JP2014011203A - Exposure device, exposure method, and device manufacturing method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an exposure device that reduces the occurrence of exposure failures.SOLUTION: An exposure device exposes a substrate with exposure light through a first liquid in a first immersion space. The exposure device includes: an optical member having an emission surface that emits exposure light; a first member that is arranged in at least part of the surroundings of an optical path of the exposure light and that forms the first immersion space of the first liquid; and a second member that is arranged on an outer side of the first member with respect to the optical path and that forms a second immersion space of a second liquid away from the first immersion space.

Description

  The present invention relates to an exposure apparatus, an exposure method, and a device manufacturing method.

  As an exposure apparatus used in a photolithography process, for example, an immersion exposure apparatus that exposes a substrate with exposure light via a liquid as disclosed in the following patent document is known.

US Patent Application Publication No. 2009/0046261

  In the immersion exposure apparatus, if the liquid flows into an undesired space, an exposure failure may occur. As a result, a defective device may occur.

  An object of an aspect of the present invention is to provide an exposure apparatus and an exposure method that can suppress the occurrence of exposure failure. Moreover, the aspect of this invention aims at providing the device manufacturing method which can suppress generation | occurrence | production of a defective device.

  According to the first aspect of the present invention, an exposure apparatus that exposes a substrate with exposure light through the first liquid in the first immersion space, the optical member having an exit surface from which the exposure light is emitted; A first member disposed at least part of the periphery of the optical path of the exposure light and forming a first liquid immersion space for the first liquid; and disposed outside the first member with respect to the optical path, from the first liquid immersion space. An exposure apparatus is provided that includes a second member that can form a second immersion space for the second liquid.

  According to a second aspect of the present invention, there is provided a device manufacturing method including exposing a substrate using the exposure apparatus according to the first aspect and developing the exposed substrate.

  According to a third aspect of the present invention, there is provided an exposure method for exposing a substrate with exposure light through a first liquid in a first immersion space, wherein the exposure light path exits from an exit surface of an optical member. Forming a first immersion space for the first liquid with a first member disposed at least at a part of the periphery, and a second member disposed outside the first member with respect to the optical path, An object having a predetermined region below the second member in a state where the second immersion space of the second liquid is formed apart from the space and the second immersion space is formed is an optical axis of the optical member. The supply amount of the second liquid supply unit capable of supplying the second liquid to the second space below the second member and the fluid in the second space can be sucked in at least a part of the period of movement in the direction intersecting with the second member An exposure method is provided that includes changing one or both of the suction forces of the fluid suction portion.

  According to a fourth aspect of the present invention, there is provided an exposure method for exposing a substrate with exposure light through a first liquid in a first immersion space, the optical path of exposure light being emitted from an exit surface of an optical member. Forming a first immersion space for the first liquid with a first member disposed at least at a part of the periphery, and a second member disposed outside the first member with respect to the optical path, A direction in which the object intersects the optical axis of the optical member below the second member in a state where the second immersion space of the second liquid is formed apart from the space and the second immersion space is formed. The supply amount of the second liquid supply unit capable of supplying the second liquid to the second space below the second member and the fluid in the second space based on the moving condition of the object in at least a part of the period of movement Changing one or both of the suction forces of the suckable fluid suction part, and an exposure method comprising: .

  According to a fifth aspect of the present invention, there is provided an exposure method for exposing a substrate with exposure light through a first liquid in a first immersion space, wherein the exposure light path exits from an exit surface of an optical member. Forming a first immersion space for the first liquid with a first member disposed at least at a part of the periphery, and a second member disposed outside the first member with respect to the optical path, Forming a second immersion space for the second liquid away from the space, and the second immersion space from one side to the other on the first object and on the second object adjacent to the first object via a gap. Moving the second member and the first and second objects relative to each other in a predetermined plane substantially perpendicular to the optical axis of the optical member so that the second immersion space moves on the first object and the second object. Supplying the second liquid to the second space below the second member during at least part of the period of movement from one to the other on the two objects The supply amount of the second liquid supply unit of capacity, and the fact that the fluid in the second space changing one or both of the suction force of the fluid suction unit capable suction exposure method comprising is provided.

  According to a sixth aspect of the present invention, there is provided an exposure method for exposing a substrate with exposure light through a first liquid in a first immersion space, the optical path of exposure light being emitted from an exit surface of an optical member. Forming a first immersion space for the first liquid with a first member disposed at least at a part of the periphery, and a second member disposed outside the first member with respect to the optical path, A direction in which the object intersects the optical axis of the optical member below the second member in a state where the second immersion space of the second liquid is formed apart from the space and the second immersion space is formed. The amount of fluctuation in the supply amount of the second liquid supply unit capable of supplying the second liquid to the second space below the second member during the period of constant speed movement and the period of non-constant speed movement, and the second space Changing one or both of the fluctuation amounts of the suction force of the fluid suction portion capable of sucking the fluid is provided.

  According to a seventh aspect of the present invention, there is provided an exposure method for exposing a substrate with exposure light through a first liquid in a first immersion space, wherein the exposure light path exits from an exit surface of an optical member. Forming a first immersion space for the first liquid with a first member disposed at least at a part of the periphery, and a second member disposed outside the first member with respect to the optical path, The second immersion space for the second liquid is formed away from the space, and the plurality of shot regions of the substrate are moved to the first liquid in the first immersion space in the state where the second immersion space is formed. Through the exposure light, the amount of fluctuation in the supply amount of the second liquid supply unit capable of supplying the second liquid to the second space below the second member, and the fluid in the second space can be sucked One or both of the fluctuation amounts of the suction force of the fluid suction unit are exposed to the first shot area among the plurality of shot areas. A light period, after the exposure of the first shot area, an exposure method comprising altering in a non-exposure period until the exposure of the second shot region is started, the to be exposed next is provided.

  According to an eighth aspect of the present invention, there is provided an exposure method for exposing a substrate with exposure light through a first liquid in a first immersion space, the optical path of exposure light being emitted from an exit surface of an optical member. Forming a first immersion space for the first liquid with a first member disposed at least at a part of the periphery, and a second member disposed outside the first member with respect to the optical path, Forming a second immersion space for the second liquid away from the space; and in a state where the second immersion space is formed, an object having a gap below the second member is connected to the optical axis of the optical member. Moving in the intersecting direction, supplying the second liquid from the second liquid supply unit to the second space below the second member, and from the upper fluid suction unit disposed in the space above the gap, From the suction of the fluid in the second space and the lower fluid suction part disposed in the space below the gap part, In different suction force from the fluid suction unit, and aspirating the fluid in the second space, the exposure method comprising is provided.

  According to a ninth aspect of the present invention, there is provided an exposure method for exposing a substrate with exposure light through a first liquid in a first immersion space, wherein the exposure light path exits from an exit surface of an optical member. Forming a first immersion space for the first liquid with a first member disposed at least at a part of the periphery, and a second member disposed outside the first member with respect to the optical path, Forming a second immersion space for the second liquid away from the space, and the first immersion space from one side to the other on the first object and on the second object adjacent to the first object via a gap. Moving the first member and the first and second objects relative to each other within a predetermined plane substantially perpendicular to the optical axis of the optical member so that the second immersion space moves on the first object and the first object. The second member and the first and second objects are moved in a predetermined direction substantially perpendicular to the optical axis of the optical member so as to move from one to the other on the two objects. A fluid suction portion disposed in a space below the gap in at least a part of a period in which the first immersion space moves from one to the other on the first object and the second object, At least part of the period in which the fluid in the first space below the first member is sucked by the first suction force and the second immersion space moves from one side to the other on the first object and the second object. And an aspirating method including sucking the fluid in the second space below the second member with a second suction force smaller than the first suction force by the fluid suction unit.

  According to a tenth aspect of the present invention, there is provided a device manufacturing method comprising: exposing a substrate using the exposure method according to any one of the third to ninth aspects; and developing the exposed substrate. Is provided.

  According to the aspect of the present invention, it is possible to suppress the occurrence of exposure failure. Moreover, according to the aspect of this invention, generation | occurrence | production of a defective device can be suppressed.

It is a figure which shows an example of the exposure apparatus which concerns on 1st Embodiment. It is a figure which shows an example of the liquid immersion member which concerns on 1st Embodiment. It is a figure which shows an example of the liquid immersion member which concerns on 1st Embodiment. It is a figure which shows an example of the liquid immersion member which concerns on 1st Embodiment. It is a figure which shows an example of the liquid immersion member which concerns on 1st Embodiment. It is a figure which shows an example of the liquid immersion member which concerns on 1st Embodiment. It is a figure which shows an example of the substrate stage and measurement stage which concern on 1st Embodiment. It is a figure for demonstrating an example of the exposure method which concerns on 1st Embodiment. It is a figure which shows an example of operation | movement of the 2nd member which concerns on 1st Embodiment. It is a figure which shows an example of operation | movement of the 2nd member which concerns on 2nd Embodiment. It is a figure which shows an example of operation | movement of the 2nd member which concerns on 3rd Embodiment. It is a figure which shows an example of operation | movement of the 2nd member which concerns on 4th Embodiment. It is a figure which shows an example of operation | movement of the 2nd member which concerns on 5th Embodiment. It is a figure which shows an example of operation | movement of the 2nd member which concerns on 6th Embodiment. It is a figure which shows an example of operation | movement of the 2nd member which concerns on 7th Embodiment. It is a figure which shows an example of the substrate stage which concerns on 8th Embodiment. It is a figure which shows an example of operation | movement of the 2nd member which concerns on 8th Embodiment. It is a figure which shows an example of operation | movement of the 2nd member which concerns on 9th Embodiment. It is a figure which shows an example of operation | movement of the liquid immersion member which concerns on 10th Embodiment. It is a figure which shows an example of the supply port which supplies a liquid. It is a figure which shows an example of operation | movement of the 2nd member which concerns on 11th Embodiment. It is a figure which shows an example of operation | movement of the 2nd member which concerns on 11th Embodiment. It is a figure which shows an example of operation | movement of the liquid immersion member which concerns on 11th Embodiment. It is a figure which shows an example of a substrate stage. It is a flowchart which shows an example of a device manufacturing method.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings, but the present invention is not limited thereto. In the following description, an XYZ orthogonal coordinate system is set, and the positional relationship of each part will be described with reference to this XYZ orthogonal coordinate system. A predetermined direction in the horizontal plane is defined as an X-axis direction, a direction orthogonal to the X-axis direction in the horizontal plane is defined as a Y-axis direction, and a direction orthogonal to each of the X-axis direction and the Y-axis direction (that is, a vertical direction) is defined as a Z-axis direction. Further, the rotation (inclination) directions around the X axis, Y axis, and Z axis are the θX, θY, and θZ directions, respectively.

<First Embodiment>
A first embodiment will be described. FIG. 1 is a schematic block diagram that shows an example of an exposure apparatus EX according to the present embodiment. The exposure apparatus EX of the present embodiment is an immersion exposure apparatus that exposes a substrate P with exposure light EL through a liquid LQ. In the present embodiment, the immersion space LS1 is formed so that the optical path K of the exposure light EL irradiated to the substrate P is filled with the liquid LQ. The immersion space refers to a portion (space, region) filled with liquid. The substrate P is exposed with the exposure light EL through the liquid LQ in the immersion space LS1. In the present embodiment, water (pure water) is used as the liquid LQ.

  Further, the exposure apparatus EX of the present embodiment is an exposure apparatus provided with a substrate stage and a measurement stage as disclosed in, for example, US Pat. No. 6,897,963 and European Patent Application Publication No. 1713113.

  In FIG. 1, an exposure apparatus EX measures a mask stage 1 that can move while holding a mask M, a substrate stage 2 that can move while holding a substrate P, and exposure light EL without holding the substrate P. A movable measuring stage 3 mounted with a measuring member (measuring instrument) C, a mask stage 1, a substrate stage 2, a measuring system 4 for measuring positions of the measuring stage 3, and a mask M illuminated with exposure light EL An illumination system IL, a projection optical system PL that projects an image of the pattern of the mask M illuminated by the exposure light EL onto the substrate P, a liquid immersion member 5 that forms liquid immersion spaces LS1 and LS2, and the entire exposure apparatus EX And a storage device 7 connected to the control device 6 and storing various information relating to exposure.

  The exposure apparatus EX includes a chamber apparatus 11 that adjusts the environment (at least one of temperature, humidity, pressure, and cleanness) of the space CS in which the exposure light EL travels. The chamber apparatus 11 includes a gas supply unit 11S that supplies a gas Fr whose temperature and humidity are adjusted to the space CS. In the space CS, at least the projection optical system PL, the liquid immersion member 5, the substrate stage 2, and the measurement stage 3 are arranged. In the present embodiment, the mask stage 1 and at least a part of the illumination system IL are also arranged in the space CS.

  The mask M includes a reticle on which a device pattern projected onto the substrate P is formed. The mask M includes a transmission type mask having a transparent plate such as a glass plate and a pattern formed on the transparent plate using a light shielding material such as chromium. A reflective mask can also be used as the mask M.

  The substrate P is a substrate for manufacturing a device. The substrate P includes, for example, a base material such as a semiconductor wafer and a photosensitive film formed on the base material. The photosensitive film is a film of a photosensitive material (photoresist). The substrate P may include a photosensitive film and a film different from the photosensitive film. For example, the substrate P may include an antireflection film or a protective film (topcoat film) that protects the photosensitive film.

The illumination system IL irradiates the predetermined illumination area IR with the exposure light EL. The illumination area IR includes a position where the exposure light EL emitted from the illumination system IL can be irradiated. The illumination system IL illuminates at least a part of the mask M arranged in the illumination region IR with the exposure light EL having a uniform illuminance distribution. As the exposure light EL emitted from the illumination system IL, for example, far ultraviolet light (DUV light) such as bright lines (g line, h line, i line) and KrF excimer laser light (wavelength 248 nm) emitted from a mercury lamp, ArF Excimer laser light (wavelength 193 nm), vacuum ultraviolet light (VUV light) such as F ₂ laser light (wavelength 157 nm), or the like is used. In the present embodiment, ArF excimer laser light, which is ultraviolet light (vacuum ultraviolet light), is used as the exposure light EL.

  The mask stage 1 is movable on the guide surface 8G of the base member 8 including the illumination region IR while holding the mask M. In the present embodiment, the guide surface 8G and the XY plane are substantially parallel. The mask stage 1 is moved by the operation of a drive system including a planar motor as disclosed in US Pat. No. 6,452,292, for example. In the present embodiment, the mask stage 1 can move in six directions on the guide surface 8G in the X axis, Y axis, Z axis, θX, θY, and θZ directions by the operation of the drive system.

  The projection optical system PL irradiates the predetermined projection region PR with the exposure light EL. The projection region PR includes a position where the exposure light EL emitted from the projection optical system PL can be irradiated. The projection optical system PL projects an image of the pattern of the mask M at a predetermined projection magnification onto at least a part of the substrate P arranged in the projection region PR. In the present embodiment, the projection optical system PL is a reduction system. The projection magnification of the projection optical system PL may be, for example, 1/4, 1/5, or 1/8. The projection optical system PL may be a unity magnification system or an enlargement system. In the present embodiment, the optical axis of the projection optical system PL is parallel to the Z axis. The projection optical system PL may be a refractive system that does not include a reflective optical element, a reflective system that does not include a refractive optical element, or a catadioptric system that includes both a reflective optical element and a refractive optical element. The projection optical system PL may form an inverted image or an erect image.

  The projection optical system PL includes a terminal optical element 13 having an emission surface 12 from which the exposure light EL is emitted. The exit surface 12 emits the exposure light EL toward the image plane of the projection optical system PL. The last optical element 13 is an optical element closest to the image plane of the projection optical system PL among the plurality of optical elements of the projection optical system PL. The projection region PR includes a position where the exposure light EL emitted from the emission surface 12 can be irradiated. In the present embodiment, the emission surface 12 faces the −Z direction. The exit surface 12 is parallel to the XY plane. The exit surface 12 facing the −Z direction may be a convex surface or a concave surface. In addition, the emission surface 12 may be inclined with respect to the XY plane, or may include a curved surface. In the present embodiment, the optical axis of the last optical element 13 is parallel to the Z axis. In the present embodiment, the exposure light EL emitted from the emission surface 12 travels in the −Z direction.

  The substrate stage 2 is movable in an XY plane including a position (projection region PR) where the exposure light EL from the emission surface 12 can be irradiated while holding the substrate P. The measurement stage 3 is movable in an XY plane including a position (projection region PR) where the exposure light EL from the emission surface 12 can be irradiated with the measurement member (measuring instrument) C mounted. Each of the substrate stage 2 and the measurement stage 3 is movable on the guide surface 9G of the base member 9. In the present embodiment, the guide surface 9G and the XY plane are substantially parallel.

  The substrate stage 2 and the measurement stage 3 are moved by operation of a drive system including a planar motor as disclosed in, for example, US Pat. No. 6,452,292. Each of the substrate stage 2 and the measurement stage 3 can move in six directions on the guide surface 9G in the X axis, Y axis, Z axis, θX, θY, and θZ directions by the operation of the drive system.

  The substrate stage 2 can release the substrate P as disclosed in, for example, US Patent Application Publication No. 2007/0177125, US Patent Application Publication No. 2008/0049209, and US Patent Application Publication No. 2007/0288121. And a second holding part 15 which is disposed around the first holding part 14 and holds the cover member T1 and the scale member (measurement member) T2 in a releasable manner. In the present embodiment, the upper surface of the substrate stage 2 disposed around the substrate P includes the upper surface of the cover member T1. Further, the upper surface of the substrate stage 2 includes the upper surface of the scale member T2.

  The measurement system 4 includes an encoder system that measures the position of the substrate stage 2 using a scale member T2 of the substrate stage 2 as disclosed in, for example, US Patent Application Publication No. 2007/0288121. The measurement system 4 includes an interferometer system.

  When executing the exposure process of the substrate P or when executing a predetermined measurement process, the control device 6 determines the mask stage 1 (mask M) and the substrate stage 2 (substrate P) based on the measurement result of the measurement system 4. And position control of the measurement stage 3 (measurement member C).

  Next, the liquid immersion member 5 according to this embodiment will be described. FIG. 2 is a side view showing an example of the liquid immersion member 5 according to the present embodiment, and FIG. 3 is a view of the liquid immersion member 5 as viewed from the lower side (−Z side).

  The liquid immersion member 5 is in relation to the first member 21 disposed at least at a part of the periphery of the terminal optical element 13 and the optical path K of the exposure light EL emitted from the emission surface 12 (the optical axis of the terminal optical element 13). And a second member 22 disposed outside the first member 21. The first member 21 forms an immersion space LS1 for the liquid LQ. The second member 22 can be separated from the immersion space LS1 to form an immersion space LS2 for the liquid LQ. The immersion space LS1 is formed in at least a part of the first space SP1 below the first member 21. The immersion space LS2 is formed in at least a part of the second space SP2 below the second member 22.

  The first member 21 has a lower surface 23. The second member 22 has a lower surface 24. The lower surface 23 and the lower surface 24 can be opposed to an object that can move below the last optical element 13. An object that can move below the last optical element 13 can face the exit surface 12. The object can be arranged in the projection region PR. The object can move in the XY plane including the projection region PR. The object is movable below the first member 21. The object is movable below the second member 22.

  In the present embodiment, the object is at least the substrate stage 2 (cover member T1, scale member T2), the substrate P held on the substrate stage 2 (first holding unit 14), and the measurement stage 3 (measurement member C). Including one.

