JP2013183017A - 描画装置、基準素子、及び物品製造方法 - Google Patents

描画装置、基準素子、及び物品製造方法 Download PDF

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Publication number
JP2013183017A
JP2013183017A JP2012045783A JP2012045783A JP2013183017A JP 2013183017 A JP2013183017 A JP 2013183017A JP 2012045783 A JP2012045783 A JP 2012045783A JP 2012045783 A JP2012045783 A JP 2012045783A JP 2013183017 A JP2013183017 A JP 2013183017A
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JP
Japan
Prior art keywords
reference mark
pattern
measurement
mark
drawing apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
JP2012045783A
Other languages
English (en)
Japanese (ja)
Other versions
JP2013183017A5 (https=
Inventor
Wataru Yamaguchi
渉 山口
Hideki Ine
秀樹 稲
Satoru Oishi
哲 大石
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2012045783A priority Critical patent/JP2013183017A/ja
Priority to US13/771,243 priority patent/US20130230805A1/en
Publication of JP2013183017A publication Critical patent/JP2013183017A/ja
Publication of JP2013183017A5 publication Critical patent/JP2013183017A5/ja
Abandoned legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0035—Multiple processes, e.g. applying a further resist layer on an already in a previously step, processed pattern or textured surface
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/248—Components associated with the control of the tube
    • H01J2237/2482—Optical means
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24777—Edge feature

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
JP2012045783A 2012-03-01 2012-03-01 描画装置、基準素子、及び物品製造方法 Abandoned JP2013183017A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2012045783A JP2013183017A (ja) 2012-03-01 2012-03-01 描画装置、基準素子、及び物品製造方法
US13/771,243 US20130230805A1 (en) 2012-03-01 2013-02-20 Drawing apparatus, reference member, and method of manufacturing article

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012045783A JP2013183017A (ja) 2012-03-01 2012-03-01 描画装置、基準素子、及び物品製造方法

Publications (2)

Publication Number Publication Date
JP2013183017A true JP2013183017A (ja) 2013-09-12
JP2013183017A5 JP2013183017A5 (https=) 2015-04-09

Family

ID=49043026

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012045783A Abandoned JP2013183017A (ja) 2012-03-01 2012-03-01 描画装置、基準素子、及び物品製造方法

Country Status (2)

Country Link
US (1) US20130230805A1 (https=)
JP (1) JP2013183017A (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6426984B2 (ja) * 2014-11-18 2018-11-21 キヤノン株式会社 リソグラフィ装置および物品製造方法
US9892885B2 (en) * 2016-03-24 2018-02-13 Kla-Tencor Corporation System and method for drift compensation on an electron beam based characterization tool

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004349515A (ja) * 2003-05-23 2004-12-09 Hitachi High-Technologies Corp Ｓｅｍ式外観検査装置，レビュー装置、およびアライメント座標設定方法
US7332729B1 (en) * 2004-06-18 2008-02-19 Novelx, Inc. System and method for multiple electron, ion, and photon beam alignment
TWI368973B (en) * 2008-09-24 2012-07-21 Ind Tech Res Inst Package and substrate structure with alignment pattern and analysis method about its yield
JP5506560B2 (ja) * 2010-06-18 2014-05-28 キヤノン株式会社 描画装置及びデバイス製造方法

Also Published As

Publication number Publication date
US20130230805A1 (en) 2013-09-05

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