JP2014168029A - Process of manufacturing circuit board that eliminates need of character and symbol printing and such by a screen printing - Google Patents

Process of manufacturing circuit board that eliminates need of character and symbol printing and such by a screen printing Download PDF

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JP2014168029A
JP2014168029A JP2013054068A JP2013054068A JP2014168029A JP 2014168029 A JP2014168029 A JP 2014168029A JP 2013054068 A JP2013054068 A JP 2013054068A JP 2013054068 A JP2013054068 A JP 2013054068A JP 2014168029 A JP2014168029 A JP 2014168029A
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circuit board
solder resist
manufacturing
character
mask film
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JP5374799B1 (en
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Kazunori Tsuge
和典 柘植
Yoshito Tanaka
義人 田中
Koji Akiyama
浩司 秋山
Kiyoshi Tanaka
清 田中
Kazuyoshi Nishio
和義 西尾
Takehiro Kato
雄大 加藤
Masaru Murakami
勝 村上
Tadayoshi Saito
忠芳 齋藤
Hirotoshi Yoshimura
浩年 吉村
Satoshi Inoue
智 井上
Gen Numakura
巖 沼倉
Noriaki Tsukada
典明 塚田
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TOKAI SHINEI DENSHI KOGYO KK
Yamatoya and Co Ltd
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TOKAI SHINEI DENSHI KOGYO KK
Yamatoya and Co Ltd
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Publication of JP5374799B1 publication Critical patent/JP5374799B1/en
Priority to CN201480000746.0A priority patent/CN104255086B/en
Priority to PCT/JP2014/054601 priority patent/WO2014132974A1/en
Priority to US14/770,979 priority patent/US9857687B2/en
Priority to KR1020157025148A priority patent/KR101802046B1/en
Priority to TW103106767A priority patent/TWI535353B/en
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Abstract

PROBLEM TO BE SOLVED: To provide a process of manufacturing a circuit board capable of printing characters and such without using character and symbol printing and such by a screen printing.SOLUTION: The process of manufacturing a circuit board in which, by changing ultraviolet light irradiation amount to a combined coat of a coloring ink layer and a solder resist ink layer (also called as a permanent resist) containing an epoxy resin and an acrylic resin to generate a difference of ratio in crosslinking density and a degree of polymerization of the solder resist ink on the circuit board, differences in refractive index and transparency are generated to make color of the coloring ink visible.

Description

発明の詳細な説明Detailed Description of the Invention

本発明は、エポキシ系樹脂と一部カルボン酸残存のアクリル系樹脂を含むソルダーレジストインキ(以後は、MSRと言う)を用い、紫外線照射量又は乾燥熱量を変化させることで、MSR層の架橋密度・重合度量等の割合を変化させることにより、屈折率や透明度を変化させその屈折率や透明度の差により搭載部品認識用文字等が下地色をかいして微小文字まで鮮明に視認ができる回路基板の製造方法に関するものである。  The present invention uses a solder resist ink (hereinafter referred to as MSR) containing an epoxy resin and an acrylic resin partially remaining in carboxylic acid, and changes the UV irradiation amount or the amount of drying heat to change the crosslinking density of the MSR layer.・ Circuit board that changes the refractive index and transparency by changing the ratio of the degree of polymerization, etc., and the letters for recognition of mounted parts, etc., turn the background color by virtue of the difference in the refractive index and transparency, so that even minute characters can be clearly seen It is related with the manufacturing method.

回路基板は銅回路保護のため等にソルダーレジストが施されており、このソルダーレジスト上に搭載部品等の適確な情報を提供するため、スクリーン印刷方法で搭載部品名などの識別文字・記号等が印字される。  The circuit board is coated with solder resist to protect the copper circuit, etc. In order to provide accurate information on the mounted components on this solder resist, identification characters and symbols such as names of mounted components are screen printed. Is printed.

しかし、近年はより軽薄短小化が飛躍的に進んでおり、スクリーン印刷による印字方法は、用いるスクリーン版のメッシュ目に文字の大きさ及び解像度が左右される。文字・記号等用のインキが通過できるメッシュ目の大きさが限界になっており、小文字化の要求に対応できなくなっている。  However, in recent years, lighter, thinner, and smaller sizes have been drastically advanced. In the printing method using screen printing, the size and resolution of characters are influenced by the mesh of the screen plate used. The mesh size through which ink for letters, symbols, etc. can pass is limited, making it impossible to meet the demand for lower case letters.

さらに、高機能製品が求められることから、回路基板の実装面積が小さくなり、搭載部品は小型化され、多くの部品が搭載されるようになった。現状のスクリーン文字印刷方法では、文字の大きさが限界に達しており、物理的に全ての文字を表記することが不可能になってきている。  Furthermore, since a high-performance product is required, the mounting area of the circuit board is reduced, the mounted components are downsized, and many components are mounted. In the current screen character printing method, the size of characters has reached the limit, and it has become impossible to physically represent all characters.

また、スクリーン印刷方法による文字印刷は、版の目詰が生じないように、作業中頻繁に有機溶剤で版の裏面の清掃が必要である。さらに、印刷終了後は版に付着しているインキ除去に有機溶剤を開放状態で使用。又、印刷版の保管のためには、スクリーン印刷版をデップ方式、又は、スプレー方式等で、前記で除去できなかった、インキの洗浄除去が必要で、この工程では、多量の有機溶剤が使用されていることから、作業環境の悪化さらに大気汚染の問題が課題になっている。  Also, character printing by the screen printing method requires frequent cleaning of the back side of the plate with an organic solvent during work so that the plate is not clogged. In addition, the organic solvent is used in an open state to remove ink adhering to the plate after printing. Also, in order to store the printing plate, it is necessary to wash and remove the ink that could not be removed by the dipping method or the spraying method, and a large amount of organic solvent is used in this process. As a result, the deterioration of the working environment and the problem of air pollution are becoming issues.

スクリーン印刷による印刷物は、メッシュ目の関係でラインがギザギザになる欠点があり、小文字等は不明瞭で判読不能な状態である事から、部品の小型化、高密度実装から鮮明な小文字・記号等の表記が要求されている。  The printed matter by screen printing has the disadvantage that the lines become jagged due to mesh mesh, and the lowercase letters etc. are unclear and unreadable, so the lowercase letters and symbols etc. are clear from miniaturization of parts and high density mounting Is required.

