JP2014044169A - Voltage measurement sensor and voltage measurement device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To measure a voltage with high accuracy by sufficiently reducing influence of a disturbance.SOLUTION: A voltage measurement sensor comprises: a first shield electrode that is composed of a first shield electrode conductor layer 51 and that is connected to a reference potential; and a detection electrode 31 that is composed of a detection electrode conductor layer 41 formed on the first shield electrode conductor layer 51 in a state of being insulated from the first shield electrode conductor layer 51 and that is connected to a voltage measurement unit, and also comprises a second shield electrode that is composed of a second shield electrode conductor layer 52 formed on the detection electrode conductor layer 41 in a state of being insulated from the detection electrode conductor layer 41, that is provided with an opening 34, for allowing the detection electrode 31 to detect a voltage, in an area facing the detection electrode 31, and that is connected to "the reference potential".

Description

  The present invention relates to a voltage measurement sensor including a detection electrode and a shield electrode, and a voltage measurement device including the voltage measurement sensor.

  For example, Japanese Patent Application Laid-Open No. 2010-169568 discloses a voltage that is arranged on a clip in an electrostatic induction detector such as a phase detector or a voltage detector so that a voltage can be measured without contact with a conductor to be measured. A sensor is disclosed. In this voltage sensor, a sensor electrode is constituted by a surface conductive layer formed by attaching a copper foil layer to a surface layer of a printed wiring board, and a first conductive material formed by attaching a copper foil layer to an inner layer of the printed wiring board. The shield electrode is constituted by the layers. In this case, in this voltage sensor, the above-mentioned surface conductive layer (sensor electrode) and the first conductive layer (shield electrode) are formed to have substantially the same size (width) as the printed wiring board, and both conductor layers Are opposed to each other in a state where they are insulated from each other across the surface substrate layer in the printed wiring board. Thereby, in this voltage sensor, it is possible to detect the potential of the conductor to be measured by using one surface side of the printed wiring board as a sensor surface and the other surface side as a shield surface.

JP 2010-169568 (page 4-8, Fig. 1-4)

  However, the conventional voltage sensor has the following problems to be solved. That is, in the conventional voltage sensor, the surface conductive layer and the first conductive layer arranged opposite to each other with the surface substrate layer interposed therebetween are used as the sensor electrode and the shield electrode, so that one surface side of the printed wiring board is used as the sensor surface, and the other A configuration is employed in which the surface side functions as a shield surface. Thereby, in this voltage sensor, it is possible to reduce the influence of disturbance from the shield surface side on the sensor electrode. However, the conventional voltage sensor has a configuration in which no shield electrode exists above the sensor electrode (that is, the sensor surface side of the voltage sensor) in order to enable voltage detection by the sensor electrode. For this reason, the conventional voltage sensor has a problem that it is easily affected by disturbance from the sensor surface side.

  The present invention has been made in view of such a problem to be solved, and mainly provides a voltage measuring sensor and a voltage measuring apparatus capable of measuring a voltage with high accuracy by sufficiently reducing the influence of disturbance. Objective.

  In order to achieve the above object, a voltage measurement sensor according to claim 1 is constituted by a first conductor layer and is insulated from the first conductor layer and a first shield electrode connected to a reference potential of the voltage measurement device. A voltage measuring sensor comprising a detection electrode configured by a second conductor layer formed on the first conductor layer and connected to a voltage measuring unit of the voltage measuring device, Voltage detection by the detection electrode in at least a part of the region that is configured by the third conductor layer formed on the second conductor layer in a state of being insulated from the second conductor layer and that faces the detection electrode And a second shield electrode connected to the reference potential.

  The voltage measuring sensor according to claim 2 is the voltage measuring sensor according to claim 1, further comprising a fourth conductor layer formed between the first conductor layer and the third conductor layer. A connection conductor connected to the detection electrode is provided.

  Furthermore, the voltage measurement sensor according to claim 3 is the voltage measurement sensor according to claim 2, wherein the second conductor layer and the fourth conductor layer are formed in the same layer, and the second conductor layer and the The second conductor layer and the fifth conductor layer formed in the same layer as the fourth conductor layer so as to surround the detection electrode and the connection conductor in a state of being insulated from the fourth conductor layer, and A third shield electrode connected to the reference potential is provided.

