JP2014188839A - Pattern formation method and pattern formation device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To raise accuracy of pattern formation by successfully performing positioning, namely, pre-alignment of a plate-like object to a target position before forming a pattern by pressing one surface of a blanket to be held by first holding means and one surface of the plate-like object to be held by second holding means to each other.SOLUTION: At least one of first holding means and second holding means 41 is moved, at least a part of an outer edge of a plate-like object PP held by the second holding means 41 is imaged before forming a pattern by pressing one surface of a blanket and one surface of the plate-like object PP against each other, and the second holding means 41 is moved in parallel with the one surface of the plate-like object PP as holding the plate-like object PP on the basis of an imaging result to position the plate-like object PP at a target position.

Description

  The present invention relates to a pattern forming technique for forming a pattern by pressing one side of a blanket held by a first holding unit and one side of a plate-like object held by a second holding unit.

  As an invention for manufacturing an electronic component, for example, the invention described in Patent Document 1 has been conventionally known. In the invention described in Patent Document 1, the flat plate blanket is fixed to the upper surface of the lower stage, while the surface on which the pattern is formed faces downward, that is, the letterpress is sucked and fixed by the upper stage in the face-down state. Compressed gas is injected from an opening provided near the center of the stage, and a flat blanket is pushed out. Thus, the blanket is brought into pressure contact with the relief plate to transfer the relief pattern onto the flat blanket (patterning).

JP 2010-158799 A

  By the way, in the conventional pattern formation technique, so-called pre-alignment is generally performed in which the relief plate is positioned at a target position before the blanket is brought into pressure contact with the relief plate. As a method for performing the pre-alignment, a pre-alignment technique frequently used in the technical field of manufacturing a semiconductor device, a liquid crystal display device, or the like is used as it is. That is, a pre-alignment apparatus is provided outside the apparatus, and the relief plate is positioned in a predesignated direction and position by the pre-alignment apparatus. The relief plate thus preliminarily positioned outside the apparatus is carried into the apparatus by a conveying means such as a conveying robot. The apparatus receives the pre-aligned relief from the hand of the transport means, transfers it to the upper stage, and holds it by suction. For this reason, misalignment may occur during conveyance of the relief plate until it is held by the upper stage.

  Moreover, in order to suppress a conveyance position shift, it is conceivable to preliminarily align the relief plate on the hand, but prealignment on the hand may not function sufficiently due to the influence of the deflection of the relief plate. In order to transfer the relief plate to the upper stage, the hand needs to hold the relief plate in a so-called face-down state, and supports the relief plate while avoiding the pattern formed on the relief plate. For this reason, in order to support the lower surface peripheral part of a letterpress, for example, the peripheral area | region within 10 [mm] of outer periphery edges, and hold a letterpress, the center part of a letterpress will be in the state bent in mortar shape. In this state, even if an external force is applied to the relief plate supported by the hand to move the relief plate on the hand, the deflection is increased and it is difficult to move it slightly.

  Such a problem is not only when pressing the relief plate to the flat plate blanket and transferring the relief pattern to the flat plate blanket, but instead of changing to the relief plate, the substrate is sucked and fixed on the upper stage, and the patterned flat plate blanket is pressed against the substrate This also occurs when the pattern on the flat blanket is transferred to the substrate. That is, in the prior art, it has been difficult to satisfactorily perform pre-alignment before pattern formation is performed by pressing a plate-like object such as a relief plate or a substrate and a blanket together.

  The present invention has been made in view of the above problems, and forms a pattern by pressing one side of a blanket held by a first holding unit and one side of a plate-like object held by a second holding unit. An object of the present invention is to provide a technique for improving the accuracy of pattern formation by preferentially positioning a plate-like object at a target position, that is, pre-alignment.

  In the pattern forming method according to the present invention, the blanket is held by the first holding means while the one side of the blanket and the one side of the plate-like object are opposed to each other, and the plate-like object is held by the second holding means. A first step, and a second step of moving at least one of the first holding means and the second holding means and pressing one side of the blanket and one side of the plate-like object together to form a pattern, In the process, at least a part of the outer edge of the plate-like object held by the second holding means is imaged, and the second holding means is parallel to one surface of the plate-like object while holding the plate-like object based on the imaging result. It has the pre-alignment process which moves and positions a plate-shaped object to a target position, It is characterized by the above-mentioned.

  Further, the pattern forming apparatus according to the present invention forms a pattern by pressing one side of the blanket held by the first holding unit and one side of the plate-like object held by the second holding unit against each other. An apparatus, a moving means for moving the second holding means in parallel with one surface of the plate-like object, an imaging means for taking an image of at least a part of the outer edge of the plate-like object held by the second holding means, and a pattern And a pre-alignment means for positioning the plate-like object at the target position by operating the moving means while holding the plate-like object by the second holding means based on the imaging result of the image pickup means. .

  In the invention configured as described above, one side of the blanket held by the first holding unit and one side of the plate-like object held by the second holding unit are pressed against each other to form a pattern. Before that, the plate-like object is positioned at the target position while being held by the second holding means. That is, pre-alignment is performed while the plate-like object is held by the second holding means. Therefore, even if there is an effect such as a shift in the transport position or bending of the plate-like object that occurs before the plate-like object is held by the second holding means, they are eliminated by pre-alignment, and the plate-like object is securely The target position can be determined. As a result, the accuracy of pattern formation can be increased.

  Here, when the plate-like object has a polygonal shape, a plurality of different locations on the first side, which is one of the sides defining the shape of the plate-like object, are imaged, and the plate-like shape with respect to the target position is based on the imaging result. A tilt correction step for correcting the tilt of the object, and a second side and a first side that are not parallel to the first side among the sides that define the shape of the plate-shaped object subjected to the tilt correction, and based on the imaging result The pre-alignment may be performed by executing an offset correction step of correcting the offset of the plate-like object with respect to the target position. Thus, the polygonal plate-like object can be accurately positioned at the target position.

  Prior to executing the inclination correction step and the offset correction step, the first and second sides when the plate-like object is held at the target position by the second holding unit are imaged and obtained from the imaging results. Information regarding the target position may be stored as target position information. Then, in the inclination correction step, the amount of inclination of the plate-like object with respect to the target position is obtained based on the information about the position of the plate-like object obtained from the imaging result and the target position information, and the second holding means moves according to the amount of inclination The inclination of the plate-like object with respect to the target position is corrected. Further, in the offset correction step, an offset amount of the plate-like object with respect to the target position is obtained based on the information on the position of the plate-like object obtained from the imaging result and the target position information, and the second holding means moves according to the offset amount. You may correct | amend the offset of the plate-shaped object with respect to a target position. As described above, by performing the two-step correction process based on the information obtained from the imaging result and the target position information, the polygonal plate-like object can be positioned at the target position with high accuracy.

  Further, when a plate having a first pattern provided on one surface is used as a plate-like object and one surface of the blanket is patterned with the first pattern, the blanket is held by the first holding means and then the first holding means. And without aligning the plate positioned at the target position in the pre-alignment step, the first surface of the blanket and the one surface of the plate-like object are pressed against each other to transfer the first pattern to the one surface of the blanket. Also good. This is because the plate (plate-like object) is positioned at the target position by pre-alignment, so there is no large displacement between the blanket and the plate, and even if there is some displacement. This is because it does not affect the patterning itself on one side of the blanket.

  On the other hand, when the second pattern provided on one surface of the blanket is transferred to a substrate which is one of the plate-like objects, it is desirable to perform precision alignment in addition to pre-alignment. That is, when the blanket has the first alignment mark and the second pattern is provided on one surface of the blanket, and the plate-like object is a substrate having the second alignment mark, the blanket held by the first holding means. The first alignment mark and the second alignment mark of the substrate positioned at the target position by the pre-alignment step are imaged, and at least one of the first holding means and the second holding means is moved based on the imaging result to blanket A precision alignment process that aligns the substrate and the substrate, and a transfer process that, after the precision alignment process, presses one side of the blanket and one side of the plate-like object together to transfer the second pattern onto one side of the substrate It is desirable to do.

  In addition, in order to image suitably the outer edge of a plate-shaped object, you may comprise as follows. That is, the second holding means has a holding plane that holds the central portion of the other surface of the plate-like object by suction, holds the plate-like object with the outer edge of the plate-like object protruding from the holding plane, and the imaging means The outer edge of the plate-like object may be imaged from the opposite side to the first holding means with respect to the plate-like object. Thereby, it becomes possible to arrange the imaging means without interfering with the first holding means and the blanket and to image the outer edge of the plate-like object well.

  As described above, according to the present invention, while the plate-like object is held by the second holding means, the second holding means is moved in parallel with one surface of the plate-like object to position the plate-like object at the target position. That is, pre-alignment is performed. Therefore, even if the conveyance position deviation or the deflection of the plate-like object that occurs before holding the plate-like object by the second holding means occurs, the plate-like object can be reliably positioned at the target position by pre-alignment. The pattern can be formed with excellent accuracy.

