the surfaces of the edges 4a and 4b is scraped off by the scrapers 25a and 25b disposed on both sides of the stage 12 in the transfer portion as the stage 12 moves. The scraped ultraviolet curable resin is removed by adsorption by the adsorption units 26a and 26b.

  Instead of using the scrapers 25a, 25b and the suction units 26a, 26b, it is also possible to suck and remove the ultraviolet curable resin protruding from the edges 4a, 4b on both sides of the mold 4 using a vacuum suction nozzle.

  Moreover, while adopting these resin removal mechanisms, it is possible to accurately control the application amount of the ultraviolet curable resin applied to the surface of the glass substrate 2 in the resin application part 6 (see FIG. 1) so as to be a necessary minimum amount. desirable. In this way, it is possible to reliably prevent the ultraviolet curable resin from protruding from the edges on both sides of the glass substrate 2 in the transfer portion 15.

  In addition, the ultraviolet curable resin which protruded from the rear-end edge of the laminated body 5B can be scraped off and removed, for example, by moving a scraper and an adsorption unit along the width direction of the laminated body 5B. Further, by applying the principle of electrostatic coating instead of the scraper and vacuum suction, it is also possible to remove the protruding ultraviolet curable resin by electrostatic adsorption.

  On the other hand, the ultraviolet curable resin protruding from the outer peripheral edge of the glass substrate 2 can be cured and removed in a separate process from the ultraviolet curable resin in the fine pattern transfer region. For example, the entire laminate of the glass substrate and the mold can be covered with a film, and the protruding ultraviolet curable resin can be attached to the film and cured to be removed. The protruding ultraviolet curable resin can be completely cured by nitrogen purge or the like, and can be cut and removed after curing. It is also possible to irradiate the ultraviolet curable resin portion protruding from the side of the transfer portion 15 directly below the press roller 18 with high-intensity ultraviolet rays, and cure and remove only the resin portion first. .

[Embodiment 2]
FIG. 4 is an explanatory diagram showing a main part of the nanoimprint apparatus (fine transfer apparatus) according to the second embodiment. The nanoimprint apparatus (fine transfer apparatus) 30 includes a supply unit 33 that supplies a substrate, for example, a glass substrate 31 and a mold 32. In addition, the glass substrate 31 and the mold 32 are positioned while the photosensitive resin, for example, the ultraviolet curable resin 34 is applied to the surface of the supplied glass substrate 31 and the applied ultraviolet curable resin 34 is sandwiched between the glass substrate 31 and the mold 32. A stacking portion 37 that is stacked to form a stacked body 36 is provided.

  The nanoimprint apparatus 1 further conveys the laminated portion 37 along a moving path that passes through a line-shaped pressing position by the transfer press roller 38, so that the ultraviolet light sandwiched between the glass substrate 31 and the mold 32 is obtained. A transfer portion 39 for transferring the fine pattern of the mold 32 to the layer of the cured resin 34 and an exposure portion 40 for irradiating the ultraviolet ray curable resin 34 after the transfer of the fine pattern with ultraviolet rays for curing are provided. In addition to this, the mold 32 is peeled from the layer of the cured ultraviolet curable resin 34, and a demolding part 41 is provided to send the glass substrate 31 after transfer to the next process.

  The drive control of each part described above is performed by the controller 42. Further, the resin application part 35, the lamination part 37, the transfer part 39 and the exposure part 40 are arranged in this order from the upstream side to the downstream side along the movement path of the glass substrate 31.

  The resin coating unit 35 includes a resin discharge unit 35b that discharges droplets of the ultraviolet curable resin 34 from a single or a plurality of nozzles 35a and adheres the droplets to the surface of the glass substrate 31 in a predetermined pattern. The controller 42 controls the discharge amount of the droplets of the ultraviolet curable resin 34 discharged from the nozzle 35a, controls the adhesion pattern of the droplets of the ultraviolet curable resin 34 attached to the glass substrate 31, or controls the discharge amount and the adhesion pattern. It functions as a discharge controller that controls both.

  For example, as shown in FIG. 5, on the surface 31 a of the glass substrate 31, the droplets of the ultraviolet curable resin 34 are spaced at predetermined intervals in the length direction, which is the moving direction of the glass substrate 31, and in the width direction perpendicular thereto. Control is performed so that the adhesion pattern is adhered in a matrix. The optimum adhesion pattern, the amount of liquid droplets to be ejected, and the like are controlled according to parameters such as the size of the glass substrate 31 to be processed, the formation area of the fine pattern, and the pressing force of the transfer press roller 38.