  The voltage measurement sensor according to claim 4 is the voltage measurement sensor according to any one of claims 1 to 3, wherein the detection electrode is connected to a measurement target conductor positioned at a predetermined measurement position. A first voltage detector that is opposed to the first voltage detector; and the measurement target conductor that is disposed across the first voltage detector so as to extend from the first voltage detector and is displaced in the line width direction from the measurement position. And a pair of second voltage detectors opposed to each other.

  Furthermore, the voltage measurement sensor according to claim 5 is the voltage measurement sensor according to claim 4, wherein the first voltage detection unit is along a wire length direction of the measurement target conductor positioned at the measurement position. The length of the second voltage detection unit is set to be longer than the length along the line width direction. The length is defined to be shorter than the length along the line length direction, and each area is smaller than the area of the first voltage detection unit.

  According to a sixth aspect of the present invention, there is provided a voltage measuring apparatus including the voltage measuring sensor according to any of the first to fifth aspects.

  According to the voltage measurement sensor of claim 1, the non-conductor portion is formed of the third conductor layer formed on the second conductor layer constituting the detection electrode, and at least part of the region facing the detection electrode. By providing the second shield electrode provided with, it is possible to sufficiently reduce the influence of disturbance from above the detection electrode, that is, from above the voltage measurement sensor, and improve the voltage measurement accuracy.

  According to the voltage measurement sensor of claim 2, the connection conductor configured by the fourth conductor layer formed between the first conductor layer and the third conductor layer is provided. Since noise can be suitably avoided, voltage measurement accuracy can be further improved.

  Furthermore, according to the voltage measuring sensor of claim 3, the third shield formed of the fifth conductor layer formed in the same layer as the second conductor layer and the fourth conductor layer so as to surround the detection electrode and the connection conductor. By providing an electrode, it is possible to sufficiently reduce the influence of disturbance from the side of the detection electrode, that is, the side of the voltage measuring sensor, and more appropriately avoid noise from entering the connecting conductor. Therefore, the voltage measurement accuracy can be further improved.

  According to the voltage measurement sensor of claim 4, the first voltage detector that is opposed to the measurement target conductor positioned at the measurement position, and the measurement target conductor that is displaced in the line width direction from the measurement position By configuring the detection electrode with a pair of second voltage detection units opposed to each other, the voltage detection sensitivity can be sufficiently improved when the measurement target conductor is located at the measurement position, Even if the measurement target conducting wire is displaced from the measurement position, the voltage can be detected.

  Further, according to the voltage measurement sensor of claim 5, the detection electrodes are excessively enlarged by forming each of the second voltage detection parts so as to have a shorter area than the first voltage detection part. (Wide) makes it possible to detect the voltage suitably without inviting a state of being easily affected by disturbance.

  In addition, according to the voltage measuring device according to claim 6, by providing the voltage measuring sensor according to any one of claims 1 to 5, the influence of the disturbance is sufficiently reduced and the voltage measurement accuracy is improved. Can be made.

1 is a configuration diagram showing a configuration of a non-contact voltage measuring device 1. FIG. 3 is a cross-sectional view showing an internal structure of a sensor unit 3. FIG. It is the sectional view on the AA line in FIG. 1 of the sensor board | substrate 30 for voltage measurement. FIG. 3 is a cross-sectional view of the voltage measurement sensor substrate 30 taken along line BB in FIG. 1. FIG. 3 is a cross-sectional view of a state in which a measurement target conductor X is positioned at a measurement position so as to be sandwiched between a sensor substrate housing part 22 and a measurement target conductor pressing part 23 of the casing 21. FIG. 6 is an explanatory diagram for explaining a positional relationship between a detection electrode 31 (first voltage detection unit 31a and second voltage detection unit 31b) and a measurement target conductive wire X in the voltage measurement sensor substrate 30; It is sectional drawing of the sensor board | substrate 70 for voltage measurement. 3 is a cross-sectional view of a voltage measurement sensor substrate 80. FIG. It is sectional drawing of the sensor board | substrate 90 for voltage measurement.

  Embodiments of a voltage measuring sensor and a voltage measuring device according to the present invention will be described below with reference to the accompanying drawings.

  A non-contact voltage measuring device 1 shown in FIG. 1 is an example of a “voltage measuring device”, and is configured by connecting a device body 2 and a sensor unit 3 to each other by a signal cable 4. In this case, as shown in FIG. 5, the sensor unit 3 sets the AC voltage potential of the measurement target lead X to the measurement target lead X in a state where the measurement target lead X (measurement target) is held. As shown in FIGS. 2 and 5, the sensor for detecting by contact includes a casing 21 and a sensor substrate 30 for voltage measurement.