  In the following description, the object that can move below the last optical element 13 is the substrate P. As described above, the object movable below the last optical element 13 may be at least one of the substrate stage 2 and the measurement stage 3, or an object different from the substrate P, the substrate stage 2, and the measurement stage 3. But you can.

  The first member 21 forms an immersion space LS1 for the liquid LQ so that the optical path K of the exposure light EL on the emission surface 12 side is filled with the liquid LQ. The immersion space LS1 is formed so that the optical path K between the emission surface 12 and the upper surface of the substrate P (object) is filled with the liquid LQ.

  The first member 21 forms an immersion space LS1 for the liquid LQ in at least a part of the optical path space SPK including the optical path K on the emission surface 12 side and the first space SP1 on the lower surface 23 side. The last optical element 13 and the first member 21 can hold the liquid LQ between the substrate P (object). The immersion space LS1 is formed by the liquid LQ held between the terminal optical element 13 and the first member 21 and the substrate P. The optical path of the exposure light EL between the last optical element 13 and the substrate P is maintained by holding the liquid LQ between the emission surface 12 and the lower surface 23 on the one side and the upper surface of the substrate P (object) on the other side. The immersion space LS1 is formed so that K is filled with the liquid LQ.

  In the exposure of the substrate P, the immersion space LS1 is formed so that the optical path K of the exposure light EL irradiated to the substrate P is filled with the liquid LQ. When the substrate P is irradiated with the exposure light EL, the immersion space LS1 is formed so that only a partial region of the surface of the substrate P including the projection region PR is covered with the liquid LQ.

  In the present embodiment, at least a part of the interface (meniscus, edge) LG1 of the liquid LQ in the immersion space LS1 is formed between the lower surface 23 and the upper surface of the substrate P. That is, the exposure apparatus EX of the present embodiment employs a local liquid immersion method. The outside of the immersion space LS1 (the outside of the interface LG1) is a gas space.

  In the present embodiment, the first member 21 is an annular member. In the present embodiment, a part of the first member 21 is disposed around the last optical element 13. In addition, a part of the first member 21 is disposed around the optical path K of the exposure light EL between the terminal optical element 13 and the substrate P.

  The first member 21 may not be an annular member. For example, the first member 21 may be disposed in a part of the periphery of the terminal optical element 13 and the optical path K. The first member 21 may not be disposed at least at a part of the periphery of the last optical element 13. For example, the first member 21 may be disposed at least part of the periphery of the optical path K between the exit surface 12 and the substrate P and may not be disposed around the terminal optical element 13. The first member 21 may not be disposed at least at a part of the periphery of the optical path K between the emission surface 12 and the substrate P. For example, the first member 21 may be disposed at least at a part of the periphery of the terminal optical element 13 and may not be disposed around the optical path K between the exit surface 12 and the object.

  The first member 21 includes a supply port 31 for supplying the liquid LQ for forming the immersion space LS1, and a recovery port 32 for recovering at least a part of the liquid LQ in the immersion space LS1.

  FIG. 4 is a cross-sectional view of the first member 21 showing the vicinity of the supply port 31. The supply port 31 is disposed so as to face the optical path space SPK (optical path K). The supply port 31 is connected to a liquid supply device 34 that can supply the liquid LQ via a supply flow path 33 formed inside the first member 21. The supply port 31 supplies the liquid LQ from the liquid supply device 34 to the optical path space SPK (optical path K) on the exit surface 12 side.

  The first member 21 has a hole (opening) 20 that the injection surface 12 faces. The exposure light EL emitted from the emission surface 12 can pass through the opening 20 and irradiate the substrate P. At least a part of the liquid LQ supplied from the supply port 31 to the optical path space SPK is supplied onto the substrate P (on the object) through the opening 20. Further, at least a part of the liquid LQ supplied from the supply port 31 to the optical path space SPK is supplied to the first space SP1 through the opening 20. In the present embodiment, the liquid LQ is supplied from the opening 20 to the first space SP1 below the first member 21.

  The liquid supply device 34 includes a liquid adjustment system. The liquid supply device 34 includes, for example, a supply amount adjusting unit 34A that can adjust the supply amount (liquid supply amount per unit time) of the liquid LQ supplied from the supply port 31, and a temperature that adjusts the temperature of the supplied liquid LQ. It has the adjustment part 34B and the temperature sensor 34C which detects the temperature of the liquid LQ to supply. The supply amount adjustment unit 34A includes a mass flow controller. The temperature adjustment unit 34B includes a heating device that can heat the liquid LQ and a cooling device that can cool the liquid LQ.

  A plurality of supply ports 31 may be arranged around the optical path K. As shown in FIG. 2, in the present embodiment, the supply port 31 is arranged on one side (+ X side) and the other side (−X side) with respect to the optical path K. As shown in FIG. 2, in this embodiment, a liquid supply device 34 is connected to each of the supply port 31 on one side and the supply port 31 on the other side. The temperature of the liquid LQ supplied from the supply port 31 on one side and the temperature of the liquid LQ supplied from the supply port 31 on the other side may be substantially equal or different. The supply amount of the liquid LQ supplied from the supply port 31 on one side and the supply amount of the liquid LQ supplied from the supply port 31 on the other side may be substantially equal or different.

  FIG. 5 is a cross-sectional view of the first member 21 showing the vicinity of the recovery port 32. The collection port 32 is disposed so as to face the first space SP1. The substrate P (object) can face the recovery port 32. The recovery port 32 is connected to a liquid recovery device 36 that can recover (suction) the liquid LQ via a recovery flow path 35 formed inside the first member 21. The recovery port 32 can recover (suction) at least part of the liquid LQ in the first space SP1 between the first member 21 and the substrate P. The liquid LQ that has flowed into the recovery channel 35 from the recovery port 32 is recovered by the liquid recovery device 36.

  The liquid recovery device 36 can connect the recovery port 32 to the vacuum system BS. The liquid recovery device 36 includes a storage portion 36A that stores the liquid LQ recovered from the recovery port 32, and a pressure adjustment unit 36B that can adjust the suction force of the recovery port 32. The accommodating portion 36A includes a tank. The pressure adjustment unit 36B includes a pressure adjustment valve and the like.

  In the present embodiment, the first member 21 includes a porous member 37. The porous member 37 has a plurality of holes (openings or pores) through which the liquid LQ can flow. The porous member 37 includes, for example, a mesh filter. The mesh filter is a porous member in which a large number of small holes are formed in a mesh shape.

  In the present embodiment, the porous member 37 is a plate-like member. The porous member 37 has a plurality of holes formed so as to connect the lower surface 37B to which the substrate P can face, the upper surface 37A facing the recovery flow path 35 formed in the first member 21, and the upper surface 37A and the lower surface 37B. And have. In the present embodiment, the recovery port 32 includes a hole of the porous member 37. The liquid LQ recovered through the hole (recovery port 32) of the porous member 37 flows through the recovery channel 35.

  In the present embodiment, both the liquid LQ and the gas in the first space SP1 are recovered (sucked) from the porous member 37 (recovery port 32). Note that only the liquid LQ may be substantially recovered through the porous member 37, and the recovery of the gas may be limited. For example, the pressure (first space SP1) on the lower surface 37B side of the porous member 37 so that the liquid LQ on the substrate P (object) passes through the hole of the porous member 37 and flows into the recovery flow path 35 and does not pass the gas. ) And the pressure on the upper surface 37A side (pressure of the recovery flow path 35) may be adjusted. An example of a technique for recovering only the liquid through the porous member is disclosed in, for example, US Pat. No. 7,292,313.

  The porous member 37 may not be provided.

  In the present embodiment, the liquid LQ is recovered from the recovery port 32 in parallel with the supply of the liquid LQ from the supply port 31, so that the terminal optical element 13 and the first member 21 on one side and the other An immersion space LS1 for the liquid LQ is formed between the substrate P on the side. The immersion space LS1 is formed by the liquid LQ supplied from the supply port 31.

  The lower surface 23 is disposed around the opening 20. In the present embodiment, at least a part of the lower surface 23 is substantially parallel to the XY plane. Note that at least a part of the lower surface 23 may be inclined with respect to the XY plane, or may include a curved surface.

  The lower surface 23 includes a lower surface 23B that is disposed around the opening 20 and cannot collect the liquid LQ, and a lower surface 37B of the porous member 37 that is disposed around the lower surface 23B and can collect the liquid LQ. The liquid LQ cannot pass through the lower surface 23B. The lower surface 23B can hold the liquid LQ with the substrate P.

  In the present embodiment, the lower surface 37 </ b> B capable of collecting the liquid LQ is disposed at the peripheral edge of the lower surface 23. In the XY plane parallel to the lower surface 23 (the upper surface of the substrate P), the lower surface 37B is annular. The lower surface 23B that cannot recover the liquid LQ is disposed inside the lower surface 37B. In the present embodiment, the interface LG1 is disposed between the lower surface 37B and the upper surface of the substrate P.

  A plurality of lower surfaces 37B (collection ports 32) that can collect the liquid LQ may be arranged around the optical path K (opening 20).

  The second member 22 is a member different from the first member 21. The second member 22 is separated from the first member 21. The second member 22 is disposed at a part of the periphery of the first member 21.

  The second member 22 can form an immersion space LS2 for the liquid LQ in at least a part of the second space SP2 below the second member 22. The second space SP2 is a space on the lower surface 24 side. The immersion space LS2 is formed apart from the immersion space LS1. The immersion space LS2 is formed between the lower surface 24 and the upper surface of the substrate P (object). The second member 22 can hold the liquid LQ with the substrate P (object). The immersion space LS2 is formed by the liquid LQ that is held between the second member 22 and the substrate P. Liquid immersion space LS2 is formed by holding liquid LQ between lower surface 24 on one side and the upper surface of substrate P (object) on the other side.

  In the present embodiment, at least a part of the interface (meniscus, edge) LG2 of the liquid LQ in the immersion space LS2 is formed between the lower surface 24 and the upper surface of the substrate P. The outside of the immersion space LS2 (the outside of the interface LG2) is a gas space.

  The immersion space LS2 is smaller than the immersion space LS1. The size of the immersion space includes the volume of the liquid that forms the immersion space. The size of the immersion space includes the weight of the liquid that forms the immersion space. The size of the immersion space includes, for example, the area of the immersion space in a plane parallel to the surface (upper surface) of the substrate P (in the XY plane). The size of the immersion space includes, for example, the dimension of the immersion space in a predetermined direction (for example, the X-axis direction or the Y-axis direction) in a plane (in the XY plane) parallel to the surface (upper surface) of the substrate P. .

  That is, in the plane parallel to the surface (upper surface) of the substrate P (in the XY plane), the immersion space LS2 is smaller than the immersion space LS1. The volume (weight) of the liquid LQ that forms the immersion space LS2 is smaller than the volume (weight) of the liquid LQ that forms the immersion space LS1. The dimension of the immersion space LS2 in the XY plane is smaller than the dimension of the immersion space LS1.

  In the present embodiment, two second members 22 are arranged in the space around the first member 21. In the present embodiment, the second member 22 is disposed on one side (+ X side) and the other side (−X side) of the first member 21 with respect to the X-axis direction. The immersion space LS2 is formed on one side (+ X side) and the other side (−X side) of the immersion space LS1 with respect to the X-axis direction.

  In the following description, the second member 22 disposed on the + X side of the first member 21 is appropriately referred to as a second member 221, and the second member 22 disposed on the −X side of the first member 21 is appropriately included. , Referred to as a second member 222.

  The second member 22 may be disposed only on one side (+ X side) of the first member 21 or may be disposed only on the other side (−X side). The immersion space LS2 may be disposed only on one side (+ X side) of the immersion space LS1, or may be disposed only on the other side (−X side).

  In the present embodiment, at least a part of the lower surface 24 is substantially parallel to the XY plane. Note that at least a part of the lower surface 24 may be inclined with respect to the XY plane, or may include a curved surface.

  In the present embodiment, the position (height) of the lower surface 23 and the position (height) of the lower surface 24 in the Z-axis direction are substantially equal. That is, the distance between the lower surface 23 and the upper surface of the substrate P (object) and the distance between the lower surface 24 and the upper surface of the substrate P (object) are substantially equal.

  Note that the lower surface 24 may be disposed at a position lower than the lower surface 23. That is, the distance between the lower surface 24 and the upper surface of the substrate P (object) may be smaller than the distance between the lower surface 23 and the upper surface of the substrate P (object). Note that the lower surface 24 may be disposed at a position higher than the lower surface 23. That is, the distance between the lower surface 25 and the upper surface of the substrate P (object) may be larger than the distance between the lower surface 24 and the upper surface of the substrate P (object).

  FIG. 6 is a partial cross-sectional view showing an example of the second member 22. The second member 22 includes a supply port 41 for supplying the liquid LQ for forming the immersion space LS2, and a recovery port 42 for recovering at least a part of the liquid LQ in the immersion space LS2.

    In the present embodiment, the supply port 41 is disposed so as to face the second space SP <b> 2 below the second member 22. The substrate P (object) can face the supply port 41. The supply port 41 is disposed on at least a part of the lower surface 24 of the second member 22. The supply port 41 can supply the liquid LQ to the second space SP2.

    In the present embodiment, the recovery port 42 is disposed so as to face the second space SP <b> 2 below the second member 22. The substrate P (object) can face the recovery port 42. The collection port 42 is disposed on at least a part of the lower surface 24 of the second member 22. The recovery port 42 can recover at least a part of the liquid LQ in the second space SP2. The recovery port 42 can recover the gas in the second space SP2. In the present embodiment, the recovery port 42 recovers the liquid LQ together with the gas. At least a portion of the fluid (one or both of the liquid LQ and gas) in the second space SP2 is recovered from the recovery port 42.

  In the present embodiment, at least a part of the recovery port 42 is disposed between the first member 21 and the supply port 41. In addition, at least a part of the recovery port 42 is disposed outside the supply port 41 with respect to the optical path K (first member 21). In the present embodiment, the collection port 42 is disposed so as to surround the supply port 41. In a plane parallel to the lower surface 24 (in the XY plane), the recovery port 42 is annular.

  A plurality of recovery ports 42 may be arranged around the supply port 41. That is, the plurality of recovery ports 42 may be discretely arranged around the supply port 41.

  The supply port 41 is connected to a liquid supply device 44 that can supply the liquid LQ via a supply flow path 43 formed inside the second member 22. The supply port 41 supplies the liquid LQ from the liquid supply device 44 to the second space SP2.

  The liquid supply device 44 includes a liquid adjustment system. The liquid supply device 44 includes, for example, a supply amount adjusting unit 44A that can adjust the supply amount (liquid supply amount per unit time) of the liquid LQ supplied from the supply port 41, and a temperature that adjusts the temperature of the supplied liquid LQ. It has the adjustment part 44B and the temperature sensor 44C which detects the temperature of the liquid LQ to supply. The supply amount adjusting unit 44A includes a mass flow controller. The temperature adjustment unit 44B includes a heating device that can heat the liquid LQ and a cooling device that can cool the liquid LQ.

  As shown in FIG. 2, in the present embodiment, the liquid supply device 44 is connected to each of the second member 221 on one side and the second member 222 on the other side. In the present embodiment, the temperature of the liquid LQ supplied from the supply port 41 of the second member 221 on one side and the temperature of the liquid LQ supplied from the supply port 41 of the second member 222 on the other side are substantially equal. May be equal to or different from each other. The supply amount of the liquid LQ supplied from the supply port 41 of the second member 221 on one side is substantially equal to the supply amount of the liquid LQ supplied from the supply port 41 of the second member 22 on the other side. It may be different or different.

  The recovery port 42 is connected to a liquid recovery device 46 capable of recovering (suctioning) the liquid LQ (gas) via a recovery channel 45 formed inside the second member 22. The recovery port 42 can recover (suck) at least a part of the liquid LQ in the second space SP2 between the second member 22 and the substrate P. The liquid LQ recovered from the second space SP2 below the second member 22 flows through the recovery channel 45. The liquid LQ that has flowed into the recovery channel 45 from the recovery port 42 is recovered by the liquid recovery device 46.

  The liquid recovery device 46 can connect the recovery port 42 to the vacuum system BS. The liquid recovery device 46 includes a storage portion 46A that stores the liquid LQ recovered from the recovery port 42, and a pressure adjustment unit 46B that can adjust the suction force of the recovery port 42. The accommodating portion 46A includes a tank. The pressure adjustment unit 46B includes a pressure adjustment valve and the like.

  The suction force of the recovery port 42 depends on the difference between the pressure of the recovery channel 45 and the pressure of the second space SP2. The suction force of the recovery port 42 is determined by the pressure difference between the recovery flow path 45 and the second space SP2. In the present embodiment, the pressure adjusting unit 46B can adjust the pressure of the recovery flow path 45. The chamber device 11 can adjust the pressure in the second space SP2.

  As shown in FIG. 2, in the present embodiment, a liquid recovery device 46 is connected to each of the second member 221 on one side and the second member 222 on the other side. In the present embodiment, the recovery force (suction force) of the recovery port 41 of the second member 221 on one side and the recovery force (suction force) of the recovery port 42 of the second member 222 on the other side are substantially equal. It may be different or different.

  In the present embodiment, the liquid LQ is recovered from the recovery port 42 in parallel with the supply of the liquid LQ from the supply port 41, whereby the second member 22 on one side and the substrate P on the other side In the meantime, an immersion space LS2 is formed with the liquid LQ. The immersion space LS2 is formed by the liquid LQ supplied from the supply port 41.

  FIG. 7 is a plan view showing an example of the substrate stage 2 and the measurement stage 3. The substrate P is held by the first holding unit 14 so that the surface (upper surface) of the substrate P and the XY plane are substantially parallel. The cover member T1 and the scale member T2 are held by the second holding unit 15 so that the upper surface of the cover member T1 and the upper surface of the scale member T2 are substantially parallel to the XY plane. In the present embodiment, the upper surface of the substrate P held by the first holding unit 14, the upper surface of the cover member T1 and the upper surface of the scale member T2 held by the second holding unit 15 are substantially in the same plane. Be placed. Note that the upper surface of the substrate P held by the first holding unit 14 and one or both of the upper surface of the cover member T1 and the scale member T2 held by the second holding unit 15 are not arranged in the same plane. Also good. One or both of the upper surface of the cover member T1 and the upper surface of the scale member T2 may be inclined with respect to the upper surface of the substrate P, or one or both of the upper surface of the cover member T1 and the upper surface of the scale member T2 have a curved surface. May be included.

  The cover member T1 is disposed around the substrate P. The cover member T1 is adjacent to the substrate P through the gap Ga. A gap Ga is provided between the substrate P and the cover member T1.

  The scale member T2 is disposed around the cover member T1. The scale member T2 is adjacent to the cover member T1 through the gap Gb. A gap Gb is formed between the cover member T1 and the scale member T2.

  In the present embodiment, as disclosed in, for example, U.S. Patent Application Publication No. 2006/0023186 and U.S. Patent Application Publication No. 2007/0127006, it is formed below the terminal optical element 13 and the first member 21. The upper surface of the substrate stage 2 (the upper surface of the scale member T2) and the upper surface of the measurement stage 3 are brought close to or in contact with each other so that the immersion space LS1 moves from one to the other on the substrate stage 2 and the measurement stage 3. In this state, the substrate stage 2 and the measurement stage 3 are movable in the XY plane with respect to the terminal optical element 13 and the first member 21.

