JP2012229462A - Multipoint evaporation source device - Google Patents

Multipoint evaporation source device Download PDF

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JP2012229462A
JP2012229462A JP2011096994A JP2011096994A JP2012229462A JP 2012229462 A JP2012229462 A JP 2012229462A JP 2011096994 A JP2011096994 A JP 2011096994A JP 2011096994 A JP2011096994 A JP 2011096994A JP 2012229462 A JP2012229462 A JP 2012229462A
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crucible
crucibles
rotary table
shield
electron beam
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Toru Takashima
徹 高島
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Jeol Ltd
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Jeol Ltd
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Abstract

PROBLEM TO BE SOLVED: To reliably block the intrusion of an evaporant into other crucible and prevent mutual contamination of crucibles by providing a mobile blocking body-lifting unit so that the evaporant does not intrude into other crucible when evaporating a material to be evaporated.SOLUTION: A multipoint evaporation source device includes: a turntable 2 provided with a plurality of crucibles in which the evaporant 3 is stored and rotating around a rotary shaft as a center; an electron gun 1 for evaporating the evaporant 3 in the crucible 7 by irradiating one crucible 7 positioned at the irradiation location of an electron beam with the electron beam; and a cover 6 which is located on the upper aspect of the turntable 2, covers a plurality of crucibles 7 and has all opened irradiation regions of the electron beam facing the gun 1. The device also comprises: a groove 24 formed on the upper face of the table 2 so as to partition the crucibles 7; a blocking body 20 fitting into the groove 24, partitioning each crucible and rotating together with the table 2; and a blocking body-lifting unit elevating the blocking body 20 and narrowing the interval of the blocking body 20 and the cover 6 when each of the crucibles come at the beam irradiation position.

Description

本発明は、真空蒸着槽内に設定された電子ビームの照射位置に対して、複数の坩堝を一つづつ順次移動させ、坩堝内の蒸発材料を蒸発させて成膜対象に付着させる技術に関し、特に、多数の坩堝を扱う多点蒸発源装置に関する。   The present invention relates to a technique for sequentially moving a plurality of crucibles one by one with respect to an electron beam irradiation position set in a vacuum vapor deposition tank, and evaporating an evaporation material in the crucible to adhere to a film formation target. In particular, the present invention relates to a multipoint evaporation source apparatus that handles a large number of crucibles.

従来の多点蒸発源装置の蒸発源の構成を図1に示す。図中100は蒸発源、1は電子ビームを出射する電子銃で、出射した電子ビームは蒸発源100の内側に配置されている偏向装置(図示せず)によって偏向され、蒸発材料の加熱位置へと向けられる。
2は4個の坩堝(7a,7b,7c,7d)を円周上に等間隔に配置した円盤状の坩堝回転テーブルで、各坩堝内には蒸発材料3が収められていると共に、その内の一つの坩堝(この図では坩堝7a)に前記電子銃1からの電子ビームが到達するように配置されている。
4は該坩堝回転テーブル2下面の中央に固定された回転軸、5は該回転軸4を回転させる回転軸駆動装置である。
6は前記坩堝回転テーブル2の上方に配置された坩堝カバーで、3個の坩堝(7b,7c,7d)を覆うように配置され、電子ビームが通過する部分には外周縁部に切欠け部8が形成され、該切欠け部8には坩堝上面側へ延びる下端縁部9が設けられている。
このような構成の蒸発源において、回転軸駆動装置5を駆動させ回転軸4が回転すると、図2に示すように坩堝回転テーブル2が矢印A方向に回転する。そして、所望の坩堝7aが電子銃1の対面位置にきたところで、前記坩堝回転テーブル2の回転が停止する。
そして、電子銃1から電子ビームEBが偏向装置(図示せず)で偏向され、坩堝7a内の蒸発材料3上に照射される。
この電子ビームEBの照射により蒸発材料3は、加熱され溶融する。溶融した蒸発材料3の蒸発流は、衝突すること無く直線状に蒸発源100から上方の基板(図示せず)へと進行し、該基板の表面を被覆する。このような動作を繰返し行うことにより、所望の多層膜が基板上に形成される。
The structure of the evaporation source of the conventional multipoint evaporation source apparatus is shown in FIG. In the figure, 100 is an evaporation source, 1 is an electron gun that emits an electron beam, and the emitted electron beam is deflected by a deflecting device (not shown) arranged inside the evaporation source 100 to the heating position of the evaporation material. Directed.
Reference numeral 2 denotes a disk-shaped crucible rotary table in which four crucibles (7a, 7b, 7c, 7d) are arranged at equal intervals on the circumference, and the evaporation material 3 is contained in each crucible. Are arranged so that the electron beam from the electron gun 1 reaches one crucible (the crucible 7a in this figure).
Reference numeral 4 denotes a rotary shaft fixed at the center of the lower surface of the crucible rotary table 2, and reference numeral 5 denotes a rotary shaft driving device for rotating the rotary shaft 4.
Reference numeral 6 denotes a crucible cover disposed above the crucible turntable 2 and is disposed so as to cover the three crucibles (7b, 7c, 7d). 8 is formed, and the notch 8 is provided with a lower edge 9 that extends to the upper surface side of the crucible.
In the evaporation source having such a configuration, when the rotary shaft driving device 5 is driven and the rotary shaft 4 rotates, the crucible rotary table 2 rotates in the direction of arrow A as shown in FIG. Then, when the desired crucible 7a comes to the facing position of the electron gun 1, the rotation of the crucible turntable 2 is stopped.
Then, the electron beam EB is deflected by the deflecting device (not shown) from the electron gun 1 and irradiated onto the evaporation material 3 in the crucible 7a.
The evaporation material 3 is heated and melted by the irradiation of the electron beam EB. The evaporating flow of the evaporated evaporating material 3 proceeds linearly from the evaporation source 100 to the upper substrate (not shown) without colliding, and covers the surface of the substrate. By repeating such an operation, a desired multilayer film is formed on the substrate.

