JP2014040633A - Pattern formation apparatus and pattern formation method - Google Patents

Pattern formation apparatus and pattern formation method Download PDF

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JP2014040633A
JP2014040633A JP2012183261A JP2012183261A JP2014040633A JP 2014040633 A JP2014040633 A JP 2014040633A JP 2012183261 A JP2012183261 A JP 2012183261A JP 2012183261 A JP2012183261 A JP 2012183261A JP 2014040633 A JP2014040633 A JP 2014040633A
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tanks
workpiece
different types
electrodeposition
coatings
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Boyko Stoimenov
ボイコ ストイメノフ
Kazuyoshi Yamakawa
和芳 山川
Masahiro Suzuki
雅裕 鈴木
Kazuaki Matsuo
和昭 松尾
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JTEKT Corp
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JTEKT Corp
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Priority to JP2012183261A priority Critical patent/JP2014040633A/en
Priority to US13/957,865 priority patent/US20140054176A1/en
Priority to CN201310361890.4A priority patent/CN103628103A/en
Priority to EP13181003.8A priority patent/EP2700737A3/en
Publication of JP2014040633A publication Critical patent/JP2014040633A/en
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    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/02Electroplating of selected surface areas
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D13/00Electrophoretic coating characterised by the process
    • C25D13/22Servicing or operating apparatus or multistep processes
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/02Tanks; Installations therefor
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10Electrodes, e.g. composition, counter electrode
    • C25D17/12Shape or form
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/004Sealing devices

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Abstract

PROBLEM TO BE SOLVED: To enable the reduction of the number of steps in a case where films of different types are formed respectively within multiple regions on the surface F of a workpiece W and where a specified film pattern is obtained from these films.SOLUTION: The provided pattern formation apparatus includes multiple tanks 11 through 19 and a power supply device 10. The tanks 11 through 19 possess aperture edges having shapes identical respectively to contour shapes of multiple regions in which films of mutually different types are scheduled to be formed, and electrodeposition liquids for forming films of different types are stocked respectively therein in a state where the aperture edges thereof are being contacted with the surface F of a workpiece W. The power supply device 10 impresses a specified voltage between the workpiece W serving as a first electrode and each of second electrodes positioned respectively within the multiple tanks 11 through 19.

Description

本発明は、ワークの表面の複数領域に種類の異なる皮膜を電着によって形成し、これら皮膜によって所定の皮膜パターンをワークの表面に得るパターン形成装置、及び、パターン形成方法に関するものである。   The present invention relates to a pattern forming apparatus and a pattern forming method for forming different types of coatings on a plurality of regions on the surface of a workpiece by electrodeposition and obtaining a predetermined coating pattern on the surface of the workpiece by these coatings.

例えば、金属製ワークの表面の摩擦抵抗を小さくするために、その表面に樹脂による皮膜を形成する場合があり、このような皮膜を形成するための手段として、電着が知られている。すなわち、図7に示すように、樹脂成分を含む電着液(電解液)90を溜めた水槽91内に、ワーク92と対向電極93とを配置し、これらに直流電圧を印加することで、電着液90に含まれている樹脂成分をワーク92の表面に付着させ、樹脂による皮膜を形成することができる。なお、電着によりワークの表面に皮膜を形成する装置として、例えば特許文献1に記載のものがある。   For example, in order to reduce the frictional resistance of the surface of a metal workpiece, a film made of a resin may be formed on the surface, and electrodeposition is known as a means for forming such a film. That is, as shown in FIG. 7, a work 92 and a counter electrode 93 are arranged in a water tank 91 in which an electrodeposition liquid (electrolyte) 90 containing a resin component is stored, and a DC voltage is applied to them. The resin component contained in the electrodeposition liquid 90 can be adhered to the surface of the workpiece 92 to form a resin film. An apparatus for forming a film on the surface of a workpiece by electrodeposition is disclosed in Patent Document 1, for example.

また、図8に示すように、ワーク95の表面の複数領域に種類の異なる皮膜を電着によって形成し、これら皮膜によって所定の皮膜パターンを形成する場合、以下に説明するように、従来ではマスクが用いられる。なお、図8では、板状のワーク95の表面が9つの領域A1〜A9に区画されており、領域A2,A4,A6,A8に、第一の皮膜を形成し、領域A1,A9に、第一の皮膜と種類が異なる第二の皮膜を形成し、領域A3,A7に、第一の皮膜及び第二の皮膜と種類が異なる第三の皮膜を形成し、領域A5に、第一、第二及び第三の皮膜と種類が異なる第四の皮膜を形成する。   In addition, as shown in FIG. 8, when different types of coatings are formed by electrodeposition on a plurality of regions on the surface of the workpiece 95 and a predetermined coating pattern is formed by these coatings, a mask is conventionally used as described below. Is used. In FIG. 8, the surface of the plate-like workpiece 95 is divided into nine areas A1 to A9, a first film is formed in the areas A2, A4, A6, and A8, and the areas A1 and A9 are A second film having a different type from the first film is formed, a first film and a third film having a different type from the second film are formed in the regions A3 and A7, and the first, A fourth film different in type from the second and third films is formed.