  The casing 21 is formed of a non-conductive resin material so as to be able to receive the voltage measurement sensor substrate 30, and is formed of a non-conductive resin material and accommodates the sensor substrate via the rotation shaft 24. And a measuring object conductor pressing portion 23 that is pivotally supported so as to be rotatable in a direction indicated by an arrow D with respect to the portion 22 (in a direction toward and away from the sensor substrate housing portion 22). In this case, as shown in FIG. 5, in this sensor unit 3, a conductive sponge formed by foaming a conductive resin material between the inner surface of the sensor substrate housing unit 22 and the surface of the voltage measurement sensor substrate 30 is used. 25 is arranged. In this case, instead of the conductive sponge 25 described above, the surface of a foamed resin (sponge) obtained by foaming a non-conductive resin material is coated with carbon or deposited with a conductive metal material. It is also possible to dispose one provided with. Further, in place of the foamed resin (sponge) such as the conductive sponge 25, a non-foamable resin having conductivity, carbon fiber, or the like may be provided.

  The voltage measurement sensor substrate 30 is an example of a “voltage measurement sensor”, and includes a detection electrode 31 and a shield electrode 32 as shown in FIG. 1 and an opening that allows voltage detection by the detection electrode 31. A portion 34 (an example of a “non-conductor portion”) is provided. In addition, in the same figure, the CC board | substrate cross section in FIG.3, 4 is shown regarding the sensor board | substrate 30 for voltage measurement. As shown in FIGS. 3 and 4, the voltage measurement sensor substrate 30 constitutes a “first shield electrode”, a detection electrode conductor layer 41 that constitutes the detection electrode 31 and the connection conductor 33 a (see FIG. 1). The first shield electrode conductor layer 51, the second shield electrode conductor layer 52 constituting the "second shield electrode", the third shield electrode conductor layer 53 constituting the "third shield electrode", and the detection electrode conductor layer 41 and the first shield electrode conductor layer 51 are insulated from each other, and the detection electrode conductor layer 41 and the third shield electrode conductor layer 53 are insulated from each other. Each layer is formed in accordance with a known multilayer substrate manufacturing process, and configured to detect a voltage using the surface on the second shield electrode conductor layer 52 side as a sensor surface.

  In this case, in the voltage measurement sensor substrate 30 of this example, the first shield electrode conductor layer 51 corresponds to the “first conductor layer”, and the detection electrode conductor layer 41 corresponds to the “second conductor layer” and the “fourth conductor layer”. The second shield electrode conductor layer 52 corresponds to a “third conductor layer”, and the third shield electrode conductor layer 53 corresponds to a “fifth conductor layer”. In addition, each conductor layer 41 and 51-53 is formed in the thin film shape with high electroconductive metal materials, such as copper and aluminum, as an example.

  Further, as shown in FIG. 3, in the voltage measurement sensor substrate 30 of this example, the detection electrode conductor layer 41 constituting the “second conductor layer” has the first insulating layer 61 sandwiched therebetween for the first shield electrode. For example, a part of the detection electrode conductor layer 41 functions as a “fourth conductor layer” and is connected to connect the detection electrode 31 to the apparatus main body 2. A conductor 33a (see FIG. 1) is formed. Further, as shown in FIG. 4, the first shield electrode conductor layer 51, the second shield electrode conductor layer 52, and the third shield electrode conductor layer 53 are connected to each other by vias 54, and each conductor layer The shield electrode 32 is configured by 51 to 53 and the via 54. In this case, in the voltage measurement sensor substrate 30 of this example, as an example, the shield electrode 32 is connected to the apparatus body 2 by a part of the third shield electrode conductor layer 53 constituting the “third shield electrode”. A connecting conductor 33b (see FIG. 1) is formed.

  As shown in FIGS. 3 and 4, in the voltage measurement sensor substrate 30 of the present example, the second insulating layer 62 is formed on the detection electrode conductor layer 41 constituting the detection electrode 31 (above the detection electrode 31). A second shield electrode conductor layer 52 is formed in a state of being insulated from the detection electrode conductor layer 41 across the electrode to constitute a “second shield electrode”. In this case, in the voltage measurement sensor substrate 30 of the present example, the detection electrode 31 is provided at a portion of the second shield electrode conductor layer 52 that faces the detection electrode 31 and a portion of the second insulating layer 62 that faces the detection electrode 31. An opening 34 (a cross-shaped opening in plan view) that is slightly smaller than that is provided, and voltage detection by the detection electrode 31 is allowed. Note that the opening 34 as the “non-conductor portion” can be formed in the same size as the detection electrode 31 or formed in a plan view shape different from the detection electrode 31 and smaller than the detection electrode 31. You can also.

