JP2013082050A - Polishing material, polishing composition, and polishing method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a polishing material which can exhibit excellent CMP (chemical mechanical polishing) characteristics and has a new combined shape.SOLUTION: The polishing material comprises a particle having a first phase shown by a composition formula (1): A(Zr)O(where A is one or more selected from Ca, Sr and Ba) and a second phase shown by ZrO. Since the polishing material comprises the particle having the first phase and the second phase, both of chemical action and mechanical action in CMP can be attained.

Description

  The present invention relates to a polishing material, a polishing composition, a polishing method, and the like.

  Currently, silica and cerium oxide are generally used as abrasive grains (polishing materials) used for polishing various materials such as glass, ceramics, and metals in electronic devices and semiconductor devices, particularly for precision polishing. Among them, cerium oxide has chemical mechanical polishing (CMP) characteristics, and has a high polishing rate because it has both high chemical reactivity with glass and appropriate hardness. It is excellent in polishing speed and is the most used polishing material.

  On the other hand, if the raw material of the polishing material depends only on cerium (Ce), there is a possibility that stable supply of the polishing material, and thus stable execution of the polishing process may be difficult. Therefore, a new polishing material that can replace cerium oxide is demanded. Further, since cerium oxide tends to have low mechanical strength, a polishing material that can compensate for this has been studied.

For example, BaTiO ₃ or MgSiO ₃ etc. composition formula ABO ₃ (however, A is, Li, Mg, Ca, Sr , Ba, Zn, Al, is selected from Fe, B is Ti, Zr, Hf, Sn, Si, Cr Perovskite oxides are selected as an alternative polishing material (Patent Literature 1).

  Further, an abrasive containing composite oxide particles of cerium oxide, for example, cerium oxide and zirconium oxide having high mechanical strength is known (Patent Document 2). Furthermore, it has also been proposed to use composite oxide particles of cerium oxide, zirconium oxide and silicon oxide (Patent Document 3).

JP 2001-107028 A Japanese Patent Laid-Open No. 10-237425 JP 2007-61989

  Patent Document 1 reports that a perovskite oxide is suitable as a glass abrasive. However, according to the present inventors, although only a zirconium-based perovskite oxide can provide a flat polished surface, the polishing rate is low. This was expected due to the lack of mechanical action in CMP.

  Further, as described in Patent Documents 2 and 3, it has been found that the method of using cerium oxide as a complex oxide such as zirconium oxide tends to greatly reduce the CMP characteristics inherent in cerium oxide.

  Accordingly, it has been found that there is a demand for a new composite form of a perovskite oxide that can replace cerium oxide and a reinforcing material that can reinforce its mechanical strength and mechanical polishing action in cerium oxide.

  Accordingly, an object of the present invention is to provide a new composite abrasive material that can exhibit good CMP characteristics.

  The present inventors have studied various composite forms that can achieve both chemical action and mechanical action in CMP.

  The present inventors have obtained the knowledge that the polishing rate and the surface smoothness are in a trade-off relationship with simple metal oxides that do not use cerium, and pay attention to the lack of chemical reactivity with glass in these oxides. As a result, it was found that zirconium-based perovskite oxide has excellent chemical reactivity with glass.

  In addition, as a material that exhibits a mechanical action, an oxide such as zirconium oxide is used. However, in the case of a simple mixed particle of a chemical polishing material and a mechanical polishing material, due to the difference in specific gravity of these polishing materials. It has been found that it is difficult to obtain a good dispersion state of the two kinds of abrasive material particles. If the distance between the particles is increased, the distance between the chemical action point of CMP and the mechanical action point is also increased, so there is a concern that the synergistic effect is small.

  As a result of repeated investigations, the present inventors have carried out chemical action and mechanical action in CMP by zirconium-based perovskite oxide and zirconium oxide, respectively, and by dispersing these oxide phases well. The knowledge that a polishing material with high CMP characteristics can be provided was obtained. According to the disclosure of the present specification, the following means are provided by such knowledge.

