JP2014110298A - Method of manufacturing pressure-welded semiconductor device - Google Patents

Method of manufacturing pressure-welded semiconductor device Download PDF

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JP2014110298A
JP2014110298A JP2012263327A JP2012263327A JP2014110298A JP 2014110298 A JP2014110298 A JP 2014110298A JP 2012263327 A JP2012263327 A JP 2012263327A JP 2012263327 A JP2012263327 A JP 2012263327A JP 2014110298 A JP2014110298 A JP 2014110298A
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housing
semiconductor chip
lid
pressing
semiconductor device
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Osamu Tsuneoka
治 常岡
Yosuke Nakazawa
洋介 中沢
Hiroshi Takenaka
浩 竹中
Masaru Karasawa
大 唐澤
Ryuta Hasegawa
隆太 長谷川
Takeshi Murao
武 村尾
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Toshiba Corp
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Toshiba Corp
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Abstract

PROBLEM TO BE SOLVED: To provide a method of manufacturing a pressure-welded semiconductor device capable of manufacturing a pressure-welded semiconductor device by assembling undistorted components.SOLUTION: There is provided a method of manufacturing a pressure-welded semiconductor device comprising: a component arranging step of arranging components of a pressure-welded semiconductor device including a semiconductor chip inside a housing; a pressing structural member mounting step of mounting a pressing structural member contacting the semiconductor chip on the semiconductor chip; a lid attaching step of covering the housing with a lid over the pressing structural member; a pressing step of applying a predetermined pressure to between the lid and the housing; and a joining step of joining the lid and the housing after the pressing in the pressing step.

Description

本発明の実施形態は、半導体チップを内部に備えた圧接型半導体装置の製造方法に関する。   Embodiments described herein relate generally to a method for manufacturing a pressure contact type semiconductor device having a semiconductor chip therein.

近年、半導体装置には、スイッチング速度の速い大電力化・高耐圧化した、絶縁ゲート・バイポーラ・トランジスタ(IGBT)に代表される電圧駆動型の半導体スイッチング素子が用いられている。   2. Description of the Related Art In recent years, a voltage-driven semiconductor switching element represented by an insulated gate bipolar transistor (IGBT), which has high switching speed and high power and high breakdown voltage, has been used.

電圧駆動型の半導体スイッチング素子は、製造の点から半導体チップの1個あたりの容量が小さいため、大容量とするために多数の半導体チップを接続した圧接型半導体装置とすることが多く見られる。   A voltage-driven semiconductor switching element has a small capacity per semiconductor chip from the viewpoint of manufacturing, and is often a pressure-contact type semiconductor device in which a large number of semiconductor chips are connected to increase the capacity.

半導体チップを電気的に接続させる方法として圧接方法を用いる圧接型半導体装置においては、全ての半導体チップを均等に圧接することが重要である。半導体チップを均等に圧接するためには、例えば、半導体チップの厚み幅を同一に形成することや、圧接する金属部材の平面の加工精度を均一にすることも重要とされている。   In a pressure-contact type semiconductor device that uses a pressure-contact method as a method for electrically connecting semiconductor chips, it is important to press-contact all the semiconductor chips evenly. In order to press the semiconductor chips evenly, for example, it is important to form the same thickness width of the semiconductor chips and to make the processing accuracy of the flat surface of the metal member to be pressed uniform.

特開平10−150061号公報Japanese Patent Laid-Open No. 10-150061 特開2000−91362号公報JP 2000-91362 A 特開2002−270246号公報JP 2002-270246 A 特開2004−23083号公報Japanese Patent Laid-Open No. 2004-23083

しかしながら、従来の圧接型半導体装置を構成する構成部品には、セラミックと例えば銅などからなる導電性材料とを接合させて形成した構成部品が含まれている。セラミックと銅とでは、熱膨張係数が異なり、これら熱膨張係数の異なる部材を接合させる工程で行われた加熱処理等により、かかる構成部品にゆがみやひずみが発生していることが考えられる。このような、ゆがみ等が発生している構成部品を用いて圧接型半導体装置を製造すると、半導体チップへの接合力が不均等になったり、内部応力が発生したりするおそれがある。   However, the components constituting the conventional pressure contact type semiconductor device include components formed by bonding ceramic and a conductive material made of, for example, copper. Ceramic and copper have different coefficients of thermal expansion, and it is considered that distortion and distortion have occurred in such components due to heat treatment performed in the process of joining these members having different coefficients of thermal expansion. When a pressure-contact type semiconductor device is manufactured using such a component in which distortion or the like occurs, there is a risk that the bonding force to the semiconductor chip becomes uneven or internal stress is generated.

本発明が解決しようとする課題は、ゆがみ等の生じていない構成部品で、圧接型半導体装置を製造できる圧接型半導体装置の製造方法を提供することである。   The problem to be solved by the present invention is to provide a manufacturing method of a press contact type semiconductor device capable of manufacturing a press contact type semiconductor device with a component which is not distorted.

