JP2013046044A - リソグラフィ装置及びデバイスの製造方法 - Google Patents

リソグラフィ装置及びデバイスの製造方法 Download PDF

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Publication number
JP2013046044A
JP2013046044A JP2011185253A JP2011185253A JP2013046044A JP 2013046044 A JP2013046044 A JP 2013046044A JP 2011185253 A JP2011185253 A JP 2011185253A JP 2011185253 A JP2011185253 A JP 2011185253A JP 2013046044 A JP2013046044 A JP 2013046044A
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JP
Japan
Prior art keywords
substrate
stage
optical system
pattern
stroke
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2011185253A
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English (en)
Japanese (ja)
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JP2013046044A5 (enExample
Inventor
Tadashi Kimura
正 木村
Nobushige Korenaga
伸茂 是永
Akira Morohashi
明 諸橋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
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Canon Inc
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Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2011185253A priority Critical patent/JP2013046044A/ja
Publication of JP2013046044A publication Critical patent/JP2013046044A/ja
Publication of JP2013046044A5 publication Critical patent/JP2013046044A5/ja
Pending legal-status Critical Current

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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2011185253A 2011-08-26 2011-08-26 リソグラフィ装置及びデバイスの製造方法 Pending JP2013046044A (ja)

Priority Applications (1)

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JP2011185253A JP2013046044A (ja) 2011-08-26 2011-08-26 リソグラフィ装置及びデバイスの製造方法

Applications Claiming Priority (1)

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JP2011185253A JP2013046044A (ja) 2011-08-26 2011-08-26 リソグラフィ装置及びデバイスの製造方法

Publications (2)

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JP2013046044A true JP2013046044A (ja) 2013-03-04
JP2013046044A5 JP2013046044A5 (enExample) 2014-09-25

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JP2011185253A Pending JP2013046044A (ja) 2011-08-26 2011-08-26 リソグラフィ装置及びデバイスの製造方法

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10515844B2 (en) 2017-11-08 2019-12-24 Samsung Electronics Co., Ltd. Substrate supporting and transferring apparatus, method of supporting and transferring substrate, and manufacturing method of display apparatus using the same
JP2025182656A (ja) * 2024-06-03 2025-12-15 キヤノン株式会社 露光装置、露光方法、及び物品の製造方法

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04129209A (ja) * 1990-09-20 1992-04-30 Canon Inc 露光装置
JPH04337621A (ja) * 1991-05-14 1992-11-25 Olympus Optical Co Ltd 位置決めステージ装置
JPH0774089A (ja) * 1994-03-14 1995-03-17 Nikon Corp 投影露光装置
JPH0786377A (ja) * 1993-09-10 1995-03-31 Canon Inc 位置決め装置
JP2000138279A (ja) * 1998-10-29 2000-05-16 Nikon Corp ステージ装置及び露光装置
JP2000331929A (ja) * 1999-04-19 2000-11-30 Asm Lithography Bv リソグラフィ投影装置と方法
JP2001168008A (ja) * 1999-12-09 2001-06-22 Canon Inc 基板ステージ装置および該基板ステージ装置を用いた半導体露光装置
WO2010131485A1 (ja) * 2009-05-15 2010-11-18 株式会社ニコン 移動体装置、用力伝達装置、及び露光装置、並びにデバイス製造方法

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04129209A (ja) * 1990-09-20 1992-04-30 Canon Inc 露光装置
JPH04337621A (ja) * 1991-05-14 1992-11-25 Olympus Optical Co Ltd 位置決めステージ装置
JPH0786377A (ja) * 1993-09-10 1995-03-31 Canon Inc 位置決め装置
JPH0774089A (ja) * 1994-03-14 1995-03-17 Nikon Corp 投影露光装置
JP2000138279A (ja) * 1998-10-29 2000-05-16 Nikon Corp ステージ装置及び露光装置
JP2000331929A (ja) * 1999-04-19 2000-11-30 Asm Lithography Bv リソグラフィ投影装置と方法
US6597433B1 (en) * 1999-04-19 2003-07-22 Asml Netherlands B.V. Multi-stage drive arrangements and their application in lithographic projection apparatuses
JP2001168008A (ja) * 1999-12-09 2001-06-22 Canon Inc 基板ステージ装置および該基板ステージ装置を用いた半導体露光装置
WO2010131485A1 (ja) * 2009-05-15 2010-11-18 株式会社ニコン 移動体装置、用力伝達装置、及び露光装置、並びにデバイス製造方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10515844B2 (en) 2017-11-08 2019-12-24 Samsung Electronics Co., Ltd. Substrate supporting and transferring apparatus, method of supporting and transferring substrate, and manufacturing method of display apparatus using the same
JP2025182656A (ja) * 2024-06-03 2025-12-15 キヤノン株式会社 露光装置、露光方法、及び物品の製造方法

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