It is a perspective view showing one embodiment of a pattern formation device concerning this invention. It is a block diagram which shows the control system of this pattern formation apparatus. It is a perspective view which shows the structure of a lower stage block. It is a figure which shows the structure of a raising / lowering hand unit. It is a figure which shows the structure of a transfer roller unit. It is a figure which shows the structure of an upper stage assembly. It is a flowchart which shows a pattern formation process. It is a 1st figure which shows typically the positional relationship of each part of an apparatus in each step of a process. It is a 2nd figure which shows typically the positional relationship of each part of an apparatus in each step of a process. It is a 3rd figure which shows typically the positional relationship of each part of an apparatus in each step of a process. It is a 4th figure which shows typically the positional relationship of each part of an apparatus in each step of a process. It is a 5th figure which shows typically the positional relationship of each part of an apparatus in each step of a process. It is a 6th figure which shows typically the positional relationship of each part of an apparatus in each step of processing. It is a figure which shows the positional relationship of a plate | board or a board | substrate, and a blanket. It is a 7th figure which shows typically the positional relationship of each part of an apparatus in each step of a process. It is a figure which shows typically schematic structure of an upper stage block and the pre-alignment camera for substrates. It is a figure which shows typically the structure of the upper stage block support mechanism on the (-X) side. It is a figure which shows typically the structure of the upper stage block support mechanism on the (+ X) side. It is a figure which shows typically the pre-alignment process of a plate.

  FIG. 1 is a perspective view showing an embodiment of a pattern forming apparatus according to the present invention. FIG. 2 is a block diagram showing a control system of the pattern forming apparatus. FIG. 1 shows a state in which the external cover is removed to show the internal configuration of the apparatus. In order to uniformly indicate the direction in each figure, XYZ orthogonal coordinate axes are set as shown in the lower right of FIG. Here, the XY plane represents a horizontal plane and the Z axis represents a vertical axis. More specifically, the (+ Z) direction represents a vertically upward direction. The front direction when viewed from the apparatus is the (−Y) direction, and access to the apparatus from the outside, including loading and unloading of articles, is made along the Y-axis direction.

  The pattern forming apparatus 1 has a structure in which an upper stage block 4 and a lower stage block 6 are attached to a main frame 2. In FIG. 1, in order to clearly show the distinction between the blocks, the upper stage block 4 is provided with dots having a coarse pitch, and the lower stage block 6 is provided with dots having a finer pitch. In addition to the above, the pattern forming apparatus 1 has a control unit 8 (FIG. 2) that controls each part of the apparatus according to a processing program stored in advance and executes a predetermined operation. Detailed configurations of the upper stage block 4 and the lower stage block 6 will be described later. First, the overall configuration of the apparatus 1 will be described.

  The pattern forming apparatus 1 is an apparatus that forms a pattern by bringing the blanket BL held by the lower stage block 6 and the plate PP or the substrate SB held by the upper stage block 4 into contact with each other. More specifically, the pattern forming process by the apparatus 1 is as follows. First, the coated layer carried on the blanket BL is patterned by bringing a plate PP created corresponding to the pattern to be formed into contact with the blanket BL on which the pattern forming material is uniformly applied (see FIG. Patterning process). Then, by bringing the blanket BL thus patterned and the substrate SB into contact, the pattern carried on the blanket BL is transferred to the substrate SB (transfer process). As a result, a desired pattern is formed on the substrate SB.

  As described above, the pattern forming apparatus 1 can be used for both the patterning process and the transfer process in the pattern forming process for forming a predetermined pattern on the substrate SB. However, the pattern forming apparatus 1 is responsible for only one of these processes. May be used.

  The lower stage block 6 of the pattern forming apparatus 1 is supported by the base frame 21 of the main frame 2. On the other hand, the upper stage block 4 is attached to a pair of upper stage support frames 22 and 23 that are erected from the base frame 21 and extend in the Y direction so as to sandwich the lower stage block 6 from the X direction.

  The main frame 2 is attached with a pre-alignment camera for detecting the positions of the plate PP, the substrate SB, and the blanket BL carried into the apparatus. Specifically, three substrate pre-alignment cameras 241, 242, and 243 for detecting the edges of the plate PP and the substrate SB that are carried into the apparatus along the Y-axis direction at three different locations include the upper stage. It is attached to the boom standing from the support frames 22 and 23, respectively. Similarly, three blanket pre-alignment cameras 244, 245 and 246 for detecting the edge of the blanket BL carried into the apparatus along the Y-axis direction at three different positions are provided from the upper stage support frames 22 and 23. Each is attached to a standing boom. In FIG. 1, one blanket pre-alignment camera 246 located behind the upper stage block 4 does not appear. In FIG. 2, the plate and substrate pre-alignment cameras are abbreviated as “substrate PA camera” and the blanket pre-alignment camera is abbreviated as “blanket PA camera”, respectively.

  FIG. 3 is a perspective view showing the structure of the lower stage block. In the lower stage block 6, pillars 602 are erected in the vertical direction (Z direction) at the four corners of a plate-shaped alignment stage 601 with an opening at the center, and the stage support plate 603 is supported by these pillars 602. ing. Although not shown, at the lower part of the alignment stage 601, there are three degrees of freedom in the rotational direction (hereinafter referred to as “θ direction”), the X direction and the Y direction with the rotational axis extending in the vertical direction Z as the rotational center. An alignment stage support mechanism 605 (FIG. 2) such as a cross roller bearing is provided, and the alignment stage 601 is attached to the base frame 21 via the alignment stage support mechanism 605. Therefore, the alignment stage 601 can move in a predetermined range in the X direction, the Y direction, and the θ direction with respect to the base frame 21 by the operation of the alignment stage support mechanism 605.

  An annular rectangular lower stage 61 having an upper surface substantially coincident with a horizontal plane and having an opening window 611 formed at the center is disposed above the stage support plate 603. A blanket BL is placed on the upper surface of the lower stage 61, and the lower stage 61 holds it.

  The opening size of the opening window 611 needs to be larger than the planar size of the effective area (not shown) in the central portion that effectively functions as the pattern formation area in the surface area of the blanket BL. That is, when the blanket BL is placed on the lower stage 61, the entire area corresponding to the effective area on the lower surface of the blanket BL faces the opening window 611, and the lower part of the effective area needs to be completely open. is there. The coating layer made of the pattern forming material is formed so as to cover at least the entire effective area.

  On the upper surface 61a of the lower stage 61, a plurality of grooves 612 are provided along the peripheral edges of the opening window 611. Each groove 612 is connected to a negative pressure supply section of the control unit 8 via a control valve (not shown). 804 is connected. Each groove 612 is disposed in a region having a planar size smaller than the planar size of the blanket BL. Then, as indicated by the alternate long and short dash line in the figure, the blanket BL is placed on the lower stage 61 so as to cover all the grooves 612. In order to enable this, a stopper member 613 for restricting the position of the blanket BL is appropriately disposed on the lower stage upper surface 61a.

  By supplying negative pressure to each groove 612, each groove 612 functions as a vacuum suction groove, and thus the four sides of the peripheral portion of the blanket BL are sucked and held on the upper surface 61a of the lower stage 61. By configuring the vacuum suction groove with a plurality of independent grooves 612, even if a vacuum break occurs in some of the grooves for some reason, the suction of the blanket BL by other grooves is maintained, so that the blanket BL can be securely attached. Can be held. Further, the blanket BL can be adsorbed with a stronger adsorbing force than when a single groove is provided.

  Below the opening window 611 of the lower stage 61, there are provided lifting hand units 62 and 63 for moving the blanket BL up and down in the Z-axis direction, and a transfer roller unit 64 that abuts and pushes up the blanket BL from below. Yes.

  FIG. 4 is a diagram showing the structure of the lifting hand unit. Since the structures of the two lifting hand units 62 and 63 are the same, the structure of one lifting hand unit 62 will be described here. The elevating hand unit 62 has two support columns 621 and 622 erected in the Z direction from the base frame 21, and a plate-like slide base 623 can move up and down with respect to these support columns 621 and 622. It is attached. More specifically, guide rails 6211 and 6221 extending in the vertical direction (Z direction) are attached to the two support columns 621 and 622, respectively, and attached to the rear surface of the slide base 623, that is, the (+ Y) side main surface. The slider (not shown) is slidably attached to the guide rails 6211 and 6221. Then, for example, an elevating mechanism 624 including an appropriate drive mechanism such as a motor and a ball screw mechanism moves the slide base 623 up and down in accordance with a control command from the control unit 8.