  In the following description, the substrate stage 2 and the measurement stage 3 are placed on the XY plane with respect to the last optical element 13 and the first member 21 in a state where the upper surface of the substrate stage 2 and the upper surface of the measurement stage 3 are close to or in contact with each other. The operation of moving in a synchronized manner is appropriately referred to as a scrum moving operation.

  In the present embodiment, as shown in FIG. 7, in the scram moving operation, the + Y side edge of the upper surface of the substrate stage 2 and the + Y side edge of the upper surface of the measurement stage 3 approach or come into contact with each other.

  By the scram moving operation, the immersion space LS1 formed below the last optical element 13 and the first member 21 moves from one side to the other on the substrate stage 2 and the measurement stage 3. The immersion space LS2 formed below the second member 22 moves from one to the other on the substrate stage 2 and the measurement stage 3.

  In the scram moving operation, the substrate stage 2 is adjacent to the measurement stage 3 through the gap Gc. In the scram moving operation, a gap Gc is provided between the substrate stage 2 and the measurement stage 3.

  The upper surface of the measurement stage 3 is arranged around the measurement member C. The upper surface of the measurement stage 3 is adjacent to the measurement member C through the gap Gd. A gap Gd is formed between the measurement stage 3 and the measurement member C.

  Next, a method for exposing the substrate P using the exposure apparatus EX having the above-described configuration will be described.

  At a substrate exchange position away from the liquid immersion member 5, a process of loading (loading) the substrate P before exposure into the substrate stage 2 (first holding unit) is performed. In addition, the measurement stage 3 is disposed so as to face the last optical element 13 and the liquid immersion member 5 in at least a part of the period in which the substrate stage 2 is separated from the liquid immersion member 5.

  The supply port 31 (opening 20) of the first member 21 can supply the liquid LQ to the first space SP1 below the first member 21. The recovery port 32 of the first member 21 can suck the fluid (one or both of the liquid LQ and the gas) in the first space SP1. In parallel with at least a part of the supply of the liquid LQ from the supply port 31, the liquid LQ is recovered from the recovery port 32, whereby an immersion space LS1 of the liquid LQ is formed in the first space SP1.

  The supply port 41 of the second member 22 can supply the liquid LQ to the second space SP <b> 2 below the second member 22. The recovery port 42 of the second member 22 can suck the fluid (one or both of the liquid LQ and the gas) in the second space SP2. In parallel with at least part of the supply of the liquid LQ from the supply port 41, the liquid LQ is recovered from the recovery port 42, whereby an immersion space LS2 of the liquid LQ is formed in the second space SP2.

  In a state where the measurement stage 3 is disposed so as to face the terminal optical element 13 and the liquid immersion member 5, the first and second liquid immersion spaces LS1 and LS2 are formed on the measurement stage 3.

  After the substrate P before exposure is loaded onto the substrate stage 2 and the measurement process using the measurement stage 3 is completed, the control device 6 causes the last optical element 13 and the liquid immersion member 5 to face the substrate stage 2 (substrate P). Then, the substrate stage 2 is moved. The scram movement operation is executed so that the terminal optical element 13 and the liquid immersion member 5 and the measurement stage 3 are changed from the facing state to the state in which the terminal optical element 13 and the liquid immersion member 5 and the substrate stage 2 are facing each other. The The recovery of the liquid LQ from the recovery port 32 is performed in parallel with the supply of the liquid LQ from the supply port 31 with the last optical element 13 and the liquid immersion member 5 facing the substrate stage 2 (substrate P). Thus, an immersion space LS1 is formed between the last optical element 13 and the first member 21 and the substrate stage 2 (substrate P) so that the optical path K of the exposure light EL on the exit surface 12 side is filled with the liquid LQ. The Further, by collecting the liquid LQ from the collection port 42 in parallel with the supply of the liquid LQ from the supply port 41, the immersion space LS2 between the second member 22 and the substrate stage 2 (substrate P). Is formed.

  The control device 6 starts the exposure process for the substrate P. The control device 6 emits the exposure light EL from the illumination system IL in a state where the immersion space LS1 is formed on the substrate P and the immersion space LS2 is formed on at least one of the substrate P and the substrate stage 2. To do. The illumination system IL illuminates the mask M with the exposure light EL. The exposure light EL from the mask M is irradiated onto the substrate P through the projection optical system PL and the liquid LQ in the immersion space LS1 between the emission surface 12 and the substrate P. Accordingly, the substrate P is exposed with the exposure light EL emitted from the emission surface 12 through the liquid LQ in the immersion space LS1, and the pattern image of the mask M is projected onto the substrate P.

    The exposure apparatus EX of the present embodiment is a scanning exposure apparatus (so-called scanning stepper) that projects an image of the pattern of the mask M onto the substrate P while synchronously moving the mask M and the substrate P in a predetermined scanning direction. In the present embodiment, the scanning direction (synchronous movement direction) of the substrate P is the Y-axis direction, and the scanning direction (synchronous movement direction) of the mask M is also the Y-axis direction. The control device 6 moves the substrate P in the Y-axis direction with respect to the projection region PR of the projection optical system PL, and in the illumination region IR of the illumination system IL in synchronization with the movement of the substrate P in the Y-axis direction. On the other hand, the substrate P is irradiated with the exposure light EL through the projection optical system PL and the liquid LQ in the immersion space LS1 on the substrate P while moving the mask M in the Y-axis direction.

  In a state where the immersion space LS1 is formed, the substrate P (object) moves in the XY plane, whereby a part of the liquid LQ in the immersion space LS1 is separated from the immersion space LS1, and the first space. There is a possibility of movement (outflow) to the outside of SP1. In the present embodiment, the immersion space LS2 is formed in a part of the periphery of the first space SP1. Therefore, the liquid LQ that has moved to the outside of the first space SP1 is captured in the immersion space LS2. The liquid LQ captured in the immersion space LS2 is recovered from the recovery port 42 together with the liquid LQ in the immersion space LS2.

  In the present embodiment, the immersion space LS2 is smaller than the immersion space LS1. Therefore, when the substrate P (object) moves in a state where the immersion spaces LS1 and LS2 are formed, a part of the liquid LQ in the immersion space LS2 is separated from the immersion space LS2 and outside the second space SP2. (Moving out) is suppressed. In other words, since the immersion space LS2 is smaller than the immersion space LS1, a part of the liquid LQ in the immersion space LS2 flows out from the second space SP2, and a part of the liquid LQ in the immersion space LS1 It is suppressed from flowing out of the first space SP1.

  FIG. 8 is a diagram illustrating an example of the substrate P held on the substrate stage 2. In the present embodiment, a plurality of shot areas S, which are exposure target areas, are arranged in a matrix on the substrate P. The control device 6 sequentially exposes the plurality of shot regions S of the substrate P held on the substrate stage 2 (first holding unit 14) with the exposure light EL through the liquid LQ in the immersion space LS1. Each of the plurality of shot areas S is exposed while moving the substrate P in the Y-axis direction with respect to the exposure light EL (projection area PR).

  For example, in order to expose the first shot region S of the substrate P, the control device 6 causes the substrate P (first shot region S) to be projected onto the projection optical system PL in the state where the immersion spaces LS1 and LS2 are formed. While moving in the Y-axis direction with respect to the projection region PR, in synchronization with the movement of the substrate P in the Y-axis direction, while moving the mask M in the Y-axis direction with respect to the illumination region IR of the illumination system IL, The first shot region S is irradiated with the exposure light EL through the projection optical system PL and the liquid LQ in the immersion space LS1 on the substrate P. As a result, an image of the pattern of the mask M is projected onto the first shot area S of the substrate P, and the first shot area S is exposed with the exposure light EL emitted from the emission surface 12. After the exposure of the first shot region S is completed, the control device 6 starts the exposure of the next second shot region S, and the substrate P in a state where the immersion spaces LS1 and LS2 are formed. Is moved in a direction intersecting the X axis in the XY plane (for example, the X axis direction or a direction inclined with respect to the X axis and Y axis directions in the XY plane), and the second shot area S is moved to the exposure start position. Move to. Thereafter, the control device 6 starts exposure of the second shot region S.

  The control device 6 performs shots on the position (projection region PR) irradiated with the exposure light EL from the emission surface 12 in the state where the immersion spaces LS1 and LS2 are formed on the substrate P (substrate stage 2). The operation of exposing the shot area while moving the area in the Y-axis direction, and the next shot in the state where the immersion spaces LS1 and LS2 are formed on the substrate P (substrate stage 2) after the exposure of the shot area The substrate P is placed in a direction crossing the Y-axis direction in the XY plane (X-axis direction, a direction inclined with respect to the X-axis and Y-axis directions in the XY plane, etc.) so that the region is arranged at the exposure start position. The plurality of shot areas of the substrate P are sequentially exposed by repeating the moving operation.

  In the following description, in order to expose the shot area, the position (in which the exposure light EL from the emission surface 12 is irradiated) in the state where the immersion spaces LS1 and LS2 are formed on the substrate P (substrate stage 2) ( The operation of moving the substrate P (shot region) in the Y-axis direction with respect to the projection region PR) is appropriately referred to as a scan movement operation. In addition, after the exposure of a certain shot area, in order to expose the next shot area, the next shot area is at the exposure start position in the state where the immersion spaces LS1 and LS2 are formed on the substrate P (substrate stage 2). The operation of moving the substrate P in the direction crossing the Y-axis direction in the XY plane as appropriate is referred to as a step movement operation as appropriate.

  The plurality of shot regions S of the substrate P are sequentially exposed by repeating the scan movement operation and the step movement operation.

  The scan movement operation is a constant speed movement exclusively in the Y-axis direction. The step movement operation includes non-constant speed movement (acceleration / deceleration movement). For example, the step movement operation between two shot areas adjacent in the X-axis direction includes non-constant speed movement (acceleration / deceleration movement) in the Y-axis direction and non-constant speed movement (acceleration / deceleration movement) in the X-axis direction.

  In the present embodiment, the control device 6 moves the substrate stage 2 so that the projection region PR of the projection optical system PL and the substrate P relatively move along a movement locus indicated by an arrow Sr in FIG. The projection area PR is irradiated with the exposure light EL while moving, and the plurality of shot areas S of the substrate P are sequentially exposed with the exposure light EL via the liquid LQ.

  After the exposure of the plurality of shot regions S of the substrate P is completed, the substrate stage 2 holding the substrate P after the exposure moves to the substrate exchange position. The measurement stage 3 is disposed so as to face the terminal optical element 13 and the liquid immersion member 5. The scram moving operation is executed so that the terminal optical element 13 and the liquid immersion member 5 and the substrate stage 2 are changed from the facing state to the state in which the terminal optical element 13 and the liquid immersion member 5 and the measurement stage 3 are facing each other. The

  Thereafter, the same processing is repeated to sequentially expose the plurality of substrates P.

  In at least a part of the exposure time (including the scan movement operation and the step movement operation), the scram movement operation, and the measurement process, the immersion spaces LS1 and LS2 are on the upper surface of the substrate P (only the upper surface of the substrate P). In some cases). The immersion spaces LS1 and LS2 may be formed on the gap Ga between the substrate P and the cover member T1 (so as to straddle the substrate P and the cover member T1). Further, the immersion spaces LS1 and LS2 may be formed on the upper surface of the cover member T1 (only on the upper surface of the cover member T1). Moreover, the immersion spaces LS1 and LS2 may be formed on the gap Gb between the cover member T1 and the scale member T2 (so as to straddle the cover member T1 and the scale member T2). Further, the immersion spaces LS1 and LS2 may be formed on the upper surface of the scale member T2 (only on the upper surface of the scale member T2). Further, the immersion spaces LS1 and LS2 may be formed on the gap Gc between the substrate stage 2 and the measurement stage 3 (so as to straddle the substrate stage 2 and the measurement stage 3). The immersion spaces LS1 and LS2 may be formed on the upper surface of the measurement stage 3 (only on the upper surface of the measurement stage 3). The immersion spaces LS1 and LS2 may be formed on the upper surface of the measurement member C (only on the upper surface of the measurement member C). Moreover, the immersion spaces LS1 and LS2 may be formed on the gap Gd between the measurement stage 3 and the measurement member C (so as to straddle the measurement stage 3 and the measurement member C).

  In the following description, the gaps Ga, Gb, Gc, and Gd are collectively referred to as a gap G as appropriate. An object such as the substrate P is appropriately referred to as an object B. Of the two objects forming the gap G, one object B is appropriately referred to as a first object B1, and the other object B is appropriately referred to as a second object B2. The second object B2 is adjacent to the first object B1 through the gap G. The gap G is formed between the first object B1 and the second object B2.

  In the present embodiment, when the first object B1 is the substrate P, the second object B2 is the cover member T1 disposed around the substrate P. When the first object B1 is the cover member T1, the second object B2 is the substrate P. When the first object B1 is the cover member T1 (or scale member T2), the second object B2 is the scale member T2 (or cover member T1). When the first object B1 is the substrate stage 2 (or measurement stage 3), the second object B2 is the measurement stage 3 (or substrate stage 2). When the first object B1 is the measurement member C (or measurement stage 3), the second object B2 is the measurement stage 3 (or measurement member C).

  The gap G may be a gap formed between the first object B1 and the second object B2, or may be a gap (slit, opening, etc.) of one object B.

  In the present embodiment, XY in which the object B having the predetermined area PA intersects the optical axis (Z axis) of the last optical element 13 below the second member 22 in the state where the immersion space LS2 is formed. Move in the plane.

  The control device 6 changes one or both of the supply amount of the liquid LQ from the supply port 41 and the suction force of the recovery port 42 during at least a part of the period during which the object B having the predetermined area PA moves.

  The predetermined area PA is an area where the liquid LQ is more likely to remain after passing through the immersion space LS2 than the area outside the predetermined area PA. The predetermined area PA is an area where the liquid LQ is more likely to remain after passing through the immersion space LS1 than the area outside the predetermined area PA.

  The predetermined area PA is an area where the liquid LQ tends to flow out from the second space SP2 between the second area 22 and the second area 22. That is, there is a possibility that the liquid LQ may flow out from the second space SP2 between the second member 22 and the predetermined area PA, and the second space between the second member 22 and the area outside the predetermined area PA. It is higher than the possibility that the liquid LQ flows out from SP2.

  The predetermined area PA is a partial area of the object B (first and second objects B1, B2). The area outside the predetermined area PA is a partial area of the object B (first and second objects B1, B2).

  In the present embodiment, the predetermined area PA includes the gap G of the object B.

  FIG. 9 shows an example of the operation of the second member 22. FIG. 9 shows that the second member 22 and the first and second objects B1 and B2 are connected to the optical axis of the last optical element 13 so that the immersion space LS2 moves from the first object B1 to the second object B2. An example of a state of relative movement in an XY plane substantially perpendicular to the (Z axis) is shown. A gap (gap part) G is provided between the first object B1 and the second object B2.

  FIG. 9A shows a state in which the immersion space LS2 is formed on the upper surface of the first object B1. FIG. 9B shows a state in which the immersion space LS2 is formed on the gap G. In the example illustrated in FIG. 9, the state changes from the state in which the immersion space LS <b> 2 is formed on the upper surface of the first object B <b> 1 to the state in which the liquid immersion space LS <b> 2 is formed on the upper surface of the second object B <b> 2. As described above, the first and second objects B <b> 1 and B <b> 2 move in the −Y direction with respect to the second member 22.

  The control device 6 determines one of the supply amount of the liquid LQ from the supply port 41 and the suction force of the recovery port 42 during at least a part of the period during which the immersion space LS2 moves from the first object B1 to the second object B2. Or change both.

  The control device 6 can adjust the supply amount of the liquid LQ from the supply port 41 by controlling the liquid supply device 44.

  The suction force of the recovery port 42 is determined based on the pressure difference between the recovery flow path 45 and the second space SP2. The pressure in the recovery channel 45 is adjusted by the pressure adjustment unit 46B of the liquid recovery device 46. The pressure in the second space SP2 is controlled by the chamber device 11. The control device 6 can adjust the suction force of the recovery port 42 by controlling one or both of the liquid recovery device 46 and the chamber device 11.

  In the present embodiment, the control device 6 includes the pressure of the liquid LQ in the immersion space LS2 formed between the second member 22 and the first object B1, and the second member 22 and the second object B2. One or both of the supply amount of the liquid LQ from the supply port 41 and the suction force of the recovery port 42 are changed so that the difference from the pressure of the liquid LQ in the formed immersion space LS2 becomes small. Further, the control device 6 determines the pressure of the liquid LQ in the immersion space LS2 when the entire immersion space LS2 is formed on the first object B1, and the time when the immersion space LS2 is formed on the gap G. One or both of the supply amount of the liquid LQ from the supply port 41 and the suction force of the recovery port 42 are changed so that the difference from the pressure of the liquid LQ in the immersion space LS2 becomes small. Further, the control device 6 determines the pressure of the liquid LQ in the immersion space LS2 when the entire immersion space LS2 is formed on the second object B2, and the time when the immersion space LS2 is formed on the gap G. One or both of the supply amount of the liquid LQ from the supply port 41 and the suction force of the recovery port 42 are changed so that the difference from the pressure of the liquid LQ in the immersion space LS2 becomes small.

  In the present embodiment, the suction force of the recovery port 42 in a state where the second member 22 and the predetermined area PA (gap G) face each other, and the area outside the second member 22 and the predetermined area PA (gap G) (first area). The suction force of the recovery port 42 in a state where at least one of the upper surface of the object B1 and the upper surface of the second object B2 is opposed is different. In the present embodiment, the recovery port includes a state in which the entire immersion space LS2 is formed on the first object B1 or the second object B2, and a state in which the immersion space LS2 is formed on the gap G. The suction force of 42 is different.

  For example, the control device 6 determines the suction force of the recovery port 42 in a state where the second member 22 and the predetermined area PA (gap G) face each other, the area outside the second member 22 and the predetermined area PA (gap G) ( The suction force of the recovery port 42 in a state where at least one of the upper surface of the first object B1 and the upper surface of the second object B2 faces each other is set larger. That is, the control device 6 forms the suction force of the recovery port 42 in a state where the immersion space LS2 is formed on the gap G, and the entire immersion space LS2 is formed on the first object B1 or the second object B2. The suction force of the collection port 42 in a state where the recovery is performed is made larger.

  Thereby, for example, the liquid LQ in the immersion space LS2 flows into the gap G, the liquid LQ in the immersion space LS2 flows out of the second space SP2, or the liquid LQ is in the first and second objects B1, B2. It is suppressed that it remains on top.

  The supply amount of the liquid LQ from the supply port 41 in a state where the second member 22 and the predetermined area PA (gap G) face each other, and the area (first object) outside the second member 22 and the predetermined area PA (gap G). The supply amount of the liquid LQ from the supply port 41 in a state where at least one of the upper surface of B1 and the upper surface of the second object B2 faces each other may be different. That is, in the state where the entire immersion space LS2 is formed on the first object B1 or the second object B2, and the state where the immersion space LS2 is formed on the gap G, The supply amount of the liquid LQ may be different.

  For example, the control device 6 determines the supply amount of the liquid LQ from the supply port 41 in a state where the second member 22 and the predetermined area PA (gap G) face each other, in the second member 22 and the predetermined area PA (gap G). The supply amount of the liquid LQ from the supply port 41 in a state where the outer region (at least one of the upper surface of the first object B1 and the upper surface of the second object B2) faces may be smaller. That is, the control device 6 determines the supply amount of the liquid LQ from the supply port 41 in a state where the immersion space LS2 is formed on the gap G, and the entire immersion space LS2 is on the first object B1 or the second object. It may be less than the supply amount in the state formed on B2.