米国特許第4748935号公報U.S. Pat. No. 4,748,935

ところが、上述のような蒸発源で、成膜した膜に欠陥が生じてしまう問題が起きる。
これは、蒸発材料の蒸発時に坩堝からの蒸発物が、他の坩堝に混入してしまうことで起きる。
この対策として、上述したように電子ビームが照射されていない坩堝を覆うように坩堝カバーが配置されているが、このような対策をしても、坩堝カバーと坩堝との間の隙間から蒸発物が侵入することが避けられず、他の坩堝への蒸発物の混入を完全に防止することは困難であるため、坩堝相互の汚染が発生する。
また、各坩堝の上端面と前記坩堝カバーの下端面との間隔を可能な限り小さくすると他の坩堝への蒸発物の侵入を確実に防止することができるが、この坩堝カバーが坩堝回転テーブルの回転を阻害することが懸念される。
本発明は、このような問題を解決するためになされたもので、新規な多点蒸発源装置を提供することを目的とする。
However, there is a problem that a defect occurs in the film formed by the evaporation source as described above.
This occurs because the evaporated material from the crucible is mixed into another crucible when the evaporation material is evaporated.
As a countermeasure, the crucible cover is arranged so as to cover the crucible not irradiated with the electron beam as described above. However, even if such a countermeasure is taken, evaporates from the gap between the crucible cover and the crucible. Since it is unavoidable to enter the crucible and it is difficult to completely prevent the evaporate from entering other crucibles, contamination between the crucibles occurs.
Further, if the distance between the upper end surface of each crucible and the lower end surface of the crucible cover is made as small as possible, it is possible to reliably prevent the intrusion of the evaporate into other crucibles. There is concern about inhibiting rotation.
The present invention has been made to solve such a problem, and an object thereof is to provide a novel multi-point evaporation source apparatus.

