JP2014011202A - Exposure device, exposure method, and device manufacturing method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an exposure device that reduces the occurrence of exposure failures.SOLUTION: An exposure device exposes a substrate with exposure light through a first liquid in a first immersion space. The exposure device includes: an optical member having an emission surface that emits exposure light; a first member that is arranged in at least part of the surroundings of an optical path of the exposure light and that forms the first immersion space of the first liquid; and a second member that is arranged on an outer side of the first member with respect to the optical path and that forms a second immersion space of a second liquid away from the first immersion space.

Description

  The present invention relates to an exposure apparatus, an exposure method, and a device manufacturing method.

  As an exposure apparatus used in a photolithography process, for example, an immersion exposure apparatus that exposes a substrate with exposure light via a liquid as disclosed in the following patent document is known.

US Patent Application Publication No. 2009/0046261

  In the immersion exposure apparatus, if the liquid flows into an undesired space, an exposure failure may occur. As a result, a defective device may occur.

  An object of an aspect of the present invention is to provide an exposure apparatus and an exposure method that can suppress the occurrence of exposure failure. Moreover, the aspect of this invention aims at providing the device manufacturing method which can suppress generation | occurrence | production of a defective device.

  According to the first aspect of the present invention, an exposure apparatus that exposes a substrate with exposure light through the first liquid in the first immersion space, the optical member having an exit surface from which the exposure light is emitted; A first member disposed at least part of the periphery of the optical path of the exposure light and forming a first liquid immersion space for the first liquid; and disposed outside the first member with respect to the optical path, from the first liquid immersion space. An exposure apparatus is provided that includes a second member that can form a second immersion space for the second liquid.

  According to a second aspect of the present invention, there is provided a device manufacturing method including exposing a substrate using the exposure apparatus according to the first aspect and developing the exposed substrate.

  According to a third aspect of the present invention, there is provided an exposure method for exposing a substrate with exposure light through a first liquid in a first immersion space, wherein the exposure light path exits from an exit surface of an optical member. Forming the first liquid immersion space of the first liquid with the first member disposed at least at a part of the periphery, and from the second supply port of the second member disposed outside the first member with respect to the optical path The liquid supply is performed, the liquid recovery from one of the first opening and the second opening of the second recovery port is substantially stopped, and the liquid recovery is performed from the other of the first opening and the second opening. Forming a second immersion space for the second liquid away from the immersion space.

  According to a fourth aspect of the present invention, there is provided a device manufacturing method including exposing a substrate using the exposure method of the third aspect and developing the exposed substrate.

  According to the aspect of the present invention, it is possible to suppress the occurrence of exposure failure. Moreover, according to the aspect of this invention, generation | occurrence | production of a defective device can be suppressed.

It is a figure which shows an example of the exposure apparatus which concerns on 1st Embodiment. It is a figure which shows an example of the liquid immersion member which concerns on 1st Embodiment. It is a figure which shows an example of the liquid immersion member which concerns on 1st Embodiment. It is a figure which shows an example of the liquid immersion member which concerns on 1st Embodiment. It is a figure which shows an example of the liquid immersion member which concerns on 1st Embodiment. It is a figure which shows an example of the liquid immersion member which concerns on 1st Embodiment. It is a figure which shows an example of the substrate stage and measurement stage which concern on 1st Embodiment. It is a figure for demonstrating an example of the exposure method which concerns on 1st Embodiment. It is a figure showing an example of the 2nd member concerning a 1st embodiment. It is a figure showing an example of the 2nd member concerning a 1st embodiment. It is a figure showing an example of the 2nd member concerning a 1st embodiment. It is a figure which shows an example of the immersion space formed of the 2nd member which concerns on 1st Embodiment. It is a figure which shows an example of the 2nd member which concerns on 2nd Embodiment. It is a figure which shows an example of the 2nd member which concerns on 3rd Embodiment. It is a figure which shows an example of the immersion space formed of the 2nd member which concerns on 3rd Embodiment. It is a figure which shows an example of the immersion space which concerns on 3rd Embodiment. It is a figure which shows an example of the immersion space which concerns on 3rd Embodiment. It is a figure which shows an example of the 2nd member which concerns on 4th Embodiment. It is a figure which shows an example of the 2nd member which concerns on 5th Embodiment. It is a figure which shows an example of the immersion space formed of the 2nd member which concerns on 5th Embodiment. It is a figure which shows an example of the 2nd member which concerns on 6th Embodiment. It is a figure which shows an example of the immersion space formed of the 2nd member which concerns on 6th Embodiment. It is a figure which shows an example of the immersion space which concerns on this embodiment. It is a figure which shows an example of operation | movement of the exposure apparatus which concerns on 7th Embodiment. It is a figure which shows an example of operation | movement of the exposure apparatus which concerns on 8th Embodiment. It is a figure which shows an example of the liquid immersion member which concerns on 9th Embodiment. It is a figure which shows an example of operation | movement of the exposure apparatus which concerns on 10th Embodiment. It is a figure which shows an example of the liquid immersion member which concerns on 10th Embodiment. It is a figure which shows an example of the liquid immersion member which concerns on 11th Embodiment. It is a figure which shows an example of the exposure apparatus which concerns on 12th Embodiment. It is a figure which shows an example of the exposure apparatus which concerns on 13th Embodiment. It is a figure which shows an example of the exposure apparatus which concerns on 14th Embodiment. It is a figure which shows an example of the exposure apparatus which concerns on this embodiment. It is a figure which shows an example of the exposure apparatus which concerns on this embodiment. It is a figure which shows an example of a substrate stage. It is a flowchart which shows an example of a device manufacturing method.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings, but the present invention is not limited thereto. In the following description, an XYZ orthogonal coordinate system is set, and the positional relationship of each part will be described with reference to this XYZ orthogonal coordinate system. A predetermined direction in the horizontal plane is defined as an X-axis direction, a direction orthogonal to the X-axis direction in the horizontal plane is defined as a Y-axis direction, and a direction orthogonal to each of the X-axis direction and the Y-axis direction (that is, a vertical direction) is defined as a Z-axis direction. Further, the rotation (inclination) directions around the X axis, Y axis, and Z axis are the θX, θY, and θZ directions, respectively.

<First Embodiment>
A first embodiment will be described. FIG. 1 is a schematic block diagram that shows an example of an exposure apparatus EX according to the present embodiment. The exposure apparatus EX of the present embodiment is an immersion exposure apparatus that exposes a substrate P with exposure light EL through a liquid LQ. In the present embodiment, the immersion space LS1 is formed so that the optical path K of the exposure light EL irradiated to the substrate P is filled with the liquid LQ. The immersion space refers to a portion (space, region) filled with liquid. The substrate P is exposed with the exposure light EL through the liquid LQ in the immersion space LS1. In the present embodiment, water (pure water) is used as the liquid LQ.

  Further, the exposure apparatus EX of the present embodiment is an exposure apparatus provided with a substrate stage and a measurement stage as disclosed in, for example, US Pat. No. 6,897,963 and European Patent Application Publication No. 1713113.

  In FIG. 1, an exposure apparatus EX measures a mask stage 1 that can move while holding a mask M, a substrate stage 2 that can move while holding a substrate P, and exposure light EL without holding the substrate P. A movable measuring stage 3 mounted with a measuring member (measuring instrument) C, a mask stage 1, a substrate stage 2, a measuring system 4 for measuring positions of the measuring stage 3, and a mask M illuminated with exposure light EL An illumination system IL, a projection optical system PL that projects an image of the pattern of the mask M illuminated by the exposure light EL onto the substrate P, a liquid immersion member 5 that forms liquid immersion spaces LS1 and LS2, and the entire exposure apparatus EX And a storage device 7 connected to the control device 6 and storing various information relating to exposure.

  The exposure apparatus EX includes a chamber apparatus 11 that adjusts the environment (at least one of temperature, humidity, pressure, and cleanness) of the space CS in which the exposure light EL travels. The chamber apparatus 11 includes a gas supply unit 11S that supplies a gas Fr whose temperature and humidity are adjusted to the space CS. In the space CS, at least the projection optical system PL, the liquid immersion member 5, the substrate stage 2, and the measurement stage 3 are arranged. In the present embodiment, the mask stage 1 and at least a part of the illumination system IL are also arranged in the space CS.

  The mask M includes a reticle on which a device pattern projected onto the substrate P is formed. The mask M includes a transmission type mask having a transparent plate such as a glass plate and a pattern formed on the transparent plate using a light shielding material such as chromium. A reflective mask can also be used as the mask M.

  The substrate P is a substrate for manufacturing a device. The substrate P includes, for example, a base material such as a semiconductor wafer and a photosensitive film formed on the base material. The photosensitive film is a film of a photosensitive material (photoresist). The substrate P may include a photosensitive film and a film different from the photosensitive film. For example, the substrate P may include an antireflection film or a protective film (topcoat film) that protects the photosensitive film.

The illumination system IL irradiates the predetermined illumination area IR with the exposure light EL. The illumination area IR includes a position where the exposure light EL emitted from the illumination system IL can be irradiated. The illumination system IL illuminates at least a part of the mask M arranged in the illumination region IR with the exposure light EL having a uniform illuminance distribution. As the exposure light EL emitted from the illumination system IL, for example, far ultraviolet light (DUV light) such as bright lines (g line, h line, i line) and KrF excimer laser light (wavelength 248 nm) emitted from a mercury lamp, ArF Excimer laser light (wavelength 193 nm), vacuum ultraviolet light (VUV light) such as F ₂ laser light (wavelength 157 nm), or the like is used. In the present embodiment, ArF excimer laser light, which is ultraviolet light (vacuum ultraviolet light), is used as the exposure light EL.

  The mask stage 1 is movable on the guide surface 8G of the base member 8 including the illumination region IR while holding the mask M. In the present embodiment, the guide surface 8G and the XY plane are substantially parallel. The mask stage 1 is moved by the operation of a drive system including a planar motor as disclosed in US Pat. No. 6,452,292, for example. In the present embodiment, the mask stage 1 can move in six directions on the guide surface 8G in the X axis, Y axis, Z axis, θX, θY, and θZ directions by the operation of the drive system.

  The projection optical system PL irradiates the predetermined projection region PR with the exposure light EL. The projection region PR includes a position where the exposure light EL emitted from the projection optical system PL can be irradiated. The projection optical system PL projects an image of the pattern of the mask M at a predetermined projection magnification onto at least a part of the substrate P arranged in the projection region PR. In the present embodiment, the projection optical system PL is a reduction system. The projection magnification of the projection optical system PL may be, for example, 1/4, 1/5, or 1/8. The projection optical system PL may be a unity magnification system or an enlargement system. In the present embodiment, the optical axis of the projection optical system PL is parallel to the Z axis. The projection optical system PL may be a refractive system that does not include a reflective optical element, a reflective system that does not include a refractive optical element, or a catadioptric system that includes both a reflective optical element and a refractive optical element. The projection optical system PL may form an inverted image or an erect image.

  The projection optical system PL includes a terminal optical element 13 having an emission surface 12 from which the exposure light EL is emitted. The exit surface 12 emits the exposure light EL toward the image plane of the projection optical system PL. The last optical element 13 is an optical element closest to the image plane of the projection optical system PL among the plurality of optical elements of the projection optical system PL. The projection region PR includes a position where the exposure light EL emitted from the emission surface 12 can be irradiated. In the present embodiment, the emission surface 12 faces the −Z direction. The exit surface 12 is parallel to the XY plane. The exit surface 12 facing the −Z direction may be a convex surface or a concave surface. In addition, the emission surface 12 may be inclined with respect to the XY plane, or may include a curved surface. In the present embodiment, the optical axis of the last optical element 13 is parallel to the Z axis. In the present embodiment, the exposure light EL emitted from the emission surface 12 travels in the −Z direction.

  The substrate stage 2 is movable in an XY plane including a position (projection region PR) where the exposure light EL from the emission surface 12 can be irradiated while holding the substrate P. The measurement stage 3 is movable in an XY plane including a position (projection region PR) where the exposure light EL from the emission surface 12 can be irradiated with the measurement member (measuring instrument) C mounted. Each of the substrate stage 2 and the measurement stage 3 is movable on the guide surface 9G of the base member 9. In the present embodiment, the guide surface 9G and the XY plane are substantially parallel.

  The substrate stage 2 and the measurement stage 3 are moved by the operation of the drive system 10 including a planar motor as disclosed in US Pat. No. 6,452,292, for example. The drive system 10 includes a mover 2 </ b> C disposed on the substrate stage 2, a mover 3 </ b> C disposed on the measurement stage 3, and a stator 9 </ b> M disposed on the base member 9. Each of the substrate stage 2 and the measurement stage 3 can move in six directions on the guide surface 9G in the X axis, Y axis, Z axis, θX, θY, and θZ directions by the operation of the drive system 10.

  The substrate stage 2 can release the substrate P as disclosed in, for example, US Patent Application Publication No. 2007/0177125, US Patent Application Publication No. 2008/0049209, and US Patent Application Publication No. 2007/0288121. And a second holding part 15 which is disposed around the first holding part 14 and holds the cover member T1 and the scale member (measurement member) T2 in a releasable manner. In the present embodiment, the upper surface of the substrate stage 2 disposed around the substrate P includes the upper surface of the cover member T1. Further, the upper surface of the substrate stage 2 includes the upper surface of the scale member T2.

  The measurement system 4 includes an encoder system that measures the position of the substrate stage 2 using a scale member T2 of the substrate stage 2 as disclosed in, for example, US Patent Application Publication No. 2007/0288121. The measurement system 4 includes an interferometer system.

  When executing the exposure process of the substrate P or when executing a predetermined measurement process, the control device 6 determines the mask stage 1 (mask M) and the substrate stage 2 (substrate P) based on the measurement result of the measurement system 4. And position control of the measurement stage 3 (measurement member C).

  Next, the liquid immersion member 5 according to this embodiment will be described. FIG. 2 is a side view showing an example of the liquid immersion member 5 according to the present embodiment, and FIG. 3 is a view of the liquid immersion member 5 as viewed from the lower side (−Z side).

  The liquid immersion member 5 is in relation to the first member 21 disposed at least at a part of the periphery of the terminal optical element 13 and the optical path K of the exposure light EL emitted from the emission surface 12 (the optical axis of the terminal optical element 13). And a second member 22 disposed outside the first member 21. The first member 21 forms an immersion space LS1 for the liquid LQ. The second member 22 can be separated from the immersion space LS1 to form an immersion space LS2 for the liquid LQ. The immersion space LS1 is formed in at least a part of the first space SP1 below the first member 21. The immersion space LS2 is formed in at least a part of the second space SP2 below the second member 22.

  The first member 21 has a lower surface 23. The second member 22 has a lower surface 24. The lower surface 23 and the lower surface 24 can be opposed to an object that can move below the last optical element 13. An object that can move below the last optical element 13 can face the exit surface 12. The object can be arranged in the projection region PR. The object can move in the XY plane including the projection region PR. The object is movable below the first member 21. The object is movable below the second member 22.

  In the present embodiment, the object is at least the substrate stage 2 (cover member T1, scale member T2), the substrate P held on the substrate stage 2 (first holding unit 14), and the measurement stage 3 (measurement member C). Including one.

  In the following description, the object that can move below the last optical element 13 is the substrate P. As described above, the object movable below the last optical element 13 may be at least one of the substrate stage 2 and the measurement stage 3, or an object different from the substrate P, the substrate stage 2, and the measurement stage 3. But you can.