  As a result, the liquid LQ flows into the gap G, the liquid LQ in the immersion space LS2 flows out of the second space SP2, or the liquid LQ remains on the first and second objects B1 and B2. It is suppressed.

  The control device 6 determines the supply amount of the liquid LQ from the supply port 41 in a state where the second member 22 and the predetermined area PA (gap G) face each other, in the second member 22 and the predetermined area PA (gap G). The suction force of the recovery port 42 in a state where the second member 22 and the predetermined region PA (gap G) are opposed to each other is made smaller than the supply amount of the liquid LQ from the supply port 41 in a state where the outer region is opposed. The suction force of the recovery port 42 in a state where the second member 22 and the region outside the predetermined region PA (gap G) face each other may be set larger.

  As a result, the liquid LQ flows into the gap G, the liquid LQ in the immersion space LS2 flows out of the second space SP2, or the liquid LQ remains on the first and second objects B1 and B2. It is suppressed.

  Note that the suction force of the recovery port 42 in a state where the second member 22 and the predetermined area PA face each other is more than the suction force of the recovery port 42 in a state where the second member 22 and the region outside the predetermined area PA face each other. It may be small. That is, the suction force of the recovery port 42 in the state where the immersion space LS2 is formed on the gap G is the state in which the entire immersion space LS2 is formed on the first object B1 or the second object B2. The suction force of the collection port 42 may be smaller.

  Note that the supply amount of the liquid LQ from the supply port 41 in a state where the second member 22 and the predetermined region PA are opposed to each other is from the supply port 41 in a state where the second member 22 and the region outside the predetermined region PA are opposed. It may be larger than the supply amount of the liquid LQ. That is, in the state where the immersion space LS2 is formed on the gap G, the supply amount of the liquid LQ from the supply port 41 is that the entire immersion space LS2 is formed on the first object B1 or the second object B2. It may be larger than the supply amount of the liquid LQ from the supply port 41 in the closed state.

  A pressure sensor 50 that detects the pressure of the liquid LQ in the immersion space LS2 may be provided. The control device 6 may adjust one or both of the supply amount of the liquid LQ from the supply port 41 and the suction force of the recovery port 42 based on the detection result of the pressure sensor 50. The control device 6 uses the pressure of the liquid LQ in the liquid immersion space LS2 formed between the second member 22 and the first object B1, and the liquid immersion formed between the second member 22 and the second object B2. Based on the detection result of the pressure sensor 50, one or both of the supply amount of the liquid LQ from the supply port 41 and the suction force of the recovery port 42 are adjusted so that the difference from the pressure of the liquid LQ in the space LS2 becomes small. May be.

  Further, the control device 6 determines the pressure of the liquid LQ in the immersion space LS2 when the entire immersion space LS2 is formed on the first object B1, and the time when the immersion space LS2 is formed on the gap G. Based on the detection result of the pressure sensor 50, one or both of the supply amount of the liquid LQ from the supply port 41 and the suction force of the recovery port 42 are reduced so that the difference from the pressure of the liquid LQ in the immersion space LS2 becomes small. You may adjust.

  Further, the control device 6 determines the pressure of the liquid LQ in the immersion space LS2 when the entire immersion space LS2 is formed on the second object B2, and the time when the immersion space LS2 is formed on the gap G. Based on the detection result of the pressure sensor 50, one or both of the supply amount of the liquid LQ from the supply port 41 and the suction force of the recovery port 42 are reduced so that the difference from the pressure of the liquid LQ in the immersion space LS2 becomes small. You may adjust.

  The control device 6 may adjust one or both of the supply amount of the liquid LQ from the supply port 41 and the suction force of the recovery port 42 without using the detection result of the pressure sensor 50. Note that the pressure sensor 50 may not be provided.

  The control device 6 determines one or both of the supply amount of the liquid LQ from the supply port 41 and the suction force of the suction port 42 based on the position of the object B (first and second objects B1, B2) in the XY plane. You may adjust. For example, when the first object B1 is the substrate P and the second object B2 is the cover member T1 disposed around the substrate P, at least one of the substrate P, the cover member T1, and the gap Ga in the XY plane. Based on the position, the pressure of the liquid LQ in the immersion space LS2 when the entire immersion space LS2 is formed on the substrate P or the cover member T1, and the time when the immersion space LS2 is formed on the gap G One or both of the supply amount of the liquid LQ from the supply port 41 and the suction force of the recovery port 42 may be adjusted so that the difference from the pressure of the liquid LQ in the immersion space LS2 becomes small.

  In the present embodiment, the measurement system 4 can measure the position of the substrate stage 2 in the XY plane. By measuring the position of the substrate stage 2, at least one position of the substrate P, the cover member T1, and the gap Ga in the XY plane is obtained. For example, information regarding the position of the gap Ga on the substrate stage 2 is stored in the storage device 7. For example, when the measurement system 4 is an interferometer system, the positional relationship between the measurement mirror of the substrate stage 2 irradiated with the measurement light of the interferometer system and the gap Ga on the substrate stage 2 is stored in the storage device 7. . The positional relationship is known from, for example, design values. Based on the storage information of the storage device 7 and the measurement result of the measurement system 4, the position of the gap Ga in the XY plane can be obtained. The control device 6 determines the pressure of the liquid LQ in the immersion space LS2 when the entire immersion space LS2 is formed on at least one of the substrate P and the cover member T1 based on the obtained position of the gap Ga, The supply amount of the liquid LQ from the supply port 41 and the suction force of the suction port 42 are reduced so that the difference from the pressure of the liquid LQ in the immersion space LS2 when the immersion space LS2 is formed on the gap Ga is reduced. One or both can be adjusted.

  When the measurement system 4 includes a mark detection device that detects the alignment mark of the substrate P, the control device 6 uses the measurement result of the interferometer system that measures the position of the substrate stage 2 and the detection result of the mark detection device. Based on this, the position of the substrate P in the coordinate system defined by the interferometer system can be obtained. By obtaining the position of the substrate P, the position of the gap Ga formed around the substrate P (the position of the gap Ga in the coordinate system defined by the interferometer system) is obtained. Further, by obtaining the position of the substrate P, the position of the cover member T1 formed around the substrate P (the position of the cover member T1 in the coordinate system defined by the interferometer system) is obtained. Based on the measurement result of the interferometer system and the detection result of the mark detection device, the control device 6 uses the immersion space LS2 when the entire immersion space LS2 is formed on at least one of the substrate P and the cover member T1. The supply amount of the liquid LQ from the supply port 41 so that the difference between the pressure of the liquid LQ and the pressure of the liquid LQ in the immersion space LS2 when the immersion space LS2 is formed on the gap Ga is small. One or both of the suction forces of the suction port 42 can be adjusted.

  When an alignment mark is provided on an object B (first and second objects B1, B2) different from the substrate P, such as the substrate stage 2 or the measurement stage 3, the mark detection apparatus detects the object B (first object). 1, the alignment mark of the second object B1, B2) can be detected. The control device 6 aligns the measurement result of the interferometer system that measures the position of the object B (first and second objects B1 and B2) in the XY plane and the object B (first and second objects B1 and B2). Based on the detection result of the mark detection device that detects the mark, the pressure of the liquid LQ in the immersion space LS2 when the entire immersion space LS2 is formed in the object B (first and second objects B1, B2). And the supply amount of the liquid LQ from the supply port 41 and the suction of the suction port 42 so that the difference between the pressure of the liquid LQ in the immersion space LS2 when the immersion space LS2 is formed on the gap G is reduced. One or both of the forces can be adjusted.

  The second member 22 and the first and second objects B1 and B2 are arranged such that the immersion space LS2 moves from the second object B2 to the first object B1. The same applies to the case of relative movement in the XY plane substantially perpendicular to ().

  As described above, according to the present embodiment, the object B (first and second objects B1, B2) having the predetermined area PA (gap G) is the second in the state where the immersion space LS2 is formed. Since at least a part of the supply amount of the liquid LQ from the supply port 41 and the suction force of the recovery port 42 are changed during at least a part of the period of moving below the member 22, the outflow of the liquid LQ is suppressed. The Therefore, the occurrence of exposure failure and the occurrence of defective devices are suppressed.

  In the present embodiment, the predetermined area PA is the gap G formed between the first object B1 and the second object B2. The predetermined area PA may be a gap (slit, opening, etc.) provided in one object B.

Second Embodiment
Next, a second embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 10 shows an example of the operation of the second member 22 according to the present embodiment. The object B having the predetermined area PA is moved below the second member 22 in the XY plane.

  In the present embodiment, the predetermined area PA includes a step (step portion) D of the object B. In the present embodiment, a step (step portion) D is provided between the first portion Bp1 and the second portion Bp2 of the object B. In the example shown in FIG. 10, the upper surface of the second portion Bp2 is arranged on the + Z side (upper side) than the upper surface of the first portion Bp1. The first part Bp1 is disposed on the −Y side of the second part Bp2.

  FIG. 10 shows that the second member 22 and the object B are substantially the optical axis (Z axis) of the last optical element 13 so that the immersion space LS2 moves from the first part Bp1 to the second part Bp2. An example of a state of relative movement in a vertical XY plane is shown.

  FIG. 10A shows a state in which the immersion space LS2 is formed on the upper surface of the first portion Bp1. FIG. 10B shows a state where the immersion space LS2 is formed on the upper surface of the second portion Bp2. In this embodiment, the liquid immersion space LS2 changes from the state formed on the upper surface of the first portion Bp1 to the state formed on the upper surface of the second portion Bp2 through the state formed on the step D. As described above, the object B moves in the −Y direction with respect to the second member 22.

  In the present embodiment, the control device 6 controls the supply amount of the liquid LQ from the supply port 41 and the recovery port during at least a part of the period during which the immersion space LS2 moves from the first portion Bp1 to the second portion Bp2. Change one or both of the 42 suction forces.

  The control device 6 is configured such that the pressure of the liquid LQ in the liquid immersion space LS2 formed between the second member 22 and the first part Bp1 and the liquid immersion formed between the second member 22 and the second part Bp2. One or both of the supply amount of the liquid LQ from the supply port 41 and the suction force of the recovery port 42 are changed so that the difference from the pressure of the liquid LQ in the space LS2 becomes small. For example, when the distance between the lower surface 24 of the second member 22 and the upper surface of the second portion Bp2 is shorter than the distance between the lower surface 24 of the second member 22 and the upper surface of the first portion Bp1, the control device 6 The pressure of the liquid LQ in the immersion space LS2 formed between the member 22 and the first part Bp1, and the pressure of the liquid LQ in the immersion space LS2 formed between the second member 22 and the second object B2. One or both of the supply amount of the liquid LQ from the supply port 41 and the suction force of the recovery port 42 are changed so that the difference between the two is small.

  Further, the control device 6 determines that the pressure of the liquid LQ in the immersion space LS2 when the entire immersion space LS2 is formed on the first portion Bp1 and the immersion space LS is formed on the step portion D. One or both of the supply amount of the liquid LQ from the supply port 41 and the suction force of the recovery port 42 may be changed so that the difference from the pressure of the liquid LQ in the immersion space LS2 becomes small. Further, the control device 6 determines that the pressure of the liquid LQ in the immersion space LS2 when the entire immersion space LS2 is formed on the second portion Bp2, and the immersion space LS is formed on the step portion D. One or both of the supply amount of the liquid LQ from the supply port 41 and the suction force of the recovery port 42 may be changed so that the difference from the pressure of the liquid LQ in the immersion space LS2 becomes small.

  For example, the control device 6 uses the suction force of the recovery port 42 in a state where the second member 22 and the second part Bp2 face each other, and sucks the recovery port 42 in the state where the second member 22 and the first part Bp1 face each other. It may be greater than the force.

  The control device 6 uses the suction force of the recovery port 42 in a state where the second member 22 and the predetermined area PA (stepped portion D) face each other to the area outside the second member 22 and the predetermined area PA (stepped portion D) ( It may be larger than the suction force of the recovery port 42 in a state where at least one of the upper surface of the first part Bp1 and the upper surface of the second part Bp2 is opposed.

  As a result, the liquid LQ in the immersion space LS2 of the second member 22 is prevented from flowing out of the second space SP2 or the liquid LQ remaining on the object B.

  The control device 6 supplies the supply amount of the liquid LQ from the supply port 41 in a state where the second member 22 and the second portion Bp2 face each other in the state where the second member 22 and the first portion Bp1 face each other. It may be less than the supply amount of the liquid LQ from the port 41.

  Note that the control device 6 determines the supply amount of the liquid LQ from the supply port 41 in a state where the second member 22 and the predetermined area PA (stepped portion D) face each other. ) Outside the region (at least one of the upper surface of the first portion Bp1 and the upper surface of the second portion Bp2) may be less than the supply amount of the liquid LQ from the supply port 41.

  As a result, the liquid LQ in the immersion space LS2 is prevented from flowing out of the second space SP2 and the liquid LQ remaining on the object B.

  The control device 6 supplies the supply amount of the liquid LQ from the supply port 41 in a state where the second member 22 and the second portion Bp2 face each other in the state where the second member 22 and the first portion Bp1 face each other. The second member 22 and the first portion Bp1 are opposed to each other with the suction force of the recovery port 42 in a state where the second member 22 and the second portion Bp2 face each other while the amount of liquid LQ supplied from the mouth 41 is reduced. It may be larger than the suction force of the recovery port 42 in the state of being.

  Note that the control device 6 determines the supply amount of the liquid LQ from the supply port 41 in a state where the second member 22 and the predetermined area PA (stepped portion D) face each other. Of the recovery port 42 in a state where the second member 22 and the predetermined region PA (stepped portion D) are opposed to each other. The suction force may be larger than the suction force of the recovery port 42 in a state where the second member 22 and the region outside the predetermined region PA (stepped portion D) face each other.

  As a result, the liquid LQ in the immersion space LS2 is prevented from flowing out of the second space SP2 and the liquid LQ remaining on the object B.

  The control device 6 uses the suction force of the recovery port 42 in a state where the second member 22 and the second portion Bp2 face each other, and sucks the recovery port 42 in the state where the second member 22 and the first portion Bp1 face each other. It may be smaller than the force.

  Note that the control device 6 uses the suction force of the recovery port 42 in a state where the second member 22 and the predetermined area PA (stepped portion D) face each other on the outside of the second member 22 and the predetermined area PA (stepped portion D). It may be smaller than the suction force of the recovery port 42 in a state where the region faces the region.

  The control device 6 supplies the supply amount of the liquid LQ from the supply port 41 in a state where the second member 22 and the second portion Bp2 face each other in the state where the second member 22 and the first portion Bp1 face each other. The supply amount of the liquid LQ from the mouth 41 may be increased.

  Note that the control device 6 determines the supply amount of the liquid LQ from the supply port 41 in a state where the second member 22 and the predetermined area PA (stepped portion D) face each other. ) May be larger than the supply amount of the liquid LQ from the supply port 41 in a state of facing the outer region.

  A pressure sensor 50 that detects the pressure of the liquid LQ in the immersion space LS2 may be provided. The control device 6 may adjust one or both of the supply amount of the liquid LQ from the supply port 41 and the suction force of the recovery port 42 based on the detection result of the pressure sensor 50.

  The control device 6 is configured such that the pressure of the liquid LQ in the liquid immersion space LS2 formed between the second member 22 and the first part Bp1 and the liquid immersion formed between the second member 22 and the second part Bp2. Based on the detection result of the pressure sensor 50, one or both of the supply amount of the liquid LQ from the supply port 41 and the suction force of the recovery port 42 are adjusted so that the difference from the pressure of the liquid LQ in the space LS2 becomes small. May be.

  The control device 6 is formed between the pressure of the liquid LQ in the immersion space LS2 formed between the second member 22 and the first portion Bp1, and between the second member 22 and the predetermined area PA (stepped portion D). One of the supply amount of the liquid LQ from the supply port 41 and the suction force of the recovery port 42 based on the detection result of the pressure sensor 50 so that the difference from the pressure of the liquid LQ in the immersion space LS2 is reduced. Both may be adjusted. The control device 6 is formed between the pressure of the liquid LQ in the immersion space LS2 formed between the second member 22 and the second portion Bp2, and between the second member 22 and the predetermined area PA (stepped portion D). One of the supply amount of the liquid LQ from the supply port 41 and the suction force of the recovery port 42 based on the detection result of the pressure sensor 50 so that the difference from the pressure of the liquid LQ in the immersion space LS2 is reduced. Both may be adjusted.

  That is, the control device 6 forms the pressure of the liquid LQ in the immersion space LS2 when the entire immersion space LS2 is formed on the first portion Bp1, and the entire immersion space LS2 is formed on the second portion Bp2. The supply amount of the liquid LQ from the supply port 41 and the suction force of the recovery port 42 are determined based on the detection result of the pressure sensor 50 so that the difference from the pressure of the liquid LQ in the immersion space LS2 is reduced. One or both may be adjusted. In the control device 6, the pressure of the liquid LQ in the immersion space LS2 when the entire immersion space LS2 is formed on the first portion Bp1, and the immersion space LS2 are formed in the predetermined area PA (stepped portion D). One of the supply amount of the liquid LQ from the supply port 41 and the suction force of the recovery port 42 based on the detection result of the pressure sensor 50 so that the difference from the pressure of the liquid LQ in the immersion space LS2 is reduced. Or both may be adjusted. In the control device 6, the pressure of the liquid LQ in the immersion space LS2 when the entire immersion space LS2 is formed on the second portion Bp2 and the immersion space LS2 are formed in the predetermined area PA (stepped portion D). One of the supply amount of the liquid LQ from the supply port 41 and the suction force of the recovery port 42 based on the detection result of the pressure sensor 50 so that the difference from the pressure of the liquid LQ in the immersion space LS2 is reduced. Or both may be adjusted.

  The control device 6 may adjust one or both of the supply amount of the liquid LQ from the supply port 41 and the suction force of the recovery port 42 without using the detection result of the pressure sensor 50. Note that the pressure sensor 50 may not be provided.

  The controller 6 determines one of the supply amount of the liquid LQ from the supply port 41 and the suction force of the recovery port 42 based on the difference between the height of the upper surface of the first portion Bp1 and the height of the upper surface of the second portion Bp2. Or both may be defined.

  For example, when the distance between the lower surface 24 of the second member 22 and the upper surface of the second portion Bp2 is shorter than the distance between the lower surface 24 of the second member 22 and the upper surface of the first portion Bp1, the control device 6 The pressure of the liquid LQ in the immersion space LS2 formed between the member 22 and the first portion Bp1, and the pressure of the liquid LQ in the immersion space LS2 formed between the second member 22 and the second portion Bp2. The amount of liquid LQ supplied from the supply port 41 and the suction force of the recovery port 42 are based on the difference between the height of the upper surface of the first portion Bp1 and the height of the upper surface of the second portion Bp2. One or both of these may be changed.

  The difference between the height of the upper surface of the first part Bp1 and the height of the upper surface of the second part Bp2 can be detected by a so-called autofocus detection system that can detect the position of the upper surface of the substrate P, for example. Note that the predetermined detection system may detect the difference between the height of the upper surface of the first portion Bp1 and the height of the upper surface of the second portion Bp2 before the exposure of the substrate P is started. The controller 6 forms liquid between the second member 22 and the first part Bp1 based on the detection result of the difference between the height of the upper surface of the first part Bp1 and the height of the upper surface of the second part Bp2. The liquid from the supply port 41 is reduced so that the difference between the pressure of the liquid LQ in the immersion space LS2 and the pressure of the liquid LQ in the immersion space LS2 formed between the second member 22 and the second portion Bp2 is reduced. One or both of the supply amount of LQ and the suction force of the recovery port 42 may be adjusted.