このような皮膜パターンを形成する場合、まず、第一の皮膜を形成するための電着液が溜められた水槽内に、ワーク及び対向電極を配置する。なお、このワークの表面には、図9(A)に示すように、格子状のマスクM1が被せられている。そして、ワーク及び対向電極に直流電圧を印加することで、マスクM1に覆われていない領域A2,A4,A6,A8に、第一の皮膜が形成される(図9(B)参照)。
次に、第二の皮膜を形成するための電着液が溜められた水槽内に、第一の皮膜が形成されたワーク及び対向電極を配置する。なお、このワークの表面に被せるマスクは、図9(C)に示すように、別のマスクM2に取り替えられている。これにより、マスクM2に覆われていない領域A1,A9に、第二の皮膜が形成される(図9(D)参照)。
When forming such a film pattern, first, a workpiece and a counter electrode are placed in a water tank in which an electrodeposition liquid for forming the first film is stored. Note that the surface of this work is covered with a lattice-like mask M1 as shown in FIG. And a 1st membrane | film | coat is formed in area | region A2, A4, A6, A8 which is not covered with the mask M1 by applying a DC voltage to a workpiece | work and a counter electrode (refer FIG.9 (B)).
Next, the work and the counter electrode on which the first film is formed are placed in a water tank in which the electrodeposition liquid for forming the second film is stored. The mask that covers the surface of the workpiece is replaced with another mask M2 as shown in FIG. 9C. As a result, a second film is formed in the regions A1 and A9 that are not covered with the mask M2 (see FIG. 9D).

以下、同様に、第三の皮膜を形成するための電着液が溜められた水槽内に、マスクM3(図9(E)参照)に交換したワークを配置し、領域A3,A7に第三の皮膜を形成する(図9(F))。
さらに、第四の皮膜を形成するための電着液が溜められた水槽内に、マスクM4(図9(G)参照)を被せたワークを配置し、領域A5に第四の皮膜を形成する(図9(H))。
Hereinafter, similarly, the work replaced with the mask M3 (see FIG. 9E) is placed in the water tank in which the electrodeposition liquid for forming the third film is stored, and the third work is placed in the regions A3 and A7. (FIG. 9F).
Further, a work covered with a mask M4 (see FIG. 9G) is placed in a water tank in which an electrodeposition liquid for forming the fourth film is stored, and the fourth film is formed in the region A5. (FIG. 9 (H)).

特開2000−256895号公報(図1参照)JP 2000-256895 A (see FIG. 1)

前記のとおり、ワークの表面の複数領域A1〜A9に種類の異なる皮膜を電着によって形成し、これら皮膜によって所定の皮膜パターンを得るためには、電着液の種類を異ならせた水槽内に、繰り返しワークを配置して複数回の電着の処理を行う必要がある。そして、その処理毎に、ワークに被せるマスクを交換する必要があり、従来の方法では、工数が多く発生し、製品コストが高くなるという問題点がある。   As described above, different types of coatings are formed by electrodeposition on the plurality of regions A1 to A9 on the surface of the workpiece, and in order to obtain a predetermined coating pattern by these coatings, the types of electrodeposition liquids are different in water tanks. Therefore, it is necessary to repeat the electrodeposition process by arranging the workpiece repeatedly. Further, it is necessary to replace the mask placed on the work for each processing, and the conventional method has a problem that a lot of man-hours are generated and a product cost is increased.

そこで、本発明は、ワークの表面の複数領域に種類の異なる皮膜を電着によって形成し、これら皮膜によって所定の皮膜パターンを得る場合に、工数の低減を可能とさせるパターン形成装置、及び、工数の低減が可能となるパターン形成方法を提供することを目的とする。   Therefore, the present invention provides a pattern forming apparatus and a man-hour that can reduce man-hours when different types of films are formed by electrodeposition on a plurality of regions on the surface of a workpiece and a predetermined film pattern is obtained by these films. An object of the present invention is to provide a pattern forming method capable of reducing the above.

本発明は、ワークの表面の複数領域に種類の異なる皮膜を電着によって形成し、これら皮膜によって所定の皮膜パターンを得るパターン形成装置であって、種類の異なる皮膜が形成される前記複数領域それぞれの輪郭形状と同一形状である開口端を有し、当該開口端を前記表面に当接させた状態で、種類の異なる皮膜を形成するための電着液をそれぞれ溜める複数のタンクと、第一電極となる前記ワークと、前記複数のタンク内の第二電極それぞれとの間に所定の電圧を印加する電源装置とを備えていることを特徴とする。   The present invention is a pattern forming apparatus that forms different types of coatings on a plurality of regions on the surface of a workpiece by electrodeposition, and obtains a predetermined coating pattern with these coatings, each of the plurality of regions where different types of coatings are formed. A plurality of tanks each storing an electrodeposition solution for forming a different type of film in a state where the opening end has the same shape as the contour shape of And a power supply device for applying a predetermined voltage between the work as an electrode and each of the second electrodes in the plurality of tanks.

