JP2013173368A - Laminated material for electric insulation, and printed wiring board using the laminated material - Google Patents
Laminated material for electric insulation, and printed wiring board using the laminated material Download PDFInfo
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- JP2013173368A JP2013173368A JP2013084494A JP2013084494A JP2013173368A JP 2013173368 A JP2013173368 A JP 2013173368A JP 2013084494 A JP2013084494 A JP 2013084494A JP 2013084494 A JP2013084494 A JP 2013084494A JP 2013173368 A JP2013173368 A JP 2013173368A
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- laminated material
- insulating layer
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- 239000002648 laminated material Substances 0.000 title claims abstract description 35
- 238000009413 insulation Methods 0.000 title abstract description 3
- 239000004020 conductor Substances 0.000 claims abstract description 39
- 239000011810 insulating material Substances 0.000 abstract description 16
- 238000000034 method Methods 0.000 abstract description 15
- 230000001939 inductive effect Effects 0.000 abstract 4
- 239000000463 material Substances 0.000 description 21
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 18
- 239000003822 epoxy resin Substances 0.000 description 17
- 229920000647 polyepoxide Polymers 0.000 description 17
- 229920005989 resin Polymers 0.000 description 17
- 239000011347 resin Substances 0.000 description 17
- 238000010292 electrical insulation Methods 0.000 description 16
- 239000011889 copper foil Substances 0.000 description 14
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 10
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 10
- 229920003986 novolac Polymers 0.000 description 9
- 239000003795 chemical substances by application Substances 0.000 description 8
- 239000011888 foil Substances 0.000 description 7
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 6
- 238000005259 measurement Methods 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 238000010030 laminating Methods 0.000 description 5
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 4
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 4
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 4
- 150000001412 amines Chemical class 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
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- 229930003836 cresol Natural products 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 4
- -1 prepreg Substances 0.000 description 4
- 239000011342 resin composition Substances 0.000 description 4
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- BGDOLELXXPTPFX-UHFFFAOYSA-N 3,4-dihydro-2h-1,2-benzoxazine Chemical group C1=CC=C2ONCCC2=C1 BGDOLELXXPTPFX-UHFFFAOYSA-N 0.000 description 3
- 239000002313 adhesive film Substances 0.000 description 3
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- 239000002904 solvent Substances 0.000 description 3
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- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- 239000003989 dielectric material Substances 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 239000012776 electronic material Substances 0.000 description 2
- 239000003063 flame retardant Substances 0.000 description 2
- 125000002485 formyl group Chemical class [H]C(*)=O 0.000 description 2
- 150000004820 halides Chemical class 0.000 description 2
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical class C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 2
- 239000005011 phenolic resin Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- GEYOCULIXLDCMW-UHFFFAOYSA-N 1,2-phenylenediamine Chemical compound NC1=CC=CC=C1N GEYOCULIXLDCMW-UHFFFAOYSA-N 0.000 description 1
- OUPZKGBUJRBPGC-UHFFFAOYSA-N 1,3,5-tris(oxiran-2-ylmethyl)-1,3,5-triazinane-2,4,6-trione Chemical compound O=C1N(CC2OC2)C(=O)N(CC2OC2)C(=O)N1CC1CO1 OUPZKGBUJRBPGC-UHFFFAOYSA-N 0.000 description 1
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 229910016847 F2-WS Inorganic materials 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 239000004111 Potassium silicate Substances 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229920001807 Urea-formaldehyde Polymers 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 description 1
- 229910002113 barium titanate Inorganic materials 0.000 description 1
- AYJRCSIUFZENHW-DEQYMQKBSA-L barium(2+);oxomethanediolate Chemical compound [Ba+2].[O-][14C]([O-])=O AYJRCSIUFZENHW-DEQYMQKBSA-L 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 150000001649 bromium compounds Chemical class 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 239000000378 calcium silicate Substances 0.000 description 1
- 229910052918 calcium silicate Inorganic materials 0.000 description 1
- AOWKSNWVBZGMTJ-UHFFFAOYSA-N calcium titanate Chemical compound [Ca+2].[O-][Ti]([O-])=O AOWKSNWVBZGMTJ-UHFFFAOYSA-N 0.000 description 1
- OYACROKNLOSFPA-UHFFFAOYSA-N calcium;dioxido(oxo)silane Chemical compound [Ca+2].[O-][Si]([O-])=O OYACROKNLOSFPA-UHFFFAOYSA-N 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 229910052570 clay Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- XLJMAIOERFSOGZ-UHFFFAOYSA-M cyanate Chemical compound [O-]C#N XLJMAIOERFSOGZ-UHFFFAOYSA-M 0.000 description 1
