JP2014060225A - Pattern formation method and device, exposure device and display panel manufacturing method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To generate drawing data without causing a void due to overlapping of pattern figures even when coordinate conversion is performed.SOLUTION: A plurality of pieces of vector figure data constituted by vector segments which are sources of patterns are analyzed. As a result of the analysis, when the vector figure data includes segment regions having different vector segment lengths and overlapping with each other, when the vector figure data includes an area region in which the vector segment intersects with another piece of vector figure data, or when the vector figure data includes a double structure, a new piece of vector figure data which does not include the segment region, the area region, or the double structure is created by deforming the vector figure data corresponding to the respective cases and drawing data is created on the basis of the new vector figure data after creation and vector figure data which does not originally include the segment region, the area region, or the double structure.

Description

  The present invention irradiates a light beam to a substrate coated with a resin material that causes a chemical reaction such as polymerization or curing by light of a specific wavelength, scans the substrate with the light beam, and forms a predetermined pattern on the substrate. In particular, the present invention relates to a pattern forming method and apparatus, an exposure apparatus, and a display panel manufacturing method, in particular, by modulating and irradiating a light beam using a spatial light modulator in which a plurality of mirrors are arranged in two axes. The present invention relates to a pattern forming method and apparatus for drawing a predetermined pattern on a resin, an exposure apparatus, and a display panel manufacturing method.

  An exposure apparatus is used to manufacture TFT (Thin Film Transistor) base materials, color filter base materials, plasma display panel base materials, organic EL (Electroluminescence) display panel base materials and the like used in display panels. Then, a pattern is drawn and formed on a substrate by a photolithography technique. As an exposure apparatus, conventionally, a projection method in which a mask pattern is projected onto a substrate using a lens or a mirror, and a fine gap (proximity gap) is provided between the mask and the substrate to form the mask pattern. There was a proximity method to transfer to the substrate.

  In recent years, an exposure apparatus has been developed that irradiates a substrate coated with a photoresist with a light beam, scans the substrate with the light beam, and draws a pattern on the substrate. Since the substrate is scanned by the light beam and the pattern is directly drawn on the substrate, an expensive mask is not required. Further, by changing the drawing data and the scanning program, various types of display panel substrates can be handled. Examples of such an exposure apparatus include those described in Patent Documents 1 and 2.

JP 2007-219011 A JP2012-103321A

  When a pattern is drawn on a substrate with a light beam, a spatial light modulator such as DMD (Digital Micromirror Device) is used to modulate the light beam. The DMD is configured by arranging a plurality of minute mirrors that reflect a light beam in two orthogonal directions, and modulates the light beam applied to the substrate by changing the angle of each mirror. In the DMD currently on the market, each mirror has a dimension of about 10 to 15 [μm], and a gap of about 1 [μm] is provided between adjacent mirrors.

  The light beam modulated by the DMD is irradiated onto the substrate from the head unit including the irradiation optical system of the light beam irradiation apparatus. Each light beam irradiation area corresponding to each mirror of the DMD is the same square as the shape of the mirror, and the pattern drawn on the base material is a superposition of minute square dots. In such an apparatus, drawing data for DMD is created based on pattern data based on vector graphic data created by CAD / CAM as a pattern to be formed. This drawing data is represented by raster data, and data in a necessary range is passed to the DMD in accordance with scanning. This vector-raster conversion is performed during scanning by a pattern generator circuit mounted on the apparatus. This is because if the data is converted into raster data in advance, the data capacity becomes excessive and may not fit in the memory installed in the apparatus. Alternatively, if data raster-converted in advance by an external computer or the like is supplied to the memory mounted on the apparatus during scanning, the scanning speed cannot be increased due to the limited communication speed.

  In general, when the vector-raster conversion processing speed in the pattern generator circuit is low, the scanning speed of the apparatus cannot be increased. Therefore, it is desirable to convert vector graphic data created by CAD / CAM into vector graphic data that can be easily handled by the pattern generator circuit. Therefore, vector-raster conversion in the pattern generator circuit is performed by a scan line method. At that time, the intersection of the scanning line and each vector constituting the pattern is obtained, and the point where the determination point is between the odd-numbered intersection and the even-numbered intersection is turned on and converted to raster data.

  FIG. 1 is a diagram showing the concept of vector-raster conversion processing executed by the pattern generator circuit in a scan line method. FIG. 1A shows an example where there is no overlap of pattern figures. In FIG. 1, the raster resolution is 0.50, the scanning line has Y-axis values of 0.25, 0.75, 1.25, 1.75, and 2.25, and the scanning line and X-axis values. The intersection points of 0.25, 0.75, 1.25, 1.75, 2.25, 2.75, 3.25, 3.75, 4.25, and 4.75 are the raster-on determination points. Become. Therefore, in FIG. 1 (A), the intersection of the scanning line and each vector constituting the square pattern 291 is obtained, and a place where a determination point exists between the odd-numbered intersection and the even-numbered intersection from the left side is detected. This is the raster-on area. In the case of FIG. 1A, the rectangular pattern 291 has nine raster-on areas, and the triangular pattern 292 has four raster-on areas.

  FIG. 1B shows an example where pattern figures overlap each other. In FIG. 1B, the rectangular pattern 291 is the same as that in FIG. 1A, but the triangular pattern 293 is the one in FIG. 1A moved to the left side by about 0.75 in terms of resolution. As a result, the right side of the square pattern 291 and the left side of the triangular pattern 293 partially overlap each other. In such a case, when the raster-on determination process similar to that described above is executed, the portion corresponding to the logical product of the quadrangle pattern 291 and the triangle pattern 293 is an interval from the even-numbered intersection point to the odd-numbered intersection point. It is not white. Therefore, conventionally, the pattern figures are divided so as not to overlap each other.

  FIG. 1C shows an example of division when the pattern figures overlap each other. When the square pattern 291 and the triangle pattern 293 overlap each other as shown in FIG. 1B, the vector of the square pattern 291 is left as it is, and the vector of the triangle pattern 292 does not overlap the square pattern 291. The process of dividing and forming a new triangular pattern 293 was performed. Thus, by dividing one of the pattern figures, an accurate raster-on region in which the square pattern 291 and the triangle pattern 293 are combined is created.

  Also, vector graphic data is corrected by geometrical distortion based on the inclination θ of the spatial light modulator, the actual coordinate value of the alignment mark, and the coordinate value of the designed alignment mark during scanning of the substrate by the light beam by the pattern generator circuit. After the coordinate conversion by, it is converted into raster data. Due to the rounding error at the time of coordinate conversion, even if the pattern figures do not overlap, there is a possibility that adjacently divided figures will overlap. Further, there is a possibility that a gap is generated between the pattern figures.

  FIG. 2 is a diagram illustrating an example in which adjacent pattern figures overlap or a gap occurs due to a rounding error during coordinate conversion. As shown in FIG. 2A, even if the quadrilateral patterns 101 and 102 that are in contact with each other with no overlapping of figures can be converted into quadrilateral patterns 101a and 102a having overlapping by rounding during coordinate conversion. There is sex. That is, the quadrilateral pattern 101 is rounded to the intersection of the resolution of the vector graphic data at the time of coordinate conversion, but becomes the same graphic as the quadrilateral pattern 101a. Since each vector graphic data is rounded to the resolution intersection, the deformed quadrilateral pattern 102a is formed and overlaps with the quadrangular pattern 101a.

