JP2013503430A - 高真空チャンバー用貫通型プラズマ発生装置 - Google Patents

高真空チャンバー用貫通型プラズマ発生装置 Download PDF

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JP2013503430A
JP2013503430A JP2012526183A JP2012526183A JP2013503430A JP 2013503430 A JP2013503430 A JP 2013503430A JP 2012526183 A JP2012526183 A JP 2012526183A JP 2012526183 A JP2012526183 A JP 2012526183A JP 2013503430 A JP2013503430 A JP 2013503430A
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plasma
dch
pch
section
high vacuum
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JP2013503430A5 (enExample
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アイナヴ、モシェ
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モザイク・クリスタルズ・リミテッド
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Priority claimed from PCT/IL2010/000707 external-priority patent/WO2011024174A1/en
Publication of JP2013503430A publication Critical patent/JP2013503430A/ja
Publication of JP2013503430A5 publication Critical patent/JP2013503430A5/ja
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H01J37/3211—Antennas, e.g. particular shapes of coils

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Physical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)
JP2012526183A 2009-08-27 2010-08-29 高真空チャンバー用貫通型プラズマ発生装置 Pending JP2013503430A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US23746209P 2009-08-27 2009-08-27
US61/237,462 2009-08-27
PCT/IL2010/000707 WO2011024174A1 (en) 2009-08-27 2010-08-29 Penetrating plasma generating apparatus for high vacuum chambers

Publications (2)

Publication Number Publication Date
JP2013503430A true JP2013503430A (ja) 2013-01-31
JP2013503430A5 JP2013503430A5 (enExample) 2014-05-15

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JP2012526183A Pending JP2013503430A (ja) 2009-08-27 2010-08-29 高真空チャンバー用貫通型プラズマ発生装置

Country Status (4)

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US (1) US20120212136A1 (enExample)
JP (1) JP2013503430A (enExample)
CN (1) CN102598201A (enExample)
CA (1) CA2772178A1 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016520950A (ja) * 2013-03-15 2016-07-14 プラズマビリティー， エルエルシー トロイダルプラズマ処理装置
US10443150B2 (en) 2015-05-21 2019-10-15 Plasmability, Llc Toroidal plasma processing apparatus with a shaped workpiece holder

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US9035553B2 (en) * 2011-11-09 2015-05-19 Dae-Kyu Choi Hybrid plasma reactor
US20130118589A1 (en) * 2011-11-15 2013-05-16 Mks Instruments, Inc. Toroidal Plasma Channel with Varying Cross-Section Areas Along the Channel
DE102012107282A1 (de) * 2012-01-17 2013-07-18 Reinhausen Plasma Gmbh Vorrichtung und verfahren zur plasmabehandlung von oberflächen
US9560730B2 (en) 2013-09-09 2017-01-31 Asml Netherlands B.V. Transport system for an extreme ultraviolet light source
US9557650B2 (en) 2013-09-09 2017-01-31 Asml Netherlands B.V. Transport system for an extreme ultraviolet light source
US9776218B2 (en) 2015-08-06 2017-10-03 Asml Netherlands B.V. Controlled fluid flow for cleaning an optical element
JP7085898B2 (ja) * 2018-05-25 2022-06-17 東京エレクトロン株式会社 ラジカル失活部品及びこれを用いたプラズマ処理装置
US10553403B1 (en) * 2019-05-08 2020-02-04 Mks Instruments, Inc. Polygonal toroidal plasma source
CN111416185B (zh) * 2020-03-18 2021-06-22 中国科学院近代物理研究所 一种用于ecr离子源的高压隔离波导
CN112383997B (zh) * 2020-10-05 2024-10-25 四川大学 一种大功率微波等离子体煤粉裂解装置
KR20220107521A (ko) * 2021-01-25 2022-08-02 (주) 엔피홀딩스 반응기, 이를 포함하는 공정 처리 장치 및 반응기 제조 방법
CN115604899A (zh) * 2021-07-09 2023-01-13 北京北方华创微电子装备有限公司（Cn） 用于产生等离子体的线圈结构及半导体工艺设备
CN114018849B (zh) * 2021-11-24 2023-10-03 云南孚尔质量检验检测有限公司 一种具有远程监测功能的水质检测系统
US12284747B2 (en) 2023-03-07 2025-04-22 Finesse Technology Co., Ltd. Hollow cathode discharge assistant transformer coupled plasma source and operation method of the same
TWI874990B (zh) * 2023-03-07 2025-03-01 明遠精密科技股份有限公司 中空陰極放電輔助之變壓器耦合電漿源結構及其運作方法
CN119747317B (zh) * 2025-03-03 2025-06-27 江西祥益鼎盛科技有限公司 一种线路板用的等离子清洗机