本発明によれば、ワークの表面のうち、種類の異なる皮膜が形成される複数領域に対して、これら複数領域それぞれの輪郭形状と同一の形状である開口端を有している複数のタンクを当接させ、これらタンクそれぞれに、種類の異なる皮膜を形成するための電着液を溜め、第一電極となるワークと複数のタンク内の第二電極との間に電圧を印加することにより、ワークの表面の前記複数領域に、種類の異なる皮膜が形成される。すなわち、ワークの表面に種類の異なる皮膜を形成するために、従来のようなマスクが不要となることから、その交換も不要であり、工数の低減が可能となる。   According to the present invention, a plurality of tanks having open ends having the same shape as the contour shape of each of the plurality of regions are formed on a plurality of regions where different types of coatings are formed on the surface of the workpiece. By contacting each of these tanks, an electrodeposition liquid for forming a different type of film is stored, and by applying a voltage between the work serving as the first electrode and the second electrodes in the plurality of tanks, Different types of films are formed in the plurality of regions on the surface of the workpiece. In other words, since different types of coatings are formed on the surface of the workpiece, a conventional mask is not necessary, so that it is not necessary to replace the mask, and man-hours can be reduced.

また、前記電源装置は、前記第一電極と、前記複数のタンク内の前記第二電極それぞれとの間に、電圧を同時に印加するのが好ましい。
この場合、種類の異なる皮膜を形成する複数領域に対して、同時に電着を行い、種類の異なる皮膜を同時に形成することができる。
Moreover, it is preferable that the said power supply device applies a voltage simultaneously between said 1st electrode and each said 2nd electrode in these tanks.
In this case, it is possible to perform electrodeposition simultaneously on a plurality of regions where different types of films are formed, and simultaneously form different types of films.

また、前記パターン形成装置は、前記ワークの表面に前記タンクの開口端を当接させた状態で当該タンク内の電着液が当該ワークの表面と当該開口端との間から漏れるのを防止するシール部を更に備えているのが好ましい。
この構成によれば、ワークの表面に区画されて形成された複数領域が隣接しており、複数のタンクが隣接して配置される場合であっても、電着液が漏れて隣りのタンク内の電着液と混ざるのを防ぐことができる。
Further, the pattern forming apparatus prevents the electrodeposition liquid in the tank from leaking from between the surface of the workpiece and the opening end in a state where the opening end of the tank is in contact with the surface of the workpiece. It is preferable to further include a seal portion.
According to this configuration, even when a plurality of regions formed on the surface of the workpiece are adjacent to each other and a plurality of tanks are adjacently disposed, the electrodeposition liquid leaks and the inside of the adjacent tank Can be prevented from mixing with the electrodeposition solution.

また、前記複数のタンクの内壁面の少なくとも一部が、前記第二電極となっているのが好ましい。
この場合、タンクの内壁面の少なくとも一部を、第一電極(ワーク)の対向電極とすることができる。
Moreover, it is preferable that at least some of the inner wall surfaces of the plurality of tanks serve as the second electrode.
In this case, at least a part of the inner wall surface of the tank can be used as the counter electrode of the first electrode (workpiece).

また、本発明は、ワークの表面の複数領域に種類の異なる皮膜を電着によって形成し、これら皮膜によって所定の皮膜パターンを得るパターン形成方法であって、前記ワークの表面のうち、種類の異なる皮膜が形成される複数領域に対して、これら複数領域それぞれの輪郭形状と同一の形状である開口端を有している複数のタンクを当接させ、これらタンクそれぞれに、種類の異なる皮膜を形成するための電着液を溜め、第一電極となる前記ワークと、前記複数のタンク内の第二電極それぞれとの間に電圧を印加することを特徴とする。   Further, the present invention is a pattern forming method in which different types of coatings are formed by electrodeposition in a plurality of regions on the surface of the workpiece, and a predetermined coating pattern is obtained by these coatings, and the types of the surfaces of the workpiece are different. A plurality of tanks having open ends having the same shape as the contour shapes of the plurality of areas are brought into contact with the plurality of areas where the films are formed, and different types of films are formed in the respective tanks. The electrodeposition liquid for storing is stored, and a voltage is applied between the workpiece to be the first electrode and each of the second electrodes in the plurality of tanks.

本発明によれば、ワークの表面の複数領域に、種類の異なる皮膜を形成するために、従来のようなマスクが不要となることから、その交換も不要であり、工数の低減が可能となる。   According to the present invention, since different types of coatings are formed on a plurality of regions on the surface of the workpiece, a conventional mask is not required, so that replacement is not necessary, and man-hours can be reduced. .

本発明によれば、ワークの表面の複数領域に、種類の異なる皮膜を電着によって形成し、これら皮膜によって所定の皮膜パターンを得るために、従来のようなマスクが不要であることから、その交換も不要であり、工数の低減が可能となる。   According to the present invention, since different types of coatings are formed by electrodeposition in a plurality of regions on the surface of the workpiece, and a predetermined coating pattern is obtained by these coatings, a conventional mask is not necessary. No replacement is required, and man-hours can be reduced.

本発明のパターン形成装置の概略構成を示す斜視図である。It is a perspective view which shows schematic structure of the pattern formation apparatus of this invention. タンクとワークとを分離させた状態の図である。It is a figure of the state which isolate | separated the tank and the workpiece | work. タンクを上下逆とし、当接部を上にして示した説明図である。It is explanatory drawing which turned the tank upside down and showed the contact part up. タンクを断面として示す正面から見た説明図である。It is explanatory drawing seen from the front which shows a tank as a cross section. パターン形成装置によって所定の皮膜パターンが得られたワークの表面の説明図である。It is explanatory drawing of the surface of the workpiece | work from which the predetermined film pattern was obtained with the pattern formation apparatus. 他の実施形態によるパターン形成装置の概略構成を示す斜視図である。It is a perspective view which shows schematic structure of the pattern formation apparatus by other embodiment. 従来の装置を説明する説明図である。It is explanatory drawing explaining the conventional apparatus. ワークの表面の説明図である。It is explanatory drawing of the surface of a workpiece | work. 従来のパターン形成方法を説明する説明図である。It is explanatory drawing explaining the conventional pattern formation method.