  The first member 21 forms an immersion space LS1 for the liquid LQ so that the optical path K of the exposure light EL on the emission surface 12 side is filled with the liquid LQ. The immersion space LS1 is formed so that the optical path K between the emission surface 12 and the upper surface of the substrate P (object) is filled with the liquid LQ.

  The first member 21 forms an immersion space LS1 for the liquid LQ in at least a part of the optical path space SPK including the optical path K on the emission surface 12 side and the first space SP1 on the lower surface 23 side. The last optical element 13 and the first member 21 can hold the liquid LQ between the substrate P (object). The immersion space LS1 is formed by the liquid LQ held between the terminal optical element 13 and the first member 21 and the substrate P. The optical path of the exposure light EL between the last optical element 13 and the substrate P is maintained by holding the liquid LQ between the emission surface 12 and the lower surface 23 on the one side and the upper surface of the substrate P (object) on the other side. The immersion space LS1 is formed so that K is filled with the liquid LQ.

  In the exposure of the substrate P, the immersion space LS1 is formed so that the optical path K of the exposure light EL irradiated to the substrate P is filled with the liquid LQ. When the substrate P is irradiated with the exposure light EL, the immersion space LS1 is formed so that only a partial region of the surface of the substrate P including the projection region PR is covered with the liquid LQ.

  In the present embodiment, at least a part of the interface (meniscus, edge) LG1 of the liquid LQ in the immersion space LS1 is formed between the lower surface 23 and the upper surface of the substrate P. That is, the exposure apparatus EX of the present embodiment employs a local liquid immersion method. The outside of the immersion space LS1 (the outside of the interface LG1) is a gas space.

  In the present embodiment, the first member 21 is an annular member. In the present embodiment, a part of the first member 21 is disposed around the last optical element 13. In addition, a part of the first member 21 is disposed around the optical path K of the exposure light EL between the terminal optical element 13 and the substrate P.

  The first member 21 may not be an annular member. For example, the first member 21 may be disposed in a part of the periphery of the terminal optical element 13 and the optical path K. The first member 21 may not be disposed at least at a part of the periphery of the last optical element 13. For example, the first member 21 may be disposed at least part of the periphery of the optical path K between the exit surface 12 and the substrate P and may not be disposed around the terminal optical element 13. The first member 21 may not be disposed at least at a part of the periphery of the optical path K between the emission surface 12 and the substrate P. For example, the first member 21 may be disposed at least at a part of the periphery of the terminal optical element 13 and may not be disposed around the optical path K between the exit surface 12 and the object.

  The first member 21 includes a supply port 31 for supplying the liquid LQ for forming the immersion space LS1, and a recovery port 32 for recovering at least a part of the liquid LQ in the immersion space LS1.

  FIG. 4 is a cross-sectional view of the first member 21 showing the vicinity of the supply port 31. The supply port 31 is disposed so as to face the optical path space SPK (optical path K). The supply port 31 is connected to a liquid supply device 34 that can supply the liquid LQ via a supply flow path 33 formed inside the first member 21. The supply port 31 supplies the liquid LQ from the liquid supply device 34 to the optical path space SPK (optical path K) on the exit surface 12 side.

  The first member 21 has a hole (opening) 20 that the injection surface 12 faces. The exposure light EL emitted from the emission surface 12 can pass through the opening 20 and irradiate the substrate P. At least a part of the liquid LQ supplied from the supply port 31 to the optical path space SPK is supplied onto the substrate P (on the object) through the opening 20. Further, at least a part of the liquid LQ supplied from the supply port 31 to the optical path space SPK is supplied to the first space SP1 through the opening 20. In the present embodiment, the liquid LQ is supplied from the opening 20 to the first space SP1 below the first member 21.

  The liquid supply device 34 includes a liquid adjustment system. The liquid supply device 34 includes, for example, a supply amount adjusting unit 34A that can adjust the supply amount (liquid supply amount per unit time) of the liquid LQ supplied from the supply port 31, and a temperature that adjusts the temperature of the supplied liquid LQ. It has the adjustment part 34B and the temperature sensor 34C which detects the temperature of the liquid LQ to supply. The supply amount adjustment unit 34A includes a mass flow controller. The temperature adjustment unit 34B includes a heating device that can heat the liquid LQ and a cooling device that can cool the liquid LQ.

  A plurality of supply ports 31 may be arranged around the optical path K. As shown in FIG. 2, in the present embodiment, the supply port 31 is arranged on one side (+ X side) and the other side (−X side) with respect to the optical path K. As shown in FIG. 2, in this embodiment, a liquid supply device 34 is connected to each of the supply port 31 on one side and the supply port 31 on the other side. The temperature of the liquid LQ supplied from the supply port 31 on one side and the temperature of the liquid LQ supplied from the supply port 31 on the other side may be substantially equal or different. The supply amount of the liquid LQ supplied from the supply port 31 on one side and the supply amount of the liquid LQ supplied from the supply port 31 on the other side may be substantially equal or different.

  FIG. 5 is a cross-sectional view of the first member 21 showing the vicinity of the recovery port 32. The collection port 32 is disposed so as to face the first space SP1. The substrate P (object) can face the recovery port 32. The recovery port 32 is connected to a liquid recovery device 36 that can recover (suction) the liquid LQ via a recovery flow path 35 formed inside the first member 21. The recovery port 32 can recover (suction) at least part of the liquid LQ in the first space SP1 between the first member 21 and the substrate P. The liquid LQ that has flowed into the recovery channel 35 from the recovery port 32 is recovered by the liquid recovery device 36.

  The liquid recovery device 36 can connect the recovery port 32 to the vacuum system BS. The liquid recovery device 36 includes a storage portion 36A that stores the liquid LQ recovered from the recovery port 32, and a pressure adjustment unit 36B that can adjust the suction force of the recovery port 32. The accommodating portion 36A includes a tank. The pressure adjustment unit 36B includes a pressure adjustment valve and the like.

  In the present embodiment, the first member 21 includes a porous member 37. The porous member 37 has a plurality of holes (openings or pores) through which the liquid LQ can flow. The porous member 37 includes, for example, a mesh filter. The mesh filter is a porous member in which a large number of small holes are formed in a mesh shape.

  In the present embodiment, the porous member 37 is a plate-like member. The porous member 37 has a plurality of holes formed so as to connect the lower surface 37B to which the substrate P can face, the upper surface 37A facing the recovery flow path 35 formed in the first member 21, and the upper surface 37A and the lower surface 37B. And have. In the present embodiment, the recovery port 32 includes a hole of the porous member 37. The liquid LQ recovered through the hole (recovery port 32) of the porous member 37 flows through the recovery channel 35.

  In the present embodiment, both the liquid LQ and the gas in the first space SP1 are recovered (sucked) from the porous member 37 (recovery port 32). Note that only the liquid LQ may be substantially recovered through the porous member 37, and the recovery of the gas may be limited. For example, the pressure (first space SP1) on the lower surface 37B side of the porous member 37 so that the liquid LQ on the substrate P (object) passes through the hole of the porous member 37 and flows into the recovery flow path 35 and does not pass the gas. ) And the pressure on the upper surface 37A side (pressure of the recovery flow path 35) may be adjusted. An example of a technique for recovering only the liquid through the porous member is disclosed in, for example, US Pat. No. 7,292,313.

  The porous member 37 may not be provided.

  In the present embodiment, the liquid LQ is recovered from the recovery port 32 in parallel with the supply of the liquid LQ from the supply port 31, so that the terminal optical element 13 and the first member 21 on one side and the other An immersion space LS1 for the liquid LQ is formed between the substrate P on the side. The immersion space LS1 is formed by the liquid LQ supplied from the supply port 31.

  The lower surface 23 is disposed around the opening 20. In the present embodiment, at least a part of the lower surface 23 is substantially parallel to the XY plane. Note that at least a part of the lower surface 23 may be inclined with respect to the XY plane, or may include a curved surface.

  The lower surface 23 includes a lower surface 23B that is disposed around the opening 20 and cannot collect the liquid LQ, and a lower surface 37B of the porous member 37 that is disposed around the lower surface 23B and can collect the liquid LQ. The liquid LQ cannot pass through the lower surface 23B. The lower surface 23B can hold the liquid LQ with the substrate P.

  In the present embodiment, the lower surface 37 </ b> B capable of collecting the liquid LQ is disposed at the peripheral edge of the lower surface 23. In the XY plane parallel to the lower surface 23 (the upper surface of the substrate P), the lower surface 37B is annular. The lower surface 23B that cannot recover the liquid LQ is disposed inside the lower surface 37B. In the present embodiment, the interface LG1 is disposed between the lower surface 37B and the upper surface of the substrate P.

  A plurality of lower surfaces 37B (collection ports 32) that can collect the liquid LQ may be arranged around the optical path K (opening 20).

  The second member 22 is a member different from the first member 21. The second member 22 is separated from the first member 21. The second member 22 is disposed at a part of the periphery of the first member 21.

  The second member 22 can form an immersion space LS2 for the liquid LQ in at least a part of the second space SP2 below the second member 22. The second space SP2 is a space on the lower surface 24 side. The immersion space LS2 is formed apart from the immersion space LS1. The immersion space LS2 is formed between the lower surface 24 and the upper surface of the substrate P (object). The second member 22 can hold the liquid LQ with the substrate P (object). The immersion space LS2 is formed by the liquid LQ that is held between the second member 22 and the substrate P. Liquid immersion space LS2 is formed by holding liquid LQ between lower surface 24 on one side and the upper surface of substrate P (object) on the other side.

  In the present embodiment, at least a part of the interface (meniscus, edge) LG2 of the liquid LQ in the immersion space LS2 is formed between the lower surface 24 and the upper surface of the substrate P. The outside of the immersion space LS2 (the outside of the interface LG2) is a gas space.

  The immersion space LS2 is smaller than the immersion space LS1. The size of the immersion space includes the volume of the liquid that forms the immersion space. The size of the immersion space includes the weight of the liquid that forms the immersion space. The size of the immersion space includes, for example, the area of the immersion space in a plane parallel to the surface (upper surface) of the substrate P (in the XY plane). The size of the immersion space includes, for example, the dimension of the immersion space in a predetermined direction (for example, the X-axis direction or the Y-axis direction) in a plane (in the XY plane) parallel to the surface (upper surface) of the substrate P. .

  That is, in the plane parallel to the surface (upper surface) of the substrate P (in the XY plane), the immersion space LS2 is smaller than the immersion space LS1. The volume (weight) of the liquid LQ that forms the immersion space LS2 is smaller than the volume (weight) of the liquid LQ that forms the immersion space LS1. The dimension of the immersion space LS2 in the XY plane is smaller than the dimension of the immersion space LS1.

  In the present embodiment, two second members 22 are arranged in the space around the first member 21. In the present embodiment, the second member 22 is disposed on one side (+ X side) and the other side (−X side) of the first member 21 with respect to the X-axis direction. The immersion space LS2 is formed on one side (+ X side) and the other side (−X side) of the immersion space LS1 with respect to the X-axis direction.

  In the following description, the second member 22 disposed on the + X side of the first member 21 is appropriately referred to as a second member 221, and the second member 22 disposed on the −X side of the first member 21 is appropriately included. , Referred to as a second member 222.

  The second member 22 may be disposed only on one side (+ X side) of the first member 21 or may be disposed only on the other side (−X side). The immersion space LS2 may be disposed only on one side (+ X side) of the immersion space LS1, or may be disposed only on the other side (−X side).

  In the present embodiment, at least a part of the lower surface 24 is substantially parallel to the XY plane. Note that at least a part of the lower surface 24 may be inclined with respect to the XY plane, or may include a curved surface.

  In the present embodiment, the position (height) of the lower surface 23 and the position (height) of the lower surface 24 in the Z-axis direction are substantially equal. That is, the distance between the lower surface 23 and the upper surface of the substrate P (object) and the distance between the lower surface 24 and the upper surface of the substrate P (object) are substantially equal.

  Note that the lower surface 24 may be disposed at a position lower than the lower surface 23. That is, the distance between the lower surface 24 and the upper surface of the substrate P (object) may be smaller than the distance between the lower surface 23 and the upper surface of the substrate P (object). Note that the lower surface 24 may be disposed at a position higher than the lower surface 23. That is, the distance between the lower surface 25 and the upper surface of the substrate P (object) may be larger than the distance between the lower surface 24 and the upper surface of the substrate P (object).

  FIG. 6 is a partial cross-sectional view showing an example of the second member 22. The second member 22 includes a supply port 41 for supplying the liquid LQ for forming the immersion space LS2, and a recovery port 42 for recovering at least a part of the liquid LQ in the immersion space LS2.

    In the present embodiment, the supply port 41 is disposed so as to face the second space SP <b> 2 below the second member 22. The substrate P (object) can face the supply port 41. The supply port 41 is disposed on at least a part of the lower surface 24 of the second member 22. The supply port 41 can supply the liquid LQ to the second space SP2.

    In the present embodiment, the recovery port 42 is disposed so as to face the second space SP <b> 2 below the second member 22. The substrate P (object) can face the recovery port 42. The collection port 42 is disposed on at least a part of the lower surface 24 of the second member 22. The recovery port 42 can recover at least a part of the liquid LQ in the second space SP2. The recovery port 42 can recover the gas in the second space SP2. In the present embodiment, the recovery port 42 recovers the liquid LQ together with the gas. At least a portion of the fluid (one or both of the liquid LQ and gas) in the second space SP2 is recovered from the recovery port 42.

  In the present embodiment, at least a part of the recovery port 42 is disposed between the first member 21 and the supply port 41. In addition, at least a part of the recovery port 42 is disposed outside the supply port 41 with respect to the optical path K (first member 21). In the present embodiment, the collection port 42 is disposed so as to surround the supply port 41. In a plane parallel to the lower surface 24 (in the XY plane), the recovery port 42 is annular.

  A plurality of recovery ports 42 may be arranged around the supply port 41. That is, the plurality of recovery ports 42 may be discretely arranged around the supply port 41.

  The supply port 41 is connected to a liquid supply device 44 that can supply the liquid LQ via a supply flow path 43 formed inside the second member 22. The supply port 41 supplies the liquid LQ from the liquid supply device 44 to the second space SP2.

  The liquid supply device 44 includes a liquid adjustment system. The liquid supply device 44 includes, for example, a supply amount adjusting unit 44A that can adjust the supply amount (liquid supply amount per unit time) of the liquid LQ supplied from the supply port 41, and a temperature that adjusts the temperature of the supplied liquid LQ. It has the adjustment part 44B and the temperature sensor 44C which detects the temperature of the liquid LQ to supply. The supply amount adjusting unit 44A includes a mass flow controller. The temperature adjustment unit 44B includes a heating device that can heat the liquid LQ and a cooling device that can cool the liquid LQ.

  As shown in FIG. 2, in the present embodiment, the liquid supply device 44 is connected to each of the second member 221 on one side and the second member 222 on the other side. In the present embodiment, the temperature of the liquid LQ supplied from the supply port 41 of the second member 221 on one side and the temperature of the liquid LQ supplied from the supply port 41 of the second member 222 on the other side are substantially equal. May be equal to or different from each other. The supply amount of the liquid LQ supplied from the supply port 41 of the second member 221 on one side is substantially equal to the supply amount of the liquid LQ supplied from the supply port 41 of the second member 22 on the other side. It may be different or different.