  As shown in FIG. 2B, the quadrilateral patterns 101 and 102 that are in contact with each other without overlapping of the figures similarly have gaps between adjacent figures such as the quadrilateral patterns 101b and 102b due to rounding during coordinate conversion. May occur. That is, when the coordinates are converted, the vertices are rounded to the resolution intersection of the vector graphic data, whereby the quadrilateral pattern 101 becomes a deformed quadrilateral pattern 101b, and the quadrilateral pattern 102 becomes a deformed quadrilateral pattern 102b. A gap is generated between them. Such rounding error in coordinate conversion is very small because it is less than the coordinate resolution of vector graphic data. However, if the decision point of vector-raster conversion comes in this overlap or gap, the white portion of raster data will be raster resolution. It will be expanded to. When the raster resolution is made fine, the vector-raster conversion time increases. Alternatively, it is necessary to increase the pattern generator circuit for speeding up.

  The present invention has been made in view of the above-described points, and a pattern forming method and apparatus, and an exposure apparatus that can generate drawing data so as not to cause white spots due to overlapping of pattern figures even when coordinate conversion is performed. It is another object of the present invention to provide a display panel manufacturing method.

A first feature of the pattern forming method according to the present invention is that the modulated light beam is modulated by using a spatial light modulator that drives a plurality of mirror groups arranged in two directions based on drawing data. A pattern forming method for forming a pattern based on the drawing data on the resin film of the substrate by irradiating a light beam while moving the light beam relative to the substrate coated with the resin film, When a plurality of vector graphic data composed of vector line segments that are the basis of a pattern is analyzed and the vector line segments have mutually overlapping line segment areas, the vector line segments intersect with other vector graphic data In the case of having an area region, or when the vector graphic data has a double structure, the line segment region and the area are modified by modifying the vector graphic data corresponding to each case. New vector graphic data that does not have a region and the double structure is created, and the new vector graphic data after the creation and the vector graphic that originally does not have the line segment region, the area region, and the double structure The drawing data is created based on the data.
As shown in FIGS. 2A and 2B, pattern figures overlap or generate gaps due to rounding during coordinate conversion. The lengths of vector line segments of adjacent pattern figures are different, and the line segments are mutually different. This is because they overlap. Therefore, as shown in FIG. 2C, in the case of the quadrilateral patterns 102 and 103 in which the coordinates of both ends of the vector line segments that are in contact with each other are not overlapped, overlapping and gaps are generated due to rounding during coordinate conversion. I know I won't. This is because the vertices of the vector line segments common to the rectangular patterns 102 and 103 are rounded to the same vector graphic data resolution intersection at the time of coordinate conversion. That is, the quadrilateral patterns 102 and 103 become deformed quadrilateral patterns 102c and 103c, and the vector line segments in contact with each other of the quadrangular pattern 102c and the quadrangular pattern 103c after deformation are in a common state. In this way, by transforming vector graphic data so that there is no overlap or gap due to rounding during coordinate conversion, white space due to overlapping pattern figures does not occur even if coordinate conversion is performed on the vector graphic data after deformation. Drawing data can be generated. This can be similarly applied to the deformation of vector graphic data when the vector line segment has an area area intersecting with other vector graphic data or when the vector graphic data has a double structure.

  A second feature of the pattern formation method according to the present invention is that, in the pattern formation method according to the first feature, as a result of the analysis, the vector line segments have mutually overlapping line segment regions having different lengths or When the vector line segment has an area area intersecting with the other first vector graphic data, the vector line segment overlaps each other and the line segment area or the area area is removed to create second vector graphic data. When the first vector graphic data or the second vector graphic data after removing the line segment region or the area region has a double structure, the first or second vector graphic data is common to each other. A first vector that is divided into at least two third and fourth vector graphic data that are in contact with each other by a vector line segment that does not have the line segment region, the area region, and the double structure. Shape data, the second vector graphic data without the double structure, and is to create the drawing data based on said third and fourth vector graphic data after the division. 11A to 11C, when there are overlapping line segment regions having different vector line lengths, the vector line segments are different from each other as shown in FIG. The details of the processing in the case of having an area area intersecting with the first vector graphic data are mentioned. As shown in FIGS. 11 (A), 11 (B), and 12 (A), when the second vector graphic data has a double structure, the third and the third that are in contact with each other by the common vector line segment. Divide into 4 vector graphic data. As shown in FIG. 11C, when the second vector graphic data does not have a double structure, the subsequent division processing is not performed. Although there are various types of division processing here, the embodiment refers to the case of division into two, but it may be divided into three or more.

A third feature of the pattern forming method according to the present invention is that, in the pattern forming method according to the second feature, when the first vector graphic data includes the line segment region, the overlapping line segment region is determined. The second vector graphic data is created by synthesizing the removed vector graphic data, and when the first vector graphic data has the area area, logical OR synthesis of the corresponding vector graphic data is performed. When the second vector graphic data is created and the first or second vector graphic data has the double structure, the maximum and minimum points in the first direction of the inner vector graphic data are A division line candidate orthogonal to the first direction is set at a substantially intermediate position between the second line and a portion where no vertex of the inner vector graphic data exists on the division line candidate as the division line. Dividing the vector graphics data is to create the third and fourth vector graphic data.
As shown in FIGS. 11A to 11C, when there are overlapping line segment areas having different lengths, the overlapping line segment areas are removed, and the vector figure after removal is removed. The second vector graphic data is created by combining the data. Further, as shown in FIG. 12A, when the vector line segment has an area area intersecting with the other first vector graphic data, the second vector graphic data is subjected to the logical sum synthesis of the corresponding vector graphic data. Is to create. Furthermore, as shown in FIG. 11A, FIG. 11B, and FIG. 12A, when the first or second vector graphic data has a double structure, the first vector graphic data inside A division line candidate that is orthogonal to the first direction is set at an approximately middle position between the maximum point and the minimum point in the direction of, and a portion where the vertex of the inner vector graphic data does not exist on the division line candidate is set as a division line The second vector graphic data is divided to create third and fourth vector graphic data. It should be noted that the setting position of the division line candidate is preferably set to a position where the areas of the third and fourth vector graphic data after division are substantially the same. Further, the division line candidates are orthogonal to the first direction, but if the first direction is the scan line scanning direction, the line segment in the direction orthogonal to the scan line scanning direction is the division line candidate. Become. On the other hand, if the first direction is a direction orthogonal to the scan line scanning direction, the division line candidate becomes a direction that matches the scan line scanning direction. Further, depending on the shape of the vector graphic data, the first direction may be a direction that forms a predetermined angle with respect to the scan line direction.

  According to a fourth feature of the pattern forming method of the present invention, in the pattern forming method according to the third feature, when the first or second vector graphic data has the double structure, an inner vector is provided. A division line candidate orthogonal to the first direction is set at a midpoint position between the maximum point and the minimum point in the first direction of the graphic data, and the vertex of the inner vector graphic data is set on the division line candidate. Is present, a position moved by a predetermined amount in the ± direction from the division line candidate, and a position where the vertex of the inner vector graphic data does not exist is set as the new division line candidate as the second vector graphic data. Is divided to create the third and fourth vector graphic data. As shown in FIG. 12B, when the vertex of the inner vector graphic data exists on the division line candidate set when the vector graphic data has a double structure, the division line candidate is separately set. There is a need. Therefore, according to the present invention, the second vector graphic data is divided by setting a position that is moved by a predetermined amount in the ± direction from the division line candidate and having no vertex of the inner vector graphic data as a new division line candidate. Thus, the third and fourth vector graphic data are created. Here, it is preferable to set a value corresponding to the raster resolution as the predetermined amount.