  Further, as shown in FIGS. 3 and 4, in the voltage measurement sensor substrate 30 of the present example, the third shield electrode conductor layer is formed in the same layer as the detection electrode conductor layer 41 so as to surround the detection electrode 31 and the connection conductor 33a. 53 is formed to constitute a “third shield electrode”. In this case, the detection electrode conductor layer 41 and the third shield electrode conductor layer 53 are insulated from each other by the insulating material 64.

  Further, as shown in FIG. 6, in the voltage measurement sensor substrate 30 of this example, the measurement target conductor X (in this example, the measurement target conductor X indicated by a solid line) positioned at a predetermined “measurement position”. The first voltage detection unit 31a, which is a part facing the first voltage detection unit 31a, and the first voltage detection unit 31a are arranged so as to extend from the first voltage detection unit 31a, and the line width direction (in this example, from the “measurement position”) , Opposite to the measurement target conductor X (in this example, the measurement target conductor X indicated by the one-dot chain line and the measurement target conductor X indicated by the two-dot chain line in FIG. 6) displaced in the direction of arrows E1 and E2 in FIGS. The detection electrode 31 is formed in a cross shape in plan view, including a pair of second voltage detection portions 31b that are portions to be detected. 5 and 6, illustration of the shield electrode 32 is omitted.

  In this case, the first voltage detector 31a has a length along the line length direction (in this example, the left-right direction in FIG. 6) of the measurement target conductor X positioned at the “measurement position” described above in the line width direction. It is defined to be longer than the length along the vertical direction in FIG. Further, the second voltage detection unit 31b is defined such that the length along the line length direction of the measurement target conducting wire X is shorter than the length along the line length direction of the first voltage detection unit 31a, and each area is The area is smaller than the area of the first voltage detector 31a.

  On the other hand, as shown in FIG. 1, the apparatus main body 2 includes a reference voltage generation unit 11, a current-voltage conversion unit 12, an operation unit 13, a display unit 14, and a control unit 15. The voltage value of the AC voltage is configured to be measurable. The reference voltage generation unit 11 generates a reference voltage (in this example, a voltage that fluctuates so as to reduce the potential difference with the AC voltage of the measurement target conductor X) according to the control of the control unit 15, and uses the generated reference voltage as a shield electrode. 32 and the current-voltage converter 12. Thereby, in the non-contact voltage measuring apparatus 1 of this example, the shield electrode 32 functions as a “guard electrode” and is maintained at a potential substantially equal to the measurement target conductor X. In this example, the state in which the shield electrode 32 is connected to the reference voltage generation unit 11 that generates the reference voltage corresponds to the state of “connected to the reference potential of the voltage measuring device”. The reference voltage generation unit 11 includes a voltmeter (not shown), measures the voltage value of the reference voltage supplied to the shield electrode 32, and outputs the voltage value to the control unit 15.

  The current-voltage conversion unit 12 forms a “voltage measurement unit” together with the reference voltage generation unit 11 and the control unit 15. This current-voltage conversion unit 12 is based on the potential difference between the AC voltage of the conductor X to be measured and the voltage (reference voltage) of the shield electrode 32 in the voltage measurement sensor substrate 30, and the current-voltage conversion unit 12 measures the current with a current value corresponding to this potential difference. A detection current (hereinafter also referred to as “current signal”) flowing between the lead wire X and the detection electrode 31 is converted into a detection voltage signal and output to the control unit 15. The operation unit 13 includes operation switches for setting measurement conditions and various operation switches (not shown) for instructing measurement start / stop, and outputs an operation signal corresponding to the switch operation to the control unit 15. To do. The display unit 14 displays the voltage value (measurement result) measured by the control unit 15 (that is, measured by the voltmeter of the reference voltage generation unit 11).

  The control unit 15 comprehensively controls the non-contact voltage measuring device 1. Specifically, the control unit 15 controls the reference voltage generation unit 11 to sequentially generate a reference voltage corresponding to a change in the potential of the measurement target conductor X. The control unit 15 controls the reference voltage generation unit 11 (voltmeter) to measure the voltage value of the reference voltage supplied to the shield electrode 32 and is output from the reference voltage generation unit 11 (voltmeter). The displayed voltage value is displayed on the display unit 14 as a measurement result.

