JP2014033057A - Substrate sucking device - Google Patents

Substrate sucking device Download PDF

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JP2014033057A
JP2014033057A JP2012172378A JP2012172378A JP2014033057A JP 2014033057 A JP2014033057 A JP 2014033057A JP 2012172378 A JP2012172378 A JP 2012172378A JP 2012172378 A JP2012172378 A JP 2012172378A JP 2014033057 A JP2014033057 A JP 2014033057A
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substrate
sensor
suction
stage
opening
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Takashi Takeoka
高史 武岡
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Murata Manufacturing Co Ltd
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Murata Manufacturing Co Ltd
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Abstract

PROBLEM TO BE SOLVED: To provide a substrate sucking device capable of preventing dirt adhering to a sensor provided at a stage.SOLUTION: A substrate sucking device 10 includes: a stage 12; and a sensor 40. The sensor 12 includes: a substrate placement region 28 on which a substrate is placed; an opening 22a formed in the substrate placement region 28; and suction holes 22, 14, 36 which communicate with the opening 22a. The stage 12 performs vacuum suction through the suction holes 22, 14, 36 thereby suctioning and fixing the substrate in the substrate placement region 28. The sensor 40 is disposed in the suction holes 22x, 14, faces the opening 22a, and detects the substrate placed in the substrate placement region 28.

Description

本発明は、基板吸着装置に関し、詳しくは、真空吸引によりテーブル面に基板を吸着する基板吸着装置に関する。   The present invention relates to a substrate suction device, and more particularly to a substrate suction device that sucks a substrate onto a table surface by vacuum suction.

従来、電子部品を加工する種々の工程において、基板を吸着して固定する基板吸着装置が用いられている。   2. Description of the Related Art Conventionally, a substrate adsorption device that adsorbs and fixes a substrate is used in various processes for processing an electronic component.

例えば図4の断面図に示すように、ステージ2に形成された吸引流路7を介して、矢印で示すように真空吸引することにより、ステージ2の上面に基板1を吸着して固定する(例えば、特許文献1参照)。   For example, as shown in the cross-sectional view of FIG. 4, the substrate 1 is adsorbed and fixed to the upper surface of the stage 2 by vacuum suction as indicated by an arrow through the suction channel 7 formed in the stage 2 ( For example, see Patent Document 1).

特開2000−349430号公報JP 2000-349430 A

基板吸着装置に固定される基板の位置を認識したり、基板の有無を認識したりするために、ステージに穴を形成し、穴の中にセンサを配置する場合がある。この場合、センサに塵やごみが付着すると、センサの誤検出の原因となる。センサに付着した塵やごみを取り除けば誤検出を防止できるが、センサを清掃する手間がかかる。   In order to recognize the position of the substrate fixed to the substrate suction device or to recognize the presence or absence of the substrate, a hole may be formed in the stage and a sensor may be arranged in the hole. In this case, if dust or dirt adheres to the sensor, it may cause erroneous detection of the sensor. Removing dust and dirt attached to the sensor can prevent false detection, but it takes time to clean the sensor.

本発明は、かかる実情に鑑み、ステージに設けたセンサの汚れを防止することができる基板吸着装置を提供しようとするものである。   In view of such circumstances, the present invention is intended to provide a substrate suction device that can prevent contamination of a sensor provided on a stage.

本発明は、上記課題を解決するために、以下のように構成した基板吸着装置を提供する。   In order to solve the above-mentioned problems, the present invention provides a substrate suction device configured as follows.

基板吸着装置は、ステージと、センサとを備える。前記ステージは、基板が載置される基板載置領域と、該基板載置領域内に形成された開口と、該開口に連通する吸引穴とを有する。前記ステージは、該吸引穴を介して真空吸引することにより前記基板載置領域内に前記基板を吸着して固定することができる。前記センサは、前記吸引穴内に配置され、前記開口に対向し、前記基板載置領域内に載置された前記基板を検出することができる。   The substrate suction device includes a stage and a sensor. The stage includes a substrate placement area on which a substrate is placed, an opening formed in the substrate placement area, and a suction hole communicating with the opening. The stage can suck and fix the substrate in the substrate placement region by vacuum suction through the suction hole. The sensor is disposed in the suction hole, faces the opening, and can detect the substrate placed in the substrate placement region.

上記構成において、吸引穴には、真空吸引に伴って空気が流れる。この空気の流れによって、ステージの吸引穴内に配置されたセンサには、塵やごみなどの汚れが付着しにくい。したがって、ステージに設けたセンサの汚れを防止することができる。   In the above configuration, air flows through the suction hole along with vacuum suction. Due to this air flow, dirt such as dust and dirt is difficult to adhere to the sensor arranged in the suction hole of the stage. Therefore, contamination of the sensor provided on the stage can be prevented.

