JP2013111671A - Foil making roller inspection device - Google Patents

Foil making roller inspection device Download PDF

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JP2013111671A
JP2013111671A JP2011257470A JP2011257470A JP2013111671A JP 2013111671 A JP2013111671 A JP 2013111671A JP 2011257470 A JP2011257470 A JP 2011257470A JP 2011257470 A JP2011257470 A JP 2011257470A JP 2013111671 A JP2013111671 A JP 2013111671A
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foil
polishing
roller
inspection
making roller
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JP5806092B2 (en
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Kenji Nakauchi
健二 中内
Yusuke Muraoka
祐介 村岡
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Kokusai Gijutsu Kaihatsu Co Ltd
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Kokusai Gijutsu Kaihatsu Co Ltd
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Abstract

PROBLEM TO BE SOLVED: To provide a foil making roller inspection device that easily detects ruggedness of a foil making roller with high precision, and repairs the same.SOLUTION: The foil making roller inspection device includes polishing means comprising a polishing roller which achieves polishing with abrasives brought into contact with the surface of the foil making roller and abrasive supply means of supplying abrasives to the polishing roller; cleaning means of cleaning the surface of the foil making roller; inspection means of inspecting ruggedness of the surface of the foil making roller; control means of determining whether the surface of the foil making roller needs to be polished according to an inspection result; and moving means of holding an inspection polishing mechanism having the polishing means, cleaning means, and inspection means united movably to and away from the foil making roller, and moving the inspection polishing mechanism between an inspection and repair position where the mechanism comes close to the foil making roller to perform ruggedness inspection on the surface and polishing of the surface and a standby position where the mechanism moves away from the foil making roller to avoid interference with a foil making process.

Description

本発明は製箔ローラ検査装置に関し、特に製箔ローラの表面を補修する補修装置を備えた製箔ローラ検査装置に関する。   The present invention relates to a foil making roller inspection device, and more particularly to a foil making roller inspection device provided with a repair device for repairing the surface of a foil making roller.

一般的な電解銅箔の製造方法について図5を用いて簡単に説明する。一般にチタン或いはステンレスにクロムめっきした金属ドラムよりなる陰極(銅箔用ローラ12)と、銅箔用ローラ12から所定の距離を隔てて対面する陽極15とで形成する電解槽14(電解装置)に電解液18を流す。   A general method for producing an electrolytic copper foil will be briefly described with reference to FIG. In general, an electrolytic cell 14 (electrolyzer) is formed by a cathode (copper foil roller 12) made of a metal drum chrome-plated on titanium or stainless steel and an anode 15 facing the copper foil roller 12 at a predetermined distance. The electrolyte solution 18 is flowed.

陽極15で形成された電解槽14は鉛又は鉛合金あるいはチタンに白金族酸化物等を被覆した円弧状の金属板であり、液槽を形成する。銅箔用ローラ12と陽極15との間に電解液18(例えば硫酸酸性硫酸銅溶液)を流しながら電位を印加しつつ、銅箔用ローラ12を回転させることにより、銅箔用ローラ12の表面には電解作用により、電解液中の銅イオンが銅箔用ローラ12の回転にともなってその表面に次第に厚く析出(電着)する。所定の厚さになった金属銅(電着物)を銅箔用ローラ12から逐次ロール等に巻き取って剥離することにより、銅箔16が製造される。   The electrolytic cell 14 formed by the anode 15 is an arc-shaped metal plate obtained by coating lead, a lead alloy, or titanium with a platinum group oxide or the like, and forms a liquid tank. The surface of the copper foil roller 12 is rotated by rotating the copper foil roller 12 while applying a potential while flowing an electrolytic solution 18 (for example, sulfuric acid copper sulfate solution) between the copper foil roller 12 and the anode 15. Due to the electrolytic action, copper ions in the electrolytic solution gradually deposit (electrodeposit) on the surface of the copper foil roller 12 as the copper foil roller 12 rotates. The copper foil 16 is manufactured by winding and peeling the copper metal (electrodeposit) having a predetermined thickness from the copper foil roller 12 onto a roll or the like successively.

このとき、銅箔用ローラ12の表面に凹凸が存在した場合、製造される銅箔16の表面には該凹凸に対応した凹凸が生じてしまう。そのため銅箔用ローラ12の表面を研磨・補修する種々の装置が提案されている(例えば特許文献1、2参照)。   At this time, when unevenness exists on the surface of the copper foil roller 12, unevenness corresponding to the unevenness is generated on the surface of the manufactured copper foil 16. Therefore, various devices for polishing and repairing the surface of the copper foil roller 12 have been proposed (see, for example, Patent Documents 1 and 2).

特開平10−330984号公報JP-A-10-330984 特表2003−500228号公報Special table 2003-500228 gazette

しかし、検査・補修対象である製箔ローラの表面に存在する凹凸を検出するためには、従来では作業者の目視による検出に頼っており、自動的に製箔ローラ表面の凹凸を検出し補修することはできず、作業者の負担が大きく且つ検出精度を高くできない問題があった。   However, in order to detect irregularities present on the surface of the foil-making roller that is the subject of inspection and repair, the conventional method relies on visual detection by the operator, and automatically detects irregularities on the surface of the foil-making roller and repairs them. There is a problem that the load on the operator is large and the detection accuracy cannot be increased.

本発明は上記問題点を解消するためになされたものであり、製箔ローラ表面の凹凸を簡易に、かつ高い精度で検出し補修する製箔ローラ検査装置を提供することを課題とする。   The present invention has been made to solve the above-described problems, and an object of the present invention is to provide a foil-making roller inspection device that detects and repairs irregularities on the surface of a foil-making roller easily and with high accuracy.

