JP2013064192A - Abrasion-resistant member made from aluminum alloy, and method for producing same - Google Patents

Abrasion-resistant member made from aluminum alloy, and method for producing same Download PDF

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JP2013064192A
JP2013064192A JP2012172934A JP2012172934A JP2013064192A JP 2013064192 A JP2013064192 A JP 2013064192A JP 2012172934 A JP2012172934 A JP 2012172934A JP 2012172934 A JP2012172934 A JP 2012172934A JP 2013064192 A JP2013064192 A JP 2013064192A
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aluminum alloy
resistant member
plating
substrate
layer
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JP5867332B2 (en
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Yuka Yamada
由香 山田
Hideaki Matsuoka
秀明 松岡
Kenichi Suzuki
憲一 鈴木
Manabu Kitahara
学 北原
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Toyota Central R&D Labs Inc
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    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals
    • C23C18/32Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
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    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1633Process of electroless plating
    • C23C18/1689After-treatment
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    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1633Process of electroless plating
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    • C23C18/1696Control of atmosphere
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    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/1803Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces
    • C23C18/1824Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces by chemical pretreatment
    • C23C18/1837Multistep pretreatment
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    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/1851Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material
    • C23C18/1872Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material by chemical pretreatment
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    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/54Contact plating, i.e. electroless electrochemical plating
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    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/34Pretreatment of metallic surfaces to be electroplated
    • C25D5/38Pretreatment of metallic surfaces to be electroplated of refractory metals or nickel
    • C25D5/40Nickel; Chromium
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    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
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    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/48After-treatment of electroplated surfaces
    • C25D5/50After-treatment of electroplated surfaces by heat-treatment

Abstract

PROBLEM TO BE SOLVED: To provide an abrasion-resistant member made from an aluminum alloy.SOLUTION: The abrasion-resistant member made from an aluminum alloy comprises a base that comprises an aluminum alloy and a coating layer that coats at least a portion of the surface of the base, wherein the aluminum alloy has a residual hardness of 120 Hv or more as measured at room temperature after being retained in an air atmosphere at 400°C for 10 hours, and the coating layer is a crystalline Ni-P layer comprising Ni and NiP. The crystalline Ni-P layer is obtained by heating an Ni-P plating layer, which is formed on the surface of the base by electroless Ni-P plating, at a temperature of, for example, 300°C or higher. The crystalline Ni-P layer is imparted with a compressive residual stress. It is preferred that the aluminum alloy includes 1-7% of Fe, because the crystalline Ni-P layer having excellent adhesion properties can be obtained.

Description

本発明は、アルミニウム合金製耐摩耗性部材およびその製造方法に関する。   The present invention relates to an aluminum alloy wear-resistant member and a method for producing the same.

自動車、二輪車、航空機などの輸送機器分野では、最近の環境意識の高揚に伴い、低燃費化またはCO排出削減等に有効な軽量化が強く進められている。このため、従来は鉄鋼材や鋳鉄材で構成されていた部材も、アルミニウム合金へ置換されつつある。 In the field of transportation equipment such as automobiles, motorcycles, and aircraft, with the recent heightening of environmental awareness, weight reduction effective for reducing fuel consumption or reducing CO 2 emissions has been strongly promoted. For this reason, the member conventionally comprised with the steel material and the cast iron material is also being replaced by the aluminum alloy.

このようなアルミニウム合金への置換を促進する上で、その耐熱性のみならず、最近では耐摩耗性、耐食性、耐疲労強度等も重視されるようになってきている。このような事情の下、例えば、硬質皮膜を表面に形成したアルミニウム合金製耐摩耗性部材に関する記載が下記の特許文献で紹介されている。   In accelerating the replacement with such an aluminum alloy, not only the heat resistance but also the wear resistance, corrosion resistance, fatigue resistance strength and the like have recently been emphasized. Under such circumstances, for example, a description relating to an aluminum alloy wear-resistant member having a hard film formed on its surface is introduced in the following patent documents.

特許3009527号公報Japanese Patent No. 3009527 特開2004−277784号公報JP 2004-277784 A

アルミニウム合金に硬質皮膜等を形成する方法には、ドライプロセスとウエットプロセスがある。ドライプロセスは、 PVD、CVD、イオン窒化、溶射等により、TiN、CrN、DLC、Al等の硬質皮膜を基体表面に形成する方法である。ウエットプロセスは、アルミニウム合金を特定の溶液中に浸漬して、その表面に陽極酸化皮膜や各種めっきを形成する方法である。 Methods for forming a hard film or the like on an aluminum alloy include a dry process and a wet process. The dry process is a method of forming a hard film such as TiN, CrN, DLC, Al 2 O 3 or the like on the substrate surface by PVD, CVD, ion nitriding, thermal spraying or the like. The wet process is a method in which an aluminum alloy is immersed in a specific solution to form an anodic oxide film or various platings on the surface thereof.

ドライプロセスで形成される皮膜は、ビッカース硬さが1000〜3000Hv程度あり、ウエットプロセスで形成される皮膜よりも硬質である。しかし、ドライプロセスは量産性が低く、設備コストや処理コスト等も高い。   The film formed by the dry process has a Vickers hardness of about 1000 to 3000 Hv, and is harder than the film formed by the wet process. However, dry processes are low in mass productivity, and equipment costs and processing costs are high.

一方、ウエットプロセスを用いれば、生産性の向上やコスト低減等を図り易い。もっとも、ウエットプロセスで形成される硬質皮膜のうち、耐摩耗性等に優れるCrめっき(800〜1000Hv)は、六価クロムを用いる点で環境上好ましくない。複合めっき(分散めっき)は、めっき液が不安定で管理が難しい。   On the other hand, if a wet process is used, it is easy to improve productivity and reduce costs. However, among hard coatings formed by a wet process, Cr plating (800 to 1000 Hv) excellent in wear resistance and the like is not environmentally preferable in terms of using hexavalent chromium. Composite plating (dispersion plating) is difficult to manage because the plating solution is unstable.

これらのめっき法に対して、無電解Ni−Pめっきは、環境上の問題も比較的少なく、量産性にも優れる。ただし、Ni−Pめっき層は、ドライプロセスで形成される皮膜やCrめっきに比べて硬質ではなく、一般的に耐摩耗性に欠ける。比較的硬質な低P濃度のNi−Pめっき層でもビッカース硬さが500〜700Hvである。Ni−Pめっき層を300℃以上に加熱すると、最高硬さが900〜1000HvとCrめっきに匹敵する硬度が得られることは知られているが、そのような加熱を行うと基材(母材)であるアルミニウム合金が軟化等して、部材に必要な強度が確保できなかった。また、部材に大きな荷重が作用した際に、Ni−Pめっき層が基材の変形に追従できず、亀裂や剥離がNi−Pめっき層に生じることがあった。このように従来は、Ni−Pめっき層によりアルミニウム合金製部材の耐摩耗性を確保することは困難であった。   In contrast to these plating methods, electroless Ni—P plating has relatively few environmental problems and is excellent in mass productivity. However, the Ni—P plating layer is not hard compared to a film formed by a dry process or Cr plating, and generally lacks wear resistance. Even a relatively hard Ni-P plating layer having a low P concentration has a Vickers hardness of 500 to 700 Hv. It is known that when the Ni—P plating layer is heated to 300 ° C. or higher, the maximum hardness is 900 to 1000 Hv and hardness comparable to Cr plating can be obtained. ) Was softened and the strength required for the member could not be secured. Further, when a large load is applied to the member, the Ni—P plating layer cannot follow the deformation of the base material, and cracks and peeling may occur in the Ni—P plating layer. Thus, conventionally, it has been difficult to ensure the wear resistance of the aluminum alloy member by the Ni-P plating layer.

本発明は、このような事情に鑑みて為されたものであり、量産性、生産コスト、環境性等を考慮しつつ、Ni−Pめっきにより耐摩耗性を高めたアルミニウム合金製部材を提供することを目的とする。またその製造方法も併せて提供することを目的とする。   The present invention has been made in view of such circumstances, and provides an aluminum alloy member having improved wear resistance by Ni-P plating in consideration of mass productivity, production cost, environmental performance, and the like. For the purpose. Moreover, it aims at providing the manufacturing method collectively.

本発明者はこの課題を解決すべく鋭意研究し、アルミニウム合金からなる基体を軟化させることなく、その表面に形成したNi−Pめっき層の硬質化に成功した。この成果を発展させることにより、以降に述べる本発明を完成するに至った。   The inventor has intensively studied to solve this problem, and succeeded in hardening the Ni—P plating layer formed on the surface of the substrate made of aluminum alloy without softening the substrate. By developing this result, the present invention described below has been completed.

《アルミニウム合金製耐摩耗性部材》
(1)本発明のアルミニウム合金製耐摩耗性部材は、アルミニウム合金からなる基体と、該基体の少なくとも一部の表面を被覆する被覆層と、からなるアルミニウム合金製耐摩耗性部材であって、前記アルミニウム合金は、400℃の大気圧雰囲気中に10時間保持した後に室温状態で測定した残留硬さが120Hv以上あり、前記被覆層は、ニッケル(Ni)とリン(P)からなると共に結晶質である結晶質Ni−P層からなることを特徴とする。
《Aluminum alloy wear-resistant member》
(1) The aluminum alloy wear-resistant member of the present invention is an aluminum alloy wear-resistant member comprising a base made of an aluminum alloy and a coating layer covering at least a part of the surface of the base, The aluminum alloy has a residual hardness of 120 Hv or more measured at room temperature after being kept in an atmospheric atmosphere at 400 ° C. for 10 hours, and the coating layer is made of nickel (Ni) and phosphorus (P) and is crystalline. It consists of the crystalline Ni-P layer which is.

(2)本発明のアルミニウム合金製耐摩耗性部材(適宜「耐摩耗性部材」という。)は、その基体表面が結晶質Ni−P層からなる被覆層で被覆されており、優れた耐摩耗性を発揮する。加えて本発明の耐摩耗性部材は、優れた耐熱性、耐食性、耐疲労性、耐久性等をも発揮し得る。もっとも本発明の耐摩耗性部材が優れた特性を発現する理由は必ずしも定かではない。現状では次のように考えられる。 (2) The aluminum alloy wear-resistant member of the present invention (suitably referred to as “abrasion-resistant member”) is coated with a coating layer comprising a crystalline Ni—P layer, and has excellent wear resistance. Demonstrate sex. In addition, the wear-resistant member of the present invention can also exhibit excellent heat resistance, corrosion resistance, fatigue resistance, durability, and the like. However, the reason why the wear-resistant member of the present invention exhibits excellent characteristics is not necessarily clear. The current situation is considered as follows.

先ず、結晶質Ni−P層は、無電解Ni−Pめっき等により形成される非晶質なNi−Pめっき層(これを適宜「非晶質Ni−P層」という。)とは異なり、非常に硬質である。この結晶質Ni−P層は、P濃度が少ない場合は勿論、P濃度が高い場合でも、結晶化度に応じて十分な硬さを発揮する。これは、結晶質Ni−P層が、結晶化したNiの母相中に、NiP等の析出相が分散した複合組織構造を有しているためと考えられる。 First, the crystalline Ni—P layer is different from an amorphous Ni—P plating layer (this is appropriately referred to as “amorphous Ni—P layer”) formed by electroless Ni—P plating or the like. Very hard. This crystalline Ni—P layer exhibits sufficient hardness according to the degree of crystallinity, not only when the P concentration is low, but also when the P concentration is high. This is presumably because the crystalline Ni—P layer has a composite structure in which a precipitated phase such as Ni 3 P is dispersed in the crystallized Ni matrix.