  A plurality (four in this example) of hands 625 are attached to the slide base 623 so as to be movable up and down. The structure of each hand 625 is basically the same except that the shape of the base portion differs depending on the arrangement position. Each hand 625 is fixed to a slider 627 that is slidably engaged with a guide rail 626 that is attached to the front surface of the slide base 623, that is, the (−Y) side main surface along the vertical direction (Z direction). Has been. The slider 627 is connected to an elevating mechanism 628 having an appropriate drive mechanism such as a rodless cylinder attached to the back surface of the slide base 623, and moves up and down with respect to the slide base 623 by the operation of the elevating mechanism 628. To do. Each hand 625 is provided with an independent lifting mechanism 628, and each hand 625 can be moved up and down individually.

  That is, in the elevating hand unit 62, the elevating mechanism 624 moves the slide base 623 up and down to integrally move the hands 625 up and down, and the elevating mechanisms 628 operate independently to allow the hands 625 to move up and down. Can be raised and lowered individually.

  The upper surface 625a of the hand 625 is finished in an elongated flat surface with the Y direction as the longitudinal direction, and the upper surface 625a can be brought into contact with the lower surface of the blanket BL to support the blanket BL. The upper surface 625a is provided with an adsorption hole 625b that communicates with a negative pressure supply unit 804 provided in the control unit 8 via a pipe and a control valve (not shown). Thereby, negative pressure from the negative pressure supply unit 804 is supplied to the suction hole 625b as necessary, and the blanket BL can be sucked and held on the upper surface 625a of the hand 625. Therefore, it is possible to prevent slipping when the hand 625 supports the blanket BL.

  In addition, an appropriate gas, for example, dry air or inert gas, is supplied to the adsorption hole 625b from a gas supply unit 806 of the control unit 8 through a pipe and a control valve (not shown) as necessary. That is, the negative pressure from the negative pressure supply unit 804 and the gas from the gas supply unit 806 are selectively supplied to the suction hole 625 b by opening and closing each control valve controlled by the control unit 8.

  When the gas from the gas supply unit 806 is supplied to the adsorption hole 625b, a small amount of gas is discharged from the adsorption hole 625b. Thereby, a minute gap is formed between the lower surface of the blanket BL and the upper surface 625a of the hand, and the hand 625 is in a state of being separated from the lower surface of the blanket BL while supporting the blanket BL from below. Therefore, the blanket BL can be moved in the horizontal direction without being rubbed against each hand 625 while the blanket BL is supported by each hand 625. In addition, you may provide a gas discharge hole in the hand upper surface 625a separately from the adsorption hole 625b.

  Returning to FIG. 3, in the lower stage block 6, the lifting hand units 62, 63 having the above-described configuration are disposed facing each other so as to face the Y direction with the hand 625 facing inward. In the state where each hand 625 is lowered most, the upper surface 625a of the hand is located below the lower stage upper surface 61a, that is, a position that is largely retracted in the (−Z) direction. On the other hand, in the state where each hand 625 is raised most, the tip of each hand 625 protrudes upward from the opening window 611 of the lower stage 61, and the hand upper surface 625a is above the lower stage upper surface 61a, that is, in the (+ Z) direction. To the position protruding.

  Further, when viewed from above, a certain distance is provided between the tips of the hands 625 facing each other of the elevating hand units 62 and 63 so that they do not come into contact with each other. Further, as will be described next, the transfer roller unit 64 moves in the X direction using this gap.

  FIG. 5 shows the structure of the transfer roller unit. The transfer roller unit 64 includes a transfer roller 641 that is a cylindrical roller member extending in the Y direction, and a support frame that extends in the Y direction along the lower side of the transfer roller 641 and rotatably supports the transfer roller 641 at both ends thereof. 642 and an elevating mechanism 644 that has an appropriate drive mechanism and moves the support frame 642 up and down in the Z direction. The transfer roller 641 is not connected to a rotation drive mechanism and rotates freely. Further, the support frame 642 is provided with a backup roller 643 that comes into contact with the surface of the transfer roller 641 from below to prevent the transfer roller 641 from bending.

  The length of the transfer roller 641 in the Y direction is shorter than the length of the four sides of the opening window 611 of the lower stage 61 along the Y direction, that is, the opening dimension of the opening window 611 in the Y direction, and will be described later. It is longer than the length along the Y direction of the plate PP or the substrate SB when held on the upper stage. Since the effective area effective as a pattern formation area in the blanket BL is naturally equal to or shorter than the length of the plate PP or the substrate SB, the transfer roller 641 is longer than the effective area in the Y direction.

  The elevating mechanism 644 includes a base portion 644a and support legs 644b extending upward from the base portion 644a and connected to the vicinity of the center of the support frame 642 in the Y direction. The support leg 644b can move up and down with respect to the base portion 644a by an appropriate drive mechanism such as a motor or a cylinder. The base portion 644a is slidably attached to a guide rail 646 extending in the X direction, and is further coupled to a moving mechanism 647 having an appropriate driving mechanism such as a motor and a ball screw mechanism. . A guide rail 646 is attached to the upper surface of the lower frame 645 that extends in the X direction and is fixed to the base frame 21. By operating the moving mechanism 647, the transfer roller 641, the support frame 642, and the lifting mechanism 644 integrally travel in the X direction.

  As will be described in detail later, in this pattern forming apparatus 1, the blanket BL held on the lower stage 61 is brought into contact with the transfer roller 641 to partially lift the blanket BL, whereby the blanket BL is held on the upper stage. The blanket BL is brought into contact with the plate PP or the substrate SB arranged in close proximity to each other.

  The elevating mechanism 644 travels through a gap formed by the hands 625 facing each other of the elevating hand units 62 and 63. Each hand 625 has an upper surface 625 a that can be retracted in the (−Z) direction from the lower surface of the support frame 642 of the transfer roller unit 64 to the lower side. Therefore, when the elevating mechanism 644 runs in this state, the support frame 642 of the transfer roller unit 64 passes over the upper surface 625a of each hand 625, and the transfer roller unit 64 and the hand 625 are prevented from colliding. .

  Next, the structure of the upper stage block 4 will be described. As shown in FIG. 1, the upper stage block 4 is erected from an upper stage assembly 40 that is a structure extending in the X direction and upper stage support frames 22 and 23. A pair of support columns 45 and 46 for supporting each of them, and an elevating mechanism 47 that includes an appropriate drive mechanism such as a motor and a ball screw mechanism and moves the entire upper stage assembly 40 up and down in the Z direction.

  FIG. 6 shows the structure of the upper stage assembly. The upper stage assembly 40 is coupled to the upper stage 41 holding the plate PP or the substrate SB on the lower surface, a reinforcing frame 42 provided on the upper stage 41, and extends horizontally along the X direction. A beam-like structure 43 and an upper suction unit 44 mounted on the upper stage 41 are provided. As shown in FIG. 6, the upper stage assembly 40 has substantially symmetric shapes with respect to the XZ plane and the YZ plane including the center on the outer shape.

  The upper stage 41 is a flat member slightly smaller than the plane size of the plate PP or the substrate SB to be held, and a lower surface 41a held in a horizontal posture holds the plate PP or the substrate SB in contact with the holding plane. It has become. Since the holding plane is required to have a high degree of flatness, quartz glass or a stainless steel plate is suitable as the material. The holding plane is provided with a through hole for mounting a suction pad of the upper suction unit 44 described later.

  The reinforcing frame 42 is composed of a combination of reinforcing ribs extending in the Z direction on the upper surface of the upper stage 41. As shown in the drawing, the upper stage 41 is prevented from being bent and its lower surface (holding plane) 41a In order to maintain the flatness, a plurality of reinforcing ribs 421 parallel to the YZ plane and reinforcing ribs 422 parallel to the XZ plane are appropriately combined. The reinforcing ribs 421 and 422 can be made of, for example, a metal plate.

  Further, the beam-like structure 43 is a structure formed by combining a plurality of metal plates and having a longitudinal direction in the X direction, and both ends thereof are supported by the support columns 45 and 46 so as to be vertically movable. Yes. Specifically, guide rails 451 and 461 extending in the Z direction are provided on the support columns 45 and 46, respectively, and a slider (not shown) is attached to the (+ Y) side main surface of the beam-like structure 43 facing the support pillars 45 and 46, respectively. These are slidably engaged. As shown in FIG. 1, the beam-like structure 43 and the support column 46 are connected by an elevating mechanism 47, and the elevating mechanism 47 operates to keep the beam-like structure 43 in a horizontal posture. Move in the vertical direction (Z direction). Since the upper stage 41 is integrally coupled to the beam-like structure 43 via the reinforcing frame 42, the upper stage 41 moves up and down with the holding plane 41 a kept horizontal by the operation of the elevating mechanism 47.

  The structures of the reinforcing frame 42 and the beam-like structure 43 are not limited to those illustrated. Here, a necessary strength is obtained by combining a plate-like member parallel to the YZ plane and a plate-like member parallel to the XZ plane, but a sheet metal, an angle member, or the like may be appropriately combined with other shapes. The reason for this structure is to make the upper stage assembly 40 lightweight. In order to reduce the deflection of each part, it is conceivable to increase the thickness of the upper stage 41 or to use the beam-like structure 43 as a solid body, but if so, the mass of the entire upper stage assembly 40 will increase.

