JP2012519387A5 - - Google Patents
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- JP2012519387A5 JP2012519387A5 JP2011552398A JP2011552398A JP2012519387A5 JP 2012519387 A5 JP2012519387 A5 JP 2012519387A5 JP 2011552398 A JP2011552398 A JP 2011552398A JP 2011552398 A JP2011552398 A JP 2011552398A JP 2012519387 A5 JP2012519387 A5 JP 2012519387A5
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- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US15749809P | 2009-03-04 | 2009-03-04 | |
| US61/157,498 | 2009-03-04 | ||
| PCT/EP2010/052432 WO2010100078A1 (en) | 2009-03-04 | 2010-02-25 | Illumination system, lithographic apparatus and method of forming an illumination mode |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2012519387A JP2012519387A (ja) | 2012-08-23 |
| JP2012519387A5 true JP2012519387A5 (ja) | 2013-04-11 |
| JP5650670B2 JP5650670B2 (ja) | 2015-01-07 |
Family
ID=42224657
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011552398A Active JP5650670B2 (ja) | 2009-03-04 | 2010-02-25 | 照明システム、リソグラフィ装置および照明モードを形成する方法 |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US9134629B2 (ja) |
| EP (1) | EP2404218B1 (ja) |
| JP (1) | JP5650670B2 (ja) |
| KR (1) | KR101666073B1 (ja) |
| CN (1) | CN102341754B (ja) |
| NL (1) | NL2004303A (ja) |
| SG (1) | SG173857A1 (ja) |
| TW (1) | TWI519733B (ja) |
| WO (1) | WO2010100078A1 (ja) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5657000B2 (ja) * | 2009-08-25 | 2015-01-21 | エーエスエムエル ネザーランズ ビー．ブイ． | 照明システム、リソグラフィ装置、及び照明モード調整方法 |
| US8681413B2 (en) | 2011-06-27 | 2014-03-25 | Kla-Tencor Corporation | Illumination control |
| DE102012209412A1 (de) * | 2012-06-04 | 2013-12-05 | Carl Zeiss Smt Gmbh | Optisches Verfahren und optische Messvorrichtung zum Messen von Winkellagen von Facetten zumindest eines Facettenspiegels für EUV-Anwendungen |
| JP6125798B2 (ja) * | 2012-11-02 | 2017-05-10 | 大日本印刷株式会社 | パターンの製造方法および半導体装置の製造方法 |
| DE102015209176A1 (de) * | 2015-05-20 | 2016-11-24 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik für die EUV-Projektionslithographie |
| US9886543B2 (en) | 2016-02-10 | 2018-02-06 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method providing for asymmetric pupil configuration for an extreme ultraviolet lithography process |
| CN106842829B (zh) * | 2017-04-19 | 2019-04-09 | 广东工业大学 | 一种用于增强光刻分辨率的离轴照明结构和光刻系统 |
| US10314154B1 (en) * | 2017-11-29 | 2019-06-04 | Taiwan Semiconductor Manufacturing Co., Ltd. | System and method for extreme ultraviolet source control |
| CN114253054A (zh) * | 2020-09-22 | 2022-03-29 | 上旸光学股份有限公司 | 投影光学系统 |
Family Cites Families (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10043315C1 (de) * | 2000-09-02 | 2002-06-20 | Zeiss Carl | Projektionsbelichtungsanlage |
| KR100576746B1 (ko) | 2001-06-01 | 2006-05-03 | 에이에스엠엘 네델란즈 비.브이. | 리소그래피장치, 디바이스제조방법, 그 디바이스,제어시스템, 컴퓨터프로그램, 및 컴퓨터프로그램물 |