スクリーン印刷方法による文字印刷は、版の位置合わせや、版の伸びと刷り後の位置などの調整には多大な時間が掛る。さらに作業中での微調整などの一連の作業は熟練工でなければできない。又、日本の回路基板製造業は多品種少量ロットを手掛けており、版の取り換え回数が多く、その結果、文字印刷作業に多大な時間が取られる。生産を上げために人員を増やして凌いでいるのが現状である。この工程の人員割合は他の工程と比較して高い位置にあることが製造コストアップに繋がっているのが現状である。  Character printing by the screen printing method takes a great deal of time to adjust the position of the plate and the adjustment of the plate elongation and the position after printing. Furthermore, a series of work such as fine adjustment during work can only be performed by skilled workers. The Japanese circuit board manufacturing industry handles many kinds of small lots, and the number of plate replacements is large. As a result, it takes a lot of time to print characters. The current situation is that the number of personnel has been increased to surpass production. At present, the ratio of personnel in this process is higher than that in other processes, leading to an increase in manufacturing costs.

スクリーン印刷方法による文字印刷版は、レピート品製造のために数年間の保管が必要となり、印刷版の保管に多大な保管場所が必要で、保管管理費も製造コストアップの要因の一つでもある。  Character printing plates using the screen printing method need to be stored for several years in order to produce repeat products, and a large storage space is required to store the printing plates. Storage management costs are one of the factors that increase manufacturing costs. .

ソルダーレジスト上に部品搭載等の認識文字(以後、文字と言う)を印刷することから、表面はインキの盛り上りにより10〜20μmの凹凸が出来、搭載部品の接合不良や微細部品の脱落等による不良品が多々起こり、再登載に多大な時間を浪費することにより製造コストアップの要因になっている。スクリーン文字印刷方法はこの様な、極小表面実装部品に、致命的なマイナス要因がある。  Since the recognition characters (hereinafter referred to as “characters”) such as component mounting are printed on the solder resist, the surface has 10-20 μm irregularities due to the rise of the ink, which is caused by poor bonding of the mounting components or dropping of fine components. Many defective products occur, and a great deal of time is wasted on re-registration, which increases manufacturing costs. The screen character printing method has a fatal negative factor in such a small surface mount component.

前記スクリーン印刷法に代わる、方法として基板上にロールコータによりインキを塗布し、露光現像を行うことで文字等を印字する方法や、インクジェットプリンターによる塗布方法が開示されている。(例えば、特許文献1,2参照)  As an alternative to the screen printing method, a method of printing characters and the like by applying ink on a substrate with a roll coater and performing exposure development, and a coating method using an ink jet printer are disclosed. (For example, see Patent Documents 1 and 2)

特開2002−214778JP 2002-214778 A 特開平9−135062JP-A-9-133502

スクリーン文字印刷は、文字・記号等のラインがギザギザに形成されることから、小文字・記号等は不明瞭となる。さらに、インキの通過メッシュ目に限界があり、極小表面実装部品に対応する回路基板への追従ができない。又、スクリーン印刷法に代わる、方法として基板上にロールコータによりインキを塗布し、露光現像を行うことで文字等を印字する方法や、インクジェットプリンターによる塗布方法では、微細文字の印字は可能となるが、スクリーン印刷と同様にソルダーレジスト面上にインキを塗布するためフラットな状態の印字ができない。  In screen character printing, since the lines of characters, symbols, etc. are formed in a jagged manner, lowercase letters, symbols, etc. are unclear. Furthermore, there is a limit to the ink passing mesh, and it is impossible to follow the circuit board corresponding to the minimum surface mount component. Also, as an alternative to the screen printing method, fine characters can be printed by a method of printing characters by applying ink on a substrate with a roll coater and performing exposure development, or a coating method using an ink jet printer. However, since the ink is applied onto the solder resist surface as in the case of screen printing, printing in a flat state cannot be performed.

スクリーン文字印刷は、印刷版のセットには多大な時間を要し、印刷にも、熟練工が必要で、生産性を上げるために、多くの熟練工を抱えなければならない。又、印刷版の必要面積は文字印刷部分の3〜5倍必要で、その保管に多大な場所が必要となる。  In screen character printing, it takes a lot of time to set a printing plate, and skill is required for printing. In order to increase productivity, many skilled workers are required. Moreover, the required area of the printing plate is required to be 3 to 5 times that of the character printing portion, which requires a large place for storage.

スクリーン文字印刷は、有機溶剤を多量に使用することから、作業環境が悪化、大気汚染負荷の増大につながる。使用溶剤によれば、癌の誘発に繋がる危険性を含むばあいもある。さらに、作業の多くは開放で行なわれているため、有機溶剤中毒の危険にもさらされている。  Screen character printing uses a large amount of organic solvent, which deteriorates the working environment and increases the air pollution load. Depending on the solvent used, there may be a risk of cancer induction. In addition, since many of the operations are performed open, they are at risk of organic solvent poisoning.

本発明は、前記のような問題を解決できる回路基板の製造方法を提供することである。  The present invention is to provide a circuit board manufacturing method capable of solving the above-described problems.

本発明者は、前記問題を解決するため鋭意検討の結果、写真法を用い、次のような手順を踏むことでフラットなソルダーレジスト面を保ち、搭載部品等の小文字の認識まで鮮明に読み取ることができる事を見出し、回路基板の製造方法を確立して本発明は完成するに至った。
但し、マルチ基板の様にブラック処理やブラウン処理が施され、その色が搭載部品等の認識文字として使用可能な場合は、着色インキ層処理を除いても問題ないことを一言付け加えておく。
As a result of intensive studies to solve the above problems, the present inventor uses a photographic method, and maintains a flat solder resist surface by following the procedure described below, and clearly reads even lowercase letters such as mounted parts. As a result, the present invention has been completed by establishing a circuit board manufacturing method.
However, if black processing or brown processing is performed like a multi-substrate and the color can be used as a recognition character for a mounted component or the like, it should be noted that there is no problem even if the colored ink layer processing is omitted.

