JP2013158676A - Method for producing saturated gas-containing nano-bubble water - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a method for producing saturated gas-containing nano-bubble water, allowing continuous acquisition of constantly stable gaseous saturation nano-bubble water over a long period capable of being used for an electronic industry field such as a semiconductor or a liquid crystal by more stably producing particle-free and metal-free nano-bubble water and controlling a nano-bubble amount.SOLUTION: Pure water is deaerated to generate deaerated pure water, the deaerated pure water is led to a positive electrode chamber and/or a negative electrode chamber of an electrolytic bath electrolyzing pure water to generate gas generation pure water, the current of the electrolytic bath is controlled in a gas generation pure water process, and the pressure of the gas generation pure water having passed through the gas generation pure water process is reduced to generate saturated gas-containing nano-bubble water.

Description

  The present invention relates to a method of producing saturated gas-containing nanobubble water that generates nanobubble water from gas-containing pure water, and more specifically, particle-free and metal-free nanobubble water is more stably produced, and the amount of nanobubbles Further, the present invention relates to a method for producing saturated gas-containing nanobubble water that can be used in the electronic industry field including semiconductors and liquid crystals by controlling the pressure of the gas-containing pure water.

  Conventionally, APM (ammonia, hydrogen peroxide) has been used for particle removal in the electronics industry. However, in recent years, cleaning has been performed by using hydrogen water obtained by dissolving hydrogen gas in pure water and applying megasonic to it.

  However, in recent years, for example, in the manufacture of semiconductors, as the line width of a circuit pattern is narrowed and the aspect ratio is increased, the circuit pattern is distorted by megasonics.

  Therefore, the current situation is that the output of Megasonic is reduced as an emergency response.

  As another method, for example, cleaning using a two-fluid jet or the like is experimentally performed, but it is difficult to stably output two fluids of gas and water from a jet nozzle.

  In addition, it is difficult to obtain a particle removal effect compared to conventional hydrogen water and megasonic.

  For this reason, it is conceivable to wash using nanobubble water. For example, a technology for producing water in which microbubbles containing hydrogen are stably dispersed without the need for ultrasonic energy as a production of nanobubble water (patent) Document 1), and a technique for generating microbubbles by sending a water flow and gas into a pipe in which a physical obstacle is set using a pressure pump and forcibly mixing the pressure (Patent Document 2) ~ 5).

JP 2009-195889 A Japanese Patent No. 3043315 Japanese Patent Laid-Open No. 2001-300522 JP 2004-073953 A JP 2005-245817 A

  The present invention solves the above-mentioned problems of the prior art, can obtain the effect of particle removal, and is a saturated gas capable of obtaining gas-saturated nanobubble water that is continuous for a long period of time and always stable. It aims at providing the manufacturing method of containing nano bubble water.

  In order to solve the above-described problems and achieve the object, the present invention is configured as follows.

  The invention described in claim 1 includes a degassing step of degassing pure water to produce degassed pure water, an anode chamber of an electrolytic cell obtained by electrolyzing the degassed pure water, and / Or a gas generation pure water step which leads to the cathode chamber to be a gas generation pure water, a current control step for controlling an electric current of an electrolytic cell in the gas generation pure water step, and the gas generation through the gas generation pure water step And a nanobubble generating step of generating saturated gas-containing nanobubble water by reducing the pressure of pure water.

  The invention according to claim 2 is the method for producing saturated gas-containing nanobubble water according to claim 1, wherein the specific resistance of the gas-generated pure water is reduced before the nanobubble generation step.

  The invention according to claim 3 is characterized in that the specific resistance of the gas-generated pure water is reduced by reducing the specific resistance by injecting at least acid or alkali and controlling the degree of reduction of the specific resistance. The method for producing saturated gas-containing nanobubble water according to claim 2.