次に、結晶質Ni−P層には大きな圧縮残留応力が生じ得る。この圧縮残留応力は被覆層と基体の熱膨張量差と、非晶質Ni−P層が加熱されて結晶質のNiおよびNi−Pが析出すること等に起因して発生すると考えられる。具体的にいうと、基体と被覆層からなる部材を加熱した場合、被覆層は熱膨張する基体から剥離することなく同様に熱膨張する。昇温中またはその後の保持中において、非晶質Ni−P層から結晶質のNi相およびNi−P相が析出するが、結晶質のNi相およびNi−P相が主体となる被覆層は基体と熱膨張係数が異なる。このため、降温過程において、両者間に熱収縮量差が生じる。その結果、基体よりも熱膨張係数の小さい結晶質Ni−P層において、圧縮残留応力が発生したと考えられる。   Next, a large compressive residual stress may be generated in the crystalline Ni—P layer. This compressive residual stress is considered to be generated due to the difference in thermal expansion between the coating layer and the substrate, the precipitation of crystalline Ni and Ni-P by heating the amorphous Ni-P layer, and the like. Specifically, when a member composed of a substrate and a coating layer is heated, the coating layer is similarly thermally expanded without being peeled off from the thermally expanding substrate. Crystalline Ni phase and Ni—P phase are precipitated from the amorphous Ni—P layer during the temperature rise or during the subsequent holding, but the coating layer mainly composed of the crystalline Ni phase and Ni—P phase is The coefficient of thermal expansion is different from that of the substrate. For this reason, in the temperature lowering process, a heat shrinkage difference occurs between them. As a result, it is considered that compressive residual stress was generated in the crystalline Ni-P layer having a smaller thermal expansion coefficient than that of the substrate.

このような圧縮残留応力が作用している結晶質Ni−P層には、亀裂等が生じ難い。このことは、耐摩耗性の向上に寄与するのみならず、耐食性の向上や繰り返し荷重が作用する際の疲労強度の向上(耐疲労性の向上)等にも寄与することになる。   In the crystalline Ni-P layer on which such compressive residual stress is acting, cracks and the like are hardly generated. This not only contributes to the improvement of the wear resistance, but also contributes to the improvement of the corrosion resistance and the fatigue strength when a repeated load acts (improvement of fatigue resistance).

ところで、非晶質Ni−P層を結晶化させたり、結晶質Ni−P層に圧縮残留応力を生じさせる高温加熱を行っても、基体は十分な残留硬さを発揮し、結晶質Ni−P層の保持や耐摩耗性部材の機能は確保される。従って本発明の耐摩耗性部材によれば、耐軟化性に優れた基体と耐摩耗性に優れた結晶質Ni−P層(被覆層)が相乗的に作用することにより、優れた耐摩耗性を安定して発揮するようになると考えられる。   By the way, even if the amorphous Ni—P layer is crystallized or subjected to high temperature heating that causes compressive residual stress in the crystalline Ni—P layer, the substrate exhibits sufficient residual hardness, and crystalline Ni—P The function of the P-layer holding and the wear-resistant member is ensured. Therefore, according to the wear-resistant member of the present invention, the substrate having excellent softening resistance and the crystalline Ni-P layer (coating layer) having excellent wear resistance act synergistically to provide excellent wear resistance. It is thought that will come out stably.

なお、本発明の耐摩耗性部材は、高温特性に優れる基体や被覆層からなるため、高温環境下でも十分な耐摩耗性や強度等を発揮し得る。   In addition, since the wear-resistant member of the present invention is composed of a substrate and a coating layer excellent in high-temperature characteristics, it can exhibit sufficient wear resistance and strength even in a high-temperature environment.

《アルミニウム合金製耐摩耗性部材の製造方法》
(1)本発明は、上述した耐摩耗性部材としてのみならず、その製造方法としても把握できる。すなわち本発明は、上述したアルミニウム合金製耐摩耗性部材の製造方法であって、基体表面に無電解Ni−Pめっき液を接触させて該基体表面にNi−Pめっき層を形成するめっき工程と、該Ni−Pめっき層を加熱して該Ni−Pめっき層を結晶化させる結晶化工程と、を備えることを特徴とするアルミニウム合金製耐摩耗性部材の製造方法とも把握できる。
<< Method for Producing Aluminum Alloy Wear Resistant >>
(1) The present invention can be grasped not only as the wear-resistant member described above but also as a manufacturing method thereof. That is, the present invention is a method for producing the above-described aluminum alloy wear-resistant member, wherein a plating step of forming an Ni-P plating layer on the substrate surface by bringing an electroless Ni-P plating solution into contact with the substrate surface; And a crystallization step of crystallizing the Ni-P plating layer by heating the Ni-P plating layer, and can be grasped as a method for producing an aluminum alloy wear-resistant member.

(2)本発明の製造方法によれば、基体表面に無電解Ni−Pめっきで形成した非晶質なNi−Pめっき層を、所定温度で加熱することにより、前述した結晶質Ni−P層が容易に形成され得る。従って、この製造方法によれば、環境上の問題も少なく、上述した耐摩耗性部材を効率良く低コストで量産可能となる。 (2) According to the production method of the present invention, the amorphous Ni—P plating layer formed by electroless Ni—P plating on the surface of the substrate is heated at a predetermined temperature, whereby the above-described crystalline Ni—P is obtained. Layers can be easily formed. Therefore, according to this manufacturing method, there are few environmental problems, and the above-described wear-resistant member can be mass-produced efficiently and at low cost.

《その他》
(1)本明細書でいう「残留硬さ」は、所定の加熱工程を経た対象物を、室温状態で、ビッカース硬度計により測定した硬さを意味する。より具体的な測定条件は、マイクロビッカース硬度計を用いて、試験荷重:0.245N、保持時間:20秒の条件で、対象物断面に対して5回測定した硬度の平均値である。
<Others>
(1) “Residual hardness” as used herein means the hardness of an object that has been subjected to a predetermined heating process, measured at room temperature with a Vickers hardness tester. More specific measurement conditions are an average value of hardness measured five times with respect to the cross section of the object using a micro Vickers hardness tester under the conditions of test load: 0.245 N and holding time: 20 seconds.

本発明に係るアルミニウム合金の場合、400℃の大気圧雰囲気中に10時間保持した後の残留硬さが120Hv以上、130Hv以上、140Hvさらには145Hv以上であると好ましい。なお、この残留硬さを測定する際、アルミニウム合金の熱履歴(使用歴)は基本的に問わない。結晶質Ni−P層が密着しているアルミニウム合金に、上記の加熱処理を加えた後に測定した残留硬さが120Hv以上であればよい。   In the case of the aluminum alloy according to the present invention, it is preferable that the residual hardness after being held in an atmospheric pressure atmosphere at 400 ° C. for 10 hours is 120 Hv or more, 130 Hv or more, 140 Hv, or 145 Hv or more. When measuring the residual hardness, the thermal history (usage history) of the aluminum alloy is basically not questioned. The residual hardness measured after applying the above heat treatment to the aluminum alloy with which the crystalline Ni—P layer is in close contact may be 120 Hv or more.

(2)本明細書でいう「残留応力」は、X線応力測定法標準(日本材料学会X線材料強度部門委員会(1997))に基づいて定められる。より具体的には、対象物表面に、特性X線Cu−Kαを照射し、得られるNi(311)回折ピークより、sinψ法により決定される。この残留応力の決定に際して必要となる応力定数はニッケルのヤング率、ポアソン比により定めた。 (2) “Residual stress” as used herein is defined based on the X-ray stress measurement method standard (X-ray Material Strength Division Committee of the Society of Materials Science (1997)). More specifically, the surface of the object is irradiated with characteristic X-ray Cu—Kα, and is determined by the sin 2 ψ method from the obtained Ni (311) diffraction peak. The stress constant required for determining this residual stress was determined by the Young's modulus and Poisson's ratio of nickel.

前述したように、結晶質Ni−P層には圧縮残留応力が作用している。この圧縮残留応力の値は問わないが、200MPa以上、300MPa以上さらには900MPa以上であると好ましい。なお、結晶質Ni−P層に作用する残留応力は、印加された加熱温度が高いほど、比例的に大きくなり得る。   As described above, compressive residual stress acts on the crystalline Ni-P layer. Although the value of this compressive residual stress is not ask | required, it is preferable in it being 200 Mpa or more, 300 Mpa or more, and 900 Mpa or more. The residual stress acting on the crystalline Ni—P layer can be proportionally increased as the applied heating temperature is higher.

(3)本発明に係るアルミニウム合金は、その形態、金属組織、加工段階などは問わない。例えば、鋳塊、急冷凝固させた粉末、薄帯やその破砕粉、成形体やビレット、さらには焼結材や展伸材(押出材等)などでもよいし、また、素材でも、中間製品でも、最終製品でもよい。 (3) The form, metal structure, processing stage, etc. of the aluminum alloy according to the present invention do not matter. For example, ingots, rapidly solidified powders, ribbons and crushed powders, compacts and billets, sintered materials and wrought materials (extruded materials, etc.), raw materials, and intermediate products It may be the final product.

(4)特に断らない限り本明細書でいう「x〜y」は、下限値xおよび上限値yを含む。本明細書に記載した種々の数値または数値範囲に含まれる任意の数値を、新たな下限値または上限値として「a〜b」のような数値範囲を新設し得る。 (4) Unless otherwise specified, “x to y” in this specification includes the lower limit value x and the upper limit value y. Any numerical value included in the various numerical values or numerical ranges described in the present specification can be newly established as a new lower limit value or upper limit value such as “ab”.

加熱温度と基体の硬さとの関係を示すグラフである。It is a graph which shows the relationship between heating temperature and the hardness of a base | substrate. 加熱温度と被覆層の硬さとの関係を示すグラフである。It is a graph which shows the relationship between heating temperature and the hardness of a coating layer. 加熱温度と被覆層の残留応力との関係を示すグラフである。It is a graph which shows the relationship between heating temperature and the residual stress of a coating layer. 各被覆層のX線回折像である。It is an X-ray diffraction image of each coating layer. 基材No.11のアルミニウム合金に無電解Ni−Pめっきを施した様子を示す外観写真である。Base No. It is an external appearance photograph which shows a mode that electroless Ni-P plating was given to 11 aluminum alloy. 基材No.C3のアルミニウム合金に無電解Ni−Pめっきを施した様子を示す外観写真である。Base No. It is an external appearance photograph which shows a mode that electroless Ni-P plating was given to the aluminum alloy of C3. ボールオンディスク試験後の試験片No.1の摩耗痕の断面形状を示す図である。Specimen No. after ball-on-disk test It is a figure which shows the cross-sectional shape of 1 wear scar. ボールオンディスク試験後の試験片No.2の摩擦痕の断面形状を示す図である。Specimen No. after ball-on-disk test It is a figure which shows the cross-sectional shape of 2 friction marks. ボールオンディスク試験後の試験片No.3の摩擦痕の断面形状を示す図である。Specimen No. after ball-on-disk test It is a figure which shows the cross-sectional shape of 3 friction marks.

本明細書で説明する内容は、本発明の耐摩耗性部材のみならず、その製造方法にも該当し得る。製造方法に関する構成要素は、プロダクトバイプロセスとして理解すれば物に関する構成要素ともなり得る。そして上述した本発明の構成要素に、本明細書中から任意に選択した一つまたは二つ以上の構成要素を付加し得る。いずれの実施形態が最良であるか否かは、対象、要求性能等によって異なる。   The contents described in this specification can be applied not only to the wear-resistant member of the present invention but also to the manufacturing method thereof. A component related to a manufacturing method can be a component related to an object if understood as a product-by-process. One or two or more components arbitrarily selected from the present specification can be added to the above-described components of the present invention. Which embodiment is the best depends on the target, required performance, and the like.

