JP2012174966A - Lead frame for semiconductor light-emitting device and manufacturing method therefor - Google Patents

Abstract

PROBLEM TO BE SOLVED: To solve such a problem of a lead frame where a cavity formed in a metal plate is filled with a filling resin that a clearance appears on the interface of the metal plate and the filling resin, and moisture infiltrates thereinto.SOLUTION: In the lead frame for semiconductor light-emitting device, a noble metal plating layer is formed on the surface of a metal plate exposed from a filling resin, and adhesion of the filling resin and the metal plate is enhanced when an oxide film on the surface of the metal plate in contact with the filling resin is bonded to the polar group of the filling resin thus preventing infiltration of moisture into a cavity between the filling resin and the metal plate.

Description

  The present invention relates to a lead frame for a semiconductor light-emitting device that carries and mounts a light-emitting element such as an LED (Light Emitting Diode), and a manufacturing method thereof.

  In general, a lead frame that constitutes a semiconductor light emitting device by supporting and mounting a semiconductor light emitting element such as an LED chip is a lead made of an alloy thin plate such as plate-like iron-nickel or copper-nickel-tin. A metal plate for a frame is manufactured by photoetching from one or both sides using an etchant such as ferric chloride, and a pad portion (island portion) for mounting a semiconductor light emitting element such as an LED chip; The pad portion is separated from the pad and is provided with a lead portion that is electrically connected to the semiconductor light emitting element.

  As a substrate for supporting a semiconductor light emitting element such as an LED chip, a ceramic substrate, a printed circuit board, or the like is used in addition to a lead frame made of an alloy thin plate. Patent Documents 1 to 5 describe a technique for mounting a semiconductor light emitting element such as an LED on a carrier.

  Patent Document 3 discloses a semiconductor light emitting device in which a noble metal plating layer is formed on the entire surface of a metal plate by performing wet plating on the entire metal plate of a lead frame, and light from an LED chip is reflected to increase brightness. Obtaining techniques are disclosed. In particular, a semiconductor that is plated on the lead frame from the metal plate side so that the first layer is Ni-plated, the second layer is Pd-plated, and the third layer is Rh-plated, so that the reflectivity is reduced little over time. A lead frame for a light emitting device is disclosed.

  Patent Document 4 discloses a semiconductor light emitting device provided on a lead frame having a cross frame provided on a lead frame base material, a light reflection ring provided so that a gap portion of the lead frame is filled with a resin and not in contact with the resin A semiconductor light-emitting device that reflects light from a light reflecting surface of a light reflecting ring is disclosed.

  Further, in Patent Document 5, the technique of Patent Document 3 and Patent Document 4 is combined to form a precious metal plating layer in a partial region on a pressed or etched metal plate, and the entire surface of the metal plate as a characteristic maintaining layer. A technique is disclosed in which a noble metal plating layer is formed on a metal plate and a resin is molded on the metal plate as a reflector that reflects light.

JP 2003-8071 A JP 2004-172160 A JP 2005-129970 A JP 2008-227166 A JP 2009-135355 A

However, the technique of Patent Document 5 has a drawback that the manufacturing cost is high because the noble metal plating layer is formed on the entire surface of the metal plate of the lead frame base. Further, after a noble metal plating layer is formed on the entire surface of the metal plate which is the base of the lead frame, a white resin with high light reflectance for a reflector (for example, a titanium oxide powder is contained in the resin to adjust the thermal expansion coefficient to white). When molded into a predetermined shape were mixed such fine particles such as SiO ₂₎ in order, the noble metal plating has a problem of low adhesion to the molded white resin.

  In an LED module, after mounting an LED chip on a lead frame molded with a white resin, the lead part and the LED chip are electrode-wired by wire bonding with a gold wire, and then a silicone-based transparent resin excellent in light transmittance, epoxy The LED chip and the gold wire are covered with a transparent resin. However, since the adhesion between the transparent resin and the molded white resin and the noble metal plating formed on the surface of the metal plate is poor, there is a problem that a gap is generated at the interface between the transparent resin and the white resin and the noble metal plating of the metal plate. . If the gap is formed, there is a problem that moisture, that is, water permeates through the gap and aggregates on the surface of the LED chip and corrodes the light emitting layer on the surface of the LED chip 10. That is, since the light emitting layer of the LED chip 10 is corroded, the light emission efficiency of the LED chip 10 is lowered, and there is a problem that long-term stability as an optical member is lowered. Sometimes, there is a problem that the luminous efficiency is significantly lower than the reference value, and the life may be lost.

  In addition, in the conventional technique, the precious metal plating is performed on the entire surface of the metal plate, and then the filling resin is filled. Then, a small amount of the filling resin that contaminates the surface of the precious metal plating is removed by the deburring process. In order to prevent plating peeling during the deburring process, a process requiring meticulous attention to remove the deburring in the plating region to a minimum is required. Further, as a result of the burr removal process, an inspection process requiring careful attention to confirm that no resin contamination remains on the surface of the noble metal plating is necessary. Furthermore, since a small amount of the precious metal plating is scraped off from the surface of the precious metal plating during the deburring process, it is necessary to use extra precious metal, and there is a problem that the amount of precious metal used increases and the manufacturing cost increases. .

  The present invention has been made in view of the above problems, and a gap is formed at the interface between the noble metal plating formed on the surface of the lead frame and the white resin so as to reflect light from the LED chip of the semiconductor light emitting device, and the gap is passed through the gap. The purpose is to solve the problem of moisture intrusion.

  As a result of diligent research to solve the above-mentioned problems, the following knowledge was obtained as the cause of the low adhesion between the noble metal plating and the molded white resin in the conventional technique. That is, since the noble metal plating layer does not form an oxide film on the surface, it is a resin containing a white oxide, which is a polar group such as epoxy, silicone resin, liquid crystal polymer resin, PPS resin, aromatic polyamide (PPA) resin. The knowledge that it will be inferior to adhesiveness was acquired. Based on this knowledge, the present invention forms an oxide film on the surface of the metal plate that is in contact with the white resin that is molded and filled in the gap between the metal plates. Thereby, by bonding the oxide film with the polar group of the white resin, the adhesion between the surface of the metal plate and the filling resin is improved.

That is, according to the present invention, a pad portion on which a semiconductor light emitting element is mounted and a lead portion electrically connected to the semiconductor light emitting element are formed of a metal plate, and a gap between the pad portion of the metal plate and the lead portion is formed. A lead frame for a semiconductor light emitting device, wherein a portion is filled with a filling resin, and the surface of the filling resin, the pad portion of the metal plate exposed from the filling resin, and the surface of the lead portion are formed flush with each other. And
A noble metal plating layer is formed on the surface of the metal plate exposed from the filling resin, and an oxide film on the surface of the metal plate in contact with the filling resin is bonded to a polar group of the filling resin to thereby form the filling resin and the metal. A lead frame for a semiconductor light-emitting device, wherein adhesion to a plate is enhanced to prevent moisture from entering a gap between the filling resin and the metal plate.

  The present invention is the above-described lead frame for a semiconductor light-emitting device, wherein the noble metal plating layer is a plating layer in which a plating portion protrudes in an overhang shape on the surface of the filling resin, and the overhang shape A lead frame for a semiconductor light-emitting device, wherein a plating portion blocks a gap at an interface between the filling resin and the noble metal plating layer, thereby preventing moisture from entering a gap between the filling resin and the metal plate. is there.

  Further, the present invention is the above lead frame for a semiconductor light emitting device, wherein the noble metal plating layer includes at least a silver plating layer on the metal plate side and a silver alloy plating layer on the silver plating layer. The silver alloy plating layer contains at least one of Zn, Au, Pd, Mg, Ce, Rh, Cu, In, and Sn as an X component, and the thickness of the silver alloy plating layer is the lower layer. A lead frame for a semiconductor light emitting device, wherein the lead frame is made thinner than a thickness of a silver plating layer.

