JP2013110623A - Mems vibrator, manufacturing method of mems vibrator, and oscillator - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an MEMS vibrator which inhibits fatigue breakdown of a beam part.SOLUTION: An MEMS vibrator 100 according to this invention comprises: a silicon substrate 10; a silicon nitride layer 30 disposed above the silicon substrate 10; a first electrode 40 disposed above the silicon nitride layer 30; a second electrode 50 having a beam part 54 which is disposed having a gap with the first electrode 40 and may be vibrated in the thickness direction of the silicon substrate 10 by an electrostatic force, and a support part 56 disposed above the silicon nitride layer 30 and supporting the beam part 54. Materials of the first electrode 40 and the second electrode 50 are single crystal silicon having conductivity.

Description

  The present invention relates to a MEMS vibrator, a manufacturing method thereof, and an oscillator.

  MEMS (Micro Electro Mechanical Systems) is one of micro structure forming techniques, and refers to, for example, a technique for producing a micro electro-mechanical system of micron order and its product.

  Patent Document 1 describes that a cantilever-like MEMS vibrator is formed on the surface of a semiconductor substrate and a CMOS (Complementary Metal Oxide Semiconductor) is also formed in the same chip. This MEMS vibrator is composed of an upper MEMS structure layer and a lower MEMS structure layer made of polycrystalline silicon imparted with conductivity, and a resonance frequency can be obtained by bending vibration of the upper MEMS structure layer. .

JP 2008-105157 A

  Such a MEMS vibrator may cause fatigue failure due to repeated bending vibration of the beam portion.

  One of the objects according to some aspects of the present invention is to provide a MEMS vibrator capable of suppressing a fatigue failure of a beam portion. Another object of some aspects of the present invention is to provide a method of manufacturing a MEMS vibrator capable of suppressing a fatigue failure of a beam portion. Another object of some aspects of the present invention is to provide an oscillator having the MEMS vibrator described above.

The MEMS vibrator according to the present invention includes:
A silicon substrate;
A silicon nitride layer disposed above the silicon substrate;
A first electrode disposed above the silicon nitride layer;
A beam part disposed between the first electrode and the first electrode so as to be vibrated by an electrostatic force in the thickness direction of the silicon substrate, and disposed above the silicon nitride layer and supporting the beam part. A second electrode having a support portion to
Including
The material of the first electrode and the second electrode is single crystal silicon having conductivity.

  According to such a MEMS vibrator, it is possible to suppress the fatigue failure of the beam portion as compared with the case where the material of the first electrode and the second electrode is polycrystalline silicon. Thereby, for example, the mechanical characteristics of the beam portion can be improved, and the life can be extended. For example, when the material of the first electrode and the second electrode is polycrystalline silicon, the beam portion may be broken at the grain boundary due to flexural vibration, and fatigue fracture is likely to occur compared to single crystal silicon.

  Furthermore, according to such a MEMS vibrator, since the beam portion can be prevented from fatigue failure as described above, it is possible to prevent the positional accuracy of the beam portion from being lowered even if the beam portion is repeatedly bent and vibrated. .

  Single crystal silicon has higher flatness than polycrystalline silicon. Therefore, according to such a MEMS vibrator, for example, even if gas is generated around the first electrode and the second electrode, it is possible to suppress trapping of the gas in the first electrode and the second electrode.

  Furthermore, according to such a MEMS vibrator, the first electrode and the second electrode are disposed on the silicon nitride layer. Therefore, it can suppress that a beam part sticks to a silicon substrate (namely, pull-in).

  In the description according to the present invention, the word “upper” is used, for example, “specifically” (hereinafter referred to as “A”) is formed above another specific thing (hereinafter referred to as “B”). The word “above” is used to include the case where B is formed directly on A and the case where B is formed on A via another object. Used.

In the MEMS vibrator according to the present invention,
A buffer layer disposed between the silicon substrate and the silicon nitride layer;
The buffer material may be single crystal silicon.

  According to such a MEMS vibrator, since the flatness of the first silicon germanium layer described later can be improved, the flatness of the first electrode can be improved.

A method for manufacturing a MEMS vibrator according to the present invention includes:
Forming a first insulating layer above the silicon substrate;
Patterning the first insulating layer to expose the silicon substrate;
Epitaxially growing a first silicon germanium layer above the exposed silicon substrate;
Epitaxially growing a first single crystal silicon layer on the first silicon germanium layer;
Forming a second insulating layer so as to cover the first single crystal silicon layer;
Patterning the first insulating layer and the second insulating layer to expose side surfaces of the first silicon germanium layer;
Forming a through hole in the second insulating layer and the first single crystal silicon layer to expose the first silicon germanium layer;
Removing the first silicon germanium layer by passing an etching solution or an etching gas through the through hole;
Forming a silicon nitride layer between the silicon substrate from which the first silicon germanium layer has been removed and the first single crystal silicon layer;
Removing the second insulating layer;
Patterning the first single crystal silicon layer to form a fixing portion of the first electrode and the second electrode;
Epitaxially growing a second silicon germanium layer so as to cover the first electrode;
Epitaxially growing a second single crystal silicon layer so as to cover the second silicon germanium layer and the fixed portion;
The second single crystal silicon layer is patterned to form a beam portion of the second electrode that can be vibrated by an electrostatic force in the thickness direction of the silicon substrate above the first electrode, and on the fixed portion. Forming a support portion of the second electrode that supports the beam portion;
Removing the second silicon germanium layer;
including.

