JP2013000658A - Treatment method of wastewater containing hydrazine and chelate formation organic compound - Google Patents

Treatment method of wastewater containing hydrazine and chelate formation organic compound Download PDF

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JP2013000658A
JP2013000658A JP2011134221A JP2011134221A JP2013000658A JP 2013000658 A JP2013000658 A JP 2013000658A JP 2011134221 A JP2011134221 A JP 2011134221A JP 2011134221 A JP2011134221 A JP 2011134221A JP 2013000658 A JP2013000658 A JP 2013000658A
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hydrazine
water
organic compound
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homogeneous catalyst
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JP5776357B2 (en
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Toshiji Nakahara
敏次 中原
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Kurita Water Industries Ltd
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Abstract

PROBLEM TO BE SOLVED: To provide a treatment method capable of treating wastewater containing hydrazine and a chelate formation organic compound stably and efficiently.SOLUTION: A predetermined amount of the wastewater W is filled in a reaction tank 1, then air as oxygen-containing gas is sent from a diffuser tube 4 arranged on a bottom part of the reaction tank 1 by a blower 3, and a homogeneous catalyst is added from a supply means 2 of the homogeneous catalyst (a first oxidation treatment process). Then, the wastewater W is added to primary treated water W1 in the first oxidation treatment process to prepare treated raw water W2. After that, the air as the oxygen-containing gas is sent from the diffuser tube 4 arranged on the bottom part of the reaction tank 1 by the blower 3, and the homogeneous catalyst is added from the supply means 2 of the homogeneous catalyst (a second oxidation treatment process). Thereby, the hydrazine in the treated raw water W2 is oxidatively-degraded.

Description

本発明は、ヒドラジンとキレート形成有機化合物を含む排水の処理方法に関する。特にヒドラジンとキレート形成有機化合物を含む排水を、均一系触媒により安定的にかつ効率良く処理することの可能なヒドラジンとキレート形成有機化合物を含む排水の処理方法に関する。   The present invention relates to a method for treating waste water containing hydrazine and a chelate-forming organic compound. In particular, the present invention relates to a method for treating wastewater containing hydrazine and a chelate-forming organic compound capable of stably and efficiently treating wastewater containing hydrazine and a chelate-forming organic compound with a homogeneous catalyst.

ヒドラジンを含有する排水の処理方法として、次亜塩素酸ナトリウムなどの酸化剤によりヒドラジンを酸化分解する方法、酸素含有ガスで曝気処理してヒドラジンを酸化分解する方法、活性炭に通水してヒドラジンを除去する方法などが提案されている。曝気処理方法として、例えば、特許文献1には、効率よくヒドラジン類を除去するとともに、二次公害を発生させることのないヒドラジン類含有水の処理方法として、ヒドラジン類を含む水を酸化槽において銅化合物の存在下に空気と接触させ、次いでろ過により固液分離を行い、処理水は系外へ排出する一方、固形分は再度酸化槽に返送するヒドラジン類含有水の処理方法が提案されている。   As a method of treating wastewater containing hydrazine, oxidative decomposition of hydrazine with an oxidizing agent such as sodium hypochlorite, oxidative decomposition of hydrazine by aeration treatment with an oxygen-containing gas, hydrazine is passed through activated carbon. A removal method has been proposed. As an aeration treatment method, for example, in Patent Document 1, as a method for treating hydrazine-containing water that efficiently removes hydrazines and does not generate secondary pollution, water containing hydrazines is treated with copper in an oxidation tank. There has been proposed a method for treating hydrazine-containing water in which it is brought into contact with air in the presence of the compound and then subjected to solid-liquid separation by filtration, and the treated water is discharged out of the system while the solid content is returned to the oxidation tank again. .

また、特許文献2には、排水中のヒドラジンをイオン交換樹脂によって除去する前処理工程として有用なヒドラジン含有排水の処理方法として、ヒドラジン含有排水中に、金属銅又は銅塩溶液の存在下で散気させてヒドラジンを分解除去する方法が提案されている。   Patent Document 2 discloses a method for treating hydrazine-containing wastewater that is useful as a pretreatment step for removing hydrazine in wastewater with an ion exchange resin, and is dispersed in the presence of metallic copper or a copper salt solution in the hydrazine-containing wastewater. There has been proposed a method for decomposing and removing hydrazine.

しかしながら、特許文献1及び特許文献2に記載された方法は、ヒドラジンに加えてキレート形成有機化合物を含む排水に適用すると、ヒドラジンの酸化分解が十分に進行しないことが分かった。   However, when the methods described in Patent Document 1 and Patent Document 2 are applied to wastewater containing a chelate-forming organic compound in addition to hydrazine, it has been found that oxidative decomposition of hydrazine does not proceed sufficiently.