Invention of Claim 4 removes the gaseous component in pure water from the pure water by making the said deaeration process into a deaeration state in one side and a deaeration state in the other through a film | membrane,
It is led to the space of a deaeration state through the said film | membrane, It is a manufacturing method of saturated gas containing nano bubble water of Claim 1 characterized by the above-mentioned.

  According to a fifth aspect of the present invention, the electrolytic cell in the gas generation pure water step is an electrolytic cell that generates oxygen gas and / or ozone gas from the anode and hydrogen gas from the cathode, and is an electrode that leads to the nanobubble generation step. The method for producing saturated gas-containing nanobubble water according to claim 1, wherein the water pressure in the polar chamber that is not led to the nanobubble generation step is made lower than the water pressure in the chamber.

  The invention according to claim 6 is the saturated gas-containing nanobubble according to claim 1, wherein the electrolytic cell in the gas generation pure water step also passes through the polar chamber not led to the nanobubble generation step. It is a manufacturing method of water.

  In the invention according to claim 7, in the current control step, the gas pressure in the gas-generated pure water is a positive pressure, and at least the water pressure of the degassed pure water or the water pressure of the gas-generated pure water 2. The method for producing saturated gas-containing nanobubble water according to claim 1, wherein the electric current in the electrolytic cell is controlled so as to obtain a low gas pressure.

  According to an eighth aspect of the present invention, in the current control step, the gas pressure in the gas generation pure water is increased once at least to the water pressure of the degassed pure water or the water pressure of the gas generation pure water. 2. The method for producing saturated gas-containing nanobubble water according to claim 1, wherein the lowering is performed later.

  The invention according to claim 9 is characterized in that, in the nanobubble generation step, the pressure of the gas generation pure water that has passed through the gas generation pure water step is reduced via pores of 1 micron or less. It is a manufacturing method of the saturated gas containing nano bubble water of Claim 1.

  The invention according to claim 10 has a rectifying step of rectifying the gas-generated pure water via a pore of 1 micron or less between the gas-generated pure water step and the nanobubble generating step. It is a manufacturing method of the saturated gas containing nano bubble water of Claim 1 characterized by the above-mentioned.

  The invention according to claim 11 is characterized in that, between the gas generation pure water step and the nanobubble generation step, the pressure of the gas generation pure water is equal to or higher than the gas pressure controlled by the current of the electrolytic cell. 2. The method for producing saturated gas-containing nanobubble water according to claim 1, further comprising a water pressure adjusting step of controlling the gas so as to approach the water.

  In the invention of claim 12, the pressure of the degassed pure water is controlled by the current of the electrolytic cell at a pressure equal to or higher than the gas pressure controlled by the current of the electrolytic cell before the gas generation pure water step. The method for producing saturated gas-containing nanobubble water according to claim 1, further comprising a water pressure adjusting step for controlling the gas pressure so as to approach the gas pressure.

  The invention according to claim 13 is the method of producing saturated gas-containing nanobubble water according to claim 1, wherein the saturated gas-containing nanobubble water is used in the field of electronic industry including semiconductors and liquid crystals. is there.

  With the above configuration, the present invention has the following effects.

  According to the first aspect of the present invention, pure water is degassed to produce degassed pure water, and the degassed pure water is electrolyzed with pure water. It is possible to obtain the effect of particle removal by reducing the pressure of this gas generation pure water and generating saturated gas-containing nanobubble water, and continuously for a long period of time. Moreover, it is possible to obtain gas stable nanobubble water which is always stable.

  In the invention according to claim 2, by further reducing the specific resistance of gas generating pure water before the nano bubble generating step to generate saturated gas-containing nano bubble water, for example, by injecting alkali or the like, the ratio of pure water By reducing the resistance (increasing the pH), it is possible to obtain gas-saturated nanobubble water that is continuous for a long period of time and is always stable.

  In the invention according to claim 3, the specific resistance of the gas-generating pure water is reduced by reducing the specific resistance by injecting at least an acid or an alkali, and controlling the degree of reduction of the specific resistance. The contained nanobubble water can be increased and always stabilized.