以下、本発明の実施の形態を図面に基づいて説明する。
図1は、本発明のパターン形成装置の概略構成を示す斜視図である。このパターン形成装置は、ワークWの表面Fの複数領域に種類の異なる皮膜を電着によって形成し、これら皮膜によって所定の皮膜パターンを得るための装置である。なお、このようにワークWの表面に皮膜を形成する理由は、例えば、表面における耐摩耗性を向上させたり、摩擦抵抗を低減させるためであり、また、複数種類の皮膜を有する皮膜パターンとするのは、表面Fの領域毎に特性を変えるためである。
Hereinafter, embodiments of the present invention will be described with reference to the drawings.
FIG. 1 is a perspective view showing a schematic configuration of a pattern forming apparatus of the present invention. This pattern forming apparatus is an apparatus for forming different types of films on a plurality of regions of the surface F of the workpiece W by electrodeposition and obtaining a predetermined film pattern using these films. The reason for forming the film on the surface of the workpiece W in this way is, for example, to improve the wear resistance on the surface or to reduce the frictional resistance, and to form a film pattern having a plurality of types of films. This is because the characteristics are changed for each region of the surface F.

図5は、本実施形態のパターン形成装置によって所定の皮膜パターンが得られたワークWの表面Fの説明図である。本実施形態では、ワークWは金属板からなり、この表面Fは、格子状に区画されており、9つの領域A1〜A9を有している。なお、このワークWは、後に説明するが、電極(第一電極)となる。
そして、この表面Fに対して4種類の皮膜を電着によって形成し、これら4種類の皮膜による皮膜パターンが得られる。具体的には、領域A2,A4,A6,A8に、第一の皮膜S1を形成し、領域A1,A9に、第一の皮膜S1と種類が異なる第二の皮膜S2を形成し、領域A3,A7に、第一の皮膜S1及び第二の皮膜S2と種類が異なる第三の皮膜S3を形成し、領域A5に、第一、第二及び第三の皮膜S1,S2,S3と種類が異なる第四の皮膜S4を形成する。
FIG. 5 is an explanatory diagram of the surface F of the workpiece W on which a predetermined film pattern is obtained by the pattern forming apparatus of the present embodiment. In the present embodiment, the workpiece W is made of a metal plate, and the surface F is partitioned in a lattice shape and has nine regions A1 to A9. In addition, although this workpiece | work W demonstrates later, it becomes an electrode (1st electrode).
Then, four types of films are formed on the surface F by electrodeposition, and a film pattern with these four types of films is obtained. Specifically, the first film S1 is formed in the regions A2, A4, A6, A8, the second film S2 of a different type from the first film S1 is formed in the regions A1, A9, and the region A3. , A7 is formed with a third coating S3 of a different type from the first coating S1 and the second coating S2, and the first, second and third coatings S1, S2, S3 and the type are formed in the region A5. A different fourth coating S4 is formed.

図1において、パターン形成装置は、複数のタンク11〜19を備えている。図2は、これらタンク11〜19とワークWとを分離させた状態の図である。図1及び図2において、パターン形成装置は、ワークWの表面Fに皮膜が形成される前記領域A1〜A9と同数のタンク、つまり、9つのタンク11〜19を備えている。
このパターン形成装置は、表面Fが上向きとなるようにしてワークWを設置し、この表面Fの上にタンク11〜19を載せた状態として使用される。つまり、タンク11〜19それぞれは、表面F側(つまり、下端部側)に開口した構成を有しており、ワークWの表面Fに各タンクの下端部を当接させて使用される。
各タンクの内周面は上下に長い筒形状を有しており、これらタンク11〜19の下端部は、表面Fに対する当接部9となる。タンク11〜19それぞれの下端部(開口端)は、領域A1〜A9それぞれの外周縁に当接する。
In FIG. 1, the pattern forming apparatus includes a plurality of tanks 11 to 19. FIG. 2 is a view showing a state in which the tanks 11 to 19 and the workpiece W are separated. 1 and 2, the pattern forming apparatus includes the same number of tanks as the regions A1 to A9 on which the film is formed on the surface F of the workpiece W, that is, nine tanks 11 to 19.
This pattern forming apparatus is used in a state in which the workpiece W is set so that the surface F faces upward and the tanks 11 to 19 are placed on the surface F. That is, each of the tanks 11 to 19 has a configuration that opens to the surface F side (that is, the lower end side), and is used with the lower end portion of each tank in contact with the surface F of the workpiece W.
The inner peripheral surface of each tank has a vertically long cylindrical shape, and the lower end portions of these tanks 11 to 19 serve as contact portions 9 with respect to the surface F. The lower end portions (open ends) of the tanks 11 to 19 are in contact with the outer peripheral edges of the regions A1 to A9.

