JP2013544670A5 - - Google Patents
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- Publication number
- JP2013544670A5 JP2013544670A5 JP2013532811A JP2013532811A JP2013544670A5 JP 2013544670 A5 JP2013544670 A5 JP 2013544670A5 JP 2013532811 A JP2013532811 A JP 2013532811A JP 2013532811 A JP2013532811 A JP 2013532811A JP 2013544670 A5 JP2013544670 A5 JP 2013544670A5
- Authority
- JP
- Japan
- Prior art keywords
- light energy
- article
- silica nanoparticles
- structured surface
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 16
- 230000003667 anti-reflective effect Effects 0.000 claims description 11
- 239000011248 coating agent Substances 0.000 claims description 9
- 238000000576 coating method Methods 0.000 claims description 9
- 239000002105 nanoparticle Substances 0.000 claims description 9
- 239000000377 silicon dioxide Substances 0.000 claims description 8
- 239000000758 substrate Substances 0.000 claims description 5
- 239000006096 absorbing agent Substances 0.000 claims description 4
- 238000010521 absorption reaction Methods 0.000 claims 1
- 230000002378 acidificating effect Effects 0.000 claims 1
- 229920006037 cross link polymer Polymers 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000004075 alteration Effects 0.000 description 1
- 230000002902 bimodal effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US39052410P | 2010-10-06 | 2010-10-06 | |
| US61/390,524 | 2010-10-06 | ||
| PCT/US2011/049854 WO2012047422A1 (en) | 2010-10-06 | 2011-08-31 | Anti-reflective articles with nanosilica-based coatings |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2013544670A JP2013544670A (ja) | 2013-12-19 |
| JP2013544670A5 true JP2013544670A5 (enExample) | 2014-09-25 |
| JP5869581B2 JP5869581B2 (ja) | 2016-02-24 |
Family
ID=44675818
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013532811A Expired - Fee Related JP5869581B2 (ja) | 2010-10-06 | 2011-08-31 | ナノシリカ系コーティングを有する反射防止物品 |
Country Status (7)
| Country | Link |
|---|---|
| US (3) | US20130186466A1 (enExample) |
| EP (1) | EP2625313B1 (enExample) |
| JP (1) | JP5869581B2 (enExample) |
| KR (3) | KR102115937B1 (enExample) |
| CN (1) | CN103154320B (enExample) |
| BR (1) | BR112013008304A2 (enExample) |
| WO (1) | WO2012047422A1 (enExample) |
Families Citing this family (46)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9353268B2 (en) | 2009-04-30 | 2016-05-31 | Enki Technology, Inc. | Anti-reflective and anti-soiling coatings for self-cleaning properties |
| US9376593B2 (en) | 2009-04-30 | 2016-06-28 | Enki Technology, Inc. | Multi-layer coatings |
| EP2563865B1 (en) | 2010-04-28 | 2016-06-01 | 3M Innovative Properties Company | Articles including nanosilica-based primers for polymer coatings and methods |
| KR20130073898A (ko) | 2010-04-28 | 2013-07-03 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 실리콘-기반 물질 |
| EP2625314A1 (en) | 2010-10-06 | 2013-08-14 | 3M Innovative Properties Company | Anti-reflective articles with nanosilica-based coatings and barrier layer |
| TW201333393A (zh) * | 2012-02-13 | 2013-08-16 | Ind Tech Res Inst | 光熱轉換集能裝置及其系統 |
| EP2674449A1 (en) * | 2012-06-11 | 2013-12-18 | 3M Innovative Properties Company | Nanosilica coating assembly with enhanced durability |
| EP2698212B1 (en) * | 2012-08-17 | 2017-10-11 | Rohm and Haas Company | Substrate marking system |
| CN102998723B (zh) * | 2012-11-29 | 2016-03-16 | 法国圣戈班玻璃公司 | 减反光学组件及制造方法 |
| US11121267B2 (en) | 2013-03-01 | 2021-09-14 | Board Of Trustees Of The University Of Arkansas | Antireflective coating for glass applications and method of forming same |
