JP2012142060A - Substrate for magnetic recording medium and method for manufacturing the same - Google Patents

Substrate for magnetic recording medium and method for manufacturing the same Download PDF

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JP2012142060A
JP2012142060A JP2011001288A JP2011001288A JP2012142060A JP 2012142060 A JP2012142060 A JP 2012142060A JP 2011001288 A JP2011001288 A JP 2011001288A JP 2011001288 A JP2011001288 A JP 2011001288A JP 2012142060 A JP2012142060 A JP 2012142060A
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recording medium
magnetic recording
substrate
plating layer
plating
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Takashi Watanabe
孝志 渡辺
Shigeyuki Nakayama
茂幸 中山
Norihiko Nakajima
典彦 中島
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Fuji Electric Co Ltd
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Abstract

PROBLEM TO BE SOLVED: To provide a substrate for a magnetic recording medium which enhances the hardness of a substrate while maintaining non-magnetic properties even when being subjected to a heat treatment at high temperature for a long period of time.SOLUTION: In the substrate for the magnetic recording medium including an aluminum alloy layer and an Ni-P-Mo plated layer formed on the aluminum alloy layer and the method for manufacturing the same, the Ni-P-Mo plated layer consists of 0.05-1.0 wt% of Mo, 9-15 wt% of P and the balance Ni, the substrate for the magnetic recording medium has a hardness of 650 Hv or more and a saturation magnetic flux density of 0.2 mT or less, and the method includes subjecting the Ni-P-Mo plated layer to a heat treatment in an inert atmosphere.

Description

本発明は、磁気記録媒体用基板およびその製造方法に関し、好適にはハードディスクドライブ(HDD)に搭載される磁気記録媒体用基板およびその製造方法に関する。   The present invention relates to a magnetic recording medium substrate and a manufacturing method thereof, and more preferably to a magnetic recording medium substrate mounted on a hard disk drive (HDD) and a manufacturing method thereof.

現在、パーソナルコンピュータ(PC)の記録装置として、HDDが広く用いられている。このHDDに用いられる磁気記録媒体用基板は、安価で加工性が良好なアルミニウム合金層の表面にNi−Pめっき層を形成したものが主流である。このような基板は、半導体媒体に比べ、安価で、大容量化に適している。   Currently, HDDs are widely used as recording devices for personal computers (PCs). A substrate for a magnetic recording medium used in this HDD is mainly one in which a Ni—P plating layer is formed on the surface of an aluminum alloy layer that is inexpensive and has good workability. Such a substrate is less expensive than a semiconductor medium and is suitable for increasing the capacity.

最近では、HDDの用途は、携帯用PCに拡大されている。携帯用PCの場合、運搬時または使用時の落下または衝撃によって、その磁気ヘッドが基板表面の磁性層に傷を付けることがある。そのため、携帯用PCのHDDには、運搬時または使用時の落下または衝撃に対する良好な耐衝撃性が必要とされている。   Recently, the use of HDDs has been expanded to portable PCs. In the case of a portable PC, the magnetic head may damage the magnetic layer on the substrate surface due to a drop or impact during transportation or use. Therefore, the HDD of the portable PC is required to have good impact resistance against dropping or impact during transportation or use.

上述のNi−P系のめっきに関連して、Ni−PめっきにMoを添加した無電解Ni−P−Moめっき浴およびめっき方法が提案されている(特許文献1を参照)。この無電解Ni−P−Moめっき浴およびめっき方法においては、Ni−P−Moめっき層が300℃で3時間加熱処理された場合でも非磁性を維持し、高析出速度でつきまわりよく得られることが見出されている。磁気記録媒体用基板の非磁性を維持する目的で、非磁性層の上に非晶質のNi−P−Mo合金層を形成した磁気記録媒体用基板も提案されている(特許文献2を参照)。   In connection with the above-described Ni-P plating, an electroless Ni-P-Mo plating bath and a plating method in which Mo is added to Ni-P plating have been proposed (see Patent Document 1). In this electroless Ni—P—Mo plating bath and plating method, even when the Ni—P—Mo plating layer is heat-treated at 300 ° C. for 3 hours, it maintains non-magnetism and can be obtained well at a high deposition rate. It has been found. In order to maintain the nonmagnetic property of the magnetic recording medium substrate, a magnetic recording medium substrate in which an amorphous Ni—P—Mo alloy layer is formed on the nonmagnetic layer has also been proposed (see Patent Document 2). ).