  In the voltage measurement process by the non-contact voltage measuring device 1, as shown in FIG. 5, first, measurement is performed so as to be sandwiched between the sensor substrate housing part 22 and the measurement target conductor pressing part 23 in the casing 21 of the sensor part 3. The target conducting wire X is positioned at the measurement position. In this case, in the non-contact voltage measuring apparatus 1 of the present example, as indicated by a broken line in the figure, an alignment mark (as an example, a triangular mark) indicating the “measurement position” is the sensor substrate housing portion 22 and the measurement target conductor. It is marked on the outer surface of the pressing part 23. Accordingly, by positioning the measurement target conductor X at the position indicated by the alignment mark, the measurement target conductor X is positioned at the “measurement position”. At this time, a capacitance is formed between the detection electrode 31 of the voltage measurement sensor substrate 30 and the measurement target conductor X.

  Next, when the measurement start switch of the operation unit 13 is operated, the control unit 15 starts a voltage measurement process. Specifically, the control unit 15 first controls the reference voltage generation unit 11 to generate a reference voltage that fluctuates so that the potential difference from the AC voltage of the measurement target conductor X becomes small. Thereby, the generated reference voltage is supplied to the shield electrode 32 of the sensor unit 3 (voltage measurement sensor substrate 30) via the signal cable 4. In addition, the control unit 15 controls the current / voltage conversion unit 12 to execute processing for converting a current signal into a detection voltage signal.

  In this case, when the potential difference between the AC voltage and the voltage of the shield electrode 32 (the reference voltage supplied from the reference voltage generating unit 11) is increased due to the increase in the AC voltage of the measurement target conductor X, the measurement is performed. The amount of current of the current signal that flows (inflows) from the target conductor X into the current-voltage converter 12 via the detection electrode 31 increases. At this time, the current-voltage conversion unit 12 decreases the voltage value of the detection voltage signal output to the control unit 15. Accordingly, the control unit 15 increases the voltage value of the reference voltage generated by controlling the reference voltage generation unit 11. Thereby, the voltage of the shield electrode 32 is made to follow the alternating voltage of the measuring object conducting wire X. It is also possible to employ a configuration in which the current-voltage conversion unit 12 increases the voltage value of the detection voltage signal, and the control unit 15 controls the reference voltage generation unit 11 to increase the voltage value of the reference voltage.

  In addition, when the potential difference between the AC voltage and the voltage of the shield electrode 32 is increased due to the decrease in the AC voltage of the measurement target conductor X, the measurement target conductor X is detected from the current-voltage conversion unit 12 via the detection electrode 31. The amount of current signal flowing out (flowing out) increases. At this time, the current-voltage conversion unit 12 increases the voltage value of the detection voltage signal output to the control unit 15. Accordingly, the control unit 15 controls the reference voltage generation unit 11 to reduce the voltage value of the reference voltage generated. Thereby, the voltage of the shield electrode 32 is made to follow the alternating voltage of the measuring object conducting wire X. Therefore, by measuring the voltage value of the reference voltage supplied to the shield electrode 32 and the like with the voltmeter of the reference voltage generation unit 11, the same as the AC voltage of the measurement target conductor X in a non-contact manner with respect to the measurement target conductor X. The voltage value can be measured. Thereby, the voltage value of the measuring object conducting wire X is displayed on the display unit 14. In the above operation, a configuration is adopted in which the current-voltage conversion unit 12 decreases the voltage value of the detection voltage signal, and the control unit 15 controls the reference voltage generation unit 11 to decrease the voltage value of the reference voltage. You can also.

  In this case, in the voltage measurement sensor substrate 30 of the sensor unit 3 in the non-contact voltage measurement device 1, the first shield electrode conductor layer 51 constituting the “first shield electrode” is formed on the back surface side of the detection electrode 31. ing. Therefore, in this voltage measurement sensor substrate 30, as in the case of the conventional voltage sensor, during the above measurement process, due to disturbance from the back surface side of the detection electrode 31 (that is, the back surface side of the voltage measurement sensor substrate 30). It is less affected. In the voltage measurement sensor substrate 30, the second shield electrode conductor layer 52 constituting the “second shield electrode” is formed above the detection electrode conductor layer 41 constituting the detection electrode 31. Therefore, in the voltage measurement sensor substrate 30, unlike the conventional voltage sensor, the voltage can be detected through the opening 34 at the time of the above-described measurement process, and the upper side of the detection electrode 31 (that is, the voltage) It is difficult to be affected by disturbance from the upper side of the sensor substrate for measurement 30).