図3は、タンク11〜19を上下逆とし、前記当接部9を上にして示した説明図である。タンク11〜19それぞれの開口端21〜29の形状は、領域A1〜A9それぞれの輪郭形状と同一形状である。本実施形態では、領域A1〜A9それぞれは輪郭形状が矩形であり、領域A1〜A9全ての形状は同じである。したがって、開口端21〜29それぞれの形状は、全て同じ矩形である。これら開口端21〜29は、ワークWの表面Fに当接する当接部9となる。また、タンク11〜19それぞれは、その長手方向(上下方向)に沿って、同一の断面形状を有している。
そして、本実施形態では、これらタンク11〜19は一体ものとして構成されている。つまり、例えば、タンク11の内壁面11aと、その隣りのタンク12の内壁面12aとは、共通した一つの側壁の両側面からなる。
FIG. 3 is an explanatory view showing the tanks 11 to 19 upside down and the contact portion 9 facing up. The shapes of the open ends 21 to 29 of the tanks 11 to 19 are the same as the contour shapes of the regions A1 to A9. In the present embodiment, each of the regions A1 to A9 has a rectangular outline shape, and all the regions A1 to A9 have the same shape. Accordingly, the shapes of the open ends 21 to 29 are all the same rectangle. These open ends 21 to 29 serve as contact portions 9 that contact the surface F of the workpiece W. Moreover, each of the tanks 11 to 19 has the same cross-sectional shape along the longitudinal direction (vertical direction).
And in this embodiment, these tanks 11-19 are comprised as an integral thing. That is, for example, the inner wall surface 11a of the tank 11 and the inner wall surface 12a of the adjacent tank 12 are formed from both side surfaces of one common side wall.

そして、これらタンク11〜19は、開口端21〜29を表面Fに当接させた状態で、種類の異なる皮膜を形成するための電着液(電解液)をそれぞれ溜めることができる。図4は、タンク17,18,19を断面として示す正面から見た説明図である。この図4によれば、タンク17,18,19それぞれには、異なる種類の電着液L3,L1,L2が溜められている。タンク11〜19それぞれの内部空間は、他のタンクの内部空間と独立して構成されており、電着液同士が混ざり合うことがない。   And these tanks 11-19 can each store the electrodeposition liquid (electrolytic solution) for forming a different kind of membrane | film | coat in the state which contacted the surface F with the open ends 21-29. FIG. 4 is an explanatory view seen from the front showing the tanks 17, 18, and 19 as a cross section. According to FIG. 4, different types of electrodeposition liquids L3, L1, and L2 are stored in the tanks 17, 18, and 19, respectively. The internal spaces of the tanks 11 to 19 are configured independently of the internal spaces of the other tanks, and the electrodeposition liquids do not mix with each other.

図1において、本実施形態では、タンク12,14,16,18には、第一の皮膜S1を形成するための同じ電着液L1が溜められ、タンク11,19には、第二の皮膜S2を形成するための同じ電着液L2が溜められ、タンク13,17には、第三の皮膜S3を形成するための同じ電着液L3が溜められ、タンク15には、第四の皮膜S4を形成するための電着液L4が溜められている。これら電着液L1〜L4それぞれは樹脂成分を含み、それぞれ樹脂成分が異なっている。このため、本実施形態では、表面Fに、種類の異なる樹脂製の皮膜S1〜S4が形成される。   In FIG. 1, in the present embodiment, the same electrodeposition liquid L1 for forming the first film S1 is stored in the tanks 12, 14, 16, and 18, and the second film is stored in the tanks 11 and 19, respectively. The same electrodeposition liquid L2 for forming S2 is stored, the same electrodeposition liquid L3 for forming the third film S3 is stored in the tanks 13 and 17, and the fourth film is stored in the tank 15. The electrodeposition liquid L4 for forming S4 is stored. Each of these electrodeposition liquids L1 to L4 contains a resin component, and the resin components are different from each other. For this reason, in this embodiment, different types of resin films S1 to S4 are formed on the surface F.

なお、タンク11〜19それぞれは、図示しないが、配管を通じてサーバタンクに接続されており、このサーバタンクに溜められている電着液が、前記配管を通じて、タンク11〜19それぞれに供給される構成であってもよい。   Although not shown, each of the tanks 11 to 19 is connected to a server tank through a pipe, and the electrodeposition liquid stored in the server tank is supplied to each of the tanks 11 to 19 through the pipe. It may be.

また、パターン形成装置は、電着液の漏れを防止するシール部8を備えている(図3及び図4参照)。シール部8は、ワークWの表面Fに当接させるタンク11〜19の開口端21〜29に設けられている。つまり、シール部8は、タンク11〜19の当接部9に設けられている。シール部8は、例えばゴム又はシリコン等の樹脂製からなり、開口端21〜29に樹脂を接着して構成される。このシール部8によれば、ワークWの表面Fにタンク11〜19の開口端21〜29を当接させた状態で、タンク11〜19内の電着液L1〜L4が、表面Fと開口端21〜29との間から漏れるのを防止することができる。   In addition, the pattern forming apparatus includes a seal portion 8 that prevents leakage of the electrodeposition liquid (see FIGS. 3 and 4). The seal portion 8 is provided at the open ends 21 to 29 of the tanks 11 to 19 that are brought into contact with the surface F of the workpiece W. That is, the seal part 8 is provided in the contact part 9 of the tanks 11 to 19. The seal portion 8 is made of, for example, a resin such as rubber or silicon, and is configured by bonding a resin to the open ends 21 to 29. According to the seal portion 8, the electrodeposition liquids L 1 to L 4 in the tanks 11 to 19 are opened to the surface F in a state where the opening ends 21 to 29 of the tanks 11 to 19 are in contact with the surface F of the work W. Leakage from between the ends 21 to 29 can be prevented.