本発明の多点蒸発源装置は、蒸発材料が収められた複数の坩堝を備え回転軸を中心に回転する回転テーブルと、電子ビーム照射位置に位置する一つの坩堝に対して電子ビームを照射して坩堝の蒸発材料を蒸発させる電子銃と、前記回転テーブルの上側に複数の坩堝を覆い、かつ前記電子銃に対向する電子ビームの照射領域の全てが開口したカバーとを備えた多点蒸発源装置において、前記回転テーブルの上面に前記坩堝を仕切るように形成された溝と、該溝に嵌り込み各坩堝を仕切る形状を有し、前記回転テーブルの回転と共に回転する遮蔽体と、各坩堝が電子ビームの照射位置に来たとき、該遮蔽体を上昇させ該遮蔽体と前記カバーとの間隔を狭める遮蔽体昇降手段とを備えたことを特徴とする。   The multi-point evaporation source apparatus of the present invention irradiates an electron beam onto a rotary table having a plurality of crucibles containing evaporation materials and rotating around a rotating shaft, and one crucible located at an electron beam irradiation position. A multi-point evaporation source comprising: an electron gun that evaporates the evaporation material of the crucible; and a cover that covers a plurality of crucibles on the upper side of the rotary table and that is open in the entire electron beam irradiation region facing the electron gun. In the apparatus, a groove formed on the upper surface of the rotary table so as to partition the crucible, a shield that fits into the groove and partitions each crucible, and rotates with the rotation of the rotary table; Shielding means raising and lowering means for raising the shielding body and narrowing the distance between the shielding body and the cover when the electron beam irradiation position is reached is provided.

本発明の多点蒸発源装置において、蒸発材料の蒸発時、蒸発物が他の坩堝内に侵入しないように可動式の遮蔽体昇降手段を設けたことによって、他の坩堝への蒸発物の侵入を確実に遮断でき、坩堝相互の汚染を防止することができる。 In the multipoint evaporation source apparatus of the present invention, when the evaporation material is evaporated, a movable shield lifting / lowering means is provided so that the evaporated material does not enter the other crucible, so that the evaporated material enters the other crucible. Can be reliably shut off and contamination between crucibles can be prevented.

従来の蒸発源を斜上方から見た外観図である。It is the external view which looked at the conventional evaporation source from diagonally upward. 従来の蒸発源を上方から見たときの図である。It is a figure when the conventional evaporation source is seen from upper direction. 本発明に係る蒸発源を上方から見たときの図である。It is a figure when the evaporation source which concerns on this invention is seen from upper direction. 本発明に係る蒸発源の一部を示す斜上方から見た外観図である。It is the external view seen from diagonally upward which shows a part of evaporation source which concerns on this invention. 本発明に係る蒸発源の一部を示す概略断面図である。It is a schematic sectional drawing which shows a part of evaporation source which concerns on this invention. 本発明に係る蒸発源の一部を示す概略断面図である。It is a schematic sectional drawing which shows a part of evaporation source which concerns on this invention. 本発明に係る回転テーブル上面の溝の形状の変形例を示す図である。It is a figure which shows the modification of the shape of the groove | channel of the upper surface of the turntable which concerns on this invention.