  The recovery port 42 is connected to a liquid recovery device 46 capable of recovering (suctioning) the liquid LQ (gas) via a recovery channel 45 formed inside the second member 22. The recovery port 42 can recover (suck) at least a part of the liquid LQ in the second space SP2 between the second member 22 and the substrate P. The liquid LQ recovered from the second space SP2 below the second member 22 flows through the recovery channel 45. The liquid LQ that has flowed into the recovery channel 45 from the recovery port 42 is recovered by the liquid recovery device 46.

  The liquid recovery device 46 can connect the recovery port 42 to the vacuum system BS. The liquid recovery device 46 includes a storage portion 46A that stores the liquid LQ recovered from the recovery port 42, and a pressure adjustment unit 46B that can adjust the suction force of the recovery port 42. The accommodating portion 46A includes a tank. The pressure adjustment unit 46B includes a pressure adjustment valve and the like.

  The suction force of the recovery port 42 depends on the difference between the pressure of the recovery channel 45 and the pressure of the second space SP2. The suction force of the recovery port 42 is determined by the pressure difference between the recovery flow path 45 and the second space SP2. In the present embodiment, the pressure adjusting unit 46B can adjust the pressure of the recovery flow path 45. The chamber device 11 can adjust the pressure in the second space SP2.

  As shown in FIG. 2, in the present embodiment, a liquid recovery device 46 is connected to each of the second member 221 on one side and the second member 222 on the other side. In the present embodiment, the recovery force (suction force) of the recovery port 41 of the second member 221 on one side and the recovery force (suction force) of the recovery port 42 of the second member 222 on the other side are substantially equal. It may be different or different.

  In the present embodiment, the liquid LQ is recovered from the recovery port 42 in parallel with the supply of the liquid LQ from the supply port 41, whereby the second member 22 on one side and the substrate P on the other side In the meantime, an immersion space LS2 is formed with the liquid LQ. The immersion space LS2 is formed by the liquid LQ supplied from the supply port 41.

  FIG. 7 is a plan view showing an example of the substrate stage 2 and the measurement stage 3. The substrate P is held by the first holding unit 14 so that the surface (upper surface) of the substrate P and the XY plane are substantially parallel. The cover member T1 and the scale member T2 are held by the second holding unit 15 so that the upper surface of the cover member T1 and the upper surface of the scale member T2 are substantially parallel to the XY plane. In the present embodiment, the upper surface of the substrate P held by the first holding unit 14, the upper surface of the cover member T1 and the upper surface of the scale member T2 held by the second holding unit 15 are substantially in the same plane. Be placed. Note that the upper surface of the substrate P held by the first holding unit 14 and one or both of the upper surface of the cover member T1 and the scale member T2 held by the second holding unit 15 are not arranged in the same plane. Also good. One or both of the upper surface of the cover member T1 and the upper surface of the scale member T2 may be inclined with respect to the upper surface of the substrate P, or one or both of the upper surface of the cover member T1 and the upper surface of the scale member T2 have a curved surface. May be included.

  The cover member T1 is disposed around the substrate P. The cover member T1 is adjacent to the substrate P through the gap Ga. A gap Ga is provided between the substrate P and the cover member T1.

  The scale member T2 is disposed around the cover member T1. The scale member T2 is adjacent to the cover member T1 through the gap Gb. A gap Gb is formed between the cover member T1 and the scale member T2.

  In the present embodiment, as disclosed in, for example, U.S. Patent Application Publication No. 2006/0023186 and U.S. Patent Application Publication No. 2007/0127006, it is formed below the terminal optical element 13 and the first member 21. The upper surface of the substrate stage 2 (the upper surface of the scale member T2) and the upper surface of the measurement stage 3 are brought close to or in contact with each other so that the immersion space LS1 moves from one to the other on the substrate stage 2 and the measurement stage 3. In this state, the substrate stage 2 and the measurement stage 3 are movable in the XY plane with respect to the terminal optical element 13 and the first member 21.

  In the following description, the substrate stage 2 and the measurement stage 3 are placed on the XY plane with respect to the last optical element 13 and the first member 21 in a state where the upper surface of the substrate stage 2 and the upper surface of the measurement stage 3 are close to or in contact with each other. The operation of moving in a synchronized manner is appropriately referred to as a scrum moving operation.

  In the present embodiment, as shown in FIG. 7, in the scram moving operation, the + Y side edge of the upper surface of the substrate stage 2 and the + Y side edge of the upper surface of the measurement stage 3 approach or come into contact with each other.

  By the scram moving operation, the immersion space LS1 formed below the last optical element 13 and the first member 21 moves from one side to the other on the substrate stage 2 and the measurement stage 3. The immersion space LS2 formed below the second member 22 moves from one to the other on the substrate stage 2 and the measurement stage 3.

  In the scram moving operation, the substrate stage 2 is adjacent to the measurement stage 3 through the gap Gc. In the scram moving operation, a gap Gc is provided between the substrate stage 2 and the measurement stage 3.

  The upper surface of the measurement stage 3 is arranged around the measurement member C. The upper surface of the measurement stage 3 is adjacent to the measurement member C through the gap Gd. A gap Gd is formed between the measurement stage 3 and the measurement member C.

  Next, a method for exposing the substrate P using the exposure apparatus EX having the above-described configuration will be described.

  At a substrate exchange position away from the liquid immersion member 5, a process of loading (loading) the substrate P before exposure into the substrate stage 2 (first holding unit) is performed. In addition, the measurement stage 3 is disposed so as to face the last optical element 13 and the liquid immersion member 5 in at least a part of the period in which the substrate stage 2 is separated from the liquid immersion member 5.

  The supply port 31 (opening 20) of the first member 21 can supply the liquid LQ to the first space SP1 below the first member 21. The recovery port 32 of the first member 21 can suck the fluid (one or both of the liquid LQ and the gas) in the first space SP1. In parallel with at least a part of the supply of the liquid LQ from the supply port 31, the liquid LQ is recovered from the recovery port 32, whereby an immersion space LS1 of the liquid LQ is formed in the first space SP1.

  The supply port 41 of the second member 22 can supply the liquid LQ to the second space SP <b> 2 below the second member 22. The recovery port 42 of the second member 22 can suck the fluid (one or both of the liquid LQ and the gas) in the second space SP2. In parallel with at least part of the supply of the liquid LQ from the supply port 41, the liquid LQ is recovered from the recovery port 42, whereby an immersion space LS2 of the liquid LQ is formed in the second space SP2.

  In a state where the measurement stage 3 is disposed so as to face the terminal optical element 13 and the liquid immersion member 5, the first and second liquid immersion spaces LS1 and LS2 are formed on the measurement stage 3.

  After the substrate P before exposure is loaded onto the substrate stage 2 and the measurement process using the measurement stage 3 is completed, the control device 6 causes the last optical element 13 and the liquid immersion member 5 to face the substrate stage 2 (substrate P). Then, the substrate stage 2 is moved. The scram movement operation is executed so that the terminal optical element 13 and the liquid immersion member 5 and the measurement stage 3 are changed from the facing state to the state in which the terminal optical element 13 and the liquid immersion member 5 and the substrate stage 2 are facing each other. The The recovery of the liquid LQ from the recovery port 32 is performed in parallel with the supply of the liquid LQ from the supply port 31 with the last optical element 13 and the liquid immersion member 5 facing the substrate stage 2 (substrate P). Thus, an immersion space LS1 is formed between the last optical element 13 and the first member 21 and the substrate stage 2 (substrate P) so that the optical path K of the exposure light EL on the exit surface 12 side is filled with the liquid LQ. The Further, by collecting the liquid LQ from the collection port 42 in parallel with the supply of the liquid LQ from the supply port 41, the immersion space LS2 between the second member 22 and the substrate stage 2 (substrate P). Is formed.

  The control device 6 starts the exposure process for the substrate P. The control device 6 emits the exposure light EL from the illumination system IL in a state where the immersion space LS1 is formed on the substrate P and the immersion space LS2 is formed on at least one of the substrate P and the substrate stage 2. To do. The illumination system IL illuminates the mask M with the exposure light EL. The exposure light EL from the mask M is irradiated onto the substrate P through the projection optical system PL and the liquid LQ in the immersion space LS1 between the emission surface 12 and the substrate P. Accordingly, the substrate P is exposed with the exposure light EL emitted from the emission surface 12 through the liquid LQ in the immersion space LS1, and the pattern image of the mask M is projected onto the substrate P.

    The exposure apparatus EX of the present embodiment is a scanning exposure apparatus (so-called scanning stepper) that projects an image of the pattern of the mask M onto the substrate P while synchronously moving the mask M and the substrate P in a predetermined scanning direction. In the present embodiment, the scanning direction (synchronous movement direction) of the substrate P is the Y-axis direction, and the scanning direction (synchronous movement direction) of the mask M is also the Y-axis direction. The control device 6 moves the substrate P in the Y-axis direction with respect to the projection region PR of the projection optical system PL, and in the illumination region IR of the illumination system IL in synchronization with the movement of the substrate P in the Y-axis direction. On the other hand, the substrate P is irradiated with the exposure light EL through the projection optical system PL and the liquid LQ in the immersion space LS1 on the substrate P while moving the mask M in the Y-axis direction.

  In a state where the immersion space LS1 is formed, the substrate P (object) moves in the XY plane, whereby a part of the liquid LQ in the immersion space LS1 is separated from the immersion space LS1, and the first space. There is a possibility of movement (outflow) to the outside of SP1. In the present embodiment, the immersion space LS2 is formed in a part of the periphery of the first space SP1. Therefore, the liquid LQ that has moved to the outside of the first space SP1 is captured in the immersion space LS2. The liquid LQ captured in the immersion space LS2 is recovered from the recovery port 42 together with the liquid LQ in the immersion space LS2.

  In the present embodiment, the immersion space LS2 is smaller than the immersion space LS1. Therefore, when the substrate P (object) moves in a state where the immersion spaces LS1 and LS2 are formed, a part of the liquid LQ in the immersion space LS2 is separated from the immersion space LS2 and outside the second space SP2. (Moving out) is suppressed. In other words, since the immersion space LS2 is smaller than the immersion space LS1, a part of the liquid LQ in the immersion space LS2 flows out from the second space SP2, and a part of the liquid LQ in the immersion space LS1 It is suppressed from flowing out of the first space SP1.

  FIG. 8 is a diagram illustrating an example of the substrate P held on the substrate stage 2. In the present embodiment, a plurality of shot areas S, which are exposure target areas, are arranged in a matrix on the substrate P. The control device 6 sequentially exposes the plurality of shot regions S of the substrate P held on the substrate stage 2 (first holding unit 14) with the exposure light EL through the liquid LQ in the immersion space LS1. Each of the plurality of shot areas S is exposed while moving the substrate P in the Y-axis direction with respect to the exposure light EL (projection area PR).

  For example, in order to expose the first shot region S of the substrate P, the control device 6 causes the substrate P (first shot region S) to be projected onto the projection optical system PL in the state where the immersion spaces LS1 and LS2 are formed. While moving in the Y-axis direction with respect to the projection region PR, in synchronization with the movement of the substrate P in the Y-axis direction, while moving the mask M in the Y-axis direction with respect to the illumination region IR of the illumination system IL, The first shot region S is irradiated with the exposure light EL through the projection optical system PL and the liquid LQ in the immersion space LS1 on the substrate P. As a result, an image of the pattern of the mask M is projected onto the first shot area S of the substrate P, and the first shot area S is exposed with the exposure light EL emitted from the emission surface 12. After the exposure of the first shot region S is completed, the control device 6 starts the exposure of the next second shot region S, and the substrate P in a state where the immersion spaces LS1 and LS2 are formed. Is moved in a direction intersecting the X axis in the XY plane (for example, the X axis direction or a direction inclined with respect to the X axis and Y axis directions in the XY plane), and the second shot area S is moved to the exposure start position. Move to. Thereafter, the control device 6 starts exposure of the second shot region S.

  The control device 6 performs shots on the position (projection region PR) irradiated with the exposure light EL from the emission surface 12 in the state where the immersion spaces LS1 and LS2 are formed on the substrate P (substrate stage 2). The operation of exposing the shot area while moving the area in the Y-axis direction, and the next shot in the state where the immersion spaces LS1 and LS2 are formed on the substrate P (substrate stage 2) after the exposure of the shot area The substrate P is placed in a direction crossing the Y-axis direction in the XY plane (X-axis direction, a direction inclined with respect to the X-axis and Y-axis directions in the XY plane, etc.) so that the region is arranged at the exposure start position. The plurality of shot areas of the substrate P are sequentially exposed by repeating the moving operation.

  In the following description, in order to expose the shot area, the position (in which the exposure light EL from the emission surface 12 is irradiated) in the state where the immersion spaces LS1 and LS2 are formed on the substrate P (substrate stage 2) ( The operation of moving the substrate P (shot region) in the Y-axis direction with respect to the projection region PR) is appropriately referred to as a scan movement operation. In addition, after the exposure of a certain shot area, in order to expose the next shot area, the next shot area is at the exposure start position in the state where the immersion spaces LS1 and LS2 are formed on the substrate P (substrate stage 2). The operation of moving the substrate P in the direction crossing the Y-axis direction in the XY plane as appropriate is referred to as a step movement operation as appropriate.

  The plurality of shot regions S of the substrate P are sequentially exposed by repeating the scan movement operation and the step movement operation.

  The scan movement operation is a constant speed movement exclusively in the Y-axis direction. The step movement operation includes non-constant speed movement (acceleration / deceleration movement). For example, the step movement operation between two shot areas adjacent in the X-axis direction includes non-constant speed movement (acceleration / deceleration movement) in the Y-axis direction and non-constant speed movement (acceleration / deceleration movement) in the X-axis direction.

  In the present embodiment, the control device 6 moves the substrate stage 2 so that the projection region PR of the projection optical system PL and the substrate P relatively move along a movement locus indicated by an arrow Sr in FIG. The projection area PR is irradiated with the exposure light EL while moving, and the plurality of shot areas S of the substrate P are sequentially exposed with the exposure light EL via the liquid LQ.

  After the exposure of the plurality of shot regions S of the substrate P is completed, the substrate stage 2 holding the substrate P after the exposure moves to the substrate exchange position. The measurement stage 3 is disposed so as to face the terminal optical element 13 and the liquid immersion member 5. The scram moving operation is executed so that the terminal optical element 13 and the liquid immersion member 5 and the substrate stage 2 are changed from the facing state to the state in which the terminal optical element 13 and the liquid immersion member 5 and the measurement stage 3 are facing each other. The

  Thereafter, the same processing is repeated to sequentially expose the plurality of substrates P.

  In at least a part of the exposure time (including the scan movement operation and the step movement operation), the scram movement operation, and the measurement process, the immersion spaces LS1 and LS2 are on the upper surface of the substrate P (only the upper surface of the substrate P). In some cases). The immersion spaces LS1 and LS2 may be formed on the gap Ga between the substrate P and the cover member T1 (so as to straddle the substrate P and the cover member T1). Further, the immersion spaces LS1 and LS2 may be formed on the upper surface of the cover member T1 (only on the upper surface of the cover member T1). Moreover, the immersion spaces LS1 and LS2 may be formed on the gap Gb between the cover member T1 and the scale member T2 (so as to straddle the cover member T1 and the scale member T2). Further, the immersion spaces LS1 and LS2 may be formed on the upper surface of the scale member T2 (only on the upper surface of the scale member T2). Further, the immersion spaces LS1 and LS2 may be formed on the gap Gc between the substrate stage 2 and the measurement stage 3 (so as to straddle the substrate stage 2 and the measurement stage 3). The immersion spaces LS1 and LS2 may be formed on the upper surface of the measurement stage 3 (only on the upper surface of the measurement stage 3). The immersion spaces LS1 and LS2 may be formed on the upper surface of the measurement member C (only on the upper surface of the measurement member C). Moreover, the immersion spaces LS1 and LS2 may be formed on the gap Gd between the measurement stage 3 and the measurement member C (so as to straddle the measurement stage 3 and the measurement member C).