手順の例として、
▲1▼エッチング等により回路形成基板⇒▲2▼整面・乾燥⇒▲3▼プライマー処理(除くこともある)⇒▲4▼乾燥A⇒▲5▼MSR塗布⇒▲6▼乾燥B⇒▲7▼一次露光⇒▲8▼二次露光⇒現像⇒▲9▼乾燥⇒後工程へ
As an example of the procedure,
(1) Circuit forming substrate by etching, etc. (2) Surface preparation and drying (3) Primer treatment (may be removed) (4) Drying A (5) MSR coating (6) Drying B (7) ▼ Primary exposure ⇒ ▲ 8 ▼ Secondary exposure ⇒Development ⇒ ▲ 9 ▼ Dry ⇒To the next process

整面・乾燥は、一般的な方法で行えばよいが、回路面での凹凸は3μm以内が望ましいが、機能に問題なければ凹凸は問題にしない。  The surface conditioning and drying may be performed by a general method, but the unevenness on the circuit surface is preferably within 3 μm, but the unevenness is not a problem if there is no problem in function.

官能基を持つ着色インキを図1のように、プライマー層として用いるか、あるいは、図2のように、MSR層間にインキ層をもけることで、文字が鮮明に読み取ることが出来ることを特徴とした請求項1〜7の回路基板の製造方法。ただし着色インキは、露光により、色彩変化しても問題ないことをいとこと付け加えておく。  Characteristic ink can be read clearly by using a colored ink having a functional group as a primer layer as shown in FIG. 1 or by providing an ink layer between MSR layers as shown in FIG. A method for manufacturing a circuit board according to claim 1. However, it should be noted that there is no problem even if the color of the colored ink changes due to exposure.

着色インキの塗布方法にはこだわらないが、ロールコート、カーテンコート、スプレーコート、静電塗装等を用いて出来る限り均一に塗布することが望ましく、塗布厚みは2μm〜300μm、好ましくは5μm〜150μm。塗布の厚みが2μm以下では文字などが鮮明でなくなる、又、300μm以上でも、識別文字等の明瞭差に変わりがなく、効果が発揮されない。  Although it does not care about the coating method of colored ink, it is desirable to apply as uniformly as possible using roll coating, curtain coating, spray coating, electrostatic coating, etc., and the coating thickness is 2 μm to 300 μm, preferably 5 μm to 150 μm. If the coating thickness is 2 μm or less, characters and the like will not be clear, and if it is 300 μm or more, the distinction difference between identification characters will not change and the effect will not be exhibited.

乾燥Aは、次工程の塗布時に着色インキとMSRとが混ざらない程度の乾燥状態を得る事が必要で、温度は40℃〜100℃、時間は5分〜60分、好ましくは、温度は50℃〜80℃、時間は10分〜30分。乾燥が甘いとMSRと混ざり、文字等の鮮明さが失われる、又、乾燥が強いと現像時での非画先部の抜けが悪く、基材に付着し、部品のマウント時に支障をきたす。乾燥には熱温風乾燥機を用いることおすすめする。  The drying A needs to obtain a dry state in which the colored ink and the MSR are not mixed at the time of application in the next step, the temperature is 40 ° C. to 100 ° C., the time is 5 minutes to 60 minutes, and preferably the temperature is 50 ℃ -80 ℃, time is 10-30 minutes. If the drying is sweet, it mixes with the MSR, and the sharpness of characters and the like is lost. If the drying is strong, the non-tip portion does not come off at the time of development, adheres to the base material, and hinders the mounting of parts. It is recommended to use a hot air dryer for drying.

MSRの塗布は、均一に塗布することが望ましく(図1・2)、塗布厚みは2μm〜300μm、好ましくは5μm〜150μm。塗布厚みは2μm以下では、ピンホールなどができ十分な回路保護が出来なくなる。300μm以上では、生産性を考慮した作業時間内では、深部まで紫外線照射量が十分とどかなくなり、現像時において深部のMSRがえぐられ、回路である金属銅が保護されなく、以後の工程中で腐食され断線やマイグレーションなどが起きる原因の要因となる。  The MSR is desirably applied uniformly (FIGS. 1 and 2), and the coating thickness is 2 μm to 300 μm, preferably 5 μm to 150 μm. If the coating thickness is 2 μm or less, pinholes and the like are formed, and sufficient circuit protection cannot be achieved. Above 300 μm, the UV irradiation dose does not reach the deep part sufficiently within the working time considering productivity, the deep part MSR is obtained at the time of development, and the metallic copper that is the circuit is not protected, and corrosion is caused in the subsequent processes. This is a cause of disconnection and migration.

MSRは、エポキシ系樹脂とアクリル系樹脂混合割合は任意であるが、エポキシ系樹脂の割合がアクリル系樹脂より多少、多くすることで、文字がより鮮明にできることを特徴とした請求項1〜8の回路基板の製造方法。  In MSR, the mixing ratio of the epoxy resin and the acrylic resin is arbitrary, but the character can be made clearer by increasing the ratio of the epoxy resin slightly more than the acrylic resin. Circuit board manufacturing method.

エポキシ系樹脂の割合は40%〜80%、好ましくは50.1%〜65%。40%以下、又は、80%以上では、紫外線の照射量変化に対して、透明部分と、不透明部分とのコントラストが得られにくく、文字が不鮮明になる。  The proportion of the epoxy resin is 40% to 80%, preferably 50.1% to 65%. If it is 40% or less, or 80% or more, it is difficult to obtain contrast between the transparent portion and the opaque portion with respect to the change in the irradiation amount of ultraviolet rays, and the characters become unclear.