  The laminated portion 37 includes a resin leveling press roller 37a and a resin leveling support roller 37b. The resin leveling press roller 37a is, for example, a resin roller, and can be pressed toward a hard material, for example, a metal leveling support roller 37b with a predetermined pressure for resin leveling. The glass substrate 31 and the mold 32 are fed and laminated between a resin leveling press roller 37a and a resin leveling support roller 37b. Further, by passing between these, the droplets of the ultraviolet curable resin are crushed and spread between the glass substrate 31 and the mold 32 to form a resin layer 34a having a certain thickness.

  The transfer unit 39 includes a transfer press roller 38 and a transfer support roller 43. The transfer press roller 38 is, for example, a resin roller, and can be pressed against the transfer support roller 43 made of a hard material such as metal with the laminated body 36 interposed therebetween with a predetermined transfer pressure. While the laminate 36 passes between the transfer press roller 38 and the transfer support roller 43, the fine pattern of the mold 32 is transferred to the resin layer while the resin layer 34a between them is uniformly leveled.

  Here, the controller 42 is a nip pressure control unit that controls the pressure for resin leveling, the pressure for transfer, or controls both the pressure for leveling resin and the pressure for transfer. Function as.

  Next, with reference to FIGS. 4 and 6, the exposure unit 40 includes a light emitting unit 40 a that emits ultraviolet light, and a reflecting surface 43 a formed on the circular outer peripheral surface of the transfer support roller 43. . The ultraviolet ray emitted from the light emitting part 40a is reflected by the reflecting surface 43a, and the ultraviolet curable resin in the laminate 36 immediately after being sent out from the nip part 39a (transfer position) between the transfer press roller 38 and the transfer support roller 43. Toward the layer portion 34b.

  The glass substrate 31 of the laminate 36 is a transparent glass substrate that is transmissive to ultraviolet rays, and is laminated on the transfer support roller 43 side, as can be seen from the figure. Therefore, the ultraviolet reflected light component reflected by the reflecting surface 43a is transmitted through the glass substrate 31 and irradiates the layer portion 34b of the ultraviolet curable resin immediately after the transfer position 39a, thereby curing the layer portion.

  When irradiating the ultraviolet rays directly toward the layer portion 34b, the incident angle of the ultraviolet rays with respect to the surface of the glass substrate 31 is greatly inclined from the vertical direction, and the irradiation light quantity of the layer portion 34b may not be ensured. Further, the ultraviolet rays are reflected in the glass substrate and the layer portion of the ultraviolet curable resin on the near side of the transfer position 39a is irradiated, and there is a possibility that the fine pattern cannot be transferred with high accuracy.

  In this example, since the ultraviolet rays are reflected by the reflecting surface 43a formed on the outer peripheral surface of the transfer support roller 43, it can be incident on the surface of the glass substrate 31 at an angle close to the vertical direction. . Therefore, the layer portion 34b immediately after transfer can be reliably irradiated and cured. The transfer support roller 43 is made of a hard material such as metal, and the outer peripheral surface of the roller is processed to have a high cylindricity so that a uniform transfer pressure is applied in the roller surface length direction. Is mirror finished. Accordingly, the mirror-finished outer peripheral surface of the transfer support roller 43 can be used as it is as a reflecting surface.

  In the nanoimprint apparatus 30 of this example, the resin removal unit (see FIG. 3) described in Embodiment 1 may be attached to remove the resin protruding from the outer peripheral edge of the glass substrate 31. Of course.

1 Nanoimprint device (fine transfer device) 2 Glass substrate 3 UV curable resin layer,
4 mold, 4B mold, 4a, 4b edge, 5 laminate,
5A, 5B laminated body, 6 resin application part, 7 UV curable resin, 8 laminated part,
9 Demolding section, 10 controller, 11 device mount, 12 stage,
13 transfer mechanism, 15 transfer section, 16 roller support section, 17 roller press mechanism,
18 roller for press, 20 exposure part, 21 UV irradiation lamp,
22 lamp drive circuit unit, 25a, 25b scraper,
26a, 26b adsorption unit, 28 magnet sheet, 29 resin block sheet,
30 nanoimprinting device (fine transfer device), 31 glass substrate, 32 mold,
33 supply unit, 34 UV curable resin, 34a resin layer,
34b Resin layer immediately after transfer, 35 Resin application part, 35a Nozzle,
35b Resin discharging part, 36 laminated body, 37 laminated part, 37a resin leveling press roller, 37b resin leveling support roller, 38 transfer press roller, 39 transfer part,
39a Nip part (transfer position), 40 exposure part, 41 demolding part, 42 controller,
43 Transfer support roller, 43a Reflective surface

