JP2014073446A - 構造体 - Google Patents
構造体 Download PDFInfo
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- JP2014073446A JP2014073446A JP2012221729A JP2012221729A JP2014073446A JP 2014073446 A JP2014073446 A JP 2014073446A JP 2012221729 A JP2012221729 A JP 2012221729A JP 2012221729 A JP2012221729 A JP 2012221729A JP 2014073446 A JP2014073446 A JP 2014073446A
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- amorphous carbon
- carbon film
- titanium dioxide
- photocatalytic
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- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims abstract description 191
- 229910003481 amorphous carbon Inorganic materials 0.000 claims abstract description 170
- 239000004408 titanium dioxide Substances 0.000 claims abstract description 87
- 230000001699 photocatalysis Effects 0.000 claims abstract description 60
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 72
- 229910052710 silicon Inorganic materials 0.000 claims description 72
- 239000010703 silicon Substances 0.000 claims description 72
- 239000011941 photocatalyst Substances 0.000 claims description 30
- 239000000758 substrate Substances 0.000 claims description 26
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 24
- 239000001301 oxygen Substances 0.000 claims description 24
- 229910052760 oxygen Inorganic materials 0.000 claims description 24
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 14
- 239000004020 conductor Substances 0.000 claims description 10
- 239000011787 zinc oxide Substances 0.000 claims description 7
- 150000001450 anions Chemical class 0.000 claims description 5
- 150000001768 cations Chemical class 0.000 claims description 5
- 239000002131 composite material Substances 0.000 claims description 4
- 239000000463 material Substances 0.000 abstract description 52
- 238000007146 photocatalysis Methods 0.000 abstract 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 22
- 239000010410 layer Substances 0.000 description 22
- 238000000034 method Methods 0.000 description 20
- 238000005259 measurement Methods 0.000 description 19
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 18
- 229910052799 carbon Inorganic materials 0.000 description 15
- 239000007789 gas Substances 0.000 description 14
- 239000010935 stainless steel Substances 0.000 description 13
- 229910001220 stainless steel Inorganic materials 0.000 description 13
- 239000010936 titanium Substances 0.000 description 13
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 11
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 10
- -1 WO 3 Inorganic materials 0.000 description 10
- 239000001257 hydrogen Substances 0.000 description 10
- 229910052739 hydrogen Inorganic materials 0.000 description 10
- 239000004065 semiconductor Substances 0.000 description 10
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 9
- 238000003980 solgel method Methods 0.000 description 9
- 229910052751 metal Inorganic materials 0.000 description 8
- 239000002184 metal Substances 0.000 description 8
- 238000002360 preparation method Methods 0.000 description 8
- 239000004215 Carbon black (E152) Substances 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 7
- 229930195733 hydrocarbon Natural products 0.000 description 7
- 150000002430 hydrocarbons Chemical class 0.000 description 7