  According to such a method of manufacturing a MEMS vibrator, a MEMS vibrator having the single crystal silicon layer as the first electrode and the second electrode can be formed above the silicon substrate.

  Furthermore, according to such a method of manufacturing a MEMS vibrator, the first silicon germanium layer between the silicon substrate and the first single crystal silicon layer can be removed by passing an etching solution or etching gas through the through hole. Therefore, even when the first electrode and the second electrode having a large area in plan view are formed, for example, by increasing the number of through holes, the first silicon between the silicon substrate and the first single crystal silicon layer is formed. The germanium layer can be removed. Further, for example, by increasing the number of through holes, the etching time of the first silicon germanium layer can be shortened, and the first single crystal silicon layer can be prevented from being damaged by the etching solution.

  Furthermore, according to such a method of manufacturing a MEMS vibrator, a MEMS vibrator capable of suppressing the fatigue failure of the beam portion is formed compared to the case where the material of the first electrode and the second electrode is polycrystalline silicon. can do.

  Furthermore, according to such a method of manufacturing a MEMS vibrator, a silicon nitride layer can be formed between the silicon substrate and the first electrode and the second electrode. Therefore, in the release process for removing the second silicon germanium layer, the silicon nitride layer is not etched, and the beam portion of the second electrode can be prevented from sticking to the silicon substrate (pull-in).

In the manufacturing method of the MEMS vibrator according to the present invention,
Further comprising the step of epitaxially growing a buffer layer on the silicon substrate before the step of epitaxially growing the first silicon germanium layer,
In the step of epitaxially growing the first silicon germanium layer,
Epitaxially growing the first silicon germanium layer on the buffer layer;
The buffer material may be single crystal silicon.

  According to such a method of manufacturing a MEMS vibrator, the flatness of the first silicon germanium layer can be improved. Therefore, the flatness of the first single crystal silicon layer epitaxially grown on the first silicon germanium layer can be improved, and a first electrode having high flatness can be formed.

In the manufacturing method of the MEMS vibrator according to the present invention,
Before the step of forming the silicon nitride layer, the method may further include a step of epitaxially growing the first single crystal silicon layer so as to close the through hole formed in the first single crystal silicon layer.

  According to such a method of manufacturing a MEMS vibrator, the strength of the first electrode and the second electrode can be increased as compared with the case where the through hole is not blocked.

The oscillator according to the present invention is
A MEMS resonator according to the present invention;
A circuit unit electrically connected to the first electrode and the second electrode of the MEMS vibrator;
including.

  Such an oscillator can have high reliability.

FIG. 3 is a cross-sectional view schematically showing the MEMS vibrator according to the embodiment. The top view which shows typically the MEMS vibrator | oscillator concerning this embodiment. Sectional drawing and the top view which show typically the manufacturing process of the MEMS vibrator | oscillator which concerns on this embodiment. Sectional drawing and the top view which show typically the manufacturing process of the MEMS vibrator | oscillator which concerns on this embodiment. Sectional drawing and the top view which show typically the manufacturing process of the MEMS vibrator | oscillator which concerns on this embodiment. Sectional drawing and the top view which show typically the manufacturing process of the MEMS vibrator | oscillator which concerns on this embodiment. Sectional drawing and the top view which show typically the manufacturing process of the MEMS vibrator | oscillator which concerns on this embodiment. Sectional drawing and the top view which show typically the manufacturing process of the MEMS vibrator | oscillator which concerns on this embodiment. Sectional drawing and the top view which show typically the manufacturing process of the MEMS vibrator | oscillator which concerns on this embodiment. Sectional drawing and the top view which show typically the manufacturing process of the MEMS vibrator | oscillator which concerns on this embodiment. Sectional drawing and the top view which show typically the manufacturing process of the MEMS vibrator | oscillator which concerns on this embodiment. Sectional drawing and the top view which show typically the manufacturing process of the MEMS vibrator | oscillator which concerns on this embodiment. Sectional drawing and the top view which show typically the manufacturing process of the MEMS vibrator | oscillator which concerns on this embodiment. Sectional drawing and the top view which show typically the manufacturing process of the MEMS vibrator | oscillator which concerns on this embodiment. Sectional drawing and the top view which show typically the manufacturing process of the MEMS vibrator | oscillator which concerns on this embodiment. Sectional drawing and the top view which show typically the manufacturing process of the MEMS vibrator | oscillator which concerns on this embodiment. Sectional drawing and the top view which show typically the manufacturing process of the MEMS vibrator | oscillator which concerns on this embodiment. The SEM observation result of Experimental example 1. The SEM observation result of Experimental example 2. The circuit diagram which shows the oscillator concerning this embodiment. The circuit diagram which shows the oscillator which concerns on the modification of this embodiment.

  DESCRIPTION OF EMBODIMENTS Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the drawings. The embodiments described below do not unduly limit the contents of the present invention described in the claims. In addition, not all of the configurations described below are essential constituent requirements of the present invention.

1. MEMS vibrator First, a MEMS vibrator according to this embodiment will be described with reference to the drawings. FIG. 1 is a cross-sectional view schematically showing a MEMS vibrator 100 according to this embodiment. FIG. 2 is a plan view schematically showing the MEMS vibrator 100 according to the present embodiment. 1 is a cross-sectional view taken along the line II of FIG.