以下、図面を参照して本発明の実施例を詳細に説明する。
図3は、本発明に係る蒸発源を上方から見た構成図である。また、図4は、本発明に係る蒸発源の一部を斜め上方から見たときの図である。図3及び図4中、図1及び図2にて使用した記号と同一記号の付されたものは同一構成要素を示す。
本実施例の基本構成は、図1及び図2を用いて説明した従来例と同一であり、坩堝7a〜7dを備えた回転テーブル2の上に坩堝カバー6が設けられ、坩堝カバーの切欠け部8に位置する坩堝に対し電子銃1から電子ビームEBが照射される。本実施例が従来例と異なるのは、遮蔽部材と、遮蔽部材を上下させるための固定ガイドレールを設けた点である。
即ち、図4において、図中20は坩堝と坩堝を仕切るように形成された遮蔽部材で、例えば坩堝回転テーブル2上面に等間隔に4個の坩堝が備えられている場合には十字状の部材となる。該遮蔽部材20低面の中央部には突起物21が形成され、該突起物21は前記坩堝回転テーブル2の中心の穴に支承され、該突起部21を中心に前記坩堝回転テーブル2と一緒に回転できる構造になっている。該遮蔽部材20のそれぞれの端部には各々支持体(23a,23b,23c,23d)が固定され、該支持体の他の端部にはローラー(22a,22b,22c,22d)がそれぞれ設けられている。
24は前記坩堝回転テーブル2上面に前記遮蔽部材20が収まるように凹状に形成された溝、25は前記坩堝回転テーブル2側面の外周に沿って設けられ、かつ、蒸発源100内壁に固定されている固定ガイドレールで、上面はローラーが接触しながら回転する平坦な面を有し、この面上の所定の位置には緩やかなスロープを有する凸部(26a,26b,26c,26d)が等間隔に4箇所形成されている。なお、前記坩堝回転テーブル2は前記固定ガイドレール25に接触することなく回転できる構造に成っている。
このような構成の蒸発源の動作を説明する。回転軸駆動装置5を駆動させ回転軸4を回転させると、坩堝回転テーブル2が矢印Aの方向に回転する。この該坩堝回転テーブル2の回転動作に伴なって、遮蔽部材20も突起物21を中心に一緒に回転する。
図5は、前記坩堝回転テーブル2が回転しているときで、遮蔽部材20は、前記坩堝回転テーブル2上面の溝24内に収まって、前記遮蔽部材20の先端部のローラ22aが固定ガイドレール25上面を転がっている様子を示している。
また、図6は、前記坩堝回転テーブル2の一つの坩堝が電子銃1の対面にきたときで、前記遮蔽部材20は、ローラー(22a,22b,22c,22d)が前記固定ガイドレール25上面の各々の凸部(26a,26b,26c,26d)に同時に乗り上げ、前記坩堝回転テーブル2の溝24から上昇し前記遮蔽部材20が坩堝カバー6裏面に接近し、図ではローラー22が凸部26の頂点で停止し、前記遮蔽部材20が前記坩堝カバー6に当接している様子を示している。
このとき、電子銃1から電子ビームEBを坩堝内の蒸発材料3に照射して、該蒸発材料3を溶融・蒸発させとき、蒸発物が前記坩堝回転テーブル2上端面と前記坩堝カバー6の下端部との隙間に入り込んでも前記遮蔽部材20によって遮蔽される。
次に、坩堝に対して電子ビームによる照射が完了すると、再び、前記回転軸駆動装置5を駆動させ、前記坩堝回転テーブル2を回転させると、前記遮蔽部材20の各々のローラー(22a,22b,22c,22d)が凸部(26a,26b,26c,26d)の頂点から同時に下り、前記遮蔽部材20は前記坩堝回転テーブル2の前記溝24に完全に収まる。このような動作を繰返し遮蔽部材20の上下動が自動的に行われる。
このように蒸発材料の蒸発時、蒸発物が他の坩堝内に侵入しないように可動式の遮蔽体昇降手段を設けたことによって、他の坩堝への蒸発物の侵入を確実に遮断でき、坩堝相互の汚染を防止することができる。
Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.
FIG. 3 is a configuration diagram of the evaporation source according to the present invention as viewed from above. FIG. 4 is a view of a part of the evaporation source according to the present invention when viewed obliquely from above. 3 and 4, the same reference numerals as those used in FIGS. 1 and 2 denote the same components.
The basic configuration of this embodiment is the same as that of the conventional example described with reference to FIGS. 1 and 2, and the crucible cover 6 is provided on the rotary table 2 provided with the crucibles 7a to 7d. An electron beam EB is irradiated from the electron gun 1 to the crucible located in the section 8. This embodiment is different from the conventional example in that a shielding member and a fixed guide rail for moving the shielding member up and down are provided.
That is, in FIG. 4, 20 is a shielding member formed so as to partition the crucible from the crucible. For example, when four crucibles are provided at equal intervals on the upper surface of the crucible rotary table 2, a cross-shaped member is provided. It becomes. A projection 21 is formed at the central portion of the lower surface of the shielding member 20, and the projection 21 is supported by a hole at the center of the crucible turntable 2, and together with the crucible turntable 2 around the protrusion 21. It has a structure that can be rotated. Supports (23a, 23b, 23c, 23d) are fixed to the respective ends of the shielding member 20, and rollers (22a, 22b, 22c, 22d) are provided to the other ends of the support, respectively. It has been.