  A first feature of the pattern forming apparatus according to the present invention is that the modulated light beam is modulated by using a spatial light modulator that drives a plurality of mirror groups arranged in two directions based on drawing data. A pattern forming apparatus for forming a pattern based on the drawing data on the resin film of the substrate by irradiating a light beam while moving the light beam relative to the substrate coated with the resin film, The analysis means for analyzing a plurality of vector graphic data composed of vector line segments that are the source of the pattern, and as a result of the analysis by the analysis means, when having line segment areas that overlap each other in the length of the vector line segments, When the vector line segment has an area that intersects with other vector graphic data, or when the vector graphic data has a double structure, the vector graphic corresponding to each case Vector graphic deformation means for deforming data to create new vector graphic data that does not have the line segment area, the area area, and the double structure, and a new vector created by the vector graphic deformation means Drawing data creation means for creating the drawing data based on the graphic data and the vector figure data originally not having the line segment area, the area area, and the double structure as a result of the analysis by the analysis means It is in. This is an invention of a pattern forming apparatus that realizes the first feature of the pattern forming method.

  According to a second feature of the pattern forming apparatus of the present invention, in the pattern forming apparatus according to the first feature, the vector graphic deforming means has a length of the vector line segment as a result of analysis by the analyzing means. When there are different line segment areas that overlap each other or when the vector line segment has an area area that intersects with the other first vector graphic data, the line segment areas or the area areas that overlap the vector line segments are removed. Second vector graphic data is created, and when the first vector graphic data or the second vector graphic data after removing the line segment area or the area area has a double structure, Alternatively, the second vector graphic data is divided into at least two third and fourth vector graphic data that are in contact with each other by common vector line segments, and the drawing data creating means A line segment region, the area region and the first vector graphic data not having the double structure, the second vector graphic data not having the double structure, and the third and fourth vectors after the division. The drawing data is created based on the graphic data. This is an invention of a pattern forming apparatus that realizes the second feature of the pattern forming method.

  According to a third aspect of the pattern forming apparatus of the present invention, in the pattern forming apparatus according to the second aspect, the vector graphic deforming unit is configured such that the first vector graphic data includes the line segment area. The overlapping line segment area is removed, and the vector graphic data after the removal is synthesized to create the second vector graphic data. When the first vector graphic data has the area area, the corresponding vector When the second vector graphic data is created by performing a logical sum synthesis of graphic data, and the first or second vector graphic data has the double structure, the inner vector graphic data in the first direction A division line candidate that is orthogonal to the first direction is set at a substantially intermediate position between the maximum point and the minimum point, and the vertex of the inner vector graphic data does not exist on the division line candidate By dividing the second vector graphic data as a division line is to create the third and fourth vector graphic data. This is an invention of a pattern forming apparatus that realizes the third feature of the pattern forming method.

  According to a fourth feature of the pattern forming apparatus of the present invention, in the pattern forming apparatus according to the third feature, the vector graphic deforming means is configured such that the first or second vector graphic data is the double structure. Is set, a division line candidate orthogonal to the first direction is set at a midpoint position between the maximum point and the minimum point in the first direction of the inner vector graphic data, and the division line candidate is set on the division line candidate. If there is a vertex of the inner vector graphic data, a position moved by a predetermined amount in the ± direction from the division line candidate, and a position where the vertex of the inner vector graphic data does not exist is a new division line candidate The second vector graphic data is divided to create the third and fourth vector graphic data. This is an invention of a pattern forming apparatus that realizes the fourth feature of the pattern forming method.

  The exposure apparatus according to the present invention is characterized in that the pattern forming method according to any one of the first to fourth features or the pattern forming apparatus according to any one of the first to fourth features. It is to be used to expose the substrate. In this method, exposure is performed using the one described in the feature of any one of the pattern forming method and the pattern forming apparatus.

  The display panel manufacturing method according to the present invention is characterized in that the pattern forming method according to any one of the first to fourth features or the pattern according to any one of the first to fourth features. It is to manufacture a display panel using a forming apparatus. In this method, a display panel is manufactured using the method described in any one of the features of the pattern forming method or the pattern forming apparatus.

  According to the present invention, there is an effect that it is possible to generate drawing data so that white spots and the like due to overlapping pattern figures do not occur even if coordinate conversion is performed.

It is a figure which shows the concept of the vector-raster conversion process which a pattern generator circuit performs by a scan line system. It is a figure which shows an example when the adjacent pattern figure overlaps by the rounding error at the time of coordinate conversion, or a gap | interval generate | occur | produces. It is a figure which shows schematic structure of the exposure apparatus which concerns on one embodiment of this invention. FIG. 4 is a side view of the exposure apparatus shown in FIG. 3. It is a front view of the exposure apparatus shown in FIG. It is a figure which shows schematic structure of a light beam irradiation apparatus. It is a figure which shows an example of the mirror part of DMD. It is a figure explaining operation | movement of the laser length measurement system provided in the exposure apparatus of FIG. It is a block diagram which shows schematic structure of the main controller 70 shown in FIG.3, FIG6 and FIG.8. It is a figure which shows the functional block which performs creation of vector figure data. It is a 1st figure which shows the detail of the process which the vector figure data processing circuit of FIG. 10 performs. FIG. 11 is a second diagram showing details of processing executed by the vector graphic data processing circuit of FIG. 10. 6 is a flowchart illustrating an example of a method for generating drawing vector data in which white spots do not occur due to overlapping of figures even if coordinate conversion is performed. It is a figure which shows an example of the figure division process of FIG. It is the 1st figure explaining scanning of the substrate concerning a light beam. It is a 2nd figure explaining the scanning of the board | substrate which concerns on a light beam. It is a 3rd figure explaining the scanning of the board | substrate which concerns on a light beam. It is a 4th figure explaining the scanning of the board | substrate which concerns on a light beam. It is a flowchart which shows an example of the manufacturing process of the TFT substrate of a liquid crystal display device. It is a flowchart which shows an example of the manufacturing process of the color filter board | substrate of a liquid crystal display device.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings. In this embodiment, an exposure apparatus will be described as an example of the pattern forming apparatus. FIG. 3 is a view showing the schematic arrangement of an exposure apparatus according to an embodiment of the present invention. 4 is a side view of the exposure apparatus shown in FIG. 3, and FIG. 5 is a front view of the exposure apparatus shown in FIG. The exposure apparatus includes a base 3, an X guide 4, an X stage 5, a Y guide 6, a Y stage 7, a θ stage 8, a chuck 10, a gate 11, a light beam irradiation device 20, linear scales 31, 33, encoders 32, 34, A laser length measurement system, a laser length measurement system control device 40, a stage drive circuit 60, and a main control device 70 are configured. 4 and 5, the laser light source 41 of the laser length measurement system, the laser length measurement system control device 40, the stage drive circuit 60, and the main control device 70 are omitted. In addition to these, the exposure apparatus includes a substrate transfer robot that loads the substrate 1 as a base material into the chuck 10 and unloads the substrate 1 from the chuck 10, a temperature control unit that performs temperature management in the apparatus, and the like. However, these illustrations are also omitted. 3 to 5, the X direction and the Y direction are examples, and it goes without saying that the X direction and the Y direction may be interchanged with each other.