  As illustrated in FIGS. 1 and 2, the MEMS vibrator 100 includes a silicon substrate 10, a silicon nitride layer 30, a first electrode 40, and a second electrode 50. Further, the MEMS vibrator 100 can include a buffer layer 20, a silicon oxide layer 32, and an insulating layer 34 (also referred to as the first insulating layer 34).

  The silicon substrate 10 is a substrate made of, for example, single crystal silicon.

  The silicon oxide layer 32 is disposed on the silicon substrate 10. The silicon oxide layer 32 is a layer made of, for example, silicon oxide. More specifically, the silicon oxide layer 32 is, for example, a pad oxide film used when forming a LOCOS (local oxidation of silicon) insulating layer, a semi-recessed LOCOS insulating layer, and a trench insulating layer. The first electrode 40 and the second electrode 50 may be electrically separated from other elements (for example, a transistor, not shown) by the silicon oxide layer 32.

  The insulating layer 34 is disposed on the silicon oxide layer 32. The insulating layer 34 is a layer made of, for example, silicon nitride.

  The buffer layer 20 is disposed on the silicon substrate 10. In the illustrated example, the buffer layer 20 is formed on the surface of the silicon substrate 10 where the silicon oxide layer 32 is not provided. The upper surface of the buffer layer 20 is continuous with the upper surface of the silicon oxide layer 32, for example. The thickness of the buffer layer 20 is, for example, not less than 0.01 μm and not more than 0.1 μm. The material of the buffer layer 20 is single crystal silicon, and the buffer layer 20 is a layer made of single crystal silicon. The buffer layer 20 can improve the flatness of the first silicon germanium layer 60 described later.

  The silicon nitride layer 30 is disposed on the buffer layer 20. In the example shown in FIG. 2, insulating layers 34 are formed on both sides of the silicon nitride layer 30 in plan view. The upper surface of the silicon nitride layer 30 is continuous with, for example, the upper surface of the insulating layer 34. The thickness of the silicon nitride layer 30 is not less than 0.1 μm and not more than 1 μm, for example. The silicon nitride layer 30 is a layer made of, for example, silicon nitride.

  The first electrode 40 is disposed on the silicon nitride layer 30. The shape of the first electrode 40 is, for example, a layer shape or a thin film shape. The thickness of the 1st electrode 40 is 0.1 micrometer or more and 10 micrometers or less, for example. The planar shape of the first electrode 40 is not particularly limited as long as it has a surface facing the beam portion 54 of the second electrode 50 with a gap.

  The second electrode 50 is disposed on the silicon nitride layer 30 with a gap from the first electrode 40. The material of the first electrode 40 and the second electrode 50 is single crystal silicon having conductivity. More specifically, the material of the electrodes 40 and 50 is single crystal silicon provided with conductivity by doping a predetermined impurity (for example, boron).

  The second electrode 50 includes a fixed portion 52 fixed on the silicon substrate 10, a beam portion 54 disposed to face the first electrode 40, and a support portion 56 disposed on the fixed portion 52 and supporting the beam portion 54. , Can have.

  The beam portion 54 is disposed with a gap between the beam portion 54 and the first electrode 40. The beam portion 54 is formed above the first electrode 40 at a predetermined interval from the first electrode 40. The distance between the beam part 54 and the 1st electrode 40 is 0.01 micrometer or more and 1 micrometer or less, for example. The beam portion 54 extends from the support portion 56. The second electrode 40 is formed in a cantilever shape (cantilever shape) in which one end of the beam portion 54 is fixed by the support portion 56 and the other end of the beam portion 54 is free. Although the planar shape of the beam part 54 is not specifically limited, In the example shown in FIG. The thickness of the beam portion 54 is, for example, not less than 0.1 μm and not more than 10 μm.

  The fixing part 52 fixes the support part 56 above the silicon nitride layer 30. The thickness of the fixing part 52 is the same as the thickness of the first electrode 40, for example. The shape of the fixing portion 52 is not particularly limited as long as the supporting portion 56 can be fixed above the silicon nitride layer 30.

  The support portion 56 is disposed on the fixed portion 52 and is fixed to the fixed portion 52. The thickness of the support part 56 is the same as the thickness of the beam part 54, for example. The shape of the support part 56 will not be specifically limited if the beam part 54 can be supported.

  In the MEMS vibrator 100, when a voltage (alternating voltage) is applied between the first electrode 40 and the second electrode 50, the beam portion 54 has a thickness of the substrate 10 due to an electrostatic force generated between the electrodes 40 and 50. Can vibrate in the direction. Here, it can be said that the thickness direction of the substrate 10 is a direction along the perpendicular P of the main surface of the substrate 10 (surface on which the electrodes 40 and 50 are formed). Thereby, for example, a signal (output signal) having a predetermined frequency (frequency corresponding to the natural frequency of the beam portion 54) can be output from the first electrode 40. The MEMS vibrator 100 is an electrostatic MEMS vibrator that operates by electrostatic force. The first electrode 40 and the fixing portion 52 of the second electrode 50 can be connected to a wiring (not shown) for applying a voltage between the electrodes 40 and 50.

  Although not shown, the MEMS vibrator 100 may have a covering structure that hermetically seals the first electrode 40 and the second electrode 50 in a reduced pressure state. Thereby, the air resistance at the time of vibration of the beam part 54 can be reduced.

  The MEMS vibrator 100 has the following features, for example.