Reference numeral 24 denotes a groove formed in a concave shape so that the shielding member 20 can be accommodated on the upper surface of the crucible turntable 2, and 25 is provided along the outer periphery of the side surface of the crucible turntable 2 and fixed to the inner wall of the evaporation source 100. The upper surface of the fixed guide rail has a flat surface that rotates while contacting with the roller, and convex portions (26a, 26b, 26c, 26d) having gentle slopes are equidistant at predetermined positions on this surface. Are formed at four locations. The crucible turntable 2 has a structure that can rotate without contacting the fixed guide rail 25.
The operation of the evaporation source having such a configuration will be described. When the rotary shaft driving device 5 is driven to rotate the rotary shaft 4, the crucible rotary table 2 rotates in the direction of arrow A. As the crucible turntable 2 rotates, the shielding member 20 also rotates around the protrusion 21 together.
FIG. 5 shows the state in which the crucible turntable 2 is rotating, and the shielding member 20 is housed in the groove 24 on the upper surface of the crucible turntable 2 so that the roller 22a at the tip of the shielding member 20 is fixed guide rail. 25 shows a state of rolling on the upper surface.
FIG. 6 shows a state in which one crucible of the crucible turntable 2 comes to the opposite side of the electron gun 1, and the shielding member 20 has rollers (22a, 22b, 22c, 22d) on the upper surface of the fixed guide rail 25. Each of the convex portions (26a, 26b, 26c, 26d) rides on the convex portions at the same time, rises from the groove 24 of the crucible rotary table 2, and the shielding member 20 approaches the back surface of the crucible cover 6. The state is stopped at the apex, and the shielding member 20 is in contact with the crucible cover 6.
At this time, when the evaporating material 3 in the crucible is irradiated with the electron beam EB from the electron gun 1 to melt and evaporate the evaporating material 3, the evaporant is the lower end of the crucible rotary table 2 and the lower end of the crucible cover 6. Even if it enters the gap with the part, it is shielded by the shielding member 20.
Next, when irradiation of the crucible with the electron beam is completed, the rotary shaft driving device 5 is driven again, and the crucible rotary table 2 is rotated, whereby each roller (22a, 22b, 22c, 22d) simultaneously descends from the apex of the convex portions (26a, 26b, 26c, 26d), and the shielding member 20 is completely contained in the groove 24 of the crucible turntable 2. Repeating such operations, the vertical movement of the shielding member 20 is automatically performed.
Thus, by providing the movable shield lifting / lowering means so that the evaporated material does not enter the other crucible when the evaporation material evaporates, the intrusion of the evaporated material into the other crucible can be surely blocked, and the crucible Mutual contamination can be prevented.

