JP2014201825A - 次亜塩素酸水の生成用電解槽 - Google Patents
次亜塩素酸水の生成用電解槽 Download PDFInfo
- Publication number
- JP2014201825A JP2014201825A JP2013081793A JP2013081793A JP2014201825A JP 2014201825 A JP2014201825 A JP 2014201825A JP 2013081793 A JP2013081793 A JP 2013081793A JP 2013081793 A JP2013081793 A JP 2013081793A JP 2014201825 A JP2014201825 A JP 2014201825A
- Authority
- JP
- Japan
- Prior art keywords
- water
- electrolytic cell
- chlorine gas
- casing
- water supply
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 title claims abstract description 85
- QWPPOHNGKGFGJK-UHFFFAOYSA-N hypochlorous acid Chemical compound ClO QWPPOHNGKGFGJK-UHFFFAOYSA-N 0.000 title claims abstract description 28
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 claims abstract description 44
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims abstract description 24
- 238000005868 electrolysis reaction Methods 0.000 claims abstract description 19
- 230000000149 penetrating effect Effects 0.000 claims abstract 2
- 229910001919 chlorite Inorganic materials 0.000 claims 2
- 229910052619 chlorite group Inorganic materials 0.000 claims 2
- QBWCMBCROVPCKQ-UHFFFAOYSA-N chlorous acid Chemical compound OCl=O QBWCMBCROVPCKQ-UHFFFAOYSA-N 0.000 claims 2
- 239000007789 gas Substances 0.000 abstract description 14
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract description 7
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 abstract description 3
- 230000007774 longterm Effects 0.000 abstract description 3
- 230000002265 prevention Effects 0.000 abstract 1
- 239000007788 liquid Substances 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 150000002739 metals Chemical class 0.000 description 4
- 238000009434 installation Methods 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 241000221535 Pucciniales Species 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 230000000474 nursing effect Effects 0.000 description 1
- 244000144977 poultry Species 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B9/00—Cells or assemblies of cells; Constructional parts of cells; Assemblies of constructional parts, e.g. electrode-diaphragm assemblies; Process-related cell features
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/20—Mixing gases with liquids
- B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
- B01F23/232—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids using flow-mixing means for introducing the gases, e.g. baffles
- B01F23/2323—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids using flow-mixing means for introducing the gases, e.g. baffles by circulating the flow in guiding constructions or conduits
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
- B01F25/50—Circulation mixers, e.g. wherein at least part of the mixture is discharged from and reintroduced into a receptacle
- B01F25/53—Circulation mixers, e.g. wherein at least part of the mixture is discharged from and reintroduced into a receptacle in which the mixture is discharged from and reintroduced into a receptacle through a recirculation tube, into which an additional component is introduced
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B1/00—Electrolytic production of inorganic compounds or non-metals
- C25B1/01—Products
- C25B1/24—Halogens or compounds thereof
- C25B1/26—Chlorine; Compounds thereof