請求項1に記載の製箔ローラ検査装置は、電解槽に浸漬され、表面に銅箔を析出させるための製箔ローラの表面に接触し研磨剤で研磨する研磨ローラと、前記研磨ローラに研磨材を供給する研磨材供給部とからなる研磨手段と、前記製箔ローラの表面を洗浄する洗浄手段と、回転する前記製箔ローラの表面の凹凸を検査する検査手段と、を備えた検査研磨機構と、前記検査手段の検査結果に従い前記製箔ローラの表面研磨の要否を判断する制御手段と、前記検査研磨機構を前記製箔ローラに対して接離方向に移動可能に支持し、前記制御手段の判断に従って前記製箔ローラに接近し表面の凹凸検査および表面の研磨を行う検査補修位置と、前記製箔ローラから離れて製箔工程への干渉を避ける退避位置との間を移動させる移動手段と、を有することを特徴とする。   The foil-making roller inspection device according to claim 1 is a polishing roller that is immersed in an electrolytic bath and contacts the surface of the foil-making roller for depositing copper foil on the surface and is polished with an abrasive, and the polishing roller is polished. Inspection polishing comprising: polishing means comprising an abrasive supply section for supplying a material; cleaning means for cleaning the surface of the foil making roller; and inspection means for inspecting irregularities on the surface of the rotating foil making roller. A mechanism, control means for determining whether surface polishing of the foil making roller is necessary according to the inspection result of the inspection means, and supporting the inspection polishing mechanism movably in the contact / separation direction with respect to the foil making roller, According to the judgment of the control means, it is moved between an inspection / repair position where the surface irregularity inspection and surface polishing are performed by approaching the foil making roller and a retreating position away from the foil making roller to avoid interference with the foil making process. Transportation means It is characterized in.

上記の発明によれば、製箔ローラの表面に凹凸が存在する場合であっても、製箔工程以外の時間に検査研磨機構を製箔ローラの近傍に移動させて表面の凹凸を検出し、これを研磨して除去することで、製箔ローラの表面を凹凸の少ない円筒面とすることができ、一様な厚さの銅箔を製造できる。   According to the above invention, even when unevenness is present on the surface of the foil-making roller, the unevenness on the surface is detected by moving the inspection and polishing mechanism to the vicinity of the foil-making roller at a time other than the foil-making process, By polishing and removing this, the surface of the foil-making roller can be made into a cylindrical surface with little unevenness, and a copper foil with a uniform thickness can be produced.

また、製箔ローラの表面に存在する凹凸の検出を検査手段による自動作業とすることで、作業者の目視による確認を必要とせず、また製箔工程終了後など製箔工程以外の時間に自動で製箔ローラの検査と補修とを行うことも可能なため、作業者には工数の削減と負担の軽減になり、製箔装置全体の作業不能時間を削減することができる。   In addition, by detecting the unevenness on the surface of the foil-making roller as an automatic operation by the inspection means, it is not necessary to visually check by the operator, and it is automatically performed at times other than the foil-making process, such as after the completion of the foil-making process. Since it is also possible to perform inspection and repair of the foil-making roller, it is possible to reduce the man-hours and burdens on the operator, and to reduce the inoperable time of the entire foil-making apparatus.

請求項2に記載の製箔ローラ検査装置は、前記研磨手段は、研磨剤を含有する研磨液を貯留する研磨液槽と、前記研磨液で前記製箔ローラの表面を研磨する研磨ローラと、前記製箔ローラの表面から前記研磨液をスクイーズする液切りブレードと、を備え、前記洗浄手段および前記検査手段よりも前記製箔ローラの回転方向上流側に設けられたことを特徴とする。   The foil-making roller inspection device according to claim 2, wherein the polishing means stores a polishing liquid tank that stores a polishing liquid containing an abrasive, a polishing roller that polishes the surface of the foil-making roller with the polishing liquid, A liquid draining blade for squeezing the polishing liquid from the surface of the foil-making roller, and is provided on the upstream side in the rotation direction of the foil-making roller with respect to the cleaning means and the inspection means.

上記の発明によれば、回転する製箔ローラの表面を研磨ローラで段差なく研磨し、且つ洗浄その他の工程よりも先に行うことで効率よく製箔ローラの検査および研磨を行うことができる。   According to the above invention, the surface of the rotating foil-making roller is polished without a step with the polishing roller, and the foil-making roller can be efficiently inspected and polished by performing it before the cleaning and other steps.

請求項3に記載の製箔ローラ検査装置は、前記洗浄手段は、前記製箔ローラの表面に洗浄水を噴射する水洗ノズルと、前記製箔ローラ表面より水分を吹き飛ばして除去するエアナイフと、前記製箔ローラの表面から水分をスクイーズする水切りブレードと、前記洗浄ノズルおよび前記エアナイフを収納し水洗時および乾燥時に生じるミストの拡散を防止する排気ボックスとを備え、前記研磨手段よりも前記製箔ローラの回転方向下流側、かつ前記検査手段よりも前記製箔ローラの回転方向上流側に設けられたことを特徴とする。   The foil-rolling roller inspection apparatus according to claim 3, wherein the cleaning means is a water-washing nozzle that sprays cleaning water onto the surface of the foil-making roller, an air knife that blows and removes moisture from the surface of the foil-making roller, and A foil draining blade that squeezes moisture from the surface of the foil making roller, and an exhaust box that houses the washing nozzle and the air knife and prevents mist from spreading during washing and drying. It is provided on the downstream side in the rotation direction and on the upstream side in the rotation direction of the foil-making roller with respect to the inspection means.

上記の発明によれば、研磨された製箔ローラの表面を直後に洗浄することで装置内の汚れを防ぎ、乾燥した粉塵が飛散しローラ類の軸受け等に影響することを防ぐことができる。   According to the above invention, the surface of the polished foil-making roller can be washed immediately to prevent contamination in the apparatus, and dry dust can be prevented from scattering and affecting the bearings of the rollers.

請求項4に記載の製箔ローラ検査装置は、前記検査手段は、回転する前記製箔ローラの表面を撮影し、撮影画像から凹凸を光学的に検出するCCDカメラと、前記CCDカメラの視野を照明する照明手段と、前記CCDカメラの映像から前記製箔ローラの表面に存在する凹凸の形状、大きさ及び位置を記憶する記憶手段と、を備え、前記研磨手段および前記洗浄手段よりも前記製箔ローラの回転方向下流側に設けられたことを特徴とする。   The foil-making roller inspection apparatus according to claim 4, wherein the inspection unit images the surface of the rotating foil-making roller and optically detects irregularities from the captured image, and the field of view of the CCD camera. Illuminating means for illuminating, and storage means for storing the shape, size, and position of unevenness present on the surface of the foil-making roller from the image of the CCD camera, and more suitable than the polishing means and the cleaning means. It was provided in the rotation direction downstream of the foil roller.