  The increase in the weight of the structure disposed on the upper part of the apparatus requires additional strength and durability for a mechanism for supporting and moving the structure, and the entire apparatus becomes very large and heavy. It is more realistic to reduce the weight of the entire structure while obtaining the required strength by combining plate materials and the like.

  A pair of upper suction units 44 are mounted on the upper stage 41 surrounded by the reinforcing frame 42. A state where one upper suction unit 44 is taken out upward is shown in the upper part of FIG. In the upper suction unit 44, for example, rubber suction pads 443 are attached to lower ends of a plurality of pipes 442 extending downward from the support frame 441, respectively. The upper end side of each pipe 442 is connected to a negative pressure supply unit 804 of the control unit 8 via a pipe and a control valve (not shown). The support frame 441 has a shape that does not interfere with the ribs 421 and 422 constituting the reinforcing frame 42.

  The support frame 441 is supported movably in the vertical direction with respect to the base plate 446 through a pair of sliders 444 and a pair of guide rails 445 engaged therewith. Further, the base plate 446 and the support frame 441 are coupled by an elevating mechanism 447 having an appropriate driving mechanism such as a motor and a ball screw mechanism. By the operation of the lifting mechanism 447, the support frame 441 moves up and down with respect to the base plate 446, and the pipe 442 and the suction pad 443 move up and down integrally therewith.

  The upper suction unit 44 is integrated with the upper stage 41 by fixing the base plate 446 to the side surface of the beam-like structure 43. In this state, the lower end of each pipe 442 and the suction pad 443 are inserted through through holes (not shown) provided in the upper stage 41. Then, by the operation of the elevating mechanism 447, the suction pad 443 has the lower surface discharged to the lower side of the lower surface (holding plane) 41a of the upper stage 41 and the lower surface inside the through hole of the upper stage 41 (upper). It moves up and down with the retracted position. When the lower surface of the suction pad 443 is positioned at substantially the same height as the holding plane 41a of the upper stage 41, the upper stage 41 and the suction pad 443 cooperate to hold the plate PP or the substrate SB on the holding plane 41a. can do.

  Returning to FIG. 1, the upper stage assembly 40 configured as described above is provided on base plates 4811 and 4812. More specifically, support columns 45 and 46 are erected on base plates 4811 and 4812, respectively, and the upper stage assembly 40 is attached to the support columns 45 and 46 so as to be movable up and down. The base plates 4811 and 4812 are attached to the upper stage support frames 22 and 23, respectively, and are supported by upper stage block support mechanisms 4821 and 4822 including an appropriate movable mechanism such as a cross roller bearing. The configuration of each upper stage block support mechanism 4821, 4822 will be described in detail later.

  Therefore, the entire upper stage assembly 40 can be moved horizontally with respect to the main frame 2. Specifically, the base plate 4811 is moved horizontally in the horizontal plane, that is, the XY plane by the operation of two motors provided in the upper stage block support mechanism 4821, and the base plate 4812 is provided in one motor provided in the upper stage block support mechanism 4822. Is moved horizontally within the horizontal plane (XY plane). A pair of base plates 4811 and 4812 provided corresponding to each of the support pillars 45 and 46 can move independently of each other, and the upper stage assembly 40 moves relative to the main frame 2 along with these movements. Can be moved within a predetermined range in the X direction, the Y direction, and the θ direction. The movement of the upper stage assembly 40 by the upper stage block support mechanisms 4821 and 4822 will be described in detail later.

  Each part of the pattern forming apparatus 1 configured as described above is controlled by the control unit 8. As shown in FIG. 2, the control unit 8 includes a CPU 801 that controls the operation of the entire apparatus, a motor control unit 802 that controls a motor provided in each unit, and a valve control unit that controls control valves provided in each unit. 803 and a negative pressure supply unit 804 that generates a negative pressure to be supplied to each unit. In addition, when the negative pressure supplied from the outside can be utilized, the control unit 8 does not need to be provided with the negative pressure supply part.

  The motor control unit 802 controls positioning and movement of each part of the apparatus by controlling a motor group provided in each functional block. Further, the valve control unit 803 controls a valve group provided on a negative pressure piping path connected from the negative pressure supply unit 804 to each functional block and on a piping path connected from the gas supply unit 806 to the hand 625. Thus, the vacuum suction by the negative pressure supply is executed and released, and the gas is discharged from the hand upper surface 625a.

  The control unit 8 includes an image processing unit 805 that performs image processing on an image captured by the camera. The image processing unit 805 performs predetermined image processing on the images captured by the substrate pre-alignment cameras 241 to 243 and the blanket pre-alignment cameras 244 to 246 attached to the main frame 2, so that the plate PP, The approximate positions of the substrate SB and the blanket BL are detected. Further, the positional relationship between the substrate SB and the blanket BL is detected more precisely by performing predetermined image processing on the image captured by the alignment camera 27 for precision alignment. The CPU 801 controls the upper stage block support mechanisms 4821 and 4822 and the alignment stage support mechanism 605 based on these position detection results, and the plate PP or substrate SB held on the upper stage 41 and the blanket held on the lower stage 61. Position alignment (pre-alignment processing and precision alignment processing) with BL is performed.

  Next, a pattern forming process in the pattern forming apparatus 1 configured as described above will be described. In this pattern forming process, the plate PP or the substrate SB held on the upper stage 41 and the blanket BL held on the lower stage 61 are arranged close to each other with a minute gap therebetween. Then, the transfer roller 641 contacts the lower surface of the blanket BL and moves along the lower surface of the blanket BL while locally pushing up the blanket BL. The pushed blanket BL first locally contacts the plate PP or the substrate SB, and the contact portion gradually expands as the roller moves, and finally contacts the entire plate PP or the substrate SB. Thus, patterning from the plate PP to the blanket BL or pattern transfer from the blanket BL to the substrate SB is performed.

  FIG. 7 is a flowchart showing the pattern forming process. FIGS. 8 to 15 are diagrams schematically showing the positional relationship of each part of the apparatus at each stage of processing. The operation of each part in the pattern forming process will be described below with reference to FIGS. In addition, in order to show the relationship between the respective units at each stage of the process in an easy-to-understand manner, a configuration that is not directly related to the process at the stage or a reference numeral to be attached thereto may be omitted. In addition, since the operation is the same except when a processing object held on the upper stage 41 is a plate PP and a substrate SB, the plate PP and the substrate SB are shown in common in the figure. Will be read as appropriate.

  In this pattern forming process, the plate PP corresponding to the pattern to be formed is first loaded into the initialized pattern forming apparatus 1 and set on the upper stage 41 (step S101). A blanket BL on which such a coating layer is formed is carried and set on the lower stage 61 (step S102). The plate PP is loaded with the effective surface corresponding to the pattern facing downward, and the blanket BL is loaded with the coating layer facing upward.

  FIG. 8 shows a process until the plate PP or the substrate SB is carried into the apparatus and set on the upper stage 41. As shown in FIG. 8A, in the initial state, the upper stage 41 is retracted upward and the distance from the lower stage 61 is increased, and a wide processing space SP is formed between both stages. Each hand 625 is retracted below the upper surface of the lower stage 61. The transfer roller 641 is the position closest to the (−X) direction among the positions facing the opening window 611 of the lower stage 61, and the position retracted below the upper surface of the lower stage 61 in the vertical direction (Z direction). is there. Each control valve connected to the negative pressure supply unit 804 is closed.

  In this state, from the front side of the apparatus, that is, from the (−Y) direction to the (+ Y) direction, the plate PP placed on the external plate hand HP is processed after its thickness is measured in advance. It is carried into the space SP. The plate hand HP may be an operation jig manually operated by an operator, or may be a hand of an external transfer robot. At this time, since the hand 625 and the transfer roller 641 are retracted downward, the carrying-in operation can be facilitated. When the plate PP is positioned at a predetermined position, the upper stage 41 is lowered as indicated by an arrow.

  When the upper stage 41 is lowered to a predetermined position close to the plate PP, the suction pad 443 provided on the upper stage 41 is below the lower surface of the upper stage 41, that is, the holding plane 41a, as shown in FIG. Until it touches the upper surface of the plate PP. When the control valve connected to the suction pad 443 is opened, the upper surface of the plate PP is sucked by the suction pad 443 and the plate PP is held. Then, the plate PP is lifted from the plate hand HP by raising the suction pad 443 while continuing the suction. At this point, the plate hand HP moves out of the apparatus.

  Finally, as shown in FIG. 8C, the lower surface of the suction pad 443 rises to a position that is the same height as or slightly higher than the holding plane 41a, so that the upper surface of the plate PP becomes higher than that of the upper stage 41. It is held in close contact with the holding plane 41a. A configuration may be adopted in which suction grooves or suction holes are provided on the lower surface of the upper stage 41 so that the plate PP delivered from the suction pad 443 is sucked and held. In this way, the holding of the plate PP is completed. By the same procedure, the substrate SB can be loaded by the substrate hand HS.

