JP2012139923A5 - Liquid jet head and method of manufacturing the same, liquid jet device, piezoelectric element, ultrasonic sensor, and infrared sensor - Google Patents

Liquid jet head and method of manufacturing the same, liquid jet device, piezoelectric element, ultrasonic sensor, and infrared sensor Download PDF

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JP2012139923A5
JP2012139923A5 JP2010294368A JP2010294368A JP2012139923A5 JP 2012139923 A5 JP2012139923 A5 JP 2012139923A5 JP 2010294368 A JP2010294368 A JP 2010294368A JP 2010294368 A JP2010294368 A JP 2010294368A JP 2012139923 A5 JP2012139923 A5 JP 2012139923A5
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piezoelectric
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liquid jet
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ノズル開口に連通する圧力発生室と、
圧電体層と前記圧電体層に設けられた電極とを備えた圧電素子と、を具備する液体噴射ヘッドの製造方法であって、
第１圧電体膜形成用組成物を塗布して第１圧電体前駆体膜を形成する工程及び該第１圧電体前駆体膜を加熱することにより結晶化させて第１圧電体膜を形成する工程を備え、Ａサイトに、カリウム及びナトリウムを含み、Ｂサイトにニオブを含むペロブスカイト構造の複合酸化物を含む圧電材料からなる第１圧電体膜を有する第１圧電体層を前記電極上方に形成する工程と、
気相成長法により中間層を前記第１圧電体層上に形成する工程と、
第２圧電体膜形成用組成物を塗布して第２圧電体前駆体膜を形成する工程及び該第２圧電体前駆体膜を加熱することにより結晶化させて第２圧電体膜を形成する工程を備え、Ａサイトに、カリウム及びナトリウムを含み、Ｂサイトにニオブを含むペロブスカイト構造の複合酸化物を含む圧電材料からなる第２圧電体膜を有する第２圧電体層を前記中間層上に形成する工程と、
を具備し、前記第１圧電体層、中間層、及び前記第２圧電体層からなる前記圧電体層を形成することを特徴とする液体噴射ヘッドの製造方法。 A pressure generating chamber in communication with the nozzle opening;
A method of manufacturing a liquid jet head comprising: a piezoelectric element comprising a piezoelectric layer and an electrode provided on the piezoelectric layer,
Applying a composition for forming a first piezoelectric film to form a first piezoelectric precursor film, and heating the first piezoelectric precursor film to crystallize it to form a first piezoelectric film Forming a first piezoelectric layer having a first piezoelectric film made of a piezoelectric material containing a complex oxide of a perovskite structure containing potassium and sodium at site A and niobium at site B on the electrode The process to
Forming an intermediate layer on the first piezoelectric layer by a vapor deposition method;
Applying a composition for forming a second piezoelectric film to form a second piezoelectric precursor film, and heating the second piezoelectric precursor film to crystallize it to form a second piezoelectric film A second piezoelectric layer having a second piezoelectric film made of a piezoelectric material containing a complex oxide of a perovskite structure containing potassium and sodium at A site and niobium at B site on the intermediate layer Forming step;
A method of manufacturing a liquid jet head, comprising: forming the piezoelectric layer comprising the first piezoelectric layer, the intermediate layer, and the second piezoelectric layer. 前記中間層は、ペロブスカイト構造の複合酸化物からなることを特徴とする請求項１に記載の液体噴射ヘッドの製造方法。   The method for manufacturing a liquid jet head according to claim 1, wherein the intermediate layer is made of a complex oxide of a perovskite structure. 前記中間層は、ニオブ酸カリウムナトリウム、鉄酸ビスマス、鉄酸マンガン酸ビスマス、チタン酸バリウム、チタン酸ビスマス、又はチタン酸ビスマスナトリウムからなることを特徴とする請求項１又は２に記載の液体噴射ヘッドの製造方法。   The liquid injection according to claim 1 or 2, wherein the intermediate layer is made of potassium niobate, bismuth ferrate, bismuth ferrate manganate, barium titanate, bismuth titanate, or bismuth sodium titanate. Head manufacturing method. 前記気相成長法は、スパッタリング法であることを特徴とする請求項１〜３のいずれか一項に記載の液体噴射ヘッドの製造方法。   The method for manufacturing a liquid jet head according to any one of claims 1 to 3, wherein the vapor phase growth method is a sputtering method. 前記中間層の厚さが２０〜１００ｎｍとなるように形成することを特徴とする請求項１〜４のいずれか一項に記載の液体噴射ヘッドの製造方法。   The method for manufacturing a liquid jet head according to any one of claims 1 to 4, wherein the thickness of the intermediate layer is formed to be 20 to 100 nm. 前記第１圧電体層及び前記第２圧電体層は、それぞれ厚さが５００ｎｍ以下となるように形成することを特徴とする請求項１〜５のいずれか一項に記載の液体噴射ヘッドの製造方法。   The liquid jet head according to any one of claims 1 to 5, wherein the first piezoelectric layer and the second piezoelectric layer are formed to have a thickness of 500 nm or less. Method. ノズル開口に連通する圧力発生室と、