  In the following description, the gaps Ga, Gb, Gc, and Gd are collectively referred to as a gap G as appropriate. An object such as the substrate P is appropriately referred to as an object B. Of the two objects forming the gap G, one object B is appropriately referred to as a first object B1, and the other object B is appropriately referred to as a second object B2. The second object B2 is adjacent to the first object B1 through the gap G. The gap G is formed between the first object B1 and the second object B2.

  In the present embodiment, when the first object B1 is the substrate P, the second object B2 is the cover member T1 disposed around the substrate P. When the first object B1 is the cover member T1, the second object B2 is the substrate P. When the first object B1 is the cover member T1 (or scale member T2), the second object B2 is the scale member T2 (or cover member T1). When the first object B1 is the substrate stage 2 (or measurement stage 3), the second object B2 is the measurement stage 3 (or substrate stage 2). When the first object B1 is the measurement member C (or measurement stage 3), the second object B2 is the measurement stage 3 (or measurement member C).

  The gap G may be a gap formed between the first object B1 and the second object B2, or may be a gap (slit, opening, etc.) of one object B.

  In the present embodiment, the second member 22 can change the size of the immersion space LS2. The size of the immersion space LS2 includes the volume of the liquid LQ that forms the immersion space LS2. The size of the immersion space LS2 includes the weight of the liquid LQ that forms the immersion space LS2. The size of the immersion space LS2 includes the area of the immersion space LS2 in a plane parallel to the upper surface of the object facing the lower surface 24 of the second member 22 (in the XY plane). The size of the immersion space LS2 includes the size (area) of the liquid contact region on the upper surface of the object that is in contact with the liquid LQ in the immersion space LS2. The size of the immersion space includes, for example, the dimension of the immersion space in a predetermined direction (for example, the X-axis direction or the Y-axis direction) in a plane parallel to the upper surface of the object (in the XY plane).

  The second member 22 may change the shape of the immersion space LS2. The shape of the immersion space LS2 includes the shape of the immersion space LS2 in a plane (in the XY plane) parallel to the upper surface of the object with which the lower surface 24 of the second member 22 is opposed. The shape of the immersion space LS2 includes the shape of the liquid contact area on the upper surface of the object that the liquid LQ in the immersion space LS2 contacts.

  The second member 22 may change only the size of the immersion space LS2, may change only the shape of the immersion space LS2, or may change both the size and shape of the immersion space LS2. Good.

  9, 10, and 11 show an example of the second member 22 according to the present embodiment. 9 and 10 are partial sectional views of the second member 22. FIG. 11 is a plan view showing the lower surface 24 of the second member 22. FIG. 12 is a schematic diagram showing the size and shape of the immersion space LS2 formed by the second member 22. As shown in FIG.

  The second member 22 includes a supply port 41 that supplies the liquid LQ and a recovery port 42 that recovers at least a part of the liquid LQ. A liquid immersion space LS2 is formed by the supply of the liquid LQ from the supply port 41 and the recovery of the liquid LQ from the recovery port 42.

  In the present embodiment, the recovery port 42 includes a first opening 421 and a second opening 422. The first opening 421 can collect the liquid LQ. The second opening 422 can collect the liquid LQ. The second member 22 substantially stops the recovery of the liquid LQ from one of the first opening 421 and the second opening 422, and recovers the liquid LQ from the other of the first opening 421 and the second opening 422. The immersion space LS2 can be formed.

  Substantially stopping the recovery of the liquid LQ includes not completely recovering the liquid LQ. Note that substantially stopping the recovery of the liquid LQ includes a concept that does not completely stop the recovery operation (suction operation) of the liquid LQ. For example, substantially stopping the recovery of the liquid LQ from the first opening 421 and recovering the liquid LQ from the other of the second openings 422 completely stops the suction operation from the first opening 421, A concept of performing a recovery operation (suction operation) from the two openings 422, or a concept of lowering the suction force of the first opening 421 than the suction force of the second opening 422 while performing the suction operation from the first opening 421. But you can.

  The first opening 421 is disposed at least at a part around the supply port 41. The second opening 422 is disposed outside the first opening 421 with respect to the supply port 41.

  As shown in FIG. 11, in the present embodiment, the first opening 421 is disposed so as to surround the supply port 41. In a plane parallel to the lower surface 24 (in the XY plane), the first opening 421 is an annular shape surrounding the supply port 41. Note that a plurality of first openings 421 may be arranged discretely around the supply port 41.

  As shown in FIG. 11, in the present embodiment, the second opening 422 is disposed so as to surround the supply port 41 and the first opening 421. In a plane parallel to the lower surface 24 (in the XY plane), the first opening 421 is an annular shape surrounding the supply port 41. Note that a plurality of the second openings 422 may be discretely arranged around the supply port 41 and the first opening 421.

  FIG. 9 shows a state where the recovery of the liquid LQ from the second opening 422 is substantially stopped and the recovery of the liquid LQ from the first opening 421 is performed. By the supply of the liquid LQ from the supply port 41 and the recovery of the liquid LQ from the first opening 421, a first-size immersion space LS2a is formed.

  FIG. 10 shows a state in which the recovery of the liquid LQ from the first opening 421 is substantially stopped and the recovery of the liquid LQ from the second opening 422 is performed. By the supply of the liquid LQ from the supply port 41 and the recovery of the liquid LQ from the second opening 422, a second-sized immersion space LS2b is formed.

  FIG. 12A shows the first size immersion space LS2a. FIG. 12B shows a second-sized immersion space LS2b. In this embodiment, the liquid LQ is recovered from the first opening 421, and the liquid immersion space LS2a formed in the first state in which the recovery of the liquid LQ from the second opening 422 is substantially stopped. (First size), the liquid LQ is recovered from the second opening 422, and the liquid immersion formed in the second state in which the recovery of the liquid LQ from the first opening 421 is substantially stopped. It is different from the size (second size) of the space LS2b. As shown in FIG. 12, in the present embodiment, the immersion space LS2b is larger than the immersion space LS2a.

  In the present embodiment, the second member 22 includes a first portion 221 in which the first opening 421 is disposed and a second portion 222 in which the second opening 422 is disposed. The first portion 221 and the second portion 222 are relatively movable.

  In the present embodiment, the first portion 221 has a rod shape. The second portion 222 has a pipe shape arranged around the first portion 222. The second portion 222 is movable in the Z-axis direction around the first portion 221. The second portion 222 is movable (can be lowered) so as to approach the object B. The second portion 222 is movable (can be raised) away from the object B.

  In the present embodiment, the supply port 41 is disposed in the first portion 221. By the relative movement of the first part 221 and the second part 222, the supply port 41 and the second opening 422 are relatively moved.

  The lower surface 24 of the second member 22 includes a lower surface 241 of the first portion 221 and a lower surface 242 of the second portion 222. The supply port 41 and the first opening 421 are disposed on the lower surface 241. The second opening 422 is disposed on the lower surface 422.

  As shown in FIGS. 9 and 10, the height of the first portion 221 when the liquid LQ is recovered from the first opening 421 and the recovery of the liquid LQ from the second opening 422 is substantially stopped. Ha is substantially equal to the height Hb of the first portion 221 when the recovery of the liquid LQ from the first opening 421 is substantially stopped and the recovery of the liquid LQ from the second opening 422 is performed.

  The height Hc of the second portion 222 when the liquid LQ is recovered from the first opening 421 and the recovery of the liquid LQ from the second opening 422 is substantially stopped is the liquid HQ from the first opening 421. The recovery of the LQ is substantially stopped and the height Hd of the second portion 222 when the recovery of the liquid LQ from the second opening 422 is performed is higher.

  The heights of the first and second portions 221 and 222 are a concept including a position in a direction (Z-axis direction) parallel to the optical axis of the terminal optical element 13. The height of the first and second portions 221 and 222 is a concept including the distance from the upper surface of the object B in the Z-axis direction. The heights of the first and second portions 221 and 222 are concepts including the relative positions of the terminal optical element 13 and the first member 21 in the Z-axis direction.

  In the present embodiment, the height of the second portion 222 is adjusted so that the second opening 422 (the lower surface 242) is separated from the object B when the liquid LQ is collected from the first opening 421. When the liquid LQ is collected from the second opening 422, the height of the second portion 222 is adjusted so that the second opening 422 (the lower surface 241) approaches the object B.

  In the present embodiment, when the liquid LQ is recovered from the second opening 422, the lower surface 241 and the lower surface 242 are arranged in the same plane. Note that when the liquid LQ is recovered from the second opening 422, the lower surface 242 may be disposed below (−Z side) than the lower surface 241 or may be disposed above (+ Z side). .

  Note that the height of the first portion 221 may be adjusted such that the first opening 421 (the lower surface 241) is separated from the object B when the liquid LQ is recovered from the second opening 422. That is, the recovery of the liquid LQ from the first opening 421 is substantially stopped, and the height Hb of the first portion 221 when the recovery of the liquid LQ from the second opening 422 is performed is the same as the height Lb from the first opening 421. May be higher than the height Ha of the first portion 221 when the recovery of the liquid LQ from the second opening 422 is substantially stopped.

  The control device 6 changes the size of the immersion space LS2 based on the processing executed in the exposure apparatus EX. Further, the control device 6 changes the size of the immersion space LS2 based on the state (structure, movement condition, etc.) of the object B facing the second member 22. The control device 6 may change the shape of the immersion space LS2 based on the processing executed in the exposure apparatus EX. The control device 6 may change the shape of the immersion space LS2 based on the state (structure, movement condition, etc.) of the object B facing the second member 22.

  For example, one or both of the size and shape of the immersion space LS2 may be different between an exposure period in which the exposure light EL is irradiated on the substrate P and a non-exposure period in which the exposure light EL is not irradiated on the substrate P. .

  The non-exposure period includes, for example, a maintenance period of the exposure apparatus EX. In the maintenance period, a process for capturing foreign matter on the object B in the immersion space LS2 may be performed. The foreign matter may be a residual liquid on the object B or a particle. For example, the positions of the second member 22 and the object B (residual liquid on the object B) in the XY plane are adjusted, and the liquid LQ in the immersion space LS2 and the residual liquid on the object B are brought into contact with each other. Thereby, the residual liquid on the object B is recovered from the recovery port 42 together with the liquid LQ of the immersion space LS2, and the residual liquid is removed from the object B.

  The size of the immersion space LS2 formed during the maintenance period may be larger than the size of the immersion space LS2 formed during the non-exposure period. By increasing the immersion space LS2, there is a possibility that foreign matters on the object B can be easily captured in the immersion space LS2.

  The size of the immersion space LS2 formed during the maintenance period may be smaller than the size of the immersion space LS2 formed during the non-exposure period. When the size of the immersion space LS2 is smaller, when the object B moves while the immersion space LS2 is formed, a part of the liquid LQ in the immersion space LS2 moves away from the immersion space LS2 and becomes the second. The movement (outflow) to the outside of the space SP2 may be suppressed. Therefore, in the maintenance period, when the object B is moved in a state where the immersion space LS2 is formed, the size of the immersion space LS2 may be reduced.

  Further, the liquid immersion space LS2 formed between the second member 22 and the predetermined area PA of the object B, and the liquid immersion formed between the second member 22 and the area outside the predetermined area PA of the object B. One or both of the size and the shape may be different from each other in the space LS2.

  For example, in the state where the immersion space LS2 is formed, the object B having the predetermined area PA moves in the XY plane intersecting the optical axis (Z axis) of the last optical element 13 below the second member 22. There is a case. The control device 6 may change one or both of the size and shape of the immersion space LS2 during at least a part of the period during which the object B having the predetermined area PA moves.

  The predetermined area PA is an area where the liquid LQ is more likely to remain after passing through the immersion space LS2 than the area outside the predetermined area PA. The predetermined area PA is an area where the liquid LQ is likely to flow out of the second space SP2 between the second area 22 and the second area 22. That is, there is a possibility that the liquid LQ may flow out from the second space SP2 between the second member 22 and the predetermined area PA, and the second space between the second member 22 and the area outside the predetermined area PA. It is higher than the possibility that the liquid LQ flows out from SP2.

  The predetermined area PA is a partial area of the object B (first and second objects B1, B2). The area outside the predetermined area PA is a partial area of the object B (first and second objects B1, B2).

  The predetermined area PA of the object B includes the gap G of the object B. The gap G may be a gap between the first object B1 and the second object B2, or may be a gap (slit, opening, etc.) provided in one object B. The gap G may be the above-described gaps Ga, Gb, Gc, Gd. The gap G may be, for example, a light transmission part (slit part or opening part) of the measuring member C.

  The predetermined area PA includes a lyophilic area SA that is more lyophilic with respect to the liquid LQ than the area outside the predetermined area PA. In the object B, the area outside the predetermined area PA includes a liquid repellent area HA that is liquid repellent with respect to the liquid LQ. The contact angle of the lyophilic area SA with the liquid LQ is larger than 90 degrees. The contact angle of the lyophilic area SA with the liquid LQ may be 100 degrees or more, or 110 degrees or more. The contact angle of the liquid repellent area HA with respect to the liquid LQ is smaller than 90 degrees. The contact angle of the liquid repellent area HA with the liquid LQ may be 80 degrees or less, or 70 degrees or less.

  Further, the predetermined area PA includes a stepped portion D of the object B provided in a portion where the second member 22 can face.

  The size of the immersion space LS2 formed between the second member 22 and the predetermined region PA is larger than the size of the immersion space LS formed between the second member and the region outside the predetermined region PA. May be small. As described above, when the size of the immersion space LS2 is smaller, when the object B moves while the immersion space LS2 is formed, a part of the liquid LQ in the immersion space LS2 is immersed in the immersion space LS2. There is a possibility that the movement (outflow) outside the second space SP2 away from the second space SP2 is suppressed. Therefore, when the immersion space LS2 is formed between the second member 22 and the predetermined area PA, the outflow of the liquid LQ is suppressed by reducing the size of the immersion space LS2.

  The size of the immersion space LS2 formed between the second member 22 and the predetermined area PA is equal to the size of the immersion space LS formed between the second member and the area outside the predetermined area PA. It may be larger than the size.

  In addition, the size of the immersion space LS2 formed between the second member 22 and the predetermined area PA, and the immersion space LS formed between the second member 22 and the area outside the predetermined area PA. The operation for changing one or both of the shape and the shape may be performed during the exposure period or during the non-exposure period.

  Further, when the object B moves while the immersion space LS2 is formed, one or both of the size and the shape of the immersion space LS2 may be changed based on the moving condition of the object B.

  For example, the immersion space LS2 formed between the object B moving under the first movement condition and the second member 22, and the object B and the second member 22 moving under a second movement condition different from the first movement condition. One or both of the size and the shape may be different from each other in the immersion space LS2 formed between the two.