ヒドラジンとキレート形成有機化合物を含む排水は、半導体製造工程排水、ボイラーブロー水、無機化学工業排水などとして排出されるので、キレート形成有機化合物が共存する場合でも、酸素含有ガスによりヒドラジンを効果的に酸化分解し得る排水の処理方法が必要である。   Wastewater containing hydrazine and chelate-forming organic compounds is discharged as semiconductor process wastewater, boiler blow water, inorganic chemical industry wastewater, etc., so even if chelate-forming organic compounds coexist, hydrazine is effectively removed by oxygen-containing gas. There is a need for a wastewater treatment method that can be oxidatively decomposed.

そこで、このような課題を解決する技術として、特許文献3には、ヒドラジンとキレート形成有機化合物を含む排水に、金属イオン10〜1000mg/Lを添加し、空気の吹込みなどによる酸素含有ガスでヒドラジンを酸化分解する方法が開示されている。   Therefore, as a technique for solving such a problem, Patent Document 3 discloses that oxygen ions containing 10 to 1000 mg / L of metal ions are added to waste water containing hydrazine and a chelate-forming organic compound, and oxygen-containing gas such as air is blown. A method for oxidative degradation of hydrazine is disclosed.

特開昭56−136695号公報JP-A-56-136695 特開昭57−27913号公報JP 57-27913 A 特開2003−39083号公報JP 2003-39083 A

しかしながら、特許文献3に記載された方法でヒドラジンとキレート形成有機化合物を含む排水に適用した場合には、まず、高濃度にヒドジンを含有する排水に金属イオンを添加すると、条件によっては金属イオンが還元されて金属状態となって触媒活性が低下し、極端な場合には触媒としての機能が失活する場合がある、という問題点がある。また、ヒドラジンの酸化分解は発熱反応であり、高濃度のヒドラジンを処理する場合、ヒドラジンの濃度がある程度低くなるまでは液温が上昇する一方、ヒドラジンの濃度が低くなると反応熱による温度上昇よりも空気の吹き込みによる温度の低下のほうが大きくなり、液温が低下することになり、温度傾向が一定でないため反応が安定せず、温度の監視や冷却装置が必要となる、という問題点がある。   However, when applied to wastewater containing hydrazine and a chelate-forming organic compound by the method described in Patent Document 3, first, when metal ions are added to wastewater containing hydrazine at a high concentration, depending on conditions, metal ions may be There is a problem that the catalytic activity is reduced due to reduction and the catalytic activity is lowered. In an extreme case, the function as a catalyst may be deactivated. In addition, oxidative decomposition of hydrazine is an exothermic reaction. When a high concentration of hydrazine is treated, the liquid temperature rises until the hydrazine concentration is lowered to some extent, whereas when the hydrazine concentration is lowered, the temperature rises due to reaction heat. There is a problem that the temperature drop due to the blowing of air becomes larger and the liquid temperature is lowered, the temperature tendency is not constant, the reaction is not stable, and temperature monitoring and a cooling device are required.

本発明は、上記課題に鑑みてなされたものであり、ヒドラジンとキレート形成有機化合物を含む排水を、安定的にかつ効率良く処理することの可能なヒドラジンとキレート形成有機化合物を含む排水の処理方法を提供することを目的とする。   The present invention has been made in view of the above problems, and a method for treating wastewater containing hydrazine and a chelate-forming organic compound capable of stably and efficiently treating wastewater containing hydrazine and a chelate-forming organic compound. The purpose is to provide.

上記課題を解決するために、本発明は、ヒドラジンとキレート形成有機化合物を含み、ヒドラジン濃度が3000mg/Lを超える排水の処理方法であって、該排水に均一系触媒を添加し、酸素含有ガスでヒドラジンを酸化分解することにより排水中のヒドラジン濃度を低減する第一の酸化処理工程と、前記第一の酸化処理工程の一次処理水に前記排水を添加して処理原水を調製し、この処理原水に均一系触媒を添加し、酸素含有ガスでヒドラジンを酸化分解して処理水を得る第二の酸化処理工程とを有することを特徴とするヒドラジンとキレート形成有機化合物を含む排水の処理方法を提供する(発明1)。   In order to solve the above-mentioned problems, the present invention is a method for treating wastewater containing hydrazine and a chelate-forming organic compound and having a hydrazine concentration exceeding 3000 mg / L, comprising adding a homogeneous catalyst to the wastewater, The first oxidation treatment step for reducing the hydrazine concentration in the wastewater by oxidatively decomposing hydrazine in the step, and preparing the treated raw water by adding the wastewater to the primary treatment water of the first oxidation treatment step, this treatment A method for treating wastewater containing hydrazine and a chelate-forming organic compound, comprising: adding a homogeneous catalyst to raw water and oxidizing and decomposing hydrazine with an oxygen-containing gas to obtain treated water. Provided (Invention 1)