  In the invention of claim 4, pure water is removed from one side through the membrane, and the gas component in the pure water is removed from the pure water through the other side. It can be led to a deaerated space with a certain structure.

  In the invention according to claim 5, the electrolytic cell is led to the nanobubble generation step from the water pressure of the polar chamber that leads to the nanobubble generation step by making the water pressure into an extreme chamber that is used as nanobubble water and an extreme chamber that is not used as nanobubble water. By reducing the water pressure in the non-polar chamber, it is possible to prevent gas generated in the polar chamber that is not used as nanobubble water from entering the polar chamber that is used as the nanobubble water of the counter electrode.

  In the invention according to claim 6, the electrolytic cell passes through the polar chamber that is not led to the nanobubble generation step, and also passes through the polar chamber that is not used as nanobubble water, so that it is not used as nanobubble water. It is possible to prevent the gas generated in step 1 from being carried over by the water (pure water) that has been passed through and mixing into the polar chamber used as the nanobubble water of the counter electrode.

  In the invention according to claim 7, the electrolytic cell is configured so that the gas pressure in the gas-generated pure water is a positive pressure and at least a gas pressure lower than the water pressure of the degassed pure water or the water pressure of the gas-generated pure water. By controlling this current, degassed pure water can be reliably made into gas-generated pure water.

  In the invention according to claim 8, the gas pressure in the gas-generated pure water is once increased by at least the water pressure of the degassed pure water or the water pressure of the gas-generated pure water, and then decreased. Gas-containing nanobubble water increases on the contrary, and it is always stable.

  In the ninth aspect of the present invention, the pressure of the gas-generated pure water that has passed through the gas-generated pure water step is reduced through pores of 1 micron or less, and saturated gas-containing nanobubble water is generated.

  In the invention according to claim 10, it is simple and easy by having a rectifying step for rectifying the gas-generated pure water via the pores of 1 micron or less between the gas-generated pure water step and the nanobubble generation step. Saturated gas-containing nanobubble water can be produced reliably.

  In the invention according to claim 11, between the gas generation pure water step and the nano bubble generation step, the pressure of the gas generation pure water is set to be close to the gas pressure at a gas pressure controlled by the current of the electrolytic cell. By controlling, saturated bubble-containing nanobubble water can be produced easily and reliably.

  In the twelfth aspect of the present invention, before the gas generation pure water step, the pressure of the degassed pure water is equal to or higher than the gas pressure controlled by the electrolyzer current and close to the gas pressure controlled by the electrolyzer current. By controlling in this way, saturated gas-containing nanobubble water can be produced easily and reliably.

  In the invention described in claim 13, the saturated gas-containing nanobubble water can be used in the electronic industry field including semiconductors and liquid crystals.

It is a conceptual diagram of 1st Embodiment of the manufacturing method of saturated gas containing nano bubble water. It is a conceptual diagram of 2nd Embodiment of the manufacturing method of saturated gas containing nano bubble water. It is a conceptual diagram of 3rd Embodiment of the manufacturing method of saturated gas containing nano bubble water.

  Hereinafter, an embodiment of a method for producing saturated gas-containing nanobubble water of the present invention will be described. The embodiment of the present invention shows the most preferable mode of the present invention, and the present invention is not limited to this.

[First Embodiment]
FIG. 1 is a conceptual diagram of a first embodiment of a method for producing saturated gas-containing nanobubble water. In the first embodiment, a degassing process A, a gas generation pure water process B, a current control process C, and a nanobubble generation process D are provided, and particle-free and metal-free nanobubble water is manufactured more stably. Manufactures nanobubble water containing saturated gas that can be used in the electronics industry including semiconductors and liquid crystals.