特開平5−263259号公報JP-A-5-263259 特開平5−266457号公報JP-A-5-266457

しかしながら、最近の磁気記録媒体に要求される耐衝撃性は高く、前記基板を用いただけでは、要求される耐衝撃性に十分に応えることができない。特許文献1および特許文献2は、いずれも、硬さを向上させる明示的な解決手段を提示していない。他方、前記基板を高温で加熱処理すると容易に磁性を帯びるという問題も解決する必要がある。   However, the impact resistance required for recent magnetic recording media is high, and the required impact resistance cannot be sufficiently met by just using the substrate. Neither Patent Document 1 nor Patent Document 2 presents explicit solution means for improving hardness. On the other hand, it is necessary to solve the problem that the substrate is easily magnetized when heated at a high temperature.

本発明は、上述の点に鑑み、高温、長時間加熱処理しても非磁性を保ちながら表面の硬さを向上させた磁気記録媒体用基板を提供することを目的とする。   An object of the present invention is to provide a substrate for a magnetic recording medium that has improved surface hardness while maintaining non-magnetism even after heat treatment at a high temperature for a long time.

本発明の第1の態様である磁気記録媒体用基板(以下単に基板ともいう)は、アルミニウム合金層と、このアルミニウム合金層の上に形成されたNi−P−Moめっき層とを含み、前記Ni−P−Moめっき層が、0.05〜1.0wt%のMo、9〜15wt%のPおよび残部Niからなり、前記磁気記録媒体用基板が、650Hv以上の硬さと、0.2mT(2Gauss)以下の飽和磁束密度とを有することを特徴とする。ここで、前記Ni−P−Moめっき層が、5μm以上15μm未満の厚さを有することが好ましい。また、前記Ni−P−Moめっき層が、0.6〜1.0wt%のMoを含むことが好ましい。   A magnetic recording medium substrate (hereinafter also simply referred to as a substrate) according to a first aspect of the present invention includes an aluminum alloy layer and a Ni-P-Mo plating layer formed on the aluminum alloy layer, The Ni—P—Mo plating layer is made of 0.05 to 1.0 wt% Mo, 9 to 15 wt% P and the balance Ni, and the magnetic recording medium substrate has a hardness of 650 Hv or more and 0.2 mT ( 2 Gauss) or less. Here, the Ni—P—Mo plating layer preferably has a thickness of 5 μm or more and less than 15 μm. Moreover, it is preferable that the said Ni-P-Mo plating layer contains 0.6-1.0 wt% Mo.

本発明の第2の態様である磁気記録媒体用基板の製造方法は、めっき法によって、アルミニウム合金層の上にNi−P−Moめっき層を形成する工程と、前記Ni−P−Moめっき層を不活性雰囲気で加熱処理する工程を含み、前記Ni−P−Moめっき層が、0.05〜1.0wt%のMo、9〜15wt%のPおよび残部Niからなることを特徴とする。ここで、加熱処理を、300℃以上320℃以下で行うことが好ましい。また、Ni−P−Moめっき層が、0.6〜1.0wt%のMoを含むことが好ましい。   The method for manufacturing a magnetic recording medium substrate according to the second aspect of the present invention includes a step of forming a Ni—P—Mo plating layer on an aluminum alloy layer by a plating method, and the Ni—P—Mo plating layer. The Ni—P—Mo plating layer is composed of 0.05 to 1.0 wt% Mo, 9 to 15 wt% P, and the balance Ni. Here, the heat treatment is preferably performed at 300 ° C. or higher and 320 ° C. or lower. Moreover, it is preferable that a Ni-P-Mo plating layer contains 0.6-1.0 wt% Mo.