一実施形態の圧接型半導体装置の製造方法は、次のように構成されている。筐体の内部に、半導体チップを含む圧接型半導体装置の構成部品を配置する構成部品配置工程と、半導体チップの上部に、半導体チップに接する押圧構造部材を載置する押圧構造部材載置工程と、押圧構造部材に重ねて、蓋体を筐体に被せる蓋体取付工程と、蓋体と筐体の間に所定圧力を付加する押圧工程と、押圧工程で押圧した後、蓋体と筐体との間を接合する接合工程と、から圧接型半導体装置の製造方法を構成した。   The manufacturing method of the pressure contact type semiconductor device of one embodiment is configured as follows. A component placement step for placing the components of the pressure contact type semiconductor device including the semiconductor chip inside the housing; and a pressing structure member placement step for placing a pressure structure member in contact with the semiconductor chip on the top of the semiconductor chip; A lid mounting step of covering the casing with the lid over the pressing structure member, a pressing step of applying a predetermined pressure between the lid and the casing, and pressing after the pressing step, and then the lid and the casing The manufacturing method of the pressure contact type semiconductor device is configured from a bonding step of bonding between the two.

圧接型半導体装置を製造する製造方法の第1実施形態にかかる圧接型半導体装置を示す正面断面図。BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a front sectional view showing a pressure contact type semiconductor device according to a first embodiment of a manufacturing method for manufacturing a pressure contact type semiconductor device. 同製造方法の第1実施形態を表す流れ図。The flowchart showing 1st Embodiment of the manufacturing method. 圧接型半導体装置の製造方法の第2実施形態にかかる圧接型半導体装置を示す正面断面図。Front sectional drawing which shows the press-contact type semiconductor device concerning 2nd Embodiment of the manufacturing method of a press-contact type semiconductor device. 同製造方法の第2実施形態を表す流れ図。The flowchart showing 2nd Embodiment of the manufacturing method.

<第1実施形態>
以下、圧接型半導体装置の製造方法の第1実施形態について、圧接型半導体装置10を製造することを例にして、図面を用いて説明する。図1は、圧接型半導体装置の第1実施形態の製造方法で製造する圧接型半導体装置10を示す正面断面図であり、図2は、製造方法の第1実施形態を示す流れ図(フローチャート)である。
<First Embodiment>
Hereinafter, a first embodiment of a method for manufacturing a pressure-contact type semiconductor device will be described with reference to the drawings, taking an example of manufacturing a pressure-contact type semiconductor device 10. FIG. 1 is a front sectional view showing a pressure-contact type semiconductor device 10 manufactured by the manufacturing method of the pressure-contact type semiconductor device according to the first embodiment, and FIG. 2 is a flowchart (flow chart) showing the first embodiment of the manufacturing method. is there.

まず、圧接型半導体装置10について説明する。圧接型半導体装置10は、図1に示すように半導体チップ12と、筐体14と、押圧構造部材16と、蓋体18と、を備えている。   First, the press contact type semiconductor device 10 will be described. As shown in FIG. 1, the press-contact type semiconductor device 10 includes a semiconductor chip 12, a housing 14, a pressing structure member 16, and a lid 18.

半導体チップ12は、絶縁ゲート・バイポーラ・トランジスタ(IGBT)に代表される電圧駆動型の半導体である。半導体チップ12は、後述する下押圧構造部材22上に複数設けてある。   The semiconductor chip 12 is a voltage-driven semiconductor typified by an insulated gate bipolar transistor (IGBT). A plurality of semiconductor chips 12 are provided on a lower pressing structure member 22 to be described later.

筐体14は、環状絶縁部材20と下押圧構造部材22とを有している。環状絶縁部材20は、セラミックなどの絶縁性材料からなり、環状に形成してある。環状絶縁部材20の内部には、下押圧構造部材22が設けてある。環状絶縁部材20には、ろう付け用の金属片が設けてある。   The housing 14 has an annular insulating member 20 and a lower pressing structure member 22. The annular insulating member 20 is made of an insulating material such as ceramic and is formed in an annular shape. A lower pressing structure member 22 is provided inside the annular insulating member 20. The annular insulating member 20 is provided with a metal piece for brazing.

下押圧構造部材22は、例えば銅などの導電性材料からなり、環状絶縁部材20の内周に沿った形状を有している。下押圧構造部材22の上部には、複数の圧接部材28が設けてある。圧接部材28は、上面が平坦で、かつ各圧接部材28の上面が同一平面上に位置するように形成されている。下押圧構造部材22は、環状絶縁部材20にろう付けにより固定してある。半導体チップ12は、下押圧構造部材22の圧接部材28の上面に配置してある。   The lower pressing structure member 22 is made of a conductive material such as copper and has a shape along the inner periphery of the annular insulating member 20. A plurality of pressure contact members 28 are provided on the lower pressing structure member 22. The pressure contact member 28 is formed so that the upper surface is flat and the upper surface of each pressure contact member 28 is located on the same plane. The lower pressing structure member 22 is fixed to the annular insulating member 20 by brazing. The semiconductor chip 12 is disposed on the upper surface of the pressure contact member 28 of the lower pressing structure member 22.