  9 and 10 show a process from the loading of the plate PP until the blanket BL is loaded and held on the lower stage 61. FIG. When the holding of the plate PP by the upper stage 41 is completed, as shown in FIG. 9A, the upper stage 41 is raised to form a wide processing space SP again, and each hand 625 is moved from the upper surface 61 a of the lower stage 61. Also raise to the top. At this time, the upper surfaces 625a of the hands 625 are all set to the same height.

  In this state, as shown in FIG. 9B, the blanket BL having the coating layer PT made of the patterning material formed on the upper surface is placed on the external blanket hand HB and carried into the processing space SP. Accept. The thickness of the blanket BL is measured prior to loading. The blanket hand HB is preferably of the fork type having fingers extending in the Y direction so that the blanket hand HB can enter through the gap without interfering with the hand 625.

  When the blanket hand HB descends after entering or the hand 625 rises, the upper surface 625a of the hand 625 comes into contact with the lower surface of the blanket BL. Thereafter, as shown in FIG. Is supported by By supplying a negative pressure to the suction hole 625b (FIG. 4) provided in the hand 625, the support can be made more reliable. Thus, the blanket BL is transferred from the blanket hand HB to the hand 625, and the blanket hand HB can be discharged out of the apparatus.

  Thereafter, as shown in FIG. 10A, the hand 625 is lowered with the height of the upper surface 625 a of each hand 625 aligned, and finally the hand upper surface 625 a is made to be the same height as the upper surface 61 a of the lower stage 61. . As a result, the peripheral portions of the four sides of the blanket BL abut against the upper surface 61 a of the lower stage 61.

  At this time, as shown in FIG. 10B, a negative pressure is supplied to the vacuum suction groove 612 provided on the lower stage upper surface 61a to suck and hold the blanket BL. Accordingly, the suction with the hand 625 is released. As a result, the blanket BL is in a state in which the peripheral portions of the four sides are sucked and held by the lower stage 61. In FIG. 10B, the blanket BL and the hand 625 are separated to clearly indicate that the suction holding by the hand 625 has been released, but in actuality, the lower surface of the blanket BL is in contact with the upper surface 625a of the hand. Is maintained.

  If the hand 625 is separated in this state, it is considered that the blanket BL is bent downward at its center by its own weight, and has a convex shape as a whole. By maintaining the hand 625 at the same height as the lower stage upper surface 61a, it is possible to suppress the bending and maintain the blanket BL in a planar state. In this way, the blanket BL is held by the lower stage 61 by suction and the central portion is supplementarily supported by the hand 625, and the holding of the blanket BL is completed.

  The order of loading the plate PP and the blanket BL may be reversed. However, when the plate PP is loaded after the blanket BL is loaded, there is a risk that foreign matter may fall on the blanket BL when the plate PP is loaded, thereby contaminating the coating layer PT with the pattern forming material or causing defects. By setting the blanket BL on the lower stage 61 after setting the plate PP on the upper stage 41 as described above, such a problem can be avoided in advance.

  Returning to FIG. 7, when the plate PP and the blanket BL are set on the upper and lower stages in this way, the plate PP and the blanket BL are pre-aligned (step S103). Furthermore, gap adjustment is performed so that both face each other across a preset gap (step S104).

  FIG. 11 is a diagram illustrating a process of gap adjustment processing and alignment processing. Among them, the precision alignment process shown in FIG. 11C is a process necessary only for the transfer process described later, and will be described in the later description of the transfer process. As described above, the plate PP, the substrate SB, or the blanket BL is carried in from the outside, but a positional shift may occur during the delivery. The pre-alignment process is a process for roughly positioning the plate PP or substrate SB held on the upper stage 41 and the blanket BL held on the lower stage 61 at positions suitable for the subsequent processes.

  FIG. 11A is a side view schematically showing the arrangement of a configuration for executing pre-alignment. As described above, in this embodiment, a total of six pre-alignment cameras 241 to 246 are provided in the upper part of the apparatus. Among these, the three cameras 241 to 243 are substrate pre-alignment cameras for detecting the outer edge of the plate PP (or the substrate SB) held on the upper stage 41. The other three cameras 244 to 246 are blanket pre-alignment cameras for detecting the outer edge of the blanket BL. Here, the pre-alignment cameras 241 to 243 are referred to as “substrate pre-alignment cameras” for the sake of convenience, but these can be used for both the alignment of the plate PP and the alignment of the substrate SB. The processing contents are also the same.

  As shown in FIGS. 1 and 11 (a), the substrate pre-alignment cameras 241 and 242 are installed at substantially the same position in the X direction and different positions in the Y direction. The (-X) side outer edge is imaged from above. Since the upper stage 41 is formed in a plane size slightly smaller than each of the plate PP and the substrate SB, the (−X) side outer edge portion of the plate PP (or the substrate SB) extending to the outside from the end portion of the upper stage 41. Can be imaged from above. Further, although not shown in the figure, another substrate pre-alignment camera 243 is provided on the front side of the paper surface of FIG. 11A, and the camera 243 is (−) of the plate PP (or the substrate SB). Y) Take an image of the side outer edge from above.

  On the other hand, the blanket pre-alignment cameras 244 and 246 are installed in substantially the same position in the X direction and different positions in the Y direction, and the (+ X) side outer edge portion of the blanket BL placed on the lower stage 61. Are imaged from above. Further, another blanket pre-alignment camera 245 is provided on the front side of FIG. 11A, and the camera 245 images the outer edge of the blanket BL on the (−Y) side from above.

  The positions of the plate PP (or the substrate SB) and the blanket BL are grasped from the imaging results of these pre-alignment cameras 241 to 246, respectively. Then, the upper stage block support mechanisms 4821 and 4822 and the alignment stage support mechanism 605 are operated as necessary, so that the plate PP (or the substrate SB) and the blanket BL are respectively positioned at preset target positions. Positioning by the upper stage block support mechanisms 4821 and 4822 based on the imaging result, that is, pre-alignment processing of the plate PP (or substrate SB) will be described in detail later.

  When the blanket BL is moved horizontally together with the lower stage 61, it is preferable that the upper surface 625a of each hand 625 and the lower surface of the blanket BL are slightly separated from each other as shown in FIG. For this purpose, the gas supplied from the gas supply unit 806 can be discharged from the suction hole 625 b of the hand 625. The same applies to the precision alignment process described later.

  In addition, for a thin or large substrate SB that is likely to be bent, the substrate SB may be subjected to processing with a plate-like support member in contact with the back surface, for example, in order to facilitate handling. In such a case, even if the support member is larger than the substrate SB, for example, the support member is made of a transparent material, or a partially transparent window or through hole is provided in the support member. If the position of the outer edge portion is set to be easy to detect, pre-alignment processing similar to the above can be performed.

  Next, as shown in FIG. 11B, the upper stage 41 holding the plate PP is lowered with respect to the lower stage 61 holding the blanket BL, and a gap G between the plate PP and the blanket BL is determined in advance. To the set value. At this time, the thicknesses of the plate PP and the blanket BL measured in advance are taken into consideration. That is, the distance between the upper stage 41 and the lower stage 61 is adjusted so that the gap between the plates PP and the blanket BL takes a predetermined value in consideration of the thickness. The gap value G here can be set to about 300 μm, for example.

  Regarding the thicknesses of the plate PP and the blanket BL, there are individual differences due to dimensional variations in manufacturing, and even for the same part, for example, a change in thickness due to swelling is conceivable. Further, the gap G may be defined between the lower surface of the plate PP and the upper surface of the blanket BL, and between the lower surface of the plate PP and the upper surface of the coating layer PT of the pattern forming material carried on the blanket BL. May be defined between. As long as the thickness of the coating layer PT is strictly controlled in the coating stage, it is technically equivalent.

  Returning to FIG. 7, when the plate PP and the blanket BL are arranged to face each other with a gap G therebetween, the plate PP is moved by moving the transfer roller 641 in the X direction while contacting the lower surface of the blanket BL. And the blanket BL are brought into contact with each other. Thereby, the coating layer PT of the pattern forming material on the blanket BL is patterned by the plate PP (patterning process; step S105).

  FIG. 12 shows the patterning process. Specifically, as shown in FIG. 12A, the transfer roller 641 is raised to a position immediately below the blanket BL, and the center line of the transfer roller 641 is substantially the same as the end of the plate PP in the X direction. Alternatively, the transfer roller 641 is disposed at a position slightly deviated in the (−X) direction. In this state, as shown in FIG. 12B, the transfer roller 641 is further raised and brought into contact with the lower surface of the blanket BL, and the blanket BL at the contacted position is locally pushed upward. As a result, the blanket BL (more precisely, the coating layer PT of the pattern forming material carried on the blanket BL) is pressed against the lower surface of the plate PP with a predetermined pressing force. Since the transfer roller 641 is longer than the plate PP (and the effective region) in the Y direction, an elongated region along the Y direction from one end to the other end in the Y direction on the lower surface of the plate PP contacts the blanket BL.