(1) including particles having a first phase mainly composed of an oxide represented by the following composition formula (1) and a second phase mainly composed of ZrO ₂ or a composite oxide containing the oxide. , Polishing material.
A (Zr) O ₃ (1)
(However, A represents one or more selected from Ca, Sr and Ba.)
(2) The polishing material according to (1), wherein the first phase and the second phase are dispersed with each other.
(3) The polishing material according to (1) or (2), wherein the first phase and the second phase are substantially independent particles.
(4) The polishing material according to (3), wherein the first phase particles and the second phase particles are at least partially sintered and integrated with each other.
(5) The polishing material according to (3) or (4), wherein the first phase and / or the second phase has an average primary particle size of 300 nm or less.
(6) The mol% of A (Zr) O ₃ is 40% or more and 95% or less with respect to the whole of A (Zr) O ₃ and ZrO ₂ , according to any one of (1) to (5) Abrasive material.
(7) The mol% of A (Zr) O ₃ is 50% or more and 90% or less with respect to the whole of A (Zr) O ₃ and ZrO ₂ , according to any one of (1) to (6) Abrasive material.
(8) A polishing composition comprising:
A composition comprising the polishing material according to any one of (1) to (7).
(9) A method for producing an abrasive material according to any one of (1) to (7),
A raw material liquid containing the raw material of the first phase and the raw material of the second phase is spray pyrolyzed so that the first phase and the second phase are at least partially in contact with each other. A manufacturing method comprising the step of synthesizing.
(10) The production according to (9), wherein the raw material liquid in which the mol% of A (Zr) O ₃ is 40% or more and 95% or less with respect to the whole of A (Zr) O ₃ and ZrO ₂ is used. Method.
(11) A polishing method,
A step of polishing a workpiece using the polishing composition according to (8).
(12) A method for producing an abrasive product,
A method comprising polishing a workpiece using the polishing composition according to (8) to produce the polished product.

It is a figure which shows an example of a structure of the abrasive material of this invention. It is a figure which shows the SEM image of the abrasive material synthesize | combined by the spray pyrolysis method. It is a figure which shows the STEM image of the abrasive material synthesize | combined by the solid-phase method, and the EDS mapping image in the same image.

  The present disclosure relates to an abrasive material, an abrasive composition, an abrasive method, an abrasive product production method, and the like. The abrasive material disclosed herein is an abrasive material that can suppress the use of cerium or avoid the use of cerium.

  FIG. 1 shows an example of an abrasive material disclosed in this specification. In FIG. 1, the first phase and the second phase each have a particle form separately and are integrated by sintering.

  For example, as shown in FIG. 1, the polishing material disclosed in the present specification includes particles having a first phase and a second phase, thereby achieving both chemical action and mechanical action in CMP. We succeeded in planning. That is, the conventional composite oxide is responsible for the chemical action of CMP, but the mechanical action is not sufficiently exhibited. According to the composite form disclosed in this specification, both are made independent phases, By being in contact with each other, the action points are brought close to each other, so that two actions can be expressed and compatible on the workpiece surface. As a result, a polishing material that can replace cerium oxide can be provided.

  Hereinafter, embodiments of the present disclosure will be described in detail.

(Abrasive material)
The polishing material disclosed in this specification (hereinafter simply referred to as the present polishing material) includes a first phase mainly composed of an oxide represented by the following composition formula, ZrO ₂ and / or the oxide. And a second phase mainly composed of a complex oxide.
A (Zr) O ₃ (1)

  The first phase can be mainly composed of an oxide represented by the above composition formula. In the above compositional formula, A can be one or more selected from Ca, Sr and Ba. It is believed that the first phase can contribute primarily to the chemical action of CMP. In the first phase, any of these can be used equally. When using 2 or more types, those complex oxides may be sufficient and it may have 2 or more types of 1st phases of each oxide. Containing mainly these oxides means that these oxides are components having the largest molar ratio in the first phase, preferably 50 mol% or more, more preferably 60 mol. %, More preferably 70 mol% or more, still more preferably 80 mol% or more, and still more preferably 90 mol% or more. Most preferably, it is 95 mol% or more.

The second phase can be mainly composed of ZrO ₂ and / or a composite oxide containing this oxide. That is, among the complex oxides containing ZrO ₂ and this oxide, when only ZrO ₂ is contained, ZrO ₂ may be the main component in the second phase, or ZrO ₂ and the complex oxide containing this oxide In the case where only the composite oxide containing ZrO ₂ is included, the composite oxide containing ZrO ₂ may be the main component in the second phase. Among the composite oxides containing ZrO ₂ and this oxide, ZrO ₂ and When this oxide is contained, ZrO ₂ and a composite oxide containing this oxide may be mainly used in the second phase.