押圧構造部材16は、例えば銅などの導電性材料からなり、環状絶縁部材20の内部に収納可能に形成されている。押圧構造部材16の下部には、圧接部材26が設けてある。圧接部材26は、圧接部材28に対応して形成とてあり、下面が平坦で、かつ各圧接部材26の下面が同一平面上に位置するように形成してある。下押圧構造部材22の圧接部材28と押圧構造部材16の圧接部材26との間に、半導体チップ12が挟持される。又、押圧構造部材16と下押圧構造部材22との間には、半導体チップ12以外の圧接型半導体装置10の内部構成部品、例えば、抵抗や接続用の導電片なども組み付けられる。   The pressing structure member 16 is made of a conductive material such as copper, and is formed so as to be housed inside the annular insulating member 20. A pressing member 26 is provided below the pressing structure member 16. The pressure contact member 26 is formed so as to correspond to the pressure contact member 28, and is formed such that the lower surface is flat and the lower surfaces of the pressure contact members 26 are located on the same plane. The semiconductor chip 12 is sandwiched between the pressing member 28 of the lower pressing structure member 22 and the pressing member 26 of the pressing structure member 16. Further, between the pressing structure member 16 and the lower pressing structure member 22, internal components of the press contact type semiconductor device 10 other than the semiconductor chip 12, for example, a resistance piece or a conductive piece for connection are also assembled.

蓋体18は、導電性材料からなり、筐体14の上部の形状に対応して形成してある。蓋体18は、筐体14の上部に載置すると、下面が押圧構造部材16の上面に接するとともに、所定圧力で押圧することにより周縁が筐体14の上面に密着し、筐体14の内部を封止可能に形成されている。すなわち、図1に示すように、押圧構造部材16の高さ幅は、aであり、半導体チップ12の厚み幅は、bである。これらの厚み幅の合計値は、蓋体18を筐体14に被せたとき、筐体14と蓋体18との間に所定の押し代が生じる値となっている。   The lid 18 is made of a conductive material and is formed corresponding to the shape of the upper portion of the housing 14. When the lid 18 is placed on the upper portion of the housing 14, the lower surface is in contact with the upper surface of the pressing structure member 16, and the peripheral edge is in close contact with the upper surface of the housing 14 by pressing with a predetermined pressure. Is formed so that it can be sealed. That is, as shown in FIG. 1, the height width of the pressing structure member 16 is a, and the thickness width of the semiconductor chip 12 is b. The total value of these thickness widths is a value at which a predetermined pushing allowance is generated between the casing 14 and the lid 18 when the lid 18 is put on the casing 14.

図1において、筐体14の下部にあるのは、型締め装置30の下金型34であり、蓋体18の上部にあるのは、型締め装置30の上金型32である。型締め装置30は、上金型32と、下金型34と、それら上金型32と下金型34との間を押圧する押圧機構とを備えている。上金型32は、内面形状が蓋体18の外形に適合して形成してあり、下金型34は、内面形状が筐体14の外形に適合して形成してある。尚、上金型32と下金型34とから構成される金型には、押圧による材料の塑性変形に対応するための逃げを必要に応じて設けてもよい。   In FIG. 1, the lower mold 34 of the mold clamping device 30 is at the lower part of the housing 14, and the upper mold 32 of the mold clamping apparatus 30 is at the upper part of the lid 18. The mold clamping device 30 includes an upper mold 32, a lower mold 34, and a pressing mechanism that presses between the upper mold 32 and the lower mold 34. The upper mold 32 is formed with an inner surface shape adapted to the outer shape of the lid 18, and the lower mold 34 is formed with an inner surface shape adapted to the outer shape of the housing 14. In addition, you may provide in the metal mold | die comprised from the upper metal mold | die 32 and the lower metal mold | die 34 as needed, and the relief | combination for respond | corresponding to the plastic deformation of the material by press.

次に、圧接型半導体装置10を製造する製造方法について、図2に示す流れ図(フローチャート)を用いて説明する。   Next, a manufacturing method for manufacturing the pressure contact type semiconductor device 10 will be described with reference to a flowchart shown in FIG.

環状絶縁部材20と下押圧構造部材22とを、熱処理を介して接合して筐体14を形成する(S1)。筐体14が形成されたら、筐体14の下押圧構造部材22の圧接部材28に、半導体チップ12を載せ、更に、半導体チップ12以外の内部構成部品を配置する(構成部品配置工程)(S2)。これら内部構成部品の全てを筐体14内に収納したなら、半導体チップ12の上に押圧構造部材16を載せる(押圧構造部材載置工程)(S3)。更に、押圧構造部材16の上に蓋体18を被せる(蓋体取付工程)(S4)。   The casing 14 is formed by joining the annular insulating member 20 and the lower pressing structure member 22 through heat treatment (S1). When the housing 14 is formed, the semiconductor chip 12 is placed on the pressure contact member 28 of the lower pressing structure member 22 of the housing 14, and further, internal components other than the semiconductor chip 12 are disposed (component component arranging step) (S 2). ). When all of these internal components are stored in the housing 14, the pressing structure member 16 is placed on the semiconductor chip 12 (pressing structure member mounting step) (S3). Further, the lid 18 is placed on the pressing structure member 16 (lid attachment step) (S4).