  The present invention is the above-described lead frame for a semiconductor light emitting device, characterized in that a hard base plating layer and the noble metal plating layer are laminated on the base plating layer from the metal plate side. This is a lead frame for a semiconductor light emitting device.

According to the present invention, a pad portion on which a semiconductor light emitting element is mounted and a lead portion electrically connected to the semiconductor light emitting element are formed of a metal plate, and a gap portion between the pad portion and the lead portion of the metal plate A method of manufacturing a lead frame for a semiconductor light emitting device, in which a filling resin is filled, and the surface of the filling resin, the pad portion of the metal plate exposed from the filling resin, and the surface of the lead portion are formed flush with each other Because
From the step of forming the pad portion and the lead portion by etching a metal plate, the step of filling the gap portion between the pad portion and the lead portion of the metal plate with a filling resin, and the filling resin Forming a noble metal plating layer on the exposed surface of the metal plate;
By bonding an oxide film on the surface of the metal plate in contact with the filling resin to the polar group of the filling resin, the adhesion between the metal plate and the filling resin is enhanced, and moisture in the gap between the filling resin and the metal plate is increased. A lead frame manufacturing method for a semiconductor light-emitting device, which prevents entry.

Further, the present invention provides the above-described method for manufacturing a lead frame for a semiconductor light-emitting device, wherein the step of forming the noble metal plating overlies the surface of the metal plate exposed from the filler resin and the surface of the filler resin. It is a process of forming a noble metal plating layer with the plating part protruding in a hang shape,
Semiconductor light emission characterized in that the penetration of moisture into the gap between the filling resin and the metal plate is prevented by closing the gap at the interface between the filling resin and the noble metal plating layer with the overhanging plating portion It is a manufacturing method of a lead frame for a device.

  According to the present invention, the oxide film 1e is formed on the surface of the metal plate 1a in contact with the filling resin 4 that is molded and filled in the gap between the metal plates 1a, and the oxide film 1e and the polar group of the filling resin 4 are combined. By doing, there exists an effect which can improve the adhesiveness of the metal plate 1a and the filling resin 4. FIG. Thereby, there exists an effect which can avoid the permeation of the water | moisture content to the clearance gap between the filling resin 4 and the metal plate 1a.

  In addition, according to the present invention, a noble metal plating layer is formed on the surface of the metal plate 1 a exposed from the filling resin 4 of the lead frame 1, and the noble metal plating layer protrudes from the surface of the filling resin 4 in an overhang shape. Then, by filling the gap at the interface between the filling resin 4 and the noble metal plating layer with the overhanged plating portion H, it is possible to avoid the intrusion of moisture into the gap between the filling resin 4 and the metal plate 1a. effective.

Moreover, in this invention, when filling the metal plate 1a after the etching with the filling resin 4, a small amount of resin that leaks from the gap of the mold and covers the surface of the lead frame 1 is removed by mechanical or chemical treatment. Later, a noble metal plating layer is formed on the surface of a predetermined portion of the metal plate 1 a exposed from the filling resin 4. Therefore, the surface of the noble metal plating layer can be kept clean. In the present invention, since the noble metal plating layer is formed on the metal plate 1a after the filling resin 4 is filled, the deburring process is performed with such a strength that the resin contamination can be surely removed. It is not necessary to inspect the residual material, and the manufacturing cost can be reduced. Further, since the noble metal used for metal plating on the metal plate 1a is not scraped off by the deburring process, the amount of the noble metal used can be reduced, so that the manufacturing cost of the lead frame for a semiconductor light emitting device can be reduced.

It is a sectional side view of the lead frame for semiconductor light-emitting devices of this invention. It is a sectional side view of the lead frame for semiconductor light-emitting devices of this invention. It is sectional drawing which shows the layer structure of the noble metal plating layer given to the lead frame for semiconductor light-emitting devices of this invention. It is sectional drawing which shows the layer structure of the noble metal plating layer given to the lead frame for semiconductor light-emitting devices of this invention. It is a top view of the lead frame for semiconductor light emitting devices of the present invention. It is a top view of the semiconductor light emitting device LE obtained by dividing the lead frame for a semiconductor light emitting device of the present invention. It is X1-X1 side sectional drawing of the semiconductor light-emitting device LE using the lead frame for semiconductor light-emitting devices of this invention. It is X2-X2 sectional side view of the semiconductor light-emitting device LE using the lead frame for semiconductor light-emitting devices of this invention. It is a YY side sectional view of semiconductor light-emitting device LE using a lead frame for semiconductor light-emitting devices of the present invention. It is a sectional side view which shows the molding method of the filling resin to the lead frame for semiconductor light-emitting devices of this invention.

<First Embodiment>
A first embodiment of the present invention will be described with reference to FIGS. FIG. 1A shows a side cross-sectional view of the lead frame 1 before it is manufactured by etching the metal plate 1 a and filling the filling resin 4. FIG. 1B shows a side sectional view of the lead frame 1 after the filling resin 4 is filled. FIG. 1C shows a side sectional view of a lead frame 1 for a semiconductor light emitting device in which noble metal plating 1b is applied to the surface of the metal plate 1a exposed from the filling resin 4 after filling with the filling resin 4. FIG. The top view is shown. FIG. 2D shows a structure in which the LED chip 10 is installed on the lead frame 1 and wire bonding is performed to electrically connect the electrode terminal of the LED chip 10 and the lead frame 1 with the wire W. FIG. 2E shows a structure in which the LED chip 10 and the wire W are covered with the transparent resin 5. 3 and 4 are cross-sectional views showing the layer structure of the noble metal plating 1b formed on the upper and lower surfaces of the metal plate 1a of the lead frame 1 for the semiconductor light emitting device in FIG.

  FIG. 6 is a top view showing a semiconductor light emitting device LE obtained by dividing the lead frame for a semiconductor light emitting device of FIG. 2E into a plurality of pieces from a multi-faceted state. 7 is a side sectional view taken along line X1-X1 in FIG. 6, FIG. 8 is a side sectional view taken along line X2-X2 in FIG. 6, and FIG. 9 is taken along line YY in FIG. Side sectional views are shown respectively. FIG. 10 is a sectional side view showing a method for manufacturing a lead frame for a semiconductor light emitting device according to the present invention by molding.

(Lead frame structure)
A lead frame 1 shown in FIG. 1 (a) is formed by forming a pad portion 2 and a lead portion 2a on a sheet-like or strip-like metal plate 1a for each unit frame Z shown by a dotted line Z portion in FIG. The unit frames Z are formed in a sheet shape that is arranged in multiple directions in the vertical and horizontal directions.

  The lead frame 1 is manufactured by photo-etching a metal alloy metal plate 1a from the front side and the back side. As shown in FIG. 1A, the structure of the lead frame 1 is a surface side formed by photoetching a plate-like base material made of a metal alloy having a thickness t1 (for example, 0.2 mm) from both sides. The upper structure with a height t2 (for example, 0.1 mm) and the pattern of the lower structure on the back surface with a height t3 (for example, 0.1 mm). Integrally formed.

  The lead frame 1 uses a plate-like alloy thin plate such as iron-nickel or an alloy thin plate such as copper-nickel-tin as the metal plate 1a. However, it is preferable to use copper or a copper alloy having high thermal conductivity as the metal plate 1a. Since heat dissipation improves, it is preferable. As the other metal plate 1 a, a metal plate 1 a such as an aluminum alloy can be used as the material of the lead frame 1.

  As the metal plate 1a made of a plate-like metal alloy of the lead frame 1, a copper material having a thickness t1 (for example, 0.2 mm) is used, and a pattern of an etching resist layer having a thickness of 0.015 mm to 0.030 mm is formed on the metal plate. The lead frame 1 having the obtuse angle in the cross section of the upper and lower surfaces of the metal plate 1a as shown in FIG. 1A is manufactured by forming on both surfaces of the metal plate 1a and etching from both surfaces of the metal plate 1a. In the etching process, etching is performed using an etching solution in which an oxygen component is dissolved, so that the metal plate 1a is oxidized by the oxygen component. As a result, a thin oxide film 1e (shown in FIGS. 3 and 4) having a thickness of about 1 nm is formed on the surface of the metal plate 1a.