かかる発明(発明1)によれば、第一の酸化処理工程において、ヒドラジン濃度が3000mg/Lを超えるヒドラジンとキレート形成有機化合物を含む排水に、硫酸銅などの均一系触媒を添加して曝気処理することにより、ある程度の濃度にまでヒドラジンを酸化分解する。次いで、第二の酸化処理工程により、このヒドラジンの濃度がある程度低下した一次処理水に前記排水を添加してヒドラジンの濃度を制御して処理原水を調製し、この処理原水にさらに均一系触媒を添加して曝気処理することにより、温度上昇を抑制してヒドラジンを安定的にかつ効率良く処理して処理水を得ることができる。   According to this invention (Invention 1), in the first oxidation treatment step, a homogeneous catalyst such as copper sulfate is added to the waste water containing hydrazine having a hydrazine concentration exceeding 3000 mg / L and a chelate-forming organic compound, and aerated. By doing so, hydrazine is oxidatively decomposed to a certain concentration. Next, in the second oxidation treatment step, the waste water is added to the primary treated water in which the concentration of hydrazine has been reduced to some extent to prepare a treated raw water by controlling the concentration of hydrazine, and a homogeneous catalyst is further added to the treated raw water. By adding and aeration treatment, it is possible to obtain a treated water by stably and efficiently treating hydrazine while suppressing temperature rise.

上記発明(発明1)においては、前記処理原水中のヒドラジン濃度が3000mg/L以下であるのが好ましい(発明2)。   In the said invention (invention 1), it is preferable that the hydrazine density | concentration in the said processing raw water is 3000 mg / L or less (invention 2).

かかる発明(発明2)によれば、ヒドラジン濃度が3000mg/L以下の処理原水に均一系触媒を添加して曝気処理することにより、温度上昇を抑制してさらに効率よくヒドラジンを安定的に酸化分解することができる。   According to this invention (Invention 2), by adding a homogeneous catalyst to the treated raw water having a hydrazine concentration of 3000 mg / L or less and subjecting to aeration treatment, the temperature rise is suppressed and hydrazine is stably and efficiently decomposed. can do.

上記発明(発明1,2)においては、前記一次処理水への前記排水の添加を前記均一系触媒による酸化反応の進行に応じて設定するのが好ましい(発明3)。   In the said invention (invention 1 and 2), it is preferable to set the addition of the said waste_water | drain to the said primary treated water according to the progress of the oxidation reaction by the said homogeneous catalyst (invention 3).

かかる発明(発明3)によれば、前記第一の酸化処理工程でのヒドラジンの酸化分解による残留ヒドラジン濃度に応じて、一次処理水への排水の添加量を制御することで、所定のヒドラジン濃度以下の原水を処理することができるので、ヒドラジンを安定的に酸化分解することができる。   According to this invention (invention 3), by controlling the amount of wastewater added to the primary treated water according to the residual hydrazine concentration by oxidative decomposition of hydrazine in the first oxidation treatment step, a predetermined hydrazine concentration Since the following raw water can be treated, hydrazine can be stably oxidatively decomposed.

本発明のヒドラジンとキレート形成有機化合物を含む排水の処理方法によれば、第一の酸化処理工程において、ヒドラジン濃度が3000mg/Lを超えるヒドラジンとキレート形成有機化合物を含む排水に、硫酸銅などの均一系触媒を添加して曝気処理することにより、ある程度の濃度にまでヒドラジンを酸化分解する。次いで、第二の酸化処理工程により、このヒドラジンの濃度がある程度低下した一次処理水に前記排水を添加してヒドラジンの濃度を制御して処理原水を調製し、この処理原水にさらに均一系触媒を添加して曝気処理することにより、温度上昇を抑制してヒドラジンを安定的にかつ効率良く処理して処理水を得ることができる。   According to the method for treating wastewater containing hydrazine and a chelate-forming organic compound of the present invention, in the first oxidation treatment step, wastewater containing hydrazine and a chelate-forming organic compound having a hydrazine concentration exceeding 3000 mg / L is added to copper sulfate or the like. By adding a homogeneous catalyst and subjecting to aeration, hydrazine is oxidatively decomposed to a certain level. Next, in the second oxidation treatment step, the waste water is added to the primary treated water in which the concentration of hydrazine has been reduced to some extent to prepare a treated raw water by controlling the concentration of hydrazine, and a homogeneous catalyst is further added to the treated raw water. By adding and aeration treatment, it is possible to obtain a treated water by stably and efficiently treating hydrazine while suppressing temperature rise.