本発明によれば、非磁性を保ちつつ表面の硬さを向上させた磁気記録媒体用基板を提供できる。特に、Ni−P−Moめっき層が5μm以上15μm未満の厚さを有すると、析出初期からのめっき欠陥(ピット)および、ポリッシュ後の欠陥も少ない。特に、Ni−P−Moめっき層が0.6〜1.0wt%のMoを含むと、320℃の加熱処理であっても非磁性を保ちつつ表面の硬さを向上させた磁気記録媒体用基板を提供できる。   According to the present invention, it is possible to provide a magnetic recording medium substrate having improved surface hardness while maintaining non-magnetism. In particular, when the Ni—P—Mo plating layer has a thickness of 5 μm or more and less than 15 μm, there are few plating defects (pits) from the initial stage of deposition and defects after polishing. In particular, when the Ni—P—Mo plating layer contains 0.6 to 1.0 wt% of Mo, the magnetic recording medium has improved surface hardness while maintaining non-magnetism even at 320 ° C. heat treatment. A substrate can be provided.

本発明の磁気記録媒体用基板の例を示した模式図である。It is the schematic diagram which showed the example of the board | substrate for magnetic recording media of this invention. Ni−P−Moめっき層のMo濃度(wt%)と飽和磁束密度(mT)との関係を示した図である。It is the figure which showed the relationship between Mo density | concentration (wt%) of a Ni-P-Mo plating layer, and a saturation magnetic flux density (mT). Ni−P−Moめっき層のMo濃度(wt%)と硬さ(Hv)との関係を示した図である。It is the figure which showed the relationship between Mo density | concentration (wt%) and hardness (Hv) of a Ni-P-Mo plating layer.

本発明の第1の形態である磁気記録媒体用基板(以下単に基板ともいう)は、アルミニウム合金層と、このアルミニウム合金層の上に形成されたNi−P−Moめっき層とを含む。図1に例として示すように、磁気記録媒体用基板10は、アルミニウムを主体とするアルミニウム合金層12上にNi−P−Moめっき層14を形成したものである。通常は、このNi−P−Moめっき層14上に磁性層16などが形成されて磁気記録媒体20を構成している。磁気記録媒体20は、ハードディスク等に通常使用されるものである。   A magnetic recording medium substrate (hereinafter also simply referred to as a substrate) according to the first embodiment of the present invention includes an aluminum alloy layer and a Ni—P—Mo plating layer formed on the aluminum alloy layer. As shown in FIG. 1 as an example, the magnetic recording medium substrate 10 is obtained by forming a Ni—P—Mo plating layer 14 on an aluminum alloy layer 12 mainly composed of aluminum. Normally, the magnetic recording medium 20 is configured by forming the magnetic layer 16 and the like on the Ni—P—Mo plating layer 14. The magnetic recording medium 20 is normally used for a hard disk or the like.

アルミニウム合金層12は、例えば、加熱溶融したアルミニウム合金材料を圧延、加熱焼鈍した後、規定の寸法に加工が行われたアルミニウム合金のブランク材から形成することができる。用いることができるアルミニウム合金は、例えばAl−Mg合金、Al−Cu合金である。アルミニウムを主体とするアルミニウム合金層12のアルミニウム濃度は、90.0〜99.8wt%が好ましい。   The aluminum alloy layer 12 can be formed from, for example, an aluminum alloy blank material that has been rolled and heat-annealed and then processed to a specified size after being heated and melted. Examples of the aluminum alloy that can be used include an Al—Mg alloy and an Al—Cu alloy. The aluminum concentration of the aluminum alloy layer 12 mainly composed of aluminum is preferably 90.0 to 99.8 wt%.

