JP2014132695A5 - - Google Patents
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- Publication number
- JP2014132695A5 JP2014132695A5 JP2014079408A JP2014079408A JP2014132695A5 JP 2014132695 A5 JP2014132695 A5 JP 2014132695A5 JP 2014079408 A JP2014079408 A JP 2014079408A JP 2014079408 A JP2014079408 A JP 2014079408A JP 2014132695 A5 JP2014132695 A5 JP 2014132695A5
- Authority
- JP
- Japan
- Prior art keywords
- measurement
- beam portion
- alignment
- detector
- illumination source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005259 measurement Methods 0.000 claims 18
- 230000010287 polarization Effects 0.000 claims 9
- 238000005286 illumination Methods 0.000 claims 7
- 239000000758 substrate Substances 0.000 claims 6
- 230000005855 radiation Effects 0.000 claims 4
- 238000000034 method Methods 0.000 claims 3
- 238000000059 patterning Methods 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US38214710P | 2010-09-13 | 2010-09-13 | |
| US61/382,147 | 2010-09-13 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011196769A Division JP5559114B2 (ja) | 2010-09-13 | 2011-09-09 | アライメント測定システム、リソグラフィ装置、およびリソグラフィ装置においてのアライメントを決定する方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2014132695A JP2014132695A (ja) | 2014-07-17 |
| JP2014132695A5 true JP2014132695A5 (https=) | 2014-10-23 |
Family
ID=45806404
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011196769A Active JP5559114B2 (ja) | 2010-09-13 | 2011-09-09 | アライメント測定システム、リソグラフィ装置、およびリソグラフィ装置においてのアライメントを決定する方法 |
| JP2014079408A Pending JP2014132695A (ja) | 2010-09-13 | 2014-04-08 | アライメント測定システム、リソグラフィ装置、およびリソグラフィ装置においてのアライメントを決定する方法 |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011196769A Active JP5559114B2 (ja) | 2010-09-13 | 2011-09-09 | アライメント測定システム、リソグラフィ装置、およびリソグラフィ装置においてのアライメントを決定する方法 |
Country Status (3)
| Country | Link |
|---|---|
| US (2) | US9046385B2 (https=) |
| JP (2) | JP5559114B2 (https=) |
| NL (1) | NL2007177A (https=) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL2007177A (en) | 2010-09-13 | 2012-03-14 | Asml Netherlands Bv | Alignment measurement system, lithographic apparatus, and a method to determine alignment of in a lithographic apparatus. |
| NL2011477A (en) | 2012-10-10 | 2014-04-14 | Asml Netherlands Bv | Mark position measuring apparatus and method, lithographic apparatus and device manufacturing method. |
| WO2014068116A1 (en) | 2012-11-05 | 2014-05-08 | Asml Netherlands B.V. | Method and apparatus for measuring asymmetry of a microstructure, position measuring method, position measuring apparatus, lithographic apparatus and device manufacturing method |
| US8830456B2 (en) * | 2013-02-01 | 2014-09-09 | Zeta Instruments, Inc. | Optical inspector |
| US9383661B2 (en) | 2013-08-10 | 2016-07-05 | Kla-Tencor Corporation | Methods and apparatus for determining focus |
| US10935893B2 (en) * | 2013-08-11 | 2021-03-02 | Kla-Tencor Corporation | Differential methods and apparatus for metrology of semiconductor targets |
| WO2015143428A1 (en) * | 2014-03-21 | 2015-09-24 | Carpe Diem Technologies, Inc. | System and method for fabricating miniature structures on a flexible substrate |
| WO2017009036A1 (en) | 2015-07-13 | 2017-01-19 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| WO2017032534A2 (en) | 2015-08-27 | 2017-03-02 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| CN106610570B (zh) * | 2015-10-21 | 2020-11-13 | 上海微电子装备（集团）股份有限公司 | 一种实现运动台定位的装置及方法 |
| WO2017207269A1 (en) * | 2016-06-03 | 2017-12-07 | Asml Holding N.V. | Alignment system wafer stack beam analyzer |
| WO2018206177A1 (en) * | 2017-05-08 | 2018-11-15 | Asml Netherlands B.V. | Metrology sensor, lithographic apparatus and method for manufacturing devices |