  According to the MEMS vibrator 100, the material of the first electrode 40 and the second electrode 50 is single crystal silicon having conductivity. Therefore, the MEMS vibrator 100 can suppress fatigue failure of the beam portion 54 compared to the case where the material of the first electrode and the second electrode is polycrystalline silicon. Thereby, for example, the mechanical characteristics of the beam portion 54 can be improved, and the life can be extended. For example, when the material of the first electrode and the second electrode is polycrystalline silicon, the beam portion may be broken at the grain boundary due to flexural vibration, and fatigue fracture is likely to occur compared to single crystal silicon.

  Furthermore, according to the MEMS vibrator 100, since the beam portion 54 can be prevented from being fatigued and destroyed as described above, the positional accuracy of the beam portion 54 is prevented from being lowered even if the beam portion 54 is repeatedly bent and vibrated. it can.

  Single crystal silicon has higher flatness than polycrystalline silicon. Therefore, according to the MEMS vibrator 100, for example, even if gas is generated around the electrodes 40 and 50, it is possible to prevent the gas from being trapped by the electrodes 40 and 50. When gas is trapped in the electrode, the frequency of the MEMS vibrator varies, and a desired frequency may not be obtained. The gas generation source is not particularly limited, but may be generated, for example, from a covering structure (not shown) that hermetically seals the electrodes 40 and 50.

  Furthermore, according to the MEMS vibrator 100, the electrodes 40 and 50 are disposed on the silicon nitride layer 30. Therefore, it is possible to suppress the beam portion 54 of the second electrode 50 from adhering to the silicon substrate 10 (the buffer layer 20 in the example shown in FIG. 1) (that is, pull-in). For example, when a silicon nitride layer is not formed between the electrode and the silicon substrate, and the electrode is disposed with a gap from the silicon substrate, the electrode is pulled to the silicon substrate having the ground potential, and pull-in is not generated. Will occur.

  Note that when the first electrode and the second electrode are disposed in contact with the silicon substrate (in contact with the buffer layer) without providing the silicon nitride layer, the first electrode and the second electrode are disposed through the silicon substrate (through the buffer layer). The two electrodes may be short-circuited.

  Further, when a silicon oxide layer is used instead of the silicon nitride layer, the silicon oxide layer may be etched in a release process described later, and pull-in may not be suppressed.

  According to the MEMS vibrator 100, the buffer layer 20 can be disposed between the silicon substrate 10 and the silicon nitride layer 30. Thereby, since the flatness of the 1st silicon germanium layer 60 mentioned later can be improved, the flatness of the 1st electrode 40 can be improved. For example, when the flatness of the first electrode is low and the surface has irregularities, the first electrode and the second electrode come into contact with each other and the first electrode and the second electrode are short-circuited when the beam is bent and vibrated. There is a possibility.

2. Next, a method for manufacturing a MEMS vibrator according to the present embodiment will be described with reference to the drawings. 3 to 17 are diagrams schematically showing a manufacturing process of the MEMS vibrator 100 according to the present embodiment. 3 to 17, (a) in the drawing shows a plan view, and (b) in the drawing shows a cross-sectional view taken along line BB of the plan view shown in (a). Furthermore, in FIGS. 7-11, the CC sectional view taken on the line of the top view shown to (a) in (c) in the figure is shown.

  As shown in FIG. 3, the silicon oxide layer 32 and the first insulating layer 34 are formed in this order on the silicon substrate 10. The silicon oxide layer 32 is formed by, for example, a CVD (Chemical Vapor Deposition) method, a sputtering method, or a thermal oxidation method. The first insulating layer 34 is formed by, for example, a CVD method or a sputtering method.

  As shown in FIG. 4, the silicon oxide layer 32 and the first insulating layer 34 are patterned to expose the surface 12 of the silicon substrate 10. The patterning is performed by, for example, a photolithography technique and an etching technique.

  As shown in FIG. 5, the buffer layer 20 is epitaxially grown on the exposed surface 12 of the silicon substrate 10. Next, the first silicon germanium layer 60 is epitaxially grown on the buffer layer 20. Next, the first single crystal silicon layer 22 is epitaxially grown on the first silicon germanium layer 60. Examples of the epitaxial growth method include a MOCVD (Metal Organic Chemical Deposition) method and an MBE (Molecular Beam Epitaxy) method.

  In the illustrated example, the upper surface of the buffer layer 20 is continuous with the upper surface of the silicon oxide layer 32, and the upper surface of the first silicon germanium layer 60 is continuous with the upper surface of the first insulating layer 34. The thickness of the first silicon germanium layer 60 is, for example, the same as the thickness of the silicon nitride layer 30 (see FIG. 1). The thickness of the first single crystal silicon layer 22 is, for example, the same as the thickness of the first electrode 40 (see FIG. 1). The planar shapes of the buffer layer 20, the first silicon germanium layer 60, and the first single crystal silicon layer 22 are not particularly limited, but are rectangular in the illustrated example.

  The first silicon germanium layer 60 is a layer made of, for example, single crystal silicon germanium. The ratio of silicon to germanium in the first silicon germanium layer 60 is not particularly limited. For example, silicon: germanium = 7: 3. The first single crystal silicon layer 22 is a layer made of, for example, single crystal silicon.

  Although not shown, the first silicon germanium layer 60 may be epitaxially grown directly on the silicon substrate 10 without epitaxially growing the buffer layer 20 on the silicon substrate 10.

  As shown in FIG. 6, a second insulating layer 36 is formed so as to cover the first single crystal silicon layer 22. More specifically, the second insulating layer 36 is formed on the first single crystal silicon layer 22 and the first insulating layer 34 and on the side of the first single crystal silicon layer 22. The second insulating layer 36 is formed by, for example, a CVD method or a sputtering method. The second insulating layer 36 is a layer made of, for example, silicon oxide.