上記の発明によれば、製箔ローラの表面を撮影し光学的に凹凸の検出を行うことで、製箔ローラの表面に影響を与えず凹凸の検出を行い、さらに回転する製箔ローラの表面を研磨および洗浄した後に再度検査することができる。   According to the above invention, the surface of the rotating foil making roller is detected by detecting the unevenness without affecting the surface of the foil making roller by photographing the surface of the foil making roller and optically detecting the unevenness. Can be inspected again after polishing and cleaning.

請求項5に記載の製箔ローラ検査装置は、前記製箔ローラ、前記電解槽、前記検査研磨機構、および前記移動手段を保持し外気から遮断する筐体と、筐体内部で前記検査研磨機構を待機位置にて格納する格納部と、前記格納部の開口部分を封止するシャッタと、前記電解槽を上下させ前記製箔ローラを電解液に浸漬させる位置と退避位置とに移動させる電解槽上下手段と、を備えたことを特徴とする。   The foil-making roller inspection device according to claim 5, wherein the foil-making roller, the electrolytic bath, the inspection and polishing mechanism, a casing that holds the moving means and shields it from outside air, and the inspection and polishing mechanism inside the casing A storage section for storing the storage section in a standby position, a shutter for sealing the opening of the storage section, and an electrolytic bath for moving the electrolytic bath up and down to a position where the foil-making roller is immersed in an electrolytic solution and a retracted position And an up-and-down means.

上記の発明によれば、格納部の開口部は、検査研磨機構が待機位置にあるときシャッタで封止され、検査研磨機構が検査位置に移動する際には解放される構造とされていれば、電解槽の近傍と検査研磨機構内との雰囲気を分離することで互いに干渉する事態を防ぐことができる。また電解槽を移動させる電解槽上下手段により、銅箔用ローラを移動させずに種々の工程を実行することができる。   According to the above invention, the opening of the storage portion is sealed by the shutter when the inspection polishing mechanism is in the standby position, and is released when the inspection polishing mechanism moves to the inspection position. By separating the atmosphere in the vicinity of the electrolytic cell and the inspection and polishing mechanism, it is possible to prevent a situation in which they interfere with each other. Moreover, various processes can be performed without moving the roller for copper foil by the electrolytic cell up-and-down means for moving the electrolytic cell.

本発明によれば、製箔ローラ表面の凹凸を簡易に、かつ高い精度で検出し補修する製箔ローラ検査装置とすることができる。 ADVANTAGE OF THE INVENTION According to this invention, it can be set as the foil making roller test | inspection apparatus which detects and repairs the unevenness | corrugation of the foil making roller surface easily and with high precision.

本発明の第1実施形態に係る製箔ローラ検査装置の構造を示す概念図である。It is a conceptual diagram which shows the structure of the foil manufacturing roller inspection apparatus which concerns on 1st Embodiment of this invention. 図1に示す製箔ローラ検査装置の検査研磨機構を示す概念図である。It is a conceptual diagram which shows the test | inspection grinding | polishing mechanism of the foil manufacturing roller test | inspection apparatus shown in FIG. 銅箔用ローラの表面凸部とその補修工程を示す拡大図である。It is an enlarged view which shows the surface convex part of the roller for copper foil, and its repair process. 銅箔用ローラの表面凹部とその補修工程を示す拡大図である。It is an enlarged view which shows the surface recessed part of the roller for copper foils, and its repair process. 図1に示す製箔ローラ装置による製箔工程を示す斜視図である。It is a perspective view which shows the foil making process by the foil making roller apparatus shown in FIG.

以下、図面を参照して本発明の実施の形態を詳細に説明する。 Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.

<第1の実施の形態> <First Embodiment>

図1には本発明の第1の実施の形態に係る製箔ローラ検査装置10が示されている。   FIG. 1 shows a foil-making roller inspection device 10 according to a first embodiment of the present invention.

図1に示すように製箔ローラ検査装置10は、主として銅箔用ローラ12、電解槽14、検査研磨機構20から構成されている。   As shown in FIG. 1, the foil-making roller inspection apparatus 10 mainly includes a copper foil roller 12, an electrolytic cell 14, and an inspection polishing mechanism 20.

銅箔用ローラ12は例えばチタンあるいはステンレス材にクロムめっきを施した円筒形のドラムであり、固定された軸12Cを中心として回転可能に支持されている。銅箔用ローラ12はその外周面積が製造される銅箔の面積に関わる為、屡々直径2mあるいはそれ以上の大きさとなり、その重量も併せて移動が困難な場合がある。そのため周辺機器は銅箔用ローラ12に対して接離方向に移動可能とされることが望ましい。   The copper foil roller 12 is, for example, a cylindrical drum in which chrome plating is applied to titanium or stainless steel, and is supported rotatably about a fixed shaft 12C. Since the outer peripheral area of the copper foil roller 12 is related to the area of the copper foil to be manufactured, the diameter of the copper foil roller 12 is often 2 m or more, and its weight may be difficult to move. Therefore, it is desirable that the peripheral device be movable in the contact / separation direction with respect to the copper foil roller 12.

すなわち銅箔用ローラ12の直下には陽極を兼ねた電解槽14が電解槽上下機構70によって上下方向に移動可能に支持されており、電解槽14の内部には例えば硫酸酸性硫酸銅溶液からなる電解液18が満たされ、電解槽14が電解槽上下機構70で上方へ移動すると銅箔用ローラ12が電解液18に浸漬される。電解槽上下機構70は、例えばモータで駆動される移動ステージでもよく、あるいは油圧機構を利用したジャッキ装置などでもよい。   That is, an electrolytic cell 14 also serving as an anode is supported directly below the copper foil roller 12 by an electrolytic cell vertical mechanism 70 so as to be movable in the vertical direction. The electrolytic cell 14 is made of, for example, a sulfuric acid copper sulfate solution. When the electrolytic solution 18 is filled and the electrolytic cell 14 moves upward by the electrolytic cell vertical mechanism 70, the copper foil roller 12 is immersed in the electrolytic solution 18. The electrolytic cell vertical mechanism 70 may be, for example, a moving stage driven by a motor, or a jack device using a hydraulic mechanism.

