JP2014517856A5 - - Google Patents
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- Publication number
- JP2014517856A5 JP2014517856A5 JP2014506475A JP2014506475A JP2014517856A5 JP 2014517856 A5 JP2014517856 A5 JP 2014517856A5 JP 2014506475 A JP2014506475 A JP 2014506475A JP 2014506475 A JP2014506475 A JP 2014506475A JP 2014517856 A5 JP2014517856 A5 JP 2014517856A5
- Authority
- JP
- Japan
- Prior art keywords
- voxel
- dose
- volume
- photocurable composition
- solid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000007787 solid Substances 0.000 claims 6
- 239000000178 monomer Substances 0.000 claims 3
- NGQSLSMAEVWNPU-YTEMWHBBSA-N 1,2-bis[(e)-2-phenylethenyl]benzene Chemical compound C=1C=CC=CC=1/C=C/C1=CC=CC=C1\C=C\C1=CC=CC=C1 NGQSLSMAEVWNPU-YTEMWHBBSA-N 0.000 claims 2
- 125000001140 1,4-phenylene group Chemical group [H]C1=C([H])C([*:2])=C([H])C([H])=C1[*:1] 0.000 claims 2
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims 2
- 125000000217 alkyl group Chemical group 0.000 claims 2
- 125000004432 carbon atom Chemical group C* 0.000 claims 2
- 239000000975 dye Substances 0.000 claims 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 2
- 239000011347 resin Substances 0.000 claims 2
- 229920005989 resin Polymers 0.000 claims 2
- 241001070941 Castanea Species 0.000 claims 1
- 235000014036 Castanea Nutrition 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201161478180P | 2011-04-22 | 2011-04-22 | |
| US61/478,180 | 2011-04-22 | ||
| PCT/US2012/033874 WO2012145282A2 (en) | 2011-04-22 | 2012-04-17 | Enhanced multi-photon imaging resolution method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2014517856A JP2014517856A (ja) | 2014-07-24 |
| JP2014517856A5 true JP2014517856A5 (https=) | 2015-03-19 |
Family
ID=46026938
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014506475A Pending JP2014517856A (ja) | 2011-04-22 | 2012-04-17 | 改善された多光子撮像解像方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20140030655A1 (https=) |
| EP (1) | EP2699965A2 (https=) |
| JP (1) | JP2014517856A (https=) |
| CN (1) | CN103492951A (https=) |
| WO (1) | WO2012145282A2 (https=) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2718766A1 (en) | 2011-06-08 | 2014-04-16 | 3M Innovative Properties Company | Photoresists containing polymer-tethered nanoparticles |
| JP2015512061A (ja) * | 2012-02-28 | 2015-04-23 | スリーエム イノベイティブ プロパティズ カンパニー | 陰性造影組成物を用いた多光子硬化方法 |
| JP6566952B2 (ja) | 2013-12-06 | 2019-08-28 | スリーエム イノベイティブ プロパティズ カンパニー | 光反応性液体組成物及び構造体の作製方法 |
| IT202100013421A1 (it) * | 2021-05-24 | 2022-11-24 | Fondazione St Italiano Tecnologia | Formulazioni di fotoresist per tecniche di microstampa 3D |
| EP4160313A1 (en) * | 2021-09-30 | 2023-04-05 | Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. | Method for non-invasive production of defined structures inside compartements and compartment |
Family Cites Families (30)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3954475A (en) | 1971-09-03 | 1976-05-04 | Minnesota Mining And Manufacturing Company | Photosensitive elements containing chromophore-substituted vinyl-halomethyl-s-triazines |
| US3987037A (en) | 1971-09-03 | 1976-10-19 | Minnesota Mining And Manufacturing Company | Chromophore-substituted vinyl-halomethyl-s-triazines |
| US3729313A (en) | 1971-12-06 | 1973-04-24 | Minnesota Mining & Mfg | Novel photosensitive systems comprising diaryliodonium compounds and their use |
| US3808006A (en) | 1971-12-06 | 1974-04-30 | Minnesota Mining & Mfg | Photosensitive material containing a diaryliodium compound, a sensitizer and a color former |
| US3779778A (en) | 1972-02-09 | 1973-12-18 | Minnesota Mining & Mfg | Photosolubilizable compositions and elements |
| US3741769A (en) | 1972-10-24 | 1973-06-26 | Minnesota Mining & Mfg | Novel photosensitive polymerizable systems and their use |