このような効果が得られるのは以下のような理由による。すなわち、空気等の酸素含有ガスでヒドラジンを酸化分解する場合、ヒドラジンの処理を効率良く行うには、銅イオン等を放出する均一系触媒が使用することが多い。しかしながら、均一系触媒を高濃度にヒドラジンを含有する排水に添加すると、均一系触媒に起因する金属イオンが還元されて金属となり、触媒活性が大きく低下する。この結果、下記式(1)に示すヒドラジンの酸化分解反応が進行せず、ヒドラジン処理が不良となると考えられる。
+O → N+2HO ΔH=−622kJ/mol・・・(1)
(触媒)
The reason why such an effect is obtained is as follows. That is, when hydrazine is oxidatively decomposed with an oxygen-containing gas such as air, a homogeneous catalyst that releases copper ions and the like is often used to efficiently treat hydrazine. However, when a homogeneous catalyst is added to wastewater containing hydrazine at a high concentration, metal ions resulting from the homogeneous catalyst are reduced to become metal, and the catalytic activity is greatly reduced. As a result, the hydrazine oxidative decomposition reaction represented by the following formula (1) does not proceed, and the hydrazine treatment is considered to be poor.
N 2 H 4 + O 2 → N 2 + 2H 2 O ΔH = −622 kJ / mol (1)
(catalyst)

なお、上述したような処理の後は、残留する酸化剤を還元剤で還元処理し、得られた処理水から金属イオンを除去したのち、BOD成分を生物処理等で除去することにより、ヒドラジンとキレート形成有機化合物を含む排水から有害物を除去して良好な水質の処理水を得ることができる。   After the treatment as described above, the remaining oxidizing agent is reduced with a reducing agent, and after removing metal ions from the obtained treated water, the BOD component is removed by biological treatment, etc. By removing harmful substances from the waste water containing the chelate-forming organic compound, treated water with good water quality can be obtained.

本発明の一実施形態に係るヒドラジンとキレート形成有機化合物を含む排水の処理方法を実施可能なシステムを示す系統図である。It is a systematic diagram which shows the system which can implement the processing method of the waste_water | drain containing the hydrazine and chelate formation organic compound which concern on one Embodiment of this invention.

以下、図1を参照して本実施形態のヒドラジンとキレート形成有機化合物を含む排水の処理方法について説明する。図1は、本発明の一実施形態に係るヒドラジンとキレート形成有機化合物を含む排水の処理方法を実施可能なシステムを示す系統図である。   Hereinafter, with reference to FIG. 1, the processing method of the waste_water | drain containing the hydrazine and chelate formation organic compound of this embodiment is demonstrated. FIG. 1 is a system diagram showing a system capable of implementing a method for treating wastewater containing hydrazine and a chelate-forming organic compound according to an embodiment of the present invention.

図1において、1はヒドラジンとキレート形成有機化合物を含む排水Wを導入するための反応槽であり、2は均一系触媒の供給手段である。そして、反応槽1の底部には、送風機3に接続した散気管4が設けられている。   In FIG. 1, 1 is a reaction tank for introducing waste water W containing hydrazine and a chelate-forming organic compound, and 2 is a homogeneous catalyst supply means. A diffuser pipe 4 connected to the blower 3 is provided at the bottom of the reaction tank 1.

上述したような構成の処理システムにおいて、排水Wとしては、3000mg/Lを超える高濃度でヒドラジンを含有するものである。ヒドラジンの濃度が3000mg/L以下では、本実施形態の方法による効果が十分に発揮できない。なお、キレート形成有機化合物に含有率については、1000〜20000mg/L含有するのが一般的である。また、排水WのpHは、高アルカリであるのが普通であり、例えばpH13以上である。   In the treatment system having the above-described configuration, the waste water W contains hydrazine at a high concentration exceeding 3000 mg / L. When the concentration of hydrazine is 3000 mg / L or less, the effect of the method of the present embodiment cannot be sufficiently exhibited. In addition, about a content rate to a chelate formation organic compound, it is common to contain 1000-20000 mg / L. Further, the pH of the waste water W is usually highly alkaline, for example, pH 13 or more.

また、本実施形態において、均一系触媒とは、反応系(水)に均一に分散するイオンを放出する酸化触媒であり、銅イオン、鉄イオン、コバルトイオン、ニッケルイオンなどを放出するものであり、これら金属の硫酸塩、塩酸塩などを用いることができる。具体的には、硫酸銅、塩化銅、硫酸ニッケル、塩化ニッケル等の水溶液を用いることができる。これらの中で、硫酸銅(銅イオン)は、ヒドラジンの酸化分解を顕著に速める効果を有するので特に好適に用いることができる。排水中にキレート形成有機化合物が存在するとき、銅イオンはキレート錯体を形成するので、高pHのアルカリ性であっても、水中に高濃度で存在することができる。   In this embodiment, the homogeneous catalyst is an oxidation catalyst that releases ions uniformly dispersed in the reaction system (water), and releases copper ions, iron ions, cobalt ions, nickel ions, and the like. Sulfates and hydrochlorides of these metals can be used. Specifically, an aqueous solution of copper sulfate, copper chloride, nickel sulfate, nickel chloride or the like can be used. Among these, copper sulfate (copper ions) can be particularly preferably used because it has an effect of remarkably accelerating the oxidative decomposition of hydrazine. When a chelate-forming organic compound is present in the waste water, the copper ions form a chelate complex, so even if it is alkaline at high pH, it can be present in water at a high concentration.