特に、本実施形態では、ワークWの表面Fに区画されて形成された複数の領域A1〜A9には、隣接している領域(例えば、A7とA8)が含まれていることから、これら領域に対応するタンク(図4において、タンク17とタンク18)同士は隣接して配置されるが、この場合であっても、電着液L1(L3)が漏れて隣りのタンク内の電着液L3(L1)と混ざるのを防ぐことができる。   In particular, in the present embodiment, the plurality of regions A1 to A9 formed by being partitioned on the surface F of the workpiece W include adjacent regions (for example, A7 and A8). 4 are disposed adjacent to each other (in FIG. 4, tank 17 and tank 18), but even in this case, electrodeposition liquid L1 (L3) leaks and the electrodeposition liquid in the adjacent tanks. Mixing with L3 (L1) can be prevented.

また、タンク11〜19内には、第一電極(ワークW)の対向電極として第二電極31〜39が設けられている(図4参照)。本実施形態では、タンク11〜19それぞれの内壁面に電極31〜39が設けられている。すなわち、タンク11〜19それぞれの内壁面の一部が、第二電極31〜39となっている。
なお、前記のとおり、タンク11〜19の当接部9にはシール部8が設けられていることから、このシール部8が、非導電性の材料からなり、タンク11〜19とワークWとの間を電気的に絶縁する部材として機能することにより、タンク11〜19それぞれの内壁面の全部が、第二電極となっていてもよい。つまり、タンク11〜19は、導電性を有する素材により構成されていてもよい。
Moreover, in the tanks 11-19, the 2nd electrodes 31-39 are provided as a counter electrode of a 1st electrode (work W) (refer FIG. 4). In this embodiment, the electrodes 31-39 are provided in the inner wall surface of each of the tanks 11-19. That is, part of the inner wall surface of each of the tanks 11 to 19 is the second electrodes 31 to 39.
As described above, since the seal portion 8 is provided in the contact portion 9 of the tanks 11 to 19, the seal portion 8 is made of a non-conductive material, and the tanks 11 to 19 and the workpiece W All of the inner wall surfaces of the tanks 11 to 19 may serve as the second electrode by functioning as a member that electrically insulates the tank. That is, the tanks 11 to 19 may be made of a conductive material.

そして、このパターン形成装置は、更に、電源装置10を備えている(図1参照)。電源装置10は、第一電極となるワークWと、タンク11〜19内の第二電極31〜39それぞれとの間に所要の直流電圧を印加する。これにより、ワークWの表面Fの領域A1〜A9それぞれに、隣りの領域とは種類の異なる皮膜が形成され、図5に示すような格子状の皮膜パターンが得られる。特に、本実施形態では、電源装置10は、第一電極(ワークW)と、タンク11〜19内の第二電極31〜39それぞれとの間に、電圧を同時に印加し、同時に電着処理を行う。   The pattern forming apparatus further includes a power supply device 10 (see FIG. 1). The power supply device 10 applies a required DC voltage between the work W to be the first electrode and the second electrodes 31 to 39 in the tanks 11 to 19. Thereby, a different type of coating from the adjacent region is formed in each of the regions A1 to A9 of the surface F of the workpiece W, and a lattice-like coating pattern as shown in FIG. 5 is obtained. In particular, in this embodiment, the power supply device 10 applies a voltage simultaneously between the first electrode (work W) and each of the second electrodes 31 to 39 in the tanks 11 to 19 and simultaneously performs electrodeposition treatment. Do.

以上の構成を備えたパターン形成装置によって、ワークWの表面Fの領域A1〜A9に種類の異なる皮膜を電着によって形成し、これら皮膜によって所定の皮膜パターンを得るパターン形成方法について説明する。
図1及び図2に示すように、ワークWの表面Fのうち、種類の異なる皮膜が形成される領域A1〜A9に対して、これら領域A1〜A9それぞれの輪郭形状と同一の形状である開口端21〜29(図3参照)を有しているタンク11〜19を当接させる。
A pattern forming method will be described in which different types of films are formed by electrodeposition in the regions A1 to A9 of the surface F of the workpiece W by the pattern forming apparatus having the above-described configuration, and a predetermined film pattern is obtained by these films.
As shown in FIG.1 and FIG.2, with respect to the area | region A1-A9 in which the film | membrane from which a kind differs is formed among the surfaces F of the workpiece | work W, the opening which is the same shape as each outline shape of these area | region A1-A9. The tanks 11 to 19 having the ends 21 to 29 (see FIG. 3) are brought into contact with each other.

そして、これらタンク11〜19それぞれに、種類の異なる皮膜S1〜S4を形成するための電着液L1〜L4を溜め、第一電極となるワークWと、タンク11〜14内の第二電極31〜39それぞれとの間に、電源装置10によって、直流電圧を印加する。   Electrodeposition liquids L1 to L4 for forming different types of coatings S1 to S4 are stored in the tanks 11 to 19, respectively, and the work W serving as the first electrode and the second electrode 31 in the tanks 11 to 14 are stored. A DC voltage is applied by the power supply device 10 between each of .about.39.