Claims (8)

A resin application part for applying a photosensitive resin to the surface of the substrate or mold;
A laminated part sandwiching the applied photosensitive resin and stacking the substrate and the mold to form a laminated body,
The laminate is conveyed along a movement path that passes through a line-shaped pressure position by a transfer press roller, so that the layer of the photosensitive resin sandwiched between the substrate and the mold is placed on the layer of the mold. A transfer part for transferring a fine pattern;
An exposure part for irradiating and curing the photosensitive resin layer after the fine pattern is transferred;
A resin block portion for preventing the photosensitive resin from protruding from the outer peripheral edge of the substrate in the laminate;
A fine transfer device characterized by comprising: A laminate having a configuration in which the photosensitive resin is sandwiched and the substrate and the mold are overlapped is transported along a moving path passing through a line-shaped pressurizing position by a transfer press roller. A transfer portion for transferring the fine pattern of the mold to the photosensitive resin layer sandwiched between
An exposure part for irradiating and curing the photosensitive resin layer after the fine pattern is transferred;
A resin removing portion that removes the photosensitive resin protruding from the end face of the laminate before curing;
A fine transfer device characterized by comprising: A resin application part for applying a photosensitive resin to the surface of the substrate or mold;
A laminated part sandwiching the applied photosensitive resin and stacking the substrate and the mold to form a laminated body,
The laminate is conveyed along a movement path that passes through a line-shaped pressure position by a transfer press roller, so that the layer of the photosensitive resin sandwiched between the substrate and the mold is placed on the layer of the mold. A transfer part for transferring a fine pattern;
An exposure part for irradiating and curing the photosensitive resin layer after the fine pattern is transferred;
Have
The resin application part is
A resin discharge unit that discharges droplets of photosensitive resin from a single nozzle or a plurality of nozzles and adheres the droplets of photosensitive resin in a predetermined pattern to the surface of the substrate;
Control of the discharge amount of the photosensitive resin droplets discharged from the nozzle, control of the adhesion pattern of the photosensitive resin droplets attached to the substrate, or control of both the discharge amount and the adhesion pattern A resin discharge control unit for performing
A fine transfer apparatus comprising: A laminated part that sandwiches a photosensitive resin and stacks a substrate and a mold to form a laminated body,
The laminate is conveyed along a movement path that passes through a line-shaped pressure position by a transfer press roller, so that the layer of the photosensitive resin sandwiched between the substrate and the mold is placed on the layer of the mold. A transfer part for transferring a fine pattern;
An exposure part for irradiating and curing the photosensitive resin layer after the fine pattern is transferred;
Have
The laminated portion includes a resin leveling press roller and a resin leveling support roller, and the resin leveling press roller sandwiches the laminate and supports the resin leveling with a pressurizing pressure for resin leveling. Can be pressed against the roller,
The substrate and the mold are fed and laminated between the resin-equalizing press roller and the resin-equalizing support roller, and by passing between them, the droplets of the photosensitive resin are leveled. A fine transfer device in which a resin layer is formed between the substrate and the mold. In claim 4,
The transfer unit includes the transfer press roller and a transfer support roller, and the transfer press roller can sandwich the laminate and be pressed against the transfer support roller with a transfer pressure.
A fine transfer device in which a fine pattern of the mold is transferred to the resin layer while the laminate passes between the transfer press roller and the transfer support roller. In claim 5,
A nip pressure control unit for controlling the pressure applied for the resin leveling, controlling the pressure applied for the transfer, or controlling both the pressure applied for the resin leveling and the pressure applied for the transfer The fine transfer device. In claim 5 or 6,
The exposure unit is
A light emitting part;
A reflective surface that reflects the light beam emitted from the light emitting portion toward the photosensitive resin layer portion of the laminate immediately after being sent out from the nip portion between the transfer press roller and the transfer support roller. When,
With
The reflective surface is formed on the outer peripheral surface of the transfer support roller,
The fine transfer apparatus, wherein the substrate of the laminate is a translucent substrate that is located on the transfer support roller side and is capable of transmitting the light beam. In any one of claims 3 to 7,
A fine transfer device having a resin removing portion for removing a photosensitive resin protruding from an end face of the laminate before curing.