Examples of the composite oxide containing ZrO ₂ include a composite oxide in which one or more selected from Ca, Sr and Ba contained in the first phase are solid-solved with respect to ZrO ₂ . Examples of such composite oxides include composite oxides in which one or two selected from Mg and Y, which are generally used as stabilizers, are solid-solubilized with respect to ZrO ₂ . In the second phase, “main body” in which the main component is ZrO ₂ and / or a composite oxide containing this oxide is synonymous with that in the first phase. It is thought that the second phase can mainly contribute to the mechanical action of CMP.

  The abrasive material includes particles having a first phase and a second phase. Such composite forms include various aspects. For example, the second phase may be dispersed in a matrix mainly composed of the first phase, or the first phase may be dispersed in a matrix mainly composed of the second phase. May be. Furthermore, the form which a 1st phase and a 2nd phase disperse | distribute mutually may be sufficient. These dispersion forms are appropriately designed according to the quantitative ratio between the first phase and the second phase, the synthesis method, and the like. The interdispersion form is preferable in order to exhibit a cooperative action by simultaneously expressing a chemical action and a mechanical action in CMP.

  Moreover, each form of the first phase and the second phase is not particularly limited. As will be described later, when the first phase and the second phase are in the form of independent particles, both particles can take a predetermined shape independently or in common. Examples of the particle shape include a spherical shape, an indefinite shape, a rod shape, a needle shape, and a plate shape.

  As a composite form of the first phase and the second phase, for example, as shown in FIG. 1, the first phase and the second phase each constitute a substantially independent particle. Can be mentioned. In the form shown in FIG. 1, two kinds of particles are at least partially in contact with each other to form particles of the present polishing material as secondary particles. Note that the two kinds of particles may be brought into contact with each other with a large surface area and integrated to constitute the particles of the present polishing material as secondary particles. Such partial contact or integration of the particles is preferably integrated by at least partial sintering of each particle.

  For example, as shown in FIG. 1, when secondary particles including particles of a first phase and particles of a second phase are used as particles of the polishing material, the particles of the first phase and the second phase It is preferable that each particle has an average primary particle diameter of 500 nm or less. This is because if the primary particles are too large, the distance between the two particles is too large, making it difficult to simultaneously develop and cooperate with the chemical action and the mechanical action. Preferably, these primary particles have an average particle size of 300 nm or less. This is because the point of action between the chemical action and the mechanical action becomes far beyond 300 nm. More preferably, it is 200 nm or less. These average primary particle diameters can be measured by observing with a microscope, and can be obtained by averaging the measurement results of particles in a plurality of fields of a certain size.

In this polishing material, the mol% of A (Zr) O ₃ is 40% or more and 95% or less with respect to the total amount of A (Zr) O ₃ and / or the composite oxide containing the oxide. Is preferred. When A (Zr) O ₃ is less than 40 mol%, the chemical action tends to be too low, and when A (Zr) O ₃ exceeds 95 mol%, the mechanical action tends to be too low. Because. More preferably, A (Zr) O ₃ is 50 mol% or more, and more preferably A (Zr) O ₃ is 90 mol% or less. Even more preferably, A (Zr) O ₃ is 60 mol% or more, and still more preferably 80 mol% or less. The numerical values obtained by subtracting the mole percent of A (Zr) O ₃ to 100 mol% is mole percent of ZrO _2.

  The polishing material only needs to have the first phase and the second phase, and may be composed only of these, or as long as it has the first phase and the second phase. , May have other phases. The other phase may be a phase that develops chemical action or mechanical action of CMP, or may be a phase for other purposes.

  This abrasive material is usually used in the form of abrasive grains and is in powder form. The particle shape of the polishing material is not particularly limited, but is preferably spherical in consideration of polishing characteristics and dispersibility. In addition, the abrasive grain here means the particle | grains (it may be a secondary particle | grains) of this polishing material. The abrasive material preferably has an average particle size of 0.1 μm to 3 μm, more preferably 0.2 μm to 2 μm. The average particle diameter here may be based on volume conversion or number conversion, but is preferably number conversion. The average particle diameter can be obtained by calculating the average particle size in terms of volume using, for example, a laser diffraction particle size distribution measuring device, a particle size distribution measuring device using a dynamic light scattering method, a photon correlation method, or the like.

