JP2013124217A5 - - Google Patents

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Publication number
JP2013124217A5
JP2013124217A5 JP2012270433A JP2012270433A JP2013124217A5 JP 2013124217 A5 JP2013124217 A5 JP 2013124217A5 JP 2012270433 A JP2012270433 A JP 2012270433A JP 2012270433 A JP2012270433 A JP 2012270433A JP 2013124217 A5 JP2013124217 A5 JP 2013124217A5
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JP
Japan
Prior art keywords
nitride crystal
reaction vessel
nitride
raw material
regeneration
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Pending
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JP2012270433A
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Japanese (ja)
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JP2013124217A (en
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Publication of JP2013124217A publication Critical patent/JP2013124217A/en
Publication of JP2013124217A5 publication Critical patent/JP2013124217A5/ja
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Claims (6)

反応容器内で第一の窒化物結晶を原料としてアモノサーマル法による結晶成長を行った後、該反応容器内に残存した該第一の窒化物結晶に再生処理を施して、アモノサーマル法用の窒化物結晶原料である再生原料を得る
ことを特徴とする、再生原料の製造方法。
After crystal growth by the ammonothermal method using the first nitride crystal as a raw material in the reaction vessel, the first nitride crystal remaining in the reaction vessel is subjected to a regeneration treatment to obtain an ammonothermal method. A method for producing a recycled material, characterized in that a recycled material that is a nitride crystal material for use is obtained .
反応容器内で第一の窒化物結晶を原料としてアモノサーマル法による結晶成長を行った後、副生物として該反応容器内に発生した第二の窒化物結晶に再生処理を施して、アモノサーマル法用の窒化物結晶原料である再生原料を得るAfter crystal growth by the ammonothermal method using the first nitride crystal as a raw material in the reaction vessel, the second nitride crystal generated in the reaction vessel as a by-product is subjected to a regeneration treatment to produce an ammono Obtaining recycled raw materials that are nitride crystal raw materials for thermal processes
ことを特徴とする、再生原料の製造方法。A method for producing a recycled raw material.
反応容器内で第一の窒化物結晶を原料としてアモノサーマル法による結晶成長を行った後、該反応容器内に残存した該第一の窒化物結晶および副生物として該反応容器内に発生した第二の窒化物結晶に再生処理を施して、アモノサーマル法用の窒化物結晶原料である再生原料を得るAfter crystal growth by the ammonothermal method using the first nitride crystal as a raw material in the reaction vessel, the first nitride crystal remaining in the reaction vessel and a byproduct were generated in the reaction vessel. Regeneration treatment is performed on the second nitride crystal to obtain a regeneration material that is a nitride crystal material for the ammonothermal method.
ことを特徴とする、再生原料の製造方法。A method for producing a recycled raw material.
前記再生処理が、処理すべき窒化物結晶酸を含むエッチング液を用いてエッチングすることを含む、請求項1〜3のいずれか1項に記載の製造方法。 The regeneration process, the nitride to be treated crystals, using an etchant containing an acid includes etching, manufacturing process according to any one of claims 1-3. 前記再生処理が、処理すべき窒化物結晶塩基を含むエッチング液を用いてエッチングすることを含む、請求項1〜4のいずれか1項に記載の製造方法。 The regeneration process, the nitride to be treated crystals, using an etching solution containing base includes etching, manufacturing process according to any one of claims 1-4. 請求項1〜のいずれか1項に記載の製造方法により再生原料を得る工程と、該再生原料を含む原料を用いてアモノサーマル法により第三の窒化物結晶を成長させることを特徴とする、窒化物結晶の製造方法。
Wherein the step of obtaining a reclaimed by manufacturing method according to any one of claims 1-5, growing a third nitride crystal by the ammonothermal method using a raw material containing regeneration material A method for producing a nitride crystal.
JP2012270433A 2011-12-13 2012-12-11 Method for producing regenerated raw material, method for producing nitride crystal and nitride crystal Pending JP2013124217A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201113569964A 2011-12-13 2011-12-13
US61/569964 2011-12-13

Publications (2)

Publication Number Publication Date
JP2013124217A JP2013124217A (en) 2013-06-24
JP2013124217A5 true JP2013124217A5 (en) 2016-01-21

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ID=48775697

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012270433A Pending JP2013124217A (en) 2011-12-13 2012-12-11 Method for producing regenerated raw material, method for producing nitride crystal and nitride crystal

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JP (1) JP2013124217A (en)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007008198A1 (en) * 2005-07-08 2007-01-18 The Regents Of The University Of California Method for growing group iii-nitride crystals in supercritical ammonia using an autoclave
JP5493302B2 (en) * 2007-07-19 2014-05-14 三菱化学株式会社 Group III nitride semiconductor substrate and cleaning method thereof
KR20120127397A (en) * 2009-11-27 2012-11-21 미쓰비시 가가꾸 가부시키가이샤 Method for producing nitride crystals, and production vessel and members

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