ここで銅箔用ローラ12を図中矢印12Rのように回転させながら電解槽14が陽極、銅箔用ローラ12が陰極となるように、図示しない電圧印加手段(直流電源など)によって電圧を印加すると、電解液18中の銅イオンが銅箔用ローラ12の表面に析出(電着)する。この工程により所定の厚さに成長した金属銅(電着物)をローラ12から逐次ロール等に巻き取って剥離することにより、銅箔16が製造される。図5に示すように製造された銅箔16は巻取りロール78に巻き取られ、次行程へ搬送される。   Here, while rotating the copper foil roller 12 as shown by an arrow 12R in the figure, a voltage is applied by a voltage applying means (DC power supply or the like) (not shown) so that the electrolytic cell 14 becomes an anode and the copper foil roller 12 becomes a cathode. Then, copper ions in the electrolytic solution 18 are deposited (electrodeposited) on the surface of the copper foil roller 12. The copper foil 16 is manufactured by winding and peeling the metal copper (electrodeposit) grown to a predetermined thickness by this process from the roller 12 onto a roll or the like. The copper foil 16 produced as shown in FIG. 5 is taken up by a take-up roll 78 and conveyed to the next process.

製箔ローラ検査装置10は検査研磨機構20を備えており、検査研磨機構20は移動手段72によって銅箔用ローラ12に対して接離方向に移動可能とされている。すなわち図2に示すように、検査研磨機構20を構成する研磨機構30(研磨ローラ34、液切りブレード36など)、洗浄機構40(水切りブレード44、水洗ノズル52、エアナイフ54など)、および検査機構60が一体となって銅箔用ローラ12の近傍である検査時位置(図中実線で表示)と、離間した退避位置(図中波破線で表示)との間を移動可能に支持されている。   The foil-making roller inspection device 10 includes an inspection / polishing mechanism 20, and the inspection / polishing mechanism 20 can be moved in the contact / separation direction with respect to the copper foil roller 12 by a moving means 72. That is, as shown in FIG. 2, the polishing mechanism 30 (polishing roller 34, liquid draining blade 36, etc.), the cleaning mechanism 40 (water draining blade 44, water washing nozzle 52, air knife 54, etc.), and the inspection mechanism constituting the inspection polishing mechanism 20 60 is integrally supported so as to be movable between an inspection position (indicated by a solid line in the figure) near the copper foil roller 12 and a separated retreat position (indicated by a broken wave line in the figure). .

移動手段72は、検査研磨機構20の重量を支え、且つ所望の位置に停止可能であれば、例えばモータで駆動される車輪やギア等によって銅箔用ローラ12に対して接離方向に移動可能とされていても、あるいは油圧機構を利用した移動機構とされていてもよい。   If the moving means 72 supports the weight of the inspection and polishing mechanism 20 and can stop at a desired position, the moving means 72 can move in the contact / separation direction with respect to the copper foil roller 12 by, for example, a wheel or gear driven by a motor. Or a moving mechanism using a hydraulic mechanism.

図1に示すように、検査研磨機構20には銅箔用ローラ12の回転方向(図中矢印12R)上流側に研磨機構30が設けられている。   As shown in FIG. 1, the inspection and polishing mechanism 20 is provided with a polishing mechanism 30 on the upstream side in the rotation direction of the copper foil roller 12 (arrow 12R in the figure).

研磨機構30は酸化アルミ(アルミナ)、炭化珪素(シリコンカーバイド)など種々の研磨材を液中に分散させた研磨液32を貯留する研磨液槽38と、表面に研磨液32を含み銅箔用ローラ12の表面に圧接され回転することで銅箔用ローラ12の表面を研磨、凹凸を補修する研磨ローラ34、銅箔用ローラ12の表面をスクイーズして研磨液32の液だれを防止する液切りブレード36を備えている。   A polishing mechanism 30 includes a polishing bath 38 for storing a polishing solution 32 in which various types of polishing materials such as aluminum oxide (alumina) and silicon carbide (silicon carbide) are dispersed in a solution, and a polishing solution 32 on the surface. The surface of the copper foil roller 12 is polished by being pressed against the surface of the roller 12 and rotated, a polishing roller 34 for repairing irregularities, and the surface of the copper foil roller 12 is squeezed to prevent dripping of the polishing liquid 32. A cutting blade 36 is provided.

研磨ローラ34の構造としては、一般にゴムなどの軟質素材からなる軟質ローラが用いられるが、これに限定されず研磨液32に代えて表面に研磨材を固着させた布状の研磨シートと硬質ローラとを組み合わせて使用しても良い。   The structure of the polishing roller 34 is generally a soft roller made of a soft material such as rubber. However, the structure is not limited to this, and a cloth-like polishing sheet and a hard roller having an abrasive fixed on the surface instead of the polishing liquid 32 are used. And may be used in combination.

また、研磨ローラ34の軸方向長さは銅箔用ローラ12の軸方向長さをカバーする長さを備えていることが一般的だが、これに限定せず短い研磨ローラ34を用いて回転軸方向に移動可能に支持され、銅箔用ローラ12の表面を回転軸方向に移動しながら研磨する構成とされていてもよい。   The axial length of the polishing roller 34 generally includes a length that covers the axial length of the copper foil roller 12, but the present invention is not limited to this. The surface of the copper foil roller 12 may be polished while moving in the direction of the rotation axis.

また図1に示すように、研磨機構30に隣接して、銅箔用ローラ12の回転方向下流側には洗浄機構40が設けられている。   Further, as shown in FIG. 1, a cleaning mechanism 40 is provided adjacent to the polishing mechanism 30 on the downstream side in the rotation direction of the copper foil roller 12.

洗浄機構40は洗浄水42を受ける水槽46、水槽46から溢れた水を排水する配水管47、銅箔用ローラ12の表面をスクイーズして洗浄水42の液だれを防止する水切りブレード44、銅箔用ローラ12の表面を水で洗浄し研磨液32を洗い流す水洗ノズル52、水洗ノズル52に洗浄水を供給する給水路53、銅箔用ローラ12の表面から洗浄水42を除去し表面を乾燥させるエアナイフ54、エアナイフ54に空気を供給する圧搾空気管55、水洗および乾燥時に生じるミスト(霧)を封じ込め装置内への拡散を防止する排気ボックス50を備えている。   The cleaning mechanism 40 includes a water tank 46 that receives the cleaning water 42, a water distribution pipe 47 that drains the water overflowing from the water tank 46, a draining blade 44 that squeezes the surface of the copper foil roller 12 to prevent dripping of the cleaning water 42, copper The surface of the foil roller 12 is washed with water to wash away the polishing liquid 32, the water supply passage 53 for supplying the washing water to the water washing nozzle 52, and the washing water 42 is removed from the surface of the copper foil roller 12 to dry the surface. An air box 54 for supplying air to the air knife 54, and an exhaust box 50 for preventing mist (mist) generated during washing and drying from being diffused into the containment device.