このようにして、圧接型半導体装置10の内部構成部品を筐体14と蓋体18の間に組み付けて、かつ、蓋体18と筐体14とを接合していないものを、圧接型半導体装置の構成部品一式とも呼ぶ。圧接型半導体装置の構成部品一式を形成したなら、圧接型半導体装置の構成部品一式を型締め装置30にセットする(S5)。   In this manner, the internal components of the press contact type semiconductor device 10 are assembled between the casing 14 and the lid body 18 and the lid body 18 and the casing 14 are not joined. It is also called a set of components. If a set of components of the press contact type semiconductor device is formed, the set of components of the press contact type semiconductor device is set in the mold clamping device 30 (S5).

上金型32と下金型34との間に圧接型半導体装置の構成部品一式を組み付けたら、型締め装置30を作動させる。押圧機構により上金型32が押し下げられ、蓋体18と筐体14との間を上下方向から押圧する(押圧工程)(S6)。これにより、圧接型半導体装置の構成部品一式が押圧される。   When a set of components of the press contact type semiconductor device is assembled between the upper mold 32 and the lower mold 34, the mold clamping device 30 is operated. The upper mold 32 is pushed down by the pressing mechanism, and the space between the lid 18 and the housing 14 is pressed from above and below (pressing step) (S6). As a result, the set of components of the pressure contact type semiconductor device is pressed.

型締め装置30は、圧接型半導体装置10が製品化された状態で、半導体チップ12にかかる圧接力と同等の押圧力が、圧接型半導体装置の構成部品一式の半導体チップ12に生じるように押圧機構で押圧する。かかる押圧作業を行う工程が、特許請求の範囲における押圧工程である。   The mold clamping device 30 is pressed so that a pressing force equivalent to the pressure contact force applied to the semiconductor chip 12 is generated in the semiconductor chip 12 of the component parts of the pressure contact type semiconductor device in a state where the pressure contact type semiconductor device 10 is commercialized. Press with the mechanism. The step of performing the pressing operation is a pressing step in the claims.

型締め装置30での押圧工程が終了したなら、圧接型半導体装置の構成部品一式を型締め装置30から取り出し、蓋体18と筐体14とを所定の条件で接合する(接合工程)(S7)。筐体14には、蓋体18と筐体14とを接合する金属片が予め設けてある。   When the pressing process in the mold clamping device 30 is completed, a set of components of the pressure-contact type semiconductor device is taken out from the mold clamping device 30 and the lid 18 and the housing 14 are joined under a predetermined condition (joining process) (S7). ). The casing 14 is provided with a metal piece for joining the lid 18 and the casing 14 in advance.

かかる圧接型半導体装置の製造方法によれば、筐体14を形成する際に実施した熱処理により、仮に、筐体14等にひずみが生じているとしても、そのひずみが型締め装置30による押圧工程により修正される。したがって、圧接型半導体装置10は、ひずみのない構成部品で組み立てられ、かかる状態で、蓋体18と筐体14とが接合される。   According to the method for manufacturing a pressure-contact type semiconductor device, even if the housing 14 and the like are distorted by the heat treatment performed when forming the housing 14, the strain is pressed by the mold clamping device 30. It is corrected by. Therefore, the press contact type semiconductor device 10 is assembled with components without distortion, and in this state, the lid 18 and the housing 14 are joined.

そのため、製品化された圧接型半導体装置10には、内部応力等が残存しておらず、半導体チップ12が、押圧構造部材16と下押圧構造部材22により所望の押圧力で、かつ各半導体チップ12が均等な圧力で圧接されることとなる。   Therefore, no internal stress or the like remains in the press-contact type semiconductor device 10 that has been commercialized, and the semiconductor chip 12 has a desired pressing force by the pressing structure member 16 and the lower pressing structure member 22, and each semiconductor chip. 12 will be press-contacted by equal pressure.

<第2実施形態>
次に、圧接型半導体装置の製造方法の第2実施形態について、図3の断面図、及び図4のフローチャートを用いて説明する。図3は、図1の圧接型半導体装置10に対して、半導体チップ12に代えて挟持部材40が配置されている点を除いて同一の構成である。同一の構成の部材には、同一の符号を付して説明を省略する。
Second Embodiment
Next, a second embodiment of the manufacturing method of the pressure contact type semiconductor device will be described with reference to the cross-sectional view of FIG. 3 and the flowchart of FIG. 3 has the same configuration as the press-contact type semiconductor device 10 of FIG. 1 except that a clamping member 40 is disposed instead of the semiconductor chip 12. The members having the same configuration are denoted by the same reference numerals and description thereof is omitted.

まず、筐体14を製造方法の第1実施形態と同様にして形成する(Sa1)。筐体14を形成したなら、筐体14内の下押圧構造部材22の上に挟持部材40を載せる(挟持部材配置工程)(Sa2)。挟持部材40は、第1実施形態のときの半導体チップ12の厚み幅と等しい厚み幅Cを有している。挟持部材40は、例えば、超硬合金やセラミック素材などからなり、容易に圧縮変形や破損しない、硬度及び強度を有している。   First, the housing 14 is formed in the same manner as in the first embodiment of the manufacturing method (Sa1). If the housing | casing 14 is formed, the clamping member 40 will be mounted on the lower press structure member 22 in the housing | casing 14 (clamping member arrangement | positioning process) (Sa2). The clamping member 40 has a thickness width C equal to the thickness width of the semiconductor chip 12 in the first embodiment. The clamping member 40 is made of, for example, a cemented carbide or a ceramic material, and has a hardness and strength that do not easily cause compression deformation or breakage.