  FIG. 5 shows a planar pattern of the lead frame 1 together with the filling resin 4 filled therein. As shown in FIGS. 1A and 5, the pattern of the upper structure of the lead frame 1 having a height t2 is formed in the pad portion 2 and at one or a plurality of locations that are separated from each other at a predetermined interval. The lead part 2a is provided with a suspension bar 20 and a tie bar 30 for connecting them.

  That is, as shown in the plan view of FIG. 5, in order to prevent each unit frame Z of the lead frame 1 from being detached from the metal plate 1a after etching, a grid-like frame portion that connects the unit frames Z to each other. The tie bar 30 is formed. Further, by connecting the pad portion 2 and the lead portion 2a of the constituent elements of the 1 unit frame Z to the tie bar 30 by the suspension bar 20, the 1 unit frame Z is connected to the tie bar 30 as the frame portion. The suspension bar 20 prevents the pad portion 2 and the lead portion 2a from falling off the metal plate 1a after the etching process of the lead frame 1, and the pad portion 2 and the lead portion 2a are made into the metal plate 1a for a necessary period. Keep linked.

  Depending on the specifications, the unit frame Z and the tie bar 30 may be directly connected without forming the suspension bar 20.

  The pattern of the substructure of height t3 is a heat radiating portion 3 (heat radiating plate) integrated with the pad portion 2 on the back surface side and a heat radiating portion 3a (heat radiating plate) integrated with the lead portion 2a on the back surface side.

Even if the metal plate 1a is exposed to the atmosphere at room temperature, the oxide film 1e is formed on the surface thereof. For example, when the clean surface of the pure iron metal plate 1a is exposed to air at room temperature for 1 minute, an oxide film 1e having a thickness of 1.1 nm is formed. When the clean surface of the copper metal plate 1a is exposed to air at room temperature for 17 minutes, a copper oxide (Cu ₂ O) oxide film 1e having a thickness of 0.3 nm is formed.

Next, as shown in FIG. 1 (b), resin molding using a mold is performed on the metal plate 1a to fill the gap between the pad portion 2 and the lead portion 2a of the metal plate 1a. 4 is filled. Since the filling resin 4 has polar groups such as epoxy, silicone resin, liquid crystal polymer resin, PPS resin, and aromatic polyamide (PPA) resin, the polar group of the filling resin is formed on the metal plate 1a by these steps. Combined with the oxidized film 1e, the adhesion between the metal plate 1a and the filling resin 4 is excellent. That is, by bringing the filling resin 4 into contact with the oxide film 1e formed on the metal plate 1a, the adhesiveness at the interface between the filling resin 4 and the metal plate 1a is excellent, and the lead frame 1 with high moisture resistance can be obtained. effective.

  In this resin molding, the respective surfaces of the semiconductor light emitting element mounting surface A and the heat radiation back surface B of the pad portion 2 of the metal plate 1a, and the respective electrical connection areas C and the heat radiation back surface D of the lead portion 2a are formed. The exposed metal surface is exposed from the filling resin 4 and the surface of the filling resin 4 is formed to be flush with each other. The semiconductor light emitting element mounting surface A of the pad portion 2 and the surface of the electrical connection area C of the lead portion 2a are formed from the same metal plate of the lead frame 1 and are on the same plane and have the same height. is there.

  Further, the heat dissipation back surface B of the lower structure heat dissipating portion 3 (heat dissipating plate) integral with the back surface of the pad portion 2, and the heat dissipating back surface D of the heat dissipating portion 3a (heat dissipating plate) integral with the back surface of the lead portion 2a. Are on the same plane and have the same height.

(Cross sectional shape of precious metal plating layer on metal plate)
Next, as shown in FIG. 1C, a noble metal plating layer 1 b is formed on the surface of the metal plate 1 a exposed from the filling resin 4 after filling with the filling resin 4. 3 and 4 show the layer structure of the cross section of the metal plate 1a and the metal plating layer in the lead frame 1 of FIG. 1 (c). In FIG. 3A, a clean surface is formed on the surface (upper surface and lower surface) of the metal plate 1a exposed from the filling resin 4 of the lead frame 1 by removing the oxide film 1e on the surface of the metal plate 1a. Above, the noble metal plating layer 1b is formed on the surface. The noble metal plating 1b layer is made of one kind of noble metal such as Au, Ag, Pd, Rh or an alloy of two or more kinds of these noble metals, which is a noble metal having the die bonding property of the LED chip 10 and the wire bonding property by the gold wire W. A noble metal plating layer 1b having a thickness of 0.5 μm or more and 8 μm or less is formed by metal plating.

  Here, the noble metal plating layer 1b formed on the surface of the semiconductor light emitting element mounting surface A of the metal plate 1a increases the light reflectivity of the semiconductor light emitting element mounting surface A, and the light emitted from the LED chip 10 is emitted. The brightness of the semiconductor light emitting device LE can be increased by reflection. Thereby, there exists an effect which can utilize the light emitted from LED chip 10 efficiently. Further, the surface of the electrical connection area C is provided with the noble metal plating layer 1b, so that the connectivity when the LED chip 10 and the lead portion 2a are electrically connected by wire bonding or chip bonding is improved. To do.

  As shown in FIG. 3A, the noble metal plating layer 1 b is formed on the surface of the metal plate 1 a exposed from the filling resin 4 after filling with the filling resin 4. This causes the noble metal plating layer 1b to cover the boundary line portion P between the metal plate 1a and the filling resin 4 from the upper surface of the metal plate 1a as well as plating covering the surface of the metal plate 1a. As a result, an overhanging plating portion H is formed on the surface of the filling resin 4 so that the plating spreads to a distance corresponding to the thickness of the noble metal plating layer 1b.

  In this embodiment, the metal surface of the metal plate 1a exposed from the filling resin 4 after filling the filling resin 4 in the gap between the pad portion 2 and the lead portion 2a of the metal plate 1a by molding as described above. Only the noble metal plating layer 1b is formed, and no noble metal plating is formed on the side surface of the metal plate 1a, that is, the boundary portion between the metal plate 1a and the filling resin 4 as in the prior art. Is effective.

Further, in the present embodiment, the knowledge that the effect of preventing the penetration of moisture into the gap between the metal plate 1a and the filling resin 4 is increased by experiments by forming the overhang-shaped plating portion H on the noble metal plating layer 1b through experiments. Obtained. The reason why this effect is obtained is thought to be because a moisture permeation path through which moisture reaches the gap at the interface between the metal plate 1a and the filling resin 4 is added with a barrier that is blocked by the thickness of the overhanging plating portion H. That is, since the overhang-like plated portion H covers the boundary surface between the filling resin 4 and the metal plate 1a without a gap, the moisture transmission path reaching the gap between the moisture metal plate 1a and the filling resin 4 is blocked. This is thought to increase the effect of preventing moisture from entering.

(Modification 1)
As a modified example 1, as shown in FIG. 3B, the surface of the metal plate 1a exposed from the filling resin 4 (upper surface and lower surface) of the lead frame 1 is first coated with gloss or semi-gloss Ni (nickel). Forming a hard base plating layer 1c such as plating 1c or Co (cobalt) plating to form a part of the overhanging plating portion H with the base plating 1c, and forming a noble metal plating layer 1b thereon. Then, the remaining portion of the overhanging plating portion H is formed.

  That is, the filling resin 4 extends from the upper surface of the metal plate 1 a beyond the boundary line portion P between the metal plate and the resin by the base plating layer 1 c and the noble metal plating layer 1 b formed on the surface of the metal plate 1 a exposed from the filling resin 4. An overhang-like plated portion H in which plating spreads to a distance corresponding to the thickness of the base plating layer 1c and the noble metal plating layer 1b is formed on the surface of the substrate. The overhanging plating portion H covers the boundary line portion P between the metal plate and the resin.