上記構成によれば、ステージには、センサ専用の穴や開口などを別に設ける必要がないため、基板吸着装置の構成を簡単にすることができる。   According to the above configuration, since it is not necessary to separately provide holes or openings dedicated to the sensor on the stage, the configuration of the substrate suction device can be simplified.

好ましくは、前記センサは受光部を含み、該受光部が前記開口に対向する。   Preferably, the sensor includes a light receiving portion, and the light receiving portion faces the opening.

センサが受光部を含む場合、通常は、受光部に塵やごみなどの汚れが堆積しやすい上、受光部の汚れの影響に敏感であり誤検出が発生しやすいが、センサの受光部の汚れが防止されるので、本発明による効果が特に顕著である。   When the sensor includes a light receiving part, it is usually easy for dirt and dust to accumulate on the light receiving part, and it is sensitive to the influence of the light receiving part contamination and easily causes false detection. Therefore, the effect of the present invention is particularly remarkable.

好ましくは、前記基板載置領域内に固定された前記基板が切削加工される。   Preferably, the substrate fixed in the substrate placement region is cut.

基板の切削加工によって切削くずが出やすく、通常は、センサが汚れやすいが、センサの汚れが防止されるため、本発明による効果が特に顕著である。   Cutting waste tends to be generated by cutting the substrate, and the sensor is usually easily soiled. However, the sensor is prevented from being soiled, and the effect of the present invention is particularly remarkable.

本発明によれば、ステージに設けたセンサの汚れを防止することができる。   According to the present invention, it is possible to prevent the sensor provided on the stage from being soiled.

基板吸着装置の分解斜視図である。(実施例1)It is a disassembled perspective view of a board | substrate adsorption | suction apparatus. Example 1 基板吸着装置の平面図である。(実施例1)It is a top view of a substrate adsorption device. Example 1 基板吸着装置の断面図である。(実施例1)It is sectional drawing of a board | substrate adsorption | suction apparatus. Example 1 基板吸着装置の断面図である。(従来例)It is sectional drawing of a board | substrate adsorption | suction apparatus. (Conventional example)

以下、本発明の実施の形態について、図1〜図3を参照しながら説明する。   Embodiments of the present invention will be described below with reference to FIGS.

<実施例1> 実施例1の基板吸着装置10について、図1〜図3を参照しながら説明する。図1は、基板吸着装置10の分解斜視図である。図2は、基板吸着装置10の平面図である。図3は、図2の線X−Xに沿って切断した断面図である。   <Example 1> The board | substrate adsorption | suction apparatus 10 of Example 1 is demonstrated referring FIGS. 1-3. FIG. 1 is an exploded perspective view of the substrate suction apparatus 10. FIG. 2 is a plan view of the substrate suction apparatus 10. FIG. 3 is a cross-sectional view taken along line XX in FIG.

図1〜図3に示すように、基板吸着装置10は、ステージ12と、センサ40とを備えている。ステージ12は、互いに結合される天板部20及び基部30を含む。   As shown in FIGS. 1 to 3, the substrate suction device 10 includes a stage 12 and a sensor 40. The stage 12 includes a top plate 20 and a base 30 that are coupled to each other.

天板部20の上面20aに、基板(図示せず)が載置される。天板部20には貫通穴22が形成されている。貫通穴22によって、天板部20の上面20aと下面20bには、開口22a,22bが形成される。図1及び図2に示すように、上面20aの開口22aは、上面20aのうち基板が載置される基板載置領域28内に形成されている。   A substrate (not shown) is placed on the upper surface 20 a of the top plate portion 20. A through hole 22 is formed in the top plate portion 20. Due to the through holes 22, openings 22 a and 22 b are formed in the upper surface 20 a and the lower surface 20 b of the top plate portion 20. As shown in FIGS. 1 and 2, the opening 22a on the upper surface 20a is formed in the substrate placement region 28 on which the substrate is placed on the upper surface 20a.

図1及び図3に示すように、基部30は、天板部20に対向する上面32から後退した凹部34が形成されている。凹部34の底面34aには、真空源(図示せず)に接続される接続穴36が形成されている。   As shown in FIGS. 1 and 3, the base 30 is formed with a recess 34 that is recessed from the upper surface 32 facing the top plate 20. A connection hole 36 connected to a vacuum source (not shown) is formed in the bottom surface 34 a of the recess 34.