次に上述したようなシステム及び均一系触媒を用いて排水Wを処理する本実施形態の方法について以下説明する。   Next, the method of this embodiment which processes the waste_water | drain W using the above systems and a homogeneous catalyst is demonstrated below.

(第一の酸化処理工程)
まず、反応槽1に排水Wを所定量充填したら、必要に応じて硫酸などの酸を添加することでpHを9〜13、特に10〜12に調整する。排水WのpHが9未満であるか、あるいはpHが13を超えると、ヒドラジンの酸化分解速度が低下するおそれがあるため好ましくない。続いて、送風機3により反応槽1の底部に設けた散気管4から酸素含有ガスとしての空気を送って、均一系触媒の供給手段2から上述した均一系触媒(金属イオン)を添加する。具体的な操作としては、水溶性の金属塩又は金属塩の水溶液を添加し均一に混合する。これによりヒドラジンを酸化分解して、一次処理水W1とする。
(First oxidation treatment process)
First, when a predetermined amount of waste water W is filled in the reaction tank 1, the pH is adjusted to 9 to 13, particularly 10 to 12, by adding an acid such as sulfuric acid as necessary. If the pH of the waste water W is less than 9, or if the pH exceeds 13, it is not preferable because the oxidative decomposition rate of hydrazine may decrease. Subsequently, air as an oxygen-containing gas is sent from the air diffuser 4 provided at the bottom of the reaction vessel 1 by the blower 3, and the above-described homogeneous catalyst (metal ions) is added from the homogeneous catalyst supply means 2. As a specific operation, a water-soluble metal salt or an aqueous solution of a metal salt is added and mixed uniformly. As a result, hydrazine is oxidatively decomposed into primary treated water W1.

上記酸素含有ガス(空気)の吹き込み量は、排水1m当り1〜10m/分であることが好ましく、特に1.5〜5m/分であるのが好ましい。酸素含有ガスの吹き込み量が排水1m当り1m未満であると、均一系触媒と排水Wとの混合が均一に行われなくなるおそれがある一方、酸素含有ガス(空気)の吹き込み量が、排水1m当り10mを超えると、反応槽1の容積と酸素吹き込み動力が過大になり、酸素含有ガスと排水Wの気液接触効率が低下するおそれがある。 The blowing amount of the oxygen-containing gas (air) is preferably 1 to 10 m 3 / min per 1 m 3 of waste water, and particularly preferably 1.5 to 5 m 3 / min. When blowing of oxygen-containing gas is less than the waste water 1 m 3 per 1 m 3, while the mixing with the homogeneous catalyst and waste water W which may not be performed uniformly, blowing amount of oxygen-containing gas (air), drainage If it exceeds 10 m 3 per m 3 , the volume of the reaction tank 1 and the oxygen blowing power become excessive, and the gas-liquid contact efficiency between the oxygen-containing gas and the waste water W may be reduced.

均一系触媒の供給手段2からの均一系触媒の添加量は、排水Wに対して均一系触媒10〜300mg/L(金属イオン寒換算)とすればよい。上述したような第一の酸化処理工程により、ヒドラジンの濃度を100mg/L以下にまで低下させる。   The addition amount of the homogeneous catalyst from the homogeneous catalyst supply means 2 may be 10 to 300 mg / L of the homogeneous catalyst with respect to the waste water W (metal ion cold conversion). By the first oxidation treatment step as described above, the concentration of hydrazine is lowered to 100 mg / L or less.

上述したような第一の酸化処理工程により、一次処理水W1は排水Wに対して
20〜60℃程度温度上昇する。
By the first oxidation treatment step as described above, the temperature of the primary treated water W1 is increased by about 20 to 60 ° C. with respect to the waste water W.

(第二の酸化処理工程)
次に第一の酸化処理工程の一次処理水W1に排水Wを添加して処理原水W2を調製する。具体的には、排水Wのヒドラジン濃度と一次処理水W1のヒドラジン濃度とに応じて、処理原水W2のヒドラジン濃度が好ましくは3000mg/L以下、特に2000mg/L以下となるように排水Wを添加する。その後は前述した第一の酸化処理工程と同じ操作を繰り返せばよい。具体的には、処理原水W2に必要に応じて硫酸などの酸を添加し、続いて送風機3により反応槽1の底部に設けた散気管4から空気を送って、均一系触媒の供給手段2から上述した均一系触媒(金属イオン)を添加する。これにより処理原水W2中のヒドラジンを酸化分解する。
(Second oxidation process)
Next, the waste water W is added to the primary treated water W1 of the first oxidation treatment step to prepare the treated raw water W2. Specifically, according to the hydrazine concentration of the waste water W and the hydrazine concentration of the primary treated water W1, the waste water W is added so that the hydrazine concentration of the treated raw water W2 is preferably 3000 mg / L or less, particularly 2000 mg / L or less. To do. Thereafter, the same operation as the first oxidation treatment step described above may be repeated. Specifically, an acid such as sulfuric acid is added to the treated raw water W2 as necessary, and then air is sent from the air diffuser 4 provided at the bottom of the reaction tank 1 by the blower 3 to supply the homogeneous catalyst 2 To the above-mentioned homogeneous catalyst (metal ion). Thereby, the hydrazine in the treated raw water W2 is oxidatively decomposed.