  By providing this base plating layer 1c between the noble metal plating layer 1b and the metal plate 1a, the copper metal component of the metal plate 1a made of a copper alloy or the like is thermally diffused into the noble metal plating layer 1b such as silver plating, thereby precious metal plating layer. It has the effect of acting as a metal thermal diffusion barrier that prevents discoloration of 1b, can be formed with a thin film thickness of the noble metal plating layer 1b such as expensive silver plating, and the formation cost of the noble metal plating layer 1b such as silver plating can be reduced. There is an effect that can be reduced. In addition, the formation of the overhang-shaped plated portion H has an effect of preventing moisture from entering the gaps at the interface between the metal plate 1 a and the filling resin 4.

(Modification 2)
As a second modification, as shown in FIG. 4C, an overhang-like plated portion H is formed by forming a noble metal plating layer 1b by silver plating on the surface (upper surface and lower surface) of the metal plate 1a exposed from the filling resin 4. And at least one of Zn, Au, Pd, Mg, Ce, Rh, Cu, In, and Sn having sulfur resistance as an X component, and the content of the component is 0. A silver alloy plating layer of 1 wt% or more and 5 wt% or less, that is, an Ag—X alloy plating layer 1 d is formed.

  By the noble metal plating layer 1b and the Ag-X alloy plating layer 1d formed on the surface of the metal plate 1a exposed from the filling resin 4, the filling resin passes over the boundary line portion P between the metal plate and the resin from the upper surface of the metal plate 1a. An overhang-like plated portion H is formed on the surface of 4 where the plating spreads to a distance corresponding to the thickness of the noble metal plating layer 1b and the Ag-X alloy plating layer 1d. And the overhanging plating part H covers the boundary line part P of a metal plate and resin. By forming the overhang-shaped plated portion H, there is an effect of preventing moisture from entering the gaps at the interface between the metal plate 1 a and the filling resin 4.

  This Ag-X alloy plating layer 1d is formed by alloy plating on the surface of the noble metal plating layer 1b by silver plating. The Ag-X alloy is formed to a thickness of 0.02 μm or more and 3 μm or less on a film having a thickness equal to or less than the thickness of the noble metal plating layer 1b by silver plating.

The Ag-X alloy plating layer 1d containing an X component composed of one or more of Zn, Au, Pd, Mg, Ce, Rh, Cu, In, and Sn has a high reflectance and is contained in a small amount in silver. The X component suppresses the bond between the S (sulfur) component in the atmosphere and silver, thereby having good sulfidation resistance. Therefore, the Ag-X alloy plating layer 1d has an effect of protecting the surface of the noble metal plating layer 1b by silver plating, improving the sulfidation resistance of the plating film, and maintaining the high light reflectance of the plating film.

  Only the noble metal plating layer 1b formed by silver plating has a defect of being easily changed to black (sulfurized Ag) in combination with an extremely small amount of S component contained in the atmosphere. This is improved by forming an Ag-X alloy plating layer 1d on the surface of the plating layer 1b to form two plating layers that are protected from the atmosphere. Thereby, there is an effect that the high light reflectance of the noble metal plating layer 1b by silver plating can be maintained in the atmosphere for a long time.

  The film of the Ag-X alloy plating layer 1d containing these X components is hard and has a problem of being easily damaged when stress is applied. In the second modification, the thickness of the Ag-X alloy plating layer 1d is silver-plated. By forming the surface of the noble metal plating layer 1b by silver plating to be equal to or less than the thickness of the noble metal plating layer 1b, the stress applied to the Ag-X alloy plating layer 1d becomes the cushion of the noble metal plating layer 1b by the underlying silver plating. By absorbing it, there is an effect that the hard Ag-X alloy plating layer 1d can be improved due to stress.

  In particular, in Modification 2, the lattice constant close to the lattice constant of the silver crystals of the noble metal plating layer 1b by the underlying silver plating is obtained by setting the content of the X component of the Ag-X alloy plating layer 1d to 5 wt% or less. By forming the Ag-X alloy plating layer 1d on the film, the Ag-X alloy plating layer 1d is well adapted to the noble metal plating layer 1b by the underlying silver plating and the Ag-X alloy plating layer 1d and the noble metal plating by silver plating There is an effect that the layers 1b can be integrated so that they are strongly bonded and do not peel at the interface.

  That is, when the X component is 0.1 wt% or more and 5 wt% or less, and the thickness of the Ag—X alloy plating layer 1 d is 0.02 μm or more and 3 μm or less, the sulfidation resistance is improved and the wire bonding property is improved. Maintained.

  The reason why the wire bonding property is maintained in Modification 2 is as follows. That is, when the gold wire W is wire-bonded from the surface of the Ag-X alloy plating layer 1d, the gold wire W breaks through the Ag-X alloy plating layer 1d which is thinner than the noble metal plating layer 1b by silver plating. It reaches the noble metal plating layer 1b by plating and is directly joined to the noble metal plating layer 1b by silver plating. In this way, by making the thickness of the Ag-X alloy plating layer 1d thinner than the thickness of the noble metal plating layer 1b by silver plating, the wire W for wire bonding breaks through the thin film of the Ag-X alloy plating layer 1d to form silver. It reaches the noble metal plating layer 1b by plating and can be directly bonded to the noble metal plating layer 1b by silver plating, so that the bonding portion of the wire W can be strongly bonded.

  In addition to the effects described above, the Ag-X alloy plating layer 1d protects the surface of the noble metal plating layer 1b by silver plating and suppresses the ionization of silver, so that the silver of the noble metal plating layer 1b by silver plating can be used. This has the effect of suppressing the migration.

(Modification 3)
As a third modification, three metal plating layers are formed on the surface (upper surface and lower surface) of the metal plate 1a exposed from the filling resin 4 as shown in FIG. That is, a hard base plating layer 1c such as Ni (nickel) plating or Co (cobalt) plating is first formed on the surface (upper surface and lower surface) of the metal plate 1a, and a noble metal plating layer 1b is formed thereon by silver plating. Furthermore, Ag-X, which is a silver alloy plating layer containing one or more of Zn, Au, Pd, Mg, Ce, Rh, Cu, In, and Sn having sulfur resistance as the X component. An alloy plating layer 1d is formed. Modification 3 has a configuration in which Modification 1 and Modification 2 are combined, and an effect obtained by adding the effect of Modification 2 to the effect of Modification 1 can be obtained.

(Semiconductor light emitting device LE)
(LED chip mounting)
Next, as shown in FIG. 2D, for the sheet-like lead frame 1 to which the one unit frame Z is connected, the surface A for mounting the semiconductor light emitting element of the pad portion 2 of the metal plate 1a of the lead frame. An LED chip (semiconductor light emitting element) 10 is mounted thereon. The thickness of the LED chip 10 is about 0.05 mm to 0.1 mm.

  Next, the wire W of the gold wire is connected to the electrode terminal on the LED chip 10 and the electrical contact area C of the lead portion 2a by wire bonding. Thereby, the LED chip 10 and the lead part 2a are electrically connected. Next, as shown in FIG. The LED chip 10 and the wire W are covered with the transparent resin 5.

(Division into pieces)
Next, as shown in FIG. 5, the sheet-like lead frame 1 on which the LED chip 10 is mounted for each unit frame Z is divided into front, back, left, and right by dividing lines BX and BY of the unit frame Z. Divide into The divided pieces become individual semiconductor light emitting devices LE. 6 to 9 are views showing the semiconductor light emitting device LE obtained by dividing the lead frame for the semiconductor light emitting device of FIG. 2E into pieces, FIG. 6 is a top view thereof, and FIG. 7 to FIG. 9 is a side sectional view thereof.

(Detailed shape of the metal plate after etching)
As shown in FIG. 7, the etched metal plate 1 a of the lead frame 1 of the present embodiment has a semiconductor light emitting element mounting surface A on the surface (upper surface) of the pad portion 2 and an area S <b> 1 for mounting the LED chip 10. Have

  In the pad part 2, the heat-dissipating back surface B (heat dissipating plate) of the heat dissipating part 3 on the back surface side facing the upper structure dissipates drive heat generated from the LED chip 10 main body and ambient environment conditions of the LED chip 10. Thus, the IC chip 10 has an area S2 for dissipating heat from the back side of the pad portion 2 to the outside so as not to accumulate heat.