  As shown in FIG. 7, the insulating layers 34 and 36 are patterned to expose the side surfaces 60 a and 60 b of the first silicon germanium layer 60 and the side surfaces 22 a and 22 b of the first single crystal silicon layer 22. Further, by the patterning, the upper surface of the silicon oxide layer 32 is exposed as shown in FIG. The patterning is performed by, for example, a photolithography technique and an etching technique.

  In the example shown in FIG. 7A, the side surfaces 60a and 60b of the first silicon germanium layer 60 are surfaces facing each other, and are surfaces forming the long sides of the first silicon germanium layer 60 in plan view. Further, the side surfaces 22a and 22b of the first single crystal silicon layer 22 are surfaces facing each other, and are surfaces forming the long sides of the first single crystal silicon layer 22 in plan view. In plan view, the surfaces 60c and 60d forming the short sides of the first silicon germanium layer 60 and the surfaces 22c and 22d forming the short sides of the first single crystal silicon layer 22 are not exposed in this patterning step. The side surfaces 60a, 60b, 60c, and 60d may be continuous with the side surfaces 22a, 22b, 22c, and 22d, respectively.

  Although not shown, if the side surfaces 60a and 60b of the first silicon germanium layer 60 are exposed, the side surfaces 22a and 22b of the first single crystal silicon layer 22 may not be exposed. Further, instead of the side surfaces 60a and 60b forming the long sides of the first silicon germanium layer 60, the side surfaces 60c and 60d forming the short sides of the first silicon germanium layer 60 may be exposed. If the silicon nitride layer 30 can be formed between the buffer layer 20 and the first single crystal silicon layer 22 in the step of forming the silicon nitride layer 30 described later, 2 of the first silicon germanium layer 60 is obtained. One side surface does not need to be exposed, and a part of the side surface of the first silicon germanium layer 60 may be exposed.

  Next, the second insulating layer 36 is patterned by a photolithography technique and an etching technique, and the first single crystal silicon layer 22 is patterned by an etching technique using the patterned second insulating layer 36 as a mask. Thereby, the through-hole 70 can be formed in the 2nd insulating layer 36 and the 1st single crystal silicon layer 22, and the upper surface of the 1st silicon germanium layer 60 can be exposed. A plurality of through holes 70 are formed, for example. In the illustrated example, the through holes 70 are arranged in a matrix, but the number and shape thereof are not particularly limited as long as the first silicon germanium layer 60 can be removed through the through holes 70 as will be described later. .

  The depth of the through hole 70 is not particularly limited as long as the first silicon germanium layer 60 is exposed. For example, the bottom surface of the through hole 70 is located between the upper surface and the lower surface of the first silicon germanium layer 60. You may do it.

  Further, the patterning step for exposing the side surfaces 22a and 22b of the first single crystal silicon layer 22 and the side surfaces 60a and 60b of the first silicon germanium layer 60 and the patterning step for forming the through holes 70 are not limited.

  As shown in FIG. 8, the first silicon germanium layer 60 is removed by passing an etching solution or etching gas through the through hole 70. More specifically, the first silicon germanium layer 60 is removed by passing hydrofluoric acid through the through hole 70. The first silicon germanium layer 60 may also be etched from the exposed side surfaces 60a and 60b. Thereby, the cavity 72 can be formed between the buffer layer 20 and the first single crystal silicon layer 22.

  As shown in FIG. 9, the first single crystal silicon layer 22 is epitaxially grown so as to close the through hole 70 formed in the first single crystal silicon layer 22. More specifically, the side surface of the first single crystal silicon layer 22 that defines the through hole 70 (that is, the inner surface of the through hole 70) is selected by LPCVD (Low Pressure Chemical Vapor Deposition) method, MOCVD method, MBE method, or the like. In particular, lateral through growth (ELO) is performed to close the through hole 70.

  As shown in FIG. 10, between the silicon substrate 10 from which the first silicon germanium layer 60 has been removed and the first single crystal silicon layer 22 (in the example shown, the buffer layer 20 and the first single crystal silicon layer 22 The silicon nitride layer 30 is formed in the hollow portion 72. The silicon nitride layer 30 is formed by, for example, a CVD method. The silicon nitride layer 30 is formed between the buffer layer 20 and the first single crystal silicon layer 22 by wrapping around from the portions where the side surfaces 60a and 60b (see FIG. 7) of the first silicon germanium layer 60 are formed. Is done. In the illustrated example, on the second insulating layer 36, in the through hole 70 formed in the second insulating layer 36, the side surfaces 22a and 22b of the first single crystal silicon layer 22, and the side surfaces 22a, 22b, 60a and 60b described above. The silicon nitride layer 30 is also formed on the silicon oxide layer 32 (see FIG. 10C) exposed in the patterning process that exposes.

  As shown in FIG. 11, the silicon nitride layer 30 is patterned so that the silicon nitride layer 30 remains between the buffer layer 20 and the first single crystal silicon layer 22 and on the silicon oxide layer 32. More specifically, the silicon nitride layer 30 on the second insulating layer 36, the silicon nitride layer 30 in the through hole 70, and the silicon nitride layer 30 on the side surfaces 22a and 22b are removed. The patterning is performed by, for example, a photolithography technique and an etching technique. Next, the second insulating layer 36 is removed by a known method.