  This polishing material can be preferably applied to glass. Glass substrates for optical lenses, glass substrates for optical disks and magnetic disks, glass substrates for plasma displays, thin film transistor (TFT) type LCDs, twisted nematic (TN) type LCDs, etc. It is used for finish polishing of various optical and electronics related glass materials and general glass products such as substrates, color filters for liquid crystal televisions, and glass substrates for LSI photomasks.

  This polishing material can be applied to various polishing methods and polishing objects. For example, the present invention can be applied to a polishing method and a polishing object in which cerium oxide has been conventionally used as a polishing material. For example, the polishing method to which the present polishing material is applied includes chemical mechanical polishing in addition to normal polishing. Moreover, the grinding | polishing object (workpiece | work) to which this grinding | polishing material is applied is not specifically limited, Glass, a metal, ceramics, etc. are mentioned.

(Polishing composition)
The polishing composition disclosed herein (hereinafter simply referred to as the present composition) can contain the present polishing material. The form of the composition is not particularly limited. The present composition may be a solid such as a powder or may be in a slurry form. Further, the present composition may be used as it is for polishing a workpiece, or may be appropriately dispersed in an appropriate medium, or may be appropriately diluted with the medium and used for polishing a workpiece. The polishing material is usually used as a slurry during polishing.

  The present composition may contain an abrasive material other than the abrasive material as well as the abrasive material. Examples of such polishing materials include cerium oxide, silicon oxide, iron oxide, aluminum oxide, titanium oxide, manganese oxide, chromium oxide, silicon carbide, and diamond. In addition, the content ratio in the present composition of these other polishing materials is not particularly limited.

  When this composition takes a slurry form, it is preferable to contain this polishing material 1 mass% or more with respect to the total mass of this composition, More preferably, it is 3 mass% or more. Moreover, Preferably it is 20 mass% or less, More preferably, it is 10 mass% or less.

  When this composition takes a slurry form, the medium which disperse | distributes polishing material is not specifically limited, The medium used for a well-known polishing slurry can be used. For example, an aqueous medium selected from water, a water-soluble organic solvent, and a mixture thereof can be used.

  Examples of the water-soluble organic solvent include monohydric alcohols having 1 to 10 carbon atoms such as methanol, ethanol, propanol, isopropanol and butanol, polyhydric alcohols having 3 to 10 carbon atoms such as ethylene glycol and glycerin, Acetone, dimethyl sulfoxide (DMSO), dimethylformamide (DMF), tetrahydrofuran, dioxane and the like can be mentioned. Of these, water, alcohol and glycol are preferably used.

  When the present composition contains the present abrasive material and other abrasive materials, it can contain a dispersing agent in order to disperse them well in the medium. Additives such as polymer dispersants such as tripolyphosphate, phosphates such as hexametaphosphate, cellulose ethers such as methylcellulose and carboxymethylcellulose, and water-soluble polymers such as polyvinyl alcohol are added as such dispersants. You can also The addition amount of these additives is generally preferably in the range of 0.05% by mass or more and 20% by mass or less, particularly preferably 0.1% by mass or more and 10% by mass or less, with respect to the abrasive. Range. In addition, examples of the dispersant include alkalis and inorganic salts.

  Further, the present composition may contain a surfactant. Examples of the surfactant include an anionic surfactant, a cationic surfactant, a nonionic surfactant, and a zwitterionic surfactant. These may be used alone or in combination of two or more. Also good.

  Furthermore, the present composition may contain various components according to the object to be polished and the polishing method. For example, in the case of chemical mechanical polishing, an acid or an alkali for modifying the work surface may be included. In the case of metal polishing, a chelating agent may be included.

  The present composition can be produced by a known method using the present polishing material and materials used for known polishing compositions such as the above-described components. For example, the present composition in a slurry form can be obtained by dispersing an abrasive material such as the present abrasive material in an aqueous medium. If necessary, wet grinding may be combined. Alternatively, the abrasive material may be dispersed in an aqueous medium after dry grinding.

  This composition can be applied to the same polishing method and polishing object as the present polishing material.