  The relationship between the area S1 of the semiconductor light emitting element mounting surface A of the pad portion 2 of the lead frame 1 and the area S2 of the heat radiating back surface B facing the semiconductor light emitting element mounting surface A of the pad portion 2 is 0 <S1. <S2 is set such that the area of the heat-dissipating back surface B is larger than the area of the semiconductor light-emitting element mounting surface A. By doing in this way, the heat radiation part can be set widely and there exists an effect that the semiconductor light-emitting device LE excellent in heat dissipation is obtained.

  In addition, the side surface portion of the upper structure of the pad portion 2 and the lead portion 2a of the lead frame 1 has a lower structure from the surface of the upper structure (the surface including the semiconductor light emitting element mounting surface A and the electrical connection area C). A stepped portion or a tapered portion E that extends in the direction of the back surface (the surface including the heat dissipating back surface B and the heat dissipating back surface D) is formed. This stepped portion or tapered portion E holds the filled resin 4 during resin molding.

  Tapered portions E1 extending from the back surface side of the lower structure to the front surface side of the upper structure are formed on the side surfaces of the heat radiation portions 3 and 3a of the lower structure of the pad portion 2 and the lead portion 2a of the lead frame 1. The tapered portion E1 holds the filling resin 4 at the time of resin molding.

  Further, in the lead frame 1 of the present embodiment, as shown in FIG. 1, in the lead portion 2a, for example, the upper structure has a height t2 (= 0.1 mm) and the lower structure has a height t3 (= 0.1 mm). The lead portion 2a, which is integrated with the heat radiating portion 3a (heat radiating plate), is separated from the pad portion 2 where the upper structure with the height t2 and the lower structure with the height t3 are integrated with one or more places. In preparation.

  The electrical connection area C on the surface of the lead portion 2a shown in FIG. 8 is a surface having the same height as the semiconductor light emitting element mounting surface A of the pad portion 2, and the wire W of the gold wire for electrical wiring with the LED chip 10 is provided. This is a region to be a wire bonding region to be bonded, and its area is S3. The surface of the heat radiating portion 3a facing the electrical connection area C of the lead portion 2a is a heat radiating back surface D (heat radiating plate), and its area is S4.

  The relationship between the area S3 of the electrical connection area C of the lead frame 1 and the area S4 of the heat dissipating back surface D is 0 <S3 <S4. That is, the area of the heat radiating back surface D is set larger than the area of the electrical connection area C to be wire bonded. By doing in this way, the heat radiation part can be set widely and there exists an effect that the semiconductor light-emitting device LE excellent in heat dissipation is obtained.

  Then, on the side surface side of the lead portion 2a of the upper structure between the electrical connection area C and the heat radiating back surface D, a stepped portion or a tapered portion that extends from the electrical connection area C in the direction of the heat radiating back surface D. E is formed, and the filling resin 4 at the time of resin molding is held so as not to drop in the direction from the frame front side to the back side. On the other hand, a tapered portion E1 extending from the heat dissipating back surface D toward the electrical connection area C is formed on the side surface portion of the heat dissipating portion 3 (heat dissipating plate) of the lower structure, and the filling resin 4 at the time of resin molding is framed. It keeps so that it may not drop out from the back side to the front side.

  In this lead frame 1, the taper portion E of the upper structure portion has a taper shape, for example, and the taper portion E1 of the lower structure portion has, for example, an inverted C shape, an upper structure portion, and a lower structure. The taper direction of each part is the opposite direction. Therefore, for example, the filling resin 4 at a portion sandwiched between the pad portion 2 and the lead portion 2a is between the upper surface (surface on the upper structure portion side) and the lower surface (surface on the lower structure portion side). It has a constricted portion, and has a drum shape (or hourglass shape) in a cross-sectional view as shown in FIG. Since the lead frame 1 holds the filling resin 4 on the side surfaces which are respectively tapered in the opposite direction above and below the constricted portion, there is an effect of preventing the filling resin 4 from falling off the lead frame 1.

  In the lead frame 1, a pad portion 2 for mounting the LED chip 10 is formed so as to overlap the heat radiating portion 3 of the lower structure, and a lead portion 2a separated from the pad portion 2 is overlapped with the heat radiating portion 3a of the lower structure. They are formed to be flat and connected by a suspension bar 20 and a tie bar 30 formed as shown in the side view of FIG. 1A and the plan view of FIG. As shown in the side view of FIG. 1 (a), the suspension bar 20 and the tie bar 30 are formed by the upper structure of the lead frame 1, and in the region where it overlaps the heat dissipating part 3 or the heat dissipating part 3a of the lower structure, In other areas, the lead frame 1 is formed only by the upper structure.

(Lead frame manufacturing method)
Next, the method for manufacturing the lead frame for the semiconductor light emitting device according to the present embodiment will be explained.
(Metal plate etching process)
First, a photoresist (photosensitive resin) is applied to the surface of a metal plate 1a made of an alloy thin plate such as iron-nickel or a metal alloy such as copper-nickel-tin to form a photoresist layer. Next, in order to form a resist pattern on the surface A for mounting the semiconductor light emitting element composed of the area S1 of the pad portion 2, the electrical connection area C composed of the area S3 of the lead portion 2a, and the portion where the suspension bar 20 and tie bar 30 are formed. Then, the pattern is exposed on the photoresist layer through a photomask for pattern exposure having a predetermined pattern.

Next, the photoresist layer is developed and, if necessary, hardened. As a result, the photoresist is developed and removed, leaving the portions to be the electrical connection area C of the semiconductor light emitting element mounting surface A and the lead portion 2a of the pad portion 2 and the portions to be the suspension bar 20 and the tie bar 30. Then, a resist pattern is formed on the portion of the pad portion 2 where the semiconductor light emitting element mounting surface A is formed, the electrical connection area C of the lead portion 2a, and the portion where the suspension bar 20 and the tie bar 30 are formed.

  Similarly, after a photoresist is applied to the back surface of the metal plate 1a to form a photoresist layer, a series of processes such as pattern exposure and development are performed. In the pattern exposure, the pattern for forming the heat radiation back surface B composed of the area S2 of the heat radiation portion 3 and the heat radiation back surface D composed of the area S4 of the heat radiation portion 3a are exposed and then developed. As a result, a resist pattern is formed in which the photoresist is developed and removed, leaving a portion that becomes the heat radiating back surface B of the heat radiating portion 3 and a portion that becomes the heat radiating back surface D of the heat radiating portion 3a.

  Next, a corrosion-resistant resin film is attached to the back surface of the metal plate 1a, and the photoresist non-formed portion on the surface from the surface side of the metal plate 1a has a predetermined depth (height t2 shown in FIG. 1 (a)). Etching process (half etching process) is performed using an etchant such as ferric chloride. Next, a resin film for corrosion resistance is stuck on the surface after washing.

  Next, the anti-corrosion resin film on the back surface of the metal plate 1a is peeled off, and from the back surface side of the metal plate 1a, the non-photoresist-formed portion on the back surface reaches a predetermined depth (depth t3 shown in FIG. 1 (a)). Etching is performed using an etchant such as ferric chloride. Thereby, as shown in FIG. 1A, a lead frame 1 is formed in which a penetrating portion is formed in a metal portion where a resist pattern corresponding to each of the front surface and the back surface is not formed.

  In the above description, the etching process for forming the lead frame 1 is performed once on each of the front and back surfaces, a total of two times. However, the etching process is performed on the metal plate 1a by one etching from the front and back simultaneously. It doesn't matter.

  When the lead frame 1 is formed by etching by the above processing, the metal plate 1a portion exposed from the resist pattern is isotropically etched. Therefore, by performing etching from both surfaces of the metal plate 1a, the lead frame 1 in which the taper direction of the tapered portion E and the taper direction of the tapered portion E1 are reversed is obtained.