  As shown in FIG. 12, a third insulating layer 38 is formed so as to cover the first single crystal silicon layer 22. More specifically, the third insulating layer 38 is formed on the first single crystal silicon layer 22 and the first insulating layer 34 and on the side of the first single crystal silicon layer 22. The third insulating layer 38 is formed by, for example, a CVD method or a sputtering method. The third insulating layer 38 is a layer made of, for example, silicon oxide.

  As shown in FIG. 13, the third insulating layer 38 is patterned by a photolithography technique and an etching technique, and the first single crystal silicon layer 22 is patterned by an etching technique using the patterned third insulating layer 38 as a mask. Thereby, the fixing portion 52 of the first electrode 40 and the second electrode 50 can be formed on the silicon nitride layer 30. The patterning is performed by, for example, a photolithography technique and an etching technique.

  As shown in FIG. 14, the silicon germanium layer 62 is epitaxially grown on the side surfaces of the first electrode 40 and the fixing portion 52. More specifically, the silicon germanium layer 62 is laterally epitaxially grown (ELO) by LPCVD, MOCVD, MBE, or the like. Since the third insulating layer 38 is formed on the upper surface of the first electrode 40 and the upper surface of the fixing portion 52, the silicon germanium layer 62 is not grown.

  As shown in FIG. 15, after the third insulating layer 38 is removed by a known method, a fourth insulating layer 39 is formed so as to cover the fixing portion 52. More specifically, the fourth insulating layer 39 is formed on the fixed portion 52 and the first insulating layer 34 and on the side of the silicon germanium layer 62. The fourth insulating layer 39 is formed, for example, by forming an insulating layer (not shown) by CVD or sputtering, and then patterning the insulating layer. The patterning is performed by, for example, a photolithography technique and an etching technique. The fourth insulating layer 39 is a layer made of, for example, silicon oxide.

  Note that after the third insulating layer 38 is removed and before the fourth insulating layer 39 is formed, the first electrode 40 and the fixing portion 52 are doped with a predetermined impurity (for example, boron) to impart conductivity. can do. The order of the impurity doping process is not particularly limited, and for example, the first single crystal silicon layer 22 may be doped before the third insulating layer 38 is formed (see FIG. 12).

  Next, the silicon germanium layer 63 is epitaxially grown on the first electrode 40. Examples of the epitaxial growth method include MOCVD method and MBE method. A second silicon germanium layer 64 covering the first electrode 40 can be formed by the silicon germanium layers 62 and 63. The ratio of silicon to germanium in the silicon germanium layers 62 and 63 is not particularly limited. For example, silicon: germanium = 7: 3. The distance between the first electrode 40 and the beam portion 54 of the second electrode 50 is determined by the thickness of the silicon germanium layer 63.

  As shown in FIG. 16, the second single crystal silicon layer 24 is epitaxially grown so as to cover the second silicon germanium layer 64 (silicon germanium layers 62 and 63) and the fixing portion 52. More specifically, the second single crystal silicon layer 24 is epitaxially grown on the silicon germanium layer 63, the fixed portion 52, and the first insulating layer 34, on the side of the silicon germanium layer 62. Examples of the epitaxial growth method include MOCVD method and MBE method.

  Note that after the second single crystal silicon layer 24 is epitaxially grown, the second single crystal silicon layer 24 can be doped with a predetermined impurity (for example, boron) to impart conductivity. The order of the impurity doping process is not particularly limited, and may be performed, for example, after a process of forming a beam part 54 and a support part 56 of the second electrode 50 described later (see FIG. 17).

  As shown in FIG. 17, the second single crystal silicon layer 24 is patterned to form the beam portion 54 and the support portion 56 of the second electrode 50. Thereby, the 2nd electrode 50 which has the beam part 54, the support part 56, and the fixing | fixed part 52 can be formed.

  As shown in FIG. 1, the second silicon germanium layer 64 (silicon germanium layers 62 and 63) is removed to form a gap between the beam portion 54 and the first electrode 40 (release process). For example, the release process can be performed using hydrofluoric acid.

  Through the above steps, the MEMS vibrator 100 can be manufactured.

  The method for manufacturing the MEMS vibrator 100 has the following features, for example.

  According to the manufacturing method of the MEMS vibrator 100, the MEMS vibrator 100 using the single crystal silicon layer as the first electrode 40 and the second electrode 50 can be formed above the silicon substrate 10.

  According to the method of manufacturing the MEMS vibrator 100, an etching solution or an etching gas is passed through the through hole 70 to pass between the silicon substrate 10 and the first single crystal silicon layer 22 (more specifically, the buffer layer 20 and the first single crystal The first silicon germanium layer 60 (between the crystalline silicon layer 22) can be removed. Therefore, in the method of manufacturing the MEMS vibrator 100, even when the electrodes 40 and 50 having a large area in plan view are formed, the buffer layer 20 and the first single crystal silicon are increased by increasing the number of through holes 70, for example. The first silicon germanium layer 60 between the layers 22 can be removed. Further, for example, by increasing the number of through holes 70, the etching time of the first silicon germanium layer 60 can be shortened, and the first single crystal silicon layer 22 and the buffer layer 20 are damaged by the etching solution. Can be suppressed.

  According to the method for manufacturing the MEMS vibrator 100, the MEMS vibrator 100 can be formed in which the beam portion 54 can be prevented from being damaged by fatigue as compared with the case where the material of the first electrode and the second electrode is polycrystalline silicon. Can do.

