JP2014508663A5 - - Google Patents
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- Publication number
- JP2014508663A5 JP2014508663A5 JP2013543224A JP2013543224A JP2014508663A5 JP 2014508663 A5 JP2014508663 A5 JP 2014508663A5 JP 2013543224 A JP2013543224 A JP 2013543224A JP 2013543224 A JP2013543224 A JP 2013543224A JP 2014508663 A5 JP2014508663 A5 JP 2014508663A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- crystalline material
- weakly bonded
- bonded crystalline
- printer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002178 crystalline material Substances 0.000 claims 6
- 239000000758 substrate Substances 0.000 claims 5
- 125000004429 atoms Chemical group 0.000 claims 1
Claims (3)
- 弱く結合した結晶性材料を基板上に提供する方法であって、第１の弱く結合した結晶性材料の、第１の単一の個別の原子の乾燥した層の少なくとも一部を、基板の表面上に転写することを含み、転写することが、前記弱く結合した結晶性材料で前記基板をこすることを含む、方法。
- 基板の少なくとも１つの表面上に、第１の弱く結合した結晶性材料の、第１の個別の単一の原子の乾燥した層を有し、前記基板の表面上に転写された前記第１の弱く結合した結晶性材料が、Ｘ軸及びＹ軸の両方に整列した異なる寸法を有する印刷されたパターンを示す、物品。
- 乾燥状態の弱く結合した結晶性材料を有する印刷表面を有する第１の印刷ヘッドを備えるプリンターであって、前記プリンターがＸ軸、Ｙ軸、及びＺ軸のそれぞれに沿って印刷表面を動かすように設定されている、プリンター。
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US42101710P | 2010-12-08 | 2010-12-08 | |
| US61/421,017 | 2010-12-08 | ||
| PCT/US2011/063064 WO2012078464A2 (en) | 2010-12-08 | 2011-12-02 | Article and method of making and using the same |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2014508663A JP2014508663A (ja) | 2014-04-10 |
| JP2014508663A5 true JP2014508663A5 (ja) | 2015-01-22 |
| JP6124797B2 JP6124797B2 (ja) | 2017-05-10 |
Family
ID=46207657
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013543224A Active JP6124797B2 (ja) | 2010-12-08 | 2011-12-02 | 物品並びにその製造及び使用方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (2) | US9321254B2 (ja) |
| EP (1) | EP2649217A4 (ja) |
| JP (1) | JP6124797B2 (ja) |
| CN (2) | CN107419241A (ja) |
| WO (1) | WO2012078464A2 (ja) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6212050B2 (ja) | 2011-12-22 | 2017-10-11 | スリーエム イノベイティブ プロパティズ カンパニー | 高い光透過を備えた導電性物品 |
| CN103779576B (zh) * | 2012-10-24 | 2015-12-02 | 清华大学 | 电化学电池集流体的制备方法及电化学电池电极的制备方法 |
| GB2508226B (en) * | 2012-11-26 | 2015-08-19 | Selex Es Ltd | Protective housing |
| ITTO20150243A1 (it) * | 2015-05-07 | 2016-11-07 | Itt Italia Srl | Materiale di attrito, in particolare per la fabbricazione di una pastiglia freno, e metodo di preparazione associato |
| WO2017219125A1 (en) * | 2016-06-10 | 2017-12-28 | Pope Michael A | Method and apparatus for producing large-area monolayer films of solution dispersed nanomaterials |
Family Cites Families (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5389195A (en) | 1991-03-07 | 1995-02-14 | Minnesota Mining And Manufacturing Company | Surface modification by accelerated plasma or ions |
| US6203898B1 (en) | 1997-08-29 | 2001-03-20 | 3M Innovatave Properties Company | Article comprising a substrate having a silicone coating |
| US5972176A (en) | 1997-10-03 | 1999-10-26 | 3M Innovative Properties Company | Corona treatment of polymers |
| EP1611963A1 (en) | 2000-04-06 | 2006-01-04 | 3M Innovative Properties Company | Electrostatically and acoustically assisted coating method and apparatus |