アルミニウム合金層12の上に形成されたNi−P−Moめっき層14は、0.05〜1.0wt%のMo、9〜15wt%のP、および84〜90.95wt%のNiを含む。Ni−P−Moめっき層14が0.05wt%以上のMoを含むため、加熱処理による磁性悪化(飽和磁束密度の増加)が防止される。Ni−P−Moめっき層14が、1.0wt%以下のMoを含むため、特に無電解めっき法では成膜速度が遅くならず、実用に適する。Ni−P−Moめっき層14が、9wt%以上のPを含むため、非晶質な皮膜が得られる。Ni−P−Moめっき層は、5μm以上15μm未満の厚さを有することが好ましい。Ni−P−Moめっき層が5μm以上の厚さを有するため、析出初期からのめっき欠陥(ピット)および、ポリッシュ後の欠陥も少ない。   The Ni—P—Mo plating layer 14 formed on the aluminum alloy layer 12 includes 0.05 to 1.0 wt% Mo, 9 to 15 wt% P, and 84 to 90.95 wt% Ni. Since the Ni—P—Mo plating layer 14 contains 0.05 wt% or more of Mo, magnetic deterioration (increase in saturation magnetic flux density) due to heat treatment is prevented. Since the Ni—P—Mo plating layer 14 contains 1.0 wt% or less of Mo, the film formation rate is not slow particularly in the electroless plating method, which is suitable for practical use. Since the Ni—P—Mo plating layer 14 contains 9 wt% or more of P, an amorphous film can be obtained. The Ni—P—Mo plating layer preferably has a thickness of 5 μm or more and less than 15 μm. Since the Ni—P—Mo plating layer has a thickness of 5 μm or more, there are few plating defects (pits) from the initial stage of deposition and defects after polishing.

本発明の磁気記録媒体用基板は、650Hv以上の硬さを有する。本発明における磁気記録媒体用基板の「硬さ」は、マイクロビッカース硬さを意味する。前述の範囲内の硬さを有することによって、本発明の磁気記録媒体用基板は、所望の耐衝撃性を発揮する。   The magnetic recording medium substrate of the present invention has a hardness of 650 Hv or more. The “hardness” of the magnetic recording medium substrate in the present invention means micro Vickers hardness. By having the hardness within the above-mentioned range, the magnetic recording medium substrate of the present invention exhibits desired impact resistance.

本発明の磁気記録媒体用基板は、0.2mT(2Gauss)以下の飽和磁束密度を有する。前述の範囲内の飽和磁束密度を有することによって、本発明の磁気記録媒体用基板は、所望の非磁性を発揮する。   The magnetic recording medium substrate of the present invention has a saturation magnetic flux density of 0.2 mT (2 Gauss) or less. By having the saturation magnetic flux density within the above-mentioned range, the magnetic recording medium substrate of the present invention exhibits desired non-magnetism.

本発明の第2の形態である磁気記録媒体用基板の製造方法は、めっき法によって、アルミニウム合金層の上にNi−P−Moめっき層を形成する工程と、前記Ni−P−Moめっき層を不活性雰囲気で加熱処理する工程とを含み、前記Ni−P−Moめっき層が、0.05〜1.0wt%のMo、9〜15wt%のPおよび残部Niからなることを特徴とする。不活性雰囲気は、例えば、窒素、アルゴン等の不活性ガスとすることができる。   The method for manufacturing a magnetic recording medium substrate according to the second aspect of the present invention includes a step of forming a Ni—P—Mo plating layer on an aluminum alloy layer by a plating method, and the Ni—P—Mo plating layer. The Ni—P—Mo plating layer is composed of 0.05 to 1.0 wt% Mo, 9 to 15 wt% P, and the balance Ni. . The inert atmosphere can be, for example, an inert gas such as nitrogen or argon.

Ni−P−Moめっき層の形成には、従来から使用されている磁気記録媒体用基板のNiPめっき液にMo塩を添加させたNi−P−Moめっき液を用いる。Mo塩としては、モリブデン酸ナトリウム、モリブデン酸アンモニウム、モリブデン酸カリウム、モリブデン酸カルシウム、リンモリブデン酸、リンモリブデン酸アンモニウム等を用いることができる。めっきは無電解めっきにより行うのが好ましい。めっき(無電解めっき)によって形成されるNi−P−Moめっき層の厚さは、めっき液への浸漬時間、めっき液の温度によって調整することが可能である。めっき時の条件は、特に限定されるものではないが、好ましい実施態様として、めっき浴のpHを4.5〜6.5とし、浴温を70〜100℃、好ましくは85〜95℃とし、浸漬時間を30〜60分間とする。   For the formation of the Ni—P—Mo plating layer, a Ni—P—Mo plating solution obtained by adding Mo salt to a NiP plating solution of a conventionally used magnetic recording medium substrate is used. As the Mo salt, sodium molybdate, ammonium molybdate, potassium molybdate, calcium molybdate, phosphomolybdic acid, ammonium phosphomolybdate, or the like can be used. Plating is preferably performed by electroless plating. The thickness of the Ni—P—Mo plating layer formed by plating (electroless plating) can be adjusted by the immersion time in the plating solution and the temperature of the plating solution. Although the conditions at the time of plating are not particularly limited, as a preferred embodiment, the pH of the plating bath is 4.5 to 6.5, the bath temperature is 70 to 100 ° C, preferably 85 to 95 ° C, Immersion time is 30 to 60 minutes.