  Thus, the lifting mechanism 644 travels in the (+ X) direction while the transfer roller 641 presses the blanket BL, thereby moving the push-up position of the blanket BL in the (+ X) direction. At this time, in order to prevent the hand 625 from coming into contact with the transfer roller 641, as shown in FIG. 12C, at least the hand 625 with respect to the hand 625 whose X-direction distance to the transfer roller 641 is equal to or smaller than a predetermined value. The upper surface 625a is retracted downward until it is positioned lower than the lower surface of the support frame 642.

  Since the suction by the hand 625 has already been released, the blanket BL is not lowered downward as the hand 625 is lowered. Further, by appropriately managing the timing of starting the descent in synchronization with the travel of the transfer roller 641, it is possible to prevent the blanket BL that has lost support by the hand 625 from drooping downward due to its own weight.

  FIG. 13 shows the running process of the transfer roller 641. Since the plate PP and the blanket BL that have been in contact with each other are maintained in close contact with each other through the coating layer PT of the pattern forming material, the plate PP is moved along with the travel of the transfer roller 641 as shown in FIG. And the area where the blanket BL is in close contact gradually expands in the (+ X) direction. At this time, as shown in the figure, the hand 625 is sequentially lowered as the transfer roller 641 approaches.

  Finally, as shown in FIG. 13B, all the hands 625 are lowered, and the transfer roller 641 reaches the vicinity of the (+ X) side end below the lower stage 61. At this time, the transfer roller 641 has reached a position substantially directly below or slightly to the (+ X) side of the end of the (+ X) side of the plate PP, and the entire lower surface of the plate PP is applied to the coating layer PT on the blanket BL. Abutted.

  While the transfer roller 641 travels while maintaining a constant height, the area of the area pressed by the transfer roller 641 on the lower surface of the blanket BL is constant. Therefore, when the lifting mechanism 644 applies a constant load and presses the transfer roller 641 against the blanket BL, the plate PP and the blanket BL are pressed against each other with a constant pressing force with the coating layer PT of the pattern forming material interposed therebetween. Will be. Thereby, patterning from the plate PP to the blanket BL can be performed satisfactorily.

  In patterning, it is ideal that the entire surface area of the plate PP can be used effectively. However, an area that cannot be effectively used due to scratches, contact with the hand during transportation, or the like is unavoidable at the periphery of the plate PP. To occur. As shown in FIG. 13B, when the central area excluding the end area of the plate PP is an effective area AR that functions effectively as a plate, at least the effective area AR has a pressing force and a traveling speed of the transfer roller 641. It is desirable that is constant. For this purpose, the length of the transfer roller 641 in the Y direction needs to be longer than the length of the effective area AR in the same direction. In the X direction, the transfer roller 641 starts traveling from a position on the (−X) side of the end of the effective area AR in the (−X) direction, and reaches at least the end of the effective area AR in the (+ X) direction. Until then, it is desirable to maintain a constant speed. The surface area of the blanket BL facing the effective area AR of the plate PP is the effective area on the blanket BL side.

  FIG. 14 shows the positional relationship between the plate or substrate and the blanket. More specifically, this figure is a plan view of the positional relationship when the plate PP or the substrate SB contacts the blanket BL as viewed from above. As shown in the figure, the blanket BL has a larger planar size than the plate PP or the substrate SB. The region R1 near the peripheral edge with dots in the drawing in the blanket BL is a region that abuts the lower stage upper surface 61a when held by the lower stage 61. The blanket BL is held by the lower stage 61 in a state where the lower surface of the inner region is open.

  The plate PP and the substrate SB are substantially the same size, and these are smaller than the opening window size of the lower stage 61. The effective area AR that is effectively used for actual pattern formation is smaller than the size of the plate PP or the substrate SB. Therefore, the area corresponding to the effective area AR in the blanket BL is in a state where the lower surface is opened and faces the opening window 611 of the lower stage 61.

  A hatched region R2 indicates a region (pressing region) that is simultaneously pressed by the transfer roller 641 on the lower surface of the blanket BL. The pressing region R2 is an elongated region extending in the roller extending direction, that is, the Y direction, and both end portions in the Y direction extend to the outside from the end portions of the plate PP or the substrate SB, respectively. Therefore, when the transfer roller 641 presses the blanket BL in a state parallel to the lower surface of the blanket BL, the pressing force is uniform in the Y direction from one end to the other end of the effective area AR in the Y direction. is there.

  Thus, the transfer roller 641 moves in the X direction while applying a uniform pressing force in the Y direction to the effective area AR, so that the plate PP or the substrate SB and the blanket BL are uniformly pressed in the entire effective area AR. They are pressed against each other by pressure. Thereby, it is possible to prevent pattern damage due to non-uniform pressing and to form a high quality pattern.

  When the transfer roller 641 reaches the end on the (+ X) side in this way, the transfer roller 641 stops running, and the transfer roller 641 is retracted downward as shown in FIG. Thereby, the transfer roller 641 is separated from the lower surface of the blanket BL, and the patterning process is completed.

  Returning to FIG. 7, when the patterning process is completed in this way, the plate PP and the blanket BL are carried out (step S106). FIG. 15 shows the process of carrying out the plate and blanket. First, as shown in FIG. 15A, each hand 625 that has been lowered during the patterning process is raised again to position the upper surface 625 a at the same height as the upper surface 61 a of the lower stage 61. In this state, the adsorption of the plate PP by the adsorption pad 443 of the upper stage 41 (in the case of adsorption holding by an adsorption groove or an adsorption hole, adsorption by them) is released. As a result, the holding of the plate PP by the upper stage 41 is released, and a laminated body in which the plate PP and the blanket BL are integrated via the coating layer PT of the pattern forming material is left on the lower stage 61. The center of the laminate is supported by the hand 625.

  Subsequently, as shown in FIG. 15B, the upper stage 41 is lifted to form a wide processing space SP, the suction by the groove 612 of the lower stage 61 is released, and the hand 625 is further lifted to lower the lower stage. Move upward from 61. At this time, it is preferable that the laminate is sucked and held by the hand 625.

  This makes it possible to access from the outside. Therefore, as shown in FIG. 15C, the blanket BL with the plate PP in close contact is carried out by accepting the blanket hand HB from the outside and performing the reverse operation to that during loading. . If the plate PP thus adhered is peeled from the blanket BL by an appropriate peeling means, a predetermined pattern is formed on the blanket BL.

  Next, a case where the pattern formed on the blanket BL is transferred to the substrate SB that is the final object will be described. The process is basically the same as in the patterning process. That is, as shown in FIG. 7, first, the substrate SB is set on the upper stage 41 (step S107), and then the blanket BL after pattern formation is set on the lower stage 61 (step S108). Then, after pre-alignment processing and gap adjustment between the substrate SB and the blanket BL (steps S109 and S110), the pattern on the blanket BL is transferred to the substrate SB by running the transfer roller 641 below the blanket BL. (Transfer process; Step S112). After the transfer is completed, the integrated blanket BL and the substrate SB are carried out, and the process ends (step S113). These series of operations are also the same as those shown in FIGS. In these drawings, when the plate PP is read as the substrate SB, the symbol PT means a pattern after the patterning process.

  However, in the transfer process, in order to properly transfer the pattern to a predetermined position on the substrate SB, before the substrate SB and the blanket BL are brought into contact with each other, a more precise alignment (precise alignment process) between the two is performed ( Step S111). FIG. 11C shows the process.

  Although not shown in FIG. 1, the pattern forming apparatus 1 is provided with a precision alignment camera 27 supported by a support column erected in the (+ Z) direction from the base frame 21. A total of four precision alignment cameras 27 are provided with their optical axes oriented vertically upward so as to respectively image the four corners of the substrate SB through the opening window 611 of the lower stage 61.

  On the four corners of the substrate SB, alignment marks (substrate-side alignment marks) serving as position references are formed in advance. On the corresponding positions of the blanket BL, blanket-side alignment is performed as a part of the pattern patterned by the plate PP. A mark is formed. These are imaged with the same visual field of the precision alignment camera 27, and the positional relationship between them is obtained by detecting the positional relationship between them, and the amount of movement of the blanket BL that corrects this is obtained. By moving the alignment stage 601 by the obtained movement amount by the alignment stage support mechanism 605, the lower stage 61 moves in the horizontal plane, and the positional deviation between the substrate SB and the blanket BL is corrected.

  The substrate SB and the blanket BL are opposed to each other with a small gap G, and the alignment marks formed on the substrates SB and the blanket BL are imaged with the same camera, so that the substrate SB and the blanket BL can be aligned with high accuracy. It can be carried out. In this sense, the alignment process can be said to be a highly accurate precision alignment process compared to the case where the substrate SB and the blanket BL are individually imaged and the position is adjusted. By bringing them into contact with each other from this state, in this embodiment, it is possible to form a pattern that is accurately aligned with a predetermined position of the substrate SB. Then, by performing pre-alignment processing of the substrate SB and the blanket BL in advance, the alignment marks respectively formed on the substrate SB and the blanket BL can be positioned in the visual field of the precision alignment camera 27.