図3に示すように、ステージ12は、天板部20と基部30とが、天板部20の下面20bの開口22bが凹部34の底面34aに対向するように結合される。ステージ12には、貫通穴22と、凹部34によって天板部20と基部30との間に形成される空間14と、接続穴36とを含む吸引穴が形成される。   As shown in FIG. 3, the stage 12 is coupled to the top plate portion 20 and the base portion 30 so that the opening 22 b of the lower surface 20 b of the top plate portion 20 faces the bottom surface 34 a of the recess 34. In the stage 12, a suction hole including a through hole 22, a space 14 formed between the top plate portion 20 and the base portion 30 by the concave portion 34, and a connection hole 36 is formed.

基板が基板載置領域28に載置されると、天板部20の上面20aの開口22aは基板で覆われる。この状態で、接続穴36を真空源に接続し、矢印38で示すように真空引きすることによって、基板を天板部20の上面20aに吸着して固定することができる。   When the substrate is placed on the substrate placement region 28, the opening 22a on the upper surface 20a of the top plate 20 is covered with the substrate. In this state, the connection hole 36 is connected to a vacuum source and evacuated as indicated by an arrow 38, whereby the substrate can be adsorbed and fixed to the upper surface 20a of the top plate portion 20.

図1及び図3に示すように、センサ40は、凹部34の底面34aに固定され、天板部20の貫通穴22のうち少なくとも一つ22xに挿入される。センサ40は、センサ40が挿入された貫通穴22xの内周面22sとの間に隙間48ができるように配置される。   As shown in FIGS. 1 and 3, the sensor 40 is fixed to the bottom surface 34 a of the recess 34 and is inserted into at least one of the through holes 22 of the top plate 20. The sensor 40 is disposed such that a gap 48 is formed between the inner peripheral surface 22s of the through hole 22x in which the sensor 40 is inserted.

センサ40が挿入された貫通穴22xは、センサ40によって塞がれないため、センサ40の周囲には、真空吸引に伴って空気が流れる。センサ40に塵やごみなどの汚れが付着しても、空気の流れで除去されやすいため、センサ40には汚れが付着しにくい。したがって、センサ40の汚れを防止することができる。   Since the through hole 22x into which the sensor 40 is inserted is not blocked by the sensor 40, air flows around the sensor 40 along with vacuum suction. Even if dirt such as dust or dust adheres to the sensor 40, it is easily removed by the flow of air, so that the sensor 40 is difficult to adhere dirt. Therefore, the sensor 40 can be prevented from being soiled.

センサ40を、吸引用の貫通穴22x内に配置することにより、ステージ12には、吸引穴とは別に、センサ専用の穴や開口などを設ける必要がない。したがって、基板吸着装置10の構成を簡単にすることができる。   By disposing the sensor 40 in the through hole 22x for suction, it is not necessary to provide a hole or opening dedicated to the sensor in the stage 12 in addition to the suction hole. Therefore, the configuration of the substrate suction device 10 can be simplified.

センサ40は、工程の自動化や監視等のために利用できる。例えば、基板がステージ12の所定位置に載置されているか否かをセンサ40で検出し、基板載置を検出したら真空吸引を開始するように制御したり、基板載置を検出していないのに真空吸引している場合は異常発生と判断したりする。   The sensor 40 can be used for process automation and monitoring. For example, the sensor 40 detects whether or not the substrate is placed at a predetermined position on the stage 12, and when the substrate placement is detected, control is performed so as to start vacuum suction or the substrate placement is not detected. It is judged that an abnormality has occurred when vacuum suction is performed.

例えば、センサ40は、光の透過を利用する近接センサである。この場合、図1〜図3に示すように、天板部20の上面20aの開口22aに対向するセンサ40の先端部42に受光部(図示せず)を備える。受光部で検出した受光量が所定値以下のときに、受光部に入射する光が基板で遮られた、すなわち基板が載置されたと判断する。   For example, the sensor 40 is a proximity sensor that utilizes light transmission. In this case, as shown in FIGS. 1 to 3, a light receiving portion (not shown) is provided at the distal end portion 42 of the sensor 40 facing the opening 22 a of the upper surface 20 a of the top plate portion 20. When the amount of received light detected by the light receiving unit is equal to or less than a predetermined value, it is determined that the light incident on the light receiving unit is blocked by the substrate, that is, the substrate is placed.