| US11181835B2 (en) | 2017-05-15 | 2021-11-23 | Asml Netherlands B.V. | Metrology sensor, lithographic apparatus and method for manufacturing devices |
| WO2019206586A1 (en) * | 2018-04-26 | 2019-10-31 | Asml Netherlands B.V. | Alignment sensor apparatus for process sensivity compensation |
| US11971665B2 (en) * | 2019-02-21 | 2024-04-30 | Asml Holding N.V. | Wafer alignment using form birefringence of targets or product |
Family Cites Families (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62211503A (ja) | 1986-03-13 | 1987-09-17 | Hitachi Ltd | 段差計測装置 |
| JPS635203A (ja) | 1986-06-25 | 1988-01-11 | Hitachi Ltd | パタ−ン検出方法および装置 |
| JPH0635928B2 (ja) | 1990-10-11 | 1994-05-11 | 株式会社ソルテック | 位置検出方法及び位置合せ方法 |
| US5182610A (en) | 1990-04-19 | 1993-01-26 | Sortec Corporation | Position detecting method and device therefor as well as aligning device |
| JPH0540026A (ja) | 1991-03-15 | 1993-02-19 | Nippon Seiko Kk | パターン読み取り装置 |
| JPH0587528A (ja) | 1991-09-27 | 1993-04-06 | Canon Inc | 光ヘテロダイン干渉計測方法及び計測装置 |
| JPH07239212A (ja) | 1994-02-28 | 1995-09-12 | Nikon Corp | 位置検出装置 |
| JPH09293663A (ja) | 1996-04-26 | 1997-11-11 | Nikon Corp | 位置検出装置及び該装置を備えた露光装置 |
| US20010026357A1 (en) | 1996-04-26 | 2001-10-04 | Nikon Corporation | Position transducer and exposure apparatus with same |
| JP2003506741A (ja) | 1999-08-02 | 2003-02-18 | ゼテティック・インスティチュート | 走査干渉計近視野共焦点顕微鏡 |
| DE60016761T2 (de) | 1999-08-02 | 2005-12-15 | Zetetic Institute, Tucson | Interferometrische konfokale nahfeld-abtastmikroskopie |
| US6891627B1 (en) * | 2000-09-20 | 2005-05-10 | Kla-Tencor Technologies Corp. | Methods and systems for determining a critical dimension and overlay of a specimen |
| JP2002350117A (ja) | 2001-05-29 | 2002-12-04 | Olympus Optical Co Ltd | 形状計測装置及び形状計測方法 |
| WO2003040648A1 (en) * | 2001-11-05 | 2003-05-15 | Zygo Corporation | Interferometric cyclic error compensation |
| TWI227814B (en) | 2002-09-20 | 2005-02-11 | Asml Netherlands Bv | Alignment system and methods for lithographic systems using at least two wavelengths |
| JP2005062155A (ja) * | 2003-07-25 | 2005-03-10 | Olympus Corp | コヒーレントラマン散乱顕微鏡 |
| US7136163B2 (en) * | 2003-12-09 | 2006-11-14 | Applied Materials, Inc. | Differential evaluation of adjacent regions for change in reflectivity |
| US20060117293A1 (en) | 2004-11-30 | 2006-06-01 | Nigel Smith | Method for designing an overlay mark |
| WO2006078856A1 (en) | 2005-01-16 | 2006-07-27 | Baer Stephen C | Realtime high magnification stereoscopic microscope |
| WO2006078857A2 (en) | 2005-01-16 | 2006-07-27 | Baer Stephen C | Single wavelength stimulated emission depletion microscopy |
| US7701577B2 (en) * | 2007-02-21 | 2010-04-20 | Asml Netherlands B.V. | Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method |
| JP5508416B2 (ja) * | 2008-07-24 | 2014-05-28 | ザ リージェンツ オブ ザ ユニヴァーシティー オブ カリフォルニア | ディスパーシブフーリエ変換イメージングの装置および方法 |
| JP4436878B2 (ja) | 2008-10-06 | 2010-03-24 | オリンパス株式会社 | 観察物体の物理量を検出するための装置およびこれを用いた検出方法 |
| NL2007177A (en) | 2010-09-13 | 2012-03-14 | Asml Netherlands Bv | Alignment measurement system, lithographic apparatus, and a method to determine alignment of in a lithographic apparatus. |
-
2011
- 2011-07-26 NL NL2007177A patent/NL2007177A/en not_active Application Discontinuation
- 2011-08-10 US US13/206,592 patent/US9046385B2/en active Active
- 2011-09-09 JP JP2011196769A patent/JP5559114B2/ja active Active
-
2014
- 2014-04-08 JP JP2014079408A patent/JP2014132695A/ja active Pending
-
2015
- 2015-05-29 US US14/725,023 patent/US9280057B2/en active Active
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