  As shown in FIGS. 3 to 5, the chuck 10 is at a delivery position for delivering the substrate 1. At the delivery position, the substrate 1 is carried into the chuck 10 by a substrate carrying robot (not shown), and the substrate 1 is carried out of the chuck 10 by a substrate carrying robot (not shown). The chuck 10 supports the back surface of the substrate 1 by vacuum suction. A resin film that is an ultraviolet curable resin such as a photoresist is applied to the surface of the substrate 1.

  A gate 11 is provided above the exposure position where the substrate 1 is exposed so as to straddle the base 3. A plurality of light beam irradiation devices 20 are mounted on the gate 11. Although this embodiment shows an example of an exposure apparatus using eight light beam irradiation apparatuses 20, the number of the light beam irradiation apparatuses is not limited to this, and one or two or more light beam irradiations are performed. The present invention is applied to an exposure apparatus using the apparatus.

  FIG. 6 is a diagram showing a schematic configuration of the light beam irradiation apparatus. The light beam irradiation device 20 includes an optical fiber 22, a lens 23, a mirror 24, a DMD (Digital Micromirror Device) 25, a projection lens 26, and a DMD driving circuit 27. The optical fiber 22 introduces an ultraviolet light beam generated from the laser light source unit 21 into the light beam irradiation device 20. The light beam emitted from the optical fiber 22 is irradiated to the DMD 25 through the lens 23 and the mirror 24. The DMD 25 is a spatial light modulator configured by arranging a plurality of minute mirrors that reflect a light beam in two orthogonal directions, and modulates the light beam by changing the angle of each mirror. The light beam modulated by the DMD 25 is irradiated on the surface of the substrate 1 by the head unit 20 a including the projection lens 26. The DMD drive circuit 27 changes the angle of each mirror of the DMD 25 based on the drawing data supplied from the main controller 70.

  As shown in FIGS. 3 to 5, the chuck 10 is mounted on the upper side of the θ stage 8. An X stage 5 and a Y stage 7 are provided below the θ stage 8. The X stage 5 is mounted on four X guides 4 provided on the upper surface of the base 3, and moves in the X direction along the X guides 4. The Y stage 7 is mounted on two Y guides 6 provided on the upper surface of the X stage 5, and moves in the Y direction along the Y guide 6. The θ stage 8 is mounted on the Y stage 7 and controls the rotation of the chuck 10 in the θ direction. The X stage 5, Y stage 7 and θ stage 8 are provided with drive mechanisms (not shown) such as ball screws and motors, linear motors, etc., and each drive mechanism is driven and controlled by the stage drive circuit 60 of FIG. Has been.

  When the θ stage 8 rotates the chuck 10 in the θ direction, the substrate 1 mounted on the chuck 10 is controlled to rotate so that two orthogonal sides coincide with each other in the X direction and the Y direction. The X stage 5 moves in the X direction to move the chuck 10 between the delivery position and the exposure position. When the X stage 5 moves in the X direction at the exposure position, the light beam irradiated from the head unit 20a of each light beam irradiation apparatus 20 scans the surface of the substrate 1 in the X direction. Further, when the Y stage 7 moves in the Y direction, the operation region in the X direction of the light beam emitted from the head unit 20a of each light beam irradiation apparatus 20 moves in the Y direction. As shown in FIG. 3, the main controller 70 outputs a control signal to the stage drive circuit 60 and controls the stage drive circuit 60, whereby the rotation amount and rotation position of the θ stage 8 in the θ direction, the X stage 5. The movement amount and movement position in the X direction and the movement amount and movement position of the Y stage 7 in the Y direction are controlled.

  FIG. 7 is a diagram illustrating an example of a DMD mirror unit. The DMD 25 of the light beam irradiation device 20 is disposed at a predetermined angle θ with respect to the scanning direction (X direction) of the substrate 1 by the light beam from the light beam irradiation device 20. When the DMD 25 is arranged to be inclined with respect to the scanning direction, any one of the plurality of mirrors 25a arranged in two orthogonal directions covers a portion corresponding to the gap between the adjacent mirrors 25a. It can be done without gaps.

  In this embodiment, the chuck 10 moves in the X direction together with the X stage 5 to scan the substrate 1 using the light beam from the light beam irradiation device 20, but the light beam irradiation device. By moving 20, the substrate 1 may be scanned using the light beam from the light beam irradiation device 20. Further, both the chuck 10 and the light beam irradiation device 20 may be moved in the X direction. Similarly, the chuck 10 moves in the Y direction together with the Y stage 7 so that the scanning region of the substrate 1 using the light beam from the light beam irradiation device 20 is changed. The scanning region of the substrate 1 may be changed by using the light beam from the light beam irradiation device 20 by moving. In this case as well, both the chuck 10 and the light beam irradiation device 20 may be moved in the Y direction.

  As shown in FIGS. 3 to 5, a linear scale 31 extending in the X direction is installed on the side edge of the base 3. The linear scale 31 includes a scale for the encoder 32 for detecting the amount of movement of the X stage 5 in the X direction. A linear scale 33 extending in the Y direction is installed on the side edge of the X stage 5. The linear scale 33 includes a scale for the encoder 34 for detecting the amount of movement of the Y stage 7 in the Y direction.

  As shown in FIGS. 3 to 5, an encoder 32 is attached to one side surface of the X stage 5 so as to face the scale of the linear scale 31. The encoder 32 detects the scale of the linear scale 31 and outputs the detected pulse signal to the main controller 70. An encoder 34 is attached to one side surface of the Y stage 7 so as to face the scale of the linear scale 33. The encoder 34 detects the scale of the linear scale 33 and outputs the detected pulse signal to the main controller 70. The main controller 70 counts the pulse signals from the encoders 32 and 34, detects the movement amounts of the X stage 5 in the X direction and the Y stage 7 in the Y direction, and specifies the positions thereof.

  FIG. 8 is a view for explaining the operation of the laser length measurement system provided in the exposure apparatus of FIG. In FIG. 8, the same components as those in FIG. 3 are denoted by the same reference numerals, and the description thereof is omitted. In FIG. 8, only devices necessary for explaining the operation of the laser length measurement system are shown, and the gate 11 and the light beam irradiation device 20 in FIG. 3 are omitted. The laser length measurement system is configured by a known laser interference type length measurement system, and includes a laser light source 41, laser interferometers 42 and 44, and bar mirrors 43 and 45. The bar mirror 43 is attached to one side surface of the chuck 10 that extends in the Y direction. The bar mirror 45 is attached to one side surface of the chuck 10 extending in the X direction.

  The laser interferometer 42 receives the laser light emitted from the laser light source 41 and introduced by the half mirror 46 and the mirror 47. The laser interferometer 42 irradiates the received laser light to the bar mirror 43 and receives the laser light reflected by the bar mirror 43. The laser interferometer 42 measures the interference between the laser light from the laser light source 41 and the laser light reflected by the bar mirror 43 at two locations in the Y direction. The laser interferometer 42 detects the rotation of the chuck 10 by measuring interference at two locations in the Y direction. The laser length measurement system control device 40 takes in the measurement result of the laser interferometer 42 under the control of the main control device 70 and detects the position and rotation of the chuck 10 in the X direction.

  The laser interferometer 44 receives the laser light emitted from the laser light source 41 and introduced by the half mirror 46 and the mirror 48. The laser interferometer 44 irradiates the bar mirror 45 with the received laser light and receives the laser light reflected by the bar mirror 45. The laser interferometer 44 measures the interference between the laser light from the laser light source 41 and the laser light reflected by the bar mirror 45. The laser length measurement system control device 40 receives the measurement result of the laser interferometer 44 under the control of the main control device 70 and detects the position of the chuck 10 in the Y direction. The rotation of the chuck 10 may be detected by measuring interference at two locations in the X direction with the laser interferometer 44. Further, the rotation of the chuck 10 may be detected by both the laser interferometers 42 and 44.