  The moving condition of the object B includes the speed of the object B in the XY plane. The size of the immersion space LS2 formed between the object B moving at the first speed V1 and the second member 22 is such that the object B and the second member moving at the second speed V2 that is slower than the first speed V1. 22 may be smaller than the size of the immersion space LS2 formed between the two. When the object B moves at a high speed in the state where the immersion space LS2 is formed, a part of the liquid LQ in the immersion space LS2 moves away from the second space SP2 away from the immersion space LS2. May be suppressed. Therefore, when the object B moves at a high speed, the outflow of the liquid LQ is suppressed by reducing the size of the immersion space LS2.

  The size of the immersion space LS2 formed between the object B moving at the first speed V1 and the second member 22 is the same as that of the object B moving at the second speed V2 slower than the first speed V1. It may be larger than the size of the immersion space LS2 formed between the two members 22.

  Note that the moving condition of the object B may include the acceleration of the object B in the XY plane. The size of the immersion space LS2 formed between the object B moving at the first acceleration Ac1 and the second member 22 is the object B and the second member moving at the second acceleration Ac2 lower than the first acceleration Ac1. 22 may be smaller than the size of the immersion space LS2 formed between the two. When the object B moves at a high acceleration in the state where the immersion space LS2 is formed, a part of the liquid LQ in the immersion space LS2 moves away from the second space SP2 away from the immersion space LS2. May be suppressed. Therefore, when the object B moves at a high acceleration, the outflow of the liquid LQ is suppressed by reducing the size of the immersion space LS2.

  The size of the immersion space LS2 formed between the object B moving at the first acceleration Ac1 and the second member 22 is the same as that of the object B moving at the second acceleration Ac2 lower than the first acceleration Ac1. It may be larger than the size of the immersion space LS2 formed between the two members 22.

  The operation of changing one or both of the size and shape of the immersion space LS based on the moving condition of the object B may be performed during the exposure period or during the non-exposure period.

  As described above, according to the present embodiment, since one or both of the size and shape of the immersion space LS2 are changed, the outflow of the liquid LQ and the like are suppressed. Therefore, the occurrence of exposure failure and the occurrence of defective devices are suppressed.

  In the present embodiment, a first opening 421 and a second opening 422 that are different in size or shape are provided, and the recovery of the liquid LQ from one of the first opening 421 and the second opening 422 is possible. By substantially stopping and collecting the liquid LQ from the other of the first opening 421 and the second opening 422, one or both of the size and shape of the immersion space LS2 are changed. One or both of the size and shape of the immersion space LS2 may be changed by moving at least one of the first opening 421 and the second opening 422 in the Z-axis direction. For example, when forming the liquid immersion space LS2a of the first size, the control device 6 includes the first and the second so that the first opening 421 is disposed near the object B and the second opening 422 is separated from the object B. The two portions 221 and 222 may be moved. In that case, the suction operation of the second opening 422 may or may not be performed. Even when the suction operation of the second opening 422 is performed, the second opening 422 and the object B may be separated so that the liquid LQ on the object B is not collected by the second opening 422. Further, when forming the second-sized liquid immersion space LS2b, the control device 6 includes the first and the second so that the second opening 422 is disposed near the object B and the first opening 421 is separated from the object B. The two portions 221 and 222 may be moved. In that case, the suction operation of the first opening 421 may or may not be performed. Even when the suction operation of the first opening 421 is performed, the first opening 421 and the object B may be separated so that the liquid LQ on the object B is not collected in the first opening 421. Even when the first portion 221 having the first opening 421 is separated from the object B, the liquid LQ is supplied to the second space SP2 by disposing the supply port 41 on a member different from the first portion 221. Can do.

  In the present embodiment, the first portion 221 and the second portion 222 do not have to move relative to each other. The first portion 221 and the second portion 222 may be integrated.

Second Embodiment
Next, a second embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 13 shows an example of the second member 22B according to the present embodiment. The second member 22B includes a first portion 221 having a supply port 41 and a first opening 421, and a second portion 222B that can move relative to the first portion 221. The lower surface 242B of the second portion 222B has no opening. The second portion 222B is a pipe-like member disposed around the first portion 221. The second opening 422B is disposed between the outer edge of the lower surface 241 of the first portion 221 and the inner edge of the lower surface 242B of the second portion 222B. The first portion 221 and the second portion 222B are relatively movable in the Z-axis direction.

<Third Embodiment>
Next, a third embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 14 shows an example of the second member 22C according to the present embodiment. The second member 22C includes a first portion 221C having a supply port 41 and a first opening 421C, and a second portion 222C having a second opening 422C that is movable relative to the first portion 221C. The first opening 421C and the second opening 422C are different in size and shape. In the present embodiment, the first opening 421C is annular in the XY plane. The second opening 422C has a plurality of corners.

  FIG. 15A shows an example of the immersion space LS2c formed by the immersion member 22C. FIG. 15B shows an example of the immersion space LS2d formed by the immersion member 22C. The size of the immersion space LS2c is different from the size of the immersion space LS2d. The immersion space LS2d is larger than the immersion space LS2c. The shape of the immersion space LS2c is different from the shape of the immersion space LS2d. The immersion space LS2c is substantially circular. The immersion space LS2d is substantially polygonal (octagonal). The immersion space LS2c is formed by supplying the liquid LQ from the supply port 41, substantially stopping the recovery of the liquid LQ from the second opening 422C, and recovering the liquid LQ from the first opening 421C. . The immersion space LS2d is formed by supplying the liquid LQ from the supply port 41, substantially stopping the recovery of the liquid LQ from the first opening 421C, and recovering the liquid LQ from the second opening 422C. .

  The size and shape of the immersion space LS2 are determined based on the size and shape of the first opening (421, etc.) and the second opening (422, etc.).

  By supplying the liquid LQ from the supply port 41, substantially stopping the recovery of the liquid LQ from the second opening, and recovering the liquid LQ from the first opening, as shown in FIG. A polygonal (rectangular) immersion space LS2e can be formed. By supplying the liquid LQ from the supply port 41, substantially stopping the recovery of the liquid LQ from the first opening, and recovering the liquid LQ from the second opening, as shown in FIG. A circular immersion space LS2f can be formed. The immersion space LS2f is larger than the immersion space LS2e.

  Further, the liquid LQ is supplied from the supply port 41, the recovery of the liquid LQ from the second opening is substantially stopped, and the liquid LQ is recovered from the first opening, as shown in FIG. In addition, a polygonal (octagonal) immersion space LS2g can be formed. By supplying the liquid LQ from the supply port 41, substantially stopping the recovery of the liquid LQ from the first opening, and recovering the liquid LQ from the second opening, as shown in FIG. A polygonal (octagonal) immersion space LS2h can be formed. The immersion space LS2h is larger than the immersion space LS2g.

<Fourth embodiment>
Next, a fourth embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 18 shows an example of the second member 22D according to this embodiment. The second member 22D is provided in the supply port 41 that can supply the liquid LQ, the first opening 421D that can be collected at least around the supply port 41, and the supply port 41 and the first opening 421D. 2nd opening 422D which can be collected at least a part of the circumference of the 2 Possible third opening 423D.

  A plurality of first openings 421 </ b> D are discretely arranged around the supply port 41. The second opening 422D is annular. A plurality of third openings 423D are discretely arranged in the second opening 422D.

  Note that a plurality of the second openings 422D may be arranged discretely. At least one of the first opening 421D and the third opening 423D may be annular.

  The second member 22D may be divided into a first part having the first opening 421D, a second part having the second opening 422D, and a third part having the third opening 423D. The first, second, and third portions may be relatively movable. The first, second and third portions may be integrated.

  The liquid immersion member 22D can form a liquid immersion space LS2 having a first size, a second size, and a third size. By substantially stopping the recovery of the liquid LQ from the second and third openings 422D and 423D and recovering the liquid LQ from the first opening 421D, the liquid immersion space LS2 of the first size can be formed. . By substantially stopping the recovery of the liquid LQ from the first and third openings 421D and 423D and recovering the liquid LQ from the second opening 422D, it is possible to form the liquid immersion space LS2 having the second size. . By substantially stopping the recovery of the liquid LQ from the first and second openings 421D and 422D and recovering the liquid LQ from the third opening 423D, it is possible to form the liquid immersion space LS2 of the third size. .

  The liquid immersion member 22D can form not only the first, second, and third size immersion spaces LS2, but also the fourth size, the fifth size,..., The nth size immersion space LS2. is there. By providing the first opening, the second opening,..., The nth opening that are different from each other in the radial direction with respect to the supply port 41, it is possible to form the immersion spaces LS2 having different sizes.

<Fifth Embodiment>
Next, a fifth embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 19 shows an example of the second member 22E according to this embodiment. The second member 22E includes a supply port 41 that can supply the liquid LQ, and an opening 421E that is disposed at least at a part of the periphery of the supply port 41 and can collect the liquid LQ. A plurality of openings 421E are arranged around the supply port 41. In the example shown in FIG. 19, four openings 421E are arranged.

  The second member 22E includes a first portion 221E having a supply port 41 and a second portion 222E having an opening 421E. A plurality of (four) second portions 222E are arranged around the first portion 221E. In the present embodiment, one opening 421E is disposed in one second portion 222E. Note that two or more openings 421E may be disposed in one second portion 222E.

  The opening 421E is movable with respect to the supply port 41. In the present embodiment, the second portion 222E is movable with respect to the first portion 221E. By moving the second portion 222E, the opening 421E moves with respect to the supply port 41.

  FIG. 19A shows a state where the opening 421E (second portion 422E) is approaching the supply port 41 (first portion 421E). FIG. 19B shows a state where the opening 421E (second portion 422E) is separated from the supply port 41 (first portion 421E).

  FIG. 20A shows an example of the immersion space LS2j that can be formed by the second member 22E in the state shown in FIG. FIG. 20B shows an example of the immersion space LS2k that can be formed by the second member 22E in the state shown in FIG. The liquid immersion spaces LS2j and LS2k are formed by liquid supply from the supply port 41 and liquid recovery from the opening 421E. By moving the opening 421E, one or both of the size and shape of the immersion space LS2 (LS2j, LS2j) can be changed. The size of the immersion space LS2k is larger than the size of the immersion space LS2j. The shape of the immersion space LS2k may be different from or the same as the shape of the immersion space LS2j.

<Sixth Embodiment>
Next, a sixth embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 21 shows an example of the second member 22F according to the present embodiment. The second member 22F includes a supply port 41 that can supply the liquid LQ, and a plurality of openings 421F that are arranged at least at a part of the periphery of the supply port 41 and can collect the liquid LQ. In the XY plane, the plurality of openings 421F are arranged in a matrix.

  The control device 6 can select the opening 421F that substantially stops the recovery of the liquid LQ among the plurality of openings 421F. The control device 6 can select the opening 421F that performs recovery of the liquid LQ among the plurality of openings 421F.

  FIG. 22 shows an example of the size and shape of the immersion space LS2 formed by the second member 22F. The control device 6 defines an opening 421F that substantially stops the recovery of the liquid LQ and an opening 421F that executes the recovery of the liquid LQ among the plurality of openings 421F. As a result, the second member 22F has, for example, an immersion space LS2m, an immersion space LS2n, and an immersion space having a size and shape as shown in FIGS. 22 (A), 22 (B), and 22 (C). The space LS2p can be formed. For example, in the XY plane, the shapes of the immersion spaces LS2m and LS2n are substantially polygons (quadrangles). The immersion spaces LS2m and LS2n have sides that are substantially parallel to the X axis and sides that are parallel to the Y axis. The immersion space LS2m and the immersion space LS2n are similar, and the immersion space LS2n is larger than the immersion space LS2m. Further, in the XY plane, the shape of the immersion space LS2p is substantially a polygon (quadrangle). The immersion space LS2p has a side that intersects the X axis (Y axis).

  FIG. 22 shows an example of the immersion space LS2 in which the second member 22F can be formed. The control device 6 defines an opening 421F that substantially stops the recovery of the liquid LQ and an opening 421F that executes the recovery of the liquid LQ, among the plurality of openings 421F, so that immersion spaces of various sizes and shapes are formed. LS2 can be formed.

  FIG. 23 shows an example of the immersion space LS2. As described above, the recovery port (such as 42) is moved, or the recovery port (opening) that substantially stops the recovery of the liquid LQ among the plurality of recovery ports (openings) and the recovery for executing the recovery of the liquid LQ By setting the recovery port (opening) to be performed, as shown in FIG. 23 (A) to FIG. 23 (H), the second member (22 etc.) is immersed in various sizes and shapes of the immersion space LS2. Can be formed.

  As an example, the shape of the immersion space LS2 shown in FIG. 23A in the XY plane is an octagon. The shape of the immersion space LS2 shown in FIG. 23B in the XY plane is a hexagon. The shape of the immersion space LS2 shown in FIG. 23C in the XY plane is a rectangle that is long in the Y-axis direction. The shape of the immersion space LS2 shown in FIG. 23D in the XY plane is a rectangle that is long in the X-axis direction. The shape of the immersion space LS2 shown in FIG. 23E in the XY plane is a hexagon that is long in the Y-axis direction. The shape of the immersion space LS2 shown in FIG. 23F in the XY plane is an octagon that is long in the X-axis direction. The shape of the immersion space LS2 shown in FIG. 23G in the XY plane is an ellipse that is long in the Y-axis direction. The immersion space LS2 illustrated in FIG. 23H has corner portions that are sharp in the + X direction and the −X direction.

<Seventh embodiment>
Next, a seventh embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 24 shows an example of the operation of the exposure apparatus EX according to this embodiment. In the present embodiment, the second member 22 can hold the holding member DP in a releasable manner. The holding member DP has an upper surface 50 that can be opposed to the lower surface 23 of the first member 21. The upper surface 50 of the holding member DP can also face the lower surface 24 of the second member 22. The upper surface 50 facing the lower surface 23 also faces the lower surface 24. That is, the upper surface 50 can face both the lower surface 23 and the lower surface 24.

  The second member 22 can hold the holding member DP so as to be attracted to the lower surface 24 using, for example, the recovery port 42. With the lower surface 24 and the upper surface 50 being in contact with each other, the suction operation of the collection port 42 is performed, whereby the holding member DP is sucked and held on the lower surface 24. The holding member DP can be released from the lower surface 24 by releasing the suction operation of the recovery port 42. Note that the second member 22 may have a suction port different from the recovery port 42. You may hold | maintain so that holding member DP may be adsorbed using the suction port.

  In this embodiment, the 1st holding | maintenance part 14 can hold | maintain the holding member DP so that release is possible. In the present embodiment, the outer shape of the holding member DP is substantially equal to the outer shape of the substrate P. The holding member DP does not have a photosensitive film. The holding member DP is not formed with a pattern by irradiation with the exposure light EL. A device (device pattern) is not formed on the holding member DP. That is, a device cannot be manufactured from the holding member DP. Note that the outer shape of the holding member DP may be different from the outer shape of the substrate P.

  As shown in FIG. 24A, the holding member DP is moved to a position facing the first member 21 and the second member 22 by the substrate stage 2. The position of the substrate stage 2 is adjusted so that the upper surface 50 of the holding member DP held by the first holding unit 14 faces the lower surface 23 and the lower surface 24. As shown in FIG. 24A, an immersion space LS1 is formed between the first member 21 and the holding member DP held by the first holding portion 14.