  That is, pure water is degassed via degassing step A to become degassed pure water, and degassed pure water is an electrolysis obtained by electrolyzing pure water in degassed pure water step B. It is led to a tank and used as gas generation pure water. In the gas generation pure water process B, the current of the electrolytic cell that controls the current of the electrolytic cell in the current control process C is controlled.

  The gas-generated pure water thus generated is decompressed in the nanobubble generation step D, and is generated as saturated gas-containing nanobubble water in which the supersaturated gas has become nanobubbles.

(Deaeration process A)
In the deaeration step A, the deaeration unit 10 generates pure water by deaeration of pure water. In the deaeration means 10, a membrane 12 is disposed in a deaeration case 11, and a weir plate 14 that forms a maze 13 is further disposed. In the deaeration case 11, an inlet 15 and an outlet 16 are formed. Pure water flows through the maze 13 from the inlet 15, and degassed pure water is discharged from the outlet 16. The deaeration means 10 removes the pure water from the pure water by placing the pure water on one side through the membrane 12 and the deaerated state on the other side. In this configuration, the pure water is degassed to generate degassed pure water. The pure water is removed from the pure water through the membrane 12 and the pure water is removed from the pure water through the membrane 12. It can be led to the state space.

  In a normal electrolytic cell, for example, in the case of hydrogen, the concentration dissolved in pure water is about 0.6 ppm. Saturation is 1.6 ppm, and nanobubble generation requires conditions for supersaturation, so the pure water introduced to the electrolytic cell is degassed. This is in accordance with Henry's law and dissolves according to the partial pressure of the gas, so the partial pressure of the existing gas of pure water led to the electrolytic cell is lowered.

(Gas production pure water process B)
In the gas generation pure water process B, the degassed pure water is led to the anode chamber 21 and / or the cathode chamber 22 of the electrolytic cell 20 obtained by electrolyzing the pure water, and used as gas generation pure water. That is, the degassed pure water is led to the anode chamber 21, led to the cathode chamber 22, or led to the anode chamber 21 and the cathode chamber 22. A power source 23 is connected to the electrolytic cell 20, and in the gas generation pure water process B, the current control device 24 controls the current of the electrolytic cell 20 in the current control process C.

  The electrolytic cell 20 in the gas generation pure water process B is an electrolytic cell that generates oxygen gas and / or ozone gas from the anode of the anode chamber 21 and hydrogen gas from the cathode of the cathode chamber 22. The water pressure in the polar chamber that is not led to the nanobubble generation step D is made lower than the water pressure in the chamber. The electrolyzer 20 has a polar chamber that is not used as nanobubble water and a polar chamber that is not used as nanobubble water as water pressure. By making it low, it can prevent that the gas generated in the polar chamber which is not used as nanobubble water mixes in the polar chamber used as the nanobubble water of the counter electrode.

  The electrolytic cell 20 in the gas generation pure water process B also passes through the polar chamber that is not led to the nanobubble generation process D. The electrolytic cell 20 also passes through the polar chamber that is not guided to the nanobubble generation step D, and also passes through the polar chamber that is not used as nanobubble water. Can be prevented from being mixed in the polar chamber used as the nanobubble water of the counter electrode.

  In the current control step C, the current in the electrolytic cell 20 is such that the gas pressure in the gas-generated pure water is positive and at least the gas pressure is lower than the water pressure of the degassed pure water or the water pressure of the gas-generated pure water. To control. In this way, by controlling the current in the electrolytic cell 20 by the current control device 24, the degassed pure water can be reliably converted into the gas-generated pure water.

  In the current control step C, the gas pressure in the gas-generated pure water is increased at least once until the water pressure of the degassed pure water or the water pressure of the gas-generated pure water is lowered. In this way, by controlling the gas pressure in the gas-generated pure water, the saturated gas-containing nanobubble water increases on the contrary and is always stable.

