JP2012195096A - 荷電粒子線レンズおよびそれを用いた露光装置 - Google Patents

荷電粒子線レンズおよびそれを用いた露光装置 Download PDF

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Publication number
JP2012195096A
JP2012195096A JP2011056813A JP2011056813A JP2012195096A JP 2012195096 A JP2012195096 A JP 2012195096A JP 2011056813 A JP2011056813 A JP 2011056813A JP 2011056813 A JP2011056813 A JP 2011056813A JP 2012195096 A JP2012195096 A JP 2012195096A
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JP
Japan
Prior art keywords
region
charged particle
particle beam
opening
section
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
JP2011056813A
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English (en)
Japanese (ja)
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JP2012195096A5 (https=
Inventor
Takahisa Kato
貴久 加藤
豊 ▲瀬▼戸本
Yutaka Setomoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2011056813A priority Critical patent/JP2012195096A/ja
Priority to KR1020137026268A priority patent/KR20130135335A/ko
Priority to PCT/JP2012/001773 priority patent/WO2012124319A1/en
Priority to US14/004,845 priority patent/US20140151570A1/en
Publication of JP2012195096A publication Critical patent/JP2012195096A/ja
Publication of JP2012195096A5 publication Critical patent/JP2012195096A5/ja
Abandoned legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/12—Lenses electrostatic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/049—Focusing means
    • H01J2237/0492—Lens systems
    • H01J2237/04924—Lens systems electrostatic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/10—Lenses
    • H01J2237/12—Lenses electrostatic
    • H01J2237/1205—Microlenses
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/10—Lenses
    • H01J2237/12—Lenses electrostatic
    • H01J2237/1207—Einzel lenses
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography
    • H01J2237/31774—Multi-beam

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP2011056813A 2011-03-15 2011-03-15 荷電粒子線レンズおよびそれを用いた露光装置 Abandoned JP2012195096A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2011056813A JP2012195096A (ja) 2011-03-15 2011-03-15 荷電粒子線レンズおよびそれを用いた露光装置
KR1020137026268A KR20130135335A (ko) 2011-03-15 2012-03-14 하전 입자 빔 렌즈 및 이를 사용한 노광 장치
PCT/JP2012/001773 WO2012124319A1 (en) 2011-03-15 2012-03-14 Charged particle beam lens and exposure apparatus using the same
US14/004,845 US20140151570A1 (en) 2011-03-15 2012-03-14 Charged particle beam lens and exposure apparatus using the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011056813A JP2012195096A (ja) 2011-03-15 2011-03-15 荷電粒子線レンズおよびそれを用いた露光装置

Publications (2)

Publication Number Publication Date
JP2012195096A true JP2012195096A (ja) 2012-10-11
JP2012195096A5 JP2012195096A5 (https=) 2014-05-08

Family

ID=45932473

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011056813A Abandoned JP2012195096A (ja) 2011-03-15 2011-03-15 荷電粒子線レンズおよびそれを用いた露光装置

Country Status (4)

Country Link
US (1) US20140151570A1 (https=)
JP (1) JP2012195096A (https=)
KR (1) KR20130135335A (https=)
WO (1) WO2012124319A1 (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6720861B2 (ja) * 2016-12-28 2020-07-08 株式会社ニューフレアテクノロジー マルチビーム用アパーチャセット及びマルチ荷電粒子ビーム描画装置
KR102799604B1 (ko) 2020-02-04 2025-04-23 칼 짜이스 멀티셈 게엠베하 다중 빔 디지털 스캐닝 및 이미지 획득
JP7689139B2 (ja) 2020-03-12 2025-06-05 カール ツァイス マルティセム ゲゼルシヤフト ミット ベシュレンクテル ハフツング マルチビーム発生ユニットおよびマルチビーム偏向ユニットの特定の改善
DE102020123567B4 (de) 2020-09-09 2025-02-13 Carl Zeiss Multisem Gmbh Vielzahl-Teilchenstrahl-System mit Kontrast-Korrektur-Linsen-System
TW202220012A (zh) 2020-09-30 2022-05-16 德商卡爾蔡司多重掃描電子顯微鏡有限公司 在可調工作距離附近具快速自動對焦之多重粒子束顯微鏡及相關方法

Citations (7)

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Publication number Priority date Publication date Assignee Title
JPS58500306A (ja) * 1981-02-27 1983-02-24 ベ−コ　インスツルメンツ　インコ−ポレイテツド スクリ−ンレンズアレ−板の製造方法
JPH0562611A (ja) * 1991-09-05 1993-03-12 Hitachi Ltd 電子銃用板状電極を備えた陰極線管
JPH0814881A (ja) * 1994-06-28 1996-01-19 Nippon Steel Corp 三次元測定機による直径値算出方法
JPH08241688A (ja) * 1995-03-03 1996-09-17 Hitachi Ltd パターンイオンビーム投射装置
JP2001283756A (ja) * 2000-03-31 2001-10-12 Canon Inc 電子光学系アレイ、これを用いた荷電粒子線露光装置ならびにデバイス製造方法
JP2006162805A (ja) * 2004-12-03 2006-06-22 National Institutes Of Natural Sciences 位相差電子顕微鏡用位相板及びその製造方法並びに位相差電子顕微鏡
JP2010517233A (ja) * 2007-01-25 2010-05-20 エヌエフエイビー・リミテッド 改良された粒子ビーム発生装置