乾燥Bは、次工程の露光で支障のない程度の乾燥状態で良く、温度は40℃〜120℃で、好ましくは60℃〜95℃。時間は5分〜100分で、好ましくは10分〜70分。乾燥状態が甘いと、使用フィルムにMSRが付着し、そのインキ除去等に時間がとられ作業性が悪くなる。また、フィルムに付着することでMSR層の厚みが不十分となり回路保護に支障をきたす。乾燥が行き過ぎると熱量で架橋・重合反応が進み過ぎて、現像工程においてソルダージストの不必要部分である非画線部にMSRが残り部品の搭載が出来なくなる。  Dry B may be in a dry state that does not interfere with exposure in the next step, and the temperature is 40 ° C to 120 ° C, preferably 60 ° C to 95 ° C. The time is 5 to 100 minutes, preferably 10 to 70 minutes. When the dry state is sweet, MSR adheres to the film used, and it takes time to remove the ink and the workability deteriorates. Moreover, the thickness of the MSR layer becomes insufficient by adhering to the film, which hinders circuit protection. If the drying is excessive, the crosslinking / polymerization reaction proceeds excessively by the amount of heat, and the MSR remains in the non-image area, which is an unnecessary part of the solderist, in the development process, making it impossible to mount the parts.

一次露光は、図3のようにセットし、搭載すべき部品位置である画線部は、マスクフィルムで紫外線をカットし、非画線部を少量照射する、その照射量は、現像工程でMSR(▲4▼)が、流失しない程度に止めることで、エポキシ系樹脂とアクリル系樹脂との反応による、架橋密度・重合度量を少なくする。その結果、元のMSRの透明度に近いMSRの塗膜を得ることを特徴とする、請求項1〜8の回路基板の製造方法。  The primary exposure is set as shown in FIG. 3, and the image area, which is the position of the component to be mounted, cuts ultraviolet rays with a mask film and irradiates a small amount of the non-image area. The irradiation amount is MSR in the development process. ((4)) is reduced to such an extent that it does not flow out, thereby reducing the crosslink density and the degree of polymerization due to the reaction between the epoxy resin and the acrylic resin. As a result, an MSR coating film close to the transparency of the original MSR is obtained.

ネガタイプのMSRを用い、図3のようにセットした場合の、一次露光は、ネガ型のソルダーレジスト用のフイルムを用い、紫外線を照射する。照射量は10mJ/cm〜300mJ/cm、好ましくは40mJ/cm〜150mJ/cm。10mJ/cm以下では、架橋・重合不足により、現像工程でMSRが除去されてしまう。300mJ/cm以上では、架橋・重合が進み過ぎ、透明度が低下し、文字が不鮮明となる。
ポジタイプの着色インキ及びソルダーレジストインキを用いる場合は、前記と逆タイプのフイルムを使用することは言うまでもない。
In the case of using a negative type MSR and setting as shown in FIG. 3, the primary exposure uses a film for a negative type solder resist and irradiates ultraviolet rays. Dose is 10mJ / cm 2 ~300mJ / cm 2 , preferably 40mJ / cm 2 ~150mJ / cm 2 . If it is 10 mJ / cm 2 or less, the MSR is removed in the development process due to insufficient crosslinking and polymerization. If it is 300 mJ / cm 2 or more, crosslinking / polymerization proceeds excessively, the transparency is lowered, and the characters become unclear.
Needless to say, when using positive type colored ink and solder resist ink, the reverse type film is used.

又は、図4、又は、図6のようにセットし、部品搭載位置と文字位置である画線部は、マスクフイルムで紫外線をカットし、非画線部のみを照射し、エポキシ系樹脂とアクリル系樹脂との反応による、架橋密度・重合度量を多くし、透明度の低いMSRの塗膜を得ることを特徴とする、請求項1〜8の回路基板の製造方法。  4 or 6, set the part mounting position and the character line area, cut the ultraviolet rays with a mask film, and irradiate only the non-image area, epoxy resin and acrylic The method for producing a circuit board according to claim 1, wherein an MSR coating film having a low degree of transparency is obtained by increasing the crosslinking density and the degree of polymerization by reaction with a resin.

図4、又は、図6のようにセットした場合の、一次露光は、部品搭載位置はネガタイプで識別文字・記号等はポジタイプに加工したフォトマスクフイルムを用い、紫外線を照射する。照射量は50mJ/cm〜800mJ/cm、好ましくは100mJ/cm〜600mJ/cm。50mJ/cm以下では、架橋・重合不足により、非画線部の樹脂膜の透明性が高く識別文字が不鮮明となる。800mJ/cm以上では、識別文字の鮮明さに変わりがなく、時間・エネルギー等の無駄使いとなる。In the primary exposure when set as shown in FIG. 4 or FIG. 6, ultraviolet rays are irradiated using a photomask film in which the component mounting position is a negative type and the identification characters and symbols are processed into a positive type. The irradiation amount is 50 mJ / cm 2 to 800 mJ / cm 2 , preferably 100 mJ / cm 2 to 600 mJ / cm 2 . At 50 mJ / cm 2 or less, due to insufficient crosslinking and polymerization, the resin film in the non-image area is highly transparent and the identification characters are unclear. If it is 800 mJ / cm 2 or more, the sharpness of the identification character is not changed, and time and energy are wasted.

二次露光は、図4のようにセットし、文字の位置と搭載する部品位置の紫外線をカットし、非画線部を照射する。その照射量は一次露光の照射量よりも多くすることで、非画線部のエポキシ系樹脂とアクリル系樹脂の反応が進み、図5の模式で示すように架橋密度・重合度量が多くなり、MSR塗膜の透明度を低下させ、文字位置のMSR塗膜と非画線部のMSR塗膜とに於いて透明度に差を生じさせることを特徴とする、請求項1〜8の回路基板の製造方法。  The secondary exposure is set as shown in FIG. 4, and the ultraviolet rays at the character position and the component position to be mounted are cut, and the non-image area is irradiated. By making the irradiation amount larger than the irradiation amount of the primary exposure, the reaction between the epoxy resin and the acrylic resin in the non-image area proceeds, and as shown in the schematic diagram of FIG. The circuit board according to claim 1, wherein the transparency of the MSR coating film is lowered to cause a difference in transparency between the MSR coating film at the character position and the MSR coating film at the non-image area. Method.