  Further, in this voltage measurement sensor substrate 30, the detection electrode conductor layer 41 constituting the detection electrode 31 and the connection conductor 33 a is interposed between the first shield electrode conductor layer 51 and the second shield electrode conductor layer 52. Is formed. In the voltage measurement sensor substrate 30, a third shield electrode conductor layer 53 constituting a “third shield electrode” is formed so as to surround the detection electrode 31 and the connection conductor 33 a. Therefore, unlike the conventional voltage sensor, the voltage measurement sensor substrate 30 is not easily affected by disturbance from the side of the detection electrode 31 (that is, the side of the voltage measurement sensor substrate 30). Moreover, the amount of noise mixed into the connecting conductor 33a is sufficiently small. Thereby, in the non-contact voltage measuring apparatus 1 that measures the voltage of the measurement target conductor X via the sensor unit 3 including the voltage measurement sensor substrate 30, the measurement target conductor X is hardly affected by disturbance. AC voltage can be measured with high accuracy.

  Further, as described above, in the voltage measurement sensor substrate 30 of the non-contact voltage measuring device 1, the measurement target conductor in the first voltage detection unit 31a that is opposed to the measurement target conductor X positioned at the “measurement position”. The detection electrode 31 is configured such that the length along the line length direction of X is defined to be longer than the length along the line width direction. Therefore, as shown by a solid line in FIG. 6, in a state where the measurement target wire X is correctly positioned at the “measurement position”, a sufficiently wide region (first voltage detection unit 31 a) in the detection electrode 31 is measured. It is possible to perform highly accurate measurement processing.

  On the other hand, as described above, in the voltage measurement sensor substrate 30 of the non-contact voltage measurement device 1, the pair of second voltage detection units 31b is formed with the first voltage detection unit 31a interposed therebetween, and the detection electrode 31 is configured. ing. Accordingly, when the measurement target conductor X is displaced from the “measurement position” in the direction of the arrow E1 shown in FIGS. 5 and 6 and is located at the position indicated by the alternate long and short dash line in FIG. The pair of second voltage detectors 31b also when the measurement target conductor X is displaced from the “measurement position” in the direction of the arrow E2 shown in FIG. 6 and is located at the position indicated by the two-dot chain line in FIG. Is in a state of facing the measurement target conductor X.

  In this case, by forming the detection electrode 31 larger (wider), even if the measurement target conductor X is displaced from the “measurement position”, any part of the detection electrode 31 is opposed to the measurement target conductor X. It becomes possible. However, when the detection electrode 31 is formed excessively large (wide), it is likely to be affected by disturbances, and it may be difficult to perform highly accurate measurement processing.

  On the other hand, in this voltage measurement sensor substrate 30, the second voltage detection unit 31b which is not required when the measurement target conductor X is positioned at the “measurement position” is smaller than the first voltage detection unit 31a. By setting the area, it is possible to avoid the situation where the entire area of the detection electrode 31 is excessively wide and to be hardly affected by disturbances, and to be opposed to the measurement target conductor X positioned at the “measurement position”. Even if the voltage detection unit 31a is made sufficiently large (wide) to improve detection sensitivity and the measurement target conductor X is displaced from the “measurement position”, the voltage detection unit 31a can be connected via either of the second voltage detection units 31b. It is possible to detect the AC voltage of the conductor X to be measured.

  As described above, according to the voltage measurement sensor substrate 30, the voltage measurement sensor substrate 30 includes the second shield electrode conductor layer 52 formed on the detection electrode conductor layer 41 constituting the detection electrode 31 and faces the detection electrode 31. By providing the “second shield electrode” having the opening 34 in at least a part of the region to be subjected to, the influence of disturbance from above the detection electrode 31, that is, from above the voltage measurement sensor substrate 30 is sufficiently reduced. Thus, the voltage measurement accuracy can be improved.

  Further, according to the voltage measurement sensor substrate 30, the connection conductor formed by a part of the detection electrode conductor layer 41 formed between the first shield electrode conductor layer 51 and the second shield electrode conductor layer 52. By providing 33a, it is possible to suitably avoid noise from being mixed into the connecting conductor 33a, so that the voltage measurement accuracy can be further improved.