  FIG. 9 is a block diagram showing a schematic configuration of main controller 70 shown in FIGS. 3, 6 and 8. As shown in FIG. 9, the main controller 70 includes a drawing controller 71 that supplies drawing data to the eight DMD drive circuits 27 of the light beam irradiation device 20. The main controller 70 is configured to include other components, but here, the drawing controller 71 will be described. The drawing control unit 71 includes a drawing data memory 72, a bandwidth setting unit 73, a center point coordinate determination unit 74, a coordinate determination unit 75, a drawing figure coordinate memory 82, and a drawing data generation unit 84.

  The drawing figure coordinate memory 82 stores vector figure data obtained by processing CAD / CAM data of a pattern figure to be drawn on the substrate. The drawing data generation unit 84 includes a coordinate calculation circuit 85 and a drawing data generation circuit 86. The coordinate calculation circuit 85 calculates, from the vector graphic data stored in the drawing graphic coordinate memory 82, an intersection point between a straight line (scanning line) in the scanning direction of the substrate by the light beam and a line constituting the pattern graphic. The position where the irradiation of the light beam is started on the substrate 1 and the position where the irradiation of the light beam ends are determined. The drawing data generation circuit 86 draws a pattern by filling the space between the position where the irradiation of the light beam is started and the position where the irradiation of the light beam is finished, which is determined by the coordinate calculation circuit 85, so Generate data. The drawing data memory 72 stores the drawing data generated by the drawing data generation unit 84 using the XY coordinates as addresses. The bandwidth setting unit 73 sets the Y-direction bandwidth of the light beam emitted from the head unit 20a of the light beam irradiation apparatus 20 by determining the range of the Y coordinate of the drawing data read from the drawing data memory 72. To do.

  The laser length measurement system control device 40 detects the position of the chuck 10 in the XY direction before the exposure of the substrate 1 at the exposure position is started. The center point coordinate determination unit 74 determines the XY coordinates of the center point of the chuck 10 before starting the exposure of the substrate 1 based on the position in the XY direction of the chuck 10 detected by the laser length measurement system control device 40. As shown in FIG. 3, when scanning the substrate 1 using the light beam emitted from the light beam irradiation device 20, the main control device 70 controls the stage driving circuit 60, and the X stage 5 performs chuck 10. Is moved in the X direction. When changing the scanning area of the substrate 1, the main controller 70 controls the stage driving circuit 60 to move the chuck 10 in the Y direction by the Y stage 7. In FIG. 9, the center point coordinate determination unit 74 counts the pulse signals from the encoders 32 and 34 to detect the amount of movement of the X stage 5 in the X direction and the amount of movement of the Y stage 7 in the Y direction, respectively. Then, the XY coordinates of the center point of the chuck 10 are determined.

  The coordinate determination unit 75 determines the XY coordinates of the drawing data supplied to the DMD drive circuit 27 of each light beam irradiation device 20 based on the XY coordinates of the center point of the chuck 10 determined by the center point coordinate determination unit 74. The drawing data memory 72 inputs the XY coordinates determined by the coordinate determination unit 75 as an address, and supplies the drawing data stored at the address of the XY coordinates to the DMD drive circuit 27 of each light beam irradiation apparatus 20.

  Hereinafter, vector graphic data creation processing executed by the pattern forming method according to the embodiment of the present invention will be described. FIG. 10 is a diagram showing functional blocks that execute creation of vector graphic data. In FIG. 10, the device for creating vector graphic data includes a CAD / CAM computer 90, a vector graphic data processing circuit 91, and an input device 93. The CAD / CAM computer 90 creates CAD / CAM data of a pattern figure to be drawn on the substrate. The CAD / CAM data created by the CAD / CAM computer 90 is composed of vector graphic data consisting of the coordinates of the start and end points of the lines constituting the pattern graphic and information connecting the two points. The vector graphic data processing circuit 91 generates drawing data from the vector graphic data according to the conditions input from the input device 93 with the CAD / CAM data (vector graphic data) generated by the CAD / CAM computer 90. The vector graphic data processing circuit 91 has an analysis function, a graphic deformation function, and a drawing data creation function. The analysis function analyzes various vector graphic data created by the CAD / CAM computer 90. For example, whether or not the vector line segments constituting the vector graphic data have mutually overlapping line segment areas, whether the vector line segment has an area area intersecting with other vector graphic data, and the vector graphic Analyzes whether or not the data has a double structure. The graphic conversion function transforms a graphic according to the analysis result of vector graphic data. For example, the vector line segments that make up vector graphic data may be modified so that they do not have overlapping line areas of different lengths, or the vector line segments do not have an area area that intersects with other vector graphic data Or the vector graphic data is modified so as not to have a double structure. The drawing data creation function creates vector figure data stored in the drawing figure coordinate memory 82 by converting the coordinates of the transformed vector figure data. The vector graphic data processing circuit 91 is constituted by a general-purpose computer (personal computer) or the like.

  FIG. 11 and FIG. 12 are diagrams showing details of processing executed by the vector graphic data processing circuit of FIG. 10, and a method for generating drawing vector data in which white spots do not occur due to overlapping of graphics even if coordinate conversion is performed. It is a figure which shows the concept of. FIG. 11A and FIG. 11B show a case where two vector graphic data have mutually overlapping line segment regions with different vector line lengths. FIG. 12A shows a case where the vector line segment has an area area intersecting with other vector graphic data. FIG. 11A, FIG. 11B, and FIG. 12A show a case where the vector graphic data has a double structure. The graphic transformation function of the vector graphic data processing circuit 91 transforms the vector graphic data corresponding to each case into new vector graphic data having no line segment area, area area, and double structure. The drawing data creation function of the vector figure data processing circuit 91 creates drawing data based on the newly created vector figure data and the vector figure data originally having no line segment area, area area and double structure, Is stored in the drawing figure coordinate memory 82.

  11 and 12, the scan line scanning direction may be parallel or perpendicular to the scanning direction of the substrate by the light beam, but here, the scanning direction of the substrate by the light beam is the scanning line scanning direction. The same case will be explained. FIG. 11A corresponds to the case where the concave vector graphic 111 and the rectangular vector graphic 112 have overlapping line segment regions having different vector line lengths. In this case, new vector graphic data adjacent so that both vector graphics 111 and 112 are in contact with each other are synthesized and re-divided. In FIG. 11A, for convenience of explanation, the vector graphic 111 and the vector graphic 112 are shown as being slightly separated from each other, but actually have overlapping line segment regions with different vector line lengths. In this case, there are two overlapping vector line segments in the vector graphics 111 and 112.

  Since these two vector line segments may overlap with each other as a result of coordinate conversion, in this embodiment, vector line segments (overlapping portions) that contact each other are removed and the vector lines 111 and 112 A combined vector graphic 113 is created. The vector figure 113 has a double structure in which vector line segments exist on the outside and the inside. Therefore, the coordinate conversion process cannot be performed as it is. In such a case, for the vector graphic 113, the division line candidates 114 are set in the direction perpendicular to the scan line scanning direction. This division line candidate 114 is set at a substantially intermediate position between the maximum value and the minimum value of the vector graphic 113 in the scan line scanning direction. This division line candidate 114 is set so as to divide the inner vector figure almost evenly, avoiding the position where the vertex of the inner vector figure (rectangle) exists. In the case of FIG. 11 (A), the division line candidate 114 is located substantially at the center of the inner vector graphic. Since the divided vector graphics 113a and 113b have a common vector line segment, there is no possibility that the graphics overlap with each other by coordinate conversion. In FIG. 11A, for convenience of explanation, the vector graphic 113a and the vector graphic 113b are shown as being slightly separated from each other, but actually vector line segments that are common to each other overlap each other.