  That is, the filling resin that fills the side surface portion of the pad portion between the semiconductor light emitting element mounting surface A and the heat radiation back surface B from the semiconductor light emitting element mounting surface A toward the heat radiation back surface B during molding. A stepped portion E or a tapered portion E for holding 4 is formed. In addition, on the side surface side of the lead portion 2a between the electrical connection area C and the heat radiation back surface D, a filling resin 4 that is filled from the electrical connection area C in the direction of the heat radiation back surface D is filled. The lead frame 1 in which the stepped portion E or the tapered portion E for holding is formed.

(Molding process of filled resin)
Next, as described below, the filling resin 4 is formed on the lead frame 1 formed in this manner by resin molding using a mold, as shown in FIG. The lead frame 1 filled with the filling resin 4 so that the respective surfaces of the front surface A for mounting the semiconductor light emitting element and the rear surface B for heat dissipation, and the respective surfaces of the electrical connection area C and the rear surface D for heat dissipation are exposed from the filling resin 4. Manufacturing.

As a mold used for resin molding, a mold in which a concave portion having a predetermined internal shape for accommodating the lead frame 1 is formed in advance as shown in FIG. As shown in FIG. 10, the mold is configured such that a pair of molds is formed by a plate-shaped upper mold 40 and a lower mold 41 serving as a lid. Lower mold 41
In this case, an inlet 42 for injecting the filling resin 4 to be melted and a recess 43 into which the lead frame 1 can be loaded are formed as internal spaces.

  The upper mold 40 has a light reflecting ring recess 40a having a depth of about 0.3 mm, which is a mold for forming a light reflecting ring 4a having a height of about 0.3 mm on the top of the filling resin 4. It is formed as a space.

  In resin molding, first, the lead frame 1 is loaded in the concave portion 43 of the lower mold 41, and then the upper mold 40 is covered with a lid on the lower mold 41 and clamped.

  Next, the filling resin 4 heated and melted is injected into the internal space between the concave portion 43 and the light reflecting ring concave portion 40a from the injection port 42, and the filled resin 4 is molded into the loaded lead frame 1 and molded. A lead frame filled with is obtained.

  Here, when the filling resin 4 is injected into the mold, in the lead frame 1, from the 1 unit frame Z in the vicinity of the resin injection port 42 to the 1 unit frame Z in a part away from the injection port, The resin flows in sequence and is molded with resin.

  Further, the depth of the recess 43 (the height of the internal space) of the lower mold 41 is substantially the same as the thickness of the lead frame 1 so that the filling resin 4 does not adhere to the front and back surfaces of the lead frame 1 during resin molding. Form. Thereby, when the lead frame 1 is loaded in the mold, the surface of the lead frame 1 is brought into close contact with the surface of the upper mold 40 and the back surface thereof is brought into close contact with the surface of the lower mold 41.

  This prevents the resin from adhering to the front and back surfaces of the lead frame 1 when the resin is injected into the recess (internal space), and the surface of the lead frame 1 (the surface A for mounting the semiconductor light emitting element, the electric Target connection area) and back surface (back surface for heat dissipation) are exposed from the filling resin 4 respectively.

  Thereby, the filling resin 4 extends from the height of the electrical connection area C between the semiconductor light emitting element mounting surface A of the pad portion 2 and the lead portion 2a to the height of the heat radiation back surface B and the heat radiation back surface D facing each other. The lead frame 1 having a thickness within the range is filled and molded.

  Further, in this way, the filling resin 4 is injected into the light reflecting ring recess 40a formed in the upper mold 40, and the filling resin 4 is formed into the shape of the light reflecting ring 4a. That is, in the upper mold 40, the light reflecting ring 4a is integrated with the filling resin 4 from the height of the semiconductor light emitting element mounting surface A and the electrical connection area C to the height of the heat radiating back surface B and the heat radiating back surface D. The structure is formed so as to protrude above the upper surface of the lead frame 1.

  As a result, as shown in FIG. 1B, the light reflecting ring 4 a formed by projecting on the upper surface of the lead frame 1 by the filling resin 4 formed by this resin mold, and the upper and lower surfaces of the lead frame 1. A lead frame for a semiconductor light emitting device is formed with a structure integrated with the space between them and the filling resin 4.

  That is, the light reflecting ring 4a and the filling resin 4 filled between the pad portion 2 and the lead portion 2a of the lead frame 1 are integrally formed, and there is no resin interface between them.

  Therefore, the light reflecting ring 4a of the filling resin 4 and the main body of the filling resin 4 are firmly connected and have high adhesion. In addition, since there is no interface between the light reflecting ring 4a and the main body of the filling resin 4, water vapor does not diffuse at the interface and is not easily peeled off, and the effect of obtaining the light reflecting ring 4a with high connection reliability can be obtained. is there. Furthermore, since the light reflecting ring 4a is formed at the same time as the other filling portions of the filling resin 4, only one resin molding is required.

  As for the shape of the reflection ring 4a formed of the filling resin 4, as shown in FIGS. 6 to 9, a mortar-shaped slope is formed on the lead frame 1 on the outside of the lead portion 2a and surrounding the central circular region. It forms in the shape of the outer wall which has.

  That is, as shown in FIG. 6, a circular central region in a plan view centering on the light emitting portion (LED) of the installed LED chip 10 is surrounded by a mortar-shaped inclined surface of the filling resin 4. And the upper part of the inclined surface outside the inclined surface is formed in a flat plate shape. Dividing lines BX and BY into pieces are set in the plateau area.

  Alternatively, the upper part of the inclined surface outside the mortar-shaped slope may be formed on a flat plateau with a certain width, and the outside thereof may be formed on the concentric wall surface outside the light reflecting ring 4a. That is, the filling resin 4 outside the outer wall surface of the light reflecting ring 4 a may be set to the same height as the height of the upper surface of the metal plate 1 a of the lead frame 1.

  The specific shape of the inner peripheral surface of the light reflecting ring 4a of the filling resin 4 may be a conical surface, an elliptical conical surface, a spherical surface, or a part of a paraboloid so that light can be efficiently reflected. The shape of the light reflecting ring 4a in a plan view is not limited to an annular shape, and may be formed in an elliptical annular shape centering on the light emitting portion of the LED chip 10. Further, if the light emitting part is close to the center of the annular ring, the center of the circular ring that is the light reflecting ring 4a may be slightly shifted from the light emitting part.

  The cross-sectional shape of the inclined surface of the light reflecting ring 4a is 30 degrees from the surface formed by the semiconductor light emitting element mounting surface A and the electrical connection area C on the inner peripheral surface that is the inclined surface facing the light emitting portion of the LED chip 10. It is formed on a slope inclined by 85 degrees. Thereby, the reflected light incident on the inclined surface of the light reflecting ring 4a can be efficiently re-reflected, and further, the light emitted from the LED chip 10 is directly incident on the inclined surface of the light reflecting ring 4a. Even in this case, incident light can be efficiently reflected outward.

  As the filling resin 4 used in this molding, it is desirable to use a white resin having a high light reflection efficiency. In addition, it is also desirable that the filling resin 4 has heat resistance, light resistance, thermal conductivity, and high light diffusibility. As the filling resin, a thermoplastic resin or a thermosetting resin can be used. Therefore, as the filling resin 4, for example, an epoxy resin, a modified epoxy resin, a silsesquioxane resin, a silicone resin, an acrylic resin, a polycarbonate resin, an aromatic polyester resin (unsaturated polyester resin), a polyamide resin (aromatic) Organic polymer materials such as polyamide (PPA)), polyphthalamide (PPA), liquid crystal polymer (LCP), and cycloolefin resin are desirable, and one kind of resin or a mixed resin of plural kinds of resins may be used. .