- 239000011353 cycloaliphatic epoxy resin Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 239000002305 electric material Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- WJRBRSLFGCUECM-UHFFFAOYSA-N hydantoin Chemical compound O=C1CNC(=O)N1 WJRBRSLFGCUECM-UHFFFAOYSA-N 0.000 description 1
- 229940091173 hydantoin Drugs 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 229910003475 inorganic filler Inorganic materials 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 1
- 239000001095 magnesium carbonate Substances 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 1
- 239000000347 magnesium hydroxide Substances 0.000 description 1
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 1
- HCWCAKKEBCNQJP-UHFFFAOYSA-N magnesium orthosilicate Chemical compound [Mg+2].[Mg+2].[O-][Si]([O-])([O-])[O-] HCWCAKKEBCNQJP-UHFFFAOYSA-N 0.000 description 1
- 239000000391 magnesium silicate Substances 0.000 description 1
- 229910052919 magnesium silicate Inorganic materials 0.000 description 1
- 235000019792 magnesium silicate Nutrition 0.000 description 1
- 229910000000 metal hydroxide Inorganic materials 0.000 description 1
- 150000004692 metal hydroxides Chemical class 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910000476 molybdenum oxide Inorganic materials 0.000 description 1
- NXPPAOGUKPJVDI-UHFFFAOYSA-N naphthalene-1,2-diol Chemical compound C1=CC=CC2=C(O)C(O)=CC=C21 NXPPAOGUKPJVDI-UHFFFAOYSA-N 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- AFEQENGXSMURHA-UHFFFAOYSA-N oxiran-2-ylmethanamine Chemical compound NCC1CO1 AFEQENGXSMURHA-UHFFFAOYSA-N 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- PQQKPALAQIIWST-UHFFFAOYSA-N oxomolybdenum Chemical compound [Mo]=O PQQKPALAQIIWST-UHFFFAOYSA-N 0.000 description 1
- 229920002866 paraformaldehyde Polymers 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- NNHHDJVEYQHLHG-UHFFFAOYSA-N potassium silicate Chemical compound [K+].[K+].[O-][Si]([O-])=O NNHHDJVEYQHLHG-UHFFFAOYSA-N 0.000 description 1
- 229910052913 potassium silicate Inorganic materials 0.000 description 1
- 235000019353 potassium silicate Nutrition 0.000 description 1
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- 229910052710 silicon Inorganic materials 0.000 description 1
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- VEALVRVVWBQVSL-UHFFFAOYSA-N strontium titanate Chemical compound [Sr+2].[O-][Ti]([O-])=O VEALVRVVWBQVSL-UHFFFAOYSA-N 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
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Abstract
Description
本発明は、電気絶縁用積層材料及びこの積層材料を用いたプリント配線板に関する。 The present invention relates to a laminated material for electrical insulation and a printed wiring board using the laminated material.
昨今の電気・電子機器の多様化、技術的課題の多様化に伴い、電気・電子用材料の分野でも要求仕様が大きく変化しており、従来セラミックスなどに代表される無機材料が使用されていた分野にまで、有機材料が採用されるようになるなど、電気絶縁用積層材料は多種・多様な分野へ展開してきている。 With the recent diversification of electrical and electronic equipment and diversified technical issues, the required specifications have changed greatly in the field of electrical and electronic materials, and inorganic materials such as ceramics have been used. Organic materials have been adopted in various fields, and laminated materials for electrical insulation have been developed in a wide variety of fields.
これに伴い、電気絶縁用積層材料に対する要求も、機械特性、電気特性、物理特性、化学特性等々多岐にわたり多様化してきている。電気特性の中では誘電特性(比誘電率・誘電正接等)に関しても様々な要求があり、多種多様な比誘電率の電気絶縁用積層材料の提供の要求がある。 Accordingly, demands for laminated materials for electrical insulation have been diversified in various ways such as mechanical characteristics, electrical characteristics, physical characteristics, and chemical characteristics. Among the electrical characteristics, there are various requirements regarding dielectric characteristics (relative dielectric constant, dielectric loss tangent, etc.), and there is a demand for providing laminated materials for electrical insulation having various dielectric constants.
中でも、特殊な誘電特性を有する電気絶縁用積層材料は、一般的な電気絶縁用積層材料に比べて非常に高価であるが、より安価に提供することが求められている。 Among them, a laminate material for electrical insulation having special dielectric properties is very expensive compared to a typical laminate material for electrical insulation, but is required to be provided at a lower cost.
特許文献1〜7には、誘電率の異なる2以上の材料を用いて比誘電率を調整することが開示されている。例えば、特許文献1では、使用するプリプレグの一部に、酸化チタンを添加したプリプレグを用いることで比誘電率を調整することを試みている。 Patent Documents 1 to 7 disclose that the relative dielectric constant is adjusted using two or more materials having different dielectric constants. For example, Patent Document 1 attempts to adjust the relative dielectric constant by using a prepreg to which titanium oxide is added as a part of the prepreg to be used.
この手法で用いているプリプレグのうち、酸化チタンを添加する際にベースとして用いる樹脂として、一般的な電気絶縁用積層材料用の樹脂を用いた場合、樹脂は比較的安価に入手できる。また、使用するプリプレグのうち酸化チタンを添加しないプリプレグについても、一般的な電気絶縁用積層材料を用いることが可能であるため、比較的安価に電気絶縁用積層材料を作れる可能性はある。 Of the prepregs used in this technique, when a resin for a general laminated material for electrical insulation is used as a base when adding titanium oxide, the resin can be obtained at a relatively low cost. Also, a prepreg to which titanium oxide is not added among prepregs to be used can use a general electrical insulation laminate material, and therefore there is a possibility that the electrical insulation laminate material can be produced at a relatively low cost.