《被覆層》
(1)本発明に係る被覆層は結晶質Ni−P層からなるが、この「結晶質」は被覆層全体が完全な結晶となっている必要はない。X線で検出される程度に結晶部分が存在すれば足る。また結晶質Ni−P層の成分組成や金属組織も本発明では問わない。結晶質Ni−P層の金属組織は、一概に特定できないが、例えば、Niの結晶相とNiP等の析出相により構成されると考えられる。この金属組織は、結晶質Ni−P層の成分組成、結晶化度、熱履歴等によって異なる。
<Coating layer>
(1) Although the coating layer according to the present invention is composed of a crystalline Ni-P layer, this "crystalline" does not have to be a complete crystal of the entire coating layer. It suffices if there is a crystal part that can be detected by X-rays. Further, the component composition and metal structure of the crystalline Ni—P layer are not limited in the present invention. The metal structure of the crystalline Ni—P layer cannot be specified in general, but is considered to be composed of, for example, a crystal phase of Ni and a precipitated phase such as Ni 3 P. This metal structure differs depending on the component composition, crystallinity, thermal history, etc. of the crystalline Ni-P layer.

結晶質Ni−P層のP量は、耐摩耗性部材の用途、機能、要求仕様等に応じて適宜調整される。もっとも結晶質Ni−P層(特に無電解Ni−Pめっきを経由した場合)は、全体を100質量%(以下単に「%」という)としたとき、Pが1〜13%であると、均一なめっき層が安定して形成される。つまりPが過少では還元剤である次亜リン酸ナトリム等が少なく、還元力が低下してめっきが析出されにくくなる。Pが過多ではめっき液が不安定となり現実的にめっきが困難となり得る。但し、非晶質なNi−Pめっき層とは異なり、本発明に係る結晶質Ni−P層はPが多くても十分な硬さを発揮し得る。   The amount of P in the crystalline Ni—P layer is appropriately adjusted according to the use, function, required specifications, etc. of the wear-resistant member. However, the crystalline Ni—P layer (especially when it passes through electroless Ni—P plating) is uniform when P is 1 to 13% when the whole is 100 mass% (hereinafter simply referred to as “%”). A stable plating layer is stably formed. That is, when P is too small, sodium hypophosphite or the like, which is a reducing agent, is small, reducing power is reduced, and plating is hardly deposited. If P is excessive, the plating solution becomes unstable, and plating can be difficult in practice. However, unlike the amorphous Ni—P plating layer, the crystalline Ni—P layer according to the present invention can exhibit sufficient hardness even if P is large.

(2)本発明に係る結晶質Ni−P層は、例えば、無電解Ni−Pめっきにより基体の表面上に形成されたNi−Pめっき層を、300℃〜500℃より好ましくは350〜450℃で加熱することにより得られる。無電解Ni−PめっきをしたままのNi−Pめっき層は非晶質で、その状態は200℃ぐらいまで維持され得る。ところが、その非晶質のNi−Pめっき層を200℃以上に加熱していくと、徐々に結晶化が進行する。この結晶化に応じて、結晶質Ni−P層の硬さや結晶質Ni−P層に作用する圧縮残留応力も大きくなり得る。 (2) The crystalline Ni—P layer according to the present invention is a Ni—P plating layer formed on the surface of the substrate by electroless Ni—P plating, for example, 300 ° C. to 500 ° C., more preferably 350 to 450. Obtained by heating at ° C. The Ni—P plating layer as it is subjected to electroless Ni—P plating is amorphous, and the state can be maintained up to about 200 ° C. However, when the amorphous Ni—P plating layer is heated to 200 ° C. or higher, crystallization gradually proceeds. In accordance with this crystallization, the hardness of the crystalline Ni—P layer and the compressive residual stress acting on the crystalline Ni—P layer can also increase.

勿論、結晶質Ni−P層は、無電解Ni−Pめっきのみならず、電解Ni−Pめっきに依っても得られる。無電解Ni−Pめっきが次亜リン酸ナトリウム等を還元剤として用いてPを共析させるのに対して、電解Ni−Pめっきは亜リン酸ナトリウム等を用いてPを共析させる。電解Ni−Pめっきは、基体の形状によって電流密度が異なり易く、共析するP量、めっきの膜厚等の制御が容易ではない。そこで本発明に係る結晶質Ni−P層は、無電解Ni−Pめっきから形成されると好ましい。   Of course, the crystalline Ni—P layer can be obtained not only by electroless Ni—P plating but also by electrolytic Ni—P plating. Electroless Ni-P plating eutects P using sodium hypophosphite or the like as a reducing agent, while electrolytic Ni-P plating eutects P using sodium phosphite or the like. In electrolytic Ni-P plating, the current density tends to vary depending on the shape of the substrate, and it is not easy to control the amount of P to be eutectoid, the thickness of the plating, and the like. Therefore, the crystalline Ni—P layer according to the present invention is preferably formed from electroless Ni—P plating.

《被覆層の形成(耐摩耗性部材の製造方法)》
本発明に係る被覆層は、その形成方法を問わないが、例えば、次のような無電解Ni−Pめっき法により形成される。
<< Formation of coating layer (production method of wear-resistant member) >>
The coating layer according to the present invention may be formed by any method, for example, by the following electroless Ni-P plating method.

(1)清浄工程
清浄工程により、基体表面に形成された酸化皮膜や機械加工等により基体表面に付着した油汚れ等が除去される。この清浄工程により、次工程の前処理を効率的に行え、Ni−Pめっき層の密着性等が向上し得る。
(1) Cleaning process The cleaning process removes oil stains and the like adhering to the substrate surface by an oxide film formed on the substrate surface, machining or the like. By this cleaning step, the pretreatment of the next step can be performed efficiently, and the adhesion of the Ni—P plating layer can be improved.

清浄工程は、例えば、基体をアルカリ性溶液と接触させて酸化皮膜を除去するエッチング工程と、エッチング工程後に生じたスマットを酸性溶液で除去するデスマット工程からなる。アルカリ性溶液や酸性溶液の種類、それらの濃度等は適宜調整される。これらの工程に替えて、化学研磨や電解研磨により清浄工程を行うと、基体表面の平滑化も図れる。   The cleaning process includes, for example, an etching process for removing the oxide film by bringing the substrate into contact with an alkaline solution, and a desmutting process for removing smut generated after the etching process with an acidic solution. The kind of alkaline solution or acidic solution, their concentration, etc. are adjusted as appropriate. If the cleaning process is performed by chemical polishing or electrolytic polishing instead of these processes, the substrate surface can be smoothed.

(2)前処理工程(ジンケート処理工程、活性化工程)
アルミニウム合金は、難めっき材であり、清浄工程を行っても、大気に接触すると、直ぐに緻密で強固な酸化皮膜が形成されて不活性となり、Ni−Pめっき層の形成が阻害され易い。
(2) Pretreatment process (zincate treatment process, activation process)
An aluminum alloy is a difficult-to-plat material, and even when the cleaning process is performed, when it comes into contact with the atmosphere, a dense and strong oxide film is immediately formed and becomes inactive, and the formation of the Ni-P plating layer is likely to be hindered.

そこでアルミニウム合金にめっきを行う場合、前処理工程としてジンケート処理がなされることが多い。ジンケート処理は、ジンケート液(例えば、酸化亜鉛を溶解させた水酸化ナトリウム水溶液等)に基体を接触させて、その基体表面に中間皮膜となる亜鉛置換めっきを形成する処理である。このジンケート処理を行うことにより、密着性に優れたNi−Pめっき層が基体表面に形成され易くなる。特にジンケート処理を2回以上行うと、密着性の高いNi−Pめっき層が得られ易い。従ってめっきの前処理の一つとして、ジンケート処理は本発明でも有効である。   Therefore, when plating is performed on an aluminum alloy, a zincate treatment is often performed as a pretreatment step. The zincate treatment is a treatment in which a substrate is brought into contact with a zincate solution (for example, a sodium hydroxide aqueous solution in which zinc oxide is dissolved) to form zinc replacement plating serving as an intermediate film on the surface of the substrate. By performing this zincate treatment, a Ni—P plating layer having excellent adhesion can be easily formed on the substrate surface. In particular, when the zincate treatment is performed twice or more, a Ni—P plating layer with high adhesion is easily obtained. Accordingly, the zincate treatment is also effective in the present invention as one of the pretreatments for plating.

もっとも、ジンケート処理後に無電解Ni−Pめっきを行うと、中間皮膜を形成していた亜鉛の大部分がめっき液中に溶出する。このため、めっき液が汚染され、高価なめっき液の寿命が短くなって不経済である。   However, when electroless Ni-P plating is performed after the zincate treatment, most of the zinc forming the intermediate film is eluted in the plating solution. For this reason, the plating solution is contaminated, and the life of the expensive plating solution is shortened, which is uneconomical.

そこで、ジンケート処理を行うことなく、基体表面へ直接めっきできる活性化工程を行うと好適である。この活性化工程は、基体表面にpH3〜12の処理液を接触させて基体表面を活性化する工程である。この処理液(活性化処理液)には、酸性活性化処理液またはアルカリ性活性化処理液がある。酸性活性化処理液には、例えば、塩酸、フッ酸、酸性フッ化アンモニウム等の水溶液がある。アルカリ性処理液には、例えば、水酸化ナトリウム、炭酸ナトリウム、水酸化アンモニウム、各種アミン類等の水溶液がある。勿論、この活性化工程は清浄工程後になされると好ましいが、酸性活性化処理液を用いる場合には活性化工程により前述した清浄工程を兼ねてもよい。   Therefore, it is preferable to perform an activation process that can directly plate the substrate surface without performing a zincate treatment. This activation step is a step of activating the substrate surface by bringing a treatment liquid having a pH of 3 to 12 into contact with the substrate surface. The treatment liquid (activation treatment liquid) includes an acid activation treatment liquid or an alkaline activation treatment liquid. Examples of the acid activation treatment liquid include aqueous solutions of hydrochloric acid, hydrofluoric acid, acidic ammonium fluoride, and the like. Examples of the alkaline treatment liquid include aqueous solutions of sodium hydroxide, sodium carbonate, ammonium hydroxide, various amines, and the like. Of course, this activation step is preferably performed after the cleaning step. However, when an acidic activation treatment solution is used, the activation step may also serve as the above-described cleaning step.

ちなみに、活性化工程の意義は次の通りである。アルミニウム系基材に無電解めっきを施す場合、元素としてのアルミニウムは、還元剤の反応を開始させる触媒活性を有していないため、無電解めっき反応は自動的に開始されない。もっとも、実用的なアルミニウム系基材は、触媒活性を有する鉄、ニッケル等の元素を、不純物または添加元素として少なからず含有している。これらの元素を、アルミニウム系基材の表面に露出できれば無電解めっき反応を自動的に開始させることができる。しかし、脱脂、エッチング、酸浸漬等の清浄工程を経たアルミニウム系基材では、表面が不働態皮膜(アルミニウム酸化物)で覆われており、上述した鉄やニッケル等の析出物からなる活性点が十分に露出した状態にない。この段階のアルミニウム系基材を無電解めっき液に投入しても、めっき反応は開始されない。そこで、清浄工程後の活性化処理により不働態皮膜が消失されるに伴ない、活性点の露出が進む。そして、浸漬電位が−1.4〜−1.35V(vsAg/AgCl)までシフトすると、活性点の露出(活性化)が十分となり、アルミニウム系基材に対しても、無電解めっきが自動的に開始されるようになる。   Incidentally, the significance of the activation process is as follows. When electroless plating is performed on an aluminum-based substrate, aluminum as an element does not have a catalytic activity for initiating a reaction of a reducing agent, and thus the electroless plating reaction is not automatically started. However, a practical aluminum-based base material contains elements such as iron and nickel having catalytic activity as impurities or additive elements. If these elements can be exposed on the surface of the aluminum-based substrate, the electroless plating reaction can be automatically started. However, in an aluminum-based base material that has undergone a cleaning process such as degreasing, etching, and acid dipping, the surface is covered with a passive film (aluminum oxide), and the above-mentioned active sites composed of precipitates such as iron and nickel are present. Not fully exposed. Even if the aluminum-based substrate at this stage is added to the electroless plating solution, the plating reaction is not started. Therefore, as the passive film disappears due to the activation process after the cleaning process, the exposure of the active sites proceeds. When the immersion potential is shifted from -1.4 to -1.35 V (vsAg / AgCl), the exposure (activation) of the active sites becomes sufficient, and the electroless plating is automatically performed even on the aluminum-based substrate. To be started.

