JP2013239639A5 - - Google Patents

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Publication number
JP2013239639A5
JP2013239639A5 JP2012112683A JP2012112683A JP2013239639A5 JP 2013239639 A5 JP2013239639 A5 JP 2013239639A5 JP 2012112683 A JP2012112683 A JP 2012112683A JP 2012112683 A JP2012112683 A JP 2012112683A JP 2013239639 A5 JP2013239639 A5 JP 2013239639A5
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Japan
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JP2012112683A
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English (en)
Japanese (ja)
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JP2013239639A (ja
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Priority to JP2012112683A priority Critical patent/JP2013239639A/ja
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Publication of JP2013239639A5 publication Critical patent/JP2013239639A5/ja
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JP2012112683A 2012-05-16 2012-05-16 露光装置及びその調整方法、パターンのずれの計測方法、並びに、デバイス製造方法 Pending JP2013239639A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2012112683A JP2013239639A (ja) 2012-05-16 2012-05-16 露光装置及びその調整方法、パターンのずれの計測方法、並びに、デバイス製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012112683A JP2013239639A (ja) 2012-05-16 2012-05-16 露光装置及びその調整方法、パターンのずれの計測方法、並びに、デバイス製造方法

Publications (2)

Publication Number Publication Date
JP2013239639A JP2013239639A (ja) 2013-11-28
JP2013239639A5 true JP2013239639A5 (https=) 2015-07-02

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ID=49764409

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JP2012112683A Pending JP2013239639A (ja) 2012-05-16 2012-05-16 露光装置及びその調整方法、パターンのずれの計測方法、並びに、デバイス製造方法

Country Status (1)

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JP (1) JP2013239639A (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20210001968A (ko) * 2019-06-27 2021-01-06 캐논 가부시끼가이샤 패턴 형성 방법 및 물품의 제조 방법

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6279621A (ja) * 1985-10-02 1987-04-13 Mitsubishi Electric Corp 投影露光装置
JPH07142329A (ja) * 1993-06-24 1995-06-02 Hitachi Ltd 露光方法及び露光装置並びにマスク
JPH10223518A (ja) * 1997-02-04 1998-08-21 Canon Inc デバイス製造方法およびこれに使用できる露光装置
JP4182303B2 (ja) * 1997-04-14 2008-11-19 株式会社ニコン 投影光学系のディストーション測定方法及びディストーションを補正して行う半導体デバイスの製造方法
JP3797638B2 (ja) * 1997-06-09 2006-07-19 キヤノン株式会社 露光装置、投影光学系の歪曲収差を求める方法およびデバイス製造方法
JP4324848B2 (ja) * 2003-07-30 2009-09-02 株式会社ニコン 走査露光特性の評価方法及び露光装置
TWI396225B (zh) * 2004-07-23 2013-05-11 尼康股份有限公司 成像面測量方法、曝光方法、元件製造方法以及曝光裝置

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