使用MSRが、ネガタイプの場合は、二次露光は、ネガタイプのソルダーレジスト用のフイルムとポジタイプの部品搭載識別フイルム(以後、文字用フイルムと言う)を回路基板の指示位置に重ね合わせてセット後、紫外線を照射する。照射量は100mJ/cm〜1500mJ/cm、好ましくは200mJ/cm〜800mJ/cm。照射量が100mJ/cm以下では、現像時にMSR層の、文字部等の画線部と非画線部との透明度差が得られず、文字等が不明瞭となり用をなさない。1500mJ/cm以上では、光の乱反射の影響を受け、画線部も架橋・重合が進み搭載部品位置が現像できなく(俗に言われるカブリが生じる)ソルダーレジストが残り、部品の取り付けなどができなくなる。
ポジタイプの着色インキ及びソルダーレジストインキを用いた場合のフイルムの使用はすべて、ネガタイプのインキ使用のときと逆のフイルムを用いることは言うまでもない。
When the MSR used is a negative type, the secondary exposure is set after overlaying a negative type solder resist film and a positive type component mounting identification film (hereinafter referred to as character film) on the indicated position on the circuit board. Irradiate ultraviolet rays. Dose is 100mJ / cm 2 ~1500mJ / cm 2 , preferably 200mJ / cm 2 ~800mJ / cm 2 . When the irradiation amount is 100 mJ / cm 2 or less, a difference in transparency between the image portion such as the character portion and the non-image portion of the MSR layer cannot be obtained at the time of development, and the character or the like becomes unclear and is not useful. At 1500 mJ / cm 2 or more, affected by the diffuse reflection of light, the image area is also cross-linked and polymerized, and the position of the mounted part cannot be developed (so-called fogging occurs). become unable.
Needless to say, all the films used in the case of using the positive type colored ink and the solder resist ink use the opposite film as in the case of using the negative type ink.

又は、一次露光で図4、又は、図6のようにフイルムをセットした場合の、二次露光は、部品搭載位置の画線部は、マスクフイルムで紫外線をカットし、文字等の画線部と非画線部は少量照射し、文字等の画線部のエポキシ系樹脂とアクリル系樹脂との反応を抑え、架橋密度・重合度量を少なくすることで、文字部分の樹脂透明度が高いMSRの塗膜を得ることを特徴とする、請求項1〜8の回路基板の製造方法。  Alternatively, when the film is set as shown in FIG. 4 or FIG. 6 in the primary exposure, the image area at the component mounting position is cut off the ultraviolet rays by the mask film, and the image area such as characters. The non-image area is irradiated with a small amount, the reaction between the epoxy resin and the acrylic resin in the image area such as characters is suppressed, and the cross-link density and the degree of polymerization are reduced, so that the resin transparency of the character area is high. A method for producing a circuit board according to claim 1, wherein a coating film is obtained.

ソルダー用マスクフイルムと文字・記号等のマスクフイルムを重ね合わせて使用することを特徴とする請求項1〜8の回路基板の製造方法。  9. The method of manufacturing a circuit board according to claim 1, wherein a mask film for solder and a mask film of characters / symbols are used in an overlapping manner.

ソルダー部分と文字部分を同一フイルム上に合成した、マスクフイルムを使用することを特徴とする請求項1〜8の回路基板の製造方法。  9. The method of manufacturing a circuit board according to claim 1, wherein a mask film in which a solder portion and a character portion are synthesized on the same film is used.

図7のように、画線部である部品搭載位置は紫外線を100%遮断、搭載するべき部品等の識別文字位置は50〜95%遮断でき、非画線部は100%紫外線が透過できる、機能を持つ濃淡フイルムを用いることを特徴とする請求項1〜8の回路基板の製造方法。  As shown in FIG. 7, the component mounting position which is the image line portion can block 100% of ultraviolet rays, the identification character positions of components to be mounted can be blocked by 50 to 95%, and the non-image area portion can transmit 100% ultraviolet rays. A method for producing a circuit board according to claim 1, wherein a light and dark film having a function is used.

濃淡をつけたフイルムを使用するときは、回路基板の指定位置に合うようにセット後、紫外線の照射は1回でよく、その照射量は100mJ/cm〜1000mJ/cm、好ましくは200mJ/cm〜800mJ/cm。照射量が100mJ/cm以下では、架橋・重合不足により、非画線部の樹脂膜の透明性が高く、識別文字が不鮮明となる。1000mJ/cm以上では、識別文字の鮮明さに変わりがなく、作業時間の無駄ばかりでなく、カブリ現象が起きてくる。When using a film with light and shade, after setting it so as to match the designated position of the circuit board, irradiation with ultraviolet rays may be performed once, and the irradiation amount is 100 mJ / cm 2 to 1000 mJ / cm 2 , preferably 200 mJ / cm 2 to 800 mJ / cm 2 . When the irradiation amount is 100 mJ / cm 2 or less, the resin film in the non-image area is highly transparent and the identification characters are unclear due to insufficient crosslinking and polymerization. If it is 1000 mJ / cm 2 or more, the sharpness of the identification character is not changed, and not only the working time is wasted but also the fogging phenomenon occurs.

現像・乾燥及び後露光等は、使用ソルダーレジストインキメーカーの取扱い指示に準じて作業を行えばよい。  Development, drying, post-exposure, etc. may be performed according to the handling instructions of the solder resist ink manufacturer used.

エポキシ系樹脂と一部カルボン酸の残存アクリル系樹脂混合の、MSRの塗膜に対し、紫外線の照射量を変化することで、スクリーン印刷では不可能であった、微小文字などの印字ができ、より極小表面実装部品を搭載する回路基板の対応が可能となり、資源の有効活用の一助となるものである。  By changing the irradiation amount of ultraviolet rays on the MSR coating film, which is a mixture of epoxy resin and residual acrylic resin with some carboxylic acid, it is possible to print minute characters, etc., which was impossible with screen printing, This makes it possible to support circuit boards on which ultra-small surface-mounted components are mounted, thereby helping to make effective use of resources.

有機溶剤の使用量は、スクリーン印刷法と比較して1/50〜1/70減少でき、作業環境改善の一助となり、しいては、環境負荷の低減に大いに貢献するものである。  The amount of the organic solvent used can be reduced by 1/50 to 1/70 as compared with the screen printing method, which contributes to the improvement of the working environment and thus greatly contributes to the reduction of the environmental load.