  It should be noted that such a precise alignment process is not necessarily required when forming a pattern on the blanket BL using the plate PP. This is because the blanket side alignment mark is preliminarily formed on the plate PP together with the pattern, so that there is no positional deviation between the pattern formed on the blanket BL and the blanket side alignment mark. This is because a slight misalignment between the plate PP and the blanket BL does not affect pattern formation as long as precise alignment is performed between the side alignment mark and the substrate side alignment mark. From this point, only the pre-alignment process is executed in the patterning process.

  Although the pre-alignment of the plate PP (or the substrate SB) has been briefly described, the pre-alignment process of the plate PP will be described in detail below with reference to FIGS. Note that the pre-alignment process for the substrate SB is also the same as that for the plate PP described below, and a detailed description of the pre-alignment process for the substrate SB will be omitted.

  FIG. 16 is a diagram schematically showing a schematic configuration of the upper stage block and the substrate pre-alignment camera. The configuration and arrangement of the upper stage block 4 and the substrate pre-alignment cameras 241 to 243 are as described above. As shown in FIG. 16A, the upper stage 41, the reinforcing frame 42, the beam-like structure 43 and the support are provided. The columns 45 and 46 constitute a gantry section, and are configured to be horizontally driven while being supported by upper stage block support mechanisms 4821 and 4822.

  FIG. 17 is a diagram schematically showing the configuration of the upper stage block support mechanism on the (−X) side. The upper stage block support mechanism 4821 is a biaxial stage mechanism that drives the base plate 4811 in the X direction and the Y direction. In the upper stage block support mechanism 4821, as shown in FIG. 17B, a guide rail 482b extending in the Y direction is fixed on the base member 482a, and a slider 482c is fixed in the Y direction with respect to the guide rail 482b. It is slidably attached. A Y-axis ball screw bracket 482d is mounted on the slider 482c. As shown in FIG. 17A, the Y-axis ball screw bracket 482d extends in the X direction, and its (+ X) side end is screwed into a Y-axis ball screw 482e extending in the Y direction. A Y-axis motor 482f is attached to the (+ Y) side end of the Y-axis ball screw 482e, and when the Y-axis motor 482f is operated in accordance with an operation command from the motor control unit 802 (FIG. 2), Accordingly, the Y-axis ball screw bracket 482d moves in the Y direction. With these configurations, a Y-axis moving unit is configured.

  An X-axis moving part is provided on the Y-axis ball screw bracket 482d. The X-axis moving part is screwed into a linear guide in which a slider 482h is slidably attached in the X direction to a guide rail 482g extending in the X direction, an X-axis ball screw 482j, and the X-axis ball screw 482j. X-axis ball screw bracket 482k and X-axis motor 482m. In the X-axis moving portion, the slider 482h is fixed to the upper surface of the (+ X) side end portion of the Y-axis ball screw bracket 482d with the guide rail 482g positioned above the slider 482h. Further, an X-axis ball screw bracket 482k is mounted on the guide rail 482g. Therefore, when the X-axis motor 482m connected to the (−X) side end of the X-axis ball screw 482j is operated in accordance with an operation command from the motor control unit 802 (FIG. 2), the X-axis ball screw bracket 482k. Moves in the X-axis direction with respect to the Y-axis moving unit. Thus, the biaxial stage mechanism is configured in such a manner that the X-axis moving unit is stacked on the Y-axis moving unit, and the X-axis ball screw bracket 482k can be moved in the X direction and the Y direction. ing.

  A base plate 4811 is attached to the X-axis ball screw bracket 482k via a cross roller bearing 482n. Therefore, the base plate 4811 can be driven in the X direction and the Y direction by controlling the Y-axis motor 482f and the X-axis motor 482m.

  FIG. 18 is a diagram schematically showing the configuration of the upper stage block support mechanism on the (+ X) side. The upper stage block support mechanism 4822 is provided with a ball screw mechanism and an X axis motor not provided in the X axis moving portion, and a bracket 482p having the same shape instead of the X axis ball screw bracket 482k. Except for the upper stage block support mechanism 4821. Therefore, the upper stage block support mechanism 4822 can drive only the Y direction while supporting the base plate 4812 so as to be movable in the X direction and the Y direction.

  Returning to FIG. 16, the description will be continued. The plate PP and the substrate SB used in the present embodiment are both plate-like objects having a rectangular shape, and among the pre-alignment cameras, the substrate pre-alignment cameras 241 and 242 have four sides that define the shapes of the plate PP and the substrate SB. E1-E4 is provided corresponding to the long side E1 on the (−X) side and images the two outer edges on the (−X) side, respectively, and the substrate pre-alignment camera 243 is short on the (−Y) side. A portion of the outer edge on the (−Y) side that is provided corresponding to the side E2 is imaged. In FIG. 3C, areas IR1, IR2, and IR3 indicate imaging ranges by the cameras 241 to 243, respectively. In this way, it is possible to increase the positioning accuracy in the pre-alignment by imaging the outer edges close to the corners of the plate PP.

  In this embodiment, the reason why each part of the two sides E1 and E2 that are not parallel to each other is imaged is to independently determine the amount of displacement of the plate PP with respect to the target position in the two-dimensional direction in the X direction and the Y direction. It is. Further, the reason for imaging two or more locations on the same side E1 is to obtain the inclination amount of the plate PP with respect to the target position in the θ direction, and it is desirable to use the long side as in this embodiment. However, it is not limited to the long side, and may be the short sides E2 and E4. It is also possible to take an image at each of two sides parallel to each other (for example, side E1 and side E3, or side E2 and side E4), and obtain the amount of inclination.

Next, the pre-alignment processing of the plate PP will be described with reference to FIG. In the present embodiment, the plate PP previously held by the upper stage 41 is positioned at the target position, and as shown in FIG. 19A, the plates PP at the target position are imaged by the cameras 241 to 243,
The position X01 of the long side E1 in the X direction in the image IR1,
A position X02 in the X direction of the long side E1 in the image IR2,
The position Y03 of the short side E2 in the Y direction in the image IR3,
Further, including the displacement amount ΔX0 of the positions X01 and X02, these values are stored in the storage unit (not shown) of the control unit 8 as target position information. Here, the positions X01 and X02 do not have to coincide with each other, and they may be shifted. Further, the target position information (X01, X02, Y03, ΔX0) need not be updated unless the positions of the cameras 241 to 243 are changed.

  Next, when the plate PP is actually loaded, the CPU 801 of the control unit 8 performs upper stage block support mechanism 4821 based on the imaging results of the cameras 241 to 243 according to a program stored in advance in a storage unit (not shown). 4822 is controlled to position the plate PP at the target position (pre-alignment of the plate PP). That is, the edge of the plate PP is imaged by the substrate pre-alignment cameras 241 to 243 while being transferred to the upper stage 41 and sucked and held by the upper stage 41. FIG. 19B shows an example thereof. In general, the plate PP is sucked and held on the upper stage 41 in a state of being deviated from the target position as described above. At this time, the position X11 of the long side E1 in the X direction in the image IR1 imaged by the camera 241 and the position X12 of the long side E1 in the image IR2 imaged by the camera 242 are obtained. Note that reference symbol ΔX1 in FIG. 4B indicates the amount of displacement between the positions X11 and X12.

  Here, when the plate PP is sucked and held on the upper stage 41 without causing a positional deviation with respect to the target position, the positions X11 and X12 coincide with the target position information X01 and X02, and the deviation amount ΔX1 is also the target position information ΔX0. In addition, the position Y13 in the Y direction of the short side E2 in the image IR3 captured by the camera 243 also matches the target position information Y03. However, as shown in FIG. In fact, both values are different.

  Therefore, in this embodiment, the amount of inclination of the plate PP with respect to the target position is obtained by calculation based on the target position information X01 and X02 and the positions X11 and X12. Then, the Y-axis motors 482f and 482f and the X-axis motor 482m are operated by the tilt amount to rotate the upper stage 41 in the horizontal plane to correct the tilt. As a result, for example, as shown in FIG. 19C, the position X21 of the long side E1 in the X direction in the image IR1 captured by the camera 241 and the image IR2 captured by the camera 242 after the tilt correction. The deviation amount ΔX2 of the long side E1 from the position X22 in the X direction coincides with or substantially coincides with the target position information ΔX0. If the difference between the deviation amount ΔX2 and the target position information ΔX0 is not within the specified value, the inclination amount of the plate PP with respect to the target position is again calculated based on the positions X21 and X22, and only the inclination amount is Y The shaft motors 482f and 482f and the X-axis motor 482m are operated to rotate the upper stage 41 in the horizontal plane to correct the tilt. By repeating until the amount of deviation ΔX2 coincides with or substantially coincides with the target position information ΔX0 and the difference is within a specified value, the inclination of the plate PP with respect to the target position can be accurately corrected.

