JP2013159787A - Cleaning method and device therefor - Google Patents

Abstract

PROBLEM TO BE SOLVED: To perform a corrosion prevention treatment on a surface of a metal strip and to enable removal of fine metal powder generated in a production process from the surface of the metal strip.SOLUTION: In a metal-surface cleaning method including an acid cleaning step of cleaning a metal surface with an acidic liquid, a buffing step of buffing the metal surface having been cleaned with an acid, a brush-cleaning step of cleaning the metal surface having been buffed with a brush, and a drying step of drying the metal surface having been cleaned with the brush, a liquid having a corrosion prevention effect is used in the brush-cleaning step as a cleaning liquid for cleaning the metal surface having been buffed with the brush, so as to make fine metal powder adhering to the metal surface easier to wash off upon cleaning the metal surface than when not using the liquid having a corrosion prevention effect, and a corrosion prevention treatment is applied to the metal surface activated by the buffing.

Description

  The present invention relates to a method and apparatus for cleaning the surface of a metal material of a strip, and more particularly to a cleaning method and apparatus for cleaning while applying a rust preventive agent that prevents oxidation of the metal surface after cleaning.

  Japanese Patent Application Laid-Open No. 2006-247740 (Patent Document 1) describes performing rust prevention treatment while wiping off fine particles adhering to the surface of copper or a copper alloy sheet. In this patent document 1, in the column of the subject of summary, while performing an organic compound rust prevention treatment for copper or a copper alloy sheet, green powder is prevented from accumulating on the wiping pad during pressing. Thus, the object is to provide a copper or copper alloy strip that can improve press productivity while preventing discoloration and preventing corrosion. " Further, in the column of the summary solution, “a copper or copper alloy sheet having an organic compound rust preventive film that reacts with copper to form a carboxylate on the surface, and is a base material of copper or copper alloy” The half-value width of the frequency distribution diagram in the measurement of the three-dimensional surface roughness of the strip is 0.2 μm or more, and suppresses unevenness of the unevenness existing on the surface of the copper or copper alloy strip. The friction or wear between the surface of the alloy strip and the wiping pad is reduced, and green powder is prevented from accumulating on the wiping pad. "

  Also, when removing fine particles adhering to the surface of the sample by cleaning, controlling the surface potential (zeta potential) of the fine particles adhering to the sample surface in the cleaning solution to make the particles easily peel off from the sample surface. JP-A-6-132267 (Patent Document 2).

JP 2006-247740 A JP-A-6-132267

  Patent Document 1 describes that “green powder adheres to and accumulates on a wiping pad because copper having carboxylate attached to the surface of copper or a copper alloy strip is peeled off”. Yes. Furthermore, “the unevenness of the copper or copper alloy sheet as the base material is controlled. Thereby, the wiping pad (wiping cloth) and the copper or copper alloy used in the wiping operation of the copper or copper alloy sheet in the press working. It is suggested that friction or wear with the plate surface be reduced.

  However, in the said patent document 1, it is not considered about copper powder other than the green powder which peels by the friction or abrasion between a wiping pad and copper or a copper alloy sheet surface.

  On the surface of the metal strip including copper or copper alloy, metal fine powder may be generated during the manufacturing process. For example, metal fine powder may be generated in plastic processing processes such as rolling and wire drawing, and surface processing processes such as grinding and buffing. In particular, in the surface processing step by buffing, metal fines are often generated and may reattach to the surface of the metal plate.

  After surface processing steps such as grinding and buffing, cleaning is performed to remove metal fines. However, when the cleaning is insufficient, the metal fine powder remains and adheres to the surface of the metal plate. Since the metal fine powder remaining and adhered to the surface of the metal plate is also deposited on the wiping pad at the time of press working, for example, a cleaning method capable of removing a large amount of metal fine powder generated by buffing is necessary.

  Patent Document 2 describes that the surface potential of the fine particles attached to the surface of the sample in the cleaning liquid is controlled so that the fine particles are easily peeled off from the sample surface, but the surface is activated by buffing. There is no mention of applying a rust-proofing treatment to a metal surface in a finished state.