  Further, information regarding the difference between the height of the upper surface of the first part Bp1 and the height of the upper surface of the second part Bp2 may be stored in the storage device 7. Based on the storage information of the storage device 7, the control device 6 determines the pressure of the liquid LQ in the immersion space LS2 formed between the second member 22 and the first portion Bp1, the second member 22, and the second One or both of the supply amount of the liquid LQ from the supply port 41 and the suction force of the recovery port 42 are adjusted so that the difference between the pressure of the liquid LQ in the immersion space LS2 formed between the portion Bp2 and the liquid LQ is reduced. May be.

  Further, the control device 6 determines one of the supply amount of the liquid LQ from the supply port 41 and the suction force of the suction port 42 based on the position of the object B (first and second portions Bp1, Bp2) in the XY plane. Both may be adjusted. The position of the object B in the XY plane includes the position of the step portion D. The position of the object B in the XY plane can be measured by the measurement system 4.

  For example, when the object B is the substrate stage 2, the measurement system 4 can measure the position of the substrate stage 2 in the XY plane. By measuring the position of the substrate stage 2, at least one position of the first portion Bp1, the second portion Bp2, and the step portion D in the XY plane is obtained. For example, at least one position of the first portion Bp1, the second portion Bp2, and the step portion D on the substrate stage 2 is stored in the storage device 7. For example, when the measurement system 4 is an interferometer system, the storage device 7 stores the positional relationship between the measurement mirror of the substrate stage 2 irradiated with the measurement light of the interferometer system and the step portion D on the substrate stage 2. To do. The positional relationship is known from, for example, design values. Based on the storage information of the storage device 7 and the measurement result of the measurement system 4, at least one position of the first portion Bp1, the second portion Bp2, and the step portion D in the XY plane can be obtained. Further, the storage device 7 stores information related to the difference between the height of the upper surface of the first portion Bp1 and the height of the upper surface of the second portion Bp2. The control device 6 determines the pressure of the liquid LQ in the immersion space LS2 when the immersion space LS2 is formed on the first portion Bp1 and the immersion space LS2 based on the obtained position of the stepped portion D. One or both of the supply amount of the liquid LQ from the supply port 41 and the suction force of the suction port 42 are adjusted so that the difference from the pressure of the liquid LQ in the immersion space LS2 when formed on the portion Bp2 is reduced. can do. That is, the control device 6 stores the information on the position of the stepped portion D, the storage information of the storage device 7 that stores information about the difference between the height of the upper surface of the first portion Bp1 and the height of the upper surface of the second portion Bp2, and the object B ( Based on the measurement result of the measurement system 4 that measures the position of the substrate stage 2 or the like), the pressure of the liquid LQ in the immersion space LS2 formed between the second member 22 and the first portion Bp1, and the second The supply amount of the liquid LQ from the supply port 41 and the suction force of the recovery port 42 are reduced so that the difference between the pressure of the liquid LQ in the immersion space LS2 formed between the member 22 and the second portion Bp2 is reduced. One or both can be adjusted.

  When the measurement system 4 includes a mark detection device that detects an alignment mark provided on the object B (substrate stage 2 or the like), the control device 6 measures an interferometer that measures the position of the object B in the XY plane. Based on the measurement result of the system (or the encoder system) and the detection result of the mark detection device, the position of the object B in the coordinate system defined by the interferometer system can be obtained. By obtaining the position of the object B, the positions of the first part Bp1, the second part Bp2 and the predetermined area PA (stepped part D) of the object B (positions in the coordinate system defined by the interferometer system) are obtained. . The control device 6 stores the information on the measurement result of the interferometer system, the detection result of the mark detection device, and the difference between the height of the upper surface of the first portion Bp1 and the height of the upper surface of the second portion Bp2. Based on the stored information, the pressure of the liquid LQ in the immersion space LS2 when the immersion space LS2 is formed on the first portion Bp1, and the time when the immersion space LS2 is formed on the second portion Bp2 One or both of the supply amount of the liquid LQ from the supply port 41 and the suction force of the suction port 42 can be adjusted so that the difference from the pressure of the liquid LQ in the immersion space LS2 becomes small.

  The second member 22 and the object B are substantially perpendicular to the optical axis (Z axis) of the last optical element 13 so that the immersion space LS2 moves from the second part Bp2 to the first part Bp1. The same applies to the case of relative movement in the XY plane.

  As described above, according to the present embodiment, at least the period during which the object B having the predetermined area PA (stepped portion D) moves below the second member 22 in the state where the immersion space LS2 is formed. In part, since one or both of the supply amount of the liquid LQ from the supply port 41 and the suction force of the recovery port 42 are changed, the outflow of the liquid LQ and the like are suppressed. Therefore, the occurrence of exposure failure and the occurrence of defective devices are suppressed.

  In the present embodiment, the first part Bp1 and the second part Bp2 are arranged on one object B. The first part Bp1 may be arranged on the first object B1, and the second part Bp2 may be arranged on the second object B2 adjacent to the first object B1.

<Third Embodiment>
Next, a third embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 11 is a diagram illustrating an example of the operation of the second member 22 according to the present embodiment. In the present embodiment, the predetermined area PA includes a step portion D provided between the first object B1 and the second object B2. The step portion D is provided between the first object B1 and the second object B2 adjacent to the first object B1 through the gap G.

  The control device 6 uses the pressure of the liquid LQ in the liquid immersion space LS2 formed between the second member 22 and the first object B1, and the liquid immersion formed between the second member 22 and the second object B2. One or both of the supply amount of the liquid LQ from the supply port 41 and the suction force of the recovery port 42 may be changed so that the difference from the pressure of the liquid LQ in the space LS2 becomes small. For example, when the distance between the lower surface 24 of the second member 22 and the upper surface of the second object B2 is shorter than the distance between the lower surface 24 of the second member 22 and the upper surface of the first object B1, the control device 6 The pressure of the liquid LQ in the immersion space LS2 formed between the second member 22 and the first object B1, and the liquid LQ in the immersion space LS2 formed between the second member 22 and the second object B2. One or both of the supply amount of the liquid LQ from the supply port 41 and the suction force of the recovery port 42 may be adjusted so that the difference from the pressure becomes small.

  Further, the control device 6 determines that the pressure of the liquid LQ in the immersion space LS2 when the entire immersion space LS2 is formed on the first object B1, and the immersion space LS2 is in the predetermined area PA (the step portion D and the gap). Part G) one or both of the supply amount of the liquid LQ from the supply port 41 and the suction force of the recovery port 42 so that the difference from the pressure of the liquid LQ in the immersion space LS2 when formed on the part G) is reduced. You may change it. In addition, the control device 6 determines that the pressure of the liquid LQ in the immersion space LS2 when the entire immersion space LS2 is formed on the second object B2 and the immersion space LS2 is within the predetermined area PA (the step portion D and the gap). Part G) one or both of the supply amount of the liquid LQ from the supply port 41 and the suction force of the recovery port 42 so that the difference from the pressure of the liquid LQ in the immersion space LS2 when formed on the part G) is reduced. You may change it.

  Further, the control device 6 adjusts one or both of the supply amount of the liquid LQ from the supply port 41 and the suction force of the suction port 42 based on the positions of the first and second objects B1 and B2 in the XY plane. May be. The position of the object B in the XY plane includes the position of the step portion D (gap portion G). The positions of the first and second objects B1 and B2 in the XY plane can be measured by the measurement system 4. For example, when the first object B1 is the substrate P and the second object B2 is the cover member T1 disposed around the substrate P, by measuring the position of the substrate stage 2 in the XY plane, The position of the step portion D (gap portion G) in the XY plane is obtained. For example, the storage device 7 stores the position of the stepped portion D (gap portion G) on the substrate stage 2, and based on the measurement result of the measurement system 4 that measured the position of the substrate stage 2, it is in the XY plane. The position of the step portion D (gap portion G) is obtained. Further, the storage device 7 can store information relating to the difference between the height of the upper surface of the substrate P and the height of the upper surface of the cover member T1 disposed around the upper surface of the substrate P. In the present embodiment, the height of the upper surface of the cover member T1 (the height of the upper surface of the substrate stage 2) does not substantially change. Therefore, by acquiring information related to the thickness of the substrate P, information related to the difference between the height of the upper surface of the substrate P and the height of the upper surface of the cover member T1 (the upper surface of the substrate stage 2) is obtained. The control device 6 stores information on the position of the stepped portion D (gap portion G) and the difference between the height of the upper surface of the first object B1 (substrate P) and the height of the upper surface of the second object B2 (cover member T1). On the basis of the storage information of the storage device 7 and the measurement result of the measurement system 4 that measures the positions of the first and second objects B1 and B2 (substrate stage 2) in the XY plane. The difference between the pressure of the liquid LQ in the immersion space LS2 formed between the object B1 and the pressure of the liquid LQ in the immersion space LS2 formed between the second member 22 and the second object B2 is small. As described above, one or both of the supply amount of the liquid LQ from the supply port 41 and the suction force of the recovery port 42 may be adjusted.

  The contents of the first embodiment, the second embodiment, and the third embodiment described above can be combined as appropriate.

<Fourth embodiment>
Next, a fourth embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 12 shows an example of the operation of the second member 22 according to this embodiment. The object B having the predetermined area PA is moved below the second member 22 in the XY plane.

  In the present embodiment, the predetermined area PA includes a lyophilic area SA that is more lyophilic with respect to the liquid LQ than the area outside the predetermined area PA. In the object B, the area outside the predetermined area PA includes a liquid repellent area HA that is liquid repellent with respect to the liquid LQ. The contact angle of the lyophilic area SA with the liquid LQ is larger than 90 degrees. The contact angle of the lyophilic area SA with the liquid LQ may be 100 degrees or more, or 110 degrees or more. The contact angle of the liquid repellent area HA with respect to the liquid LQ is smaller than 90 degrees. The contact angle of the liquid repellent area HA with the liquid LQ may be 80 degrees or less, or 70 degrees or less.

  FIG. 12 shows that the second member 22 and the object B are substantially aligned with the optical axis (Z axis) of the last optical element 13 so that the immersion space LS2 moves from the liquid repellent area HA to the lyophilic area SA. An example of a state of relative movement in a vertical XY plane is shown.

  FIG. 12A shows a state in which the immersion space LS2 is formed on the upper surface of the liquid repellent area HA. FIG. 12B shows a state in which the immersion space LS2 is formed on the upper surface of the lyophilic area SA. In the present embodiment, the immersion space LS2 is formed on the upper surface of the lyophilic region SA from the state where the immersion space LS2 is formed on the upper surface of the lyophobic region HA through the boundary between the lyophobic region HA and the lyophilic region SA. The object B moves in the −Y direction with respect to the second member 22 so as to change to the state.

  In the present embodiment, the control device 6 determines the supply amount of the liquid LQ from the supply port 41 and the recovery port during at least a part of the period during which the immersion space LS2 moves from the liquid-repellent region HA to the lyophilic region SA. Change one or both of the 42 suction forces.

  For example, the control device 6 uses the suction force of the recovery port 42 in a state where the second member 22 and the predetermined area PA (lyophilic area SA) face each other to the second member 22 and the predetermined area PA (lyophilic area SA). The suction force of the recovery port 42 in a state where the outer region (the liquid repellent region HA) faces is set larger.

  As a result, the liquid LQ in the immersion space LS2 is prevented from flowing out of the second space SP2 and the liquid LQ remaining on the object B.

  The control device 6 determines the supply amount of the liquid LQ from the supply port 41 in a state where the second member 22 and the predetermined area PA (lyophilic area SA) face each other. The supply amount of the liquid LQ from the supply port 41 in a state where the region outside the region SA) is opposed may be smaller. This also suppresses the liquid LQ in the immersion space LS2 from flowing out of the second space SP2 and the liquid LQ remaining on the object B.

  The control device 6 determines the supply amount of the liquid LQ from the supply port 41 in a state where the second member 22 and the predetermined area PA (lyophilic area SA) face each other. The amount of liquid LQ supplied from the supply port 41 in a state in which the region outside the region SA) is opposed is reduced, and the recovery in a state in which the second member 22 and the predetermined region PA (lyophilic region SA) are opposed to each other. The suction force of the port 42 may be larger than the suction force of the recovery port 42 in a state where the second member 22 and the region outside the predetermined region PA (lyophilic region SA) face each other. This also suppresses the liquid LQ in the immersion space LS2 from flowing out of the second space SP2 and the liquid LQ remaining on the object B.

  Note that the control device 6 determines the supply amount of the liquid LQ from the supply port 41 in a state where the second member 22 and the predetermined area PA face each other, in a state where the second member 22 and the area outside the predetermined area PA face each other. The supply amount of the liquid LQ from the supply port 41 may be increased.

  Note that the control device 6 uses the suction force of the recovery port 42 in a state where the second member 22 and the predetermined area PA face each other, and the recovery port 42 in a state where the second member 22 and the area outside the predetermined area PA face each other. It may be smaller than the suction force.

  In the present embodiment, the controller 6 determines the supply amount of the liquid LQ from the supply port 41 and the suction of the recovery port 42 based on the detection result of the pressure sensor 50 that detects the pressure of the liquid LQ in the immersion space LS. One or both of the forces may be adjusted.

  The control device 6 may adjust one or both of the supply amount of the liquid LQ from the supply port 41 and the suction force of the recovery port 42 without using the detection result of the pressure sensor 50. Note that the pressure sensor 50 may not be provided.

  The second member 22 and the object B are substantially perpendicular to the optical axis (Z axis) of the last optical element 13 so that the immersion space LS2 moves from the lyophilic area SA to the liquid repellent area HA. The same applies to the case of relative movement in the XY plane.

  As described above, according to the present embodiment, the period during which the object B having the predetermined area PA (lyophilic area SA) moves below the second member 22 in the state where the immersion space LS2 is formed. At least in part, one or both of the supply amount of the liquid LQ from the supply port 41 and the suction force of the recovery port 42 are changed, so that the outflow of the liquid LQ is suppressed. Therefore, the occurrence of exposure failure and the occurrence of defective devices are suppressed.

  The contents of the first embodiment, the second embodiment, the third embodiment, and the fourth embodiment described above can be combined as appropriate.

<Fifth Embodiment>
Next, a fifth embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 13 shows an example of the operation of the second member 22 according to this embodiment. The object B is moved in the XY plane below the second member 22.

  In the present embodiment, the control device 6 changes one or both of the supply amount of the liquid LQ from the supply port 41 and the suction force of the recovery port 42 based on the moving condition of the object B.

  In the present embodiment, the movement condition includes the speed of the object B.

  FIG. 13A shows a state where the object B moves at the first speed V1 in a state where the immersion space LS2 is formed. In the state where the object B moves at the first speed V1, the fluid (one or both of the liquid LQ and the gas) is sucked from the recovery port 42 with the first suction force.

  FIG. 13B shows a state in which the object B moves at a second speed V2 higher than the first speed V1 in a state where the immersion space LS2 is formed. In the state where the object B moves at the second speed V2, the fluid (one or both of the liquid LQ and the gas) is sucked from the recovery port 42 with a second suction force larger than the first suction force.

  In a state where the immersion space LS2 is formed and the object B moves at the first speed V1, the liquid LQ is supplied from the supply port 41 at the first supply amount, and the object B moves at the second speed V2. In the state, the liquid LQ may be supplied from the supply port 41 with a second supply amount smaller than the first supply amount.

  As a result, the liquid LQ in the immersion space LS2 is prevented from flowing out of the second space SP2 and the liquid LQ remaining on the object B.

  In the state where the immersion space LS2 is formed and the object B moves at the first speed V1, the liquid LQ is supplied from the supply port 41 at the first supply amount, and the first from the recovery port 42. The fluid may be sucked by a suction force. In the state where the immersion space LS2 is formed and the object B moves at the second speed V2, the liquid LQ is supplied from the supply port 41 at the second supply amount, and the second from the recovery port 42. The fluid may be sucked by a suction force.

  In the state where the object B moves at the first speed V1, the liquid LQ is supplied from the supply port 41 at the first supply amount, and in the state where the object B moves at the second speed V2 higher than the first speed V1, The liquid LQ may be supplied from the supply port 41 with a supply amount larger than the first supply amount.

  In the state where the object B moves at the first speed V1, the fluid is sucked by the first suction force from the recovery port 42, and in the state where the object B moves at the second speed V2 higher than the first speed V1, The fluid may be sucked from the recovery port 42 with a suction force smaller than one suction force.

  In the present embodiment, the movement condition may include the acceleration of the object B.

  In a state where the immersion space LS2 is formed and the object B moves at the first acceleration Ac1, the fluid is sucked from the recovery port 42 by the first suction force, and the object B is higher than the first acceleration Ac1. In the state of moving at the two accelerations Ac2, the fluid may be sucked from the recovery port 42 with a second suction force that is greater than the first suction force.

  In a state where the immersion space LS2 is formed and the object B moves at the first acceleration Ac1, the liquid LQ is supplied from the supply port 41 at the first supply amount, and the object B moves at the second acceleration Ac2. In the state, the liquid LQ may be supplied from the supply port 41 with a second supply amount smaller than the first supply amount.

  As a result, the liquid LQ in the immersion space LS2 is prevented from flowing out of the second space SP2 and the liquid LQ remaining on the object B.

  In the state where the immersion space LS2 is formed and the object B moves at the first acceleration Ac1, the liquid LQ is supplied from the supply port 41 at the first supply amount, and the first from the recovery port 42. The fluid may be sucked by a suction force. In the state where the immersion space LS2 is formed and the object B moves at the second acceleration Ac2, the liquid LQ is supplied from the supply port 41 at the second supply amount, and the second from the recovery port 42. The fluid may be sucked by a suction force.

  In the state where the object B moves at the first acceleration Ac1, the liquid LQ is supplied from the supply port 41 at the first supply amount, and the object B moves at the second acceleration Ac2 higher than the first acceleration Ac1. The liquid LQ may be supplied from the supply port 41 with a supply amount larger than the first supply amount.

  In the state where the object B moves at the first acceleration Ac1, the fluid is sucked by the first suction force from the recovery port 42, and in the state where the object B moves at the second acceleration Ac2 higher than the first acceleration Ac1. The fluid may be sucked from the recovery port 42 with a suction force smaller than one suction force.

  The contents of the first embodiment, the second embodiment, the third embodiment, the fourth embodiment, and the fifth embodiment described above can be combined as appropriate.

<Sixth Embodiment>
Next, a sixth embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 14 shows an example of the operation of the second member 22 according to this embodiment. The object B is moved in the XY plane below the second member 22.

  In the present embodiment, the control device 6 changes one or both of the supply amount of the liquid LQ from the supply port 41 and the suction force of the recovery port 42 based on the moving condition of the object B.

In the present embodiment, the movement condition includes a movement locus of the object B in the XY plane.

  For example, in FIG. 14, when the object B moves relative to the second member 22 so as to move relatively along the movement locus indicated by the arrow Sb, the control device 6 changes the movement locus Sb of the object B to the movement locus Sb. Based on this, one or both of the supply amount of the liquid LQ from the supply port 41 and the suction force of the recovery port 42 are changed.