活性化工程自体は数分間程度行えば十分であるが、必要に応じて2回以上行ってもよい。いずれにしても、この活性化工程により、基体表面が十分に活性化されることが重要となる。この判断は、活性化処理した基体が有する自然(標準)電極電位の貴卑によって行える。自然電極電位の測定は、例えば、pH11.5に調整したアルカリ水溶液(測定液)に、活性化処理後の基体とAg/AgCl電極を浸漬して、電位差計により基体の自然電極電位を直ちに測定する。この自然電極電位が−1.4〜−1.35Vまでシフトすると、基体表面はめっきに好適な活性状態にあると判断される。要するに、基体の自然電極電位が所望値になるまで、基体表面に活性化処理液を接触させる活性化工程を行えばよい。   It is sufficient that the activation process itself is performed for several minutes, but it may be performed twice or more as necessary. In any case, it is important that the substrate surface is sufficiently activated by this activation step. This determination can be made based on the natural (standard) electrode potential of the activated substrate. The natural electrode potential is measured by, for example, immersing the activated substrate and the Ag / AgCl electrode in an alkaline aqueous solution (measurement solution) adjusted to pH 11.5, and immediately measuring the natural electrode potential of the substrate with a potentiometer. To do. When the natural electrode potential shifts from -1.4 to -1.35 V, the substrate surface is determined to be in an active state suitable for plating. In short, an activation step of bringing the activation treatment solution into contact with the substrate surface may be performed until the natural electrode potential of the substrate reaches a desired value.

なお、自然電極電位が所望値となる活性化条件を決定できれば、自然電極電位の測定を毎回行う必要はなく、その条件下で活性化工程を繰り返し行えばよい。ちなみに、自然電極電位の測定を行う場合、使用する測定液は、活性化処理液と相互に兼用可能である。この他、活性化工程に関することは、特許2648716号公報に詳しく記載されている。   In addition, if the activation conditions under which the natural electrode potential becomes a desired value can be determined, it is not necessary to measure the natural electrode potential every time, and the activation process may be repeated under the conditions. Incidentally, when measuring the natural electrode potential, the measurement liquid to be used can be used together with the activation treatment liquid. In addition, the activation process is described in detail in Japanese Patent No. 2648716.

(3)めっき工程
めっき工程により、前処理した基体表面にNi−Pめっき層が形成される。このNi−Pめっき層は、無電解Ni−Pめっき液を用いることにより効率的に形成される。無電解めっき液の組成、めっき液の温度、めっき時間等は適宜調整される。
(3) Plating step A Ni-P plating layer is formed on the pretreated substrate surface by the plating step. This Ni-P plating layer is efficiently formed by using an electroless Ni-P plating solution. The composition of the electroless plating solution, the temperature of the plating solution, the plating time, and the like are adjusted as appropriate.

なお、めっき直後のNi−Pめっき層は非晶質であり、必ずしも密着性が高くない。この密着性を高めるために、次の結晶化工程とは別に、めっき工程後の基体を200℃で1時間程度加熱してもよい。   Note that the Ni—P plating layer immediately after plating is amorphous and does not necessarily have high adhesion. In order to enhance this adhesion, the substrate after the plating step may be heated at 200 ° C. for about 1 hour, separately from the next crystallization step.

(4)結晶化工程
結晶化工程により、基体表面に形成された非晶質なNi−Pめっき層は結晶化した硬質な結晶質Ni−P層となる。この結晶化工程では、基本的にNi−Pめっき層を300〜500℃好ましくは350〜450℃で加熱すると好適である。このときの加熱時間は0.5〜10時間程度でよい。
(4) Crystallization process The amorphous Ni-P plating layer formed on the substrate surface by the crystallization process becomes a crystallized hard crystalline Ni-P layer. In this crystallization step, it is preferable to heat the Ni—P plating layer basically at 300 to 500 ° C., preferably 350 to 450 ° C. The heating time at this time may be about 0.5 to 10 hours.

《基体》
基体は、結晶化工程で加熱しても軟化しないアルミニウム合金からなる。このアルミニウム合金は、400℃で10時間保持した後に室温状態で測定した残留硬さが120Hv以上となる耐軟化性を有するものであればよく、その組成や製造方法等は問わない。例えば、以降に述べるようなアルミニウム合金が好適である。
<Substrate>
The substrate is made of an aluminum alloy that does not soften even when heated in the crystallization process. The aluminum alloy may have any softening resistance such that the residual hardness measured at room temperature after being held at 400 ° C. for 10 hours is 120 Hv or more, and the composition and manufacturing method thereof are not limited. For example, an aluminum alloy as described below is suitable.

〈アルミニウム合金の組成〉
(1)Fe
Feは、アルミニウム合金の強度や硬さなどを高める元素である。具体的には、適量のFeはAlと金属間化合物(Al−Fe系金属間化合物:第一化合物相)を母相(α−Al相)中に形成する。この第一化合物相がアルミニウム合金の強度や硬さを高める。
<Composition of aluminum alloy>
(1) Fe
Fe is an element that increases the strength and hardness of the aluminum alloy. Specifically, an appropriate amount of Fe forms Al and an intermetallic compound (Al—Fe-based intermetallic compound: first compound phase) in the parent phase (α-Al phase). This first compound phase increases the strength and hardness of the aluminum alloy.

アルミニウム合金全体を100質量%としたときに(以下ではこの記載を省略する。)、Feは1〜7%、3〜6%、4〜6%さらには4.5〜5.5%であると好ましい。Feが過少では十分な強度や硬さが得られず、Feが過多では延性が低下し、また高強度過ぎて成形性や加工性などが困難となる。   When the entire aluminum alloy is 100% by mass (this description is omitted below), Fe is 1 to 7%, 3 to 6%, 4 to 6%, and further 4.5 to 5.5%. And preferred. If Fe is insufficient, sufficient strength and hardness cannot be obtained. If Fe is excessive, ductility is lowered, and if it is too high, moldability and workability become difficult.

なお、Feはアルミニウム合金の強度等に有効なだけではなく、上述した無電解Ni−Pめっきを行う際の触媒元素(活性化元素)としても機能し得る。すなわち、上述した活性化処理工程後に、基体表面からFeが部分的に露出していると、その部分が起点となってNi−Pめっき層が形成され始める。従ってFeを含有するアルミニウム合金を基体に用いることにより、密着性や均一性等に優れるNi−Pめっき層が形成される。この傾向はアルミニウム合金中のFe含有量が1%以上の範囲で増加するほど大きくなる。   Note that Fe is not only effective for the strength of the aluminum alloy, but can also function as a catalyst element (activation element) in performing the above-described electroless Ni—P plating. That is, if Fe is partially exposed from the surface of the substrate after the activation process described above, the Ni—P plating layer starts to be formed starting from that portion. Therefore, by using an aluminum alloy containing Fe for the substrate, a Ni-P plating layer having excellent adhesion and uniformity can be formed. This tendency increases as the Fe content in the aluminum alloy increases in the range of 1% or more.

(2)ZrおよびTi
ZrおよびTiは、Alと協調して、アルミニウム合金の耐熱性を高める第二化合物相を形成する重要な元素である。前述した第一化合物相は、必ずしも熱的に安定ではなく、高温雰囲気に長時間曝されると、相変態や形状変化(粗大化)などを生じ得る。
(2) Zr and Ti
Zr and Ti are important elements that form a second compound phase that enhances the heat resistance of the aluminum alloy in cooperation with Al. The aforementioned first compound phase is not necessarily thermally stable, and may undergo phase transformation, shape change (coarse), etc. when exposed to a high temperature atmosphere for a long time.

適量のZrおよびTiは、Alとの間でL1型構造のAl−(Zr、Ti)系金属間化合物(第二化合物相または析出相)を形成する。この第二化合物相は、母相に整合的であると共に、Al−Fe系金属間化合物と母相の境界(界面)近傍に出現して高温域まで安定している。具体的にいうと、第二化合物相は、少なくともその析出を開始した温度以下で、相変態や粗大化を生じることが殆どない。そして、第一化合物相と母相が接する近傍に析出等した第二化合物相は、アルミニウム合金の強度や硬さを担う第一化合物相の高温時における相変態や形状変化等を、安定的に抑止(いわばピン留め)する。このように第一化合物相および第二化合物相が相乗的に作用することによって、優れた耐軟化性、耐熱性を発揮するアルミニウム合金が得られたと考えられる。 An appropriate amount of Zr and Ti form a Al- the L1 2 -type structure between Al (Zr, Ti) intermetallic compound (the second compound phase or precipitated phase). This second compound phase is consistent with the parent phase, appears near the boundary (interface) between the Al—Fe-based intermetallic compound and the parent phase, and is stable up to a high temperature range. More specifically, the second compound phase hardly undergoes phase transformation or coarsening at least at or below the temperature at which the precipitation started. The second compound phase precipitated in the vicinity where the first compound phase and the parent phase are in contact with each other stably causes the phase transformation and shape change of the first compound phase responsible for the strength and hardness of the aluminum alloy at high temperatures. Deterrence (so to pin). Thus, it is considered that an aluminum alloy exhibiting excellent softening resistance and heat resistance was obtained by the synergistic action of the first compound phase and the second compound phase.

なお、本明細書でいう「整合」とは、第二化合物相の結晶基本構造が母相と同一であって、その母相との境界(界面)で原子面あるいは原子列が過不足なく連なっている場合をいう。但し、加工等に導入された転位によって原子列の乱れや点欠陥などを生じ得るが、このようなものは除いて考える。   In this specification, “matching” means that the basic crystal structure of the second compound phase is the same as that of the parent phase, and the atomic plane or atomic row is connected without excess or deficiency at the boundary (interface) with the parent phase. If you are. However, although dislocations introduced in processing or the like can cause disorder of atomic sequences or point defects, these are excluded.

ところで、第二化合物相はナノ粒子状であり、その中央部でZr濃度が高く、その外郭部でTi濃度が高くなっていることもわかっている。つまり、Al(Zr、Ti)中のZrおよびTiの濃度が、中央から外殻にかけて傾斜していることもわかっている。このような第二化合物相の形成には、ZrがTiよりも多く存在して、Tiに対するZrの質量比(Zr/Ti)が所定範囲内であると好適である。 By the way, the second compound phase is in the form of nanoparticles, and it is also known that the Zr concentration is high in the central part and the Ti concentration is high in the outer part. That is, it is also known that the concentration of Zr and Ti in Al 3 (Zr, Ti) is inclined from the center to the outer shell. For the formation of such a second compound phase, it is preferable that more Zr is present than Ti and the mass ratio of Zr to Ti (Zr / Ti) is within a predetermined range.

そこでZrは0.5〜3%、0.66〜1.5%、0.7〜1.3%さらには0.8〜1.2%であると好ましい。またTiは0.5〜3%、0.6〜1%さらには0.7〜0.9%であると好ましい。ZrまたはTiが過少になると、その効果が低下し、ZrまたはTiが過多になると、溶解温度が極めて高くなり製造コスト高になると共にAlとの間で粗大な晶出物または析出物が形成されたり、アルミニウム合金の加工性や成形性が低下し得る傾向がある。   Therefore, Zr is preferably 0.5 to 3%, 0.66 to 1.5%, 0.7 to 1.3%, and further 0.8 to 1.2%. Ti is preferably 0.5 to 3%, 0.6 to 1%, and more preferably 0.7 to 0.9%. When Zr or Ti is too small, the effect is reduced, and when Zr or Ti is excessive, the melting temperature becomes extremely high and the production cost is increased, and coarse crystallized products or precipitates are formed with Al. Or the workability and formability of the aluminum alloy tend to be reduced.