  According to the method of manufacturing the MEMS vibrator 100, the silicon nitride layer 30 is formed between the silicon substrate 10 and the electrodes 30 and 40 (more specifically, between the buffer layer 20 and the electrodes 30 and 40). can do. Therefore, in the release process, the silicon nitride layer 30 is not etched, and the beam portion 54 of the second electrode 50 sticks to the silicon substrate 10 (more specifically, to the buffer layer 20) (pull-in). Can be suppressed. For example, when a silicon oxide layer is used instead of the silicon nitride layer 30, the silicon oxide layer may be etched in the release process, and pull-in may not be suppressed.

  According to the method for manufacturing the MEMS vibrator 100, the buffer layer 20 can be epitaxially grown on the silicon substrate 10, and the first silicon germanium layer 60 can be epitaxially grown on the buffer layer 20. Thereby, the flatness of the 1st silicon germanium layer 60 can be improved (refer the example of an experiment shown below). Therefore, the flatness of the first single crystal silicon layer 22 epitaxially grown on the first silicon germanium layer 60 can be improved, and the first electrode 40 having high flatness can be formed. For example, when the flatness of the first electrode is low and the surface has irregularities, the first electrode and the second electrode come into contact with each other and the first electrode and the second electrode are short-circuited when the beam is bent and vibrated. There is a possibility.

  According to the method for manufacturing the MEMS vibrator 100, the first single crystal silicon layer 22 can be epitaxially grown so as to close the through hole 70 formed in the first single crystal silicon layer 22. Thereby, the intensity | strength of the electrodes 40 and 50 can be enlarged compared with the case where the through-hole 70 is not obstruct | occluded.

  In the above description, the example in which the through hole 70 formed in the first single crystal silicon layer 22 is closed by epitaxially growing the first single crystal silicon layer 22 has been described (see FIG. 9). The through hole 70 formed in the silicon layer 22 may not be blocked by epitaxially growing the first single crystal silicon layer 22. In this case, in the step of epitaxially growing the silicon germanium layer 62 (see FIG. 14), the through-hole formed in the first single crystal silicon layer 22 (the first electrode 40 and the fixing portion 52) is blocked by the silicon germanium layer 62. However, in the release process of removing the silicon germanium layers 62 and 63 (see FIG. 1), the silicon germanium layer 62 in the through hole can be removed. As a result, a MEMS vibrator (not shown) in which a through hole is formed in at least the first electrode 40 can be formed.

3. Experimental Example Next, an experimental example will be described. The present invention is not limited by the following experimental examples.

As Experimental Example 1, a buffer layer made of single crystal silicon is epitaxially grown on a single crystal silicon substrate by MOCVD, and a silicon germanium layer made of single crystal silicon germanium (Si _0.7 Ge _0.3 ) is formed on the buffer layer. Was epitaxially grown by MOCVD. The thickness of the buffer layer was 5 nm, and the thickness of the silicon germanium layer was 15 nm.

As Experimental Example 2, a silicon germanium layer made of single crystal silicon germanium (Si _0.7 Ge _0.3 ) was directly epitaxially grown on a single crystal silicon substrate by MOCVD. That is, in Experimental Example 2, a buffer layer made of single crystal silicon was not formed. The thickness of the silicon germanium layer was 15 nm.

  18 shows the SEM observation result of Example 1. FIG. FIG. 19 shows the SEM observation result of Experimental Example 2. 18 and 19, it was found that Experimental Example 1 has higher flatness of the silicon germanium layer than Experimental Example 2. That is, it was found that the buffer layer made of single crystal silicon improves the flatness of the silicon germanium layer.

  The silicon germanium layer is sensitive to the state of the surface of the base (the surface of the single crystal silicon substrate), and when foreign matter adheres to the surface of the single crystal silicon substrate, the foreign matter is transferred to the silicon germanium layer. It is considered that irregularities are formed on the surface (see FIG. 19). However, since the buffer layer made of single crystal silicon is not affected by the surface state of the base as much as the silicon germanium layer, even if impurities are attached to the surface of the single crystal silicon substrate, a highly flat surface should be formed. Can do. Therefore, it is considered that the silicon germanium layer on the buffer layer can also have high flatness.

4). Oscillator Next, an oscillator according to this embodiment will be described with reference to the drawings. FIG. 20 is a circuit diagram showing an oscillator 600 according to the present embodiment.

  As illustrated in FIG. 20, the oscillator 600 includes, for example, a MEMS vibrator (for example, the MEMS vibrator 100) according to the present invention and an inverting amplifier circuit (circuit unit) 610.

  The MEMS vibrator 100 includes a first terminal 100 a electrically connected to the first electrode 40 and a second terminal 100 b electrically connected to the second electrode 50. The first terminal 100a of the MEMS vibrator 100 is connected to the input terminal 610a of the inverting amplifier circuit 610 at least in an AC manner. The second terminal 100b of the MEMS vibrator 100 is connected to the output terminal 610b of the inverting amplifier circuit 610 at least in an AC manner.

  In the illustrated example, the inverting amplifier circuit 610 is configured by one inverter, but may be configured by combining a plurality of inverters (inverting circuits) and amplifier circuits so that a desired oscillation condition is satisfied. .

  The oscillator 600 may include a feedback resistor for the inverting amplifier circuit 610. In the example illustrated in FIG. 20, the input terminal and the output terminal of the inverting amplifier circuit 610 are connected via a resistor 620.