  For example, when the movement locus Sb includes the first movement locus Sb1 and the second movement locus Sb2 in which the liquid LQ is likely to flow out of the second space SP2 due to the movement of the object B, the control device 6 The suction force of the collection port 42 in the movement locus Sb2 is made smaller than the suction force of the collection port 42 in the first movement locus Sb1. The control device 6 may make the supply amount of the liquid LQ from the supply port 41 in the second movement locus Sb2 smaller than the supply amount of the liquid LQ from the supply port 41 in the first movement locus Sb1. The control device 6 makes the supply amount of the liquid LQ from the supply port 41 in the second movement locus Sb2 smaller than the supply amount of the liquid LQ from the supply port 41 in the first movement locus Sb1, and also the second movement locus Sb2. The suction force of the recovery port 42 may be smaller than the suction force of the recovery port 42 in the first movement locus Sb1.

  The first movement locus Sb1 is, for example, a straight movement locus. The second movement locus Sb2 is a movement locus including a curve, for example. For example, when the object B changes its traveling direction in the XY plane, there is a high possibility that the liquid LQ will flow out from the second space SP2.

  For example, in the exposure of the substrate P, the first movement locus Sb1 is the movement locus of the substrate stage 2 when the scan movement operation is performed. The second movement locus Sb2 is a movement locus when the step movement operation is performed.

  Also in the present embodiment, the liquid LQ in the immersion space LS2 is prevented from flowing out of the second space SP2 and the liquid LQ remaining on the object B.

  Note that the suction force of the collection port 42 in the second movement locus Sb2 may be larger than the suction force of the collection port 42 in the first movement locus Sb1. The supply amount of the liquid LQ from the supply port 41 in the second movement locus Sb2 may be larger than the supply amount of the liquid LQ from the supply port 41 in the first movement locus Sb1.

<Seventh embodiment>
Next, a seventh embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 15 shows an example of the operation of the second member 22 according to this embodiment. The object B is moved in the XY plane below the second member 22. In the state where the immersion space LS <b> 2 is formed, the object B moves at a constant speed in the XY plane below the second member 22. Further, the object B moves at a non-constant speed in the XY plane below the second member 22.

  FIG. 15A shows an example of a state in which the object B moves at a constant speed in the −Y direction. FIG. 15B shows an example of a state in which the object B moves in the −Y direction at a non-constant speed. The non-constant speed movement includes a state in which the object B moves so as to accelerate. The non-constant speed movement includes a state in which the object B moves so as to decelerate. The non-constant speed movement includes a state in which the object B moves so as to decelerate after being accelerated. The non-constant speed movement includes a state in which the object B moves so as to accelerate after decelerating. Non-constant speed movement includes a state in which the object B moves while repeating acceleration and deceleration.

  In the present embodiment, the control device 6 changes the amount of fluctuation in the suction force of the recovery port 42 between a period during which the object B moves at a constant speed and a period during which the object B moves at a non-constant speed.

  For example, in the exposure of the substrate P, the constant speed movement operation of the object B is the scan movement operation of the substrate P (substrate stage 2). The non-constant speed moving operation of the object B is a step moving operation of the substrate P (substrate stage 2). That is, the period during which the object B moves at a constant speed is an exposure period during which the shot area S of the substrate P is exposed. The period during which the object B moves at a non-constant speed is a non-exposure period until the exposure of the shot area S to be exposed next starts after the exposure of the shot area S on the substrate P ends. In the exposure period, the object B is moved at a constant speed (scanning movement). In the non-exposure period, the object B is moved at a non-constant speed (step movement).

  In the present embodiment, in the exposure of the substrate P, the control device 6 uses the exposure period (period during which the scan movement operation is performed) and the non-exposure period (when the step movement operation is performed) to change the amount of change in the suction force of the recovery port 42. (Period).

  In the present embodiment, the amount of change in the suction force of the recovery port 42 during the period during which the object B moves at a constant speed (exposure period) is the suction force of the recovery port 42 during the period during which the object B moves at a non-constant speed (non-exposure period). Is less than the fluctuation amount.

  For example, the control device 6 makes the suction force of the recovery port 42 constant during a period during which the object B moves at a constant speed (exposure period). The control device 6 changes the suction force of the recovery port 42 from the first suction force to the second suction force larger than the first suction force during the period in which the object B moves at a non-constant speed (non-exposure period). Further, the control device 6 changes the suction force of the recovery port 42 from the first suction force to a third suction force smaller than the first suction force during the period in which the object B moves at a non-constant speed (non-exposure period). In other words, the control device 6 increases or decreases the suction force of the collection port 42 during the period (non-exposure period) in which the object B moves at a non-constant speed.

  Note that the suction force of the recovery port 42 does not have to be constant during the period in which the object B moves at a constant speed (exposure period).

  By varying the suction force of the recovery port 42, for example, vibration may occur. According to this embodiment, during the period in which the object B moves at a constant speed (exposure period), the amount of fluctuation in the suction force of the collection port 42 is small, so that the occurrence of vibration is suppressed. Therefore, the occurrence of exposure failure and the occurrence of defective devices are suppressed.

  Further, the suction force of the collection port 42 can be changed to a desired suction force during the period in which the object B moves at a non-constant speed (non-exposure period).

  Note that the amount of change in the suction force of the recovery port 42 during the period in which the object B moves at a constant speed (exposure period) is the amount of change in the suction force in the recovery port 42 in the period in which the object B moves at a non-constant speed (non-exposure period). May be larger.

  The control device 6 may change the fluctuation amount of the supply amount of the liquid LQ from the supply port 41 between a period during which the object B moves at a constant speed and a period during which the object B moves at a non-constant speed.

  The fluctuation amount of the supply amount of the liquid LQ from the supply port 41 during the period in which the object B moves at a constant speed (exposure period) is the liquid LQ from the supply port 41 in the period during which the object B moves at a non-constant speed (non-exposure period). It is smaller than the fluctuation amount of the supply amount.

  For example, the control device 6 makes the supply amount of the liquid LQ from the supply port 41 constant during the period (exposure period) in which the object B moves at a constant speed. The control device 6 changes the supply amount of the liquid LQ from the supply port 41 from the first supply amount to the second supply amount larger than the first supply amount during the period in which the object B moves at a non-constant speed (non-exposure period). To do. In addition, the control device 6 sets the supply amount of the liquid LQ from the supply port 41 from the first supply amount to the third supply amount that is smaller than the first supply amount during the period in which the object B moves at a non-constant speed (non-exposure period). Change to In other words, the control device 6 increases or decreases the supply amount of the liquid LQ from the supply port 41 during the period in which the object B moves at a non-constant speed (non-exposure period).

  Note that the supply amount of the liquid LQ from the supply port 41 does not have to be constant during the period in which the object B moves at a constant speed (exposure period).

  By changing the supply amount of the liquid LQ from the supply port 41, for example, vibration may occur. In the period during which the object B moves at a constant speed (exposure period), the amount of fluctuation in the supply amount of the liquid LQ from the supply port 41 is small, so that occurrence of vibration is suppressed. Therefore, the occurrence of exposure failure and the occurrence of defective devices are suppressed.

  Further, the supply amount of the liquid LQ from the supply port 41 can be changed to a desired supply amount during the period in which the object B moves at a non-constant speed (non-exposure period).

  Note that the amount of change in the supply amount of the liquid LQ from the supply port 41 during the period during which the object B moves at a constant speed (exposure period) is different from the supply port 41 during the period during which the object B moves at a non-constant speed (non-exposure period). It may be larger than the fluctuation amount of the supply amount of the liquid LQ.

  Note that the control device 6 determines both the fluctuation amount of the supply amount of the liquid LQ from the supply port 41 and the fluctuation amount of the suction force of the recovery port 42 during a period during which the object B moves at a constant speed and a period during which the object B moves at a non-constant speed. You may change it.

<Eighth Embodiment>
Next, an eighth embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 16 shows an example of the second member 22 and the substrate stage 2 according to this embodiment. As shown in FIG. 16, the substrate stage 2 includes a first holding part 14 that holds the substrate P so as to be releasable, and a second holding part 15 that holds the cover member T1 so as to be releasable. The cover member T1 held by the second holding unit 15 is adjacent to the substrate P held by the first holding unit 14 via the gap Ga.

  In the present embodiment, a suction port 60 that sucks fluid (liquid LQ and / or gas) is disposed in a lower space US of the gap G. The suction port 60 faces the lower space US. In the example shown in FIG. 16, the lower space US is disposed on the substrate stage 2. The substrate stage 2 has the inner surface of the lower space US.

  The first holding portion 14 is disposed on the inner side of the peripheral wall portion 14W, the peripheral wall portion 14W having an upper surface that can be opposed to the lower surface of the substrate P, a plurality of pin-shaped support portions 14S disposed on the inner side of the peripheral wall portion 14W. And a suction port 14B. The first holding unit 14 includes a so-called pin chuck mechanism (vacuum chuck mechanism).

  The second holding portion 15 is disposed on the inner side of the peripheral wall portion 15W, the peripheral wall portion 15W having an upper surface that can be opposed to the lower surface of the cover member T1, a plurality of pin-shaped support portions 15S disposed on the inner side of the peripheral wall portion 15W. Suction port 15B. The second holding unit 15 includes a so-called pin chuck mechanism (vacuum chuck mechanism).

  In the present embodiment, the lower space US includes a space between the peripheral wall portion 14W and the peripheral wall portion 15W.

  The suction port 60 is connected to a suction device 62 via a suction flow channel 61. The suction device 62 can connect the suction port 60 to the vacuum system BS. The suction device 62 includes a storage portion 62A that stores the liquid LQ sucked (collected) from the suction port 60, and a pressure adjustment unit 62B that can adjust the suction force of the suction port 60. The accommodating portion 62A includes a tank. The pressure adjustment unit 62B includes a pressure adjustment valve and the like.

  The suction force of the suction port 60 depends on the difference between the pressure of the suction channel 61 and the pressure of the lower space US. The suction force of the suction port 60 is determined by the pressure difference between the suction channel 61 and the lower space US. The lower space US communicates with the space CS above the gap Ga via the gap Ga. In the present embodiment, the pressure adjusting unit 62 </ b> B can adjust the pressure of the suction channel 61. The chamber apparatus 11 can adjust the pressure of the lower space US.

  The suction port 60 can suck the fluid (one or both of LQ and gas) in the lower space US. The gas in the space CS above the gap Ga can flow into the lower space US via the gap Ga. The liquid LQ in the space CS above the gap Ga may also flow into the lower space US via the gap Ga. The suction port 60 can suck fluid (one or both of liquid LQ and gas) that has flowed into the lower space US through the gap Ga.

  Further, the suction port 60 can suck the fluid in the space CS above the gap Ga through the gap Ga. In the state where the second member 22 is disposed on the gap Ga, the suction port 60 can suck the fluid in the second space SP2 below the second member 22 through the gap Ga.

  The recovery port 42 disposed in the space CS above the gap Ga can suck the fluid in the second space SP2 (space CS). The suction port 60 disposed in the lower space US of the gap Ga can suck the fluid in the second space SP2 (space CS). In the present embodiment, the suction force of the recovery port 42 and the suction force of the suction port 60 are different.

  FIG. 16 shows an example in which the suction port 60 is arranged in the lower space US of the gap Ga between the substrate P and the cover member T1. A suction port may be disposed in a space below the gap Gb between the cover member T1 and the scale member T2. In the scram moving operation, a suction port may be disposed in a space below the gap Gc between the substrate stage 2 and the measurement stage 3. A suction port may be arranged in a space below the gap Gd between the measurement member C and the measurement stage 3.

  FIG. 17 shows an example in which the suction port 60 is arranged in the lower space US of the gap G between the first object B1 and the second object B2. In the present embodiment, the suction force of the suction port 60 is larger than the suction force of the suction port 42. In a state where the immersion space LS2 is formed on the gap G, the suction force of the suction port 60 is larger than the suction force of the suction port 42. In a state where the entire immersion space LS2 is formed on the first object B1 or the second object B2 (a state where the immersion space LS2 is not formed on the gap G), the suction force of the suction port 60 is It may be larger than the suction force of the suction port 42.

  According to this embodiment, the liquid LQ is suppressed from remaining in the gap G or the like. Therefore, the occurrence of exposure failure and the occurrence of defective devices are suppressed.

  Note that the suction force of the suction port 60 may be smaller than the suction force of the suction port 42. In a state where the immersion space LS2 is formed on the gap G, the suction force of the suction port 60 may be smaller than the suction force of the suction port 42. In a state where the entire immersion space LS2 is formed on the first object B1 or the second object B2 (a state where the immersion space LS2 is not formed on the gap G), the suction force of the suction port 60 is It may be smaller than the suction force of the suction port 42.

<Ninth Embodiment>
Next, a ninth embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 18 shows an example of the operation of the second member 22 according to this embodiment. The second member 22 and the first and second objects B1, B2 are relatively moved in the XY plane so that the immersion space LS2 moves from one to the other on the first object B1 and the second object B2. . FIG. 18 shows that the first and second objects B1 and B2 move in the −Y direction with respect to the second member 22 so that the immersion space LS2 moves from the first object B1 to the second object B2. An example is shown. FIG. 18A shows a state in which the entire immersion space LS2 is formed on the first object B1. FIG. 18B shows a state in which the immersion space LS2 is formed on the gap G.

  In the present embodiment, the control device 6 determines the difference in suction force between the recovery port 42 and the suction port 60 between the state where the entire immersion space LS2 is formed on the first object B1 and the immersion space LS2. It changes depending on the state formed on G.

  In addition, the control device 6 determines the difference in suction force between the recovery port 42 and the suction port 60, so that the entire immersion space LS2 is formed on the second object B2 and the immersion space LS2 is on the gap G. It changes depending on the formed state.

  In the present embodiment, the difference in suction force between the recovery port 42 and the suction port 60 in a state where the entire immersion space LS2 is formed on the first object B1 (or the second object B2) is the immersion space. This is larger than the difference in suction force between the recovery port 42 and the suction port 60 in a state where LS2 is formed on the gap G.

  In the present embodiment, in both the state where the entire immersion space LS2 is formed on the first object B1 (or the second object B2) and the state where the immersion space LS2 is formed on the gap G, The suction force of the suction port 60 is larger than the suction force of the suction port 42.

  In the present embodiment, both of the state where the entire immersion space LS2 is formed on the first object B1 (or the second object B2) and the state where the immersion space LS2 is formed on the gap G are both. In this case, the suction force of the suction port 60 may be smaller than the suction force of the suction port 42.

  In the state where the entire immersion space LS2 is formed on the first object B1 (or the second object B2), the suction force of the suction port 60 is smaller than the suction force of the suction port 42, and the immersion space In a state where LS2 is formed on the gap G, the suction force of the suction port 60 may be larger than the suction force of the suction port 42.

  In the state where the entire immersion space LS2 is formed on the first object B1 (or the second object B2), the suction force of the suction port 60 is larger than the suction force of the suction port 42, and the immersion space In a state where LS2 is formed on the gap G, the suction force of the suction port 60 may be smaller than the suction force of the suction port 42.

  According to the present embodiment, for example, the liquid LQ is suppressed from remaining in the gap G or the like. Further, by reducing the difference in suction force between the recovery port 42 and the suction port 60 in the state where the immersion space LS2 is formed on the gap G, the movement of the fluid in the gap G is suppressed. In addition, the occurrence of vibration is suppressed.

  Note that the difference in the suction force between the recovery port 42 and the suction port 60 in a state where the entire immersion space LS2 is formed on the first object B1 (or the second object B2) indicates that the immersion space LS2 has a gap G. It may be smaller than the difference in suction force between the recovery port 42 and the suction port 60 in the state formed above.

  Note that the difference in the suction force between the recovery port 42 and the suction port 60 in a state where the entire immersion space LS2 is formed on the first object B1 (or the second object B2) indicates that the immersion space LS2 has a gap G. The difference in suction force between the recovery port 42 and the suction port 60 in the state formed above may be substantially equal.

<Tenth Embodiment>
Next, a tenth embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 19 shows an example of the operation of the first member 21 and the second member 22 according to this embodiment. In the state in which the immersion spaces LS1 and LS2 are formed, the second object B2 adjacent to the first object B1 via the first object B1 and the gap G below the first and second members 21 and 22 is the XY plane. Moved in.

  In the lower space US of the gap G, a suction port 60 capable of sucking the fluid in the first space SP1 below the first member 21 and the second space SP2 below the second member 22 is arranged.

  The first and second members 21 and 22 and the first and second objects B1 and B2 are XY so that the immersion spaces LS1 and LS2 move from one to the other on the first object B1 and the second object B2. Relative movement in the plane. FIG. 19 shows the first and second objects B1, B2 with respect to the first and second members 21, 22, so that the immersion spaces LS1, LS2 move from the first object B1 to the second object B2. Shows an example of moving in the -Y direction. FIG. 19A shows a state in which the immersion space LS1 is formed on the gap G and the entire immersion space LS2 is formed on the first object B1. FIG. 19B shows a state in which the entire immersion space LS1 is formed on the second object B2, and the immersion space LS2 is formed on the gap G.

  In the present embodiment, the suction force of the suction port 60 during at least part of the period in which the immersion space LS2 moves from the first object B1 to the second object B2 is the second in the immersion space LS1 from the first object B1. It is smaller than the suction force of the suction port 60 in at least a part of the period of moving onto the object B2.

  The suction force of the suction port 60 in the state where the immersion space LS2 is formed on the gap G is smaller than the suction force of the suction port 60 in the state where the immersion space LS1 is formed on the gap G.

  The first and second objects B1 and B2 move relative to the first and second members 21 and 22 so that the immersion spaces LS1 and LS2 move from the second object B2 to the first object B1. The same applies to the case.

  Since the suction force of the suction port 60 when the immersion space LS1 is formed on the gap G is larger than the suction force of the suction port 60 when the immersion space LS2 is formed on the gap G, for example, It is suppressed that the liquid LQ flows out from the first space SP1, the liquid LQ remains in the gap G, or the liquid LQ remains on the first and second objects B1 and B2.

  In the present embodiment, the first and second objects B1 and B2 are moved so that the liquid immersion space LS2 passes through the liquid contact portion of the gap G that is in contact with the liquid LQ in the liquid immersion space LS1. The first and second objects B1 and B2 may be moved so that the immersion space LS2 passes through the non-wetted part of the gap G that does not contact the liquid LQ of the immersion space LS1.

  In addition, after the immersion space LS2 passes over the gap G, the first and second objects B1 so that the immersion space LS1 passes through the liquid contact portion of the gap G that is in contact with the liquid LQ of the immersion space LS2. , B2 may be moved. The first and second objects B1 and B2 may be moved so that the immersion space LS1 passes through the non-wetted part of the gap G that does not contact the liquid LQ of the immersion space LS2.

  In the present embodiment, the gap G may be a gap (slit, opening, etc.) of one object B.

  The object B (the first B so that the immersion space LS2 passes through both the liquid contact portion of the gap G that is in contact with the liquid LQ in the immersion space LS1 and the non-liquid contact portion of the gap G that is not in contact with the liquid LQ. When the second object B1, B2) is moved, the suction force of the suction port 60 during the period in which the liquid immersion space LS2 passes through the liquid contact portion of the gap G and the liquid immersion space LS2 is not in liquid contact with the gap G. The suction force of the suction port 60 during the period of passing through the portion may be different.

  For example, the suction force of the suction port 60 during the period in which the immersion space LS2 passes through the liquid contact part of the gap G is greater than the suction force of the suction port 60 in the period during which the liquid immersion space LS2 passes through the non-wetted part of the gap G. May be larger.