  When the tilt correction is completed in this way, the X direction is based on the position X21 (or position X22) in the X direction of the long side E1 in the image IR1 captured by the camera 241 after the tilt correction and the target position information X01 (or X02). The offset amount Xoff of the plate PP is calculated. Further, the offset amount Yoff of the plate PP in the Y direction is calculated based on the position Y23 in the Y direction and the target position information Y03 of the short side E3 in the image IR3 captured by the camera 243 after the inclination correction. Then, the X-axis motor 482m is operated only for the offset amount Xoff to shift the upper stage 41 in the X direction, and the Y-axis motors 482f and 482f are operated for the offset amount Yoff to shift the upper stage 41 in the Y direction. Move. As a result, as shown in FIG. 19D, the plate PP is positioned at the target position, and the pre-alignment process is completed. Note that the position X31 (or position X32) in the X direction of the long side E1 in the image IR1 captured by the camera 241 after offset correction does not match the target position information X01 (or X02), and the offset amount Xoff is The position Y33 in the Y direction of the short side E3 in the image IR3 captured by the camera 243 after offset correction does not match the target position information Y03 and the offset amount Yoff is within the specified value. If not, the motor on the side where the offset is generated is operated and shifted by the offset amount. The offset of the plate PP with respect to the target position can be accurately corrected by repeating the offset correction until the offset amounts Xoff and Yoff are both within the specified values.

  As described above, according to the present embodiment, the upper surface of the blanket BL held on the lower stage 61 and the lower surface of the plate PP or substrate SB held on the upper stage 41 are pressed against each other to form a pattern. However, before this is performed, the plate PP or the substrate SB is positioned at the target position while being held on the upper stage 41, that is, pre-alignment processing is performed. Therefore, if the plate PP is transported by the plate hand HP, the substrate SB is transported by the substrate hand HS, or the plate PP or the substrate SB is transferred to the upper stage 41, a positional deviation may occur, or the plate PP or the substrate SB. Even if a large deflection occurs, the plate PP and the substrate SB can be reliably positioned at the target position by eliminating the pre-alignment process. As a result, the accuracy of pattern formation can be increased.

  In addition, since the tilt correction and the offset correction described above are performed based on the imaging results of the cameras 241 to 243, the plate PP and the substrate SB having a rectangular shape can be accurately positioned at the target position.

  Further, in the above-described embodiment, the holding plane 41a of the upper stage 41 is formed in a plane size slightly smaller than each of the plate PP and the substrate SB, and adsorbs the central portion of the plate PP and the substrate SB, and the plate PP and the substrate SB. The plate PP and the substrate SB are adsorbed and held in a state where the outer edge of the plate protrudes from the holding plane 41a. The outer edges of the plate PP and the substrate SB are imaged from the (+ Z) side opposite to the lower stage 61 with respect to the plate PP and the substrate SB. Accordingly, it is possible for the cameras 241 to 243 to image the outer edges of the plate PP and the substrate SB without interfering with the lower stage block.

  Thus, in the present embodiment, the plate PP and the substrate SB correspond to an example of the “plate-like object” of the present invention, and the lower surface corresponds to “one surface of the plate-like object” of the present invention. The upper surface corresponds to “the other surface of the plate-like object” of the present invention. Further, the upper surface of the blanket BL corresponds to “one side of the blanket” of the present invention. Further, the lower stage 61 and the upper stage 41 correspond to examples of “first holding means” and “second holding means” of the present invention, respectively. The upper stage block support mechanisms 4821 and 4822 correspond to an example of the “moving means” in the present invention. The substrate pre-alignment cameras 241 to 243 correspond to an example of the “imaging unit” of the present invention. Further, the control unit 8 functions as “pre-alignment means” of the present invention.

  The present invention is not limited to the above-described embodiment, and various modifications can be made to the above-described one without departing from the spirit of the present invention. For example, in the above embodiment, the outer edges of the plate PP and the substrate SB are imaged by the three substrate pre-alignment cameras 241 to 243, but the number and arrangement positions of the cameras are not limited to the above embodiment. In addition, the number and position of locations to be imaged are not limited to the above embodiment, and are arbitrary as long as at least a part of the outer edge of the plate PP and the substrate SB can be imaged and used for pre-alignment.

  In the above-described embodiment, pre-alignment is performed in two stages of tilt correction and offset correction. However, the correction method based on the imaging results of the cameras 241 to 243 is not limited to this, and for example, tilt Correction and offset correction may be performed simultaneously.

  The present invention can be applied to all pattern forming techniques for forming a pattern by pressing one side of a blanket held by a first holding unit and one side of a plate-like object held by a second holding unit. it can.

DESCRIPTION OF SYMBOLS 1 ... Pattern formation apparatus 8 ... Control unit (pre-alignment means)
41 ... Upper stage (second holding means)
41a ... holding plane 61 ... lower stage (first holding means)
241 to 243 ... Pre-alignment camera for substrate (imaging means)
4821, 4822 ... Upper stage block support mechanism (moving means)
BL ... Blanket PP ... Plate (Plate-like object)
SB ... Substrate (plate-like object)

Claims (7)

A first step of holding the blanket by the first holding means in a state where the one surface of the blanket and the one surface of the plate-like object are opposed to each other, and holding the plate-like object by the second holding means;
A second step of moving at least one of the first holding means and the second holding means and pressing one side of the blanket and one side of the plate-like object together to form a pattern;
The first step images at least a part of the outer edge of the plate-like object held by the second holding means, and holds the plate-like object while holding the plate-like object based on the imaging result. A pattern forming method comprising a pre-alignment step of moving the plate-like object at a target position by moving the plate-like object in parallel with one surface of the object. The pattern forming method according to claim 1,
The plate-like object has a polygonal shape;
The pre-alignment step includes
An inclination correction step of imaging a plurality of different locations on the first side which is one of the sides defining the shape of the plate-like object, and correcting the inclination of the plate-like object with respect to the target position based on the imaging result;
The second side that is not parallel to the first side and the first side among the sides that define the shape of the plate-like object whose tilt is corrected are imaged, and the plate shape with respect to the target position based on the imaging result An offset correction step for correcting an offset of an object. It is a pattern formation method of Claim 2, Comprising:
The first side and the second side when the plate-like object is held at the target position by the second holding unit are imaged, and information on the target position obtained from the imaging result is stored as target position information. Further comprising a third step,
The inclination correction step obtains an inclination amount of the plate-like object with respect to the target position based on information on the position of the plate-like object obtained from the imaging result and the target position information, and the second according to the inclination amount. A step of correcting the inclination of the plate-like object with respect to the target position by movement of a holding means;
The offset correction step obtains an offset amount of the plate-like object with respect to the target position based on information about the position of the plate-like object obtained from the imaging result and the target position information, and the second correction according to the offset amount. A pattern forming method which is a step of correcting an offset of the plate-like object with respect to the target position by movement of a holding unit. A pattern forming method according to any one of claims 1 to 3,
The plate-like object is a plate provided with a first pattern on one side,
In the second step, the blanket is held by the first holding unit, and then the first holding unit and the plate positioned at the target position by the pre-alignment step are not aligned. A pattern formation method comprising a patterning step of transferring the first pattern onto one side of the blanket by pressing one side of the blanket and one side of the plate-like object together. A pattern forming method according to any one of claims 1 to 3,
The blanket has a first alignment mark, and a second pattern is provided on the one surface of the blanket,
The plate-like object is a substrate having a second alignment mark;
The second step includes
Imaging the first alignment mark of the blanket held by the first holding means and the second alignment mark of the substrate positioned at the target position by the pre-alignment step, and based on the imaging result, A precision alignment step of aligning the blanket and the substrate by moving at least one of the first holding means and the second holding means;
A pattern forming method comprising: a transfer step of transferring the second pattern onto the one surface of the substrate by pressing the one surface of the blanket and the one surface of the plate-like object together after the precision alignment step. A pattern forming apparatus for forming a pattern by pressing one side of a blanket held by a first holding unit and one side of a plate-like object held by a second holding unit,
Moving means for moving the second holding means in parallel with one surface of the plate-like object;
Imaging means for imaging at least a part of an outer edge of the plate-like object held by the second holding means;
Pre-alignment means for positioning the plate-like object at a target position by operating the moving means while holding the plate-like object by the second holding means based on an imaging result by the image pickup means before forming the pattern; A pattern forming apparatus comprising: It is a pattern formation apparatus of Claim 6, Comprising:
The second holding means has a holding plane that sucks and holds the central portion of the other surface of the plate-like object, and holds the plate-like object in a state where an outer edge of the plate-like object protrudes from the holding plane. Hold on,
The pattern forming apparatus that images the outer edge of the plate-like object from the side opposite to the first holding means with respect to the plate-like object.

Images