(Manufacturing method of polishing material)
This polishing material can be obtained by a known ceramic synthesis method. The synthetic ceramic powder obtained by various methods may be calcined or pulverized as necessary. The spray pyrolysis method can be used in that the particle size distribution is good and spherical particles can be obtained. The spray pyrolysis method is a method in which a solution or dispersion containing raw materials is introduced in a droplet state into a heating furnace through which a firing gas flow flows, and pyrolysis, firing, and sometimes sintering are performed to obtain synthetic ceramic particles. it can. Specifically, as such a manufacturing method, particles having a first phase and a second phase are obtained by spray pyrolysis of a raw material liquid containing a first phase raw material and a second phase raw material. Synthesizing. In the case of spray pyrolysis, spherical particles (secondary particles) in which the particles of the first phase and the particles of the second phase are dispersed can be obtained. The particles of the first phase and the particles of the second phase are at least partially sintered, and the secondary particles may have voids, but some of them are highly dense. When the spray pyrolysis method is used, synthesis conditions such as heating conditions and gas flow rates can be appropriately set by those skilled in the art to obtain particles of the intended composite form.

  Further, the polishing material can also be obtained by a solid phase synthesis method. By thoroughly mixing the raw material of the first phase (solid such as powder) and the raw material of the second phase (solid such as powder), forming as necessary, firing (sintering), and further grinding This polishing material can be obtained. In the case of using the solid phase synthesis method, heating / pressurization conditions and synthesis conditions such as mixing and pulverization can be appropriately set by those skilled in the art to obtain the intended composite particles.

In this manufacturing method, it is preferable to mix | blend a raw material so that it may become a preferable composition (mol%) in this polishing material. That is, the raw material composition is determined so that the mol% of A (Zr) O ₃ is 40% or more and 95% or less with respect to the whole of A (Zr) O ₃ and ZrO _{2 in} terms of the final oxide. Is preferred. More preferably, A (Zr) O ₃ is 50 mol% or more, and more preferably A (Zr) O ₃ is 90 mol% or less. Even more preferably, A (Zr) O ₃ is 60 mol% or more, and even more preferably, A (Zr) O ₃ is 80 mol% or less.

(Polishing method)
The polishing method disclosed in the present specification can include a step of polishing a workpiece using the polishing composition. Moreover, the manufacturing method of the abrasive | polishing product disclosed by this specification can comprise the process of grind | polishing a workpiece | work using this polishing composition, and manufacturing the said abrasive | polishing product.

  As mentioned above, although embodiment of the indication of this specification was described, this invention is not limited to this, A various change is possible unless it deviates from the meaning of this invention.

  Hereinafter, the disclosure of the present specification will be specifically described with reference to examples. However, the disclosure of the present specification is not limited to the following examples.

(Examples 1-4)
The raw material solutions were prepared so that the raw material compositions as shown in the following table were obtained, and samples of Examples 1 to 4 were synthesized by a spray pyrolysis method. In spray pyrolysis, a raw material solution of 0.4 mol / L in terms of each oxide was prepared. The heating temperature is 200 ° C. near the entrance of the heating furnace, further 400 ° C. and 800 ° C., the outlet temperature is raised stepwise to 1000 ° C., and air is flowed at 3 L / min as a carrier gas. Was synthesized. It should be noted that nitrate was used as the Sr source, Zr source, Ca source and Ba source. Thereafter, the synthesized particles were calcined at 1000 ° C. As a result of observation by SEM, the obtained particles were spherical particles having a diameter of about 1 μm composed of primary particles of 20 to 300 nm. The particle diameter was measured based on the SEM image, and the average particle diameter was calculated for each (Table 1). Further, as a result of crystal structure analysis by X-ray diffraction, it was confirmed that it was composed of two crystal phases of a perovskite structure and tetragonal ZrO ₂ as intended. Since the crystal system of ZrO ₂ is tetragonal, it is considered that Sr is slightly dissolved in ZrO ₂ . About Example 1, the observation result by SEM is shown in FIG.

(Example 5)
Abrasive grains were synthesized by mixing zirconium oxide and calcium carbonate as raw materials by a solid phase method so that the molar ratio of CaZrO ₃ and ZrO ₂ was 6: 4. As a result of crystal structure analysis by X-ray diffraction, it was confirmed that the crystal was composed of a perovskite structure and three crystal phases of ZrO ₂ and monoclinic ZrO ₂ . It is considered that Ca is dissolved in ZrO ₂ having a cubic crystal system. When the synthesized abrasive grains were observed with a scanning transmission electron microscope, it was confirmed that secondary particles of about 1 μm composed of primary particles of 50 to 200 nm were formed. As a result of measurement by a laser diffraction method, the average particle size was 1.0 μm. Furthermore, since the primary particles containing a large amount of Ca (CaZrO ₃ phase) and the primary particles containing a small amount of Ca (ZrO ₂ phase) are present and dispersed by an energy dispersive X-ray spectrometer, they are composite abrasive grains. I understood it.