上述したような第二の酸化処理工程の処理時間、すなわち処理原水W2の反応槽1における滞留時間は、目的とするヒドラジン除去量に応じて適宜選定することができるが、通常は0.1〜2.0時間であることが好ましく、特に0.4〜1.5時間であるのが好ましい。反応槽1での滞留時間が0.1時間未満であると、ヒドラジンの酸化分解が不十分となるおそれがある一方、2.0時間を超えてもそれ以上の効果の向上が得られずかえって処理効率が低下する。   The treatment time of the second oxidation treatment step as described above, that is, the residence time of the treated raw water W2 in the reaction tank 1 can be appropriately selected according to the target hydrazine removal amount. It is preferably 2.0 hours, particularly preferably 0.4 to 1.5 hours. If the residence time in the reaction tank 1 is less than 0.1 hour, the hydrazine may be insufficiently oxidized and decomposed, but if it exceeds 2.0 hours, no further improvement in the effect can be obtained. Processing efficiency decreases.

上述したような第二の酸化処理工程により、ヒドラジンの濃度を100mg/L以下にまで低下した処理水W3を排出することができる。また、この処理水W3は、処理原水W2に対して10℃以下の温度上昇であり、第一の酸化処理工程より大幅に低減されるという効果も奏する。   By the second oxidation treatment step as described above, the treated water W3 having a hydrazine concentration reduced to 100 mg / L or less can be discharged. Further, the treated water W3 has a temperature increase of 10 ° C. or less with respect to the treated raw water W2, and has an effect that it is significantly reduced compared to the first oxidation treatment step.

(後処理工程)
上述したようにしてヒドラジンを酸化分解した処理水W3は、例えば、その後残留するヒドラジンを、次亜塩素酸ナトリウム、過酸化水素などの酸化剤で酸化処理して除去した後、処理水W3をイオン交換樹脂、キレート樹脂などに接触させることで、処理水W3中の金属イオンを除去する。続いて、生物処理手段などにより、キレート形成有機化合物及びそれ以外のBOD成分を除去することで、良好な水質の処理水を得ることができる。
(Post-processing process)
The treated water W3 obtained by oxidizing and decomposing hydrazine as described above is, for example, obtained by removing the remaining hydrazine by oxidizing it with an oxidizing agent such as sodium hypochlorite and hydrogen peroxide, and then treating the treated water W3 with ions. Metal ions in the treated water W3 are removed by contacting with an exchange resin, a chelate resin, or the like. Subsequently, treated water with good water quality can be obtained by removing the chelate-forming organic compound and the other BOD components by means of biological treatment means or the like.

以上本実施形態のヒドラジンとキレート形成有機化合物を含む排水Wの処理方法について説明してきたが、本発明は前記実施形態に限定されず、種々の変形実施が可能である。   As mentioned above, although the processing method of the waste_water | drain W containing the hydrazine and chelate formation organic compound of this embodiment has been demonstrated, this invention is not limited to the said embodiment, A various deformation | transformation implementation is possible.

例えば、本実施形態においては、酸素含有ガスとして空気をそのまま用いたが、酸素富化空気を用いることもできる。また、酸素含有ガスの供給方法としては、散気管4による曝気に限らず、例えば、充填塔、濡れ壁塔、段塔、スプレー塔、スクラバー、気泡塔などを用いて、酸素含有ガスと金属イオンを添加した排水を接触させ、ヒドラジンを酸化分解することができる。   For example, in the present embodiment, air is used as it is as the oxygen-containing gas, but oxygen-enriched air can also be used. The method for supplying the oxygen-containing gas is not limited to aeration by the diffuser tube 4, and for example, using a packed tower, a wet wall tower, a plate tower, a spray tower, a scrubber, a bubble tower, etc. The hydrazine can be oxidatively decomposed by contacting the wastewater to which is added.

さらに、前記実施形態においては、回分式で処理を行ったが、連続式で処理することもできる。連続式の場合には、反応槽1を十分な反応時間(滞留時間)が確保できる容積とすればよい。   Furthermore, in the said embodiment, although it processed by the batch type, it can also process by a continuous type. In the case of the continuous type, the reaction tank 1 may be a volume capable of ensuring a sufficient reaction time (residence time).