圧電体層と前記圧電体層に設けられた電極とを備えた圧電素子と、を具備し、
前記圧電体層は、
ＣＳＤ法（Chemical Solution Deposition）により形成され、Ａサイトに、カリウム及びナトリウムを含み、Ｂサイトにニオブを含むペロブスカイト構造の複合酸化物を含む圧電材料からなる第１圧電体層及び第２圧電体層と、
前記第１圧電体層と前記第２圧電体層との間に設けられ、気相成長法により形成された中間層と、を備えることを特徴とする液体噴射ヘッド。 A pressure generating chamber in communication with the nozzle opening;
A piezoelectric element comprising a piezoelectric layer and an electrode provided on the piezoelectric layer;
The piezoelectric layer is
A first piezoelectric layer and a second piezoelectric layer formed by a CSD method (Chemical Solution Deposition), comprising a piezoelectric material containing a complex oxide of a perovskite structure containing potassium and sodium at the A site and niobium at the B site When,
A liquid jet head comprising: an intermediate layer provided between the first piezoelectric layer and the second piezoelectric layer and formed by a vapor deposition method. 請求項１〜６のいずれか一項に記載の液体噴射ヘッドの製造方法により製造された液体噴射ヘッドを具備することを特徴とする液体噴射装置。   A liquid jet apparatus comprising the liquid jet head manufactured by the method of manufacturing a liquid jet head according to any one of claims 1 to 6. 第１電極と、圧電体層と、第２電極と、を備える圧電素子の製造方法であって、
第１圧電体膜形成用組成物を塗布して第１圧電体前駆体膜を形成する工程及び該第１圧電体前駆体膜を加熱することにより結晶化させて第１圧電体膜を形成する工程を備え、Ａサイトに、カリウム及びナトリウムを含み、Ｂサイトにニオブを含むペロブスカイト構造の複合酸化物を含む圧電材料からなる第１圧電体膜を有する第１圧電体層を前記第１電極上方に形成する工程と、
気相成長法により中間層を前記第１圧電体層上に形成する工程と、
第２圧電体膜形成用組成物を塗布して第２圧電体前駆体膜を形成する工程及び該第２圧電体前駆体膜を加熱することにより結晶化させて第２圧電体膜を形成する工程を備え、Ａサイトに、カリウム及びナトリウムを含み、Ｂサイトにニオブを含むペロブスカイト構造の複合酸化物を含む圧電材料からなる第２圧電体膜を有する第２圧電体層を前記中間層上に形成する工程と、
を具備し、前記第１圧電体層、中間層、及び前記第２圧電体層からなる前記圧電体層を形成することを特徴とする圧電素子の製造方法。 A method of manufacturing a piezoelectric element, comprising: a first electrode, a piezoelectric layer, and a second electrode,
Applying a composition for forming a first piezoelectric film to form a first piezoelectric precursor film, and heating the first piezoelectric precursor film to crystallize it to form a first piezoelectric film A first piezoelectric layer having a first piezoelectric film made of a piezoelectric material containing a complex oxide of the perovskite structure containing potassium and sodium at the A site and niobium containing the B site at the upper side of the first electrode Forming in
Forming an intermediate layer on the first piezoelectric layer by a vapor deposition method;
Applying a composition for forming a second piezoelectric film to form a second piezoelectric precursor film, and heating the second piezoelectric precursor film to crystallize it to form a second piezoelectric film A second piezoelectric layer having a second piezoelectric film made of a piezoelectric material containing a complex oxide of a perovskite structure containing potassium and sodium at A site and niobium at B site on the intermediate layer Forming step;
And manufacturing the piezoelectric layer comprising the first piezoelectric layer, the intermediate layer, and the second piezoelectric layer. 請求項９に記載の圧電素子の製造方法により製造された圧電素子を具備することを特徴とする超音波センサー。  An ultrasonic sensor comprising the piezoelectric element manufactured by the method of manufacturing a piezoelectric element according to claim 9. 請求項９に記載の圧電素子の製造方法により製造された圧電素子を具備することを特徴とする赤外線センサー。  An infrared sensor comprising the piezoelectric element manufactured by the method of manufacturing a piezoelectric element according to claim 9.