- 230000003647 oxidation Effects 0.000 description 7
- 238000007254 oxidation reaction Methods 0.000 description 7
- 230000001681 protective effect Effects 0.000 description 7
- 239000000126 substance Substances 0.000 description 7
- 229910052719 titanium Inorganic materials 0.000 description 7
- 230000000844 anti-bacterial effect Effects 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 6
- 238000007747 plating Methods 0.000 description 6
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 6
- 229910002804 graphite Inorganic materials 0.000 description 5
- 239000010439 graphite Substances 0.000 description 5
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 5
- 229910052709 silver Inorganic materials 0.000 description 5
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 4
- 239000000956 alloy Substances 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 230000006866 deterioration Effects 0.000 description 4
- 239000010419 fine particle Substances 0.000 description 4
- 229910052737 gold Inorganic materials 0.000 description 4
- 239000010931 gold Substances 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 238000007639 printing Methods 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- CZDYPVPMEAXLPK-UHFFFAOYSA-N tetramethylsilane Chemical compound C[Si](C)(C)C CZDYPVPMEAXLPK-UHFFFAOYSA-N 0.000 description 4
- 238000012795 verification Methods 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 229910010413 TiO 2 Inorganic materials 0.000 description 3
- 230000009471 action Effects 0.000 description 3
- 150000004703 alkoxides Chemical class 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 238000000354 decomposition reaction Methods 0.000 description 3
- 239000011261 inert gas Substances 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- 239000002344 surface layer Substances 0.000 description 3
- 230000003746 surface roughness Effects 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- LLYXJBROWQDVMI-UHFFFAOYSA-N 2-chloro-4-nitrotoluene Chemical compound CC1=CC=C([N+]([O-])=O)C=C1Cl LLYXJBROWQDVMI-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 2
- 241000872198 Serjania polyphylla Species 0.000 description 2
- 229910006404 SnO 2 Inorganic materials 0.000 description 2
- 229910001069 Ti alloy Inorganic materials 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 2
- 229910002092 carbon dioxide Inorganic materials 0.000 description 2
- 239000001569 carbon dioxide Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- UBHZUDXTHNMNLD-UHFFFAOYSA-N dimethylsilane Chemical compound C[SiH2]C UBHZUDXTHNMNLD-UHFFFAOYSA-N 0.000 description 2
- 229910001882 dioxygen Inorganic materials 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 2
- 230000001747 exhibiting effect Effects 0.000 description 2
- 239000005357 flat glass Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 229910021389 graphene Inorganic materials 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 230000004298 light response Effects 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- UIUXUFNYAYAMOE-UHFFFAOYSA-N methylsilane Chemical compound [SiH3]C UIUXUFNYAYAMOE-UHFFFAOYSA-N 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 239000005416 organic matter Substances 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 238000002294 plasma sputter deposition Methods 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 2