  FIG. 11B shows a case where a pattern having a concave window (hollow figure) is divided in a rectangular vector figure 115. The vector graphic 115 is not a double structure in which a vector exists outside and inside like the vector graphic 113 but is a graphic that can be drawn with a single stroke. That is, there is an overlap of vector line segments. Since there is a possibility that the figures overlap as a result of the coordinate conversion due to the presence of the vector line segment in this way, in this embodiment, the vector figure is removed by removing the vector line segments (overlapping portions) that are in contact with each other. 116 is created. Since this vector graphic 116 has a double structure in which the vector exists on the outside and the inside, the coordinate conversion process cannot be performed as it is. In such a case, the division line candidate 117 is set for the vector graphic 116 in the direction perpendicular to the scan line scanning direction. This divided line candidate 117 is set at a substantially intermediate position between the maximum value and the minimum value of the vector graphic 116 in the scan line scanning direction, as in the case described above. This division line candidate 117 is set so as to divide the inner vector figure almost evenly, avoiding the position where the vertex of the inner vector figure (concave shape) exists. In the case of FIG. 11B, the division line candidate 117 is located approximately at the center of the inner vector graphic. Since the divided vector graphics 116a and 116b have a common vector line segment, there is no possibility that the graphics overlap each other by coordinate conversion. In FIG. 11B, for convenience of explanation, the vector graphic 116a and the vector graphic 116b are shown as being slightly separated from each other, but actually vector line segments that are common to each other overlap.

  FIG. 11C shows a case where adjacent patterns are synthesized such that the L-shaped vector graphic 118 and the rectangular vector graphic 119 are in contact with each other. In FIG. 11C, for convenience of explanation, the vector graphic 118 and the vector graphic 119 are shown as being slightly separated. In this case, there are overlapping line segment regions having different vector line lengths of the vector graphics 118 and 119. Since there is a possibility that the figures overlap as a result of the coordinate conversion due to the presence of the vector line segment in this way, in this embodiment, the vector figure is removed by removing the vector line segments (overlapping portions) that are in contact with each other. 11A is created. Since the created vector figure 11A is a figure that can be drawn with a single stroke, there is no need for the division processing as shown in FIGS.

  FIG. 12A shows a pattern in which a concave vector graphic 121 and a rectangular vector graphic 122 partially overlap each other (overlapping graphic). That is, the vector line segment of the vector graphic 121 has an area area where it intersects with another vector graphic 122. As described above, when the vector graphics 121 and 122 have area areas that overlap each other, the raster-on determination process determines that the vector graphic 121 and 122 are not turned on and causes white spots. In this embodiment, the logical sum synthesis of the vector graphics 121 and 122 overlapping each other is executed to create the vector graphics 123 synthesized by the logical sum. Since the vector figure 123 has a double structure in which vector line segments exist outside and inside, the coordinate conversion process cannot be performed as it is. In such a case, the division line candidate 124 is set in a direction perpendicular to the scan line scanning direction as in the process performed in FIG. This divided line candidate 124 is set at a substantially intermediate position between the maximum value and the minimum value of the vector graphic 123 in the scan line scanning direction, as in the case described above. This division line candidate 124 is set so as to divide the inner vector graphic almost evenly, avoiding the position where the vertex of the inner vector graphic (rectangle) exists. Since the divided vector figures 123a and 123b have a common vector line segment, there is no possibility that the figures overlap each other by coordinate conversion. In FIG. 12A, for convenience of explanation, the vector figure 123a and the vector figure 123b are shown as being slightly separated from each other, but actually vector line segments that are common to each other overlap each other.

  FIG. 12B is a diagram showing the reason for avoiding the position where the vertex of the inner figure exists when dividing a vector figure having a double structure (hollow figure) having a concave window in the rectangular vector figure 116. It is. A vector graphic 116 shown in FIG. 12B is the same as FIG. For this vector graphic 116, a division line must be set in a direction perpendicular to the scan line scanning direction. However, if the division line candidate 125 is set at a position where the vertex of the inner vector graphic (concave shape) exists, the division is performed. Since the subsequent vector graphics 116c and 116d have portions having vector line segments that are not common to each other, there is a possibility that the graphics overlap each other by coordinate conversion at that location. In FIG. 12B, for convenience of explanation, the vector graphic 116c and the vector graphic 116d are shown as being slightly separated from each other, but in reality, vector line segments that are common to each other overlap each other.

  FIG. 13 is a flowchart illustrating an example of a method for generating drawing vector data in which white spots do not occur due to overlapping of figures even if coordinate conversion is performed. In step S131, it is determined whether or not two figures are overlapped, that is, whether or not the vector line segment has an area area intersecting with other vector figure data, and there is no area area that does not overlap (no). If so, the process proceeds to the next step S132. If the overlapping area area is present (yes), the process proceeds to step S136. In step S132, it is determined whether or not two figures have vector line segments that overlap each other, that is, whether or not they have line segment regions that overlap each other with different lengths, and overlap vector line segments (line segment regions). ) (Yes), the process proceeds to the next step S133, and if there is no overlapping vector line segment (line segment region) (no), the process ends. In step S133, the overlapping vector line segment (line segment region) is removed, and two graphics are combined. In step S134, it is determined whether or not a figure is generated inside the synthesized figure created by the synthesis process, that is, whether or not the synthesized figure is a hollow figure (having a double structure). If there is a double structure (yes), the process proceeds to step S135, and if there is no hollow structure (no), the process ends. In step S135, a graphic dividing process as shown in FIG. 11 or FIG. 12 is executed for the hollow graphic. In step S136, since it is determined that the two graphics overlap each other, that is, the vector line segment has an area area intersecting with other vector graphic data, the logical OR synthesis processing of the graphics is performed as shown in FIG. And combine two figures. In step S137, as in step S134, whether or not a figure is generated inside the synthesized figure created by the logical sum synthesis process, that is, whether or not the synthesized figure is a hollow figure (having a double structure). The determination is made, and if there is a hollow structure with a double structure (yes), the process proceeds to step S138, and if there is no hollow structure and there is no double structure (no), the process ends. In step S138, similar to step S135, the graphic dividing process as shown in FIG. 11 or FIG. 12 is executed.

