JP2013021044A5 - - Google Patents

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Publication number
JP2013021044A5
JP2013021044A5 JP2011151520A JP2011151520A JP2013021044A5 JP 2013021044 A5 JP2013021044 A5 JP 2013021044A5 JP 2011151520 A JP2011151520 A JP 2011151520A JP 2011151520 A JP2011151520 A JP 2011151520A JP 2013021044 A5 JP2013021044 A5 JP 2013021044A5
Authority
JP
Japan
Prior art keywords
stage
drawing apparatus
substrate
shield
detector
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2011151520A
Other languages
English (en)
Japanese (ja)
Other versions
JP2013021044A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2011151520A priority Critical patent/JP2013021044A/ja
Priority claimed from JP2011151520A external-priority patent/JP2013021044A/ja
Priority to US13/534,044 priority patent/US8476607B2/en
Priority to TW101123886A priority patent/TW201303953A/zh
Priority to KR1020120073645A priority patent/KR20130006355A/ko
Publication of JP2013021044A publication Critical patent/JP2013021044A/ja
Publication of JP2013021044A5 publication Critical patent/JP2013021044A5/ja
Pending legal-status Critical Current

Links

JP2011151520A 2011-07-08 2011-07-08 荷電粒子線描画装置、および、物品の製造方法 Pending JP2013021044A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2011151520A JP2013021044A (ja) 2011-07-08 2011-07-08 荷電粒子線描画装置、および、物品の製造方法
US13/534,044 US8476607B2 (en) 2011-07-08 2012-06-27 Charged particle beam drawing apparatus and article manufacturing method
TW101123886A TW201303953A (zh) 2011-07-08 2012-07-03 帶電粒子束繪圖設備及物品製造方法
KR1020120073645A KR20130006355A (ko) 2011-07-08 2012-07-06 하전 입자 빔 묘화 장치 및 물품 제조 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011151520A JP2013021044A (ja) 2011-07-08 2011-07-08 荷電粒子線描画装置、および、物品の製造方法

Publications (2)

Publication Number Publication Date
JP2013021044A JP2013021044A (ja) 2013-01-31
JP2013021044A5 true JP2013021044A5 (cg-RX-API-DMAC7.html) 2014-08-21

Family

ID=47438864

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011151520A Pending JP2013021044A (ja) 2011-07-08 2011-07-08 荷電粒子線描画装置、および、物品の製造方法

Country Status (4)

Country Link
US (1) US8476607B2 (cg-RX-API-DMAC7.html)
JP (1) JP2013021044A (cg-RX-API-DMAC7.html)
KR (1) KR20130006355A (cg-RX-API-DMAC7.html)
TW (1) TW201303953A (cg-RX-API-DMAC7.html)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI674620B (zh) * 2013-12-13 2019-10-11 日商荏原製作所股份有限公司 真空磁性遮蔽容器的構造
US9952255B2 (en) * 2015-10-30 2018-04-24 Texas Instruments Incorporated Magnetically shielded probe card
CN106019854A (zh) * 2016-07-18 2016-10-12 无锡宏纳科技有限公司 图形可变的电子束光刻机
WO2019211123A1 (en) 2018-05-02 2019-11-07 Asml Netherlands B.V. E-beam apparatus
TWI886395B (zh) * 2021-06-14 2025-06-11 日商紐富來科技股份有限公司 多帶電粒子束描繪裝置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW466542B (en) * 1999-02-26 2001-12-01 Nippon Kogaku Kk A stage device and a method of manufacturing same, a position controlling method, an exposure device and a method of manufacturing same, and a device and a method of manufacturing same
JP2002184664A (ja) 2000-12-12 2002-06-28 Canon Inc 荷電粒子線露光装置及び方法並びにステージ装置
JP2004047170A (ja) * 2002-07-09 2004-02-12 Hitachi Ltd 電子線描画装置
JP2005268268A (ja) * 2004-03-16 2005-09-29 Canon Inc 電子ビーム露光装置

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