- 239000010944 silver (metal) Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- 239000011135 tin Substances 0.000 description 2
- PQDJYEQOELDLCP-UHFFFAOYSA-N trimethylsilane Chemical compound C[SiH](C)C PQDJYEQOELDLCP-UHFFFAOYSA-N 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- WZJUBBHODHNQPW-UHFFFAOYSA-N 2,4,6,8-tetramethyl-1,3,5,7,2$l^{3},4$l^{3},6$l^{3},8$l^{3}-tetraoxatetrasilocane Chemical compound C[Si]1O[Si](C)O[Si](C)O[Si](C)O1 WZJUBBHODHNQPW-UHFFFAOYSA-N 0.000 description 1
- WSPOQKCOERDWJQ-UHFFFAOYSA-N 2-methyl-1,3,5,7,2,4,6,8-tetraoxatetrasilocane Chemical compound C[SiH]1O[SiH2]O[SiH2]O[SiH2]O1 WSPOQKCOERDWJQ-UHFFFAOYSA-N 0.000 description 1
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 229920000049 Carbon (fiber) Polymers 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229920000742 Cotton Polymers 0.000 description 1
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 244000043261 Hevea brasiliensis Species 0.000 description 1
- 229910017709 Ni Co Inorganic materials 0.000 description 1
- 229910003267 Ni-Co Inorganic materials 0.000 description 1
- 229910003262 Ni‐Co Inorganic materials 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 229910001260 Pt alloy Inorganic materials 0.000 description 1
- 229920000297 Rayon Polymers 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229910002367 SrTiO Inorganic materials 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- OUUQCZGPVNCOIJ-UHFFFAOYSA-M Superoxide Chemical compound [O-][O] OUUQCZGPVNCOIJ-UHFFFAOYSA-M 0.000 description 1
- 229910003074 TiCl4 Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- UHYPYGJEEGLRJD-UHFFFAOYSA-N cadmium(2+);selenium(2-) Chemical compound [Se-2].[Cd+2] UHYPYGJEEGLRJD-UHFFFAOYSA-N 0.000 description 1
- 239000004917 carbon fiber Substances 0.000 description 1
- 239000003575 carbonaceous material Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 239000013522 chelant Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 230000006355 external stress Effects 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 229910001026 inconel Inorganic materials 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- YOBAEOGBNPPUQV-UHFFFAOYSA-N iron;trihydrate Chemical compound O.O.O.[Fe].[Fe] YOBAEOGBNPPUQV-UHFFFAOYSA-N 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229920003052 natural elastomer Polymers 0.000 description 1
- 229920001194 natural rubber Polymers 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 238000007645 offset printing Methods 0.000 description 1
- 230000033116 oxidation-reduction process Effects 0.000 description 1
- 238000013032 photocatalytic reaction Methods 0.000 description 1
- 238000007750 plasma spraying Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000010248 power generation Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 239000002964 rayon Substances 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- SBIBMFFZSBJNJF-UHFFFAOYSA-N selenium;zinc Chemical compound [Se]=[Zn] SBIBMFFZSBJNJF-UHFFFAOYSA-N 0.000 description 1
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 230000001502 supplementing effect Effects 0.000 description 1