  The present invention solves the above-described problems of the prior art, and provides a cleaning method and apparatus capable of rust-proofing the surface of a metal plate and removing metal fines generated during the manufacturing process from the surface of the metal plate. It is to provide.

  In order to solve the above-described problems of the prior art, the present invention provides a method for cleaning a metal surface, which includes an acid cleaning step for cleaning the metal surface with an acidic liquid, and a buffer for cleaning the surface of the acid cleaned metal. A buffing step for polishing, a brush cleaning step for cleaning the surface of the buffed metal with a brush, and a drying step for drying the surface of the metal cleaned with the brush, and the surface of the metal buffed in the brush cleaning step By using a liquid that has a rust-preventing effect as a cleaning liquid for cleaning with a brush, the metal surface adhered to the metal surface by cleaning the metal surface compared to the case where a liquid having a rust-preventing effect is not used The surface of the metal activated by the buffing was made to be easily washed and rust-proofed.

  Further, in order to solve the above-described problems of the prior art, the present invention provides a method for cleaning a metal surface, an acid cleaning step for cleaning the metal surface with an acidic liquid, and an acid cleaned metal surface. A buffing process for buffing, a brush cleaning process for cleaning the buffed metal surface with a brush, and a drying process for drying the brush-washed metal surface. In the buffing process, the metal surface is buffed. By using a liquid having a rust preventive effect as a polishing liquid when polishing, the metal surface buffed and subjected to a rust preventive treatment on the metal surface activated by buff polishing, and further adhered to the metal surface The metal fine particles were made easier to wash away than when a liquid having an antirust effect was not used.

  Furthermore, in order to solve the above-described problems of the prior art, in the present invention, an apparatus for cleaning a metal surface includes an acid cleaning means for cleaning the metal surface with an acidic liquid, and a buffer for the surface of the acid cleaned metal. Buffing means for polishing, brush cleaning means for cleaning the surface of the metal buffed with a brush, and drying means for drying the surface of the metal cleaned with the brush. A brush for cleaning the surface of the metal buffed with a cleaning liquid and a cleaning liquid supply nozzle for supplying the cleaning liquid between the brush and the metal surface. By supplying the metal surface, the metal particles adhered to the metal surface can be easily washed out compared with the case where a liquid having an anticorrosive effect is not used, and buffing is performed. It was such as to carry out anti-rust treatment to the activatable surface of the metal.

  Furthermore, in order to solve the above-described problems of the prior art, in the present invention, an apparatus for cleaning a metal surface includes an acid cleaning means for cleaning the metal surface with an acidic liquid, and a buffer for the surface of the acid cleaned metal. A buffing means for polishing, a brush cleaning means for cleaning the surface of the buffed metal with a brush, and a drying means for drying the surface of the metal subjected to the brush cleaning. A buffing part for buffing and a polishing liquid supply nozzle part for supplying a polishing liquid are supplied, and a liquid having a rust prevention effect is supplied between the buffling part and the metal surface as a polishing liquid from the polishing liquid supply nozzle part. By buffing the surface of the metal while supplying the polishing liquid from the polishing liquid supply nozzle, the metal surface activated by the buff polishing is subjected to rust prevention treatment, and the metal fine particles generated by the buff polishing It was to buffing while as compared with the case of not using a liquid having a rustproof effect was less likely to adhere to the surface of the metal.

  ADVANTAGE OF THE INVENTION According to this invention, the washing | cleaning method which can remove the metal fine powder generate | occur | produced in the manufacturing process of a metal plate is provided. For example, a cleaning method capable of removing a large amount of fine metal powder generated by buffing is provided.

It is a block diagram which shows the structure of the washing | cleaning apparatus based on 1st Example of this invention. It is a block diagram which shows the structure of the washing | cleaning apparatus based on 2nd Example of this invention.

  In the process of manufacturing a strip steel material, an example of a method for reducing the cleaning residue and improving the surface quality of the strip steel material in the cleaning process after polishing the surface of the strip steel material with a buff will be described below with reference to the drawings. To do.