洗浄機構40も研磨機構30と同様に軸方向長さは銅箔用ローラ12の軸方向長さをカバーする長さを備えていることが一般的だが、これに限定せず短い洗浄機構40を用いて銅箔用ローラ12の回転軸方向に移動可能に支持され、銅箔用ローラ12の表面を回転軸方向に移動しながら洗浄する構成とされていてもよい。   The cleaning mechanism 40 is generally provided with a length that covers the axial length of the copper foil roller 12 in the same manner as the polishing mechanism 30, but the short cleaning mechanism 40 is not limited to this. The copper foil roller 12 may be used so as to be movable in the direction of the rotation axis, and the surface of the copper foil roller 12 may be cleaned while moving in the direction of the rotation axis.

さらに図1に示すように、洗浄機構40に隣接して、銅箔用ローラ12の回転方向下流側には検査機構60が設けられている。   Further, as shown in FIG. 1, an inspection mechanism 60 is provided adjacent to the cleaning mechanism 40 on the downstream side in the rotation direction of the copper foil roller 12.

検査機構60は銅箔用ローラ12の表面を撮影し、凹凸の大きさと位置を検出するCCDカメラ62、CCDカメラ62で検出された凹凸の大きさと位置の情報を保存する記憶装置64、記憶装置64の情報をもとに補修(研磨)の要否および研磨位置に応じて検査研磨機構20の移動、研磨機構30、洗浄機構40への動作指示を行う図示しない制御部66、およびCCDカメラ62の撮影領域を照明する照明装置68を備えている。   The inspection mechanism 60 images the surface of the copper foil roller 12 and detects the size and position of the unevenness, a storage device 64 that stores information on the size and position of the unevenness detected by the CCD camera 62, and the storage device Based on the information of 64, a control unit 66 (not shown) for instructing the movement of the inspection and polishing mechanism 20 and the operation of the polishing mechanism 30 and the cleaning mechanism 40 according to the necessity of repair (polishing) and the polishing position, and the CCD camera 62 The illumination device 68 for illuminating the imaging region is provided.

また、検査機構60の軸方向長さは銅箔用ローラ12の軸方向長さをカバーする長さを備えていることが一般的だが、これに限定せず短いCCDカメラ62および照明装置68を用いて銅箔用ローラ12の回転軸方向に移動可能に支持され、銅箔用ローラ12の表面を回転軸方向に移動しながら撮影する構成とされていてもよい。   The inspection mechanism 60 is generally provided with a length that covers the length of the copper foil roller 12 in the axial direction. However, the present invention is not limited to this, and a short CCD camera 62 and illumination device 68 are provided. It may be configured to be used so as to be movable in the direction of the rotation axis of the copper foil roller 12 and to shoot while moving the surface of the copper foil roller 12 in the direction of the rotation axis.

さらに製箔ローラ検査装置10は、上記の銅箔用ローラ12、電解槽14(電解槽上下機構70)、検査研磨機構20(移動手段72)を保持する共通の筐体11が形成され、筐体11に形成されて待機位置の検査研磨機構20を格納し周囲の雰囲気を管理する格納部13が設けられていてもよい。   Further, the foil-making roller inspection apparatus 10 is formed with a common casing 11 that holds the copper foil roller 12, the electrolytic bath 14 (electrolytic bath vertical mechanism 70), and the inspection polishing mechanism 20 (moving means 72). A storage unit 13 formed in the body 11 for storing the inspection polishing mechanism 20 at the standby position and managing the surrounding atmosphere may be provided.

この場合、格納部13の開口部は、検査研磨機構20が待機位置にあるときシャッタ74で封止され、検査研磨機構20が検査位置に移動する際には巻取機構76でシャッタ74が巻き取られる構造とされていれば、電解槽14の近傍と検査研磨機構20内との雰囲気を分離することで互いに干渉する事態を防ぐことができる。   In this case, the opening of the storage unit 13 is sealed by the shutter 74 when the inspection polishing mechanism 20 is in the standby position, and the shutter 74 is wound by the winding mechanism 76 when the inspection polishing mechanism 20 moves to the inspection position. If it is set as the structure taken, the situation which interferes mutually can be prevented by isolate | separating the atmosphere of the vicinity of the electrolytic vessel 14, and the test | inspection grinding | polishing mechanism 20 inside.

<検査と補修> <Inspection and repair>

本実施形態においては、製箔工程終了後あるいは工程前の状態において、移動手段72が図2に示すように検査研磨機構20を待機位置(2点鎖線で表示)から検査時位置(実線で表示)へと移動させ、銅箔用ローラ12の表面を検査機構60のCCDカメラ62が撮影し、凹凸の検査を開始する。このとき、移動手段72でCCDカメラ62の合焦位置まで検査研磨機構20を移動させた際には研磨ローラ34は銅箔用ローラ12の表面に接触しない(離間している)ことが望ましい。すなわち、CCDカメラ62の撮影位置は研磨機構30(研磨ローラ34)による研磨位置よりも銅箔用ローラ12の表面から遠く、研磨時には更に銅箔用ローラ12の表面に接近し研磨位置とする。   In the present embodiment, the moving means 72 moves the inspection and polishing mechanism 20 from the standby position (indicated by a two-dot chain line) to the inspection time position (indicated by a solid line) as shown in FIG. ), The surface of the copper foil roller 12 is photographed by the CCD camera 62 of the inspection mechanism 60, and the inspection of the unevenness is started. At this time, when the inspection and polishing mechanism 20 is moved to the in-focus position of the CCD camera 62 by the moving means 72, it is desirable that the polishing roller 34 does not contact (separate) the surface of the copper foil roller 12. That is, the photographing position of the CCD camera 62 is farther from the surface of the copper foil roller 12 than the polishing position by the polishing mechanism 30 (polishing roller 34), and is closer to the surface of the copper foil roller 12 at the time of polishing.