あるいは、センサ40は、光の反射を利用する近接センサである。この場合、センサ40の先端部42に、受光部及び発光部を備える。受光部で検出した受光量が所定値を越えるときには、発光部から照射された光が基板で反射して受光部に入射した、すなわち基板が載置されたと判断する。逆に、受光量が所定値以下のときに、発光部から照射された光が基板で反射して受光部に入射していない、すなわち基板が載置されていないと判断する。   Alternatively, the sensor 40 is a proximity sensor that utilizes light reflection. In this case, the front end portion 42 of the sensor 40 includes a light receiving portion and a light emitting portion. When the amount of received light detected by the light receiving unit exceeds a predetermined value, it is determined that the light emitted from the light emitting unit is reflected by the substrate and enters the light receiving unit, that is, the substrate is placed. Conversely, when the amount of received light is equal to or less than a predetermined value, it is determined that the light emitted from the light emitting unit is reflected by the substrate and is not incident on the light receiving unit, that is, the substrate is not placed.

センサ40の先端部42に受光部を備える場合、通常は、受光部に塵やごみなどの汚れが堆積しやすい上、受光部の汚れによって誤検出が発生しやすいが、真空吸引に伴う空気の流れによって受光部の汚れが防止されるので、本発明による効果が特に顕著である。   When the light receiving unit is provided at the tip 42 of the sensor 40, normally, dirt such as dust and dust is likely to accumulate on the light receiving unit, and erroneous detection is likely to occur due to contamination of the light receiving unit. The effect of the present invention is particularly significant because the flow prevents the light receiving portion from being contaminated.

なお、センサ40は、光を利用する近接センサに限らず、超音波、電界、磁界等を利用する近接センサであっても、近接センサ以外のタイプのセンサ(例えば、圧力センサ、温度センサ等)であっても構わない。   The sensor 40 is not limited to a proximity sensor that uses light, but may be a sensor other than the proximity sensor (for example, a pressure sensor, a temperature sensor, or the like), even if it is a proximity sensor that uses an ultrasonic wave, an electric field, a magnetic field, or the like. It does not matter.

基板吸着装置10は、基板の切削、基板上への樹脂の塗布、基板上への部品搭載など、種々の工程において用いることができる。   The board | substrate adsorption | suction apparatus 10 can be used in various processes, such as cutting of a board | substrate, application | coating of the resin on a board | substrate, and component mounting on a board | substrate.

基板の切削工程において基板吸着装置10を用いた場合、基板の切削加工によって切削くずが出やすく、通常は、センサが汚れやすいが、真空吸引に伴う空気の流れによってセンサの汚れが防止されるため、本発明による効果が特に顕著である。   When the substrate adsorbing device 10 is used in the substrate cutting process, cutting waste tends to be generated by the substrate cutting process, and the sensor is usually easily contaminated. However, the sensor is prevented from being contaminated by the air flow accompanying vacuum suction. The effect of the present invention is particularly remarkable.

なお、センサは、貫通穴22に挿入されていなくても、貫通穴22の開口22aに対向するように、吸引穴内に配置されていれば、基板載置領域内に載置された基板を検出することができる。吸引穴内にセンサが配置されていれば、センサの汚れを防止することができる。   Even if the sensor is not inserted into the through hole 22, it can detect the substrate placed in the substrate placement region if it is arranged in the suction hole so as to face the opening 22a of the through hole 22. can do. If the sensor is disposed in the suction hole, the sensor can be prevented from being soiled.

<まとめ> 以上に説明したように、吸引穴内にセンサを設けることによって、センサの汚れを防止することができる。   <Summary> As described above, the sensor can be prevented from being contaminated by providing the sensor in the suction hole.

なお、本発明は、上記実施の形態に限定されるものではなく、種々変更を加えて実施することが可能である。   The present invention is not limited to the above embodiment, and can be implemented with various modifications.

例えば、複数個のセンサを設けてもよく、全ての貫通穴に挿入されるようにセンサを設けてもよい。   For example, a plurality of sensors may be provided, or the sensors may be provided so as to be inserted into all through holes.