  In this embodiment, the active surface of the copper or copper alloy strip after buffing (hereinafter referred to as copper alloy strip) is prevented from being oxidized, and is produced by the copper alloy strip and buffing in the cleaning process. By controlling the surface potential (zeta potential) of the copper powder so that the surface potential of the copper powder is the same polarity and the difference is large (by increasing the absolute value of the surface potential of the copper powder), it was charged with the same polarity The copper powder was easily removed from the copper alloy strip. Thereby, the amount of copper powder generated by buffing adheres to the buffed copper alloy strip and remains as dirt is reduced.

  In this example, attention was paid to the fact that the treatment liquid for rust-proofing the surface of the copper alloy sheet has an action of controlling the surface potential (zeta potential) of the metal fine particles adhering to the surface of the copper alloy sheet. . The following three methods are conceivable as a method of controlling the surface potential (zeta potential) between the copper alloy sheet and the copper powder. (1) Rust prevention treatment is performed before buffing. (2) Rust prevention treatment is performed immediately after buffing. (3) Washing is performed in a rust-proofing solution after buffing.

  In Example 1, a method for performing cleaning in the antirust treatment liquid after the buffing in the above (3) will be specifically described.

Below, the example which uses a rust preventive as the brush washing | cleaning liquid 44 when removing the fine powder of the copper alloy sheet | seat adhering to the copper alloy sheet | seat by a brush cleaning by a present Example is demonstrated.
FIG. 1 is an example of a cleaning apparatus 100 which is a part of the configuration of a copper alloy sheet production line based on this embodiment. That is, in FIG. 1, as a part of the copper alloy sheet production line, deposits adhered to the upper and lower surfaces of the copper alloy sheet 10 formed through the process of forming a copper alloy sheet not shown. Acid cleaning means 20 for acid cleaning with an acidic liquid, buff polishing means 30 for buffing the upper and lower surfaces of the acid-washed copper alloy strip 10, and upper and lower surfaces of the buffed copper alloy strip 10 A brush cleaning means 40 for brush cleaning and a drying means 50 for drying the copper alloy sheet 10 whose upper and lower surfaces are brush-cleaned are sequentially arranged. In this embodiment, the cleaning apparatus 100 includes the acid cleaning means 20, the buff polishing means 30, the brush cleaning means 40, and the drying means 50. Below, the structure and effect | action of each means which comprise the washing | cleaning apparatus 100 are demonstrated.

  The acid cleaning means 20 is provided with an acid cleaning tank 21. The acid cleaning tank 21 is filled with an acid cleaning liquid 22 composed of 5 wt% sulfuric acid, 2 wt% hydrogen peroxide, and the remaining water in order to dissolve deposits adhering to the upper and lower surfaces of the copper alloy sheet 10 with an acidic liquid. Yes. The acid cleaning liquid 22 is circulated by an acid cleaning liquid circulation pipe (not shown) and an acid cleaning liquid circulation pump (not shown). The acid cleaning tank 21 is provided with a heater (not shown) for heating the acid cleaning liquid 22 and an acid cleaning liquid temperature controller (not shown) for controlling the heater. The acid cleaning liquid 22 is maintained at a liquid temperature of about 30 ° C. Yes.

  The buffing means 30 is provided with baffles 31 for buffing the upper and lower surfaces of the copper alloy sheet 10 respectively. A back-up roll 32 for buffling is provided on the opposite surface of the buffling 31 with the copper alloy sheet 10 interposed therebetween. A buffing polishing liquid supply nozzle 35 for supplying a buffing polishing liquid 34 to the copper alloy sheet 10 and the baffle 31 is provided on the upstream side and the downstream side of the buffling 31, respectively. The buff polishing liquid 34 is sent out from a buff polishing liquid tank (not shown) by a circulation pump (not shown), passes through a buff polishing liquid pipe (not shown), and is supplied from the buff polishing liquid supply nozzle 35 to the copper alloy strip 10 and the baffle. 31. After buffing, the buffing liquid 34 is returned to a buffing liquid tank (not shown) by a buffing liquid recovery pipe (not shown). Ion exchange water is used as the buff polishing liquid 34.