  Further, according to the voltage measuring sensor substrate 30, the third shield electrode conductor layer 53 is formed in the same layer as the detection electrode conductor layer 41 so as to surround the detection electrode 31 and the connection conductor 33a. By providing the “shield electrode”, it is possible to sufficiently reduce the influence of disturbance from the side of the detection electrode 31, that is, from the side of the voltage measurement sensor substrate 30, and to reduce noise on the connection conductor 33 a. Since mixing can be avoided more preferably, the voltage measurement accuracy can be further improved.

  Further, according to the voltage measurement sensor substrate 30, the first voltage detection unit 31a opposed to the measurement target conducting wire X positioned at the “measurement position” is displaced in the line width direction from the “measurement position”. Since the detection electrode 31 is configured to include the pair of second voltage detectors 31b opposed to the measurement target conductor X, the voltage detection sensitivity can be increased when the measurement target conductor X is positioned at the “measurement position”. Further, the voltage can be detected even if the measurement target conductor X is displaced from the “measurement position”.

  Furthermore, according to the voltage measurement sensor substrate 30, each of the second voltage detectors 31b is shortened to have a smaller area than that of the first voltage detector 31a. The voltage can be suitably detected without incurring a state that is easily affected by a disturbance by increasing (broader).

  Moreover, according to this non-contact voltage measuring apparatus 1, by providing the voltage measurement sensor substrate 30, it is possible to sufficiently reduce the influence of disturbance and improve the voltage measurement accuracy.

  The configurations of the “voltage measuring device” and the “voltage measuring sensor” are not limited to the configuration examples of the non-contact voltage measuring device 1 and the voltage measuring sensor substrate 30 described above. For example, the detection electrode 31 having a cross shape in plan view and the voltage measurement sensor substrate 30 having the opening 34 having the same shape as the detection electrode 31 in plan view have been described as examples. The planar shape of “part” is not limited to a cross shape. More specifically, as an example, the detection electrode 71 and the opening 74 (another example of the “non-conductive portion”) in the voltage measurement sensor substrate 70 illustrated in FIG. it can.

  This detection electrode 71 has a length along the line length direction (in this example, the left-right direction in the figure) of the measurement target conductor X positioned at the “measurement position” in the line width direction (up-down direction in the figure). Is defined to be longer than the length along. For this reason, the detection sensitivity when the measurement target lead X is positioned at the “measurement position” is sufficiently improved, and the “detection electrode” is formed to be excessively large (wide) so that it is easily affected by disturbance. It is possible to avoid this situation.

  As an example, the shield electrode 72 in the voltage measurement sensor substrate 70 is configured in the same manner as the “first shield electrode (first shield electrode conductor layer 51)” in the voltage measurement sensor substrate 30 described above. “Second shield electrode” configured in the same manner as the “second shield electrode (second shield electrode conductor layer 52)” in the voltage measurement sensor substrate 30 and “voltage shield sensor substrate 30” The “third shield electrode” (third shield electrode conductor layer 53) ”is configured in the same manner as the“ third shield electrode ”. Therefore, the voltage measurement sensor substrate 70 can also achieve the same effects as the voltage measurement sensor substrate 30 described above.

  In addition, the voltage measurement sensor substrate 30 in which the connection conductor 33a is configured by a part of the detection electrode conductor layer 41 constituting the “detection electrode” has been described as an example. However, the “detection electrode” and the “connection conductor” are described. Can be formed in a separate layer. Specifically, as an example, like the voltage measurement sensor substrate 80 shown in FIG. 8, the connection conductor layer 42 (another example of the “fourth conductor layer”) constituting the connection conductor 33 a is used as the “first conductor layer”. The first shield electrode conductor layer 51 constituting the “one shield electrode” may be formed in the same layer, and the detection electrode 31 and the connection conductor 33 a may be connected to each other by the via 43. It should be noted that components having the same functions as those of the voltage measurement sensor substrate 30 described above with reference to FIG. 9 and FIG.