検査工程としては、まず銅箔用ローラ12を回転させながら銅箔用ローラ12の表面にて凹凸の有無およびその位置を検査機構60で検出し、検出された凹凸の形状、大きさ、および場所(軸方向位置、周方向位置)を記憶装置64に記憶させると共に、制御部66にて検査研磨機構20、移動手段72、電解槽上下機構70および銅箔用ローラ12を回転駆動する図示しない駆動手段に対して、移動および駆動の指示を行う。   As the inspection process, first, the presence or absence and position of the unevenness on the surface of the copper foil roller 12 is detected by the inspection mechanism 60 while rotating the copper foil roller 12, and the shape, size, and location of the detected unevenness are detected. (Axial position, circumferential position) are stored in the storage device 64, and the control unit 66 rotates the inspection polishing mechanism 20, the moving means 72, the electrolytic cell vertical mechanism 70, and the copper foil roller 12 (not shown). Instructions for movement and driving are given to the means.

CCDカメラ62による銅箔用ローラ12の表面凹凸の検出は、例えば照明装置68として設けられたLEDアレイにより銅箔用ローラ12の表面を均一に照明し、凹凸の存在により生じた影や反射による明暗を反射光量差によって検出し、サイズ、形状および位置のデータとする方法などが考えられる。   The surface unevenness of the copper foil roller 12 by the CCD camera 62 is detected by, for example, illuminating the surface of the copper foil roller 12 uniformly with an LED array provided as an illumination device 68, and by shadows and reflections caused by the presence of the unevenness. A method is conceivable in which brightness and darkness are detected based on the difference in the amount of reflected light and used as size, shape, and position data.

銅箔用ローラ12は円筒形であるため、凹凸の周方向位置は検査機構60(CCDカメラ62)に対する軸12Cの回転位置で置き換えることができる。また銅箔用ローラ12の軸方向長さにわたってCCDカメラ62が撮影を行っていれば、凹凸の軸方向位置は画像内の位置座表として直接数値化が可能であり、また短いCCDカメラ62を銅箔用ローラ12の軸方向に移動させて撮影を行う場合は、CCDカメラ62の軸方向位置を加味して位置座標とすることができる。   Since the copper foil roller 12 has a cylindrical shape, the circumferential position of the irregularities can be replaced with the rotational position of the shaft 12C with respect to the inspection mechanism 60 (CCD camera 62). Further, if the CCD camera 62 has taken images over the axial length of the copper foil roller 12, the axial position of the projections and depressions can be directly digitized as a position map in the image. When photographing is performed by moving the copper foil roller 12 in the axial direction, the position coordinates can be obtained by taking into account the axial position of the CCD camera 62.

さらにCCDカメラ62と研磨ローラ34との、銅箔用ローラ12の表面における周方向距離は予め正確に計測されており、CDDカメラ62で検出された凹凸が銅箔用ローラ12の回転に伴って研磨ローラ34と対向する(銅箔用ローラ12の)回転位置に達するタイミングを、制御部66で算出することができる。   Further, the circumferential distance between the CCD camera 62 and the polishing roller 34 on the surface of the copper foil roller 12 is accurately measured in advance, and the irregularities detected by the CDD camera 62 are accompanied by the rotation of the copper foil roller 12. The timing at which the rotational position (of the copper foil roller 12) that faces the polishing roller 34 is reached can be calculated by the control unit 66.

銅箔用ローラ12の回転に伴い、検出された凹凸が研磨ローラ34と対向する位置に移動すると、上記のように移動手段72が検査研磨機構20を検査時位置から更に銅箔用ローラ12に接近した位置へ移動させ、研磨ローラ34、液切りブレード36、水切りブレード44が銅箔用ローラ12の表面に接触する状態とする。   When the detected irregularities move to the position facing the polishing roller 34 as the copper foil roller 12 rotates, the moving means 72 moves the inspection polishing mechanism 20 from the inspection position to the copper foil roller 12 as described above. The polishing roller 34, the liquid draining blade 36, and the water draining blade 44 are brought into contact with the surface of the copper foil roller 12.

あるいは研磨ローラ34、液切りブレード36、水切りブレード44(水槽46)に関して更に移動機構を設け、銅箔用ローラ12の表面に対して接離方向に移動可能な構成とされていてもよい。   Alternatively, a moving mechanism may be further provided for the polishing roller 34, the liquid draining blade 36, and the water draining blade 44 (water tank 46) so as to be movable toward and away from the surface of the copper foil roller 12.

研磨液槽38から研磨液32を供給された研磨ローラ34が銅箔用ローラ12の表面に接触し、さらに研磨ローラ34が回転することで凹凸を研磨、補修する。この際に生じるダスト(金属粉)は下流側に設けられた洗浄機構40によって銅箔用ローラ12の表面から除去される。   The polishing roller 34 supplied with the polishing liquid 32 from the polishing liquid tank 38 comes into contact with the surface of the copper foil roller 12, and the polishing roller 34 rotates to polish and repair the unevenness. Dust (metal powder) generated at this time is removed from the surface of the copper foil roller 12 by the cleaning mechanism 40 provided on the downstream side.

さらに補修後の凹凸箇所を下流側の検査機構60で再度撮影することで、正しく補修が行われ平面性が確保できたか否かの再確認を行うことができる。   Furthermore, by re-photographing the uneven portion after the repair with the inspection mechanism 60 on the downstream side, it is possible to reconfirm whether or not the repair has been correctly performed and the flatness has been secured.

次に銅箔用ローラ12の表面に存在する凹凸について、凹部と凸部に分けた補修作業の内容を以下に説明する。   Next, the contents of the repair work for the concave and convex portions present on the surface of the copper foil roller 12 will be described below.

図3に示すように、銅箔用ローラ12の表面に凸部12Aが存在する場合、この表面に析出する銅箔16にも凸部12Aに対応した凹部16Aが形成されてしまうため、平面性および強度が失われる虞がある。   As shown in FIG. 3, when the convex part 12A exists on the surface of the copper foil roller 12, the concave part 16A corresponding to the convex part 12A is also formed on the copper foil 16 deposited on the surface. And the strength may be lost.

経験上、凸部12Aの平均サイズは平面的サイズとして10〜100μm程度であり、突出高さは10μm程度となることが多い。製造される銅箔16の厚さは数μm程度であるため、この凸部12Aの存在により銅箔16に穴が開く欠陥となってしまう。   From experience, the average size of the convex portion 12A is about 10 to 100 μm as a planar size, and the protruding height is often about 10 μm. Since the thickness of the manufactured copper foil 16 is about several μm, the presence of the convex portion 12A causes a defect in which a hole is formed in the copper foil 16.