加熱処理を、300℃以上320℃以下で行うことが好ましい。加熱処理が300℃以上であるため基板の所望の硬さが得られ、加熱処理が320℃以下であるため基板の非磁性を維持することができる。   The heat treatment is preferably performed at 300 ° C. or higher and 320 ° C. or lower. Since the heat treatment is 300 ° C. or higher, the desired hardness of the substrate can be obtained, and since the heat treatment is 320 ° C. or lower, the non-magnetic property of the substrate can be maintained.

磁気記録媒体用基板は、重要な特性として、非磁性すなわち飽和磁束密度が0.2mT(2Gauss)以下であることを必要とする。このため、従来技術において、アルミニウム合金層の表面処理には、9〜15wt%のP、無電解めっきでは12wt%程度の高濃度(高含有率)のPを含むNiPめっき層を形成して、非磁性を確保している。しかしながら、加熱処理の温度を上昇させた場合、および長時間にわたる加熱処理を行った場合には、NiPめっき層の磁性が悪化(飽和磁束密度が増加)して非磁性を確保できない。この加熱処理による磁性の悪化を防止するために、Moを添加することが知られている。他方で、高濃度のPを含むNiPめっきを加熱処理(アニール)して、硬さを向上させることが知られている。本願発明者は、Moの添加により磁気記録媒体用基板の硬さが顕著に向上することを見出した。具体的には、本願発明者は、磁気記録媒体用基板のめっき層に所定の量のMoを含有させ、これを所定の温度範囲で加熱処理すると、前記基板の非磁性が確保されるだけでなく、前記基板の硬さも顕著に向上することを見出したのである。   An important characteristic of a magnetic recording medium substrate is that it is non-magnetic, that is, the saturation magnetic flux density is 0.2 mT (2 Gauss) or less. For this reason, in the prior art, for the surface treatment of the aluminum alloy layer, a NiP plating layer containing 9 to 15 wt% of P, and in electroless plating containing a high concentration (high content) of P of about 12 wt%, Ensures non-magnetism. However, when the temperature of the heat treatment is increased and when the heat treatment is performed for a long time, the magnetism of the NiP plating layer is deteriorated (saturation magnetic flux density is increased), and non-magnetism cannot be ensured. In order to prevent the deterioration of magnetism due to this heat treatment, it is known to add Mo. On the other hand, it is known that NiP plating containing a high concentration of P is heat-treated (annealed) to improve the hardness. The inventor of the present application has found that the addition of Mo significantly increases the hardness of the magnetic recording medium substrate. Specifically, the inventor of the present application includes a predetermined amount of Mo in the plating layer of the magnetic recording medium substrate and heat-treats it in a predetermined temperature range, so that the non-magnetism of the substrate is ensured only. In addition, the inventors have found that the hardness of the substrate is also significantly improved.

以下、実験例および比較例を示し、本発明を具体的に説明するが、本発明は実験例および比較例に制限されるものではない。   EXAMPLES Hereinafter, although an experiment example and a comparative example are shown and this invention is demonstrated concretely, this invention is not restrict | limited to an experiment example and a comparative example.