このように電圧を印加することにより、ワークWの表面Fの領域A1〜A9に、種類の異なる皮膜S1〜S4が形成され、図5に示す皮膜パターンが得られる。したがって、ワークWの表面Fに種類の異なる皮膜S1〜S4を形成するために、従来のようなマスクが不要となることから、その交換も不要であり、皮膜パターンを形成するために要する工数の低減が可能となる。この結果、ワークWの表面処理を短時間で行うことができ、製品コストの低減に貢献することが可能となる。   By applying a voltage in this way, different types of coatings S1 to S4 are formed in the regions A1 to A9 of the surface F of the workpiece W, and the coating pattern shown in FIG. 5 is obtained. Therefore, in order to form the different types of coatings S1 to S4 on the surface F of the workpiece W, a conventional mask is not required, so that the replacement thereof is also unnecessary, and the number of steps required to form the coating pattern is reduced. Reduction is possible. As a result, the surface treatment of the workpiece W can be performed in a short time, and it is possible to contribute to a reduction in product cost.

特に本実施形態では、タンク11〜19それぞれに所要の電着液L1〜L4を溜めた状態とし、第二電極31〜39それぞれと第一電力(ワークW)との間の電圧を同時に印加することで、領域A1〜A9に対して、同時に電着を行うことができ、種類の異なる皮膜S1〜S4を同時に形成することができる。   In particular, in the present embodiment, the required electrodeposition liquids L1 to L4 are stored in the tanks 11 to 19, respectively, and a voltage between each of the second electrodes 31 to 39 and the first power (work W) is applied simultaneously. Thus, the regions A1 to A9 can be electrodeposited simultaneously, and different types of coatings S1 to S4 can be formed simultaneously.

これに対して、従来では、図9により説明したように、複数の領域に対して複数種類の皮膜を形成するためには、複数種類の電着液が溜められた水槽と、複数種類のマスクとが必要であり、水槽を替えながらワークに電着を行い、しかも、水槽を替える毎に、マスクを交換する必要がある。マスクの交換と電着処理とを1つの工程とすると、4種類の皮膜S1〜S4を形成するためには、4回の工程を繰り返し行う必要がある。
しかし、本実施形態によれば、マスクは不要であり、また、すべての領域A1〜A9に対して電着処理を同時に行うことで、1工程で、つまり、短時間で、4種類の皮膜S1〜S4をワークWの表面Fに形成することが可能となる。
In contrast, conventionally, as described with reference to FIG. 9, in order to form a plurality of types of coatings in a plurality of regions, a water tank in which a plurality of types of electrodeposition liquid is stored, and a plurality of types of masks. It is necessary to perform electrodeposition on the workpiece while changing the water tank, and to change the mask every time the water tank is changed. If the replacement of the mask and the electrodeposition process are taken as one step, it is necessary to repeat four steps in order to form the four types of films S1 to S4.
However, according to the present embodiment, no mask is necessary, and by performing the electrodeposition process on all the regions A1 to A9 at the same time, the four types of coatings S1 can be performed in one step, that is, in a short time. ~ S4 can be formed on the surface F of the workpiece W.

なお、電源装置10を用いた電着処理のための制御に関して、すべてのタンク11〜19で、電圧、電流等が同じ条件となるように制御してもよいが、タンク11〜19それぞれで条件を異ならせてもよい。条件としては、電流、電圧、印加時間のうちの少なくとも一つを含む。この制御のために、電源装置10は、この条件を制御するための制御部(図示せず)を備えている。この制御部は、CPUや内部メモリを有するマイコンからなる。   In addition, regarding the control for the electrodeposition process using the power supply device 10, control may be performed so that the voltage, current, and the like are the same in all the tanks 11 to 19, but each tank 11 to 19 has a condition. May be different. The condition includes at least one of current, voltage, and application time. For this control, the power supply apparatus 10 includes a control unit (not shown) for controlling this condition. This control unit includes a microcomputer having a CPU and an internal memory.

例えば、図1に示す実施形態では、電源が単一であり、第一電極となるワークWと、タンク11〜19内の第二電極31〜39それぞれとの間に所要の電圧を印加して、同じパラメータ(例えば、電流、電圧)及び同じプロセス(例えば、印加時間)により電着処理を行う場合について説明したが、これ以外として、一つのタンクに対して一つの電源を設けてもよく(図6参照)、この図6の場合、タンク11〜19に対して電源V1〜V9を設けている。このため、電着処理は、タンク毎にそのパラメータやプロセスを変えて行うことが可能となり、例えば、タンク11〜19に貯留されている電着液の特性が様々であっても、その特性に応じてパラメータとプロセスとのうちの一方又は双方を変えて電着処理を行うことが可能となる。   For example, in the embodiment shown in FIG. 1, the power source is single, and a required voltage is applied between the work W serving as the first electrode and the second electrodes 31 to 39 in the tanks 11 to 19. In the above description, the electrodeposition process is performed using the same parameters (for example, current, voltage) and the same process (for example, application time). Alternatively, one power source may be provided for one tank ( In the case of FIG. 6, power supplies V <b> 1 to V <b> 9 are provided for the tanks 11 to 19. For this reason, the electrodeposition process can be performed by changing the parameters and processes for each tank. For example, even if the characteristics of the electrodeposition liquid stored in the tanks 11 to 19 are various, Accordingly, it is possible to perform the electrodeposition process by changing one or both of the parameter and the process.