以下の具体的実施例により本発明をさらに詳細に説明する。
〔比較例1〕
(第一の酸化処理工程)
ヒドラジン20000mg/Lとキレート形成有機化合物であるクエン酸12000mg/Lを含むpH13.7の半導体工場排水に、硫酸を加えてpHを約12に調整して排水Wとした。この硫酸を添加した排水の温度は56℃であった。次いで、この排水Wを20℃になるまで放置した後、反応槽1に130L供給し、送風機3により散気管4から排水W1Lに対して60L/hrで空気を吹き込み、空気曝気を行った。
The following specific examples further illustrate the present invention.
[Comparative Example 1]
(First oxidation treatment process)
Waste water W was prepared by adding sulfuric acid to pH 13.7 semiconductor factory waste water containing 20000 mg / L of hydrazine and 12000 mg / L of citric acid, which is a chelate-forming organic compound, to adjust the pH to about 12. The temperature of the wastewater to which this sulfuric acid was added was 56 ° C. Next, after leaving this waste water W to reach 20 ° C., 130 L was supplied to the reaction tank 1, and air was blown from the air diffuser 4 to the waste water W 1 L at 60 L / hr by the blower 3 to perform air aeration.

そして、空気曝気を継続しながら、反応槽1に硫酸銅溶液を銅イオン濃度が排水Wに対して200mg/Lとなるように添加し、ヒドラジン濃度の経時変化を測定し、ヒドラジン濃度が100mg/Lに低減するまでの時間を求めた。この結果、約10時間経過後にヒドラジン濃度が100mg/Lとなった。また、単位時間当たりのヒドラジン処理量を算出したところ1990mg/hrであり、液温上昇の最大値は30℃であった。   Then, while continuing air aeration, a copper sulfate solution was added to the reaction tank 1 so that the copper ion concentration was 200 mg / L with respect to the waste water W, the change in hydrazine concentration over time was measured, and the hydrazine concentration was 100 mg / L. The time to decrease to L was determined. As a result, the hydrazine concentration reached 100 mg / L after about 10 hours. Further, the amount of hydrazine treated per unit time was calculated to be 1990 mg / hr, and the maximum value of the increase in the liquid temperature was 30 ° C.

〔実施例1〜3〕
(第二の酸化処理工程)
比較例1で処理した処理液を一次処理水W1とし、比較例1と同じ条件で空気曝気を継続しながら、排水Wを一次処理水W1に対して、5容積%(実施例1)、10容積%(実施例2)及び15容積%(実施例3)それぞれ添加して処理原水W2とした。これらの処理原水W2のヒドラジン濃度(初期N)を測定した結果を表1に示す。
Examples 1 to 3
(Second oxidation process)
The treated liquid treated in Comparative Example 1 is used as the primary treated water W1, and while continuing aeration with air under the same conditions as in Comparative Example 1, the waste water W is 5% by volume (Example 1), 10% with respect to the primary treated water W1. Volume% (Example 2) and 15 volume% (Example 3) were respectively added to obtain treated raw water W2. Table 1 shows the results of measuring the hydrazine concentration (initial N 2 H 4 ) of these treated raw water W2.

次いで、この処理原水W2を20℃になるまで放置した後、空気曝気を継続しながら反応槽1に銅イオン濃度が排水Wに対して200mg/Lとなるように硫酸銅溶液を添加し、ヒドラジン濃度の経時変化を測定し、ヒドラジン濃度が100mg/Lに低減するまでの処理時間をそれぞれ求めた結果を表1に示す。また、単位時間当たりのヒドラジンの処理量(ΔN)を算出するとともには、液温上昇の最大値をそれぞれ計測した結果を表1にあわせて示す。 Next, after leaving this treated raw water W2 to 20 ° C., a copper sulfate solution is added to the reaction tank 1 so that the copper ion concentration is 200 mg / L with respect to the waste water W while continuing air aeration, and hydrazine is added. Table 1 shows the results of measuring the change with time of the concentration and determining the treatment time until the hydrazine concentration is reduced to 100 mg / L. Also, the processing amount of hydrazine per unit time to calculate the (ΔN 2 H 4) are shown in Table 1 The results of the maximum value of the liquid temperature rise were measured, respectively.