(実験例1〜5)
Al合金/Ni−P−Mo基板
内径φ20mm、外形φ65mm、厚さ0.8mmのAl−Mg合金製の円環状アルミニウム合金層に対して、従来の条件に従って、アルカリ脱脂、酸エッチング、ジンケート処理を順次行った。次いで、このアルミニウム合金層を第1表の組成からなるめっき液(硫酸およびアンモニア水でpH4.5に調節し、90℃に加温したもの)中に90分浸漬してNi−P−Moめっき層を形成した。蛍光X線分析装置を用いてNi−P−Moめっき層の厚さを測定した。厚さは12μmであった。
(Experimental Examples 1-5)
Al alloy / Ni-P-Mo substrate Al-Mg alloy annular aluminum alloy layer with inner diameter φ20mm, outer diameter φ65mm, thickness 0.8mm is subjected to alkali degreasing, acid etching and zincate treatment according to conventional conditions We went sequentially. Next, this aluminum alloy layer was immersed in a plating solution having the composition shown in Table 1 (pH 4.5 adjusted with sulfuric acid and ammonia water and heated to 90 ° C.) for 90 minutes, and Ni—P—Mo plating was performed. A layer was formed. The thickness of the Ni—P—Mo plating layer was measured using a fluorescent X-ray analyzer. The thickness was 12 μm.

Figure 2012142060
Figure 2012142060

Figure 2012142060
Figure 2012142060

次に、このNi−P−Moめっき層を、第2表に示す条件で、クリーンオーブン使用して、窒素ガス雰囲気下で加熱処理して、磁気記録媒体用基板を得た。次いで、得られた磁気記録媒体用基板のマイクロビッカース硬さ(Hv)および飽和磁束密度(mT)を測定した。   Next, this Ni—P—Mo plating layer was heat-treated in a nitrogen gas atmosphere using a clean oven under the conditions shown in Table 2 to obtain a magnetic recording medium substrate. Next, the micro Vickers hardness (Hv) and saturation magnetic flux density (mT) of the obtained magnetic recording medium substrate were measured.

Figure 2012142060
Figure 2012142060

Figure 2012142060
Figure 2012142060

マイクロビッカース硬さ(Hv)は、5gの荷重でマイクロビッカース法(四角錐圧子)により測定した。   Micro Vickers hardness (Hv) was measured by a micro Vickers method (square pyramid indenter) with a load of 5 g.

飽和磁束密度(mT)は、VSM−P7−15型を使用して、磁化測定感度約2×10−6emu、最大印加磁場5kOe、試料8mm角により測定した。   The saturation magnetic flux density (mT) was measured using a VSM-P7-15 type with a magnetization measurement sensitivity of about 2 × 10 −6 emu, a maximum applied magnetic field of 5 kOe, and a sample 8 mm square.

図2は、Ni−P−Moめっき層のMo濃度(wt%)と飽和磁束密度(mT)との関係を示す。磁気記録媒体用基板は、Moの0.05wt%以上の添加により、飽和磁束密度が顕著に低減した。300℃以上320℃以下の高温の加熱処理においては、飽和磁束密度の低減効果が大きかった。特に、Moを0.6から1.0wt%添加すると、320℃の加熱処理でも非磁性を維持できることが確認された。但し、330℃では非磁性とはならなかった。   FIG. 2 shows the relationship between the Mo concentration (wt%) and the saturation magnetic flux density (mT) of the Ni—P—Mo plating layer. In the magnetic recording medium substrate, the saturation magnetic flux density was significantly reduced by adding 0.05 wt% or more of Mo. In the heat treatment at a high temperature of 300 ° C. or higher and 320 ° C. or lower, the effect of reducing the saturation magnetic flux density was great. In particular, it was confirmed that when Mo was added in an amount of 0.6 to 1.0 wt%, non-magnetism could be maintained even by heat treatment at 320 ° C. However, it was not non-magnetic at 330 ° C.

図3は、Ni−P−Moめっき層のMo濃度(wt%)と硬さ(Hv)との関係を示す。この図は、磁気記録媒体用基板の加熱処理(アニール)後の硬さ変化を示すものである。Moを0.05wt%以上添加したNi−P−Moめっき層は、加熱処理により、Ni−Pめっき層(Moが0wt%)よりも顕著に硬さが向上した。   FIG. 3 shows the relationship between the Mo concentration (wt%) and the hardness (Hv) of the Ni—P—Mo plating layer. This figure shows the change in hardness after heat treatment (annealing) of the magnetic recording medium substrate. The Ni—P—Mo plating layer to which 0.05 wt% or more of Mo was added was significantly improved in hardness as compared with the Ni—P plating layer (Mo is 0 wt%) by heat treatment.

