JP2012148397A - 3層チップスケールmemsデバイスのためのシステムおよび方法 - Google Patents
3層チップスケールmemsデバイスのためのシステムおよび方法 Download PDFInfo
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- 238000000034 method Methods 0.000 title claims abstract description 99
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/84—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by variation of applied mechanical force, e.g. of pressure
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B7/00—Microstructural systems; Auxiliary parts of microstructural devices or systems
- B81B7/0032—Packages or encapsulation
- B81B7/0035—Packages or encapsulation for maintaining a controlled atmosphere inside of the chamber containing the MEMS
- B81B7/0038—Packages or encapsulation for maintaining a controlled atmosphere inside of the chamber containing the MEMS using materials for controlling the level of pressure, contaminants or moisture inside of the package, e.g. getters
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B7/00—Microstructural systems; Auxiliary parts of microstructural devices or systems
- B81B7/0032—Packages or encapsulation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B7/00—Microstructural systems; Auxiliary parts of microstructural devices or systems
- B81B7/0032—Packages or encapsulation
- B81B7/0074—3D packaging, i.e. encapsulation containing one or several MEMS devices arranged in planes non-parallel to the mounting board
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B7/00—Microstructural systems; Auxiliary parts of microstructural devices or systems
- B81B7/0032—Packages or encapsulation
- B81B7/0077—Other packages not provided for in groups B81B7/0035 - B81B7/0074
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2201/00—Specific applications of microelectromechanical systems
- B81B2201/02—Sensors
- B81B2201/0228—Inertial sensors
- B81B2201/0235—Accelerometers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2201/00—Specific applications of microelectromechanical systems
- B81B2201/02—Sensors
- B81B2201/0228—Inertial sensors
- B81B2201/0242—Gyroscopes
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2201/00—Specific applications of microelectromechanical systems
- B81B2201/02—Sensors
- B81B2201/0228—Inertial sensors
- B81B2201/025—Inertial sensors not provided for in B81B2201/0235 - B81B2201/0242
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C2201/00—Manufacture or treatment of microstructural devices or systems
- B81C2201/01—Manufacture or treatment of microstructural devices or systems in or on a substrate
- B81C2201/0174—Manufacture or treatment of microstructural devices or systems in or on a substrate for making multi-layered devices, film deposition or growing
- B81C2201/019—Bonding or gluing multiple substrate layers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
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- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
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Abstract
【解決手段】微小電気機械システム(MEMS)デバイスのためのシステムおよび方法が提供される。一実施形態では、システムは、第1の外側層と、第1の組のMEMSデバイスを含む第1のデバイス層とを備え、第1のデバイス層は第1の外側層に接合される。システムは、第2の外側層と、第2の組のMEMSデバイスを含む第2のデバイス層とをさらに備え、第2のデバイス層は第2の外側層に接合される。さらに、システムは、第1の側と、第1の側と反対側の第2の側とを有する中央層を備え、第1の側は第1のデバイス層に接合され、第2の側は第2のデバイス層に接合される。
【選択図】図1
Description
[0001]本出願は、2010年11月23日に出願された米国特許仮出願第61/416,485号の優先権の利益を主張し、その開示は参照により本明細書に組み込まれる。
[0004]微小電気機械システム(MEMS)デバイスのためのシステムおよび方法が提供される。一実施形態では、システムは、第1の外側層と、第1の組のMEMSデバイスを含む第1のデバイス層とを備え、第1のデバイス層は第1の外側層に接合される。システムは、第2の外側層と、第2の組のMEMSデバイスを含む第2のデバイス層とをさらに備え、第2のデバイス層は第2の外側層に接合される。さらに、システムは、第1の側と、第1の側と反対側の第2の側とを有する中央層を備え、第1の側は第1のデバイス層に接合され、第2の側は第2のデバイス層に接合される。
[0016]以下の詳細な説明では、本発明の一部を形成し、実例として特定の例示的実施形態を示す添付図面を参照する。しかし、他の実施形態を利用することができ、論理的、機械的、および電気的な変更を行うことができることが理解されるべきである。さらに、描かれた図および明細において提示される方法は、個々のステップが行われ得る順序を限定するものと解釈されるべきではない。したがって、以下の詳細な説明は限定的な意味で解釈されるべきではない。
Claims (3)
- 第1の外側層(102)と、
第1の組のMEMSデバイス(122、123)を含む第1のデバイス層(108)であり、前記第1の外側層(102)に接合される、第1のデバイス層(108)と、
第2の外側層(106)と、
第2の組のMEMSデバイス(120、121)を含む第2のデバイス層(110)であり、前記第2の外側層(106)に接合される、第2のデバイス層(110)と、
第1の側と、前記第1の側と反対側の第2の側とを有する中央層(104)であり、前記第1の側が前記第1のデバイス層(108)に接合され、前記第2の側が前記第2のデバイス層(110)に接合される、中央層(104)と、
を備える微小電気機械システム(MEMS)デバイス。 - 前記第1の組のMEMSデバイス(122、123)が第1の組の加速度計および第1の組のジャイロスコープを含み、
前記第2の組のMEMSデバイス(120、121)が第2の組の加速度計および第2の組のジャイロスコープを含み、
前記第1の組のジャイロスコープおよび前記第2の組のジャイロスコープが第1の雰囲気タイプ中で気密封止され、前記第1の組の加速度計および前記第2の組の加速度計が第2の雰囲気タイプ中で気密封止される、請求項1に記載のMEMSデバイス。 - MEMSデバイスを形成する方法であって、
第1のデバイス層(108)を第1の外側層(102)に接合するステップであり、前記第1のデバイス層(108)が第1の組のMEMSデバイス(122、123)を含む、ステップと、
第2のデバイス層(110)を第2の外側層(106)に接合するステップであり、前記第2のデバイス層(110)が第2の組のMEMSデバイス(120、121)を含む、ステップと、
中央層(104)を前記第1のデバイス層(108)および前記第2のデバイス層(110)に接合するステップと、
を含む、方法。
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US41648510P | 2010-11-23 | 2010-11-23 | |
US61/416,485 | 2010-11-23 | ||
US13/296,642 US9171964B2 (en) | 2010-11-23 | 2011-11-15 | Systems and methods for a three-layer chip-scale MEMS device |
US13/296,642 | 2011-11-15 |
Publications (1)
Publication Number | Publication Date |
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JP2012148397A true JP2012148397A (ja) | 2012-08-09 |
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Application Number | Title | Priority Date | Filing Date |
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JP2011255386A Ceased JP2012148397A (ja) | 2010-11-23 | 2011-11-22 | 3層チップスケールmemsデバイスのためのシステムおよび方法 |
Country Status (4)
Country | Link |
---|---|
US (1) | US9171964B2 (ja) |
EP (1) | EP2455331B1 (ja) |
JP (1) | JP2012148397A (ja) |
CN (1) | CN102556939B (ja) |
Cited By (2)
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JP2013056413A (ja) * | 2011-09-08 | 2013-03-28 | Commissariat A L'energie Atomique & Aux Energies Alternatives | 制御された雰囲気下で気密封止された空胴を有する構造を作製する方法 |
WO2015166771A1 (ja) * | 2014-04-28 | 2015-11-05 | 日立オートモティブシステムズ株式会社 | 加速度検出装置 |
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CN102556939B (zh) | 2016-01-20 |
EP2455331A3 (en) | 2014-01-01 |
CN102556939A (zh) | 2012-07-11 |
US20120126349A1 (en) | 2012-05-24 |
US9171964B2 (en) | 2015-10-27 |
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EP2455331B1 (en) | 2014-06-18 |
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