  Before the substrate stage 2 (holding member DP2) is moved to a position facing the first member 21 and the second member 22, for example, the upper surface of the measurement stage 3 and the lower surface 23 of the first member 21 are facing each other. May be. For example, an immersion space LS1 may be formed between the measurement stage 3 and the first member 21. The state where the upper surface of the measurement stage 3 and the lower surface 23 of the first member 21 face each other may be changed to the state where the upper surface 50 of the holding member DP and the lower surface 23 of the first member 21 face each other. For example, in a period in which the upper surface 50 of the holding member DP and the lower surface 23 of the first member 21 are changed from a state in which the upper surface of the measurement stage 3 and the lower surface 23 of the first member 21 are opposed to each other by a scram moving operation. The immersion space LS1 may continue to be formed on the lower surface 23 side of the first member 21.

  As shown in FIG. 24B, the holding member DP is transferred from the first holding portion 14 to the second member 22. In a state where the immersion space LS1 is formed, the holding member DP is separated from the first holding unit 14 and is held by the second member 22. When the holding member DP is held by the second member 22, the immersion space LS2 is not formed. In the present embodiment, as shown in FIG. 24B, the holding member DP is moved so as to move away from the first holding unit 14 and approach the second member 22 by the moving mechanism 51 of the substrate stage 2. . Even in the period in which the holding member DP is passed from the first holding unit 14 to the second member 22, the immersion space LS1 continues to be formed.

  As illustrated in FIG. 24C, the immersion space LS <b> 1 can be formed between the holding member DP that is held using the second member 22 and the first member 21. The upper surface 50 of the holding member DP held by the second member 22 faces the lower surface 23 of the first member 21 via a gap. Even if the position of the second member 22 in the Z-axis direction is adjusted so that a gap is formed between the upper surface 50 of the holding member DP held by the second member 22 and the lower surface 23 of the first member 21. Good. In other words, the second member 22 may move such that the lower surface 24 is disposed on the lower side (−Z side) than the lower surface 23.

  The substrate stage 2 is movable below the holding member DP in a state in which the immersion space LS1 is formed between the holding member DP held using the second member 22 and the first member 21. . The measurement stage 3 is also movable below the holding member DP.

  In the present embodiment, for example, the maintenance of the substrate stage 2 is performed in a state where the immersion space LS1 is formed between the holding member DP held using the second member 22 and the first member 21. be able to. Of course, in a state where the immersion space LS1 is formed between the holding member DP held using the second member 22 and the first member 21, a member different from the substrate stage 2 such as the measurement stage 3 or the like. You can also perform maintenance. It is also possible to perform processing different from maintenance.

  The second member 22 can pass the holding member DP to the first holding unit 14. In a state where the moving mechanism 51 holds the lower surface of the holding member DP, the second member 22 releases the holding member DP. The moving mechanism 51 moves the holding member DP from the second member 22 to the first holding unit 14 so that the holding member DP is held by the first holding unit 14. Even during the period in which the holding member DP is passed from the second member 22 to the first holding unit 14, the immersion space LS1 is continuously formed.

  An immersion space LS <b> 1 is formed between the holding member DP held by the first holding unit 14 and the first member 21. Thereafter, the state in which the upper surface 50 of the holding member DP and the lower surface 23 of the first member 21 face each other may change to the state in which the upper surface of the measurement stage 3 and the lower surface 23 of the first member 21 face each other. For example, during a period in which the upper surface 50 of the holding member DP and the lower surface 23 of the first member 21 face each other and the upper surface of the measurement stage 3 and the lower surface 23 of the first member 21 face each other due to a scram moving operation. The immersion space LS1 may continue to be formed on the lower surface 23 side of the first member 21.

  As described above, the immersion space LS <b> 1 can be formed between the holding member DP held by the second member 22 and the first member 21. In addition, even when objects such as the substrate stage 2 and the measurement stage 3 do not face the first member 21, the immersion space LS <b> 1 can be continuously formed on the lower surface 23 side of the first member 21 by the holding member DP. Thereby, for example, after the process such as the maintenance of the substrate stage 2 is completed, the process (exposure process, measurement process, etc.) using the liquid LQ in the immersion space LS1 can be shifted in a short time.

<Eighth Embodiment>
Next, an eighth embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 25 shows an example of the operation of the exposure apparatus EX according to the present embodiment. In the present embodiment, a cover member CP that is movable below the second member 22 is provided.

  The cover member CP has an upper surface 52 that can face the lower surface 24 of the second member 22. The cover member CP is movable in the second space SP2. Further, the cover member CP is movable between the second space SP2 and a space outside the second space SP2. For example, in a state where the second member 22 and the substrate stage 2 (measurement stage 3, substrate P) face each other, the cover member CP is between the second member 22 and the substrate stage 2 (measurement stage 3, substrate P). Is movable. The cover member CP is movable so as not to contact the second member 22 and the substrate stage 2 (measurement stage 3, substrate P).

  In the present embodiment, the immersion space LS2 can be formed between the lower surface 24 of the second member 22 and the cover member CP.

  FIG. 25A shows a state in which an immersion space LS2 is formed between the second member 22 and the substrate stage 2. As shown in FIG. 25A, when the cover member CP is not disposed between the second member 22 and the substrate stage 2, it is between the upper surface of the substrate stage 2 and the lower surface 24 of the second member 22. A liquid immersion space LS2 is formed.

  FIG. 25B shows a state where the immersion space LS2 is formed between the second member 22 and the cover member CP. As shown in FIG. 25B, when the cover member CP is disposed between the second member 22 and the substrate stage 2, the space between the upper surface 52 of the cover member CP and the lower surface 24 of the second member 22. An immersion space LS2 is formed in

  The upper surface of the substrate stage 2 can be opposed to the lower surface 53 of the cover member CP via a gap. There is no liquid LQ between the lower surface 53 of the cover member CP and the upper surface of the substrate stage 2. The substrate stage 2 does not come into contact with the liquid LQ. The substrate stage 2 is movable below the cover member CP in a state where the immersion space LS2 is formed between the lower surface 24 of the second member 22 and the upper surface 52 of the cover member CP.

  As described with reference to FIG. 25, since the cover member CP is not disposed between the second member 22 and the substrate stage 2, the cover member CP is disposed between the second member 22 and the substrate stage 2. By changing to the arranged state, the liquid LQ in the immersion space LS2 changes from the state in contact with the substrate stage 2 to the state in which it does not contact.

  Further, the state changes from the state in which the cover member CP is disposed between the second member 22 and the substrate stage 2 to the state in which the cover member CP is not disposed between the second member 22 and the substrate stage 2. As a result, the liquid LQ in the immersion space LS2 changes from a state where it does not contact the substrate stage 2 to a state where it contacts.

  Here, the state in which the cover member CP is disposed between the second member 22 and the substrate stage 2 has been described. The same applies to the case where the cover member CP is disposed between the second member 22 and an object different from the substrate stage 2 (such as the measurement stage 3 and the substrate P).

  As described above, the immersion space LS2 can be formed between the cover member CP and the cover member CP. Even in the state where objects such as the substrate stage 2 and the measurement stage 3 do not face the second member 22, the liquid immersion space LS2 can be continuously formed on the lower surface 24 side of the second member 22 by the cover member CP.

  Note that the cover member CP may be releasably held by a third holding portion provided in the substrate stage 2. The immersion space LS2 formed on the lower surface 24 side of the second member 22 is movable between the upper surface of the substrate stage 2 and the upper surface 52 of the cover member CP held by the third holding unit. In a state where the immersion space LS2 is formed between the second member 22 and the cover member CP held by the third holding portion, the cover member CP is released from the third holding portion, and the second member 22 Since the immersion space LS2 is formed between the second member 22 and the substrate stage 2 by being held by the fourth holding portion provided in at least a part of the periphery, the immersion space LS2 is the second member. It changes to the state formed between 22 and the cover member CP hold | maintained at the 4th holding | maintenance part. The third holding unit may be provided on the measurement stage 3.

  The cover member CP may form an immersion space LS1 between the cover member CP and the first member 21. Note that an immersion space LS1 may be formed between the cap member and the first member 21 as disclosed in, for example, US Patent Application Publication No. 2005/0036121, or the cap member and the second member. An immersion space LS2 may be formed between the two. Further, the above-described fourth holding unit may include a gas supply port and a gas suction port provided in the second member 22. The cover member CP may be held on the second member 22 by a gas bearing formed between the second member 22 and the cover member CP by the operation of the gas supply port and the gas suction port.

<Ninth Embodiment>
Next, a ninth embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 26 is a view of the liquid immersion member 5H according to the present embodiment as viewed from the lower side (−Z side). In the present embodiment, four second members 22 are arranged in the space around the first member 21. In the present embodiment, the second member 221 is disposed on the + X side and the + Y side with respect to the center of the opening 20, the second member 222 is disposed on the −X side and the + Y side, and on the −X side. The second member 223 is disposed on the −Y side, and the second member 224 is disposed on the + X side and the −Y side. The immersion space LS2 can be formed below each of the four second members 22.

  In the following description, the second member 22 disposed on the + X side and the + Y side with respect to the center of the opening 20 is appropriately referred to as a second member 221, and is disposed on the −X side and the + Y side. The second member 22 is appropriately referred to as a second member 222, and the second member 22 disposed on the −X side and on the −Y side is appropriately referred to as a second member 223, and is on the + X side. The second member 22 disposed on the −Y side is appropriately referred to as a second member 224.

  Exposure light EL from the emission surface 12 is irradiated onto the projection region PR. The dimension of the projection region PR in the Y axis direction (scan direction) is larger than the dimension of the projection region PR in the X axis direction (non-scan direction). The lower surface 23 of the first member 21 includes a lower surface 23B that cannot collect the liquid LQ and a lower surface 37B that can collect the liquid LQ. The collection port 32 is disposed on the lower surface 37B.

  In the present embodiment, the outer shape of the lower surface 37B is substantially circular in the XY plane. The second members 221 and 222 are disposed on the + Y side with respect to the outer edge of the lower surface 37B. The second members 223 and 224 are disposed on the −Y side with respect to the outer edge of the lower surface 37B. The second members 221 and 224 are disposed on the + X side with respect to the optical path K (projection region PR) of the exposure light EL. The second members 222 and 223 are disposed on the −X side with respect to the optical path K (projection region PR) of the exposure light EL.

  In the present embodiment, the second member 22 relative to the first member 21 is arranged such that a part of the recovery port 42 of the second member 22 is disposed on a tangent line Lx passing through the outer edge of the lower surface 37B in the X-axis direction. A position is defined. In the present embodiment, a part of the recovery port 42 of the second member 22 is also disposed on the tangent line Ly that passes through the outer edge of the lower surface 37B in the Y-axis direction. The collection port 42 may not be arranged on the tangent line Ly.

   In the present embodiment, the dimension of the immersion space LS2 in the X axis direction is larger than the dimension of the shot region S in the X axis direction.

  In the present embodiment, the dimension of the immersion space LS2 with respect to the X-axis direction is larger than the dimension of the projection region PR with respect to the X-axis direction.

  In the present embodiment, the dimension of the immersion space LS2 in the X-axis direction is 26 mm or more.

  According to this embodiment, for example, even if the liquid LQ flows out from the first space SP1, the outflowed liquid LQ is captured by the liquid immersion space LS2 formed by at least one of the second members 221, 222, 223, and 224. Is done. For example, when the substrate P repeats the scan movement operation and the step movement operation in order to sequentially expose the plurality of shot regions S of the substrate P, the liquid LQ may flow out from the first space SP1. The substrate P moves in at least one of the + Y direction, the −Y direction, the + X direction, and the −X direction by the scan movement operation and the step movement operation. Based on the moving direction of the substrate P, the direction in which the liquid LQ in the first space SP1 flows out may be determined. According to the present embodiment, the second members 221, 222, 223, and 224 are arranged in the space around the first member 21. Therefore, the liquid LQ flowing out from the first space SP1 is captured by the immersion space LS2 formed by at least one of the second members 221, 222, 223, and 224.

<Tenth Embodiment>
Next, a tenth embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 27 shows an example of the substrate P held by the liquid immersion member 5K and the substrate stage 2 according to this embodiment. As shown in FIG. 27, a plurality of shot areas S are arranged on the substrate P. While the scan movement operation and the step movement operation are performed, the shot areas S on the substrate P are sequentially exposed with the exposure light EL.

  In the present embodiment, among the plurality of shot areas S, the first group SG1 of the −X side shot area S with respect to the substantial center of the substrate P in the X-axis direction is exposed, and then the + X side shot area S is exposed. The second group SG2 is exposed.

  In the present embodiment, the second member 22 is disposed on the −X side with respect to the first member 21 and is not disposed on the + X side. In the present embodiment, one second member 22 is arranged in the space around the first member 21. Two second members 22 may be disposed on the −X side with respect to the first member 21, or three or more members may be disposed.

  FIG. 28A is a schematic diagram illustrating an example of a state in which the shot region S of the first group SG1 is exposed.

  When the substrate P repeats the scan movement operation and the step movement operation, the liquid LQ may flow out from the first space SP1. In a state where the shot region S of the first group SG1 is exposed, the liquid LQ that has flowed out to the −X side with respect to the first space SP1 is disposed on the −X side with respect to the first member 21. It is captured by the immersion space LS2 formed by the member 22. The liquid LQ captured in the immersion space LS2 is recovered from the recovery port 42 of the second member 22 together with the liquid LQ in the immersion space LS2. Thereby, the liquid LQ is suppressed from remaining on the substrate P.

  In a state where the shot region S of the first group SG1 is exposed, the liquid LQ that has flowed out to the + X side with respect to the first space SP1 is captured by the immersion space LS1 formed by the first member 21. That is, the substrate P moves below the first member 21 so that the first member 21 (immersion space LS1) moves relative to the substrate P in the exposure of the plurality of shot regions S of the substrate P. Therefore, even if the liquid LQ flows out to the + X side with respect to the first space SP1, the liquid LQ is captured by the liquid immersion space LS1 formed by the first member 21. The liquid LQ captured in the immersion space LS1 is recovered from the recovery port 32 of the first member 21 together with the liquid LQ in the immersion space LS1. Thereby, the liquid LQ is suppressed from remaining on the substrate P.

  FIG. 28B is a schematic diagram illustrating an example of a state in which the shot region S of the second group SG2 is exposed.

  When the substrate P repeats the scan movement operation and the step movement operation, the liquid LQ may flow out from the first space SP1. In a state where the shot area S of the second group SG2 is exposed, the liquid LQ that has flowed out to the −X side with respect to the first space SP1 is disposed on the −X side with respect to the first member 21. It is captured by the immersion space LS2 formed by the member 22. The liquid LQ captured in the immersion space LS2 is recovered from the recovery port 42 of the second member 22 together with the liquid LQ in the immersion space LS2. Thereby, the liquid LQ is suppressed from remaining on the substrate P.

  In a state where the shot region S of the second group SG2 is exposed, a part of the liquid LQ that has flowed out to the + X side with respect to the first space SP1 is captured by the immersion space LS1 formed by the first member 21. The That is, the substrate P moves below the first member 21 so that the first member 21 (immersion space LS1) moves relative to the substrate P in the exposure of the plurality of shot regions S of the substrate P. Therefore, even if the liquid LQ flows out to the + X side with respect to the first space SP1, the liquid LQ is captured by the liquid immersion space LS1 formed by the first member 21. The liquid LQ captured in the immersion space LS1 is recovered from the recovery port 32 of the first member 21 together with the liquid LQ in the immersion space LS1.