| AU497960B2 (en) | 1974-04-11 | 1979-01-25 | Minnesota Mining And Manufacturing Company | Photopolymerizable compositions |
| US4250053A (en) | 1979-05-21 | 1981-02-10 | Minnesota Mining And Manufacturing Company | Sensitized aromatic iodonium or aromatic sulfonium salt photoinitiator systems |
| US4642126A (en) | 1985-02-11 | 1987-02-10 | Norton Company | Coated abrasives with rapidly curable adhesives and controllable curvature |
| US4652274A (en) | 1985-08-07 | 1987-03-24 | Minnesota Mining And Manufacturing Company | Coated abrasive product having radiation curable binder |
| CA1323949C (en) | 1987-04-02 | 1993-11-02 | Michael C. Palazzotto | Ternary photoinitiator system for addition polymerization |
| US4859572A (en) | 1988-05-02 | 1989-08-22 | Eastman Kodak Company | Dye sensitized photographic imaging system |
| US5235015A (en) | 1991-02-21 | 1993-08-10 | Minnesota Mining And Manufacturing Company | High speed aqueous solvent developable photopolymer compositions |
| US6267913B1 (en) | 1996-11-12 | 2001-07-31 | California Institute Of Technology | Two-photon or higher-order absorbing optical materials and methods of use |
| WO1998021521A1 (en) | 1996-11-12 | 1998-05-22 | California Institute Of Technology | Two-photon or higher-order absorbing optical materials and methods of use |
| US6025406A (en) | 1997-04-11 | 2000-02-15 | 3M Innovative Properties Company | Ternary photoinitiator system for curing of epoxy resins |
| US5770737A (en) | 1997-09-18 | 1998-06-23 | The United States Of America As Represented By The Secretary Of The Air Force | Asymmetrical dyes with large two-photon absorption cross-sections |
| US5859251A (en) | 1997-09-18 | 1999-01-12 | The United States Of America As Represented By The Secretary Of The Air Force | Symmetrical dyes with large two-photon absorption cross-sections |
| US6078433A (en) | 1998-01-05 | 2000-06-20 | Intel Corporation | Zoom lens system |
| US6100405A (en) | 1999-06-15 | 2000-08-08 | The United States Of America As Represented By The Secretary Of The Air Force | Benzothiazole-containing two-photon chromophores exhibiting strong frequency upconversion |
| WO2001096962A2 (en) * | 2000-06-15 | 2001-12-20 | 3M Innovative Properties Company | Multiphoton absorption method using patterned light |
| DE60138021D1 (https=) * | 2000-06-15 | 2009-04-30 | 3M Innovative Properties Co | |
| ATE433129T1 (de) | 2000-06-15 | 2009-06-15 | 3M Innovative Properties Co | Mikroherstellungsverfahren für organische optische bauteile |
| JP2004503928A (ja) * | 2000-06-15 | 2004-02-05 | スリーエム イノベイティブ プロパティズ カンパニー | 多方向光反応吸収方法 |
| US7118845B2 (en) * | 2000-06-15 | 2006-10-10 | 3M Innovative Properties Company | Multiphoton photochemical process and articles preparable thereby |
| US20040012872A1 (en) * | 2001-06-14 | 2004-01-22 | Fleming Patrick R | Multiphoton absorption method using patterned light |
| US20030155667A1 (en) * | 2002-12-12 | 2003-08-21 | Devoe Robert J | Method for making or adding structures to an article |
| US8193397B2 (en) | 2006-12-06 | 2012-06-05 | 3M Innovative Properties Company | Hydrofluoroether compounds and processes for their preparation and use |
| EP2207820A4 (en) * | 2007-10-11 | 2011-10-26 | 3M Innovative Properties Co | HIGHLY FUNCTIONAL REACTIVE SPECIES WITH MULTIPHOTONIC HARDENING |
| US8432533B2 (en) | 2009-01-05 | 2013-04-30 | Univ. of MD. at College Park | Method and system for photolithographic fabrication with resolution far below the diffraction limit |
-
2012
- 2012-04-17 JP JP2014506475A patent/JP2014517856A/ja active Pending
- 2012-04-17 WO PCT/US2012/033874 patent/WO2012145282A2/en not_active Ceased
- 2012-04-17 CN CN201280019462.7A patent/CN103492951A/zh active Pending
- 2012-04-17 EP EP12718808.4A patent/EP2699965A2/en not_active Withdrawn
- 2012-04-17 US US14/002,493 patent/US20140030655A1/en not_active Abandoned
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