  FIG. 14 is a diagram illustrating an example of the figure dividing process of FIG. In step S141, the maximum point and the minimum point in the X direction of the inner figure are detected, and the intermediate position is set as a division line candidate. In step S142, it is determined whether or not the vertex of the inner graphic exists on the division line candidate. If the vertex exists (yes), the process proceeds to step S143. If the vertex does not exist (no), the process proceeds to step S144. move on. In step S143, since a vertex exists on the current division line candidate, the position moved by a predetermined amount in the ± direction from the current division line candidate is set as a new division line candidate, and the process returns to step S142. As the predetermined amount here, it is desirable to use a value corresponding to the raster resolution. Only the value corresponding to the raster resolution moves in the ± direction from the current division line candidate, and a position where no vertex exists is set as a new division line candidate. As another example, an intermediate position between the X direction position of the current division line candidate and the minimum or maximum point in the X direction of the inner graphic may be set as a new division line candidate. By repeating the processing of step S142 and step S143, it is possible to detect a divided run candidate having no vertex. In step S144, the composite figure is divided using the division line candidates obtained by the above processing. This processing is executed by a method for obtaining a logical product of figures. In the above-described embodiment, the case where the division line candidate is orthogonal to the scan line scanning direction has been described. However, if the division line candidate is set in a direction parallel to the scan line scanning direction, the division line candidate is the scan line. The direction coincides with the scanning direction. Further, depending on the shape of the vector graphic data, the direction of the division line candidate may be freely changed at a predetermined angle with respect to the scan line scanning direction. In the above-described embodiment, the case of dividing a vector graphic into two parts has been described. However, the present invention is not limited to this, and it goes without saying that the vector figure may be divided into three or more parts.

  15 to 18 are diagrams for explaining the scanning of the substrate according to the light beam. 15 to 18 show an example in which the entire substrate 1 is scanned by performing four scans in the X direction of the substrate 1 with eight light beams from the eight light beam irradiation apparatuses 20. 15-18, the head part 20a of each light beam irradiation apparatus 20 is shown with the broken line. The light beam emitted from the head unit 20a of each light beam irradiation device 20 has a bandwidth W in the Y direction, and the substrate 1 is scanned in the direction indicated by the arrow by the movement of the X stage 5 in the X direction.

FIG. 15 shows the first scanning, and the pattern is drawn in the scanning area shown in gray in FIG. 15 by the first scanning in the X direction. When the first scanning is completed, the substrate 1 is moved in the Y direction by the same distance as the bandwidth W by the movement of the Y stage 7 in the Y direction.
FIG. 16 shows the second scan, and the pattern is drawn in the scan area shown in gray in FIG. 16 by the second scan in the X direction. When the second scan is completed, the substrate 1 is moved in the Y direction by the same distance as the bandwidth W by the movement of the Y stage 7 in the Y direction.
FIG. 17 shows the third scan, and a pattern is drawn in the scan area shown in gray in FIG. 17 by the third scan in the X direction. When the third scan is completed, the substrate 1 is moved in the Y direction by the same distance as the bandwidth W by the movement of the Y stage 7 in the Y direction.
FIG. 18 shows the fourth scan. With the fourth scan in the X direction, the pattern is drawn in the scan area shown in gray in FIG. 18, and the scan of the entire substrate 1 is completed.

  By scanning the substrate 1 in parallel with a plurality of light beams from the plurality of light beam irradiation apparatuses 20, the time required for scanning the entire substrate 1 can be shortened, and the tact time can be shortened. 15 to 18 show an example in which the substrate 1 is scanned four times by scanning the substrate 1 in the X direction. However, the number of scans is not limited to this, and the substrate 1 is scanned in the X direction. May be performed 3 times or less or 5 times or more to scan the entire substrate 1.

  According to the embodiment described above, drawing data at the same position in the exposure area is supplied to the DMD driving circuit 27 of the light beam irradiation apparatus 20 a plurality of times, and a part of the drawing data supplied a plurality of times is supplied to the exposure area. By supplying drawing data at adjacent positions to the DMD driving circuit 27 of the light beam irradiation device 20, the jagged edges of the pattern can be made inconspicuous, and the generation of moire can be suppressed to improve the drawing quality. .

  By performing exposure of the substrate using the exposure apparatus or exposure method of the present invention, the jagged edges of the pattern can be made inconspicuous, and the generation of moire can be suppressed to improve the drawing quality. A display panel substrate can be manufactured.

  For example, FIG. 19 is a flowchart showing an example of the manufacturing process of the TFT substrate of the liquid crystal display device. In the thin film forming step (step S191), a thin film such as a conductor film or an insulator film, which becomes a transparent electrode for driving liquid crystal, is formed on the substrate by sputtering, plasma chemical vapor deposition (CVD), or the like. In the resist coating process (step S192), a photoresist is coated by a roll coating method or the like to form a photoresist film on the thin film formed in the thin film forming process (step S191). In the exposure step (step S193), a pattern is formed on the photoresist film using an exposure apparatus. In the development process (step S194), a developer is supplied onto the photoresist film by a shower development method or the like to remove unnecessary portions of the photoresist film. In the etching process (step S195), a portion of the thin film formed in the thin film formation process (step S191) that is not masked by the photoresist film is removed by wet etching. In the stripping step (step S196), the photoresist film that has finished the role of the mask in the etching step (step S195) is stripped with a stripping solution. Before or after each of these steps, a substrate cleaning / drying step is performed as necessary. These steps are repeated several times to form a TFT array on the substrate.

  FIG. 20 is a flowchart showing an example of the manufacturing process of the color filter substrate of the liquid crystal display device. In the black matrix forming step (step S201), a black matrix is formed on the substrate by processes such as resist coating, exposure, development, etching, and peeling. In the colored pattern forming step (step S202), a colored pattern is formed on the substrate by a staining method, a pigment dispersion method, or the like. This process is repeated for the R, G, and B coloring patterns. In the protective film forming step (step S203), a protective film is formed on the colored pattern, and in the transparent electrode film forming step (step S204), a transparent electrode film is formed on the protective film. Before, during or after each of these steps, a substrate cleaning / drying step is performed as necessary.

  In the TFT substrate manufacturing process shown in FIG. 19, in the exposure process (step S193), in the color filter substrate manufacturing process shown in FIG. 20, in the black matrix forming process (step S201) and the colored pattern forming process (step S202). In this exposure process, the exposure apparatus or the exposure method of the present invention can be applied.

  In the above-described embodiment, the TFT substrate or the color filter substrate is described as an example of the substrate to which the ultraviolet curable resin is applied, but the light beam is spatially modulated on the substrate to which the photocurable resin is applied. It is possible to apply to a device in which a predetermined pattern is drawn on a photo-curing resin by performing modulated irradiation using a container.

  In addition, in this specification, a base material is a concept including a plate shape (what is usually called a board | substrate) and a film-like thing. Resins that cause a chemical reaction such as polymerization and curing by light of a specific wavelength include ultraviolet curable resins such as photoresists, resins used for plate making such as screen printing, resins for holographic recording media, and rapid prototyping. Including the above resin.

  The pattern forming method and apparatus according to the present embodiment can be applied to a substrate (substrate, film, etc.) using a printing technique used in the field of printable electronics for creating a display circuit or an electronic component on a flexible substrate or the like by a printing (printable) technique. The present invention is applicable to the technical field of patterning a printing plate (mask) on a resinous material (including a resinous material). In addition, the light modulated according to the image data is imaged on the photosensitive layer, the photosensitive layer is exposed, and a high-definition permanent pattern (protective film) in the printed wiring substrate field or semiconductor field including the package substrate Further, the present invention can be applied to a pattern forming apparatus that efficiently forms an interlayer insulating film and a solder resist pattern. Examples of circuits created by such a printing technique include electronic paper, electronic signboards, and printable TFTs.

The pattern forming method according to this embodiment can be applied to the field of surface modification of a substrate using a resin that causes a chemical reaction such as polymerization or curing by light of a specific wavelength. Further, the present invention can also be applied to the field of forming a pattern such as a chip-like (repair) wiring of a semiconductor through-silicon via (TSV).
In addition to this, the present invention can also be applied to an apparatus for making a printing plate, a plate making apparatus for a rotary press, a stencil printing such as a lithograph or a preport or a stencil printing apparatus. For plate making equipment such as screen printing, semiconductor device repair methods and equipment, printed wiring board manufacturing equipment including package base materials, fine electrode patterns such as flat panel displays and printed base materials, or pattern making equipment for exposure masks Is also applicable.
Substrates include wafers, printed substrates, flat panel displays, masks, reticles, and the like, as well as plates used for copying magazines, newspapers and books, and those formed into films.