  Note that the suction force of the suction port 60 during the period when the immersion space LS2 passes through the liquid contact portion of the gap G is greater than the suction force of the suction port 60 during the period when the immersion space LS2 passes through the non-wetted portion of the gap G. May be small.

  Note that the object B (so that the immersion space LS2 passes through both the liquid contact portion of the gap portion G in contact with the liquid LQ in the immersion space LS1 and the non-liquid contact portion of the gap portion G not in contact with the liquid LQ. When the first and second objects B1, B2) are moved, the suction force of the recovery port 42 during the period in which the immersion space LS2 passes through the liquid contact portion of the gap G, and the immersion space LS2 is not in the gap G. The suction force of the recovery port 42 during the period of passing through the wetted part may be different.

  For example, the suction force of the recovery port 42 during the period in which the immersion space LS2 passes through the liquid contact portion of the gap G is greater than the suction force of the recovery port 42 in the period in which the immersion space LS2 passes through the non-wetted portion of the gap G. May be larger.

  Note that the suction force of the recovery port 42 during the period in which the immersion space LS2 passes through the liquid contact part of the gap G is greater than the suction force of the recovery port 42 in the period during which the liquid immersion space LS2 passes through the non-wetted part of the gap G. May be small.

  In each of the above-described embodiments, as illustrated in FIG. 20, the supply port 410 that can supply the liquid LQ to the second space SP2 may be disposed in the lower space US of the gap G. The liquid LQ supplied from the supply port 410 is supplied to the second space SP2 through the gap G.

  For example, when the immersion space LS2 passes over the gap G, the liquid LQ may be supplied from the supply port 410 to the immersion space LS2. Further, in order to adjust the pressure of the liquid LQ in the immersion space LS2 formed on the gap G, the liquid LQ may be supplied from the supply port 410 to the immersion space LS2. The supply amount of the liquid LQ supplied from the supply port 41 arranged in the space CS above the gap G and the supply amount of the liquid LQ supplied from the supply port 410 arranged in the lower space US of the gap G are: It may be different or substantially equal. For example, the supply amount of the liquid LQ supplied from the supply port 41 arranged in the space CS above the gap G is larger than the supply amount of the liquid LQ supplied from the supply port 410 arranged in the space US below the gap G. May be more or less.

<Eleventh embodiment>
Next, an eleventh embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 21 is a side view showing an example of the second member 2211 according to this embodiment, and FIG. 22 is a view showing an example of the lower surface 2411 of the second member 2211.

  The second member 2211 has a supply port 41 that supplies the liquid LQ to the second space SP2, and a recovery port 4211 that recovers (sucks) the fluid (one or both of the liquid LQ and gas) in the second space SP2. The substrate P (object) can face the supply port 41 and the recovery port 4211. As shown in FIG. 22, a plurality of recovery ports 4211 are arranged around the supply port 41.

  In the present embodiment, a liquid recovery device 46 is connected to each of the plurality of recovery ports 4211. The control device 6 can adjust the suction force of each of the plurality of recovery ports 4211.

  In the present embodiment, the control device 6 adjusts the suction force of each of the plurality of recovery ports 4211 to adjust the pressure gradient in the gas space around the immersion space LS2.

  FIG. 23 is a diagram illustrating an example of a state in which the pressure gradient around the immersion space LS2 is adjusted. The control device 6 adjusts the suction force of each of the plurality of recovery ports 4211 to make the pressure gradient of the outer space of the immersion space LS2 smaller than the pressure gradient of the inner space with respect to the immersion space LS1. That is, the control device 6 determines that the pressure gradient of the first gas space between the immersion space LS1 and the immersion space LS2 is the pressure of the second gas space opposite to the first gas space with respect to the immersion space LS2. Make it larger than the gradient.

  The control device 6 adjusts the suction force of each of the plurality of recovery ports 4211 so that the pressure gradient in the outer space of the immersion space LS2 with respect to the immersion space LS1 is larger than the pressure gradient in the inner space. Also good.

  In the present embodiment, the control device 6 is arranged around the immersion space LS2 so that the liquid LQ on the substrate P (object) between the immersion space LS1 and the immersion space LS2 moves to the immersion space LS2. Adjust the pressure gradient in the gas space.

  Thereby, the liquid LQ on the substrate P (object) is recovered from the recovery port 2411 of the second member 2211 together with the liquid LQ in the immersion space LS2. Therefore, the liquid is suppressed from remaining on the substrate P (object), and the occurrence of defective exposure and the generation of defective devices are suppressed.

  In each of the above-described embodiments, the liquid LQ for forming the immersion space LS1 and the liquid LQ for forming the immersion space LS2 may be the same type (physical properties) or different types (physical properties). But you can.

  In the present embodiment, the liquid LQ for forming the immersion space LS1 and the liquid LQ for forming the immersion space LS2 may have the same or different cleanliness.

  As described above, the control device 6 includes a computer system including a CPU and the like. The control device 6 includes an interface capable of executing communication between the computer system and an external device. The storage device 7 includes a memory such as a RAM, and a recording medium such as a hard disk and a CD-ROM. The storage device 7 is installed with an operating system (OS) that controls the computer system, and stores a program for controlling the exposure apparatus EX.

  Note that an input device capable of inputting an input signal may be connected to the control device 6. The input device includes an input device such as a keyboard and a mouse, or a communication device that can input data from an external device. Further, a display device such as a liquid crystal display may be provided.

  Various information including programs recorded in the storage device 7 can be read by the control device (computer system) 6. In the storage device 7, a liquid that exposes the substrate with the exposure light to the control device 6 through the first liquid filled in the optical path of the exposure light between the emission surface of the optical member from which the exposure light is emitted and the substrate. A program for executing control of the immersion exposure apparatus is recorded.

  The program recorded in the storage device 7 is a first member arranged in at least a part of the periphery of the optical path of the exposure light emitted from the exit surface of the optical member according to the above-described embodiment. Forming a first liquid immersion space of one liquid and a second member disposed outside the first member with respect to the optical path, away from the first liquid immersion space, and a second liquid immersion space of the second liquid And at least part of a period in which an object having a predetermined region moves below the second member in a direction intersecting the optical axis of the optical member in a state where the second immersion space is formed, Changing one or both of the supply amount of the second liquid supply part capable of supplying the second liquid to the second space below the second member and the suction force of the fluid suction part capable of sucking the fluid in the second space; , May be executed.

  In addition, the program recorded in the storage device 7 is a first member arranged in at least a part of the periphery of the optical path of the exposure light emitted from the exit surface of the optical member in the control device 6 according to the above-described embodiment. Forming a first immersion space for the first liquid, and a second member disposed outside the first member with respect to the optical path, and away from the first immersion space to separate the second liquid of the second liquid. The movement of the object in at least part of the period in which the object moves in the direction intersecting the optical axis of the optical member below the second member in the state in which the immersion space is formed and the second immersion space is formed. One of the supply amount of the second liquid supply unit capable of supplying the second liquid to the second space below the second member and the suction force of the fluid suction unit capable of sucking the fluid in the second space based on the condition Changing both may be performed.

  In addition, the program recorded in the storage device 7 is a first member arranged in at least a part of the periphery of the optical path of the exposure light emitted from the exit surface of the optical member in the control device 6 according to the above-described embodiment. Forming a first immersion space for the first liquid, and a second member disposed outside the first member with respect to the optical path, and away from the first immersion space to separate the second liquid of the second liquid. Forming the immersion space; and moving the second member and the first member so that the second immersion space moves from one to the other on the first object and on the second object adjacent to the first object via the gap. A relative movement of the second object in a predetermined plane substantially perpendicular to the optical axis of the optical member, and a period in which the second immersion space moves from one to the other on the first object and the second object. At least a part of the second liquid that can supply the second liquid to the second space below the second member The supply amount of the supply unit, and the fact that the fluid in the second space changing one or both of the suction force of the fluid suction unit capable suction, may be executed.

  In addition, the program recorded in the storage device 7 is a first member arranged in at least a part of the periphery of the optical path of the exposure light emitted from the exit surface of the optical member in the control device 6 according to the above-described embodiment. Forming a first immersion space for the first liquid, and a second member disposed outside the first member with respect to the optical path, and away from the first immersion space to separate the second liquid of the second liquid. In the state where the immersion space is formed and the second immersion space is formed, the object moves at a constant speed in the direction of crossing the optical axis of the optical member below the second member and at a non-constant speed. The amount of fluctuation of the supply amount of the second liquid supply unit capable of supplying the second liquid to the second space below the second member, and the suction force of the fluid suction unit capable of sucking the fluid in the second space. Changing one or both of the fluctuation amounts may be executed.

  In addition, the program recorded in the storage device 7 is a first member arranged in at least a part of the periphery of the optical path of the exposure light emitted from the exit surface of the optical member in the control device 6 according to the above-described embodiment. Forming a first immersion space for the first liquid, and a second member disposed outside the first member with respect to the optical path, and away from the first immersion space to separate the second liquid of the second liquid. Forming the immersion space, sequentially exposing the plurality of shot regions of the substrate with the exposure light through the first liquid in the first immersion space in a state where the second immersion space is formed; One of the fluctuation amount of the second liquid supply part capable of supplying the second liquid to the second space below the two members and the fluctuation amount of the suction force of the fluid suction part capable of sucking the fluid in the second space or Both the exposure period during which the first shot area is exposed among the plurality of shot areas, and the first After the exposure of the shot area, and be varied in a non-exposure period until the exposure of the second shot area to be exposed next is started, it may be executed.

  In addition, the program recorded in the storage device 7 is a first member arranged in at least a part of the periphery of the optical path of the exposure light emitted from the exit surface of the optical member in the control device 6 according to the above-described embodiment. Forming a first immersion space for the first liquid, and a second member disposed outside the first member with respect to the optical path, and away from the first immersion space to separate the second liquid of the second liquid. Forming an immersion space, moving an object having a gap below the second member in a direction intersecting the optical axis of the optical member in a state where the second immersion space is formed, and the second member Supplying the second liquid from the second liquid supply unit to the second space below the second space, sucking the fluid in the second space from the upper fluid suction unit disposed in the space above the gap, and the gap Different from the upper fluid suction part. That a suction force, and aspirating the fluid in the second space, may be executed.

  In addition, the program recorded in the storage device 7 is a first member arranged in at least a part of the periphery of the optical path of the exposure light emitted from the exit surface of the optical member in the control device 6 according to the above-described embodiment. Forming a first immersion space for the first liquid, and a second member disposed outside the first member with respect to the optical path, and away from the first immersion space to separate the second liquid of the second liquid. Forming the immersion space; and moving the first member and the first, so that the first immersion space moves from one to the other on the first object and on the second object adjacent to the first object via the gap. Relative movement of the second object in a predetermined plane substantially perpendicular to the optical axis of the optical member, and movement of the second immersion space from one side to the other on the first object and the second object , The second member and the first and second objects in a predetermined plane substantially perpendicular to the optical axis of the optical member. A fluid suction part disposed in a space below the gap in at least part of a period during which the first immersion space moves from one side to the other on the first object and the second object. At least part of the period during which the fluid in the first space below the first fluid is sucked by the first suction force and the second immersion space moves from one to the other on the first object and the second object. And suctioning the fluid in the second space below the second member with a second suction force smaller than the first suction force.

  When the program stored in the storage device 7 is read into the control device 6, various devices of the exposure apparatus EX such as the substrate stage 2, the measurement stage 3, and the liquid immersion member 5 cooperate to form a liquid immersion space. In the state where is formed, various processes such as immersion exposure of the substrate P are executed.

  In each of the above-described embodiments, the optical path K on the exit surface 12 side (image surface side) of the terminal optical element 13 of the projection optical system PL is filled with the liquid LQ. As disclosed in Japanese Patent Publication No. 2004/019128, the optical path on the incident side (object surface side) of the last optical element 13 may be a projection optical system filled with the liquid LQ.

  In each of the above-described embodiments, the liquid LQ is water, but a liquid other than water may be used. The liquid LQ is transmissive to the exposure light EL, has a high refractive index with respect to the exposure light EL, and forms a film such as a photosensitive material (photoresist) that forms the surface of the projection optical system PL or the substrate P. A stable material is preferred. For example, the liquid LQ may be a fluorinated liquid such as hydrofluoroether (HFE), perfluorinated polyether (PFPE), or fomblin oil. Further, the liquid LQ may be various fluids such as a supercritical fluid.

  In each of the above-described embodiments, the substrate P includes a semiconductor wafer for manufacturing a semiconductor device. For example, the substrate P is used in a glass substrate for a display device, a ceramic wafer for a thin film magnetic head, or an exposure apparatus. A mask or reticle master (synthetic quartz, silicon wafer) or the like may also be included.

  In each of the above-described embodiments, the exposure apparatus EX is a step-and-scan type scanning exposure apparatus (scanning stepper) that scans and exposes the pattern of the mask M by moving the mask M and the substrate P synchronously. However, for example, a step-and-repeat projection exposure apparatus (stepper) that performs batch exposure of the pattern of the mask M while the mask M and the substrate P are stationary and sequentially moves the substrate P stepwise may be used.

  In addition, the exposure apparatus EX transfers a reduced image of the first pattern onto the substrate P using the projection optical system while the first pattern and the substrate P are substantially stationary in the step-and-repeat exposure. Thereafter, with the second pattern and the substrate P substantially stationary, an exposure apparatus (stitch method) that collectively exposes a reduced image of the second pattern on the substrate P by partially overlapping the first pattern using a projection optical system. (Batch exposure apparatus). Further, the stitch type exposure apparatus may be a step-and-stitch type exposure apparatus in which at least two patterns are partially overlapped and transferred on the substrate P, and the substrate P is sequentially moved.

  Further, the exposure apparatus EX combines two mask patterns as disclosed in, for example, US Pat. No. 6,611,316 on the substrate via the projection optical system, and 1 on the substrate by one scanning exposure. An exposure apparatus that double-exposes two shot areas almost simultaneously may be used. Further, the exposure apparatus EX may be a proximity type exposure apparatus, a mirror projection aligner, or the like.

  In each of the embodiments described above, the exposure apparatus EX is a twin stage type having a plurality of substrate stages as disclosed in US Pat. No. 6,341,007, US Pat. No. 6,208,407, US Pat. No. 6,262,796 and the like. The exposure apparatus may be used. For example, as shown in FIG. 24, when the exposure apparatus EX includes two substrate stages 2001 and 2002, an object that can be arranged to face the emission surface 12 is one substrate stage and one substrate stage. At least one of the substrate held by the first holding unit, the other substrate stage, and the substrate held by the first holding unit of the other substrate stage.

  The exposure apparatus EX may be an exposure apparatus that includes a plurality of substrate stages and measurement stages.

  The exposure apparatus EX may be an exposure apparatus for manufacturing a semiconductor element that exposes a semiconductor element pattern on the substrate P, an exposure apparatus for manufacturing a liquid crystal display element or a display, a thin film magnetic head, an imaging element ( CCD), micromachine, MEMS, DNA chip, or an exposure apparatus for manufacturing a reticle or mask.

In the above-described embodiment, a light-transmitting mask in which a predetermined light-shielding pattern (or phase pattern / dimming pattern) is formed on a light-transmitting substrate is used. A variable shaped mask (also called an electronic mask, an active mask, or an image generator) that forms a transmission pattern, a reflection pattern, or a light emission pattern based on electronic data of a pattern to be exposed, as disclosed in No. 6778257 It may be used. Further, a pattern forming apparatus including a self-luminous image display element may be provided instead of the variable molding mask including the non-luminous image display element.

  In each of the above embodiments, the exposure apparatus EX includes the projection optical system PL. However, the components described in the above embodiments are applied to an exposure apparatus and an exposure method that do not use the projection optical system PL. May be. For example, an exposure apparatus and an exposure method for forming an immersion space between an optical member such as a lens and a substrate and irradiating the substrate with exposure light via the optical member are described in the above embodiments. Elements may be applied.

  The exposure apparatus EX exposes a line and space pattern on the substrate P by forming interference fringes on the substrate P as disclosed in, for example, International Publication No. 2001/035168. A lithography system).

  The exposure apparatus EX of the above-described embodiment is manufactured by assembling various subsystems including the above-described components so as to maintain predetermined mechanical accuracy, electrical accuracy, and optical accuracy. In order to ensure these various accuracies, before and after assembly, various optical systems are adjusted to achieve optical accuracy, various mechanical systems are adjusted to achieve mechanical accuracy, and various electrical systems are Adjustments are made to achieve electrical accuracy. The assembly process from the various subsystems to the exposure apparatus includes mechanical connection, electrical circuit wiring connection, pneumatic circuit piping connection and the like between the various subsystems. Needless to say, there is an assembly process for each subsystem before the assembly process from the various subsystems to the exposure apparatus. After the assembly process of the various subsystems to the exposure apparatus is completed, comprehensive adjustment is performed to ensure various accuracies as the entire exposure apparatus. The exposure apparatus is preferably manufactured in a clean room where the temperature, cleanliness, etc. are controlled.

  As shown in FIG. 25, a microdevice such as a semiconductor device includes a step 201 for designing a function / performance of the microdevice, a step 202 for producing a mask (reticle) based on the design step, and a substrate as a base material of the device. Substrate processing step 204, including substrate processing (exposure processing) including exposing the substrate with exposure light from the pattern of the mask and developing the exposed substrate according to the above-described embodiment, It is manufactured through a device assembly step (including processing processes such as a dicing process, a bonding process, and a packaging process) 205, an inspection step 206, and the like.

  Note that the requirements of the above-described embodiments can be combined as appropriate. Some components may not be used. In addition, as long as permitted by law, the disclosure of all published publications and US patents related to the exposure apparatus and the like cited in the above embodiments and modifications are incorporated herein by reference.

  DESCRIPTION OF SYMBOLS 2 ... Substrate stage, 3 ... Measurement stage, 5 ... Liquid immersion member, 6 ... Control apparatus, 7 ... Memory | storage device, 12 ... Ejection surface, 13 ... Terminal optical element, 21 ... 1st member, 22 ... 2nd member, EL ... exposure light, EX ... exposure device, IL ... illumination system, K ... optical path, LQ ... liquid, LS1 ... immersion space, LS2 ... immersion space, P ... substrate, S ... shot region, SP1 ... first space, SP2 ... second space.