  Further, among the plurality of shot regions S of the second group SG2, for example, in a state where the most + X side shot region S is exposed, the liquid LQ that has flowed out to the + X side with respect to the first space SP1 is the first There is a possibility that it is not captured by the immersion space LS1 formed by the member 21. As shown in FIG. 28B, the liquid LQ that has flowed out is likely to move to the outside of the substrate P. The liquid LQ that has flowed out is likely to be disposed on the cover member T1, for example. The liquid LQ that has flowed out onto the cover member T1 may be captured by the immersion space LS1, or may be captured by the immersion space LS2.

<Eleventh embodiment>
Next, an eleventh embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 29 is a diagram schematically illustrating an example of the liquid immersion member 5L according to the present embodiment. FIG. 29 is a view of the liquid immersion member 5L as viewed from below.

  In the present embodiment, the side surface of the first member 21L has a recess 21LU. At least a part of the second member 22 is disposed inside the recess 21LU.

  According to the present embodiment, the distance between the immersion space LS1 and the immersion space LS2 can be reduced in the XY plane.

  In the present embodiment, the concave portion 21LU is provided in the Y-axis direction (scanning direction) with respect to the optical axis of the terminal optical element 13. The concave portion 21LU may be provided in the X-axis direction (non-scanning direction) with respect to the optical axis of the last optical element 13.

  In the first to tenth embodiments described above, after exposure of the substrate P, a portion where the residual liquid exists on the object or a portion where the residual liquid may exist is located below the second member 22. The second member 22 and the object may be moved relative to each other so as to pass, and the remaining liquid on the object may be removed by the second member 22.

  In each of the above-described embodiments, at least two second members 22 are arranged around the first member 21, and the liquid contact region on the object that is in contact with the liquid LQ in the immersion space LS1 is one second. When passing below the member 221 and not passing below another second member 222, the liquid immersion space LS2 is formed so that the liquid LQ is in contact with the liquid contact region in one second member 221, and another second member 221 is formed. In the two members 222, the immersion space LS2 may not be formed. Alternatively, in another second member 22, the liquid LQ in the immersion space LS2 may be prevented from contacting the object.

  In the above-described embodiment, in the exposure of the substrate P, the upper surface of the object is not in contact with the liquid contact region that is in contact with one or both of the liquid LQ in the immersion space LS1 and the liquid LQ in the immersion space LS2. When the liquid region is included, after the substrate P is exposed, the liquid LQ existing in the non-wetted region on the object may be removed using the second member 22. That is, after the exposure of the substrate P, if there is residual liquid in the non-wetted area, the liquid LQ in the non-wetted area may be captured in the immersion space LS2 formed by the second member 22. Good. The removal of the liquid LQ using the second member 22 may be performed after the exposure of the substrate P and before the substrate P is unloaded from the substrate stage 2 (first holding unit 14).

<Twelfth embodiment>
Next, a twelfth embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 30 shows an example of the exposure apparatus EX according to the present embodiment. As shown in FIG. 30, in the exposure apparatus EX, the liquid immersion space LS2 is formed between the first object B1 and the second object B1 by passing the first object B1 and the second object B2 below the second member 22. An air supply device 60 that blows gas into the gap G from above the gap G after passing over the gap G is provided. This suppresses, for example, the occurrence of a phenomenon in which the liquid LQ remains in the gap G or a liquid LQ film is formed in the gap G (a so-called bridge phenomenon).

<13th Embodiment>
Next, a thirteenth embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 31 shows an example of the exposure apparatus EX according to the present embodiment. As shown in FIG. 31, the exposure apparatus EX includes a suction port 61 that is disposed outside the first member 21 with respect to the optical path K of the exposure light EL and that can suck the liquid LQ on the substrate P (object). Three members 62 are provided.

  In the present embodiment, the first member 21 and the second member 22 do not move substantially. One or both of the first member 21 and the second member 22 may move.

  The third member 62 is movable with respect to the first and second members 21 and 22. In the present embodiment, a driving device 63 capable of moving the third member 62 is provided. The suction port 61 is disposed on the lower surface of the third member 62 that can face the substrate P (object). The driving device 63 can move the third member 62 in the XY plane while the suction port 61 (the lower surface of the third member 62) of the third member 62 and the upper surface of the substrate P (object) are opposed to each other with a gap. It is. Note that the driving device 63 may move the third member 62 in six directions of the X axis, the Y axis, the Z axis, θX, θY, and θZ.

  FIG. 31 shows an example in which the third member 62 is disposed outside the first member 21 and the second member 22 with respect to the optical path K of the exposure light EL. When a plurality of the second members 22 are arranged in the space around the first member 21, the third member 62 may be arranged between the second members 22. The third member 62 may be disposed adjacent to the second member 22.

  The third member 62 does not form a liquid immersion space. A liquid immersion space is not formed in the third space below the third member 62.

  By providing the third member 62 having the suction port 61, for example, the liquid LQ flowing out of the first space SP1 is sucked from the suction port 61. The liquid LQ that has flowed out of the second space SP2 is also sucked from the suction port 61. Further, residual liquid on the substrate P (object) that could not be captured in the immersion space LS2 is also sucked from the suction port 61. Further, particles on the substrate P (object) are also sucked from the suction port 61. As a result, the occurrence of defective exposure and the occurrence of defective devices are suppressed.

  Note that a detection device 64 that detects the liquid LQ on the substrate P (object) outside the first space SP1 and the second space SP2 may be provided. The detection device 64 includes, for example, an imaging device (camera) that acquires an optical image (image) of the liquid LQ on the substrate P (object). The drive device 63 may move the third member 62 based on the detection result of the detection device 64. That is, when the liquid LQ on the substrate P (object) outside the first space SP1 and the second space SP2 is detected by the detection device 64, the third member is set so that the liquid LQ and the suction port 61 face each other. 62 may be moved.

  In the present embodiment, the third member 62 may be omitted. It should be noted that the residual liquid is generated on the substrate P (object) outside the first space SP1, or the relative movement condition between the first member 21 and the substrate P (object) from which the liquid LQ flows out of the first space SP1, and the residual The storage device 7 may store information related to the relative movement conditions in which the generation of liquid or the outflow of the liquid LQ from the first space SP1 is suppressed. Based on the stored information of the storage device 7, the relative movement condition between the first member 21 and the substrate P (object) in the exposure of the substrate P may be adjusted. Further, after the exposure of the substrate P, the detection device 64 may detect the residual liquid on the substrate P (object) or the liquid LQ flowing out of the first space SP1. Based on the detection result of the detection device 64, the storage information of the storage device 7 may be updated.

  The relative movement condition between the second member 22 where the residual liquid is generated on the substrate P (object) outside the second space SP2 or the liquid LQ flows out of the second space SP2 and the substrate P (object), and the residual The storage device 7 may store information relating to the relative movement conditions in which the generation of the liquid or the outflow of the liquid LQ from the second space SP2 is suppressed. Based on the storage information of the storage device 7, the relative movement condition between the second member 22 and the substrate P (object) in the exposure of the substrate P may be adjusted. Further, after the exposure of the substrate P, the detection device 64 may detect the residual liquid on the substrate P (object) or the liquid LQ flowing out of the second space SP2. Based on the detection result of the detection device 64, the storage information of the storage device 7 may be updated.

  The relative movement conditions between the first member 21 (second member 22) and the object are the relative movement speed and acceleration in the XY plane, the relative movement distance in one direction in the XY plane, and the XY plane. This is a concept including at least one of the relative movement trajectories in. Further, when a plurality of shot areas of the substrate P are sequentially exposed while the substrate P is repeatedly moved in the scanning direction and in the step direction intersecting the scanning direction, the relative movement condition is the movement in the scanning direction. It is a concept that includes the combined speed of the speed and the moving speed in the step direction.

  The storage device 7 may store the positional relationship between the second member 22 and the object in the Z-axis direction, in which the residual liquid on the object can be captured by the second member 22. In the exposure of the substrate P, the position of the second member 22 in the Z-axis direction may be adjusted based on the storage information in the storage device 7 and the position of the object measured by the measurement system 4.

<Fourteenth embodiment>
Next, a fourteenth embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 32 shows an example of the exposure apparatus EX according to the present embodiment. As shown in FIG. 32, the exposure apparatus EX has an air supply port 65 for supplying gas, which is provided on one or both side surfaces of the first object B1 and the second object B2 that are movable below the second member 22. It has. The side surface of the first object B1 faces the side surface of the second object B2. In the example shown in FIG. 32, the air supply port 65 is disposed on the side surface of the first object B1. The air supply port 65 may be disposed on the side surface of the second object B2, or may be disposed on both the side surface of the first object B1 and the side surface of the second object B2.

  In the present embodiment, the first and second objects B1 and B2 are moved below the second member 22 so that the immersion space LS2 passes over the gap G between the first object B1 and the second object B2. During at least part of the period, gas is supplied from the air supply port 65. As a result, for example, the liquid LQ in the liquid immersion space LS2 enters the gap G, the liquid LQ remains in the gap G, or the liquid LQ film is formed in the gap G (so-called bridge phenomenon). Is suppressed.

  As shown in FIG. 32, a suction port 66 for sucking the fluid in the lower space US of the gap G may be provided. By sucking the fluid (one or both of the liquid LQ and gas) from the suction port 66, the occurrence of the liquid LQ remaining in the gap G is suppressed.

  In each of the above-described embodiments, for example, as illustrated in FIG. 33, an injection device 67 that blows gas to at least a part of the space around the immersion space LS2 may be provided. Thereby, the liquid LQ in the immersion space LS2 is suppressed from flowing out from the second space SP2.

  In each of the above-described embodiments, for example, as shown in FIG. 34, a magnetic force generator 68 that generates a magnetic force around the immersion space LS2 may be provided. Thereby, the liquid LQ in the immersion space LS2 is suppressed from flowing out from the second space SP2.

  In each of the above-described embodiments, the liquid LQ for forming the immersion space LS1 and the liquid LQ for forming the immersion space LS2 may be the same type (physical properties) or different types (physical properties). But you can.

  In each of the embodiments described above, the viscosity of the liquid LQ that forms the immersion space LS2 may be higher than the viscosity of the liquid LQ that forms the immersion space LS1. Thereby, even if the object B moves while the immersion space LS2 is formed between the second member 22 and the object B, the outflow of the liquid LQ from the second space SP2 is suppressed.

  In each of the above-described embodiments, the dissolved gas concentration of the liquid LQ that forms the immersion space LS2 may be higher than the dissolved gas concentration of the liquid LQ that forms the immersion space LS1. This also suppresses the outflow of the liquid LQ from the second space SP2.

  In each of the above-described embodiments, the exposure apparatus EX is rotatably arranged on the lower surface 23 of the first member 21, and the object B moves in a state where the immersion space LS1 is formed. You may provide the baffle member from which a position changes based on a moving direction. The rectifying member can adjust the outflow direction of the liquid LQ flowing out of the first space SP1 from the first space SP1. A liquid immersion space LS2 may be formed by the second member 22 in front of the outflow direction of the liquid LQ.

  In the present embodiment, the liquid LQ for forming the immersion space LS1 and the liquid LQ for forming the immersion space LS2 may have the same or different cleanliness.

  As described above, the control device 6 includes a computer system including a CPU and the like. The control device 6 includes an interface capable of executing communication between the computer system and an external device. The storage device 7 includes a memory such as a RAM, and a recording medium such as a hard disk and a CD-ROM. The storage device 7 is installed with an operating system (OS) that controls the computer system, and stores a program for controlling the exposure apparatus EX.

  Note that an input device capable of inputting an input signal may be connected to the control device 6. The input device includes an input device such as a keyboard and a mouse, or a communication device that can input data from an external device. Further, a display device such as a liquid crystal display may be provided.

  Various information including programs recorded in the storage device 7 can be read by the control device (computer system) 6. In the storage device 7, a liquid that exposes the substrate with the exposure light to the control device 6 through the first liquid filled in the optical path of the exposure light between the emission surface of the optical member from which the exposure light is emitted and the substrate. A program for executing control of the immersion exposure apparatus is recorded.

  The program recorded in the storage device 7 is a first member arranged in at least a part of the periphery of the optical path of the exposure light emitted from the exit surface of the optical member according to the above-described embodiment. Forming a first immersion space for one liquid, supplying a liquid from a second supply port of a second member disposed outside the first member with respect to the optical path, and a first opening of the second recovery port; The second liquid of the second liquid is separated from the first immersion space by substantially stopping the liquid recovery from one of the second openings and recovering the liquid from the other of the first opening and the second opening. Forming an immersion space.

  When the program stored in the storage device 7 is read into the control device 6, various devices of the exposure apparatus EX such as the substrate stage 2, the measurement stage 3, and the liquid immersion member 5 cooperate to form a liquid immersion space. In the state where is formed, various processes such as immersion exposure of the substrate P are executed.

  In each of the above-described embodiments, the optical path K on the exit surface 12 side (image surface side) of the terminal optical element 13 of the projection optical system PL is filled with the liquid LQ. As disclosed in Japanese Patent Publication No. 2004/019128, the optical path on the incident side (object surface side) of the last optical element 13 may be a projection optical system filled with the liquid LQ.

  In each of the above-described embodiments, the liquid LQ is water, but a liquid other than water may be used. The liquid LQ is transmissive to the exposure light EL, has a high refractive index with respect to the exposure light EL, and forms a film such as a photosensitive material (photoresist) that forms the surface of the projection optical system PL or the substrate P. A stable material is preferred. For example, the liquid LQ may be a fluorinated liquid such as hydrofluoroether (HFE), perfluorinated polyether (PFPE), or fomblin oil. Further, the liquid LQ may be various fluids such as a supercritical fluid.

  In each of the above-described embodiments, the substrate P includes a semiconductor wafer for manufacturing a semiconductor device. For example, the substrate P is used in a glass substrate for a display device, a ceramic wafer for a thin film magnetic head, or an exposure apparatus. A mask or reticle master (synthetic quartz, silicon wafer) or the like may also be included.

  In each of the above-described embodiments, the exposure apparatus EX is a step-and-scan type scanning exposure apparatus (scanning stepper) that scans and exposes the pattern of the mask M by moving the mask M and the substrate P synchronously. However, for example, a step-and-repeat projection exposure apparatus (stepper) that performs batch exposure of the pattern of the mask M while the mask M and the substrate P are stationary and sequentially moves the substrate P stepwise may be used.

  In addition, the exposure apparatus EX transfers a reduced image of the first pattern onto the substrate P using the projection optical system while the first pattern and the substrate P are substantially stationary in the step-and-repeat exposure. Thereafter, with the second pattern and the substrate P substantially stationary, an exposure apparatus (stitch method) that collectively exposes a reduced image of the second pattern on the substrate P by partially overlapping the first pattern using a projection optical system. (Batch exposure apparatus). Further, the stitch type exposure apparatus may be a step-and-stitch type exposure apparatus in which at least two patterns are partially overlapped and transferred on the substrate P, and the substrate P is sequentially moved.

  Further, the exposure apparatus EX combines two mask patterns as disclosed in, for example, US Pat. No. 6,611,316 on the substrate via the projection optical system, and 1 on the substrate by one scanning exposure. An exposure apparatus that double-exposes two shot areas almost simultaneously may be used. Further, the exposure apparatus EX may be a proximity type exposure apparatus, a mirror projection aligner, or the like.