(Nano bubble generation process D)
In this nanobubble generation step D, the nanobubble generation means 40 reduces the pressure of the gas generation pure water that has passed through the gas generation pure water step B to generate saturated gas-containing nanobubble water. The nano-bubble generating means 40 has a filter 41, and the pressure of the gas-generated pure water is reduced through the pores of 1 micron or less of the filter 41, and the gas-generated pure water subjected to the gas-generated pure water step B is used. The pressure is reduced to produce saturated gas-containing nanobubble water. The pressure reducing structure of the nanobubble generating means 40 is characterized in that the pressure is reduced via the pores of 1 micron or less of the filter 41, and the pressure is reduced via the pores of 0.5 micron or less if possible.

[Second Embodiment]
FIG. 2 is a conceptual diagram through a rectification step and a water pressure adjustment step in the method for producing saturated gas-containing nanobubble water. As in the first embodiment, the second embodiment includes a deaeration process A, a gas generation pure water process B, a current control process C, and a nanobubble generation process D, and further includes a rectification process E, a water pressure It has adjustment process F.

  In the second embodiment, in order to generate more stable saturated gas-containing nanobubble water, the gas generation pure water is guided to the rectification step E and rectified by the rectification pure water with respect to the embodiment of FIG. Then, after adjusting the water pressure of the pure water in the water pressure adjusting step F to make the water pressure adjusted pure water, the pressure is reduced in the nano bubble generating step D, and the supersaturated gas is generated as nanobubble water containing saturated gas that has become nano bubbles. Is done.

(Rectification process E)
This rectification process E is provided between the gas generation pure water process B and the nanobubble generation process D, and the gas generation pure water is rectified by the rectification means 50 through holes of 1 micron or less. In the state where pure water is pressurized, the gas-generated pure water is not a bubble, so in order to generate nanobubbles uniformly in the nanobubble generation process, rectification is performed easily and reliably before that. Uniform nanobubbles can be generated.

(Water pressure adjustment process F)
This water pressure adjustment step F is provided between the gas generation pure water step B and the nanobubble generation step D, and the pressure of the gas generation pure water is controlled by the water pressure adjusting means 60 to be equal to or higher than the gas pressure controlled by the current in the electrolytic cell 20. Then, control is performed so as to approach this gas pressure. The water pressure adjusting means 60 is controlled using a pressure sensor 61.

(Saturated gas-containing nanobubble water)
The produced saturated gas-containing nanobubble water can be used in the electronic industry field including semiconductors and liquid crystals. This saturated gas-containing nanobubble water is water containing ultrafine bubbles having a diameter of 1 μm (1 micrometer: one millionth of a meter) or less, and therefore also contains microbubbles having a diameter of 1 μm or more. .

  Saturated gas-containing nanobubble water has a large specific surface area compared to a single bubble with the same volume, and it has a high solubility of gas in water, adsorption of impurities in the liquid, scientific catalytic effect, and buoyancy. Has a feature such as a long time for staying in the liquid because it is hardly effective.

  Nanobubbles have a diameter of about 100 nm and the pressure inside the bubbles is increased to about 30 atm due to the surface tension of the gas-liquid interface, and the surface of the bubbles is highly active and adsorbs dirt components to the interface. In addition, bubbles of about 100 nm have a surface area that is tens of thousands of times larger than bubbles of about several mm compared to bubbles of about several millimeters, and molecular dynamics analysis results show that the polarity of the gas-liquid interface is uniform for bubbles of several nm. have.

  Therefore, saturated gas-containing nanobubble water generates a jet of several tens of atmospheres when broken when nanobubbles come into contact with an object, has a high purification rate, has a cleaning effect on the surface of the object, and has a sterilizing effect due to static electricity.

  And especially the conditions necessary for saturated gas-containing nanobubble water used for semiconductor cleaning, such as being particle-free, being metal-free, being able to control the amount of gas, being able to be continuously supplied from a nozzle, always a constant particle It has a removal performance.