Figure 2013000658
Figure 2013000658

表1から明らかなとおり、ヒドラジン濃度を3000mg/L以下に制御した実施例1〜3では、ヒドラジン濃度が100mg/Lに低減するまでの処理時間が、比較例1と比較して大幅に短縮された。これは、銅イオンの還元が抑制されて、ヒドラジンの酸化分解反応が促進されたためであると考えられる。また、温度上昇も大幅に少なかった。これにより、冷却装置が不要となり、樹脂ライニング等の適用が可能となり、材質選定が容易になる、という効果を奏する。これらの効果は、処理原水W2の初期N濃度が2000mg/L前後の実施例1、2で良好であり、特に初期N濃度が2000mg/L以下の実施例1で顕著であった。 As is apparent from Table 1, in Examples 1 to 3 in which the hydrazine concentration was controlled to 3000 mg / L or less, the processing time until the hydrazine concentration was reduced to 100 mg / L was significantly shortened compared to Comparative Example 1. It was. This is considered to be because the reduction of copper ions was suppressed and the oxidative decomposition reaction of hydrazine was promoted. Also, the temperature rise was significantly less. This eliminates the need for a cooling device, makes it possible to apply resin lining and the like, and has the effect of facilitating material selection. These effects are good in Examples 1 and 2 where the initial N 2 H 4 concentration of the treated raw water W2 is around 2000 mg / L, and particularly remarkable in Example 1 where the initial N 2 H 4 concentration is 2000 mg / L or less. there were.

1…反応槽
2…均一系触媒の供給手段
3…送風機(酸素含有ガス供給手段)
4…散気管(酸素含有ガス供給手段)
W…排水
W1…一次処理水
W2…処理原水
W3…処理水
DESCRIPTION OF SYMBOLS 1 ... Reaction tank 2 ... Uniform catalyst supply means 3 ... Blower (oxygen-containing gas supply means)
4 ... Diffuser (oxygen-containing gas supply means)
W ... Wastewater W1 ... Primary treated water W2 ... Raw treated water W3 ... treated water

Claims (3)

ヒドラジンとキレート形成有機化合物を含み、ヒドラジン濃度が3000mg/Lを超える排水の処理方法であって、
該排水に均一系触媒を添加し、酸素含有ガスでヒドラジンを酸化分解することにより排水中のヒドラジン濃度を低減する第一の酸化処理工程と、
前記第一の酸化処理工程の一次処理水に前記排水を添加して処理原水を調製し、この処理原水に均一系触媒を添加し、酸素含有ガスでヒドラジンを酸化分解して処理水を得る第二の酸化処理工程とを有することを特徴とする、ヒドラジンとキレート形成有機化合物を含む排水の処理方法。
A method for treating wastewater containing hydrazine and a chelate-forming organic compound and having a hydrazine concentration exceeding 3000 mg / L,
A first oxidation treatment step of adding a homogeneous catalyst to the waste water and oxidatively decomposing hydrazine with an oxygen-containing gas to reduce the concentration of hydrazine in the waste water;
The waste water is added to the primary treated water of the first oxidation treatment step to prepare treated raw water, a homogeneous catalyst is added to the treated raw water, and hydrazine is oxidized and decomposed with an oxygen-containing gas to obtain treated water. A wastewater treatment method comprising hydrazine and a chelate-forming organic compound, characterized by comprising a second oxidation treatment step.
前記処理原水中のヒドラジン濃度が3000mg/L以下であることを特徴とする請求項1に記載のヒドラジンとキレート形成有機化合物を含む排水の処理方法。   The method for treating wastewater containing hydrazine and a chelate-forming organic compound according to claim 1, wherein the concentration of hydrazine in the treated raw water is 3000 mg / L or less. 前記第一の酸化処理工程の一次処理水への前記排水の添加を前記均一系触媒による酸化反応の進行に応じて設定することを特徴とする請求項1又は2に記載のヒドラジンとキレート形成有機化合物を含む排水の処理方法。   The hydrazine and chelate-forming organic substance according to claim 1 or 2, wherein the addition of the waste water to the primary treated water of the first oxidation treatment step is set according to the progress of the oxidation reaction by the homogeneous catalyst. A method for treating wastewater containing compounds.
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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56136695A (en) * 1980-03-28 1981-10-26 Kurita Water Ind Ltd Treatment of water containing hydrazines
JPS59378A (en) * 1982-06-25 1984-01-05 Hitachi Plant Eng & Constr Co Ltd Treatment of waste water containing hydrazine
JP2003039083A (en) * 2001-07-31 2003-02-12 Kurita Water Ind Ltd Treatment method for wastewater containing hydrazine and chelate forming organic compound
JP2008504111A (en) * 2004-06-28 2008-02-14 レクティセル Purification method of contaminated water
JP2011031195A (en) * 2009-08-03 2011-02-17 Daiseki:Kk Waste fluid treatment method for suppressing environmental load

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56136695A (en) * 1980-03-28 1981-10-26 Kurita Water Ind Ltd Treatment of water containing hydrazines
JPS59378A (en) * 1982-06-25 1984-01-05 Hitachi Plant Eng & Constr Co Ltd Treatment of waste water containing hydrazine
JP2003039083A (en) * 2001-07-31 2003-02-12 Kurita Water Ind Ltd Treatment method for wastewater containing hydrazine and chelate forming organic compound
JP2008504111A (en) * 2004-06-28 2008-02-14 レクティセル Purification method of contaminated water
JP2011031195A (en) * 2009-08-03 2011-02-17 Daiseki:Kk Waste fluid treatment method for suppressing environmental load

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