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Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015038953A (en) 2013-06-28 2015-02-26 セイコーエプソン株式会社 Piezoelectric material, piezoelectric element, liquid injection head, liquid injection device, ultrasonic sensor, piezoelectric motor and power generator
JP5754660B2 (en) 2013-06-28 2015-07-29 セイコーエプソン株式会社 Piezoelectric material, piezoelectric element, liquid ejecting head, liquid ejecting apparatus, ultrasonic sensor, piezoelectric motor, and power generation apparatus
JP5761540B2 (en) 2013-06-28 2015-08-12 セイコーエプソン株式会社 Piezoelectric material, piezoelectric element, liquid ejecting head, liquid ejecting apparatus, ultrasonic sensor, piezoelectric motor, and power generation apparatus
JP6478070B2 (en) 2014-12-26 2019-03-06 セイコーエプソン株式会社 Piezoelectric material, manufacturing method thereof, piezoelectric element, and piezoelectric element applied device
JP6560897B2 (en) * 2015-05-20 2019-08-14 スタンレー電気株式会社 Piezoelectric film laminate, method of manufacturing the same, and optical scanner
KR20200094995A (en) * 2019-01-31 2020-08-10 삼성전기주식회사 Bulk-acoustic wave resonator
CN114068799A (en) * 2020-07-30 2022-02-18 丰田自动车株式会社 Niobate base leadless ferroelectric piezoelectric film and preparation method thereof

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4005A (en) * 1845-04-22 Improvement in the manufacture of indurated rubber fabrics
DE2742921C2 (en) * 1977-09-23 1985-07-11 Siemens AG, 1000 Berlin und 8000 München Process for the indirect connection of two parts by welding two metal supports
JPH0727559A (en) * 1993-07-15 1995-01-27 Nikon Corp Cantilever with thin film type displacement sensor
JPH1187791A (en) * 1997-09-02 1999-03-30 Seiko Epson Corp Piezoelectric element, ink jet recording head and manufacture thereof
JPH11191645A (en) * 1997-12-25 1999-07-13 Kyocera Corp Piezoelectric-electrostrictive film actuator
JP2001063048A (en) * 1999-08-26 2001-03-13 Kyocera Corp Piezoelectric/electrostriction film type actuator and ink jet printing head using the same
JP5168717B2 (en) * 2001-02-09 2013-03-27 セイコーエプソン株式会社 Piezoelectric element, ink jet recording head, and ink jet printer
JP2004128492A (en) * 2002-09-13 2004-04-22 Matsushita Electric Ind Co Ltd Piezoelectric thin-film element and actuator using it, ink jet head and ink jet recording device
JP2005123421A (en) * 2003-10-17 2005-05-12 Matsushita Electric Ind Co Ltd Piezoelectric thin film element, ink jet head, ink jet type recorder, angular velocity sensor, and piezoelectric actuator for disk unit
JP2007142261A (en) * 2005-11-21 2007-06-07 Seiko Epson Corp Piezoelectric element, piezoelectric actuator and ink-jet recording head
JP4735840B2 (en) * 2005-12-06 2011-07-27 セイコーエプソン株式会社 Piezoelectric laminate, surface acoustic wave device, thin film piezoelectric resonator, and piezoelectric actuator
JP2007287918A (en) * 2006-04-17 2007-11-01 Seiko Epson Corp Piezoelectric laminate, manufacturing method of same, surface acoustic wave element, thin film piezoelectric resonator, and piezoelectric actuator
JP5103790B2 (en) * 2006-05-25 2012-12-19 日立電線株式会社 Piezoelectric thin film, element using piezoelectric thin film, and method for manufacturing piezoelectric thin film element
JP5115161B2 (en) * 2006-11-29 2013-01-09 日立電線株式会社 Piezoelectric thin film element
JP5495512B2 (en) * 2007-05-30 2014-05-21 キヤノン株式会社 Method for manufacturing piezoelectric element
JP5181649B2 (en) * 2007-09-18 2013-04-10 日立電線株式会社 Piezoelectric element

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