上記の理由から、研磨ローラ34は少なくとも10μm程度の厚さを研磨し、凸部12Aのみを研磨するために弱い押し込み力で研磨することが望ましい。この結果、凸部12Aの周囲に広がる平坦部は殆ど研磨されず、凸部12Aを除去することができるので、銅箔16の穴欠陥を回避することができる。   For the above reasons, it is desirable that the polishing roller 34 is polished to a thickness of at least about 10 μm and polished with a weak pushing force in order to polish only the convex portion 12A. As a result, the flat portion extending around the convex portion 12A is hardly polished and the convex portion 12A can be removed, so that a hole defect in the copper foil 16 can be avoided.

一方、図4に示すように銅箔用ローラ12の表面に凹部12Bが存在する場合、この表面に析出する銅箔16にも凹部12Bに対応した凸部16Bが形成されてしまうため、平面性および凸部16B周囲の強度が失われる虞がある。   On the other hand, as shown in FIG. 4, when the concave portion 12B exists on the surface of the copper foil roller 12, the convex portion 16B corresponding to the concave portion 12B is also formed on the copper foil 16 deposited on the surface. In addition, the strength around the convex portion 16B may be lost.

経験上、凹部12Bの平均サイズは平面的サイズとして10〜100μm程度であり、深さは10μm程度となることが多い。製造される銅箔16の厚さは数μm程度であるため、この凸部12Aの存在により銅箔16の厚さを超える凸部16Bが形成され、欠陥となってしまう。   From experience, the average size of the recesses 12B is about 10 to 100 μm as a planar size, and the depth is often about 10 μm. Since the thickness of the copper foil 16 to be manufactured is about several μm, the presence of the convex portion 12A forms a convex portion 16B exceeding the thickness of the copper foil 16, resulting in a defect.

上記の理由から、研磨ローラ34は少なくとも10μm程度の厚さを研磨し、凹部12Bの周囲を研磨するために、凸部12Aを研磨した時に比較して強い押し込み力で研磨することが望ましい。この結果、凹部12Bの周囲に広がる平坦部は薄く研磨され、凹部12Bを除去することができるので、銅箔16に凸部16Bが生じる欠陥を回避することができる。あるいは、研磨ローラ34の押し込み量(深さ)を制御する押し込み量制御とすることで銅箔用ローラ12の表面を滑らかに研磨することもできる。   For the above reason, it is desirable that the polishing roller 34 is polished with a stronger pressing force than when the convex portion 12A is polished in order to polish the thickness of at least about 10 μm and polish the periphery of the concave portion 12B. As a result, the flat portion extending around the concave portion 12B is thinly polished and the concave portion 12B can be removed, so that a defect in which the convex portion 16B is generated in the copper foil 16 can be avoided. Alternatively, the surface of the copper foil roller 12 can be smoothly polished by controlling the amount of pressing (depth) of the polishing roller 34.

本発明は上記の構成としたので、製箔ローラ表面の凹凸を簡易に、かつ高い精度で検出し補修する検査装置とすることができた。   Since the present invention has the above-described configuration, it was possible to provide an inspection apparatus that detects and repairs irregularities on the surface of the foil-making roller easily and with high accuracy.

<その他> <Others>

以上、本発明の実施例について記述したが、本発明は上記の実施例に何ら限定されるものではなく、本発明の要旨を逸脱しない範囲において種々なる態様で実施し得ることは言うまでもない。   As mentioned above, although the Example of this invention was described, it cannot be overemphasized that this invention is not limited to said Example at all, and can implement in a various aspect in the range which does not deviate from the summary of this invention.

例えば上記実施形態ではCCDカメラ62を備えた検査機構60を用いたが、これに限定せずレーザ測距手段や超音波による距離測定など、非接触で銅箔用ローラ12の表面に生じた凹凸を検出できる構成であれば使用することができる。   For example, in the above-described embodiment, the inspection mechanism 60 including the CCD camera 62 is used. However, the present invention is not limited thereto, and irregularities generated on the surface of the copper foil roller 12 in a non-contact manner such as laser distance measurement means or ultrasonic distance measurement. Any configuration can be used as long as it can be detected.

また研磨液32を含ませた研磨ローラ34に代えてベルト式の研磨装置などを用いてもよく、回転運動ではなく微振動で表面を研磨する方式としてもよい。   Further, instead of the polishing roller 34 containing the polishing liquid 32, a belt type polishing apparatus or the like may be used, and the surface may be polished by slight vibration instead of rotational movement.

さらに、上記実施形態では検査研磨機構20全体を移動手段72で銅箔用ローラ12に対して接離方向に移動可能としているが、研磨機構30、洗浄機構40、検査機構60それぞれを独立して各々専用の移動手段によって移動可能とする構成でもよい。例えばこの場合では検査機構60で銅箔用ローラ12の表面汚れ等を検出し、洗浄機構40で洗浄のみ行うこともできる。   Furthermore, in the above-described embodiment, the entire inspection and polishing mechanism 20 can be moved in the contact / separation direction with respect to the copper foil roller 12 by the moving means 72. However, the polishing mechanism 30, the cleaning mechanism 40, and the inspection mechanism 60 are independently provided. It may be configured to be movable by dedicated moving means. For example, in this case, the inspection mechanism 60 can detect surface contamination of the copper foil roller 12 and the cleaning mechanism 40 can only perform cleaning.

10 製箔ローラ検査装置
11 筐体
12 銅箔用ローラ
12A 凸部
12B 凹部
12C 軸
13 格納部
14 電解槽
15 陽極
16 銅箔
16A 凹部
16B 凸部
18 電解液
20 検査研磨機構
30 研磨機構(研磨手段)
32 研磨液
34 研磨ローラ
36 液切りブレード
38 研磨液槽
40 洗浄機構(洗浄手段)
42 洗浄水
44 水切りブレード
46 水槽
50 排気ボックス
52 水洗ノズル
54 エアナイフ
60 検査機構(検査手段)
62 CCDカメラ
64 記憶装置
66 制御部
68 照明装置
70 電解槽上下機構
72 移動手段
74 シャッタ
76 巻取機構
DESCRIPTION OF SYMBOLS 10 Foil-making roller inspection apparatus 11 Case 12 Copper foil roller 12A Convex part 12B Concave part 12C Shaft 13 Storage part 14 Electrolytic tank 15 Anode 16 Copper foil 16A Concave part 16B Convex part 18 Electrolytic solution 20 Inspection polishing mechanism 30 Polishing mechanism (polishing means) )
32 Polishing liquid 34 Polishing roller 36 Liquid draining blade 38 Polishing liquid tank 40 Cleaning mechanism (cleaning means)
42 Washing water 44 Draining blade 46 Water tank 50 Exhaust box 52 Water washing nozzle 54 Air knife 60 Inspection mechanism (inspection means)
62 CCD camera 64 Storage device 66 Control unit 68 Illumination device 70 Electrolyzer vertical mechanism 72 Moving means 74 Shutter 76 Winding mechanism