  The brush cleaning means 40 is provided with brush rolls 41 for brush cleaning the upper and lower surfaces of the copper alloy sheet 10. A brush roll backup roll 42 is provided on the opposite surface of the brush roll 41 across the copper alloy strip 10. A brush cleaning liquid supply nozzle 45 for supplying the brush cleaning liquid 44 to the copper alloy sheet 10 and the brush roll 41 is provided on the downstream side of the brush roll 41. The brush cleaning liquid 44 is fed from a cleaning liquid tank (not shown) by a circulation pump (not shown), and supplied to the copper alloy sheet 10 and the brush roll 41 from the brush cleaning liquid supply nozzle 45 through a cleaning liquid pipe (not shown). . The brush cleaning liquid 44 after the brush cleaning is returned to a brush cleaning liquid tank (not shown) by a brush cleaning liquid recovery pipe (not shown). A brush cleaning liquid tank (not shown) is provided with a heater (not shown) for heating the brush cleaning liquid and a brush cleaning liquid temperature controller (not shown) for controlling the heater, and the brush cleaning liquid 44 is maintained at a liquid temperature around 50 ° C. Has been. As the brush cleaning solution 44, a 0.2 wt% aqueous solution of benzotriazole having a rust preventive effect for copper alloy strips is used.

  A pair of air nozzles 51 is disposed inside the drying means 50, and air 52 heated to a high temperature and dried from the pair of air nozzles 51 is blown onto the copper alloy strip 10 that has been brush-washed. The copper alloy strip 10 is continuously sent out at a constant speed in a state where air heated to a high temperature dried on both the upper and lower surfaces is blown from a pair of air nozzles 51, and the cleaning liquid adhering to the upper and lower surfaces is evaporated by brush cleaning. And dried.

  The copper alloy strip 10 is continuously delivered at a constant speed by a dispenser (not shown), and the copper alloy strip 10 is immersed in the acid cleaning solution 22 inside the acid cleaning means 20. The upper and lower surfaces are acid-washed by the acid washing liquid 22 by continuously passing through the nozzle at a constant speed.

  Next, the copper alloy strip 10 that has been subjected to the acid cleaning by passing through the acid cleaning means 20 is sent to the buff polishing means 30 and continuously supplied at a constant speed with the polishing liquid 34 supplied from the polishing liquid supply nozzle 35. The upper and lower surfaces are buffed by a baffle 31 that is driven to rotate by a drive unit (not shown) while moving to the position.

  The copper alloy strip 10 buffed by passing through the buffing means 30 is sent to the brush cleaning means 40, and the brush cleaning liquid 44 is supplied from the supply nozzle 45 disposed downstream in the brush cleaning means 40. The upper and lower surfaces are brush-cleaned by a brush roll 41 that is driven to rotate by a drive unit (not shown) while continuously moving at a constant speed in the state.

  Next, the copper alloy strip 10 that has passed the brush cleaning means 40 and is brush-cleaned is dried by the drying means 50 and then wound by a winder (not shown).

  The amount of copper alloy fine powder adhering to the surface of the copper alloy sheet 10 when the copper alloy sheet 10 is cleaned with the cleaning apparatus 100 shown in FIG. It was measured.

First, the upper and lower surfaces of the copper alloy sheet 10 are buffed by the buffing means 30 and the surface of the copper alloy sheet 10 before being brush-washed by the brush cleaning means 40 is wiped off using a cloth with a width of 0.1 m. 100 m was wiped off in the direction of travel. The amount of copper alloy fine powder adhering to the wiping cloth was measured with a fluorescent X-ray measuring apparatus System 3272 manufactured by Rigaku. The measurement results were semi-quantitatively analyzed by the FP (Fundamental Parameter) method. The result of semi-quantitative analysis at this time was defined as an adhesion amount A (unit: μg / cm ² ) before washing.

Next, the upper and lower surfaces are buffed by the buffing means 30, brush cleaned by the brush cleaning means 40, and the surface of the copper alloy sheet 10 dried by the drying means 50 is wiped with a width of 0.1 m using a cloth. 100 m was wiped off in the traveling direction of the copper alloy sheet. The amount of copper alloy fine powder adhering to the wiping cloth was measured with a Rigaku fluorescent X-ray measuring apparatus. The measurement results were semi-quantitatively analyzed by the FP method. The semi-quantitative analysis result at this time was defined as an adhesion amount B (unit: μg / cm ² ) after washing.
From the adhesion amount A before washing and the adhesion amount B after washing, the fine powder removal rate (unit%) was determined by the following (Equation 1).