| US10040953B2 (en) | 2013-05-30 | 2018-08-07 | 3M Innovative Properties Company | Poly(vinyl alcohol) and silica nanoparticle multilayer coatings and methods |
| EP3004259A1 (en) | 2013-05-30 | 2016-04-13 | 3M Innovative Properties Company | Poly(vinyl alcohol)-containing and silica nanoparticle multilayer coatings and methods |
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| CN105322433B (zh) * | 2014-05-28 | 2020-02-04 | 深圳光峰科技股份有限公司 | 波长转换装置及其相关发光装置 |
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| US9598586B2 (en) | 2014-07-14 | 2017-03-21 | Enki Technology, Inc. | Coating materials and methods for enhanced reliability |
| US9376589B2 (en) | 2014-07-14 | 2016-06-28 | Enki Technology, Inc. | High gain durable anti-reflective coating with oblate voids |
| EP3172260B1 (en) * | 2014-07-14 | 2022-01-26 | First Solar, Inc | High gain durable anti-reflective coating |
| KR102293731B1 (ko) | 2014-10-16 | 2021-08-27 | 삼성디스플레이 주식회사 | 표시 장치용 윈도우 및 이를 포함하는 표시 장치 |
| JP2016087561A (ja) * | 2014-11-06 | 2016-05-23 | 富士フイルム株式会社 | 水性塗布液、膜及びその製造方法、積層体、並びに太陽電池モジュール |
| CN105514188B (zh) * | 2015-12-25 | 2017-10-03 | 中国科学院上海高等研究院 | 一种减反射自清洁薄膜及其制备方法 |
| JP6892740B2 (ja) * | 2016-04-22 | 2021-06-23 | パンサーフェス株式会社 | 親水性付与剤、親水性被膜形成方法、親水性被膜、及び太陽光パネル |
| US10814287B2 (en) | 2016-05-13 | 2020-10-27 | 3M Innovative Properties Company | Multilayer articles including coatings on microfiltration membrane substrates and methods of making same |
| DE102016225813A1 (de) * | 2016-12-13 | 2018-06-14 | Continental Automotive Gmbh | Verfahren zum Herstellen eines durchleuchtbaren dreidimensionalen Kraftfahrzeuginnenraumelements und Kraftfahrzeuginnenraumelement |
| US11135554B2 (en) | 2017-03-15 | 2021-10-05 | 3M Innovative Properties Company | Multilayer articles including coatings containing metal on microfiltration membrane substrates |
| GB201709562D0 (en) * | 2017-06-15 | 2017-08-02 | Grafmarine | Power distrubution and cell storage apparatus |
| CN107170852A (zh) * | 2017-06-27 | 2017-09-15 | 深圳市上古光电有限公司 | 一种轻型太阳能组件及其制造方法 |
| WO2019160093A1 (ja) * | 2018-02-15 | 2019-08-22 | 国立大学法人大阪大学 | コアシェル型半導体ナノ粒子、その製造方法および発光デバイス |
| US11940636B2 (en) * | 2018-06-15 | 2024-03-26 | Lg Chem, Ltd. | Decoration member |
| US11584856B2 (en) | 2018-06-20 | 2023-02-21 | Saint-Gobain Performance Plastics Corporation | Composite film with anti-reflective coating |
| CN113302170A (zh) * | 2018-08-31 | 2021-08-24 | 康宁股份有限公司 | 制造具有无机过滤沉积物的蜂窝体的方法 |
| KR102094192B1 (ko) * | 2018-09-07 | 2020-04-23 | 고려대학교 산학협력단 | 무반사막 및 그 형성 방법 |
| JPWO2020067134A1 (ja) * | 2018-09-25 | 2021-09-02 | 日本電気硝子株式会社 | 透明物品 |
| JP6843400B1 (ja) * | 2019-10-18 | 2021-03-17 | 大塚テクノ株式会社 | 反射防止構造体 |
| CN114902087B (zh) * | 2020-01-16 | 2024-11-08 | 3M创新有限公司 | 包括反射性无孔有机聚合物层和uv保护层的复合冷却膜 |
| WO2021224703A1 (en) * | 2020-05-08 | 2021-11-11 | 3M Innovative Properties Company | Optical films and stacks including optically diffusive layer |
| KR102668109B1 (ko) * | 2020-11-03 | 2024-05-22 | 한국전자통신연구원 | 광소자의 광학 특성을 조절하는 나노 구조체 및 그의 제조방법 |
| US20240302571A1 (en) * | 2020-11-27 | 2024-09-12 | International Advanced Research Centre For Powder Metallurgy And New Materials (Arci) | Method of producing single layer omnidirectional broadband antireflective and super hydrophilic (antifogging) coatings for solar and other applications |
| US11912899B2 (en) | 2021-03-24 | 2024-02-27 | Sony Group Corporation | Film, liquid paint and method |
| US11169306B1 (en) * | 2021-04-08 | 2021-11-09 | Mark Joseph Oneill | Curvilinear prismatic film which eliminates glare and reduces front-surface reflections for solar panels and other surfaces |