| US20030129305A1 (en) | 2002-01-08 | 2003-07-10 | Yihong Wu | Two-dimensional nano-sized structures and apparatus and methods for their preparation |
| US6874699B2 (en) | 2002-10-15 | 2005-04-05 | Wisconsin Alumni Research Foundation | Methods and apparata for precisely dispensing microvolumes of fluids |
| US20050250052A1 (en) | 2004-05-10 | 2005-11-10 | Nguyen Khe C | Maskless lithography using UV absorbing nano particle |
| US20070138405A1 (en) | 2005-12-16 | 2007-06-21 | 3M Innovative Properties Company | Corona etching |
| JP4756548B2 (ja) * | 2006-04-20 | 2011-08-24 | 株式会社リコー | 潤滑剤供給装置、クリーニング装置、プロセスカートリッジ、及び、画像形成装置 |
| GB0622150D0 (en) * | 2006-11-06 | 2006-12-20 | Kontrakt Technology Ltd | Anisotropic semiconductor film and method of production thereof |
| JP4933287B2 (ja) * | 2007-01-29 | 2012-05-16 | 株式会社リコー | 画像形成装置用潤滑剤塗布装置及びこれを用いたプロセスカートリッジ並びに画像形成装置 |
| US7885595B2 (en) * | 2007-09-04 | 2011-02-08 | Ricoh Company Limited | Lubricant applicator, process cartridge including same, and image forming apparatus including same |
| EP3540436B1 (en) * | 2007-09-12 | 2023-11-01 | President And Fellows Of Harvard College | High-resolution molecular sensor |
| CN102066245B (zh) | 2007-10-19 | 2014-07-16 | 卧龙岗大学 | 石墨烯分散体的制备方法 |
| KR100923304B1 (ko) * | 2007-10-29 | 2009-10-23 | 삼성전자주식회사 | 그라펜 시트 및 그의 제조방법 |
| CN101442105B (zh) * | 2007-11-21 | 2010-06-09 | 中国科学院化学研究所 | 一种有机场效应晶体管及其专用源漏电极与制备方法 |
| KR101344493B1 (ko) | 2007-12-17 | 2013-12-24 | 삼성전자주식회사 | 단결정 그라펜 시트 및 그의 제조방법 |
| CN106376174B (zh) | 2008-02-05 | 2019-06-07 | 普林斯顿大学理事会 | 电子器件和形成电子器件的方法 |
| FI20085113A0 (fi) * | 2008-02-08 | 2008-02-08 | Valtion Teknillinen | Menetelmä grafiinirakenteiden valmistamiseksi alustoille |
| JP5553353B2 (ja) | 2008-03-26 | 2014-07-16 | 学校法人早稲田大学 | 単原子膜の製造方法 |
| CN101285175B (zh) * | 2008-05-29 | 2010-07-21 | 中国科学院化学研究所 | 化学气相沉积法制备石墨烯的方法 |
| US20100000441A1 (en) * | 2008-07-01 | 2010-01-07 | Jang Bor Z | Nano graphene platelet-based conductive inks |
| US8487296B2 (en) | 2008-11-26 | 2013-07-16 | New Jersey Institute Of Technology | Graphene deposition and graphenated substrates |
| US8057863B2 (en) * | 2008-12-05 | 2011-11-15 | The Regents Of The University Of California | Electrostatic force assisted deposition of graphene |
| CN101503174B (zh) * | 2009-03-18 | 2011-01-05 | 北京大学 | 二氧化钛光催化切割石墨烯的方法 |
| DE102009022982A1 (de) * | 2009-05-28 | 2010-12-02 | Oerlikon Trading Ag, Trübbach | Verfahren zum Aufbringen eines Hochtemperaturschmiermittels |
| CN101648182B (zh) * | 2009-09-07 | 2012-01-11 | 中国科学院化学研究所 | 一种溶液态石墨烯图案化排布方法 |
-
2011
- 2011-12-02 CN CN201710020285.9A patent/CN107419241A/zh active Pending
- 2011-12-02 WO PCT/US2011/063064 patent/WO2012078464A2/en active Application Filing
- 2011-12-02 JP JP2013543224A patent/JP6124797B2/ja active Active
- 2011-12-02 EP EP11846563.2A patent/EP2649217A4/en not_active Withdrawn
- 2011-12-02 US US13/880,820 patent/US9321254B2/en not_active Expired - Fee Related
- 2011-12-02 CN CN201180059236.7A patent/CN103314133B/zh not_active Expired - Fee Related
-
2016
- 2016-03-21 US US15/075,539 patent/US20160200098A1/en not_active Abandoned
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