しかし、上記の特許文献1〜7は、材料の配置については指定していない。材料の配置によっては、プリント配線板の比誘電率は大きく異なる場合がある。 However, the above Patent Documents 1 to 7 do not specify the material arrangement. Depending on the arrangement of materials, the relative permittivity of the printed wiring board may vary greatly.
よって、作製した電気絶縁用積層材料は、同じプリプレグを用いても、そのプリプレグの構成によっては、同様の効果が得られない場合がある。 Therefore, even if the produced laminated material for electrical insulation uses the same prepreg, the same effect may not be obtained depending on the configuration of the prepreg.
本発明は、比誘電率の異なる絶縁材料を組み合わせ、かつ特定の組合わせ方をすることによって、任意の比誘電率の電気絶縁用積層材料及びこの積層材料を用いたプリント配線板を提供することを目的とするものである。 The present invention provides an insulating material having an arbitrary relative dielectric constant and a printed wiring board using the laminated material by combining insulating materials having different relative dielectric constants and performing a specific combination. It is intended.
そこで、既存の比誘電率の異なる基材を少なくとも2種類積層し、導体に接する材料によって積極的に誘電率を制御した構造をとることで、任意の比誘電率の電気絶縁用積層材料を完成するに至った。 Therefore, by laminating at least two types of existing base materials with different relative dielectric constants and adopting a structure in which the dielectric constant is positively controlled by the material in contact with the conductor, a laminated material for electrical insulation having an arbitrary relative dielectric constant is completed. It came to do.
つまり、本発明は、絶縁層の上下に導体層を備える積層材料であって、絶縁層は2以上の比誘電率の異なる絶縁層から構成され、導体層と接する絶縁層と導体層と接しない絶縁層との比誘電率が異なることを特徴とする積層材料に関する。導体層と接する絶縁層の比誘電率は、導体層と接しない絶縁層の2倍以上又は3/4倍以下であることが好ましい。導体層と接する絶縁層の比誘電率が、10〜50又は1.5〜3であることが好ましい。また、さらに、本発明は積層材料を含むプリント配線板に関する。 That is, the present invention is a laminated material having conductor layers above and below an insulating layer, the insulating layer is composed of insulating layers having different relative dielectric constants of 2 or more, and does not contact the conductor layer and the conductor layer. The present invention relates to a laminated material characterized by having a relative dielectric constant different from that of an insulating layer. The relative dielectric constant of the insulating layer in contact with the conductor layer is preferably 2 times or more or 3/4 times or less that of the insulating layer not in contact with the conductor layer. It is preferable that the dielectric constant of the insulating layer in contact with the conductor layer is 10 to 50 or 1.5 to 3. Furthermore, the present invention relates to a printed wiring board containing a laminated material.
本発明によれば、少なくとも比誘電率の異なる2種類以上の絶縁材料を用いるので、用いた電気絶縁用積層材料各々の持つ比誘電率の最大値と最小値の範囲内で、任意の比誘電率を有する積層用材料及びプリントの配線板を容易に提供することができる。 According to the present invention, since at least two types of insulating materials having different relative dielectric constants are used, any specific dielectric constant can be used within the range of the maximum and minimum relative dielectric constants of each of the laminated materials for electrical insulation used. It is possible to easily provide a laminating material having a rate and a printed wiring board.
以下、発明を実施するための最良の形態について詳細に説明する。本発明は、比誘電率の異なる絶縁材料を少なくとも2種類積層し、かつ導体に接する部分に配した材料によって積極的に誘電率を制御することによって得られる電気絶縁用積層材料であり、絶縁材料の組合せを変更することによって得られる任意の比誘電率を有する電気絶縁用積層材料及びプリント配線板として良好な特性を獲得する。 Hereinafter, the best mode for carrying out the invention will be described in detail. The present invention is an electrically insulating laminated material obtained by laminating at least two types of insulating materials having different relative dielectric constants and positively controlling the dielectric constant by a material disposed on a portion in contact with a conductor. As a laminated material for electrical insulation and a printed wiring board having an arbitrary relative dielectric constant obtained by changing the combination of the above, good characteristics are obtained.
本発明の積層材料は、絶縁層と、その上下に導体層とを備える。絶縁層は、製造される電気絶縁用積層材料及びプリント配線板としての要求特性を著しく損なわない絶縁材料から形成された物であれば、特に制限はない。絶縁材料としては、例えば、塗工布、塗工紙、プリプレグ、接着シート、樹脂付銅箔等の電気絶縁用積層材料を用いてもよい。 The laminated material of the present invention includes an insulating layer and conductor layers above and below the insulating layer. The insulating layer is not particularly limited as long as it is formed from an insulating material that does not significantly impair the required characteristics as a laminated material for electrical insulation and a printed wiring board to be manufactured. As the insulating material, for example, a laminated material for electrical insulation such as coated cloth, coated paper, prepreg, adhesive sheet, and copper foil with resin may be used.
絶縁材料に樹脂が含まれる場合には、樹脂としては、熱硬化樹脂、熱可塑樹脂等特に制限はないが、好ましくはエポキシ樹脂、尿素樹脂、メラミン樹脂、フェノール樹脂等であり、中でもエポキシ樹脂を主硬化系に用いることが特に好ましい。これらを単独又は複数組合せて用いることもできる。 When the insulating material contains a resin, the resin is not particularly limited, such as a thermosetting resin or a thermoplastic resin, but is preferably an epoxy resin, a urea resin, a melamine resin, a phenol resin, etc. It is particularly preferable to use it for the main curing system. These can be used alone or in combination.