DESCRIPTION OF SYMBOLS 1 ... Board | substrate 10 ... Chuck 11 ... Gate 20 ... Light beam irradiation apparatus 20a ... Head part 21 ... Laser light source unit 22 ... Optical fiber 23 ... Lens 24 ... Mirror 25 ... DMD (Digital Micromirror Device)
25a ... Mirror 26 ... Projection lens 27 ... DMD drive circuit 3 ... Base 31, 33 ... Linear scale 32, 34 ... Encoder 4 ... X guide 40 ... Laser measuring system controller 41 ... Laser light source 42, 44 ... Laser interferometer 43 , 45 ... Bar mirror 46 ... Half mirror 47, 48 ... Mirror 5 ... X stage 6 ... Y guide 60 ... Stage drive circuit 7 ... Y stage 70 ... Main controller 71 ... Drawing controller 72 ... Drawing data memory 73 ... Bandwidth Setting unit 74 ... center point coordinate determination unit 75 ... coordinate determination unit 8 ... θ stage 82 ... drawing figure coordinate memory 84 ... drawing data generation unit 85 ... coordinate calculation circuit 86 ... drawing data generation circuit 90 ... CAD / CAM computer 91 ... Vector graphic data processing circuit 93 ... input device

Claims (10)

A light beam is modulated using a spatial light modulator that drives a plurality of mirror groups arranged in two directions based on drawing data, and the modulated light beam is applied to a substrate coated with a resin film. A pattern forming method for forming a pattern based on the drawing data on the resin film of the substrate by irradiating while relatively moving,
Analyzing a plurality of vector graphic data composed of vector line segments that are the basis of the pattern,
When the vector line segments have mutually overlapping line segment areas, when the vector line segments have an area area intersecting with other vector graphic data, or when the vector graphic data has a double structure, The vector graphic data corresponding to each case is transformed to create new vector graphic data that does not have the line segment region, the area region, and the double structure, A pattern forming method, characterized in that the drawing data is created based on vector graphic data that originally does not have the line segment region, the area region, and the double structure. In the pattern formation method of Claim 1,
As a result of the analysis, when the vector line segments have mutually overlapping line segment regions or the vector line segments have an area region intersecting with other first vector graphic data, the vector line segments Removing the overlapping line segment area or the area area to create second vector graphic data;
When the first vector graphic data or the second vector graphic data after removal of the line segment region or the area region has a double structure, the first or second vector graphic data is common to each other. Divide into at least two third and fourth vector graphic data that touch at a vector line segment,
The line segment region, the area region and the first vector graphic data not having the double structure, the second vector graphic data not having the double structure, and the third and fourth after the division A pattern forming method, wherein the drawing data is created based on vector graphic data. In the pattern formation method of Claim 2,
If the line segment area is included, the overlapping line segment area is removed, and the second vector graphic data is created by combining the vector graphic data after removal,
When the area area is included, the second vector graphic data is created by performing a logical OR synthesis of the corresponding vector graphic data,
In the case of having the double structure, a division line candidate orthogonal to the first direction is set at a substantially intermediate position between the maximum point and the minimum point in the first direction of the inner vector graphic data, and the division A pattern characterized in that the third and fourth vector graphic data are created by dividing the second vector graphic data by using a part where a vertex of the inner vector graphic data does not exist on a line candidate as a division line. Forming method. In the pattern formation method of Claim 3,
In the case of having the double structure, a division line candidate orthogonal to the first direction is set at the midpoint position between the maximum point and the minimum point in the first direction of the inner vector graphic data, and the division When the vertex of the inner vector graphic data exists on the line candidate, a position moved by a predetermined amount in the ± direction from the division line candidate and a position where the vertex of the inner vector graphic data does not exist is newly added. A pattern forming method comprising: dividing the second vector graphic data as a candidate for a divided line to create the third and fourth vector graphic data. A light beam is modulated using a spatial light modulator that drives a plurality of mirror groups arranged in two directions based on drawing data, and the modulated light beam is applied to a substrate coated with a resin film. A pattern forming apparatus for forming a pattern based on the drawing data on the resin film of the substrate by irradiating while relatively moving,
Analyzing means for analyzing a plurality of vector graphic data composed of vector line segments that are the basis of the pattern;
As a result of analysis by the analyzing means, when the vector line segments have mutually overlapping line segment areas, the vector line segments have area areas intersecting with other vector graphic data, or the vector graphic data is A vector graphic that creates new vector graphic data that does not have the line segment region, the area region, and the dual structure by modifying the vector graphic data corresponding to each case when it has a double structure. Deformation means;
As a result of the analysis of the new vector graphic data created by the vector graphic deforming means and the analyzing means, the drawing data is obtained based on the vector graphic data originally not having the line segment area, the area area and the double structure. A pattern forming apparatus comprising: drawing data creating means for creating. 6. The pattern forming apparatus according to claim 5, wherein the vector graphic deformation means is
As a result of analysis by the analyzing means, when the vector line segments have mutually overlapping line segment regions or when the vector line segment has an area region intersecting with other first vector graphic data, the vector Creating the second vector graphic data by removing the line segment region or the area region overlapping each other,
When the first vector graphic data or the second vector graphic data after removal of the line segment region or the area region has a double structure, the first or second vector graphic data is common to each other. Divide into at least two third and fourth vector graphic data that touch at a vector line segment,
The drawing data creation means includes the line segment region, the area region, the first vector graphic data not having the double structure, the second vector graphic data not having the double structure, and the divided data A pattern forming apparatus that creates the drawing data based on the third and fourth vector graphic data. The pattern forming apparatus according to claim 6, wherein the vector graphic deformation means is
If the line segment area is included, the overlapping line segment area is removed, and the second vector graphic data is created by combining the vector graphic data after removal,
When the area area is included, the second vector graphic data is created by performing a logical OR synthesis of the corresponding vector graphic data,
In the case of having the double structure, a division line candidate orthogonal to the first direction is set at a substantially intermediate position between the maximum point and the minimum point in the first direction of the inner vector graphic data, and the division A pattern characterized in that the third and fourth vector graphic data are created by dividing the second vector graphic data by using a part where a vertex of the inner vector graphic data does not exist on a line candidate as a division line. Forming equipment. 8. The pattern forming apparatus according to claim 7, wherein the vector graphic deformation means is
In the case of having the double structure, a division line candidate orthogonal to the first direction is set at the midpoint position between the maximum point and the minimum point in the first direction of the inner vector graphic data, and the division When the vertex of the inner vector graphic data exists on the line candidate, a position moved by a predetermined amount in the ± direction from the division line candidate and a position where the vertex of the inner vector graphic data does not exist is newly added. A pattern forming apparatus characterized in that the third vector graphic data is generated by dividing the second vector graphic data as a possible division line candidate.   An exposure apparatus that performs exposure of a substrate using the pattern forming method according to any one of claims 1 to 4 or the pattern forming apparatus according to any one of claims 5 to 8.   A display panel is manufactured using the pattern forming method according to any one of claims 1 to 4 or the pattern forming apparatus according to any one of claims 5 to 8. Panel manufacturing method.

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