挟持部材40に押圧構造部材16を載せ(押圧構造部材載置工程)(Sa3)、更に筐体14に蓋体18を被せる(蓋体取付工程)(Sa4)。挟持部材40を下押圧構造部材22と押圧構造部材16で挟んだ状態で、蓋体18を被せた筐体14を、型締め装置30に取り付ける(Sa5)。型締め装置30で、蓋体18を被せた筐体14を上下方向から押圧する(押圧工程)(Sa6)。   The pressing structure member 16 is placed on the clamping member 40 (pressing structure member mounting step) (Sa3), and the casing 14 is covered with the lid body 18 (lid body mounting step) (Sa4). With the clamping member 40 sandwiched between the lower pressing structure member 22 and the pressing structure member 16, the casing 14 covered with the lid 18 is attached to the mold clamping device 30 (Sa5). The mold clamping device 30 presses the casing 14 covered with the lid 18 from above and below (pressing step) (Sa6).

型締め装置30は、挟持部材40に、製品としての圧接型半導体装置10の半導体チップ12に加えられる押圧力と同等の押圧力がかかるように蓋体18を被せた筐体14を押圧する。かかる工程が、特許請求の範囲の押圧工程である。   The mold clamping device 30 presses the casing 14 covered with the lid 18 so that a pressing force equivalent to the pressing force applied to the semiconductor chip 12 of the press-contact type semiconductor device 10 as a product is applied to the clamping member 40. Such a process is a pressing process in the scope of claims.

押圧工程を行ったなら、蓋体18を被せた筐体14を型締め装置30から取り外す(Sa7)。更に、筐体14から蓋体18を外し(Sa8)、筐体14の内部から挟持部材40を取り出す(挟持部材取外工程)(Sa9)。挟持部材40を筐体14から取り出したなら、圧接部材28に半導体チップ12を載せるとともに、その他の内部構成部品の全てを筐体14内に組み込む(構成部品配置工程)(Sa10)。   After performing the pressing step, the casing 14 covered with the lid 18 is removed from the mold clamping device 30 (Sa7). Further, the lid 18 is removed from the housing 14 (Sa8), and the holding member 40 is taken out from the inside of the housing 14 (a holding member removing step) (Sa9). If the clamping member 40 is taken out from the housing | casing 14, while mounting the semiconductor chip 12 on the press-contacting member 28, all other internal components are integrated in the housing | casing 14 (component component arrangement | positioning process) (Sa10).

内部構成部品を筐体14内に組み込んだら、押圧構造部材16を載せ(押圧構造部材載置)(Sa11)、更に筐体14に蓋体18を被せる(蓋体取付工程)(Sa12)。そして、蓋体18と筐体14とを、ろう付けして接合する(接合工程)(Sa13)。   After the internal components are incorporated in the casing 14, the pressing structure member 16 is placed (pressing structure member placement) (Sa11), and the casing 14 is covered with the lid body 18 (lid body attaching step) (Sa12). Then, the lid 18 and the casing 14 are joined by brazing (joining step) (Sa13).

圧接型半導体装置の製造方法の第2実施形態によれば、下押圧構造部材22と押圧構造部材16との間に挟持部材40を挟んで押圧することから、下押圧構造部材22と押圧構造部材16とを均一に押圧して、これらに生じているゆがみを効果的に矯正できる。   According to the second embodiment of the method of manufacturing a press-contact type semiconductor device, the pressing member 40 is pressed between the lower pressing structure member 22 and the pressing structure member 16, so that the lower pressing structure member 22 and the pressing structure member are pressed. 16 can be pressed evenly, and the distortion occurring in these can be effectively corrected.

挟持部材40は、硬度が高く、変形しにくいことから、押圧構造部材16と下押圧構造部材22との間隔を正確に設定できる。製品となる半導体チップ12が押圧工程で押圧されないので、半導体チップ12に押圧による影響が発生しない。挟持部材40は繰り返し圧接型半導体装置10の製造に用いることができ、圧接型半導体装置10の製造コストを低減できる。   Since the pinching member 40 has high hardness and is not easily deformed, the interval between the pressing structure member 16 and the lower pressing structure member 22 can be accurately set. Since the semiconductor chip 12 as a product is not pressed in the pressing process, the semiconductor chip 12 is not affected by the pressing. The clamping member 40 can be repeatedly used for manufacturing the pressure-contact type semiconductor device 10, and the manufacturing cost of the pressure-contact type semiconductor device 10 can be reduced.