上記エポキシ樹脂については、特に制限はないが、例えばビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、ビスフェノールS型エポキシ樹脂、ビフェニル型エポキシ樹脂、ナフタレンジオール型エポキシ樹脂、フェノールノボラック型エポキシ樹脂、クレゾールノボラック型エポキシ樹脂、ビスフェノールAノボラック型エポキシ樹脂、環状脂肪族エポキシ樹脂、グリシジルエステル樹脂、グリシジルアミン樹脂、複素環式エポキシ樹脂(トリグリシジルイソシアヌレート、ジグリシジルヒダントイン等)及びこれらを種々の材料で変性した変性エポキシ樹脂等が使用できる。 The epoxy resin is not particularly limited. For example, bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol S type epoxy resin, biphenyl type epoxy resin, naphthalenediol type epoxy resin, phenol novolac type epoxy resin, cresol novolak Type epoxy resin, bisphenol A novolak type epoxy resin, cycloaliphatic epoxy resin, glycidyl ester resin, glycidyl amine resin, heterocyclic epoxy resin (triglycidyl isocyanurate, diglycidyl hydantoin, etc.) and these were modified with various materials Modified epoxy resins can be used.
また、これらの臭素化物、塩素化物等のハロゲン化物も使用できる。さらに、これらのエポキシ樹脂を2種類以上適宜組合せて使用することもできる。特に、電気電子材料用途に適用できる高い耐熱性や信頼性を絶縁層に付与できることから、フェノールノボラック型エポキシ樹脂、クレゾールノボラック型エポキシ樹脂、ビスフェノールAノボラック型エポキシ樹脂又はこれらのハロゲン化物を用いることが望ましい。 In addition, halides such as bromides and chlorides can also be used. Furthermore, two or more of these epoxy resins can be used in appropriate combination. In particular, since it is possible to impart high heat resistance and reliability applicable to electric and electronic material applications to the insulating layer, it is necessary to use a phenol novolac type epoxy resin, a cresol novolac type epoxy resin, a bisphenol A novolac type epoxy resin or a halide thereof. desirable.
エポキシ樹脂の添加量は、特に制限はないが、十分な硬化物を得るためには、フィラーを除く樹脂組成物中の16〜95重量%の範囲が好ましい。 The amount of the epoxy resin added is not particularly limited, but is preferably in the range of 16 to 95% by weight in the resin composition excluding the filler in order to obtain a sufficient cured product.
また、加工性改良、添加した樹脂の硬化促進等の目的で、硬化剤を添加してもよい。硬化剤には、フェノール系、アミン系、シアネート系、酸無水物系、ジヒドロベンゾオキサジン環を有する化合物等の、公知の硬化剤を単独または複数組合せて用いることができる。 Moreover, you may add a hardening | curing agent for the purpose of workability improvement, hardening acceleration of the added resin, etc. As the curing agent, a known curing agent such as a phenol, amine, cyanate, acid anhydride, or a compound having a dihydrobenzoxazine ring may be used alone or in combination.
具体的には、フェノールノボラック、クレゾールノボラック、ビスフェノールA、ビスフェノールF、ビスフェノールS、メラミン変性ノボラック型フェ−ノール樹脂等のフェノール性水酸基を有するフェノール系硬化剤又はこれらのハロゲン化された硬化剤、ジシアンジアミド等アミン系硬化剤等が挙げられる。 Specifically, phenolic novolak, cresol novolak, bisphenol A, bisphenol F, bisphenol S, phenolic curing agents having a phenolic hydroxyl group such as melamine-modified novolak type phenol resin, or halogenated curing agents thereof, dicyandiamide And amine-based curing agents.
また、上記ジヒドロベンゾオキサジン環を有する化合物は、メチルエチルケトンなどの適当な溶媒中で、フェノール類、アミン類、アルデヒド類を、加熱反応させ、溶剤及び水を除去することで容易に合成できる。 The compound having a dihydrobenzoxazine ring can be easily synthesized by heating and reacting phenols, amines and aldehydes in an appropriate solvent such as methyl ethyl ketone and removing the solvent and water.
上記フェノール類としてはフェノール、クレゾール、ビスフェノールA、ビスフェノールF等を用いることができ、アミン類としてはアニリン、ジアミノベンゼン等を用いることができ、上記アルデヒド類では、ホルムアルデヒド、パラホルム等を用いることができる。 Phenol, cresol, bisphenol A, bisphenol F, etc. can be used as the phenol, aniline, diaminobenzene, etc. can be used as the amine, and formaldehyde, paraform, etc. can be used as the aldehyde. .
具体的には、フェノール1当量に対して、アニリンを1当量及びホルムアルデヒドを2当量の割合で配合し、還流させ、任意の反応率の点で冷却し、さらに、溶剤及び水分、場合によっては未反応物質を除去することにより所望のジヒドロベンゾオキサジン環を有する樹脂を得ることができる。 Specifically, 1 equivalent of phenol and 1 equivalent of aniline and 2 equivalents of formaldehyde are mixed in, refluxed, cooled at an arbitrary reaction rate, and further, solvent and moisture, and in some cases, unreacted. By removing the reactant, a resin having a desired dihydrobenzoxazine ring can be obtained.