| JP4307813B2 (ja) * | 2001-11-14 | 2009-08-05 | 株式会社リコー | 光偏向方法並びに光偏向装置及びその光偏向装置の製造方法並びにその光偏向装置を具備する光情報処理装置及び画像形成装置及び画像投影表示装置及び光伝送装置 |
| US20040101018A1 (en) * | 2002-08-28 | 2004-05-27 | Syb Leijenaar | Suspension system for laser discharge unit |
| TWI260154B (en) * | 2003-07-03 | 2006-08-11 | Fuji Photo Film Co Ltd | Image forming device |
| US7053981B2 (en) * | 2004-03-31 | 2006-05-30 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7384725B2 (en) * | 2004-04-02 | 2008-06-10 | Advanced Micro Devices, Inc. | System and method for fabricating contact holes |
| US7349068B2 (en) * | 2004-12-17 | 2008-03-25 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| JP2006216917A (ja) | 2005-02-07 | 2006-08-17 | Canon Inc | 照明光学系、露光装置およびデバイス製造方法 |
| JP2006253487A (ja) * | 2005-03-11 | 2006-09-21 | Nikon Corp | 照明装置、投影露光方法、投影露光装置、及びマイクロデバイスの製造方法 |
| JP2007015067A (ja) * | 2005-07-08 | 2007-01-25 | Fujifilm Holdings Corp | 微小薄膜可動素子及び微小薄膜可動素子アレイ並びに画像形成装置 |
| JP2007033787A (ja) | 2005-07-26 | 2007-02-08 | Fujifilm Corp | 微小薄膜可動素子および微小薄膜可動素子アレイ並びに微小薄膜可動素子アレイの駆動方法 |
| US7830578B2 (en) * | 2005-10-12 | 2010-11-09 | Jeremy Branson | Apparatus for electronically controlled holograms |
| US7511799B2 (en) | 2006-01-27 | 2009-03-31 | Asml Netherlands B.V. | Lithographic projection apparatus and a device manufacturing method |
| CN101669071B (zh) * | 2007-04-25 | 2012-03-21 | 卡尔蔡司Smt有限责任公司 | 微光刻曝光装置中照明掩模的照明系统 |
| US8237913B2 (en) * | 2007-05-08 | 2012-08-07 | Asml Netherlands B.V. | Lithographic apparatus and method |
| KR20120031050A (ko) * | 2009-06-17 | 2012-03-29 | 에이에스엠엘 네델란즈 비.브이. | 리소그래피 장치 및 방법 |
| EP2449418A1 (en) * | 2009-06-30 | 2012-05-09 | ASML Netherlands BV | Mountings for rotation of array of reflective elements and lithographic apparatus incorporating same |
| JP5657000B2 (ja) * | 2009-08-25 | 2015-01-21 | エーエスエムエル ネザーランズ ビー．ブイ． | 照明システム、リソグラフィ装置、及び照明モード調整方法 |
| CN102483581B (zh) * | 2009-08-25 | 2015-04-01 | Asml荷兰有限公司 | 光学设备和定向反射元件的方法 |
| NL2005724A (en) * | 2009-12-23 | 2011-06-27 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method. |
| JP2013516079A (ja) * | 2009-12-29 | 2013-05-09 | エーエスエムエル ネザーランズ ビー．ブイ． | 照明システム、リソグラフィ装置および照明方法 |
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2010
- 2010-02-25 EP EP10705380.3A patent/EP2404218B1/en active Active
- 2010-02-25 KR KR1020117022140A patent/KR101666073B1/ko active IP Right Grant
- 2010-02-25 WO PCT/EP2010/052432 patent/WO2010100078A1/en active Application Filing
- 2010-02-25 US US13/203,773 patent/US9134629B2/en active Active
- 2010-02-25 CN CN201080009961.9A patent/CN102341754B/zh active Active
- 2010-02-25 NL NL2004303A patent/NL2004303A/en not_active Application Discontinuation
- 2010-02-25 JP JP2011552398A patent/JP5650670B2/ja active Active
- 2010-02-25 SG SG2011061553A patent/SG173857A1/en unknown
- 2010-03-04 TW TW099106363A patent/TWI519733B/zh active