<第3実施形態>
圧接型半導体装置の製造方法の第3実施形態について説明する。第3実施形態の製造方法は、第3実施形態の製造方法に用いられる挟持部材41が、第2実施形態の製造方法における挟持部材40の厚み幅、つまり半導体チップ12の標準の厚み幅(標準厚み)より薄く形成されている点を除くと、第2実施形態の製造方法と同一の製造方法である。
<Third Embodiment>
A third embodiment of the manufacturing method of the pressure contact type semiconductor device will be described. In the manufacturing method of the third embodiment, the clamping member 41 used in the manufacturing method of the third embodiment is the thickness width of the clamping member 40 in the manufacturing method of the second embodiment, that is, the standard thickness width of the semiconductor chip 12 (standard The manufacturing method is the same as the manufacturing method of the second embodiment except that the thickness is smaller than that of the second embodiment.

半導体チップ12の標準の厚み幅とは、蓋体18と筐体14とを所定の条件で接合させたとき、押圧構造部材16と下押圧構造部材22とで挟まれた半導体チップ12に所望の接合力が発生する厚み幅である。   The standard thickness width of the semiconductor chip 12 is a desired thickness of the semiconductor chip 12 sandwiched between the pressing structure member 16 and the lower pressing structure member 22 when the lid 18 and the casing 14 are joined under a predetermined condition. It is the thickness width in which the bonding force is generated.

更に、半導体チップ12の標準の厚み幅は、厚み幅が増加する方向と減少する方向の双方に許容値を有している。半導体チップ12の厚み幅の許容値は、許容値の範囲内であれば、押圧構造部材16等と半導体チップ12との接合力が許容範囲内となる値である。許容値は、半導体チップ12の製造上の誤差のみならず、半導体チップ12を押圧する構成部品の誤差全般を含んでいてもよい。   Furthermore, the standard thickness width of the semiconductor chip 12 has an allowable value in both the direction in which the thickness width increases and the direction in which the thickness width decreases. If the allowable value of the thickness width of the semiconductor chip 12 is within the allowable range, the bonding force between the pressing structure member 16 and the semiconductor chip 12 is within the allowable range. The allowable value may include not only errors in manufacturing the semiconductor chip 12 but also errors in components that press the semiconductor chip 12.

挟持部材41の厚み幅は、半導体チップ12の標準の厚み幅より厚み幅が減少する方向に許容される最少の厚み幅と同等の厚み幅である。   The thickness width of the clamping member 41 is equal to the minimum thickness width allowed in the direction in which the thickness width decreases from the standard thickness width of the semiconductor chip 12.

圧接型半導体装置の製造方法の第3実施形態は、挟持部材41を下押圧構造部材22と押圧構造部材16との間に挟んで、蓋体18を被せた筐体14を型締め装置30で押圧する。型締め装置30での押圧は、製品としての圧接型半導体装置10の半導体チップ12に加えられる押圧力の許容範囲内の最少の押圧力となるように行う。かかる製造方法によれば、押圧構造部材16と下押圧構造部材22との間隔は、半導体チップ12の許容最少厚み幅と同等に形成される。このようにして形成された筐体14に、挟持部材41を取り出し、製造方法の第2実施形態と同様に、圧接型半導体装置の内部構成部品の一式を組み入れて蓋体18と筐体14とを接合する。   In the third embodiment of the manufacturing method of the press contact type semiconductor device, the clamping member 30 is used to clamp the casing 14 covered with the lid 18 with the clamping member 41 sandwiched between the lower pressing structure member 22 and the pressing structure member 16. Press. The pressing by the mold clamping device 30 is performed so as to be the minimum pressing force within the allowable range of the pressing force applied to the semiconductor chip 12 of the press contact type semiconductor device 10 as a product. According to this manufacturing method, the distance between the pressing structure member 16 and the lower pressing structure member 22 is formed to be equal to the allowable minimum thickness width of the semiconductor chip 12. The clamping member 41 is taken out of the casing 14 formed in this way, and a set of internal components of the pressure contact type semiconductor device is incorporated into the casing 18 and the casing 14 in the same manner as in the second embodiment of the manufacturing method. Join.

かかる製造方法の第3実施形態により製造された圧接型半導体装置は、押圧構造部材16と下押圧構造部材22との間隔が、半導体チップ12に許容される最少の厚み幅と同等に形成されるので、筐体14の内部に組み付けられた半導体チップ12の中に、仮に、許容範囲内の最少の厚み幅のものが含まれていた場合であっても、その許容範囲内の最少の厚み幅の半導体チップ12も、許容される範囲内の接合力で押圧構造部材16と下押圧構造部材22とにより圧接される。   In the press contact type semiconductor device manufactured by the third embodiment of the manufacturing method, the distance between the pressing structure member 16 and the lower pressing structure member 22 is formed to be equal to the minimum thickness width allowed for the semiconductor chip 12. Therefore, even if the semiconductor chip 12 assembled in the housing 14 includes a semiconductor chip 12 having the minimum thickness width within the allowable range, the minimum thickness width within the allowable range is included. The semiconductor chip 12 is also pressed by the pressing structure member 16 and the lower pressing structure member 22 with a bonding force within an allowable range.