また、本発明で用いるエポキシ樹脂及び硬化剤を、事前に適宜反応させてから用いることもできる。硬化剤の添加量は、樹脂組成物の硬化反応を著しく阻害しない範囲であればよく、特に制限はないが、好ましくは、フィラーを除く樹脂組成物中の2〜73重量%の範囲である。 In addition, the epoxy resin and the curing agent used in the present invention can be used after appropriately reacting in advance. The addition amount of the curing agent is not particularly limited as long as it does not significantly inhibit the curing reaction of the resin composition, and is preferably in the range of 2 to 73% by weight in the resin composition excluding the filler.
また、1種又は複数種のフィラーを、比誘電率を高める目的の他に、高剛性化、低熱膨張化等の目的で添加することができ、これらは無機・有機に特に制限はない。上記無機フィラーとしては、特に制限はないが、例えば、酸化モリブデン、酸化亜鉛、珪酸マグネシウム等の金属酸化物、水酸化アルミニウム、水酸化マグネシウム等の金属水酸化物、アルミナ、シリカ、タルク、マイカ、ケイ酸カルシウム、ケイ酸カリウム、焼成クレー、酸化チタン、硫酸バリウム、チタン酸ストロンチウム、チタン酸カルシウム、チタン酸バリウム、酸化アルミニウム、炭酸マグネシウム、炭酸カルシウム、炭酸バリウム等が挙げられ、この他にも、モリブデン、亜鉛、カルシウム、リン、アルミニウム、カリウム、珪素、マグネシウム等の複数の元素からなる酸化物等の化合物であってもよく、上記の化合物を複数組合せて用いてもよい。 In addition to the purpose of increasing the relative dielectric constant, one or more kinds of fillers can be added for the purpose of increasing the rigidity and decreasing the thermal expansion, and these are not particularly limited to inorganic and organic. The inorganic filler is not particularly limited. For example, metal oxides such as molybdenum oxide, zinc oxide, and magnesium silicate, metal hydroxides such as aluminum hydroxide and magnesium hydroxide, alumina, silica, talc, mica, Calcium silicate, potassium silicate, calcined clay, titanium oxide, barium sulfate, strontium titanate, calcium titanate, barium titanate, aluminum oxide, magnesium carbonate, calcium carbonate, barium carbonate, etc. A compound such as an oxide composed of a plurality of elements such as molybdenum, zinc, calcium, phosphorus, aluminum, potassium, silicon, and magnesium may be used, or a plurality of the above compounds may be used in combination.
さらに、上記樹脂組成物には、公知の顔料、染料、接着助剤、酸化防止剤、硬化促進剤、難燃剤、難燃助剤、有機溶剤等をプリント配線板としての特性を損なわない範囲で添加することができる。
絶縁層は2以上の比誘電率の異なる絶縁層から構成され、絶縁層の比誘電率は、導体に接する絶縁層の比誘電率と導体に接しない絶縁層の比誘電率とが異なっていれば特に制限されないが、導体層と接する絶縁層の比誘電率は、導体層と接しない絶縁層の2倍以上又は3/4倍以下であることが好ましい。
導体層と接しない絶縁層の比誘電率は、一般的な有機絶縁材料の比誘電率である4〜5が好ましい。具体的には、要求特性を損なわなければ特に制限されないが、コスト等を勘案した場合、ガラスエポキシ絶縁材料が好ましく、中でも比誘電率は4〜5であるFR−4基材が挙げられる。
導体層と接しない絶縁層の比誘電率について、導体層と接する絶縁層の比誘電率が導体層と接しない絶縁層の2倍以上の場合は、高誘電材料の比誘電率である10〜50が好ましく、20〜50がより好ましい。また、導体層と接する絶縁層の比誘電率が導体層と接しない絶縁層の3/4倍以下の場合は、低誘電材料の比誘電率である1.5〜3が好ましく、2〜3がより好ましい。具体的には、要求特性を損なわなければ特に制限されないが、例えば、MCF−HD−45、MCF−HD−30、MCF−HD−20、MCF−7000LX(日立化成工業株式会社製、それぞれ比誘電率45、30、20、2.8(1MHz))、GDN−67N(日立化成工業株式会社製、比誘電率10.2〜10.6(1MHz))、BC12TM,BCT16T(三井金属株式会社製、それぞれ比誘電率10、30(1MHz))等の樹脂付銅箔の樹脂層が挙げられる。
導体間の絶縁材料の厚さ及び、その中に占める絶縁層に接する部分の同一の絶縁材料の占める割合は、所望の要求特性を獲得できれば特に制限されないが、積層材料の絶縁層全体厚に対し1%以上40%以下であり、より好ましくは、3%以上30%以下であり、さらに好ましくは5%以上20%以下である。
Furthermore, the above resin composition contains known pigments, dyes, adhesion assistants, antioxidants, curing accelerators, flame retardants, flame retardant assistants, organic solvents and the like as long as the characteristics as a printed wiring board are not impaired. Can be added.