なお、前記実施例では、4つの坩堝を備えた坩堝回転テーブルを挙げて説明したが、坩堝回転テーブルの坩堝の数を限定するものでは無い。この場合、坩堝回転テーブルには、配置された坩堝の数に応じてそれぞれの坩堝を仕切るように溝が形成され、遮蔽体は、該溝に嵌る込むように形成されるものである。
また、前記坩堝回転テーブル2上面には、中央部が連結され、該テーブル2の外周縁部まで連続に連なった溝が形成され、遮蔽部材は、該溝に嵌り込むように形成されるものである。
In addition, although the said Example gave and demonstrated the crucible rotation table provided with four crucibles, it does not limit the number of crucibles of a crucible rotation table. In this case, the crucible rotary table is formed with grooves so as to partition each crucible according to the number of crucibles arranged, and the shield is formed so as to fit into the grooves.
In addition, a central portion is connected to the upper surface of the crucible rotary table 2 to form a continuous groove up to the outer peripheral edge of the table 2, and the shielding member is formed so as to be fitted into the groove. is there.

また、前記遮蔽体昇降手段は、前記回転テーブルの外周に沿って配置されたレールと、前記遮蔽体には、中央方向から前記回転テーブルの外まで伸び前記レールと先端部が接触するように設けられる枝部が形成され、該テーブルの回転に伴い前記各坩堝が電子ビームの照射位置に来たとき、前記レール上面に形成された凸部に前記枝部の先端が乗り上げることにより、該遮蔽体が前記回転テーブルの溝から上昇し前記カバーに接近する例を挙げて説明したが、図示してはいないが、前記回転テーブル2の回転に伴い各坩堝7が電子ビームの照射位置に来たとき、前記遮蔽部材20の中央部を上方に押し上げ、前記遮蔽部材20と坩堝カバー6との隙間を狭め、又は当接させる押上げ手段を設けても良い。
また、図7には前記坩堝回転テーブル2上面に4個の坩堝を等間隔に配置した場合の溝形状の変形例を示した。図7(A)に示す溝は回転テーブル2の中央部で連結され、各坩堝を取り囲み、中央部から外周縁部まで連続的に形成され、図7(B)に示す溝は各坩堝を取り囲み、各坩堝の間が連結され、中央方向から外周縁部まで連続的に形成され、図7(c)に示す溝は各坩堝をそれぞれ独立に取り囲んで、かつそれぞれ異なる方向の外周縁部まで連続的に形成されたものである。本発明ではこのような溝形状でも良く、この場合、各々の遮蔽部材20は、上記溝に嵌り込む形状に形成される。
このような溝の形状は、図7に示すような変形例の溝形状に限定されるものでなく、色々な溝の形状が適用できるものである。
The shield lifting / lowering means includes a rail disposed along an outer periphery of the rotary table, and the shield extends from a center direction to the outside of the rotary table so that the rail and a tip end are in contact with each other. When the crucible comes to an electron beam irradiation position as the table is rotated, the tip of the branch portion rides on the convex portion formed on the rail upper surface. Has been described with reference to an example of rising from the groove of the rotary table and approaching the cover, although not shown, when each crucible 7 comes to the irradiation position of the electron beam as the rotary table 2 rotates Further, there may be provided push-up means for pushing up the central portion of the shielding member 20 upward and narrowing or contacting the gap between the shielding member 20 and the crucible cover 6.
FIG. 7 shows a modification of the groove shape when four crucibles are arranged at equal intervals on the upper surface of the crucible rotary table 2. The groove shown in FIG. 7 (A) is connected at the center of the turntable 2 and surrounds each crucible, and is continuously formed from the center to the outer peripheral edge. The groove shown in FIG. 7 (B) surrounds each crucible. The crucibles are connected to each other and formed continuously from the central direction to the outer peripheral edge, and the grooves shown in FIG. 7 (c) surround each crucible independently and continue to the outer peripheral edge in different directions. Is formed. In the present invention, such a groove shape may be used, and in this case, each shielding member 20 is formed into a shape that fits into the groove.
The shape of such a groove is not limited to the groove shape of the modified example as shown in FIG. 7, and various groove shapes can be applied.

1・・・電子銃
2・・・坩堝回転テーブル
3・・・蒸発材料
4・・・回転軸
5・・・回転軸駆動装置
6・・・坩堝カバー
7・・・坩堝
8・・・切欠け部
9・・・下端縁部
20・・・遮蔽部材
21・・・突起物
22・・・ローラー
23・・・支持部
24・・・溝
25・・・固定
ガイドレール
26・・・凸部
100・・・蒸発源
DESCRIPTION OF SYMBOLS 1 ... Electron gun 2 ... Crucible rotary table 3 ... Evaporation material 4 ... Rotating shaft 5 ... Rotating shaft drive 6 ... Crucible cover 7 ... Crucible 8 ... Notch Part 9 ... Lower end edge part 20 ... Shielding member 21 ... Projection 22 ... Roller 23 ... Support part 24 ... Groove 25 ... Fixed guide rail 26 ... Convex part 100 ... Evaporation source

Claims (4)