  Therefore, since the saturated bubble-containing nanobubble water is mainly due to a jet that is said to be several tens of atmospheres at the time of destruction, the nanobubbles can be uniformly supplied and destroyed on the object to be cleaned.

  Next, although the Example of manufacture of the saturated gas containing nano bubble water concerning this invention is described, this Example does not limit this invention. Saturated gas-containing nanobubble water was generated at a water pressure of 250 kPa. When the generated bubbles of the nanobubble water were measured, 2400 particles having a particle diameter of 0.1 to 0.5 microns and 30 particles of 0.5 microns or more were measured.

[Third Embodiment]
FIG. 3 is a conceptual diagram of a third embodiment of a method for producing saturated gas-containing nanobubble water. In the third embodiment, similarly to the first and second embodiments, the degassing step A, the gas generation pure water step B, the pressure control step C, and the nanobubble generation step D are provided, and the rectification step is further performed. E, specific resistance reduction process G.

  In this embodiment, it has a deaeration process A, a gas generation pure water process B, a current control process C, a rectification process E, a specific resistance reduction process G, and a nanobubble generation process D, and is continuous over a long period of time. It is possible to obtain stable gas-saturated nanobubble water, and to produce saturated gas-containing nanobubble water that can be used in the electronic industry field including semiconductors and liquid crystals.

  That is, pure water is degassed via degassing step A to become degassed pure water, and degassed pure water is an electrolysis obtained by electrolyzing pure water in degassed pure water step B. It is led to a tank and used as gas generation pure water. Further, in the current control step C, the gas pressure in the gas generation pure water is a positive pressure, and at least the water pressure of the degassing pure water or the gas pressure of the gas generation pure water is lower than the water pressure of the electrolytic cell. Control the current. In the current control step C, the gas pressure in the gas-generated pure water is increased at least once until the water pressure of the degassed pure water or the water pressure of the gas-generated pure water is lowered.

  In order to generate more stable saturated gas-containing nanobubble water, the gas-generated pure water is guided to the rectifying step E, rectified to generate rectified pure water, and then the specific resistance reduction step G is used to reduce the specific resistance of the gas-generated pure water. The specific resistance-decreased pure water is reduced in the nanobubble generation step D, and is generated as saturated gas-containing nanobubble water in which the supersaturated gas becomes nanobubbles.

  The deaeration process A, the gas generation pure water process B, and the current control process C are configured in the same manner as in the first embodiment, and the rectification process E is configured in the same manner as in the second embodiment. Will be omitted, and the specific resistance reduction process G and nanobubble generation process D will be described.

(Resistivity reduction process G)
The specific resistance reduction process G may be between the deaeration process A and the nanobubble generation process D, but most of them are arranged before the nanobubble generation process D, and the ratio of the gas-generated pure water obtained from the rectification process E Reduce resistance. The specific resistance decreasing step G of this embodiment includes specific resistance reducing means 70 and specific resistance reduced pure water specific resistance 61, and at least acid or alkali is injected by the specific resistance reducing means 70 to reduce specific resistance reduced pure water. The specific resistance is reduced by the specific resistance 71 of water, and the degree of reduction of the specific resistance is controlled. That is, when the specific resistance is high, the nanobubbles generated in the nanobubble generation process D are easily combined together to become a large bubble, but the specific resistance is decreased, and thus the nanobubbles are generated in the nanobubble generation process D. Since the nanobubbles exist as they are, the specific resistance is reduced by injecting at least acid or alkali, and the degree of reduction of the specific resistance is controlled, for example, 1 MΩcm or less.

(Nano bubble generation process D)
In this nanobubble generation step D, the nanobubble generation unit 40 generates saturated gas-containing nanobubble water by reducing the pressure of the specific resistance pure water obtained by reducing the specific resistance obtained from the rectification step E by the specific resistance reduction mechanism F. The nanobubble generating means 40 has a filter 41, and the pressure of the gas generation pure water that has passed through the gas generation pure water step B is reduced through the pores of 1 micron or less of the filter 41 to contain saturated gas-containing nanobubble water. Is generated. The pressure reducing structure of the nanobubble generating means 40 is characterized in that the pressure is reduced via the pores of 1 micron or less of the filter 41, and the pressure is reduced via the pores of 0.5 micron or less if possible.

