JP2014214863A5 - - Google Patents

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Publication number
JP2014214863A5
JP2014214863A5 JP2013095346A JP2013095346A JP2014214863A5 JP 2014214863 A5 JP2014214863 A5 JP 2014214863A5 JP 2013095346 A JP2013095346 A JP 2013095346A JP 2013095346 A JP2013095346 A JP 2013095346A JP 2014214863 A5 JP2014214863 A5 JP 2014214863A5
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JP
Japan
Prior art keywords
opening
valve
gap
sealing member
seal member
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JP2013095346A
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Japanese (ja)
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JP6172442B2 (en
JP2014214863A (en
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Priority to JP2013095346A priority Critical patent/JP6172442B2/en
Priority claimed from JP2013095346A external-priority patent/JP6172442B2/en
Publication of JP2014214863A publication Critical patent/JP2014214863A/en
Publication of JP2014214863A5 publication Critical patent/JP2014214863A5/ja
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Description

また、前記ゲートバルブは、一般に、弁板に取り付けたＯリング等のシール部材を前記開口の回りの弁シート面に接離させて該開口を開閉するように構成されており、発塵を防止するため、前記シール部材を弁シート面に押し付けて前記開口を閉鎖した際に、前記弁板のシール部材以外の部分が前記隔壁に接触しないようになっており、該弁板と隔壁との間には隙間（閉弁隙間）が形成される。
このため、前記半導体処理装置において、前記被処理物の処理時に、前記プロセスチャンバ内のラジカルが前記閉弁隙間を通じてシール部材に作用し、該シール部材を劣化させたり、該シール部材からの発塵を生じさせたりするという問題があった。 The gate valve is generally configured to open and close the opening by bringing a sealing member such as an O-ring attached to the valve plate into contact with or separating from the valve seat surface around the opening to prevent dust generation. Therefore, when the seal member is pressed against the valve seat surface and the opening is closed, portions other than the seal member of the valve plate do not come into contact with the partition wall. A gap (valve closing gap) is formed in.
In this reason, the semiconductor processing apparatus, wherein when processing the object to be treated, the acting on the sealing member radicals within the process chamber through the closed gap, or deteriorate the sealing member, from the sheet seal member There was a problem of generating dust.

JP2013095346A 2013-04-30 2013-04-30 Gate valve Active JP6172442B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2013095346A JP6172442B2 (en) 2013-04-30 2013-04-30 Gate valve

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013095346A JP6172442B2 (en) 2013-04-30 2013-04-30 Gate valve

Publications (3)

Publication Number Publication Date
JP2014214863A JP2014214863A (en) 2014-11-17
JP2014214863A5 true JP2014214863A5 (en) 2016-06-02
JP6172442B2 JP6172442B2 (en) 2017-08-02

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ID=51940823

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013095346A Active JP6172442B2 (en) 2013-04-30 2013-04-30 Gate valve

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JP (1) JP6172442B2 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6209043B2 (en) * 2013-09-30 2017-10-04 東京エレクトロン株式会社 Gate valve and substrate processing apparatus
KR102193380B1 (en) * 2016-12-19 2020-12-21 주식회사 원익아이피에스 Apparatus for processing substrate
CN109323012B (en) * 2018-12-10 2023-10-10 嘉兴科奥电磁技术有限公司 Slide type three-way electromagnetic valve
CN114464550A (en) 2020-11-09 2022-05-10 东京毅力科创株式会社 Substrate processing system
CN113932011A (en) * 2021-11-23 2022-01-14 深圳市尊绅投资有限公司 Cavity vacuum transmission valve sealing assembly applied to TFT and PECVD process

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03173784A (en) * 1989-12-01 1991-07-29 Hitachi Ltd Vacuum vessel
JP2005030459A (en) * 2003-07-09 2005-02-03 Smc Corp Vacuum exhaust valve
JP2006005008A (en) * 2004-06-15 2006-01-05 Matsushita Electric Ind Co Ltd Plasma treatment equipment
JP2006194303A (en) * 2005-01-12 2006-07-27 Nok Corp Plasma resisting seal

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