Citations (4)

* Cited by examiner, † Cited by third party
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JP2002507315A (ja) * 1997-06-26 2002-03-05 アプライド サイエンス アンド テクノロジー，インコーポレイテッド トロイダル低電場反応性ガスソース
US6392351B1 (en) * 1999-05-03 2002-05-21 Evgeny V. Shun'ko Inductive RF plasma source with external discharge bridge
JP2006332055A (ja) * 2005-05-23 2006-12-07 New Power Plasma Co Ltd プラズマ処理チャンバ、プラズマ反応器、大気圧プラズマ処理システム及びプラズマ処理システム
WO2011142125A1 (ja) * 2010-05-13 2011-11-17 パナソニック株式会社 プラズマ処理装置及び方法

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US6273950B1 (en) * 1996-04-18 2001-08-14 Matsushita Electric Industrial Co., Ltd. SiC device and method for manufacturing the same
US5767627A (en) * 1997-01-09 1998-06-16 Trusi Technologies, Llc Plasma generation and plasma processing of materials
US7569790B2 (en) * 1997-06-26 2009-08-04 Mks Instruments, Inc. Method and apparatus for processing metal bearing gases
US6815633B1 (en) * 1997-06-26 2004-11-09 Applied Science & Technology, Inc. Inductively-coupled toroidal plasma source
US7166816B1 (en) * 1997-06-26 2007-01-23 Mks Instruments, Inc. Inductively-coupled torodial plasma source
US6203657B1 (en) * 1998-03-31 2001-03-20 Lam Research Corporation Inductively coupled plasma downstream strip module
US6939434B2 (en) * 2000-08-11 2005-09-06 Applied Materials, Inc. Externally excited torroidal plasma source with magnetic control of ion distribution
US20050034668A1 (en) * 2001-03-22 2005-02-17 Garvey James F. Multi-component substances and apparatus for preparation thereof
KR100542740B1 (ko) * 2002-11-11 2006-01-11 삼성전자주식회사 가스 플라즈마 생성 방법 및 장치, 플라즈마 생성용 가스조성물 및 이를 이용한 반도체 장치의 제조 방법
US20050058872A1 (en) * 2003-09-12 2005-03-17 Blanchet Scott C. Connection assembly for promoting electrical isolation
US8031824B2 (en) * 2005-03-07 2011-10-04 Regents Of The University Of California Inductive plasma source for plasma electric generation system
US20090152684A1 (en) * 2007-12-18 2009-06-18 Li-Peng Wang Manufacture-friendly buffer layer for ferroelectric media
US7999479B2 (en) * 2009-04-16 2011-08-16 Varian Semiconductor Equipment Associates, Inc. Conjugated ICP and ECR plasma sources for wide ribbon ion beam generation and control

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002507315A (ja) * 1997-06-26 2002-03-05 アプライド サイエンス アンド テクノロジー，インコーポレイテッド トロイダル低電場反応性ガスソース
US6392351B1 (en) * 1999-05-03 2002-05-21 Evgeny V. Shun'ko Inductive RF plasma source with external discharge bridge
JP2006332055A (ja) * 2005-05-23 2006-12-07 New Power Plasma Co Ltd プラズマ処理チャンバ、プラズマ反応器、大気圧プラズマ処理システム及びプラズマ処理システム
WO2011142125A1 (ja) * 2010-05-13 2011-11-17 パナソニック株式会社 プラズマ処理装置及び方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016520950A (ja) * 2013-03-15 2016-07-14 プラズマビリティー， エルエルシー トロイダルプラズマ処理装置
US10443150B2 (en) 2015-05-21 2019-10-15 Plasmability, Llc Toroidal plasma processing apparatus with a shaped workpiece holder
US10704161B2 (en) 2015-05-21 2020-07-07 Plasmability, Llc Toroidal plasma processing apparatus with a shaped workpiece holder

Also Published As

Publication number Publication date
CN102598201A (zh) 2012-07-18
CA2772178A1 (en) 2011-03-03
US20120212136A1 (en) 2012-08-23

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