  In this manner, by reducing the specific resistance of the gas-generating pure water before the nanobubble generation step to generate saturated gas-containing nanobubble water, for example, alkali or the like is injected to lower the specific resistance of pure water (pH is reduced). It is possible to obtain gas-saturated nanobubble water that is continuous and always stable over a long period of time.

(Saturated gas-containing nanobubble water)
The produced saturated gas-containing nanobubble water can be used in the electronic industry field including semiconductors and liquid crystals. This saturated gas-containing nanobubble water is water containing ultrafine bubbles having a diameter of 1 μm (1 micrometer: one millionth of a meter) or less, and therefore also contains microbubbles having a diameter of 1 μm or more. .

  Saturated gas-containing nanobubble water has a large specific surface area compared to a single bubble with the same volume, and it has a high solubility of gas in water, adsorption of impurities in the liquid, scientific catalytic effect, and buoyancy. Has a feature such as a long time for staying in the liquid because it is hardly effective.

  Nanobubbles have a diameter of about 100 nm and the pressure inside the bubbles is increased to about 30 atm due to the surface tension of the gas-liquid interface, and the surface of the bubbles is highly active and adsorbs dirt components to the interface. In addition, bubbles of about 100 nm have a surface area that is tens of thousands of times larger than bubbles of about several mm compared to bubbles of about several millimeters, and molecular dynamics analysis results show that the polarity of the gas-liquid interface is uniform for bubbles of several nm. have.

  Therefore, saturated gas-containing nanobubble water generates a jet of several tens of atmospheres when broken when nanobubbles come into contact with an object, has a high purification rate, has a cleaning effect on the surface of the object, and has a sterilizing effect due to static electricity.

  As described above, the method for producing saturated gas-containing nanobubble water takes out only the uniform nanobubble water through the rectifying means (filter) from the pure water produced by controlling the water pressure and the gas pressure.

  And especially the conditions necessary for saturated gas-containing nanobubble water used for semiconductor cleaning, such as being particle-free, being metal-free, being able to control the amount of gas, being able to be continuously supplied from a nozzle, always a constant particle It has a removal performance.

  Therefore, since the saturated bubble-containing nanobubble water is mainly due to a jet that is said to be several tens of atmospheres at the time of destruction, the nanobubbles can be uniformly supplied and destroyed on the object to be cleaned.

  Next, examples of the production of saturated gas-containing nanobubble water according to the present invention will be described. Saturated gas-containing nanobubble water was generated at a water pressure of 250 kPa. A 0.05 micron filter was used for the pores in the nanobubble generation process. The specific resistance was adjusted with NH 4 OH so as to be 0.3 MΩcm. When the generated bubbles of nanobubble water were measured, 46443 particles with a particle size of 0.1 to 0.15 microns were measured.

  The present invention can be applied to a saturated gas-containing nanobubble water production method that generates nanobubble water from gas-containing pure water, and more stably produces particle-free and metal-free nanobubble water, and reduces the amount of nanobubbles. By controlling, it can be used in the electronic industry field including semiconductors and liquid crystals.

  In addition, it is applicable to a method for producing saturated gas-containing nanobubble water that can be used in the electronic industry field, including semiconductors and liquid crystals, by making particle-free and metal-free nanobubble water more stable. It is possible to obtain gas-saturated nanobubble water that is continuous over time and always stable.