- 229920003051 synthetic elastomer Polymers 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 239000005061 synthetic rubber Substances 0.000 description 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical compound CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 210000002268 wool Anatomy 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
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Abstract
【解決手段】 一実施形態に係る構造体は、基材上に形成された非晶質炭素膜と、この非晶質炭素膜上に形成された二酸化チタン膜とを備え、二酸化チタン膜の光触媒作用を用いた様々な用途に適用され得る。
【選択図】 図1
Description
概ね1回のディップで0.1μm−0.3μmの膜厚で基材上にゲルコーティングを行うことができる。したがって、ディップ、引き上げ、加熱の工程を必要に応じて繰り返すことにより、所望の二酸化チタン膜の膜厚を得る事が可能である。二酸化チタンの膜厚は、抗菌性やセルフクリーニング性、超親水皮膜など様々な機能や用途、用法、外観上の要求に応じて適宜選定することが可能である。例えば、本発明の一実施形態にかかる二酸化チタン膜16を電気化学膜として利用する場合には、電極等に印加するバイアス電圧が一定の場合、二酸化チタンの膜厚が大きい方が光電流は大きくなるため膜厚を1.8μm程度まで厚く形成する場合もある。
を1対とする複合層自体を必要に応じて複数層繰り返し積層することも可能である。
まず、表面粗さがRa:0.09μmのステンレス鋼(SUS304 2B)から成る基材を、各試料の基材として準備した。このステンレス鋼(SUS304 2B)基材は、40mm×100mmで厚さ1mmのものを準備した。
ステンレス鋼(SUS304 2B)基材に公知の方法でケイ素を含む非晶質炭素膜を厚さ約60〜90nmで青色に形成し、その上に二酸化チタン膜を形成した。二酸化チタン膜は、二酸化チタン膜をイソプロピルアルコール(IPA)を溶媒とし、IPAとの体積比で2%に希釈したチタン有機金属アルコキシドを主成分とする溶液(マツモトファインケミカル(株)の市販する「オルガチックスTA−25」)に、前述した非晶質炭素膜を形成した試料をディップ塗布した後、マッフル炉に投入して約400℃にて1時間加熱固化するゾル−ゲル法にて形成した。
ステンレス鋼(SUS304 2B)基材にケイ素を含む非晶質炭素膜を厚さ約50nmで形成し、その上にケイ素を含まない水素と炭素で構成される非晶質炭素膜を厚さ約550nmで黒色に形成し、その上に実施例1と同様に二酸化チタン膜を形成した。
ステンレス鋼(SUS304 2B)基材にケイ素を含む非晶質炭素膜を厚さ約50nmで形成し、その上にケイ素を含まない水素と炭素で構成される非晶質炭素膜を厚さ約550nmで黒色に形成し、更にケイ素を含む非晶質炭素膜を厚さ約60〜90nmで形成し、さらに酸素プラズマを約3分間照射したものの上に実施例1と同様に二酸化チタン膜を形成した。
ステンレス鋼(SUS304 2B)基材にケイ素を含む非晶質炭素膜を厚さ約60〜90nmで青色に形成し、さらに酸素プラズマを約3分間照射したものの上に実施例1と同様に二酸化チタン膜を形成した。
ステンレス鋼(SUS304 2B)基材にケイ素を含む非晶質炭素膜を厚さ約340nmで緑色〜赤色に形成し、その上に実施例1と同様に二酸化チタン膜を形成した。
ステンレス鋼(SUS304 2B)基材にケイ素を含む非晶質炭素膜を厚さ約340nmで緑色〜赤色に形成し、さらに酸素プラズマを約3分間照射したものの上に実施例1と同様に二酸化チタン膜を形成した。
ステンレス鋼(SUS304 2B)基材に二酸化チタン膜を実施例1と同様に形成した。
酸化チタン膜を形成後の各試料について、以下の条件で色の測定を行った。
測定機 : 分光測色計 CM-508d (ミノルタカメラ社製)
測定光源: パルスキセノンランプ
測定径 : 直径8mm
測定視野: 2°(50cm離れたところから直径1.7cmを見る視野を示す)
測定光源: D65 (昼光の光源、ISOの基準光で色温度6504K)
測定種類: L* a* b* 表色計
(L* は明度、a* と b* は色相と彩度を表す)
測定結果を表1に示す。
こうして形成された各試料について、(1)明るい場所(蛍光灯下の屋内環境)、および(2)暗い場所(暗室内)にて、水(純水)との接触角の測定を行った。これは、水との接触角を測定することにより各試料における酸化チタン膜の親水性を測定し、親水性を測定することにより酸化チタン膜の光触媒機能の発現状態を測定することができると考えられることに基づく。測定条件は以下の通りである。
(1)明るい場所(蛍光灯下の屋内環境):各試料を8月の正午前の約5時間天日に当てたのち、各試料を持ち込み、2分間以内に接触角測定を開始、各試料毎の測定所要時間は6点測定で1〜2分間程度である。
(2)暗い場所(暗室内):予め暗所に4日間各試料を保管し、各試料の測定を行っている。各試料毎の測定所要時間は6点測定で3分間程度である。
接触角計は、協和界面科学(株) ポータブル接触角計 PCA-1を使用し、概ね湿度60%、温度28℃の環境で測定を行った。なお、測定環境の明るさは下記内容にて測定を行っている。
測定機器: 東京硝子器械 Fineデジタル照度計 FLX-1330
測定範囲: 0.01〜20000ルクス(再現性±2%)
測定結果:(1)明るい場所・・・210〜230ルクス
(2)暗い場所・・・0.02ルクス(※接触角計の角度認識ライトは点灯状態)
12、112 基材
14、113、114、115 非晶質炭素膜
16、116 二酸化チタン膜
Claims (11)
- 非晶質炭素膜と、
前記非晶質炭素膜に少なくとも一部が接する光触媒膜と、
前記非晶質炭素膜または前記光触媒膜の少なくとも一方に少なくとも一部が接する導電体と、
を備える構造体。 - 前記非晶質炭素膜は、ケイ素を含有する請求項1記載の構造体。
- 前記非晶質炭素膜は、ケイ素に加え酸素を含有する請求項2記載の構造体。
- ケイ素を含有する第1の非晶質炭素膜と、
前記第1の非晶質炭素膜上に形成された光触媒膜と、
を備える構造体。 - 請求項4記載の構造体であって、
基材を備え、
前記第1の非晶質炭素膜は、前記基材上に形成される、
構造体。 - 前記第1の非晶質炭素膜は、前記ケイ素に加え酸素を含有する請求項4または5記載の構造体。
- 前記第1の非晶質炭素膜と前記光触媒膜との間にケイ素を含有しない第2の非晶質炭素膜を備える請求項4ないし6いずれか記載の構造体。
- 前記第2の非晶質炭素膜と前記光触媒膜との間にケイ素を含有する第3の非晶質炭素膜を備える請求項7記載の構造体。
- 前記第3の非晶質炭素膜は、前記ケイ素に加え酸素を含有する請求項8記載の構造体。
- 前記第1の非晶質炭素膜と前記光触媒膜との間に、当該第1の非晶質炭素膜側に位置するケイ素を含有しない非晶質炭素膜と当該光触媒膜側に位置するケイ素を含有する非晶質炭素膜とを有する複合層を1つまたは複数備える請求項4ないし6いずれか記載の構造体。
- 前記光触媒膜は、少なくとも二酸化チタン膜、カチオンまたはアニオンをドーピングした二酸化チタン膜、酸化亜鉛膜を含む請求項1ないし10いずれか記載の構造体。
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