写真法であるため、フィルムと基板をピンなどで合わせる事ができ、熟練工でなくても、誰でも作業が効率良くでき生産性が格段によくなり、生産コストの低減に貢献できるものである。  Because it is a photographic method, the film and the substrate can be combined with pins, etc., so that even if they are not skilled workers, anyone can work efficiently and productivity is greatly improved, which can contribute to reduction of production costs.

保管は、フイルムであることから、スクリーン印刷法と比較して保管場所面積は約1/100以上減少でき、保管費用の低減に貢献できるものである。  Since the storage is a film, the storage area can be reduced by about 1/100 or more compared to the screen printing method, which can contribute to a reduction in storage cost.

ソルダーレジスト面がフラットであることから、微小部品の搭載が容易で、搭載部品の欠落などのやり直しが減少することで生産性の向上に貢献できるものである。  Since the solder resist surface is flat, it is easy to mount micro-parts, and it is possible to contribute to improvement of productivity by reducing redo such as missing parts.

下層に着色インキをプライマー層として用いた場合の基板断面図。The board | substrate cross section at the time of using colored ink as a primer layer for a lower layer. 着色インキをMSR層間に用いた場合の基板断面図。The board | substrate sectional drawing at the time of using colored ink between MSR layers. 一次露光時の基板断面図Substrate cross-section during primary exposure 二次露光時の基板断面図Substrate cross-section during secondary exposure 露光量による架橋密度・重合度量差の模式図Schematic diagram of difference in crosslinking density and degree of polymerization depending on exposure amount 合成マスクフイルムを用いた場合の露光時の基板断面図Cross-sectional view of the substrate during exposure when using a synthetic mask film 濃淡の付いたマスクフイルムを用いた場合の露光時の基板断面図Cross-sectional view of the substrate during exposure when using a mask film with shading 現像処理後の基板断面図Substrate cross-section after development

本発明を実施例及び比較例にて説明するが、本発明の範囲はこの実施例のみに限定されるものでなく、本発明の趣旨を損ねない範囲内において種々の変更を加えることが可能である。  The present invention will be described with reference to examples and comparative examples. However, the scope of the present invention is not limited to these examples, and various modifications can be made without departing from the spirit of the present invention. is there.

本発明の実施例及び比較例に使用する共通機材などは、
▲1▼東海神栄電子工業(株)のテスト用基板の、エッチングまで終了した両面ス ルホール基板、そのサイズは500dm(250mm×200mm)(以 後、基板と言う)
▲2▼整面(ブラシ研磨)には、(株)石井表記製のスクラブ研磨機で砥粒#18 0。
▲3▼着色インキの塗布は、(株)ミノグループ社製のスクリーン印刷機DF65 P。
▲4▼ソルダーレジストインキの塗布は、(株)ミノグループ社製のスクリーン印 刷機DF65P。
▲5▼着色インキは、山栄化学(株)社製 SSR−6500C。
▲6▼温風乾燥機は、メッシュ(株)社製 BOX乾燥機。
▲7▼露光機は、(株)ハイテック社製のTHE−7000MC。
▲8▼現像液は、(株)ヤマトヤ商会社製の商品名現像液D−701の2%(v/ v)溶液。
▲9▼現像機は、東京化工機(株)製。
▲10▼ソルダーレジスト用のマスクフイルムは、東海神栄電子工業(株)のテス ト用のネガタイプ。
▲11▼文字用マスクフイルムは、東海神学電子工業(株)のテスト用のポジタイ プ。
Common equipment used in the examples and comparative examples of the present invention,
(1) Tokai Shinei Electronics Co., Ltd. test substrate, double-sided through-hole substrate that has been etched, its size is 500 dm 2 (250 mm × 200 mm) (hereinafter referred to as substrate)
(2) Abrasion # 180 was made with a scrubbing machine manufactured by Ishii Co., Ltd. for leveling (brush polishing).
(3) The coloring ink is applied by a screen printer DF65 P manufactured by Mino Group.
(4) Solder resist ink is applied by a screen printer DF65P manufactured by Mino Group.
(5) The coloring ink is SSR-6500C manufactured by Yamaei Chemical Co., Ltd.
(6) The hot air dryer is a BOX dryer manufactured by Mesh Co., Ltd.
(7) The exposure machine is THE-7000MC manufactured by Hitec Corporation.
(8) The developer is a 2% (v / v) solution of trade name developer D-701 manufactured by Yamatoya Corporation.
(9) The developing machine is manufactured by Tokyo Chemical Industry Co., Ltd.
(10) The mask film for solder resist is a negative type for testing by Tokai Shinei Electronics Co., Ltd.
(11) The mask film for characters is a positive type for testing by Tokai Theological Electronics Co., Ltd.

本発明の実施例及び比較例に用いた評価機材の作成方法。  A method for creating evaluation equipment used in Examples and Comparative Examples of the present invention.

着色インキをプライマー層として用いた場合の評価機材の作成。  Creation of evaluation equipment when colored ink is used as a primer layer.

実施例の評価機材の作成の概略
基板⇒整面・乾燥⇒着色インキ塗布⇒乾燥A⇒MSRの塗布⇒乾燥B⇒一次露光⇒二次露光⇒現像(30℃、0.25MPa、有効チャンバー長の1/2で現像ができるように速度調整)⇒乾燥(50分/150℃)⇒評価
Outline of creation of evaluation equipment of Example Substrate ⇒ Surface conditioning and drying ⇒ Colored ink application ⇒ Dry A ⇒ Application of MSR ⇒ Dry B ⇒ Primary exposure ⇒ Secondary exposure ⇒ Development (30 ° C, 0.25 MPa, effective chamber length Adjust the speed so that development can be done at 1/2) ⇒Dry (50min / 150 ℃) ⇒Evaluation

実施例1〜9の作業条件は表−1に示す。
使用MSRは、山栄化学(株)の製品名SSR−6600W
The working conditions of Examples 1 to 9 are shown in Table-1.
The MSR used is the product name SSR-6600W of Sanei Chemical Co., Ltd.