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US3899711A (en) * 1973-05-09 1975-08-12 Gen Electric Laminated multi-apertured electrode
US4200794A (en) * 1978-11-08 1980-04-29 Control Data Corporation Micro lens array and micro deflector assembly for fly's eye electron beam tubes using silicon components and techniques of fabrication and assembly
US4533794A (en) * 1983-05-23 1985-08-06 Beveridge Harold N Electrode for electrostatic transducer
US4902898A (en) * 1988-04-26 1990-02-20 Microelectronics Center Of North Carolina Wand optics column and associated array wand and charged particle source
US5155412A (en) * 1991-05-28 1992-10-13 International Business Machines Corporation Method for selectively scaling a field emission electron gun and device formed thereby
EP0545621B1 (en) * 1991-11-29 1995-09-06 Motorola, Inc. Method of forming a field emission device with integrally formed electrostatic lens
JP2000188068A (ja) * 1998-12-22 2000-07-04 Hitachi Ltd カラー陰極線管
US6741016B2 (en) * 2001-06-14 2004-05-25 Hewlett-Packard Development Company, L.P. Focusing lens for electron emitter with shield layer
KR100496643B1 (ko) * 2003-10-25 2005-06-20 한국전자통신연구원 마이크로칼럼 전자빔 장치의 자체정렬 적층 금속 박막전자빔 렌즈 및 그 제작방법
US7045794B1 (en) * 2004-06-18 2006-05-16 Novelx, Inc. Stacked lens structure and method of use thereof for preventing electrical breakdown
US7515253B2 (en) * 2005-01-12 2009-04-07 Kla-Tencor Technologies Corporation System for measuring a sample with a layer containing a periodic diffracting structure
JP5663717B2 (ja) * 2005-09-06 2015-02-04 カール ツァイス マイクロスコピー ゲーエムベーハーＣａｒｌ Ｚｅｉｓｓ Ｍｉｃｒｏｓｃｏｐｙ Ｇｍｂｈ 荷電粒子システム
JP5159035B2 (ja) 2005-10-28 2013-03-06 キヤノン株式会社 レンズアレイ及び該レンズアレイを含む荷電粒子線露光装置
TWI479530B (zh) * 2008-10-01 2015-04-01 Mapper Lithography Ip Bv 靜電透鏡結構、靜電透鏡陣列、帶電粒子的子束微影系統以及製造絕緣結構的方法
JP5428682B2 (ja) 2009-09-10 2014-02-26 株式会社リコー 画像形成装置ならびに画像形成システム
KR101041369B1 (ko) * 2009-11-19 2011-06-15 한국기초과학지원연구원 초고속 대량 시료 분석을 위한 장치 및 방법
JP2012195097A (ja) * 2011-03-15 2012-10-11 Canon Inc 荷電粒子線レンズおよびそれを用いた露光装置
JP5744579B2 (ja) * 2011-03-15 2015-07-08 キヤノン株式会社 荷電粒子線レンズおよびそれを用いた露光装置
JP5669636B2 (ja) * 2011-03-15 2015-02-12 キヤノン株式会社 荷電粒子線レンズおよびそれを用いた露光装置
JP5886663B2 (ja) * 2012-03-21 2016-03-16 株式会社日立ハイテクノロジーズ 電子線応用装置およびレンズアレイ
JP2013239667A (ja) * 2012-05-17 2013-11-28 Canon Inc 荷電粒子線静電レンズにおける電極とその製造方法、荷電粒子線静電レンズ、及び荷電粒子線露光装置

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58500306A (ja) * 1981-02-27 1983-02-24 ベ−コ　インスツルメンツ　インコ−ポレイテツド スクリ−ンレンズアレ−板の製造方法
JPH0562611A (ja) * 1991-09-05 1993-03-12 Hitachi Ltd 電子銃用板状電極を備えた陰極線管
JPH0814881A (ja) * 1994-06-28 1996-01-19 Nippon Steel Corp 三次元測定機による直径値算出方法
JPH08241688A (ja) * 1995-03-03 1996-09-17 Hitachi Ltd パターンイオンビーム投射装置
JP2001283756A (ja) * 2000-03-31 2001-10-12 Canon Inc 電子光学系アレイ、これを用いた荷電粒子線露光装置ならびにデバイス製造方法
JP2006162805A (ja) * 2004-12-03 2006-06-22 National Institutes Of Natural Sciences 位相差電子顕微鏡用位相板及びその製造方法並びに位相差電子顕微鏡
JP2010517233A (ja) * 2007-01-25 2010-05-20 エヌエフエイビー・リミテッド 改良された粒子ビーム発生装置

Also Published As

Publication number Publication date
WO2012124319A1 (en) 2012-09-20
US20140151570A1 (en) 2014-06-05
KR20130135335A (ko) 2013-12-10

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