  In this case, in the voltage measurement sensor substrate 80, the connection conductor layer 42 constituting the connection conductor 33 a and the first shield electrode conductor layer 51 constituting the “first shield electrode” are insulated from each other by the insulating material 65. In addition, the connection conductor 33b for connecting the shield electrode 32 to the apparatus main body 2 is constituted by a part of the third shield electrode conductor layer 53 constituting the “third shield electrode” as an example. . Also in the voltage measurement sensor substrate 80 adopting such a configuration, the same effects as those of the voltage measurement sensor substrate 30 described above can be obtained. Instead of the configuration of the voltage measurement sensor substrate 80, the connection conductor layer 42 may be formed in the same layer as the second shield electrode conductor layer 52 to form the connection conductor 33a (not shown). )

  Further, the voltage measurement sensor substrates 30, 70, 80 having the “third shield electrode” composed of the third shield electrode conductor layer 53 around the detection electrode conductor layer 41 constituting the detection electrode 31 are taken as an example. As described above, the detection electrode conductor layer 41, etc., instead of the third shield electrode conductor layer 53 in the voltage measurement sensor substrates 30, 70, 80, as in the voltage measurement sensor substrate 90 shown in FIG. A third insulating layer 63 may be provided so as to surround the substrate. In this case, in the voltage measurement sensor substrate 90, the first shield electrode conductor layer 51 and the second shield electrode conductor layer 52 are combined to form the shield electrode 92.

  Further, the voltage measurement sensor substrate 30 in which the opening 34 is provided in a portion facing the detection electrode 31 in the second shield electrode conductor layer 52 constituting the “second shield electrode” (“non-conductive portion” is referred to as “ However, in place of such a configuration, the opening 34 can be filled with a non-conductive material (for example, a non-conductive resin material). Furthermore, the configuration in which the shield electrode 32 functions as a “card electrode” by supplying the reference voltage generated by the reference voltage generation unit 11 to the shield electrode 32 has been described as an example, but instead of such a configuration, A configuration in which the shield electrode 32 is connected to the ground potential (another example of the state of being “connected to the reference potential of the voltage measuring device”: not shown) may be employed. Even when such a configuration is adopted, the influence of disturbance can be sufficiently reduced.

DESCRIPTION OF SYMBOLS 1 Non-contact voltage measuring apparatus 2 Apparatus main body 3 Sensor part 4 Signal cable 11 Reference voltage generation part 12 Current voltage conversion part 15 Control part 30,70,80,90 Voltage measurement sensor board 31,71 Detection electrode 31a 1st voltage detection Portion 31b Second voltage detector 32, 72, 92 Shield electrode 33a, 33b Connection conductor 34, 74 Opening 41 Detection electrode conductor layer 42 Connection conductor layer 51 First shield electrode conductor layer 52 For second shield electrode Conductor layer 53 Conductor layer for third shield electrode 54 Via 61 First insulating layer 62 Second insulating layer 63 Third insulating layer 64, 65 Insulating material X Conductor to be measured

Claims (6)

A first shield electrode configured by the first conductor layer and connected to a reference potential of the voltage measuring device; and a second shield electrode formed on the first conductor layer in a state of being insulated from the first conductor layer. A voltage measurement sensor comprising a detection electrode configured by a conductor layer and connected to a voltage measurement unit of the voltage measurement device;
A voltage generated by the detection electrode in at least a part of a region formed of the third conductor layer formed on the second conductor layer in a state of being insulated from the second conductor layer and facing the detection electrode A voltage measurement sensor provided with a second shield electrode provided with a non-conductor portion allowing detection and connected to the reference potential.   The voltage measurement sensor according to claim 1, further comprising a connection conductor configured by a fourth conductor layer formed between the first conductor layer and the third conductor layer and connected to the detection electrode. The second conductor layer and the fourth conductor layer are formed in the same layer;
The fifth conductor layer is formed in the same layer as the second conductor layer and the fourth conductor layer so as to surround the detection electrode and the connection conductor while being insulated from the second conductor layer and the fourth conductor layer. The voltage measuring sensor according to claim 2, further comprising a third shield electrode configured by a conductor layer and connected to the reference potential.   The detection electrode sandwiches the first voltage detection unit so as to extend from the first voltage detection unit, and a first voltage detection unit that is opposed to a measurement target conducting wire positioned at a predetermined measurement position. 4. The voltage measurement sensor according to claim 1, further comprising: a pair of second voltage detection units that are arranged in a manner opposed to the measurement target conductor that is displaced in the line width direction from the measurement position. 5. . The first voltage detection unit is defined such that a length along a line length direction of the measurement target conductor positioned at the measurement position is longer than a length along a line width direction,
Each of the second voltage detection units is defined such that the length of the misaligned measurement target conductor along the line length direction is shorter than the length of the first voltage detection unit along the line length direction. The voltage measurement sensor according to claim 4, wherein the area is smaller than the area of the first voltage detection unit.   A voltage measuring apparatus comprising the voltage measuring sensor according to claim 1.

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