Fine powder removal rate (%) = 100 × (A−B) / A (Equation 1)
Table 1 shows the results when a benzotriazole 0.2 wt% aqueous solution is used as the brush cleaning liquid 44 used in the brush cleaning apparatus (this example) and when ion-exchanged water is used as a comparative example. The evaluation was performed twice each.

  As is clear from Table 1, the fine powder removal rates when using a 0.2 wt% benzotriazole aqueous solution as the brush cleaning liquid 44 were 93% and 95%. On the other hand, when using ion-exchanged water as the brush cleaning liquid 44 as a comparative example, the fine powder removal rates were 75% and 77%. The fine powder removal rate when a 0.2 wt% benzotriazole aqueous solution is used as the brush cleaning liquid 44 is about 20% higher than when the ion-exchanged water is used as the brush cleaning liquid 44. It became clear that the removal rate of fine powder adhering to the copper alloy sheet was improved by using a 2 wt% aqueous solution.

  That is, the 0.2 wt% benzotriazole aqueous solution used as the brush cleaning solution 44 has a function as a rust preventive agent, and at the same time, copper alloy fine particles and copper generated by buffing adhered to the copper alloy strip after buffing. It can be seen that it also has a function of controlling the surface potential (zeta potential) with the alloy strip to easily wash away the copper alloy fine particles adhering to the copper alloy strip.

  The benzotriazole aqueous solution supplied as the brush cleaning solution 44 is not limited to the concentration shown in the present embodiment, and a solution diluted to a generally used concentration is preferably used. Moreover, it is not limited to aqueous solution, What was diluted with solvents, such as alcohol, is used suitably. Furthermore, those added with additives such as amine solvents and glycol solvents are also preferably used.

  The liquid temperature of the brush cleaning liquid 44 is not limited to the temperature shown in the present embodiment, and generally used liquid temperature is preferably used.

  Further, the brush cleaning liquid 44 is not limited to benzotriazole, and those that form a film on the surface of the copper alloy strip such as benzotriazole derivatives and thiazole and derivatives thereof, imidazole and derivatives thereof are also preferably used. Furthermore, those added with additives such as amine solvents and glycol solvents are also preferably used.

  A foreign substance removing means (not shown) such as a filter can be installed in the middle of the acid cleaning liquid circulation pipe (not shown).

  A foreign substance removing means (not shown) such as a filter can be installed in the buff polishing liquid pipe (not shown) and / or the buff polishing liquid recovery pipe (not shown) and / or the buff polishing liquid tank (not shown).

  A foreign substance removing means (not shown) such as a filter may be installed in the brush cleaning liquid pipe (not shown) and / or the brush cleaning liquid recovery pipe (not shown) and / or the brush cleaning liquid tank (not shown).

In the present embodiment described above, the surface potential of the copper alloy fine particles and the copper alloy sheet generated by the buffing that adheres to the copper alloy sheet after the buffing using the rust inhibitor as the brush cleaning liquid 44. Although the example which wash | cleans the copper alloy fine particle adhering to a copper alloy sheet strip by controlling is demonstrated, you may provide the means which performs a rust prevention process separately. That is, between the acid cleaning means 20 and the buff polishing means 30 described in (1) above, or between the buff polishing means 30 and the brush cleaning means 40 described in (2) above, or between the brush cleaning means 40 and the drying. An antirust treatment means may be provided between the means 50 and the upper and lower surfaces of the copper alloy sheet 10 may be antirust treated.
The type, composition, and temperature of the rust preventive liquid are not particularly defined, and generally used rust preventive liquids can be suitably used. Moreover, the same kind, composition, and temperature as the brush cleaning liquid 44 can be used as the rust preventive liquid. Different types, compositions and temperatures can also be used.

  In this embodiment, an example will be described in which fine powder of a copper alloy sheet adhering to a copper alloy sheet is removed by brush cleaning after buffing using a rust preventive liquid as the buffing liquid 34.

