EP2700737A3 - Pattern forming device and pattern forming method - Google Patents
Pattern forming device and pattern forming method Download PDFInfo
- Publication number
- EP2700737A3 EP2700737A3 EP13181003.8A EP13181003A EP2700737A3 EP 2700737 A3 EP2700737 A3 EP 2700737A3 EP 13181003 A EP13181003 A EP 13181003A EP 2700737 A3 EP2700737 A3 EP 2700737A3
- Authority
- EP
- European Patent Office
- Prior art keywords
- pattern forming
- tanks
- workpiece
- films
- forming device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/02—Electroplating of selected surface areas
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D13/00—Electrophoretic coating characterised by the process
- C25D13/22—Servicing or operating apparatus or multistep processes
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/02—Tanks; Installations therefor
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/10—Electrodes, e.g. composition, counter electrode
- C25D17/12—Shape or form
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/004—Sealing devices
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating Methods And Accessories (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
- Manufacturing Of Printed Wiring (AREA)
Abstract
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012183261A JP2014040633A (en) | 2012-08-22 | 2012-08-22 | Pattern formation apparatus and pattern formation method |
Publications (2)
Publication Number | Publication Date |
---|---|
EP2700737A2 EP2700737A2 (en) | 2014-02-26 |
EP2700737A3 true EP2700737A3 (en) | 2015-05-27 |
Family
ID=49028916
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP13181003.8A Withdrawn EP2700737A3 (en) | 2012-08-22 | 2013-08-20 | Pattern forming device and pattern forming method |
Country Status (4)
Country | Link |
---|---|
US (1) | US20140054176A1 (en) |
EP (1) | EP2700737A3 (en) |
JP (1) | JP2014040633A (en) |
CN (1) | CN103628103A (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20160049701A1 (en) * | 2014-08-13 | 2016-02-18 | Farasis Energy, Inc. | Process for preparing and recycling cathode active materials for lithium-ion batteries |
US11408086B2 (en) * | 2015-05-14 | 2022-08-09 | Lacks Enterprises, Inc. | Method for creating multiple electrical current pathways on a work piece |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4315809A (en) * | 1979-04-23 | 1982-02-16 | Honeywell Inc. | Cluster core assembly for electroplating radioactive sources for an ionization smoke detector |
US4348267A (en) * | 1979-08-09 | 1982-09-07 | Sonix Limited | Plating means |
US20030070917A1 (en) * | 2001-10-11 | 2003-04-17 | Symyx Technologies, Inc. | Synthesis and characterization of materials for electrochemical cells |
US20040168925A1 (en) * | 2002-10-09 | 2004-09-02 | Uziel Landau | Electrochemical system for analyzing performance and properties of electrolytic solutions |
US20070029189A1 (en) * | 2005-08-02 | 2007-02-08 | The University Of Chicago | Combinatorial electrochemical deposition system |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5571118A (en) * | 1995-01-05 | 1996-11-05 | Boutos; David | Apparatus for stimulating penile, scrotal, anal, vaginal and clitoral tissue |
JP2000256895A (en) | 1999-03-08 | 2000-09-19 | Sankyo Seiki Mfg Co Ltd | System and method for electrodeposition coating |
JP2002097594A (en) * | 2000-09-20 | 2002-04-02 | Ebara Corp | Equipment and method for plating substrate |
JP3513130B2 (en) * | 2001-10-11 | 2004-03-31 | 日本エレクトロプレイテイング・エンジニヤース株式会社 | Plating apparatus and plating method |
US7544574B2 (en) * | 2005-10-11 | 2009-06-09 | Intermolecular, Inc. | Methods for discretized processing of regions of a substrate |
JP2010236054A (en) * | 2009-03-31 | 2010-10-21 | Fujitsu Semiconductor Ltd | Method of manufacturing semiconductor device and plating apparatus |
-
2012
- 2012-08-22 JP JP2012183261A patent/JP2014040633A/en active Pending
-
2013
- 2013-08-02 US US13/957,865 patent/US20140054176A1/en not_active Abandoned
- 2013-08-19 CN CN201310361890.4A patent/CN103628103A/en active Pending
- 2013-08-20 EP EP13181003.8A patent/EP2700737A3/en not_active Withdrawn
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4315809A (en) * | 1979-04-23 | 1982-02-16 | Honeywell Inc. | Cluster core assembly for electroplating radioactive sources for an ionization smoke detector |
US4348267A (en) * | 1979-08-09 | 1982-09-07 | Sonix Limited | Plating means |
US20030070917A1 (en) * | 2001-10-11 | 2003-04-17 | Symyx Technologies, Inc. | Synthesis and characterization of materials for electrochemical cells |
US20040168925A1 (en) * | 2002-10-09 | 2004-09-02 | Uziel Landau | Electrochemical system for analyzing performance and properties of electrolytic solutions |
US20070029189A1 (en) * | 2005-08-02 | 2007-02-08 | The University Of Chicago | Combinatorial electrochemical deposition system |
Also Published As
Publication number | Publication date |
---|---|
CN103628103A (en) | 2014-03-12 |
JP2014040633A (en) | 2014-03-06 |
US20140054176A1 (en) | 2014-02-27 |
EP2700737A2 (en) | 2014-02-26 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
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AK | Designated contracting states |
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AX | Request for extension of the european patent |
Extension state: BA ME |
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PUAL | Search report despatched |
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AX | Request for extension of the european patent |
Extension state: BA ME |
|
RIC1 | Information provided on ipc code assigned before grant |
Ipc: C25D 13/22 20060101ALI20150421BHEP Ipc: C25D 17/02 20060101ALI20150421BHEP Ipc: C25D 17/12 20060101ALI20150421BHEP Ipc: C25D 5/02 20060101AFI20150421BHEP Ipc: C25D 17/00 20060101ALI20150421BHEP |
|
17P | Request for examination filed |
Effective date: 20151103 |
|
RBV | Designated contracting states (corrected) |
Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR |
|
17Q | First examination report despatched |
Effective date: 20160224 |
|
GRAP | Despatch of communication of intention to grant a patent |
Free format text: ORIGINAL CODE: EPIDOSNIGR1 |
|
INTG | Intention to grant announced |
Effective date: 20161130 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN |
|
18D | Application deemed to be withdrawn |
Effective date: 20170411 |