また、本発明のパターン形成装置は、図示する形態に限らず本発明の範囲内において他の形態のものであってもよい。例えば、ワークWは板状ではなく、円筒状や円柱状のものであってもよく、また、ワークの表面に区画されて形成される複数の領域は、矩形でなく、曲線部分を含む形状等その他の形状であってもよい。そして、この領域の輪郭形状に合わせて、タンク(開口端)を形成すればよい。   In addition, the pattern forming apparatus of the present invention is not limited to the illustrated form, and may be of other forms within the scope of the present invention. For example, the workpiece W may not be plate-shaped, but may be cylindrical or columnar, and the plurality of regions formed by being partitioned on the surface of the workpiece are not rectangular but have a shape including a curved portion, etc. Other shapes may be used. And what is necessary is just to form a tank (open end) according to the outline shape of this area | region.

8:シール部 10:電源装置 11〜19:タンク 11a:内壁面 21〜29:開口端 31〜39:第二電極 W:ワーク(第一電極) F:表面 A1〜A9:領域 L1〜L4:電着液 S1:第一の皮膜 S2:第二の皮膜 S3:第三の皮膜 S4:第四の皮膜   8: Sealing part 10: Power supply device 11-19: Tank 11a: Inner wall surface 21-29: Open end 31-39: Second electrode W: Workpiece (first electrode) F: Surface A1-A9: Region L1-L4: Electrodeposition solution S1: First coating S2: Second coating S3: Third coating S4: Fourth coating

Claims (5)

ワークの表面の複数領域に種類の異なる皮膜を電着によって形成し、これら皮膜によって所定の皮膜パターンを得るパターン形成装置であって、
種類の異なる皮膜が形成される前記複数領域それぞれの輪郭形状と同一形状である開口端を有し、当該開口端を前記表面に当接させた状態で、種類の異なる皮膜を形成するための電着液をそれぞれ溜める複数のタンクと、
第一電極となる前記ワークと、前記複数のタンク内の第二電極それぞれとの間に所定の電圧を印加する電源装置と、
を備えていることを特徴とするパターン形成装置。
A pattern forming apparatus that forms different types of coatings on a plurality of regions of the surface of a workpiece by electrodeposition, and obtains a predetermined coating pattern with these coatings,
An electrode for forming different types of coatings having an open end having the same shape as the contour shape of each of the plurality of regions on which different types of coatings are formed, with the open ends in contact with the surface. A plurality of tanks for storing liquids,
A power supply device that applies a predetermined voltage between the workpiece to be a first electrode and each of the second electrodes in the plurality of tanks;
A pattern forming apparatus comprising:
前記電源装置は、前記第一電極と、前記複数のタンク内の前記第二電極それぞれとの間に、電圧を同時に印加する請求項1に記載のパターン形成装置。   The pattern forming apparatus according to claim 1, wherein the power supply device simultaneously applies a voltage between the first electrode and each of the second electrodes in the plurality of tanks. 前記ワークの表面に前記タンクの開口端を当接させた状態で当該タンク内の電着液が当該ワークの表面と当該開口端との間から漏れるのを防止するシール部を更に備えている請求項1又は2に記載のパターン形成装置。   A seal portion is further provided to prevent the electrodeposition liquid in the tank from leaking between the surface of the workpiece and the opening end in a state where the opening end of the tank is in contact with the surface of the workpiece. Item 3. The pattern forming apparatus according to Item 1 or 2. 前記複数のタンクの内壁面の少なくとも一部が、前記第二電極となっている請求項1〜3のいずれか一項に記載のパターン形成装置。   The pattern formation apparatus as described in any one of Claims 1-3 in which at least one part of the inner wall face of these tanks becomes said 2nd electrode. ワークの表面の複数領域に種類の異なる皮膜を電着によって形成し、これら皮膜によって所定の皮膜パターンを得るパターン形成方法であって、
前記ワークの表面のうち、種類の異なる皮膜が形成される複数領域に対して、これら複数領域それぞれの輪郭形状と同一の形状である開口端を有している複数のタンクを当接させ、
これらタンクそれぞれに、種類の異なる皮膜を形成するための電着液を溜め、
第一電極となる前記ワークと、前記複数のタンク内の第二電極それぞれとの間に電圧を印加することを特徴とするパターン形成方法。
A pattern forming method for forming different types of coatings on a plurality of regions of the surface of a workpiece by electrodeposition and obtaining a predetermined coating pattern with these coatings,
Among the surface of the workpiece, a plurality of areas where different types of films are formed are brought into contact with a plurality of tanks having open ends that are the same shape as the contour shape of each of the plurality of areas,
In each of these tanks, an electrodeposition solution for forming different types of films is stored,
A pattern forming method, wherein a voltage is applied between the work to be a first electrode and each of the second electrodes in the plurality of tanks.
JP2012183261A 2012-08-22 2012-08-22 Pattern formation apparatus and pattern formation method Pending JP2014040633A (en)

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