Further, as the filling resin 4, it is desirable to use a light diffusing resin obtained by mixing an additive of a powdery substance with a resin mainly composed of the above-mentioned one kind of resin or a mixed resin of plural kinds of resins. Examples of the additive added to the filling resin 4 include fine particles such as white powder such as SiO ₂ , TiO ₂ , Al ₂ O ₃ , zirconium oxide, lead oxide, ceramic material, or a mixture thereof, and the main resin In the present invention, the mixing ratio of the additive with respect to can be set as appropriate. For example, it is 1% to 20% or more. Such a filling resin 4 has an effect that the light diffusibility can be enhanced by the additive. At the same time, the filling resin 4 can have a refractive index n of 2 or more by its additive. Thereby, a refractive index can be made higher than the transparent resin 5 formed on the filling resin 4 later. Due to the difference in refractive index, there is an effect of obtaining high light reflectivity at the boundary surface between the filling resin 4 and the transparent resin 5. As an example of the filling resin 4, a filling resin 4 containing white TiO ₂ powder to be white and containing SiO ₂ powder to adjust the thermal expansion coefficient can be configured.

  As shown in FIG. 1 (a), the upper portion of the pad portion 2 and the lead portion 2a of the upper structure of each unit frame Z formed on the lead frame 1 is formed on the lower structure of the height t3. The height of the lower structure with respect to the back surface is t1 which is substantially the same as the thickness of the metal plate 1a. On the other hand, the thickness of the suspension bar 20 and the tie bar 30 is set to the height t2 of the superstructure which is thinner than the thickness t1 of the metal plate 1a.

  Thereby, at the time of injection | pouring of the filling resin 4, resin can flow through the clearance gap made between the suspension bar 20, the tie bar 30, and the metal mold | die, the flow of resin is not prevented, and the effect which is not dammed is carried out. is there. As a result, the lead frame 1 can be molded without introducing bubbles into the filling resin 4, and the quality of the lead frame for a semiconductor light emitting device can be improved.

In addition, the filling resin 4 has a refractive index n of 2 or more due to the additive, and the relationship between the light refractive index n1 of the filling resin 4 and the light refractive index n2 of the transparent resin 5 satisfies n1> n2. Due to the difference in refractive index, there is an effect of obtaining high light reflectivity at the boundary surface between the filling resin 4 and the transparent resin 5. The greater the difference in refractive index, the higher the light reflection. The refractive index of a normal resin is approximately 2 or less, and there is a limit to increase the difference in refractive index using only the resin, but the filler resin 4 contains, as additives, SiO ₂ , TiO ₂ , Al ₂ O ₃ , oxidation By adding fine particles such as zirconium, a ceramic material, or a mixture thereof and adding a mixing ratio of the additive to the main resin, for example, 1% to 20% or more, the refractive index of the filling resin 4 is set to 2 or more. The refractive index difference with the transparent resin 5 can be increased. Accordingly, there is an effect that high light reflectivity at the boundary surface between the filling resin 4 and the transparent resin 5 can be obtained.

  Thus, by making the filling resin 4 have a high light reflectance, it is possible to efficiently emit the light emitted from the LED chip 10 to the outside. Furthermore, it is also preferable to coat the surface of the filling resin 4 with a ceramic ink or the like having an excellent light reflectance in order to efficiently use the light emitted from the LED chip 10.

  After filling the filling resin 4 into the gap of the metal plate 1 a of the lead frame 1 and molding, the upper mold 40 is removed, and the lead frame filled with the resin is taken out from the lower mold 41. Thereby, as shown in FIG. 1B, the filling resin 4 is filled between the pad portion 2 and the lead portion 2 a of the lead frame 1, and a layer of the filling resin 4 is formed under the tie bar 30 and the suspension bar 20. Then, the front surface A for mounting the semiconductor light emitting element and the rear surface B for heat dissipation, and the electrical connection area C and the rear surface D for heat dissipation on the surface of the metal plate 1a are exposed from the filling resin 4 to the outer surface. A lead frame for a semiconductor light emitting device is formed in which the exposed metal surface and the surface of the filling resin 4 are flush with each other.

(Resin deburring process)
When the filling resin 4 is filled in the gap of the metal plate 1a by molding with a mold, a small amount of resin leaks from the gap of the mold and covers the lead frame surface outside a predetermined area. Therefore, the resin that thinly covers the surface of the metal plate 1a is removed by a mechanical or chemical operation in the resin burr removing step after the molding step of the filling resin 4.

(Metal plating process)
Next, as shown in FIG. 4 (d), the surface of the metal plate 1a exposed from the filling resin 4 is hard such as glossy or semi-glossy Ni (nickel) plating or Co (cobalt) plating with excellent heat diffusion resistance. The underlying plating layer 1c is formed to a thickness of 0.5 to 8 μm.

In particular, according to the manufacturing method in which the metal plating layer is formed on the surface of the metal plate 1a exposed from the filling resin 4 after filling the gaps of the metal plate 1a with the filling resin 4, when the filling resin 4 is filled, When the filling resin 4 remains thinly on a part of the surface of the metal plate 1a, the metal plating layer is not formed on that part of the surface of the metal plate 1a, so the filling resin 4 remains on the surface of the metal plate 1a. As a result, the contamination can be easily verified, and as a result, there is an advantage that the productivity is excellent.

  Next, a noble metal plating layer 1b by silver plating having a thickness of 0.5 to 8 μm is formed on the base plating layer 1c. Then, on the noble metal plating layer 1b by silver plating, as the X component, one or more of sulfur-resistant components of Zn, Au, Pd, Mg, Ce, Rh, Cu, In, and Sn are contained, and the X component The Ag—X alloy plating layer 1d having a content of 0.1 wt% or more and 5 wt% or less is thinner than the noble metal plating layer 1 b formed by silver plating, and is provided at about 0.02 μm to 3 μm. As a result, a metal plating film having a thickness of 3 μm to 10 μm is provided from the surface of the metal plate 1a.

  During the formation of the metal plating film, an overhang-shaped plating portion H is formed that protrudes outward from the contour line of the metal surface of the metal plate 1 a exposed from the filling resin 4.

  By providing the base plating layer 1c between the noble metal plating layer 1b by silver plating and the metal plate 1a, the copper metal component of the metal plate 1a made of a copper alloy or the like is thermally diffused into the noble metal plating layer 1b by silver plating, so that silver It has the effect of acting as a metal thermal diffusion barrier that prevents discoloration of the noble metal plating layer 1b by plating, and can reduce the thickness of the noble metal plating layer 1b by expensive silver plating. There is an effect that the formation cost can be reduced.

  The lead having the electrical connection area C for electrical connection between one or a plurality of pad portions 2 on which the LED chip 10 is mounted and the LED chip 10 by the metal plating layer forming process on the lead frame 1 described above. A lead frame for a semiconductor light emitting device having the portion 2a on the same plane is obtained.

  In this embodiment, the example in which the noble metal plating 1b is performed on both surfaces of the metal plate 1a is described. However, the noble metal plating 1b may be performed only on the surface of the metal plate 1a on the mounting surface side of the LED chip 10. .

(Modification 4)
As a modified example 4, among the three plating layers formed on the surface of the metal plate 1a, the uppermost Ag-X alloy plating layer 1d is formed by vapor deposition or sputtering on the surface of the noble metal plating layer 1b by silver plating. Alternatively, an Ag component is formed by dry plating such as ion plating, and the Ag-X alloy plating layer 1d is formed by heating and thermally diffusing the X component in the noble metal plating layer 1b by the underlying silver plating. Is also possible. In particular, the X component of 1/30 of the amount of silver used for the Ag-X alloy plating layer 1d is formed on the surface of the noble metal plating layer 1b by silver plating, and heated to form the X component as the underlying silver plating. The target Ag-X alloy plating layer 1d can be formed on the surface of the noble metal plating layer 1b by silver plating by thermally diffusing to the noble metal plating layer 1b.

(Modification 5)
As a modified example 5, among the three plating layers formed on the surface of the metal plate 1a, as a method of forming the uppermost Ag-X alloy plating layer 1d, a Ce-based luster is applied to the surface of the noble metal plating layer 1b by silver plating. An Ag—X alloy plating layer 1d containing a mixed component of Zn and Ce as an X component is formed by wet plating using a low cyan silver plating solution containing an agent and a Zn component.