そして両者の質量比(Zr/Ti)が1.1〜1.5さらには1.15〜1.4であると、第二化合物相の形成により、高温域まで安定なアルミニウム合金が得られ易くなる。   And when both mass ratio (Zr / Ti) is 1.1-1.5 and also 1.15-1.4, a stable aluminum alloy is easily obtained to a high temperature range by formation of a 2nd compound phase. Become.

なお、第一化合物相の境界近傍にある母相中に第二化合物相を微細に分散させるには、ZrおよびTiを基地中に十分に固溶(過飽和固溶)させて、後から析出させればよい。具体的には、急冷凝固により適量のZrおよびTiを過飽和に固溶させた後、その析出を促進させる駆動力となるエネルギーを付与するとよい。このようなエネルギーとして、熱処理や熱間加工等によって加えられる熱エネルギー、塑性加工等によって加えられる歪みエネルギーなどがある。加熱処理により熱エネルギーが単独で加えられてもよいし、熱間加工等により熱エネルギーと歪みエネルギーが同時に加えられてもよい。さらには、冷間加工後または温間加工後に加熱処理を行うなど、歪みエネルギーを導入した後に熱エネルギーを加えてもよい。熱エネルギーに歪みエネルギーが加わることにより、第二化合物相の析出が加速されて、耐熱高強度アルミニウム合金を短時間内で効率的に得ることができる。   In order to finely disperse the second compound phase in the parent phase in the vicinity of the boundary of the first compound phase, Zr and Ti are sufficiently dissolved in the matrix (supersaturated solid solution) and precipitated later. Just do it. Specifically, after a suitable amount of Zr and Ti are dissolved in supersaturation by rapid solidification, energy serving as a driving force for promoting the precipitation may be applied. Examples of such energy include thermal energy applied by heat treatment and hot working, strain energy applied by plastic working, and the like. Thermal energy may be applied alone by heat treatment, or thermal energy and strain energy may be applied simultaneously by hot working or the like. Furthermore, heat energy may be applied after introducing strain energy, such as performing heat treatment after cold working or warm working. By adding strain energy to thermal energy, precipitation of the second compound phase is accelerated, and a heat-resistant and high-strength aluminum alloy can be efficiently obtained within a short time.

(3)Mg
Mgは、アルミニウム合金の強度(特に室温強度)の向上に有効な元素である。Mgは0.5〜5%、0.6〜2.2%、1〜2%さらには1.2〜1.8%であると好ましい。Mgが過少ではその効果がなく、過多ではアルミニウム合金材の加工性や成形性の低下を招く。
(3) Mg
Mg is an element effective for improving the strength (particularly the room temperature strength) of the aluminum alloy. Mg is preferably 0.5 to 5%, 0.6 to 2.2%, 1 to 2%, and further 1.2 to 1.8%. If Mg is too small, the effect is not obtained, and if it is excessive, workability and formability of the aluminum alloy material are lowered.

(4)上述した内容を踏まえて、本発明に係るアルミニウム合金は、例えば、全体を100%としたときに、Fe:3〜6%、Zr:0.66〜1.5%、Ti:0.6〜1%、Tiに対するZrの質量比(Zr/Ti):1.1〜1.5、残部:Alと不可避不純物および/または改質元素となる合金組成を有すると好適である。 (4) Based on the above-described contents, the aluminum alloy according to the present invention has, for example, Fe: 3 to 6%, Zr: 0.66 to 1.5%, Ti: 0 when the whole is 100%. It is preferable to have an alloy composition that is 6 to 1%, a mass ratio of Zr to Ti (Zr / Ti): 1.1 to 1.5, and the balance: Al and inevitable impurities and / or modifying elements.

ここでいう「改質元素」は、Al、Fe、Zr、TiおよびMg以外の元素であって、アルミニウム合金の特性改善に有効な元素である。改善される特性は、その種類は問わないが、高温域または室温域における強度、硬さ、靱性、延性、寸法安定性などがある。このような改質元素の具体例として、Cr、Co、マンガン(Mn)、ニッケル(Ni)、スカンジウム(Sc)、イットリウム(Y)、ランタン(La)、バナジウム(V)、ハフニウム(Hf)、ニオブ(Nb)などがある。各元素の配合などは任意であるが、通常、その含有量は微量である。   The “reforming element” here is an element other than Al, Fe, Zr, Ti, and Mg, and is an element effective for improving the characteristics of the aluminum alloy. The properties to be improved are not limited by type, but include strength, hardness, toughness, ductility, dimensional stability, etc. at high temperatures or room temperatures. Specific examples of such modifying elements include Cr, Co, manganese (Mn), nickel (Ni), scandium (Sc), yttrium (Y), lanthanum (La), vanadium (V), hafnium (Hf), There is niobium (Nb). The composition of each element is arbitrary, but the content is usually very small.

「不可避不純物」は、溶解原料中に含まれる不純物や各工程時に混入等する不純物などであって、コスト的または技術的な理由等により除去することが困難な元素である。本発明に係るアルミニウム合金の場合であれば、例えば、シリコン(Si)等がある。   “Inevitable impurities” are impurities contained in the melted raw material, impurities mixed in at each step, etc., and are elements that are difficult to remove due to cost or technical reasons. Examples of the aluminum alloy according to the present invention include silicon (Si).

〈アルミニウム合金の金属組織〉
上述したアルミニウム合金は、Alの母相(α相)と、Al−Fe系金属間化合物相(第一化合物相)と、Al−(Zr、Ti)系金属間化合物(第二化合物相)を少なくとも有する複合組織からなる。
<Metal structure of aluminum alloy>
The above-described aluminum alloy includes an Al matrix (α phase), an Al—Fe intermetallic compound phase (first compound phase), and an Al— (Zr, Ti) intermetallic compound (second compound phase). It consists of at least a complex tissue.

第二化合物相の平均サイズは、1〜30、2〜20nmさらには3〜15nmであると好ましい。このサイズが過小でも過大でも、第二化合物相によるアルミニウム合金の耐熱性の向上効果が低下し得る。なお平均サイズとは、アルミニウム合金中より無作為に抽出したサンプルを透過電子顕微鏡(TEM)で観察し、30個以上の分散する第二化合物相の平均直径を画像処理法により解析して求めた値である。   The average size of the second compound phase is preferably 1 to 30, 2 to 20 nm, and more preferably 3 to 15 nm. Whether the size is too small or too large, the effect of improving the heat resistance of the aluminum alloy by the second compound phase can be lowered. The average size was obtained by observing a sample randomly extracted from the aluminum alloy with a transmission electron microscope (TEM) and analyzing the average diameter of 30 or more dispersed second compound phases by an image processing method. Value.

〈アルミニウム合金の製造方法〉
(1)上述したようなアルミニウム合金の製造方法は種々考えられる。例えば、合金溶湯を100℃/秒以上の冷却速度で急冷凝固させた凝固体を得る凝固工程と、この凝固体を例えば300〜500℃で加熱する熱処理工程とを備えるアルミニウム合金の製造方法でもよい。この熱処理工程は、凝固体に熱間で塑性加工を施す熱間加工工程であると、前述した第二化合物相が基地中に超微細に均一的に分散した金属組織を得ることができて好適である。
<Method for producing aluminum alloy>
(1) Various methods for producing the aluminum alloy as described above are conceivable. For example, it may be a method for producing an aluminum alloy comprising a solidification step for obtaining a solidified body obtained by rapidly solidifying a molten alloy at a cooling rate of 100 ° C./second or more and a heat treatment step for heating the solidified body at, for example, 300 to 500 ° C. . This heat treatment step is a hot working step in which the solidified body is subjected to plastic working in a hot manner, and it is possible to obtain a metal structure in which the above-mentioned second compound phase is dispersed in an ultrafine and uniform manner in the matrix. It is.

急冷凝固させた凝固体は、ZrおよびTiが基地中に過飽和に固溶した状態となっている。この原素材に熱間塑性加工を施すと、所望形状に創成された加工材が得られるのみならず、凝固体に熱エネルギーおよび歪みエネルギーが順次または同時に印加されて、第二化合物相の析出が促進される。こうして、母相中に第一化合物相のみならず、第二化合物相が超微細に多数析出した耐熱性に優れるアルミニウム合金が容易に得られる。そして、第二化合物相の析出に長時間を要する時効処理等を行う必要もなく、アルミニウム合金を効率的に低コストで得ることが可能となる。勿論、熱処理(例えば、時効処理)により第二化合物相を析出させてもよい。   The rapidly solidified solidified body is in a state where Zr and Ti are supersaturated in the matrix. When this raw material is subjected to hot plastic working, not only a processed material created in a desired shape is obtained, but also heat energy and strain energy are applied to the solidified body sequentially or simultaneously, so that precipitation of the second compound phase occurs. Promoted. Thus, an aluminum alloy having excellent heat resistance in which not only the first compound phase but also a large number of second compound phases are precipitated in the matrix phase can be easily obtained. And it is not necessary to perform the aging treatment etc. which require a long time for precipitation of a 2nd compound phase, and it becomes possible to obtain an aluminum alloy efficiently at low cost. Of course, the second compound phase may be precipitated by heat treatment (for example, aging treatment).

(2)凝固体の冷却速度は大きいほど好ましく、例えば、100℃/秒、300℃/秒以上、1000℃/秒以上、5000℃/秒以上さらには10000℃/秒以上であるとよい。これにより第二化合物相の生成に必要なZrおよびTiを過飽和に固溶させた凝固体(原素材)を容易に得ることができる。 (2) The cooling rate of the solidified body is preferably as high as possible. For example, it is preferably 100 ° C./second, 300 ° C./second or more, 1000 ° C./second or more, 5000 ° C./second or more, further 10,000 ° C./second or more. Thereby, a solidified body (raw material) in which Zr and Ti necessary for the generation of the second compound phase are supersaturated can be easily obtained.

このような急冷凝固は、例えば、アトマイズ法、スプレーフォーミング法、ストリップキャスト法(ロール鋳造法等)などにより行える。アトマイズ法によると、粉末状の凝固体(アトマイズ粒子が集合したアトマイズ粉末)が得られる。スプレーフォーミング法によると、塊状の凝固体が得られる。連続鋳造法によると、薄帯からなる凝固体が得られる。   Such rapid solidification can be performed by, for example, an atomizing method, a spray forming method, a strip casting method (roll casting method, or the like). According to the atomization method, a powdery solidified body (atomized powder in which atomized particles are aggregated) is obtained. According to the spray forming method, a massive solidified body is obtained. According to the continuous casting method, a solidified body made of a ribbon is obtained.

凝固体のサイズは問わないが、アトマイズ粒子なら、例えば、平均粒径が50〜300μm程度であり、薄片なら、例えば、厚さが0.05〜1.5mmで5〜8mm角程度であると好ましい。   The size of the solidified body is not limited, but if it is atomized particles, for example, the average particle size is about 50 to 300 μm, and if it is a thin piece, for example, the thickness is about 0.05 to 1.5 mm and about 5 to 8 mm square. preferable.

原素材は、このような凝固体そのものでも良い。もっとも、アトマイズ粉末(水アトマイズ粉末、ガスアトマイズ粉末、水・ガスアトマイズ粉末)や薄帯を破砕または粉砕した薄片からなる破砕粉等を、圧縮成形した成形体またはビレットを原素材として用いると、生産性等の点で好ましい。   The raw material may be such a solidified body itself. However, when using atomized powder (water atomized powder, gas atomized powder, water / gas atomized powder) or crushed powder consisting of thin pieces obtained by crushing or pulverizing thin strips as a raw material, productivity, etc. This is preferable.

