JP2014511849A5 - - Google Patents
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- Publication number
- JP2014511849A5 JP2014511849A5 JP2014502731A JP2014502731A JP2014511849A5 JP 2014511849 A5 JP2014511849 A5 JP 2014511849A5 JP 2014502731 A JP2014502731 A JP 2014502731A JP 2014502731 A JP2014502731 A JP 2014502731A JP 2014511849 A5 JP2014511849 A5 JP 2014511849A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- degradation
- hydrogen atom
- shows
- hydrocarbon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000015556 catabolic process Effects 0.000 description 5
- 238000006731 degradation reaction Methods 0.000 description 5
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 4
- 125000001183 hydrocarbyl group Chemical group 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 125000000008 (C1-C10) alkyl group Chemical group 0.000 description 1
- 125000006374 C2-C10 alkenyl group Chemical group 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 125000002009 alkene group Chemical group 0.000 description 1
- 125000002355 alkine group Chemical group 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201161470767P | 2011-04-01 | 2011-04-01 | |
| US61/470,767 | 2011-04-01 | ||
| US201261597883P | 2012-02-13 | 2012-02-13 | |
| US61/597,883 | 2012-02-13 | ||
| PCT/US2012/030850 WO2012135286A2 (en) | 2011-04-01 | 2012-03-28 | Stabilized acid amplifiers |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2014511849A JP2014511849A (ja) | 2014-05-19 |
| JP2014511849A5 true JP2014511849A5 (enExample) | 2015-07-30 |
Family
ID=46932305
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014502731A Pending JP2014511849A (ja) | 2011-04-01 | 2012-03-28 | 安定化された酸増幅剤 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US20140193752A1 (enExample) |
| JP (1) | JP2014511849A (enExample) |
| KR (1) | KR20140033027A (enExample) |
| WO (1) | WO2012135286A2 (enExample) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5960027B2 (ja) * | 2012-08-31 | 2016-08-02 | セントラル硝子株式会社 | 含フッ素酸増幅剤の保存方法 |
| WO2014208102A1 (en) * | 2013-06-27 | 2014-12-31 | Toyo Gosei Co., Ltd. | Reagent for Enhancing Generation of Chemical Species |
| US10031416B2 (en) | 2013-08-07 | 2018-07-24 | Toyo Gosei Co., Ltd. | Reagent for enhancing generation of chemical species |
| JP2016539201A (ja) * | 2013-10-02 | 2016-12-15 | 東洋合成工業株式会社 | 化学種発生向上試剤 |
| US20160259245A1 (en) * | 2013-10-07 | 2016-09-08 | Toyo Gosei Co., Ltd. | Reagent for enhancing generation of chemical species and manufacturing apparatus |
| KR102324819B1 (ko) | 2014-12-12 | 2021-11-11 | 삼성전자주식회사 | 포토레지스트용 고분자, 포토레지스트 조성물, 패턴 형성 방법 및 반도체 장치의 제조 방법 |
| US9951164B2 (en) * | 2016-08-12 | 2018-04-24 | International Business Machines Corporation | Non-ionic aryl ketone based polymeric photo-acid generators |
| US9983475B2 (en) * | 2016-08-12 | 2018-05-29 | International Business Machines Corporation | Fluorinated sulfonate esters of aryl ketones for non-ionic photo-acid generators |
| US9950999B2 (en) * | 2016-08-12 | 2018-04-24 | International Business Machines Corporation | Non-ionic low diffusing photo-acid generators |
| US10662274B2 (en) | 2016-12-02 | 2020-05-26 | Georgia Tech Research Corporation | Self-immolative polymers, articles thereof, and methods of making and using same |
| JP2022129980A (ja) * | 2021-02-25 | 2022-09-06 | 東京応化工業株式会社 | 化学増幅型ポジ型感光性組成物、感光性ドライフィルム、パターン化されたレジスト膜の製造方法、鋳型付き基板の製造方法、及びめっき造形物の製造方法 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3995369B2 (ja) * | 1998-12-07 | 2007-10-24 | 富士フイルム株式会社 | ポジ型フォトレジスト組成物 |
| US6605599B1 (en) * | 1997-07-08 | 2003-08-12 | Bristol-Myers Squibb Company | Epothilone derivatives |
| JP2002006481A (ja) * | 2000-06-23 | 2002-01-09 | Toda Kogyo Corp | 有機超強酸発生剤 |
| US7632833B2 (en) * | 2004-07-01 | 2009-12-15 | Merck & Co., Inc. | Mitotic kinesin inhibitors |
-
2012
- 2012-03-28 US US14/008,475 patent/US20140193752A1/en not_active Abandoned
- 2012-03-28 WO PCT/US2012/030850 patent/WO2012135286A2/en not_active Ceased
- 2012-03-28 JP JP2014502731A patent/JP2014511849A/ja active Pending
- 2012-03-28 KR KR1020137028396A patent/KR20140033027A/ko not_active Withdrawn
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