蒸発材料が収められた複数の坩堝を備え回転軸を中心に回転する回転テーブルと、電子ビーム照射位置に位置する一つの坩堝に対して電子ビームを照射して坩堝の蒸発材料を蒸発させる電子銃と、前記回転テーブルの上側に複数の坩堝を覆い、かつ前記電子銃に対向する電子ビームの照射領域の全てが開口したカバーとを備えた多点蒸発源装置において、前記回転テーブルの上面に前記坩堝を仕切るように形成された溝と、該溝に嵌り込み各坩堝を仕切る形状を有し、前記回転テーブルの回転と共に回転する遮蔽体と、各坩堝が電子ビームの照射位置に来たとき、該遮蔽体を上昇させ該遮蔽体と前記カバーとの間隔を狭める遮蔽体昇降手段とを備えたことを特徴とする多点蒸発源装置。 A rotary table having a plurality of crucibles containing evaporation materials and rotating around a rotation shaft, and an electron gun for evaporating the evaporation material in the crucible by irradiating one crucible located at the electron beam irradiation position And a cover that covers a plurality of crucibles on the upper side of the rotary table and that is open to all of the irradiation region of the electron beam facing the electron gun, on the upper surface of the rotary table, A groove formed so as to partition the crucible, a shape that fits into the groove and partitions each crucible, and rotates with the rotation of the rotary table; and when each crucible comes to the irradiation position of the electron beam, A multi-point evaporation source device comprising: a shield lifting / lowering means that raises the shield and narrows the distance between the shield and the cover. 前記回転テーブルの外周に沿って配置されたレールと、前記遮蔽体には、中央方向から前記回転テーブルの外まで伸び前記レールと先端部が接触するように設けられる枝部が形成され、該テーブルの回転に伴い前記各坩堝が電子ビームの照射位置に来たとき、前記レール上面に形成された凸部に前記枝部の先端が乗り上げることにより、該遮蔽体が前記回転テーブルの溝から上昇し前記カバーに接近することを特徴とする請求項1記載の多点蒸発源装置。 The rail disposed along the outer periphery of the rotary table and the shield are formed with branch portions extending from the center direction to the outside of the rotary table so that the rail and the tip end are in contact with each other. When the crucibles come to the irradiation position of the electron beam with the rotation of the shield, the tip of the branch portion rides on the convex portion formed on the rail upper surface, so that the shield rises from the groove of the rotary table. The multipoint evaporation source device according to claim 1, wherein the multipoint evaporation source device approaches the cover. 前記溝は、中央部が連結し、放射状に伸びた枝部から形成されていることを特徴とする請求項1及び2記載の多点蒸発源装置。 3. The multi-point evaporation source device according to claim 1, wherein the groove is formed of branch portions that are connected at the center and extend radially. 前記遮蔽体昇降手段は、前記各坩堝が電子ビームの照射位置に来たとき、前記遮蔽体の中央部を前記回転テーブルから上方に押上げ、該遮蔽体と前記カバーとの間隔を狭める押上げ手段を設けたことを特徴とする請求項1及び2記載の多点蒸発源装置。 The shield lifting / lowering means pushes up the central part of the shield upward from the rotary table when each of the crucibles has reached the electron beam irradiation position, and pushes up the gap between the shield and the cover. 3. A multipoint evaporation source apparatus according to claim 1 or 2, further comprising means.
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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015137409A (en) * 2014-01-23 2015-07-30 スタンレー電気株式会社 Crucible and vacuum evaporation system
WO2016169357A1 (en) * 2015-04-24 2016-10-27 京东方科技集团股份有限公司 Evaporation device and evaporation method using evaporation device
CN111621750A (en) * 2020-07-03 2020-09-04 埃频(上海)仪器科技有限公司 Multi-channel evaporation source
JP2022520307A (en) * 2018-11-30 2022-03-30 フェローテック(ユーエスエー)コーポレイション Crucible cover for coating with electron beam source
CN116770234A (en) * 2023-06-25 2023-09-19 苏州佑伦真空设备科技有限公司 Crucible device for preventing material mixing

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015137409A (en) * 2014-01-23 2015-07-30 スタンレー電気株式会社 Crucible and vacuum evaporation system
WO2016169357A1 (en) * 2015-04-24 2016-10-27 京东方科技集团股份有限公司 Evaporation device and evaporation method using evaporation device
US10487389B2 (en) 2015-04-24 2019-11-26 Boe Technology Group Co., Ltd. Evaporation device and evaporation method using the same
JP2022520307A (en) * 2018-11-30 2022-03-30 フェローテック(ユーエスエー)コーポレイション Crucible cover for coating with electron beam source
US11807935B2 (en) 2018-11-30 2023-11-07 Ferrotec (Usa) Corporation Crucible cover for coating with an electron beam source
JP7394134B2 (en) 2018-11-30 2023-12-07 フェローテック(ユーエスエー)コーポレイション Crucible cover for coating with electron beam source
CN111621750A (en) * 2020-07-03 2020-09-04 埃频(上海)仪器科技有限公司 Multi-channel evaporation source
CN116770234A (en) * 2023-06-25 2023-09-19 苏州佑伦真空设备科技有限公司 Crucible device for preventing material mixing
CN116770234B (en) * 2023-06-25 2023-12-15 苏州佑伦真空设备科技有限公司 Crucible device for preventing material mixing

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