  Modification 5 includes Ce as a brightening agent, so that the surface of the Ag—X alloy plating layer 1 d is smoothed, and the reflection efficiency of light emitted from the LED chip 10 can be increased.

(Modification 6)
As a modified example 6, of the three plating layers formed on the surface of the metal plate 1a, as the lowermost base plating layer 1c, the surface of the metal plate 1a has a strike excellent in sulfur resistance such as Au, Pd, Zn. By providing a plating thickness of 0.02 μm to 0.5 μm, the base plating layer 1c is formed, and the two metal plating layers described above are formed on the base plating layer 1c.

  That is, a noble metal plating layer 1b by silver plating of 0.5 to 8 [mu] m is provided on the base plating layer 1c, and the thickness of the Ag-X alloy plating layer 1d is further set on the noble metal plating layer 1b by silver plating. Also, the thickness is about 0.02 μm to 3 μm.

  Thereby, in the modified example 6, the noble metal plating layer 1b by silver plating is protected from the surface side by the Ag-X alloy plating layer 1d, and the metal plate 1a side is protected by the base plating layer 1c made of strike plating. The metal component such as copper on the 1a side is effectively diffused into the noble metal plating layer 1b by silver plating and discolors the noble metal plating layer 1b by silver plating. Both sides can be protected to prevent sulfidation.

(LED chip mounting process)
The LED chip 10 is attached (die-bonded) to the upper surface of the pad portion 2 of the lead frame for a semiconductor light emitting device thus obtained, for example, with a conductive adhesive, and then the terminal on the upper surface of the LED chip 10 and the other lead are connected with a wire bonder The LED chip 10 and the lead frame 1 are electrically connected by wire bonding a wire W such as a gold wire to the electrical connection area C on the upper surface of the portion 2a. Thus, the LED chip 10 is mounted on the semiconductor light emitting device lead frame.

(Transparent resin molding process)
Next, as shown in FIG. 2E, the semiconductor light emitting element mounting surface of the pad portion 2 is formed by performing resin molding using a mold on the lead frame for the semiconductor light emitting device on which the LED chip 10 is mounted. The LED chip 10 on the upper surface side from A and the upper surface side from the electrical connection area C of the lead portion 2a, the wire W of the gold wire bonded to the electrical connection area C, and the transparent resin 5 covering the light reflecting ring 4a Form.

  As the transparent resin 5, a resin having good transparency such as a light-transmitting acrylic resin (polymetamethyl acrylate resin), a silicone-based transparent resin, and an epoxy-based transparent resin is used. Thereby, when the LED chip 10 emits light in a state where it is embedded in the transparent resin layer 5, the light emitted from the LED chip 10 has a high optical gain property when emitted from the transparent resin 5 to the outside. be able to. In addition, in FIG.2 (e), although the transparent resin 5 is formed in the layer form, you may form in a dome shape.

(Division process into individual pieces)
Next, as shown in FIG. 5, the sheet-like lead frame 1 on which the LED chip 10 is mounted is divided into individual pieces by dividing the sheet-like lead frame 1 into individual pieces by dividing lines BX and BY into individual pieces. A semiconductor light emitting device LE is manufactured.

  The present invention is not limited to the above embodiment, and the light reflecting ring 4a is not integrally formed with the filling resin 4, but the light reflecting ring 4a formed separately is bonded to the lead frame, and the lead for the semiconductor light emitting device. A frame may be formed. Alternatively, it is possible to form a lead frame for a semiconductor light emitting device that does not form the light reflecting ring 4a.

DESCRIPTION OF SYMBOLS 1 ... Lead frame 1a ... Metal plate 1b ... Noble metal plating layer 1c ... Undercoat plating layer 1d ... Ag-X alloy plating layer 1e ... Oxide film 2 ... Pad part 2a .... Lead part 3, 3a ... Radiating part 4 ... Filling resin 4a ... Light reflecting ring 5 ... Transparent resin 10 ... LED chip (semiconductor light emitting element)
20 ... Hanging bar 30 ... Tie bar 40 ... Upper mold 40a ... Light reflecting ring recess 41 ... Lower mold 42 ... Inlet 43 ... Recess 50 ... Up Mold A ... Semiconductor light emitting element mounting surface B ... Heat radiation back surface BX, BY ... Dividing line C into pieces C ... Electrical connection area D ... Heat radiation back surface E ... Stepped part or tapered part E1... Tapered part (or chamfered part)
H ... Overhanging plating part LE ... Semiconductor light emitting device P ... Metal plate-resin boundary t1 ... Metal plate thickness t2 ... Superstructure height t3 ...・ Lower structure height W ・ ・ ・ Wire Z ・ ・ ・ 1 unit frame

Claims (6)

A pad portion for mounting a semiconductor light emitting element and a lead portion electrically connected to the semiconductor light emitting element are formed of a metal plate, and a filling resin is filled in a gap portion between the pad portion and the lead portion of the metal plate. A lead frame for a semiconductor light emitting device, wherein the surface of the filling resin, the pad portion of the metal plate exposed from the filling resin, and the surface of the lead portion are formed flush with each other,
A noble metal plating layer is formed on the surface of the metal plate exposed from the filling resin, and an oxide film on the surface of the metal plate in contact with the filling resin is bonded to a polar group of the filling resin to thereby form the filling resin and the metal. A lead frame for a semiconductor light-emitting device, wherein adhesion to the plate is enhanced to prevent moisture from entering into a gap between the filling resin and the metal plate.   2. The lead frame for a semiconductor light emitting device according to claim 1, wherein the noble metal plating layer is a plating layer in which a plating portion is projected in an overhang shape on the surface of the filling resin, and the overhang plating portion is A lead frame for a semiconductor light emitting device, wherein a gap at an interface between the filling resin and the noble metal plating layer is blocked to prevent moisture from entering into a gap between the filling resin and the metal plate.   3. The lead frame for a semiconductor light emitting device according to claim 1, wherein the noble metal plating layer includes at least a silver plating layer on the metal plate side and a silver alloy plating layer on the silver plating layer. The silver alloy plating layer contains at least one of Zn, Au, Pd, Mg, Ce, Rh, Cu, In, and Sn as an X component, and the thickness of the silver alloy plating layer is the lower layer. A lead frame for a semiconductor light emitting device, characterized in that it is thinner than the thickness of the silver plating layer.   4. The lead frame for a semiconductor light emitting device according to claim 1, wherein the noble metal plating layer is laminated on the hard base plating layer and the base plating layer from the metal plate side. 5. A lead frame for a semiconductor light emitting device. A pad part for mounting the semiconductor light emitting element and a lead part electrically connected to the semiconductor light emitting element are formed of a metal plate, and a gap resin between the pad part and the lead part of the metal plate is filled with a filling resin. A method of manufacturing a lead frame for a semiconductor light emitting device, wherein the surface of the filling resin and the pad portion of the metal plate exposed from the filling resin and the surface of the lead portion are formed flush with each other,
From the step of forming the pad portion and the lead portion by etching a metal plate, the step of filling the gap portion between the pad portion and the lead portion of the metal plate with a filling resin, and the filling resin Forming a noble metal plating layer on the exposed surface of the metal plate;
By bonding an oxide film on the surface of the metal plate in contact with the filling resin to the polar group of the filling resin, the adhesion between the metal plate and the filling resin is enhanced, and moisture in the gap between the filling resin and the metal plate is increased. A method of manufacturing a lead frame for a semiconductor light emitting device, wherein the penetration is prevented.   6. The method of manufacturing a lead frame for a semiconductor light-emitting device according to claim 5, wherein the step of forming the noble metal plating is overhanging on the surface of the metal plate exposed from the filler resin. It is a step of forming a noble metal plating layer with a plating portion protruding, and a gap between the filling resin and the noble metal plating layer is blocked by the overhanging plating portion, thereby A method for manufacturing a lead frame for a semiconductor light-emitting device, which prevents moisture from entering into the gap.

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