Claims (5)

電解槽に浸漬され、表面に銅箔を析出させるための製箔ローラの表面に接触し研磨剤で研磨する研磨ローラと、前記研磨ローラに研磨材を供給する研磨材供給部とからなる研磨手段と、
前記製箔ローラの表面を洗浄する洗浄手段と、
回転する前記製箔ローラの表面の凹凸を検査する検査手段と、
を備えた検査研磨機構と、
前記検査手段の検査結果に従い前記製箔ローラの表面研磨の要否を判断する制御手段と、
前記検査研磨機構を前記製箔ローラに対して接離方向に移動可能に支持し、前記制御手段の判断に従って前記製箔ローラに接近し表面の凹凸検査および表面の研磨を行う検査補修位置と、前記製箔ローラから離れて製箔工程への干渉を避ける退避位置との間を移動させる移動手段と、
を有することを特徴とする製箔ローラ検査装置。
A polishing means comprising a polishing roller immersed in an electrolytic bath and contacting the surface of a foil-making roller for depositing copper foil on the surface and polishing with an abrasive, and an abrasive supply unit for supplying the polishing material to the polishing roller When,
Cleaning means for cleaning the surface of the foil-making roller;
Inspection means for inspecting irregularities on the surface of the rotating foil making roller;
Inspection and polishing mechanism with
Control means for determining the necessity of surface polishing of the foil making roller according to the inspection result of the inspection means;
An inspection / repair position for supporting the inspection / polishing mechanism so as to be movable in the contact / separation direction with respect to the foil-making roller, approaching the foil-making roller according to the judgment of the control means, and performing surface unevenness inspection and surface polishing, Moving means for moving between the retreat position to avoid interference with the foil making process away from the foil making roller;
A foil-making roller inspection device characterized by comprising:
前記研磨手段は、研磨剤を含有する研磨液を貯留する研磨液槽と、前記研磨液で前記製箔ローラの表面を研磨する研磨ローラと、前記製箔ローラの表面から前記研磨液をスクイーズする液切りブレードと、を備え、前記洗浄手段および前記検査手段よりも前記製箔ローラの回転方向上流側に設けられたことを特徴とする請求項1に記載の製箔ローラ検査装置。   The polishing means is a polishing liquid tank for storing a polishing liquid containing an abrasive, a polishing roller for polishing the surface of the foil making roller with the polishing liquid, and a squeeze of the polishing liquid from the surface of the foil making roller. The foil-making roller inspection device according to claim 1, further comprising a liquid draining blade, and provided on the upstream side of the cleaning means and the inspection means in the rotation direction of the foil-making roller. 前記洗浄手段は、前記製箔ローラの表面に洗浄水を噴射する水洗ノズルと、前記製箔ローラ表面より水分を吹き飛ばして除去するエアナイフと、前記製箔ローラの表面から水分をスクイーズする水切りブレードと、前記洗浄ノズルおよび前記エアナイフを収納し水洗時および乾燥時に生じるミストの拡散を防止する排気ボックスとを備え、前記研磨手段よりも前記製箔ローラの回転方向下流側、かつ前記検査手段よりも前記製箔ローラの回転方向上流側に設けられたことを特徴とする請求項1または請求項2に記載の製箔ローラ検査装置。   The cleaning means includes a water washing nozzle that sprays cleaning water onto the surface of the foil making roller, an air knife that blows and removes water from the surface of the foil making roller, and a draining blade that squeezes water from the surface of the foil making roller. An exhaust box that houses the cleaning nozzle and the air knife and prevents the mist from spreading during washing and drying, and downstream of the polishing means in the rotational direction of the foil-making roller, and more than the inspection means. The foil-making roller inspection device according to claim 1, wherein the foil-making roller inspection device is provided on the upstream side in the rotation direction of the foil-making roller. 前記検査手段は、回転する前記製箔ローラの表面を撮影し、撮影画像から凹凸を光学的に検出するCCDカメラと、前記CCDカメラの視野を照明する照明手段と、前記CCDカメラの映像から前記製箔ローラの表面に存在する凹凸の形状、大きさ及び位置を記憶する記憶手段と、を備え、前記研磨手段および前記洗浄手段よりも前記製箔ローラの回転方向下流側に設けられたことを特徴とする請求項1〜請求項3の何れか1項に記載の製箔ローラ検査装置。   The inspection means shoots the surface of the rotating foil-making roller, optically detects irregularities from the photographed image, illumination means for illuminating the visual field of the CCD camera, and the image of the CCD camera. Storage means for storing the shape, size and position of irregularities present on the surface of the foil-making roller, and provided on the downstream side in the rotational direction of the foil-making roller with respect to the polishing means and the cleaning means. The foil-making roller inspection device according to any one of claims 1 to 3, wherein 前記製箔ローラ、前記電解槽、前記検査研磨機構、および前記移動手段を保持し外気から遮断する筐体と、筐体内部で前記検査研磨機構を待機位置にて格納する格納部と、前記格納部の開口部分を封止するシャッタと、前記電解槽を上下させ前記製箔ローラを電解液に浸漬させる位置と退避位置とに移動させる電解槽上下手段と、を備えたことを特徴とする請求項1〜請求項4の何れか1項に記載の製箔ローラ検査装置。   The foil-making roller, the electrolytic cell, the inspection polishing mechanism, and a casing that holds the moving means and shields it from the outside air, a storage unit that stores the inspection polishing mechanism in a standby position inside the casing, and the storage A shutter that seals the opening of the part, and an electrolytic cell up-and-down means that moves the electrolytic cell up and down to move the foil-making roller to a position where it is immersed in an electrolytic solution and a retracted position. The foil-making roller test | inspection apparatus of any one of Claims 1-4.
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