  In each of the embodiments described above, the exposure apparatus EX is a twin stage type having a plurality of substrate stages as disclosed in US Pat. No. 6,341,007, US Pat. No. 6,208,407, US Pat. No. 6,262,796 and the like. The exposure apparatus may be used. For example, as shown in FIG. 35, when the exposure apparatus EX includes two substrate stages 2001 and 2002, an object that can be arranged to face the emission surface 12 is one substrate stage and one substrate stage. At least one of the substrate held by the first holding unit, the other substrate stage, and the substrate held by the first holding unit of the other substrate stage.

  The exposure apparatus EX may be an exposure apparatus that includes a plurality of substrate stages and measurement stages.

  The exposure apparatus EX may be an exposure apparatus for manufacturing a semiconductor element that exposes a semiconductor element pattern on the substrate P, an exposure apparatus for manufacturing a liquid crystal display element or a display, a thin film magnetic head, an imaging element ( CCD), micromachine, MEMS, DNA chip, or an exposure apparatus for manufacturing a reticle or mask.

In the above-described embodiment, a light-transmitting mask in which a predetermined light-shielding pattern (or phase pattern / dimming pattern) is formed on a light-transmitting substrate is used. A variable shaped mask (also called an electronic mask, an active mask, or an image generator) that forms a transmission pattern, a reflection pattern, or a light emission pattern based on electronic data of a pattern to be exposed, as disclosed in No. 6778257 It may be used. Further, a pattern forming apparatus including a self-luminous image display element may be provided instead of the variable molding mask including the non-luminous image display element.

  In each of the above embodiments, the exposure apparatus EX includes the projection optical system PL. However, the components described in the above embodiments are applied to an exposure apparatus and an exposure method that do not use the projection optical system PL. May be. For example, an exposure apparatus and an exposure method for forming an immersion space between an optical member such as a lens and a substrate and irradiating the substrate with exposure light via the optical member are described in the above embodiments. Elements may be applied.

  The exposure apparatus EX exposes a line and space pattern on the substrate P by forming interference fringes on the substrate P as disclosed in, for example, International Publication No. 2001/035168. A lithography system).

  The exposure apparatus EX of the above-described embodiment is manufactured by assembling various subsystems including the above-described components so as to maintain predetermined mechanical accuracy, electrical accuracy, and optical accuracy. In order to ensure these various accuracies, before and after assembly, various optical systems are adjusted to achieve optical accuracy, various mechanical systems are adjusted to achieve mechanical accuracy, and various electrical systems are Adjustments are made to achieve electrical accuracy. The assembly process from the various subsystems to the exposure apparatus includes mechanical connection, electrical circuit wiring connection, pneumatic circuit piping connection and the like between the various subsystems. Needless to say, there is an assembly process for each subsystem before the assembly process from the various subsystems to the exposure apparatus. After the assembly process of the various subsystems to the exposure apparatus is completed, comprehensive adjustment is performed to ensure various accuracies as the entire exposure apparatus. The exposure apparatus is preferably manufactured in a clean room where the temperature, cleanliness, etc. are controlled.

  As shown in FIG. 36, a microdevice such as a semiconductor device includes a step 201 for designing a function / performance of the microdevice, a step 202 for producing a mask (reticle) based on the design step, and a substrate which is a base material of the device. Substrate processing step 204, including substrate processing (exposure processing) including exposing the substrate with exposure light from the pattern of the mask and developing the exposed substrate according to the above-described embodiment, It is manufactured through a device assembly step (including processing processes such as a dicing process, a bonding process, and a packaging process) 205, an inspection step 206, and the like.

  Note that the requirements of the above-described embodiments can be combined as appropriate. Some components may not be used. In addition, as long as permitted by law, the disclosure of all published publications and US patents related to the exposure apparatus and the like cited in the above embodiments and modifications are incorporated herein by reference.

  DESCRIPTION OF SYMBOLS 2 ... Substrate stage, 3 ... Measurement stage, 5 ... Liquid immersion member, 6 ... Control apparatus, 7 ... Memory | storage device, 12 ... Ejection surface, 13 ... Terminal optical element, 21 ... 1st member, 22 ... 2nd member, EL ... exposure light, EX ... exposure device, IL ... illumination system, K ... optical path, LQ ... liquid, LS1 ... immersion space, LS2 ... immersion space, P ... substrate, S ... shot region, SP1 ... first space, SP2 ... second space.

Claims (52)

An exposure apparatus that exposes a substrate with exposure light through a first liquid in a first immersion space,
An optical member having an exit surface from which the exposure light is emitted;
A first member that is disposed at least in part around the optical path of the exposure light and that forms the first immersion space of the first liquid;
An exposure apparatus comprising: a second member that is disposed outside the first member with respect to the optical path, and is capable of forming a second immersion space for the second liquid away from the first immersion space. The second member has a second supply port for supplying the second liquid, and a second recovery port for recovering at least a part of the second liquid,
The second immersion space is formed by the liquid supply from the second supply port and the liquid recovery from the second recovery port,
The second recovery port has a first opening and a second opening,
Substantially stopping the recovery of the second liquid from one of the first opening and the second opening, and recovering the second liquid from the other of the first opening and the second opening, The exposure apparatus according to claim 1, wherein the second immersion space can be formed. The first opening is disposed in at least a part of the periphery of the second supply port,
The exposure apparatus according to claim 2, wherein the second opening is disposed outside the first opening with respect to the second supply port.   The exposure apparatus according to claim 2, wherein the first opening is disposed so as to surround the second supply port.   The exposure apparatus according to claim 2, wherein the second opening is disposed so as to surround the second supply port and the first opening. The second member includes a first portion in which the first opening is disposed, and a second portion in which the second opening is disposed,
The exposure apparatus according to claim 2, wherein the first part and the second part are relatively movable.   The height of the second portion when the second liquid is recovered from the first opening and the recovery of the second liquid from the second opening is substantially stopped is the first opening. The exposure apparatus according to claim 6, wherein recovery of the second liquid from the second portion is substantially stopped and the height of the second portion when the recovery of the second liquid is performed from the second opening is higher.   The second immersion space formed in a first state in which the recovery of the second liquid from the first opening is performed and the recovery of the second liquid from the second opening is substantially stopped; What is the second immersion space formed in the second state in which the recovery of the second liquid is performed from the second opening and the recovery of the second liquid from the first opening is substantially stopped The exposure apparatus according to claim 2, wherein one or both of a size and a shape are different. The second member has a second supply port for supplying the second liquid, and a second recovery port for recovering at least a part of the second liquid,
The second immersion space is formed by the liquid supply from the second supply port and the liquid recovery from the second recovery port,
The exposure apparatus according to claim 1, wherein the second recovery port is movable with respect to the second supply port.   The exposure apparatus according to claim 9, wherein one or both of the size and shape of the second immersion space can be changed by moving the second recovery port.   The exposure apparatus according to claim 1, wherein the second member can change one or both of a size and a shape of the second immersion space.   11. The size and / or shape of the second immersion space differ between an exposure period in which the substrate is exposed to exposure light and a non-exposure period in which the substrate is not irradiated with exposure light. The exposure apparatus according to any one of 11 and 11.   The exposure apparatus according to claim 12, wherein the non-exposure period includes a maintenance period.   The exposure apparatus according to claim 13, wherein residual liquid on the object is captured in the second immersion space during the maintenance period.   The exposure apparatus according to claim 13 or 14, wherein the second immersion space formed during the maintenance period is larger than the second immersion space formed during the non-exposure period.   The second immersion space formed between the second member and a predetermined region, and the second immersion space formed between the second member and a region outside the predetermined region are: The exposure apparatus according to any one of claims 12 to 15, wherein one or both of a size and a shape are different.   The exposure apparatus according to claim 16, wherein the predetermined area includes a gap between the first object and the second object.   The exposure apparatus according to claim 16 or 17, wherein the predetermined area is more lyophilic with respect to the second liquid than an area outside the predetermined area.   The size of the second immersion space formed between the second member and the predetermined region is the second immersion space formed between the second member and a region outside the predetermined region. The exposure apparatus according to claim 18, which is smaller than the size of the exposure apparatus.   The second immersion space formed between the object moving under the first movement condition and the second member; the object moving under a second movement condition different from the first movement condition; and the second member The exposure apparatus according to any one of claims 12 to 19, wherein one or both of a size and a shape is different from the second immersion space formed between the two. The moving condition includes speed,
The size of the second immersion space formed between the object moving at the first speed and the second member is such that the object moving at the second speed slower than the first speed and the second member 21. The exposure apparatus according to claim 20, wherein the exposure apparatus is smaller than the second immersion space formed between the two. A shot area on the substrate is exposed with the exposure light while the substrate is moved in a first direction within a predetermined plane substantially parallel to the emission surface,
The first member has a first recovery part capable of recovering the liquid in the first space below the first member;
The second member has a second recovery part capable of recovering the liquid in the second space below the second member;
The part with respect to the first member is arranged such that a part of the second recovery part is disposed on a tangent line passing through an outer edge of the first recovery part in a second direction orthogonal to the first direction within the predetermined plane. The exposure apparatus according to claim 1, wherein a position of the second member is determined.   23. The exposure apparatus according to claim 22, wherein a dimension of the second immersion space with respect to the second direction is larger than a dimension of the shot region with respect to the second direction. The exposure area is irradiated with the exposure light from the emission surface,
The exposure apparatus according to claim 22 or 23, wherein a dimension of the second immersion space with respect to the second direction is larger than a dimension of the irradiation region with respect to the second direction.   The exposure apparatus according to any one of claims 22 to 24, wherein a dimension of the second immersion space in the second direction is 26 mm or more.   The second member is disposed on each of one side and the other side of the first direction with respect to the outer edge, and on each of the one side and the other side of the second direction with respect to the optical path of the exposure light. The exposure apparatus according to any one of claims 22 to 25, which is arranged. A plurality of shot areas are disposed on the substrate,
The shot area on the substrate is sequentially exposed with the exposure light while the substrate is moved in a first direction in a predetermined plane substantially parallel to the emission surface,
Among a plurality of shot areas, a group of shot areas on one side with respect to the center of the substrate in a second direction orthogonal to the first direction within the predetermined plane is exposed, and then a group of shot areas on the other side Is exposed,
The first member has a first recovery part capable of recovering the liquid in the first space below the first member;
The second member has a second recovery part capable of recovering the liquid in the second space below the second member;
2. The exposure apparatus according to claim 1, wherein the second member is disposed on one side with respect to the first member in the second direction and is not disposed on the other side. The second member can releasably hold a holding member having an upper surface that can be opposed to the lower surface of the first member,
28. The exposure apparatus according to claim 1, wherein the first immersion space can be formed between the holding member and the first member that are held using the second member.   The exposure apparatus according to claim 28, wherein the first immersion space can be formed between the first member and the holding member.   The state changes from one of the first state in which the upper surface of the object different from the holding member and the lower surface of the first member face each other, and the second state in which the upper surface of the holding member and the lower surface of the first member face each other. 30. The exposure apparatus according to claim 28 or 29, wherein the first immersion space continues to be formed on the lower surface side of the first member during the period. A cover member having an upper surface capable of facing the lower surface of the second member;
31. The exposure apparatus according to any one of claims 1 to 30, wherein the second immersion space can be formed between a lower surface of the second member and the cover member. A substrate stage for holding the substrate;
32. The substrate stage is movable below the cover member in a state where the second immersion space is formed between the lower surface of the second member and the upper surface of the cover member. Exposure equipment. When the cover member is disposed between the second member and the object, the second immersion space can be formed between the upper surface of the cover member and the lower surface of the second member;
32. The second immersion space can be formed between the upper surface of the object and the lower surface of the second member when the cover member is not disposed between the second member and the object. Or the exposure apparatus according to 32.   By changing from one of the state in which the cover member is disposed between the second member and the object and the state in which the cover member is not disposed between the second member and the object to the other, 34. The exposure apparatus according to claim 33, wherein the second liquid in the second immersion space changes from one of a state in which the second liquid is not in contact with the object and a state in contact with the object to the other.   The exposure apparatus according to any one of claims 1 to 34, further comprising a third member disposed outside the first member with respect to the optical path and having a suction port capable of sucking the liquid on the object.   36. The exposure apparatus according to claim 35, wherein the third member is movable with respect to the first and second members.   37. The exposure apparatus according to claim 35 or 36, further comprising a driving device capable of moving the third member. A detection device for detecting liquid on the object;
38. The exposure apparatus according to claim 37, wherein the driving device moves the third member based on a detection result of the detection device.   The exposure apparatus according to any one of claims 35 to 38, wherein the first member and the second member do not substantially move. The side surface of the first member has a recess,
The exposure apparatus according to any one of claims 1 to 39, wherein at least a part of the second member is disposed inside the recess. The substrate is exposed while being moved in a first direction in a plane substantially parallel to the first lower surface;
41. The exposure apparatus according to claim 40, wherein the recess is provided in the first direction with respect to the optical axis of the optical member.   The exposure apparatus according to any one of claims 1 to 41, wherein the viscosity of the second liquid forming the second immersion space is higher than the viscosity of the first liquid forming the first immersion space. .   43. The dissolved gas concentration of the second liquid that forms the second immersion space is higher than the dissolved gas concentration of the first liquid that forms the first immersion space. The exposure apparatus described.   By passing the first object and the second object below the second member, the second immersion space passes over the gap between the first object and the second object, and then the upper part of the gap. The exposure apparatus according to any one of claims 1 to 43, further comprising an air supply device that blows gas into the gap. An air supply port for supplying gas, provided on one or both side surfaces of the first object and the second object movable below the second member;
In at least a part of a period during which the first and second objects are moved below the second member so that the second immersion space passes over the gap between the first object and the second object. The exposure apparatus according to claim 1, wherein a gas is supplied from the air supply port.   The exposure apparatus according to claim 45, further comprising a suction port for sucking fluid in a space below the gap. At least two of the second members are disposed around the first member,
When the liquid contact region of the object that has contacted the first liquid in the first liquid immersion space passes below one second member and does not pass below another second member,
A second immersion space is formed so that the second liquid is in contact with the liquid contact area in the one second member, and the second immersion space is not formed in the other second member, or 47. The exposure apparatus according to claim 1, wherein the second liquid in the second immersion space does not contact the object in another second member.   After the exposure of the substrate, the second member and the object are arranged such that a portion where the residual liquid exists on the object or a portion where the residual liquid may exist passes below the second member. The exposure apparatus according to any one of claims 1 to 47, wherein the residual liquid on the object is removed by the second member. The first member has a first supply port for supplying the first liquid, and a first recovery port for recovering at least a part of the first liquid,
49. The exposure apparatus according to any one of claims 1 to 48, wherein the first immersion space is formed by liquid supply from the first supply port and liquid recovery from the first recovery port. Exposing the substrate using the exposure apparatus according to any one of claims 1 to 49;
Developing the exposed substrate. A device manufacturing method. An exposure method for exposing a substrate with exposure light through a first liquid in a first immersion space,
Forming the first liquid immersion space of the first liquid with a first member arranged at least part of the periphery of the optical path of the exposure light emitted from the emission surface of the optical member;
Liquid is supplied from the second supply port of the second member disposed outside the first member with respect to the optical path, and liquid recovery from one of the first opening and the second opening of the second recovery port is substantially performed. And the second liquid immersion space of the second liquid is formed away from the first liquid immersion space by performing liquid recovery from the other of the first opening and the second opening. Including an exposure method. Exposing the substrate using the exposure apparatus of claim 51;
Developing the exposed substrate. A device manufacturing method.

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