したがって、第3実施形態の製造方法によれば、挟持部材41を用いることにより、押圧構造部材16と下押圧構造部材22との間隔が許容範囲内の最少の厚み幅の半導体チップ12に対応することができ、各半導体チップ12を確実に所定の接合力で圧接させることができる。   Therefore, according to the manufacturing method of the third embodiment, by using the holding member 41, the distance between the pressing structure member 16 and the lower pressing structure member 22 corresponds to the semiconductor chip 12 having the smallest thickness width within the allowable range. Thus, each semiconductor chip 12 can be reliably pressed with a predetermined bonding force.

又、押圧工程時に、構成部品のひずみを修正させるに好適な温度に、圧接型半導体装置の構成部品一式、あるいは、挟持部材40等を挟み込んだ状態の筐体14と蓋体18とを、加熱装置により加熱してもよい。すると、構成部品の金属部材が温度上昇により軟化し、効率よくひずみが修正される。   Also, during the pressing process, the housing 14 and the lid 18 in a state in which the set of components of the pressure contact type semiconductor device or the clamping member 40 is sandwiched are heated to a temperature suitable for correcting the distortion of the components. You may heat with an apparatus. Then, the metal member of the component part is softened by the temperature rise, and the distortion is efficiently corrected.

更にこの場合、押圧工程は、構成部品の温度が、常温に低下するまで、継続させることとしてもよい。すると、より確実構成部品のひずみを修正することができる。   Further, in this case, the pressing step may be continued until the temperature of the component part decreases to room temperature. As a result, the distortion of the component can be corrected more reliably.

以上、本発明のいくつかの実施形態を説明したが、これらの実施形態は、例として提示したものであり、発明の範囲を限定することは意図していない。これら新規な実施形態は、その他の様々な形態で実施されることが可能であり、発明の要旨を逸脱しない範囲で、種々の省略、置き換え、変更を行うことができる。これら実施形態やその変形は、発明の範囲や要旨に含まれるとともに、特許請求の範囲に記載された発明とその均等の範囲に含まれる。   As mentioned above, although some embodiment of this invention was described, these embodiment is shown as an example and is not intending limiting the range of invention. These novel embodiments can be implemented in various other forms, and various omissions, replacements, and changes can be made without departing from the scope of the invention. These embodiments and modifications thereof are included in the scope and gist of the invention, and are included in the invention described in the claims and the equivalents thereof.

例えば、第1実施形態の製造方法において、内部構成部品の全てを筐体14に組み付けて押圧工程を行うのでなく、押圧工程において、押圧作用を受ける構成部品のみを組み付けて押圧工程を行ってもよい。この場合、押圧工程が終了した後、押圧作用を受けない構成部品を筐体14内に組み入れ、蓋体18と筐体14とを接合させる。   For example, in the manufacturing method of the first embodiment, not all of the internal components are assembled to the housing 14 and the pressing process is performed, but in the pressing process, only the components that receive the pressing action are assembled and the pressing process is performed. Good. In this case, after the pressing step is completed, components that are not subjected to the pressing action are incorporated into the casing 14, and the lid 18 and the casing 14 are joined.

10…圧接型半導体装置、12…半導体チップ、14…筐体、16…押圧構造部材、18…蓋体、20…環状絶縁部材、22…下押圧構造部材、26、28…押圧部材、30…型締め装置、32…上金型、34…下金型、40、41…挟持部材。   DESCRIPTION OF SYMBOLS 10 ... Pressure-contact type semiconductor device, 12 ... Semiconductor chip, 14 ... Housing | casing, 16 ... Pressing structural member, 18 ... Lid body, 20 ... Annular insulating member, 22 ... Lower pressing structural member, 26, 28 ... Pressing member, 30 ... Clamping device, 32 ... upper mold, 34 ... lower mold, 40, 41 ... clamping member.

Claims (6)