A Deaeration process B Gas generation pure water process C Current control process D Nano bubble generation process E Rectification process F Water pressure adjustment process G Resistivity reduction process 10 Deaeration means 11 Deaeration case 12 Membrane 13 Maze 14 Dam plate 15 Inlet 16 Outlet 20 Electrolytic cell 21 Anode chamber 22 Cathode chamber 23 Power supply 24 Current control device 40 Nano bubble generating means 41 Filter 50 Rectifying means 60 Water pressure adjusting means 61 Pressure sensor 70 Specific resistance decreasing means 71 Specific resistance decreasing Pure water specific resistance

Claims (13)

A degassing step of degassing pure water to produce degassed pure water;
A gas generation pure water step of introducing the degassed pure water into an anode chamber and / or a cathode chamber of an electrolytic cell obtained by electrolyzing the pure water to obtain gas generation pure water;
A current control step of controlling the current of the electrolytic cell in the gas generation pure water step;
A nanobubble generation step of generating saturated gas-containing nanobubble water by reducing the pressure of the gas generation pure water that has undergone the gas generation pure water step;
A method for producing saturated gas-containing nanobubble water, comprising:   2. The method for producing saturated gas-containing nanobubble water according to claim 1, wherein the specific resistance of the gas-generated pure water is reduced before the nanobubble generation step.   3. The saturated gas according to claim 2, wherein the specific resistance of the gas-generating pure water is reduced by reducing the specific resistance by injecting at least an acid or an alkali and controlling the degree of reduction of the specific resistance. Method for producing contained nano bubble water. The degassing step is to remove pure water from pure water from the pure water by putting pure water on one side and degassing the other side through the membrane,
2. The method for producing saturated gas-containing nanobubble water according to claim 1, wherein the saturated gas-containing nanobubble water is led to a degassed space through the membrane. The electrolytic cell in the gas generation pure water step is an electrolytic cell that generates oxygen gas and / or ozone gas from the anode and hydrogen gas from the cathode,
The method for producing saturated gas-containing nanobubble water according to claim 1, wherein the water pressure in the polar chamber not led to the nanobubble generation step is made lower than the water pressure in the polar chamber led to the nanobubble generation step.   2. The method for producing saturated gas-containing nanobubble water according to claim 1, wherein the electrolytic cell in the gas generation pure water process also passes through an electrode chamber that is not led to the nanobubble generation process.   In the current control step, the electrolytic cell is configured so that the gas pressure in the gas-generated pure water is a positive pressure and at least a gas pressure lower than the water pressure of the degassed pure water or the water pressure of the gas-generated pure water. The method for producing saturated gas-containing nanobubble water according to claim 1, wherein the current is controlled.   The current control step is characterized in that the gas pressure in the gas generation pure water is once increased at least during a period of time until the water pressure of the degassed pure water or the water pressure of the gas generation pure water is reduced. The method for producing saturated gas-containing nanobubble water according to claim 1.   2. The saturated gas-containing composition according to claim 1, wherein in the nanobubble generation step, the pressure of the gas generation pure water that has passed through the gas generation pure water step is reduced through pores of 1 micron or less. Production method of nano bubble water.   The rectifying step of rectifying the gas-generated pure water via a pore of 1 micron or less is provided between the gas-generated pure water step and the nanobubble generation step. This is a method for producing saturated gas-containing nanobubble water.   A water pressure adjustment step for controlling the pressure of the gas generation pure water between the gas generation pure water step and the nanobubble generation step to be close to the gas pressure at or above the gas pressure controlled by the current of the electrolytic cell. The method for producing saturated gas-containing nanobubble water according to claim 1, comprising:   Before the gas generation pure water step, the water pressure is controlled so that the pressure of the degassed pure water is equal to or higher than the gas pressure controlled by the current of the electrolytic cell and approaches the gas pressure controlled by the current of the electrolytic cell. It has an adjustment process, The manufacturing method of the saturated gas containing nano bubble water of Claim 1 characterized by the above-mentioned. The method for producing saturated gas-containing nanobubble water according to claim 1, wherein the saturated gas-containing nanobubble water is used in the field of electronic industries including semiconductors and liquid crystals.