10 基板吸着装置
12 ステージ
14 空間(吸引穴)
20 天板部
20a 上面(主面)
20b 下面(主面)
22,22x 貫通穴(吸引穴)
22a,22b 開口
22s 内周面
28 基板載置領域
30 基部
32 上面
34 凹部
34a 底面
36 接続穴(吸引穴)
38 矢印
40 センサ
42 先端部
48 隙間
10 Substrate suction device 12 Stage 14 Space (suction hole)
20 Top plate 20a Top surface (main surface)
20b Lower surface (main surface)
22,22x Through hole (suction hole)
22a, 22b Opening 22s Inner peripheral surface 28 Substrate placement region 30 Base 32 Upper surface 34 Recess 34a Bottom surface 36 Connection hole (suction hole)
38 Arrow 40 Sensor 42 Tip 48 Clearance

Claims (3)

基板が載置される基板載置領域と、該基板載置領域内に形成された開口と、該開口に連通する吸引穴とを有し、該吸引穴を介して真空吸引することにより前記基板載置領域内に前記基板を吸着して固定することができるステージと、
前記吸引穴内に配置され、前記開口に対向し、前記基板載置領域内に載置された前記基板を検出することができるセンサと、
を備えたことを特徴とする、基板吸着装置。
The substrate has a substrate placement area on which the substrate is placed, an opening formed in the substrate placement area, and a suction hole communicating with the opening, and the substrate is vacuum-sucked through the suction hole. A stage capable of adsorbing and fixing the substrate in the mounting area;
A sensor arranged in the suction hole, opposed to the opening, and capable of detecting the substrate placed in the substrate placement region;
A substrate suction apparatus comprising:
前記センサは受光部を含み、該受光部が前記開口に対向することを特徴とする、請求項1に記載の基板吸着装置。   The substrate suction apparatus according to claim 1, wherein the sensor includes a light receiving portion, and the light receiving portion faces the opening. 前記基板載置領域内に固定された前記基板が切削加工されることを特徴とする、請求項1又は2に記載の基板吸着装置。   The substrate suction apparatus according to claim 1, wherein the substrate fixed in the substrate placement region is cut.
JP2012172378A 2012-08-02 2012-08-02 Substrate sucking device Pending JP2014033057A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111707849A (en) * 2020-08-18 2020-09-25 江西铭德半导体科技有限公司 Device fixing device and semiconductor laser testing equipment

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59208741A (en) * 1983-05-12 1984-11-27 Mitsubishi Electric Corp Attracting chuck device for semiconductor wafer
JPH04111339A (en) * 1990-08-30 1992-04-13 Mitsubishi Electric Corp Stage for semiconductor wafer
JPH0562045U (en) * 1992-01-24 1993-08-13 関西日本電気株式会社 Semiconductor wafer suction device
JPH1068759A (en) * 1996-05-31 1998-03-10 Advantest Corp Attracted matter detecting device attracted mater detecting method using the same, dislocation detecting method using the device and cleaning method using the device
JPH11207678A (en) * 1998-01-27 1999-08-03 Kawasaki Heavy Ind Ltd Attracting position detecting pad
US20060245138A1 (en) * 2003-07-14 2006-11-02 Koh Meng F Perforated plate for water chuck
JP2009255242A (en) * 2008-04-18 2009-11-05 Disco Abrasive Syst Ltd Suction device, retaining table, conveying device, workpiece machining device, and method for machining workpiece
JP2012044052A (en) * 2010-08-20 2012-03-01 Tokyo Ohka Kogyo Co Ltd Coating apparatus
JP2012076203A (en) * 2010-10-05 2012-04-19 Mitsuboshi Diamond Industrial Co Ltd Suction table

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59208741A (en) * 1983-05-12 1984-11-27 Mitsubishi Electric Corp Attracting chuck device for semiconductor wafer
JPH04111339A (en) * 1990-08-30 1992-04-13 Mitsubishi Electric Corp Stage for semiconductor wafer
JPH0562045U (en) * 1992-01-24 1993-08-13 関西日本電気株式会社 Semiconductor wafer suction device
JPH1068759A (en) * 1996-05-31 1998-03-10 Advantest Corp Attracted matter detecting device attracted mater detecting method using the same, dislocation detecting method using the device and cleaning method using the device
JPH11207678A (en) * 1998-01-27 1999-08-03 Kawasaki Heavy Ind Ltd Attracting position detecting pad
US20060245138A1 (en) * 2003-07-14 2006-11-02 Koh Meng F Perforated plate for water chuck
JP2009255242A (en) * 2008-04-18 2009-11-05 Disco Abrasive Syst Ltd Suction device, retaining table, conveying device, workpiece machining device, and method for machining workpiece
JP2012044052A (en) * 2010-08-20 2012-03-01 Tokyo Ohka Kogyo Co Ltd Coating apparatus
JP2012076203A (en) * 2010-10-05 2012-04-19 Mitsuboshi Diamond Industrial Co Ltd Suction table

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111707849A (en) * 2020-08-18 2020-09-25 江西铭德半导体科技有限公司 Device fixing device and semiconductor laser testing equipment

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