The insulating layer is composed of two or more insulating layers having different relative dielectric constants, and the relative dielectric constant of the insulating layer is different from that of the insulating layer in contact with the conductor and that of the insulating layer not in contact with the conductor. Although not particularly limited, the relative dielectric constant of the insulating layer in contact with the conductor layer is preferably not less than 2 times or not more than 3/4 times that of the insulating layer not in contact with the conductor layer.
The dielectric constant of the insulating layer that does not contact the conductor layer is preferably 4 to 5, which is the relative dielectric constant of a general organic insulating material. Specifically, it is not particularly limited as long as the required characteristics are not impaired, but in consideration of cost and the like, a glass epoxy insulating material is preferable, and an FR-4 base material having a relative dielectric constant of 4 to 5 is particularly mentioned.
When the relative dielectric constant of the insulating layer not in contact with the conductor layer is more than twice that of the insulating layer in contact with the conductor layer, the relative dielectric constant of the high dielectric material is 10 to 10. 50 is preferable and 20-50 is more preferable. Moreover, when the relative dielectric constant of the insulating layer in contact with the conductor layer is 3/4 or less that of the insulating layer not in contact with the conductor layer, the relative dielectric constant of the low dielectric material is preferably from 1.5 to 3, Is more preferable. Specifically, there is no particular limitation as long as the required characteristics are not impaired. For example, MCF-HD-45, MCF-HD-30, MCF-HD-20, MCF-7000LX (manufactured by Hitachi Chemical Co., Ltd., respectively, dielectric constant) 45, 30, 20, 2.8 (1 MHz)), GDN-67N (manufactured by Hitachi Chemical Co., Ltd., relative permittivity 10.2 to 10.6 (1 MHz)), BC12TM, BCT16T (manufactured by Mitsui Kinzoku Co., Ltd.) And a resin layer of a copper foil with resin such as a relative dielectric constant of 10 and 30 (1 MHz), respectively.
The thickness of the insulating material between the conductors and the proportion of the same insulating material in the portion in contact with the insulating layer in the conductor are not particularly limited as long as the desired required characteristics can be obtained. 1% or more and 40% or less, more preferably 3% or more and 30% or less, and further preferably 5% or more and 20% or less.
導体層は、その材質は特に制限はないが、銅、アルミ、鉄等が好ましく、これらのうち銅がもっとも好ましい。また、この絶縁材料と金属箔を組合わせ、適宜加熱加圧成形して得た金属張積層板の、金属箔の不要な部分をエッチング除去することによってプリント配線板を製造することもできる。
また、一般的な金属張積層板から作製したプリント配線板を用い、その外側に少なくとも2種類の誘電率の異なるプリプレグ等の絶縁材料、樹脂付き金属箔、もしくは接着フィルム等の絶縁材料を複数組み合わせて、必要に応じて金属箔を積層し、適宜積層し、加熱、加圧することにより、本発明でいう導体に接する部分の材料によって積極的に誘電率を制御した絶縁層を少なくとも一層有するプリント配線板を作製することも出来る。
The material of the conductor layer is not particularly limited, but copper, aluminum, iron and the like are preferable, and copper is most preferable. Moreover, a printed wiring board can also be manufactured by etching away the unnecessary part of metal foil of the metal-clad laminated board obtained by combining this insulating material and metal foil, and heat-pressing suitably.
Also, a printed wiring board made from a general metal-clad laminate is used, and at least two types of insulating materials such as prepregs with different dielectric constants, metal foils with resin, or adhesive films are combined on the outside. A printed wiring having at least one insulating layer in which the dielectric constant is positively controlled by the material of the portion in contact with the conductor in the present invention by laminating metal foil as necessary, laminating appropriately, heating and pressing A plate can also be produced.
必要に応じてこれらプリント配線板と、プリプレグ、樹脂付き金属箔又は接着フィルム及び金属箔を単独又は複数組合せて適宜積層し、加熱、加圧することにより、多層化したプリント配線板を製造することもできる。これらプリプレグ、積層板、樹脂付き銅箔、接着フィルム、プリント配線板の製造においては、当該業界における通常の塗工、積層、回路加工工程を適用することができる。 If necessary, these printed wiring boards, prepregs, resin-added metal foils or adhesive films, and metal foils may be appropriately laminated alone or in combination, and heated and pressed to produce multilayer printed wiring boards. it can. In the production of these prepregs, laminates, resin-coated copper foils, adhesive films, and printed wiring boards, ordinary coating, lamination, and circuit processing steps in the industry can be applied.
以下、実施例及び比較例により、本発明をさらに具体的に説明するが、本発明はこれらの実施例に制限するものではない。実施例及び比較例において配線板材料は下記のものを用いた。
(プリプレグ:日立化成工業株式会社製)
・GEA−67BE(JAJH) 比誘電率4.9(1MHz) 公称厚 0.1mm 本文略称JAJH
・GEA−67BE(JRPJ) 比誘電率4.9(1MHz) 公称厚 0.06mm 本文略称JRPJ
EXAMPLES Hereinafter, although an Example and a comparative example demonstrate this invention further more concretely, this invention is not restrict | limited to these Examples. In the examples and comparative examples, the following wiring board materials were used.
(Prepreg: made by Hitachi Chemical Co., Ltd.)