| CN113113497B (zh) * | 2021-04-13 | 2023-01-24 | 河南大学 | 一种使用有机增效剂的太阳能电池及其制备方法 |
| JP2024529831A (ja) * | 2021-06-23 | 2024-08-14 | スリーエム イノベイティブ プロパティズ カンパニー | 光学フィルム、バックライト及びディスプレイ |
| CN117820885A (zh) * | 2023-08-31 | 2024-04-05 | 江苏双星彩塑新材料股份有限公司 | 一种高折射率光学涂料及其制备方法 |
| CN117567894B (zh) * | 2024-01-11 | 2024-04-05 | 中稀易涂科技发展有限公司 | 一种高发射稀土基辐射制冷涂料 |
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| US4082570A (en) * | 1976-02-09 | 1978-04-04 | Semicon, Inc. | High intensity solar energy converter |
| US4229066A (en) | 1978-09-20 | 1980-10-21 | Optical Coating Laboratory, Inc. | Visible transmitting and infrared reflecting filter |
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| US7019905B2 (en) | 2003-12-30 | 2006-03-28 | 3M Innovative Properties Company | Multilayer reflector with suppression of high order reflections |
| US7345137B2 (en) | 2004-10-18 | 2008-03-18 | 3M Innovative Properties Company | Modified copolyesters and optical films including modified copolyesters |
| US20070020451A1 (en) | 2005-07-20 | 2007-01-25 | 3M Innovative Properties Company | Moisture barrier coatings |
| US20070074757A1 (en) * | 2005-10-04 | 2007-04-05 | Gurdian Industries Corp | Method of making solar cell/module with porous silica antireflective coating |
| US20070227579A1 (en) * | 2006-03-30 | 2007-10-04 | Benyamin Buller | Assemblies of cylindrical solar units with internal spacing |
| US8018568B2 (en) * | 2006-10-12 | 2011-09-13 | Cambrios Technologies Corporation | Nanowire-based transparent conductors and applications thereof |
| US8241713B2 (en) | 2007-02-21 | 2012-08-14 | 3M Innovative Properties Company | Moisture barrier coatings for organic light emitting diode devices |
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| DE102008033910A1 (de) * | 2008-03-06 | 2009-09-24 | Johnson Controls Gmbh | Optische Anordnung |
| US20110120554A1 (en) * | 2008-03-27 | 2011-05-26 | Rensselaer Polytechnic Institute | Ultra-low reflectance broadband omni-directional anti-reflection coating |
| JP2009244382A (ja) * | 2008-03-28 | 2009-10-22 | Sharp Corp | 機能性フィルム及び表示装置 |
| US20100035039A1 (en) * | 2008-08-07 | 2010-02-11 | 3M Innovative Properties Company | Acicular silica coating for enhanced hydrophilicity/transmittivity |
| FR2941447B1 (fr) * | 2009-01-23 | 2012-04-06 | Saint Gobain | Substrat en verre transparent et procede de fabrication d'un tel substrat. |
| US8216357B2 (en) * | 2009-09-25 | 2012-07-10 | General Electric Company | Protective coating compositions and devices |
| WO2011140273A2 (en) * | 2010-05-04 | 2011-11-10 | Sionyx, Inc. | Photovoltaic devices and associated methods |
-
2011
- 2011-08-31 KR KR1020197030673A patent/KR102115937B1/ko not_active Expired - Fee Related
- 2011-08-31 CN CN201180048399.5A patent/CN103154320B/zh not_active Expired - Fee Related
- 2011-08-31 KR KR1020177034188A patent/KR20170137206A/ko not_active Ceased
- 2011-08-31 US US13/877,003 patent/US20130186466A1/en not_active Abandoned
- 2011-08-31 BR BR112013008304A patent/BR112013008304A2/pt not_active IP Right Cessation
- 2011-08-31 JP JP2013532811A patent/JP5869581B2/ja not_active Expired - Fee Related
- 2011-08-31 KR KR1020137011116A patent/KR20130139959A/ko not_active Ceased
- 2011-08-31 EP EP11760904.0A patent/EP2625313B1/en not_active Not-in-force
- 2011-08-31 WO PCT/US2011/049854 patent/WO2012047422A1/en not_active Ceased
-
2019
- 2019-12-02 US US16/700,509 patent/US20210257504A1/en not_active Abandoned
- 2019-12-03 US US16/701,449 patent/US20200123568A1/en not_active Abandoned
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