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B15/00—Operating or servicing cells
- C25B15/08—Supplying or removing reactants or electrolytes; Regeneration of electrolytes
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
- Accessories For Mixers (AREA)
- Water Treatment By Electricity Or Magnetism (AREA)
Abstract
Description
2 ケーシング
3 電解室
4 ガス溜り室
5a 陽極板
5b 陰極板
6 送水通路
7 混入通路
8a 電源端子
8b 電源端子
9 電解専用液流入室
10 電解専用液用通路
11 希塩酸タンク
12 送水管
13 希塩酸ポンプ
14 貯留タンク
15 循環管路
15a 流入管部
15b 流出管部
16 循環ポンプ
17 排出管
Claims (5)
- ケーシング内に、希塩酸が供給され塩素ガスを発生する陰陽両電極を有する電解室を形成すると共に、該ケーシング内を貫通する送水通路を形成し、前記電解室で生成された塩素ガスを前記送水通路内を流動する水に混入して前記塩素ガスを前記送水通路内で溶かすようにした次亜塩素酸水の生成用電解槽。
- 前記ケーシング内に、前記電解室と前記送水通路との間にガス溜り室を形成したことを特徴とする請求項1に記載の次亜塩素酸水の生成用電解槽。
- 前記ケーシングの厚さは、前記電解室から前記送水通路まで流動する塩素ガスが該ケーシング外部に漏れ出ない厚さに形成されていることを特徴とする請求項1又は請求項2に記載の次亜塩素酸水の生成用電解槽。
- 前記ケーシング内に、一端部が前記ガス溜り室に連通すると共に他端部が前記送水通路の混入箇所に連通する混入通路を設けたことを特徴とする請求項2又は請求項3に記載の次亜塩素酸水の生成用電解槽。
- 水が貯留されている貯留タンクと、該貯留タンク内から水を流入循環して該貯留タンク内に戻す循環管路とを更に設け、前記循環管路に、前記送水通路を介在させた請求項1又は請求項2又は請求項3又は請求項4に記載の次亜塩素酸水の生成用電解槽。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013081793A JP6121221B2 (ja) | 2013-04-10 | 2013-04-10 | 次亜塩素酸水の生成用電解槽 |
PCT/JP2014/059113 WO2014168024A1 (ja) | 2013-04-10 | 2014-03-28 | 次亜塩素酸水の生成用電解槽 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013081793A JP6121221B2 (ja) | 2013-04-10 | 2013-04-10 | 次亜塩素酸水の生成用電解槽 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2014201825A true JP2014201825A (ja) | 2014-10-27 |
JP2014201825A5 JP2014201825A5 (ja) | 2016-05-19 |
JP6121221B2 JP6121221B2 (ja) | 2017-04-26 |
Family
ID=51689435
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2013081793A Active JP6121221B2 (ja) | 2013-04-10 | 2013-04-10 | 次亜塩素酸水の生成用電解槽 |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP6121221B2 (ja) |
WO (1) | WO2014168024A1 (ja) |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10121280A (ja) * | 1996-08-29 | 1998-05-12 | Chlorine Eng Corp Ltd | 次亜塩素酸塩の製造装置 |
JP2002102853A (ja) * | 2000-09-29 | 2002-04-09 | Matsushita Electric Ind Co Ltd | 電解水生成装置 |
JP2004353013A (ja) * | 2003-05-27 | 2004-12-16 | Masakazu Uzawa | 電解装置 |
JP2005200761A (ja) * | 2004-01-15 | 2005-07-28 | Hokuetsu:Kk | 電気化学反応槽 |
JP2007160196A (ja) * | 2005-12-13 | 2007-06-28 | Wakamiya Kogyo Kk | 水槽の電解殺菌装置 |
WO2012043956A1 (ko) * | 2010-09-28 | 2012-04-05 | (주)시온텍 | 살균 전해수 제조 장치, 이를 포함하는 살균 전해수 제조 시스템 및 방법 |
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2013
- 2013-04-10 JP JP2013081793A patent/JP6121221B2/ja active Active
-
2014
- 2014-03-28 WO PCT/JP2014/059113 patent/WO2014168024A1/ja active Application Filing
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10121280A (ja) * | 1996-08-29 | 1998-05-12 | Chlorine Eng Corp Ltd | 次亜塩素酸塩の製造装置 |
JP2002102853A (ja) * | 2000-09-29 | 2002-04-09 | Matsushita Electric Ind Co Ltd | 電解水生成装置 |
JP2004353013A (ja) * | 2003-05-27 | 2004-12-16 | Masakazu Uzawa | 電解装置 |
JP2005200761A (ja) * | 2004-01-15 | 2005-07-28 | Hokuetsu:Kk | 電気化学反応槽 |
JP2007160196A (ja) * | 2005-12-13 | 2007-06-28 | Wakamiya Kogyo Kk | 水槽の電解殺菌装置 |
WO2012043956A1 (ko) * | 2010-09-28 | 2012-04-05 | (주)시온텍 | 살균 전해수 제조 장치, 이를 포함하는 살균 전해수 제조 시스템 및 방법 |
Also Published As
Publication number | Publication date |
---|---|
JP6121221B2 (ja) | 2017-04-26 |
WO2014168024A1 (ja) | 2014-10-16 |
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