Claims (6)

アルミニウム合金層と、このアルミニウム合金層の上に形成されたNi−P−Moめっき層とを含む磁気記録媒体用基板であって、
前記Ni−P−Moめっき層が、0.05〜1.0wt%のMo、9〜15wt%のPおよび残部Niからなり、
前記磁気記録媒体用基板が、650Hv以上の硬さと、0.2mT以下の飽和磁束密度とを有することを特徴とする磁気記録媒体用基板。
A magnetic recording medium substrate comprising an aluminum alloy layer and a Ni-P-Mo plating layer formed on the aluminum alloy layer,
The Ni-P-Mo plating layer is composed of 0.05 to 1.0 wt% Mo, 9 to 15 wt% P and the balance Ni,
The magnetic recording medium substrate has a hardness of 650 Hv or more and a saturation magnetic flux density of 0.2 mT or less.
前記Ni−P−Moめっき層が、5μm以上15μm未満の厚さを有することを特徴とする請求項1に記載の磁気記録媒体用基板。   The magnetic recording medium substrate according to claim 1, wherein the Ni—P—Mo plating layer has a thickness of 5 μm or more and less than 15 μm. 前記Ni−P−Moめっき層が、0.6〜1.0wt%のMoを含むことを特徴とする請求項1又は2に記載の磁気記録媒体用基板。   The magnetic recording medium substrate according to claim 1, wherein the Ni—P—Mo plating layer contains 0.6 to 1.0 wt% of Mo. 磁気記録媒体用基板の製造方法であって、
めっき法によって、アルミニウム合金層の上にNi−P−Moめっき層を形成する工程と、
前記Ni−P−Moめっき層を不活性雰囲気で加熱処理する工程とを含み、
前記Ni−P−Moめっき層が、0.05〜1.0wt%のMo、9〜15wt%のPおよび残部Niからなることを特徴とする方法。
A method for manufacturing a substrate for a magnetic recording medium, comprising:
Forming a Ni-P-Mo plating layer on the aluminum alloy layer by a plating method;
Heat-treating the Ni-P-Mo plating layer in an inert atmosphere,
The Ni-P-Mo plating layer is composed of 0.05 to 1.0 wt% Mo, 9 to 15 wt% P and the balance Ni.
前記加熱処理を、300℃以上320℃以下で行うことを特徴とする請求項4に記載の方法。   The method according to claim 4, wherein the heat treatment is performed at 300 ° C. or higher and 320 ° C. or lower. 前記Ni−P−Moめっき層が、0.6〜1.0wt%のMoを含むことを特徴とする請求項4又は5に記載の方法。   The method according to claim 4 or 5, wherein the Ni-P-Mo plating layer contains 0.6 to 1.0 wt% of Mo.
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7459715B2 (en) 2020-08-03 2024-04-02 株式会社レゾナック Substrate for magnetic recording medium, magnetic recording medium and magnetic storage device

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63239602A (en) * 1986-11-10 1988-10-05 Tdk Corp Magnetic recording method
JPH05266457A (en) * 1992-03-19 1993-10-15 C Uyemura & Co Ltd Magnetic recording body
JP2005203078A (en) * 2003-12-18 2005-07-28 Fuji Electric Device Technology Co Ltd Method for manufacturing substrate for magnetic recording medium, substrate for magnetic recording medium, and magnetic recording medium

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63239602A (en) * 1986-11-10 1988-10-05 Tdk Corp Magnetic recording method
JPH05266457A (en) * 1992-03-19 1993-10-15 C Uyemura & Co Ltd Magnetic recording body
JP2005203078A (en) * 2003-12-18 2005-07-28 Fuji Electric Device Technology Co Ltd Method for manufacturing substrate for magnetic recording medium, substrate for magnetic recording medium, and magnetic recording medium

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7459715B2 (en) 2020-08-03 2024-04-02 株式会社レゾナック Substrate for magnetic recording medium, magnetic recording medium and magnetic storage device

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