(Comparative Examples 1 and 2)
The compositions shown in the table below were synthesized by spray pyrolysis.
(Comparative Example 3)
SrZrO ₃ and ZrO ₂ synthesized by spray pyrolysis were simply mixed at a molar ratio of 1: 1.
(Control Examples 1 and 2)
Commercially available ceria-based abrasive grains (Mirek E21, manufactured by Mitsui Metal Mining) were used.

In Examples 1-4, Comparative Examples 1-3, and Target Example 1, slurries were prepared for various materials and a polishing test was performed. That is, each material and distilled water were mixed to form a slurry having a concentration of 5% by mass. A single-side polishing machine (Tegra System, manufactured by Marumoto Struers) was used for the polishing test. The polishing slurry was circulated using a pump. In addition, the polishing test was performed under the following conditions.
Polishing object: 37.5 mm x 30 mm Aluminoborosilicate glass polishing pad: Foam polyurethane pad (MH-C15A, manufactured by Nitta Haas)
Surface plate diameter: 300 mm
Plate rotation speed: 150 rpm
Slurry supply amount: 100 mL / min
Polishing pressure: 102 g / cm2
Polishing time: 30 minutes

In Example 5 and Target Example 2, the polishing test was performed under conditions different from the above. That is, each material and distilled water were mixed to form a slurry having a concentration of 10% by mass. A single-side polishing machine (LGP-15S-I, manufactured by Micro Engineering (formerly Lapmaster)) was used for the polishing test. In addition, the polishing test was performed under the following conditions.
Polishing object: φ2 inch Soda lime glass polishing pad: Foam polyurethane pad (MH-N15A, manufactured by Nitta Haas)
Surface plate diameter: 380 mm
Plate rotation speed: 100 rpm
Slurry supply amount: 500 mL / min
Polishing pressure: 100 g / cm2
Polishing time: 180 minutes

  About the glass before grinding | polishing, the thickness and the weight before and behind grinding | polishing were measured, the weight reduction part was converted into thickness, and the grinding | polishing speed | rate was calculated. The arithmetic average roughness Ra was measured with an atomic force microscope. The results are also shown in Table 1.

  As shown in Table 1, the polishing material in which the first phase and the second phase were combined exhibited excellent polishing characteristics as compared with other polishing materials. A polishing material capable of sufficiently replacing the cerium oxide as a control example could be obtained.

Claims (12)

A polishing material comprising particles having a first phase mainly composed of an oxide represented by the following composition formula (1) and a second phase mainly composed of ZrO ₂ or a composite oxide containing the oxide. .
A (Zr) O ₃ (1)
(However, A represents one or more selected from Ca, Sr and Ba.)   The polishing material according to claim 1, wherein the first phase and the second phase are dispersed with each other.   The abrasive material according to claim 1 or 2, wherein the first phase and the second phase are substantially independent particles.   The abrasive material according to claim 3, wherein the first phase particles and the second phase particles are at least partially sintered and integrated with each other.   The polishing material according to claim 3 or 4, wherein the first phase and / or the second phase has an average primary particle size of 300 nm or less. For the whole of the A (Zr) O ₃ and ZrO _2, mol% of the A (Zr) O ₃ is 95% or less 40%, abrasive material according to claim 1. For the whole of the A (Zr) O ₃ and ZrO _2, mol% of the A (Zr) O ₃ is 90% or less than 50%, the polishing material according to claim 1. A polishing composition comprising:
A composition comprising the polishing material according to claim 1. A method for producing an abrasive material according to any one of claims 1 to 7,
A step of spray pyrolysis of a raw material liquid containing the raw material of the first phase and the raw material of the second phase to synthesize particles having the first phase and the second phase. Method. Using the raw material liquid in which the mol% of A (Zr) O ₃ is 40% or more and 95% or less with respect to the entire composite oxide containing A (Zr) O ₃ and ZrO ₂ and / or the acid compound, The manufacturing method according to claim 9. A polishing method comprising:
A method comprising polishing a workpiece using the polishing composition according to claim 8. A method for producing an abrasive product, comprising:
A method comprising polishing a workpiece using the polishing composition according to claim 8 to produce the abrasive product.