・ GEA-67BE (JAJH) Relative permittivity 4.9 (1 MHz) Nominal thickness 0.1 mm Text abbreviation JAJH
・ GEA-67BE (JRPJ) Relative permittivity 4.9 (1 MHz) Nominal thickness 0.06 mm Abbreviated text JRPJ
(樹脂付銅箔:日立化成工業株式会社製)
絶縁層厚 20μm 使用銅箔 ロープロファイル箔 12μm
・MCF−HD−45 比誘電率 45(1MHz) 本文略称 HD45
・MCF−HD−30 比誘電率 30(1MHz) 本文略称 HD30
・MCF−HD−20 比誘電率 20(1MHz) 本文略称 HD20
・MCF−7000LX 比誘電率 2.8(1MHz) 本文略称 7000LX
(Copper foil with resin: manufactured by Hitachi Chemical Co., Ltd.)
Insulation layer thickness 20μm Copper foil Low profile foil 12μm
MCF-HD-45 Relative permittivity 45 (1 MHz) Text abbreviation HD45
MCF-HD-30 Relative permittivity 30 (1 MHz) Text abbreviation HD30
・ MCF-HD-20 Relative permittivity 20 (1MHz) Text abbreviation HD20
-MCF-7000LX Relative permittivity 2.8 (1MHz) Text abbreviation 7000LX
実施例1〜6、比較例1〜5
表1に示す構成で各種材料を重ね合わせた後、真空度40hPa、熱板温度185℃及び製品圧力3MPaの条件で80分間加熱加圧成形して評価基板を作製した。ただし、評価基板の構成上、樹脂付銅箔を複数積層するために、層間に銅が入る可能性がある場合は、1度、銅箔が最外層になる構成までプレスし、銅箔をエッチング除去して樹脂のみとした後、さらに外層部分を積層し加熱加圧成形した。また、表1に示す材料を重ね合わせた積層体が最外層に銅箔を有しない場合には、最外層に銅箔を積層して評価基板とした。銅箔としては、厚み12μmの銅箔(古河サーキットフォイル株式会社製、F2−WS)を用いた。
誘電率の測定は、JIS法とトリプレート法によって実施した。JIS法では、1MHzの誘電特性を測定し、トリプレート法では、1,3,5GHzの誘電特性を測定した。JIS法の測定は、次の手順で実施した。JIS C6481 1996に準拠し,主電極直径30mm,常態,1MHzの条件で,LCRメーター(日本ヒューレットパッカード製4284A)にて測定した。
Examples 1-6, Comparative Examples 1-5
After superimposing various materials with the structure shown in Table 1, an evaluation substrate was produced by heating and pressing under conditions of a degree of vacuum of 40 hPa, a hot plate temperature of 185 ° C., and a product pressure of 3 MPa. However, due to the structure of the evaluation board, in order to stack multiple copper foils with resin, if there is a possibility that copper may enter between the layers, press once until the copper foil becomes the outermost layer and etch the copper foil After removing the resin alone, the outer layer portion was further laminated and heated and pressed. Moreover, when the laminated body which laminated | stacked the material shown in Table 1 does not have copper foil in an outermost layer, copper foil was laminated | stacked on outermost layer and it was set as the evaluation board | substrate. As the copper foil, a copper foil having a thickness of 12 μm (F2-WS, manufactured by Furukawa Circuit Foil Co., Ltd.) was used.
The dielectric constant was measured by the JIS method and the triplate method. In the JIS method, the dielectric characteristics of 1 MHz were measured, and in the triplate method, the dielectric characteristics of 1, 3, 5 GHz were measured. The measurement of the JIS method was performed according to the following procedure. Based on JIS C6481 1996, measurement was performed with an LCR meter (4284A manufactured by Hewlett-Packard Japan) under the conditions of a main electrode diameter of 30 mm, normal state, and 1 MHz.
トリプレート法の測定は、次の手順で実施した。測定装置は、ベクトル型ネットワークアナライザ(日本ヒューレットパッカード製のHP−8722C)を用い、トリプレート構造直線線路共振法によって測定した。測定用のサンプルの作製は、次の手順で行った。 The measurement of the triplate method was performed according to the following procedure. The measurement apparatus was a vector type network analyzer (HP-8722C manufactured by Hewlett-Packard Japan) and measured by a triplate structure linear line resonance method. The sample for measurement was produced by the following procedure.
先ず、1枚の積層板(上記の評価基板)の片面の銅箔を0.8mmの直線線路(ライン長20mm)を残して除去し、裏面は全面に銅を残しグランド層とした。もう1枚の積層板は片面の銅箔を全面エッチングし、裏面はグランド層とした。ついで、これら2枚の積層板のグランド層を外側にして重ね合わせストリップ線路とし、これを試験片とした。なおいずれの測定も25℃で行った。 First, the copper foil on one side of one laminated board (the above-mentioned evaluation board) was removed leaving a 0.8 mm straight line (line length 20 mm), and the back surface was used as a ground layer leaving copper on the entire surface. The other laminated plate was etched on the entire surface of one side of the copper foil, and the back surface was a ground layer. Then, the ground layer of these two laminates was placed outside to form a superposed strip line, which was used as a test piece. All measurements were performed at 25 ° C.