  FIG. 2 shows a configuration of a cleaning apparatus 200 for carrying out the second embodiment. The configuration of the cleaning apparatus 200 shown in FIG. 2 is basically the same as the configuration of the cleaning apparatus 100 shown in FIG. Means 300, brush cleaning means 400, and drying means 50 are provided. The description of the components having the same functions as those shown in FIG. 1 already described with reference to FIG. 1 is omitted.

  In this embodiment, the cleaning apparatus 200 includes the acid cleaning means 20, the buff polishing means 300, the brush cleaning means 400, and the drying means 50. Below, the structure and effect | action of each means which comprise the washing | cleaning apparatus 200 are demonstrated.

  In the buff polishing means 300, the buff polishing liquid 340 is sent out from a buff polishing liquid tank (not shown) by a circulation pump (not shown), passes through a cleaning liquid pipe (not shown), and is supplied from the buff polishing liquid supply nozzle 350 to the copper alloy plate. Supplied to the strip 10 and the bafrol 31. The buffing liquid 340 after buffing is returned to a buffing liquid tank (not shown) by a buffing liquid recovery pipe (not shown). The buff polishing liquid tank (not shown) is provided with a heater (not shown) for heating the buff polishing liquid 340 and a buff polishing liquid temperature controller (not shown) for controlling the heater. It is kept at around 50 ° C. A benzotriazole 0.2 wt% aqueous solution used as a rust preventive solution for a copper alloy sheet is used as the buff polishing solution 340.

  In the brush cleaning means 400, ion-exchanged water is used as the brush cleaning liquid 440.

  The copper alloy sheet 10 is sent out by a dispenser (not shown), and the upper and lower surfaces are acid cleaned by the acid cleaning means 20. Next, the upper and lower surfaces are buffed by the buffing means 300 and brush-washed by the brush cleaning means 400. Next, after drying by the drying means 50, it is wound up by a winder (not shown).

  The measuring method of the adhesion amount of the fine powder of the copper alloy adhering to the surface of the copper alloy sheet 10 when the copper alloy sheet 10 is cleaned by the cleaning device 200 based on the present embodiment is the method shown in the first embodiment. It is the same.

  Table 2 shows the results when a 0.2 wt% benzotriazole aqueous solution is used as the buffing polishing liquid 340 and when ion exchange water is used as a comparative example. The evaluation was performed twice each.

  As is apparent from Table 2, when the benzotriazole 0.2 wt% aqueous solution was used as the buffing polishing liquid 340, the fine powder removal rates were 85% and 86%. On the other hand, the fine powder removal rates when using ion-exchanged water as the buffing polishing liquid 340 were 75% and 77%. The fine powder removal rate when a 0.2 wt% benzotriazole aqueous solution is used as the buffing polishing liquid 340 is about 10% higher than that when ion-exchanged water is used as the buffing polishing liquid 340. It has been clarified that the removal rate of fine powder adhering to the copper alloy strip by brush cleaning is improved by using a 0.2 wt% benzotriazole aqueous solution.

The benzotriazole aqueous solution supplied as the buff polishing liquid 340 is not limited to the concentration shown in the present embodiment, and a solution diluted to a generally used concentration is preferably used. Moreover, it is not limited to aqueous solution, What was diluted with solvents, such as alcohol, is used suitably. Furthermore, those added with additives such as amine solvents and glycol solvents are also preferably used.
The liquid temperature of the buffing liquid 340 is not limited to the temperature shown in the present embodiment, and a liquid temperature generally used is preferably used.

  Further, the buffing liquid 340 is not limited to benzotriazole, and those that form a film on the surface of the copper alloy plate such as benzotriazole derivatives and thiazole and derivatives thereof, imidazole and derivatives thereof are also preferably used. Furthermore, those added with additives such as amine solvents and glycol solvents are also preferably used.

A foreign substance removing means (not shown) such as a filter can be installed in the middle of the acid cleaning liquid circulation pipe (not shown).
A foreign substance removing means (not shown) such as a filter can be installed in the buff polishing liquid pipe (not shown) and / or the buff polishing liquid recovery pipe (not shown) and / or the buff polishing liquid tank (not shown).
Foreign matter removing means (not shown) such as a filter can be installed in the brush cleaning liquid pipe (not shown) and / or the brush cleaning liquid recovery pipe (not shown) and / or the brush cleaning liquid tank (not shown).