Claims (68)

An exposure apparatus that exposes a substrate with exposure light through a first liquid in a first immersion space,
An optical member having an exit surface from which the exposure light is emitted;
A first member that is disposed at least in part around the optical path of the exposure light and that forms the first immersion space of the first liquid;
An exposure apparatus comprising: a second member that is disposed outside the first member with respect to the optical path, and is capable of forming a second immersion space for the second liquid away from the first immersion space. In a state where the second immersion space is formed, an object having a predetermined region below the second member is moved in a direction intersecting the optical axis of the optical member,
A second liquid supply unit capable of supplying the second liquid to the second space below the second member;
A fluid suction part capable of sucking the fluid in the second space;
The exposure apparatus according to claim 1, further comprising: an adjustment device that changes one or both of a supply amount of the second liquid supply unit and a suction force of the fluid suction unit in at least a part of a period during which the object moves.   The exposure apparatus according to claim 2, wherein the predetermined area includes a gap of the object.   The exposure apparatus according to claim 2, wherein the predetermined area is more lyophilic with respect to the liquid than an area outside the predetermined area.   The exposure apparatus according to claim 2, wherein the predetermined area includes a step portion.   The said predetermined area | region is an area | region where possibility that a liquid will remain after passing the said 1st, 2nd immersion space is higher than the area | region outside the said predetermined area | region. The exposure apparatus described.   There is a possibility that the outflow of liquid from the second space between the second member and the predetermined region may occur from the second space between the second member and a region outside the predetermined region. The exposure apparatus according to any one of claims 2 to 6, wherein the exposure apparatus is higher than the possibility of occurrence of liquid outflow.   The adjustment device makes the supply amount in a state where the second member and the predetermined region face each other less than the supply amount in a state where the second member and a region outside the predetermined region face each other. Item 8. The exposure apparatus according to any one of Items 2 to 7.   The adjustment device makes the suction force in a state where the second member and the predetermined region face each other larger than the suction force in a state where the second member and a region outside the predetermined region face each other. Item 9. The exposure apparatus according to any one of Items 2 to 8. In a state where the second immersion space is formed, the object is moved below the second member in a direction intersecting the optical axis of the optical member,
A second liquid supply unit capable of supplying the second liquid to the second space below the second member;
A fluid suction part capable of sucking the fluid in the second space;
The exposure apparatus according to claim 1, further comprising: an adjustment device that changes one or both of a supply amount of the second liquid supply unit and a suction force of the fluid suction unit based on a moving condition of the object.   The exposure apparatus according to claim 10, wherein the movement condition includes a speed of the object. In a state where the object moves at a first speed, the second liquid is supplied at a first supply amount,
12. The exposure apparatus according to claim 11, wherein the second liquid is supplied at a second supply amount smaller than the first supply amount in a state where the object moves at a second speed higher than the first speed. In the state where the object moves at the first speed, the fluid is sucked by the first suction force,
The exposure apparatus according to claim 11 or 12, wherein the fluid is sucked by a second suction force larger than the first suction force in a state where the object moves at a second speed higher than the first speed.   The exposure apparatus according to claim 10, wherein the movement condition includes an acceleration of the object. In a state where the object moves at the first acceleration, the second liquid is supplied at a first supply amount,
The exposure apparatus according to claim 14, wherein the second liquid is supplied with a second supply amount smaller than the first supply amount in a state where the object moves at a second acceleration higher than the first acceleration. In the state where the object moves at the first acceleration, the fluid is sucked by the first suction force,
The exposure apparatus according to claim 14 or 15, wherein the fluid is sucked by a second suction force larger than the first suction force in a state where the object moves at a second acceleration higher than the first acceleration.   The exposure apparatus according to any one of claims 10 to 16, wherein the movement condition includes a movement locus of the object in a plane intersecting an optical axis of the optical member. The movement locus includes a linear first movement locus and a second movement locus including a curve,
The exposure apparatus according to claim 17, wherein the supply amount in the second movement locus is smaller than the supply amount in the first movement locus. The movement locus includes a linear first movement locus and a second movement locus including a curve,
The exposure apparatus according to claim 17 or 18, wherein the suction force in the second movement locus is smaller than the suction force in the first movement locus. The movement trajectory includes a first movement trajectory and a second movement trajectory that is likely to cause liquid to flow out of the second space due to the movement of the object.
The exposure apparatus according to any one of claims 17 to 19, wherein the supply amount in the second movement locus is smaller than the supply amount in the first movement locus. The movement trajectory includes a first movement trajectory and a second movement trajectory that is likely to cause liquid to flow out of the second space due to the movement of the object.
21. The exposure apparatus according to claim 17, wherein the suction force in the second movement locus is smaller than the suction force in the first movement locus. The object includes a first object and a second object adjacent to the first object through a gap;
The second member and the first and second objects are substantially aligned with the optical axis of the optical member so that the second immersion space moves from one side to the other on the first object and the second object. Relative movement within a predetermined vertical plane,
A second liquid supply unit capable of supplying the second liquid to the second space below the second member;
A fluid suction part capable of sucking the fluid in the second space;
In at least a part of the period in which the second immersion space moves from one to the other on the first object and the second object, the supply amount of the second liquid supply unit and the suction force of the fluid suction unit The exposure apparatus according to claim 1, further comprising an adjustment device that changes one or both.   A first state in which the entire second immersion space is formed on the first object or the second object, and a second state in which the second immersion space is formed on the gap. The exposure apparatus according to claim 22, wherein one or both of the supply amount and the suction force are different.   The exposure apparatus according to claim 22 or 23, wherein a step portion is provided between the first object and the second object.   The exposure apparatus according to any one of Claims 22 to 24, wherein the first object includes the substrate, and the second object includes a member disposed around the substrate.   The adjustment device determines one or both of the supply amount and the suction force based on the difference between the height of the upper surface of the first object and the height of the upper surface of the second object. The exposure apparatus according to item.   The adjusting device is formed between the pressure of the second liquid in the second immersion space formed between the second member and the first object, and between the second member and the second object. 27. The exposure according to any one of claims 22 to 26, wherein one or both of the supply amount and the suction force are adjusted so that a difference between the pressure of the second liquid in the second immersion space is small. apparatus.   The supply amount in the second state in which the second immersion space is formed on the gap is that the entire second immersion space is formed on the first object or the second object. 28. The exposure apparatus according to claim 27, wherein the exposure amount is smaller than the supply amount in the first state.   The suction force in the second state in which the second immersion space is formed on the gap is such that the second immersion space is entirely formed on the first object or the second object. The exposure apparatus according to any one of claims 22 to 28, wherein the exposure apparatus is larger than the suction force in one state.   30. The exposure apparatus according to any one of claims 22 to 29, wherein the adjustment device adjusts one or both of the supply amount and the suction force based on a position of the object in the predetermined plane.   The exposure apparatus according to claim 30, wherein the position of the object in the predetermined plane includes a position of a step portion between the first object and the second object. A storage device that stores information regarding a position of the stepped portion and a difference between a height of the upper surface of the first object and a height of the upper surface of the second object;
A measuring device for measuring the position of the object,
32. The exposure apparatus according to claim 31, wherein the adjustment device adjusts one or both of the supply amount and the suction force based on storage information of the storage device and a measurement result of the measurement device. Comprising a substrate stage movable while holding the substrate;
The upper surface of the first object includes the upper surface of the substrate held on the substrate stage,
The upper surface of the second object includes the upper surface of the substrate stage disposed around the upper surface of the substrate,
The exposure apparatus according to claim 32, wherein the information related to the difference between the height of the upper surface of the first object and the height of the upper surface of the second object includes information related to the thickness of the substrate. A pressure sensor for detecting the pressure of the second liquid in the second immersion space;
34. The exposure apparatus according to claim 2, wherein the adjustment device adjusts one or both of the supply amount and the suction force based on a detection result of the pressure sensor.   35. The exposure apparatus according to any one of claims 2 to 34, wherein at least a part of the fluid suction part is disposed on the second member. The fluid suction part arranged in the second member includes a second liquid recovery part for recovering the second liquid in the second immersion space,
The second liquid is recovered from the second liquid recovery part in parallel with the supply of the second liquid from the second liquid supply part disposed on the second member, whereby the second liquid is recovered. 36. The exposure apparatus according to claim 35, wherein an immersion space is formed. The object has a gap;
37. The exposure apparatus according to any one of claims 2 to 36, wherein at least a part of the fluid suction part is disposed in a space below the gap part.   38. The exposure apparatus according to any one of claims 2 to 37, wherein at least a part of the second liquid supply unit is disposed on the second member. The object has a gap;
The exposure apparatus according to any one of claims 2 to 38, wherein at least a part of the second liquid supply unit is disposed in a lower space of the gap. In a state where the second immersion space is formed, the object is moved at a constant speed and a non-constant speed in a direction crossing the optical axis of the optical member below the second member,
A second liquid supply unit capable of supplying the second liquid to the second space below the second member;
A fluid suction part capable of sucking the fluid in the second space;
Adjustment that changes one or both of the fluctuation amount of the supply amount of the second liquid supply unit and the fluctuation amount of the suction force of the fluid suction unit between the period during which the object moves at the constant speed and the period during which the object moves at a non-constant speed An exposure apparatus according to claim 1, comprising: an apparatus. The adjustment device can change the supply amount in a period in which the object moves at a constant speed and a period in which the object moves at a non-constant speed in the predetermined plane,
41. The exposure apparatus according to claim 40, wherein a fluctuation amount of the supply amount during the period of constant speed movement is smaller than a fluctuation amount of the supply amount during the period of non-constant speed movement. The adjusting device can change the suction force during a period in which the object moves at a constant speed and a period in which the object moves at a non-constant speed in the predetermined plane,
42. The exposure apparatus according to claim 40 or 41, wherein a fluctuation amount of the suction force during the period of constant speed movement is smaller than a fluctuation amount of the suction force during the period of non-constant speed movement. With the second immersion space formed, a plurality of shot regions of the substrate are sequentially exposed with the exposure light through the first liquid in the first immersion space,
A second liquid supply unit capable of supplying the second liquid to the second space below the second member;
A fluid suction part capable of sucking the fluid in the second space;
One or both of the fluctuation amount of the supply amount of the second liquid supply unit and the fluctuation amount of the suction force of the fluid suction unit is an exposure period in which exposure of the first shot region is performed among the plurality of shot regions, The exposure apparatus according to claim 1, further comprising: an adjusting device that changes in accordance with a non-exposure period after the exposure of the first shot area is completed until the exposure of the second shot area to be exposed next is started. The adjustment device can change the supply amount in the exposure period and the non-exposure period,
44. The exposure apparatus according to claim 43, wherein a fluctuation amount of the supply amount in the exposure period is smaller than a fluctuation amount of the supply amount in the non-exposure period. The adjusting device can change the suction force in the exposure period and the non-exposure period,
45. The exposure apparatus according to claim 43 or 44, wherein a fluctuation amount of the suction force during the exposure period is smaller than a fluctuation amount of the suction force during the non-exposure period. In a state where the second immersion space is formed, an object having a gap is moved below the second member in a direction intersecting the optical axis of the optical member,
A second liquid supply unit capable of supplying the second liquid to the second space below the second member;
An upper fluid suction part that is disposed in an upper space of the gap part and capable of sucking the fluid of the second space;
A lower fluid suction part disposed in a lower space of the gap part and capable of sucking the fluid of the second space,
The exposure apparatus according to claim 1, wherein the suction force of the upper fluid suction part and the suction force of the lower fluid suction part are different.   47. The exposure apparatus according to claim 46, wherein a suction force of the lower fluid suction part is larger than a suction force of the upper fluid suction part. The object includes a first object and a second object adjacent to the first object through the gap,
The second member and the first and second objects are substantially aligned with the optical axis of the optical member so that the second immersion space moves from one side to the other on the first object and the second object. Relative movement within a predetermined vertical plane,
The difference between the suction force of the upper fluid suction part and the lower fluid suction part is expressed as follows: the first state in which the entire second immersion space is formed on the first object or the second object; 48. The exposure apparatus according to claim 46 or 47, further comprising an adjustment device that changes the second immersion space according to a second state in which the second immersion space is formed on the gap.   The exposure apparatus according to claim 48, wherein the difference in the suction force in the first state is larger than the difference in the suction force in the second state. In a state where the first and second immersion spaces are formed, an object having a gap portion below the first and second members is moved in a direction intersecting the optical axis of the optical member,
A fluid suction portion disposed in a lower space of the gap portion and capable of sucking a fluid in a first space below the first member and a second space below the second member;
The suction force of the fluid suction part in at least a part of the period during which the second immersion space moves from one side to the other on the first object and the second object is such that the first immersion space is the first immersion space. The exposure apparatus according to claim 1, wherein the exposure force is smaller than a suction force of the fluid suction unit in at least a part of a period of moving from one to the other on the object and the second object.   51. The suction force in a state where the second immersion space is formed on the gap is smaller than the suction force in a state where the first immersion space is formed on the gap. The exposure apparatus described in 1. In a state where the first and second immersion spaces are formed, an object having a gap portion below the first and second members is moved in a direction intersecting the optical axis of the optical member,
A second liquid supply unit capable of supplying the second liquid to the second space below the second member;
A fluid suction part capable of sucking the fluid in the second space,
The second immersion space passes through both the wetted part of the gap that is in contact with the first liquid in the first immersion space and the non-wetted part of the gap that is not in contact with the first liquid. The object is moved so that
2. The exposure apparatus according to claim 1, wherein a suction force of the fluid suction part during a period in which the second immersion space passes through the liquid contact part and a suction force during a period of passage through the non-wetted part are different.   53. The exposure apparatus according to claim 52, wherein the suction force during a period in which the second immersion space passes through the liquid contact part is greater than the suction force during a period through which the non-wetted part passes.   54. The exposure apparatus according to claim 52 or 53, wherein at least a part of the fluid suction part is disposed in a space below the gap part, and sucks the fluid in the second space through the gap part.   The exposure apparatus according to any one of claims 1 to 54, further comprising a pressure gradient adjusting device that adjusts a pressure gradient around the second immersion space.   56. The exposure apparatus according to claim 55, wherein the pressure gradient adjusting device makes the pressure gradient of the outer space of the second immersion space larger than the pressure gradient of the inner space with respect to the first immersion space.   57. The pressure gradient is adjusted according to claim 55 or 56, wherein the pressure gradient is adjusted such that the liquid on the object between the first immersion space and the second immersion space moves to the second immersion space. Exposure device. The second member is disposed so that the object can be opposed to the second member, and a plurality of second liquid supply ports for supplying the second liquid and a plurality of the second members are disposed around the second liquid supply port, and suck the fluid in the second space. And a fluid suction port
58. The exposure apparatus according to any one of claims 55 to 57, wherein the pressure gradient adjusting device adjusts the pressure gradient by adjusting a suction force of each of the plurality of fluid suction ports. A first liquid supply section capable of supplying the first liquid to the first space below the first member;
An exposure apparatus according to any one of claims 1 to 58, further comprising: a first liquid recovery unit that recovers the first liquid in the first space. Exposing the substrate using the exposure apparatus according to any one of claims 1 to 59;
Developing the exposed substrate. A device manufacturing method. An exposure method for exposing a substrate with exposure light through a first liquid in a first immersion space,
Forming the first liquid immersion space of the first liquid with a first member arranged at least part of the periphery of the optical path of the exposure light emitted from the emission surface of the optical member;
Forming a second immersion space for the second liquid away from the first immersion space with a second member arranged outside the first member with respect to the optical path;
In the state in which the second immersion space is formed, at least part of a period in which an object having a predetermined region below the second member moves in a direction intersecting the optical axis of the optical member, the second Changing one or both of the supply amount of the second liquid supply part capable of supplying the second liquid to the second space below the member and the suction force of the fluid suction part capable of sucking the fluid in the second space; An exposure method comprising: An exposure method for exposing a substrate with exposure light through a first liquid in a first immersion space,
Forming the first liquid immersion space of the first liquid with a first member arranged at least part of the periphery of the optical path of the exposure light emitted from the emission surface of the optical member;
Forming a second immersion space for the second liquid away from the first immersion space with a second member arranged outside the first member with respect to the optical path;
Based on a moving condition of the object in at least a part of a period in which the object moves in a direction intersecting the optical axis of the optical member below the second member in a state where the second immersion space is formed. One or both of the supply amount of the second liquid supply part capable of supplying the second liquid to the second space below the second member and the suction force of the fluid suction part capable of sucking the fluid in the second space Changing the exposure method. An exposure method for exposing a substrate with exposure light through a first liquid in a first immersion space,
Forming the first liquid immersion space of the first liquid with a first member arranged at least part of the periphery of the optical path of the exposure light emitted from the emission surface of the optical member;
Forming a second immersion space for the second liquid away from the first immersion space with a second member arranged outside the first member with respect to the optical path;
The second member and the first and second objects such that the second immersion space moves from one to the other on the first object and on the second object adjacent to the first object via a gap. Relative movement in a predetermined plane substantially perpendicular to the optical axis of the optical member;
The second liquid can be supplied to the second space below the second member during at least a part of the period during which the second immersion space moves from one to the other on the first object and the second object. And changing one or both of the supply amount of the second liquid supply unit and the suction force of the fluid suction unit capable of sucking the fluid in the second space. An exposure method for exposing a substrate with exposure light through a first liquid in a first immersion space,
Forming the first liquid immersion space of the first liquid with a first member arranged at least part of the periphery of the optical path of the exposure light emitted from the emission surface of the optical member;
Forming a second immersion space for the second liquid away from the first immersion space with a second member arranged outside the first member with respect to the optical path;
In a state in which the second immersion space is formed, the object moves at a constant speed in a direction intersecting the optical axis of the optical member below the second member, and a period at which the object moves at a non-constant speed, Fluctuation amount of the second liquid supply part capable of supplying the second liquid to the second space below the second member, and fluctuation amount of the suction force of the fluid suction part capable of sucking the fluid in the second space Changing one or both of the exposure methods. An exposure method for exposing a substrate with exposure light through a first liquid in a first immersion space,
Forming the first liquid immersion space of the first liquid with a first member arranged at least part of the periphery of the optical path of the exposure light emitted from the emission surface of the optical member;
Forming a second immersion space for the second liquid away from the first immersion space with a second member arranged outside the first member with respect to the optical path;
Sequentially exposing the plurality of shot regions of the substrate with the exposure light through the first liquid in the first immersion space in a state where the second immersion space is formed;
Fluctuation amount of the supply amount of the second liquid supply section capable of supplying the second liquid to the second space below the second member, and fluctuation of the suction force of the fluid suction section capable of sucking the fluid of the second space. One or both of the amounts of the exposure period in which the first shot area is exposed among the plurality of shot areas and the exposure of the second shot area to be exposed next after the exposure of the first shot area is started. Changing with a non-exposure period until the exposure is performed. An exposure method for exposing a substrate with exposure light through a first liquid in a first immersion space,
Forming the first liquid immersion space of the first liquid with a first member arranged at least part of the periphery of the optical path of the exposure light emitted from the emission surface of the optical member;
Forming a second immersion space for the second liquid away from the first immersion space with a second member arranged outside the first member with respect to the optical path;
Moving an object having a gap below the second member in a direction intersecting the optical axis of the optical member in a state where the second immersion space is formed;
Supplying the second liquid from a second liquid supply unit to a second space below the second member;
Aspirating the fluid in the second space from the upper fluid suction portion disposed in the space above the gap;
An exposure method comprising: sucking the fluid in the second space from a lower fluid suction part disposed in a lower space of the gap with a suction force different from that of the upper fluid suction part. An exposure method for exposing a substrate with exposure light through a first liquid in a first immersion space,
Forming the first liquid immersion space of the first liquid with a first member arranged at least part of the periphery of the optical path of the exposure light emitted from the emission surface of the optical member;
Forming a second immersion space for the second liquid away from the first immersion space with a second member arranged outside the first member with respect to the optical path;
The first member and the first and second objects such that the first immersion space moves from one to the other on the first object and on the second object adjacent to the first object via a gap. Relative movement in a predetermined plane substantially perpendicular to the optical axis of the optical member;
The second member and the first and second objects are substantially aligned with the optical axis of the optical member so that the second immersion space moves from one to the other on the first object and the second object. Relative movement in a predetermined vertical plane,
In the fluid suction portion disposed in the space below the gap in at least a part of the period during which the first immersion space moves from one to the other on the first object and the second object, the first member Suctioning the fluid in the first space below the first suction force;
In at least part of a period in which the second immersion space moves from one to the other on the first object and the second object, the fluid in the second space below the second member in the fluid suction portion Suctioning with a second suction force smaller than the first suction force. Exposing the substrate using the exposure method according to any one of claims 61 to 67;
Developing the exposed substrate. A device manufacturing method.

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