表1に示されるように、実施例1〜6と比較例1〜5より、単純に比誘電率の異なる有機絶縁材料を組合わせることによって、異なる比誘電率を有する基材を製造できることが明らかである。 As shown in Table 1, it is clear from Examples 1-6 and Comparative Examples 1-5 that base materials having different relative dielectric constants can be produced by simply combining organic insulating materials having different relative dielectric constants. It is.
また、実施例1及び2の試験結果から、導体に接する部分の材料の層の厚さを調整することで、比誘電率が異なる基材を製造することが出来ることが明らかである。さらに、実施例1と実施例6を比較することにより、同じ材料を用いても、導体と接する絶縁層に特徴的な比誘電率の材料、つまり、導体層と接しない絶縁層の比誘電率の2倍以上又は3/4倍以下である絶縁層を使用した場合は、その効果が高いことが確認できた。
詳細には、実施例1と実施例6において、全体の比誘電率を測定するJIS法では、同じ値となったが、トリプレート法では違いが生じた。トリプレート法は、電流や信号の流れる場合の材料の影響をより正確に測定できていると考えられ、実際の電気・電子回路を作製した際の、電気信号の絶縁材料から受ける影響をJIS法よりも正確に表していると考えられる。つまり、全体としては、同じとして測定される比誘電率であっても、導体に接する部分に特徴的な比誘電率の材料を使用する場合、その効果が非常に高いことが確認できた。
From the test results of Examples 1 and 2, it is clear that substrates having different relative dielectric constants can be manufactured by adjusting the thickness of the material layer in contact with the conductor. Further, by comparing Example 1 and Example 6, even if the same material is used, a material having a relative dielectric constant characteristic of the insulating layer in contact with the conductor, that is, a relative dielectric constant of the insulating layer not in contact with the conductor layer It was confirmed that the effect was high when an insulating layer that was 2 times or more or 3/4 times or less of the above was used.
Specifically, in Example 1 and Example 6, the same value was obtained in the JIS method for measuring the entire relative dielectric constant, but a difference occurred in the triplate method. The triplate method is considered to be able to more accurately measure the influence of materials when current and signals flow. The JIS method determines the influence of electrical signals on insulating materials when manufacturing actual electrical and electronic circuits. More accurately. That is, as a whole, even when the relative permittivity is measured as the same, it has been confirmed that the effect is very high when a material having a characteristic relative permittivity is used for the portion in contact with the conductor.
本発明によれば、導体に接する部分に用いる材料の配置によって、比誘電率を所望の値に変更できる。かつ構成の一部にいわゆる一般的なFR−4用プリプレグなど、比較的安価な電気絶縁用積層材料を用いることで、製造コストの低減も可能である。よって、本発明の優位性は明らかである。 According to the present invention, the relative dielectric constant can be changed to a desired value by arranging the material used for the portion in contact with the conductor. In addition, it is possible to reduce the manufacturing cost by using a relatively inexpensive laminated material for electrical insulation such as a so-called general FR-4 prepreg as a part of the configuration. Therefore, the superiority of the present invention is clear.
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JPS5418885A (en) * | 1977-07-14 | 1979-02-13 | Fujitsu Ltd | Laminate sheet |
JPS6381139A (en) * | 1986-09-25 | 1988-04-12 | Mitsubishi Gas Chem Co Inc | Prepreg for bonding |
JPH01141043A (en) * | 1987-11-27 | 1989-06-02 | Hitachi Chem Co Ltd | Production of laminates |
JPH0424996A (en) * | 1990-05-15 | 1992-01-28 | Matsushita Electric Works Ltd | Manufacture of multilayer printed board |
JPH07232403A (en) * | 1994-02-23 | 1995-09-05 | Matsushita Electric Works Ltd | Manufacture of metal clad laminated sheet |
JPH0890713A (en) * | 1994-09-22 | 1996-04-09 | Matsushita Electric Works Ltd | Production of metal clad laminated sheet |
JP2001347600A (en) * | 2000-06-06 | 2001-12-18 | Matsushita Electric Works Ltd | Laminated sheet |
JP2002248706A (en) * | 2001-02-23 | 2002-09-03 | Hitachi Chem Co Ltd | Metal-clad laminate |
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JPS5418885A (en) * | 1977-07-14 | 1979-02-13 | Fujitsu Ltd | Laminate sheet |
JPS6381139A (en) * | 1986-09-25 | 1988-04-12 | Mitsubishi Gas Chem Co Inc | Prepreg for bonding |
JPH01141043A (en) * | 1987-11-27 | 1989-06-02 | Hitachi Chem Co Ltd | Production of laminates |
JPH0424996A (en) * | 1990-05-15 | 1992-01-28 | Matsushita Electric Works Ltd | Manufacture of multilayer printed board |
JPH07232403A (en) * | 1994-02-23 | 1995-09-05 | Matsushita Electric Works Ltd | Manufacture of metal clad laminated sheet |
JPH0890713A (en) * | 1994-09-22 | 1996-04-09 | Matsushita Electric Works Ltd | Production of metal clad laminated sheet |
JP2001347600A (en) * | 2000-06-06 | 2001-12-18 | Matsushita Electric Works Ltd | Laminated sheet |
JP2002248706A (en) * | 2001-02-23 | 2002-09-03 | Hitachi Chem Co Ltd | Metal-clad laminate |
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