(3)熱間塑性加工には、押出加工、鍛造加工、圧延加工、焼結鍛造加工等がある。例えば、ビレットを熱間で押出成形して押出材(加工材)を得る押出加工の場合、ビレットの押出温度は350〜500℃さらには400℃〜480℃にすると好ましい。押出温度が過小であると、第二化合物相の析出やアルミニウム合金の耐熱温度が不十分となる。また加工力も増加して好ましくない。一方、押出温度が過大になると、金属組織の粗大化が進行し、却ってアルミニウム合金の耐熱性が低下し得る。 (3) Hot plastic working includes extrusion, forging, rolling, and sintering forging. For example, in the case of extrusion processing in which a billet is extruded by hot forming to obtain an extruded material (processed material), it is preferable that the extrusion temperature of the billet is 350 to 500 ° C, further 400 to 480 ° C. If the extrusion temperature is too low, the precipitation of the second compound phase and the heat resistant temperature of the aluminum alloy will be insufficient. Further, the processing force increases, which is not preferable. On the other hand, when the extrusion temperature is excessive, the metal structure is coarsened, and the heat resistance of the aluminum alloy can be lowered.

ビレットの押出比は5〜30さらには10〜20が好ましい。押出比が過小であると、粉末粒子同士または破砕片同士の圧接が不十分となり、所望の強度や延性が得られず、押出比が過大になると加工力が増加して成形困難となる。   The billet extrusion ratio is preferably 5-30, more preferably 10-20. If the extrusion ratio is too small, the pressure contact between the powder particles or the crushed pieces becomes insufficient, the desired strength and ductility cannot be obtained, and if the extrusion ratio is too large, the processing force increases and molding becomes difficult.

なお、押出成形等に用いるビレットの相対密度(嵩密度/真密度)は問わないが、60%以上、70%以上、80%以上、85%以上さらには90%以上であると好ましい。相対密度が過小であると、ビレットの保形性や取扱性が低下する。相対密度の上限は問わないが、生産性を考慮すると、95%以下が好ましい。   In addition, the relative density (bulk density / true density) of the billet used for extrusion molding or the like is not limited, but is preferably 60% or more, 70% or more, 80% or more, 85% or more, and further 90% or more. If the relative density is too small, the shape retention and handling properties of the billet are reduced. The upper limit of the relative density is not limited, but 95% or less is preferable in consideration of productivity.

〈その他〉
上述したアルミニウム合金以外に、例えば特開2007−92117号公報や特開2011−42861号公報等に記載されている耐軟化性に優れたアルミニウム合金を耐摩耗性部材の基体に用いることもできる。
<Others>
In addition to the above-described aluminum alloy, an aluminum alloy having excellent softening resistance described in, for example, Japanese Patent Application Laid-Open No. 2007-92117 and Japanese Patent Application Laid-Open No. 2011-42861 can be used for the base of the wear-resistant member.

《用途》
本発明の耐摩耗性部材は、その用途や使用環境を問わない。もっとも、本発明の耐摩耗性部材は、優れた耐摩耗性を有するため、他部材や流体(液体、気体)と接触する摺動部材に好適である。具体的には、ピストン、インペラ、吸気バルブ、コンロッド、ロータ等である。特に本発明に係る基体は、耐熱性や耐軟化性にも優れるので、高温環境下で使用される部材に好適である。具体的には、内燃機関のピストン、過給器のインペラ等に本発明の耐摩耗性部材は好適である。この他、コンプレッサー、シャフト、ローラー、パイプ、ブレーキシリンダー、AT変速機器部品、金型、ねじ等にも本発明の耐摩耗性部材を用いると好適である。
<Application>
The wear-resistant member of the present invention does not ask the use or use environment. However, since the wear-resistant member of the present invention has excellent wear resistance, it is suitable for a sliding member that comes into contact with other members or fluid (liquid, gas). Specifically, a piston, an impeller, an intake valve, a connecting rod, a rotor, and the like. In particular, since the substrate according to the present invention is excellent in heat resistance and softening resistance, it is suitable for a member used in a high temperature environment. Specifically, the wear resistant member of the present invention is suitable for a piston of an internal combustion engine, an impeller of a supercharger, and the like. In addition, it is preferable that the wear-resistant member of the present invention is used for a compressor, a shaft, a roller, a pipe, a brake cylinder, an AT transmission device part, a mold, a screw, and the like.

《耐摩耗性部材の製造》
〈基体〉
耐軟化性に優れた表1に示す多数のアルミニウム合金中から、その一例として選択した基材No.11のアルミニウム合金(Al−5%Fe−1%Zr−0.85%Ti−1.5%Mg)からなる基体(試験片)を用意した。ちなみに、この基体は、430℃で直径50mmに押出加工した素材を、φ30mm×厚さ3mmの円板状に加工したものである。また「%」は特に断らない限り質量%を意味する。
<< Manufacture of wear-resistant parts >>
<Substrate>
Of the many aluminum alloys shown in Table 1 having excellent softening resistance, the base material No. selected as an example was used. A substrate (test piece) made of 11 aluminum alloy (Al-5% Fe-1% Zr-0.85% Ti-1.5% Mg) was prepared. By the way, this substrate is a material obtained by extruding a material extruded at 430 ° C. to a diameter of 50 mm into a disk shape of φ30 mm × thickness 3 mm. “%” Means mass% unless otherwise specified.

〈被覆層〉
(1)清浄工程
この基体を、水酸化ナトリウム水溶液(濃度50g/L)でアルカリエッチングして、基体の表面に形成されていた酸化皮膜を除去した(エッチング工程)。これを水洗した後、基体の表面にできたスマットを硝酸水溶液(濃度30%)で除去し、さらに水洗した(デスマット工程)。こうして基体表面を清浄化した(清浄工程)。
<Coating layer>
(1) Cleaning step The substrate was alkali-etched with an aqueous sodium hydroxide solution (concentration 50 g / L) to remove the oxide film formed on the surface of the substrate (etching step). After this was washed with water, the smut formed on the surface of the substrate was removed with an aqueous nitric acid solution (concentration 30%) and further washed with water (desmutting step). In this way, the substrate surface was cleaned (cleaning step).

(2)活性化工程
清浄化した基体を、さらに、pH11.5の炭酸ナトリウム水溶液に浸漬して活性化処理をした。この活性化処理を基体の標準(自然)電極電位が−1.4〜−1.35V(vsAg/AgCl)にシフトするまで継続した。なお、標準電極電位は該測定液に活性化処理後の基体及びAg/AgCl電極を浸漬、電位差計により測定した。こうしてジンケート処理をせずに直接めっきをするための前処理を行った。
(2) Activation process The cleaned base | substrate was further immersed in the sodium carbonate aqueous solution of pH 11.5, and the activation process was carried out. This activation process was continued until the standard (natural) electrode potential of the substrate was shifted to -1.4 to -1.35 V (vsAg / AgCl). The standard electrode potential was measured with a potentiometer after immersing the substrate after activation treatment and the Ag / AgCl electrode in the measurement solution. Thus, a pretreatment was carried out for direct plating without carrying out the zincate treatment.

(3)めっき工程
前処理をした基体を、90℃のめっき液中に60分間浸漬した。めっき液には、市販されている無電解ニッケルリンめっき液(奥野製薬工業株式会社製トップニコロンBL)を用いた。こうして基体表面にNi−Pめっき層が形成された。
(3) Plating step The pretreated substrate was immersed in a 90 ° C. plating solution for 60 minutes. A commercially available electroless nickel phosphorus plating solution (Okuno Pharmaceutical Co., Ltd. Top Nicolon BL) was used as the plating solution. Thus, a Ni—P plating layer was formed on the surface of the substrate.

(4)加熱工程(結晶化工程)
めっき処理した基体を加熱炉に入れて大気圧雰囲気中で1時間加熱した。加熱温度は、200℃、300℃、350℃、400℃および450℃とした。こうして加熱温度の異なる複数の試験片を得た。
(4) Heating process (crystallization process)
The plated substrate was placed in a heating furnace and heated in an atmospheric pressure atmosphere for 1 hour. The heating temperature was 200 ° C, 300 ° C, 350 ° C, 400 ° C and 450 ° C. Thus, a plurality of test pieces having different heating temperatures were obtained.

(5)比較例
表1の基材No.C1および基材No.C2に示す市販のアルミニウム合金(A2618およびA6061)も用意した。これらのアルミニウム合金からなる基体についても、上述した処理を同様に行った。
(5) Comparative Example Base No. of Table 1 C1 and substrate No. Commercially available aluminum alloys (A2618 and A6061) shown in C2 were also prepared. The above-described treatment was performed in the same manner for the bases made of these aluminum alloys.

《測定》
(1)基体と被覆層の硬さ
加熱温度の異なる試験片をそれぞれ切断し、切断面の基体部分と被覆層部分の硬さを室温状態でマイクロビッカース硬度計(株式会社アカシ製MVK−E)を用いて測定した。この際、試験荷重:0.245N、保持時間:20秒として、5回測定した平均値を求めた。この結果を図1および図2にそれぞれ示した。なお、図2には、基材No.11からなる試験片について測定した被覆層の硬さのみを示したが、他の基材からなる試験片についても同様な結果であった。
<Measurement>
(1) Hardness of substrate and coating layer Test specimens having different heating temperatures were cut, respectively, and the hardness of the substrate portion and the coating layer portion of the cut surface was measured at room temperature using a micro Vickers hardness tester (MVK-E manufactured by Akashi Corporation). It measured using. Under the present circumstances, the average value which measured 5 times was calculated | required by making test load: 0.245N and holding time: 20 second. The results are shown in FIGS. 1 and 2, respectively. In FIG. Only the hardness of the coating layer measured for the test piece consisting of 11 was shown, but similar results were obtained for the test pieces consisting of other substrates.

(2)被覆層の残留応力
加熱温度の異なる試験片の表面(Ni−Pめっき層)に現れた残留応力を測定した。この測定は、X線応力測定法標準(日本材料学会X線材料強度部門委員会(1997))に基づいて行った。具体的には、試料水平型強力X線回折装置(株式会社リガク製RINT−TTR)を用いて平行ビーム法および並傾法により、試験片のX線回折パターンを得た(X線源:Cu−Kα、出力:50kV−300mA)。このX線回折パターンに基づき、sinψ法により残留応力σを算出した。
σ=K・Δ(2θ)/Δ(sinψ)
K={E・cotθ/2(1+ν)}・(π/180)
E:Niのヤング率(202000MPa)、
ν:Niのポアソン比(0.306)、
θ :標準ブラッグ角(ψ=0deg.のときの回折角度)
こうして得られた結果を図3に示した。この図中、「+」は引張応力を、「−」は圧縮応力を意味する。
(2) Residual stress of coating layer The residual stress which appeared on the surface (Ni-P plating layer) of the test piece from which heating temperature differs was measured. This measurement was performed based on the X-ray stress measurement method standard (Japan Society for Materials X-ray Material Strength Division Committee (1997)). Specifically, an X-ray diffraction pattern of a test piece was obtained by a parallel beam method and a parallel tilt method using a sample horizontal strong X-ray diffractometer (RINT-TTR manufactured by Rigaku Corporation) (X-ray source: Cu -Kα, output: 50 kV-300 mA). Based on this X-ray diffraction pattern, the residual stress σ was calculated by the sin 2 ψ method.
σ = K · Δ (2θ) / Δ (sin 2 ψ)
K = {E · cotθ 0/ 2 (1 + ν)} · (π / 180)
E: Young's modulus of Ni (202000 MPa),
ν: Poisson's ratio of Ni (0.306),
θ 0 : Standard Bragg angle (diffraction angle when ψ = 0 deg.)
The results thus obtained are shown in FIG. In this figure, “+” means tensile stress and “−” means compressive stress.

