|
US3987037A
(en)
|
1971-09-03 |
1976-10-19 |
Minnesota Mining And Manufacturing Company |
Chromophore-substituted vinyl-halomethyl-s-triazines
|
|
US3954475A
(en)
|
1971-09-03 |
1976-05-04 |
Minnesota Mining And Manufacturing Company |
Photosensitive elements containing chromophore-substituted vinyl-halomethyl-s-triazines
|
|
US3808006A
(en)
|
1971-12-06 |
1974-04-30 |
Minnesota Mining & Mfg |
Photosensitive material containing a diaryliodium compound, a sensitizer and a color former
|
|
US3729313A
(en)
|
1971-12-06 |
1973-04-24 |
Minnesota Mining & Mfg |
Novel photosensitive systems comprising diaryliodonium compounds and their use
|
|
US3779778A
(en)
|
1972-02-09 |
1973-12-18 |
Minnesota Mining & Mfg |
Photosolubilizable compositions and elements
|
|
US3741769A
(en)
|
1972-10-24 |
1973-06-26 |
Minnesota Mining & Mfg |
Novel photosensitive polymerizable systems and their use
|
|
AU497960B2
(en)
|
1974-04-11 |
1979-01-25 |
Minnesota Mining And Manufacturing Company |
Photopolymerizable compositions
|
|
US4250053A
(en)
|
1979-05-21 |
1981-02-10 |
Minnesota Mining And Manufacturing Company |
Sensitized aromatic iodonium or aromatic sulfonium salt photoinitiator systems
|
|
US4642126A
(en)
|
1985-02-11 |
1987-02-10 |
Norton Company |
Coated abrasives with rapidly curable adhesives and controllable curvature
|
|
US4652274A
(en)
|
1985-08-07 |
1987-03-24 |
Minnesota Mining And Manufacturing Company |
Coated abrasive product having radiation curable binder
|
|
CA1323949C
(en)
|
1987-04-02 |
1993-11-02 |
Michael C. Palazzotto |
Ternary photoinitiator system for addition polymerization
|
|
US4859572A
(en)
|
1988-05-02 |
1989-08-22 |
Eastman Kodak Company |
Dye sensitized photographic imaging system
|
|
US5235015A
(en)
|
1991-02-21 |
1993-08-10 |
Minnesota Mining And Manufacturing Company |
High speed aqueous solvent developable photopolymer compositions
|
|
US6267913B1
(en)
|
1996-11-12 |
2001-07-31 |
California Institute Of Technology |
Two-photon or higher-order absorbing optical materials and methods of use
|
|
WO1998021521A1
(en)
|
1996-11-12 |
1998-05-22 |
California Institute Of Technology |
Two-photon or higher-order absorbing optical materials and methods of use
|
|
US6025406A
(en)
|
1997-04-11 |
2000-02-15 |
3M Innovative Properties Company |
Ternary photoinitiator system for curing of epoxy resins
|
|
US5770737A
(en)
|
1997-09-18 |
1998-06-23 |
The United States Of America As Represented By The Secretary Of The Air Force |
Asymmetrical dyes with large two-photon absorption cross-sections
|
|
US5859251A
(en)
|
1997-09-18 |
1999-01-12 |
The United States Of America As Represented By The Secretary Of The Air Force |
Symmetrical dyes with large two-photon absorption cross-sections
|
|
US6078433A
(en)
|
1998-01-05 |
2000-06-20 |
Intel Corporation |
Zoom lens system
|
|
US6100405A
(en)
|
1999-06-15 |
2000-08-08 |
The United States Of America As Represented By The Secretary Of The Air Force |
Benzothiazole-containing two-photon chromophores exhibiting strong frequency upconversion
|
|
WO2001096959A2
(en)
*
|
2000-06-15 |
2001-12-20 |
3M Innovative Properties Company |
Multidirectional photoreactive absorption method
|
|
US7118845B2
(en)
*
|
2000-06-15 |
2006-10-10 |
3M Innovative Properties Company |
Multiphoton photochemical process and articles preparable thereby
|
|
EP1292863A2
(en)
*
|
2000-06-15 |
2003-03-19 |
3M Innovative Properties Company |
Multiphoton absorption method using patterned light
|
|
EP1297021B1
(en)
*
|
2000-06-15 |
2009-03-18 |
3M Innovative Properties Company |
Multiphoton photosensitization system
|
|
JP4965052B2
(ja)
|
2000-06-15 |
2012-07-04 |
スリーエム イノベイティブ プロパティズ カンパニー |
３次元光学素子の加工方法
|
|
US20040012872A1
(en)
*
|
2001-06-14 |
2004-01-22 |
Fleming Patrick R |
Multiphoton absorption method using patterned light
|
|
US20030155667A1
(en)
*
|
2002-12-12 |
2003-08-21 |
Devoe Robert J |
Method for making or adding structures to an article
|
|
US8193397B2
(en)
|
2006-12-06 |
2012-06-05 |
3M Innovative Properties Company |
Hydrofluoroether compounds and processes for their preparation and use
|
|
WO2009048705A1
(en)
*
|
2007-10-11 |
2009-04-16 |
3M Innovative Properties Company |
Highly functional multiphoton curable reactive species
|
|
US8432533B2
(en)
|
2009-01-05 |
2013-04-30 |
Univ. of MD. at College Park |
Method and system for photolithographic fabrication with resolution far below the diffraction limit
|