In this embodiment, a rust preventive means may be provided between the brush cleaning means 400 and the drying means 50 so that the upper and lower surfaces of the copper alloy sheet 10 after the brush cleaning are subjected to a rust preventive treatment. The type, composition, and temperature of the rust preventive liquid are not particularly defined, and generally used rust preventive liquids can be suitably used. Moreover, the same kind, composition, and temperature as the buffing polishing liquid 34 can be used as the rust preventive liquid. Different types, compositions and temperatures can also be used.
Further, by combining Example 2 and Example 1, a 0.2 wt% benzotriazole aqueous solution may be used for both the buffing liquid 340 of the buffing means 300 and the cleaning liquid 440 of the brush cleaning means 400. . By comprising in this way, a fine powder removal rate can be improved more.

Copper alloy strips include pure copper, beryllium copper, brass (copper and zinc alloy), bronze (copper and tin alloy), white (copper, zinc, nickel and manganese alloy), other copper and other metals These alloys can be suitably applied. It can also be applied to metal materials other than copper and copper alloys.
As a copper alloy strip, it can be used suitably also for a plate shape, a strip shape, a line shape, a rod shape, and the like.

  The metal plate-like cleaning method is not limited to brush cleaning. High-pressure cleaning using a high-pressure pump to discharge the cleaning liquid at high pressure, ultrasonic cleaning that collects the cleaning liquid in a tank and irradiates ultrasonic waves, and cleaning liquid Any cleaning method that removes foreign substances attached to the surface, such as ultrasonic spray cleaning that discharges by applying ultrasonic waves, wipe cleaning that wipes and cleans the surface of a metal strip with a nonwoven fabric or woven fabric, etc., can be suitably used. .

  In addition, this invention is not limited to an above-described Example, Various modifications are included. For example, the above-described embodiments have been described in detail for easy understanding of the present invention, and are not necessarily limited to those having all the configurations described. Further, a part of the configuration of one embodiment can be replaced with the configuration of another embodiment, and the configuration of another embodiment can be added to the configuration of one embodiment. Further, it is possible to add, delete, and replace other configurations for a part of the configuration of each embodiment. For example, it is possible to add a degreasing and cleaning means, omit the acid cleaning means, and omit the buffing means.

  Further, as a modification of the above-described embodiment, for example, rust prevention treatment is performed after acid cleaning, rust prevention treatment is performed before buffing, rust prevention treatment is performed after buffing, and prevention is performed before brush cleaning. It is also preferable to perform a rust prevention treatment after the brush cleaning.

  Further, the types, concentrations, and temperatures of the buffing liquid and the brush cleaning solution shown in the above-described embodiments are not necessarily limited to the above-described embodiments, and various types, concentrations, and temperatures are included.

DESCRIPTION OF SYMBOLS 10 ... Copper alloy strip 20 ... Acid cleaning means 21 ... Acid cleaning liquid 30, 300 ... Buff polishing means 31 ... Buffol 32 ... Backup roll for baffles 34, 340 ... Buff polishing liquid 35, 350 ... Buff polishing liquid supply nozzle 40, 400 ... Brush cleaning means 41 ... Brush roll 42 ... Brush roll backup roll 44,440 ... Brush cleaning liquid 45,450 ... Brush cleaning liquid supply nozzle 50 ... Drying means

Claims (11)