筐体の内部に半導体チップを収納し、前記半導体チップを前記筐体に被せた蓋体と前記筐体との間で圧接する圧接型半導体装置の製造方法において、
前記筐体の内部に、前記半導体チップを含む前記圧接型半導体装置の構成部品を配置する構成部品配置工程と、
前記構成部品配置工程で前記筐体内に配置された前記半導体チップの上部に、前記半導体チップに接する押圧構造部材を載置する押圧構造部材載置工程と、
前記押圧構造部材載置工程で載置された前記押圧構造部材に重ねて、前記蓋体を前記筐体に被せる蓋体取付工程と、
前記蓋体取付工程で被せられた前記蓋体と前記筐体の間に所定圧力を付加する押圧工程と、
前記押圧工程で押圧した後、前記蓋体と前記筐体との間を接合する接合工程と、
から構成したことを特徴とする圧接型半導体装置の製造方法。
In a method of manufacturing a pressure-contact type semiconductor device in which a semiconductor chip is housed inside a housing and the semiconductor chip is pressed between the housing and the lid that covers the housing,
A component placement step of placing a component of the pressure contact type semiconductor device including the semiconductor chip inside the housing; and
A pressing structure member placing step of placing a pressing structure member in contact with the semiconductor chip on top of the semiconductor chip placed in the housing in the component placement step;
A lid mounting step of covering the casing with the lid over the pressing structure member placed in the pressing structure member placing step;
A pressing step of applying a predetermined pressure between the lid and the casing that are covered in the lid mounting step;
After pressing in the pressing step, a bonding step for bonding between the lid and the housing;
A method of manufacturing a press-contact type semiconductor device comprising:
筐体の内部に半導体チップを収納し、前記半導体チップを前記筐体に被せた蓋体と前記筐体との間で圧接する圧接型半導体装置の製造方法において、
前記筐体の内部に、前記半導体チップと同等の厚み幅を有する挟持部材を配置させる挟持部材配置工程と、
前記挟持部材配置工程で前記筐体内に配置された前記挟持部材の上部に、前記半導体チップの上部に載置される押圧構造部材を載置する押圧構造部材載置工程と、
前記押圧構造部材載置工程で載置された前記押圧構造部材に重ねて、前記蓋体を前記筐体に被せる蓋体取付工程と、
前記蓋体取付工程で被せられた前記蓋体と前記筐体の間を所定圧力で押圧する押圧工程と、
前記蓋体を開き、前記筐体から前記挟持部材を取り外す挟持部材取外工程と、
前記挟持部材取外工程で前記挟持部材を取り外した前記筐体の内部に、前記半導体チップを含む前記圧接型半導体装置の構成部品を配置させる構成部品配置工程と、
前記構成部品配置工程で前記筐体内に配置された前記半導体チップの上部に、前記半導体チップに接する押圧構造部材を載置する押圧構造部材載置工程と、
前記押圧構造部材載置工程で載置された前記押圧構造部材に重ねて、前記蓋体を前記筐体に被せる蓋体取付工程と、
前記蓋体と前記筐体との間を接合する接合工程と、
から構成したことを特徴とする圧接型半導体装置の製造方法。
In a method of manufacturing a pressure-contact type semiconductor device in which a semiconductor chip is housed inside a housing and the semiconductor chip is pressed between the housing and the lid that covers the housing,
A sandwiching member arranging step of placing a sandwiching member having a thickness width equivalent to the semiconductor chip inside the housing; and
A pressing structure member mounting step of mounting a pressing structure member mounted on the upper portion of the semiconductor chip on the upper portion of the clamping member disposed in the housing in the clamping member arrangement step;
A lid mounting step of covering the casing with the lid over the pressing structure member placed in the pressing structure member placing step;
A pressing step of pressing between the lid and the casing covered in the lid mounting step with a predetermined pressure;
A clamping member removing step of opening the lid and removing the clamping member from the housing;
A component placement step of placing the components of the press contact type semiconductor device including the semiconductor chip inside the housing from which the clamping member has been removed in the clamping member removal step;
A pressing structure member placing step of placing a pressing structure member in contact with the semiconductor chip on top of the semiconductor chip placed in the housing in the component placement step;
A lid mounting step of covering the casing with the lid over the pressing structure member placed in the pressing structure member placing step;
A joining step for joining the lid and the housing;
A method of manufacturing a press-contact type semiconductor device comprising:
前記挟持部材は、前記半導体チップの標準厚み幅に対して、前記半導体チップの薄さ方向に許容される最大厚み幅の誤差分、前記半導体チップの標準厚み幅より薄く形成されていることを特徴とする請求項2に記載の圧接型半導体装置の製造方法。   The clamping member is formed to be thinner than the standard thickness width of the semiconductor chip by an error of a maximum thickness width allowed in the thickness direction of the semiconductor chip with respect to the standard thickness width of the semiconductor chip. A method for manufacturing a press-contact type semiconductor device according to claim 2. 前記挟持部材は、セラミック、超硬合金、プレス型用材料のいずれかから形成されていることを特徴とする請求項2又は3に記載の圧接型半導体装置の製造方法。   4. The method of manufacturing a press-contact type semiconductor device according to claim 2, wherein the clamping member is formed of any one of ceramic, cemented carbide, and a press mold material. 前記押圧工程において、前記構成部品に加熱を行うことを特徴とする請求項1〜4のいずれか1項に記載の圧接型半導体装置の製造方法。   5. The method of manufacturing a press-contact type semiconductor device according to claim 1, wherein the component part is heated in the pressing step. 前記構成部品に加熱を行った後、前記構成部品の温度が所定温度に低下するまで、前記押圧工程を継続して行うことを特徴とする請求項5に記載の圧接型半導体装置の製造方法。   6. The method of manufacturing a press-contact type semiconductor device according to claim 5, wherein after the component is heated, the pressing step is continuously performed until the temperature of the component decreases to a predetermined temperature.
JP2012263327A 2012-11-30 2012-11-30 Method of manufacturing pressure-welded semiconductor device Pending JP2014110298A (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016157887A (en) * 2015-02-26 2016-09-01 京セラ株式会社 Method of manufacturing electrode member for pressure-welding semiconductor device
WO2016157464A1 (en) * 2015-03-31 2016-10-06 新電元工業株式会社 Transmission member and pressurization unit

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016157887A (en) * 2015-02-26 2016-09-01 京セラ株式会社 Method of manufacturing electrode member for pressure-welding semiconductor device
WO2016157464A1 (en) * 2015-03-31 2016-10-06 新電元工業株式会社 Transmission member and pressurization unit
JPWO2016157464A1 (en) * 2015-03-31 2017-04-27 新電元工業株式会社 Transmission member and pressure unit

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