  The oscillator 600 includes a first capacitor 630 connected between an input terminal 610a of the inverting amplifier circuit 610 and a reference potential (ground potential), and an output terminal 610b of the inverting amplifier circuit 610 and a reference potential (ground potential). And a second capacitor 632 connected to the second capacitor 632. As a result, the MEMS vibrator 100 and the capacitors 630 and 632 can form an oscillation circuit that forms a resonance circuit. The oscillator 600 outputs the oscillation signal f obtained by this oscillation circuit.

  Note that the oscillator 600 may further include a frequency dividing circuit 640 as shown in FIG. The frequency dividing circuit 640 divides the output signal Vout of the oscillation circuit and outputs the oscillation signal f. Thereby, the oscillator 600 can obtain an output signal having a frequency lower than the frequency of the output signal Vout, for example.

  Transistors, capacitors (not shown), and the like constituting the oscillator 600 may be formed on the substrate 10 (see FIG. 1), for example. Thereby, the MEMS vibrator 100 and the inverting amplifier circuit 610 can be formed monolithically.

  The oscillator 600 includes the MEMS vibrator 100 that can suppress the fatigue failure of the beam portion 54 as described above. Therefore, the oscillator 600 can have high reliability.

  In addition, embodiment mentioned above and a modification are examples, Comprising: It is not necessarily limited to these. For example, it is possible to appropriately combine each embodiment and each modification.

  The present invention includes configurations that are substantially the same as the configurations described in the embodiments (for example, configurations that have the same functions, methods, and results, or configurations that have the same objects and effects). In addition, the invention includes a configuration in which a non-essential part of the configuration described in the embodiment is replaced. In addition, the present invention includes a configuration that exhibits the same operational effects as the configuration described in the embodiment or a configuration that can achieve the same object. Further, the invention includes a configuration in which a known technique is added to the configuration described in the embodiment.

10 substrate, 12 substrate surface, 20 buffer layer, 22 first monocrystalline silicon layer,
22a, 22b, 22c, 22d side surface, 24 second single crystal silicon layer,
30 silicon nitride layer, 32 silicon oxide layer, 34 first insulating layer, 36 second insulating layer,
38 3rd insulating layer, 39 4th insulating layer, 40 1st electrode, 50 2nd electrode,
52 fixing part, 54 beam part, 56 support part, 60 first silicon germanium layer,
60a, 60b, 60c, 60d side surface, 62 silicon germanium layer,
63 silicon germanium layer, 64 second silicon germanium layer, 70 through-hole,
72 cavity, 100 MEMS vibrator, 100a first terminal, 100b second terminal,
600 oscillator, 610 inverting amplifier circuit, 610a input terminal, 610b output terminal,
620 resistor, 630 first capacitor, 632 second capacitor,
640 divider circuit

Claims (6)

A silicon substrate;
A silicon nitride layer disposed above the silicon substrate;
A first electrode disposed above the silicon nitride layer;
A beam part disposed between the first electrode and the first electrode so as to be vibrated by an electrostatic force in the thickness direction of the silicon substrate, and disposed above the silicon nitride layer and supporting the beam part. A second electrode having a support portion to
Including
The MEMS vibrator, wherein the first electrode and the second electrode are made of single crystal silicon having conductivity. In claim 1,
A buffer layer disposed between the silicon substrate and the silicon nitride layer;
The MEMS vibrator, wherein the buffer is made of single crystal silicon. Forming a first insulating layer above the silicon substrate;
Patterning the first insulating layer to expose the silicon substrate;
Epitaxially growing a first silicon germanium layer above the exposed silicon substrate;
Epitaxially growing a first single crystal silicon layer on the first silicon germanium layer;
Forming a second insulating layer so as to cover the first single crystal silicon layer;
Patterning the first insulating layer and the second insulating layer to expose side surfaces of the first silicon germanium layer;
Forming a through hole in the second insulating layer and the first single crystal silicon layer to expose the first silicon germanium layer;
Removing the first silicon germanium layer by passing an etching solution or an etching gas through the through hole;
Forming a silicon nitride layer between the silicon substrate from which the first silicon germanium layer has been removed and the first single crystal silicon layer;
Removing the second insulating layer;
Patterning the first single crystal silicon layer to form a fixing portion of the first electrode and the second electrode;
Epitaxially growing a second silicon germanium layer so as to cover the first electrode;
Epitaxially growing a second single crystal silicon layer so as to cover the second silicon germanium layer and the fixed portion;
The second single crystal silicon layer is patterned to form a beam portion of the second electrode that can be vibrated by electrostatic force in the thickness direction of the silicon substrate above the first electrode, and on the fixed portion. Forming a support portion of the second electrode that supports the beam portion;
Removing the second silicon germanium layer;
A method for manufacturing a MEMS vibrator, comprising: In claim 3,
Further comprising the step of epitaxially growing a buffer layer on the silicon substrate before the step of epitaxially growing the first silicon germanium layer,
In the step of epitaxially growing the first silicon germanium layer,
Epitaxially growing the first silicon germanium layer on the buffer layer;
The method of manufacturing a MEMS vibrator, wherein the material of the buffer is single crystal silicon. In claim 3 or 4,
The MEMS vibration further includes a step of epitaxially growing the first single crystal silicon layer so as to close the through hole formed in the first single crystal silicon layer before the step of forming the silicon nitride layer. Child manufacturing method. The MEMS vibrator according to claim 1 or 2,
A circuit unit electrically connected to the first electrode and the second electrode of the MEMS vibrator;
Including an oscillator.