Figure 2014168029
Figure 2014168029

比較例1〜2の作業条件は表−2に示す。
使用ソルダーレジストインキは、エポキシ系樹脂を含まない(以後は、SRと言う)、太陽インキ製造(株)の製品名フォトファイナーPSR−4000 CC02/CA−40
The working conditions of Comparative Examples 1 and 2 are shown in Table-2.
The used solder resist ink does not contain an epoxy resin (hereinafter referred to as SR), product name Photofiner PSR-4000 CC02 / CA-40 manufactured by Taiyo Ink Manufacturing Co., Ltd.

Figure 2014168029
Figure 2014168029

着色インキ層をMSR層間に施した場合の評価機材の作成。  Creation of evaluation equipment when a colored ink layer is applied between MSR layers.

実施例の評価機材の作成の概略
基板⇒整面・乾燥⇒一次MSRの塗布⇒乾燥C⇒着色インキの塗布⇒乾燥D⇒二次MSRの塗布⇒乾燥E⇒一次露光⇒二次露光⇒現像(30℃、0.25MPa、有効チャンバー長の1/2で現像ができるように速度調整)⇒乾燥(50分/150℃)⇒評価
Outline of preparation of evaluation equipment in Examples Substrate ⇒ Surface-conditioning and drying ⇒ Application of primary MSR ⇒ Drying C ⇒ Application of colored ink ⇒ Drying D ⇒ Application of secondary MSR ⇒ Drying E ⇒ Primary exposure ⇒ Secondary exposure ⇒ Development ( (Adjust the speed so that development is possible at 30 ° C, 0.25 MPa, 1/2 of the effective chamber length) ⇒ Drying (50 minutes / 150 ° C) ⇒ Evaluation

実施例10〜13の作業条件は表−3に示す。
使用MSRは、山栄化学(株)の製品名SSR−6600
The working conditions of Examples 10 to 13 are shown in Table-3.
The MSR used is the product name SSR-6600 of Sanei Chemical Co., Ltd.

Figure 2014168029
Figure 2014168029

比較例3〜4の作業条件は表−4に示す。
使用SRは、太陽インキ製造(株)の製品名フォトファイナーPSR−4000 CC02/CA−40
The working conditions of Comparative Examples 3 to 4 are shown in Table-4.
SR used is the product name Photofiner PSR-4000 CC02 / CA-40 of Taiyo Ink Manufacturing Co., Ltd.

Figure 2014168029
Figure 2014168029

乾燥温度を併用した場合の評価機材の作成。  Creation of evaluation equipment when combined with drying temperature.

実施例の評価機材の作成の概略
基板⇒整面・乾燥⇒着色インキの塗布⇒乾燥F⇒一次MSRの塗布⇒乾燥G⇒二次MSRの塗布⇒乾燥H⇒露光⇒現像(30℃、0.25MPa、有効チャンバー長の1/2で現像ができるように速度調整)⇒乾燥(50分/150℃)⇒評価
Outline of preparation of evaluation equipment of Example Substrate ⇒ Surface-conditioning and drying ⇒ Application of colored ink ⇒ Dry F ⇒ Application of primary MSR ⇒ Dry G ⇒ Application of secondary MSR ⇒ Dry H ⇒ Exposure ⇒ Development (30 ° C, 0. Adjust the speed so that development is possible at 25MPa and 1/2 of the effective chamber length) ⇒Dry (50min / 150 ℃) ⇒Evaluation

実施例14〜17の作業条件は表−5に示す。
使用MSRは、山栄化学(株)の製品名SSR−6600W
The working conditions of Examples 14 to 17 are shown in Table-5.
The MSR used is the product name SSR-6600W of Sanei Chemical Co., Ltd.

Figure 2014168029
Figure 2014168029

比較例5の作業条件は表−6に示す。
使用SRは、太陽インキ製造(株)の製品名フォトファイナーPSR−4000 CC02/CA−40
The working conditions of Comparative Example 5 are shown in Table-6.
SR used is the product name Photofiner PSR-4000 CC02 / CA-40 of Taiyo Ink Manufacturing Co., Ltd.

Figure 2014168029
Figure 2014168029

ソルダー部分と文字部分等を同一フィルム上に作成した場合の評価機材の作成。  Creation of evaluation equipment when the solder part and the character part are created on the same film.

実施例の評価機材の作成の概略
同一フイルムを一次露光のマスクフイルムとして用いた。
基板⇒整面・乾燥⇒着色インキの塗布⇒乾燥A⇒MSRの塗布⇒乾燥B⇒一次露光⇒二次露光⇒現像(30℃、0.25MPa、有効チャンバー長の1/2で現像ができるように速度調整)⇒乾燥(50分/150℃)⇒評価
Outline of Preparation of Evaluation Equipment of Example The same film was used as a mask film for primary exposure.
Substrate ⇒ Surface smoothing and drying ⇒ Application of colored ink ⇒ Drying A ⇒ Application of MSR ⇒ Drying B ⇒ Primary exposure ⇒ Secondary exposure ⇒ Development (30 ° C, 0.25 MPa, effective chamber length 1/2) Speed adjustment) ⇒ Drying (50 min / 150 ° C) ⇒ Evaluation

実施例18〜20の作業条件は表−7に示す。
使用MSRは、山栄化学(株)の製品名SSR−6600W
The working conditions of Examples 18 to 20 are shown in Table-7.
The MSR used is the product name SSR-6600W of Sanei Chemical Co., Ltd.

Figure 2014168029
Figure 2014168029

濃淡フイルムを用いた場合の評価機材の作成。  Creation of evaluation equipment when using light and shade film.

実施例の評価機材の作成の概略
基板⇒整面・乾燥⇒着色インキ塗布⇒乾燥A⇒MSRの塗布⇒乾燥B⇒濃淡フイルムセット⇒露光⇒現像(30℃、0.25MPa、有効チャンバー長の1/2で現像ができるように速度調整)⇒乾燥(50分/150℃)⇒評価
Outline of creation of evaluation equipment of Example Substrate ⇒ Surface conditioning and drying ⇒ Colored ink application ⇒ Dry A ⇒ Application of MSR ⇒ Dry B ⇒ Dark film set ⇒ Exposure ⇒ Development (30 ° C, 0.25 MPa, 1 of effective chamber length) Adjust speed so that development can be performed at 1/2) ⇒ Dry (50 minutes / 150 ° C) ⇒ Evaluation

実施例21〜24の作業条件は表−8に示す。
使用MSRは、山栄化学(株)の製品名SSR−6600W
The working conditions of Examples 21 to 24 are shown in Table-8.
The MSR used is the product name SSR-6600W of Sanei Chemical Co., Ltd.