A method for cleaning a metal surface,
An acid cleaning step for cleaning the surface of the metal with an acidic liquid;
A buffing step of buffing the surface of the acid-washed metal;
A brush cleaning step of cleaning the surface of the buffed metal with a brush;
A drying step of drying the surface of the metal cleaned with the brush, and in the brush cleaning step, by using a liquid having a rust preventive effect as a cleaning liquid for cleaning the surface of the buffed metal with a brush. The metal surface adhering to the metal surface by washing the metal surface is more easily washed out than the case where the liquid having the antirust effect is not used, and the metal surface activated by the buffing is prevented. A cleaning method characterized by performing rust treatment.   By using a liquid having a rust preventive effect as a cleaning liquid for cleaning the buffed metal surface with a brush, a difference between the surface potential of the metal in the cleaning liquid and the surface potential of fine particles adhering to the surface of the metal 2. The cleaning method according to claim 1, wherein the brush cleaning is performed in a state where the fine particles adhering to the surface of the metal in the cleaning liquid are easily washed out in the cleaning liquid. A method for cleaning a metal surface,
An acid cleaning step for cleaning the surface of the metal with an acidic liquid;
A buffing step of buffing the surface of the acid-washed metal;
A brush cleaning step of cleaning the surface of the buffed metal with a brush;
A drying step of drying the surface of the metal subjected to the brush cleaning, and in the buffing step, a liquid having a rust-preventing effect is used as a polishing liquid when buffing the surface of the metal. The surface of the metal activated by buffing is subjected to rust prevention treatment, and the metal fine particles adhering to the surface of the metal are further washed away as compared with the case where the liquid having the rust prevention effect is not used. A cleaning method characterized by facilitating the cleaning.   By using a liquid having a rust prevention effect as a polishing liquid for buffing, the potential of the surface of the metal during the buffing and the surface potential difference of fine particles adhering to the surface of the metal are increased, The cleaning method according to claim 3, wherein the fine particles adhering to the surface of the metal in a polishing liquid are easily washed off.   The cleaning method according to claim 1, wherein the liquid having an antirust effect is an aqueous solution of benzotriazole.   The cleaning method according to any one of claims 1 to 4, wherein the liquid having the antirust effect has a liquid temperature maintained at around 50 ° C. An apparatus for cleaning a metal surface,
Acid cleaning means for cleaning the surface of the metal with an acidic liquid;
Buffing means for buffing the surface of the acid cleaned metal;
A brush cleaning means for cleaning the surface of the buffed metal with a brush;
Drying means for drying the surface of the metal cleaned with the brush, the brush cleaning means comprising: a brush for cleaning the surface of the metal buffed by the buffing means with a cleaning liquid; and the cleaning liquid with the brush. A cleaning liquid supply nozzle that is supplied between the surface of the metal and a liquid having a rust prevention effect as a cleaning liquid from the cleaning liquid supply nozzle, thereby cleaning the metal surface and adhering to the surface of the metal A cleaning apparatus that makes it easier to wash away the fine metal particles as compared with the case where the liquid having the antirust effect is not used, and performs antirust treatment on the surface of the metal activated by the buffing.   By supplying a liquid having a rust preventive effect as a cleaning liquid from the cleaning liquid supply nozzle, the surface potential difference between the surface of the metal in the cleaning liquid of the brush cleaning means and the fine particles attached to the surface of the metal is increased. 8. The cleaning apparatus according to claim 7, wherein the cleaning is performed with the brush in a state in which the fine particles adhering to the surface of the metal are easily washed out in the cleaning liquid supplied from the cleaning liquid supply nozzle. An apparatus for cleaning a metal surface,
Acid cleaning means for cleaning the surface of the metal with an acidic liquid;
Buffing means for buffing the surface of the acid cleaned metal;
A brush cleaning means for cleaning the surface of the buffed metal with a brush;
Drying means for drying the brush-washed metal surface, the buffing means having a buffling part for buffing the metal surface, and a polishing liquid supply nozzle part for supplying a polishing liquid, A liquid having an anticorrosive effect as a polishing liquid is supplied from the polishing liquid supply nozzle part between the buffling part and the metal surface, and the metal surface is buffed while supplying the polishing liquid from the polishing liquid supply nozzle part. By polishing, the surface of the metal activated by the buffing is subjected to rust prevention treatment, and the metal fine particles generated by the buffing are compared with the case where the liquid having the rust prevention effect is not used. A cleaning apparatus characterized by buffing in a state in which it is difficult to adhere to the surface.   By using a liquid having a rust-preventing effect as a polishing liquid from the polishing liquid supply nozzle part, the surface potential difference between the surface potential of the metal being buffed and the fine particles adhering to the surface of the metal is obtained by the buffling part. The cleaning apparatus according to claim 9, wherein the cleaning apparatus performs buffing in a state in which the metal fine particles generated by the buffing are less likely to adhere to the surface of the metal.   The cleaning apparatus according to claim 7, wherein the liquid having an antirust effect is an aqueous solution of benzotriazole.

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