《評価》
(1)基体の硬さ
図1から明らかなように、基材No.11からなる基体は、450℃まで加熱しても硬さが殆ど変化しなかった。より具体的にいうと、加熱工程の前後を通じて基体の硬さは、160〜170Hv内で安定しており、高々10〜15Hv程度しか変化しなかった。さらにいえば、基材No.11からなる基体は、高温で加熱するほど硬さが増加する傾向を示した。
<Evaluation>
(1) Hardness of substrate As apparent from FIG. The substrate consisting of 11 hardly changed in hardness even when heated to 450 ° C. More specifically, the hardness of the substrate was stable within the range of 160 to 170 Hv before and after the heating step, and only changed by about 10 to 15 Hv at most. Furthermore, the base material No. The substrate consisting of 11 showed a tendency to increase in hardness as it was heated at a high temperature.

ちなみに、めっき工程後に400℃で加熱した後の基体の硬さ(残留硬さ)は165Hvであり、これは表1に示す基材No.11のアルミニウム合金単体の残留硬さとほぼ同等であった。   Incidentally, the hardness (residual hardness) of the substrate after heating at 400 ° C. after the plating step is 165 Hv. It was almost equivalent to the residual hardness of the 11 aluminum alloy simple substance.

一方、基材No.C1や基材No.C2からなる基体は、200℃以上に加熱すると、硬さが急激に低下した。そして400℃で加熱した後の硬さ(残留硬さ)は、80Hvよりも小さくなった。いずれにしても、基材No.C1や基材No.C2からなる基体は、400℃で加熱した後の残留硬さが120Hv未満さらには100Hv未満となった。   On the other hand, the base material No. C1 and substrate No. When the substrate made of C2 was heated to 200 ° C. or higher, the hardness decreased rapidly. And the hardness (residual hardness) after heating at 400 degreeC became smaller than 80Hv. In any case, the base No. C1 and substrate No. The substrate composed of C2 had a residual hardness of less than 120 Hv and even less than 100 Hv after heating at 400 ° C.

(2)被覆層の硬さ
図2から明らかなように、めっき工程で基体表面形成された(無電解)Ni−Pめっき層の硬さは、200℃までは殆ど変化せず、500Hv程度であった。
(2) Hardness of coating layer As is clear from FIG. 2, the hardness of the (electroless) Ni-P plating layer formed on the surface of the substrate in the plating step hardly changes up to 200 ° C., and is about 500 Hv. there were.

しかし、200℃を超えて加熱すると、Ni−Pめっき層は急激に硬さを増し、300℃まで加熱したときの硬さは1000Hv、350℃まで加熱したときの硬さは1180Hv、400℃まで加熱したときの硬さは1300Hvにもなった。   However, when heated above 200 ° C., the Ni-P plating layer suddenly increases in hardness. When heated to 300 ° C., the hardness is 1000 Hv, and when heated to 350 ° C., the hardness is 1180 Hv, 400 ° C. The hardness when heated was 1300 Hv.

このように、ある温度以上にNi−Pめっき層を加熱した場合に、その硬さが急変するのは、Ni−Pめっき層の構造が変化しているためと考えられる。具体的には、Ni−Pめっき層が非晶質(アモルファス)状態から結晶質状態(結晶質Ni−P層)に変化したためと考えられる。このことは、次に述べる残留応力の測定結果からわかる。   Thus, when the Ni-P plating layer is heated to a certain temperature or more, the hardness is abruptly changed because the structure of the Ni-P plating layer is changed. Specifically, it is considered that the Ni-P plating layer changed from an amorphous state to a crystalline state (crystalline Ni-P layer). This can be understood from the measurement result of the residual stress described below.

(3)被覆層の結晶性と残留応力
加熱前のNi−Pめっき層および200℃で加熱後のNi−Pめっき層の表面を上述したようにX線を用いて測定したところ、X線回折ピークはブロードであり、Ni−Pめっき層は共に非晶質状態であることがわかった。これらのことを示すNi−Pめっき層のX線回折像を図4に示した。一方、350℃、400℃および450℃で加熱したNi−Pめっき層の場合、明確なX線回折ピークが現れ、Ni−Pめっき層は共に結晶質状態であることがわかった。特に、400℃以上で加熱した場合、NiとNiPの強い回折ピークが観られた。
(3) Crystallinity and residual stress of the coating layer When the surfaces of the Ni-P plating layer before heating and the Ni-P plating layer after heating at 200 ° C. were measured using X-rays as described above, X-ray diffraction The peak was broad, and it was found that both the Ni-P plating layers were in an amorphous state. An X-ray diffraction image of the Ni—P plating layer showing these is shown in FIG. On the other hand, in the case of the Ni—P plating layer heated at 350 ° C., 400 ° C., and 450 ° C., a clear X-ray diffraction peak appeared, and it was found that both the Ni—P plating layers were in a crystalline state. In particular, when heated at 400 ° C. or higher, strong diffraction peaks of Ni and Ni 3 P were observed.

そして図3から明らかなように、これらNi−Pめっき層の表面には900〜1200MPaもの圧縮残留応力が生じており、加熱温度に比例して圧縮残留応力が大きくなることもわかった。例えば、Ni−Pめっき層を400℃で加熱した場合、1017(MPa)という高い圧縮残留応力が生じていた。なお、X線回折ピークがブロードなNi−Pめっき層の表面の残留応力は、上述した方法では正確に評価できなかった。そこで参考として、加熱前のNi−Pめっき層の表面の残留応力をBrenner Senderoff のContracto Meter型電着応力計により応力測定したところ、引張残留応力状態(参考値:12MPa)であることがわかった(参考文献:A.Brenner and S.Senderoff ; plating, 36, 810, (1949))。   As is apparent from FIG. 3, a compressive residual stress of 900 to 1200 MPa is generated on the surface of these Ni—P plating layers, and it was also found that the compressive residual stress increases in proportion to the heating temperature. For example, when the Ni—P plating layer was heated at 400 ° C., a high compressive residual stress of 1017 (MPa) was generated. The residual stress on the surface of the Ni—P plating layer having a broad X-ray diffraction peak could not be accurately evaluated by the above-described method. Therefore, as a reference, when the residual stress on the surface of the Ni-P plating layer before heating was measured with a Brenner Senderoff Contracto Meter type electrodeposition stress meter, it was found to be a tensile residual stress state (reference value: 12 MPa). (Reference: A. Brenner and S. Senderoff; plating, 36, 810, (1949)).

《観察》
(1)基材No.11と基材No.C3(A1050)のアルミニウム合金基材からなる10×70×1mmの板状の基体に、上述した方法により無電解ニッケルリンめっきを施した。これら試験片の外観写真を図5Aおよび図5Bにそれぞれ示した。いずれの試験片も、めっき後に加熱はしていない。
<< Observation >>
(1) Substrate No. 11 and base No. Electroless nickel phosphorous plating was performed on a 10 × 70 × 1 mm plate-like substrate made of a C3 (A1050) aluminum alloy substrate by the method described above. The appearance photographs of these test pieces are shown in FIGS. 5A and 5B, respectively. None of the test pieces were heated after plating.

(2)図5Aから明らかなように、Feを含有する基材No.11の試験片の場合、めっき表面に剥離、膨れ等がなく、良好に密着した均一的なNi−Pめっき層が形成されることがわかった。 (2) As is apparent from FIG. In the case of No. 11 test piece, it was found that a uniform Ni—P plating layer having good adhesion was formed without peeling or swelling on the plating surface.

一方、図5Bから明らかなように、Feを実質的に含有しない基材No.C3の試験片の場合、めっき表面に膨れ等が生じて、Ni−Pめっき層は密着不良となった。   On the other hand, as is clear from FIG. In the case of the C3 test piece, swelling or the like occurred on the plating surface, and the Ni-P plating layer had poor adhesion.

このようにNi−Pめっき層の密着性に相違が生じたのは、基材の成分組成が異なるためと考えられる。基材No.11はFeを5%程度含有するが、基材No.C3は工業用純アルミニウムであり、不純物であるFeを実質的に含有しない(Fe:0.40%以下/JIS)。   The difference in the adhesion of the Ni-P plating layer is considered to be because the component composition of the base material is different. Base No. 11 contains about 5% of Fe. C3 is industrial pure aluminum and does not substantially contain Fe as an impurity (Fe: 0.40% or less / JIS).

基材No.11からなる試験片の場合、清浄工程および活性化工程によりFeが表面に現れ、その表面が触媒を兼ねることにより、密着性に優れたNi−Pめっき層が形成されたと考えられる。逆に、基材No.C3からなる試験片の場合、清浄工程および活性化工程後もFeが表面に現れず、基材自体が触媒作用を果たすことがなかったため、Ni−Pめっき層の密着不良が生じたと考えられる。従って、活性化工程を経る場合、触媒活性を有するFe、Ni、Pd、Mn、Coなどを含むアルミニウム合金を基体に用いると、密着性に優れた被覆層を有する耐摩耗性部材が得られるといえる。   Base No. In the case of the test piece consisting of 11, it appears that Fe appeared on the surface by the cleaning process and the activation process, and the Ni-P plating layer having excellent adhesion was formed by the surface also serving as a catalyst. On the contrary, the base material No. In the case of the test piece made of C3, Fe did not appear on the surface even after the cleaning step and the activation step, and the base material itself did not perform a catalytic action, so it is considered that the adhesion failure of the Ni—P plating layer occurred. Therefore, when an activation process is performed, if an aluminum alloy containing catalytically active Fe, Ni, Pd, Mn, Co, or the like is used for the substrate, a wear-resistant member having a coating layer with excellent adhesion can be obtained. I can say that.

《耐摩耗性》
アルミニウム合金基体上に形成したNi−Pめっき層の耐摩耗性を評価するため、表1に示す基材No.11を用いて、表2に示す3種の試験片を用意した。これら試験片をボールオンディスク試験に供した。なお、ボールオンディスク試験は、試験片の評価面(摺動面)に一定の垂直荷重5Nを印加したボール(JIS SUJ2)を接触させたまま、その試験片を回転させることにより行った。この際、ボールに対する試験片の摺動速度は20cm/sとし、摺動距離は600mとした。また、この試験は無潤滑下の室温大気中で行った。
《Abrasion resistance》
In order to evaluate the wear resistance of the Ni-P plating layer formed on the aluminum alloy substrate, the base material No. 1 shown in Table 1 was used. 11 were used to prepare three types of test pieces shown in Table 2. These test pieces were subjected to a ball-on-disk test. The ball-on-disk test was performed by rotating the test piece while keeping a ball (JIS SUJ2) applied with a constant vertical load of 5 N in contact with the evaluation surface (sliding surface) of the test piece. At this time, the sliding speed of the test piece with respect to the ball was 20 cm / s, and the sliding distance was 600 m. This test was conducted in a room temperature atmosphere without lubrication.

この試験後の各試験片の表面を表面粗さ計で計測して求めた摩耗痕深さを表2に併せて示した。また、試験後の各試験片の摩耗痕の断面形状を図6A〜図6Cに示した。なお、ボールオンディスク試験前のNi−Pめっき層の厚さは10μmであった。   The wear scar depth obtained by measuring the surface of each test piece after this test with a surface roughness meter is also shown in Table 2. Moreover, the cross-sectional shape of the abrasion trace of each test piece after a test was shown to FIG. 6A-FIG. 6C. The thickness of the Ni—P plating layer before the ball-on-disk test was 10 μm.

