JP2013041946A5 - - Google Patents

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Publication number
JP2013041946A5
JP2013041946A5 JP2011177251A JP2011177251A JP2013041946A5 JP 2013041946 A5 JP2013041946 A5 JP 2013041946A5 JP 2011177251 A JP2011177251 A JP 2011177251A JP 2011177251 A JP2011177251 A JP 2011177251A JP 2013041946 A5 JP2013041946 A5 JP 2013041946A5
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JP
Japan
Prior art keywords
openings
charged particle
substrate
particle beams
electrode plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2011177251A
Other languages
English (en)
Japanese (ja)
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JP5777445B2 (ja
JP2013041946A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2011177251A priority Critical patent/JP5777445B2/ja
Priority claimed from JP2011177251A external-priority patent/JP5777445B2/ja
Priority to US13/550,702 priority patent/US8686378B2/en
Priority to KR1020120085129A priority patent/KR20130018134A/ko
Publication of JP2013041946A publication Critical patent/JP2013041946A/ja
Publication of JP2013041946A5 publication Critical patent/JP2013041946A5/ja
Application granted granted Critical
Publication of JP5777445B2 publication Critical patent/JP5777445B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2011177251A 2011-08-12 2011-08-12 荷電粒子線描画装置及び物品の製造方法 Expired - Fee Related JP5777445B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2011177251A JP5777445B2 (ja) 2011-08-12 2011-08-12 荷電粒子線描画装置及び物品の製造方法
US13/550,702 US8686378B2 (en) 2011-08-12 2012-07-17 Charged particle beam drawing apparatus, and method of manufacturing article
KR1020120085129A KR20130018134A (ko) 2011-08-12 2012-08-03 하전 입자 빔 묘화 장치 및 물품 제조 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011177251A JP5777445B2 (ja) 2011-08-12 2011-08-12 荷電粒子線描画装置及び物品の製造方法

Publications (3)

Publication Number Publication Date
JP2013041946A JP2013041946A (ja) 2013-02-28
JP2013041946A5 true JP2013041946A5 (https=) 2014-09-25
JP5777445B2 JP5777445B2 (ja) 2015-09-09

Family

ID=47677740

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011177251A Expired - Fee Related JP5777445B2 (ja) 2011-08-12 2011-08-12 荷電粒子線描画装置及び物品の製造方法

Country Status (3)

Country Link
US (1) US8686378B2 (https=)
JP (1) JP5777445B2 (https=)
KR (1) KR20130018134A (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013008878A (ja) * 2011-06-24 2013-01-10 Canon Inc 描画装置、物品の製造方法、及び処理装置
JP2014140009A (ja) * 2012-12-19 2014-07-31 Canon Inc 描画装置、及び物品の製造方法
US9981293B2 (en) 2016-04-21 2018-05-29 Mapper Lithography Ip B.V. Method and system for the removal and/or avoidance of contamination in charged particle beam systems

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001144000A (ja) * 1999-11-16 2001-05-25 Nikon Corp 荷電粒子線転写装置及びそのクリーニング方法並びにそれを用いるデバイス製造方法
JP2001283756A (ja) * 2000-03-31 2001-10-12 Canon Inc 電子光学系アレイ、これを用いた荷電粒子線露光装置ならびにデバイス製造方法
WO2001075951A1 (en) * 2000-04-04 2001-10-11 Advantest Corporation Multibeam exposure apparatus comprising multiaxis electron lens and method for manufacturing semiconductor device
JP3728217B2 (ja) 2000-04-27 2005-12-21 キヤノン株式会社 荷電粒子線露光装置およびデバイス製造方法
WO2002013227A1 (en) * 2000-07-27 2002-02-14 Ebara Corporation Sheet beam test apparatus
JP4459568B2 (ja) * 2003-08-06 2010-04-28 キヤノン株式会社 マルチ荷電ビームレンズおよびそれを用いた荷電ビーム露光装置
JP5408674B2 (ja) * 2008-02-26 2014-02-05 マッパー・リソグラフィー・アイピー・ビー．ブイ． 投影レンズ構成体

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