Figure 2014168029
Figure 2014168029

比較例6〜7の作業条件は表−9に示す。
使用SRは、太陽インキ製造(株)の製品名フォトファイナーPSR−4000 CC02/CA−40
The working conditions of Comparative Examples 6-7 are shown in Table-9.
SR used is the product name Photofiner PSR-4000 CC02 / CA-40 of Taiyo Ink Manufacturing Co., Ltd.

Figure 2014168029
Figure 2014168029

評価方法は、事務所の明るさの中で、MSR及びSR処理後の回路基板に、識別用文字・記号等の文字が、鮮明に読み取れる、読み取れる、不鮮明であるが読み取れる、読み取れないの、4段階に目視で評価した。  In the evaluation method, characters such as identification characters / symbols are clearly readable, readable, unclear, but not readable on the circuit board after MSR and SR processing in the brightness of the office. The stage was evaluated visually.

評価結果を表−10に示す。  The evaluation results are shown in Table-10.

Figure 2014168029
Figure 2014168029
Figure 2014168029
Figure 2014168029

▲1▼ 基材
▲2▼ 回路
▲3▼ 着色インキ層
▲4▼ MSR層
▲5▼ ソルダーレジスト用フォトマスク
▲6▼ 文字用フォトマスク
▲7▼ 濃度差をつけたフォトマスク
▲8▼ 合成フォトマスク
(1) Substrate (2) Circuit (3) Colored ink layer (4) MSR layer (5) Solder resist photomask (6) Character photomask (7) Photomask with density difference (8) Composite photo mask

Claims (8)

回路基板に、エポキシ系樹脂と一部カルボン酸残存のアクリル系樹脂の混合、或いは、エポキシ系樹脂に一部カルボン酸残存のアクリル系樹脂を付加させた、ソルダーレジストインキを塗布し、紫外線の照射量を変化させ、ソルダーレジストインキ層の、屈折率や透明度を変化させ、その屈折率や透明度の差より、搭載部品等の識別文字・記号等が、下地色をかいして視認できることを特徴とする回路基板の製造方法。  The circuit board is mixed with an epoxy resin and a partially carboxylic acid remaining acrylic resin, or a solder resist ink with a partially carboxylic acid remaining acrylic resin added to the epoxy resin and applied with ultraviolet light. By changing the amount, changing the refractive index and transparency of the solder resist ink layer, the difference in refractive index and transparency makes it possible to visually identify the identification characters and symbols of mounted parts etc. with the background color. Circuit board manufacturing method. 官能基を有した着色インキを回路基板とソルダーレジストインキ塗膜層間に、プライマー層として設ける。その厚みは、2μm〜300μmを特徴とした請求項1に記載した回路基板の製造方法。  A colored ink having a functional group is provided as a primer layer between the circuit board and the solder resist ink coating layer. The method for manufacturing a circuit board according to claim 1, wherein the thickness is 2 μm to 300 μm. 官能基を有した着色インキ層をソルダーレジストインキ層とソルダーレジストインキ層間に設ける。その厚みは、2μm〜300μmを特徴とした請求項1に記載した回路基板の製造方法。  A colored ink layer having a functional group is provided between the solder resist ink layer and the solder resist ink layer. The method for manufacturing a circuit board according to claim 1, wherein the thickness is 2 μm to 300 μm. ソルダーレジスト用マスクフイルムを用いて一次露光を行い、その後、ソルダーレジスト用マスクフイルムと文字・記号用マスクフイルムを重ね合わせて二次露光を行うか、又は、この露光順序を逆に行って、照射量を変化させることを特徴とした、請求項1〜3に記載した回路基板の製造方法。  Perform the primary exposure using the solder resist mask film, and then perform the secondary exposure by overlaying the solder resist mask film and the character / symbol mask film, or reverse the exposure order and perform irradiation. The method for manufacturing a circuit board according to claim 1, wherein the amount is changed. ソルダーレジスト部分と文字・記号部分を同一フイルム上に合成した、マスクフイルムを用いて一次露光を行い、その後、ソルダーレジスト用マスクフイルムで二次露光を行うか、又は、この露光順序を逆に行って、照射量を変化させることを特徴とした、請求項1〜3に記載した回路基板の製造方法。  Solder resist part and character / symbol part are synthesized on the same film, then primary exposure is performed using a mask film, and then secondary exposure is performed with a mask film for solder resist, or this exposure order is reversed. The method for manufacturing a circuit board according to claim 1, wherein the irradiation amount is changed. マスクフイルムの画線部に紫外線の透過量に差が生じる事ができるように、濃淡を施したマスクフイルムを用いることを特徴とした、請求項1〜3に記載した回路基板の製造方法。  4. The method of manufacturing a circuit board according to claim 1, wherein the mask film is light and shaded so that a difference in the amount of transmitted ultraviolet rays can be generated in the image line portion of the mask film. 乾燥熱量を変化させ、ソルダーレジストインキ層の、屈折率や透明度を変化させ、その屈折率や透明度の差により、搭載部品等の識別文字が下地色をかいして視認できることを特徴とした、請求項1〜5に記載した回路基板の製造方法。  By changing the amount of drying heat, changing the refractive index and transparency of the solder resist ink layer, and by the difference in the refractive index and transparency, the identification characters of mounted parts etc. can be visually recognized with the background color, Item 6. A method for manufacturing a circuit board according to Item 1-5. ソルダーレジストインキ層の表面上に、搭載部品等の識別文字・記号等を付加しない事を特徴とする請求項1〜7に記載した回路基板の製造方法。  8. The method of manufacturing a circuit board according to claim 1, wherein an identification character / symbol such as a mounted component is not added on the surface of the solder resist ink layer.
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