これらからも明らかなように、十分な残留硬さを有する基体上に高温処理されたNi−Pめっき層からなる被覆層を有する試験片No.1は、殆ど摩耗することなく、高い耐摩耗性を発現することが確認できた。逆に、それ以外の試験片では、基体側まで摩耗が深く進行していた。以上のことから、本発明に属する基体および被覆層からなる耐摩耗性部材は、アルミニウム合金からなる基体の優れた残留硬さと、Ni−Pめっき層の加熱硬化特性が相乗的に作用することにより、優れた耐摩耗性が発揮されることがわかった。   As is clear from these, test pieces No. 1 having a coating layer made of a Ni-P plating layer that was processed at a high temperature on a substrate having sufficient residual hardness. It was confirmed that No. 1 exhibited high wear resistance with almost no wear. On the other hand, in the other test pieces, the wear progressed deeply to the substrate side. From the above, the wear-resistant member composed of the base body and the coating layer belonging to the present invention has a synergistic effect of the excellent residual hardness of the base body made of an aluminum alloy and the heat-hardening characteristics of the Ni-P plating layer. It was found that excellent wear resistance was exhibited.

《基材の製造》
上述した基体に好適なアルミニウム合金(基材)は、例えば、次のようにして得られる。表1に示す組成のアルミニウム合金の溶湯を調製した(溶湯調製工程)。この合金溶湯を真空雰囲気中に噴霧してエアアトマイズ粉末(凝固体)を得た(凝固工程)。得られたエアアトマイズ粉末の粒子(アトマイズ粒子)を分級して粒径:150μm以下のアトマイズ粉末を用意した。ちなみに、エアアトマイズにより得られる粉末粒子のサイズと冷却速度の関係は公知である。これにより、上記アトマイズ粉末は10℃/秒以上の冷却速度で急冷凝固した粒子からなるといえる。
<Manufacture of base material>
An aluminum alloy (base material) suitable for the above-described substrate is obtained, for example, as follows. A molten aluminum alloy having the composition shown in Table 1 was prepared (melt preparation step). This molten alloy was sprayed in a vacuum atmosphere to obtain an air atomized powder (solidified body) (solidification step). The obtained air atomized powder particles (atomized particles) were classified to prepare atomized powder having a particle size of 150 μm or less. Incidentally, the relationship between the size of the powder particles obtained by air atomization and the cooling rate is known. Thereby, it can be said that the atomized powder consists of particles rapidly solidified at a cooling rate of 10 4 ° C / second or more.

アトマイズ粉末を冷間静水等方圧プレス成形(CIP)して、φ40mm×40mm、相対密度85%の押出ビレット(原素材)を得た。   The atomized powder was cold isostatically pressed (CIP) to obtain an extruded billet (raw material) having a diameter of 40 mm × 40 mm and a relative density of 85%.

この押出ビレットを押出成形機のコンテナ(図略)内に装填した。そして、そのコンテナに設けた加熱装置で430℃に加熱した押出ビレットを、押出成形して、φ12mm×400mmの(中実)棒材(加工材)を得た(熱間塑性加工/加工工程)。このときの押出比(原素材の断面積/加工材の断面積)は11.1とした。こうして得られたアルミニウム合金の棒材から採取した試料を用いて、以下の測定等を行った。   This extruded billet was loaded into a container (not shown) of the extruder. And the extrusion billet heated at 430 degreeC with the heating apparatus provided in the container was extrusion-molded, and obtained a (solid) bar (working material) of φ12 mm × 400 mm (hot plastic working / working process) . The extrusion ratio (cross-sectional area of the raw material / cross-sectional area of the processed material) at this time was 11.1. The following measurements were performed using samples collected from the aluminum alloy bar thus obtained.

《測定》
(1)強度および延性
各試料からから切り出した試験片を用いて引張試験を行い、室温における強度および延性と、300℃(予熱なし)における強度を測定した。その結果を表1に併せて示した。なお、引張試験はJIS Z2241に沿って行い、表1に示した強度は破断強さであり、延性は試験開始から破断時までにおける標点間距離の延び率である。
<Measurement>
(1) Strength and ductility A tensile test was performed using a test piece cut out from each sample, and the strength and ductility at room temperature and the strength at 300 ° C. (no preheating) were measured. The results are also shown in Table 1. The tensile test is performed in accordance with JIS Z2241, the strength shown in Table 1 is the breaking strength, and the ductility is the rate of extension of the distance between the gauge points from the start of the test to the time of breaking.

(2)残留硬さ(耐軟化性)の測定
各試料の残留硬さ(各試料を高温加熱した後の室温硬さ)も測定した。具体的には、400℃の大気雰囲気中に10時間保持した後、室温状態に戻した各試料のビッカース硬さを測定した。ビッカース硬さの測定は、ビッカース試験機を用いて、荷重0.98N、保持時間20sとして室温環境下で行った。
(2) Measurement of residual hardness (softening resistance) The residual hardness of each sample (room temperature hardness after heating each sample at a high temperature) was also measured. Specifically, the Vickers hardness of each sample returned to room temperature after being held in an air atmosphere at 400 ° C. for 10 hours was measured. The measurement of Vickers hardness was performed in a room temperature environment using a Vickers tester with a load of 0.98 N and a holding time of 20 s.

《基材の評価》
表1から明らかなように、適量のFe等を含有するアルミニウム合金は、いずれも、室温状態における初期特性に優れるのみならず、高温特性にも優れている。特にFe量が増加するほど高温強度も増加する傾向にある。また、Zr量またはTi量が適量なほど、高温強度や耐軟化性に優れ、400℃に加熱した後でも十分な残留硬さを維持していた。
<< Evaluation of substrate >>
As is apparent from Table 1, any aluminum alloy containing an appropriate amount of Fe or the like is excellent not only in initial characteristics at room temperature but also in high temperature characteristics. In particular, the high temperature strength tends to increase as the amount of Fe increases. Further, as the Zr amount or Ti amount was appropriate, the high temperature strength and softening resistance were excellent, and sufficient residual hardness was maintained even after heating to 400 ° C.

Claims (13)

アルミニウム合金からなる基体と、
該基体の少なくとも一部の表面を被覆する被覆層と、
からなるアルミニウム合金製耐摩耗性部材であって、
前記アルミニウム合金は、400℃の大気圧雰囲気中に10時間保持した後に室温状態で測定した残留硬さが120Hv以上あり、
前記被覆層は、ニッケル(Ni)とリン化ニッケル(NiP)からなる結晶質Ni−P層からなること、
を特徴とするアルミニウム合金製耐摩耗性部材。
A substrate made of an aluminum alloy;
A coating layer covering at least a part of the surface of the substrate;
An aluminum alloy wear-resistant member comprising:
The aluminum alloy has a residual hardness of 120 Hv or more measured at room temperature after being kept in an atmospheric atmosphere at 400 ° C. for 10 hours,
The coating layer is made of a crystalline Ni-P layer made of nickel (Ni) and nickel phosphide (Ni 3 P);
An aluminum alloy wear-resistant member characterized by
前記結晶質Ni−P層は、全体を100質量%(以下単に「%」という)としたときに、Pを1〜13%含む請求項1に記載のアルミニウム合金製耐摩耗性部材。   2. The aluminum alloy wear-resistant member according to claim 1, wherein the crystalline Ni—P layer contains 1 to 13% of P when the whole is 100 mass% (hereinafter simply referred to as “%”). 前記結晶質Ni−P層は、無電解Ni−Pめっきにより前記基体の表面上に形成された非晶質なNi−Pめっき層を加熱してなる請求項1または2に記載のアルミニウム合金製耐摩耗性部材。   3. The aluminum alloy product according to claim 1, wherein the crystalline Ni—P layer is formed by heating an amorphous Ni—P plating layer formed on the surface of the substrate by electroless Ni—P plating. 4. Wear-resistant member. 前記結晶質Ni−P層には、圧縮残留応力が作用している請求項1〜3のいずれかに記載のアルミニウム合金製耐摩耗性部材。   The aluminum alloy wear-resistant member according to any one of claims 1 to 3, wherein compressive residual stress is applied to the crystalline Ni-P layer. 前記アルミニウム合金は、全体を100%としたときに、鉄(Fe)を1〜7%含む請求項1または4に記載のアルミニウム合金製耐摩耗性部材。   The aluminum alloy wear-resistant member according to claim 1 or 4, wherein the aluminum alloy contains 1 to 7% of iron (Fe) when the whole is 100%. 前記アルミニウム合金は、さらに、全体を100%としたときに、
ジルコニウム(Zr)を0.5〜3%と、
チタン(Ti)を0.5〜3%と、
を含む請求項5に記載のアルミニウム合金製耐摩耗性部材。
When the aluminum alloy is further 100% as a whole,
Zirconium (Zr) 0.5-3%,
Titanium (Ti) 0.5-3%,
An aluminum alloy wear-resistant member according to claim 5 comprising:
前記アルミニウム合金は、さらに、全体を100%としたときに、
マグネシウム(Mg)を0.5〜5%含む請求項6に記載のアルミニウム合金製耐摩耗性部材。
When the aluminum alloy is further 100% as a whole,
The aluminum alloy wear-resistant member according to claim 6 containing 0.5 to 5% of magnesium (Mg).
請求項1〜7のいずれかに記載のアルミニウム合金製耐摩耗性部材の製造方法であって、
前記基体表面に無電解Ni−Pめっき液を接触させて該基体表面にNi−Pめっき層を形成するめっき工程と、
該Ni−Pめっき層を加熱して該Ni−Pめっき層を結晶化させる結晶化工程と、
を備えることを特徴とするアルミニウム合金製耐摩耗性部材の製造方法。
A method for producing an aluminum alloy wear-resistant member according to any one of claims 1 to 7,
A plating step in which an electroless Ni—P plating solution is brought into contact with the substrate surface to form a Ni—P plating layer on the substrate surface;
A crystallization step of heating the Ni-P plating layer to crystallize the Ni-P plating layer;
A method for producing an aluminum alloy wear-resistant member, comprising:
前記めっき工程前に、前記基体表面に処理液を接触させて該基体表面を活性化する活性化工程または該基体表面にジンケート処理を施すジンケート工程からなる前処理工程を備える請求項8に記載のアルミニウム合金製耐摩耗性部材の製造方法。   9. The pretreatment step according to claim 8, further comprising an activation step of activating the substrate surface by bringing a treatment liquid into contact with the substrate surface or a zincate step of performing a zincate treatment on the substrate surface before the plating step. A method of manufacturing an aluminum alloy wear-resistant member. 前記前処理工程前に、前記基体表面を清浄する清浄工程を備える請求項9に記載のアルミニウム合金製耐摩耗性部材の製造方法。   The method for manufacturing an aluminum alloy wear-resistant member according to claim 9, further comprising a cleaning step of cleaning the surface of the substrate before the pretreatment step. 前記清浄工程は、前記基体をアルカリ性溶液と接触させて前記酸化皮膜を除去するエッチング工程と、
該エッチング工程後に生じたスマットを酸性溶液で除去するデスマット工程と、からなる請求項10に記載のアルミニウム合金製耐摩耗性部材の製造方法。
The cleaning step is an etching step of removing the oxide film by bringing the substrate into contact with an alkaline solution;
The method for producing an aluminum alloy wear-resistant member according to claim 10, comprising: a desmutting step of removing smut generated after the etching step with an acidic solution.
前記基体は、
合金溶湯を急冷凝固させた凝固体を得る凝固工程と、
該凝固体を加熱する熱処理工程と、
を経て得られたアルミニウム合金からなる請求項8〜11のいずれかに記載のアルミニウム合金製耐摩耗性部材の製造方法。
The substrate is
A solidification process for obtaining a solidified body obtained by rapidly solidifying a molten alloy;
A heat treatment step for heating the solidified body;
The manufacturing method of the wear-resistant member made from an aluminum alloy in any one of Claims 8-11 which consists of an aluminum alloy obtained through these.
前記熱処理工程は、前記凝固体に熱間で塑性加工を施す熱間加工工程である請求項12に記載のアルミニウム合金製耐摩耗性部材の製造方法。   The method of manufacturing an aluminum alloy wear-resistant member according to claim 12, wherein the heat treatment step is a hot working step of performing plastic working on the solidified body hot.
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